Updated on 2024/12/11

写真a

 
KUTSUKAKE Kentaro
 
Organization
Institute of Materials and Systems for Sustainability Center for Integrated Research of Future Electronics Innovative Devices Section Associate professor
Graduate School
Graduate School of Engineering
Title
Associate professor
Contact information
メールアドレス

Degree 1

  1. 博士(理学) ( 2007.3   東北大学 ) 

Research Interests 5

  1. Silicon

  2. Solar cells

  3. Machine learning

  4. Crystal growth

  5. Crystal defects

Research Areas 6

  1. Nanotechnology/Materials / Crystal engineering

  2. Nanotechnology/Materials / Crystal engineering

  3. Nanotechnology/Materials / Applied physical properties

  4. Nanotechnology/Materials / Applied condensed matter physics

  5. Informatics / Intelligent informatics

  6. Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electric and electronic materials

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Research History 9

  1. Nagoya University   Institute of Materials and Systems for Sustainability   Associate professor

    2024.4

  2. Tohoku University   Visiting Professor

    2023.4

  3. RIKEN   Center for Advanced Intelligence Project   Postdoctoral Researcher

    2018.11 - 2024.3

  4. Nagoya University   Institutes of Innovation for Future Society   Designated lecturer

    2017.11

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    Country:Japan

  5. Tohoku University   Institute for Materials Research   Associate Professor

    2010.10 - 2017.10

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    Country:Japan

  6. Kyoto University   Graduate Scool of Energy Science   Associate Professor

    2010.4 - 2010.9

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    Country:Japan

  7. Tohoku University   Institute for Materials Research   Associate Professor

    2007.8 - 2010.3

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    Country:Japan

  8. Tohoku University

    2007.4 - 2007.7

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    Country:Japan

  9. Tohoku University

    2006.4 - 2007.3

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    Country:Japan

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Education 3

  1. Tohoku University   Graduate School, Division of Natural Science

    2004.4 - 2007.3

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    Country: Japan

  2. Tohoku University   Graduate School, Division of Natural Science

    2002.4 - 2004.3

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    Country: Japan

  3. Tohoku University   Faculty of Science

    1998.4 - 2002.3

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    Country: Japan

Professional Memberships 5

  1. 日本結晶成長学会

  2. 応用物理学会

  3. JSAP Informatics Professional Group

  4. JSAP Crystals Science and Technology Division

  5. The Japan Photovoltaic Society

Committee Memberships 9

  1. 応用物理学会 産学連携委員会「半導体の結晶成長と加工および評価に関する産学連携委員会」   幹事  

    2023   

  2. 日本結晶成長学会   機関紙編集委員  

    2022   

  3. 応用物理学会 インフォマティクス応用研究会   代表  

    2019   

  4. 日本学術振興会第145委員会   学界委員  

    2017.4   

  5. 日本学術振興会 第145委員会   学界委員  

    2017 - 2023   

  6. 応用物理学会   機関誌「応用物理」 外部記者  

    2016 - 2017   

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    Committee type:Academic society

    応用物理学会

  7. 応用物理学会   学術講演会プログラム編集委員  

    2013.8 - 2018.3   

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    Committee type:Other

  8. 応用物理学会   機関誌「応用物理」 編集委員  

    2013.4 - 2015.3   

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    Committee type:Other

  9. 応用物理学会 結晶工学分科会   幹事  

    2012   

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    Committee type:Academic society

    応用物理学会 結晶工学分科会

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Awards 1

  1. 最優秀ポスター賞

    2017  

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    Country:Japan

 

Papers 118

  1. Stress analysis and dislocation cluster generation in silicon crystal with artificial grain boundaries

    Haruki Tajika, Kentaro Kutsukake, Noritaka Usami

    Journal of crystal growth   Vol. 649   2025.1

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.jcrysgro.2024.127922

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  2. Multicrystalline informatics: a methodology to advance materials science by unraveling complex phenomena

    Noritaka Usami, Kentaro Kutsukake, Takuto Kojima, Hiroaki Kudo, Tatsuya Yokoi, Yutaka Ohno

    Science and technology of advanced materials   Vol. 25 ( 1 ) page: 2396272   2024.12

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    Multicrystalline materials play a crucial role in our society. However, their microstructure is complicated, and there is no universal approach to achieving high performance. Therefore, a methodology is necessary to answer the fundamental question of how we should design and create microstructures. ‘Multicrystalline informatics’ is an innovative approach that combines experimental, theoretical, computational, and data sciences. This approach helps us understand complex phenomena in multicrystalline materials and improve their performance. The paper covers various original research bases of multicrystalline informatics, such as the three-dimensional visualization of crystal defects in multicrystalline materials, the machine learning model for predicting crystal orientation distribution, network analysis of multicrystalline structures, computational methods using artificial neural network interatomic potentials, and so on. The integration of these research bases proves to be useful in understanding unexplained phenomena in complex multicrystalline materials. The paper also presents examples of efficient optimization of the growth process of high-quality materials with the aid of informatics, as well as prospects for extending the methodology to other materials.

    DOI: 10.1080/14686996.2024.2396272

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  3. Feature extraction and spatial imaging of synchrotron radiation X-ray diffraction patterns using unsupervised machine learning

    Kutsukake, K; Kamioka, T; Matsui, K; Takeuchi, I; Segi, T; Sasaki, T; Fujikawa, S; Takahasi, M

    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS-METHODS   Vol. 4 ( 1 )   2024.12

  4. Thermal boundary conductance of artificially and systematically designed grain boundaries of Silicon measured by laser heterodyne photothermal displacement method

    T. Harada, K. Kutsukake, N. Usami, T. Ikari, A. Fukuyama

    Journal of applied physics   Vol. 136 ( 20 )   2024.11

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/5.0237047

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  5. Analysis of Macrostep Interaction via Carbon Diffusion Field in SiC Solution Growth

    Yuki Nakanishi, Kentaro Kutsukake, Yifan Dang, Shunta Harada, Miho Tagawa, Toru Ujihara

    Journal of Crystal Growth   Vol. 631   page: 127609 - 127609   2024.4

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    Publishing type:Research paper (scientific journal)   Publisher:Elsevier BV  

    DOI: 10.1016/j.jcrysgro.2024.127609

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  6. Exploring mc-Silicon Wafers: Utilizing Machine Learning to Enhance Wafer Quality Through Etching Studies

    Raji, M; Suseela, SB; Manikkam, S; Anbazhagan, G; Kutsukake, K; Thamotharan, K; Rajavel, R; Usami, N; Perumalsamy, R

    CRYSTAL RESEARCH AND TECHNOLOGY   Vol. 59 ( 4 )   2024.4

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    Publisher:Crystal Research and Technology  

    This paper provides a method for improving the photovoltaic conversion efficiency and optical attributes of silicon solar cells manufactured from as-cut boron doped p-type multi-crystalline silicon wafers using acid-based chemical texturization via machine learning. A decreased reflectance, which can be attained by the right chemical etching conditions, is one of the key elements for raising solar cell efficiency. In this work, the mc-Silicon wafer surface reflectance is obtained under (<2%) after optimization of wet chemical etching. The HF + HNO3 + CH3COOH chemical etchant is used in the ratio 1:3:2 at different conditions of the etching duration of 1 min, 2 min, 3 min, and 4 min, respectively. The as-cut boron doped p-type mc-silicon wafers are analysed with ultraviolet–visible spectroscopy, optical microscopy, Fourier transforms infrared spectroscopy, thickness profilometer, and scanning electron microscopy before and after etching. The chemical etching solution produces good results in 3 min etched wafer, with a reflectivity value of <2%.The reflectivity and optical images are inputs to the convolutional neural network model and the linear regression model to obtain the etching rate for better reflectivity. The classification model provides 99.6% accuracy and the regression model results in the minimum mean squared error (MSE) of 0.062.

    DOI: 10.1002/crat.202300279

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  7. Review of machine learning applications for crystal growth research

    Kutsukake, K

    JOURNAL OF CRYSTAL GROWTH   Vol. 630   2024.3

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    Publisher:Journal of Crystal Growth  

    The application of information science and technology has led to a paradigm shift in scientific and technological research and crystal growth is no exception. Various types of application research have been conducted, and research methods that combine real experiments and simulations with information techniques are becoming increasingly complex. In this paper, I focus on the application of information science and technology to the field of crystal growth. In the first half, I discuss the characteristics of process informatics, including applications to crystal growth, from the perspective of how it differs from materials informatics. In the second half, by reviewing various application studies to crystal growth, I aim to highlight the characteristics and discuss future issues.

    DOI: 10.1016/j.jcrysgro.2024.127598

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  8. High Passivation Performance of Cat-CVD i-a-Si:H Derived from Bayesian Optimization with Practical Constraints

    Ryota Ohashi, Kentaro Kutsukake, Huynh Thi Cam Tu, Koichi Higashimine, Keisuke Ohdaira

    ACS Applied Materials &amp; Interfaces   Vol. 16 ( 7 ) page: 9428 - 9435   2024.2

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    Publishing type:Research paper (scientific journal)   Publisher:American Chemical Society (ACS)  

    DOI: 10.1021/acsami.3c16202

  9. Effect of Solution Components on Solvent Inclusion in SiC Solution Growth

    Huiqin Zhou, Hitoshi Miura, Yuma Fukami, Yifan Dang, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    Crystal Growth &amp; Design   Vol. 24 ( 4 ) page: 1806 - 1817   2024.2

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    Publishing type:Research paper (scientific journal)   Publisher:American Chemical Society (ACS)  

    DOI: 10.1021/acs.cgd.3c01476

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  10. Multicrystalline Informatics Applied to Multicrystalline Silicon for Unraveling the Microscopic Root Cause of Dislocation Generation

    Kenta Yamakoshi, Yutaka Ohno, Kentaro Kutsukake, Takuto Kojima, Tatsuya Yokoi, Hideto Yoshida, Hiroyuki Tanaka, Xin Liu, Hiroaki Kudo, Noritaka Usami

    Advanced Materials   Vol. 36 ( 8 ) page: e2308599   2024.2

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Wiley  

    Abstract

    A comprehensive analysis of optical and photoluminescence images obtained from practical multicrystalline silicon wafers is conducted, utilizing various machine learning models for dislocation cluster region extraction, grain segmentation, and crystal orientation prediction. As a result, a realistic 3D model that includes the generation point of dislocation clusters is built. Finite element stress analysis on the 3D model coupled with crystal growth simulation reveals inhomogeneous and complex stress distribution and that dislocation clusters are frequently formed along the slip plane with the highest shear stress among twelve equivalents, concentrated along bending grain boundaries (GBs). Multiscale analysis of the extracted GBs near the generation point of dislocation clusters combined with ab initio calculations has shown that the dislocation generation due to the concentration of shear stress is caused by the nanofacet formation associated with GB bending. This mechanism cannot be captured by the Haasen‐Alexander‐Sumino model. Thus, this research method reveals the existence of a dislocation generation mechanism unique to the multicrystalline structure. Multicrystalline informatics linking experimental, theoretical, computational, and data science on multicrystalline materials at multiple scales is expected to contribute to the advancement of materials science by unraveling complex phenomena in various multicrystalline materials.

    DOI: 10.1002/adma.202308599

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  11. A stopping criterion for level set estimation

    ISHIBASHI Hideaki, MATSUI Kota, KUTSUKAKE Kentaro, HINO Hideitsu

    Proceedings of the Annual Conference of JSAI   Vol. JSAI2024 ( 0 ) page: 2M5OS2401 - 2M5OS2401   2024

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    Language:Japanese   Publisher:The Japanese Society for Artificial Intelligence  

    <p>Level set estimation is one of the adaptive experimental design that determines the next measurement point by using the obtained measurement results so far, and its task is to estimate the regions that do not satisfy the desired level using as few data as possible. Level set estimation considers a black box function with each measurement point as an input and the corresponding measurement result as an output, and predicts whether unmeasurement point exceeds the threshold using a surrogate function estimated from the dataset. The efficiency of level set estimation depends on (1) the acquisition function that determines the next measurement point and (2) the timing at which level set estimation is stopped. This study proposes a stopping criterion for level set estimation based on the probability that the surrogate function exceeds the threshold value. The proposed stopping criterion can guarantee a tail probability that the surrogate function exceeds the threshold for any acquisition function. This paper shows that the proposed stopping criterion can efficiently stop level set estimation for several test functions.</p>

    DOI: 10.11517/pjsai.jsai2024.0_2m5os2401

    CiNii Research

  12. 3D CNN and grad-CAM based visualization for predicting generation of dislocation clusters in multicrystalline silicon

    Kyoka Hara, Takuto Kojima, Kentaro Kutsukake, Hiroaki Kudo, Noritaka Usami

    APL machine learning     2023.9

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/5.0156044

  13. Machine learning for semiconductor process simulation described by coupled partial differential equations

    Rikuya Sato, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    Advanced theory and simulations   Vol. 6 ( 9 )   2023.9

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/adts.202300218

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  14. AI・インフォマティクス応用について,今思うこと

    沓掛 健太朗

    応用物理   Vol. 92 ( 6 ) page: 369 - 372   2023.6

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    Language:Japanese   Publisher:公益社団法人 応用物理学会  

    DOI: 10.11470/oubutsu.92.6_369

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  15. A machine learning-based prediction of crystal orientations for multicrystalline materials

    Kyoka Hara, Takuto Kojima, Kentaro Kutsukake, Hiroaki Kudo, Noritaka Usami

    APL machine learning     2023.6

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/5.0138099

  16. Analysis of grain growth behavior of multicrystalline Mg2Si

    Takumi Deshimaru, Kenta Yamakoshi, Kentaro Kutsukake, Takuto Kojima, Tsubasa Umehara, Haruhiko Udono, Noritaka Usami

    Japanese journal of applied physics   Vol. 62 ( SD )   2023.5

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/aca032

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  17. Bayesian optimization of hydrogen plasma treatment in silicon quantum dot multilayer and application to solar cells

    Kumagai, F; Gotoh, K; Miyamoto, S; Kato, S; Kutsukake, K; Usami, N; Kurokawa, Y

    DISCOVER NANO   Vol. 18 ( 1 ) page: 43   2023.3

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    Language:English   Publisher:Discover Nano  

    Silicon quantum dot multilayer (Si-QDML) is a promising material for a light absorber of all silicon tandem solar cells due to tunable bandgap energy in a wide range depending on the silicon quantum dot (Si-QD) size, which is possible to overcome the Shockley–Queisser limit. Since solar cell performance is degenerated by carrier recombination through dangling bonds (DBs) in Si-QDML, hydrogen termination of DBs is crucial. Hydrogen plasma treatment (HPT) is one of the methods to introduce hydrogen into Si-QDML. However, HPT has a large number of process parameters. In this study, we employed Bayesian optimization (BO) for the efficient survey of HPT process parameters. Photosensitivity (PS) was adopted as the indicator to be maximized in BO. PS (σp/σd) was calculated as the ratio of photoconductivity (σp) and dark conductivity (σd) of Si-QDML, which allowed the evaluation of important electrical characteristics in solar cells easily without fabricating process-intensive devices. 40-period layers for Si-QDML were prepared by plasma-enhanced chemical vapor deposition method and post-annealing onto quartz substrates. Ten samples were prepared by HPT under random conditions as initial data for BO. By repeating calculations and experiments, the PS was successfully improved from 22.7 to 347.2 with a small number of experiments. In addition, Si-QD solar cells were fabricated with optimized HPT process parameters; open-circuit voltage (VOC) and fill factor (FF) values of 689 mV and 0.67, respectively, were achieved. These values are the highest for this type of device, which were achieved through an unprecedented attempt to combine HPT and BO. These results prove that BO is effective in accelerating the optimization of practical process parameters in a multidimensional parameter space, even for novel indicators such as PS.

    DOI: 10.1186/s11671-023-03821-9

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  18. Modeling-Based Design of the Control Pattern for Uniform Macrostep Morphology in Solution Growth of SiC Reviewed

    Yifan Dang, Xinbo Liu, Can Zhu, Yuma Fukami, Shuyang Ma, Huiqin Zhou, Xin Liu, Kentaro Kutsukake, Shunta Harada, Toru Ujihara

    Crystal Growth and Design   Vol. 23 ( 2 ) page: 1023 - 1032   2023.1

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    In the solution growth of the SiC crystal, macrosteps with sufficient height on an off-axis substrate are required to reduce defects and achieve a high-quality grown layer. However, over-developed macrosteps can induce new defects and adversely affect the crystal quality. To better understand and control the behavior of macrosteps corresponding to the control parameters of the growth system, a simulation method that consists of a global two-dimensional computational fluid dynamic (CFD) model, a local three-dimensional CFD model near the growth front, and a kinetics model that describes the movement of macrosteps on the crystal surface is proposed. The simulation method is first applied to investigate the effect of the crystal rotation speed on macrostep morphology. Although the results indicate that a higher crystal rotation speed results in less step bunching, constantly rotating the crystal in one direction is demonstrated to be incapable of yielding a uniform macrostep distribution on the whole surface. Accordingly, a sophisticated control pattern is designed by periodically switching the flow direction underneath the crystal surface, where the proposed simulation method is critical to determine detailed control-parameter values. When the control pattern suggested by the simulation is used, a grown crystal with a uniform macrostep morphology and ideal step height on the whole surface is obtained in the practical experiment.

    DOI: 10.1021/acs.cgd.2c01194

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  19. Bayesian Optimization for Cascade-Type Multistage Processes

    Kusakawa, S; Takeno, S; Inatsu, Y; Kutsukake, K; Iwazaki, S; Nakano, T; Ujihara, T; Karasuyama, M; Takeuchi, I

    NEURAL COMPUTATION   Vol. 34 ( 12 ) page: 2408 - 2431   2022.11

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    Language:English   Publisher:Neural Computation  

    Complex processes in science and engineering are often formulated as multistage decision-making problems. In this letter, we consider a cascade process, a type of multistage decision-making process. This is a mul-tistage process in which the output of one stage is used as an input for the subsequent stage. When the cost of each stage is expensive, it is dif-ficult to search for the optimal controllable parameters for each stage ex-haustively. To address this problem, we formulate the optimization of the cascade process as an extension of the Bayesian optimization framework and propose two types of acquisition functions based on credible inter-vals and expected improvement. We investigate the theoretical properties of the proposed acquisition functions and demonstrate their effectiveness through numerical experiments. In addition, we consider suspen-sion setting, an extension in which we are allowed to suspend the cascade process at the middle of the multistage decision-making process that often arises in practical problems. We apply the proposed method in a test problem involving a solar cell simulator, the motivation for this study.

    DOI: 10.1162/neco_a_01550

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  20. Estimation of Crystal Orientation of Grains on Polycrystalline Silicon Substrate by Recurrent Neural Network

    Hikaru Kato, Soichiro Kamibeppu, Takuto Kojima, Tetsuya Matsumoto, Hiroaki Kudo, Yoshinori Takeuchi, Kentaro Kutsukake, Noritaka Usami

    IEEJ Transactions on Electrical and Electronic Engineering   Vol. 17 ( 11 ) page: 1685 - 1687   2022.11

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    Publishing type:Research paper (scientific journal)   Publisher:Wiley  

    DOI: 10.1002/tee.23676

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    Other Link: https://onlinelibrary.wiley.com/doi/full-xml/10.1002/tee.23676

  21. Optimization of Flow Distribution by Topological Description and Machine Learning in Solution Growth of SiC Reviewed

    Masaru Isono, Shunta Harada, Kentaro Kutsukake, Tomoo Yokoyama, Miho Tagawa, Toru Ujihara

    Advanced Theory and Simulations   Vol. 5 ( 9 ) page: 2200302   2022.9

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    The macroscopic distribution of fluid flows, which affect the quality of final products for various kinds of materials, is often difficult to describe in mathematical formulae and hinders the implementation of empirical knowledge in scaling up. In the present study, the characteristics of the flow distribution in silicon carbide (SiC) solution growth are described by using the position of the saddle point and the solution growth conditions are optimized by computational fluid dynamics simulation, machine learning, and a genetic algorithm. As a result, the candidates of the optimal condition for the solution growth of 6-in. SiC crystals are successfully obtained from the empirical knowledge gained from 3-in. crystal growth, by adding the topological description to the objective function. The present design of the objective function using the topological description can possibly be applied to other crystal growth or materials processing problems and to overcome scale-up difficulties, which can facilitate the rapid development of functional materials such as SiC wafers for power device applications.

    DOI: 10.1002/adts.202200302

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  22. A Transfer Learning-Based Method for Facilitating the Prediction of Unsteady Crystal Growth Reviewed

    Yifan Dang, Kentaro Kutsukake, Xin Liu, Yoshiki Inoue, Xinbo Liu, Shota Seki, Can Zhu, Shunta Harada, Miho Tagawa, Toru Ujihara

    Advanced Theory and Simulations   Vol. 5 ( 9 ) page: 2200204   2022.9

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    Real-time prediction and dynamic control systems that can adapt to an unsteady environment are necessary for material fabrication processes, especially crystal growth. Recent studies have demonstrated the effectiveness of machine learning in predicting an unsteady crystal growth process, but its wider application is hindered by the large amount of training data required for sufficient accuracy. To address this problem, this study investigates the capability of transfer learning to predict geometric evolution in an unsteady silicon carbide (SiC) solution growth system based on a small amount of data. The performance of transferred models is discussed regarding the effect of the transfer learning method, training data amount, and time step length. The transfer learning strategy yields the same accuracy as that of training from scratch but requires only 20% of the training data. The accuracy is stably inherited through successive time steps, which demonstrates the effectiveness of transfer learning in reducing the required amount of training data for predicting evolution in an unsteady crystal growth process. Moreover, the transferred models trained with relatively more data (no more than 100%) further improve the accuracy inherited from the source model through multiple time steps, which broadens the application scope of transfer learning.

    DOI: 10.1002/adts.202200204

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  23. Study on electrical activity of grain boundaries in silicon through systematic control of structural parameters and characterization using a pretrained machine learning model

    Yusuke Fukuda, Kentaro Kutsukake, Takuto Kojima, Yutaka Ohno, Noritaka Usami

    Journal of applied physics   Vol. 132 ( 2 ) page: 025102 - 025102   2022.7

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    Publishing type:Research paper (scientific journal)   Publisher:AIP Publishing  

    We report on the effects of grain boundary (GB) structures on the carrier recombination velocity at GB ( v<sub>GB</sub>) in multicrystalline Si (mc-Si). The fabricated artificial GBs and an originally developed machine learning model allowed an investigation of the effect of three macroscopic parameters, misorientation angle α for Σ values, asymmetric angle β, and deviation angle θ from the ingot growth direction. Totally, 13 GBs were formed by directional solidification using multi-seeds with controlled crystal orientations. v<sub>GB</sub> was evaluated directly from photoluminescence intensity profiles across GBs using a pre-trained machine learning model, which allowed a quantitative and continuous evaluation along GBs. The evaluation results indicated that the impact of θ on v<sub>GB</sub> would be relatively large among the three macroscopic parameters. In addition, the results for the Σ5 and Σ13 GBs suggested that the minimum v<sub>GB</sub> would be related to the GB energy. These results were discussed in terms of the complexity of the local reconstruction of GB structures. The deviation would make a more complex reconstructed GB structure with local distortion, resulting in an increase in the electrical activity of GBs. The obtained knowledge will contribute to improving various polycrystalline materials through a comprehensive understanding of the relationship between GB structures and their properties.

    DOI: 10.1063/5.0086193

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  24. Virtual experiments of Czochralski growth of silicon using machine learning: Influence of processing parameters on interstitial oxygen concentration

    Kentaro Kutsukake, Yuta Nagai, Hironori Banba

    Journal of crystal growth   Vol. 584   page: 126580 - 126580   2022.4

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    Publishing type:Research paper (scientific journal)   Publisher:Elsevier {BV}  

    DOI: 10.1016/j.jcrysgro.2022.126580

  25. Effects of grain boundary structure and shape of the solid–liquid interface on the growth direction of the grain boundaries in multicrystalline silicon

    Yusuke Fukuda, Kentaro Kutsukake, Takuto Kojima, Noritaka Usami

    CrystEngComm   Vol. 24 ( 10 ) page: 1948 - 1954   2022.3

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    Publishing type:Research paper (scientific journal)   Publisher:Royal society of chemistry ({RSC})  

    DOI: 10.1039/d1ce01573g

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  26. Data-driven optimization and experimental validation for the lab-scale mono-like silicon ingot growth by directional solidification

    Xin Liu, Yifan Dang, Hiroyuki Tanaka, Yusuke Fukuda, Kentaro Kutsukake, Takuto Kojima, Toru Ujihara, Noritaka Usami

    ACS omega   Vol. 7 ( 8 ) page: 6665 - 6673   2022.3

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:American chemical society ({ACS})  

    DOI: 10.1021/acsomega.1c06018

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  27. Process informatics using simulation data for crystal growth

    Kutsukake Kentaro, Tsunooka Yosuke, Wancheng Yu, Dang Yifan, Harada Shunta, Ujihara Toru

    Journal of the Japanese Association for Crystal Growth   Vol. 49 ( 1 ) page: n/a   2022

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    Language:Japanese   Publisher:The Japanese Association for Crystal Growth  

    <p>  In this paper, machine learning and optimization based on simulation data of crystal growth are discussed from the viewpoint of informatics application, introducing our application to solution growth of SiC crystal. First, general aspects of crystal growth process simulation and its informatics applications are described. Next, after an overview of the solution growth of SiC crystal, the process optimization of solution growth of SiC crystal using machine learning is described, including the prediction model of temperature and flow of the solution in the crucible, the optimization of geometry conditions, and the optimization of process conditions corresponding to time evolution. Next, application to other materials is described. Finally, this paper is summarized with future prospects.</p>

    DOI: 10.19009/jjacg.49-1-06

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  28. Generation of photoluminescence image based on image translation by generative adversarial networks from multi-dimensional optical image embedding crystal orientation

    Kudo Hiroaki, Kojima Takuto, Matsumoto Tetsuya, Kutsukake Kentaro, Usami Noritaka

    Proceedings of the Annual Meeting of the Japan Photovoltaic Society   Vol. 1   page: 50 - 50   2021.10

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    Language:Japanese   Publisher:The Japan Photovoltaic Society  

    DOI: 10.57295/jpvsproc.1.0_50

  29. A machine learning-based crystal orientation estimation method and its application

    Hara Kyoka, Kojima Takuto, Kutsukake Kentaro, Kudo Hiroaki, Keerthivasan Thamotharan, Srinivasan Manickam, Ramasamy Perumalsamy, Usami Noritaka

    Proceedings of the Annual Meeting of the Japan Photovoltaic Society   Vol. 1   page: 125 - 125   2021.10

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    Language:Japanese   Publisher:The Japan Photovoltaic Society  

    DOI: 10.57295/jpvsproc.1.0_125

  30. Stress analysis on multicrystalline Si structure during crystal growth reproduced by various data

    Yamakoshi Kenta, Kutsukake Kentaro, Kojima Takuto, Kudo Hiroaki, Tanaka Hiroyuki, Ohno Yutaka, Usami Noritaka

    Proceedings of the Annual Meeting of the Japan Photovoltaic Society   Vol. 1   page: 52 - 52   2021.10

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    DOI: 10.57295/jpvsproc.1.0_52

  31. Application of Bayesian optimization for high-performance TiO /SiO /c-Si passivating contact

    Shinsuke Miyagawa, Kazuhiro Gotoh, Kentaro Kutsukake, Yasuyoshi Kurokawa, Noritaka Usami

    Solar energy materials and solar cells   Vol. 230   page: 111251 - 111251   2021.9

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    We report on the application of Bayesian optimization (BO), which could accelerate the time-intensive process optimization of many parameters, to fabrication of the high-performance titanium oxide/silicon oxide/crystalline silicon passivating contact. The process contains pre-deposition treatment to form SiOy interlayer, atomic layer deposition (ALD) of TiOx, and hydrogen plasma treatment (HPT) as post-process. We attempted to optimize seven parameters for ALD and HPT by dealing with samples treated by three kinds of chemical solutions in the same batch. This permits to perform BO for each structure at the same time and determine the superior pre-deposition treatment. Consequently, carrier selectivity S10 estimated by independent measurements of the saturation current density and contact resistance was significantly improved by BO of only 12 cycles and 10 initial random experiments. These results certify that BO could efficiently provide experimental conditions in multidimensional parameter space although we need to consider the impact of the metallization process on the passivation performance.

    DOI: 10.1016/j.solmat.2021.111251

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  32. Direct prediction of electrical properties of grain boundaries from photoluminescence profiles using machine learning

    Kentaro Kutsukake, Kazuki Mitamura, Noritaka Usami, Takuto Kojima

    Applied physics letters   Vol. 119 ( 3 ) page: 032105 - 032105   2021.7

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    DOI: 10.1063/5.0049847

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  33. Occurrence prediction of dislocation regions in photoluminescence image of multicrystalline silicon wafers using transfer learning of convolutional neural network

    Kudo, H., Matsumoto, T., Kutsukake, K., Usami, N.

    IEICE transactions on fundamentals of electronics, communications and computer sciences   Vol. E104A ( 6 ) page: 857 - 865   2021.6

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    <p>In this paper, we evaluate a prediction method of regions including dislocation clusters which are crystallographic defects in a photoluminescence (PL) image of multicrystalline silicon wafers. We applied a method of a transfer learning of the convolutional neural network to solve this task. For an input of a sub-region image of a whole PL image, the network outputs the dislocation cluster regions are included in the upper wafer image or not. A network learned using image in lower wafers of the bottom of dislocation clusters as positive examples. We experimented under three conditions as negative examples; image of some depth wafer, randomly selected images, and both images. We examined performances of accuracies and Youden's J statistics under 2 cases; predictions of occurrences of dislocation clusters at 10 upper wafer or 20 upper wafer. Results present that values of accuracies and values of Youden's J are not so high, but they are higher results than ones of bag of features (visual words) method. For our purpose to find occurrences dislocation clusters in upper wafers from the input wafer, we obtained results that randomly select condition as negative examples is appropriate for 10 upper wafers prediction, since its results are better than other negative examples conditions, consistently.</p>

    DOI: 10.1587/transfun.2020IMP0010

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  34. Geometrical design of a crystal growth system guided by a machine learning algorithm

    Yu, W., Zhu, C., Tsunooka, Y., Huang, W., Dang, Y., Kutsukake, K., Harada, S., Tagawa, M., Ujihara, T.

    CrystEngComm   Vol. 23 ( 14 ) page: 2695 - 2702   2021.4

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    DOI: 10.1039/d1ce00106j

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  35. Adaptive process control for crystal growth using machine learning for high-speed prediction: application to SiC solution growth

    Dang, Y., Zhu, C., Ikumi, M., Takaishi, M., Yu, W., Huang, W., Liu, X., Kutsukake, K., Harada, S., Tagawa, M., Ujihara, T.

    CrystEngComm   Vol. 23 ( 9 ) page: 1982 - 1990   2021.3

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    DOI: 10.1039/d0ce01824d

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  36. Identification of Dislocation Clusters based on Image Translation of Photoluminescence Image of Multicrystalline Silicon Wafer

    Kudo Hiroaki, Matsumoto Tetsuya, Kutsukake Kentaro, Usami Noritaka

    JSAP Annual Meetings Extended Abstracts   Vol. 2021.1   page: 3049 - 3049   2021.2

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    DOI: 10.11470/jsapmeeting.2021.1.0_3049

  37. Crystal orientation estimation model based on light reflection profile for multicrystalline silicon

    Kojima Takuto, Hara Kyoka, Kutsukake Kentaro, Matsumoto Tetsuya, Kudo Hiroaki, Usami Noritaka

    JSAP Annual Meetings Extended Abstracts   Vol. 2021.1   page: 3048 - 3048   2021.2

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    DOI: 10.11470/jsapmeeting.2021.1.0_3048

  38. Application of Bayesian optimization for improved passivation performance in TiO x /SiO y /c-Si heterostructure by hydrogen plasma treatment

    Shinsuke Miyagawa, Kazuhiro Gotoh, Kentaro Kutsukake, Yasuyoshi Kurokawa, Noritaka Usami

    Applied physics express   Vol. 14 ( 2 ) page: 025503 - 025503   2021.2

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    We applied hydrogen plasma treatment (HPT) on a titanium oxide/silicon oxide/crystalline silicon heterostructure to improve the passivation performance for high-efficiency silicon heterojunction solar cells. To accelerate the time-intensive process optimization of many parameters, we applied Bayesian optimization (BO). Consequently, the optimization of six process parameters of HPT was achieved by BO of only 15 cycles and 10 initial random experiments. Furthermore, the effective carrier lifetime after HPT on the optimized experimental conditions became three times higher compared with that before HPT, which certifies that BO is useful for accelerating optimization of the practical process conditions in multidimensional parameter space.

    DOI: 10.35848/1882-0786/abd869

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  39. Segregation mechanism of arsenic dopants at grain boundaries in silicon

    Yutaka Ohno, Tatsuya Yokoi, Yasuo Shimizu, Jie Ren, Koji Inoue, Yasuyoshi Nagai, Kentaro Kutsukake, Kozo Fujiwara, Atsutomo Nakamura, Katsuyuki Matsunaga, Hideto Yoshida

    Science and technology of advanced materials: Methods   Vol. 1 ( 1 ) page: 169 - 180   2021.1

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    Publishing type:Research paper (scientific journal)   Publisher:Informa {UK} limited  

    DOI: 10.1080/27660400.2021.1969701

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  40. Origin of recombination activity of non-coherent σ3{111} grain boundaries with a positive deviation in the tilt angle in cast-grown silicon ingots

    Ohno, Y; Tamaoka, T; Yoshida, H; Shimizu, Y; Kutsukake, K; Nagai, Y; Usami, N

    APPLIED PHYSICS EXPRESS   Vol. 14 ( 1 )   2021.1

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  41. Origin of recombination activity of non-coherent Σ3{111} grain boundaries with a positive deviation in the tilt angle in cast-grown silicon ingots

    Ohno, Y., Tamaoka, T., Yoshida, H., Shimizu, Y., Kutsukake, K., Nagai, Y., Usami, N.

    Applied physics express   Vol. 14 ( 1 ) page: 011002 - 011002   2021.1

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    DOI: 10.35848/1882-0786/abd0a0

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    Other Link: https://iopscience.iop.org/article/10.35848/1882-0786/abd0a0/pdf

  42. Technologies for large-diameter SiC crystal growth and application of process informatics

    Ujihara Toru, Zhu Can, Tsunooka Yosuke, Furusho Tomoaki, Suzuki Koki, Kutsukake Kentaro, Takaishi Masaki, Yu Wancheng, Dang Yifan, Isono Masaru, Takeuchi Ichiro, Tagawa Miho, Harada Shunta

    Journal of the Japanese Association for Crystal Growth   Vol. 48 ( 3 ) page: n/a   2021

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    <p>  We have been developing a SiC crystal growth technique using the solution method. As a result, we have achieved the growth of ultra-high quality crystals with extremely low dislocation density. The key to this is the reduction of dislocation density by utilizing the macro-step dislocation conversion phenomenon and the suppression of surface morphology roughness by controlling the flow in the solution. In order to put these technologies to practical use, we have developed a new machine learning technique for optimizing crystal growth conditions for large-diameter crystals. In this method, a model is constructed in the computer that reproduces the actual experiment quickly and accurately, and then hundreds of thousands or millions of trials are performed using the model to derive the experimental conditions with high efficiency. This means that optimization by surrogate models, which is one of the methods of process informatics, has been realized in crystal growth. By using these techniques, we were able to achieve 6-inch crystal growth in a very short time.</p>

    DOI: 10.19009/jjacg.48-3-04

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  43. Application of machine learning for high-performance multicrystalline materials

    Noritaka Usami, Kentaro Kutsukake, Takuto Kojima, Hiroaki Kudo, Tetsuya Matsumoto, Tatsuya Yokoi, Yasuo Shimizu, Yutaka Ohno

    ECS Transactions   Vol. 102 ( 4 ) page: 11 - 16   2021

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    We report on our recent attempt to pioneer “multicrystalline informatics” through collaboration of experiments, theory, computation, and machine learning to establish universal guidelines how we can obtain high-performance multicrystalline materials. We employ silicon as a model material, and develop various useful machine learning models. One example is a neural network to predict distribution of crystal orientations in a large-area sample from multiple optical images. Transfer learning of pre-trained image classifier could predict spatial distribution of probability of dislocations generation from photoluminescence images. Extracted regions with high probability of dislocations generation could be characterized by multiscale experiments as well as computation using artificial-neural-network interatomic potential to disclose the physics behind. The obtained knowledge could be useful for process development of high-performance multicrystalline materials.

    DOI: 10.1149/10204.0011ecst

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  44. Application of Bayesian optimization for experimental conditions of film deposition

    KUTSUKAKE Kentaro, OSADA Keiichi, MATSUI Kota, YAMAMOTO Jun

    Oyo Buturi   Vol. 89 ( 12 ) page: 711 - 714   2020.12

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    <p>Bayesian optimization, which is a machine learning method for sequential optimization, is widely applied as an optimization method that balances exploration and exploitation. In this paper, we first explain the outline of Bayesian optimization, and then introduce its application to the optimization of deposition conditions of epitaxial Si film growth. This paper focus on utilizing the expertise and experience of engineers.</p>

    DOI: 10.11470/oubutsu.89.12_711

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  45. Adaptive Bayesian optimization for epitaxial growth of Si thin films under various constraints

    Osada, K., Kutsukake, K., Yamamoto, J., Yamashita, S., Kodera, T., Nagai, Y., Horikawa, T., Matsui, K., Takeuchi, I., Ujihara, T.

    Materials today communications   Vol. 25   2020.12

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    DOI: 10.1016/j.mtcomm.2020.101538

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  46. Generation of dislocation clusters at triple junctions of random angle grain boundaries during cast growth of silicon ingots

    Ohno, Y., Tajima, K., Kutsukake, K., Usami, N.

    Applied physics express   Vol. 13 ( 10 ) page: 105505 - 105505   2020.10

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    DOI: 10.35848/1882-0786/abbb1c

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    Other Link: https://iopscience.iop.org/article/10.35848/1882-0786/abbb1c/pdf

  47. Determination of carrier recombination velocity at inclined grain boundaries in multicrystalline silicon through photoluminescence imaging and carrier simulation

    Kazuki Mitamura, Kentaro Kutsukake, Takuto Kojima, Noritaka Usami

    Journal of applied physics   Vol. 128 ( 12 ) page: 125103 - 125103   2020.9

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    DOI: 10.1063/5.0017823

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  48. Towards elucidation and control of grain boundary structures by multicrystalline informatics

    Usami Noritaka, Kutsukake Kentaro, Kojima Takuto, Kudo Hiroaki, Yokoi Tatsuya, Ohno Yutaka

    JSAP Annual Meetings Extended Abstracts   Vol. 2020.2   page: 157 - 157   2020.8

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    DOI: 10.11470/jsapmeeting.2020.2.0_157

  49. Features of Generation Points of Dislocation Clusters in Multicrystalline Silicon Ingot based on Transfer Learning of Convolutional Neural Network

    Kudo Hiroaki, Matsumoto Tetsuya, Kutsukake Kentaro, Usami Noritaka

    JSAP Annual Meetings Extended Abstracts   Vol. 2020.1   page: 3607 - 3607   2020.2

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    DOI: 10.11470/jsapmeeting.2020.1.0_3607

  50. Transmission behavior of dislocations against Σ3 twin boundaries in Si

    Ichiro Yonenaga, Kentaro Kutsukake

    Journal of applied physics   Vol. 127 ( 7 )   2020.2

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    DOI: 10.1063/1.5139972

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  51. Bayesian Active Learning for Inverse Problem of Structured-Output

    MATSUI Kota, KUSAKAWA Shunya, ANDO Keisuke, KUTSUKAKE Kentaro, UJIHARA Toru, TAKEUCHI Ichiro

    Proceedings of the Annual Conference of JSAI   Vol. JSAI2020 ( 0 ) page: 2J1GS201 - 2J1GS201   2020

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    <p>We propose an active learning method for the inverse problem of finding input parameters that achieve the desired structured-output. Here, the structured-output refers to a multidimensional vector in which each element has a correlation. Specifically, we propose three acquisition functions to minimize the squared error between the desired structured-output and the prediction by the model by explicitly incorporating the correlation between output elements for a black-box vector-valued objective function into a Gaussian process model. We apply the proposed method to the search problem of growth rate distribution using actual data of silicon carbide (SiC) crystal growth modeling, and verify its effectiveness.</p>

    DOI: 10.11517/pjsai.jsai2020.0_2j1gs201

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  52. Real-time prediction of interstitial oxygen concentration in Czochralski silicon using machine learning

    Kutsukake, K., Nagai, Y., Horikawa, T., Banba, H.

    Applied physics express   Vol. 13 ( 12 )   2020

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    DOI: 10.35848/1882-0786/abc6ec

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  53. Structural properties of triple junctions acting as dislocation sources in high-performance Si ingots

    Yutaka Ohno, Kazuya Tajima, Kentaro Kutsukake, Noritaka Usami

    Conference Record of the IEEE Photovoltaic Specialists Conference   Vol. 2020-   page: 2340 - 2340   2020

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    Language:English   Publishing type:Research paper (international conference proceedings)   Publisher:Institute of Electrical and Electronics Engineers Inc.  

    Dislocation clusters that would degrade the electric property can be generated from a grain boundary (GB) neighboring a triple junction of GBs. The atomic plane of the GB is bent via the movement of the triple junction, supposedly due to S3{111} micro-twins intersecting the GB, and a number of dislocations would be generated nearby the bending corner. Bundles of dislocation arrays expanding nearly parallel to the growth direction and honeycombed dislocation networks lying on a {111} plane nearly normal to the growth direction can coexist, suggesting that multiple slip systems would be operated when the dislocations are tangled.

    DOI: 10.1109/pvsc45281.2020.9300738

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  54. Application of artificial neural network to optimize sensor positions for accurate monitoring: An example with thermocouples in a crystal growth furnace

    Boucetta, A., Kutsukake, K., Kojima, T., Kudo, H., Matsumoto, T., Usami, N.

    Applied physics express   Vol. 12 ( 12 ) page: 125503 - 125503   2019.12

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    DOI: 10.7567/1882-0786/ab52a9

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  55. Study of local structure at crystalline rubrene grain boundaries via scanning transmission X-ray microscopy

    Foggiatto, A.L., Takeichi, Y., Ono, K., Suga, H., Takahashi, Y., Fusella, M.A., Dull, J.T., R, , B.P., Kutsukake, K., Sakurai, T.

    Organic electronics   Vol. 74   page: 315 - 320   2019.11

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    DOI: 10.1016/j.orgel.2019.07.021

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  56. Dependence of substrate work function on the energy-level alignment at organic-organic heterojunction interface

    Foggiatto, A.L., Suga, H., Takeichi, Y., Ono, K., Takahashi, Y., Kutsukake, K., Ueba, T., Kera, S., Sakurai, T.

    Japanese journal of applied physics   Vol. 58 ( SB )   2019.4

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    DOI: 10.7567/1347-4065/aaffbf

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  57. 3D visualization and analysis of dislocation clusters in multicrystalline silicon ingot by approach of data science Reviewed

    Hayama, Y., Matsumoto, T., Muramatsu, T., Kutsukake, K., Kudo, H., Usami, N.

    Solar energy materials and solar cells   Vol. 189   page: 239 - 244   2019.1

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    DOI: 10.1016/j.solmat.2018.06.008

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  58. The Prediction Model of Crystal Growth Simulation Built by Machine Learning and Its Applications

    UJIHARA Toru, TSUNOOKA Yosuke, HATASA Goki, KUTSUKAKE Kentaro, ISHIGURO Akio, MURAYAMA Kenta, NARUMI Taka, HARADA Shunta, TAGAWA Miho

    Vacuum and Surface Science   Vol. 62 ( 3 ) page: 136 - 140   2019

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    <p>The prediction model of the result of computed fluid dynamics simulation in SiC solution growth was constructed on neural network using machine learning. Utilizing the prediction model, we can optimize quickly crystal growth conditions. In addition, the real-time visualization system was also made using the prediction model.</p>

    DOI: 10.1380/vss.62.136

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  59. Machine learning for SiC top-seeded solution growth - Prediction, optimization and visualization Reviewed

    Toru Ujihara, Yosuke Tsunooka, Goki Hatasa, Can Zhu, Kentaro Kutsukake, Taka Narumi, Shunta Harada, Miho Tagawa

    CS MANTECH 2019 - 2019 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers     2019

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    © 2019 CS Mantech. All rights reserved. We are developing solution growth technique for high-quality SiC bulk crystal. In actual, we have achieved high-quality crystal with very-low-density of threading dislocations grown by controlling the surface morphology. In order to apply this technique to large-scale crystal growth, it is necessary to control supersaturation at growth surface, flow rate and flow direction of solvent in detail. However, there are many growth parameters which should be optimized. Simulation technique based on computational fluid dynamics (CFD) is often used. However, it is still difficult to optimize growth condition by utilizing simulation technique since the calculation speed of CFD simulation is not enough to optimize the growth conditions, exhaustively. In recent, informatics including machine learning is applied to various fields including materials science. In this study, we tried to apply machine learning to the analysis of the results of CFD. We could make the model to optimize the crystal growth parameters based on a neural network model. Using the model, the optimization time became 10000 times faster. This is just a trial of “Process Informatics”.

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  60. Growth of crystalline silicon for solar cells: Mono-like method

    Kutsukake, K.

    Handbook of photovoltaic silicon     2019

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    DOI: 10.1007/978-3-662-56472-1_35

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  61. Efficient estimation for red-zone in silicon wafers for solar cells using Level Set Estimation

    HOZUMI Shota, MATSUI Kota, KUTSUKAKE Kentaro, UJIHARA Toru, TAKEUCHI Ichiro

    Proceedings of the Annual Conference of JSAI   Vol. JSAI2019 ( 0 ) page: 2P4J201 - 2P4J201   2019

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    <p>For the task of estimating a spacial distribution of a physical quantity, it is common to x the measurement positions to meshgrid points evenly allocated along the coordinates of the space. However, such xed measurement positions often contain redundancy in the sense that not all the measurements in the meshgrid points are required for the target task. Especially when a measurement of the physical quantity is costly, it is thus benecial to allocate the measurement points adaptively and reduce the number of measurements. In this study, we applied Level Set Estimation (LSE), which is a method to efficiently estimate the boundary position, to carrier lifetime mapping of silicon for solar cells, and estimated the low quality region. Our approach can reasonably estimate the boundary position by measuring less than 1% position compare to conventional approach.</p>

    DOI: 10.11517/pjsai.jsai2019.0_2p4j201

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  62. Application of weighted Voronoi diagrams to analyze nucleation sites of multicrystalline silicon ingots Reviewed

    Muramatsu, T., Hayama, Y., Kutsukake, K., Maeda, K., Matsumoto, T., Kudo, H., Fujiwara, K., Usami, N.

    Journal of crystal growth   Vol. 499   page: 62 - 66   2018.10

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    DOI: 10.1016/j.jcrysgro.2018.07.028

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  63. Insight into physical processes controlling the mechanical properties of the wurtzite group-III nitride family Reviewed

    Yonenaga, I., Deura, M., Tokumoto, Y., Kutsukake, K., Ohno, Y.

    Journal of crystal growth   Vol. 500   page: 23 - 28   2018.8

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    DOI: 10.1016/j.jcrysgro.2018.08.001

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  64. Distribution of light-element impurities in Si crystals grown by seed-casting method Reviewed

    Nakayama, R., Kojima, T., Ogura, A., Kutsukake, K.

    Japanese journal of applied physics   Vol. 57 ( 8 )   2018.8

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    DOI: 10.7567/JJAP.57.08RB19

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  65. Optimization of Detection of Dislocation Clusters in the Photoluminescence Image by Image Processing

    Tajima Kazuya, Hayama Yusuke, Muramatsu Tetsuro, Kutsukake Kentaro, matsumoto Tetsuya, Kudo Hiroaki, Usami Noritaka

    JSAP Annual Meetings Extended Abstracts   Vol. 2018.1 ( 0 ) page: 3821 - 3821   2018.3

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    DOI: 10.11470/jsapmeeting.2018.1.0_3821

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  66. Mechanical properties of Cubic-BN(111) bulk single crystal evaluated by nanoindentation Reviewed

    Deura, M., Kutsukake, K., Ohno, Y., Yonenaga, I., Taniguchi, T.

    Physica status solidi (B) basic research   Vol. 255 ( 5 ) page: 1700473/1 - 1700473/4   2018

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    DOI: 10.1002/pssb.201700473

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  67. Nanoscopic analysis of oxygen segregation at tilt boundaries in silicon ingots using atom probe tomography combined with TEM and ab initio calculations Reviewed

    Ohno, Y., Inoue, K., Fujiwara, K., Kutsukake, K., Deura, M., Yonenaga, I., Ebisawa, N., Shimizu, Y., Inoue, K., Nagai, Y., Yoshida, H., Takeda, S., Tanaka, S., Kohyama, M.

    Journal of microscopy   Vol. 268 ( 3 ) page: 230 - 238   2017.12

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    DOI: 10.1111/jmi.12602

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  68. Impact of local atomic stress on oxygen segregation at tilt boundaries in silicon Reviewed

    Ohno Yutaka, Inoue Kaihei, Fujiwara Kozo, Kutsukake Kentaro, Deura Momoko, Yonenaga Ichiro, Ebisawa Naoki, Shimizu Yasuo, Inoue Koji, Nagai Yasuyoshi, Yoshida Hideto, Takeda Seiji, Tanaka Shingo, Kohyama Masanori

    APPLIED PHYSICS LETTERS   Vol. 110 ( 6 )   2017.2

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    DOI: 10.1063/1.4975814

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  69. Synthesis of highly-oriented wurtzite-type BN crystal and evaluation of its mechanical properties using nanoindentation Reviewed

    M. Deura, K. Kutsukake, Y. Ohno, I. Yonenaga, T. Taniguchi

    Japanese Journal of Applied Physics Rapid Communications   Vol. 56 ( 3 ) page: 030301/1 - 030301/4   2017.1

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    DOI: 10.7567/JJAP.56.030301

  70. Effect of grain boundary character of multicrystalline Si on external and internal (phosphorus) gettering of impurities Reviewed

    Joonwichien Supawan, Takahashi Isao, Kutsukake Kentaro, Usami Noritaka

    PROGRESS IN PHOTOVOLTAICS   Vol. 24 ( 12 ) page: 1615-1625   2016.12

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    DOI: 10.1002/pip.2795

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  71. Recombination activity of nickel, copper, and oxygen atoms segregating at grain boundaries in mono-like silicon crystals Reviewed

    Ohno Yutaka, Kutsukake Kentaro, Deura Momoko, Yonenaga Ichiro, Shimizu Yasuo, Ebisawa Naoki, Inoue Koji, Nagai Yasuyoshi, Yoshida Hideto, Takeda Seiji

    APPLIED PHYSICS LETTERS   Vol. 109 ( 14 )   2016.10

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    DOI: 10.1063/1.4964440

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  72. Characterization of silicon ingots: Mono-like versus high-performance multicrystalline Reviewed

    Kutsukake Kentaro, Deura Momoko, Ohno Yutaka, Yonenaga Ichiro

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 54 ( 8 )   2015.8

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    DOI: 10.7567/JJAP.54.08KD10

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  73. Elastic properties of indium nitrides grown on sapphire substrates determined by nano-indentation: In comparison with other nitrides Reviewed

    Yonenaga Ichiro, Ohkubo Yasushi, Deura Momoko, Kutsukake Kentaro, Tokumoto Yuki, Ohno Yutaka, Yoshikawa Akihiko, Wang Xin Qiang

    AIP ADVANCES   Vol. 5 ( 7 )   2015.7

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    DOI: 10.1063/1.4926966

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  74. Three-dimensional evaluation of gettering ability for oxygen atoms at small-angle tilt boundaries in Czochralski-grown silicon crystals Reviewed

    Ohno Yutaka, Inoue Kaihei, Fujiwara Kozo, Deura Momoko, Kutsukake Kentaro, Yonenaga Ichiro, Shimizu Yasuo, Inoue Koji, Ebisawa Naoki, Nagai Yasuyoshi

    APPLIED PHYSICS LETTERS   Vol. 106 ( 25 )   2015.6

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    DOI: 10.1063/1.4921742

    Web of Science

  75. Nanoscopic mechanism of Cu precipitation at small-angle tilt boundaries in Si Reviewed

    Ohno Yutaka, Inoue Kaihei, Kutsukake Kentaro, Deura Momoko, Ohsawa Takayuki, Yonenaga Ichiro, Yoshida Hideto, Takeda Seiji, Taniguchi Ryo, Otubo Hideki, Nishitani Sigeto R., Ebisawa Naoki, Shimizu Yasuo, Takamizawa Hisashi, Inoue Koji, Nagai Yasuyoshi

    PHYSICAL REVIEW B   Vol. 91 ( 23 )   2015.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1103/PhysRevB.91.235315

    Web of Science

  76. Czochralski growth of heavily tin-doped Si crystals Reviewed

    Yonenaga I., Taishi T., Inoue K., Gotoh R., Kutsukake K., Tokumoto Y., Ohno Y.

    JOURNAL OF CRYSTAL GROWTH   Vol. 395   page: 94-97   2014.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.jcrysgro.2014.02.052

    Web of Science

  77. Slip systems in wurtzite ZnO activated by Vickers indentation on {2(1)over-bar (1)over-bar0} and {10(1)over-bar0} surfaces at elevated temperatures Reviewed

    Ohno Y., Koizumi H., Tokumoto Y., Kutsukake K., Taneichi H., Yonenaga I.

    JOURNAL OF CRYSTAL GROWTH   Vol. 393   page: 119-122   2014.5

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    DOI: 10.1010/j.jo-vsgro.2013.11.033

    Web of Science

  78. Czochralski growth of heavily indium-doped Si crystals and co-doping effects of group-IV elements Reviewed

    Inoue K., Taishi T., Tokumoto Y., Kutsukake K., Ohno Y., Ohsawa T., Gotoh R., Yonenaga I.

    JOURNAL OF CRYSTAL GROWTH   Vol. 393   page: 45-48   2014.5

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.jcrysgro.2013.10.033

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  79. Mono-Like Silicon Growth Using Functional Grain Boundaries to Limit Area of Multicrystalline Grains Reviewed

    Kutsukake Kentaro, Usami Noritaka, Ohno Yutaka, Tokumoto Yuki, Yonenaga Ichiro

    IEEE JOURNAL OF PHOTOVOLTAICS   Vol. 4 ( 1 ) page: 84-87   2014.1

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    DOI: 10.1109/JPHOTOV.2013.2281730

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  80. Three-dimensional evaluation of gettering ability of Sigma 3{111} grain boundaries in silicon by atom probe tomography combined with transmission electron microscopy Reviewed

    Ohno Yutaka, Inoue Kaihei, Tokumoto Yuki, Kutsukake Kentaro, Yonenaga Ichiro, Ebisawa Naoki, Takamizawa Hisashi, Shimizu Yasuo, Inoue Koji, Nagai Yasuyoshi, Yoshida Hideto, Takeda Seiji

    APPLIED PHYSICS LETTERS   Vol. 103 ( 10 )   2013.9

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    DOI: 10.1063/1.4820140

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  81. Growth of Si single bulk crystals with low oxygen concentrations by the noncontact crucible method using silica crucibles without Si3N4 coating Reviewed

    Nakajima Kazuo, Murai Ryota, Morishita Kohei, Kutsukake Kentaro

    JOURNAL OF CRYSTAL GROWTH   Vol. 372   page: 121-128   2013.6

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    DOI: 10.1016/j.jcrysgro.2013.03.024

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  82. Interstitial oxygen behavior for thermal double donor formation in germanium: Infrared absorption studies Reviewed

    Inoue K., Taishi T., Tokumoto Y., Murao Y., Kutsukake K., Ohno Y., Suezawa M., Yonenaga I.

    JOURNAL OF APPLIED PHYSICS   Vol. 113 ( 7 )   2013.2

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    DOI: 10.1063/1.4792061

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  83. Control of Grain Boundary Propagation in Mono-Like Si: Utilization of Functional Grain Boundaries Reviewed

    Kutsukake Kentaro, Usami Noritaka, Ohno Yutaka, Tokumoto Yuki, Yonenaga Ichiro

    APPLIED PHYSICS EXPRESS   Vol. 6 ( 2 )   2013.2

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    DOI: 10.7567/APEX.6.025505

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  84. Nanoindentation Hardness and Elastic Modulus of AlGaN Alloys Reviewed

    Tokumoto Y., Taneichi H., Ohno Y., Kutsukake K., Miyake H., Hiramatsu K., Yonenaga I.

    2013 CONFERENCE ON LASERS AND ELECTRO-OPTICS PACIFIC RIM (CLEO-PR)     page: .   2013

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  85. Growth of Si Single Bulk Crystals Inside Si Melts By the Noncontact Crucible Method Using Silica Crucibles Without Coating Si3N4 Particles Reviewed

    Nakajima Kazuo, Murai Ryota, Morishita Kohei, Kutsukake Kentaro

    2013 IEEE 39TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)     page: 174-176   2013

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  86. Dislocation structure in AlN films induced by in situ transmission electron microscope nanoindentation (vol 112, 093526, 2012) Reviewed

    Tokumoto Yuki, Kutsukake Kentaro, Ohno Yutaka, Yonenaga Ichiro

    JOURNAL OF APPLIED PHYSICS   Vol. 112 ( 12 )   2012.12

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    DOI: 10.1063/1.4771927

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  87. Dislocation structure in AlN films induced by in situ transmission electron microscope nanoindentation Reviewed

    Tokumoto Yuki, Kutsukake Kentaro, Ohno Yutaka, Yonenaga Ichiro

    JOURNAL OF APPLIED PHYSICS   Vol. 112 ( 9 )   2012.11

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    DOI: 10.1063/1.4764928

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  88. Growth of high-quality multicrystalline Si ingots using noncontact crucible method Reviewed

    Nakajima Kazuo, Morishita Kohei, Murai Ryota, Kutsukake Kentaro

    JOURNAL OF CRYSTAL GROWTH   Vol. 355 ( 1 ) page: 38-45   2012.9

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    DOI: 10.1016/j.jcrysgro.2012.06.034

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  89. Modeling of incorporation of oxygen and carbon impurities into multicrystalline silicon ingot during one-directional growth Reviewed

    Kutsukake Kentaro, Ise Hideaki, Tokumoto Yuki, Ohno Yutaka, Nakajima Kazuo, Yonenaga Ichiro

    JOURNAL OF CRYSTAL GROWTH   Vol. 352 ( 1 ) page: 173-176   2012.8

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    DOI: 10.1016/j.jcrysgro.2012.02.004

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  90. Growth of multicrystalline Si ingots using noncontact crucible method for reduction of stress Reviewed

    Nakajima Kazuo, Murai Ryota, Morishita Kohei, Kutsukake Kentaro, Usami Noritaka

    JOURNAL OF CRYSTAL GROWTH   Vol. 344 ( 1 ) page: 6-11   2012.4

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    DOI: 10.1016/j.jcrysgro.2012.01.051

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  91. Growth of Heavily Indium doped Si Crystals by Co-Doping of Neutral Impurity Carbon or Germanium Reviewed

    Inoue Kaihei, Tokumoto Yuki, Kutsukake Kentaro, Ohno Yutaka, Yonenaga Ichiro

    MATERIALS INTEGRATION   Vol. 508   page: 220-223   2012

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    DOI: 10.4028/www.scientific.net/KEM.508.220

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  92. Growth of Multicrystalline Si Ingots for Solar Cells Using Noncontact Crucible Method without Touching the Crucible Wall Reviewed

    Nakajima Kazuo, Murai Ryota, Morishita Kohei, Kutsukake Kentaro, Usami Noritaka

    2012 38TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)     page: 1830-1832   2012

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  93. Generation mechanism of dislocations and their clusters in multicrystalline silicon during two-dimensional growth Reviewed

    Kutsukake Kentaro, Abe Takuro, Usami Noritaka, Fujiwara Kozo, Yonenaga Ichiro, Morishita Kohei, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   Vol. 110 ( 8 )   2011.10

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    DOI: 10.1063/1.3652891

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  94. Formation mechanism of twin boundaries during crystal growth of silicon Reviewed

    Kutsukake Kentaro, Abe Takuro, Usami Noritaka, Fujiwara Kozo, Morishita Kohei, Nakajima Kazuo

    SCRIPTA MATERIALIA   Vol. 65 ( 6 ) page: 556-559   2011.9

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    DOI: 10.1016/j.scriptamat.2011.06.028

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  95. Implementation of faceted dendrite growth on floating cast method to realize high-quality multicrsytalline Si ingot for solar cells Reviewed

    Usami Noritaka, Takahashi Isao, Kutsukake Kentaro, Fujiwara Kozo, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   Vol. 109 ( 8 )   2011.4

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    DOI: 10.1063/1.3576108

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  96. Arrangement of dendrite crystals grown along the bottom of Si ingots using the dendritic casting method by controlling thermal conductivity under crucibles Reviewed

    Nakajima Kazuo, Kutsukake Kentaro, Fujiwara Kozo, Morishita Kohei, Ono Satoshi

    JOURNAL OF CRYSTAL GROWTH   Vol. 319 ( 1 ) page: 13-18   2011.3

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    DOI: 10.1016/j.jcrysgro.2011.01.069

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  97. Pattern formation mechanism of a periodically faceted interface during crystallization of Si Reviewed

    Tokairin M., Fujiwara K., Kutsukake K., Kodama H., Usami N., Nakajima K.

    JOURNAL OF CRYSTAL GROWTH   Vol. 312 ( 24 ) page: 3670-3674   2010.12

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.jcrysgro.2010.09.059

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  98. Generation mechanism of dislocations during directional solidification of multicrystalline silicon using artificially designed seed Reviewed

    Takahashi Isao, Usami Noritaka, Kutsukake Kentaro, Stokkan Gaute, Morishita Kohei, Nakajima Kazuo

    JOURNAL OF CRYSTAL GROWTH   Vol. 312 ( 7 ) page: 897-901   2010.3

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    DOI: 10.1016/j.jcrysgro.2010.01.011

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  99. Relationship between grain boundary structures in Si multicrystals and generation of dislocations during crystal growth Reviewed

    Usami Noritaka, Yokoyama Ryusuke, Takahashi Isao, Kutsukake Kentaro, Fujiwara Kozo, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   Vol. 107 ( 1 )   2010.1

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    DOI: 10.1063/1.3276219

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  100. HIGH EFFICIENCY SOLAR CELLS OBTAINED FROM SMALL SIZE INGOTS WITH 30 CM Phi BY CONTROLLING THE DISTRIBUTION AND ORIENTATION OF DENDRITE CRYSTALS GROWN ALONG THE BOTTOM OF THE INGOTS Reviewed

    Nakajima K., Kutsukake K., Fujiwara K., Usami N., Ono S., Yamasaki

    35TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE     page: 817-819   2010

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  101. Computational Investigation of Relationship between Shear Stress and Multicrystalline Structure in Silicon Reviewed

    Takahashi Isao, Usami Noritaka, Kutsukake Kentaro, Morishita Kohei, Nakajima Kazuo

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 49 ( 4 )   2010

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    DOI: 10.1143/JJAP.49.04DP01

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  102. FORMATION MECHANISM OF TWIN BOUNDARIES IN SILICON MULTICRYSTALS DURING CRYSTAL GROWTH Reviewed

    Kutsukake K., Abe T., Usami N., Fujiwara K., Morishita K., Nakajima K.

    35TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE     page: .   2010

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  103. Growth behavior of faceted Si crystals at grain boundary formation Reviewed

    Fujiwara K., Tsumura S., Tokairin M., Kutsukake K., Usami N., Uda S., Nakajima K.

    JOURNAL OF CRYSTAL GROWTH   Vol. 312 ( 1 ) page: 19-23   2009.12

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    DOI: 10.1016/j.jcrysgro.2009.09.055

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  104. Formation mechanism of a faceted interface: In situ observation of the Si(100) crystal-melt interface during crystal growth Reviewed

    Tokairin M., Fujiwara K., Kutsukake K., Usami N., Nakajima K.

    PHYSICAL REVIEW B   Vol. 80 ( 17 )   2009.11

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    DOI: 10.1103/PhysRevB.80.174108

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  105. Microstructures of Si multicrystals and their impact on minority carrier diffusion length Reviewed

    Wang H. Y., Usami N., Fujiwara K., Kutsukake K., Nakajima K.

    ACTA MATERIALIA   Vol. 57 ( 11 ) page: 3268-3276   2009.6

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    DOI: 10.1016/j.actamat.2009.03.033

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  106. Quantitative analysis of subgrain boundaries in Si multicrystals and their impact on electrical properties and solar cell performance Reviewed

    Kutsukake Kentaro, Usami Noritaka, Ohtaniuchi Tsuyoshi, Fujiwara Kozo, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   Vol. 105 ( 4 )   2009.2

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    DOI: 10.1063/1.3079504

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  107. Structural origin of a cluster of bright spots in reverse bias electroluminescence image of solar cells based on Si multicrystals Reviewed

    Usami Noritaka, Kutsukake Kentaro, Fujiwara Kozo, Yonenaga Ichiro, Nakajima Kazuo

    APPLIED PHYSICS EXPRESS   Vol. 1 ( 7 )   2008.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1143/APEX.1.075001

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  108. Modification of local structures in multicrystals revealed by spatially resolved x-ray rocking curve analysis Reviewed

    Usami Noritaka, Kutsukake Kentaro, Fujiwara Kozo, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   Vol. 102 ( 10 )   2007.11

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    DOI: 10.1063/1.2816207

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  109. Influence of structural imperfection of Sigma 5 grain boundaries in bulk multicrystalline Si on their electrical activities Reviewed

    Kutsukake Kentaro, Usami Noritaka, Fujiwara Kozo, Nose Yoshitaro, Nakajima Kazuo

    JOURNAL OF APPLIED PHYSICS   Vol. 101 ( 6 )   2007.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.2710348

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  110. Modification of local structure and its influence on electrical activity of near (310) Sigma 5 grain boundary in bulk silicon Reviewed

    Kutsukake Kentaro, Usami Noritaka, Fujiwara Kozo, Nose Yoshitaro, Sugawara Takamasa, Shishido Toetsu, Nakajima Kazuo

    MATERIALS TRANSACTIONS   Vol. 48 ( 2 ) page: 143-147   2007.2

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    DOI: 10.2320/matertrans.48.143

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  111. Control of strain status in SiGe thin film by epitaxial growth on Si with buried porous layer Reviewed

    Usami Noritaka, Kutsukake Kentaro, Nakajima Kazuo, Amtablian Sevak, Fave Alain, Lemiti Mustapha

    APPLIED PHYSICS LETTERS   Vol. 90 ( 3 )   2007.1

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    DOI: 10.1063/1.2433025

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  112. Realization of bulk multicrystalline silicon with controlled grain boundaries by utilizing spontaneous modification of grain boundary configuration Reviewed

    Usami N, Kutsukake K, Sugawara T, Fujwara K, Pan W, Nose Y, Shishido T, Nakajima K

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   Vol. 45 ( 3A ) page: 1734-1737   2006.3

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    DOI: 10.1143/JJAP.45.1734

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  113. Growth of multicrystalline Si with controlled grain boundary configuration by the floating zone technique Reviewed

    Kitamura M, Usami N, Sugawara T, Kutsukake K, Fujiwara K, Nose Y, Shishido T, Nakajima K

    JOURNAL OF CRYSTAL GROWTH   Vol. 280 ( 3-4 ) page: 419-424   2005.7

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    DOI: 10.1016/j.jcrysgro.2005.04.049

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  114. Growth of SiGe-on-insulator and its application as a substrate for epitaxy of strained-Si layer Reviewed

    Usami Noritaka, Kutsukake Kentaro, Pan Wugen, Fujiwara Kozo, Ujihara Toru, Zhang Baoping, Yokoyama Takashi, Nakajima Kazuo

    JOURNAL OF CRYSTAL GROWTH   Vol. 275 ( 1-2 ) page: E1203-E1207   2005.2

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    DOI: 10.1016/j.jcrysgro.2004.11.141

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  115. Floating zone growth of Si bicrystals using seed crystals with artificially designed grain boundary configuration Reviewed

    Usami N, Kitamura M, Sugawara T, Kutsukake K, Ohdaira K, Nose Y, Fujiwara K, Shishido T, Nakajima K

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS   Vol. 44 ( 24-27 ) page: L778-L780   2005

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    DOI: 10.1143/JJAP.44.L778

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  116. On the origin of strain fluctuation in strained-Si grown on SiGe-on-insulator and SiGe virtual substrates Reviewed

    Kutsukake K, Usami N, Ujihara T, Fujiwara K, Sazaki G, Nakajima K

    APPLIED PHYSICS LETTERS   Vol. 85 ( 8 ) page: 1335-1337   2004.8

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    DOI: 10.1063/1.1784036

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  117. Fabrication of SiGe-on-insulator by rapid thermal annealing of Ge on Si-on-insulator substrate Reviewed

    Kutsukake K, Usami N, Fujiwara K, Ujihara T, Sazaki G, Nakajima K, Zhang BP, Segawa Y

    APPLIED SURFACE SCIENCE   Vol. 224 ( 1-4 ) page: 95-98   2004.3

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    DOI: 10.1016/j.apsusc.2003.08.100

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  118. Fabrication of SiGe-on-insulator through thermal diffusion of Ge on Si-on-insulator substrate Reviewed

    Kutsukake K, Usami N, Fujiwara K, Ujihara T, Sazaki G, Zhang BP, Segawa Y, Nakajima K

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   Vol. 42 ( 3A ) page: L232-L234   2003.3

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    DOI: 10.1143/JJAP.42.L232

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Books 5

  1. 多結晶マテリアルズインフォマティクス

    宇佐美 徳隆, 大野 裕 (結晶工学), 沓掛 健太朗, 工藤 博章, 小島 拓人 (結晶工学), 横井 達矢

    共立出版  2024  ( ISBN:9784320140035

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    Language:Japanese

    CiNii Books

  2. データ駆動型材料開発 : オントロジーとマイニング、計測と実験装置の自動制御

    ( Role: Contributor ,  無機材料プロセス開発MI, pp. 131-139)

    エヌ・ティー・エス  2021.11  ( ISBN:9784860437596

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    Total pages:3, 6, 244, 6, 図版26p   Language:Japanese

    CiNii Books

  3. マテリアルズインフォマティクスのためのデータ作成とその解析、応用事例

    ( Role: Contributor ,  結晶成長プロセスへの機械学習応用, pp. 311-316)

    技術情報協会  2021.7  ( ISBN:9784861048548

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    Total pages:500p   Language:Japanese

    CiNii Books

  4. マテリアルズ・インフォマティクスQ&A集 : 解析実務と応用事例

    ( Role: Contributor ,  第7章問13:MIによる半導体材料関連の開発例とは?, pp. 361-366, 第8章第2節問2:MIによるエレクトロニクス/半導体材料関連での研究状況とは?, pp. 479-486)

    情報機構  2020.12  ( ISBN:9784865022049

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    Total pages:xix, 597p   Language:Japanese

    CiNii Books

  5. Handbook of Solar Silicon

    ( Role: Contributor ,  Growth of crystalline silicon for solar cells: the mono-like method, pp. 1-20)

    2018 

MISC 1

  1. Design of High-quality SiC Solution Growth Condition Assisted by Machine Learning

    Harada Shunta, Lin Hung-Yi, Tsunooka Yosuke, Zhu Can, Narumi Taka, Kutsukake Kentaro, Ujihara Toru

    Materia Japan   Vol. 59 ( 3 ) page: 145 - 152   2020

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    Language:Japanese   Publisher:The Japan Institute of Metals and Materials  

    DOI: 10.2320/materia.59.145

    CiNii Books

    CiNii Research

Presentations 6

  1. 物理計測の適応的マッピング Invited

    沓掛健太朗

    インフォマティクスと連携したモノづくりと計測技術 

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    Event date: 2018.1

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:名古屋大学東山キャンパスES総合館ESホール   Country:Japan  

  2. データ科学を駆使した適応的マッピング測定 Invited

    沓掛健太朗

    日本学術振興会「結晶加工と評価技術」第145委員会 第156回研究会 

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    Event date: 2017.12

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:明治大学 駿河台キャンパス グローバルフロント   Country:Japan  

  3. データ科学的手法による効率的なマッピング(3):測定点移動距離の検討

    沓掛健太朗, 菊地亮太, 大野裕, 下山幸治

    第78回応用物理学会秋季学術講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場   Country:Japan  

  4. 太陽電池用シリコンのキャスト成長における欠陥制御

    学振175委員会 第6回次世代シリコン太陽電池分科会研究会  2017 

  5. データ科学的手法を用いた効率的なマッピングの提案

    学振第175委員会 第14回「次世代の太陽光発電システム」シンポジウム  2017 

  6. 太陽電池用のシリコン材料の開発

    東北大学多元物質科学研究所 若手研究者交流講演会  2017 

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KAKENHI (Grants-in-Aid for Scientific Research) 7

  1. 半導体プロセスメタファクトリーの基盤技術開発

    2023.8 - 2025.3

    NEDO  先導研究プログラム  新産業・革新技術創出に向けた先導研究プログラム

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    Authorship:Coinvestigator(s) 

  2. Complex crystal growth modeling and process design in latent space

    Grant number:22H00300  2022.4 - 2025.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

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    Authorship:Coinvestigator(s) 

  3. SiCバルク成長技術の革新に向けたプロセスインフォマティクス技術の研究開発

    2021.8 - 2023.3

    NEDO  先導研究プログラム  マテリアル革新技術先導研究プログラム

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    Authorship:Coinvestigator(s) 

  4. AIとオペレータの『意味』を介したコミュニケーションによる結晶成長技術開発

    2020.8 - 2025.3

    NEDO  人と共に進化する次世代人工知能に関する技術開発事業  人と共に進化するAIシステムの基盤技術開発, 人の意図や知識を理解して学習するAIの基盤技術開発

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    Authorship:Coinvestigator(s) 

  5. Quantification of electrical properties of defects in semiconductor crystals from a luminescence image

    Grant number:16H03856  2016.4 - 2019.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (B)

    Kutsukake Kentaro, Tanikawa Tomoyuki

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    Authorship:Principal investigator 

    Grant amount:\16770000 ( Direct Cost: \12900000 、 Indirect Cost:\3870000 )

    We worked in research and development of a method to quantify electrical properties of defects in semiconductor crystals from a luminescence image. High quality crystals of BaSi2 and SiC obtained in this research were used as measurement samples for the development. We obtained an accurate, high sensitivity, high speed, and high efficiency quantification method by combining computational methods such as carrier simulation, image processing and machine learning with fundamental physics of semiconductor and crystal defects. We work toward practical use of the obtained methods, techniques and knowledge.

  6. Investigation of physical properties of grain boundary in organic semiconductor-based polycrystalline thin films

    Grant number:16K04943  2016.4 - 2019.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (C)

    SAKURAI TAKEAKI, Rand Barry

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    Authorship:Coinvestigator(s) 

    Identifying and controlling properties of grain boundaries in organic thin films is essential to reducing the energy loss of the device. In this study, we clarified the correlation between the aggregation structure (defect structure) of the molecules near the grain boundaries and their electronic properties. We demonstrated in detail what kind of grain boundary structure causes the energy loss of the devices.

  7. Study of melt growth mechanisms of multicrystalline Si by in situ observations

    Grant number:26246016  2014.6 - 2017.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

    Fujiwara Kozo

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    The fundamental melt growth mechanisms of multicrystalline Si (mc-Si) were investigated to obtain valuable information for the development of crystal growth technology of mc-Si ingots for solar cells. We newly developed an in situ observation system for the direct observation of crystal/melt interface at high temperature as 1400℃. The effect of grain boundaries on the crystal growth behaviors was clarified. On the basis fo the fundamental understanding of crystal growth mechanisms, we developed a crystal growth technology for mc-Si ingot. We obtained high quality mc-Si ingot in comparison with the conventional one.

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