ASET 優秀研究員“SiO2およびポリマーのプラズマエッチング表面反応の研究”

2003   技術研究組合　超先端電子技術開発機構（ASET）  

2003 spring MRS best poster award: E3.28 VAPOR TREATMENT OF COPPER SURFACE USING ORGANIC ACIDS

2003   Material Research Society  

High-performance glass filters for capturing and culturing circulating tumor cells and cancer-associated fibroblasts Reviewed

Tanaka, H; Iwata, D; Shibata, Y; Hase, T; Onoshima, D; Yogo, N; Shibata, H; Sato, M; Ishikawa, K; Nagasawa, I; Hasegawa, Y; Ishii, M; Baba, Y; Hori, M

SCIENTIFIC REPORTS   Vol. 13 ( 1 )   2023.3

Generation and measurement of low-temperature plasma for cancer therapy: a historical review Reviewed

Ishikawa, K; Takeda, K; Yoshimura, S; Kondo, T; Tanaka, H; Toyokuni, S; Nakamura, K; Kajiyama, H; Mizuno, M; Hori, M

FREE RADICAL RESEARCH   Vol. 57 ( 3 ) page： 239 - 270   2023.3

Efficacy of periodic cold plasma treatment in a paddy to produce white-core grains in brewer's rice cultivar Yamadanishiki Reviewed

Hashizume, H; Kitano, H; Mizuno, H; Abe, A; Yuasa, G; Tohno, S; Tanaka, H; Ishikawa, K; Matsumoto, S; Sakakibara, H; Hirosue, Y; Maeshima, M; Mizuno, M; Hori, M

FREE RADICAL RESEARCH   Vol. 57 ( 3 ) page： 161 - 173   2023.3

Cancer-specific cytotoxicity of Ringer's acetate solution irradiated by cold atmospheric pressure plasma Reviewed

Miron, C; Ishikawa, K; Kashiwagura, S; Suda, Y; Tanaka, H; Nakamura, K; Kajiyama, H; Toyokuni, S; Mizuno, M; Hori, M

FREE RADICAL RESEARCH   Vol. 57 ( 2 ) page： 91 - 104   2023.2

Plasma-Assisted Priming: Improved Germination and Seedling Performance of Papaya Reviewed

Xi, DK; Yap, SL; Kumar, NN; Toh, CC; Ishikawa, K; Hori, M

SAINS MALAYSIANA   Vol. 52 ( 2 ) page： 599 - 611   2023.2

GaN damage-free cyclic etching by sequential exposure to Cl₂ plasma and Ar plasma with low Ar<SUP>+</SUP>-ion energy at substrate temperature of 400 °C Reviewed

Nakamura, S; Tanide, A; Kimura, T; Nadahara, S; Ishikawa, K; Oda, O; Hori, M

JOURNAL OF APPLIED PHYSICS   Vol. 133 ( 4 )   2023.1

Mechanical properties of maze-like carbon nanowalls synthesized by the radial injection plasma enhanced chemical vapor deposition method Reviewed

Ghodke, S; Murashima, M; Christy, D; Van Nong, N; Ishikawa, K; Oda, O; Umehara, N; Hori, M

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING   Vol. 862   2023.1

Effects of plasma-activated Ringer's lactate solution on cancer cells: evaluation of genotoxicity Reviewed

Liu, Y; Nakatsu, Y; Tanaka, H; Koga, K; Ishikawa, K; Shiratani, M; Hori, M

GENES AND ENVIRONMENT   Vol. 45 ( 1 )   2023.1

Editorial: Prospects of plasma generated species interaction with organic and inorganic materials Reviewed

Attri, P; Koga, K; Kurita, H; Ishikawa, K; Shiratani, M

FRONTIERS IN PHYSICS   Vol. 10   2023.1

Plasma activated Ringer's lactate solution Reviewed

Tanaka, H; Mizuno, M; Ishikawa, K; Miron, C; Okazaki, Y; Toyokuni, S; Nakamura, K; Kajiyama, H; Hori, M

FREE RADICAL RESEARCH   Vol. 57 ( 1 ) page： 14 - 20   2023.1

Biocompatibility of conformal silicon carbide on carbon nanowall scaffolds Reviewed

Ono, K; Koide, T; Ishikawa, K; Tanaka, H; Kondo, H; Sugawara-Narutaki, A; Jin, Y; Yasuhara, S; Hori, M; Takeuchi, W

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 62 ( SA )   2023.1

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies Reviewed

Kambara, M; Kawaguchi, S; Lee, HJ; Ikuse, K; Hamaguchi, S; Ohmori, T; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 62 ( SA )   2023.1

Effects of High-Quality Carbon Nanowalls Ionization-Assisting Substrates on Surface-Assisted Laser Desorption/Ionization Mass Spectrometry Performance Reviewed

Sakai, R; Kondo, H; Ishikawa, K; Ohta, T; Hiramatsu, M; Tanaka, H; Hori, M

NANOMATERIALS   Vol. 13 ( 1 )   2023.1

Impact of microsecond-pulsed plasma-activated water on papaya seed germination and seedling growth Reviewed

Xi, DK; Zhang, XH; Yang, SZ; Yap, SS; Ishikawa, K; Hori, M; Yap, SL

CHINESE PHYSICS B   Vol. 31 ( 12 )   2022.12

Indoor Floor Heel Mark Removal Using Spark Discharges and Pressurized Airflow Reviewed

Sakamoto, Y; Tsutsumi, T; Tanaka, H; Ishikawa, K; Hashizume, H; Hori, M

COATINGS   Vol. 12 ( 12 )   2022.12

Dry etching of ternary metal carbide TiAlC via surface modification using floating wire-assisted vapor plasma Reviewed

Nguyen, TTN; Shinoda, K; Hamamura, H; Maeda, K; Yokogawa, K; Izawa, M; Ishikawa, K; Hori, M

SCIENTIFIC REPORTS   Vol. 12 ( 1 )   2022.11

Carbon Layer Formation on Hexagonal Boron Nitride by Plasma Processing in Hydroquinone Aqueous Solution Reviewed

Inoue, K; Sakakibara, N; Goto, T; Ito, T; Shimizu, Y; Hakuta, Y; Ishikawa, K; Hori, M; Terashima, K

ACS APPLIED MATERIALS & INTERFACES     2022.11

Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis Reviewed

Kurokawa, J; Kondo, H; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

VACUUM   Vol. 205   2022.11

Dissociation channels of c-C₄F₈ to C₂F₄ in reactive plasma Reviewed

Hayashi, T; Ishikawa, K; Sekine, M; Hori, M; Lwayama, H

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( 10 )   2022.10

In-liquid plasma synthesis of iron-nitrogen-doped carbon nanoflakes with high catalytic activity Reviewed

Kondo, H; Hamaji, R; Amano, T; Ishikawa, K; Sekine, M; Hiramatsu, M; Hori, M

PLASMA PROCESSES AND POLYMERS   Vol. 19 ( 8 )   2022.8

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O₂/C₄F₈ plasma etching process Reviewed

Sahu, BB; Nakane, K; Ishikawa, K; Sekine, M; Tsutsumi, T; Gohira, T; Ohya, Y; Ohno, N; Hori, M

PHYSICAL CHEMISTRY CHEMICAL PHYSICS   Vol. 24 ( 22 ) page： 13883 - 13896   2022.6

Low-temperature reduction of SnO₂ by floating wire-assisted medium-pressure H₂/Ar plasma Reviewed

Nguyen, TTN; Sasaki, M; Hsiao, SN; Tsutsumi, T; Ishikawa, K; Hori, M

PLASMA PROCESSES AND POLYMERS   Vol. 19 ( 6 )   2022.6

Cytotoxicity of plasma-irradiated lactate solution produced under atmospheric airtight conditions and generation of the methyl amino group Reviewed

Ito, D; Iwata, N; Ishikawa, K; Nakamura, K; Hashizume, H; Miron, C; Tanaka, H; Kajiyama, H; Toyokuni, S; Mizuno, M; Hori, M

APPLIED PHYSICS EXPRESS   Vol. 15 ( 5 )   2022.5

Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride Reviewed

Shinoda, K; Miyoshi, N; Kobayashi, H; Hanaoka, Y; Izawa, M; Ishikawa, K; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 40 ( 2 )   2022.3

Scaffolds with isolated carbon nanowalls promote osteogenic differentiation through Runt-related transcription factor 2 and osteocalcin gene expression of osteoblast-like cells Reviewed

Ichikawa, T; Ishikawa, K; Tanaka, H; Shimizu, N; Hori, M

AIP ADVANCES   Vol. 12 ( 2 )   2022.2

Enhancement of ethanol production and cell growth in budding yeast by direct irradiation of low-temperature plasma Reviewed

Tanaka, H; Matsumura, S; Ishikawa, K; Hashizume, H; Ito, M; Nakamura, K; Kajiyama, H; Kikkawa, F; Ito, M; Ohno, K; Okazaki, Y; Toyokuni, S; Mizuno, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA )   2022.1

Towards prevention and prediction of infectious diseases with virus sterilization using ultraviolet light and low-temperature plasma and bio-sensing devices for health and hygiene care Reviewed International coauthorship

Kumagai, S; Nishigori, C; Takeuchi, T; Bruggeman, P; Takashima, K; Takahashi, H; Kaneko, T; Choi, EH; Nakazato, K; Kambara, M; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA ) page： SA0808   2022.1

Perspectives on functional nitrogen science and plasma-based <i>in situ</i> functionalization Reviewed

Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA ) page： SA0802   2022.1

Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems Reviewed International coauthorship

Kaneko, T; Kato, H; Yamada, H; Yamamoto, M; Yoshida, T; Attri, P; Koga, K; Murakami, T; Kuchitsu, K; Ando, S; Nishikawa, Y; Tomita, K; Ono, R; Ito, T; Ito, AM; Eriguchi, K; Nozaki, T; Tsutsumi, T; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA ) page： SA0805   2022.1

On the Etching Mechanism of Highly Hydrogenated SiN Films by CF₄/D₂ Plasma: Comparison with CF₄/H₂ Reviewed

Hsiao, SN; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

COATINGS   Vol. 11 ( 12 ) page： 1535   2021.12

プラズマがん治療 Invited Reviewed

石川健治，堀勝

静電気学会誌   Vol. 45 ( 6 ) page： 206 - 212   2021.11

Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF₄/H₂ plasma at different substrate temperatures Reviewed

Hsiao, SN; Britun, N; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

PLASMA PROCESSES AND POLYMERS   Vol. 18 ( 11 ) page： 2100078   2021.11

Plasma-activated Ringer's lactate solution inhibits the cellular respiratory system in HeLa cells Reviewed

Tanaka, H; Maeda, S; Nakamura, K; Hashizume, H; Ishikawa, K; Ito, M; Ohno, K; Mizuno, M; Motooka, Y; Okazaki, Y; Toyokuni, S; Kajiyama, H; Kikkawa, F; Hori, M

PLASMA PROCESSES AND POLYMERS   Vol. 18 ( 10 ) page： 2100056   2021.10

Low temperature plasma irradiation products of sodium lactate solution that induce cell death on U251SP glioblastoma cells were identified Reviewed

Tanaka, H; Hosoi, Y; Ishikawa, K; Yoshitake, J; Shibata, T; Uchida, K; Hashizume, H; Mizuno, M; Okazaki, Y; Toyokuni, S; Nakamura, K; Kajiyama, H; Kikkawa, F; Hori, M

SCIENTIFIC REPORTS   Vol. 11 ( 1 ) page： 18488   2021.9

Leading edge of transcendental dry etching technology realizing advanced decice structures Invited Reviewed

Kenji Ishikawa, and Keigo Takeda

Journal of plasma and fusion research   Vol. 97 ( 9 ) page： 534 - 536   2021.9

Effects of free radicals generated by atmospheric pressure plasma on physical actions and biochemical relaxations (PACR) Invited Reviewed

Kenji Ishikawa, Hiroshi Hashizume, Camelia Miron, Hiromasa Tanaka, and Masaru Hori

Radiation biology research communications   Vol. 56 ( 3 ) page： 280 - 294   2021.9

Reaction control of atomic layer and low dame processes for plasma etching of nitride semiconductor Invited Reviewed

Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Journal of plasma and fusion research   Vol. 97 ( 9 ) page： 517 - 521   2021.9

Leading edge of transcendental dry etching technology realizing advanced decice structures Invited Reviewed

Kenji Ishikawa, and Keigo Takeda

Journal of plasma and fusion research   Vol. 97 ( 9 ) page： 508 - 510   2021.9

Novel Method of Rebound Tailing Pulse (RTP) for Water Dissociation Reviewed

Shimizu, N; Borude, RR; Tanaka, R; Ishikawa, K; Oda, O; Hosoe, H; Ino, S; Inoue, Y; Hori, M

IEEE TRANSACTIONS ON PLASMA SCIENCE   Vol. 49 ( 9 ) page： 2893 - 2900   2021.9

Lysosomal nitric oxide determines transition from autophagy to ferroptosis after exposure to plasma-activated Ringer's lactate Reviewed

Jiang, L; Zheng, H; Lyu, QY; Hayashi, S; Sato, K; Sekido, Y; Nakamura, K; Tanaka, H; Ishikawa, K; Kajiyama, H; Mizuno, M; Hori, M; Toyokuni, S

REDOX BIOLOGY   Vol. 43   page： 101989   2021.7

Brain cell proliferation in adult rats after irradiation with nonequilibrium atmospheric pressure plasma Reviewed

Yamato, M; Tamura, Y; Tanaka, H; Ishikawa, K; Ikehara, Y; Hori, M; Kataoka, Y

APPLIED PHYSICS EXPRESS   Vol. 14 ( 6 ) page： 067002   2021.6

Hydrogen peroxide in lactate solutions irradiated by non-equilibrium atmospheric pressure plasma Reviewed

Liu, Y; Ishikawa, K; Miron, C; Hashizume, H; Tanaka, H; Hori, M

PLASMA SOURCES SCIENCE & TECHNOLOGY   Vol. 30 ( 4 )   2021.4

Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF₄/H₂ plasma Reviewed

Hsiao, SN; Nakane, K; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

APPLIED SURFACE SCIENCE   Vol. 542   page： 148550   2021.3

Selective etching of SiN against SiO₂ and poly-Si films in hydrofluoroethane chemistry with a mixture of CH₂FCHF₂, O₂, and Ar Reviewed

Hsiao, SN; Ishikawa, K; Hayashi, T; Ni, JW; Tsutsumi, T; Sekine, M; Hori, M

APPLIED SURFACE SCIENCE   Vol. 541   page： 148439   2021.3

FOREWORD Mechanistic understanding of cold atmospheric plasma applications Reviewed

Kurihara, K; Ishikawa, K; Takaki, K; Shiratani, M

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 2 )   2021.2

Growth inhibition effect on <i>Trypanosoma brucei</i> <i>gambiense</i> by the oxidative stress supplied from low-temperature plasma at atmospheric pressure Reviewed

Yokoyama, N; Sivakumar, T; Ikehara, S; Akimoto, Y; Yamaguchi, T; Wakai, K; Ishikawa, K; Hori, M; Shimizu, T; Sakakita, H; Ikehara, Y

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 2 ) page： 020601   2021.2

Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS) Reviewed

Sakai, R; Ichikawa, T; Kondo, H; Ishikawa, K; Shimizu, N; Ohta, T; Hiramatsu, M; Hori, M

NANOMATERIALS   Vol. 11 ( 2 ) page： 262   2021.2

Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture Reviewed International coauthorship

Attri, P; Ishikawa, K; Okumura, T; Koga, K; Shiratani, M; Mildaziene, V

SCIENTIFIC REPORTS   Vol. 11 ( 1 ) page： 2539   2021.1

Inactivation mechanism of fungal spores through oxygen radicals in atmospheric-pressure plasma Reviewed

Ito, M; Hashizume, H; Oh, JS; Ishikawa, K; Ohta, T; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 1 ) page： 010503   2021.1

Reduction in photon-induced interface defects by optimal pulse repetition rate in the pulse-modulated inductively coupled plasma Reviewed

Miyoshi, Y; Ishikawa, K; Sekine, M; Hori, M; Tatsumi, T

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 1 ) page： 010906   2021.1

Insights into normothermic treatment with direct irradiation of atmospheric pressure plasma for biological applications Reviewed

Yoshimura, S; Otsubo, Y; Yamashita, A; Ishikawa, K

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 1 ) page： 010502   2021.1

Improvement of yield and grain quality by periodic cold plasma treatment with rice plants in a paddy field Reviewed

Hashizume, H; Kitano, H; Mizuno, H; Abe, A; Yuasa, G; Tohno, S; Tanaka, H; Ishikawa, K; Matsumoto, S; Sakakibara, H; Nikawa, S; Maeshima, M; Mizuno, M; Hori, M

PLASMA PROCESSES AND POLYMERS   Vol. 18 ( 1 ) page： 2000181   2021.1

Cancer Treatments Using Low-Temperature Plasma Reviewed

Tanaka, H; Mizuno, M; Ishikawa, K; Toyokuni, S; Kajiyama, H; Kikkawa, F; Hori, M

CURRENT MEDICINAL CHEMISTRY   Vol. 28 ( 41 ) page： 8549 - 8558   2021

Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature Reviewed

Sugiura, H; Kondo, H; Higuchi, K; Arai, S; Hamaji, R; Tsutsumi, T; Ishikawa, K; Hori, M

CARBON   Vol. 170   page： 93 - 99   2020.12

Influence of chamber pressure on the crystal quality of homo-epitaxial GaN grown by radical-enhanced MOCVD (REMOCVD) Reviewed

Amalraj, FW; Shimizu, N; Oda, O; Ishikawa, K; Hori, M

JOURNAL OF CRYSTAL GROWTH   Vol. 549   page： 125863   2020.11

Steering of surface discharges on through-glass-vias combined with high-density nonequilibrium atmospheric pressure plasma generation Reviewed

Sato, Y; Katsuno, K; Odaka, H; Imajyo, N; Ishikawa, K; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 53 ( 43 ) page： 534302   2020.10

Formation of spherical Sn particles by reducing SnO₂ film in floating wire-assisted H₂/Ar plasma at atmospheric pressure Reviewed

Nguyen, TTN; Sasaki, M; Tsutsumi, T; Ishikawa, K; Hori, M

SCIENTIFIC REPORTS   Vol. 10 ( 1 ) page： 17770   2020.10

Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources Reviewed

Tanide, A; Nakamura, S; Horikoshi, A; Takatsuji, S; Kimura, T; Kinose, K; Nadahara, S; Nishikawa, M; Ebe, A; Ishikawa, K; Oda, O; Hori, M

ACS OMEGA   Vol. 5 ( 41 ) page： 26776 - 26785   2020.10

Laser-induced-plasma-activated medium enables killing of HeLa cells Reviewed

Kurokawa, Y; Takeda, K; Ishikawa, K; Tanaka, H; Hori, M

APPLIED PHYSICS EXPRESS   Vol. 13 ( 10 ) page： 106001   2020.10

Adjusted multiple gases in the plasma flow induce differential antitumor potentials of plasma-activated solutions Reviewed

Nakamura, K; Yoshikawa, N; Yoshihara, M; Ikeda, Y; Higashida, A; Niwa, A; Jindo, T; Tanaka, H; Ishikawa, K; Mizuno, M; Toyokuni, S; Hori, M; Kikkawa, F; Kajiyama, H

PLASMA PROCESSES AND POLYMERS   Vol. 17 ( 10 ) page： 1900259   2020.10

Small size gold nanoparticles enhance apoptosis-induced by cold atmospheric plasma via depletion of intracellular GSH and modification of oxidative stress Reviewed

Jawaid, P; Rehman, MU; Zhao, QL; Misawa, M; Ishikawa, K; Hori, M; Shimizu, T; Saitoh, J; Noguchi, K; Kondo, T

CELL DEATH DISCOVERY   Vol. 6 ( 1 ) page： 83   2020.9

Numerical analysis of coaxial dielectric barrier helium discharges: three-stage mode transitions and internal bullet propagation Reviewed

Sato, Y; Ishikawa, K; Tsutsumi, T; Hori, M

APPLIED PHYSICS EXPRESS   Vol. 13 ( 8 ) page： 086001   2020.8

Plasma Agriculture from Laboratory to Farm: A Review Reviewed

Attri, P; Ishikawa, K; Okumura, T; Koga, K; Shiratani, M

PROCESSES   Vol. 8 ( 8 ) page： 1002   2020.8

Non-thermal plasma-activated lactate solution kills U251SP glioblastoma cells in an innate reductive manner with altered metabolism Reviewed

Ishikawa, K; Hosoi, Y; Tanaka, H; Jiang, L; Toyokuni, S; Nakamura, K; Kajiyama, H; Kikkawa, F; Mizuno, M; Hori, M

ARCHIVES OF BIOCHEMISTRY AND BIOPHYSICS   Vol. 688   page： 108414   2020.7

<i>In situ</i> surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar<SUP>+</SUP> ions and Cl radicals Reviewed

Hasegawa, M; Tsutsumi, T; Tanide, A; Nakamura, S; Kondo, H; Ishikawa, K; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   Vol. 38 ( 4 ) page： 042602   2020.7

Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity Reviewed

Sato, Y; Ishikawa, K; Tsutsumi, T; Ui, A; Akita, M; Oka, S; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 53 ( 26 ) page： 265204   2020.6

In-plane modification of hexagonal boron nitride particles via plasma in solution Reviewed

Ito, T; Goto, T; Inoue, K; Ishikawa, K; Kondo, H; Hori, M; Shimizu, Y; Hakuta, Y; Terashima, K

APPLIED PHYSICS EXPRESS   Vol. 13 ( 6 ) page： 066001   2020.6

Characterization of a microsecond pulsed non-equilibrium atmospheric pressure Ar plasma using laser scattering and optical emission spectroscopy Reviewed

Jia, FD; Wu, Y; Min, Q; Su, MG; Takeda, K; Ishikawa, K; Kondo, H; Sekine, M; Hori, M; Zhong, ZP

PLASMA SCIENCE & TECHNOLOGY   Vol. 22 ( 6 ) page： 065404   2020.6

Electronic properties and primary dissociation channels of fluoromethane compounds Reviewed

Hayashi, T; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 59 ( SJ ) page： SJJE02   2020.6

Electron spin resonance as a tool to monitor the influence of novel processing technologies on food properties Reviewed International coauthorship

Barba, FJ; Roohinejad, S; Ishikawa, K; Leong, SY; Bekhit, AEA; Saraiva, JA; Lebovka, N

TRENDS IN FOOD SCIENCE & TECHNOLOGY   Vol. 100   page： 77 - 87   2020.6

Dry Process FOREWORD Reviewed

Shirafuji, T; Kinoshita, K; Akatsuka, H; Eriguchi, K; Ichikawa, T; Ichiki, T; Ishijima, T; Ishikawa, K; Karahashi, K; Kurihara, K; Sekine, M

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 59   2020.6

Synthesis of isolated carbon nanowalls via high-voltage nanosecond pulses in conjunction with CH₄/H₂ plasma enhanced chemical vapor deposition Reviewed

Ichikawa, T; Shimizu, N; Ishikawa, K; Hiramatsu, M; Hori, M

CARBON   Vol. 161   page： 403 - 412   2020.5

Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp<SUP>2</SUP> carbon structures Reviewed

Sugiura, H; Ohashi, Y; Ishikawa, K; Kondo, H; Kato, T; Kaneko, T; Takeda, K; Tsutsumi, T; Hayashi, T; Sekine, M; Hori, M

DIAMOND AND RELATED MATERIALS   Vol. 104   2020.4

In-Liquid Plasma Synthesis of Nanographene with a Mixture of Methanol and 1-Butanol Reviewed

Ando, A; Ishikawa, K; Takeda, K; Ohta, T; Ito, M; Hiramatsu, M; Kondo, H; Sekine, M; Hori, M

CHEMNANOMAT   Vol. 6 ( 4 ) page： 604 - 609   2020.4

Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study Reviewed

Fukunaga, Y; Longo, RC; Ventzek, PLG; Lane, B; Ranjan, A; Hwang, GS; Hartmann, G; Tsutsumi, T; Ishikawa, K; Kondo, H; Sekine, M; Hori, M

JOURNAL OF APPLIED PHYSICS   Vol. 127 ( 2 )   2020.1

Etching characteristics of PECVD-prepared SiN films with CF₄/D₂ and CF₄/H₂ plasmas at different temperatures Reviewed

Hsiao, SN; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

2020 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     2020

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF₃/O₂ downstream plasma Reviewed

Shinoda, K; Miyoshi, N; Kobayashi, H; Izawa, M; Ishikawa, K; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 47 )   2019.11

Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate Reviewed

Isobe, Y; Sakai, T; Suguro, K; Miyashita, N; Kondo, H; Ishikawa, K; Wilson, AF; Shimizu, N; Oda, O; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 37 ( 6 )   2019.11

Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions Reviewed

Tanaka Hiromasa, Mizuno Masaaki, Katsumata Yuko, Ishikawa Kenji, Kondo Hiroki, Hashizume Hiroshi, Okazaki Yasumasa, Toyokuni Shinya, Nakamura Kae, Yoshikawa Nobuhisa, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

SCIENTIFIC REPORTS   Vol. 9   2019.9

Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS) Reviewed

Ohta, T; Ito, H; Ishikawa, K; Kondo, H; Hiramatsu, M; Hori, M

C-JOURNAL OF CARBON RESEARCH   Vol. 5 ( 3 )   2019.9

Self-limiting reactions of ammonium salt in CHF₃/O₂ downstream plasma for thermal-cyclic atomic layer etching of silicon nitride Reviewed

Shinoda, K; Miyoshi, N; Kobayashi, H; Izawa, M; Saeki, T; Ishikawa, K; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   Vol. 37 ( 5 )   2019.9

Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects Reviewed

Miyajima, H; Ishikawa, K; Sekine, M; Hori, M

PLASMA PROCESSES AND POLYMERS   Vol. 16 ( 9 )   2019.9

Simultaneous achievement of antimicrobial property and plant growth promotion using plasma-activated benzoic compound solution Reviewed

Iwata, N; Gamaleev, V; Hashizume, H; Oh, JS; Ohta, T; Ishikawa, K; Hori, M; Ito, M

PLASMA PROCESSES AND POLYMERS   Vol. 16 ( 8 )   2019.8

Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation Reviewed

Ichikawa, T; Kondo, H; Ishikawa, K; Tsutsumi, T; Tanaka, H; Sekine, M; Hori, M

ACS APPLIED BIO MATERIALS   Vol. 2 ( 7 ) page： 2698 - 2702   2019.7

Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective Reviewed

Ishikawa Kenji, Ishijima Tatsuo, Shirafuji Tatsuru, Armini Silvia, Despiau-Pujo Emilie, Gottscho Richard A., Kanarik Keren J., Leusink Gert J., Marchack Nathan, Murayama Takahide, Morikawa Yasuhiro, Oehrlein Gottlieb S., Park Sangwuk, Hayashi Hisataka, Kinoshita Keizo

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

Plasma-activated solution alters the morphological dynamics of supported lipid bilayers observed by high-speed atomic force microscopy Reviewed

Yamaoka Sotaro, Kondo Hiroki, Hashizume Hiroshi, Ishikawa Kenji, Tanaka Hiromasa, Hori Masaru

APPLIED PHYSICS EXPRESS   Vol. 12 ( 6 )   2019.6

Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes? Reviewed

Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development Reviewed

Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation Reviewed

Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

Electronic properties and primarily dissociation channels of fluoroethane compounds Reviewed

Hayashi, T; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas Reviewed

Zhang Yan, Ishikawa Kenji, Mozetic Miran, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

PLASMA PROCESSES AND POLYMERS   Vol. 16 ( 6 )   2019.6

Laser-drilling formation of through-glass-via (TGV) on polymer-laminated glass Reviewed

Sato, Y; Imajyo, N; Ishikawa, K; Tummala, R; Hori, M

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS   Vol. 30 ( 11 ) page： 10183 - 10190   2019.6

Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition Reviewed

Isobe, Y; Sakai, T; Sugiyama, N; Mizushima, I; Suguro, K; Miyashita, N; Lu, Y; Wilson, AF; Kumar, DA; Ikarashi, N; Kondo, H; Ishikawa, K; Shimizu, N; Oda, O; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 37 ( 3 )   2019.5

Chemical bonding structure in porous SiOC films (k &lt; 2.4) with high plasma-induced damage resistance (vol 3, pg 1, 2019) Reviewed

Miyajima, H; Masuda, H; Watanabe, K; Ishikawa, K; Sekine, M; Hori, M

MICRO AND NANO ENGINEERING   Vol. 3   page： 92 - 92   2019.5

Chemical bonding structure in porous SiOC films (k &lt; 2.4) with high plasma-induced damage resistance Reviewed

Miyajima, H; Masuda, H; Watanabe, K; Ishikawa, K; Sekine, M; Hori, M

MICRO AND NANO ENGINEERING   Vol. 3   page： 1 - 6   2019.5

Facile synthesis of SnO2-graphene composites employing nonthermal plasma and SnO2 nanoparticles-dispersed ethanol Reviewed

Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 17 )   2019.4

Systematic diagnostics of the electrical, optical, and physicochemical characteristics of low-temperature atmospheric-pressure helium plasma sources Reviewed

Takeda Keigo, Yamada Hiromasa, Ishikawa Kenji, Sakakita Hajime, Kim Jaeho, Ueda Masashi, Ikeda Jun-ichiro, Akimoto Yoshihiro, Kataoka Yosky, Yokoyama Naoaki, Ikehara Yuzuru, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 16 )   2019.4

A 65-nm CMOS Fully Integrated Analysis Platform Using an On-Chip Vector Network Analyzer and a Transmission-Line-Based Detection Window for Analyzing Circulating Tumor Cell and Exosome Reviewed

Niitsu Kiichi, Nakanishi Taiki, Murakami Shunya, Matsunaga Maya, Kobayashi Atsuki, Karim Nissar Mohammad, Ito Jun, Ozawa Naoya, Hase Tetsunari, Tanaka Hiromasa, Sato Mitsuo, Kondo Hiroki, Ishikawa Kenji, Odaka Hidefumi, Hasegawa Yoshinori, Hori Masaru, Nakazato Kazuo

IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS   Vol. 13 ( 2 ) page： 470 - 479   2019.4

Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls Reviewed

Imai Shun, Naito Kenichi, Kondo Hiroki, Cho Hyung Jun, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 10 )   2019.3

Control of sp<SUP>2</SUP>-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH₄/H₂ plasma-enhanced chemical vapor deposition Reviewed

Sugiura, H; Jia, LY; Ohashi, Y; Kondo, H; Ishikawa, K; Tsutsumi, T; Hayashi, T; Takeda, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( 3 )   2019.3

Effects of BCl3 addition to Cl-2 gas on etching characteristics of GaN at high temperature Reviewed

Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kohno Motohiro, Kinose Kazuo, Nadahara Soichi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 37 ( 2 )   2019.3

Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

Sugiura, H; Kondo, H; Tsutsumi, T; Ishikawa, K; Hori, M

C-JOURNAL OF CARBON RESEARCH   Vol. 5 ( 1 )   2019.3

Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition Reviewed

Tomatsu, M; Hiramatsu, M; Kondo, H; Ishikawa, K; Tsutsumi, T; Sekine, M; Hori, M

C-JOURNAL OF CARBON RESEARCH   Vol. 5 ( 1 )   2019.3

Non-thermal plasma-activated medium modified metabolomic profiles in the glycolysis of U251SP glioblastoma Reviewed

Kurake Naoyuki, Ishikawa Kenji, Tanaka Hiromasa, Hashizume Hiroshi, Nakamura Kae, Kajiyama Hiroaki, Toyokuni Shinya, Kikkawa Fumitaka, Mizuno Masaaki, Hori Masaru

ARCHIVES OF BIOCHEMISTRY AND BIOPHYSICS   Vol. 662   page： 83 - 92   2019.2

Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF6-added plasma etching of quartz glass Reviewed

Thi-Thuy-Nga Nguyen, Sasaki Minoru, Odaka Hidefumi, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

JOURNAL OF APPLIED PHYSICS   Vol. 125 ( 6 )   2019.2

Liquid dynamics in response to an impinging low-temperature plasma jet Reviewed

Brubaker T. R., Ishikawa K., Kondo H., Tsutsumi T., Hashizume H., Tanaka H., Knecht S. D., Bilen S. G., Hori M.

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 7 )   2019.2

Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds Reviewed

Ichikawa Tomonori, Tanaka Suiki, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

APPLIED PHYSICS EXPRESS   Vol. 12 ( 2 )   2019.2

Adhesion enhancement and amine reduction using film redeposited at the interface of a stack of plasma-enhanced CVD dielectrics for Cu/low-k interconnects Reviewed

Miyajima Hideshi, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( 2 )   2019.2

Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system Reviewed

Fukunaga Yusuke, Tsutsumi Takayoshi, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( 2 )   2019.2

Hetero-epitaxial growth of a GaN film by the combination of magnetron sputtering with Ar/Cl-2 gas mixtures and a separate supply of nitrogen precursors from a high density radical source Reviewed

Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kohno Motohiro, Kinose Kazuo, Nadahara Soichi, Nishikawa Masazumi, Ebe Akinori, Ishikawa Kenji, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( SA )   2019.2

Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma Reviewed

Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Han Jeon Geon, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( SA )   2019.2

Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries Reviewed

Borude, RR; Sugiura, H; Ishikawa, K; Tsutsumi, T; Kondo, H; Ikarashi, N; Hori, M

ACS APPLIED NANO MATERIALS   Vol. 2 ( 2 ) page： 649 - 654   2019.2

Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H-2 plasma-enhanced chemical vapor deposition Reviewed

Imai Shun, Kondo Hiroki, Hyungjun Cho, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

APPLIED PHYSICS EXPRESS   Vol. 12 ( 1 )   2019.1

Molecular mechanisms of non-thermal plasmainduced effects in cancer cells Reviewed

Tanaka Hiromasa, Mizuno Masaaki, Ishikawa Kenji, Toyokuni Shinya, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

BIOLOGICAL CHEMISTRY   Vol. 400 ( 1 ) page： 87 - 91   2019.1

Effect of N-2/H-2 plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) Reviewed

Amalraj Frank Wilson, Dhasiyan Arun Kumar, Lu Yi, Shimizu Naohiro, Oda Osamu, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Ikarashi Nobuyuki, Hori Masaru

AIP ADVANCES   Vol. 8 ( 11 )   2018.11

Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H-2 at 300-500 degrees C Reviewed

Kako Takashi, Liu Zecheng, Ishikawa Kenji, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

VACUUM   Vol. 156   page： 219 - 223   2018.10

Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching Reviewed

Zhang Yan, Imamura Masato, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 10 )   2018.10

Cytotoxic effects of plasma-irradiated fullerenol Reviewed

Kanno Daiki, Tanaka Hiromasa, Ishikawa Kenji, Hashizume Hiroshi, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 51 ( 37 )   2018.9

Dissociative properties of 1,1,1,2-tetrafluoroethane obtained by computational chemistry Reviewed

Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma Reviewed

Liu Zecheng, Ishikawa Kenji, Imamura Masato, Tsutsumi Takayoshi, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom? Reviewed

Ishikawa Kenji, Karahashi Kazuhiro, Ishijima Tatsuo, Cho Sung Il, Elliott Simon, Hausmann Dennis, Mocuta Dan, Wilson Aaron, Kinoshita Keizo

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

Low-autofluorescence fluoropolymer membrane filters for cell filtration Reviewed

Kihara Naoto, Kuboyama Daiki, Onoshima Daisuke, Ishikawa Kenji, Tanaka Hiromasa, Ozawa Naoya, Hase Tetsunari, Koguchi Ryohei, Yukawa Hiroshi, Odaka Hidefumi, Hasegawa Yoshinori, Baba Yoshinobu, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

Impact of helium pressure in arc plasma synthesis on crystallinity of single-walled carbon nanotubes Reviewed

Ando Atsushi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Suzuki Tomoko, Inoue Sakae, Ando Yoshinori, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

Effects of gas residence time of CH4/H-2 on sp(2) fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition Reviewed

Sugiura Hirotsugu, Jia Lingyun, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

Dry Process FOREWORD Reviewed

Karahashi Kazuhiro, Kinoshita Keizo, Higashi Seiichiro, Ishikawa Kenji, Ishijima Tatsuo, Kuboi Nobuyuki

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

Cell Deposition Microchip with Micropipette Control over Liquid Interface Motion Reviewed

Onoshima Daisuke, Hattori Yuya, Yukawa Hiroshi, Ishikawa Kenji, Hori Masaru, Baba Yoshinobu

CELL MEDICINE   Vol. 10   2018.5

Nanographene synthesized in triple-phase plasmas as a highly durable support of catalysts for polymer electrolyte fuel cells Reviewed

Amano Tomoki, Kondo Hiroki, Takeda Keigo, Ishikawa Kenji, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 4 )   2018.4

Oxygen reduction reaction properties of nitrogen-incorporated nanographenes synthesized using in-liquid plasma from mixture of ethanol and iron phthalocyanine Reviewed

Amano Tomoki, Kondo Hiroki, Takeda Keigo, Ishikawa Kenji, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 4 )   2018.4

Cytotoxicity of cancer HeLa cells sensitivity to normal MCF10A cells in cultivations with cell culture medium treated by microwave-excited atmospheric pressure plasmas Reviewed

Takahashi Yohei, Taki Yusuke, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Ishikawa Kenji, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 51 ( 11 )   2018.3

Free radical generation by non-equilibrium atmospheric pressure plasma in alcohol-water mixtures: an EPR-spin trapping study Reviewed

Uchiyama Hidefumi, Ishikawa Kenji, Zhao Qing-Li, Andocs Gabor, Nojima Nobuyuki, Takeda Keigo, Krishna Murali C., Ishijima Tatsuo, Matsuya Yuji, Hori Masaru, Noguchi Kyo, Kondo Takashi

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 51 ( 9 )   2018.3

Facile fabrication of a poly(ethylene terephthalate) membrane filter with precise arrangement of through-holes Reviewed

Kihara Naoto, Odaka Hidefumi, Kuboyama Daiki, Onoshima Daisuke, Ishikawa Kenji, Baba Yoshinobu, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 3 )   2018.3

Reduced HeLa cell viability in methionine-containing cell culture medium irradiated with microwave-excited atmospheric-pressure plasma Reviewed

Takahashi Yohei, Taki Yusuke, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Ishikawa Kenji, Hori Masaru

PLASMA PROCESSES AND POLYMERS   Vol. 15 ( 3 )   2018.3

Glioblastoma Cell Lines Display Different Sensitivities to Plasma-Activated Medium Reviewed

Tanaka Hiromasa, Mizuno Masaaki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Nakamura Kae, Utsumi Fumi, Kajiyama Hiroaki, Okazaki Yasumasa, Toyokuni Shinya, Akiyama Shinichi, Maruyama Shoichi, Kikkawa Fumitaka, Hori Masaru

IEEE TRANSACTIONS ON RADIATION AND PLASMA MEDICAL SCIENCES   Vol. 2 ( 2 ) page： 99 - 102   2018.3

Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons Reviewed

Ando Atsushi, Ishikawa Kenji, Kondo Hiroki, Tsutsumi Takayoshi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 2 )   2018.2

Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials FOREWORD Reviewed

Naritsuka Shigeya, Miyazaki Seiichi, Fujiwara Yasufumi, Hiramatsu Mineo, Inoue Yasushi, Ishikawa Kenji, Ito Masafumi, Itoh Takashi, Kasu Makoto, Miyake Hideto, Sasaki Minoru, Shirafuji Tatsuru, Suda Yoshiyuki

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 1 )   2018.1

Selective production of reactive oxygen and nitrogen species in the plasma-treated water by using a nonthermal high-frequency plasma jet Reviewed

Uchida Giichiro, Takenaka Kosuke, Takeda Keigo, Ishikawa Kenji, Hori Masaru, Setsuhara Yuichi

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 1 )   2018.1

Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol Reviewed

Amano Tomoki, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Takeda Keigo, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

APPLIED PHYSICS EXPRESS   Vol. 11 ( 1 )   2018.1

Plasma-activated medium (PAM) kills human cancer-initiating cells Reviewed

Ikeda Jun-ichiro, Tanaka Hiromasa, Ishikawa Kenji, Sakakita Hajime, Ikehara Yuzuru, Hori Masaru

PATHOLOGY INTERNATIONAL   Vol. 68 ( 1 ) page： 23 - 30   2018.1

Electron impact ionization of perfluoro-methyl-vinyl-ether C3F6O Reviewed

Kondo Yusuke, Ishikawa Kenji, Hayashi Toshio, Sekine Makoto, Hori Masaru

PLASMA SOURCES SCIENCE & TECHNOLOGY   Vol. 27 ( 1 )   2018.1

Isotropic atomic level etching of tungsten using formation and desorption of tungsten fluoride Reviewed

Shinoda Kazunori, Miyoshi Nobuya, Kobayashi Hiroyuki, Hanaoka Yuko, Kawamura Kohei, Izawa Masaru, Ishikawa Kenji, Hori Masaru

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VII   Vol. 10589   2018

Real-time control of a wafer temperature for uniform plasma process Reviewed

Tsutsumi, T; Fuknaga, Y; Ishikawa, K; Kondo, H; Sekine, M; Hori, M

2018 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     2018

Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy Reviewed

Brubaker Timothy R., Ishikawa Kenji, Takeda Keigo, Oh Jun-Seok, Kondo Hiroki, Hashizume Hiroshi, Tanaka Hiromasa, Knecht Sean D., Bilen Sven G., Hori Masaru

JOURNAL OF APPLIED PHYSICS   Vol. 122 ( 21 )   2017.12

Dependence of absolute photon flux on infrared absorbance alteration and surface roughness on photoresist polymers irradiated with vacuum ultraviolet photons emitted from HBr plasma Reviewed

Zhang Yan, Takeuchi Takuya, Ishikawa Kenji, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 12 )   2017.12

Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium Reviewed

Furuta Ryo, Kurake Naoyuki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

PLASMA PROCESSES AND POLYMERS   Vol. 14 ( 11 )   2017.11

Surface roughening of photoresist after change of the photon/radical and ion treatment sequence Reviewed

Zhang Yan, Takeuchi Takuya, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Sekine Makoto, Hori Masaru

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   Vol. 35 ( 6 )   2017.11

Crystallization of calcium oxalate dihydrate in a buffered calcium-containing glucose solution by irradiation with non-equilibrium atmospheric pressure plasma Reviewed

Kurake Naoyuki, Tanaka Hiromasa, Ishikawa Kenji, Nakamura Kae, Kajiyama Hiroaki, Kikkawa Fumitaka, Mizuno Masaaki, Ikehara Yuzuru, Hori Masaru

JOURNAL OF APPLIED PHYSICS   Vol. 122 ( 14 )   2017.10

High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition Reviewed

Imai Shun, Kondo Hiroki, Cho Hyungjun, Kano Hiroyuki, Ishikawa Kenji, Sekine Makoto, Hiramatsu Mineo, Ito Masafumi, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 40 )   2017.10

Cold atmospheric helium plasma causes synergistic enhancement in cell death with hyperthermia and an additive enhancement with radiation Reviewed

Moniruzzaman Rohan, Rehman Mati Ur, Zhao Qing-Li, Jawaid Paras, Takeda Keigo, Ishikawa Kenji, Hori Masaru, Tomihara Kei, Noguchi Kyo, Kondo Takashi, Noguchi Makoto

SCIENTIFIC REPORTS   Vol. 7   2017.9

Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy Reviewed

Furuta Ryo, Kurake Naoyuki, Takeda Keigo, Ishikawa Kenji, Ohta Takayuki, Ito Masafumi, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

BIOINTERPHASES   Vol. 12 ( 3 )   2017.9

Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation Reviewed

Liu Zecheng, Imamura Masato, Asano Atsuki, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

APPLIED PHYSICS EXPRESS   Vol. 10 ( 8 )   2017.8

Temperature dependence of protection layer formation on organic trench sidewall in H-2/N-2 plasma etching with control of substrate temperature Reviewed

Fukunaga Yusuke, Tsutsumi Takayoshi, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 7 )   2017.7

Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy Reviewed

Furuta Ryo, Kurake Naoyuki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Kondo Hiroki, Ohta Takayuki, Ito Masafumi, Sekine Makoto, Hori Masaru

PHYSICAL CHEMISTRY CHEMICAL PHYSICS   Vol. 19 ( 21 ) page： 13438 - 13442   2017.6

Dry Process FOREWORD Reviewed

Ishikawa Kenji, Kinoshita Keizo, Higashi Seiichiro, Ichiki Takanori, Karahashi Kazuhiro, Kuboi Nobuyuki

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions? Reviewed

Ishikawa Kenji, Karahashi Kazuhiro, Ichiki Takanori, Chang Jane P., George Steven M., Kessels W. M. M., Lee Hae June, Tinck Stefan, Um Jung Hwan, Kinoshita Keizo

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition Reviewed

Tomatsu Masakazu, Hiramatsu Mineo, Foord John S., Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Takeda Keigo, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 degrees C Reviewed

Takai Shinnosuke, Lu Yi, Oda Osamu, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas Reviewed

Ueyama Toshinari, Fukunaga Yusuke, Tsutsumi Takayoshi, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Iwata Manabu, Ohya Yoshinobu, Sugai Hideo, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing Reviewed

Shinoda K., Miyoshi N., Kobayashi H., Miura M., Kurihara M., Maeda K., Negishi N., Sonoda Y., Tanaka M., Yasui N., Izawa M., Ishii Y., Okuma K., Saldana T., Manos J., Ishikawa K., Hori M.

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 19 )   2017.5

Spatial distributions of O, N, NO, OH and vacuum ultraviolet light along gas flow direction in an AC-excited atmospheric pressure Ar plasma jet generated in open air Reviewed

Takeda Keigo, Ishikawa Kenji, Tanaka Hiromasa, Sekine Makoto, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 19 )   2017.5

Bactericidal pathway of Escherichia coli in buffered saline treated with oxygen radicals Reviewed

Kobayashi Tsuyoshi, Iwata Natsumi, Oh Jun-Seok, Hahizume Hiroshi, Ohta Takayuki, Takeda Keigo, Ishikawa Kenji, Hori Masaru, Ito Masafumi

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 15 )   2017.4

Effects of center dot OH and center dot NO radicals in the aqueous phase on H2O2 and NO2- generated in plasma-activated medium Reviewed

Kurake Naoyuki, Tanaka Hiromasa, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Nakamura Kae, Kajiyama Hiroaki, Kondo Takashi, Kikkawa Fumitaka, Mizuno Masaaki, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 15 )   2017.3

Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas Reviewed

Ohya Yoshinobu, Ishikawa Kenji, Komuro Tatsuya, Yamaguchi Tsuyoshi, Takeda Keigo, Kondo Hiroki, Sekine Makoto, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 15 )   2017.3

Behavior of absolute densities of atomic oxygen in the gas phase near an object surface in an AC-excited atmospheric pressure He plasma jet Reviewed

Takeda Keigo, Kumakura Takumi, Ishikawa Kenji, Tanaka Hiromasa, Sekine Makoto, Hori Masaru

APPLIED PHYSICS EXPRESS   Vol. 10 ( 3 )   2017.3

Fabrication of superconductor-ferromagnet-insulator-superconductor Josephson junctions with critical current uniformity applicable to integrated circuits

Ito Hiroshi, Taniguchi Soya, Ishikawa Kouta, Akaike Hiroyuki, Fujimaki Akira

APPLIED PHYSICS EXPRESS   Vol. 10 ( 3 )   2017.3

Characteristics of optical emissions of arc plasma processing for high-rate synthesis of highly crystalline single-walled carbon nanotubes Reviewed

Ando Atsushi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Suzuki Tomoko, Inoue Sakae, Ando Yoshinori, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 3 )   2017.3

Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl-2 plasma etching of GaN Reviewed

Liu Zecheng, Pan Jialin, Asano Atsuki, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 2 )   2017.2

Absolute density of precursor SiH3 radicals and H atoms in H-2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films Reviewed

Abe Yusuke, Ishikawa Kenji, Takeda Keigo, Tsutsumi Takayoshi, Fukushima Atsushi, Kondo Hiroki, Sekine Makoto, Hori Masaru

APPLIED PHYSICS LETTERS   Vol. 110 ( 4 )   2017.1

Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication Reviewed

Shinoda K., Miyoshi N., Kobayashi H., Kurihara M., Izawa M., Ishikawa K., Hori M.

ATOMIC LAYER DEPOSITION APPLICATIONS 13   Vol. 80 ( 3 ) page： 3 - 14   2017

TIME EVOLUTION OF REACTIVE OXYGEN NITROGEN SPECIES IN PLASMA-ACTIVATED ESSENTIAL MEDIA AND WATER Reviewed

Brubaker Timothy, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS)     page： .   2017

Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas Reviewed

Yoshinobu Ohya, Maju Tomura, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Journal of Vacuum Science and Technology A Letters   Vol. 34 ( 4 ) page： 040602   2016.5

Effects of nitrogen on apoptosis and changes in gene expression in human lymphoma U937 cells exposed to argon-cold atmospheric pressure plasma Reviewed

Yoshiaki Tabuchi, Hidefumi Uchiyama, Qing-li Zhao, Tatsuya Yunoki, Qabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori and Takashi Kondo

International Journal of Molecular Medicine   Vol. 37   page： 1706-1714   2016.5

Red Blood Cell Coagulation Induced by Low-temperature Plasma Treatment Reviewed

Kenji Miyamoto, Sanae Ikehara, Hikaru Takei, Yoshihiro Akimoto, Hajime Sakakita, Kenji Ishikawa, Masashi Ueda, Jun-ichiro Ikeda, Masahiro Yamagishi, Jaeho Kim, Takashi Yamaguchi, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara

Archives of Biochemistry and Biophysics     2016.4

Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

Appl. Phys. Express   Vol. 7   page： 046201   2016.3

Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-injection Plasma-enhanced Chemical Vapor Deposition Reviewed

Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

Plasma Process Polym.     2016.2

Cell survival of glioblastoma grown in medium containing hydrogen peroxide and/or nitrite, or in plasma-activated medium Reviewed

Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Takashi Kondo, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Masaru Hori

Archives of Biochemistry and Biophysics     2016.1

Cover Picture: Plasma Process. Polym. 12∕2015 (page 1329) Reviewed

Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara and Shuichi Enomoto

Plasma Processes and Polymers   Vol. 12 ( 12 ) page： 1329   2015.12

Plasma Blood Coagulation Without Involving the Activation of Platelets and Coagulation Factors Reviewed

Sanae Ikehara, Hajime Sakakita, Kenji Ishikawa, Yoshihiro Akimoto, Takashi Yamaguchi, Masahiro Yamagishi, Jaeho Kim, Masashi Ueda, Jun-ichiro Ikeda, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara

Plasma Processes and Polymers   Vol. 12 ( 12 ) page： 1348–1353   2015.12

Real-time temperature-monitoring of Si substrate during plasma processing and its heat-flux analysis Reviewed

Takayoshi Tsutsumi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   Vol. 55   page： 01AB04   2015.11

Superhydrophilic glass membrane device with open-microhole array for filtering and counting rare tumor cells Reviewed

Akihiro Yonese, Daisuke Onoshima, Hiroshi Yukawa, Kenji Ishikawa, Masaru Hori, and Yoshinobu Baba

Micro Total Analysis Systems 2015     page： 493-495   2015.10

Histological and nuclear medical comparison of inflammation after haemostasis with non-thermal plasma and thermal coagulation Reviewed

Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara, and Shuichi Enomoto

Plasma Processes and Polymers   Vol. 12 ( 12 ) page： 1338–1342   2015.9

Plasma with high electron density and plasma-activated medium for cancer treatment Reviewed

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroshi Hashizume, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinya Toyokuni, Shin’ichi Akiyama, Shoichi Maruyama, Suguru Yamada, Yasuhiro Kodera, Hiroki Kaneko, Hiroko Terasaki, Hirokazu Hara, Tetsuo Adachi, Machiko Iida, Ichiro Yajima, Masashi Kato, Fumitaka Kikkawa, and Masaru Hori

Clinical Plasma Medicine   Vol. 3   page： 72-76   2015.9

EPR-Spin Trapping and Flow cytometric Studies of Free Radicals Generated using Cold Atmospheric Argon Plasma and X-ray irradiation in Aqueous Solutions and Intracellular Milieu Reviewed

Hidefumi Uchiyama, Qing-Li Zhao, Mariame Ali Hassan, Gabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori, and Takashi Kondo

PLoS One   Vol. 10 ( 8 ) page： e0136956   2015.8

Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching Reviewed

Takayoshi Tsutsumi, Yusuke Fukunaga, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori

IEEE Trans Semiconductor manufacturing   Vol. 28 ( 4 ) page： 515-520   2015.8

Decreased expression levels of cell cycle regulators and matrix metalloproteinases in melanoma from RET-transgenic mice by single irradiation of non-equilibrium atmospheric pressure plasmas Reviewed

Machiko Iida, Ichiro Yajima, Nobutaka Ohgami, Li Xiang, Cunchao Zou, Kenji Ishikawa, Masaru Hori, and Masashi Kato

International Journal of Clinical and Experimental Pathology   Vol. 8 ( 8 ) page： 9326-9331   2015.8

Suppression of plasma-induced damage on GaN etched by a Cl2 plasma at high temperatures Reviewed

Zecheng Liu, Jialin Pan, Takashi Kako Kenji Ishikawa, Osamu Oda, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   Vol. 54   page： 06GB04   2015.6

Electronic properties of HBr, O2 and Cl2 used in Si etching Reviewed

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   Vol. 54   page： 06GA03   2015.5

Effect of gas residence time on near-edge X-ray absorption fine structures of hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition Reviewed

Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

Japan. J. Appl. Phys.   Vol. 55 ( 4 ) page： 040305   2015.3

Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton Reviewed

Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   Vol. 54 ( 4 ) page： 040303   2015.3

Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF hybrid plasmas using a PECVD process Reviewed

Bibhuti Bhusan Sahu, Jeon G. Han, Kyung-Sik Shin, Kenji Ishikawa, Masaru Hori, and Yudai Miyawaki

Plasma Sources Sci. Technol.   Vol. 24 ( 2 ) page： 025019   2015.3

CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase Reviewed

Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Japan. J. Appl. Phys.   Vol. 54 ( 4 ) page： 040301   2015.3

Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals Reviewed

Yu Arai, Yusuke Noto, Yousuke Goto, Seiji Takahashi, Masashi Yamamoto, Akihiko Kono, Tatsuo Ishijima, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

Thin Solid Film   Vol. 575   page： 12-16   2015.2

Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer Reviewed

Akihiko Kono, Yu Arai, Yousuke Goto, Masashi Yamamoto, Seiji Takahashi, Tadaaki Yamagishi, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

Thin Solid Film   Vol. 575   page： 17-20   2015.2

Experimental evidence of warm electron populations in magnetron sputtering plasmas Reviewed

B. B. Sahu, Jeon G. Han, Hye R. Kim, Kenji Ishikawa, and Masaru Hori

J. Appl. Phys.   Vol. 117   page： 033301   2015.1

Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: Generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions Reviewed

Yusuke Kondo, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

J. Phys. D: Appl. Phys.   Vol. 48 ( 4 ) page： 045202   2015.1

Plasma Medical Science for Cancer Therapy: Toward Cancer Therapy Using Nonthermal Atmospheric Pressure Plasma Invited Reviewed

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinnya Toyokuni, Shoichi Maruyama, Fumitaka Kikkawa, and Masaru Hori

IEEE Trans. on Plasma Sci.   Vol. 42 ( 12 ) page： 3760-3763   2014.12

Quantitative Clarification of Inactivation Mechanism of Penicillium digitatum Spores Treated with Neutral Oxygen Radicals Reviewed

Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori, and Masafumi Ito

Jpn. J. Appl. Phys.   Vol. 54   page： 01AG05   2014.11

Robust characteristics of semiconductor-substrate temperature-measurement method using auto-correlation type frequency-domain low-coherence interferometry Reviewed

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito

Jpn. J. Appl. Phys.   Vol. 54   page： 01AB03   2014.11

Effectiveness of plasma diagnostic in ultra high frequency and radio frequency hybrid plasmas for synthesis of silicon nitride film at low temperature Reviewed

Bibhuti Bhusan Sahu, Kyung-Sik Shin, Su-Bong Jin, Jeon G. Han, Kenji Ishikawa and Masaru Hori

J. Appl. Phys.   Vol. 116   page： 134903   2014.10

Recovery of Atom Density Drift Caused by Change in Reactor Wall Conditions by Real-time Autonomous Control Reviewed

Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Journal of Physics D: Applied Physics   Vol. 47   page： 422002   2014.9

Diagnostics of plasma-biological surface interactions in low pressure and atmospheric pressure plasmas Invited Reviewed

Kenji Ishikawa, and Masaru Hori

International Journal of Modern Physics: Conference Series   Vol. 32   page： 1460318   2014.8

Cell survival and proliferation signaling pathways are downregulated by plasma-activated medium in glioblastoma brain tumor cells Reviewed

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Shoichi Maruyama, Fumitaka Kikkawa, and Masaru Hori

Plasma Medicine   Vol. 4   page： 1   2014.7

Temporal Changes of Absolute Densities of Atoms in H2 and N2 Mixture Gas Plasmas by Surface Modifications of Reactor Wall Reviewed

Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 53   page： 050301   2014.4

Epitaxial Growth of GaN by Radical-Enhanced Metalorganic Chemical Vapor Deposition (REMOCVD) in the Downflow of a Very High Frequency (VHF) N2/H2 Excited Plasma– Effect of TMG Flow Rate and VHF Power Reviewed

Yi Lu, Hiroki Kondo, Kenji Ishikawa, Osamu Oda, Keigo Takeda, Makoto Sekine, Hiroshi Amano, and Masaru Hori

J. Cryst. Growth   Vol. 391   page： 97-103   2014.4

Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls Reviewed

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 53   page： 040307   2014.3

Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution Reviewed

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 53   page： 040305   2014.3

Spatial distribution of absolute atomic oxygen density of a non-equilibrium atmospheric pressure planar plasma jet Reviewed

Fengdong Jia, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Jagath Kularatne, Hiroki Kondo, Makoto Sekine and Masaru Hori

Plasma Source Sci Technol.   Vol. 23   page： 025004   2014.3

Chemical Reactions during Plasma-enhanced Atomic Layer Deposition of SiO2 Films employing aminosilane and O2/Ar plasma at 50 C Reviewed

Lu Yi, Akiko Kobayashi, H. Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 53   2013.12

Density Control of Carbon Nanowalls Grown by CH4/H2 plasma and Their Electrical Properties Reviewed

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

Carbon   Vol. 66   2013.12

Effect of Indirect Nonequilibrium Atmospheric Pressure Plasma on Anti-proliferative Activity against Chronic Chemo-resistant Ovarian Cancer Cells in vitro and in vivo Reviewed

Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, and Fumitaka Kikkawa

PLOS One   Vol. 8   page： e81576   2013.12

Oxidation mechanism of Penicillium digitatum spores through neutral oxygen radicals Reviewed

Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Masafumi Ito

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 53   page： 010209   2013.12

High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System Reviewed

Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, and Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 52   page： 11NE01   2013.11

Field emission of nano-organic-rods armored with metal nanoparticles Reviewed

Toshiya Suzuki, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 52   page： 120203   2013.11

Effect of gas flow on atomic radical transportation in AC Excited Non-equilibrium Atmospheric Pressure Plasma jet Reviewed

Keigo Takeda, Masanori Kato, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Makoto Sekine, and Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 46   page： 464006   2013.10

Highly Precise and Rapid Measurements on Substrate Temperature Using Frequency Domain Low Coherence Interferometer Reviewed

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito

APPLIED PHYSICS LETTERS   Vol. 101   page： 182102   2013.10

Inactivation effects of neutral reactive-oxygen species on Penicillium digitatum spores using non-equilibrium atmospheric-pressure oxygen radical source Reviewed

Hiroshi Hashizume, Takayuki Ohta, Jia Fengdong, Keigo Takeda,Kenji Ishikawa,Masaru Hori, and Masafumi Ito

APPLIED PHYSICS LETTERS   Vol. 101   page： 53708   2013.10

Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO -> F + FNO at an Elevated Temperature Reviewed

Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

JOURNAL OF PHYSICAL CHEMISTRY C   Vol. 117 ( 40 ) page： 20810-20818   2013.9

Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls Reviewed

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

APPLIED PHYSICS EXPRESS   Vol. 6   page： 095201   2013.8

A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink Reviewed

Hitoshi Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, Kenji Ishikawa, H. Kondo, M. Sekine, H. Toyoda, and M. Hori

J. Phys.: Conf. Ser.   Vol. 441   page： 12019   2013.6

A novel fast and flexible technique of radical kinetic behavior investigation based on pallet for plasma evaluation structure and numerical analysis Reviewed

Malinowski, Arkadiusz; Takeuchi, Takuya; Chen, Shang; Suzuki, Toshiya; Ishikawa, Kenji; Sekine, Makoto; Hori, Masaru; Lukasiak, Lidia; Jakubowski, Andrzej

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 46   page： 265201   2013.6

Surface morphology on high-temperature plasma-etched gallium nitride Reviewed

Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Trans. Mater. Res. Soc. Jpn.   Vol. 38   page： 325   2013.6

Dissociations of C5F8 and C5HF7 in Etching Plasma Reviewed

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 5   page： 05EB02   2013.5

Wavelength dependence of photon-induced interface defects in hydrogenated silicon nitride/Si structure during plasma etching processes Reviewed

Masanaga Fukasawa, Hiroyasu Matsugai, Takayoshi Honda, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Kazunori Nagahata, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 5   page： 05ED01   2013.5

Surface analysis of gallium nitride (GaN) at elevated substrate temperature Reviewed

Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

APPLIED PHYSICS EXPRESS   Vol. 6   page： 056201   2013.4

Supercritical Fluid Deposition of High-Density Nanoparticles of Photo-Catalytic TiO2 on Carbon Nanowalls Reviewed

Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

Appl. Phys. Express   Vol. 6   page： 045103   2013.4

A Room Temperature Si Etching in NO/F2 Gas Chemistry and Its Reaction Mechanism Reviewed

Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Phys. Chem. C   Vol. 117 ( 10 ) page： 5118–5125   2013.2

Plasma-activated medium selectively kills glioblastoma brain tumor cells by downregulating a survival signaling molecule, AKT kinase Reviewed

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, and Masaru Hori

Plasma Medicine   Vol. 3   page： 1   2013.2

Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma Reviewed

Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

J. Phys. D: Appl. Phys.   Vol. 46   page： 102001   2013.2

Etching-Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma Reviewed

Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 52 ( 2 ) page： 1   2013.1

Impact of hydrogen radical injection plasma on fabrication of microcrystalline silicon thin film for solar cells Reviewed

Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Appl. Phys.   Vol. 113 ( 2 ) page： 033304   2013.1

Highly selective etching of SiO2 over Si3N4 and Si in capacitivlly coupled plasma employing C5HF7 gas Reviewed

Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 52 ( 1 ) page： 016201   2013.1

Development of high-density nitrogen radical source for low mosaicity and high rate growth of InGaN films in molecular beam epitaxy Reviewed

Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 52 ( 1 ) page： 021001   2013.1

Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment Reviewed

Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Appl. Phys.   Vol. 113 ( 1 ) page： 014306   2013.1

Surface loss probability of H radicals on silicon thin films in SiH4/H2 plasma Reviewed

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Appl. Phys.   Vol. 113 ( 1 ) page： 013303   2013.1

Individual roles for atoms and ions during hydrogen atom passivation of surface-defects on GaN created by plasma-etching Reviewed

Shang Chen, Kenji Ishikawa, Yi Lu, Ryosuke Kometani, Hiroki Kondo, Yutaka Tokuda, Takashi Egawa, Hiroshi Amano, Makoto Sekine, and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 51 ( 11 ) page： 111002-1:6   2012.10

Critical flux ratio of hydrogen radical to fi lm precursor in microcrystalline silicon deposition for solar cells Reviewed

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Appl. Phys. Lett.   Vol. 101 ( 17 ) page： 172109-1:4   2012.10

Decomposition Removal of the Polymers for Resist Material by the Hydrogen Radical Generated Using Tungsten Hot-Wire Catalyzer Reviewed

Yu Arai, Makoto Watanabe, Akihiko Kono, Tadaaki Yamagishi, Kenji Ishikawa, Masaru Hori, Hideo Horibe

Kobunshi Ronbunshu   Vol. 69 ( 6 ) page： 266-273   2012.9

As-grown deep-level defects in n-GaN grown by metal-organic chemical vapor deposition on freestanding GaN Reviewed

Shang Chen, Unhi Honda, Tatsunari Shibata, Toshiya Matumura, Yutaka Tokuda, Kenji Ishikawa, Masaru Hori, Hiroyuki Ueda, Tsutomu Uesugi, and Tetsu Kachi

J. Appl. Phys.   Vol. 112 ( 5 ) page： 053513-1:4   2012.9

Real-time In Situ Electron Spin Resonance Measurements on Fungal Spores of Penicillium digitatum during Exposure of Oxygen Plasmas Reviewed

Kenji Ishikawa, Hiroko Moriyama, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Appl. Phys. Lett.   Vol. 101 ( 1 ) page： 013704-1:4   2012.7

Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature Reviewed

Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, and Masaru Hori

AIP advance   Vol. 2 ( 2 ) page： 022149-1:6   2012.6

Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma Reviewed

Tatsuya Hagino, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Masaru Hori

Appl. Phys. Express   Vol. 5 ( 3 ) page： 035101-1:3   2012.3

Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF3 into N2 Downflow Plasma Reviewed

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

Jpn. J. Appl. Phys.   Vol. 51 ( 2 ) page： 026505-1:5   2012.2

Direct current superposed dual-frequency capacitively-coupled-plasma in selective etch of SiOCH over SiC Reviewed

Tsuyoshi Yamaguchi, Tetsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

J. Phys. D: Appl. Phys.   Vol. 45 ( 2 ) page： 025203-1:7   2012.1

Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation Reviewed

Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minami, Fumikatsu Uesawa, Masaru Hori, and Tetsuya Tatsumi

Jpn. J. Appl. Phys.   Vol. 51 ( 2 ) page： 026201-1:7   2012.1

Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature Reviewed

Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

  Vol. 51 ( 1 ) page： 016202-1:6   2012.1

Quantum Chemical Investigation for Chemical Dry Etching of SiO2 by Flowing NF3 into H2 Downflow Plasma Reviewed

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

Jpn. J. Appl. Phys.   Vol. 51 ( 1 ) page： 016201-1:6   2012.1

Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas Reviewed

Kenji Ishikawa, Hiroko Moriyama, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Hiromasa Tanaka, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori

MRS Online Proceedings Library   Vol. 1469   2012

Chemical Bond Modification in Porous SiOCH Films by H2 and H2/N2 Plasmas Investigated by in situ Infrared Reflection Absorption Spectroscopy (IR-RAS) Reviewed

Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, and Masaru Hori

J. Appl. Phys.   Vol. 111 ( 12 ) page： 1   2011.12

Inactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma Reviewed

Sachiko Iseki, Hiroshi Hashizume, Fengdong Jia, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, and Masaru Hori

Appl. Phys. Express   Vol. 4   page： 116201   2011.11

Impacts of CF+, CF2+, CF3+ and Ar Ion Beam Bombardment with energies from 100eV and 400eV on Surface Modification of Photoresist

Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 50 ( 8 ) page： 08JE05-1:5   2011.8

Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma Reviewed

Masaki Minami, Shigetaka Tomiya, Kenji Ishikawa, Ryosuke Matsumoto, Shang Chen, Masanaga Fukasawa, Fumikatsu Uesawa, Makoto Sekine, Masaru Hori, and Tetsuya Tatsumi

Jpn. J. Appl. Phys.   Vol. 50 ( 8 ) page： 08JE03-1:4   2011.8

Spatial Distributions of Electron, CF, CF2 Radical Densities and Gas Temperature in dc-Superposed Dual- Frequency- Capacitively-Coupled Plasma Etch Reactor Employing c-C4F8/N2/Ar gas

Tsuyoshi Yamaguchi, Tetsuya Kimura, Chishio Koshimizu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 50 ( 5 ) page： 0   2011.5

Synergistic Formation of Radicals with Irradiation with both Vacuum Ultraviolet and Atomic Hydrogen: a Real time in situ Electron-Spin-Resonance Study Reviewed

Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

J. Phys. Chem. Lett.   Vol. 2   page： 1278-1281   2011.5

H2/N2 Plasma Damage on Porous Dielectric SiOCH Film Evaluated by In-situ Film Characterization and Plasma Diagnostics Reviewed

Hiroshi Yamamoto, Keigo Takeda, Kenji Ishikawa, Masafumi Ito, Makoto Sekine, Masaru Hori, Takeshi Kaminatsui, Hisataka Hayashi, Itsuko Sakai, and Tokuhisa Ohiwa

J. Appl. Phys.   Vol. 109   page： 084112:1-8   2011.4

Dissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma Reviewed

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

Jpn. J. Appl. Phys.   Vol. 50   page： 036203:1-4   2011.3

Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet Reviewed

Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, and Masaru Hori

Appl. Phys. Express   Vol. 4   page： 026101:1-3   2011.1

Behaviors of Absolute Densities of N, H and NH3 at Remote Region of High Density Radical Source Employing N2-H2 Mixture Plasmas Reviewed

Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den and Masaru Hori

Jpn. J. Appl. Phys.   Vol. 50   page： 01AE03:1-4   2011.1

Hydrophobic Treatment of Organics against Glass Employing nonequilibrium Atmospheric Pressure Pulsed Plasmas with a Mixture of CF4 and N2 Gases Reviewed

Hirotoshi Inui, Keigo Takeda, Kenji Ishikawa, Takuya Yara, Tsuyoshi Uehara, Makoto Sekine and Masaru Hori

J. Appl. Phys.   Vol. 109   page： 013310:1-6   2011.1

Measurement of Hydrogen Radical Density and its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases

Hirotoshi Inui, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Sekine Makoto, Hiroyuki Kano, Naofumi Yoshida, and Masaru Hori

Appl. Phys. Express   Vol. 3   page： 126101:1-3   2010.12

Etching Damage in Diamond Studied Using an Energy-Controlled Oxygen Ion Beam Reviewed

Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

Jpn. J. Appl. Phys.   Vol. 46 ( 1 ) page： 60-64   2007.1

Defect creation in diamond by hydrogen plasma treatment at room temperature Reviewed

Yuuichi Yamazaki, Kenji Ishikawa, Seiji Samukawa, and Satoshi Yamasaki

Physica B   Vol. 376/377   page： 327-330   2006.6

Structure of diamond surface defective layer damaged by hydrogen ion beam exposure Reviewed

Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

Diamond Related Mater.   Vol. 15 ( 4-8 ) page： 703-706   2006.5

Surface Reactions During Etching of Organic Low-k Films by Plasma of N2 and H2 Reviewed

Kenji Ishikawa, Yoshikazu Yamaoka, Moritaka Nakamura, Yuichi Yamazaki, Satoshi Yamasaki, Yasushi Ishikawa, and Seiji Samukawa

J. Appl. Phys.   Vol. 99 ( 8 ) page： 083305:1-6   2006.5

Effcient Reduction of Standby Leakage Current in LSIs for Use in Mobile Devices Reviewed

Hiroshi Kudo, Kenji Ishikawa, Yasuyoshi Mishima, et al.

Jpn. J. Appl. Phys.   Vol. 45 ( 4B ) page： 3150-3153   2006.4

理想的な界面形成を追求　半導体のドライ洗浄技術 Invited

石川健治、安立なつ美

工業材料   Vol. 54   page： 1   2006

Structural change in diamond by hydrogen plasma treatment at room temperature Reviewed

Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

Diamond Related Mater.   Vol. 14 ( 11-12 ) page： 1939-1942   2005.10

In vacuo measurements of dangling bonds created during Ar-diluted fluorocarbon plasma etching of silicon dioxide films Reviewed

Kenji Ishikawa, Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa, and Satoshi Yamasaki

Appl. Phys. Lett.   Vol. 86   page： 264104:1-3   2005.6

Mass-analyzed CFx+ (x=1,2,3) ion beam study on selectivity of SiO2-to-SiN etching and a-C:F film deposition Reviewed

Ken-ichi Yanai, Kazuhiro Karahashi, Kenji Ishikawa, and Moritaka Nakamura

J. Appl. Phys.   Vol. 97 ( 5 ) page： 053302:1-6   2005.2

Etching yield of SiO2 irradiated by F+ CFx+ (x=1,2,3) ion with energies from 250 to 2000 eV Reviewed

Kazuhiro Karahashi, Ken-ichi Yanai, Kenji Ishikawa, Hideo Tsuboi, Kazuaki Kurihara, and Moritaka Nakamura

J. Vac. Sci. Technol. A   Vol. 22 ( 4 ) page： 1166   2004.6

ドライ洗浄技術－半導体製造－ Reviewed

伊藤隆司、杉野林志、石川健治

精密工学会誌   Vol. 70   page： 894   2004

Transitional change to amorphous fluorinated carbon film deposition under energetic irradiation of mass-analyzed carbon mono-fluoride ions on silicon dioxide surfaces Reviewed

Kenji Ishikawa, Kazuhiro Karahashi, Hideo Tsuboi, Ken-ichi Yanai, and Moritaka Nakamura

J. Vac. Sci. Technol. A   Vol. 21   page： L1-L3   2003.6

Surface and gas-phase observations of Ar diluted c-C4F8 plasma by using real-time infrared spectroscopy and planar laser-induced fluorescence Reviewed

Kenji Ishikawa, Shigenori Hayashi, and Makoto Sekine

J. Appl. Phys.   Vol. 93 ( 3 ) page： 1403-1408   2003.2

Vapor Treatment of Copper Surface Using Organic Acids Reviewed

Kenji Ishikawa, Teruo Yagishita and Moritaka Nakamura

MRS Proceedings   Vol. 766   2003

In-vacuo electron spin resonance study on amorphous fluorinated carbon films for understanding of surface chemical reactions in plasma etching Reviewed

Kenji Ishikawa, Shoji Kobayashi, Mitsuru Okigawa, Makoto Sekine, Satoshi Yamasaki, Tetsuji Yasuda, and Junichi Isoya

Appl. Phys. Lett.   Vol. 81 ( 10 ) page： 1773-1775   2002.9

Planar laser-induced fluorescence of fluorocarbon radicals in oxide etch process plasma Reviewed

Shigenori Hayashi, Kenji Ishikawa, and Makoto Sekine

Jpn. J. Appl. Phys.   Vol. 41 ( 4A ) page： 2207-2212   2002.4

Direct observation of surface dangling bonds during plasma process: chemical reactions during H2 and Ar plasma treatments Reviewed

Satoshi Yamasaki, Ujjwal Das, and Kenji Ishikawa

Thin Solid Films   Vol. 407 ( 1-2 ) page： 139-143   2002.2

Early-stage modification of a silicon oxide surface in fluorocarbon plasma for selective etching over silicon Reviewed

Kenji Ishikawa, and Makoto Sekine

J. Appl. Phys.   Vol. 91 ( 3 ) page： 1661-1666   2002.2

In-situ time-resolved infrared spectroscopic study of silicon-oxide surface during selective etching over silicon in fluorocarbon plasma Reviewed

Kenji Ishikawa, and Makoto Sekine

Jpn. J. Appl. Phys.   Vol. 39   page： 6990-6995   2000.12

Asymmetric peak line shape on infrared dielectric function spectra of thermally grown silicon dioxide films Reviewed

Kenji Ishikawa, Kunihiro Suzuki, and Shigeru Okamura

J. Appl. Phys.   Vol. 88   page： 7150-7156   2000

Thickness-deconvolved structural properties of thermally grown silicon dioxide films Reviewed

Kenji Ishikawa, Hiroki Ogawa, and Shuzo Fujimura

J. Appl. Phys.   Vol. 86   page： 3472-3474   1999

Contribution of interface roughness to infrared spectra of thermally grown silicon dioxide films Reviewed

Kenji Ishikawa, Hiroki Ogawa, and Shuzo Fujimura

J. Appl. Phys.   Vol. 85   page： 4076-4082   1999

Analysis of native oxide growth process on an atomically flattened and hydrogen terminated Si(111) surface in pure water using fourier transformed infrared reflection absorption spectroscopy Reviewed

Shuzo Fujimura, Kenji Ishikawa, and Hiroki Ogawa

J. Vac. Sci. Technol. A   Vol. 16 ( 1 ) page： 375-381   1998.1

Dependence of TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature Reviewed

Kenji Ishikawa, Yuji Uchiyama, Hiroki Ogawa, and Shuzo Fujimura

Appl. Surf. Sci.   Vol. 117/118   page： 212-215   1997.6

Infrared spectroscopy study of the RCA standard clean chemical oxides and their sequencing Reviewed

Carlos Inomata, Hiroki Ogawa, Kenji Ishikawa, and Shuzo Fujimura

J. Electrochem. Soc.   Vol. 143 ( 9 ) page： 2995-3000   1996.9

Initial stage of native oxide growth on hydrogen terminated silicon (111) surfaces Reviewed

Hiroki Ogawa, Kenji Ishikawa, Carlos Inomata, and Shuzo Fujimura

J. Appl. Phys.   Vol. 79 ( 1 ) page： 472-477   1996.1

Observation of Oxygen Exposed Hydrogen Terminated Silicon Surface Reviewed

Hiroki Ogawa, Kenji Ishikawa, M. Aoki, Shuzo Fujimura, N. Ueno, Yasuhiro Horiike, Y. Harada

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 3, edited by H.Z. Massoud, E.H. Poindexter, and C.R. Helms, (The Electrochemical Society, NJ)     page： 428   1996

Effects of Dissolved Oxygen in HF Solution on Silicon Surface Morphology Reviewed

Hiroki Ogawa, Kenji Ishikawa, Miki T. Suzuki, Yuka Hayami, and Shuzo Fujimura

Jpn. J. Appl. Phys.   Vol. 34 ( 2B ) page： 732-736   1995.2

FT-IR-RAS analysis of the structure of the SiO2/Si interface Reviewed

Kenji Ishikawa, Hiroki Ogawa, Carlos Inomata, Shuzo Fujimura, and Haruhisa Mori

Control of Semiconductor Interfaces, edited by I. Ohdomari, M. Oshima and A. Hiraki, (Elsevier Science B.V.)     page： 447   1994

Native Oxide Characterization on Silicon Surfaces Reviewed

Hiroki Ogawa, Carlos Inomata, Kenji Ishikawa, Shuzo Fujimura, and Haruhisa Mori

Control of Semiconductor Interfaces, edited by I. Ohdomari, M. Oshima and A. Hiraki, (Elsevier Science B.V.)     page： 383   1994

Observation of Thin SiO2 Films using IR-RAS Reviewed

Shuzo Fujimura, Kenji Ishikawa, and Haruhisa Mori

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2, edited by C. R. Helms and B. E. Deal, (Plenum Press)     page： 91   1993

New Analytical Method of SiO2 Structure by Infrared Reflection Absorption Spectroscopy (IR-RAS) Reviewed

Kenji Ishikawa, Hiroki Ogawa, Carlos Inomata, Shuzo Fujimura and Haruhisa Mori

MRS Proceedings   Vol. 318   page： 425-431   1993

ArFフォトレジストのプラズマエッチング技術

石川健治，堀勝（ Role： Joint author）

技術情報協会  2013.7 

ドライエッチング In: 「ドライプロセスによる表面処理・薄膜形成（表面技術協会編）」

石川健治，堀勝（ Role： Joint author）

丸善  2013.5  （ ISBN:978-4-339-04631-1 ）

層間絶縁膜の成膜とエッチング

石川健治，堀勝（ Role： Joint author）

エヌティエス出版  2012.7  （ ISBN:978-4-86469-039-3 ）

エッチング工程の手法およびレジスト・レジストパターンへの影響

石川健治，堀勝（ Role： Joint author）

情報機構  2011.9  （ ISBN:978-4-904080-90-0 ）

半導体プロセス洗浄方法とその効果

石川健治（ Role： Joint author）

有機汚染物質／アウトガスの発生メカニズムとトラブル対策事例集（技術情報協会）  2008 

シリコン基板の洗浄

石川健治（ Role： Joint author）

エレクトロニクス洗浄技術（技術情報協会）  2007 

C2F4の電子物性とPTFEの生成機構

林 俊雄, 石川 健治, 関根 誠, 堀 勝, 兒玉 直人, 豊田 浩孝

第70回応用物理学会春季学術講演会 17p-A205-18  2023.3.17 

F2添加 Ar プラズマを用いた基板昇温下での AlGaN の原子層エッチング

中村 昭平, 谷出 敦, 灘原 壮一, 石川 健治, 小田 修, 堀 勝

第70回応用物理学会春季学術講演会 17p-A205-11  2023.3.17 

成膜パラメータの寄与度解析に基づく、 水素化アモルファスカーボン薄膜のエッチ耐性の向上

安藤 悠介, 近藤 博基, 石川 健治, 堤 隆嘉, 関根 誠, 堀 勝

第70回応用物理学会春季学術講演会 17a-A205-7  2023.3.17 

ウエハプロセスのグリーン化イノベーションに向けた戦略的挑戦 Invited

堀 勝、関根 誠、石川 健治

第83回 応用物理学会秋季学術講演会 21p-B104-3  2022.9.21 

プラズマ活性乳酸リンゲル液によるマクロファージの形質発現誘導

出野 雄大、柏倉 慧史、田中 宏昌、石川 健治、橋爪 博司、中村 香江、豊國 伸哉、水野 正明、梶山 広明、堀 勝

第83回 応用物理学会秋季学術講演会 20a-A106-7  2022.9.20 

イオン照射角制御によるカーボンナノウォールの配向成長

射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第83回 応用物理学会秋季学術講演会 23p-B102-5  2022.9.23 

プラズマ活性溶液による細胞運命の制御 Invited

田中 宏昌、水野 正明、石川 健治、梶山 広明、豊國 伸哉、吉川 史隆、堀 勝

第83回 応用物理学会秋季学術講演会 21p-B200-5  2022.9.21 

非平衡大気圧プラズマを用いた陸上養殖実現に向けた基礎的研究

紅林 佑弥、石川 健治、田中 宏昌、秋山 真一、橋爪 博司、堀 勝

第83回 応用物理学会秋季学術講演会 20p-A106-13  2022.9.20 

水素化アモルファスカーボン薄膜の合成機構における活性種の寄与度の機械学習を用いた解析

近藤 博基、黒川 純平、堤 隆嘉、関根 誠、石川 健治、堀 勝

第83回 応用物理学会秋季学術講演会 23a-B101-3  2022.9.23 

プラズマアシスト熱サイクル法を用いたSiGeのセルフリミティング性サイクルエッチング

篠田 和典、三浦 勝哉、前田 賢治、伊澤 勝、NGUYEN Thi-Thuy-Nga、石川 健治、堀 勝

第83回 応用物理学会秋季学術講演会 22p-A406-4  2022.9.22 

ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析

近藤 博基、尾崎 敦士、堤 隆嘉、関根 誠、石川 健治、堀 勝、平松 美根男

第69回応用物理学会春季学術講演会　24p-D114-6  2022.3.24 

C3H6/H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係

黒川 純平、光成 正、近藤 博基、堤 隆嘉、関根 誠、石川 健治、堀 勝

第69回応用物理学会春季学術講演会　25p-E104-13  2022.3.24 

C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響

吉江 泰斗、堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝

第69回応用物理学会春季学術講演会　25a-E104-7  2022.3.24 

Ar/F2プラズマとBCl3の交互供給によるAlGaN原子層エッチングでの組成比制御

中村 昭平、谷出 敦、木村 貴弘、灘原 壮一、石川 健治、小田 修、堀 勝

第69回応用物理学会春季学術講演会　25a-E104-5  2022.3.24 

窒化ガリウムの基板昇温時サイクルエッチング特性

南 吏玖、中村 昭平、谷出 敦、石川 健治、堤 隆嘉、近藤 博基、関根 誠、堀 勝

第69回応用物理学会春季学術講演会　25a-E104-4  2022.3.24 

プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果

射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第69回応用物理学会春季学術講演会　24p-D114-8  2022.3.24 

高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの表面電位制御

橋本 拓海、近藤 博基、田中 宏昌、石川 健治、堤 隆嘉、関根 誠、安井 隆雄、馬場 嘉信、平松 美根男、堀 勝

第69回応用物理学会春季学術講演会　24p-D114-7  2022.3.24 

中性酸素ラジカル源を用いたポリエチレンテレフタレートの生分解速度の向上

五藤 大智、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、伊藤 昌文、堀 勝

第69回応用物理学会春季学術講演会　25a-E105-1  2022.3.24 

稲穂への低温プラズマ照射がもたらす酒造品種玄米の品質向上

橋爪 博司、北野 英己、水野 寛子、阿部 明子、三田 薫、蕭 世男、湯浅 元気、東野 里江、田中 宏昌、石川 健治、松本 省吾、榊原 均、仁川 進、前島 正義、水野 正明、堀 勝

第69回応用物理学会春季学術講演会　25p-E105-13  2022.3.24 

網羅的解析に基づくプラズマ活性溶液による細胞死の機構解明

田中 宏昌、水野 正明、石川 健治、橋爪 博司、中村 香江、梶山 広明、吉川 史隆、岡崎 康昌、豊國 伸哉、堀 勝

第69回応用物理学会春季学術講演会　25a-E105-8  2022.3.24 

プラズマ照射乳酸リンゲル液の抗腫瘍成分の評価

伊藤 大貴、岩田 直幸、石川 健治、橋爪 博司、中村 香江、ミロン カメリア、田中 宏昌、梶山 広明、豊國 伸哉、水野 正明、堀 勝

第69回応用物理学会春季学術講演会　25a-E105-7  2022.3.24 

流液への照射によるプラズマ活性溶液の作製と短寿命活性種の測定

柏倉 慧史、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、堀 勝

第69回応用物理学会春季学術講演会　25a-E105-6  2022.3.24 

Stable production of high-quality strawberry fruits with cold plasma treatment during cultivation

2022.1.24 

Morphological control of carbon nanowalls grown by a radical injection plasma enhanced chemical vapor deposition using C2F6/H2 mixture gas

2022.1.24 

Deposition of nanographene on ethanol-immersed metal substrates by in-liquid plasma process

2022.1.24 

Effect of morphology and heights of carbon nanowalls on their optical transmittance

2022.1.24 

Biodegradation of polyethylene terephthalate treated neutral oxygen radical

2022.1.24 

Molecular mechanisms of cancer cell death by plasma-activated Ringer's lactate solution

2022.1.24 

Functional nitrogen science for plasma-processing in life and matter Invited International conference

Kenji Ishikawa, Toshiro Kaneko, and Masaru Hori

2021.12.12  Material Research Society of Japan

Optical transmission of carbon nanowalls from ultra-violet region to infra-red region International conference

Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

Material Research Meeting (MRM 2020)  2021.12.12 

Enhancement of biodegradation technology of polyethylene terephthalate with plasma-pretreatment International conference

Daichi Goto, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Masafumi Ito, and Masaru Hori

31st Material Research Society in Japan (MRS-J)  2021.12.12 

Plasma-biological reaction networks and aqueous radical chemistry Invited International conference

Kenji Ishkawa, Camelia Miron, Takashi Kondo, Hiromasa Tanaka, and Masaru Hori

31st Material Research Society in Japan (MRS-J)  2021.12.12 

Cellular Respiration System Affected by Low-temperature Plasma International conference

Hiromasa Tanaka, Shogo Maeda, Shogo Matsumura, Masaaki Mizuno, Kenji Ishikawa, Masafumi Ito, Hiroshi Hashizume, Mikako Ito, Kinji Ohno, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Yasumasa Okazaki, Shinya Toyokuni, and Masaru Hori

31st Material Research Society in Japan (MRS-J)  2021.12.12 

Effects of cold plasma treatment with rice seedlings in a paddy on yield and grain quality for different cultivars International conference

Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Kaoru Sanda, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori

31st Material Research Society in Japan (MRS-J)  2021.12.12