2024/12/11 更新

写真a

クツカケ ケンタロウ
沓掛 健太朗
KUTSUKAKE Kentaro
所属
未来材料・システム研究所 附属未来エレクトロニクス集積研究センター 未来デバイス部 准教授
大学院担当
大学院工学研究科
職名
准教授
連絡先
メールアドレス

学位 1

  1. 博士(理学) ( 2007年3月   東北大学 ) 

研究キーワード 5

  1. シリコン

  2. 太陽電池

  3. 機械学習

  4. 結晶成長

  5. 結晶欠陥

研究分野 6

  1. ナノテク・材料 / 結晶工学

  2. ナノテク・材料 / 結晶工学

  3. ナノテク・材料 / 応用物性

  4. ナノテク・材料 / 応用物理一般

  5. 情報通信 / 知能情報学

  6. ものづくり技術(機械・電気電子・化学工学) / 電気電子材料工学

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経歴 9

  1. 名古屋大学   未来材料・システム研究所   准教授

    2024年4月 - 現在

  2. 東北大学   客員教授

    2023年4月 - 現在

  3. 特定国立研究開発法人理化学研究所   革新知能統合研究センター データ駆動型生物医科学チーム   研究員

    2018年11月 - 2024年3月

  4. 名古屋大学   未来社会創造機構 コベルコ科研インフォアナリシス産学協同研究部門   特任講師

    2017年11月 - 現在

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    国名:日本国

  5. 東北大学   金属材料研究所 結晶欠陥物性学研究部門   助教授

    2010年10月 - 2017年10月

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    国名:日本国

  6. 京都大学   エネルギー科学研究科 太陽電池用シリコン結晶応用科学講座   助教授

    2010年4月 - 2010年9月

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    国名:日本国

  7. 東北大学   金属材料研究所 結晶成長物理学研究部門   助教授

    2007年8月 - 2010年3月

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    国名:日本国

  8. 東北大学   金属材料研究所 結晶成長物理学研究部門   日本学術振興会特別研究員(PD)

    2007年4月 - 2007年7月

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    国名:日本国

  9. 東北大学   金属材料研究所 結晶成長物理学研究部門   日本学術振興会特別研究員(DC2)

    2006年4月 - 2007年3月

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    国名:日本国

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学歴 3

  1. 東北大学   理学研究科   物理学専攻

    2004年4月 - 2007年3月

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    国名: 日本国

  2. 東北大学   理学研究科   物理学専攻

    2002年4月 - 2004年3月

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    国名: 日本国

  3. 東北大学   理学部   物理学科

    1998年4月 - 2002年3月

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    国名: 日本国

所属学協会 5

  1. 日本結晶成長学会

  2. 応用物理学会

  3. 応用物理学会 インフォマティクス応用研究会

  4. 応用物理学会 結晶工学分科会

  5. 日本太陽光発電学会

委員歴 9

  1. 応用物理学会 産学連携委員会「半導体の結晶成長と加工および評価に関する産学連携委員会」   幹事  

    2023年 - 現在   

  2. 日本結晶成長学会   機関紙編集委員  

    2022年 - 現在   

  3. 応用物理学会 インフォマティクス応用研究会   代表  

    2019年 - 現在   

  4. 日本学術振興会第145委員会   学界委員  

    2017年4月 - 現在   

  5. 日本学術振興会 第145委員会   学界委員  

    2017年 - 2023年   

  6. 応用物理学会   機関誌「応用物理」 外部記者  

    2016年 - 2017年   

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    団体区分:学協会

    応用物理学会

  7. 応用物理学会   学術講演会プログラム編集委員  

    2013年8月 - 2018年3月   

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    団体区分:その他

  8. 応用物理学会   機関誌「応用物理」 編集委員  

    2013年4月 - 2015年3月   

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    団体区分:その他

  9. 応用物理学会 結晶工学分科会   幹事  

    2012年 - 現在   

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    団体区分:学協会

    応用物理学会 結晶工学分科会

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受賞 1

  1. 最優秀ポスター賞

    2017年  

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    受賞国:日本国

 

論文 118

  1. Stress analysis and dislocation cluster generation in silicon crystal with artificial grain boundaries

    Tajika, H; Kutsukake, K; Usami, N

    JOURNAL OF CRYSTAL GROWTH   649 巻   2025年1月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Journal of Crystal Growth  

    We conducted a dislocation and stress analysis on various grain boundaries (GBs) using silicon ingots that contained artificial GBs to permit systematic comparison of experimental and analytical results. Through photoluminescence imaging, we found that the number of dislocation clusters generated around the 〈1 1 0〉-oriented GBs was significantly higher than those around the 〈1 0 0〉-oriented GBs. The stress analysis revealed that this difference is linked to the maximum shear stress around the GB. However, there were some GBs where dislocation cluster generation was not observed despite the presence of high shear stress. For most of these GBs, the direction of the maximum shear stress in the 12 slip system of silicon crystal was found to be oblique downward to the growth direction, which appears to inhibit dislocation propagation.

    DOI: 10.1016/j.jcrysgro.2024.127922

    Web of Science

    Scopus

  2. Multicrystalline informatics: a methodology to advance materials science by unraveling complex phenomena

    Usami, N; Kutsukake, K; Kojima, T; Kudo, H; Yokoi, T; Ohno, Y

    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS   25 巻 ( 1 ) 頁: 2396272   2024年12月

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    記述言語:英語   出版者・発行元:Science and Technology of Advanced Materials  

    Multicrystalline materials play a crucial role in our society. However, their microstructure is complicated, and there is no universal approach to achieving high performance. Therefore, a methodology is necessary to answer the fundamental question of how we should design and create microstructures. ‘Multicrystalline informatics’ is an innovative approach that combines experimental, theoretical, computational, and data sciences. This approach helps us understand complex phenomena in multicrystalline materials and improve their performance. The paper covers various original research bases of multicrystalline informatics, such as the three-dimensional visualization of crystal defects in multicrystalline materials, the machine learning model for predicting crystal orientation distribution, network analysis of multicrystalline structures, computational methods using artificial neural network interatomic potentials, and so on. The integration of these research bases proves to be useful in understanding unexplained phenomena in complex multicrystalline materials. The paper also presents examples of efficient optimization of the growth process of high-quality materials with the aid of informatics, as well as prospects for extending the methodology to other materials.

    DOI: 10.1080/14686996.2024.2396272

    Web of Science

    Scopus

    PubMed

  3. Feature extraction and spatial imaging of synchrotron radiation X-ray diffraction patterns using unsupervised machine learning

    Kutsukake, K; Kamioka, T; Matsui, K; Takeuchi, I; Segi, T; Sasaki, T; Fujikawa, S; Takahasi, M

    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS-METHODS   4 巻 ( 1 )   2024年12月

  4. Thermal boundary conductance of artificially and systematically designed grain boundaries of Silicon measured by laser heterodyne photothermal displacement method

    Harada, T; Kutsukake, K; Usami, N; Ikari, T; Fukuyama, A

    JOURNAL OF APPLIED PHYSICS   136 巻 ( 20 )   2024年11月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Journal of Applied Physics  

    The overall physical properties of polycrystalline materials vary depending on the microscopic individual grain boundary (GB) properties and their structures. Unlike previous studies that only examined the structure and properties of a specific GB, this study focuses on understanding the thermal boundary conductance (TBC) through artificial and systematic changes in the GB structures. This is achieved by combining an advanced technique to map local thermal expansion displacement using the laser heterodyne photothermal displacement method and a unique crystal growth method that induces spontaneous changes in the GB structures. As a result, we could quantify the TBC of the GB in silicon, considering the changes in three structural parameters of GB: azimuthal misorientation (α), asymmetry angle (β), and deviation angle (θ) from the growth direction. Our findings reveal that the TBC increases with increasing θ, whereas parameters α and β have negligible effects. The underlying physics of this relationship is discussed in terms of local carrier concentration and impurity segregation. These results demonstrate the crucial role of the GB structures in influencing the local TBC, shedding light on potential avenues for enhancing the macroscopic properties of polycrystalline materials by engineering GBs.

    DOI: 10.1063/5.0237047

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    Scopus

  5. Analysis of Macrostep Interaction via Carbon Diffusion Field in SiC Solution Growth

    Nakanishi, Y; Kutsukake, K; Dang, YF; Harada, S; Tagawa, M; Ujihara, T

    JOURNAL OF CRYSTAL GROWTH   631 巻   頁: 127609 - 127609   2024年4月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Journal of Crystal Growth  

    In the top-seeded solution growth (TSSG) method for SiC, control of macrostep development is crucial for improving the crystal quality. Dislocation conversion phenomena caused by macrosteps with a certain height on the crystal surface can reduce the dislocation density, while over-developed macrosteps bring macroscopic defects such as solvent inclusions. It is experimentally reported that solution flow direction to the step movement has a substantial impact on the macrostep development: parallel solution flow promotes and anti-parallel solution flow suppresses the increase of macrostep height. Our hypothesis is that this macrostep development is governed by the interaction between the macrosteps not by the instability of the density of the atomical steps. In this study, we constructed a computational fluid dynamic model of the boundary layer around macrosteps on the crystal surface, incorporating the solution flow on the boundary layer and consumption of the carbon solute by the macrostep movement quantitatively. The computational simulation reveals that the macrostep with position shift from the center of the adjacent macrosteps moves to the direction of the nearer macrostep under the parallel flow and moves to the farther macrostep under the antiparallel flow. These macrostep movements result in the bunching and debunching of the macrosteps. The mechanisms of macrostep movements demonstrated in this study will be useful for the precise control of macrostep height aiming to the reduction of the dislocation density during SiC solution growth.

    DOI: 10.1016/j.jcrysgro.2024.127609

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  6. Exploring mc-Silicon Wafers: Utilizing Machine Learning to Enhance Wafer Quality Through Etching Studies

    Raji, M; Suseela, SB; Manikkam, S; Anbazhagan, G; Kutsukake, K; Thamotharan, K; Rajavel, R; Usami, N; Perumalsamy, R

    CRYSTAL RESEARCH AND TECHNOLOGY   59 巻 ( 4 )   2024年4月

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    出版者・発行元:Crystal Research and Technology  

    This paper provides a method for improving the photovoltaic conversion efficiency and optical attributes of silicon solar cells manufactured from as-cut boron doped p-type multi-crystalline silicon wafers using acid-based chemical texturization via machine learning. A decreased reflectance, which can be attained by the right chemical etching conditions, is one of the key elements for raising solar cell efficiency. In this work, the mc-Silicon wafer surface reflectance is obtained under (<2%) after optimization of wet chemical etching. The HF + HNO3 + CH3COOH chemical etchant is used in the ratio 1:3:2 at different conditions of the etching duration of 1 min, 2 min, 3 min, and 4 min, respectively. The as-cut boron doped p-type mc-silicon wafers are analysed with ultraviolet–visible spectroscopy, optical microscopy, Fourier transforms infrared spectroscopy, thickness profilometer, and scanning electron microscopy before and after etching. The chemical etching solution produces good results in 3 min etched wafer, with a reflectivity value of <2%.The reflectivity and optical images are inputs to the convolutional neural network model and the linear regression model to obtain the etching rate for better reflectivity. The classification model provides 99.6% accuracy and the regression model results in the minimum mean squared error (MSE) of 0.062.

    DOI: 10.1002/crat.202300279

    Web of Science

    Scopus

  7. Review of machine learning applications for crystal growth research

    Kutsukake, K

    JOURNAL OF CRYSTAL GROWTH   630 巻   2024年3月

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    出版者・発行元:Journal of Crystal Growth  

    The application of information science and technology has led to a paradigm shift in scientific and technological research and crystal growth is no exception. Various types of application research have been conducted, and research methods that combine real experiments and simulations with information techniques are becoming increasingly complex. In this paper, I focus on the application of information science and technology to the field of crystal growth. In the first half, I discuss the characteristics of process informatics, including applications to crystal growth, from the perspective of how it differs from materials informatics. In the second half, by reviewing various application studies to crystal growth, I aim to highlight the characteristics and discuss future issues.

    DOI: 10.1016/j.jcrysgro.2024.127598

    Web of Science

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  8. High Passivation Performance of Cat-CVD i-a-Si:H Derived from Bayesian Optimization with Practical Constraints

    Ryota Ohashi, Kentaro Kutsukake, Huynh Thi Cam Tu, Koichi Higashimine, Keisuke Ohdaira

    ACS Applied Materials &amp; Interfaces   16 巻 ( 7 ) 頁: 9428 - 9435   2024年2月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:American Chemical Society (ACS)  

    DOI: 10.1021/acsami.3c16202

  9. Effect of Solution Components on Solvent Inclusion in SiC Solution Growth

    Zhou, HQ; Miura, H; Fukami, Y; Dang, YF; Kutsukake, K; Harada, S; Tagawa, M; Ujihara, T

    CRYSTAL GROWTH & DESIGN   24 巻 ( 4 ) 頁: 1806 - 1817   2024年2月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Crystal Growth and Design  

    In the solution growth method of silicon carbide, cellular structures and solvent inclusions are fatal defects. This study investigates the mechanism of how cosolvent chromium and additive aluminum influence the formation of cellular structures and inclusions via numerical simulations based on a phase field model. The simulation results indicate that introducing chromium into the solution increases the growth rate of the SiC crystals. The uneven distribution of chromium components near the macrostep edge is prone to trigger constitutional supersaturation, ultimately leading to cellular structures and inclusions. Constitutional supersaturation is more pronounced in solutions with a higher viscosity. Additionally, a small amount of additive aluminum increases the interfacial energy, enhancing the step stability by raising the potential barrier for curved steps and moderating step slopes. Experimental results demonstrate that a solution containing 40% chromium can increase the growth rate by three times compared to a pure Si solution. The Si0.59-Cr0.4-Al0.01 solution emerges as a promising candidate, maintaining a high growth rate while preserving step stability and effectively suppressing the development of cellular structures and inclusions.

    DOI: 10.1021/acs.cgd.3c01476

    Web of Science

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  10. Multicrystalline Informatics Applied to Multicrystalline Silicon for Unraveling the Microscopic Root Cause of Dislocation Generation

    Yamakoshi, K; Ohno, Y; Kutsukake, K; Kojima, T; Yokoi, T; Yoshida, H; Tanaka, H; Liu, X; Kudo, H; Usami, N

    ADVANCED MATERIALS   36 巻 ( 8 ) 頁: e2308599   2024年2月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)   出版者・発行元:Advanced Materials  

    A comprehensive analysis of optical and photoluminescence images obtained from practical multicrystalline silicon wafers is conducted, utilizing various machine learning models for dislocation cluster region extraction, grain segmentation, and crystal orientation prediction. As a result, a realistic 3D model that includes the generation point of dislocation clusters is built. Finite element stress analysis on the 3D model coupled with crystal growth simulation reveals inhomogeneous and complex stress distribution and that dislocation clusters are frequently formed along the slip plane with the highest shear stress among twelve equivalents, concentrated along bending grain boundaries (GBs). Multiscale analysis of the extracted GBs near the generation point of dislocation clusters combined with ab initio calculations has shown that the dislocation generation due to the concentration of shear stress is caused by the nanofacet formation associated with GB bending. This mechanism cannot be captured by the Haasen-Alexander-Sumino model. Thus, this research method reveals the existence of a dislocation generation mechanism unique to the multicrystalline structure. Multicrystalline informatics linking experimental, theoretical, computational, and data science on multicrystalline materials at multiple scales is expected to contribute to the advancement of materials science by unraveling complex phenomena in various multicrystalline materials.

    DOI: 10.1002/adma.202308599

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    Scopus

    PubMed

  11. レベルセット推定の停止基準

    石橋 英朗, 松井 孝太, 沓掛 健太朗, 日野 英逸

    人工知能学会全国大会論文集   JSAI2024 巻 ( 0 ) 頁: 2M5OS2401 - 2M5OS2401   2024年

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    記述言語:日本語   出版者・発行元:一般社団法人 人工知能学会  

    <p>レベルセット推定はこれまでに得られた測定結果から次の測定点を決める適応的実験計画の一種であり,可能な限り少数のデータを用いて望ましい水準を満たさない領域を推定する問題である.レベルセット推定ではそれぞれの測定点を入力とし対応する測定結果を出力とするブラックボックス関数を考え,これまでに得られたデータから推定したサロゲート関数を用いてまだ測定していない測定点が閾値を超えるかどうかを予測する.このとき,レベルセット推定の効率は(1)次の測定点を決定する獲得関数,(2)レベルセット推定を停止するタイミングの2つによって決まる.本研究の目的はサロゲート関数が閾値を超える確率に基づいたレベルセット推定の停止基準を提案することである.提案する停止基準は任意の獲得関数に対して,サロゲート関数が閾値を超える裾確率を保証することができる.本論文ではいくつかのテスト関数に対して提案する停止基準がレベルセット推定を効率的に停止できることを示す.</p>

    DOI: 10.11517/pjsai.jsai2024.0_2m5os2401

    CiNii Research

  12. 3D CNN and grad-CAM based visualization for predicting generation of dislocation clusters in multicrystalline silicon

    Kyoka Hara, Takuto Kojima, Kentaro Kutsukake, Hiroaki Kudo, Noritaka Usami

    APL machine learning     2023年9月

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    掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/5.0156044

  13. Machine Learning for Semiconductor Process Simulation Described by Coupled Partial Differential Equations

    Sato, R; Kutsukake, K; Harada, S; Tagawa, M; Ujihara, T

    ADVANCED THEORY AND SIMULATIONS   6 巻 ( 9 )   2023年9月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Advanced Theory and Simulations  

    Technology computer-aided design (TCAD) simulation is an important tool for the development of semiconductor devices. Based on coupled partial differential equations (PDEs) for behaviors, TCAD can calculate objects such as impurities, point defects, and electronic carriers in semiconductors. However, over recent years semiconductor devices have become increasingly miniaturized and complicated, resulting in much longer calculation times for TCAD. Machine learning is one technology that may be used to overcome this simulation cost problem. In this study, a neural network architecture is proposed that considers the structure of the coupled PDEs. Features representing each concentration distribution of the calculation objects are extracted by convolution operations and their reaction is modeled by channel attention. The performance of the proposed architecture and of conventional neural network models is evaluated using a simulation dataset generated by 1D coupled PDEs that models the diffusion and reaction of vacancies and interstitial atoms. In addition, the advantage of the method is discussed through the analyses of error correlations of the two predictions and attention coefficients. The machine learning method developed in this study will be applicable to other physics described by coupled PDEs and is expected to speed up the computation of simulations in various fields.

    DOI: 10.1002/adts.202300218

    Web of Science

    Scopus

  14. AI・インフォマティクス応用について,今思うこと

    沓掛 健太朗

    応用物理   92 巻 ( 6 ) 頁: 369 - 372   2023年6月

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    記述言語:日本語   出版者・発行元:公益社団法人 応用物理学会  

    DOI: 10.11470/oubutsu.92.6_369

    CiNii Research

  15. A machine learning-based prediction of crystal orientations for multicrystalline materials

    Kyoka Hara, Takuto Kojima, Kentaro Kutsukake, Hiroaki Kudo, Noritaka Usami

    APL machine learning     2023年6月

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    掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/5.0138099

  16. Analysis of grain growth behavior of multicrystalline Mg<sub>2</sub>Si

    Deshimaru, T; Yamakoshi, K; Kutsukake, K; Kojima, T; Umehara, T; Udono, H; Usami, N

    JAPANESE JOURNAL OF APPLIED PHYSICS   62 巻 ( SD )   2023年5月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Japanese Journal of Applied Physics  

    Multicrystalline Mg2Si crystal with a diameter of 15 mm was grown via vertical Bridgman method. To clarify the growth mechanism of the multicrystalline structure, the grain growth behavior of the crystal was analyzed. This was carried out through segmenting grains by mean shift clustering using the light intensity profile obtained from multiple optical reflection images of the wafers and stacking the segmented images through the growth direction. Further crystal orientation measurement revealed that a grain with a higher surface energy competitively expanded to the lateral direction during crystal growth. We speculated that the growth behavior occurred because the supercooling was high enough to show difference in each grain’s growth rate. This idea was supported by crystal growth simulation to show a tendency for the crystallization rate to increase toward the latter half growth stage, which is consistent with the assumption for crystal growth with high supercooling.

    DOI: 10.35848/1347-4065/aca032

    Web of Science

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  17. Bayesian optimization of hydrogen plasma treatment in silicon quantum dot multilayer and application to solar cells

    Kumagai, F; Gotoh, K; Miyamoto, S; Kato, S; Kutsukake, K; Usami, N; Kurokawa, Y

    DISCOVER NANO   18 巻 ( 1 ) 頁: 43   2023年3月

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    記述言語:英語   出版者・発行元:Discover Nano  

    Silicon quantum dot multilayer (Si-QDML) is a promising material for a light absorber of all silicon tandem solar cells due to tunable bandgap energy in a wide range depending on the silicon quantum dot (Si-QD) size, which is possible to overcome the Shockley–Queisser limit. Since solar cell performance is degenerated by carrier recombination through dangling bonds (DBs) in Si-QDML, hydrogen termination of DBs is crucial. Hydrogen plasma treatment (HPT) is one of the methods to introduce hydrogen into Si-QDML. However, HPT has a large number of process parameters. In this study, we employed Bayesian optimization (BO) for the efficient survey of HPT process parameters. Photosensitivity (PS) was adopted as the indicator to be maximized in BO. PS (σp/σd) was calculated as the ratio of photoconductivity (σp) and dark conductivity (σd) of Si-QDML, which allowed the evaluation of important electrical characteristics in solar cells easily without fabricating process-intensive devices. 40-period layers for Si-QDML were prepared by plasma-enhanced chemical vapor deposition method and post-annealing onto quartz substrates. Ten samples were prepared by HPT under random conditions as initial data for BO. By repeating calculations and experiments, the PS was successfully improved from 22.7 to 347.2 with a small number of experiments. In addition, Si-QD solar cells were fabricated with optimized HPT process parameters; open-circuit voltage (VOC) and fill factor (FF) values of 689 mV and 0.67, respectively, were achieved. These values are the highest for this type of device, which were achieved through an unprecedented attempt to combine HPT and BO. These results prove that BO is effective in accelerating the optimization of practical process parameters in a multidimensional parameter space, even for novel indicators such as PS.

    DOI: 10.1186/s11671-023-03821-9

    Web of Science

    Scopus

    PubMed

  18. Modeling-Based Design of the Control Pattern for Uniform Macrostep Morphology in Solution Growth of SiC 査読有り

    Dang, YF; Liu, XB; Zhu, C; Fukami, Y; Ma, SY; Zhou, HQ; Liu, X; Kutsukake, K; Harada, S; Ujihara, T

    CRYSTAL GROWTH & DESIGN   23 巻 ( 2 ) 頁: 1023 - 1032   2023年1月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Crystal Growth and Design  

    In the solution growth of the SiC crystal, macrosteps with sufficient height on an off-axis substrate are required to reduce defects and achieve a high-quality grown layer. However, over-developed macrosteps can induce new defects and adversely affect the crystal quality. To better understand and control the behavior of macrosteps corresponding to the control parameters of the growth system, a simulation method that consists of a global two-dimensional computational fluid dynamic (CFD) model, a local three-dimensional CFD model near the growth front, and a kinetics model that describes the movement of macrosteps on the crystal surface is proposed. The simulation method is first applied to investigate the effect of the crystal rotation speed on macrostep morphology. Although the results indicate that a higher crystal rotation speed results in less step bunching, constantly rotating the crystal in one direction is demonstrated to be incapable of yielding a uniform macrostep distribution on the whole surface. Accordingly, a sophisticated control pattern is designed by periodically switching the flow direction underneath the crystal surface, where the proposed simulation method is critical to determine detailed control-parameter values. When the control pattern suggested by the simulation is used, a grown crystal with a uniform macrostep morphology and ideal step height on the whole surface is obtained in the practical experiment.

    DOI: 10.1021/acs.cgd.2c01194

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  19. Bayesian Optimization for Cascade-Type Multistage Processes

    Kusakawa, S; Takeno, S; Inatsu, Y; Kutsukake, K; Iwazaki, S; Nakano, T; Ujihara, T; Karasuyama, M; Takeuchi, I

    NEURAL COMPUTATION   34 巻 ( 12 ) 頁: 2408 - 2431   2022年11月

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    記述言語:英語   出版者・発行元:Neural Computation  

    Complex processes in science and engineering are often formulated as multistage decision-making problems. In this letter, we consider a cascade process, a type of multistage decision-making process. This is a mul-tistage process in which the output of one stage is used as an input for the subsequent stage. When the cost of each stage is expensive, it is dif-ficult to search for the optimal controllable parameters for each stage ex-haustively. To address this problem, we formulate the optimization of the cascade process as an extension of the Bayesian optimization framework and propose two types of acquisition functions based on credible inter-vals and expected improvement. We investigate the theoretical properties of the proposed acquisition functions and demonstrate their effectiveness through numerical experiments. In addition, we consider suspen-sion setting, an extension in which we are allowed to suspend the cascade process at the middle of the multistage decision-making process that often arises in practical problems. We apply the proposed method in a test problem involving a solar cell simulator, the motivation for this study.

    DOI: 10.1162/neco_a_01550

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    PubMed

  20. Estimation of Crystal Orientation of Grains on Polycrystalline Silicon Substrate by Recurrent Neural Network

    Kato, H; Kamibeppu, S; Kojima, T; Matsumoto, T; Kudo, H; Takeuchi, Y; Kutsukake, K; Usami, N

    IEEJ TRANSACTIONS ON ELECTRICAL AND ELECTRONIC ENGINEERING   17 巻 ( 11 ) 頁: 1685 - 1687   2022年11月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:IEEJ Transactions on Electrical and Electronic Engineering  

    To analyze crystal defects in polycrystalline silicon substrates, it is necessary to measure the crystal orientation at high speed. In this paper, we propose a method for simultaneous and fast estimation of the crystal orientation of an entire substrate by measuring the reflected light from a single rotation of a light source. The effectiveness of the proposed method is verified by the orientation estimation experiments. © 2022 Institute of Electrical Engineers of Japan. Published by Wiley Periodicals LLC.

    DOI: 10.1002/tee.23676

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    その他リンク: https://onlinelibrary.wiley.com/doi/full-xml/10.1002/tee.23676

  21. Optimization of Flow Distribution by Topological Description and Machine Learning in Solution Growth of SiC 査読有り

    Isono, M; Harada, S; Kutsukake, K; Yokoyama, T; Tagawa, M; Ujihara, T

    ADVANCED THEORY AND SIMULATIONS   5 巻 ( 9 ) 頁: 2200302   2022年9月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Advanced Theory and Simulations  

    The macroscopic distribution of fluid flows, which affect the quality of final products for various kinds of materials, is often difficult to describe in mathematical formulae and hinders the implementation of empirical knowledge in scaling up. In the present study, the characteristics of the flow distribution in silicon carbide (SiC) solution growth are described by using the position of the saddle point and the solution growth conditions are optimized by computational fluid dynamics simulation, machine learning, and a genetic algorithm. As a result, the candidates of the optimal condition for the solution growth of 6-in. SiC crystals are successfully obtained from the empirical knowledge gained from 3-in. crystal growth, by adding the topological description to the objective function. The present design of the objective function using the topological description can possibly be applied to other crystal growth or materials processing problems and to overcome scale-up difficulties, which can facilitate the rapid development of functional materials such as SiC wafers for power device applications.

    DOI: 10.1002/adts.202200302

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  22. A Transfer Learning-Based Method for Facilitating the Prediction of Unsteady Crystal Growth 査読有り

    Dang, YF; Kutsukake, K; Liu, X; Inoue, Y; Liu, XB; Seki, S; Zhu, C; Harada, S; Tagawa, M; Ujihara, T

    ADVANCED THEORY AND SIMULATIONS   5 巻 ( 9 ) 頁: 2200204   2022年9月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Advanced Theory and Simulations  

    Real-time prediction and dynamic control systems that can adapt to an unsteady environment are necessary for material fabrication processes, especially crystal growth. Recent studies have demonstrated the effectiveness of machine learning in predicting an unsteady crystal growth process, but its wider application is hindered by the large amount of training data required for sufficient accuracy. To address this problem, this study investigates the capability of transfer learning to predict geometric evolution in an unsteady silicon carbide (SiC) solution growth system based on a small amount of data. The performance of transferred models is discussed regarding the effect of the transfer learning method, training data amount, and time step length. The transfer learning strategy yields the same accuracy as that of training from scratch but requires only 20% of the training data. The accuracy is stably inherited through successive time steps, which demonstrates the effectiveness of transfer learning in reducing the required amount of training data for predicting evolution in an unsteady crystal growth process. Moreover, the transferred models trained with relatively more data (no more than 100%) further improve the accuracy inherited from the source model through multiple time steps, which broadens the application scope of transfer learning.

    DOI: 10.1002/adts.202200204

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  23. Study on electrical activity of grain boundaries in silicon through systematic control of structural parameters and characterization using a pretrained machine learning model

    Fukuda, Y; Kutsukake, K; Kojima, T; Ohno, Y; Usami, N

    JOURNAL OF APPLIED PHYSICS   132 巻 ( 2 ) 頁: 025102 - 025102   2022年7月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Journal of Applied Physics  

    We report on the effects of grain boundary (GB) structures on the carrier recombination velocity at GB (vGB) in multicrystalline Si (mc-Si). The fabricated artificial GBs and an originally developed machine learning model allowed an investigation of the effect of three macroscopic parameters, misorientation angle α for ς values, asymmetric angle β, and deviation angle θ from the ingot growth direction. Totally, 13 GBs were formed by directional solidification using multi-seeds with controlled crystal orientations. vGB was evaluated directly from photoluminescence intensity profiles across GBs using a pre-trained machine learning model, which allowed a quantitative and continuous evaluation along GBs. The evaluation results indicated that the impact of θ on vGB would be relatively large among the three macroscopic parameters. In addition, the results for the ς5 and ς13 GBs suggested that the minimum vGB would be related to the GB energy. These results were discussed in terms of the complexity of the local reconstruction of GB structures. The deviation would make a more complex reconstructed GB structure with local distortion, resulting in an increase in the electrical activity of GBs. The obtained knowledge will contribute to improving various polycrystalline materials through a comprehensive understanding of the relationship between GB structures and their properties.

    DOI: 10.1063/5.0086193

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  24. Virtual experiments of Czochralski growth of silicon using machine learning: Influence of processing parameters on interstitial oxygen concentration

    Kentaro Kutsukake, Yuta Nagai, Hironori Banba

    Journal of crystal growth   584 巻   頁: 126580 - 126580   2022年4月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Elsevier {BV}  

    DOI: 10.1016/j.jcrysgro.2022.126580

  25. Effects of grain boundary structure and shape of the solid-liquid interface on the growth direction of the grain boundaries in multicrystalline silicon

    Fukuda, Y; Kutsukake, K; Kojima, T; Usami, N

    CRYSTENGCOMM   24 巻 ( 10 ) 頁: 1948 - 1954   2022年3月

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    掲載種別:研究論文(学術雑誌)  

    DOI: 10.1039/d1ce01573g

    Web of Science

  26. Data-Driven Optimization and Experimental Validation for the Lab-Scale Mono-Like Silicon Ingot Growth by Directional Solidification

    Liu, X; Dang, YF; Tanaka, H; Fukuda, Y; Kutsukake, K; Kojima, T; Ujihara, T; Usami, N

    ACS OMEGA   7 巻 ( 8 ) 頁: 6665 - 6673   2022年3月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)   出版者・発行元:ACS Omega  

    The casting mono-like silicon (Si) grown by directional solidification (DS) is promising for high-efficiency solar cells. However, high dislocation clusters around the top region are still the practical drawbacks, which limit its competitiveness to the monocrystalline Si. To optimize the DS-Si process, we applied the framework, which integrates the growing experiments, transient global simulations, artificial neuron network (ANN) training, and genetic algorithms (GAs). First, we grew the Si ingot by the original recipe and reproduced it with transient global modeling. Second, predictions of the Si ingot domain from different recipes were used to train the ANN, which acts as the instant predictor of ingot properties from specific recipes. Finally, the GA equipped with the predictor searched for the optimal recipe according to multi-objective combination, such as the lowest residual stress and dislocation density. We also implemented the optimal recipe in our mono-like DS-Si process for verification and comparison. According to the optimal recipe, we could reduce the dislocation density and smooth the growth rate during the Si ingot growing process. Comparisons of the growth interface and grain boundary evolutions showed the decrease of the interface concavity and the multi-crystallization in the top part of the ingot. The well-trained ANN combined with the GA could derive the optimal growth parameter combinations instantly and quantitatively for the multi-objective processes.

    DOI: 10.1021/acsomega.1c06018

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    PubMed

  27. シミュレーションに基づく結晶成長プロセスインフォマティクス

    沓掛 健太朗, 角岡 洋介, 郁 万成, 黨 一帆, 原田 俊太, 宇治原 徹

    日本結晶成長学会誌   49 巻 ( 1 ) 頁: n/a   2022年

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    記述言語:日本語   出版者・発行元:日本結晶成長学会  

    DOI: 10.19009/jjacg.49-1-06

    CiNii Research

  28. 結晶方位情報を含む多次元光学イメージを用いた敵対的生成ネットワークによる蛍光イメージ生成

    工藤 博章, 小島 拓人, 松本 哲也, 沓掛 健太朗, 宇佐美 徳隆

    「次世代の太陽光発電システム」シンポジウム(日本太陽光発電学会学術講演会)予稿集   1 巻   頁: 50 - 50   2021年10月

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    記述言語:日本語   出版者・発行元:日本太陽光発電学会  

    DOI: 10.57295/jpvsproc.1.0_50

  29. 機械学習を用いた結晶方位推定とその応用可能性

    原 京花, 小島 拓人, 沓掛 健太朗, 工藤 博章, タモタラン ケルチバサン, マニッカム スリニバサン, ペルマルザミー ラマザミー, 宇佐美 徳隆

    「次世代の太陽光発電システム」シンポジウム(日本太陽光発電学会学術講演会)予稿集   1 巻   頁: 125 - 125   2021年10月

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    記述言語:日本語   出版者・発行元:日本太陽光発電学会  

    DOI: 10.57295/jpvsproc.1.0_125

  30. 多種データにより再現された結晶成長中の多結晶Si組織における応力解析

    山腰 健太, 沓掛 健太朗, 小島 拓人, 工藤 博章, 田中 博之, 大野 裕, 宇佐美 徳隆

    「次世代の太陽光発電システム」シンポジウム(日本太陽光発電学会学術講演会)予稿集   1 巻   頁: 52 - 52   2021年10月

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    記述言語:日本語   出版者・発行元:日本太陽光発電学会  

    DOI: 10.57295/jpvsproc.1.0_52

  31. Application of Bayesian optimization for high-performance TiOx/SiOy/c-Si passivating contact

    Miyagawa, S; Gotoh, K; Kutsukake, K; Kurokawa, Y; Usami, N

    SOLAR ENERGY MATERIALS AND SOLAR CELLS   230 巻   頁: 111251 - 111251   2021年9月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Solar Energy Materials and Solar Cells  

    We report on the application of Bayesian optimization (BO), which could accelerate the time-intensive process optimization of many parameters, to fabrication of the high-performance titanium oxide/silicon oxide/crystalline silicon passivating contact. The process contains pre-deposition treatment to form SiOy interlayer, atomic layer deposition (ALD) of TiOx, and hydrogen plasma treatment (HPT) as post-process. We attempted to optimize seven parameters for ALD and HPT by dealing with samples treated by three kinds of chemical solutions in the same batch. This permits to perform BO for each structure at the same time and determine the superior pre-deposition treatment. Consequently, carrier selectivity S10 estimated by independent measurements of the saturation current density and contact resistance was significantly improved by BO of only 12 cycles and 10 initial random experiments. These results certify that BO could efficiently provide experimental conditions in multidimensional parameter space although we need to consider the impact of the metallization process on the passivation performance.

    DOI: 10.1016/j.solmat.2021.111251

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  32. Direct prediction of electrical properties of grain boundaries from photoluminescence profiles using machine learning

    Kutsukake, K; Mitamura, K; Usami, N; Kojima, T

    APPLIED PHYSICS LETTERS   119 巻 ( 3 ) 頁: 032105 - 032105   2021年7月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Applied Physics Letters  

    We present a machine learning model to directly predict the carrier recombination velocity, vGB, at the grain boundary (GB) from the measured photoluminescence (PL) intensity profile by training it with numerical simulation results. As the training dataset, 1800 PL profiles were calculated with a combination of random values of four material properties—vGB, the GB inclination angle, and the carrier diffusion lengths in the grains on both sides of the GB. In addition, the measured noise was modeled artificially and applied to the simulated profiles. A neural network was constructed with the inputs of the PL profile and the outputs of the four properties. This served as the solver of the reverse problem of the computational simulation. The coefficient of determination and the root mean squared error of vlog, which is the common logarithm of vGB, for the test dataset were 0.97 and 0.245, respectively. This prediction error was sufficiently low for the practical estimation of vGB. Moreover, the calculation time was reduced by a factor of 198 000 compared to conventional numerical optimization of repeating the computational simulations. By utilizing this fast prediction method, continuous evaluation of vGB along a GB was demonstrated. The finding is expected to advance scientific investigation of the electrical properties of local defects.

    DOI: 10.1063/5.0049847

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  33. Occurrence Prediction of Dislocation Regions in Photoluminescence Image of Multicrystalline Silicon Wafers Using Transfer Learning of Convolutional Neural Network

    Kudo, H; Matsumoto, T; Kutsukake, K; Usami, N

    IEICE TRANSACTIONS ON FUNDAMENTALS OF ELECTRONICS COMMUNICATIONS AND COMPUTER SCIENCES   E104A 巻 ( 6 ) 頁: 857 - 865   2021年6月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)   出版者・発行元:IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences  

    In this paper, we evaluate a prediction method of regions including dislocation clusters which are crystallographic defects in a photoluminescence (PL) image of multicrystalline silicon wafers. We applied a method of a transfer learning of the convolutional neural network to solve this task. For an input of a sub-region image of a whole PL image, the network outputs the dislocation cluster regions are included in the upper wafer image or not. A network learned using image in lower wafers of the bottom of dislocation clusters as positive examples. We experimented under three conditions as negative examples; image of some depth wafer, randomly selected images, and both images. We examined performances of accuracies and Youden’s J statistics under 2 cases; predictions of occurrences of dislocation clusters at 10 upper wafer or 20 upper wafer. Results present that values of accuracies and values of Youden’s J are not so high, but they are higher results than ones of bag of features (visual words) method. For our purpose to find occurrences dislocation clusters in upper wafers from the input wafer, we obtained results that randomly select condition as negative examples is appropriate for 10 upper wafers prediction, since its results are better than other negative examples conditions, consistently.

    DOI: 10.1587/transfun.2020IMP0010

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    CiNii Research

  34. Geometrical design of a crystal growth system guided by a machine learning algorithm

    Yu, WC; Zhu, C; Tsunooka, Y; Huang, W; Dang, YF; Kutsukake, K; Harada, S; Tagawa, M; Ujihara, T

    CRYSTENGCOMM   23 巻 ( 14 ) 頁: 2695 - 2702   2021年4月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:CrystEngComm  

    In the design of a crystal growth system, the ability to efficiently regulate intertwined geometrical parameters is crucial for its successful development and commercialization. However, the traditional experimental and computational methods consume tremendous amounts of time and resources. To address this problem, a machine learning approach was developed in this study to accelerate the geometry optimization process. It was found that the combination of machine learning with a genetic algorithm could generate various possible solutions through a global search at a relatively high speed, which lie outside the solution range of the experimental optimization methods that are currently used. By applying this technique, an optimal geometrical design was obtained for a 150 mm top-seed solution growth system, indicating that the proposed method represents an innovative and attractive strategy for the development of crystal growth systems with superior characteristics.

    DOI: 10.1039/d1ce00106j

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  35. Adaptive process control for crystal growth using machine learning for high-speed prediction: application to SiC solution growth

    Dang, YF; Zhu, C; Ikumi, M; Takaishi, M; Yu, WC; Huang, W; Liu, XB; Kutsukake, K; Harada, S; Tagawa, M; Ujihara, T

    CRYSTENGCOMM   23 巻 ( 9 ) 頁: 1982 - 1990   2021年3月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:CrystEngComm  

    To design a time-dependent control recipe which can ensure consistently suitable growth conditions in an unsteady growth system with dynamic environmental changes, an adaptive control method based on high-speed machine learning prediction models was proposed and applied to the solution growth of SiC crystals. This approach comprised three parts, namely, a quasi-unsteady computational fluid dynamics (CFD) model for thermal and flow field simulation, machine learning models for approximating the simulation results and giving instant prediction, and an optimization algorithm for searching the optimal growth conditions. First, the evolution of the flow, temperature and carbon concentration fields over 50 h unsteady growth following an original recipe with fixed control parameters was analyzed by CFD simulation. Then, adaptive control was applied to design a time-dependent growth process with a 100-timestep sequence. The hybrid of machine learning models and CFD simulation accelerated the entire design and optimization process by 300 times, compared with CFD simulations alone. The adaptive control facilitated superior performance compared with the fixed recipe, where the single SiC crystal thickness increased by ∼30% and the growth interface was more uniform. Further, crucible dissolution and polycrystal precipitation were suppressed by ∼50%, enabling longer growth time and more stable growth. It is the first time that the importance of adaptive control during long-term SiC solution growth is discussed, and the method proposed in this study demonstrated the potential for real-time optimization in the future.

    DOI: 10.1039/d0ce01824d

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  36. 多結晶シリコンウェハの蛍光イメージ中の転位クラスター領域の画像変換による特定

    工藤 博章, 松本 哲也, 沓掛 健太朗, 宇佐美 徳隆

    応用物理学会学術講演会講演予稿集   2021.1 巻   頁: 3049 - 3049   2021年2月

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    記述言語:日本語   出版者・発行元:公益社団法人 応用物理学会  

    DOI: 10.11470/jsapmeeting.2021.1.0_3049

  37. 多結晶シリコンの光反射特性による結晶方位推定モデル

    小島 拓人, 原 京花, 沓掛 健太朗, 松本 哲也, 工藤 博章, 宇佐美 徳隆

    応用物理学会学術講演会講演予稿集   2021.1 巻   頁: 3048 - 3048   2021年2月

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    記述言語:日本語   出版者・発行元:公益社団法人 応用物理学会  

    DOI: 10.11470/jsapmeeting.2021.1.0_3048

  38. Application of Bayesian optimization for improved passivation performance in TiO<i><sub>x</sub></i>/SiO<i><sub>y</sub></i>/c-Si heterostructure by hydrogen plasma treatment

    Miyagawa, S; Gotoh, K; Kutsukake, K; Kurokawa, Y; Usami, N

    APPLIED PHYSICS EXPRESS   14 巻 ( 2 ) 頁: 025503 - 025503   2021年2月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Applied Physics Express  

    We applied hydrogen plasma treatment (HPT) on a titanium oxide/silicon oxide/crystalline silicon heterostructure to improve the passivation performance for high-efficiency silicon heterojunction solar cells. To accelerate the time-intensive process optimization of many parameters, we applied Bayesian optimization (BO). Consequently, the optimization of six process parameters of HPT was achieved by BO of only 15 cycles and 10 initial random experiments. Furthermore, the effective carrier lifetime after HPT on the optimized experimental conditions became three times higher compared with that before HPT, which certifies that BO is useful for accelerating optimization of the practical process conditions in multidimensional parameter space.

    DOI: 10.35848/1882-0786/abd869

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  39. Segregation mechanism of arsenic dopants at grain boundaries in silicon

    Ohno, Y; Yokoi, T; Shimizu, Y; Ren, J; Inoue, K; Nagai, Y; Kutsukake, K; Fujiwara, K; Nakamura, A; Matsunaga, K; Yoshida, H

    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS-METHODS   1 巻 ( 1 ) 頁: 169 - 180   2021年1月

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    掲載種別:研究論文(学術雑誌)  

    DOI: 10.1080/27660400.2021.1969701

    Web of Science

  40. Origin of recombination activity of non-coherent σ3{111} grain boundaries with a positive deviation in the tilt angle in cast-grown silicon ingots

    Ohno, Y; Tamaoka, T; Yoshida, H; Shimizu, Y; Kutsukake, K; Nagai, Y; Usami, N

    APPLIED PHYSICS EXPRESS   14 巻 ( 1 )   2021年1月

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  41. Origin of recombination activity of non-coherent Σ3{111} grain boundaries with a positive deviation in the tilt angle in cast-grown silicon ingots

    Ohno Y., Tamaoka T., Yoshida H., Shimizu Y., Kutsukake K., Nagai Y., Usami N.

    Applied Physics Express   14 巻 ( 1 ) 頁: 011002 - 011002   2021年1月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Applied Physics Express  

    Non-coherent Σ3{111} grain boundaries (GBs) with a positive deviation in the tilt angle (θ 110 > 70.5°) exhibit a high recombination activity in high-performance multicrystalline silicon ingots. Most of the GB segments are composed of edge-type dislocations with the Burgers vector b of a/3111, unlike Lomer dislocations with b = a/2110 observed for negative deviations, arranged on coherent Σ3{111} GB segments. Stretched 110 reconstructed bonds along the tilt axis are introduced so as not to form dangling bonds, and large strains are generated around the dislocation cores. Oxygen and carbon atoms segregating due to the strains would induce the recombination activity.

    DOI: 10.35848/1882-0786/abd0a0

    Scopus

    その他リンク: https://iopscience.iop.org/article/10.35848/1882-0786/abd0a0/pdf

  42. 大口径SiCバルク結晶成長における主要技術とプロセス・インフォマティクスの活用

    宇治原 徹, 朱 燦, 角岡 洋介, 古庄 智明, 鈴木 皓己, 沓掛 健太朗, 高石 将輝, 郁 万成, 黨 一帆, 磯野 優, 竹内 一郎, 田川 美穂, 原田 俊太

    日本結晶成長学会誌   48 巻 ( 3 ) 頁: n/a   2021年

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    記述言語:日本語   出版者・発行元:日本結晶成長学会  

    DOI: 10.19009/jjacg.48-3-04

    CiNii Research

  43. Application of machine learning for high-performance multicrystalline materials

    Usami N., Kutsukake K., Kojima T., Kudo H., Matsumoto T., Yokoi T., Shimizu Y., Ohno Y.

    ECS Transactions   102 巻 ( 4 ) 頁: 11 - 16   2021年

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    掲載種別:研究論文(国際会議プロシーディングス)   出版者・発行元:ECS Transactions  

    We report on our recent attempt to pioneer “multicrystalline informatics” through collaboration of experiments, theory, computation, and machine learning to establish universal guidelines how we can obtain high-performance multicrystalline materials. We employ silicon as a model material, and develop various useful machine learning models. One example is a neural network to predict distribution of crystal orientations in a large-area sample from multiple optical images. Transfer learning of pre-trained image classifier could predict spatial distribution of probability of dislocations generation from photoluminescence images. Extracted regions with high probability of dislocations generation could be characterized by multiscale experiments as well as computation using artificial-neural-network interatomic potential to disclose the physics behind. The obtained knowledge could be useful for process development of high-performance multicrystalline materials.

    DOI: 10.1149/10204.0011ecst

    Scopus

  44. エンジニアの知識と機械学習の融合

    沓掛 健太朗, 長田 圭一, 松井 孝太, 山本 純

    応用物理   89 巻 ( 12 ) 頁: 711 - 714   2020年12月

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    記述言語:日本語   出版者・発行元:公益社団法人 応用物理学会  

    <p>逐次最適化のための機械学習法であるベイズ最適化は,探索と活用をバランスよく行う最適化手法として,広く応用されている.本稿では,はじめにベイズ最適化の概要を解説したあと,実際の実験へのベイズ最適化の応用として,シリコンエピタキシャル膜の成長条件の最適化への適用を紹介する.特に,エンジニアがもつ専門知識や経験の活用を中心に説明する.</p>

    DOI: 10.11470/oubutsu.89.12_711

    CiNii Research

  45. Adaptive Bayesian optimization for epitaxial growth of Si thin films under various constraints

    Osada, K; Kutsukake, K; Yamamoto, J; Yamashita, S; Kodera, T; Nagai, Y; Horikawa, T; Matsui, K; Takeuchi, I; Ujihara, T

    MATERIALS TODAY COMMUNICATIONS   25 巻   2020年12月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Materials Today Communications  

    We applied a Bayesian optimization (BO) to optimize the epitaxial growth process of Si thin films. The BO enables us to effectively explore the optimal film growth conditions considering several experimental parameters and their interactions. In this way we reduced the total number of experiments required in the optimization. The epitaxial growth rate was maximized while five quality parameters were maintained within an acceptable range. Additionally, we considered two practical issues: eliminating equipment errors and the time cost of the quality parameter evaluation. To overcome these issues, we adaptively conducted BO with different constraints for different situations. As a result of these optimizations, the crystal growth rate was increased to be approximately twice as high as that under standard conditions, while satisfying the five quality parameter conditions.

    DOI: 10.1016/j.mtcomm.2020.101538

    Web of Science

    Scopus

  46. Generation of dislocation clusters at triple junctions of random angle grain boundaries during cast growth of silicon ingots

    Ohno, Y; Tajima, K; Kutsukake, K; Usami, N

    APPLIED PHYSICS EXPRESS   13 巻 ( 10 ) 頁: 105505 - 105505   2020年10月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Applied Physics Express  

    Three-dimensional distribution of grain boundaries (GBs) and generation sources of dislocation clusters is examined in a cast-grown high-performance multicrystalline silicon ingot for commercial solar cells. A significant number of dislocations are generated nearby some triple junctions of random angle GBs, although it is believed that such non-coherent GBs would not induce large strain during the cast growth. This explosive generation of dislocations would take place when the triple junctions are interacted with multiple Σ3{111} GBs. A segment of the random angle GB connected with a pair of Σ3{111} GBs nearby the triple junction would act as a dislocation source.

    DOI: 10.35848/1882-0786/abbb1c

    Web of Science

    Scopus

    その他リンク: https://iopscience.iop.org/article/10.35848/1882-0786/abbb1c/pdf

  47. Determination of carrier recombination velocity at inclined grain boundaries in multicrystalline silicon through photoluminescence imaging and carrier simulation

    Mitamura, K; Kutsukake, K; Kojima, T; Usami, N

    JOURNAL OF APPLIED PHYSICS   128 巻 ( 12 ) 頁: 125103 - 125103   2020年9月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Journal of Applied Physics  

    We present a quantification method of carrier recombination velocity of a general grain boundary (GB) by combining steady state photoluminescence (PL) imaging and carrier simulation under uniform illumination. To improve the accuracy and versatility, inclination angles of GBs, which can be obtained from front and rear optical images, were included in the carrier simulation model. As a consequence, simulated PL profiles successfully reproduced the tendency of experiments to exhibit shift of the minimal position from the GB on the front surface to the direction of inclination. Furthermore, by fitting simulated PL profiles with experiments, the carrier recombination velocity was evaluated for various GBs based on the improved model to consider the inclination angle.

    DOI: 10.1063/5.0017823

    Web of Science

    Scopus

  48. 多結晶材料情報学による粒界構造の解明と制御に向けて

    宇佐美 徳隆, 沓掛 健太朗, 小島 拓人, 工藤 博章, 横井 達矢, 大野 裕

    応用物理学会学術講演会講演予稿集   2020.2 巻   頁: 157 - 157   2020年8月

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    記述言語:日本語   出版者・発行元:公益社団法人 応用物理学会  

    DOI: 10.11470/jsapmeeting.2020.2.0_157

  49. 畳み込みニューラルネットワークの転移学習に基づいた多結晶シリコンインゴット中の転位クラスター発生点の特徴

    工藤 博章, 松本 哲也, 沓掛 健太朗, 宇佐美 徳隆

    応用物理学会学術講演会講演予稿集   2020.1 巻   頁: 3607 - 3607   2020年2月

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    記述言語:日本語   出版者・発行元:公益社団法人 応用物理学会  

    DOI: 10.11470/jsapmeeting.2020.1.0_3607

  50. Transmission behavior of dislocations against Σ3 twin boundaries in Si

    Ichiro Yonenaga, Kentaro Kutsukake

    Journal of applied physics   127 巻 ( 7 )   2020年2月

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    掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.5139972

    Scopus

  51. 構造出力の逆問題のためのベイズ的能動学習

    松井 孝太, 草川 隼也, 安藤 圭理, 沓掛 健太郎, 宇治原 徹, 竹内 一郎

    人工知能学会全国大会論文集   JSAI2020 巻 ( 0 ) 頁: 2J1GS201 - 2J1GS201   2020年

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    記述言語:日本語   出版者・発行元:一般社団法人 人工知能学会  

    <p>所望の構造出力(ここでは各要素が相関を持つ多次元ベクトルを指す)を達成する入力パラメータを見つける逆問題のための能動学習法を提案する. 理論的な貢献として,ブラックボックスなベクトル値の目的関数に対して出力の要素間の相関を明示的にガウス過程モデルに取り込むことにより,少ない観測点数で所望の構造出力とモデルによる予測との間の誤差を最小化するための新たな獲得関数を提案した.また,提案法を人工の形状探索問題,多出力のベンチマーク問題および炭化ケイ素結晶成長モデリングの実データを用いた成長速度分布の探索問題に適用し有効性を検証した.数値実験の結果,提案法は相関を考慮しないモデリングに比べて高速に所望の出力を発見できることを確認した.</p>

    DOI: 10.11517/pjsai.jsai2020.0_2j1gs201

    CiNii Research

  52. Real-time prediction of interstitial oxygen concentration in Czochralski silicon using machine learning

    Kutsukake, K., Nagai, Y., Horikawa, T., Banba, H.

    Applied physics express   13 巻 ( 12 )   2020年

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    掲載種別:研究論文(学術雑誌)  

    DOI: 10.35848/1882-0786/abc6ec

    Scopus

  53. Structural properties of triple junctions acting as dislocation sources in high-performance Si ingots

    Ohno, Y; Tajima, K; Kutsukake, K; Usami, N

    2020 47TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)   2020- 巻   頁: 2340 - 2340   2020年

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    記述言語:英語   掲載種別:研究論文(国際会議プロシーディングス)  

    DOI: 10.1109/pvsc45281.2020.9300738

    Web of Science

    Scopus

  54. Application of artificial neural network to optimize sensor positions for accurate monitoring: an example with thermocouples in a crystal growth furnace

    Boucetta, A; Kutsukake, K; Kojima, T; Kudo, H; Matsumoto, T; Usami, N

    APPLIED PHYSICS EXPRESS   12 巻 ( 12 ) 頁: 125503 - 125503   2019年12月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Applied Physics Express  

    We propose to utilize artificial neural network (ANN) to optimize positions of a limited number of sensors for accurate monitoring, and demonstrate its effectiveness by a case study of four thermocouples in a directional solidification furnace. Our concept consists of choosing the positions with ANN that has the lowest loss from a multiplicity of ANNs, which were trained by the simulated temperature distributions along the outer crucible wall. Interestingly, the top ten ranks of accurate predictions contain positions around the crucible's bottom to suggest the importance of measuring temperatures carefully around higherature gradients that is the boundary between different materials.

    DOI: 10.7567/1882-0786/ab52a9

    Web of Science

    Scopus

    その他リンク: http://iopscience.iop.org/article/10.7567/1882-0786/ab52a9/pdf

  55. Study of local structure at crystalline rubrene grain boundaries via scanning transmission X-ray microscopy

    Foggiatto, AL; Takeichi, Y; Ono, K; Suga, H; Takahashi, Y; Fusella, MA; Dull, JT; Rand, BP; Kutsukake, K; Sakurai, T

    ORGANIC ELECTRONICS   74 巻   頁: 315 - 320   2019年11月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Organic Electronics  

    Rubrene is a promising and archetypal organic semiconductor owing to its high reported hole mobility. However, this high mobility only exists in its crystalline state, with orders of magnitude reduction in disordered films. Thus, as it pertains to thin film polycrystalline rubrene, it is important to understand structure and the presence of disordered regions at grain boundaries. Here, we use scanning transmission X-ray microscopy (STXM) to investigate polycrystalline rubrene thin films with either platelet or spherulite morphology. The STXM images allow us to distinguish and quantify the arrangement of the local structure in the crystal. The analysis suggests that the platelet film has more oriented molecules in the crystal than in the spherulite phase. Also, at spherulite grain boundaries, we reveal a high number of misaligned molecules compared to the smooth boundary in the platelet case, with grain boundary sinuosity of 0.045 ± 0.002 and 0.139 ± 0.002 μm for the platelet and spherulite cases, respectively, which help to explain the higher mobility in the former case.

    DOI: 10.1016/j.orgel.2019.07.021

    Web of Science

    Scopus

  56. Dependence of substrate work function on the energy-level alignment at organic-organic heterojunction interface

    Foggiatto, AL; Suga, H; Takeichi, Y; Ono, K; Takahashi, Y; Kutsukake, K; Ueba, T; Kera, S; Sakurai, T

    JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( SB )   2019年4月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Japanese Journal of Applied Physics  

    The dependence of substrate work function (WF) on organic-organic heterojunction (OOH) interface was investigated using ultraviolet and X-ray photoelectron spectroscopy. We studied the interface of boron subphthalocyanine chloride (SubPc)/α-sexithiophene (6T) deposited on MoO3, SiO2, Cs2CO3. We observed that MoO3 and Cs2CO3 induce a p-doping and n-doping, respectively, due to the WF position, that can generate charge transfer at the OOH interface. However, the same effect was not observed after annealing the organic layers. Using scanning transmission X-ray microscope combining with near-edge X-ray absorption fine structure, we could observe that SubPc film became well-ordered after annealing the thin film. Thus, we suggested that the control of charge transfer arises from the reduction of the molecules misorientation on the film that induces a reduction in the density of gap states.

    DOI: 10.7567/1347-4065/aaffbf

    Web of Science

    Scopus

  57. 3D visualization and analysis of dislocation clusters in multicrystalline silicon ingot by approach of data science 査読有り

    Hayama, Y; Matsumoto, T; Muramatsu, T; Kutsukake, K; Kudo, H; Usami, N

    SOLAR ENERGY MATERIALS AND SOLAR CELLS   189 巻   頁: 239 - 244   2019年1月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)   出版者・発行元:Solar Energy Materials and Solar Cells  

    We report on our attempt to perform the three-dimensional (3D) visualization of dislocation clusters in multicrystalline silicon (mc-Si) ingot by processing photoluminescence (PL) images and analysis of dislocation clusters in mc-Si. As-sliced wafers prepared using a high-performance (HP) mc-Si ingot were sequentially measured by PL imaging with intentional superposition of reflection. Then, various image processing techniques were applied to all the PL images to extract dark regions, which most likely correspond to dislocation clusters, as well as microstructures. By 3D reconstruction using a large quantity of 2D images, we could successfully visualize the generation, propagation and annihilation of dislocation clusters in HP mc-Si ingot. In addition, relationship between source region of dislocation clusters and crystal orientation were investigated by combining data scientific and experimental approaches. As a result, it was suggested that small angle grain boundaries with angular deviation of less than 10 degrees cause the generation of dislocation clusters.

    DOI: 10.1016/j.solmat.2018.06.008

    Web of Science

    Scopus

  58. 機械学習を用いた結晶成長予測モデルの構築とその応用

    宇治原 徹, 角岡 洋介, 畑佐 豪記, 沓掛 健太朗, 石黒 祥生, 村山 健太, 鳴海 大翔, 原田 俊太, 田川 美穂

    表面と真空   62 巻 ( 3 ) 頁: 136 - 140   2019年

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    記述言語:日本語   掲載種別:研究論文(学術雑誌)   出版者・発行元:公益社団法人 日本表面真空学会  

    <p>The prediction model of the result of computed fluid dynamics simulation in SiC solution growth was constructed on neural network using machine learning. Utilizing the prediction model, we can optimize quickly crystal growth conditions. In addition, the real-time visualization system was also made using the prediction model.</p>

    DOI: 10.1380/vss.62.136

    CiNii Books

    CiNii Research

  59. Machine learning for SiC top-seeded solution growth - Prediction, optimization and visualization 査読有り

    Ujihara T., Tsunooka Y., Hatasa G., Zhu C., Kutsukake K., Narumi T., Harada S., Tagawa M.

    CS MANTECH 2019 - 2019 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers     2019年

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    掲載種別:研究論文(国際会議プロシーディングス)   出版者・発行元:CS MANTECH 2019 - 2019 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers  

    We are developing solution growth technique for high-quality SiC bulk crystal. In actual, we have achieved high-quality crystal with very-low-density of threading dislocations grown by controlling the surface morphology. In order to apply this technique to large-scale crystal growth, it is necessary to control supersaturation at growth surface, flow rate and flow direction of solvent in detail. However, there are many growth parameters which should be optimized. Simulation technique based on computational fluid dynamics (CFD) is often used. However, it is still difficult to optimize growth condition by utilizing simulation technique since the calculation speed of CFD simulation is not enough to optimize the growth conditions, exhaustively. In recent, informatics including machine learning is applied to various fields including materials science. In this study, we tried to apply machine learning to the analysis of the results of CFD. We could make the model to optimize the crystal growth parameters based on a neural network model. Using the model, the optimization time became 10000 times faster. This is just a trial of “Process Informatics”.

    Scopus

  60. Growth of crystalline silicon for solar cells: Mono-like method

    Kutsukake, K.

    Handbook of photovoltaic silicon     2019年

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Handbook of photovoltaic silicon  

    DOI: 10.1007/978-3-662-56472-1_35

    Scopus

  61. Level Set Estimationを用いた太陽電池用シリコンのレッドゾーンの効率的推定

    穂積 祥太, 松井 孝太, 沓掛 健太朗, 宇治原 徹, 竹内 一郎

    人工知能学会全国大会論文集   JSAI2019 巻 ( 0 ) 頁: 2P4J201 - 2P4J201   2019年

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    記述言語:日本語   出版者・発行元:一般社団法人 人工知能学会  

    <p>試料表面の測定位置を変えて物理量の空間分布を求めるマッピング測定は、材料評価の基本的な方法である。通常、マッピングは等間隔な座標に沿って実行される。しかしながら、その場合、測定の目的に対して非効率的な測定点も含まれる。そこで、より少ない計測点からより確からしい物理量分布を得ることを目指した。本研究では、太陽電池用シリコンのキャリアライフタイムマッピングに境界位置を効率的に推定する手法であるLSEを適用し、低品質領域の推定を行った。</p>

    DOI: 10.11517/pjsai.jsai2019.0_2p4j201

    CiNii Research

  62. Application of weighted Voronoi diagrams to analyze nucleation sites of multicrystalline silicon ingots 査読有り

    Muramatsu, T; Hayama, Y; Kutsukake, K; Maeda, K; Matsumoto, T; Kudo, H; Fujiwara, K; Usami, N

    JOURNAL OF CRYSTAL GROWTH   499 巻   頁: 62 - 66   2018年10月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Journal of Crystal Growth  

    Analysis of nucleation sites in multicrystalline silicon (mc-Si) grown by directional solidification is required for further grain refinement to reduce dislocation density. In this study, Voronoi diagrams were utilized to analyze nucleation sites of mc-Si grown by single-layer Si beads (SLSB)-seeding method. The grain distribution at the bottom of the ingot was almost reproduced by the weighted Voronoi diagram with a relaxation method to optimize the positions of generating points of the diagram, which correspond to the nucleation sites, and the difference of nucleation timing of each crystal grain. Comparison of the generating points with the optical image indicated that the nucleation started at the remarkably deep portions of the nucleation layer. Further grain refinement by SLSB-seeding method could be achieved by suppressing the formation of the remarkably deep portions of the nucleation layer.

    DOI: 10.1016/j.jcrysgro.2018.07.028

    Web of Science

    Scopus

  63. Insight into physical processes controlling the mechanical properties of the wurtzite group-III nitride family 査読有り

    Yonenaga, I., Deura, M., Tokumoto, Y., Kutsukake, K., Ohno, Y.

    Journal of crystal growth   500 巻   頁: 23 - 28   2018年8月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2018.08.001

    Scopus

  64. Distribution of light-element impurities in Si crystals grown by seed-casting method 査読有り

    Nakayama, R; Kojima, T; Ogura, A; Kutsukake, K

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 8 )   2018年8月

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    掲載種別:研究論文(学術雑誌)   出版者・発行元:Japanese Journal of Applied Physics  

    We investigated the distributions of interstitial oxygen (Oi) and substitutional carbon (Cs) in high-performance (HP) multicrystalline Si (mc-Si) and monocrystalline-like Si (mono-like Si) and compared them with those in conventional mc-Si, grown using the same furnace. The Oi concentration in mono-like Si grown using a Czochralski (Cz) silicon seed was the highest among the three crystals. On the other hand, the Oi and Cs concentrations in HP mc-Si grown using Siemens Si incubation seeds were the same as those in conventional mc-Si. Therefore, it is considered that Oi incorporated into the growing Si crystal originates not only from the quartz crucible wall but also from the seed. Additionally, Oi and Cs in HP mc-Si grown on the incubation seeds with adequately low Oi and Cs concentrations are distributed similarly to those in conventional mc-Si grown under the same conditions. We believe that it is important to consider the Oi and Cs concentrations in the feed stock materials both for the seed and whole ingots in the seed-casting method.

    DOI: 10.7567/JJAP.57.08RB19

    Web of Science

    Scopus

  65. 画像処理によるフォトルミネッセンス画像における転位クラスターの検出とその最適化

    田島 和哉, 羽山 優介, 村松 哲郎, 沓掛 健太朗, 松本 哲也, 工藤 博章, 宇佐美 徳隆

    応用物理学会学術講演会講演予稿集   2018.1 巻 ( 0 ) 頁: 3821 - 3821   2018年3月

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    記述言語:日本語   出版者・発行元:公益社団法人 応用物理学会  

    DOI: 10.11470/jsapmeeting.2018.1.0_3821

    CiNii Research

  66. Mechanical properties of Cubic-BN(111) bulk single crystal evaluated by nanoindentation 査読有り

    Deura, M., Kutsukake, K., Ohno, Y., Yonenaga, I., Taniguchi, T.

    Physica status solidi (B) basic research   255 巻 ( 5 ) 頁: 1700473/1 - 1700473/4   2018年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1002/pssb.201700473

    Scopus

  67. Nanoscopic analysis of oxygen segregation at tilt boundaries in silicon ingots using atom probe tomography combined with TEM and ab initio calculations 査読有り

    Ohno, Y., Inoue, K., Fujiwara, K., Kutsukake, K., Deura, M., Yonenaga, I., Ebisawa, N., Shimizu, Y., Inoue, K., Nagai, Y., Yoshida, H., Takeda, S., Tanaka, S., Kohyama, M.

    Journal of microscopy   268 巻 ( 3 ) 頁: 230 - 238   2017年12月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1111/jmi.12602

    Scopus

  68. Impact of local atomic stress on oxygen segregation at tilt boundaries in silicon 査読有り

    Ohno Yutaka, Inoue Kaihei, Fujiwara Kozo, Kutsukake Kentaro, Deura Momoko, Yonenaga Ichiro, Ebisawa Naoki, Shimizu Yasuo, Inoue Koji, Nagai Yasuyoshi, Yoshida Hideto, Takeda Seiji, Tanaka Shingo, Kohyama Masanori

    APPLIED PHYSICS LETTERS   110 巻 ( 6 )   2017年2月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.4975814

    Web of Science

  69. Synthesis of highly-oriented wurtzite-type BN crystal and evaluation of its mechanical properties using nanoindentation 査読有り

    M. Deura, K. Kutsukake, Y. Ohno, I. Yonenaga, T. Taniguchi

    Japanese Journal of Applied Physics Rapid Communications   56 巻 ( 3 ) 頁: 030301/1 - 030301/4   2017年1月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.7567/JJAP.56.030301

  70. Effect of grain boundary character of multicrystalline Si on external and internal (phosphorus) gettering of impurities 査読有り

    Joonwichien Supawan, Takahashi Isao, Kutsukake Kentaro, Usami Noritaka

    PROGRESS IN PHOTOVOLTAICS   24 巻 ( 12 ) 頁: 1615-1625   2016年12月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1002/pip.2795

    Web of Science

  71. Recombination activity of nickel, copper, and oxygen atoms segregating at grain boundaries in mono-like silicon crystals 査読有り

    Ohno Yutaka, Kutsukake Kentaro, Deura Momoko, Yonenaga Ichiro, Shimizu Yasuo, Ebisawa Naoki, Inoue Koji, Nagai Yasuyoshi, Yoshida Hideto, Takeda Seiji

    APPLIED PHYSICS LETTERS   109 巻 ( 14 )   2016年10月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.4964440

    Web of Science

  72. Characterization of silicon ingots: Mono-like versus high-performance multicrystalline 査読有り

    Kutsukake Kentaro, Deura Momoko, Ohno Yutaka, Yonenaga Ichiro

    JAPANESE JOURNAL OF APPLIED PHYSICS   54 巻 ( 8 )   2015年8月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.7567/JJAP.54.08KD10

    Web of Science

  73. Elastic properties of indium nitrides grown on sapphire substrates determined by nano-indentation: In comparison with other nitrides 査読有り

    Yonenaga Ichiro, Ohkubo Yasushi, Deura Momoko, Kutsukake Kentaro, Tokumoto Yuki, Ohno Yutaka, Yoshikawa Akihiko, Wang Xin Qiang

    AIP ADVANCES   5 巻 ( 7 )   2015年7月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.4926966

    Web of Science

  74. Three-dimensional evaluation of gettering ability for oxygen atoms at small-angle tilt boundaries in Czochralski-grown silicon crystals 査読有り

    Ohno Yutaka, Inoue Kaihei, Fujiwara Kozo, Deura Momoko, Kutsukake Kentaro, Yonenaga Ichiro, Shimizu Yasuo, Inoue Koji, Ebisawa Naoki, Nagai Yasuyoshi

    APPLIED PHYSICS LETTERS   106 巻 ( 25 )   2015年6月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.4921742

    Web of Science

  75. Nanoscopic mechanism of Cu precipitation at small-angle tilt boundaries in Si 査読有り

    Ohno Yutaka, Inoue Kaihei, Kutsukake Kentaro, Deura Momoko, Ohsawa Takayuki, Yonenaga Ichiro, Yoshida Hideto, Takeda Seiji, Taniguchi Ryo, Otubo Hideki, Nishitani Sigeto R., Ebisawa Naoki, Shimizu Yasuo, Takamizawa Hisashi, Inoue Koji, Nagai Yasuyoshi

    PHYSICAL REVIEW B   91 巻 ( 23 )   2015年6月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1103/PhysRevB.91.235315

    Web of Science

  76. Czochralski growth of heavily tin-doped Si crystals 査読有り

    Yonenaga I., Taishi T., Inoue K., Gotoh R., Kutsukake K., Tokumoto Y., Ohno Y.

    JOURNAL OF CRYSTAL GROWTH   395 巻   頁: 94-97   2014年6月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2014.02.052

    Web of Science

  77. Slip systems in wurtzite ZnO activated by Vickers indentation on {2(1)over-bar (1)over-bar0} and {10(1)over-bar0} surfaces at elevated temperatures 査読有り

    Ohno Y., Koizumi H., Tokumoto Y., Kutsukake K., Taneichi H., Yonenaga I.

    JOURNAL OF CRYSTAL GROWTH   393 巻   頁: 119-122   2014年5月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1010/j.jo-vsgro.2013.11.033

    Web of Science

  78. Czochralski growth of heavily indium-doped Si crystals and co-doping effects of group-IV elements 査読有り

    Inoue K., Taishi T., Tokumoto Y., Kutsukake K., Ohno Y., Ohsawa T., Gotoh R., Yonenaga I.

    JOURNAL OF CRYSTAL GROWTH   393 巻   頁: 45-48   2014年5月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2013.10.033

    Web of Science

  79. Mono-Like Silicon Growth Using Functional Grain Boundaries to Limit Area of Multicrystalline Grains 査読有り

    Kutsukake Kentaro, Usami Noritaka, Ohno Yutaka, Tokumoto Yuki, Yonenaga Ichiro

    IEEE JOURNAL OF PHOTOVOLTAICS   4 巻 ( 1 ) 頁: 84-87   2014年1月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1109/JPHOTOV.2013.2281730

    Web of Science

  80. Three-dimensional evaluation of gettering ability of Sigma 3{111} grain boundaries in silicon by atom probe tomography combined with transmission electron microscopy 査読有り

    Ohno Yutaka, Inoue Kaihei, Tokumoto Yuki, Kutsukake Kentaro, Yonenaga Ichiro, Ebisawa Naoki, Takamizawa Hisashi, Shimizu Yasuo, Inoue Koji, Nagai Yasuyoshi, Yoshida Hideto, Takeda Seiji

    APPLIED PHYSICS LETTERS   103 巻 ( 10 )   2013年9月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.4820140

    Web of Science

  81. Growth of Si single bulk crystals with low oxygen concentrations by the noncontact crucible method using silica crucibles without Si3N4 coating 査読有り

    Nakajima Kazuo, Murai Ryota, Morishita Kohei, Kutsukake Kentaro

    JOURNAL OF CRYSTAL GROWTH   372 巻   頁: 121-128   2013年6月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2013.03.024

    Web of Science

  82. Interstitial oxygen behavior for thermal double donor formation in germanium: Infrared absorption studies 査読有り

    Inoue K., Taishi T., Tokumoto Y., Murao Y., Kutsukake K., Ohno Y., Suezawa M., Yonenaga I.

    JOURNAL OF APPLIED PHYSICS   113 巻 ( 7 )   2013年2月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.4792061

    Web of Science

  83. Control of Grain Boundary Propagation in Mono-Like Si: Utilization of Functional Grain Boundaries 査読有り

    Kutsukake Kentaro, Usami Noritaka, Ohno Yutaka, Tokumoto Yuki, Yonenaga Ichiro

    APPLIED PHYSICS EXPRESS   6 巻 ( 2 )   2013年2月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.7567/APEX.6.025505

    Web of Science

  84. Nanoindentation Hardness and Elastic Modulus of AlGaN Alloys 査読有り

    Tokumoto Y., Taneichi H., Ohno Y., Kutsukake K., Miyake H., Hiramatsu K., Yonenaga I.

    2013 CONFERENCE ON LASERS AND ELECTRO-OPTICS PACIFIC RIM (CLEO-PR)     頁: .   2013年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    Web of Science

  85. Growth of Si Single Bulk Crystals Inside Si Melts By the Noncontact Crucible Method Using Silica Crucibles Without Coating Si3N4 Particles 査読有り

    Nakajima Kazuo, Murai Ryota, Morishita Kohei, Kutsukake Kentaro

    2013 IEEE 39TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)     頁: 174-176   2013年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    Web of Science

  86. Dislocation structure in AlN films induced by in situ transmission electron microscope nanoindentation (vol 112, 093526, 2012) 査読有り

    Tokumoto Yuki, Kutsukake Kentaro, Ohno Yutaka, Yonenaga Ichiro

    JOURNAL OF APPLIED PHYSICS   112 巻 ( 12 )   2012年12月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.4771927

    Web of Science

  87. Dislocation structure in AlN films induced by in situ transmission electron microscope nanoindentation 査読有り

    Tokumoto Yuki, Kutsukake Kentaro, Ohno Yutaka, Yonenaga Ichiro

    JOURNAL OF APPLIED PHYSICS   112 巻 ( 9 )   2012年11月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.4764928

    Web of Science

  88. Growth of high-quality multicrystalline Si ingots using noncontact crucible method 査読有り

    Nakajima Kazuo, Morishita Kohei, Murai Ryota, Kutsukake Kentaro

    JOURNAL OF CRYSTAL GROWTH   355 巻 ( 1 ) 頁: 38-45   2012年9月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2012.06.034

    Web of Science

  89. Modeling of incorporation of oxygen and carbon impurities into multicrystalline silicon ingot during one-directional growth 査読有り

    Kutsukake Kentaro, Ise Hideaki, Tokumoto Yuki, Ohno Yutaka, Nakajima Kazuo, Yonenaga Ichiro

    JOURNAL OF CRYSTAL GROWTH   352 巻 ( 1 ) 頁: 173-176   2012年8月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2012.02.004

    Web of Science

  90. Growth of multicrystalline Si ingots using noncontact crucible method for reduction of stress 査読有り

    Nakajima Kazuo, Murai Ryota, Morishita Kohei, Kutsukake Kentaro, Usami Noritaka

    JOURNAL OF CRYSTAL GROWTH   344 巻 ( 1 ) 頁: 6-11   2012年4月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2012.01.051

    Web of Science

  91. Growth of Heavily Indium doped Si Crystals by Co-Doping of Neutral Impurity Carbon or Germanium 査読有り

    Inoue Kaihei, Tokumoto Yuki, Kutsukake Kentaro, Ohno Yutaka, Yonenaga Ichiro

    MATERIALS INTEGRATION   508 巻   頁: 220-223   2012年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.4028/www.scientific.net/KEM.508.220

    Web of Science

  92. Growth of Multicrystalline Si Ingots for Solar Cells Using Noncontact Crucible Method without Touching the Crucible Wall 査読有り

    Nakajima Kazuo, Murai Ryota, Morishita Kohei, Kutsukake Kentaro, Usami Noritaka

    2012 38TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)     頁: 1830-1832   2012年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    Web of Science

  93. Generation mechanism of dislocations and their clusters in multicrystalline silicon during two-dimensional growth 査読有り

    Kutsukake Kentaro, Abe Takuro, Usami Noritaka, Fujiwara Kozo, Yonenaga Ichiro, Morishita Kohei, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   110 巻 ( 8 )   2011年10月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.3652891

    Web of Science

  94. Formation mechanism of twin boundaries during crystal growth of silicon 査読有り

    Kutsukake Kentaro, Abe Takuro, Usami Noritaka, Fujiwara Kozo, Morishita Kohei, Nakajima Kazuo

    SCRIPTA MATERIALIA   65 巻 ( 6 ) 頁: 556-559   2011年9月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.scriptamat.2011.06.028

    Web of Science

  95. Implementation of faceted dendrite growth on floating cast method to realize high-quality multicrsytalline Si ingot for solar cells 査読有り

    Usami Noritaka, Takahashi Isao, Kutsukake Kentaro, Fujiwara Kozo, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   109 巻 ( 8 )   2011年4月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.3576108

    Web of Science

  96. Arrangement of dendrite crystals grown along the bottom of Si ingots using the dendritic casting method by controlling thermal conductivity under crucibles 査読有り

    Nakajima Kazuo, Kutsukake Kentaro, Fujiwara Kozo, Morishita Kohei, Ono Satoshi

    JOURNAL OF CRYSTAL GROWTH   319 巻 ( 1 ) 頁: 13-18   2011年3月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2011.01.069

    Web of Science

  97. Pattern formation mechanism of a periodically faceted interface during crystallization of Si 査読有り

    Tokairin M., Fujiwara K., Kutsukake K., Kodama H., Usami N., Nakajima K.

    JOURNAL OF CRYSTAL GROWTH   312 巻 ( 24 ) 頁: 3670-3674   2010年12月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2010.09.059

    Web of Science

  98. Generation mechanism of dislocations during directional solidification of multicrystalline silicon using artificially designed seed 査読有り

    Takahashi Isao, Usami Noritaka, Kutsukake Kentaro, Stokkan Gaute, Morishita Kohei, Nakajima Kazuo

    JOURNAL OF CRYSTAL GROWTH   312 巻 ( 7 ) 頁: 897-901   2010年3月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2010.01.011

    Web of Science

  99. Relationship between grain boundary structures in Si multicrystals and generation of dislocations during crystal growth 査読有り

    Usami Noritaka, Yokoyama Ryusuke, Takahashi Isao, Kutsukake Kentaro, Fujiwara Kozo, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   107 巻 ( 1 )   2010年1月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.3276219

    Web of Science

  100. HIGH EFFICIENCY SOLAR CELLS OBTAINED FROM SMALL SIZE INGOTS WITH 30 CM Phi BY CONTROLLING THE DISTRIBUTION AND ORIENTATION OF DENDRITE CRYSTALS GROWN ALONG THE BOTTOM OF THE INGOTS 査読有り

    Nakajima K., Kutsukake K., Fujiwara K., Usami N., Ono S., Yamasaki

    35TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE     頁: 817-819   2010年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    Web of Science

  101. Computational Investigation of Relationship between Shear Stress and Multicrystalline Structure in Silicon 査読有り

    Takahashi Isao, Usami Noritaka, Kutsukake Kentaro, Morishita Kohei, Nakajima Kazuo

    JAPANESE JOURNAL OF APPLIED PHYSICS   49 巻 ( 4 )   2010年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1143/JJAP.49.04DP01

    Web of Science

  102. FORMATION MECHANISM OF TWIN BOUNDARIES IN SILICON MULTICRYSTALS DURING CRYSTAL GROWTH 査読有り

    Kutsukake K., Abe T., Usami N., Fujiwara K., Morishita K., Nakajima K.

    35TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE     頁: .   2010年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    Web of Science

  103. Growth behavior of faceted Si crystals at grain boundary formation 査読有り

    Fujiwara K., Tsumura S., Tokairin M., Kutsukake K., Usami N., Uda S., Nakajima K.

    JOURNAL OF CRYSTAL GROWTH   312 巻 ( 1 ) 頁: 19-23   2009年12月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2009.09.055

    Web of Science

  104. Formation mechanism of a faceted interface: In situ observation of the Si(100) crystal-melt interface during crystal growth 査読有り

    Tokairin M., Fujiwara K., Kutsukake K., Usami N., Nakajima K.

    PHYSICAL REVIEW B   80 巻 ( 17 )   2009年11月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1103/PhysRevB.80.174108

    Web of Science

  105. Microstructures of Si multicrystals and their impact on minority carrier diffusion length 査読有り

    Wang H. Y., Usami N., Fujiwara K., Kutsukake K., Nakajima K.

    ACTA MATERIALIA   57 巻 ( 11 ) 頁: 3268-3276   2009年6月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.actamat.2009.03.033

    Web of Science

  106. Quantitative analysis of subgrain boundaries in Si multicrystals and their impact on electrical properties and solar cell performance 査読有り

    Kutsukake Kentaro, Usami Noritaka, Ohtaniuchi Tsuyoshi, Fujiwara Kozo, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   105 巻 ( 4 )   2009年2月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.3079504

    Web of Science

  107. Structural origin of a cluster of bright spots in reverse bias electroluminescence image of solar cells based on Si multicrystals 査読有り

    Usami Noritaka, Kutsukake Kentaro, Fujiwara Kozo, Yonenaga Ichiro, Nakajima Kazuo

    APPLIED PHYSICS EXPRESS   1 巻 ( 7 )   2008年7月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1143/APEX.1.075001

    Web of Science

  108. Modification of local structures in multicrystals revealed by spatially resolved x-ray rocking curve analysis 査読有り

    Usami Noritaka, Kutsukake Kentaro, Fujiwara Kozo, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   102 巻 ( 10 )   2007年11月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.2816207

    Web of Science

  109. Influence of structural imperfection of Sigma 5 grain boundaries in bulk multicrystalline Si on their electrical activities 査読有り

    Kutsukake Kentaro, Usami Noritaka, Fujiwara Kozo, Nose Yoshitaro, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   101 巻 ( 6 )   2007年3月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.2710348

    Web of Science

  110. Modification of local structure and its influence on electrical activity of near (310) Sigma 5 grain boundary in bulk silicon 査読有り

    Kutsukake Kentaro, Usami Noritaka, Fujiwara Kozo, Nose Yoshitaro, Sugawara Takamasa, Shishido Toetsu, Nakajima Kazuo

    MATERIALS TRANSACTIONS   48 巻 ( 2 ) 頁: 143-147   2007年2月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.2320/matertrans.48.143

    Web of Science

  111. Control of strain status in SiGe thin film by epitaxial growth on Si with buried porous layer 査読有り

    Usami Noritaka, Kutsukake Kentaro, Nakajima Kazuo, Amtablian Sevak, Fave Alain, Lemiti Mustapha

    APPLIED PHYSICS LETTERS   90 巻 ( 3 )   2007年1月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.2433025

    Web of Science

  112. Realization of bulk multicrystalline silicon with controlled grain boundaries by utilizing spontaneous modification of grain boundary configuration 査読有り

    Usami N, Kutsukake K, Sugawara T, Fujwara K, Pan W, Nose Y, Shishido T, Nakajima K

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   45 巻 ( 3A ) 頁: 1734-1737   2006年3月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1143/JJAP.45.1734

    Web of Science

  113. Growth of multicrystalline Si with controlled grain boundary configuration by the floating zone technique 査読有り

    Kitamura M, Usami N, Sugawara T, Kutsukake K, Fujiwara K, Nose Y, Shishido T, Nakajima K

    JOURNAL OF CRYSTAL GROWTH   280 巻 ( 3-4 ) 頁: 419-424   2005年7月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2005.04.049

    Web of Science

  114. Growth of SiGe-on-insulator and its application as a substrate for epitaxy of strained-Si layer 査読有り

    Usami Noritaka, Kutsukake Kentaro, Pan Wugen, Fujiwara Kozo, Ujihara Toru, Zhang Baoping, Yokoyama Takashi, Nakajima Kazuo

    JOURNAL OF CRYSTAL GROWTH   275 巻 ( 1-2 ) 頁: E1203-E1207   2005年2月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.jcrysgro.2004.11.141

    Web of Science

  115. Floating zone growth of Si bicrystals using seed crystals with artificially designed grain boundary configuration 査読有り

    Usami N, Kitamura M, Sugawara T, Kutsukake K, Ohdaira K, Nose Y, Fujiwara K, Shishido T, Nakajima K

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS   44 巻 ( 24-27 ) 頁: L778-L780   2005年

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1143/JJAP.44.L778

    Web of Science

  116. On the origin of strain fluctuation in strained-Si grown on SiGe-on-insulator and SiGe virtual substrates 査読有り

    Kutsukake K, Usami N, Ujihara T, Fujiwara K, Sazaki G, Nakajima K

    APPLIED PHYSICS LETTERS   85 巻 ( 8 ) 頁: 1335-1337   2004年8月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1063/1.1784036

    Web of Science

  117. Fabrication of SiGe-on-insulator by rapid thermal annealing of Ge on Si-on-insulator substrate 査読有り

    Kutsukake K, Usami N, Fujiwara K, Ujihara T, Sazaki G, Nakajima K, Zhang BP, Segawa Y

    APPLIED SURFACE SCIENCE   224 巻 ( 1-4 ) 頁: 95-98   2004年3月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1016/j.apsusc.2003.08.100

    Web of Science

  118. Fabrication of SiGe-on-insulator through thermal diffusion of Ge on Si-on-insulator substrate 査読有り

    Kutsukake K, Usami N, Fujiwara K, Ujihara T, Sazaki G, Zhang BP, Segawa Y, Nakajima K

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   42 巻 ( 3A ) 頁: L232-L234   2003年3月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    DOI: 10.1143/JJAP.42.L232

    Web of Science

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書籍等出版物 5

  1. 多結晶マテリアルズインフォマティクス

    宇佐美 徳隆, 大野 裕 (結晶工学), 沓掛 健太朗, 工藤 博章, 小島 拓人 (結晶工学), 横井 達矢

    共立出版  2024年  ( ISBN:9784320140035

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    記述言語:日本語

    CiNii Books

  2. データ駆動型材料開発 : オントロジーとマイニング、計測と実験装置の自動制御

    ( 担当: 分担執筆 ,  範囲: 無機材料プロセス開発MI, pp. 131-139)

    エヌ・ティー・エス  2021年11月  ( ISBN:9784860437596

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    総ページ数:3, 6, 244, 6, 図版26p   記述言語:日本語

    CiNii Books

  3. マテリアルズインフォマティクスのためのデータ作成とその解析、応用事例

    ( 担当: 分担執筆 ,  範囲: 結晶成長プロセスへの機械学習応用, pp. 311-316)

    技術情報協会  2021年7月  ( ISBN:9784861048548

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    総ページ数:500p   記述言語:日本語

    CiNii Books

  4. マテリアルズ・インフォマティクスQ&A集 : 解析実務と応用事例

    ( 担当: 分担執筆 ,  範囲: 第7章問13:MIによる半導体材料関連の開発例とは?, pp. 361-366, 第8章第2節問2:MIによるエレクトロニクス/半導体材料関連での研究状況とは?, pp. 479-486)

    情報機構  2020年12月  ( ISBN:9784865022049

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    総ページ数:xix, 597p   記述言語:日本語

    CiNii Books

  5. Handbook of Solar Silicon

    ( 担当: 分担執筆 ,  範囲: Growth of crystalline silicon for solar cells: the mono-like method, pp. 1-20)

    2018年 

MISC 1

  1. 機械学習を活用したSiC高品質結晶成長条件のデザイン

    原田 俊太, 林 宏益, 角岡 洋介, 朱 燦, 鳴海 大翔, 沓掛 健太朗, 宇治原 徹  

    まてりあ59 巻 ( 3 ) 頁: 145 - 152   2020年

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    記述言語:日本語   出版者・発行元:公益社団法人 日本金属学会  

    DOI: 10.2320/materia.59.145

    CiNii Books

    CiNii Research

講演・口頭発表等 6

  1. 物理計測の適応的マッピング 招待有り

    沓掛健太朗

    インフォマティクスと連携したモノづくりと計測技術 

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    開催年月日: 2018年1月

    記述言語:日本語   会議種別:口頭発表(招待・特別)  

    開催地:名古屋大学東山キャンパスES総合館ESホール   国名:日本国  

  2. データ科学を駆使した適応的マッピング測定 招待有り

    沓掛健太朗

    日本学術振興会「結晶加工と評価技術」第145委員会 第156回研究会 

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    開催年月日: 2017年12月

    記述言語:日本語   会議種別:口頭発表(招待・特別)  

    開催地:明治大学 駿河台キャンパス グローバルフロント   国名:日本国  

  3. データ科学的手法による効率的なマッピング(3):測定点移動距離の検討

    沓掛健太朗, 菊地亮太, 大野裕, 下山幸治

    第78回応用物理学会秋季学術講演会 

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    開催年月日: 2017年9月

    記述言語:日本語   会議種別:口頭発表(一般)  

    開催地:福岡国際会議場   国名:日本国  

  4. 太陽電池用シリコンのキャスト成長における欠陥制御

    学振175委員会 第6回次世代シリコン太陽電池分科会研究会  2017年 

  5. データ科学的手法を用いた効率的なマッピングの提案

    学振第175委員会 第14回「次世代の太陽光発電システム」シンポジウム  2017年 

  6. 太陽電池用のシリコン材料の開発

    東北大学多元物質科学研究所 若手研究者交流講演会  2017年 

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科研費 7

  1. 半導体プロセスメタファクトリーの基盤技術開発

    2023年8月 - 2025年3月

    NEDO  先導研究プログラム  新産業・革新技術創出に向けた先導研究プログラム

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    担当区分:研究分担者 

  2. 潜在空間における複雑な結晶成長モデルの構築とプロセス設計

    研究課題/研究課題番号:22H00300  2022年4月 - 2025年3月

    日本学術振興会  科学研究費助成事業  基盤研究(A)

    宇治原 徹, 原田 俊太, 烏山 昌幸, 河村 貴宏, 岡野 泰則, 沓掛 健太朗

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    担当区分:研究分担者 

    我々はSiC溶液成長において、高温溶液内部の温度や流れの状態を即座に予測できるサロゲートモデルを機械学習技術により構築し、それを活用してプロセス設計を行い、6インチの大口径成長を早期に実現してきた。ところで、欠陥の形成や低減においてはステップバンチングやステップの湾曲や蛇行などによって形成される複雑な結晶表面構造が重要となる。本研究では、その時間発展を6インチ全面にわたって正確かつ高速に予測する代理モデルを構築し、大口径と究極の高品質を両立させたプロセス設計を行う。

  3. SiCバルク成長技術の革新に向けたプロセスインフォマティクス技術の研究開発

    2021年8月 - 2023年3月

    NEDO  先導研究プログラム  マテリアル革新技術先導研究プログラム

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    担当区分:研究分担者 

  4. AIとオペレータの『意味』を介したコミュニケーションによる結晶成長技術開発

    2020年8月 - 2025年3月

    NEDO  人と共に進化する次世代人工知能に関する技術開発事業  人と共に進化するAIシステムの基盤技術開発, 人の意図や知識を理解して学習するAIの基盤技術開発

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    担当区分:研究分担者 

  5. 発光イメージングによる欠陥特性の定量

    研究課題/研究課題番号:16H03856  2016年4月 - 2019年3月

    日本学術振興会  科学研究費助成事業  基盤研究(B)

    沓掛 健太朗, 原 康祐, 太子 敏則, 谷川 智之

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    担当区分:研究代表者 

    配分額:16770000円 ( 直接経費:12900000円 、 間接経費:3870000円 )

    本研究では半導体結晶の発光イメージから結晶内部に含まれる欠陥の物性を定量する手法の開発に取り組みました。本研究で得られたBaSi2やSiCの高品質結晶を測定試料に用いて検討を進め、半導体や結晶欠陥の物理に基づきながらキャリアシミュレーションや画像処理、機械学習などの計算手法を活用することで、従来法に比べて、より高精度、高感度、高速・高効率な定量法を得ることができました。得られた定量法や測定のための基礎技術・基礎知見は、積極的に実用を進めていく予定です。
    本研究のポイントは画像として得られる発光イメージから、欠陥物性の情報をいかに抽出するかです。本研究では、半導体や欠陥の物理に基づくシミュレーション、欠陥のもつ画像特徴を検出する画像処理、大量データから有用な法則を導く機械学習を活用することで、欠陥に関する情報を高速・正確に抽出する方法を開発しました。この方法は、半導体結晶の発光イメージに限らず、多くの計測画像に適用できる技術要素を持つため、今後さまざまな応用展開を進める予定です。

  6. 光・磁気局所解析法による有機半導体粒界物性評価ならびに粒界エンジニアリング

    研究課題/研究課題番号:16K04943  2016年4月 - 2019年3月

    日本学術振興会  科学研究費助成事業  基盤研究(C)

    櫻井 岳暁, 沓掛 健太朗,

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    担当区分:研究分担者 

    有機薄膜太陽電池の結晶粒界物性を明らかにし、これを制御することは、デバイスのエネルギー損失機構を理解・低減するうえで不可欠である。本研究は、試料に損傷を与えない光・磁気局所解析法を構築し、粒界近傍での分子の凝集構造(欠陥構造)、粒界電子物性の相関を明らかにした。これにより、粒界でおこるエネルギー失活過程がどのような粒界構造によりもたらされるか詳細を調べた。
    有機薄膜太陽電池の効率改善の指針を提供しただけでなく、局所分子配向マップや粒界物性評価の手法を新たに提供した点が意義深く、今後バルクヘテロ構造などへの応用が期待される。

  7. その場観察法によるSi多結晶の融液成長メカニズムの解明

    研究課題/研究課題番号:26246016  2014年6月 - 2017年3月

    日本学術振興会  科学研究費助成事業  基盤研究(A)

    藤原 航三, 沓掛 健太朗

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    本研究は、太陽電池用Si多結晶インゴットの高品質化・高均質化成長技術の開発に対して有用な知見を得るために、Si多結晶の固液界面現象を基礎的に解明することを目的として実施された。約1400℃という高温でSi多結晶の固液界面を直接観察するための「その場」観察装置を開発した。本装置を用いて、結晶粒界が結晶成長や組織形成に及ぼす影響を明らかにした。この基礎研究で得られた知見をSi多結晶インゴットの成長技術に反映させて、従来のSi多結晶に比較して約3倍の少数キャリアライフタイムを示す高品質Si多結晶インゴットが実現された。

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