記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：APPLIED PHYSICS EXPRESS  

DOI： 10.35848/1882-0786/ac2a03

Web of Science

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：Applied Physics Express  

The ratio of the photoionization cross sections (σo/n σ o/p) of carbon substituting at the nitrogen site [CN (0/-)] in n-type GaN, which is detected as a hole trap H1 (EV + 0.85 eV) under sub-bandgap-light irradiation (390 nm), is determined with isothermal capacitance transient spectroscopy (ICTS). The current-injection ICTS and the sub-bandgap-light-excited ICTS were compared for the same p+-n junction diode, whereby the hole occupancy ratio (fT) was obtained. Analysis of the dependence of fT on the temperature gave σo/n σ o/p of 3.0 was then used to estimate the charge state of CN (0/-) under sub-bandgap-light irradiation.

DOI： 10.35848/1882-0786/ac16ba

Web of Science

Scopus

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：Applied Physics Letters  

Reliability tests involving the application of high electrical stresses were employed to assess GaN-based vertical p-n junctions fabricated on freestanding GaN substrates with threading dislocation densities less than 104 cm−2. Electric field crowding at the device edges was eliminated by employing a shallow bevel mesa structure, thus allowing an evaluation of the reliability of the internal p-n junctions. The p-n diodes exhibited reproducible avalanche breakdown characteristics over the temperature range of 25-175 °C. No degradation was observed even during tests in which the devices were held under a reverse bias near the breakdown voltage. Despite this high degree of reliability in response to reverse bias stress, a small number of diodes were degraded during continuous forward current tests, although the majority of diodes remained unchanged. The reverse leakage current exhibited by degraded diodes was increased with an increase in the forward current density within the range of 50-500 A/cm2, while the breakdown voltages were unchanged in response to current stress. The leakage level increased exponentially with an increase in the total amount of injected carriers but eventually plateaued. In the degraded p-n diode, a luminous point in an emission microscope corresponded to one of the threading dislocations observed in the synchrotron x-ray topography, indicating that a specific dislocation played as a leakage path after injecting carriers.

DOI： 10.1063/5.0053139

Web of Science

Scopus

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：Journal of Applied Physics  

N-type GaN epitaxial layers grown via metal organic vapor-phase epitaxy typically exhibit a yellow luminescence (YL) band owing to carbon-related deep levels in the photoluminescence spectra. The decay of YL after pulse excitation involves a long time constant (∼0.2 ms at room temperature), whereas microwave photoconductivity decay (μ-PCD) curves show the corresponding component of the time constant. To clarify the origin of the long decay time, the temperature-dependent time constants of YL decay and μ-PCD curves are analyzed using a numerical model based on rate equations for trapping and emission through a deep level. The characteristics of the decays are well reproduced by a recombination model using a hole trap H1 at an energy of EV + 0.88 eV because of the acceptor-like state of carbon on a nitrogen site (CN) whose electron capture cross section (σn) is estimated to be 3 × 10-21 cm2. The slow decay in μ-PCD signals indicates that the electrons before being captured to H1 traps are free electrons in the conduction band. These findings indicate that the slow recombination process through CN results in tail currents in the turn-off switching periods of devices.

DOI： 10.1063/5.0041287

Web of Science

Scopus

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：Journal of Applied Physics  

The factors limiting channel mobility in AlSiO/p-type GaN-based metal-oxide-semiconductor field-effect transistors (MOSFETs) were systematically investigated. MOSFETs with various thin interfacial layers (ILs) between Al0.78Si0.22Oy films and Mg-doped GaN layers were prepared and found to exhibit different channel mobilities. The maximum effective mobility showed a significant correlation with the threshold voltage (Vt) and the hysteresis (ΔVt) in the transfer characteristics of these devices, such that the mobility decreased with increasing Vt and ΔVt. This effect can be explained by electron capture in and emission from border traps situated near the conduction band minimum for GaN. The insertion of a 3-nm-thick SiO2 IL drastically enhanced the effective mobility and simultaneously reduced the ΔVt value. Hall effect measurements with an applied gate voltage were used to determine the mobility of free electrons while excluding electrons captured in the border traps. The Hall effect mobility was much higher than the effective mobility, indicating that mobility was in fact reduced by the capture of electrons by the border traps. The ratio of electrons captured by border traps to the overall electrons induced by a gate bias was greatly lowered in a MOSFET incorporating a SiO2 IL. When a high vertical electric field of approximately 1 MV/cm was present in the device channel, the Hall effect mobility was slightly increased following the insertion of an IL. These results suggest that the IL reduced the interfacial roughness and/or affected the screening out of scattering due to potential fluctuations of the AlSiO.

DOI： 10.1063/5.0040700

Web of Science

Scopus

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2021.1.0_2427

CiNii Research

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2021.1.0_2428

CiNii Research

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：JAPANESE JOURNAL OF APPLIED PHYSICS  

Web of Science

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：Journal of Applied Physics  

The fabrication processes of p-type regions for vertical GaN power devices are investigated. A p-type body layer in a trench gate metal-oxide-semiconductor field-effect transistor requires precise control of the effective acceptor concentration, which is equal to the difference between the Mg acceptor concentration (Na) and the compensating donor concentration (Nd). The carbon atoms incorporated during growth via metalorganic vapor phase epitaxy substitute nitrogen sites (CN) and function as donor sources in a p-type GaN layer. Since interstitial H atoms (H i) also compensate holes, their removal from an Mg-doped layer is crucial. Extended anneals to release H atoms cause the formation of extra hole traps. The p+ capping layer allows effective and rapid removal of H atoms from a p-type body layer owing to the electric field across the p+/p- junction. On the other hand, selective area p-type doping via Mg ion implantation is needed to control the electrical field distribution at the device edge. Ultrahigh-pressure annealing (UHPA) under a nitrogen pressure of 1 GPa enables post-implantation annealing up to 1753 K without thermal decomposition. Cathodoluminescence spectra and Hall-effect measurements suggest that the acceptor activation ratio improves dramatically by annealing above 1673 K as compared to annealing at up to 1573 K. High-temperature UHPA also induces Mg atom diffusion. We demonstrate that vacancy diffusion and the introduction of H atoms from the UHPA ambient play a key role in the redistribution of Mg atoms.

DOI： 10.1063/5.0022198

Web of Science

Scopus

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2020.2.0_1911

CiNii Research

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2020.2.0_1908

CiNii Research

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：Japanese Journal of Applied Physics  

A quick method is proposed for measurement of the carbon-related hole trap (H1: +0.87 eV) density in an n-type GaN homoepitaxial layer using dual-color-sub-bandgap-light-excited isothermal capacitance transient spectroscopy. Shorter wavelength (390 nm) light irradiation is employed to cause the hole traps to be in the hole-occupied state. Longer wavelength (660 nm) light irradiation is then used to emit the hole from the trap to the valence band. The photoemission of holes is much quicker than the thermal emission, which reduces the measurement time. The trap density can be calculated from the capacitance transient.

DOI： 10.35848/1347-4065/ab6863

Web of Science

Scopus

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2020.1.0_2799

CiNii Research

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：Japanese Journal of Applied Physics  

Sources of carrier compensation in n-type and p-type GaN layers grown by metalorganic vapor phase epitaxy were quantitatively identified by a combination of Hall-effect analysis and deep level transient spectroscopy. For n-type GaN, we identified three electron compensation sources: Residual carbon atoms likely sitting on nitrogen sites (CN), an electron trap at the energy level of E C-0.6 eV (the E3 trap), and self-compensation appearing with increasing donor concentration. We showed that the CN also play a key role in hole compensation in p-type GaN by forming donor-like charged states. We also investigated the reduction of acceptor concentrations (N a) in highly Mg-doped GaN. Atomic-resolution scanning transmission electron microscopy revealed that electrically inactive Mg atoms of 3/2 atomic layers are segregated at the boundary of pyramidal inversion domains. The N a reduction can be explained by this Mg segregation.

DOI： 10.7567/1347-4065/ab4610

Web of Science

Scopus

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2019.2.0_3216

CiNii Research

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：Japanese Journal of Applied Physics  

Traps in MOVPE-grown Mg-doped GaN samples composed of p+/p-/n+ structures were investigated using low-frequency capacitance deep-level transient spectroscopy (DLTS). A drop-off in capacitance with decreasing temperature was observed. This is caused by the longer RC time constant of the diode with lower temperature, which is due to a decrease in the number of ionized Mg acceptors (which have a high ionization energy). This limits the use of lower temperatures in DLTS measurements. To extend DLTS to a lower temperature (105 K), DLTS using a capacitance measurement frequency of 1 kHz was applied. Thus, we can quantitatively discuss concentrations of traps with shallow energy levels. We obtained a nearly one-to-one relation between Ha (E V +0.29 eV) and Hd (E V +0.88 eV) in the p-type layer, which strongly supports the theoretical calculation that a carbon on a nitrogen site forms donor-like (Ha) and acceptor-like (Hd) states.

DOI： 10.7567/1347-4065/ab0408

Web of Science

Scopus

記述言語：英語   掲載種別：研究論文（学術雑誌）  

DOI： 10.7567/1882-0786/ab04f1

Web of Science

Scopus

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2019.1.0_2911

CiNii Research

記述言語：英語   掲載種別：研究論文（学術雑誌）  

DOI： 10.7567/1882-0786/aaf418

Web of Science

Scopus

記述言語：英語   掲載種別：研究論文（学術雑誌）  

DOI： 10.1063/1.5057373

Web of Science

Scopus

記述言語：英語   掲載種別：研究論文（学術雑誌）   出版者・発行元：JOURNAL OF APPLIED PHYSICS  

DOI： 10.1063/1.5045257

Web of Science

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2018.2.0_3036

CiNii Research

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2018.2.0_2994

CiNii Research

記述言語：英語   掲載種別：研究論文（学術雑誌）  

DOI： 10.1063/1.5010849

Web of Science

Scopus

記述言語：日本語   出版者・発行元：公益社団法人 応用物理学会  

DOI： 10.11470/jsapmeeting.2018.1.0_3320

CiNii Research