Updated on 2024/03/28

写真a

 
松山 智至
 
Organization
Graduate School of Engineering Professor
Graduate School
Graduate School of Engineering
Undergraduate School
School of Engineering Physical Science and Engineering
Title
Professor

Degree 1

  1. 博士(工学) ( 2007.2   大阪大学 ) 

Research Interests 5

  1. Deformable mirror

  2. X-ray interferometer

  3. X-ray nanobeam

  4. X-ray mirror

  5. X-ray microscope

Research Areas 4

  1. Nanotechnology/Materials / Optical engineering and photon science  / X-ray optics

  2. Energy Engineering / Quantum beam science  / synchrotron X-ray

  3. Nanotechnology/Materials / Nanomaterials

  4. Nanotechnology/Materials / Nanobioscience

Current Research Project and SDGs 2

  1. Development of high-resolution X-ray microscope

  2. Nanofocusing of X-ray free electron laser

Research History 3

  1. Osaka University Graduate School of Engineering .

    2020.10

  2. Nagoya University   Department of Materials Physics   Associate professor

    2020.10

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    Country:Japan

  3. Osaka University Graduate School of Engineering Division of Precision Science & Technology and Applied Physics   Assistant Professor

    2007.3 - 2020.9

Professional Memberships 3

  1. The Optical Society of Japan

    2020.11

  2. The Japan Society for Precision Engineering

  3. The Japanese Society for Synchrotron Radiation Research

Awards 8

  1. SPRUC 2015 Young Scientist Award

    2015.7   SPring-8ユーザー協同体  

    松山智至

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    Award type:International academic award (Japan or overseas)  Country:Japan

  2. 精密工学会技術奨励賞

    2012.9   精密工学会  

    松山智至

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    Award type:Award from Japanese society, conference, symposium, etc.  Country:Japan

  3. 精密工学会技術賞

    2022.9   精密工学会   接着剤フリーの高精度X線形状可変ミラーの実用化およびその商業展開

    一井 愛雄,城間 晋作,中森 紘基,松山 智至,井上 陽登

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    Award type:Award from Japanese society, conference, symposium, etc.  Country:Japan

  4. 2017年秋季大会ベストオーガナイザー賞

    2017.9   精密工学会  

    松山智至,湯本博勝

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    Award type:Award from Japanese society, conference, symposium, etc.  Country:Japan

  5. The 24th Congress of the International Comission for Optics (ICO-24), OSA/SPIE Student Paper Award

    2017.8   The 24th Congress of the International Comission for Optics  

    J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

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    Country:Japan

  6. 第30回日本放射光学会年会・放射光科学合同シンポジウムJSR2017学生発表賞

    2017.1   日本放射光学会  

    山田純平, 松山智至, 安田周平, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

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    Country:Japan

  7. 平成24年度コニカミノルタ画像科学奨励賞

    2013.3   コニカミノルタ科学技術振興財団  

    松山智至

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    Award type:Award from publisher, newspaper, foundation, etc.  Country:Japan

  8. 飛翔研究フェロー(‘飛翔30’若手プログラム)

    2010.9   大阪大学  

    松山智至

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    Country:Japan

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Papers 138

  1. Extreme focusing of hard X-ray free-electron laser pulses enables 7 nm focus width and 1022 W cm−2 intensity Reviewed

    J. Yamada, S. Matsuyama, I. Inoue, T. Osaka, T. Inoue, N. Nakamura, Y. Tanaka, Y. Inubushi, T. Yabuuchi, K. Tono, K. Tamasaku, H. Yumoto, T. Koyama, H. Ohashi, M. Yabasih, and K. Yamauchi

    Nature Photonics     2024.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41566-024-01411-4

  2. Propagation-based phase-contrast imaging method for full-field X-ray microscopy using advanced Kirkpatrick–Baez mirrors Reviewed

    Yuto Tanaka, Jumpei Yamada, Takato Inoue, Takashi Kimura, Mari Shimura, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi, Satoshi Matsuyama

    Optics Express   Vol. 31 ( 16 ) page: 26135 - 26144   2023.7

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Optica Publishing Group  

    We demonstrate a propagation-based phase-contrast imaging method for full-field X-ray microscopy based on advanced Kirkpatrick–Baez (AKB) mirrors to achieve high-contrast observations of weak phase objects and correct field curvature aberrations. Through a demonstration performed at SPring-8, the phase contrast of weak phase objects such as polystyrene spheres and chemically fixed cells was successfully observed with high sensitivity (∼0.03 rad). Furthermore, the field of view of the AKB mirrors was expanded to the full area of the obtained images (25 × 30 µm) by correcting the field curvature aberration using reconstructed complex wavefields.

    DOI: 10.1364/OE.493789

    Web of Science

    Scopus

    Other Link: https://opg.optica.org/viewmedia.cfm?URI=oe-31-16-26135&seq=0

  3. Wide field-of-view x-ray imaging optical system using grazing-incidence mirrors Reviewed

    Satoshi Matsuyama, Takato Inoue, Kentaro Hata, Haruhito Iriyama, Kazuto Yamauchi

    APPLIED OPTICS   Vol. 61 ( 35 ) page: 10465 - 10470   2022.12

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Optica Publishing Group  

    A field-curvature-corrected imaging optical system for x-ray microscopy using only grazing-incidence mirrors is proposed. It combines a Wolter type I (WO1) mirror pair, which forms a real image, with field curvature correction (FCC) optics-a convex hyperbolic mirror pair-that form a virtual image; compensation of the field curvatures realizes a wide field-of-view (FOV) and high magnification. Ray-tracing and wave-optics simulations verified the efficacy of the design, for which a FOV width was 111 mu m-4.7 times larger than that for the uncorrected WO1 design. The addition of FCC optics also produced a 2.3-fold increase in magnification.(c) 2022 Optica Publishing Group

    DOI: 10.1364/AO.475891

    Web of Science

    Scopus

  4. X-ray adaptive zoom condenser utilizing an intermediate virtual focus Reviewed

    Satoshi Matsuyama, Hiroyuki Yamaguchi, Takato Inoue, Yuka Nishioka, Jumpei Yamada, Yasuhisa Sano, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

    Optics Express   Vol. 29 ( 10 ) page: 15604 - 15615   2021.5

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:The Optical Society  

    DOI: 10.1364/OE.422723

    Web of Science

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    Other Link: https://www.osapublishing.org/viewmedia.cfm?URI=oe-29-10-15604&seq=0

  5. Generation of an X-ray nanobeam of free electron laser using reflective optics with speckle interferometry Reviewed

    T. Inoue, S. Matsuyama, J. Yamada, N. Nakamura, T. Osaka, I. Inoue, Y. Inubushi, K. Tono, H. Yumoto, T. Koyama, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

    Journal of Synchrotron Radiation   Vol. 27 ( 4 ) page: 883 - 889   2020.7

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:INT UNION CRYSTALLOGRAPHY  

    Ultimate focusing of an X-ray free-electron laser (XFEL) enables the generation of ultrahigh-intensity X-ray pulses. Although sub-10 nm focusing has already been achieved using synchrotron light sources, the sub-10 nm focusing of XFEL beams remains difficult mainly because the insufficient stability of the light source hinders the evaluation of a focused beam profile. This problem is specifically disadvantageous for the Kirkpatrick-Baez (KB) mirror focusing system, in which a slight misalignment of similar to 300 nrad can degrade the focused beam. In this work, an X-ray nanobeam of a free-electron laser was generated using reflective KB focusing optics combined with speckle interferometry. The speckle profiles generated by 2 nm platinum particles were systematically investigated on a single-shot basis by changing the alignment of the multilayer KB mirror system installed at the SPring-8 Angstrom Compact Free-Electron Laser, in combination with computer simulations. It was verified that the KB mirror alignments were optimized with the required accuracy, and a focused vertical beam of 5.8 nm (+/- 1.2 nm) was achieved after optimization. The speckle interferometry reported in this study is expected to be an effective tool for optimizing the alignment of nano-focusing systems and for generating an unprecedented intensity of up to 10(22) W cm(-2) using XFEL sources.

    DOI: 10.1107/S1600577520006980

    Web of Science

    PubMed

  6. Full-field X-ray fluorescence microscope based on total-reflection advanced Kirkpatrick-Baez mirror optics Reviewed

    S. Matsuyama, J. Yamada, Y. Kohmura, M. Yambashi, T. Ishikawa, K. Yamauchi

    Optics Express   Vol. 27 ( 13 ) page: 18318 - 18328   2019.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    A novel full-field X-ray fluorescence microscope based on total-reflection advanced Kirkpatrick–Baez mirror optics was developed. The total-reflection imaging mirror optics arrangement, with four reflections, has the advantage of being able to function both as a powerful low-pass energy filter, completely rejecting incident excitation X-rays, and as an achromatic optical imaging system. Isolated X-ray fluorescence signals can be imaged, avoiding imaging-detector saturation, with low background noise. A prototype fluorescence microscope constructed at SPring-8 demonstrated the capability to simultaneously image elemental distributions using various X-ray fluorescence signals (Ni, Cu, Zn, Ge, and Bi). A half-period spatial resolution of ~0.5–1 µm (1000–500 LP/mm) was achieved, owing to the achromaticity of the imaging mirrors and the photon-counting scheme of the CCD camera used for fluorescence detection.

    DOI: 10.1364/OE.27.018318

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  7. Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors Reviewed

    J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    Optics Express   Vol. 27 ( 3 ) page: 3429 - 3438   2019.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    We demonstrated that the combination of a hyperbolic convex and elliptical concave mirrors works as a compact reflective X-ray imaging system with a short optical focal length and large magnification factor. We performed an experiment to form a one-dimensional demagnified image with a demagnification factor of 321 within an approximately 2-m-long optical setup at an X-ray energy of 10 keV. The results showed that this imaging optics system is capable of providing a resolution of ~40 nm. From wavefront analysis, it was confirmed that the optics possessed a wide field-of-view with a significant reduction of comatic aberration.

    DOI: 10.1364/oe.27.003429

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  8. Nanofocusing of X-ray free-electron laser using wavefront-corrected multilayer focusing mirrors Reviewed

    S. Matsuyama, T. Inoue, J. Yamada, J. Kim, H. Yumoto, Y. Inubushi, T. Osaka, I. Inoue, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

    Scientific Reports   Vol. 8   2018.11

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:NATURE PUBLISHING GROUP  

    A method of fabricating multilayer focusing mirrors that can focus X-rays down to 10 nm or less was established in this study. The wavefront aberration induced by multilayer Kirkpatrick-Baez mirror optics was measured using a single grating interferometer at a photon energy of 9.1 keV at SPring-8 Angstrom Compact Free Electron Laser (SACLA), and the mirror shape was then directly corrected by employing a differential deposition method. The accuracies of these processes were carefully investigated, considering the accuracy required for diffraction-limited focusing. The wavefront produced by the corrected multilayer focusing mirrors was characterized again in the same manner, revealing that the root mean square of the wavefront aberration was improved from 2.7 (3.3) rad to 0.52 (0.82) rad in the vertical (horizontal) direction. A wave-optical simulator indicated that these wavefront-corrected multilayer focusing mirrors are capable of achieving sub-10-nm X-ray focusing.

    DOI: 10.1038/s41598-018-35611-0

    Web of Science

  9. A lipid index for risk of hyperlipidemia caused by anti-retroviral drugs. Reviewed

    Shimura M, Higashi-Kuwata N, Fujiwara A, Taniguchi M, Ichinose T, Hamano F, Uematsu M, Inoue T, Matsuyama S, Suzuki T, Ghosh AK, Shindou H, Shimuzu T, Mitsuya H

    Antiviral research   Vol. 223   page: 105819   2024.3

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Antiviral Research  

    HIV-associated lipodystrophy has been reported in people taking anti-retroviral therapy (ART). Lipodystrophy can cause cardiovascular diseases, affecting the quality of life of HIV-infected individuals. In this study, we propose a pharmacological lipid index to estimate the risk of hyperlipidemia caused by anti-retroviral drugs. Lipid droplets were stained in cells treated with anti-retroviral drugs and cyclosporin A. Signal intensities of lipid droplets were plotted against the drug concentrations to obtain an isodose of 10 μM of cyclosporin A, which we call the Pharmacological Lipid Index (PLI). The PLI was then normalized by EC50. PLI/EC50 values were low in early proteinase inhibitors and the nucleoside reverse transcriptase inhibitor, d4T, indicating high risk of hyperlipidemia, which is consistent with previous findings of hyperlipidemia. In contrast, there are few reports of hyperlipidemia for drugs with high PLI/EC50 scores. Data suggests that PLI/EC50 is a useful index for estimating the risk of hyperlipidemia.

    DOI: 10.1016/j.antiviral.2024.105819

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  10. Ultimate condensation of hard X-ray free-electron laser reaching single-nanometre focus size and 1022 W/cm2 intensity

    Jumpei Yamada, Satoshi Matsuyama, Ichiro Inoue, Taito Osaka, Takato Inoue, Nami Nakamura, Yuto Tanaka, Yuichi Inubushi, Toshinori Yabuuchi, Kensuke Tono, Kenji Tamasaku, Hirokatsu Yumoto, Takahisa Koyama, Haruhiko Ohashi, Makina Yabashi, Kazuto Yamauchi

        2023.10

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    Language:English  

    DOI: 10.21203/rs.3.rs-3384984/v1

  11. Femtosecond Reduction of Atomic Scattering Factors Triggered by Intense X-Ray Pulse Reviewed

    Ichiro Inoue, Jumpei Yamada, Konrad J. Kapcia, Michal Stransky, Victor Tkachenko, Zoltan Jurek, Takato Inoue, Taito Osaka, Yuichi Inubushi, Atsuki Ito, Yuto Tanaka, Satoshi Matsuyama, Kazuto Yamauchi, Makina Yabashi, Beata Ziaja

    Physical Review Letters   Vol. 131 ( 16 ) page: 163201   2023.10

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:American Physical Society (APS)  

    DOI: 10.1103/PhysRevLett.131.163201

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    Other Link: http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.131.163201/fulltext

  12. ニオブ酸リチウムを用いた大変形可能なX線形状可変ミラーの開発

    吉水 純弥, 井上 陽登, 加納 愛彩, 中林 荘太, 香村 芳樹, 矢橋 牧名, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2023A ( 0 ) page: 572 - 572   2023.8

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    Authorship:Last author   Language:Japanese   Publishing type:Research paper (conference, symposium, etc.)   Publisher:公益社団法人 精密工学会  

    <p>X線ビームサイズを制御できる光学システムは未だ実用化されておらず,高精度な形状可変ミラーが注目されている.これまでにニオブ酸リチウム(LN)を用いた高安定なミラーを開発したが,圧電定数が小さいため,このままではビームサイズの大幅な変化は見込めない.これを解決するために,LNの分極反転特性を活かしたバイモルフミラーを開発した.本発表では,X線波面計測法に基づき変形性能を評価した結果について報告する. </p>

    DOI: 10.11522/pscjspe.2023a.0_572

    CiNii Research

  13. 試料回転を用いたブラインドデコンボリューション手法の開発

    栗本 晋之介, 井上 陽登, 伊藤 俊希, 伊藤 颯希, 香村 芳樹, 矢橋 牧名, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2023A ( 0 ) page: 579 - 579   2023.8

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    Authorship:Last author   Language:Japanese   Publishing type:Research paper (conference, symposium, etc.)   Publisher:公益社団法人 精密工学会  

    <p>Advanced Kirkpatrick-Baezミラーを用いた結像型X線顕微鏡は,高空間分解能な観察を高効率かつ色収差なく行えるという利点を持つ.一方で,アライメントの難易度やミラーに要求される形状精度が高く,未知のアライメント誤差及びミラー形状誤差により生じる光学収差が更なる高空間分解能化を律速させている.本講演では,試料を面内回転させることで未知の光学収差を分離可能な新規手法を提案する.</p>

    DOI: 10.11522/pscjspe.2023a.0_579

    CiNii Research

  14. 単結晶圧電素子ベース形状可変ミラーを用いたアダプティブ結像型X線顕微鏡の開発

    中林 荘太, 井上 陽登, 伊藤 颯希, 香村 芳樹, 矢橋 牧名, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2023A ( 0 ) page: 576 - 576   2023.8

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    Authorship:Last author   Language:Japanese   Publishing type:Research paper (conference, symposium, etc.)   Publisher:公益社団法人 精密工学会  

    <p>結像型X線顕微鏡の超高空間分解能5nmを達成するためには,1nm PV以上の形状精度を満たすX線ミラーが必要である.しかし,その精度は現代の加工技術では達成不可能である.この問題を解決するため,単結晶圧電素子であるニオブ酸リチウムを利用した形状可変ミラーに基づくアダプティブ結像型X線顕微鏡を開発している.本発表では,開発した補償光学系を構築し,SPring-8にて実証実験を行った結果について報告する.</p>

    DOI: 10.11522/pscjspe.2023a.0_576

    CiNii Research

  15. Zinc and iron dynamics in human islet amyloid polypeptide-induced diabetes mouse model. Reviewed

    Fukunaka A, Shimura M, Ichinose T, Pereye OB, Nakagawa Y, Tamura Y, Mizutani W, Inoue R, Inoue T, Tanaka Y, Sato T, Saitoh T, Fukada T, Nishida Y, Miyatsuka T, Shirakawa J, Watada H, Matsuyama S, Fujitani Y

    Scientific reports   Vol. 13 ( 1 ) page: 3484   2023.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41598-023-30498-y

    Web of Science

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    PubMed

  16. X線フーリエタイコグラフィによる超解像イメージング

    伊藤 俊希, 栗本 晋之介, 田中 優人, 井上 陽登, 香村 芳樹, 矢橋 牧名, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2023S ( 0 ) page: 680 - 680   2023.3

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    Authorship:Last author, Corresponding author   Language:Japanese   Publisher:公益社団法人 精密工学会  

    <p>ミラーを用いた結像型X線顕微鏡は色収差がなく、効率も高いといった特徴を持っている。一方でミラーの製作難度は非常に高く、技術的観点からさらなる高分解能化は非常に難しい。そこで我々は、合成開口および光学収差の分離による分解能向上を見込めるフーリエタイコグラフィに着目した。ミラーを用いたX線顕微鏡像にこれを適用することで、結像システムの回折限界を超える空間分解能で試料像を得ることを試みた。</p>

    DOI: 10.11522/pscjspe.2023s.0_680

    CiNii Research

  17. 高空間周波数形状制御可能な新規構造の形状可変ミラーの開発

    加納 愛彩, 井上 陽登, 中林 荘太, 上松 航太, 香村 芳樹, 矢橋 牧名, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2023S ( 0 ) page: 683 - 683   2023.3

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    Authorship:Last author   Language:Japanese   Publisher:公益社団法人 精密工学会  

    <p>ミラーベースの結像型X線顕微鏡は優れた性能を有しており,更なる高分解能化が期待されている.そのためには,高精度なミラーが不可欠だが,もはや現行の加工技術では満足できない.この問題を解決するために,ニオブ酸リチウム(LN)製の形状可変ミラーを開発している.本発表では,変形可能な空間周波数を更に向上させるために開発した,複数枚のLNを積層させた新規構造ミラーについて報告する.</p>

    DOI: 10.11522/pscjspe.2023s.0_683

    CiNii Research

  18. 単結晶圧電素子を用いた大変形可能なX線形状可変ミラーの開発

    吉水 純弥, 井上 陽登, 中林 荘太, 上松 航太, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2023S ( 0 ) page: 684 - 684   2023.3

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    Authorship:Last author   Language:Japanese   Publisher:公益社団法人 精密工学会  

    <p>X線複合分析を実現するために,X線ビームサイズを変えられる光学システムが求められており,形状可変ミラーが注目されている.これまでにニオブ酸リチウム(LN)を用いた高安定なミラーを実現した.一方で,変形量が小さいため,ビームサイズを大きく変えることができない.この問題を解決するために,LNの分極反転特性に着目した.本発表では,約1100℃でアニールしたLNミラーの基礎検討結果を報告する.</p>

    DOI: 10.11522/pscjspe.2023s.0_684

    CiNii Research

  19. タイコグラフィを用いたXFEL sub-10nm集光光学系のビーム径計測

    塩井 康太, 山田 純平, 伊藤 篤輝, 田中 優人, 松山 智至, 井上 陽登, 大坂 泰斗, 井上 伊知郎, 犬伏 雄一, 矢橋 牧名, 石川 哲也, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2023S ( 0 ) page: 678 - 679   2023.3

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    Language:Japanese   Publisher:公益社団法人 精密工学会  

    <p>我々は硬X線FELにおける10<sup>22</sup> W/cm<sup>2</sup>強度の達成のために sub-10 nm集光光学系を開発している.極微小な集光径評価のためには,デフォーカス位置におけるタイコグラフィ法が適用可能であるが,低次波面収差と照射位置誤差がどちらも存在する場合に,誤った解に収束することが問題となっていた.本研究では,複数のデフォーカス位置での計測手法・再構成アルゴリズムを新たに開発し,SACLA BL3にて実証実験を行った結果について報告する.</p>

    DOI: 10.11522/pscjspe.2023s.0_678

    CiNii Research

  20. X線顕微鏡のためのin-situ波面計測法の開発

    伊藤 颯希, 田中 優人, 中林 荘太, 上松 航太, 井上 陽登, 栗本 晋之介, 青戸 仁志, 香村 芳樹, 矢橋 牧名, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2023S ( 0 ) page: 687 - 687   2023.3

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    <p>ミラーベースX線顕微鏡の更なる高分解能化のためには,ミラーの高精度化が求められるが,加工技術の限界が近づいている.これを解決するために,形状可変ミラーとin-situ波面計測法を組み合わせたアダプティブ顕微鏡の開発を進めている.フレネルゾーンプレートの集光点を用いた波面計測法と,その応用であるテストチャートのエッジの回折光を用いた波面計測法を提案し,その実証実験を行った.</p>

    DOI: 10.11522/pscjspe.2023s.0_687

    CiNii Research

  21. Development and Commercial Application of Glue-Free Adaptive High Precision X-Ray Mirror

    ICHII Yoshio, SHIROMA Shinsaku, NAKAMORI Hiroki, INOUE Takato, MATSUYAMA Satoshi

    Journal of the Japan Society for Precision Engineering   Vol. 89 ( 2 ) page: 147 - 152   2023.2

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    DOI: 10.2493/jjspe.89.147

    CiNii Research

  22. Episode 3

    ICHII Yoshio, SHIROMA Shinsaku, NAKAMORI Hiroki, INOUE Takato, MATSUYAMA Satoshi

    Journal of the Japan Society for Precision Engineering   Vol. 89 ( 2 ) page: 157 - 158   2023.2

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    DOI: 10.2493/jjspe.89.157

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  23. 教師なし学習によるX線顕微鏡画像群からの波面を推定する手法の開発

    青戸 仁志, 井上 陽登, 栗本 晋之介, 田中 優人, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2022A ( 0 ) page: 74 - 74   2022.8

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    <p>超高分解能なアダプティブX線顕微鏡の実現を目指し,顕微鏡上にてin-situでの波面計測を行う技術の開発を進めた.機械学習を用いて既知試料の顕微鏡像から波面を推定する手法を提案した.計算と実験のそれぞれで得た二種類の顕微鏡像を機械学習の入力とし用い,本手法の実現可能性を検証した.この結果,両者とも推定波面から再現した顕微鏡像とインプットした顕微鏡像がよく一致し,本手法の有効性を示すことができた.</p>

    DOI: 10.11522/pscjspe.2022a.0_74

    CiNii Research

  24. フーリエタイコグラフィに基づいたX線波面計測法の開発

    栗本 晋之介, 井上 陽登, 青戸 仁志, 田中 優人, 山田 純平, 香村 芳樹, 矢橋 牧名, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2022A ( 0 ) page: 73 - 73   2022.8

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    <p>形状可変ミラーを用いたアダプティブ波面修正により,超高分解能な結像型X線顕微鏡の実現に挑戦している.そのためには,拡大結像配置のままin-situにX線波面を計測できる手法が必要であるが,未だその手法は確立されていない.本研究ではフーリエタイコグラフィに基づいた波面計測法を提案し,本手法により拡大結像配置において高精度なin-situ X線波面計測が可能であることを実証した.</p>

    DOI: 10.11522/pscjspe.2022a.0_73

    CiNii Research

  25. ニオブ酸リチウム単結晶を用いたX線用形状可変ミラーの開発

    中林 荘太, 井上 陽登, 上松 航太, 香村 芳樹, 矢橋 牧名, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2022A ( 0 ) page: 72 - 72   2022.8

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    <p>空間分解能5nmを持つX線顕微鏡の達成には,1nm以上の形状精度を有するX線ミラーが必要である.そこで我々はニオブ酸リチウムを用いた形状可変ミラーを開発した.単結晶圧電体であるため,逆圧電効果により高精度に変形できるだけでなく,高い安定性とヒステリシスフリーを実現できる.本発表では楕円凹面の形状可変ミラーを組み込んだアダプティブAdvanced KBミラー光学系を構築し,SPring-8にてX線波面補償を行った結果について報告する.</p>

    DOI: 10.11522/pscjspe.2022a.0_72

    CiNii Research

  26. The new X-ray/visible microscopy MAXWELL technique for fast three-dimensional nanoimaging with isotropic resolution Reviewed International coauthorship

    Kohmura Yoshiki, Yang Shun-Min, Chen Hsiang-Hsin, Takano Hidekazu, Chang Chia-Ju, Wang Ya-Sian, Lee Tsung-Tse, Chiu Ching-Yu, Yang Kai-En, Chien Yu-Ting, Hu Huan-Ming, Su Tzu-Ling, Petibois Cyril, Chen Yi-Yun, Hsu Cheng-Huan, Chen Peilin, Hueng Dueng-Yuan, Chen Shean-Jen, Yang Chi Lin, Chin An-Lun, Low Chian-Ming, Tan Francis Chee Kuan, Teo Alvin, Tok Eng Soon, Cai Xu Xiang, Lin Hong-Ming, Boeckl John, Stampfl Anton P., Yamada Jumpei, Matsuyama Satoshi, Ishikawa Tetsuya, Margaritondo Giorgio, Chiang Ann-Shyn, Hwu Yeukuang

    SCIENTIFIC REPORTS   Vol. 12 ( 1 ) page: 9668   2022.6

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    DOI: 10.1038/s41598-022-13377-w

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  27. Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system (vol 92, 123706, 2021) Reviewed International coauthorship

    Inoue Takato, Nishioka Yuka, Matsuyama Satoshi, Sonoyama Junki, Akiyama Kazuteru, Nakamori Hiroki, Ichii Yoshio, Sano Yasuhisa, Shi Xianbo, Shu Deming, Wyman Max D., Harder Ross, Kohmura Yoshiki, Yabashi Makina, Assoufid Lahsen, Ishikawa Tetsuya, Yamauchi Kazuto

    REVIEW OF SCIENTIFIC INSTRUMENTS   Vol. 93 ( 4 ) page: 123706   2022.4

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    DOI: 10.1063/5.0092976

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    Scopus

  28. 高空間分解能な結像型X線顕微鏡のためのin-situ波面計測法の開発

    田中 優人, 松山 智至, 井上 陽登, 山田 純平, 香村 芳樹, 矢橋 牧名, 表 和彦, 石川 哲也, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2022S ( 0 ) page: 119 - 119   2022.3

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    <p>ミラーベースの結像型X線顕微鏡はスループットや色収差の点で優れているが,高空間分解能観察を行う上ではミラーの許容形状誤差が小さくなる.修正すべき形状誤差を波面に基づき計測する手法の開発が求められていたが,現行の手法では大開口ミラー全体の波面が計測できなかった.そこで本研究ではミラーの異なる位置の波面を求め,スティッチングする手法を提案した.概念実証実験によりミラー全体の波面は矛盾なく求められた.</p>

    DOI: 10.11522/pscjspe.2022s.0_119

    CiNii Research

  29. 機械学習を用いたX線顕微鏡像からの波面推定

    青戸 仁志, 田中 優人, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2022S ( 0 ) page: 114 - 115   2022.3

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    <p>結像型X線顕微鏡上でin-situに波面計測を行う技術が実現すれば,アダプティブX線顕微鏡によるさらなる高分解能化が可能である.本研究では,機械学習により顕微鏡から得られた画像から波面を推定する手法の開発を行った.情報量の多いコヒーレント結像の画像を用いて,顕微鏡画像と波面のゼルニケ係数との関係を学習させた.学習済みモデルは顕微鏡画像のみからゼルニケ係数を予想することができた.</p>

    DOI: 10.11522/pscjspe.2022s.0_114

    CiNii Research

  30. 単結晶圧電素子を用いた形状可変ミラーの開発

    上松 航太, 中林 荘太, 井上 陽登, 松山 智至

    精密工学会学術講演会講演論文集   Vol. 2022S ( 0 ) page: 116 - 116   2022.3

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    <p>高分解能な結像型X線顕微鏡を実現するためには、より高精度な光学素子が必要となる。しかし、光学素子の作製精度は限界に達しており、この問題解決のため形状可変ミラーの導入を進めている。これまでの形状可変ミラーは、高空間周波数の形状が制御不能、圧電素子由来の不安定性などの欠点を有する。そこで、本研究では単結晶圧電素子を用いた新構造の形状可変ミラーを提案、試作し、性能評価を実施した。</p>

    DOI: 10.11522/pscjspe.2022s.0_116

    CiNii Research

  31. ニオブ酸リチウム単結晶を用いたX線用形状可変ミラーの開発

    中林 荘太, 松山 智至, 上松 航太

    精密工学会学術講演会講演論文集   Vol. 2022S ( 0 ) page: 661 - 661   2022.3

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    <p>X線領域では、高精度な光学素子が必要とされる。しかし、その作成難易度は限界(1nm)に到達しつつあり、これら光学素子によって乱された波面を形状可変ミラーによって修正する戦略が今後重要となる。本研究では、単結晶圧電素子であるニオブ酸リチウムを用いた極シンプルな形状可変ミラーを試作した。SPring-8にてX線波面計測を試みたところ、試作した形状可変ミラーが意図したとおり変形できることを確認した。</p>

    DOI: 10.11522/pscjspe.2022s.0_661

    CiNii Research

  32. Preparation of highly planarized optical surface on Si substrate via catalyst-referred etching

    Itagaki K., Toh D., Van Bui P., Matsuyama S., Yamauchi K., Sano Y.

    European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022     page: 105 - 106   2022

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    In recent years, crystalline silicon (Si) has been used as a promising material for precision X-ray mirrors and Bragg optics. These devices require extremely well-ordered surfaces without crystallographic damage. Thus, we applied an ultra-precision polishing method called catalyst-referred etching (CARE) to planarize crystalline Si substrates. CARE is a catalyzed chemical etching method that uses pure water as an etchant and a catalytic pad that promotes the designed reactions. Owing to its abrasive-free nature, the polished surface reaches an atomic-level smoothness suitable for application to excellent optical devices, particularly in the X-ray regime. Understanding the mechanism of this method is essential for its wide practical application. CARE has been successfully applied to silicon dioxide (SiO2) optical glasses, and the removal mechanism has been clarified to be an indirect hydrolysis reaction using first-principles calculations. In the case of Si CARE, because Si is easily oxidized by dissolved oxygen (DO) in pure water, the removal pathway may involve oxidation reactions, which may be similar to the removal mechanism of SiO2CARE. Clarifying the role of DO is essential for understanding the mechanism of Si CARE. In this study, we evaluated the processing characteristics under different DO concentrations and investigated whether the accompanying oxidation induced by DO is critically required. It was observed that Si CARE does not require oxidation. The surface roughness was observed to be drastically improved in low-DO water. We conclude that the etching mechanism of Si CARE is different from that of SiO2CARE. Thus, a first-principles investigation is possible, except for the O2molecule from relevant reactions.

    Scopus

  33. Planarization of polymer materials using catalytic reaction in pure water

    Takeda K., Toh D., Van Bui P., Matsuyama S., Yamauchi K., Sano Y.

    European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022     page: 111 - 112   2022

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    In recent years, polymer materials with excellent properties, such as chemical resistance, heat resistance, and high insulation, have been produced. These materials have been widely used in advanced devices. For example, polycarbonate (PC), polymethyl methacrylate (PMMA), and polyimide (PI) are used as insulating films in microelectromechanical systems (MEMSs), and polytetrafluoroethylene (PTFE) is a promising substrate for next-generation high-frequency devices exceeding 5G. To exploit the excellent properties of these polymer materials, well-ordered surfaces are required. However, because polymer materials are extremely soft, conventional polishing methods that use abrasives cannot produce a damage-free surface. We present an abrasive-free polishing technique called catalyst-referred etching (CARE). In this method, the top surface of the workpiece is preferentially removed via an indirect hydrolysis reaction promoted by a metal catalyst. The surfaces of the amorphous and single-crystalline samples processed using CARE exhibited atomic flatness. We discuss the polishing characteristics and material removal mechanisms of polymers in CARE. The PC and PMMA were polished using Pt and pure water as the catalyst and etchant, respectively. An atomically smooth surface, which could not be fabricated by mechanical polishing, was obtained. Based on observations of the surface, the removal mechanism was estimated as follows. Molecule chains entangle to form clusters that constitute the surface of the polymer and determine the surface roughness. In CARE, the top of this cluster was selectively removed, forming a flat surface similar to that obtained on a single-crystalline polymer material. Therefore, CARE is a promising polishing method for polymer materials.

    Scopus

  34. Fabrication of an atomically smooth polycrystalline surface without grain boundary steps using catalyst-referred etching

    Toh D., Van Bui P., Matsuyama S., Sano Y., Yamauchi K.

    European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022     page: 273 - 274   2022

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    Recently, polycrystalline material can express its excellent physical properties and has been used in advanced applications in semiconductors and optics. Similar to single crystal materials, to fully exploit the properties of polycrystalline material in devices, a flat surface on the atomic level is required. However, since the polycrystalline material surface has various crystal orientations, the grain boundary steps appear on the surface polished by CMP (chemical mechanical polishing). Thus, new polishing technology needs to be developed. The following two conditions are required to obtain atomically well-ordered polycrystalline material surfaces: 1) The polishing pad must always act as a reference flat to selectively remove the crystal grain located at the topmost of the sample surface. 2) The material removal must proceed via a chemical etching to avoid crystallographic damages. Therefore, we developed a chemical etching method assisted by a metal catalyst named catalyst-referred etching (CARE). In this method, a polishing pad with a catalyst thin film works as a reference plane to be copied onto the workpiece surface. A workpiece is pressed to the polishing pad in an etchant, and they rotate around their axes. Accordingly, only the grain located at the topmost site frequently contacts the catalyst and is preferentially removed chemically, leading to obtaining a damage-free surface without grain boundary steps. In this study, we demonstrated the possibility of realizing the atomically flat polycrystalline surface by applying the CARE. Polycrystalline SiC and YAG ceramics were processed using Ru catalyst and a solution having neutral pH as a catalyst and an etchant, respectively. Using this method, we obtained an extremely smooth surface with a grain boundary step less than 1 nm without introducing crystallographic damage.

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  35. XFEL single-nanometer focusing system at SACLA

    Yamada J., Matsuyama S., Inoue T., Ito A., Inoue I., Osaka T., Inubushi Y., Yumoto H., Koyama T., Ohashi H., Yamauchi K., Yabashi M.

    Optics InfoBase Conference Papers     2022

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    A sub-10 nm focusing mirror system for the XFEL has been developed to generate an ultra-intense X-ray laser field. For the sub-10 nm focusing optic, an advanced Kirkpatrick-Baez mirror system based on Wolter-type III geometry has been adopted. The mirrors were fabricated based on a strategy of X-ray wavefront correction. As the results of the performance test at SACLA, we confirmed nearly diffraction-limited wavefront accuracy, 7 nm focusing spot size, more than 10 hours stability, and ~1022 W/cm2 intensity.

    DOI: 10.1364/CLEOPR.2022.CWP19B_01

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  36. High-throughput deterministic plasma etching using array-type plasma generator system Reviewed

    Yasuhisa Sano, Ken Nishida, Ryohei Asada, Shinya Okayama, Daisetsu Toh, Satoshi Matsuyama, Kazuto Yamauchi

    Review of Scientific Instruments   Vol. 92 ( 12 ) page: 125107 - 125107   2021.12

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    DOI: 10.1063/5.0071623

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  37. Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system Reviewed International coauthorship

    Takato Inoue, Yuka Nishioka, Satoshi Matsuyama, Junki Sonoyama, Kazuteru Akiyama, Hiroki Nakamori, Yoshio Ichii, Yasuhisa Sano, Xianbo Shi, Deming Shu, Max D. Wyman, Ross Harder, Yoshiki Kohmura, Makina Yabashi, Lahsen Assoufid, Tetsuya Ishikawa, Kazuto Yamauchi

    Review of Scientific Instruments   Vol. 92 ( 12 ) page: 123706 - 123706   2021.12

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AIP Publishing  

    DOI: 10.1063/5.0070465

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    Other Link: https://aip.scitation.org/doi/pdf/10.1063/5.0070465

  38. Fabrication of atomically smooth polycrystalline surface without grain boundary steps by using catalyst referred etching method

    Toh Daisetsu, Bui Van Pho, Matsuyama Satoshi, Sano Yasuhisa, Yamauchi Kazuto

    Proceedings of JSPE Semestrial Meeting   Vol. 2021A ( 0 ) page: 115 - 116   2021.9

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    We propose the using of catalyst referred etching (CARE) method to realize well-ordered surface on the polycrystalline. In CARE, the metal catalyst layer on the polishing pad works as a reference plane and only the top most site of sample surface contacted with the catalyst removed chemically. By using this processing characteristic, it is possible to obtain an ultra-smooth surface even on the polycrystalline surface having a random crystal orientation. In this experiment, we prepared polycrystalline SiC and YAG ceramics as a sample and applied CARE using Pt and pure water as a catalyst and an etchant respectivelly. As a result, an atomically smooth surface with no grain boundary steps was realized.

    DOI: 10.11522/pscjspe.2021a.0_115

    CiNii Research

  39. 結像型X線顕微鏡における位相イメージング手法の開発

    田中 優人, 松山 智至, 井上 陽登, 山田 純平, 香村 芳樹, 矢橋 牧名, 石川 哲也, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2021A ( 0 ) page: 546 - 547   2021.9

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    <p>結像型X 線顕微鏡では,試料の高空間分解能な像がリアルタイムに得られる.しかし,本顕微鏡では,コントラストの低い吸収コントラスト像しか直接観察できないことから,高いコントラストを持つ位相コントラスト像の獲得が望まれる.本研究では,様々なデフォーカス位置における試料の吸収コントラスト像を用いて,位相コントラスト像を得る手法を提案した. SPring-8 BL29XUでの実験を通して本手法の有用性を実証した.</p>

    DOI: 10.11522/pscjspe.2021a.0_546

    CiNii Research

  40. 圧電素子駆動型形状可変ミラーを用いたX線sub-5 nm集光システムの開発(第2報)

    井上 陽登, 松山 智至, 田中 優人, 二村 浩平, 一井 愛雄, 山田 純平, 佐野 泰久, 香村 芳樹, 矢橋 牧名, 石川 哲也, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2021A ( 0 ) page: 545 - 545   2021.9

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    <p>大型放射光施設が発振する高強度X線をより小さく集光することで,高光子密度を活かしたX線非線形光学や,小さなスポット径を利用したナノ構造解析の発展が期待される.求める集光径が小さくなるほどミラーに必要な形状精度は厳しくなる.そこで我々は中周期以上の形状を形状可変ミラーで,短周期形状を差分成膜法で修正するハイブリッド波面補償を導入した.本システムを用いることで,回折限界集光条件を満たすことに成功した.</p>

    DOI: 10.11522/pscjspe.2021a.0_545

    CiNii Research

  41. Hard X-ray nanoprobe scanner Reviewed

    Jumpei Yamada, Ichiro Inoue, Taito Osaka, Takato Inoue, Satoshi Matsuyama, Kazuto Yamauchi, Makina Yabashi

    IUCrJ   Vol. 8 ( Pt 5 ) page: 713 - 718   2021.9

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    X-ray scientists are continually striving to improve the quality of X-ray microscopy, due to the fact that the information obtained from X-ray microscopy of materials can be complementary to that obtained from optical and electron microscopes. In contrast to the ease with which one can deflect electron beams, the relative difficulty to deflect X-ray has constrained the development of scanning X-ray microscopes (SXMs) based on a scan of an X-ray small probe. This restriction has caused severe complications that hinder progress toward achieving ultimate resolution. Here, a simple and innovative method for constructing an SXM equipped with a nanoprobe scanner is proposed. The nanoprobe scanner combines X-ray prisms and advanced Kirkpatrick–Baez focusing mirrors. By rotating the prisms on the order of degrees, X-ray probe scanning with single-nanometre accuracy can be easily achieved. The validity of the concept was verified by acquiring an SXM image of a test pattern at a photon energy of 10 keV, where 50 nm line-and-space structures were resolved. This method is readily applicable to an SXM with a single-nanometre resolution and will assist effective utilization of increasing brightness of fourth-generation synchrotron radiation sources.

    DOI: 10.1107/S2052252521007004

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    PubMed

  42. Introduction to Synchrotron Radiation X-Ray Experiment

    MATSUYAMA Satoshi

    Journal of the Japan Society for Precision Engineering   Vol. 87 ( 7 ) page: 7_618 - 7_621   2021.7

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    Language:Japanese   Publisher:The Japan Society for Precision Engineering  

    DOI: 10.2493/jjspe.87.7_618

    CiNii Research

  43. 圧電素子駆動型形状可変ミラーを用いたX線sub-5nm集光システムの開発

    井上 陽登, 松山 智至, 田中 優人, 二村 浩平, 一井 愛雄, 山田 純平, 佐野 泰久, 香村 芳樹, 矢橋 牧名, 石川 哲也, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2021S ( 0 ) page: 668 - 668   2021.3

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    <p>大型放射光施設が発振する高強度X線をより小さく集光することで,高光子密度を活かしたX線非線形光学や,小さなスポット径を利用したナノ構造解析の発展が期待される.求める集光径が小さくなるほどミラーに必要な形状精度は厳しくなる.そこで我々は形状可変ミラーを導入し,有限要素法を用いて修正可能な形状を計算した.6周期までの正弦波型の初期形状誤差がPV-3 nm以上存在した場合においても修正可能であることがわかった.</p>

    DOI: 10.11522/pscjspe.2021s.0_668

    CiNii Research

  44. 複数の凸面鏡を持つ高度な硬X線結像光学系の開発(第一報)

    松山 智至, 波多 健太郎, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2021S ( 0 ) page: 672 - 672   2021.3

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    <p>4枚のミラーから成るAdvanced Kirkpatrick-Baezミラーは硬X線領域における有望な結像光学系である.我々は様々な光学系を実際に開発し,30nmの空間分解能を持つX線顕微鏡をすでに実現した.この光学系に複数の凸面鏡を組み入れることで,さらに高度な光学系が構築可能であることを見出した.本発表では,いくつかの設計例とシミュレーションを示し,結像特性について調査した結果を示す.</p>

    DOI: 10.11522/pscjspe.2021s.0_672

    CiNii Research

  45. 結像型X線顕微鏡における波面計測手法の開発

    田中 優人, 松山 智至, 井上 陽登, 中村 南美, 山田 純平, 香村 芳樹, 矢橋 牧名, 表 和彦, 石川 哲也, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2021S ( 0 ) page: 671 - 671   2021.3

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    <p>X線ミラーを用いた結像型X線顕微鏡は,色収差が無くスループットが高い点で優れているが,許容アライメント誤差が厳しく,高空間分解能画像を得るためには,拡大結像配置にて光学素子由来の波面収差を計測しなければならない.我々は,フレネルゾーンプレートの集光点を試料とし,その拡大像を複数枚取得した上で反復的位相回復計算を施すことで波面を計測した.本手法を用いてアライメントを調整し,空間分解能23 nmを達成した.</p>

    DOI: 10.11522/pscjspe.2021s.0_671

    CiNii Research

  46. High-speed etching of silicon carbide wafer using high-pressure SF6 plasma

    Yasuhisa Sano, Koki Tajiri, Yuki Inoue, Risa Mukai, Yuma Nakanishi, Satoshi Matsuyama, Kazuto Yamauchi

    ECS Journal of Solid State Science and Technology   Vol. 10 ( 1 )   2021.1

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    Semiconductor silicon carbide (SiC) is proposed to be a promising material for power-saving devices. However, due to its hard and brittle properties, there is a need to develop a highly efficient strain-free thinning process for the backside thinning of vertical power transistors. As a method for thinning SiC wafers without crystallographic damages, plasma etching with high-pressure SF6 plasma was proposed and the dependence of different processing parameters on the removal rate was investigated. The results revealed that the removal rate was mainly influenced by the power density and relatively insensitive to processing parameters such as processing gap and gas flow rate. It was discovered that a high-speed etching of the entire surface of a commercially available 2- inch wafer at approximately 15 μm min-1 can be achieved by increasing the radio frequency power. Additionally, it was demonstrated that the thickness of the 2-inch wafer can be thinned to approximately 100 μm by only 20 min plasma etching.

    DOI: 10.1149/2162-8777/abdc47

    Scopus

  47. Development of precision Wolter mirrors towards PhoENiX mission for the Sun

    Taro Sakao, Satoshi Matsuyama, Jumpei Yamada, Takato Inoue, Kentaro Hata, Hiroyuki Yamaguchi, Taku Hagiwara, Nami Nakamura, Kazuto Yamauchi, Yoshiki Kohmura, Yoshinori Suematsu, Noriyuki Narukage

    Space Telescopes and Instrumentation 2020: Ultraviolet to Gamma Ray     2020.12

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    Publishing type:Research paper (international conference proceedings)   Publisher:SPIE  

    DOI: 10.1117/12.2562077

  48. X-Ray Single-Grating Interferometry for Wavefront Measurement and Correction of Hard X-Ray Nanofocusing Mirrors Reviewed

    Jumpei Yamada, Takato Inoue, Nami Nakamura, Takashi Kameshima, Kazuto Yamauchi, Satoshi Matsuyama, Makina Yabashi

    Sensors   Vol. 20 ( 24 ) page: 7356 - 7356   2020.12

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    X-ray single-grating interferometry was applied to conduct accurate wavefront corrections for hard X-ray nanofocusing mirrors. Systematic errors in the interferometer, originating from a grating, a detector, and alignment errors of the components, were carefully examined. Based on the measured wavefront errors, the mirror shapes were directly corrected using a differential deposition technique. The corrected X-ray focusing mirrors with a numerical aperture of 0.01 attained two-dimensionally diffraction-limited performance. The results of the correction indicate that the uncertainty of the wavefront measurement was less than λ/72 in root-mean-square value.

    DOI: 10.3390/s20247356

    Web of Science

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    PubMed

  49. hv2-concept breaks the photon-count limit of RIXS instrumentation. Reviewed International coauthorship

    Zhou KJ, Matsuyama S, Strocov VN

    Journal of synchrotron radiation   Vol. 27 ( Pt 5 ) page: 1235 - 1239   2020.9

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    DOI: 10.1107/S1600577520008607

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  50. Focus characterization of an X-ray free-electron laser by intensity correlation measurement of X-ray fluorescence Reviewed

    Nami Nakamura, Satoshi Matsuyama, Takato Inoue, Ichiro Inoue, Jumpei Yamada, Taito Osaka, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

    Journal of Synchrotron Radiation   Vol. 27 ( 5 ) page: 1366 - 1371   2020.9

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:International Union of Crystallography (IUCr)  

    This paper proposes and demonstrates a simple method using the intensity correlation of X-ray fluorescence to evaluate the focused beam size of an X-ray free-electron laser (XFEL). This method was applied to the sub-micrometre focused XFEL beam at the SPring-8 Angstrom Compact Free Electron Laser, and the beam size evaluated using the proposed method was consistent with that measured using the knife-edge scan method. The proposed method is readily applicable to extremely small X-ray spots and can be applied for the precise diagnostics of sub-10 nm focused X-ray beams which have recently emerged.

    DOI: 10.1107/s1600577520009868

    PubMed

  51. High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser Reviewed

    Shotaro Matsumura, Taito Osaka, Ichiro Inoue, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, Yasuhisa Sano

    Optics Express   Vol. 28 ( 18 ) page: 25706 - 25706   2020.8

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:The Optical Society  

    DOI: 10.1364/oe.398590

    PubMed

  52. Compact full-field hard x-ray microscope based on advanced Kirkpatrick–Baez mirrors Reviewed

    Jumpei Yamada, Satoshi Matsuyama, Raita Hirose, Yoshihiro Takeda, Yoshiki Kohmura, Makina Yabashi, Kazuhiko Omote, Tetsuya Ishikawa, Kazuto Yamauchi

    Optica   Vol. 7 ( 4 ) page: 367 - 367   2020.4

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    Authorship:Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:The Optical Society  

    DOI: 10.1364/optica.386012

    Other Link: https://www.osapublishing.org/viewmedia.cfm?URI=optica-7-4-367&seq=0

  53. An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating. Reviewed

    Toh D, Van Bui P, Isohashi A, Matsuyama S, Yamauchi K, Sano Y

    The Review of scientific instruments   Vol. 91 ( 4 ) page: 045108   2020.4

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    DOI: 10.1063/1.5141381

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  54. An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating Reviewed

    D. Toh, P. V. Bui, A. Isohashi, S. Matsuyama, K. Yamauchi, Y. Sano

    Review of Scientific Instruments   Vol. 91 ( 4 ) page: 045108   2020.4

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  55. Development of an Experimental Platform for Combinative Use of an XFEL and a High-Power Nanosecond Laser Reviewed

    Y. Inubushi, T. Yabuuchi, T. Togashi, K. Sueda, K. Miyanishi, Y. Tange, N. Ozaki, T. Matsuoka, R. Kodama, T. Osaka, S. Matsuyama, K. Yamauchi, H. Yumoto, T. Koyama, H. Ohashi, K. Tono, M. Yabashi

    Applied Science   Vol. 10 ( 7 ) page: 2224 - 2224   2020.3

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    © 2020 by the authors. We developed an experimental platform for combinative use of an X-ray free electron laser (XFEL) and a high-power nanosecond laser. The main target of the platform is an investigation of matter under high-pressure states produced by a laser-shock compression. In this paper, we show details of the experimental platform, including XFEL parameters and the focusing optics, the laser irradiation system and X-ray diagnostics. As a demonstration of the high-power laser-pump XFEL-probe experiment, we performed an X-ray diffraction measurement. An in-situ single-shot X-ray diffraction pattern expands to a large angle side, which shows a corundum was compressed by laser irradiation.

    DOI: 10.3390/app10072224

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  56. Focusing mirror for coherent hard X-rays

    Kazuto Yamauchi, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yukio Takahashi, Kenji Tamasaku, Tetsuya Ishikawa

    Synchrotron Light Sources and Free-Electron Lasers: Accelerator Physics, Instrumentation and Science Applications     page: 1093 - 1122   2020.1

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    The development of high-precision x-ray mirrors is described. Atomistic surface polishing technique, elastic emission machining (EEM), was developed more than 30 years ago. This chapter describes how the polishing technique was improved to successfully apply to the synchrotron radiation and XFEL mirrors. The key was actually the figure metrology. The metrology was dramatically advanced by using coherent x-rays at the 1-km beamline of SPring-8, where classical ray-tracing approach was no more valid so that wave-optical approach was developed. Various optical references were developed to improve the global surface figures of mirrors. Successful development of elliptical mirrors helped attaining less than 100 nm focal spot in the conventional beamlines using Kirkpatrick-Baez focusing configuration, reaching 7 nm at the 1-km beamline. The speckle-free mirrors and focusing mirrors were used in XFEL facilities. These mirrors have been applied for various types of scanning nano-probes, imaging system, and generation of high-intensity photon fields for nonlinear xray optical experiments.

    DOI: 10.1007/978-3-030-23201-6_54

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  57. Atomically smooth Si surface planarized using a thin film catalyst in pure water

    Pho van Bui, Daisetsu Toh, Shinsaku Shiroma, Taku Hagiwara, Ai Isohashi Osaka, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

    Proceedings of the 20th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2020     page: 43 - 44   2020

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    A catalytically assisted etching method was applied to planarization of Si surfaces for the ultra-precision fabrication of X-ray mirrors. The study demonstrates that an atomically smooth surface with less than 0.1 nm root-mean-square roughness could be achieved on a Si substrate using a thin metal film and pure water as the catalyst and etching solution, respectively. The removal rate using a Pt catalyst can reach to over 500 nm/h. Density functional theory calculations is carried out to understand the initial steps of the catalyzed hydrolysis reaction at catalyst-Si interface during the planarization. The removal mechanism is expected to be similar to that in SiC and SiO2.

    Scopus

  58. Cause of etch pits during the high speed plasma etching of silicon carbide and an approach to reduce their size

    Y. Nakanishi, R. Mukai, S. Matsuyama, K. Yamauchi, Y. Sano

    Materials Science Forum   Vol. 1004 MSF   page: 161 - 166   2020

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    To reduce the on-resistance in vertical power transistors, backside thinning is required after device processing. However, it is difficult to thin silicon carbide (SiC) wafers with a high removal rate by conventional mechanical processing because their hardness and brittleness cause cracks and chips during thinning. Therefore, the authors have attempted to thin SiC wafers using plasma chemical vaporization machining (PCVM), which is plasma etching using high-pressure plasma. PCVM has a high removal rate because of the high radical density in the high-pressure plasma, and it does not form a damaged layer on the processed surface because of the low ion energy. The authors have already achieved a very high removal rate of 15.6 μm/min by PCVM. However, many etch pits were generated on the wafer during PCVM in these high-speed machining conditions. Therefore, this study, using molten potassium hydroxide (KOH) etching, investigated the cause of such etch pits and found that they may stem from threading screw dislocation in the wafers. In addition, this research considered a process for reducing an etch pit size and succeeded in doing so by controlling wafer temperature.

    DOI: 10.4028/www.scientific.net/MSF.1004.161

    Scopus

  59. 触媒表面電位制御を取り入れた光電気化学触媒表面基準エッチング法によるSiC基板の高能率平坦化加工

    大西 諒典, 木田 英香, 藤 大雪, 松山 智至, 佐野 泰久, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2019A   page: 28 - 29   2019.8

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    我々はSiC基板の新たな平坦化加工技術として光酸化を援用した触媒表面基準エッチング法の開発を行っている.さらに,現在では光酸化を促進するため,基板への逆バイアス印加を提案している.しかしながら,高電圧を印加した場合,基板と接する触媒の表面電位まで上昇してしまい触媒活性が低下するため,加工速度の向上に限りがあった.本研究では触媒の表面電位を制御することで更なる高能率化を目指した.

    DOI: 10.11522/pscjspe.2019a.0_28

  60. Catalyzed chemical polishing of SiO2 glasses in pure water Reviewed

    Daisetsu Toh, Pho Van Bui, Ai Isohashi, Naotaka Kidani, Satoshi Matsuyama, Yasuhisa Sano, Yoshitada Morikawa, Kazuto Yamauchi

    REVIEW OF SCIENTIFIC INSTRUMENTS   Vol. 90 ( 4 ) page: 045115   2019.4

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER INST PHYSICS  

    A catalytically assisted etching system was developed for the ultra-precision fabrication of optical components, such as X-ray mirrors and extreme-ultraviolet mask blanks. This study demonstrates that an atomically smooth surface with a sub-Angstrom root-mean-square roughness could be achieved on a SiO2 glass substrate using pure water and Pt as the etching solution and catalyst, respectively. Density functional theory calculations confirmed that the mechanistic pathway was involved in catalyzed hydrolysis. The significant roles of the catalyst were clarified to be the dissociation of water molecules and the stabilization of a meta-stable state, in which a hypervalent silicate state is induced, and the Si-O backbond is elongated and loosened. To confirm the role of the catalyst, the Pt metal was replaced by Au, and the observed drastic difference in the removal rate was attributed to the degree of stabilization of the metastable state. Published under license by AIP Publishing.

    DOI: 10.1063/1.5090320

    Web of Science

    PubMed

  61. 多層膜結像ミラーを用いた高分解能X線顕微鏡の開発

    松山智至, 山田純平, 波多健太郎, 萩原拓, 表和彦, 廣瀬雷太, 武田佳彦, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

    精密工学会春季大会     2019.3

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  62. Surface Finishing Method using Plasma Chemical Vaporization Machining for Narrow Channel Walls of X-ray Crystal Monochromators Reviewed

    T. Hirano, Y. Morioka, S. Matsumura, Y. Sano, T. Osaka, S. Matsuyama, M. Yabashi, K. Yamauchi

    Int. J. Automation Technol.   Vol. 13 ( 2 ) page: 246 - 253   2019.3

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    DOI: 10.20965/ijat.2019.p0246

  63. Development of a glue-free bimorph mirror for use in vacuum chambers Reviewed

    Y. Ichii, H. Okada, H. Nakamori, A. Ueda, H. Yamaguchi, S. Matsuyama, K. Yamauchi

    Review of Scientific Instruments   Vol. 90 ( 2 ) page: 021702   2019.2

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    DOI: 10.1063/1.5066105

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  64. High-efficiency planarization of GaN wafer by catalyst-referred etching with positive-biased photo-electrochemical oxidation

    Ryosuke Ohnishi, Daisetsu Toh, Satoshi Matsuyama, Ai Isohashi, Yasuhisa Sano, Kazuto Yamauchi

    Proceedings - 34th ASPE Annual Meeting     page: 79 - 83   2019

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  65. High-efficiency planarization of SIC wafers by water-CARE (Catalyst-referred etching) employing photoelectrochemical oxidation

    H. Kida, D. Toh, P. V. Bui, A. Isohashi, R. Ohnishi, S. Matsuyama, K. Yamauchi, Y. Sano

    Materials Science Forum   Vol. 963 MSF   page: 525 - 529   2019

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    © 2019 Trans Tech Publications Ltd, Switzerland. Catalyst-referred etching (CARE) is an abrasive-free and damage-free polishing method that involves applying a catalytic reaction at the contact point of the catalyst surface and workpiece in a chemical solution. An atomically flat silicon carbide (SiC) wafer surface can be obtained by the CARE process. Recently, it was found that water can be used as a chemical solution, even in the case of SiC polishing. However, its current removal rate of 4H-SiC (0001) 4°off-axis substrate is only 2 nm/h and is expected to increase. In this study, the use of photoelectrochemical oxidation in combination with the CARE process using water was investigated, successfully increasing the removal rate up to approximately 100 nm/h.

    DOI: 10.4028/www.scientific.net/MSF.963.525

    Scopus

  66. High-efficiency SiC polishing using a thin film catalyst in pure water

    Pho Van Bui, Daisetsu Toh, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

    European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 19th International Conference and Exhibition, EUSPEN 2019     page: 50 - 51   2019

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    A novel abrasive-free method called catalyst-referred etching (CARE) is used for planarization of SiC In this method, a thin platinum (Pt) catalyst layer is deposited on an elastic pad. The planarization is performed by rotating the catalyst pad in contact with a wafer surface in water. After the planarization, SiC surfaces are atomically smooth with a root-mean-square (RMS) roughness of less than 0.1 nm over a whole wafer. Thanks to the use of pure water as the etchant, CARE is an environmentally friendly planarization method and potentially applicable to planarization of many functional materials, including GaN and oxides surfaces. However, the practical application of CARE is limited due to its low material removal rate (MRR) when using a Pt catalyst. Therefore, improving its MRR is highly demanded. Our recent research indicated that the etching proceeds via dissociative adsorption of water molecules onto Si-C bonds at topmost Si atoms. The lower activation barrier in the presence of the Pt catalyst is mainly due to the chemical stabilization resulting from the formation of Pt-0 bonds at the Pt-SiC interface. Accordingly, the reaction will be promoted by tuning the binding energy with O using other catalysts. Therefore, we experimentally investigate the dependence of MRR on various catalyst materials. The study reveals that Ni and Ru have high catalytic performance. Compared to Pt, Ni and Ru have the higher binding energy with O. The stronger chemical bonds promote water dissociation and stabilization of chemical bonds at the catalyst-SiC interface, leading to lowering its activation barrier and enhancement of the etching reaction.

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  67. Development of an abrasive-free polishing method for optical material using pure water and Ni catalyst

    Daisetsu Toh, Ryosuke Ohnishi, Pho V. Bui, Ai Isohsahi, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

    Proceedings - 34th ASPE Annual Meeting     page: 474 - 477   2019

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    The removal rate using a Ni catalyst was higher than that using a Pt catalyst. However, it decreased with the processing time because the Ni surface was easily oxidized. Therefore, we proposed the electrochemical method to keep the Ni surface active. By repeating Ni plating and dissolution cycle, we stabilized the removal rate for at least 8 h and created an atomically flat surface on a SiO2 surface.

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  68. Development of adaptive Kirkpatrick-Baez mirrors based on mechanical and piezoelectric bending

    H. Nakamori, T. Goto, S. Matsuyama, H. Hayashi, H. Yamaguchi, J. Sonoyama, K. Akiyama, Y. Sano, Y, Kohmura, M. Yabashi, T. Ishikawa, H. Okada, K. Yamauchi

        2018.8

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  69. Reflective Imaging Optics using Concave and Convex Mirrors for A Compact and Achromatic Full-field X-ray Microscope Invited Reviewed

    J. Yamada, S. Matsuyama, K. Hata, R. Hirose, Y. Takeda, Y. Kohmura, M. Yabashi, K. Omote, T. Ishikawa, K. Yamauchi

    Microscopy and Microanalysis   Vol. 24 ( S2 ) page: 274 - 275   2018.8

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    Language:English   Publishing type:Research paper (international conference proceedings)   Publisher:Cambridge University Press (CUP)  

    DOI: 10.1017/S1431927618013715

  70. High-resolution full-field X-ray microscope for 20-keV X-rays with multilayer imaging mirrors Reviewed

    S. Matsuyama

    Microscopy and Microanalysis   Vol. 24 ( S2 ) page: 284 - 285   2018.8

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    Language:English   Publishing type:Research paper (international conference proceedings)   Publisher:Cambridge University Press (CUP)  

    DOI: 10.1017/S1431927618013764

  71. Development of new diagnostics based on LiF detector for pump-probe experiments Reviewed

    T.A. Pikuz, A.Ya.Faenov, N. Ozaki, T. Matsuoka, B. Albertazzi, N. Hartley, K. Miyanishi, K. Katagiri, S. Matsuyama, K. Yamauchi, H. Habara, Y. Inubushi, T. Togashi, H. Yumoto, H. Ohashi, Y. Tange, T. Yabuuchi, M. Yabashi, A. Grum-Grzhimailo, A. Casner, I. Skobelev, S. Makarov, S. Pikuz, G. Rigon, M. Koenig, K.A. Tanaka, T. Ishikawa, R. Kodama

        2018.7

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  72. Nearly diffraction-limited hard X-ray line focusing with hybrid adaptive X-ray mirror based on mechanical and piezo-driven deformation Reviewed

    Takumi Goto, Satoshi Matsuyama, Hiroki Hayashi, Hiroyuki Yamaguchi, Junki Sonoyama, Kazuteru Akiyama, Hiroki Nakamori, Yasuhisa Sano, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

    Optics Express   Vol. 26 ( 13 ) page: 17477 - 17486   2018.6

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    We have developed the new hybrid adaptive X-ray mirror based on mechanical and piezo-driven deformation to realize precise shape controllability on a long-length mirror. The mechanical bender approximately provides the required ellipse, while the piezoelectric actuators attached to the mirror correct very small residual errors to satisfy the diffraction-limited condition. The mechanical bender significantly reduces the role of the piezoelectric actuator, resulting in the suppression of accuracy degradation due to the drift and/or junction effect of the piezoelectric actuators. In addition, line focusing was demonstrated with two different numerical apertures at SPring-8, and the obtained beam sizes were 127 and 253 nm (FWHM), which agree well with the diffraction-limited sizes.

    DOI: 10.1364/OE.26.017477

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    PubMed

  73. Development of a multilayer Kirkpatrick-Baez mirror optics for X-ray free electron laser

    T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, T. Osaka, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

    International Conference on Synchrotron Radiation Instrumentation (SRI 2018)     2018.6

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  74. Hard-x-ray imaging mirror optics using concave and convex mirrors Invited

    J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    International Conference on Synchrotron Radiation Instrumentation (SRI 2018)     2018.6

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  75. Full‐field imaging and focusing with advanced mirror‐based optics Invited

    S. Matsuyama

    International Conference on Synchrotron Radiation Instrumentation (SRI 2018)     2018.6

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  76. Fabrication of ultraprecise multilayer focusing mirrors using an X-ray grating interferometer and differential deposition technique

    T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, T. Osaka, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

    International Workshop on X-ray Optics and Metrology Satellite Meeting of SRI 2018 (IWXM 2018)     2018.6

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  77. Development of reflective imaging optics using concave and convex mirrors

    J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    International Workshop on X-ray Optics and Metrology Satellite Meeting of SRI 2018 (IWXM 2018)     2018.6

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  78. Development of hybrid X-ray adaptive optical system based on piezo-driven deformable mirror and a mechanical mirror bender

    H. Yamaguchi, T. Goto, H. Hayashi, S. Matsuyama, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    International Conference on Synchrotron Radiation Instrumentation (SRI 2018)     2018.6

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  79. Development of adaptive Kirkpatrick-Baez mirrors based on bimorph and mechanical bending

    H. Nakamori, T. Goto, S. Matsuyama, H. Hayashi, H. Yamaguchi, J. Sonoyama, K. Akiyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, H. Okada, K. Yamauchi

    International Workshop on X-ray Optics and Metrology Satellite Meeting of SRI 2018 (IWXM 2018)     2018.6

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  80. Platinum-catalyzed hydrolysis etching of SiC in water: A density functional theory study Reviewed

    Pho Van Bui, Daisetsu Toh, Ai Isohashi, Satoshi Matsuyama, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi, Yoshitada Morikawa

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 5 ) page: 055703-1 - 055703-5   2018.5

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    A comprehensive study of the physicochemical interactions and the reaction mechanism of SiC etching with water by Pt catalysts can reveal key details about the surface treatment and catalytic phenomena at interfaces. Therefore, density functional theory simulations were performed to study the kinetics of Pt-assisted water dissociation and breaking of a Si-C bond compared to the HF-assisted mechanism. These calculations carefully considered the elastic and chemical interaction energies at the Pt-SiC interface, activation barriers of Si-C bond dissociation, and the catalytic role of Pt. It was found that the Pt-catalyzed etching of SiC in water is initiated via hydrolysis reactions that break the topmost Si-C bonds. The activation barrier strongly depends on the elastic and chemical interactions. However, chemical interactions are a dominant factor and mainly contribute to the lowering of the activation barrier, resulting in an increased rate of reaction. (C) 2018 The Japan Society of Applied Physics

    DOI: 10.7567/JJAP.57.055703

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  81. Systematic-error-free wavefront measurement using an X-ray single-grating interferometer Reviewed

    Takato Inoue, Satoshi Matsuyama, Shogo Kawai, Hirokatsu Yumoto, Yuichi Inubushi, Taito Osaka, Ichiro Inoue, Takahisa Koyama, Kensuke Tono, Haruhiko Ohashi, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

    Review of Scientific Instruments   Vol. 89 ( 4 ) page: 043106-1 - 043106-7   2018.4

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    In this study, the systematic errors of an X-ray single-grating interferometer based on the Talbot effect were investigated in detail. Non-negligible systematic errors induced by an X-ray camera were identified and a method to eliminate the systematic error was proposed. Systematic-error-free measurements of the wavefront error produced by multilayer focusing mirrors with large numerical apertures were demonstrated at the SPring-8 Angstrom Compact free electron LAser. Consequently, wavefront aberration obtained with two different cameras was found to be consistent with an accuracy better than λ/12.

    DOI: 10.1063/1.5026440

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  82. Development of nanofocusing system for X-ray free electron Laser (Study of nanobeam characterization)

    T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, T. Osaka, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

    International Conference on X-ray Optics and Applications 2018 (XOPT2018)     2018.4

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  83. Development of high-resolution X-ray imaging optical system using multilayer imaging mirrors

    K. Hata, J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    International Conference on X-ray Optics and Applications 2018 (XOPT2018)     2018.4

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  84. Compact and large-magnification full-field X-ray microscope using concave-convex imaging mirrors

    J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    International Conference on X-ray Optics and Applications 2018 (XOPT2018)     2018.4

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  85. Performance of a hard X-ray split-and-delay optical system with a wavefront division Reviewed

    Takashi Hirano, Taito Osaka, Yuki Morioka, Yasuhisa Sano, Yuichi Inubushi, Tadashi Togashi, Ichiro Inoue, Satoshi Matsuyama, Kensuke Tono, Aymeric Robert, Jerome B. Hastings, Kazuto Yamauchi, Makina Yabashi

    Journal of Synchrotron Radiation   Vol. 25 ( 1 ) page: 20 - 25   2018.1

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    The performance of a hard X-ray split-and-delay optical (SDO) system with a wavefront division scheme was investigated at the hard X-ray free-electron laser facility SACLA. For the wavefront division, beam splitters made of edge-polished perfect Si(220) crystals were employed. We characterized the beam properties of the SDO system, and investigated its capabilities for beam manipulation and diagnostics. First, it was confirmed that shot-to-shot non-invasive diagnostics of pulse energies for both branches in the SDO system was feasible. Second, nearly ideal and identical focal profiles for both branches were obtained with a spot size of â1/41.5μm in full width at half-maximum. Third, a spatial overlap of the two focused beams with a sub-μm accuracy was achieved by fine tuning of the SDO system. Finally, a reliable tunability of the delay time between two pulses was confirmed. The time interval was measured with an X-ray streak camera by changing the path length of the variable-delay branch. Errors from the fitted line were evaluated to be as small as ±0.4ps over a time range of 60ps.The performance of a hard X-ray split-and-delay optical system with a wavefront division scheme has been investigated at SACLA.

    DOI: 10.1107/S1600577517014023

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  86. Development of new diagnostics based on LiF detector for pump-probe experiments Reviewed

    T. Pikuz, A. Faenov, N. Ozaki, T. Matsuoka, B. Albertazzi, N. J. Hartley, K. Miyanishi, K. Katagiri, S. Matsuyama, K. Yamauchi, H. Habara, Y. Inubushi, T. Togashi, H. Yumoto, H. Ohashi, Y. Tange, T. Yabuuchi, M. Yabashi, A. N. Grum-Grzhimailo, A. Casner, I. Skobelev, S. Makarov, S. Pikuz, G. Rigon, M. Koenig, K. A. Tanaka, T. Ishikawa, R. Kodama

    Matter and Radiation at Extremes   Vol. 3 ( 4 ) page: 197 - 206   2018.1

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    We present new diagnostics for use in optical laser pump - X-ray Free Electron Laser (XFEL) probe experiments to monitor dimensions, intensity profile and focusability of the XFEL beam and to control initial quality and homogeneity of targets to be driven by optical laser pulse. By developing X-ray imaging, based on the use of an LiF crystal detector, we were able to measure the distribution of energy inside a hard X-ray beam with unprecedented high spatial resolution (∼1 μm) and across a field of view larger than some millimetres. This diagnostic can be used in situ, provides a very high dynamic range, has an extremely limited cost, and is relatively easy to be implemented in pump-probe experiments. The proposed methods were successfully applied in pump-probe experiments at the SPring-8 Angstrom Compact free electron LAser (SACLA) XFEL facility and its potential was demonstrated for current and future High Energy Density Science experiments.

    DOI: 10.1016/j.mre.2018.01.006

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  87. 超精密X線ミラーが拓く次世代X線集光・結像 Invited

    松山智至

        2018.1

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  88. High-efficiency planarization of GaN by catalyst-referred etching using photo-electrochemical oxidation

    KIDA Hideka, TOH Daisetsu, OHNISHI Ryosuke, Matsuyama Tomohisa, Sano Yasuhisa, Yamauchi Kazuto

    The Proceedings of Mechanical Engineering Congress, Japan   Vol. 2018   page: S1630004   2018

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    In this study, a gallium nitride (GaN) substrate produced was planarized using catalyst-referred etching (CARE). To improve the removal rate, the GaN substrate was processed using CARE-assisted photoelectrochemical (PEC) reaction (PEC CARE); the removal rate was 77 nm/h. However, the shape was embossed because of subsurface scratches introduced during preprocessing. These scratches were removed when the PEC CARE process was conducted under an applied potential of 2.5 V; The removal rate was 800 nm/h. In addition, a smooth surface of surface roughness 0.4 nm rms was obtained. A surface with step-terrace structures on the entire substrate was subsequently obtained when the CARE process was performed using a platinum (Pt) catalyst and deionized water; in this case, the surface roughness was 0.11 nm rms and the removal rate was 5 nm/h.

    DOI: 10.1299/jsmemecj.2018.s1630004

  89. In Situ Characterization of XFEL Beam Intensity Distribution and Focusability by High-Resolution LiF Crystal Detector

    T. A. Pikuz, A. Ya. Faenov, T. Matsuoka, B. Albertazzi, N. Ozaki, N. Hartely, O. Muray Ricardo Arturo, T. Yabuuchi, H. Habara, S. Matsuyama, K. Yamauchi, Y. Inubushi, T. Togashi, H. Yumoto, Y. Tange, K. Tono, Y. Sato, M. Yabashi, M. Nishikino, T. Kawachi, A. Mitrofanov, S. A. Pikuz, D. Bleiner, A. Grum-Grzhimailo, N. N. Rosanov, N. V. Vysotina, M. Harmand, M. Koenig, K. A. Tanaka, T. Ishikawa, R. Kodama

    Springer Proceedings in Physics   Vol. 202   page: 109 - 115   2018

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    We present here a new diagnostics based on using LiF crystal detectors that are able to perform measurements an intensity distribution of X-rays beams with diameters ranging from some microns up to some centimetres with high spatial resolution (~1 µm). In situ, 3D visualization of SACLA XFEL focused beam profile along propagation, including propagation inside photoluminescence solid materials, is demonstrated. Also, a high spatial resolution control a quality of targets used in optical laser pump—XFEL probe HEDS experiments is proposed.

    DOI: 10.1007/978-3-319-73025-7_17

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  90. High-efficiency planarization of SiC in pure water using a thin film catalyst

    Pho Van Bui, Yuta Nakahira, Daisetsu Toh, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

    European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 18th International Conference and Exhibition, EUSPEN 2018     page: 433 - 434   2018

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    A novel abrasive-free method called catalyst-referred etching (CARE) has been developed in our group. In this method, a platinum film as a catalyst is deposited on an elastic pad that is rotated in contact with a wafer surface in water. After CARE planarization, SiC surfaces are atomically smooth with a root-mean-square (RMS) roughness of less than 0.1 nm over a whole wafer. Using only pure water as an etchant, CARE is a promising planarization method and potentially applicable to planarization of many semiconductor surfaces, including GaN and oxides surfaces. However, the removal rate (RR) of SiC via CARE using a Pt catalyst is quite low, limiting its practical application. Our recent research on the removal mechanism using density functional theory (DFT) calculations indicated that the etching proceeded via a dissociative adsorption of water molecules onto the Si-C bonds at the topmost Si surface, catalyzed by a Pt catalyst. We expect that the RR can be improved by using the higher reactivity catalyst. Therefore, we experimentally investigate the dependence of RR on various catalyst materials. The results indicate that SiC can be planarized with a high RR using 3d transition metal catalysts. Using DFT calculations, we clarify that a high catalytic reactivity of a 3d transition metal is attributed to the higher chemical binding energy with OH, compared to that of Pt. This high chemical bond promotes water dissociation and stabilizes metastable states by forming chemical bonds at the catalyst-SiC interface, leading to lowering its activation barrier and an enhancement of the etching reaction.

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  91. Development of high efficiency polishing method using pure water and Ni catalyst

    Daisetsu Toh, Pho Van Bui, Nakahira Yuta, Hideka Kida, Takahisa Ohgushi, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

    European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 18th International Conference and Exhibition, EUSPEN 2018     page: 435 - 436   2018

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    We have developed "Catalyst Referred Etching" (CARE) using pure water as an etchant and Pt as a catalyst as a new polishing method. Using CARE, many functional materials, such as silicon carbide (SiC), gallium nitride (GaN), and metal oxides, can be planar-ized to atomically well-ordered surfaces with a root-mean-square (RMS) roughness of less than 0.1 nm over a whole wafer. The planarized surface has a step-and-terrace structure, indicating that CARE is step-flow etching type. Thus, the material removal rate (MRR) of CARE using a Pt catalyst, especially for crystalline materials, is quite low, approximately 20 nm/h for SiC. Our recent study shows that the catalytic reactivity of a Ni for CARE is higher than that of a Pt. Additionally, compared to Pt, Ni is cost-effective and abundant, indicating that Ni is a promising catalyst for CARE. However, the MRR using a Ni catalyst usually decreases with the processing time due to catalytic deactivation by oxidation of the Ni surface. Therefore, we use electrochemical deposition method to control Ni surface condition and to keep its surface catalytivally active. First, before CARE processing, the Ni is deposited on a polishing pad by setting its potential to be lower than that of the etchant. The deposited Ni layer works as an active catalyst. Second, after CARE processing, the residual Ni is dissolved into the etchant by changing its potential to be higher than that of the etchant. By alternative repeating these steps, reactive Ni on the polishing pad is continually prepared. Accordingly, the removal rate is stable with processing time. The study reveals that CARE with the potential control method is potential for high-efficiency polishing of functional materials.

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  92. Wavefront sensing for nano-focusing characterization

    S. Matsuyama

    9th Hard X-ray FEL Collaboration Meeting (5-way meeting 2017)     2017.12

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  93. Ellipsoidal mirror for two-dimensional 100-nm focusing in hard X-ray region Reviewed

    H. Yumoto, T. Koyama, S. Matsuyama, Y. Kohmura, K. Yamauchi, T. Ishikawa, H. Ohashi

    Scientific Reports   Vol. 7 ( 1 ) page: 16408   2017.11

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    Cutting-edge hard X-ray microscopy strongly depends on sophisticated focusing optics and ultrabright X-ray sources at synchrotron-radiation and X-ray free-electron laser (XFEL) facilities. These facilities typically provide two-dimensional nanofocusing X-ray beams by combining one-dimensional focusing mirrors. However, single-reflecting two-dimensional focusing mirrors with an ellipsoidal surface, which are well-known to possess high efficiency, have limited microfocusing applications. In this paper, we present an ultrahigh-precision ellipsoidal mirror for two-dimensional X-ray nanofocusing by overcoming the difficulties faced in the manufacturing process of its aspherical surface, including the surface-processing methods and surface metrology. The developed mirror has nanoscale accuracy, and it achieves focus size of 85 nm x 125 nm (full width at half maximum) using 7-keV X-rays. Two-dimensional focus was demonstrated in the same focal plane by resolving 50-nm test structures by scanning X-ray microscopy using a focusing beam. These achievements represent an important first step toward realizing two-dimensional aspherical mirrors with complex designs, in addition to ultralow loss and unprecedented small focusing property for extensive optical applications in synchrotron-radiation and XFEL facilities as well as in other scientific fields that require ultraprecision optical surfaces.

    DOI: 10.1038/s41598-017-16468-1

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    PubMed

  94. 全反射ミラーを用いた色収差のない結像光学系の開発 Invited

    松山智至

        2017.11

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  95. 衝撃圧縮された多結晶コランダムの時分割XFELその場観察

    丹下 慶範, 尾崎 典雅, 瀬戸 雄介, 佐藤 友子, 奥地 拓生, 松岡 健之, 高橋 謙次郎, 宮西 宏併, ALBERTAZZI Bruno・HARTLEY Nicholas, 梅田 悠平, 西川 豊人, 松山 智至, 山内 和人, 関根 利守, 田中 和夫, 兒玉 了祐, 籔内 俊毅, 矢橋 牧名

        2017.11

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  96. Fabrication of X-ray imaging mirror for an achromatic and high-resolution full-field X-ray microscope

    J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, K. Yamauchi

        2017.10

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  97. Development of crystal-based split-and-delay optics with wavefront splitting at SACLA

    T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, M. Yabashi

    SPIE Optics+Photonics2017     page: 187 - 187   2017.8

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  98. Full-field X-ray fluorescence imaging based on total-reflection imaging mirrors

    S. Matsuyama, S. Yasuda, J. Yamada, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics     2017.8

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  99. Development of precision Wolter mirrors for solar x-ray observations

    Taro Sakao, Satoshi Matsuyama, Takumi Goto, Jumpei Yamada, Shuhei Yasuda, Kazuto Yamauchi, Yoshiki Kohmura, Ayumi Kime, Akira Miyake, Tadakazu Maezawa, Hirokazu Hashizume, Yoshinori Suematsu, Noriyuki Narukage, Shin-nosuke Ishikawa

    Proceedings of SPIE   Vol. 10386   page: 103860E-1 - 103860E-11   2017.8

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    High resolution imagery of the Sun's X-ray corona provides an essential clue in understanding dynamics and heating processes of plasma particles there. However, X-ray imagery of the Sun with sub-arcsecond resolution has so far never been conducted due to severe technical difficulty in fabricating precision Wolter mirrors. For future X-ray observations of the solar corona, we are attempting to realize precision Wolter mirrors with sub-arcsecond resolution by adopting advanced surface polish and metrology methods to sector mirrors which consist of a portion of an entire annulus, by direct polishing onto the mirror substrate.
    Based on the knowledge obtained through fabrication of the first (in 2013) and second (in 2014) engineering Wolter mirrors and subsequent evaluations on their X-ray focusing performance, the third engineering mirror was made in 2015-2016. The primary target of improvement over the second mirror was to suppress figure error amplitude especially for spatial frequencies around 1 mm(-1) and to suppress the large astigmatism that was present in the second mirror, by introducing improved deterministic polish and smoothing on the precision mirror surfaces (32.5 mm x 10 mm in area for both parabola and hyperbola segments), as well as by careful characterization of the systematic error in the figure measurement system for the precision polish. Measurements on the focusing performance of thus-fabricated third Wolter mirror at SPring-8 synchrotron facility with 8 keV X-rays demonstrated that the mirror attained sub-arcsecond focusing performance with its HPD (half-power diameter) size reaching as small as similar to 0.2 arcsec for meridional focusing while similar to 0.1 arcsec for sagittal focusing. The meridional focusing achieved nearly diffraction limited performance (similar to 0.12 arcsec FWHM for the PSF core). We also confirmed that the large astigmatism noted in the second mirror was correctly removed in the third mirror with the correction of the above-mentioned systematic error.

    DOI: 10.1117/12.2273507

    Web of Science

  100. Development of Precise Wavefront Measurement Method for X-Ray Free Electron Laser Focusing System

    T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Osaka, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

    The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics     2017.8

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  101. Development of measurement system for ellipsoidal mirrors

    H. Nakamori, Y. Ichii, H. Okada, A. Ueda, T. Tsumura, S. Matsuyama, K. Yamauchi

    SPIE Optics+Photonics2017     page: 185 - 185   2017.8

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  102. Development of measurement system for ellipsoidal mirrors Reviewed

    H. Nakamori, Y. Ichii, H. Okada, A. Ueda, T. Tsumura, S. Matsuyama, K. Yamauchi

        2017.8

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  103. Development of hybrid adaptive x-ray focusing system based on piezoelectric bimorph mirror and mirror bender Reviewed

    T. Goto, S. Matsuyama, H. Hayashi, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, K. Yamauchi

    SPIE Optics+Photonics2017     page: 187 - 187   2017.8

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  104. Development of full-field x-ray fluorescence microscope using total-reflection mirrors Reviewed

    S. Matsuyama, J. Yamada, S. Yasuda, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    SPIE Optics+Photonics2017     page: 193 - 193   2017.8

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  105. 高分解能かつ色収差のない X 線顕微鏡の開発 Invited

    松山智至

    精密工学会学術講演会講演論文集   Vol. 2017   page: 957 - 958   2017.8

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    高精度なX線全反射ミラーを4枚用いて,高分解能かつ色収差のない結像型X線顕微鏡を開発した.本顕微鏡の実用性を確かめるために,蛍光X線イメージング,暗視野イメージング,位相イメージングを実施した.暗視野イメージングでは,後焦点位置にナイフエッジを挿入した.位相イメージングでは,位相回折格子を用いたタルボ効果を利用した.ポリスチレン球や金属微粒子,テストチャートの観察について詳細に報告する.

    DOI: 10.11522/pscjspe.2017S.0_957

  106. 高分解能かつ色収差のないX線顕微鏡の開発 Invited

    松山智至

    日本学術振興会,結晶加工と評価技術第145委員会,第154回研究会     2017.8

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  107. Shock response to solid germanium

    Kohei Miyanishi, Norimasa Ozaki, Takeshi Matsuoka, Satoshi Matsuyama, Kenjiro Takahashi, Hideaki Habara, Tatiana Pikuz, Anatoly Faenov, Kazuto Yamauchi, Ryosuke Kodama, Kazuo Tanaka, Yusuke Seto, Yoshinobu Tange, Toshinori Yabuuchi, Yuichi Inubushi, Tadashi Togashi, Makina Yabashi, Tetsuya Ishikawa, Michel Koenig, Tommaso Vinci, Takuo Okuchi, Nicholas Hartley, Osami Sakata, Toshimori Sekine, Emma McBride

        2017.7

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  108. Development of new diagnostics in the interests of pump-probe experiments Invited

    T. Pikuz, A. Faenov, N. Ozaki. T. Matsuoka, B. Albertazzi, N. Hartely, S. Matsuyama, K. Yamauchi, H. Habara, Y. Inubushi, T. Togashi, H. Yumoto, H. Ohashi, Y. Tange, T. Yabuuchi, M. Yabashi, A. Grum-Grzhimailo, A. Casner, G. Rigon, M. Koenig, K. A. Tanaka, T. Ishikawa, R. Kodama

        2017.6

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  109. Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer Reviewed

    Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, M. Yabashi

    Applied Sciences   Vol. 7 ( 6 ) page: 584-1 - 584-5   2017.6

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    We developed a single-shot X-ray spectrometer for wide-range high-resolution measurements of Self-Amplified Spontaneous Emission (SASE) X-ray Free Electron Laser (XFEL) pulses. The spectrometer consists of a multi-layer elliptical mirror for producing a large divergence of 22 mrad around 9070 eV and a silicon (553) analyzer crystal. We achieved a wide energy range of 55 eV with a fine spectral resolution of 80 meV, which enabled the observation of a whole SASE-XFEL spectrum with fully-resolved spike structures. We found that a SASE-XFEL pulse has around 60 longitudinal modes with a pulse duration of 7.7 +/- 1.1 fs.

    DOI: 10.3390/app7060584

    Web of Science

  110. Development of new diagnostics in the interests of pumpprobe experiments Invited

    T. Pikuz, A. Faenov, N. Ozaki, T. Matsuoka, B. Albertazzi, N.Hartely, S. Matsuyama, K. Yamauchi, H. Habara, Y. Inubushi, T. Togashi, H. Yumoto, H. Ohashi, Y. Tange, T. Yabuuchi, M. Yabashi, A. Grum-Grzhimailo, A. Casner, G. Rigon, M. Koenig, K. A. Tanaka, T. Ishikawa, R. Kodama

        2017.6

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  111. Chemical etching of silicon carbide in pure water by using platinum catalyst Reviewed

    A. Isohashi, P. V. Pho, S. Matsuyama, Y. Sano, K. Inagaki, Y. Morikawa, K. Yamauchi

    Applied Phsyics Letters   Vol. 110 ( 20 ) page: 201601   2017.5

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    Chemical etching of SiC was found to proceed in pure water with the assistance of a Pt catalyst. A 4H-SiC (0001) wafer was placed and slid on a polishing pad in pure water, on which a thin Pt film was deposited to give a catalytic nature. Etching of the wafer surface was observed to remove protrusions preferentially by interacting with the Pt film more frequently, thus flattening the surface. In the case of an on-axis wafer, a crystallographically ordered surface was obtained with a straight step-and-terrace structure, the height of which corresponds to that of an atomic bilayer of Si and C. The etching rate depended upon the electrochemical potential of Pt. The vicinal surface was observed at the potential at which the Pt surface was bare. The primary etching mechanism was hydrolysis with the assistance of a Pt catalyst. This method can, therefore, be used as an environmentally friendly and sustainable technology. Published by AIP Publishing.

    DOI: 10.1063/1.4983206

    Web of Science

  112. 50-nm-resolution full-field X-ray microscope without chromatic aberration using total-reflection imaging mirrors Reviewed

    S. Matsuyama, S. Yasuda, J. Yamada, H. Okada, Y. Kohmura, M Yabashi, T. Ishikawa, K. Yamauchi

    Scientific Reports   Vol. 7   page: 46358   2017.4

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:NATURE PUBLISHING GROUP  

    X-ray spectromicroscopy with a full-field imaging technique is a powerful method for chemical analysis of heterogeneous complex materials with a nano-scale spatial resolution. For imaging optics, an X-ray reflective optical system has excellent capabilities with highly efficient, achromatic, and long-workingdistance properties. An advanced Kirkpatrick-Baez geometry that combines four independent mirrors with elliptic and hyperbolic shapes in both horizontal and vertical directions was developed for this purpose, although the complexity of the system has a limited applicable range. Here, we present an optical system consisting of two monolithic imaging mirrors. Elliptic and hyperbolic shapes were formed on a single substrate to achieve both high resolution and sufficient stability. The mirrors were finished with a similar to 1-nm shape accuracy using elastic emission machining. The performance was tested at SPring-8 with a photon energy of approximately 10 keV. We could clearly resolve 50-nm features in a Siemens star without chromatic aberration and with high stability over 20 h. We applied this system to X-ray absorption fine structure spectromicroscopy and identified elements and chemical states in specimens of zinc and tungsten micron-size particles.

    DOI: 10.1038/srep46358

    Web of Science

    PubMed

  113. 4枚の形状可変鏡に基づく開口数可変集光光学系を用いた回折限界X線集光

    松山智至

    X線結像光学ニューズレター     2017.4

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    Language:Japanese  

  114. High-magnification X-ray imaging mirror system consisting of elliptical concave and hyperbolic convex mirrors

    J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017     page: 66 - 66   2017.4

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  115. Hard X-ray Split-and-Delay Optics with wavefront Division at SACLA

    T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, M. Yabashi

    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017     page: 34 - 34   2017.4

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    Language:English  

  116. Development of calibration method for X-ray single-grating interferometry

    T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, H. Ohashi, T. Katayama, S. Goto, T. Ishikawa, M. Yabashi, K. Yamauchi

    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017     page: 59 - 60   2017.4

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    Language:English  

  117. Development of an adaptive x-ray focusing system based on the combination of piezoelectric bimorph mirror and mirror bender

    T. Goto, S. Matsuyama, H. Hayashi, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, K. Yamauchi

    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017     page: 72 - 72   2017.4

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  118. Development of a multilayer KB mirror sysem for sub-10nm XFEL focusing

    S. Kawai, S. Matsuyama, T. Inoue, H. Yumoto, Y. Inubushi, T. Osaka, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017     page: 61 - 62   2017.4

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    Language:English  

  119. Achromatic and High-Resolution Full-Field X-ray Microscope and its Applicaiton

    S. Matsuyama, J. Yamada, S. Yasuda, Y. Kohmura, H. Okadam, Y. Sano, M. Yabashi, T. Ishikawa, K. Yamauchi

    International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017     page: 10 - 11   2017.4

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  120. パワーレーザーとXFELを用いた動的超高圧下の物質変形・相転移に関する研究 Reviewed

    尾崎典雅

        2017.3

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  121. 全反射ミラーを用いた高分解能かつ色収差のない結像型X線顕微鏡の開発ー様々な観察法への応用ー

    松山智至, 安田周平, 山田純平, 佐野泰久, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

    アブストラクト集   Vol. P02   2017.3

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    Language:Japanese  

  122. 全反射ミラーを用いた高分解能かつ色収差のない結像型X線顕微鏡の開発ー様々な観察法への応用ー

    松山智至, 安田周平, 山田純平, 佐野泰久, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

    2017年度精密工学会春季大会学術講演会     2017.3

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  123. 高エネルギー密度科学のための新しい実験ステーション Reviewed

    松岡健之, 尾崎典雅

        2017.3

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  124. Simulation of concave-convex imaging mirror system for development of a compact and achromatic full-field x-ray microscope Reviewed

    J. Yamada, S. Matsuyama, Y. Sano, K. Yamauchi

    Applied Optics   Vol. 56 ( 4 ) page: 967 - 974   2017.2

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:OPTICAL SOC AMER  

    We propose the use of two pairs of concave-convex mirrors as imaging optics for the compact full-field x-ray microscope with high resolution and magnification factors. The optics consists of two pairs of hyperbolic convex and elliptical concave mirrors with the principal surface near the object, consequently enabling the focal length to be 10 times shorter than conventional advanced Kirkpatrick-Baez mirror optics. This paper describes characteristics of the optics calculated by ray-tracing and wave-optical simulators. The expected spatial resolution is approximately 40 nm with a wide field of view of more than 10 mu m and a total length of about 2 m, which may lead to the possibility of laboratory-sized, achromatic, and high-resolution full-field x-ray microscopes. (C) 2017 Optical Society of America

    DOI: 10.1364/AO.56.000967

    Web of Science

    PubMed

  125. Ultrafast observation of lattice dynamics in laser-irradiated gold foils Reviewed

    N. J. Hartley, N. Ozaki, T. Matsuoka, B. Albertazzi, A. Faenov, Y. Fujimoto, H. Habara, M. Harmand, Y. Inubushi, T. Katayama, M. Koenig, A. Krygier, P. Mabey, Y. Matsumura, S. Matsuyama, E. E. McBride, K. Miyanishi, G. Morard, T. Okuchi, T. Pikuz, O. Sakata, Y. Sano, T. Sato, T. Sekine, Y. Seto, K. Takahashi, K. A. Tanaka, Y. Tange, T. Togashi, Y. Umeda, T. Vinci, M. Yabashi, T. Yabuuchi, K. Yamauchi, R. Kodama

    Applied Physics Letters   Vol. 110 ( 7 ) page: 071905 - 071905   2017.2

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER INST PHYSICS  

    We have observed the lattice expansion before the onset of compression in an optical-laser-driven target, using diffraction of femtosecond X-ray beams generated by the SPring-8 Angstrom Compact Free-electron Laser. The change in diffraction angle provides a direct measure of the lattice spacing, allowing the density to be calculated with a precision of +/- 1%. From the known equation of state relations, this allows an estimation of the temperature responsible for the expansion as &lt;1000 K. The subsequent ablation-driven compression was observed with a clear rise in density at later times. This demonstrates the feasibility of studying the dynamics of preheating and shock formation with unprecedented detail. Published by AIP Publishing.

    DOI: 10.1063/1.4976541

    Web of Science

  126. Visualization of intracellular elements using scanning X-ray fluorescence microscopy Reviewed

    Mari Shimura, Lukasz Szyrwiel, Satoshi Matsuyama, Kazuto Yamauchi

    Metallomics: Recent Analytical Techniques and Applications     page: 63 - 92   2017.1

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    Language:English   Publishing type:Part of collection (book)   Publisher:Springer Japan  

    Recent technological developments have enabled the imaging of chemical elements in cells, although quantitative analyses, such as by inductively coupled plasma mass spectrometry, were developed previously. Applications allowing high-resolution imaging at the single-cell level are anticipated in cell biology and medicine, where the roles of elements, especially in relation to intracellular molecules such as proteins, nucleic acids, lipids, and sugars, are essential for understanding cellular functions. The expression of proteins and genes varies depending on cellular function, and multiple elements are likely to be associated with biological molecules in the functioning of cell proliferation, differentiation, aging, and stress responses. In this review, we describe a scanning X-ray fluorescence microscopy system, which can reliably determine the cellular distribution of multiple elements by a sub-100-nm focusing approach, together with its applications. Visualizing intracellular elements and understanding their dynamics at the single-cell level may provide great insight into their behaviors.

    DOI: 10.1007/978-4-431-56463-8_3

    Scopus

  127. Generation of apodized X-ray illumination and its application to scanning and diffraction microscopy Reviewed

    Krishna P. Khakurel, Takashi Kimura, Hiroki Nakamori, Takumi Goto, Satoshi Matsuyama, Tomoya Sasaki, Masashi Takei, Yoshiki Kohmura, Tetsuya Ishikawa, Kazuto Yamauchi, Yoshinori Nishino

    JOURNAL OF SYNCHROTRON RADIATION   Vol. 24 ( Pt 1 ) page: 142 - 149   2017.1

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:INT UNION CRYSTALLOGRAPHY  

    X-ray science has greatly benefited from the progress in X-ray optics. Advances in the design and the manufacturing techniques of X-ray optics are key to the success of various microscopic and spectroscopic techniques practiced today. Here the generation of apodized X-ray illumination using a two-stage deformable Kirkpatrick-Baez mirror system is presented. Such apodized illumination is marked by the suppression of the side-lobe intensities of the focused beam. Thus generated apodized illumination was employed to improve the image quality in scanning X-ray fluorescence microscopy. Imaging of a non-isolated object by coherent X-ray diffractive imaging with apodized illumination in a non-scanning mode is also presented.

    DOI: 10.1107/S1600577516017677

    Web of Science

    Scopus

    PubMed

  128. 全反射結像ミラーを使った色収差のないX線顕微鏡の開発と顕微分光への応用

    松山智至, 安田周平, 山田純平, 岡田浩巳, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

    アブストラクト集   Vol. 5D003   2017.1

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  129. Forefront of Development of Ultraprecise X-ray Mirrors for Synchrotron Radiation X-rays

    MATSUYAMA Satoshi, YAMAUCHI Kazuto

    Journal of the Japan Society for Precision Engineering   Vol. 83 ( 4 ) page: 300 - 304   2017

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    Language:Japanese   Publisher:The Japan Society for Precision Engineering  

    DOI: 10.2493/jjspe.83.300

    CiNii Books

  130. 光電気化学酸化を援用した触媒表面基準エッチング法による窒化ガリウムの高能率平坦化

    木田 英香, 藤 大雪, 中平 雄太, 松山 智至, 佐野 泰久, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2017A   page: 19 - 20   2017

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    Language:Japanese   Publisher:公益社団法人 精密工学会  

    我々は,窒化ガリウム (GaN) 基板を平坦化する革新的な手法として触媒表面基準エッチング (Catalyst-Referred Etching; CARE) 法の開発,研究を行っている.現在までに研磨定盤にPt触媒,加工液に純水を用いて,原子レベルに平坦な表面が作製可能となっているが,ステップフロー型であるのでCARE法は加工速度が不十分である.そこで本研究では,GaN基板の高能率平坦化を目指し,光電気化学酸化を援用したCARE法(PEC-CARE加工)を検討することで,加工速度は800 nm/hにまで向上した.

    DOI: 10.11522/pscjspe.2017a.0_19

  131. The development of the dry planarization method with a reference plane by the transportation of active species

    Ryokume Reiji, Miyazaki Toshinobu, Sano Yasuhisa, Matsuyama Satoshi, Yamauchi Kazuto

    Proceedings of JSPE Semestrial Meeting   Vol. 2017   page: 541 - 542   2017

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    Language:Japanese   Publisher:The Japan Society for Precision Engineering  

    DOI: 10.11522/pscjspe.2017S.0_541

  132. 高濃度SF<sub>6</sub>ガスを用いたサブ大気圧プラズマエッチングによるSiC基板の高能率薄化加工

    井上 裕貴, 田尻 光毅, 向井 莉紗, 佐野 泰久, 松山 智至, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2017   page: 975 - 976   2017

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    Language:Japanese   Publisher:公益社団法人 精密工学会  

    SiCデバイス製造工程においてサブ大気圧プラズマを用いたプラズマエッチング加工を検討している。今回、実用化を視野に入れた加工速度を達成することを目指した。SF6の供給量と投入電力を増大させ、反応種であるFラジカル数を増加させることで加工速度を向上させた。大電力の投入はこれまで困難であったが、新たな試料台を用いることで大電力を投入しても安定なプラズマの発生に成功し、2インチウエハ全面加工速度15.2 μm/minを達成した。

    DOI: 10.11522/pscjspe.2017S.0_975

  133. 触媒表面基準エッチング法における水素水を用いた被毒除去法の提案

    中平 雄太, 礒橋 藍, Bui Pho, 稻田 辰昭, 藤 大雪, 木田 英香, 松山 智至, 佐野 泰久, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2017 ( 0 ) page: 1 - 2   2017

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    Language:Japanese   Publisher:公益社団法人 精密工学会  

    我々はこれまで触媒表面基準エッチング法の開発を行ってきた。本手法ではエッチング反応による加工が、触媒作用を有する研磨パッドの近傍のみで進行するため凸部からの選択的な加工が可能である。砥粒等の機械的作用によるダメージはなく効率的に基準面形状の転写が可能である。本研究では、水素水を用い触媒表面の加工生成物を除去することで加工速度の安定化を行い、加工液のpHを変化させることで加工速度の向上に成功した。

    DOI: 10.11522/pscjspe.2017A.0_1

  134. Change in surface morphology of Si (100) wafer after oxidation with atmospheric-pressure plasma Reviewed

    Hiroyasu Takei, Satoshi Kurio, Satoshi Matsuyama, Kazuto Yamauchi, Yasuhisa Sano

    Key Engineering Materials   Vol. 723   page: 242 - 246   2017

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    Language:English   Publishing type:Research paper (international conference proceedings)   Publisher:Trans Tech Publications Ltd  

    Modern surface processing of semiconductors or oxide materials requires highly precise temporal control of each processing step. In addition, large wafers must be processed quickly for high throughput. We have developed a numerically controlled sacrificial oxidation method with atmospheric-pressure plasma using electrode arrays. In this method, we oxidized the surface of a wafer with atmospheric-pressure plasma applied precisely by an electrode array, and then dipped the wafer in HF solution to remove the surface oxide layer. The plasma process time can be controlled independently at each electrode area. The oxidation rate and surface profile of the treated wafer are crucial for precision processing. We investigated the oxidation rate of atmospheric-pressure plasma oxidation by spectroscopic ellipsometry and examined the surface morphologies of untreated and treated wafers by atomic force microscopy. The surface profile smoothness correlated with the plasma oxidation time and electrode voltage during oxidation. The surface roughness tended to increase when the sample was oxidized for longer times with higher electrode voltage. This correlation between surface roughness and oxidation time resembled the results of Si/SiO2 interfacial roughness in the case of thermal oxidation. In the plasma sacrificial oxidation process, the increase of surface roughness at the Si/SiO2 interface by plasma oxidation must be considered.

    DOI: 10.4028/www.scientific.net/KEM.723.242

    Scopus

  135. Planarization of SiC and oxide surfaces by using Catalyst-Referred Etching with water

    Pho Van Bui, Ai Isohashi, Daisetsu Toh, Satoshi Matsuyama, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi

    Proceedings of the 17th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2017     page: 157 - 158   2017

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    Publishing type:Research paper (international conference proceedings)  

    A novel abrasive-free planarization method called catalyst-referred etching (CARE) has been invented and developed in our group. In this method, a platinum film, which acts as a catalyst, is deposited on an elastic pad that is rotated in contact with a wafer surface in water. CARE can produce flat, undamaged, and smooth SiC and SiO2 surfaces with a root-mean-square (RMS) roughness of less than 0.1 nm over a whole wafer. The mechanism is considered a dissociative adsorption of water molecules onto the Si-C bonds at the topmost Si surface. The gross activation barrier strongly correlates with the stability of the metastable state and is reduced by the formation of Pt-O chemical bonds, leading to an enhancement of the etching reaction.

    Scopus

  136. 多層膜KBミラーを用いたX線自由電子レーザーナノ集光システムの開発

    川合 蕉吾, 松山 智至, 井上 陽登, 湯本 博勝, 犬伏 雄一, 小山 貴久, 登野 健介, 大橋 治彦, 大坂 泰斗, 矢橋 牧名, 石川 哲也, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2017   page: 959 - 960   2017

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    Language:Japanese   Publisher:公益社団法人 精密工学会  

    X線自由電子レーザーは超高強度という非常に優れた性質をもつ.その性能をより向上させるためには,高精度かつ大開口数であるX線集光光学系の開発が必要不可欠である.我々は,大開口数多層膜ミラーを用いた集光光学系をSPring-8に構築した.そして,X線グレーチング干渉計で波面計測を行うことによって多層膜ミラーの作製誤差を計測しさらにこれを修正した.&lambda;/4程度の精度で多層膜集光ミラーを完成させた.

    DOI: 10.11522/pscjspe.2017S.0_959

  137. ニッケル触媒を利用した純水ベースの触媒表面基準エッチング法の開発

    藤 大雪, 礒橋 藍, 稻田 辰昭, 中平 雄太, 木田 英香, 松山 智至, 佐野 泰久, 山内 和人

    精密工学会学術講演会講演論文集   Vol. 2017 ( 0 ) page: 35 - 36   2017

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    Language:Japanese   Publisher:公益社団法人 精密工学会  

    我々は機能性材料を平坦化する手法として触媒表面基準エッチング法を開発してきた.加工液に純水,触媒にPt,を用いる本手法は高精度表面の実現を可能にするがステップフロー型エッチングであるため加工速度は未だ不十分である.そこで本研究ではニッケルを触媒として利用し,加工速度の向上を図った.表面が酸化され化学的不活性になりやすいニッケルを電気化学的手法によりその触媒活性を安定させ超高速加工を実現した.

    DOI: 10.11522/pscjspe.2017A.0_35

  138. Stabilization of removal rate of silica glass on catalyst-referred etching by cleaning catalyst surface

    Yuta Nakahira, Ai Isohashi, Tatsuaki Inada, Daisetsu Toh, Hideka Kida, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

    ICPT 2017 - International Conference on Planarization/CMP Technology     page: 110 - 114   2017

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    Publishing type:Research paper (international conference proceedings)  

    A novel planarization method termed catalyst-referred etching (CARE) was developed, in which platinum and pure water were respectively employed as a catalyst and an etchant to create highly ordered surfaces with a step terrace structure on oxide materials, such as quarts, sapphire, and zinc oxide substrates. The step heights were in good agreement with the theoretical single-bilayer thickness. However, the removal rate of the etching process gradually decreased with the processing time. This decrease in the removal rate was attributed to degradation of the catalyst via the adsorption of silicic acid produced during the CARE process on the catalyst surface. Two methods were employed to remove the silicic acid: control of the potential of the Pt surface and cleaning of the catalyst pad with H2 water. The removal rate was maintained by using both methods. In both methods, the potential of the Pt surface was set at the H generation level. It is proposed that the generated hydrogen atoms broke the Pt-O bonds, thereby maintaining the reactivity of the catalyst surface.

    Scopus

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Books 5

  1. Cutting-edge Analytical Techniques, 2nd Edition

    ( Role: Contributor)

    2022.1  ( ISBN:978-4-86043-737-4

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    Language:Japanese Book type:Scholarly book

  2. 差分成膜法による高精度X線ミラー作製

    松山智至, 山内和人( Role: Sole author)

    精密工学会誌  2018.3 

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    Book type:Scholarly book

  3. 全反射結像ミラーを用いた色収差のないX線顕微鏡

    松山智至( Role: Sole author)

    日本放射光学会  2018.1 

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    Book type:Scholarly book

  4. 放射光X線のための超高精度X線ミラー開発の最前線

    松山 智至, 山内 和人( Role: Contributor)

    精密工学会誌  2017.4 

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    Book type:Scholarly book

  5. 4枚の形状可変鏡に基づく開口数可変集光光学系を用いた回折限界X線集光

    松山 智至( Role: Sole author)

    X線結像光学ニューズレター  2017.4 

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    Book type:Scholarly book

MISC 22

  1. ミラー光学系を利用した結像型硬X線顕微鏡

    松山 智至

    光学   Vol. 51 ( 8 )   2022.8

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    Authorship:Lead author, Last author, Corresponding author   Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)  

  2. Advanced KBミラーに基づく硬X線自由電子レーザーsub-10nm集光システム

    山田純平, 松山智至, 井上陽登, 伊藤篤輝, 田中優人, 大坂泰斗, 井上伊知郎, 犬伏雄一, 湯本博勝, 湯本博勝, 小山貴久, 小山貴久, 大橋治彦, 大橋治彦, 山内和人, 矢橋牧名, 矢橋牧名

    日本放射光学会年会・放射光科学合同シンポジウム(Web)   Vol. 35th   2022

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  3. はじめての放射光実験 Invited

    松山智至

    精密工学会誌   Vol. 87 ( 7 ) page: 618 - 621   2021.7

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)  

    DOI: 10.2493/jjspe.87.7_618

  4. X線スペックル干渉計を駆使したナノビーム形成 Invited

    松山智至

    光学   Vol. 50 ( 6 )   2021.6

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)  

  5. Fabrication of atomically smooth polycrystalline surface without grain boundary steps by using catalyst-referred etching method

    藤大雪, VAN BUI Pho, 松山智至, 佐野泰久, 山内和人

    精密工学会大会学術講演会講演論文集   Vol. 2021   2021

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  6. Wolter III型advanced KBミラーによるXFEL sub-10nm集光光学系の開発

    山田純平, 松山智至, 松山智至, 井上陽登, 中村南美, 田中優人, 大坂泰斗, 井上伊知郎, 犬伏雄一, 犬伏雄一, 湯本博勝, 湯本博勝, 小山貴久, 小山貴久, 大橋治彦, 大橋治彦, 山内和人, 矢橋牧名, 矢橋牧名

    日本放射光学会年会・放射光科学合同シンポジウム(Web)   Vol. 34th   2021

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  7. SF<sub>6</sub>ガスを用いたサブ大気圧プラズマによるSiC-MOSFETの裏面薄化におけるデバイス性能への影響の調査

    大島政明, 中西悠真, 藤大雪, 松山智至, 山内和人, 佐野泰久

    精密工学会関西地方定期学術講演会講演論文集   Vol. 2021   2021

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  8. X線自由電子レーザー用sub10nm集光システムの開発-高反射率多層膜ミラーの作製-

    井上陽登, 松山智至, 山田純平, 中村南美, 大坂泰斗, 湯本博勝, 小山貴久, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    日本放射光学会年会・放射光科学合同シンポジウム(Web)   Vol. 33rd   2020

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  9. WolterIII型Advanced KBミラーを用いたX線自由電子レーザーsub-10nm集光システムの開発(第2報)-高反射率多層膜の作製と差分成膜による形状修正-

    井上陽登, 松山智至, 山田純平, 中村南美, 大坂泰斗, 湯本博勝, 小山貴久, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    精密工学会大会学術講演会講演論文集   Vol. 2020   2020

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  10. WolterIII型Advanced KBミラーを用いたX線自由電子レーザーsub-10nm集光システムの開発(第3報)-差分成膜によるX線ミラーの高精度形状修正およびSPring-8における性能評価-

    井上陽登, 松山智至, 山田純平, 中村南美, 田中優人, 大坂泰斗, 湯本博勝, 小山貴久, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    精密工学会大会学術講演会講演論文集   Vol. 2020   2020

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  11. X線自由電子レーザーナノ集光システムの開発 格子干渉計を用いたX線波面計測法の検証

    中村南美, 松山智至, 山田純平, 井上陽登, 大坂泰斗, 湯本博勝, 小山貴久, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    精密工学会大会学術講演会講演論文集   Vol. 2020   2020

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  12. X線自由電子レーザー用sub10nm集光システムの開発-新しいビーム径診断法を用いた精密ミラーアライメント-

    井上陽登, 松山智至, 中村南美, 湯本博勝, 犬伏雄一, 犬伏雄一, 小山貴久, 大坂泰斗, 井上伊知郎, 登野健介, 登野健介, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    日本放射光学会年会・放射光科学合同シンポジウム(Web)   Vol. 32nd   2019

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  13. X線自由電子レーザーナノ集光システムの開発-蛍光X線の強度干渉現象を利用したビーム径決定手法の検討-

    中村南美, 松山智至, 井上陽登, 井上伊知郎, 大坂泰斗, 山田純平, 湯本博勝, 小山貴久, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    精密工学会関西地方定期学術講演会講演論文集   Vol. 2019   2019

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  14. Wolter III型Advanced KBミラーを用いたX線自由電子レーザーsub-10nm集光システムの開発

    井上陽登, 松山智至, 山田純平, 中村南美, 大坂泰斗, 湯本博勝, 小山貴久, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    精密工学会大会学術講演会講演論文集   Vol. 2019   2019

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  15. X線自由電子レーザーナノ集光システムの開発(第2報)蛍光X線の強度干渉現象を利用したビーム径決定手法の実証

    中村南美, 松山智至, 井上陽登, 井上伊知郎, 大坂泰斗, 山田純平, 湯本博勝, 小山貴久, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    精密工学会大会学術講演会講演論文集   Vol. 2019   2019

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  16. 多層膜KBミラーを用いたX線自由電子レーザーナノ集光システムの開発(第二報)-スペックルを利用したミラーアライメント調整精度の検討-

    井上陽登, 松山智至, 中村南美, 湯本博勝, 犬伏雄一, 犬伏雄一, 小山貴久, 大坂泰斗, 井上伊知郎, 登野健介, 登野健介, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    精密工学会大会学術講演会講演論文集   Vol. 2018   2018

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  17. 大開口数多層膜集光ミラーを用いたsub-10nm集光システムの開発

    川合蕉吾, 松山智至, 井上陽登, 湯本博勝, 犬伏雄一, 小山貴久, 大坂泰斗, 大橋治彦, 矢橋牧名, 石川哲也, 山内和人

    日本放射光学会年会・放射光科学合同シンポジウム(Web)   Vol. 31st   2018

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  18. X線自由電子レーザー用sub10nm集光システムの開発波面計測法とビームキャラクタリゼーション法の検討

    井上陽登, 松山智至, 川合蕉吾, 湯本博勝, 犬伏雄一, 小山貴久, 大坂泰斗, 大橋治彦, 矢橋牧名, 石川哲也, 山内和人

    日本放射光学会年会・放射光科学合同シンポジウム(Web)   Vol. 31st   2018

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  19. X線自由電子レーザーナノ集光システムの開発

    中村南美, 松山智至, 井上陽登, 湯本博勝, 犬伏雄一, 犬伏雄一, 小山貴久, 大坂泰斗, 井上伊知郎, 登野健介, 登野健介, 大橋治彦, 矢橋牧名, 矢橋牧名, 石川哲也, 山内和人

    精密工学会関西地方定期学術講演会講演論文集   Vol. 2018   2018

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  20. 光電気化学酸化を利用した触媒表面基準エッチング法による窒化ガリウムの高能率平坦化

    木田英香, 藤大雪, 中平雄太, 松山智至, 佐野泰久, 山内和人

    精密工学会大会学術講演会講演論文集   Vol. 2017   2017

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  21. X線自由電子レーザーナノ集光用の大開口数多層膜集光ミラーの開発

    川合蕉吾, 松山智至, 井上陽斗, 湯本博勝, 犬伏雄一, 小山貴久, 登野健介, 大橋治彦, 矢橋牧名, 石川哲也, 山内和人

    日本放射光学会年会・放射光科学合同シンポジウム(Web)   Vol. 30th   2017

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  22. XFEL用集光光学系のための精密波面計測法の開発

    井上陽登, 松山智至, 川合蕉吾, 湯本博勝, 犬伏雄一, 小山貴久, 登野健介, 大橋治彦, 大坂泰斗, 矢橋牧名, 石川哲也, 山内和人

    精密工学会関西地方定期学術講演会講演論文集   Vol. 2017   2017

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Presentations 104

  1. 反射レンズを用いたX線顕微鏡の高分解能化 Invited

    松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:北海道,北海道大学   Country:Japan  

  2. High-resolution Full-field X-ray Microscope Based on Multilayer Advanced KB Mirrors Invited International conference

    S. Matsuyama

    15th International Conference on X-ray Microscopy (XRM2022)  2022.6.20 

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    Event date: 2022.6

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Online   Country:Taiwan, Province of China  

  3. 高強度レーザー集光工学系のための大口径形状可変ミラーの開発

    金﨑健太,井上陽登,吉水純弥,中林荘太,我妻一博,石井雅樹,松尾一輝,松山智至

    2024年度精密工学会春季大会学術講演会  2024.3.12  精密工学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京大学   Country:Japan  

  4. 色収差の無いX線sub-10 nm集光のための極薄形状可変ミラーの開発 -薄板型形状可変ミラーの試作-

    上山冬馬,井上陽登,吉水純弥,松山智至

    2024年度精密工学会春季大会学術講演会  2024.3.12  精密工学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京大学   Country:Japan  

  5. 深層強化学習によるアダプティブミラー制御法の開発

    長嶋友作,井上陽登,青戸仁志,松山智至

    2024年度精密工学会春季大会学術講演会  2024.3.12  精密工学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京大学   Country:Japan  

  6. 高強度レーザー集光工学系のための大口径形状可変ミラーの開発

    金﨑健太,井上陽登,吉水純弥,中林荘太,我妻一博,石井雅樹,松尾一輝,松山智至

    2024年度精密工学会春季大会学術講演会  2024.3.12  精密工学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京大学   Country:Japan  

  7. 色収差の無いX線sub-10 nm集光のための極薄形状可変ミラーの開発 -薄板型形状可変ミラーの試作-

    上山冬馬,井上陽登,吉水純弥,松山智至

    2024年度精密工学会春季大会学術講演会  2024.3.12  精密工学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京大学   Country:Japan  

  8. 深層強化学習によるアダプティブミラー制御法の開発

    長嶋友作,井上陽登,青戸仁志,松山智至

    2024年度精密工学会春季大会学術講演会  2024.3.12  精密工学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京大学   Country:Japan  

  9. 高空間周波数形状制御可能な接合型形状可変ミラーの開発

    加納愛彩,井上陽登,中林荘太,香村芳樹,矢橋牧名,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路   Country:Japan  

  10. 多層膜AKBミラーを用いた高分解能X線顕微鏡の開発

    伊藤颯希,表和彦,廣瀬雷太,井上陽登,中林荘太,入山陽仁,山田純平,香村芳樹,矢橋牧名,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路   Country:Japan  

  11. 内回転試料のX線顕微鏡画像群を用いたUNNベースのブラインドデコンボリューション

    栗本晋之介,井上陽登,伊藤俊希,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路   Country:Japan  

  12. 単結晶圧電素子を用いたビームサイズ可変光学系用形状可変ミラーの開発

    吉水純弥,井上陽登,香村芳樹,矢橋牧名,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路   Country:Japan  

  13. 大視野X線斜入射結像光学系の開発とシミュレーションによるアライメント誤差評価

    入山陽仁,井上陽登,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:姫路   Country:Japan  

  14. 高空間周波数形状制御可能な接合型形状可変ミラーの開発

    加納愛彩,井上陽登,中林荘太,香村芳樹,矢橋牧名,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路   Country:Japan  

  15. 多層膜AKBミラーを用いた高分解能X線顕微鏡の開発

    伊藤颯希,表和彦,廣瀬雷太,井上陽登,中林荘太,入山陽仁,山田純平,香村芳樹,矢橋牧名,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路   Country:Japan  

  16. 内回転試料のX線顕微鏡画像群を用いたUNNベースのブラインドデコンボリューション

    栗本晋之介,井上陽登,伊藤俊希,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路   Country:Japan  

  17. 単結晶圧電素子を用いたビームサイズ可変光学系用形状可変ミラーの開発

    吉水純弥,井上陽登,香村芳樹,矢橋牧名,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路   Country:Japan  

  18. 大視野X線斜入射結像光学系の開発とシミュレーションによるアライメント誤差評価

    入山陽仁,井上陽登,松山智至

    第37回日本放射光学会年会・放射光科学合同シンポジウム  2024.1.10  日本放射光学会

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    Event date: 2024.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:姫路   Country:Japan  

  19. ビームサイズ可変X線光学系のための単結晶圧電素子を使った形状可変ミラーの開発

    吉水純弥,井上陽登,加納愛彩,中林荘太,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道,北海道大学   Country:Japan  

  20. 面内回転試料のX線顕微鏡画像群を用いた教師なし学習ベースのブラインドデコンボリューション

    栗本晋之介,井上陽登,伊藤俊希,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道,北海道大学   Country:Japan  

  21. 17.5keV用多層膜AKBミラーを用いた大開口数X線顕微鏡の開発

    伊藤颯希,表和彦,廣瀬雷太,井上陽登,山田純平,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道,北海道大学   Country:Japan  

  22. 超高分解能結像型X線顕微鏡のためのアダプティブミラー光学系の開発

    井上陽登,中林荘太,田中優人,上松航太,加納愛彩,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道,北海道大学   Country:Japan  

  23. ビームサイズ可変X線光学系のための単結晶圧電素子を使った形状可変ミラーの開発

    吉水純弥,井上陽登,加納愛彩,中林荘太,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道,北海道大学   Country:Japan  

  24. 反射レンズを用いたX線顕微鏡の高分解能化

    松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:北海道,北海道大学   Country:Japan  

  25. 面内回転試料のX線顕微鏡画像群を用いた教師なし学習ベースのブラインドデコンボリューション

    栗本晋之介,井上陽登,伊藤俊希,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道,北海道大学   Country:Japan  

  26. 17.5keV用多層膜AKBミラーを用いた大開口数X線顕微鏡の開発

    伊藤颯希,表和彦,廣瀬雷太,井上陽登,山田純平,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道,北海道大学   Country:Japan  

  27. 超高分解能結像型X線顕微鏡のためのアダプティブミラー光学系の開発

    井上陽登,中林荘太,田中優人,上松航太,加納愛彩,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2023  2023.11.27  日本光学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道,北海道大学   Country:Japan  

  28. Development of X-ray Fourier Ptychography Using Mirror-based Achromatic X-ray Microscope International conference

    Toshiki Ito, Takato Inoue, Shinnosuke Kurimoto, Yuto Tanaka, Yoshiki Kohmura, Makina Yabashi and Satoshi Matsuyama

    The 10th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN) 2023  2023.11.21 

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    Event date: 2023.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:The Hong Kong Polytechnic University, Hong Kong   Country:Hong Kong  

  29. Development of a novel deformable X-ray mirror based on a single-crystal piezoelectric element International conference

    Junya Yoshimizu, Takato Inoue, Maaya Kano, Sota Nakabayashi, Yoshiki Kohmura, Makina Yabashi and Satoshi Matsuyama

    The 10th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN) 2023  2023.11.21 

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    Event date: 2023.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:The Hong Kong Polytechnic University, Hong Kong   Country:Hong Kong  

  30. Development of X-ray Fourier Ptychography Using Mirror-based Achromatic X-ray Microscope International conference

    Toshiki Ito, Takato Inoue, Shinnosuke Kurimoto, Yuto Tanaka, Yoshiki Kohmura, Makina Yabashi and Satoshi Matsuyama

    The 10th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN) 2023  2023.11.21 

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    Event date: 2023.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:The Hong Kong Polytechnic University, Hong Kong   Country:Hong Kong  

  31. Development of a novel deformable X-ray mirror based on a single-crystal piezoelectric element International conference

    Junya Yoshimizu, Takato Inoue, Maaya Kano, Sota Nakabayashi, Yoshiki Kohmura, Makina Yabashi and Satoshi Matsuyama

    The 10th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN) 2023  2023.11.21 

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    Event date: 2023.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:The Hong Kong Polytechnic University, Hong Kong   Country:Hong Kong  

  32. 試料回転を用いたブラインドデコンボリューション手法の開発

    栗本晋之介,井上陽登,伊藤俊希,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡,福岡工業大学   Country:Japan  

  33. 試料回転を用いたブラインドデコンボリューション手法の開発

    栗本晋之介,井上陽登,伊藤俊希,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:福岡,福岡工業大学   Country:Japan  

  34. 単結晶圧電素子ベース形状可変ミラーを用いたアダプティブ結像型X線顕微鏡の開発

    中林荘太,井上陽登,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:福岡,福岡工業大学   Country:Japan  

  35. ニオブ酸リチウムを用いた大変形可能なX線形状可変ミラーの開発

    吉水純弥,井上陽登,加納愛彩,中林荘太,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:福岡,福岡工業大学   Country:Japan  

  36. ニオブ酸リチウムを用いた大変形可能なX線形状可変ミラーの開発

    吉水純弥,井上陽登,加納愛彩,中林荘太,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡,福岡工業大学   Country:Japan  

  37. 単結晶圧電素子ベース形状可変ミラーを用いたアダプティブ結像型X線顕微鏡の開発

    中林荘太,井上陽登,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡,福岡工業大学   Country:Japan  

  38. 試料回転を用いたブラインドデコンボリューション手法の開発

    栗本晋之介,井上陽登,伊藤俊希,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡,福岡工業大学   Country:Japan  

  39. 試料回転を用いたブラインドデコンボリューション手法の開発

    栗本晋之介,井上陽登,伊藤俊希,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:福岡,福岡工業大学   Country:Japan  

  40. 単結晶圧電素子ベース形状可変ミラーを用いたアダプティブ結像型X線顕微鏡の開発

    中林荘太,井上陽登,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:福岡,福岡工業大学   Country:Japan  

  41. ニオブ酸リチウムを用いた大変形可能なX線形状可変ミラーの開発

    吉水純弥,井上陽登,加納愛彩,中林荘太,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:福岡,福岡工業大学   Country:Japan  

  42. ニオブ酸リチウムを用いた大変形可能なX線形状可変ミラーの開発

    吉水純弥,井上陽登,加納愛彩,中林荘太,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡,福岡工業大学   Country:Japan  

  43. 単結晶圧電素子ベース形状可変ミラーを用いたアダプティブ結像型X線顕微鏡の開発

    中林荘太,井上陽登,伊藤颯希,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会秋季大会学術講演会  2023.9.12  精密工学会

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡,福岡工業大学   Country:Japan  

  44. Development of ultraprecise X-ray adaptive optical system for high-resolution full-field microscopy International conference

    Sota Nakabayashi, Takato Inoue, Kota Uematsu, Yuto Tanaka, Yoshio Ichii, Yoshiki Kohmura, Makina Yabashi and Satoshi Matsuyama

    8th International Conference on X-ray Optics and Applications 2023 (XOPT2023) in OPIC2023  2023.4.18 

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    Event date: 2023.4

    Language:English   Presentation type:Poster presentation  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  45. X-ray Fourier Ptychography using advanced Kirkpatrick-Baez mirrors International conference

    Shinnosuke Kurimoto, Takato Inoue, Toshiki Ito, Hitoshi Aoto, Yuto Tanaka, Jumpei Yamada, Yoshiki Kohmura, Makina Yabashi, Satoshi Matsuyama

    8th International Conference on X-ray Optics and Applications 2023 (XOPT2023) in OPIC2023  2023.4.18 

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    Event date: 2023.4

    Language:English   Presentation type:Poster presentation  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  46. Development of ultraprecise X-ray adaptive optical system for high-resolution full-field microscopy International conference

    Sota Nakabayashi, Takato Inoue, Kota Uematsu, Yuto Tanaka, Yoshio Ichii, Yoshiki Kohmura, Makina Yabashi and Satoshi Matsuyama

    8th International Conference on X-ray Optics and Applications 2023 (XOPT2023) in OPIC2023  2023.4.18 

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    Event date: 2023.4

    Language:English   Presentation type:Poster presentation  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  47. X-ray Fourier Ptychography using advanced Kirkpatrick-Baez mirrors International conference

    Shinnosuke Kurimoto, Takato Inoue, Toshiki Ito, Hitoshi Aoto, Yuto Tanaka, Jumpei Yamada, Yoshiki Kohmura, Makina Yabashi, Satoshi Matsuyama

    8th International Conference on X-ray Optics and Applications 2023 (XOPT2023) in OPIC2023  2023.4.18 

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    Event date: 2023.4

    Language:English   Presentation type:Poster presentation  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  48. 高空間周波数形状制御可能な新規構造の形状可変ミラーの開発

    加納愛彩,井上陽登,中林荘太,上松航太,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会春季大会学術講演会  2023.3.16 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京理科大学葛飾キャンパス   Country:Japan  

  49. X線フーリエタイコグラフィによる超解像イメージング

    伊藤俊希,井上陽登,栗本晋之介,田中優人,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会春季大会学術講演会  2023.3.16 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京理科大学葛飾キャンパス   Country:Japan  

  50. X線顕微鏡のためのin-situ波面計測法の開発~点とエッジを用いた方法の検討~

    伊藤颯希,田中優人,中林荘太,上松航太,井上陽登,栗本晋之介,青戸仁志,香村芳樹,矢橋牧名,松山智至

    2023年度精密工学会春季大会学術講演会  2023.3.16 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京理科大学葛飾キャンパス   Country:Japan  

  51. 単結晶圧電素子を用いた大変形可能なX線形状可変ミラーの開発

    吉水純弥,井上陽登,中林荘太,上松航太,松山智至

    2023年度精密工学会春季大会学術講演会  2023.3.16 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京,東京理科大学葛飾キャンパス   Country:Japan  

  52. 高空間分解能な結像型X線顕微鏡のためのX線ミラー補償光学系

    田中優人,井上陽登,中林荘太,上松航太,伊藤颯希,山田純平,香村芳樹,矢橋牧名,山内和人,松山智至

    第36回日本放射光学会年会・放射光科学合同シンポジウム 

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    Event date: 2023.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:滋賀,立命館大学 BKC   Country:Japan  

  53. ニオブ酸リチウムを用いた高精度形状可変ミラーの開発

    中林荘太,井上陽登,上松航太,矢橋牧名,香村芳樹,松山智至

    第36回日本放射光学会年会・放射光科学合同シンポジウム 

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    Event date: 2023.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:滋賀,立命館大学 BKC   Country:Japan  

  54. 大視野を持つX線斜入射結像光学系の開発

    入山陽仁,井上陽登,松山智至

    第36回日本放射光学会年会・放射光科学合同シンポジウム 

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    Event date: 2023.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:滋賀,立命館大学 BKC   Country:Japan  

  55. Advanced Kirkpatrick-Baezミラーを用いたX線フーリエタイコグラフィ

    栗本晋之介,井上陽登,田中優人,山田純平,香村芳樹,矢橋牧名,松山智至

    第36回日本放射光学会年会・放射光科学合同シンポジウム 

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    Event date: 2023.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:滋賀,立命館大学 BKC   Country:Japan  

  56. X線フーリエタイコグラフィによる超解像イメージング -シミュレーションを用いた様々な誤差の調査-

    伊藤俊希,井上陽登,栗本晋之介,田中優人,松山智至

    第36回日本放射光学会年会・放射光科学合同シンポジウム 

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    Event date: 2023.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:滋賀,立命館大学 BKC   Country:Japan  

  57. Development of an ultraprecise X-ray deformable mirror based on a single-crystal piezoelectric element International conference

    Kota Uematsu, Takato Inoue, Sota Nakabayashi, Yoshiki Kohmura, Makina Yabashi and Satoshi Matsuyama

    The 19th International Conference on Precision Engineering (ICPE 2022 in Nara) 

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    Event date: 2022.11 - 2022.12

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Nara Prefectural Convention Center, Nara   Country:Japan  

  58. 教師なし機械学習を用いたX線顕微鏡像からの波面推定

    青戸仁志,井上陽登,栗本晋之介,田中優人,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2022  2022.11.15  日本光学会

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    Event date: 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:栃木, 栃木県総合文化センター   Country:Japan  

  59. 次世代X線顕微鏡のための高精度X線形状可変ミラーの開発

    井上陽登,中林荘太,上松航太,一井愛雄,香村芳樹,矢橋牧名,山内和人,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2022  2022.11.15  日本光学会

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    Event date: 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:栃木, 栃木県総合文化センター   Country:Japan  

  60. Advanced Kirkpatrick-Baezミラーを用いたX線フーリエタイコグラフィ

    栗本晋之介,井上陽登,青戸仁志,田中優人,山田純平,香村芳樹,矢橋牧名,松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2022  2022.11.15  日本光学会

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    Event date: 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:栃木, 栃木県総合文化センター   Country:Japan  

  61. Development of a Fourier Ptychography-based wavefront measurement method for mirror-based full-field X-ray microscopes International conference

    Y. Tanaka, S. Kurimoto, T. Inoue, J. Yamada, Y. Kohmura, M. Yabashi, T. Ishikawa, and S. Matsuyama

    Asia-Oceania Conference on Synchrotron Radiation Instrumentation 2022 (AO-SRI 2022)  

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    Event date: 2022.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Sakura Hall, Tohoku University, Miyagi   Country:Japan  

  62. Development of ultra precise adaptive X-ray optical imaging system for high-resolution X-ray microscope International conference

    Sota Nakabayashi, Takato Inoue, Kota Uematsu, Yoshiki Kohmura, Makina Yabashi and Satoshi Matsuyama

    Asia-Oceania Conference on Synchrotron Radiation Instrumentation 2022 (AO-SRI 2022)  

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    Event date: 2022.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Sakura Hall, Tohoku University, Miyagi   Country:Japan  

  63. 教師なし学習による X 線 顕微鏡画像群からの波面 を推定する手法の開発

    青戸仁志,井上陽登,栗本晋之介,田中優人,松山智至

    2022年度精密工学会秋季大会学術講演会  2022.9.9 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  64. フーリエタイコグラフィに基づいたX線波面計測法の開発

    栗本晋之介,井上陽登,青戸仁志,田中優人,山田純平,香村芳樹,矢橋牧名,松山智至

    2022年度精密工学会秋季大会学術講演会  2022.9.9 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  65. ニオブ酸リチウム単結晶を用いたX線用形状可変ミラーの開発 ー第2報:アダプティブ Advanced KBミラー光学系の構築ー

    中林荘太,井上陽登,上松航太,香村芳樹,矢橋牧名,松山智至

    2022年度精密工学会秋季大会学術講演会  2022.9.9 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  66. Development of adaptive multilayer mirror optics for sub-5 nm focusing of a hard X-ray International conference

    T. Inoue, S. Matsuyama, Y. Tanaka, A. Ito, Y. Ichii, J. Yamada, Y. Sano, Y. Kohmura, M. Yabashi, and K. Yamauchi

    SPIE Optics+Photonics2022 

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    Event date: 2022.8

    Language:English   Presentation type:Oral presentation (general)  

    Venue:San Diego Convention Center, San Diego, California   Country:United States  

  67. Development of sub-5-nm focusing system using a multilayer-coated deformable mirror International conference

    T. Inoue, S. Matsuyama, Y. Tanaka, A. Ito, Y. Ichii, J. Yamada, Y. Sano, Y. Kohmura, M. Yabashi, and K. Yamauchi

    15th International Conference on X-ray Microscopy (XRM2022) 

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    Event date: 2022.6

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Taiwan, Province of China  

  68. Advanced Kirkpatrick-Baez mirror optics based on Wolter type I and III configurations for hard X-ray full-field microscopy International conference

    J. Yamada, S. Matsuyama, Y. Tanaka, H. Takano, T. Uraga, K. Yamauchi, and M. Yabashi

    15th International Conference on X-ray Microscopy (XRM2022) 

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    Event date: 2022.6

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Taiwan, Province of China  

  69. Propagation-based phase-contrast imaging with full-field X-ray microscope using advanced Kirkpatrick?Baez mirrors International conference

    Y. Tanaka, S. Matsuyama, J. Yamada, T. Inoue, T. Kimura, M. Shimura, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi

    15th International Conference on X-ray Microscopy (XRM2022) 

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    Event date: 2022.6

    Language:English   Presentation type:Poster presentation  

    Venue:Online   Country:Taiwan, Province of China  

  70. XFEL sub-10 nm focusing system based on X-ray imaging mirrors International conference

    A. Ito, J. Yamada, S. Matsuyama, T. Inoue, Y. Tanaka, I. Inoue, T. Osaka, Y. Inubushi, H. Yumoto, T. Koyama, H. Ohashi, M. Yabashi, K. Yamauchi

    15th International Conference on X-ray Microscopy (XRM2022) 

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    Event date: 2022.6

    Language:English   Presentation type:Poster presentation  

    Venue:Online   Country:Taiwan, Province of China  

  71. Novel deformable X-ray mirrors based on lithium niobate single crystal International conference

    Sota Nakabayashi, Kota Uematsu, Takato Inoue, and Satoshi Matsuyama

    7th International Conference on X-ray Optics and Applications 2022 (XOPT2022) 

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    Event date: 2022.4

    Language:English   Presentation type:Poster presentation  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  72. Development of mirror-based full-field X-ray microscope toward XANES nano-CT measurement International conference

    J. Yamada, S. Matsuyama, Y. Tanaka, H. Takano, T. Uruga, K. Yamauchi and M. Yabashi

    7th International Conference on X-ray Optics and Applications 2022 (XOPT2022) 

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    Event date: 2022.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  73. Propagation-based phase-contrast imaging for full-field X-ray microscope with advanced Kirkpatrick-Baez mirror International conference

    Y. Tanaka, S. Matsuyama, T. Inoue, J. Yamada, T. Kimura, M. Shimura, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi

    7th International Conference on X-ray Optics and Applications 2022 (XOPT2022) 

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    Event date: 2022.4

    Language:English   Presentation type:Poster presentation  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  74. Beam size characterization method of sub-10 nm focused XFEL using uniform nanospheres International conference

    A. Ito, J. Yamada, S. Matsuyama, T. Inoue, Y. Tanaka, I. Inoue, T. Osaka, H. Yumoto, T. Koyama, H. Ohashi, M. Yabashi, T. Ishikawa, and K. Yamauchi

    7th International Conference on X-ray Optics and Applications 2022 (XOPT2022) 

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    Event date: 2022.4

    Language:English   Presentation type:Poster presentation  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  75. Development of sub-5 nm focusing system based on piezoelectric deformable mirrors International conference

    T. Inoue, S. Matsuyama, Y. Tanaka, A. Ito, Y. Ichii, J. Yamada, Y. Sano, Y. Kohmura, M. Yabashi, and K. Yamauchi

    7th International Conference on X-ray Optics and Applications 2022 (XOPT2022) 

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    Event date: 2022.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Pacifico Yokohama, Kanagawa   Country:Japan  

  76. Fabrication of XFEL sub-10 nm focusing optics based on advanced Kirkpatrick-Baez mirrors International conference

    J. Yamada, S. Matsuyama, T. Inoue, A. Ito, T. Osaka, I. Inoue, Y. Inubushi, H. Yumoto, T. Koyama, H. Ohashi, K. Yamauchi, and M. Yabashi

    7th International Workshop on Metrology for X-ray Optics, Mirror Design and Fabrication (IWXM2022) 

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    Event date: 2022.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Germany  

  77. XFEL sub-10nm focusing system using Wolter type III-based advanced KB mirrors International conference

    J. Yamada, S. Matsuyama, T. Inoue, N. Nakamura, Y. Tanaka, A. Ito, T. Osaka, I. Inoue, Y. Inubushi, H. Yumoto, T. Koyama, H. Ohashi, K. Yamauchi, and M. Yabashi

    14th International Conference on Synchrotron Radiation Instrumentation (SRI2021) 

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    Event date: 2022.3 - 2022.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Germany  

  78. Development of hard X-ray sub-5-nm focusing system with an adaptive multilayer focusing mirror International conference

    T. Inoue, S. Matsuyama, Y. Tanaka, Y. Ichii, J. Yamada, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi

    14th International Conference on Synchrotron Radiation Instrumentation (SRI2021) 

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    Event date: 2022.3 - 2022.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Germany  

  79. Development of image-based wavefront measurement for adaptive full-field X-ray microscopy International conference

    Y. Tanaka, S. Matsuyama, T. Inoue, N. Nakamura, J. Yamada, Y. Kohmura, M. Yabashi, K. Omote, T. Ishikawa, and K. Yamauchi

    14th International Conference on Synchrotron Radiation Instrumentation (SRI2021) 

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    Event date: 2022.3 - 2022.4

    Language:English   Presentation type:Poster presentation  

    Venue:Online   Country:Germany  

  80. 単結晶圧電素子を用いた形状可変ミラーの開発

    上松航太、中林荘太、井上陽登、松山智至

    2022精密工学会春季大会学術講演会  2022.3.15  精密工学会

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  81. 単結晶圧電素子を用いたX線用形状可変ミラーの開発

    中林荘太,上松航太,松山智至

    2022精密工学会春季大会学術講演会  2022.3.15  精密工学会

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  82. 機械学習を用いたX線顕微鏡像からの波面推定

    青戸仁志,田中優人,松山智至

    2022精密工学会春季大会学術講演会  2022.3.15  精密工学会

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  83. 機械学習を用いたX線顕微鏡像からの波面推定

    青戸仁志,田中優人,松山智至

    第35回日本放射光学会年会・放射光科学合同シンポジウム  2022.1.8  日本放射光学会

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    Event date: 2022.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:Online   Country:Japan  

  84. 単結晶圧電素子を用いた形状可変ミラーの開発

    上松航太、中林荘太、松山智至

    第35回日本放射光学会年会・放射光科学合同シンポジウム  2022.1.8  日本放射光学会

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    Event date: 2022.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:Online   Country:Japan  

  85. ミラーベースのX線結像光学システム Invited

    松山智至

    日本光学会年次学術講演会 Optics and Photonics Japan 2021  2021.10.28 

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    Event date: 2021.10

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:Online  

  86. 結像型 X 線顕微鏡を用いた位相イメージング手法の開発

    田中優人,松山智至,井上陽登,山田純平,木村隆志,志村まり,香村芳樹,矢橋牧名,石川哲也,山内和人

    日本光学会年次学術講演会 Optics and Photonics Japan 2021  2021.10.26 

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    Event date: 2021.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online  

  87. Optimization of mirror deformation strategy using mechanical and piezoelectric bending system International coauthorship International conference

    T. Inoue, Y. Nishioka, S. Matsuyama, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, L. Assoufid, K. Yamauchi

    SPIE Optics+Photonics2021  2021.8.1 

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    Event date: 2021.8

    Language:English   Presentation type:Oral presentation (general)  

    Venue:online  

  88. Image-based wavefront measurement for full-field X-ray microscopy International conference

    Y. Tanaka, S. Matsuyama, T. Inoue, N. Nakamura, J. Yamada, Y. Kohmura, M. Yabashi, K. Omote, T. Ishikawa, K. Yamauchi

    SPIE Optics+Photonics2021  2021.8.1 

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    Event date: 2021.8

    Language:English   Presentation type:Oral presentation (general)  

    Venue:online  

  89. ミラーベースのX線結像光学システム Invited

    松山智至

    SAGA-LSセミナー  2021.7.19  SAGA-LS

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    Event date: 2021.7

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:Online   Country:Japan  

  90. 結像型 X 線顕微鏡におけるマルチハイト位相回復法の開発

    田中優人,松山智至,井上陽登,山田純平,香村芳樹,矢橋牧名,石川哲也,山内和人

    2021年度関西地方定期学術講演会  2021.6.30 

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    Event date: 2021.6

    Language:Japanese   Presentation type:Poster presentation  

  91. 形状可変ミラーと多層膜の高次光反射を利用したX 線sub-5 nm集光光学系の開発

    二村浩平,井上陽登,松山智至,田中優人,一井愛雄,山田純平,佐野泰久,香村芳樹,矢橋牧名,石川哲也,山内和人

    2021年度関西地方定期学術講演会  2021.6.30 

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    Event date: 2021.6

    Language:Japanese   Presentation type:Poster presentation  

  92. Single-grating interferometer for hard X-ray sub-10 nm focusing mirror system International conference

    J. Yamada, S. Matsuyama, N. Nakamura, T. Inoue, T. Osaka, I. Inoue, H. Yumoto, T. Koyama, H. Ohashi, K. Yamauchi, and M. Yabashi

    6th International Conference on X-ray Optics and Applications 2021 (XOPT2021)   2021.4.19 

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    Event date: 2021.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:online  

  93. Development of wavefront sensing in full-field X-ray microscopy International conference

    Y. Tanaka, S. Matsuyama, T. Inoue, N. Nakamura, J. Yamada, Y. Kohmura, M. Yabashi, K. Omote, T. Ishikawa, and K. Yamauchi

    6th International Conference on X-ray Optics and Applications 2021 (XOPT2021)   2021.4.19 

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    Event date: 2021.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:online  

  94. Optimization of mirror deformation method for hybrid bender combining mechanical and piezoelectric bending International conference

    Y. Nishioka, T. Inoue, S. Matsuyama, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

    6th International Conference on X-ray Optics and Applications 2021 (XOPT2021)   2021.4.19 

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    Event date: 2021.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:online  

  95. Development of sub-5 nm focusing system based on precise deformable mirrors International conference

    T. Inoue, S. Matsuyama, Y. Tanaka, K. Futamura, Y. Ichii, J. Yamada, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi

    6th International Conference on X-ray Optics and Applications 2021 (XOPT2021)   2021.4.19 

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    Event date: 2021.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:online  

  96. 複数の凸⾯鏡を持つ⾼度な硬 X 線結像光学系の開発(第⼀報)

    松⼭智⾄,波多健太郎,⼭内和⼈

    2021年度精密工学会春季大会学術講演会  2021.3.16  精密工学会

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  97. 結像型 X 線顕微鏡における波⾯計測⼿法の開発

    ⽥中優⼈,松⼭智⾄,井上陽登,中村南美,⼭⽥純平, ⾹村芳樹,⽮橋牧名,表和彦,⽯川哲也,⼭内和⼈

    2021年度精密工学会春季大会学術講演会  2021.3.16  精密工学会

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  98. 圧電素⼦駆動型形状可変ミラーを⽤いた X 線 sub-5 nm 集光システムの開発

    井上陽登,松⼭智⾄,⽥中優⼈,⼆村浩平,⼀井愛雄,⼭⽥純平,佐野泰久,⾹村芳樹,⽮橋牧名(,⽯川哲也,⼭内和 ⼈

    2021年度精密工学会春季大会学術講演会  2021.3.16  精密工学会

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  99. X 線結像ミラーベースの高分解能 X 線顕微鏡 Invited

    松山智至

    ISSPワークショッフ゜「先端軟X線科学への基幹技術」  2021.3.4  東京大学物性研究所

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:Online   Country:Japan  

  100. 結像型 X 線顕微鏡における in-situ 波面計測手法の開発

    田中優人,松山智至,井上陽登,中村南美,山田純平,香村芳樹,矢橋牧名,表和彦,石川哲也,山内和人

    第34回日本放射光学会年会・放射光科学合同シンポジウム  2021.1.8  日本放射光学会

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    Event date: 2021.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  101. コヒーレントX線散乱を用いたXFELナノビーム強度プロファイルの再構成

    中村南美,松山智至,山田純平,井上陽登,井上伊知郎,矢橋牧名,石川哲也,山内和人

    第34回日本放射光学会年会・放射光科学合同シンポジウム  2021.1.8  日本放射光学会

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    Event date: 2021.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  102. X線ミラーを用いたsub-5nm集光システムの開発

    井上陽登,松山智至,一井愛雄,山田純平,佐野泰久,山内和人

    第34回日本放射光学会年会・放射光科学合同シンポジウム  2021.1.8  日本放射光学会

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    Event date: 2021.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  103. XFELの反射型セルフシード用マイクロチャネルカット結晶の大気圧プラズマによる内壁無歪み化 -ワイヤ電極を用いた高能率エッチング条件の検討-

    松村正太郎, 中野勝太, 佐野泰久, 大坂泰斗, 井上伊知郎,松山智至,山内和人, 矢橋牧名

    第34回日本放射光学会年会・放射光科学合同シンポジウム  2021.1.8  日本放射光学会

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    Event date: 2021.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

  104. Wolter III 型 advanced KBミラーによる XFEL sub-10 nm 集光光学系の開発

    山田純平,松山智至,井上陽登,中村南美,田中優人,大坂泰斗,井上伊知郎,犬伏雄一,湯本博勝,小山貴久,大橋治彦,山内和人,矢橋牧名

    第34回日本放射光学会年会・放射光科学合同シンポジウム  2021.1.8  日本放射光学会

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    Event date: 2021.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Online   Country:Japan  

▼display all

KAKENHI (Grants-in-Aid for Scientific Research) 36

  1. X線結像ミラーを用いた次世代X線結像顕微鏡の開発

    2017

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    Grant type:Collaborative (industry/university)

  2. 高精度反射結像レンズを用いたnmスケール分解能X線顕微鏡の開発

    2017

    科学技術振興機構 

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    Grant type:Other

  3. 色収差のない結像型X線顕微鏡の開発と顕微分光への応用

    2015

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    Grant type:Collaborative (industry/university)

  4. 新規構造を持つ高精度形状可変鏡の開発

    Grant number:22K18752  2022.6 - 2024.3

    科学研究費助成事業  挑戦的研究(萌芽)

    松山 智至

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    Authorship:Principal investigator 

    Grant amount:\6370000 ( Direct Cost: \4900000 、 Indirect Cost:\1470000 )

    X線光学では,波長が1nm~1ÅのX線を扱うため,理想的な実験をしようとすると,非常に高い形状精度を持つ鏡が必要である.しかし,現在の最先端技術をもってしても鏡の作製には2nm前後の誤差が生じてしまう.このような鏡の形状誤差は,X線の波面を歪めるため,集光や結像などの高度な実験を困難にする.本研究では自由かつ高精度に変形できる鏡(形状可変鏡)を実現し,その形状をX線照射下でその場調整することでこの課題を克服する.高い完成度でX線領域の補償光学を実現すべく,全く新しい構造を持つ形状可変鏡を提案し,Åオーダーの精度と安定性の達成に挑む.

  5. 新規結像ミラー光学系を用いた大視野X線顕微鏡の開発

    Grant number:22H03866  2022.4 - 2025.3

    科学研究費助成事業  基盤研究(B)

    松山 智至

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    Authorship:Principal investigator 

    Grant amount:\17420000 ( Direct Cost: \13400000 、 Indirect Cost:\4020000 )

    実用的なX線顕微分光を実施するために,大視野,高空間分解能,高効率,色収差なしを実現できる新しいX線顕微鏡を開発する.これまで像面湾曲収差によって大視野化が難しかったX線結像ミラー光学系において,像面湾曲収差をキャンセルさせることができる新規結像光学系を実現する.本顕微鏡を大型放射光施設にインストールし,実用的なXAFS顕微鏡のデモンストレーション実験を実施する.

  6. Development of X-ray nanobeam optics by precision wavefront control

    Grant number:21H05004  2021.7 - 2025.3

    Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (S)

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    Authorship:Coinvestigator(s) 

  7. Development of adaptive reflective lenses for X-ray microscope

    Grant number:20K21146  2020.7 - 2022.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Challenging Research (Exploratory)

    Matsuyama Satoshi

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    Authorship:Principal investigator 

    Grant amount:\6370000 ( Direct Cost: \4900000 、 Indirect Cost:\1470000 )

    High-performance X-ray microscopes are capable of providing breakthroughs in scientific fields such as materials science and biology because of the high penetrating power and short wavelength. However, there is still much room for development of X-ray lenses, which determine the performance of such microscopes, and research and development is being conducted in many countries around the world. In this study, we focused on reflective X-ray lenses to improve its microscope performance. We designed, simulated and fabricated deformable mirrors, and evaluated the performance. The developed deformable mirror was able to deform its shape with an accuracy of less than 1 nm, which was evaluated with an optical interferometer. The performance of the mirror was also evaluated by incorporating it into an X-ray focusing optical system, and it succeeded in correcting the wavefront aberration with an accuracy of λ/4.

  8. Development of zoom condenser system for X-ray free electron laser by high precision deformable reflective optics

    Grant number:16H06358  2020

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    Grant type:Collaborative (industry/university)

  9. Development of zoom condenser system for X-ray free electron laser by high precision deformable reflective optics

    Grant number:16H06358  2019

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    Grant type:Collaborative (industry/university)

  10. Development of next-generation full-field X-ray microscope based on X-ray mirrors

    Grant number:17H01073  2017.4 - 2022.3

    Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

    Matsuyama Satoshi

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    Authorship:Principal investigator 

    Grant amount:\41860000 ( Direct Cost: \32200000 、 Indirect Cost:\9660000 )

    In this study, we aimed to realize a high-performance full-field X-ray microscope by developing the world's first reflective X-ray lens (Advanced Kirkpatrick-Baez imaging mirror), which is a key device to improve efficiency and spatial resolution.
    The reflective lens was designed and simulated from various perspectives, and an optimized prototype was fabricated. The reflective lens was developed by coating it with multilayer for 8 keV X-rays. Its performance was evaluated by constructing an X-ray microscope at SPring-8, and it could resolve a 20 nm structure. The world's smallest resolution was achieved in an X-ray microscope using a reflective lens.

  11. 高精度形状可変ミラー光学系の構築とX線自由電子レーザーのアダプティブ集光

    Grant number:16H06358  2016.5 - 2021.3

    山内 和人

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    Authorship:Coinvestigator(s) 

    本年度は,目的達成のための要素技術である以下の5つの項目を中心に実施した.
    ①XFEL照射に対応可能な大面積ナノ精度加工の高度化:昨年度に引き続き,大型ミラー対応可能な3次元形状計測機や干渉計を高性能化した.これと数値制御EEMや差分成膜法を高度に連携させることで,ミラー形状を1nmの精度で修正する技術を確立した.大型形状可変ミラーだけでなく大型集光ミラーを高い形状精度で作製することが可能となった.
    ②XFELに最適化された2段集光光学系の提案とデモ実験:既存のズームコンデンサーは2組のアダプティブKBミラーで構成されていたが,新たにコンパクトかつ制御性のよい新規ズームコンデンサーを提案した.本光学系では,形状可変ミラーを凸面鏡から凹面鏡やその逆に変形させることでアダプティブ集光を行う.シミュレーションの結果,期待されるビーム径可変集光を実現できることが分かった.SPring-8にてデモ実験を実施したところ,予想したビーム径変化を確認した.
    ③ピエゾ素子の変形ドリフトの抑制法の高度化:形状可変ミラーに搭載しているピエゾ素子の変形ドリフトを抑制するために,特別な電圧パターンを印加する方法を研究した.また,単結晶圧電素子を用いた形状可変ミラーを試作しその動作を調べた.これらは変形ドリフトの抑制効果が見られ,形状可変ミラーのさらなる安定性向上が可能となった.
    ④波面計測法・集光ビーム径評価法の高度化:X線集光ミラーの形状誤差を高精度に決定するために必要となるX線波面計測法をテストした.ペンシルビーム法,グレーチング干渉計,タイコグラフィ法の精度を検証した.また,XFELにおける集光ビームの評価法として,スペックル計測法や蛍光X線の強度干渉計測などを試み,それぞれの精度について研究した.
    大型形状可変ミラーやそれに関わる要素技術の開発が順調に進んでいる.また,新型のズームコンデンサー光学系を提案し,そのデモ実験に成功した.これによって,本研究の応用範囲が広がった.
    今後の予定として,①新型形状可変ミラーを使ったアダプティブ集光のテスト,②新型形状可変ミラーの機械式ベント部分の高性能化,③波面計測法や集光ビーム径評価法の高度化 を中心に進める予定である.完成度の高い集光システムの完成を目指し,高精度かつユニークな要素技術の開発を進めていく.

  12. Development of zoom condenser system for X-ray free electron laser by high precision deformable reflective optics

    Grant number:16H06358  2016

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    Grant type:Collaborative (industry/university)

  13. コヒーレントX線による走査透過X線顕微鏡システムの構築と分析科学への応用

    2015

    JST 

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    Grant type:Other

  14. コヒーレントX線による走査透過X線顕微鏡システムの構築と分析科学への応用

    2014

    JST 

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    Grant type:Other

  15. 色収差のない結像型X線顕微鏡の開発と顕微分光への応用

    2014

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    Grant type:Collaborative (industry/university)

  16. XFELとパワーレーザーによる新極限物質材料の探索

    2014

    文部科学省, 科学技術振興機構 

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    Grant type:Other

  17. 高精度X線ミラー作製のための新規形状創生プロセスの開発

    2014

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    Grant type:Collaborative (industry/university)

  18. 新規2段非球面ミラーを用いた色収差のない結像型硬X線顕微鏡の開発

    2013

    コニカミノルタ科学技術振興財団 

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    Grant type:Collaborative (industry/university)

  19. コヒーレントX線による走査透過X線顕微鏡システムの構築と分析科学への応用

    2013

    JST 

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    Grant type:Other

  20. XFELとパワーレーザーによる新極限物質材料の探索

    2013

    文部科学省, 科学技術振興機構 

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    Grant type:Other

  21. 高精度X線ミラー作製のための新規形状創生プロセスの開発

    2013

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    Grant type:Collaborative (industry/university)

  22. コヒーレントX線による走査透過X線顕微鏡システムの構築と分析科学への応用

    2012

    JST 

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    Grant type:Other

  23. XFELとパワーレーザーによる新極限物質材料の探索

    2012

    文部科学省, 科学技術振興機構 

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    Grant type:Other

  24. コヒーレントX線による走査透過X線顕微鏡システムの構築と分析科学への応用

    2011

    JST 

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    Grant type:Other

  25. 新規2段非球面ミラーを用いた高分解能X線結像光学系の開発

    2011

    大阪大学大学院工学研究科若手教員専門力アッププロジェクト 

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    Grant type:Other

  26. 補償光学系を駆使した多段光学系によるX線自由電子レーザーのナノメートル集光

    2011

    日本学術振興会 

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    Grant type:Collaborative (industry/university)

  27. 高密度X線ナノビーム形成と走査型蛍光X線顕微鏡への応用

    2011

    日本学術振興会 

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    Grant type:Collaborative (industry/university)

  28. コヒーレントX線による走査透過X線顕微鏡システムの構築と分析科学への応用

    2010

    JST 

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    Grant type:Other

  29. 新規X線集光光学系による細胞内元素分布の高速・高感度イメージング

    2010

    日本学術振興会 

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    Grant type:Collaborative (industry/university)

  30. Development of achromatic X-ray imaging system for X-ray microscopy with a sub-50 nm resolution

    2010

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    Grant type:Other

  31. 空間分解能30nmを持つアクロマティック硬X線顕微鏡の開発

    2010

    大阪大学,“飛翔30”若手プログラム 

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    Grant type:Collaborative (industry/university)

  32. 4枚の非球面ミラーを用いた結像型硬X線顕微鏡の開発

    2010

    科学技術振興機構,産学イノベーション加速事業【先端計測分析技術・機器開発】要素技術プログラム 

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    Grant type:Other

  33. 新規X線集光光学系による細胞内元素分布の高速・高感度イメージング

    2009

    日本学術振興会 

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    Grant type:Collaborative (industry/university)

  34. 細胞イメージングのための30nmの分解能を持つ硬X線照射型可視共焦点顕微鏡の開発

    2008

    文部科学省 

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    Grant type:Collaborative (industry/university)

  35. 細胞内元素アレイ解析の臨床応用に向けた基盤研究

    2008

    厚生労働省 

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    Grant type:Other

  36. 細胞イメージングのための30nmの分解能を持つ硬X線照射型可視共焦点顕微鏡の開発

    2007

    文部科学省 

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    Grant type:Collaborative (industry/university)

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Teaching Experience (Off-campus) 9

  1. Seminar in Precision Science and Technology II

    2020

  2. Seminar in Precision Science and Technology I

    2020

  3. Seminar in Precision Science and Technology IV

    2020

  4. Seminar in Precision Science and Technology III

    2020

  5. Physics Experiments

    2017

  6. Scope of Precision Science and Technology I

    2015

  7. Scope of Precision Science and Technology I

    2014

  8. Information Literacy A

    2013

  9. Information Literacy A

    2012

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