ASET 優秀研究員“SiO2およびポリマーのプラズマエッチング表面反応の研究”

2003年   技術研究組合　超先端電子技術開発機構（ASET）  

2003 spring MRS best poster award: E3.28 VAPOR TREATMENT OF COPPER SURFACE USING ORGANIC ACIDS

2003年   Material Research Society  

High-performance glass filters for capturing and culturing circulating tumor cells and cancer-associated fibroblasts 査読有り

Tanaka, H; Iwata, D; Shibata, Y; Hase, T; Onoshima, D; Yogo, N; Shibata, H; Sato, M; Ishikawa, K; Nagasawa, I; Hasegawa, Y; Ishii, M; Baba, Y; Hori, M

SCIENTIFIC REPORTS   13 巻 ( 1 )   2023年3月

Generation and measurement of low-temperature plasma for cancer therapy: a historical review 査読有り

Ishikawa, K; Takeda, K; Yoshimura, S; Kondo, T; Tanaka, H; Toyokuni, S; Nakamura, K; Kajiyama, H; Mizuno, M; Hori, M

FREE RADICAL RESEARCH   57 巻 ( 3 ) 頁： 239 - 270   2023年3月

Efficacy of periodic cold plasma treatment in a paddy to produce white-core grains in brewer's rice cultivar Yamadanishiki 査読有り

Hashizume, H; Kitano, H; Mizuno, H; Abe, A; Yuasa, G; Tohno, S; Tanaka, H; Ishikawa, K; Matsumoto, S; Sakakibara, H; Hirosue, Y; Maeshima, M; Mizuno, M; Hori, M

FREE RADICAL RESEARCH   57 巻 ( 3 ) 頁： 161 - 173   2023年3月

Cancer-specific cytotoxicity of Ringer's acetate solution irradiated by cold atmospheric pressure plasma 査読有り

Miron, C; Ishikawa, K; Kashiwagura, S; Suda, Y; Tanaka, H; Nakamura, K; Kajiyama, H; Toyokuni, S; Mizuno, M; Hori, M

FREE RADICAL RESEARCH   57 巻 ( 2 ) 頁： 91 - 104   2023年2月

Plasma-Assisted Priming: Improved Germination and Seedling Performance of Papaya 査読有り

Xi, DK; Yap, SL; Kumar, NN; Toh, CC; Ishikawa, K; Hori, M

SAINS MALAYSIANA   52 巻 ( 2 ) 頁： 599 - 611   2023年2月

GaN damage-free cyclic etching by sequential exposure to Cl₂ plasma and Ar plasma with low Ar<SUP>+</SUP>-ion energy at substrate temperature of 400 °C 査読有り

Nakamura, S; Tanide, A; Kimura, T; Nadahara, S; Ishikawa, K; Oda, O; Hori, M

JOURNAL OF APPLIED PHYSICS   133 巻 ( 4 )   2023年1月

Mechanical properties of maze-like carbon nanowalls synthesized by the radial injection plasma enhanced chemical vapor deposition method 査読有り

Ghodke, S; Murashima, M; Christy, D; Van Nong, N; Ishikawa, K; Oda, O; Umehara, N; Hori, M

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING   862 巻   2023年1月

Effects of plasma-activated Ringer's lactate solution on cancer cells: evaluation of genotoxicity 査読有り

Liu, Y; Nakatsu, Y; Tanaka, H; Koga, K; Ishikawa, K; Shiratani, M; Hori, M

GENES AND ENVIRONMENT   45 巻 ( 1 )   2023年1月

Editorial: Prospects of plasma generated species interaction with organic and inorganic materials 査読有り

Attri, P; Koga, K; Kurita, H; Ishikawa, K; Shiratani, M

FRONTIERS IN PHYSICS   10 巻   2023年1月

Plasma activated Ringer's lactate solution 査読有り

Tanaka, H; Mizuno, M; Ishikawa, K; Miron, C; Okazaki, Y; Toyokuni, S; Nakamura, K; Kajiyama, H; Hori, M

FREE RADICAL RESEARCH   57 巻 ( 1 ) 頁： 14 - 20   2023年1月

Biocompatibility of conformal silicon carbide on carbon nanowall scaffolds 査読有り

Ono, K; Koide, T; Ishikawa, K; Tanaka, H; Kondo, H; Sugawara-Narutaki, A; Jin, Y; Yasuhara, S; Hori, M; Takeuchi, W

JAPANESE JOURNAL OF APPLIED PHYSICS   62 巻 ( SA )   2023年1月

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies 査読有り

Kambara, M; Kawaguchi, S; Lee, HJ; Ikuse, K; Hamaguchi, S; Ohmori, T; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   62 巻 ( SA )   2023年1月

Effects of High-Quality Carbon Nanowalls Ionization-Assisting Substrates on Surface-Assisted Laser Desorption/Ionization Mass Spectrometry Performance 査読有り

Sakai, R; Kondo, H; Ishikawa, K; Ohta, T; Hiramatsu, M; Tanaka, H; Hori, M

NANOMATERIALS   13 巻 ( 1 )   2023年1月

Impact of microsecond-pulsed plasma-activated water on papaya seed germination and seedling growth 査読有り

Xi, DK; Zhang, XH; Yang, SZ; Yap, SS; Ishikawa, K; Hori, M; Yap, SL

CHINESE PHYSICS B   31 巻 ( 12 )   2022年12月

Indoor Floor Heel Mark Removal Using Spark Discharges and Pressurized Airflow 査読有り

Sakamoto, Y; Tsutsumi, T; Tanaka, H; Ishikawa, K; Hashizume, H; Hori, M

COATINGS   12 巻 ( 12 )   2022年12月

Dry etching of ternary metal carbide TiAlC via surface modification using floating wire-assisted vapor plasma 査読有り

Nguyen, TTN; Shinoda, K; Hamamura, H; Maeda, K; Yokogawa, K; Izawa, M; Ishikawa, K; Hori, M

SCIENTIFIC REPORTS   12 巻 ( 1 )   2022年11月

Carbon Layer Formation on Hexagonal Boron Nitride by Plasma Processing in Hydroquinone Aqueous Solution 査読有り

Inoue, K; Sakakibara, N; Goto, T; Ito, T; Shimizu, Y; Hakuta, Y; Ishikawa, K; Hori, M; Terashima, K

ACS APPLIED MATERIALS & INTERFACES     2022年11月

Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis 査読有り

Kurokawa, J; Kondo, H; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

VACUUM   205 巻   2022年11月

Dissociation channels of c-C₄F₈ to C₂F₄ in reactive plasma 査読有り

Hayashi, T; Ishikawa, K; Sekine, M; Hori, M; Lwayama, H

JAPANESE JOURNAL OF APPLIED PHYSICS   61 巻 ( 10 )   2022年10月

In-liquid plasma synthesis of iron-nitrogen-doped carbon nanoflakes with high catalytic activity 査読有り

Kondo, H; Hamaji, R; Amano, T; Ishikawa, K; Sekine, M; Hiramatsu, M; Hori, M

PLASMA PROCESSES AND POLYMERS   19 巻 ( 8 )   2022年8月

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O₂/C₄F₈ plasma etching process 査読有り

Sahu, BB; Nakane, K; Ishikawa, K; Sekine, M; Tsutsumi, T; Gohira, T; Ohya, Y; Ohno, N; Hori, M

PHYSICAL CHEMISTRY CHEMICAL PHYSICS   24 巻 ( 22 ) 頁： 13883 - 13896   2022年6月

Low-temperature reduction of SnO₂ by floating wire-assisted medium-pressure H₂/Ar plasma 査読有り

Nguyen, TTN; Sasaki, M; Hsiao, SN; Tsutsumi, T; Ishikawa, K; Hori, M

PLASMA PROCESSES AND POLYMERS   19 巻 ( 6 )   2022年6月

Cytotoxicity of plasma-irradiated lactate solution produced under atmospheric airtight conditions and generation of the methyl amino group 査読有り

Ito, D; Iwata, N; Ishikawa, K; Nakamura, K; Hashizume, H; Miron, C; Tanaka, H; Kajiyama, H; Toyokuni, S; Mizuno, M; Hori, M

APPLIED PHYSICS EXPRESS   15 巻 ( 5 )   2022年5月

Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Hanaoka, Y; Izawa, M; Ishikawa, K; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   40 巻 ( 2 )   2022年3月

Scaffolds with isolated carbon nanowalls promote osteogenic differentiation through Runt-related transcription factor 2 and osteocalcin gene expression of osteoblast-like cells 査読有り

Ichikawa, T; Ishikawa, K; Tanaka, H; Shimizu, N; Hori, M

AIP ADVANCES   12 巻 ( 2 )   2022年2月

Enhancement of ethanol production and cell growth in budding yeast by direct irradiation of low-temperature plasma 査読有り

Tanaka, H; Matsumura, S; Ishikawa, K; Hashizume, H; Ito, M; Nakamura, K; Kajiyama, H; Kikkawa, F; Ito, M; Ohno, K; Okazaki, Y; Toyokuni, S; Mizuno, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   61 巻 ( SA )   2022年1月

Towards prevention and prediction of infectious diseases with virus sterilization using ultraviolet light and low-temperature plasma and bio-sensing devices for health and hygiene care 査読有り 国際共著

Kumagai, S; Nishigori, C; Takeuchi, T; Bruggeman, P; Takashima, K; Takahashi, H; Kaneko, T; Choi, EH; Nakazato, K; Kambara, M; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   61 巻 ( SA ) 頁： SA0808   2022年1月

Perspectives on functional nitrogen science and plasma-based <i>in situ</i> functionalization 査読有り

Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   61 巻 ( SA ) 頁： SA0802   2022年1月

Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems 査読有り 国際共著

Kaneko, T; Kato, H; Yamada, H; Yamamoto, M; Yoshida, T; Attri, P; Koga, K; Murakami, T; Kuchitsu, K; Ando, S; Nishikawa, Y; Tomita, K; Ono, R; Ito, T; Ito, AM; Eriguchi, K; Nozaki, T; Tsutsumi, T; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   61 巻 ( SA ) 頁： SA0805   2022年1月

On the Etching Mechanism of Highly Hydrogenated SiN Films by CF₄/D₂ Plasma: Comparison with CF₄/H₂ 査読有り

Hsiao, SN; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

COATINGS   11 巻 ( 12 ) 頁： 1535   2021年12月

プラズマがん治療 招待有り 査読有り

石川健治，堀勝

静電気学会誌   45 巻 ( 6 ) 頁： 206 - 212   2021年11月

Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF₄/H₂ plasma at different substrate temperatures 査読有り

Hsiao, SN; Britun, N; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

PLASMA PROCESSES AND POLYMERS   18 巻 ( 11 ) 頁： 2100078   2021年11月

Plasma-activated Ringer's lactate solution inhibits the cellular respiratory system in HeLa cells 査読有り

Tanaka, H; Maeda, S; Nakamura, K; Hashizume, H; Ishikawa, K; Ito, M; Ohno, K; Mizuno, M; Motooka, Y; Okazaki, Y; Toyokuni, S; Kajiyama, H; Kikkawa, F; Hori, M

PLASMA PROCESSES AND POLYMERS   18 巻 ( 10 ) 頁： 2100056   2021年10月

Low temperature plasma irradiation products of sodium lactate solution that induce cell death on U251SP glioblastoma cells were identified 査読有り

Tanaka, H; Hosoi, Y; Ishikawa, K; Yoshitake, J; Shibata, T; Uchida, K; Hashizume, H; Mizuno, M; Okazaki, Y; Toyokuni, S; Nakamura, K; Kajiyama, H; Kikkawa, F; Hori, M

SCIENTIFIC REPORTS   11 巻 ( 1 ) 頁： 18488   2021年9月

先端デバイス構造を実現する超絶ドライエッチング技術の最前線 おわりに 招待有り 査読有り

石川健治，竹田圭吾

プラズマ核融合学会誌   97 巻 ( 9 ) 頁： 534 - 536   2021年9月

Effects of free radicals generated by atmospheric pressure plasma on physical actions and biochemical relaxations (PACR) 招待有り 査読有り

Kenji Ishikawa, Hiroshi Hashizume, Camelia Miron, Hiromasa Tanaka, and Masaru Hori

Radiation biology research communications   56 巻 ( 3 ) 頁： 280 - 294   2021年9月

窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス 招待有り 査読有り

堤隆嘉，石川健治，近藤博基，関根誠，堀勝

プラズマ核融合学会誌   97 巻 ( 9 ) 頁： 517 - 521   2021年9月

先端デバイス構造を実現する超絶ドライエッチング技術の最前線 はじめに 招待有り 査読有り

石川健治，竹田圭吾

プラズマ核融合学会誌   97 巻 ( 9 ) 頁： 508 - 510   2021年9月

Novel Method of Rebound Tailing Pulse (RTP) for Water Dissociation 査読有り

Shimizu, N; Borude, RR; Tanaka, R; Ishikawa, K; Oda, O; Hosoe, H; Ino, S; Inoue, Y; Hori, M

IEEE TRANSACTIONS ON PLASMA SCIENCE   49 巻 ( 9 ) 頁： 2893 - 2900   2021年9月

Lysosomal nitric oxide determines transition from autophagy to ferroptosis after exposure to plasma-activated Ringer's lactate 査読有り

Jiang, L; Zheng, H; Lyu, QY; Hayashi, S; Sato, K; Sekido, Y; Nakamura, K; Tanaka, H; Ishikawa, K; Kajiyama, H; Mizuno, M; Hori, M; Toyokuni, S

REDOX BIOLOGY   43 巻   頁： 101989   2021年7月

Brain cell proliferation in adult rats after irradiation with nonequilibrium atmospheric pressure plasma 査読有り

Yamato, M; Tamura, Y; Tanaka, H; Ishikawa, K; Ikehara, Y; Hori, M; Kataoka, Y

APPLIED PHYSICS EXPRESS   14 巻 ( 6 ) 頁： 067002   2021年6月

Hydrogen peroxide in lactate solutions irradiated by non-equilibrium atmospheric pressure plasma 査読有り

Liu, Y; Ishikawa, K; Miron, C; Hashizume, H; Tanaka, H; Hori, M

PLASMA SOURCES SCIENCE & TECHNOLOGY   30 巻 ( 4 )   2021年4月

Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF₄/H₂ plasma 査読有り

Hsiao, SN; Nakane, K; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

APPLIED SURFACE SCIENCE   542 巻   頁： 148550   2021年3月

Selective etching of SiN against SiO₂ and poly-Si films in hydrofluoroethane chemistry with a mixture of CH₂FCHF₂, O₂, and Ar 査読有り

Hsiao, SN; Ishikawa, K; Hayashi, T; Ni, JW; Tsutsumi, T; Sekine, M; Hori, M

APPLIED SURFACE SCIENCE   541 巻   頁： 148439   2021年3月

FOREWORD Mechanistic understanding of cold atmospheric plasma applications 査読有り

Kurihara, K; Ishikawa, K; Takaki, K; Shiratani, M

JAPANESE JOURNAL OF APPLIED PHYSICS   60 巻 ( 2 )   2021年2月

Growth inhibition effect on <i>Trypanosoma brucei</i> <i>gambiense</i> by the oxidative stress supplied from low-temperature plasma at atmospheric pressure 査読有り

Yokoyama, N; Sivakumar, T; Ikehara, S; Akimoto, Y; Yamaguchi, T; Wakai, K; Ishikawa, K; Hori, M; Shimizu, T; Sakakita, H; Ikehara, Y

JAPANESE JOURNAL OF APPLIED PHYSICS   60 巻 ( 2 ) 頁： 020601   2021年2月

Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS) 査読有り

Sakai, R; Ichikawa, T; Kondo, H; Ishikawa, K; Shimizu, N; Ohta, T; Hiramatsu, M; Hori, M

NANOMATERIALS   11 巻 ( 2 ) 頁： 262   2021年2月

Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture 査読有り 国際共著

Attri, P; Ishikawa, K; Okumura, T; Koga, K; Shiratani, M; Mildaziene, V

SCIENTIFIC REPORTS   11 巻 ( 1 ) 頁： 2539   2021年1月

Inactivation mechanism of fungal spores through oxygen radicals in atmospheric-pressure plasma 査読有り

Ito, M; Hashizume, H; Oh, JS; Ishikawa, K; Ohta, T; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   60 巻 ( 1 ) 頁： 010503   2021年1月

Reduction in photon-induced interface defects by optimal pulse repetition rate in the pulse-modulated inductively coupled plasma 査読有り

Miyoshi, Y; Ishikawa, K; Sekine, M; Hori, M; Tatsumi, T

JAPANESE JOURNAL OF APPLIED PHYSICS   60 巻 ( 1 ) 頁： 010906   2021年1月

Insights into normothermic treatment with direct irradiation of atmospheric pressure plasma for biological applications 査読有り

Yoshimura, S; Otsubo, Y; Yamashita, A; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   60 巻 ( 1 ) 頁： 010502   2021年1月

Improvement of yield and grain quality by periodic cold plasma treatment with rice plants in a paddy field 査読有り

Hashizume, H; Kitano, H; Mizuno, H; Abe, A; Yuasa, G; Tohno, S; Tanaka, H; Ishikawa, K; Matsumoto, S; Sakakibara, H; Nikawa, S; Maeshima, M; Mizuno, M; Hori, M

PLASMA PROCESSES AND POLYMERS   18 巻 ( 1 ) 頁： 2000181   2021年1月

Cancer Treatments Using Low-Temperature Plasma 査読有り

Tanaka, H; Mizuno, M; Ishikawa, K; Toyokuni, S; Kajiyama, H; Kikkawa, F; Hori, M

CURRENT MEDICINAL CHEMISTRY   28 巻 ( 41 ) 頁： 8549 - 8558   2021年

Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature 査読有り

Sugiura, H; Kondo, H; Higuchi, K; Arai, S; Hamaji, R; Tsutsumi, T; Ishikawa, K; Hori, M

CARBON   170 巻   頁： 93 - 99   2020年12月

Influence of chamber pressure on the crystal quality of homo-epitaxial GaN grown by radical-enhanced MOCVD (REMOCVD) 査読有り

Amalraj, FW; Shimizu, N; Oda, O; Ishikawa, K; Hori, M

JOURNAL OF CRYSTAL GROWTH   549 巻   頁： 125863   2020年11月

Steering of surface discharges on through-glass-vias combined with high-density nonequilibrium atmospheric pressure plasma generation 査読有り

Sato, Y; Katsuno, K; Odaka, H; Imajyo, N; Ishikawa, K; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   53 巻 ( 43 ) 頁： 534302   2020年10月

Formation of spherical Sn particles by reducing SnO₂ film in floating wire-assisted H₂/Ar plasma at atmospheric pressure 査読有り

Nguyen, TTN; Sasaki, M; Tsutsumi, T; Ishikawa, K; Hori, M

SCIENTIFIC REPORTS   10 巻 ( 1 ) 頁： 17770   2020年10月

Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources 査読有り

Tanide, A; Nakamura, S; Horikoshi, A; Takatsuji, S; Kimura, T; Kinose, K; Nadahara, S; Nishikawa, M; Ebe, A; Ishikawa, K; Oda, O; Hori, M

ACS OMEGA   5 巻 ( 41 ) 頁： 26776 - 26785   2020年10月

Laser-induced-plasma-activated medium enables killing of HeLa cells 査読有り

Kurokawa, Y; Takeda, K; Ishikawa, K; Tanaka, H; Hori, M

APPLIED PHYSICS EXPRESS   13 巻 ( 10 ) 頁： 106001   2020年10月

Adjusted multiple gases in the plasma flow induce differential antitumor potentials of plasma-activated solutions 査読有り

Nakamura, K; Yoshikawa, N; Yoshihara, M; Ikeda, Y; Higashida, A; Niwa, A; Jindo, T; Tanaka, H; Ishikawa, K; Mizuno, M; Toyokuni, S; Hori, M; Kikkawa, F; Kajiyama, H

PLASMA PROCESSES AND POLYMERS   17 巻 ( 10 ) 頁： 1900259   2020年10月

Small size gold nanoparticles enhance apoptosis-induced by cold atmospheric plasma via depletion of intracellular GSH and modification of oxidative stress 査読有り

Jawaid, P; Rehman, MU; Zhao, QL; Misawa, M; Ishikawa, K; Hori, M; Shimizu, T; Saitoh, J; Noguchi, K; Kondo, T

CELL DEATH DISCOVERY   6 巻 ( 1 ) 頁： 83   2020年9月

Numerical analysis of coaxial dielectric barrier helium discharges: three-stage mode transitions and internal bullet propagation 査読有り

Sato, Y; Ishikawa, K; Tsutsumi, T; Hori, M

APPLIED PHYSICS EXPRESS   13 巻 ( 8 ) 頁： 086001   2020年8月

Plasma Agriculture from Laboratory to Farm: A Review 査読有り

Attri, P; Ishikawa, K; Okumura, T; Koga, K; Shiratani, M

PROCESSES   8 巻 ( 8 ) 頁： 1002   2020年8月

Non-thermal plasma-activated lactate solution kills U251SP glioblastoma cells in an innate reductive manner with altered metabolism 査読有り

Ishikawa, K; Hosoi, Y; Tanaka, H; Jiang, L; Toyokuni, S; Nakamura, K; Kajiyama, H; Kikkawa, F; Mizuno, M; Hori, M

ARCHIVES OF BIOCHEMISTRY AND BIOPHYSICS   688 巻   頁： 108414   2020年7月

<i>In situ</i> surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar<SUP>+</SUP> ions and Cl radicals 査読有り

Hasegawa, M; Tsutsumi, T; Tanide, A; Nakamura, S; Kondo, H; Ishikawa, K; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   38 巻 ( 4 ) 頁： 042602   2020年7月

Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity 査読有り

Sato, Y; Ishikawa, K; Tsutsumi, T; Ui, A; Akita, M; Oka, S; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   53 巻 ( 26 ) 頁： 265204   2020年6月

In-plane modification of hexagonal boron nitride particles via plasma in solution 査読有り

Ito, T; Goto, T; Inoue, K; Ishikawa, K; Kondo, H; Hori, M; Shimizu, Y; Hakuta, Y; Terashima, K

APPLIED PHYSICS EXPRESS   13 巻 ( 6 ) 頁： 066001   2020年6月

Characterization of a microsecond pulsed non-equilibrium atmospheric pressure Ar plasma using laser scattering and optical emission spectroscopy 査読有り

Jia, FD; Wu, Y; Min, Q; Su, MG; Takeda, K; Ishikawa, K; Kondo, H; Sekine, M; Hori, M; Zhong, ZP

PLASMA SCIENCE & TECHNOLOGY   22 巻 ( 6 ) 頁： 065404   2020年6月

Electronic properties and primary dissociation channels of fluoromethane compounds 査読有り

Hayashi, T; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   59 巻 ( SJ ) 頁： SJJE02   2020年6月

Electron spin resonance as a tool to monitor the influence of novel processing technologies on food properties 査読有り 国際共著

Barba, FJ; Roohinejad, S; Ishikawa, K; Leong, SY; Bekhit, AEA; Saraiva, JA; Lebovka, N

TRENDS IN FOOD SCIENCE & TECHNOLOGY   100 巻   頁： 77 - 87   2020年6月

Dry Process FOREWORD 査読有り

Shirafuji, T; Kinoshita, K; Akatsuka, H; Eriguchi, K; Ichikawa, T; Ichiki, T; Ishijima, T; Ishikawa, K; Karahashi, K; Kurihara, K; Sekine, M

JAPANESE JOURNAL OF APPLIED PHYSICS   59 巻   2020年6月

Synthesis of isolated carbon nanowalls via high-voltage nanosecond pulses in conjunction with CH₄/H₂ plasma enhanced chemical vapor deposition 査読有り

Ichikawa, T; Shimizu, N; Ishikawa, K; Hiramatsu, M; Hori, M

CARBON   161 巻   頁： 403 - 412   2020年5月

Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp<SUP>2</SUP> carbon structures 査読有り

Sugiura, H; Ohashi, Y; Ishikawa, K; Kondo, H; Kato, T; Kaneko, T; Takeda, K; Tsutsumi, T; Hayashi, T; Sekine, M; Hori, M

DIAMOND AND RELATED MATERIALS   104 巻   2020年4月

In-Liquid Plasma Synthesis of Nanographene with a Mixture of Methanol and 1-Butanol 査読有り

Ando, A; Ishikawa, K; Takeda, K; Ohta, T; Ito, M; Hiramatsu, M; Kondo, H; Sekine, M; Hori, M

CHEMNANOMAT   6 巻 ( 4 ) 頁： 604 - 609   2020年4月

Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study 査読有り

Fukunaga, Y; Longo, RC; Ventzek, PLG; Lane, B; Ranjan, A; Hwang, GS; Hartmann, G; Tsutsumi, T; Ishikawa, K; Kondo, H; Sekine, M; Hori, M

JOURNAL OF APPLIED PHYSICS   127 巻 ( 2 )   2020年1月

Etching characteristics of PECVD-prepared SiN films with CF₄/D₂ and CF₄/H₂ plasmas at different temperatures 査読有り

Hsiao, SN; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

2020 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     2020年

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF₃/O₂ downstream plasma 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Izawa, M; Ishikawa, K; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 47 )   2019年11月

Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate 査読有り

Isobe, Y; Sakai, T; Suguro, K; Miyashita, N; Kondo, H; Ishikawa, K; Wilson, AF; Shimizu, N; Oda, O; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   37 巻 ( 6 )   2019年11月

Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions 査読有り

Tanaka, H; Mizuno, M; Katsumata, Y; Ishikawa, K; Kondo, H; Hashizume, H; Okazaki, Y; Toyokuni, S; Nakamura, K; Yoshikawa, N; Kajiyama, H; Kikkawa, F; Hori, M

SCIENTIFIC REPORTS   9 巻   2019年9月

Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS) 査読有り

Ohta, T; Ito, H; Ishikawa, K; Kondo, H; Hiramatsu, M; Hori, M

C-JOURNAL OF CARBON RESEARCH   5 巻 ( 3 )   2019年9月

Self-limiting reactions of ammonium salt in CHF₃/O₂ downstream plasma for thermal-cyclic atomic layer etching of silicon nitride 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Izawa, M; Saeki, T; Ishikawa, K; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   37 巻 ( 5 )   2019年9月

Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects 査読有り

Miyajima, H; Ishikawa, K; Sekine, M; Hori, M

PLASMA PROCESSES AND POLYMERS   16 巻 ( 9 )   2019年9月

Simultaneous achievement of antimicrobial property and plant growth promotion using plasma-activated benzoic compound solution 査読有り

Iwata, N; Gamaleev, V; Hashizume, H; Oh, JS; Ohta, T; Ishikawa, K; Hori, M; Ito, M

PLASMA PROCESSES AND POLYMERS   16 巻 ( 8 )   2019年8月

Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation 査読有り

Ichikawa, T; Kondo, H; Ishikawa, K; Tsutsumi, T; Tanaka, H; Sekine, M; Hori, M

ACS APPLIED BIO MATERIALS   2 巻 ( 7 ) 頁： 2698 - 2702   2019年7月

Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective 査読有り

Ishikawa, K; Ishijima, T; Shirafuji, T; Armini, S; Despiau-Pujo, E; Gottscho, RA; Kanarik, KJ; Leusink, GJ; Marchack, N; Murayama, T; Morikawa, Y; Oehrlein, GS; Park, S; Hayashi, H; Kinoshita, K

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

Plasma-activated solution alters the morphological dynamics of supported lipid bilayers observed by high-speed atomic force microscopy 査読有り

Yamaoka, S; Kondo, H; Hashizume, H; Ishikawa, K; Tanaka, H; Hori, M

APPLIED PHYSICS EXPRESS   12 巻 ( 6 )   2019年6月

Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes? 査読有り

Iwase, T; Kamaji, Y; Kang, SY; Koga, K; Kuboi, N; Nakamura, M; Negishi, N; Nozaki, T; Nunomura, S; Ogawa, D; Omura, M; Shimizu, T; Shinoda, K; Sonoda, Y; Suzuki, H; Takahashi, K; Tsutsumi, T; Yoshikawa, K; Ishijima, T; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development 査読有り

Iwase, T; Kamaji, Y; Kang, SY; Koga, K; Kuboi, N; Nakamura, M; Negishi, N; Nozaki, T; Nunomura, S; Ogawa, D; Omura, M; Shimizu, T; Shinoda, K; Sonoda, Y; Suzuki, H; Takahashi, K; Tsutsumi, T; Yoshikawa, K; Ishijima, T; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation 査読有り

Iwase, T; Kamaji, Y; Kang, SY; Koga, K; Kuboi, N; Nakamura, M; Negishi, N; Nozaki, T; Nunomura, S; Ogawa, D; Omura, M; Shimizu, T; Shinoda, K; Sonoda, Y; Suzuki, H; Takahashi, K; Tsutsumi, T; Yoshikawa, K; Ishijima, T; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

Electronic properties and primarily dissociation channels of fluoroethane compounds 査読有り

Hayashi, T; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas 査読有り

Zhang, Y; Ishikawa, K; Mozetic, M; Tsutsumi, T; Kondo, H; Sekine, M; Hori, M

PLASMA PROCESSES AND POLYMERS   16 巻 ( 6 )   2019年6月

Laser-drilling formation of through-glass-via (TGV) on polymer-laminated glass 査読有り

Sato, Y; Imajyo, N; Ishikawa, K; Tummala, R; Hori, M

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS   30 巻 ( 11 ) 頁： 10183 - 10190   2019年6月

Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition 査読有り

Isobe, Y; Sakai, T; Sugiyama, N; Mizushima, I; Suguro, K; Miyashita, N; Lu, Y; Wilson, AF; Kumar, DA; Ikarashi, N; Kondo, H; Ishikawa, K; Shimizu, N; Oda, O; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   37 巻 ( 3 )   2019年5月

Chemical bonding structure in porous SiOC films (k &lt; 2.4) with high plasma-induced damage resistance (vol 3, pg 1, 2019) 査読有り

Miyajima, H; Masuda, H; Watanabe, K; Ishikawa, K; Sekine, M; Hori, M

MICRO AND NANO ENGINEERING   3 巻   頁： 92 - 92   2019年5月

Chemical bonding structure in porous SiOC films (k &lt; 2.4) with high plasma-induced damage resistance 査読有り

Miyajima, H; Masuda, H; Watanabe, K; Ishikawa, K; Sekine, M; Hori, M

MICRO AND NANO ENGINEERING   3 巻   頁： 1 - 6   2019年5月

Facile synthesis of SnO₂-graphene composites employing nonthermal plasma and SnO₂ nanoparticles-dispersed ethanol 査読有り

Borude, RR; Sugiura, H; Ishikawa, K; Tsutsumi, T; Kondo, H; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 17 )   2019年4月

Systematic diagnostics of the electrical, optical, and physicochemical characteristics of low-temperature atmospheric-pressure helium plasma sources 査読有り

Takeda, K; Yamada, H; Ishikawa, K; Sakakita, H; Kim, J; Ueda, M; Ikeda, J; Akimoto, Y; Kataoka, Y; Yokoyama, N; Ikehara, Y; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 16 )   2019年4月

A 65-nm CMOS Fully Integrated Analysis Platform Using an On-Chip Vector Network Analyzer and a Transmission-Line-Based Detection Window for Analyzing Circulating Tumor Cell and Exosome 査読有り

Niitsu, K; Nakanishi, T; Murakami, S; Matsunaga, M; Kobayashi, A; Karim, NM; Ito, J; Ozawa, N; Hase, T; Tanaka, H; Sato, M; Kondo, H; Ishikawa, K; Odaka, H; Hasegawa, Y; Hori, M; Nakazato, K

IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS   13 巻 ( 2 ) 頁： 470 - 479   2019年4月

Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls 査読有り

Imai, S; Naito, K; Kondo, H; Cho, HJ; Ishikawa, K; Tsutsumi, T; Sekine, M; Hiramatsu, M; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 10 )   2019年3月

Control of sp<SUP>2</SUP>-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH₄/H₂ plasma-enhanced chemical vapor deposition 査読有り

Sugiura, H; Jia, LY; Ohashi, Y; Kondo, H; Ishikawa, K; Tsutsumi, T; Hayashi, T; Takeda, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( 3 )   2019年3月

Effects of BCl₃ addition to Cl₂ gas on etching characteristics of GaN at high temperature 査読有り

Tanide, A; Nakamura, S; Horikoshi, A; Takatsuji, S; Kohno, M; Kinose, K; Nadahara, S; Ishikawa, K; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   37 巻 ( 2 )   2019年3月

Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition 査読有り

Sugiura, H; Kondo, H; Tsutsumi, T; Ishikawa, K; Hori, M

C-JOURNAL OF CARBON RESEARCH   5 巻 ( 1 )   2019年3月

Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition 査読有り

Tomatsu, M; Hiramatsu, M; Kondo, H; Ishikawa, K; Tsutsumi, T; Sekine, M; Hori, M

C-JOURNAL OF CARBON RESEARCH   5 巻 ( 1 )   2019年3月

Non-thermal plasma-activated medium modified metabolomic profiles in the glycolysis of U251SP glioblastoma 査読有り

Kurake, N; Ishikawa, K; Tanaka, H; Hashizume, H; Nakamura, K; Kajiyama, H; Toyokuni, S; Kikkawa, F; Mizuno, M; Hori, M

ARCHIVES OF BIOCHEMISTRY AND BIOPHYSICS   662 巻   頁： 83 - 92   2019年2月

Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF₆-added plasma etching of quartz glass 査読有り

Nguyen, TTN; Sasaki, M; Odaka, H; Tsutsumi, T; Ishikawa, K; Hori, M

JOURNAL OF APPLIED PHYSICS   125 巻 ( 6 )   2019年2月

Liquid dynamics in response to an impinging low-temperature plasma jet 査読有り

Brubaker, TR; Ishikawa, K; Kondo, H; Tsutsumi, T; Hashizume, H; Tanaka, H; Knecht, SD; Bilén, SG; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 7 )   2019年2月

Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds 査読有り

Ichikawa, T; Tanaka, S; Kondo, H; Ishikawa, K; Tsutsumi, T; Sekine, M; Hori, M

APPLIED PHYSICS EXPRESS   12 巻 ( 2 )   2019年2月

Adhesion enhancement and amine reduction using film redeposited at the interface of a stack of plasma-enhanced CVD dielectrics for Cu/low-<i>k</i> interconnects 査読有り

Miyajima, H; Watanabe, K; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( 2 )   2019年2月

Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system 査読有り

Fukunaga, Y; Tsutsumi, T; Kondo, H; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( 2 )   2019年2月

Hetero-epitaxial growth of a GaN film by the combination of magnetron sputtering with Ar/Cl₂ gas mixtures and a separate supply of nitrogen precursors from a high density radical source 査読有り

Tanide, A; Nakamura, S; Horikoshi, A; Takatsuji, S; Kohno, M; Kinose, K; Nadahara, S; Nishikawa, M; Ebe, A; Ishikawa, K; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( SA )   2019年2月

Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma 査読有り

Borude, RR; Sugiura, H; Ishikawa, K; Tsutsumi, T; Kondo, H; Han, JG; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( SA )   2019年2月

Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries 査読有り

Borude, RR; Sugiura, H; Ishikawa, K; Tsutsumi, T; Kondo, H; Ikarashi, N; Hori, M

ACS APPLIED NANO MATERIALS   2 巻 ( 2 ) 頁： 649 - 654   2019年2月

Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C₂F₆/H₂ plasma-enhanced chemical vapor deposition 査読有り

Imai, S; Kondo, H; Hyungjun, C; Ishikawa, K; Tsutsumi, T; Sekine, M; Hiramatsu, M; Hori, M

APPLIED PHYSICS EXPRESS   12 巻 ( 1 )   2019年1月

Molecular mechanisms of non-thermal plasmainduced effects in cancer cells 査読有り

Tanaka, H; Mizuno, M; Ishikawa, K; Toyokuni, S; Kajiyama, H; Kikkawa, F; Hori, M

BIOLOGICAL CHEMISTRY   400 巻 ( 1 ) 頁： 87 - 91   2019年1月

Effect of N₂/H₂ plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) 査読有り

Amalraj, FW; Dhasiyan, AK; Lu, Y; Shimizu, N; Oda, O; Ishikawa, K; Kondo, H; Sekine, M; Ikarashi, N; Hori, M

AIP ADVANCES   8 巻 ( 11 )   2018年11月

Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH₄/H₂ at 300-500 °C 査読有り

Kako, T; Liu, ZC; Ishikawa, K; Kondo, H; Oda, O; Sekine, M; Hori, M

VACUUM   156 巻   頁： 219 - 223   2018年10月

Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching 査読有り

Zhang, Y; Imamura, M; Ishikawa, K; Tsutsumi, T; Kondo, H; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 10 )   2018年10月

Cytotoxic effects of plasma-irradiated fullerenol 査読有り

Kanno, D; Tanaka, H; Ishikawa, K; Hashizume, H; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   51 巻 ( 37 )   2018年9月

Dissociative properties of 1,1,1,2-tetrafluoroethane obtained by computational chemistry 査読有り

Hayashi, T; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma 査読有り

Liu, ZC; Ishikawa, K; Imamura, M; Tsutsumi, T; Kondo, H; Oda, O; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom? 査読有り

Ishikawa, K; Karahashi, K; Ishijima, T; Cho, SI; Elliott, S; Hausmann, D; Mocuta, D; Wilson, A; Kinoshita, K

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

Low-autofluorescence fluoropolymer membrane filters for cell filtration 査読有り

Kihara, N; Kuboyama, D; Onoshima, D; Ishikawa, K; Tanaka, H; Ozawa, N; Hase, T; Koguchi, R; Yukawa, H; Odaka, H; Hasegawa, Y; Baba, Y; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

Impact of helium pressure in arc plasma synthesis on crystallinity of single-walled carbon nanotubes 査読有り

Ando, A; Takeda, K; Ohta, T; Ito, M; Hiramatsu, M; Ishikawa, K; Kondo, H; Sekine, M; Suzuki, T; Inoue, S; Ando, Y; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

Effects of gas residence time of CH₄/H₂ on sp<SUP>2</SUP> fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition 査読有り

Sugiura, H; Jia, LY; Kondo, H; Ishikawa, K; Tsutsumi, T; Hayashi, T; Takeda, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

Dry Process FOREWORD 査読有り

Karahashi, K; Kinoshita, K; Higashi, S; Ishikawa, K; Ishijima, T; Kuboi, N

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

Cell Deposition Microchip with Micropipette Control over Liquid Interface Motion 査読有り

Onoshima, D; Hattori, Y; Yukawa, H; Ishikawa, K; Hori, M; Baba, Y

CELL MEDICINE   10 巻   2018年5月

Nanographene synthesized in triple-phase plasmas as a highly durable support of catalysts for polymer electrolyte fuel cells 査読有り

Amano, T; Kondo, H; Takeda, K; Ishikawa, K; Hiramatsu, M; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 4 )   2018年4月

Oxygen reduction reaction properties of nitrogen-incorporated nanographenes synthesized using in-liquid plasma from mixture of ethanol and iron phthalocyanine 査読有り

Amano, T; Kondo, H; Takeda, K; Ishikawa, K; Hiramatsu, M; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 4 )   2018年4月

Cytotoxicity of cancer HeLa cells sensitivity to normal MCF10A cells in cultivations with cell culture medium treated by microwave-excited atmospheric pressure plasmas 査読有り

Takahashi, Y; Taki, Y; Takeda, K; Hashizume, H; Tanaka, H; Ishikawa, K; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   51 巻 ( 11 )   2018年3月

Free radical generation by non-equilibrium atmospheric pressure plasma in alcohol-water mixtures: an EPR-spin trapping study 査読有り

Uchiyama, H; Ishikawa, K; Zhao, QL; Andocs, G; Nojima, N; Takeda, K; Krishna, MC; Ishijima, T; Matsuya, Y; Hori, M; Noguchi, K; Kondo, T

JOURNAL OF PHYSICS D-APPLIED PHYSICS   51 巻 ( 9 )   2018年3月

Facile fabrication of a poly(ethylene terephthalate) membrane filter with precise arrangement of through-holes 査読有り

Kihara, N; Odaka, H; Kuboyama, D; Onoshima, D; Ishikawa, K; Baba, Y; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 3 )   2018年3月

Reduced HeLa cell viability in methionine-containing cell culture medium irradiated with microwave-excited atmospheric-pressure plasma 査読有り

Takahashi, Y; Taki, Y; Takeda, K; Hashizume, H; Tanaka, H; Ishikawa, K; Hori, M

PLASMA PROCESSES AND POLYMERS   15 巻 ( 3 )   2018年3月

Glioblastoma Cell Lines Display Different Sensitivities to Plasma-Activated Medium 査読有り

Tanaka, H; Mizuno, M; Ishikawa, K; Takeda, K; Hashizume, H; Nakamura, K; Utsumi, F; Kajiyama, H; Okazaki, Y; Toyokuni, S; Akiyama, S; Maruyama, S; Kikkawa, F; Hori, M

IEEE TRANSACTIONS ON RADIATION AND PLASMA MEDICAL SCIENCES   2 巻 ( 2 ) 頁： 99 - 102   2018年3月

Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons 査読有り

Ando, A; Ishikawa, K; Kondo, H; Tsutsumi, T; Takeda, K; Ohta, T; Ito, M; Hiramatsu, M; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 2 )   2018年2月

Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials FOREWORD 査読有り

Naritsuka, S; Miyazaki, S; Fujiwara, Y; Hiramatsu, M; Inoue, Y; Ishikawa, K; Ito, M; Itoh, T; Kasu, M; Miyake, H; Sasaki, M; Shirafuji, T; Suda, Y

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 1 )   2018年1月

Selective production of reactive oxygen and nitrogen species in the plasma-treated water by using a nonthermal high-frequency plasma jet 査読有り

Uchida, G; Takenaka, K; Takeda, K; Ishikawa, K; Hori, M; Setsuhara, Y

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 1 )   2018年1月

Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol 査読有り

Amano, T; Kondo, H; Ishikawa, K; Tsutsumi, T; Takeda, K; Hiramatsu, M; Sekine, M; Hori, M

APPLIED PHYSICS EXPRESS   11 巻 ( 1 )   2018年1月

Plasma-activated medium (PAM) kills human cancer-initiating cells 査読有り

Ikeda, J; Tanaka, H; Ishikawa, K; Sakakita, H; Ikehara, Y; Hori, M

PATHOLOGY INTERNATIONAL   68 巻 ( 1 ) 頁： 23 - 30   2018年1月

Electron impact ionization of perfluoro-methyl-vinyl-ether C₃F₆O 査読有り

Kondo, Y; Ishikawa, K; Hayashi, T; Sekine, M; Hori, M

PLASMA SOURCES SCIENCE & TECHNOLOGY   27 巻 ( 1 )   2018年1月

Isotropic atomic level etching of tungsten using formation and desorption of tungsten fluoride 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Hanaoka, Y; Kawamura, K; Izawa, M; Ishikawa, K; Hori, M

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VII   10589 巻   2018年

Real-time control of a wafer temperature for uniform plasma process 査読有り

Tsutsumi, T; Fuknaga, Y; Ishikawa, K; Kondo, H; Sekine, M; Hori, M

2018 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     2018年

Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy 査読有り

Brubaker, TR; Ishikawa, K; Takeda, K; Oh, JS; Kondo, H; Hashizume, H; Tanaka, H; Knecht, SD; Bilén, SG; Hori, M

JOURNAL OF APPLIED PHYSICS   122 巻 ( 21 )   2017年12月

Dependence of absolute photon flux on infrared absorbance alteration and surface roughness on photoresist polymers irradiated with vacuum ultraviolet photons emitted from HBr plasma 査読有り

Zhang, Y; Takeuchi, T; Ishikawa, K; Hayashi, T; Takeda, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 12 )   2017年12月

Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium 査読有り

Furuta, R; Kurake, N; Ishikawa, K; Takeda, K; Hashizume, H; Tanaka, H; Kondo, H; Sekine, M; Hori, M

PLASMA PROCESSES AND POLYMERS   14 巻 ( 11 )   2017年11月

Surface roughening of photoresist after change of the photon/radical and ion treatment sequence 査読有り

Zhang, Y; Takeuchi, T; Ishikawa, K; Takeda, K; Kondo, H; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   35 巻 ( 6 )   2017年11月

Crystallization of calcium oxalate dihydrate in a buffered calcium-containing glucose solution by irradiation with non-equilibrium atmospheric pressure plasma 査読有り

Kurake, N; Tanaka, H; Ishikawa, K; Nakamura, K; Kajiyama, H; Kikkawa, F; Mizuno, M; Ikehara, Y; Hori, M

JOURNAL OF APPLIED PHYSICS   122 巻 ( 14 )   2017年10月

High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition 査読有り

Imai, S; Kondo, H; Cho, H; Kano, H; Ishikawa, K; Sekine, M; Hiramatsu, M; Ito, M; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 40 )   2017年10月

Cold atmospheric helium plasma causes synergistic enhancement in cell death with hyperthermia and an additive enhancement with radiation 査読有り

Moniruzzaman, R; Rehman, MU; Zhao, QL; Jawaid, P; Takeda, K; Ishikawa, K; Hori, M; Tomihara, K; Noguchi, K; Kondo, T; Noguchi, M

SCIENTIFIC REPORTS   7 巻   2017年9月

Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy 査読有り

Furuta, R; Kurake, N; Takeda, K; Ishikawa, K; Ohta, T; Ito, M; Hashizume, H; Tanaka, H; Kondo, H; Sekine, M; Hori, M

BIOINTERPHASES   12 巻 ( 3 )   2017年9月

Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation 査読有り

Liu, ZC; Imamura, M; Asano, A; Ishikawa, K; Takeda, K; Kondo, H; Oda, O; Sekine, M; Hori, M

APPLIED PHYSICS EXPRESS   10 巻 ( 8 )   2017年8月

Temperature dependence of protection layer formation on organic trench sidewall in H₂/N₂ plasma etching with control of substrate temperature 査読有り

Fukunaga, Y; Tsutsumi, T; Takeda, K; Kondo, H; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 7 )   2017年7月

Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy 査読有り

Furuta, R; Kurake, N; Ishikawa, K; Takeda, K; Hashizume, H; Kondo, H; Ohta, T; Ito, M; Sekine, M; Hori, M

PHYSICAL CHEMISTRY CHEMICAL PHYSICS   19 巻 ( 21 ) 頁： 13438 - 13442   2017年6月

Dry Process FOREWORD 査読有り

Ishikawa, K; Kinoshita, K; Higashi, S; Ichiki, T; Karahashi, K; Kuboi, N

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 6 )   2017年6月

Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions? 査読有り

Ishikawa, K; Karahashi, K; Ichiki, T; Chang, JP; George, SM; Kessels, WMM; Lee, HJ; Tinck, S; Um, JH; Kinoshita, K

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 6 )   2017年6月

Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition 査読有り

Tomatsu, M; Hiramatsu, M; Foord, JS; Kondo, H; Ishikawa, K; Sekine, M; Takeda, K; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 6 )   2017年6月

Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 °C 査読有り

Takai, S; Lu, Y; Oda, O; Takeda, K; Kondo, H; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 6 )   2017年6月

Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas 査読有り

Ueyama, T; Fukunaga, Y; Tsutsumi, T; Takeda, K; Kondo, H; Ishikawa, K; Sekine, M; Iwata, M; Ohya, Y; Sugai, H; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 6 )   2017年6月

Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Miura, M; Kurihara, M; Maeda, K; Negishi, N; Sonoda, Y; Tanaka, M; Yasui, N; Izawa, M; Ishii, Y; Okuma, K; Saldana, T; Manos, J; Ishikawa, K; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 19 )   2017年5月

Spatial distributions of O, N, NO, OH and vacuum ultraviolet light along gas flow direction in an AC-excited atmospheric pressure Ar plasma jet generated in open air 査読有り

Takeda, K; Ishikawa, K; Tanaka, H; Sekine, M; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 19 )   2017年5月

Bactericidal pathway of <i>Escherichia coli</i> in buffered saline treated with oxygen radicals 査読有り

Kobayashi, T; Iwata, N; Oh, JS; Hahizume, H; Ohta, T; Takeda, K; Ishikawa, K; Hori, M; Ito, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 15 )   2017年4月

Effects of •OH and •NO radicals in the aqueous phase on H₂O₂ and NO₂<SUP>-</SUP> generated in plasma-activated medium 査読有り

Kurake, N; Tanaka, H; Ishikawa, K; Takeda, K; Hashizume, H; Nakamura, K; Kajiyama, H; Kondo, T; Kikkawa, F; Mizuno, M; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 15 )   2017年3月

Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas 査読有り

Ohya, Y; Ishikawa, K; Komuro, T; Yamaguchi, T; Takeda, K; Kondo, H; Sekine, M; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 15 )   2017年3月

Behavior of absolute densities of atomic oxygen in the gas phase near an object surface in an AC-excited atmospheric pressure He plasma jet 査読有り

Takeda, K; Kumakura, T; Ishikawa, K; Tanaka, H; Sekine, M; Hori, M

APPLIED PHYSICS EXPRESS   10 巻 ( 3 )   2017年3月

Fabrication of superconductor-ferromagnet-insulator-superconductor Josephson junctions with critical current uniformity applicable to integrated circuits

Ito Hiroshi, Taniguchi Soya, Ishikawa Kouta, Akaike Hiroyuki, Fujimaki Akira

APPLIED PHYSICS EXPRESS   10 巻 ( 3 )   2017年3月

Characteristics of optical emissions of arc plasma processing for high-rate synthesis of highly crystalline single-walled carbon nanotubes 査読有り

Ando, A; Takeda, K; Ohta, T; Ito, M; Hiramatsu, M; Ishikawa, K; Kondo, H; Sekine, M; Suzuki, T; Inoue, S; Ando, Y; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 3 )   2017年3月

Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl₂ plasma etching of GaN 査読有り

Liu, ZC; Pan, JL; Asano, A; Ishikawa, K; Takeda, K; Kondo, H; Oda, O; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 2 )   2017年2月

Absolute density of precursor SiH₃ radicals and H atoms in H₂-diluted SiH₄ gas plasma for deposition of microcrystalline silicon films 査読有り

Abe, Y; Ishikawa, K; Takeda, K; Tsutsumi, T; Fukushima, A; Kondo, H; Sekine, M; Hori, M

APPLIED PHYSICS LETTERS   110 巻 ( 4 )   2017年1月

Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Kurihara, M; Izawa, M; Ishikawa, K; Hori, M

ATOMIC LAYER DEPOSITION APPLICATIONS 13   80 巻 ( 3 ) 頁： 3 - 14   2017年

TIME EVOLUTION OF REACTIVE OXYGEN NITROGEN SPECIES IN PLASMA-ACTIVATED ESSENTIAL MEDIA AND WATER 査読有り

Brubaker, T; Ishikawa, K; Takeda, K; Hashizume, H; Tanaka, H; Kondo, H; Sekine, M; Hori, M

2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS)     頁： .   2017年

Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas 査読有り

Yoshinobu Ohya, Maju Tomura, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Journal of Vacuum Science and Technology A Letters   34 巻 ( 4 ) 頁： 040602   2016年5月

Effects of nitrogen on apoptosis and changes in gene expression in human lymphoma U937 cells exposed to argon-cold atmospheric pressure plasma 査読有り

Yoshiaki Tabuchi, Hidefumi Uchiyama, Qing-li Zhao, Tatsuya Yunoki, Qabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori and Takashi Kondo

International Journal of Molecular Medicine   37 巻   頁： 1706-1714   2016年5月

Red Blood Cell Coagulation Induced by Low-temperature Plasma Treatment 査読有り

Kenji Miyamoto, Sanae Ikehara, Hikaru Takei, Yoshihiro Akimoto, Hajime Sakakita, Kenji Ishikawa, Masashi Ueda, Jun-ichiro Ikeda, Masahiro Yamagishi, Jaeho Kim, Takashi Yamaguchi, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara

Archives of Biochemistry and Biophysics     2016年4月

Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

Appl. Phys. Express   7 巻   頁： 046201   2016年3月

Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-injection Plasma-enhanced Chemical Vapor Deposition 査読有り

Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

Plasma Process Polym.     2016年2月

Cell survival of glioblastoma grown in medium containing hydrogen peroxide and/or nitrite, or in plasma-activated medium 査読有り

Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Takashi Kondo, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Masaru Hori

Archives of Biochemistry and Biophysics     2016年1月

Cover Picture: Plasma Process. Polym. 12∕2015 (page 1329) 査読有り

Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara and Shuichi Enomoto

Plasma Processes and Polymers   12 巻 ( 12 ) 頁： 1329   2015年12月

Plasma Blood Coagulation Without Involving the Activation of Platelets and Coagulation Factors 査読有り

Sanae Ikehara, Hajime Sakakita, Kenji Ishikawa, Yoshihiro Akimoto, Takashi Yamaguchi, Masahiro Yamagishi, Jaeho Kim, Masashi Ueda, Jun-ichiro Ikeda, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara

Plasma Processes and Polymers   12 巻 ( 12 ) 頁： 1348–1353   2015年12月

Real-time temperature-monitoring of Si substrate during plasma processing and its heat-flux analysis 査読有り

Takayoshi Tsutsumi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   55 巻   頁： 01AB04   2015年11月

Superhydrophilic glass membrane device with open-microhole array for filtering and counting rare tumor cells 査読有り

Akihiro Yonese, Daisuke Onoshima, Hiroshi Yukawa, Kenji Ishikawa, Masaru Hori, and Yoshinobu Baba

Micro Total Analysis Systems 2015     頁： 493-495   2015年10月

Histological and nuclear medical comparison of inflammation after haemostasis with non-thermal plasma and thermal coagulation 査読有り

Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara, and Shuichi Enomoto

Plasma Processes and Polymers   12 巻 ( 12 ) 頁： 1338–1342   2015年9月

Plasma with high electron density and plasma-activated medium for cancer treatment 査読有り

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroshi Hashizume, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinya Toyokuni, Shin’ichi Akiyama, Shoichi Maruyama, Suguru Yamada, Yasuhiro Kodera, Hiroki Kaneko, Hiroko Terasaki, Hirokazu Hara, Tetsuo Adachi, Machiko Iida, Ichiro Yajima, Masashi Kato, Fumitaka Kikkawa, and Masaru Hori

Clinical Plasma Medicine   3 巻   頁： 72-76   2015年9月

EPR-Spin Trapping and Flow cytometric Studies of Free Radicals Generated using Cold Atmospheric Argon Plasma and X-ray irradiation in Aqueous Solutions and Intracellular Milieu 査読有り

Hidefumi Uchiyama, Qing-Li Zhao, Mariame Ali Hassan, Gabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori, and Takashi Kondo

PLoS One   10 巻 ( 8 ) 頁： e0136956   2015年8月

Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching 査読有り

Takayoshi Tsutsumi, Yusuke Fukunaga, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori

IEEE Trans Semiconductor manufacturing   28 巻 ( 4 ) 頁： 515-520   2015年8月

Decreased expression levels of cell cycle regulators and matrix metalloproteinases in melanoma from RET-transgenic mice by single irradiation of non-equilibrium atmospheric pressure plasmas 査読有り

Machiko Iida, Ichiro Yajima, Nobutaka Ohgami, Li Xiang, Cunchao Zou, Kenji Ishikawa, Masaru Hori, and Masashi Kato

International Journal of Clinical and Experimental Pathology   8 巻 ( 8 ) 頁： 9326-9331   2015年8月

Suppression of plasma-induced damage on GaN etched by a Cl2 plasma at high temperatures 査読有り

Zecheng Liu, Jialin Pan, Takashi Kako Kenji Ishikawa, Osamu Oda, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   54 巻   頁： 06GB04   2015年6月

Electronic properties of HBr, O2 and Cl2 used in Si etching 査読有り

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   54 巻   頁： 06GA03   2015年5月

Effect of gas residence time on near-edge X-ray absorption fine structures of hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition 査読有り

Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

Japan. J. Appl. Phys.   55 巻 ( 4 ) 頁： 040305   2015年3月

Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton 査読有り

Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   54 巻 ( 4 ) 頁： 040303   2015年3月

Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF hybrid plasmas using a PECVD process 査読有り

Bibhuti Bhusan Sahu, Jeon G. Han, Kyung-Sik Shin, Kenji Ishikawa, Masaru Hori, and Yudai Miyawaki

Plasma Sources Sci. Technol.   24 巻 ( 2 ) 頁： 025019   2015年3月

CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase 査読有り

Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   54 巻 ( 4 ) 頁： 040301   2015年3月

Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals 査読有り

Yu Arai, Yusuke Noto, Yousuke Goto, Seiji Takahashi, Masashi Yamamoto, Akihiko Kono, Tatsuo Ishijima, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

Thin Solid Film   575 巻   頁： 12-16   2015年2月

Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer 査読有り

Akihiko Kono, Yu Arai, Yousuke Goto, Masashi Yamamoto, Seiji Takahashi, Tadaaki Yamagishi, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

Thin Solid Film   575 巻   頁： 17-20   2015年2月

Experimental evidence of warm electron populations in magnetron sputtering plasmas 査読有り

B. B. Sahu, Jeon G. Han, Hye R. Kim, Kenji Ishikawa, and Masaru Hori

J. Appl. Phys.   117 巻   頁： 033301   2015年1月

Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: Generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions 査読有り

Yusuke Kondo, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

J. Phys. D: Appl. Phys.   48 巻 ( 4 ) 頁： 045202   2015年1月

Plasma Medical Science for Cancer Therapy: Toward Cancer Therapy Using Nonthermal Atmospheric Pressure Plasma 招待有り 査読有り

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinnya Toyokuni, Shoichi Maruyama, Fumitaka Kikkawa, and Masaru Hori

IEEE Trans. on Plasma Sci.   42 巻 ( 12 ) 頁： 3760-3763   2014年12月

Quantitative Clarification of Inactivation Mechanism of Penicillium digitatum Spores Treated with Neutral Oxygen Radicals 査読有り

Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori, and Masafumi Ito

Jpn. J. Appl. Phys.   54 巻   頁： 01AG05   2014年11月

Robust characteristics of semiconductor-substrate temperature-measurement method using auto-correlation type frequency-domain low-coherence interferometry 査読有り

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito

Jpn. J. Appl. Phys.   54 巻   頁： 01AB03   2014年11月

Effectiveness of plasma diagnostic in ultra high frequency and radio frequency hybrid plasmas for synthesis of silicon nitride film at low temperature 査読有り

Bibhuti Bhusan Sahu, Kyung-Sik Shin, Su-Bong Jin, Jeon G. Han, Kenji Ishikawa and Masaru Hori

J. Appl. Phys.   116 巻   頁： 134903   2014年10月

Recovery of Atom Density Drift Caused by Change in Reactor Wall Conditions by Real-time Autonomous Control 査読有り

Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Journal of Physics D: Applied Physics   47 巻   頁： 422002   2014年9月

Diagnostics of plasma-biological surface interactions in low pressure and atmospheric pressure plasmas 招待有り 査読有り

Kenji Ishikawa, and Masaru Hori

International Journal of Modern Physics: Conference Series   32 巻   頁： 1460318   2014年8月

Cell survival and proliferation signaling pathways are downregulated by plasma-activated medium in glioblastoma brain tumor cells 査読有り

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Shoichi Maruyama, Fumitaka Kikkawa, and Masaru Hori

Plasma Medicine   4 巻   頁： 1   2014年7月

Temporal Changes of Absolute Densities of Atoms in H2 and N2 Mixture Gas Plasmas by Surface Modifications of Reactor Wall 査読有り

Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Jpn. J. Appl. Phys.   53 巻   頁： 050301   2014年4月

Epitaxial Growth of GaN by Radical-Enhanced Metalorganic Chemical Vapor Deposition (REMOCVD) in the Downflow of a Very High Frequency (VHF) N2/H2 Excited Plasma– Effect of TMG Flow Rate and VHF Power 査読有り

Yi Lu, Hiroki Kondo, Kenji Ishikawa, Osamu Oda, Keigo Takeda, Makoto Sekine, Hiroshi Amano, and Masaru Hori

J. Cryst. Growth   391 巻   頁： 97-103   2014年4月

Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls 査読有り

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

Jpn. J. Appl. Phys.   53 巻   頁： 040307   2014年3月

Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution 査読有り

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

Jpn. J. Appl. Phys.   53 巻   頁： 040305   2014年3月

Spatial distribution of absolute atomic oxygen density of a non-equilibrium atmospheric pressure planar plasma jet 査読有り

Fengdong Jia, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Jagath Kularatne, Hiroki Kondo, Makoto Sekine and Masaru Hori

Plasma Source Sci Technol.   23 巻   頁： 025004   2014年3月

Chemical Reactions during Plasma-enhanced Atomic Layer Deposition of SiO2 Films employing aminosilane and O2/Ar plasma at 50 C 査読有り

Lu Yi, Akiko Kobayashi, H. Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS   53 巻   2013年12月

Density Control of Carbon Nanowalls Grown by CH4/H2 plasma and Their Electrical Properties 査読有り

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

Carbon   66 巻   2013年12月

Effect of Indirect Nonequilibrium Atmospheric Pressure Plasma on Anti-proliferative Activity against Chronic Chemo-resistant Ovarian Cancer Cells in vitro and in vivo 査読有り

Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, and Fumitaka Kikkawa

PLOS One   8 巻   頁： e81576   2013年12月

Oxidation mechanism of Penicillium digitatum spores through neutral oxygen radicals 査読有り

Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Masafumi Ito

JAPANESE JOURNAL OF APPLIED PHYSICS   53 巻   頁： 010209   2013年12月

High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System 査読有り

Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, and Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS   52 巻   頁： 11NE01   2013年11月

Field emission of nano-organic-rods armored with metal nanoparticles 査読有り

Toshiya Suzuki, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS   52 巻   頁： 120203   2013年11月

Effect of gas flow on atomic radical transportation in AC Excited Non-equilibrium Atmospheric Pressure Plasma jet 査読有り

Keigo Takeda, Masanori Kato, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Makoto Sekine, and Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS   46 巻   頁： 464006   2013年10月

Highly Precise and Rapid Measurements on Substrate Temperature Using Frequency Domain Low Coherence Interferometer 査読有り

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito

APPLIED PHYSICS LETTERS   101 巻   頁： 182102   2013年10月

Inactivation effects of neutral reactive-oxygen species on Penicillium digitatum spores using non-equilibrium atmospheric-pressure oxygen radical source 査読有り

Hiroshi Hashizume, Takayuki Ohta, Jia Fengdong, Keigo Takeda,Kenji Ishikawa,Masaru Hori, and Masafumi Ito

APPLIED PHYSICS LETTERS   101 巻   頁： 53708   2013年10月

Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO -> F + FNO at an Elevated Temperature 査読有り

Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

JOURNAL OF PHYSICAL CHEMISTRY C   117 巻 ( 40 ) 頁： 20810-20818   2013年9月

Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls 査読有り

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

APPLIED PHYSICS EXPRESS   6 巻   頁： 095201   2013年8月

A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink 査読有り

Hitoshi Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, Kenji Ishikawa, H. Kondo, M. Sekine, H. Toyoda, and M. Hori

J. Phys.: Conf. Ser.   441 巻   頁： 12019   2013年6月

A novel fast and flexible technique of radical kinetic behavior investigation based on pallet for plasma evaluation structure and numerical analysis 査読有り

Malinowski, Arkadiusz; Takeuchi, Takuya; Chen, Shang; Suzuki, Toshiya; Ishikawa, Kenji; Sekine, Makoto; Hori, Masaru; Lukasiak, Lidia; Jakubowski, Andrzej

JOURNAL OF PHYSICS D-APPLIED PHYSICS   46 巻   頁： 265201   2013年6月

Surface morphology on high-temperature plasma-etched gallium nitride 査読有り

Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Trans. Mater. Res. Soc. Jpn.   38 巻   頁： 325   2013年6月

Dissociations of C5F8 and C5HF7 in Etching Plasma 査読有り

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS   5 巻   頁： 05EB02   2013年5月

Wavelength dependence of photon-induced interface defects in hydrogenated silicon nitride/Si structure during plasma etching processes 査読有り

Masanaga Fukasawa, Hiroyasu Matsugai, Takayoshi Honda, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Kazunori Nagahata, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

JAPANESE JOURNAL OF APPLIED PHYSICS   5 巻   頁： 05ED01   2013年5月

Surface analysis of gallium nitride (GaN) at elevated substrate temperature 査読有り

Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

APPLIED PHYSICS EXPRESS   6 巻   頁： 056201   2013年4月

Supercritical Fluid Deposition of High-Density Nanoparticles of Photo-Catalytic TiO2 on Carbon Nanowalls 査読有り

Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

Appl. Phys. Express   6 巻   頁： 045103   2013年4月

A Room Temperature Si Etching in NO/F2 Gas Chemistry and Its Reaction Mechanism 査読有り

Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Phys. Chem. C   117 巻 ( 10 ) 頁： 5118–5125   2013年2月

Plasma-activated medium selectively kills glioblastoma brain tumor cells by downregulating a survival signaling molecule, AKT kinase 査読有り

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, and Masaru Hori

Plasma Medicine   3 巻   頁： 1   2013年2月

Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma 査読有り

Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

J. Phys. D: Appl. Phys.   46 巻   頁： 102001   2013年2月

Etching-Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma 査読有り

Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, and Masaru Hori

Jpn. J. Appl. Phys.   52 巻 ( 2 ) 頁： 1   2013年1月

Impact of hydrogen radical injection plasma on fabrication of microcrystalline silicon thin film for solar cells 査読有り

Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Appl. Phys.   113 巻 ( 2 ) 頁： 033304   2013年1月

Highly selective etching of SiO2 over Si3N4 and Si in capacitivlly coupled plasma employing C5HF7 gas 査読有り

Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, and Masaru Hori

Jpn. J. Appl. Phys.   52 巻 ( 1 ) 頁： 016201   2013年1月

Development of high-density nitrogen radical source for low mosaicity and high rate growth of InGaN films in molecular beam epitaxy 査読有り

Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, and Masaru Hori

Jpn. J. Appl. Phys.   52 巻 ( 1 ) 頁： 021001   2013年1月

Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment 査読有り

Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Appl. Phys.   113 巻 ( 1 ) 頁： 014306   2013年1月

Surface loss probability of H radicals on silicon thin films in SiH4/H2 plasma 査読有り

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Appl. Phys.   113 巻 ( 1 ) 頁： 013303   2013年1月

Individual roles for atoms and ions during hydrogen atom passivation of surface-defects on GaN created by plasma-etching 査読有り

Shang Chen, Kenji Ishikawa, Yi Lu, Ryosuke Kometani, Hiroki Kondo, Yutaka Tokuda, Takashi Egawa, Hiroshi Amano, Makoto Sekine, and Masaru Hori

Jpn. J. Appl. Phys.   51 巻 ( 11 ) 頁： 111002-1:6   2012年10月

Critical flux ratio of hydrogen radical to fi lm precursor in microcrystalline silicon deposition for solar cells 査読有り

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Appl. Phys. Lett.   101 巻 ( 17 ) 頁： 172109-1:4   2012年10月

タングステン加熱触媒体により生成した水素ラジカルによるレジスト用ベースポリマーの分解除去 査読有り

新井 祐, 渡邉 誠, 河野 昭彦, 山岸 忠明, 石川 健治, 堀 勝, 堀邊 英夫

高分子論文集   69 巻 ( 6 ) 頁： 266-273   2012年9月

As-grown deep-level defects in n-GaN grown by metal-organic chemical vapor deposition on freestanding GaN 査読有り

Shang Chen, Unhi Honda, Tatsunari Shibata, Toshiya Matumura, Yutaka Tokuda, Kenji Ishikawa, Masaru Hori, Hiroyuki Ueda, Tsutomu Uesugi, and Tetsu Kachi

J. Appl. Phys.   112 巻 ( 5 ) 頁： 053513-1:4   2012年9月

Real-time In Situ Electron Spin Resonance Measurements on Fungal Spores of Penicillium digitatum during Exposure of Oxygen Plasmas 査読有り

Kenji Ishikawa, Hiroko Moriyama, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Appl. Phys. Lett.   101 巻 ( 1 ) 頁： 013704-1:4   2012年7月

Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature 査読有り

Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, and Masaru Hori

AIP advance   2 巻 ( 2 ) 頁： 022149-1:6   2012年6月

Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma 査読有り

Tatsuya Hagino, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Masaru Hori

Appl. Phys. Express   5 巻 ( 3 ) 頁： 035101-1:3   2012年3月

Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF3 into N2 Downflow Plasma 査読有り

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

Jpn. J. Appl. Phys.   51 巻 ( 2 ) 頁： 026505-1:5   2012年2月

Direct current superposed dual-frequency capacitively-coupled-plasma in selective etch of SiOCH over SiC 査読有り

Tsuyoshi Yamaguchi, Tetsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Phys. D: Appl. Phys.   45 巻 ( 2 ) 頁： 025203-1:7   2012年1月

Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation 査読有り

Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minami, Fumikatsu Uesawa, Masaru Hori, and Tetsuya Tatsumi

Jpn. J. Appl. Phys.   51 巻 ( 2 ) 頁： 026201-1:7   2012年1月

Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature 査読有り

Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

  51 巻 ( 1 ) 頁： 016202-1:6   2012年1月

Quantum Chemical Investigation for Chemical Dry Etching of SiO2 by Flowing NF3 into H2 Downflow Plasma 査読有り

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

Jpn. J. Appl. Phys.   51 巻 ( 1 ) 頁： 016201-1:6   2012年1月

Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas 査読有り

Kenji Ishikawa, Hiroko Moriyama, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Hiromasa Tanaka, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori

MRS Online Proceedings Library   1469 巻   2012年

Chemical Bond Modification in Porous SiOCH Films by H2 and H2/N2 Plasmas Investigated by in situ Infrared Reflection Absorption Spectroscopy (IR-RAS) 査読有り

Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, and Masaru Hori

J. Appl. Phys.   111 巻 ( 12 ) 頁： 1   2011年12月

Inactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma 査読有り

Sachiko Iseki, Hiroshi Hashizume, Fengdong Jia, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, and Masaru Hori

Appl. Phys. Express   4 巻   頁： 116201   2011年11月

Impacts of CF+, CF2+, CF3+ and Ar Ion Beam Bombardment with energies from 100eV and 400eV on Surface Modification of Photoresist

Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, and Masaru Hori

Jpn. J. Appl. Phys.   50 巻 ( 8 ) 頁： 08JE05-1:5   2011年8月

Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma 査読有り

Masaki Minami, Shigetaka Tomiya, Kenji Ishikawa, Ryosuke Matsumoto, Shang Chen, Masanaga Fukasawa, Fumikatsu Uesawa, Makoto Sekine, Masaru Hori, and Tetsuya Tatsumi

Jpn. J. Appl. Phys.   50 巻 ( 8 ) 頁： 08JE03-1:4   2011年8月

Spatial Distributions of Electron, CF, CF2 Radical Densities and Gas Temperature in dc-Superposed Dual- Frequency- Capacitively-Coupled Plasma Etch Reactor Employing c-C4F8/N2/Ar gas

Tsuyoshi Yamaguchi, Tetsuya Kimura, Chishio Koshimizu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine and Masaru Hori

Jpn. J. Appl. Phys.   50 巻 ( 5 ) 頁： 0   2011年5月

Synergistic Formation of Radicals with Irradiation with both Vacuum Ultraviolet and Atomic Hydrogen: a Real time in situ Electron-Spin-Resonance Study 査読有り

Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

J. Phys. Chem. Lett.   2 巻   頁： 1278-1281   2011年5月

H2/N2 Plasma Damage on Porous Dielectric SiOCH Film Evaluated by In-situ Film Characterization and Plasma Diagnostics 査読有り

Hiroshi Yamamoto, Keigo Takeda, Kenji Ishikawa, Masafumi Ito, Makoto Sekine, Masaru Hori, Takeshi Kaminatsui, Hisataka Hayashi, Itsuko Sakai, and Tokuhisa Ohiwa

J. Appl. Phys.   109 巻   頁： 084112:1-8   2011年4月

Dissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma 査読有り

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

Jpn. J. Appl. Phys.   50 巻   頁： 036203:1-4   2011年3月

Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet 査読有り

Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, and Masaru Hori

Appl. Phys. Express   4 巻   頁： 026101:1-3   2011年1月

Behaviors of Absolute Densities of N, H and NH3 at Remote Region of High Density Radical Source Employing N2-H2 Mixture Plasmas 査読有り

Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den and Masaru Hori

Jpn. J. Appl. Phys.   50 巻   頁： 01AE03:1-4   2011年1月

Hydrophobic Treatment of Organics against Glass Employing nonequilibrium Atmospheric Pressure Pulsed Plasmas with a Mixture of CF4 and N2 Gases 査読有り

Hirotoshi Inui, Keigo Takeda, Kenji Ishikawa, Takuya Yara, Tsuyoshi Uehara, Makoto Sekine and Masaru Hori

J. Appl. Phys.   109 巻   頁： 013310:1-6   2011年1月

Measurement of Hydrogen Radical Density and its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases

Hirotoshi Inui, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Sekine Makoto, Hiroyuki Kano, Naofumi Yoshida, and Masaru Hori

Appl. Phys. Express   3 巻   頁： 126101:1-3   2010年12月

Etching Damage in Diamond Studied Using an Energy-Controlled Oxygen Ion Beam 査読有り

Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

Jpn. J. Appl. Phys.   46 巻 ( 1 ) 頁： 60-64   2007年1月

Defect creation in diamond by hydrogen plasma treatment at room temperature 査読有り

Yuuichi Yamazaki, Kenji Ishikawa, Seiji Samukawa, and Satoshi Yamasaki

Physica B   376/377 巻   頁： 327-330   2006年6月

Structure of diamond surface defective layer damaged by hydrogen ion beam exposure 査読有り

Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

Diamond Related Mater.   15 巻 ( 4-8 ) 頁： 703-706   2006年5月

Surface Reactions During Etching of Organic Low-k Films by Plasma of N2 and H2 査読有り

Kenji Ishikawa, Yoshikazu Yamaoka, Moritaka Nakamura, Yuichi Yamazaki, Satoshi Yamasaki, Yasushi Ishikawa, and Seiji Samukawa

J. Appl. Phys.   99 巻 ( 8 ) 頁： 083305:1-6   2006年5月

Effcient Reduction of Standby Leakage Current in LSIs for Use in Mobile Devices 査読有り

Hiroshi Kudo, Kenji Ishikawa, Yasuyoshi Mishima, et al.

Jpn. J. Appl. Phys.   45 巻 ( 4B ) 頁： 3150-3153   2006年4月

理想的な界面形成を追求　半導体のドライ洗浄技術 招待有り

石川健治、安立なつ美

工業材料   54 巻   頁： 1   2006年

Structural change in diamond by hydrogen plasma treatment at room temperature 査読有り

Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

Diamond Related Mater.   14 巻 ( 11-12 ) 頁： 1939-1942   2005年10月

In vacuo measurements of dangling bonds created during Ar-diluted fluorocarbon plasma etching of silicon dioxide films 査読有り

Kenji Ishikawa, Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa, and Satoshi Yamasaki

Appl. Phys. Lett.   86 巻   頁： 264104:1-3   2005年6月

Mass-analyzed CFx+ (x=1,2,3) ion beam study on selectivity of SiO2-to-SiN etching and a-C:F film deposition 査読有り

Ken-ichi Yanai, Kazuhiro Karahashi, Kenji Ishikawa, and Moritaka Nakamura

J. Appl. Phys.   97 巻 ( 5 ) 頁： 053302:1-6   2005年2月

Etching yield of SiO2 irradiated by F+ CFx+ (x=1,2,3) ion with energies from 250 to 2000 eV 査読有り

Kazuhiro Karahashi, Ken-ichi Yanai, Kenji Ishikawa, Hideo Tsuboi, Kazuaki Kurihara, and Moritaka Nakamura

J. Vac. Sci. Technol. A   22 巻 ( 4 ) 頁： 1166   2004年6月

ドライ洗浄技術－半導体製造－ 査読有り

伊藤隆司、杉野林志、石川健治

精密工学会誌   70 巻   頁： 894   2004年

Transitional change to amorphous fluorinated carbon film deposition under energetic irradiation of mass-analyzed carbon mono-fluoride ions on silicon dioxide surfaces 査読有り

Kenji Ishikawa, Kazuhiro Karahashi, Hideo Tsuboi, Ken-ichi Yanai, and Moritaka Nakamura

J. Vac. Sci. Technol. A   21 巻   頁： L1-L3   2003年6月

Surface and gas-phase observations of Ar diluted c-C4F8 plasma by using real-time infrared spectroscopy and planar laser-induced fluorescence 査読有り

Kenji Ishikawa, Shigenori Hayashi, and Makoto Sekine

J. Appl. Phys.   93 巻 ( 3 ) 頁： 1403-1408   2003年2月

Vapor Treatment of Copper Surface Using Organic Acids 査読有り

Kenji Ishikawa, Teruo Yagishita and Moritaka Nakamura

MRS Proceedings   766 巻   2003年

In-vacuo electron spin resonance study on amorphous fluorinated carbon films for understanding of surface chemical reactions in plasma etching 査読有り

Kenji Ishikawa, Shoji Kobayashi, Mitsuru Okigawa, Makoto Sekine, Satoshi Yamasaki, Tetsuji Yasuda, and Junichi Isoya

Appl. Phys. Lett.   81 巻 ( 10 ) 頁： 1773-1775   2002年9月

Planar laser-induced fluorescence of fluorocarbon radicals in oxide etch process plasma 査読有り

Shigenori Hayashi, Kenji Ishikawa, and Makoto Sekine

Jpn. J. Appl. Phys.   41 巻 ( 4A ) 頁： 2207-2212   2002年4月

Direct observation of surface dangling bonds during plasma process: chemical reactions during H2 and Ar plasma treatments 査読有り

Satoshi Yamasaki, Ujjwal Das, and Kenji Ishikawa

Thin Solid Films   407 巻 ( 1-2 ) 頁： 139-143   2002年2月

Early-stage modification of a silicon oxide surface in fluorocarbon plasma for selective etching over silicon 査読有り

Kenji Ishikawa, and Makoto Sekine

J. Appl. Phys.   91 巻 ( 3 ) 頁： 1661-1666   2002年2月

In-situ time-resolved infrared spectroscopic study of silicon-oxide surface during selective etching over silicon in fluorocarbon plasma 査読有り

Kenji Ishikawa, and Makoto Sekine

Jpn. J. Appl. Phys.   39 巻   頁： 6990-6995   2000年12月

Asymmetric peak line shape on infrared dielectric function spectra of thermally grown silicon dioxide films 査読有り

Kenji Ishikawa, Kunihiro Suzuki, and Shigeru Okamura

J. Appl. Phys.   88 巻   頁： 7150-7156   2000年

Thickness-deconvolved structural properties of thermally grown silicon dioxide films 査読有り

Kenji Ishikawa, Hiroki Ogawa, and Shuzo Fujimura

J. Appl. Phys.   86 巻   頁： 3472-3474   1999年

Contribution of interface roughness to infrared spectra of thermally grown silicon dioxide films 査読有り

Kenji Ishikawa, Hiroki Ogawa, and Shuzo Fujimura

J. Appl. Phys.   85 巻   頁： 4076-4082   1999年

Analysis of native oxide growth process on an atomically flattened and hydrogen terminated Si(111) surface in pure water using fourier transformed infrared reflection absorption spectroscopy 査読有り

Shuzo Fujimura, Kenji Ishikawa, and Hiroki Ogawa

J. Vac. Sci. Technol. A   16 巻 ( 1 ) 頁： 375-381   1998年1月

Dependence of TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature 査読有り

Kenji Ishikawa, Yuji Uchiyama, Hiroki Ogawa, and Shuzo Fujimura

Appl. Surf. Sci.   117/118 巻   頁： 212-215   1997年6月

Infrared spectroscopy study of the RCA standard clean chemical oxides and their sequencing 査読有り

Carlos Inomata, Hiroki Ogawa, Kenji Ishikawa, and Shuzo Fujimura

J. Electrochem. Soc.   143 巻 ( 9 ) 頁： 2995-3000   1996年9月

Initial stage of native oxide growth on hydrogen terminated silicon (111) surfaces 査読有り

Hiroki Ogawa, Kenji Ishikawa, Carlos Inomata, and Shuzo Fujimura

J. Appl. Phys.   79 巻 ( 1 ) 頁： 472-477   1996年1月

Observation of Oxygen Exposed Hydrogen Terminated Silicon Surface 査読有り

Hiroki Ogawa, Kenji Ishikawa, M. Aoki, Shuzo Fujimura, N. Ueno, Yasuhiro Horiike, Y. Harada

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 3, edited by H.Z. Massoud, E.H. Poindexter, and C.R. Helms, (The Electrochemical Society, NJ)     頁： 428   1996年

Effects of Dissolved Oxygen in HF Solution on Silicon Surface Morphology 査読有り

Hiroki Ogawa, Kenji Ishikawa, Miki T. Suzuki, Yuka Hayami, and Shuzo Fujimura

Jpn. J. Appl. Phys.   34 巻 ( 2B ) 頁： 732-736   1995年2月

FT-IR-RAS analysis of the structure of the SiO2/Si interface 査読有り

Kenji Ishikawa, Hiroki Ogawa, Carlos Inomata, Shuzo Fujimura, and Haruhisa Mori

Control of Semiconductor Interfaces, edited by I. Ohdomari, M. Oshima and A. Hiraki, (Elsevier Science B.V.)     頁： 447   1994年

Native Oxide Characterization on Silicon Surfaces 査読有り

Hiroki Ogawa, Carlos Inomata, Kenji Ishikawa, Shuzo Fujimura, and Haruhisa Mori

Control of Semiconductor Interfaces, edited by I. Ohdomari, M. Oshima and A. Hiraki, (Elsevier Science B.V.)     頁： 383   1994年

Observation of Thin SiO2 Films using IR-RAS 査読有り

Shuzo Fujimura, Kenji Ishikawa, and Haruhisa Mori

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2, edited by C. R. Helms and B. E. Deal, (Plenum Press)     頁： 91   1993年

New Analytical Method of SiO2 Structure by Infrared Reflection Absorption Spectroscopy (IR-RAS) 査読有り

Kenji Ishikawa, Hiroki Ogawa, Carlos Inomata, Shuzo Fujimura and Haruhisa Mori

MRS Proceedings   318 巻   頁： 425-431   1993年

ArFフォトレジストのプラズマエッチング技術

石川健治，堀勝（ 担当： 共著）

技術情報協会  2013年7月 

ドライエッチング In: 「ドライプロセスによる表面処理・薄膜形成（表面技術協会編）」

石川健治，堀勝（ 担当： 共著）

丸善  2013年5月  （ ISBN:978-4-339-04631-1 ）

層間絶縁膜の成膜とエッチング

石川健治，堀勝（ 担当： 共著）

エヌティエス出版  2012年7月  （ ISBN:978-4-86469-039-3 ）

エッチング工程の手法およびレジスト・レジストパターンへの影響

石川健治，堀勝（ 担当： 共著）

情報機構  2011年9月  （ ISBN:978-4-904080-90-0 ）

半導体プロセス洗浄方法とその効果

石川健治（ 担当： 共著）

有機汚染物質／アウトガスの発生メカニズムとトラブル対策事例集（技術情報協会）  2008年 

シリコン基板の洗浄

石川健治（ 担当： 共著）

エレクトロニクス洗浄技術（技術情報協会）  2007年 

C2F4の電子物性とPTFEの生成機構

林 俊雄, 石川 健治, 関根 誠, 堀 勝, 兒玉 直人, 豊田 浩孝

第70回応用物理学会春季学術講演会 17p-A205-18  2023年3月17日 

F2添加 Ar プラズマを用いた基板昇温下での AlGaN の原子層エッチング

中村 昭平, 谷出 敦, 灘原 壮一, 石川 健治, 小田 修, 堀 勝

第70回応用物理学会春季学術講演会 17p-A205-11  2023年3月17日 

成膜パラメータの寄与度解析に基づく、 水素化アモルファスカーボン薄膜のエッチ耐性の向上

安藤 悠介, 近藤 博基, 石川 健治, 堤 隆嘉, 関根 誠, 堀 勝

第70回応用物理学会春季学術講演会 17a-A205-7  2023年3月17日 

ウエハプロセスのグリーン化イノベーションに向けた戦略的挑戦 招待有り

堀 勝、関根 誠、石川 健治

第83回 応用物理学会秋季学術講演会 21p-B104-3  2022年9月21日 

プラズマ活性乳酸リンゲル液によるマクロファージの形質発現誘導

出野 雄大、柏倉 慧史、田中 宏昌、石川 健治、橋爪 博司、中村 香江、豊國 伸哉、水野 正明、梶山 広明、堀 勝

第83回 応用物理学会秋季学術講演会 20a-A106-7  2022年9月20日 

イオン照射角制御によるカーボンナノウォールの配向成長

射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第83回 応用物理学会秋季学術講演会 23p-B102-5  2022年9月23日 

プラズマ活性溶液による細胞運命の制御 招待有り

田中 宏昌、水野 正明、石川 健治、梶山 広明、豊國 伸哉、吉川 史隆、堀 勝

第83回 応用物理学会秋季学術講演会 21p-B200-5  2022年9月21日 

非平衡大気圧プラズマを用いた陸上養殖実現に向けた基礎的研究

紅林 佑弥、石川 健治、田中 宏昌、秋山 真一、橋爪 博司、堀 勝

第83回 応用物理学会秋季学術講演会 20p-A106-13  2022年9月20日 

水素化アモルファスカーボン薄膜の合成機構における活性種の寄与度の機械学習を用いた解析

近藤 博基、黒川 純平、堤 隆嘉、関根 誠、石川 健治、堀 勝

第83回 応用物理学会秋季学術講演会 23a-B101-3  2022年9月23日 

プラズマアシスト熱サイクル法を用いたSiGeのセルフリミティング性サイクルエッチング

篠田 和典、三浦 勝哉、前田 賢治、伊澤 勝、NGUYEN Thi-Thuy-Nga、石川 健治、堀 勝

第83回 応用物理学会秋季学術講演会 22p-A406-4  2022年9月22日 

ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析

近藤 博基、尾崎 敦士、堤 隆嘉、関根 誠、石川 健治、堀 勝、平松 美根男

第69回応用物理学会春季学術講演会　24p-D114-6  2022年3月24日 

C3H6/H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係

黒川 純平、光成 正、近藤 博基、堤 隆嘉、関根 誠、石川 健治、堀 勝

第69回応用物理学会春季学術講演会　25p-E104-13  2022年3月24日 

C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響

吉江 泰斗、堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝

第69回応用物理学会春季学術講演会　25a-E104-7  2022年3月24日 

Ar/F2プラズマとBCl3の交互供給によるAlGaN原子層エッチングでの組成比制御

中村 昭平、谷出 敦、木村 貴弘、灘原 壮一、石川 健治、小田 修、堀 勝

第69回応用物理学会春季学術講演会　25a-E104-5  2022年3月24日 

窒化ガリウムの基板昇温時サイクルエッチング特性

南 吏玖、中村 昭平、谷出 敦、石川 健治、堤 隆嘉、近藤 博基、関根 誠、堀 勝

第69回応用物理学会春季学術講演会　25a-E104-4  2022年3月24日 

プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果

射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第69回応用物理学会春季学術講演会　24p-D114-8  2022年3月24日 

高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの表面電位制御

橋本 拓海、近藤 博基、田中 宏昌、石川 健治、堤 隆嘉、関根 誠、安井 隆雄、馬場 嘉信、平松 美根男、堀 勝

第69回応用物理学会春季学術講演会　24p-D114-7  2022年3月24日 

中性酸素ラジカル源を用いたポリエチレンテレフタレートの生分解速度の向上

五藤 大智、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、伊藤 昌文、堀 勝

第69回応用物理学会春季学術講演会　25a-E105-1  2022年3月24日 

稲穂への低温プラズマ照射がもたらす酒造品種玄米の品質向上

橋爪 博司、北野 英己、水野 寛子、阿部 明子、三田 薫、蕭 世男、湯浅 元気、東野 里江、田中 宏昌、石川 健治、松本 省吾、榊原 均、仁川 進、前島 正義、水野 正明、堀 勝

第69回応用物理学会春季学術講演会　25p-E105-13  2022年3月24日 

網羅的解析に基づくプラズマ活性溶液による細胞死の機構解明

田中 宏昌、水野 正明、石川 健治、橋爪 博司、中村 香江、梶山 広明、吉川 史隆、岡崎 康昌、豊國 伸哉、堀 勝

第69回応用物理学会春季学術講演会　25a-E105-8  2022年3月24日 

プラズマ照射乳酸リンゲル液の抗腫瘍成分の評価

伊藤 大貴、岩田 直幸、石川 健治、橋爪 博司、中村 香江、ミロン カメリア、田中 宏昌、梶山 広明、豊國 伸哉、水野 正明、堀 勝

第69回応用物理学会春季学術講演会　25a-E105-7  2022年3月24日 

流液への照射によるプラズマ活性溶液の作製と短寿命活性種の測定

柏倉 慧史、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、堀 勝

第69回応用物理学会春季学術講演会　25a-E105-6  2022年3月24日 

低温プラズマ処理による高品質イチゴ果実の安定性生産

橋爪 博司、松本 省吾、坪田 憲紀、三田 薫、水野 寛子、阿部 明子、湯浅 元気、東野 里江、田中 宏昌、石川 健治、伊藤 昌文、北野 英己、榊原 均、仁川 進、大熊 隆之、前島 正義、水野 正明、堀 勝

The 39th Symposium on plasma processing / 34th Symposium on Plasma Science for Materials (SPP39/SPSM34)　L024-AM-A-03  2022年1月24日 

C2F6/H2混合ガスを用いてラジカル注入型プラズマ励起化学気相堆積法により成長させたカーボンナノウォールのモフォロジー制御

橋本 拓海、近藤 博基、石川 健治、堤 隆嘉、関根 誠、平松 美根男、堀 勝

The 39th Symposium on plasma processing / 34th Symposium on Plasma Science for Materials (SPP39/SPSM34)　S025-B-08  2022年1月24日 

液中プラズマプロセスを用いたエタノール内金属基板上へのナノグラフェンの成膜

デラヴェガマイアシャンリン、近藤 博基、堤 隆嘉、グエンティ・トゥイーンガ、石川 健治、関根 誠、ヴァスケズマグダレノジュニア、堀 勝

The 39th Symposium on plasma processing / 34th Symposium on Plasma Science for Materials (SPP39/SPSM34)　S025-A-11  2022年1月24日 

カーボンナノウォールの形態と高さが光透過率に及ぼす影響

射場 信太朗、近藤 博基、石川 健治、関根 誠、堤 隆嘉、平松 美根男、堀 勝

The 39th Symposium on plasma processing / 34th Symposium on Plasma Science for Materials (SPP39/SPSM34)　S025-A-10  2022年1月24日 

原子状酸素ラジカル処理したポリエチレンテレフタレートの生分解

五藤 大智、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、伊藤 昌文、上坂 裕之、堀 勝

The 39th Symposium on plasma processing / 34th Symposium on Plasma Science for Materials (SPP39/SPSM34)　S025-A-02  2022年1月24日 

プラズマ活性乳酸リンゲル液によるがん細胞死の分子機構

田中 宏昌、水野 正明、石川 健治、橋爪 博司、中村 香江、岡崎 康昌、豊國 伸哉、梶山 広明、吉川 史隆、堀 勝

The 39th Symposium on plasma processing / 34th Symposium on Plasma Science for Materials (SPP39/SPSM34)　L024-AM-A-05  2022年1月24日 

Functional nitrogen science for plasma-processing in life and matter 招待有り 国際会議

Kenji Ishikawa, Toshiro Kaneko, and Masaru Hori

2021年12月12日  Material Research Society of Japan

Optical transmission of carbon nanowalls from ultra-violet region to infra-red region 国際会議

Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

Material Research Meeting (MRM 2020)  2021年12月12日 

Enhancement of biodegradation technology of polyethylene terephthalate with plasma-pretreatment 国際会議

Daichi Goto, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Masafumi Ito, and Masaru Hori

31st Material Research Society in Japan (MRS-J)  2021年12月12日 

Plasma-biological reaction networks and aqueous radical chemistry 招待有り 国際会議

Kenji Ishkawa, Camelia Miron, Takashi Kondo, Hiromasa Tanaka, and Masaru Hori

31st Material Research Society in Japan (MRS-J)  2021年12月12日 

Cellular Respiration System Affected by Low-temperature Plasma 国際会議

Hiromasa Tanaka, Shogo Maeda, Shogo Matsumura, Masaaki Mizuno, Kenji Ishikawa, Masafumi Ito, Hiroshi Hashizume, Mikako Ito, Kinji Ohno, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Yasumasa Okazaki, Shinya Toyokuni, and Masaru Hori

31st Material Research Society in Japan (MRS-J)  2021年12月12日