Updated on 2022/03/30

写真a

 
ISHIKAWA, Kenji
 
Organization
Center for Low-temperature Plasma Sciences (cLPS) Professor
Graduate School
Graduate School of Engineering
Title
Professor
External link

Degree 1

  1. Ph. D. ( 2006.3   Tohoku University ) 

Research Areas 1

  1. Others / Others  / Plasma nanoscience and nanotechnology

Current Research Project and SDGs 3

  1. Plasma material science

  2. Plasma biology

  3. Plasma processes

Research History 3

  1. Nagoya University   Plasma science division   Professor

    2021.4

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    Country:Japan

  2. Kyushu University   Center of plasma nano interface engineering

    2021.4

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    Country:Japan

  3. Nagoya University   Center for low-temperature plasma sciences   Designated professor

    2020.2 - 2021.3

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    Country:Japan

Professional Memberships 4

  1. 応用物理学会

  2. Society for Free Radical Research JAPAN

  3. プラズマ核融合学会

  4. American Vacuum Society   Plasma Science and Technology Division

Awards 7

  1. ISPlasma 2016/IC-PLANTS 2016 Excellent Presentation Award

    2016.3   ISPlasma 2016/IC-PLANTS 2016  

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    Country:Japan

  2. 37th JSAP Outstanding Paper Award

    2015.9  

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    Country:Japan

  3. 11th Plasma Electronics Award, Division of Plasma Electronics, The Japan Society of Applied Physics

    2013.3   The Japan Society of Applied Physics  

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    Country:Japan

  4. 第11回アジア太平洋プラズマ科学会議(APCPST&SPSM) Plasma Science Award

    2012.10   APCPST&SPSM  

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    Country:Japan

  5. Symposium award (2008): The 72th Symposium on Semiconductors and Integrated Circuits Technology

    2009   The Electrochemical Society of Japan  

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    Country:Japan

  6. ASET 優秀研究員“SiO2およびポリマーのプラズマエッチング表面反応の研究”

    2003   技術研究組合 超先端電子技術開発機構(ASET)  

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    Country:Japan

  7. 2003 spring MRS best poster award: E3.28 VAPOR TREATMENT OF COPPER SURFACE USING ORGANIC ACIDS

    2003   Material Research Society  

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Papers 266

  1. Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride Reviewed

    Shinoda Kazunori, Miyoshi Nobuya, Kobayashi Hiroyuki, Hanaoka Yuko, Izawa Masaru, Ishikawa Kenji, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 40 ( 2 )   2022.3

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1116/6.0001660

    Web of Science

  2. Enhancement of ethanol production and cell growth in budding yeast by direct irradiation of low-temperature plasma Reviewed

    Tanaka Hiromasa, Matsumura Shogo, Ishikawa Kenji, Hashizume Hiroshi, Ito Masafumi, Nakamura Kae, Kajiyama Hiroaki, Kikkawa Fumitaka, Ito Mikako, Ohno Kinji, Okazaki Yasumasa, Toyokuni Shinya, Mizuno Masaaki, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA )   2022.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ac2037

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  3. Towards prevention and prediction of infectious diseases with virus sterilization using ultraviolet light and low-temperature plasma and bio-sensing devices for health and hygiene care Reviewed International coauthorship

    Kumagai Shinya, Nishigori Chikako, Takeuchi Tetsuya, Bruggeman Peter, Takashima Keisuke, Takahashi Hideki, Kaneko Toshiro, Choi Eun Ha, Nakazato Kazuo, Kambara Makoto, Ishikawa Kenji

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA ) page: SA0808   2022.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ac1c3d

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  4. Perspectives on functional nitrogen science and plasma-based in situ functionalization Reviewed

    Ishikawa Kenji

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA ) page: SA0802   2022.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ac3558

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  5. Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems Reviewed International coauthorship

    Kaneko Toshiro, Kato Hiromitsu, Yamada Hideaki, Yamamoto Muneaki, Yoshida Tomoko, Attri Pankaj, Koga Kazunori, Murakami Tomoyuki, Kuchitsu Kazuyuki, Ando Sugihiro, Nishikawa Yasuhiro, Tomita Kentaro, Ono Ryo, Ito Tsuyohito, Ito Atsushi M., Eriguchi Koji, Nozaki Tomohiro, Tsutsumi Takayoshi, Ishikawa Kenji

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA ) page: SA0805   2022.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ac25dc

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  6. On the Etching Mechanism of Highly Hydrogenated SiN Films by CF4/D-2 Plasma: Comparison with CF4/H-2 Reviewed

    Hsiao Shih-Nan, Nguyen Thi-Thuy-Nga, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    COATINGS   Vol. 11 ( 12 ) page: 1535   2021.12

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/coatings11121535

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  7. プラズマがん治療 Invited Reviewed

    石川健治,堀勝

    静電気学会誌   Vol. 45 ( 6 ) page: 206 - 212   2021.11

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    Authorship:Lead author, Corresponding author   Language:Japanese   Publishing type:Research paper (scientific journal)  

  8. Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H-2 plasma at different substrate temperatures Reviewed

    Hsiao Shih-Nan, Britun Nikolay, Thi-Thuy-Nga Nguyen, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 18 ( 11 ) page: 2100078   2021.11

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.202100078

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  9. Plasma-activated Ringer's lactate solution inhibits the cellular respiratory system in HeLa cells Reviewed

    Tanaka Hiromasa, Maeda Shogo, Nakamura Kae, Hashizume Hiroshi, Ishikawa Kenji, Ito Mikako, Ohno Kinji, Mizuno Masaaki, Motooka Yashiro, Okazaki Yasumasa, Toyokuni Shinya, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 18 ( 10 ) page: 2100056   2021.10

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.202100056

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  10. Low temperature plasma irradiation products of sodium lactate solution that induce cell death on U251SP glioblastoma cells were identified Reviewed

    Tanaka Hiromasa, Hosoi Yugo, Ishikawa Kenji, Yoshitake Jun, Shibata Takahiro, Uchida Koji, Hashizume Hiroshi, Mizuno Masaaki, Okazaki Yasumasa, Toyokuni Shinya, Nakamura Kae, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

    SCIENTIFIC REPORTS   Vol. 11 ( 1 ) page: 18488   2021.9

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41598-021-98020-w

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  11. Leading edge of transcendental dry etching technology realizing advanced decice structures Invited Reviewed

    Kenji Ishikawa, and Keigo Takeda

    Journal of plasma and fusion research   Vol. 97 ( 9 ) page: 534 - 536   2021.9

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    Authorship:Lead author, Corresponding author   Language:Japanese   Publishing type:Research paper (scientific journal)  

  12. Effects of free radicals generated by atmospheric pressure plasma on physical actions and biochemical relaxations (PACR) Invited Reviewed

    Kenji Ishikawa, Hiroshi Hashizume, Camelia Miron, Hiromasa Tanaka, and Masaru Hori

    Radiation biology research communications   Vol. 56 ( 3 ) page: 280 - 294   2021.9

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    Authorship:Lead author, Corresponding author   Language:Japanese   Publishing type:Research paper (scientific journal)  

  13. Reaction control of atomic layer and low dame processes for plasma etching of nitride semiconductor Invited Reviewed

    Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Journal of plasma and fusion research   Vol. 97 ( 9 ) page: 517 - 521   2021.9

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

  14. Leading edge of transcendental dry etching technology realizing advanced decice structures Invited Reviewed

    Kenji Ishikawa, and Keigo Takeda

    Journal of plasma and fusion research   Vol. 97 ( 9 ) page: 508 - 510   2021.9

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    Authorship:Lead author, Corresponding author   Language:Japanese   Publishing type:Research paper (scientific journal)  

  15. Novel Method of Rebound Tailing Pulse (RTP) for Water Dissociation Reviewed

    Shimizu Naohiro, Borude Ranjit R., Tanaka Reiko, Ishikawa Kenji, Oda Osamu, Hosoe Hiroki, Ino Satoshi, Inoue Yosuke, Hori Masaru

    IEEE TRANSACTIONS ON PLASMA SCIENCE   Vol. 49 ( 9 ) page: 2893 - 2900   2021.9

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1109/TPS.2021.3102639

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  16. Lysosomal nitric oxide determines transition from autophagy to ferroptosis after exposure to plasma-activated Ringer's lactate Reviewed

    Jiang Li, Zheng Hao, Lyu Qinying, Hayashi Shotaro, Sato Kotaro, Sekido Yoshitaka, Nakamura Kae, Tanaka Hiromasa, Ishikawa Kenji, Kajiyama Hiroaki, Mizuno Masaaki, Hori Masaru, Toyokuni Shinya

    REDOX BIOLOGY   Vol. 43   page: 101989   2021.7

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.redox.2021.101989

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  17. Brain cell proliferation in adult rats after irradiation with nonequilibrium atmospheric pressure plasma Reviewed

    Yamato Masanori, Tamura Yasuhisa, Tanaka Hiromasa, Ishikawa Kenji, Ikehara Yuzuru, Hori Masaru, Kataoka Yosky

    APPLIED PHYSICS EXPRESS   Vol. 14 ( 6 ) page: 067002   2021.6

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1882-0786/ac03c1

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  18. Hydrogen peroxide in lactate solutions irradiated by non-equilibrium atmospheric pressure plasma Reviewed

    Liu Yang, Ishikawa Kenji, Miron Camelia, Hashizume Hiroshi, Tanaka Hiromasa, Hori Masaru

    PLASMA SOURCES SCIENCE & TECHNOLOGY   Vol. 30 ( 4 )   2021.4

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/1361-6595/abbbd4

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  19. Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H-2 plasma Reviewed

    Hsiao Shih-Nan, Nakane Kazuya, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    APPLIED SURFACE SCIENCE   Vol. 542   page: 148550   2021.3

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.apsusc.2020.148550

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  20. Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O-2, and Ar Reviewed

    Hsiao Shih-Nan, Ishikawa Kenji, Hayashi Toshio, Ni Jiwei, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

    APPLIED SURFACE SCIENCE   Vol. 541   page: 148439   2021.3

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.apsusc.2020.148439

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  21. FOREWORD Mechanistic understanding of cold atmospheric plasma applications Reviewed

    Kurihara Kazuaki, Ishikawa Kenji, Takaki Koichi, Shiratani Masaharu

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 2 )   2021.2

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abd871

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  22. Growth inhibition effect on Trypanosoma brucei gambiense by the oxidative stress supplied from low-temperature plasma at atmospheric pressure Reviewed

    Yokoyama Naoaki, Sivakumar Thillaiampalam, Ikehara Sanae, Akimoto Yoshihiro, Yamaguchi Takashi, Wakai Ken, Ishikawa Kenji, Hori Masaru, Shimizu Tetsuji, Sakakita Hajime, Ikehara Yuzuru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 2 ) page: 020601   2021.2

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abd464

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  23. Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS) Reviewed

    Sakai Ryusei, Ichikawa Tomonori, Kondo Hiroki, Ishikawa Kenji, Shimizu Naohiro, Ohta Takayuki, Hiramatsu Mineo, Hori Masaru

    NANOMATERIALS   Vol. 11 ( 2 ) page: 262   2021.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/nano11020262

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  24. Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture Reviewed International coauthorship

    Attri Pankaj, Ishikawa Kenji, Okumura Takamasa, Koga Kazunori, Shiratani Masaharu, Mildaziene Vida

    SCIENTIFIC REPORTS   Vol. 11 ( 1 ) page: 2539   2021.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41598-021-81175-x

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  25. Inactivation mechanism of fungal spores through oxygen radicals in atmospheric-pressure plasma Reviewed

    Ito Masafumi, Hashizume Hiroshi, Oh Jun-Seok, Ishikawa Kenji, Ohta Takayuki, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 1 ) page: 010503   2021.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abcbd1

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  26. Insights into normothermic treatment with direct irradiation of atmospheric pressure plasma for biological applications Reviewed

    Yoshimura Shinji, Otsubo Yoko, Yamashita Akira, Ishikawa Kenji

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 1 ) page: 010502   2021.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abcbd2

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  27. Reduction in photon-induced interface defects by optimal pulse repetition rate in the pulse-modulated inductively coupled plasma Reviewed

    Miyoshi Yasufumi, Ishikawa Kenji, Sekine Makoto, Hori Masaru, Tatsumi Tetsuya

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 1 ) page: 010906   2021.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abd113

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  28. Improvement of yield and grain quality by periodic cold plasma treatment with rice plants in a paddy field Reviewed

    Hashizume Hiroshi, Kitano Hidemi, Mizuno Hiroko, Abe Akiko, Yuasa Genki, Tohno Satoe, Tanaka Hiromasa, Ishikawa Kenji, Matsumoto Shogo, Sakakibara Hitoshi, Nikawa Susumu, Maeshima Masayoshi, Mizuno Masaaki, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 18 ( 1 ) page: 2000181   2021.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.202000181

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  29. Cancer Treatments Using Low-Temperature Plasma Reviewed

    Tanaka Hiromasa, Mizuno Masaaki, Ishikawa Kenji, Toyokuni Shinya, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

    CURRENT MEDICINAL CHEMISTRY   Vol. 28 ( 41 ) page: 8549 - 8558   2021

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.2174/0929867328666210629121731

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  30. Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature Reviewed

    Sugiura Hirotsugu, Kondo Hiroki, Higuchi Kimitaka, Arai Shigeo, Hamaji Ryo, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

    CARBON   Vol. 170   page: 93 - 99   2020.12

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.carbon.2020.07.052

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  31. Influence of chamber pressure on the crystal quality of homo-epitaxial GaN grown by radical-enhanced MOCVD (REMOCVD) Reviewed

    Amalraj Frank Wilson, Shimizu Naohiro, Oda Osamu, Ishikawa Kenji, Hori Masaru

    JOURNAL OF CRYSTAL GROWTH   Vol. 549   page: 125863   2020.11

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.jcrysgro.2020.125863

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  32. Steering of surface discharges on through-glass-vias combined with high-density nonequilibrium atmospheric pressure plasma generation Reviewed

    Sato Yoichiro, Katsuno Kaede, Odaka Hidefumi, Imajyo Nobuhiko, Ishikawa Kenji, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 53 ( 43 ) page: 534302   2020.10

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/1361-6463/aba1ad

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  33. Formation of spherical Sn particles by reducing SnO2 film in floating wire-assisted H-2/Ar plasma at atmospheric pressure Reviewed

    Thi-Thuy-Nga Nguyen, Sasaki Minoru, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

    SCIENTIFIC REPORTS   Vol. 10 ( 1 ) page: 17770   2020.10

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41598-020-74663-z

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  34. Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources Reviewed

    Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kimura Takahiro, Kinose Kazuo, Nadahara Soichi, Nishikawa Masazumi, Ebe Akinori, Ishikawa Kenji, Oda Osamu, Hori Masaru

    ACS OMEGA   Vol. 5 ( 41 ) page: 26776 - 26785   2020.10

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1021/acsomega.0c03865

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  35. Laser-induced-plasma-activated medium enables killing of HeLa cells Reviewed

    Kurokawa Yukihiro, Takeda Keigo, Ishikawa Kenji, Tanaka Hiromasa, Hori Masaru

    APPLIED PHYSICS EXPRESS   Vol. 13 ( 10 ) page: 106001   2020.10

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  36. Adjusted multiple gases in the plasma flow induce differential antitumor potentials of plasma-activated solutions Reviewed

    Nakamura Kae, Yoshikawa Nobuhisa, Yoshihara Masato, Ikeda Yoshiki, Higashida Akihiro, Niwa Akihiro, Jindo Takahiro, Tanaka Hiromasa, Ishikawa Kenji, Mizuno Masaaki, Toyokuni Shinya, Hori Masaru, Kikkawa Fumitaka, Kajiyama Hiroaki

    PLASMA PROCESSES AND POLYMERS   Vol. 17 ( 10 ) page: 1900259   2020.10

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.201900259

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  37. Small size gold nanoparticles enhance apoptosis-induced by cold atmospheric plasma via depletion of intracellular GSH and modification of oxidative stress Reviewed

    Jawaid Paras, Rehman Mati Ur, Zhao Qing-Li, Misawa Masaki, Ishikawa Kenji, Hori Masaru, Shimizu Tadamichi, Saitoh Jun-ichi, Noguchi Kyo, Kondo Takashi

    CELL DEATH DISCOVERY   Vol. 6 ( 1 ) page: 83   2020.9

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41420-020-00314-x

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  38. Numerical analysis of coaxial dielectric barrier helium discharges: three-stage mode transitions and internal bullet propagation Reviewed

    Sato Yosuke, Ishikawa Kenji, Tsutsumi Takayoshi, Hori Masaru

    APPLIED PHYSICS EXPRESS   Vol. 13 ( 8 ) page: 086001   2020.8

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1882-0786/aba3f2

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  39. Plasma Agriculture from Laboratory to Farm: A Review Reviewed

    Attri Pankaj, Ishikawa Kenji, Okumura Takamasa, Koga Kazunori, Shiratani Masaharu

    PROCESSES   Vol. 8 ( 8 ) page: 1002   2020.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/pr8081002

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  40. Non-thermal plasma-activated lactate solution kills U251SP glioblastoma cells in an innate reductive manner with altered metabolism Reviewed

    Ishikawa Kenji, Hosoi Yugo, Tanaka Hiromasa, Jiang Li, Toyokuni Shinya, Nakamura Kae, Kajiyama Hiroaki, Kikkawa Fumitaka, Mizuno Masaaki, Hori Masaru

    ARCHIVES OF BIOCHEMISTRY AND BIOPHYSICS   Vol. 688   page: 108414   2020.7

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.abb.2020.108414

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  41. In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals Reviewed

    Hasegawa Masaki, Tsutsumi Takayoshi, Tanide Atsushi, Nakamura Shohei, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   Vol. 38 ( 4 ) page: 042602   2020.7

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1116/6.0000124

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  42. Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity Reviewed

    Sato Yosuke, Ishikawa Kenji, Tsutsumi Takayoshi, Ui Akio, Akita Masato, Oka Shotaro, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 53 ( 26 ) page: 265204   2020.6

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/1361-6463/ab7df0

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  43. In-plane modification of hexagonal boron nitride particles via plasma in solution Reviewed

    Ito Tsuyohito, Goto Taku, Inoue Kenichi, Ishikawa Kenji, Kondo Hiroki, Hori Masaru, Shimizu Yoshiki, Hakuta Yukiya, Terashima Kazuo

    APPLIED PHYSICS EXPRESS   Vol. 13 ( 6 ) page: 066001   2020.6

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1882-0786/ab916c

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  44. Characterization of a microsecond pulsed non-equilibrium atmospheric pressure Ar plasma using laser scattering and optical emission spectroscopy Reviewed

    Jia Fengdong, Wu Yong, Min Qi, Su Maogen, Takeda Keigo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Hori Masaru, Zhong Zhiping

    PLASMA SCIENCE & TECHNOLOGY   Vol. 22 ( 6 ) page: 065404   2020.6

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/2058-6272/ab84e2

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  45. Electronic properties and primary dissociation channels of fluoromethane compounds Reviewed

    Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 59 ( SJ ) page: SJJE02   2020.6

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ab7e3f

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  46. Electron spin resonance as a tool to monitor the influence of novel processing technologies on food properties Reviewed International coauthorship

    Barba Francisco J., Roohinejad Shahin, Ishikawa Kenji, Leong Sze Ying, Bekhit Alaa El-Din A., Saraiva Jorge A., Lebovka Nikolai

    TRENDS IN FOOD SCIENCE & TECHNOLOGY   Vol. 100   page: 77 - 87   2020.6

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.tifs.2020.03.032

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  47. Dry Process FOREWORD Reviewed

    Shirafuji Tatsuru, Kinoshita Keizo, Akatsuka Hiroshi, Eriguchi Koji, Ichikawa Takashi, Ichiki Takanori, Ishijima Tatsuo, Ishikawa Kenji, Karahashi Kazuhiro, Kurihara Kazuaki, Sekine Makoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 59   2020.6

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ab8acf

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  48. Synthesis of isolated carbon nanowalls via high-voltage nanosecond pulses in conjunction with CH4/H-2 plasma enhanced chemical vapor deposition Reviewed

    Ichikawa Tomonori, Shimizu Naohiro, Ishikawa Kenji, Hiramatsu Mineo, Hori Masaru

    CARBON   Vol. 161   page: 403 - 412   2020.5

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.carbon.2020.01.064

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  49. Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp(2) carbon structures Reviewed

    Sugiura Hirotsugu, Ohashi Yasuyuki, Ishikawa Kenji, Kondo Hiroki, Kato Toshiaki, Kaneko Toshiro, Takeda Keigo, Tsutsumi Takayoshi, Hayashi Toshio, Sekine Makoto, Hori Masaru

    DIAMOND AND RELATED MATERIALS   Vol. 104   2020.4

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.diamond.2019.107651

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  50. In-Liquid Plasma Synthesis of Nanographene with a Mixture of Methanol and 1-Butanol Reviewed

    Ando Atsushi, Ishikawa Kenji, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Kondo Hiroki, Sekine Makoto, Hori Masaru

    CHEMNANOMAT   Vol. 6 ( 4 ) page: 604 - 609   2020.4

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    DOI: 10.1002/cnma.201900676

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  51. Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study Reviewed

    Fukunaga Yusuke, Longo Roberto C., Ventzek Peter L. G., Lane Barton, Ranjan Alok, Hwang Gyeong S., Hartmann Greg, Tsutsumi Takayoshi, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JOURNAL OF APPLIED PHYSICS   Vol. 127 ( 2 )   2020.1

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    DOI: 10.1063/1.5127863

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  52. Etching characteristics of PECVD-prepared SiN films with CF4/D-2 and CF4/H-2 plasmas at different temperatures Reviewed

    Hsiao Shih-Nan, Thi-Thuy-Nga Nguyen, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    2020 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     2020

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    DOI: 10.1109/ISSM51728.2020.9377537

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  53. Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O-2 downstream plasma Reviewed

    Shinoda Kazunori, Miyoshi Nobuya, Kobayashi Hiroyuki, Izawa Masaru, Ishikawa Kenji, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 47 )   2019.11

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    DOI: 10.1088/1361-6463/ab3cf3

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  54. Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate Reviewed

    Isobe Yasuhiro, Sakai Takayuki, Suguro Kyoichi, Miyashita Naoto, Kondo Hiroki, Ishikawa Kenji, Wilson Amalraj Frank, Shimizu Naohiro, Oda Osamu, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 37 ( 6 )   2019.11

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    DOI: 10.1116/1.5114831

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  55. Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions Reviewed

    Tanaka Hiromasa, Mizuno Masaaki, Katsumata Yuko, Ishikawa Kenji, Kondo Hiroki, Hashizume Hiroshi, Okazaki Yasumasa, Toyokuni Shinya, Nakamura Kae, Yoshikawa Nobuhisa, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

    SCIENTIFIC REPORTS   Vol. 9   2019.9

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    DOI: 10.1038/s41598-019-50136-w

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  56. Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS) Reviewed

    Ohta Takayuki, Ito Hironori, Ishikawa Kenji, Kondo Hiroki, Hiramatsu Mineo, Hori Masaru

    C-JOURNAL OF CARBON RESEARCH   Vol. 5 ( 3 )   2019.9

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    DOI: 10.3390/c5030040

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  57. Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects Reviewed

    Miyajima Hideshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 16 ( 9 )   2019.9

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    DOI: 10.1002/ppap.201900039

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  58. Self-limiting reactions of ammonium salt in CHF3/O-2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride Reviewed

    Shinoda Kazunori, Miyoshi Nobuya, Kobayashi Hiroyuki, Izawa Masaru, Saeki Tomonori, Ishikawa Kenji, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   Vol. 37 ( 5 )   2019.9

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    DOI: 10.1116/1.5111663

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  59. Simultaneous achievement of antimicrobial property and plant growth promotion using plasma-activated benzoic compound solution Reviewed

    Iwata Naoyuki, Gamaleev Vladislav, Hashizume Hiroshi, Oh Jun-Seok, Ohta Takayuki, Ishikawa Kenji, Hori Masaru, Ito Masafumi

    PLASMA PROCESSES AND POLYMERS   Vol. 16 ( 8 )   2019.8

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    DOI: 10.1002/ppap.201900023

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  60. Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation Reviewed

    Ichikawa Tomonori, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Tanaka Hiromasa, Sekine Makoto, Hori Masaru

    ACS APPLIED BIO MATERIALS   Vol. 2 ( 7 ) page: 2698 - 2702   2019.7

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    DOI: 10.1021/acsabm.9b00178

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  61. Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective Reviewed

    Ishikawa Kenji, Ishijima Tatsuo, Shirafuji Tatsuru, Armini Silvia, Despiau-Pujo Emilie, Gottscho Richard A., Kanarik Keren J., Leusink Gert J., Marchack Nathan, Murayama Takahide, Morikawa Yasuhiro, Oehrlein Gottlieb S., Park Sangwuk, Hayashi Hisataka, Kinoshita Keizo

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

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    DOI: 10.7567/1347-4065/ab163e

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  62. Plasma-activated solution alters the morphological dynamics of supported lipid bilayers observed by high-speed atomic force microscopy Reviewed

    Yamaoka Sotaro, Kondo Hiroki, Hashizume Hiroshi, Ishikawa Kenji, Tanaka Hiromasa, Hori Masaru

    APPLIED PHYSICS EXPRESS   Vol. 12 ( 6 )   2019.6

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    DOI: 10.7567/1882-0786/ab1a58

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  63. Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes? Reviewed

    Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

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    DOI: 10.7567/1347-4065/ab163a

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  64. Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development Reviewed

    Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

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    DOI: 10.7567/1347-4065/ab163b

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  65. Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation Reviewed

    Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

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    DOI: 10.7567/1347-4065/ab1638

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  66. Electronic properties and primarily dissociation channels of fluoroethane compounds Reviewed

    Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58   2019.6

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    DOI: 10.7567/1347-4065/ab09ca

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  67. Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas Reviewed

    Zhang Yan, Ishikawa Kenji, Mozetic Miran, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 16 ( 6 )   2019.6

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    DOI: 10.1002/ppap.201800175

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  68. Laser-drilling formation of through-glass-via (TGV) on polymer-laminated glass Reviewed

    Sato Yoichiro, Imajyo Nobuhiko, Ishikawa Kenji, Tummala Rao, Hori Masaru

    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS   Vol. 30 ( 11 ) page: 10183 - 10190   2019.6

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    DOI: 10.1007/s10854-019-01354-5

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  69. Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition Reviewed

    Isobe Yasuhiro, Sakai Takayuki, Sugiyama Naoharu, Mizushima Ichiro, Suguro Kyoichi, Miyashita Naoto, Lu Yi, Wilson Amalraj Frank, Kumar Dhasiyan Arun, Ikarashi Nobuyuki, Kondo Hiroki, Ishikawa Kenji, Shimizu Naohiro, Oda Osamu, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 37 ( 3 )   2019.5

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    DOI: 10.1116/1.5083970

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  70. Chemical bonding structure in porous SiOC films (k < 2.4) with high plasma-induced damage resistance (vol 3, pg 1, 2019) Reviewed

    Miyajima Hideshi, Masuda Hideaki, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    MICRO AND NANO ENGINEERING   Vol. 3   page: 92 - 92   2019.5

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    DOI: 10.1016/j.mne.2019.05.004

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  71. Chemical bonding structure in porous SiOC films (k < 2.4) with high plasma-induced damage resistance Reviewed

    Miyajima Hideshi, Masuda Hideaki, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    MICRO AND NANO ENGINEERING   Vol. 3   page: 1 - 6   2019.5

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    DOI: 10.1016/j.mne.2019.02.005

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  72. Facile synthesis of SnO2-graphene composites employing nonthermal plasma and SnO2 nanoparticles-dispersed ethanol Reviewed

    Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 17 )   2019.4

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    DOI: 10.1088/1361-6463/ab03c4

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  73. Systematic diagnostics of the electrical, optical, and physicochemical characteristics of low-temperature atmospheric-pressure helium plasma sources Reviewed

    Takeda Keigo, Yamada Hiromasa, Ishikawa Kenji, Sakakita Hajime, Kim Jaeho, Ueda Masashi, Ikeda Jun-ichiro, Akimoto Yoshihiro, Kataoka Yosky, Yokoyama Naoaki, Ikehara Yuzuru, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 16 )   2019.4

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    DOI: 10.1088/1361-6463/aaff44

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  74. A 65-nm CMOS Fully Integrated Analysis Platform Using an On-Chip Vector Network Analyzer and a Transmission-Line-Based Detection Window for Analyzing Circulating Tumor Cell and Exosome Reviewed

    Niitsu Kiichi, Nakanishi Taiki, Murakami Shunya, Matsunaga Maya, Kobayashi Atsuki, Karim Nissar Mohammad, Ito Jun, Ozawa Naoya, Hase Tetsunari, Tanaka Hiromasa, Sato Mitsuo, Kondo Hiroki, Ishikawa Kenji, Odaka Hidefumi, Hasegawa Yoshinori, Hori Masaru, Nakazato Kazuo

    IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS   Vol. 13 ( 2 ) page: 470 - 479   2019.4

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    DOI: 10.1109/TBCAS.2018.2882472

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  75. Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls Reviewed

    Imai Shun, Naito Kenichi, Kondo Hiroki, Cho Hyung Jun, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 10 )   2019.3

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    DOI: 10.1088/1361-6463/aaf8e0

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  76. Control of sp(2)-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H-2 plasma-enhanced chemical vapor deposition Reviewed

    Sugiura Hirotsugu, Jia Lingyun, Ohashi Yasuyuki, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( 3 )   2019.3

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    DOI: 10.7567/1347-4065/aafd49

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  77. Effects of BCl3 addition to Cl-2 gas on etching characteristics of GaN at high temperature Reviewed

    Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kohno Motohiro, Kinose Kazuo, Nadahara Soichi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 37 ( 2 )   2019.3

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    DOI: 10.1116/1.5082345

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  78. Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Tomatsu Masakazu, Hiramatsu Mineo, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

    C-JOURNAL OF CARBON RESEARCH   Vol. 5 ( 1 )   2019.3

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    DOI: 10.3390/c5010007

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  79. Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Sugiura Hirotsugu, Kondo Hiroki, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

    C-JOURNAL OF CARBON RESEARCH   Vol. 5 ( 1 )   2019.3

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    DOI: 10.3390/c5010008

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  80. Non-thermal plasma-activated medium modified metabolomic profiles in the glycolysis of U251SP glioblastoma Reviewed

    Kurake Naoyuki, Ishikawa Kenji, Tanaka Hiromasa, Hashizume Hiroshi, Nakamura Kae, Kajiyama Hiroaki, Toyokuni Shinya, Kikkawa Fumitaka, Mizuno Masaaki, Hori Masaru

    ARCHIVES OF BIOCHEMISTRY AND BIOPHYSICS   Vol. 662   page: 83-92   2019.2

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    DOI: 10.1016/j.abb.2018.12.001

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  81. Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF6-added plasma etching of quartz glass Reviewed

    Thi-Thuy-Nga Nguyen, Sasaki Minoru, Odaka Hidefumi, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

    JOURNAL OF APPLIED PHYSICS   Vol. 125 ( 6 )   2019.2

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    DOI: 10.1063/1.5081875

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  82. Liquid dynamics in response to an impinging low-temperature plasma jet Reviewed

    Brubaker T. R., Ishikawa K., Kondo H., Tsutsumi T., Hashizume H., Tanaka H., Knecht S. D., Bilen S. G., Hori M.

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 7 )   2019.2

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    DOI: 10.1088/1361-6463/aaf460

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  83. Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds Reviewed

    Ichikawa Tomonori, Tanaka Suiki, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS EXPRESS   Vol. 12 ( 2 )   2019.2

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    DOI: 10.7567/1882-0786/aaf469

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  84. Adhesion enhancement and amine reduction using film redeposited at the interface of a stack of plasma-enhanced CVD dielectrics for Cu/low-k interconnects Reviewed

    Miyajima Hideshi, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( 2 )   2019.2

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    DOI: 10.7567/1347-4065/aafb5b

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  85. Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system Reviewed

    Fukunaga Yusuke, Tsutsumi Takayoshi, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( 2 )   2019.2

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    DOI: 10.7567/1347-4065/aaf92a

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  86. Hetero-epitaxial growth of a GaN film by the combination of magnetron sputtering with Ar/Cl-2 gas mixtures and a separate supply of nitrogen precursors from a high density radical source Reviewed

    Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kohno Motohiro, Kinose Kazuo, Nadahara Soichi, Nishikawa Masazumi, Ebe Akinori, Ishikawa Kenji, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( SA )   2019.2

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    DOI: 10.7567/1347-4065/aaeb39

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  87. Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma Reviewed

    Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Han Jeon Geon, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( SA )   2019.2

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    DOI: 10.7567/1347-4065/aaec87

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  88. Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries Reviewed

    Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Ikarashi Nobuyuki, Hori Masaru

    ACS APPLIED NANO MATERIALS   Vol. 2 ( 2 ) page: 649 - 654   2019.2

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    DOI: 10.1021/acsanm.8b02201

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  89. Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H-2 plasma-enhanced chemical vapor deposition Reviewed

    Imai Shun, Kondo Hiroki, Hyungjun Cho, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

    APPLIED PHYSICS EXPRESS   Vol. 12 ( 1 )   2019.1

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    DOI: 10.7567/1882-0786/aaf0ab

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  90. Molecular mechanisms of non-thermal plasmainduced effects in cancer cells Reviewed

    Tanaka Hiromasa, Mizuno Masaaki, Ishikawa Kenji, Toyokuni Shinya, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

    BIOLOGICAL CHEMISTRY   Vol. 400 ( 1 ) page: 87-91   2019.1

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    DOI: 10.1515/hsz-2018-0199

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  91. Effect of N-2/H-2 plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) Reviewed

    Amalraj Frank Wilson, Dhasiyan Arun Kumar, Lu Yi, Shimizu Naohiro, Oda Osamu, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Ikarashi Nobuyuki, Hori Masaru

    AIP ADVANCES   Vol. 8 ( 11 )   2018.11

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    DOI: 10.1063/1.5050819

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  92. Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching Reviewed

    Zhang Yan, Imamura Masato, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 10 )   2018.10

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    DOI: 10.7567/JJAP.57.106502

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  93. Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H-2 at 300-500 degrees C Reviewed

    Kako Takashi, Liu Zecheng, Ishikawa Kenji, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

    VACUUM   Vol. 156   page: 219-223   2018.10

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    DOI: 10.1016/j.vacuum.2018.07.040

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  94. Cytotoxic effects of plasma-irradiated fullerenol Reviewed

    Kanno Daiki, Tanaka Hiromasa, Ishikawa Kenji, Hashizume Hiroshi, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 51 ( 37 )   2018.9

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    DOI: 10.1088/1361-6463/aad510

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  95. Dissociative properties of 1,1,1,2-tetrafluoroethane obtained by computational chemistry Reviewed

    Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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    DOI: 10.7567/JJAP.57.06JC02

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  96. Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma Reviewed

    Liu Zecheng, Ishikawa Kenji, Imamura Masato, Tsutsumi Takayoshi, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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    DOI: 10.7567/JJAP.57.06JD01

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  97. Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom? Reviewed

    Ishikawa Kenji, Karahashi Kazuhiro, Ishijima Tatsuo, Cho Sung Il, Elliott Simon, Hausmann Dennis, Mocuta Dan, Wilson Aaron, Kinoshita Keizo

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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    DOI: 10.7567/JJAP.57.06JA01

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  98. Low-autofluorescence fluoropolymer membrane filters for cell filtration Reviewed

    Kihara Naoto, Kuboyama Daiki, Onoshima Daisuke, Ishikawa Kenji, Tanaka Hiromasa, Ozawa Naoya, Hase Tetsunari, Koguchi Ryohei, Yukawa Hiroshi, Odaka Hidefumi, Hasegawa Yoshinori, Baba Yoshinobu, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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    DOI: 10.7567/JJAP.57.06JF03

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  99. Impact of helium pressure in arc plasma synthesis on crystallinity of single-walled carbon nanotubes Reviewed

    Ando Atsushi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Suzuki Tomoko, Inoue Sakae, Ando Yoshinori, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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    DOI: 10.7567/JJAP.57.06JF01

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  100. Effects of gas residence time of CH4/H-2 on sp(2) fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition Reviewed

    Sugiura Hirotsugu, Jia Lingyun, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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    DOI: 10.7567/JJAP.57.06JE03

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  101. Dry Process FOREWORD Reviewed

    Karahashi Kazuhiro, Kinoshita Keizo, Higashi Seiichiro, Ishikawa Kenji, Ishijima Tatsuo, Kuboi Nobuyuki

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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    DOI: 10.7567/JJAP.57.06J001

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  102. Cell Deposition Microchip with Micropipette Control over Liquid Interface Motion Reviewed

    Onoshima Daisuke, Hattori Yuya, Yukawa Hiroshi, Ishikawa Kenji, Hori Masaru, Baba Yoshinobu

    CELL MEDICINE   Vol. 10   2018.5

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    DOI: 10.1177/2155179017733152

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  103. Nanographene synthesized in triple-phase plasmas as a highly durable support of catalysts for polymer electrolyte fuel cells Reviewed

    Amano Tomoki, Kondo Hiroki, Takeda Keigo, Ishikawa Kenji, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 4 )   2018.4

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    DOI: 10.7567/JJAP.57.045101

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  104. Oxygen reduction reaction properties of nitrogen-incorporated nanographenes synthesized using in-liquid plasma from mixture of ethanol and iron phthalocyanine

    Amano Tomoki, Kondo Hiroki, Takeda Keigo, Ishikawa Kenji, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 4 )   2018.4

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    DOI: 10.7567/JJAP.57.040303

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  105. Cytotoxicity of cancer HeLa cells sensitivity to normal MCF10A cells in cultivations with cell culture medium treated by microwave-excited atmospheric pressure plasmas

    Takahashi Yohei, Taki Yusuke, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Ishikawa Kenji, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 51 ( 11 )   2018.3

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    DOI: 10.1088/1361-6463/aaab09

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  106. Free radical generation by non-equilibrium atmospheric pressure plasma in alcohol-water mixtures: an EPR-spin trapping study

    Uchiyama Hidefumi, Ishikawa Kenji, Zhao Qing-Li, Andocs Gabor, Nojima Nobuyuki, Takeda Keigo, Krishna Murali C., Ishijima Tatsuo, Matsuya Yuji, Hori Masaru, Noguchi Kyo, Kondo Takashi

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 51 ( 9 )   2018.3

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    DOI: 10.1088/1361-6463/aaa885

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  107. Facile fabrication of a poly(ethylene terephthalate) membrane filter with precise arrangement of through-holes

    Kihara Naoto, Odaka Hidefumi, Kuboyama Daiki, Onoshima Daisuke, Ishikawa Kenji, Baba Yoshinobu, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 3 )   2018.3

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    DOI: 10.7567/JJAP.57.037001

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  108. Reduced HeLa cell viability in methionine-containing cell culture medium irradiated with microwave-excited atmospheric-pressure plasma

    Takahashi Yohei, Taki Yusuke, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Ishikawa Kenji, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 15 ( 3 )   2018.3

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    DOI: 10.1002/ppap.201700200

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  109. Glioblastoma Cell Lines Display Different Sensitivities to Plasma-Activated Medium Reviewed

    Tanaka Hiromasa, Mizuno Masaaki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Nakamura Kae, Utsumi Fumi, Kajiyama Hiroaki, Okazaki Yasumasa, Toyokuni Shinya, Akiyama Shinichi, Maruyama Shoichi, Kikkawa Fumitaka, Hori Masaru

    IEEE TRANSACTIONS ON RADIATION AND PLASMA MEDICAL SCIENCES   Vol. 2 ( 2 ) page: 99-102   2018.3

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    DOI: 10.1109/TRPMS.2017.2721973

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  110. Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons

    Ando Atsushi, Ishikawa Kenji, Kondo Hiroki, Tsutsumi Takayoshi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 2 )   2018.2

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    DOI: 10.7567/JJAP.57.026201

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  111. Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials FOREWORD

    Naritsuka Shigeya, Miyazaki Seiichi, Fujiwara Yasufumi, Hiramatsu Mineo, Inoue Yasushi, Ishikawa Kenji, Ito Masafumi, Itoh Takashi, Kasu Makoto, Miyake Hideto, Sasaki Minoru, Shirafuji Tatsuru, Suda Yoshiyuki

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 1 )   2018.1

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    DOI: 10.7567/JJAP.57.01A001

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  112. Electron impact ionization of perfluoro-methyl-vinyl-ether C3F6O

    Kondo Yusuke, Ishikawa Kenji, Hayashi Toshio, Sekine Makoto, Hori Masaru

    PLASMA SOURCES SCIENCE & TECHNOLOGY   Vol. 27 ( 1 )   2018.1

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    DOI: 10.1088/1361-6595/aaa22e

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  113. Selective production of reactive oxygen and nitrogen species in the plasma-treated water by using a nonthermal high-frequency plasma jet

    Uchida Giichiro, Takenaka Kosuke, Takeda Keigo, Ishikawa Kenji, Hori Masaru, Setsuhara Yuichi

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 1 )   2018.1

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    DOI: 10.7567/JJAP.57.0102B4

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  114. Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol

    Amano Tomoki, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Takeda Keigo, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS EXPRESS   Vol. 11 ( 1 )   2018.1

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    DOI: 10.7567/APEX.11.015102

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  115. Plasma-activated medium (PAM) kills human cancer-initiating cells

    Ikeda Jun-ichiro, Tanaka Hiromasa, Ishikawa Kenji, Sakakita Hajime, Ikehara Yuzuru, Hori Masaru

    PATHOLOGY INTERNATIONAL   Vol. 68 ( 1 ) page: 23-30   2018.1

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    DOI: 10.1111/pin.12617

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  116. Isotropic atomic level etching of tungsten using formation and desorption of tungsten fluoride Reviewed

    Shinoda Kazunori, Miyoshi Nobuya, Kobayashi Hiroyuki, Hanaoka Yuko, Kawamura Kohei, Izawa Masaru, Ishikawa Kenji, Hori Masaru

    ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VII   Vol. 10589   2018

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    DOI: 10.1117/12.2297241

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  117. Real-time control of a wafer temperature for uniform plasma process Reviewed

    Tsutsumi T., Fuknaga Y., Ishikawa K., Kondo H., Sekine M., Hori M.

    2018 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     2018

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  118. Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy

    Brubaker Timothy R., Ishikawa Kenji, Takeda Keigo, Oh Jun-Seok, Kondo Hiroki, Hashizume Hiroshi, Tanaka Hiromasa, Knecht Sean D., Bilen Sven G., Hori Masaru

    JOURNAL OF APPLIED PHYSICS   Vol. 122 ( 21 )   2017.12

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    DOI: 10.1063/1.4999256

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  119. Dependence of absolute photon flux on infrared absorbance alteration and surface roughness on photoresist polymers irradiated with vacuum ultraviolet photons emitted from HBr plasma

    Zhang Yan, Takeuchi Takuya, Ishikawa Kenji, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 12 )   2017.12

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    DOI: 10.7567/JJAP.56.126503

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  120. Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium

    Furuta Ryo, Kurake Naoyuki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 14 ( 11 )   2017.11

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    DOI: 10.1002/ppap.201700123

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  121. Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

    Zhang Yan, Takeuchi Takuya, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   Vol. 35 ( 6 )   2017.11

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    DOI: 10.1116/1.4994218

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  122. Crystallization of calcium oxalate dihydrate in a buffered calcium-containing glucose solution by irradiation with non-equilibrium atmospheric pressure plasma

    Kurake Naoyuki, Tanaka Hiromasa, Ishikawa Kenji, Nakamura Kae, Kajiyama Hiroaki, Kikkawa Fumitaka, Mizuno Masaaki, Ikehara Yuzuru, Hori Masaru

    JOURNAL OF APPLIED PHYSICS   Vol. 122 ( 14 )   2017.10

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    DOI: 10.1063/1.5006598

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  123. High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition

    Imai Shun, Kondo Hiroki, Cho Hyungjun, Kano Hiroyuki, Ishikawa Kenji, Sekine Makoto, Hiramatsu Mineo, Ito Masafumi, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 40 )   2017.10

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    DOI: 10.1088/1361-6463/aa8131

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  124. Cold atmospheric helium plasma causes synergistic enhancement in cell death with hyperthermia and an additive enhancement with radiation

    Moniruzzaman Rohan, Rehman Mati Ur, Zhao Qing-Li, Jawaid Paras, Takeda Keigo, Ishikawa Kenji, Hori Masaru, Tomihara Kei, Noguchi Kyo, Kondo Takashi, Noguchi Makoto

    SCIENTIFIC REPORTS   Vol. 7   2017.9

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    DOI: 10.1038/s41598-017-11877-8

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  125. Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy

    Furuta Ryo, Kurake Naoyuki, Takeda Keigo, Ishikawa Kenji, Ohta Takayuki, Ito Masafumi, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

    BIOINTERPHASES   Vol. 12 ( 3 )   2017.9

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    DOI: 10.1116/1.4997170

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  126. Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation

    Liu Zecheng, Imamura Masato, Asano Atsuki, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS EXPRESS   Vol. 10 ( 8 )   2017.8

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    DOI: 10.7567/APEX.10.086502

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  127. Temperature dependence of protection layer formation on organic trench sidewall in H-2/N-2 plasma etching with control of substrate temperature

    Fukunaga Yusuke, Tsutsumi Takayoshi, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 7 )   2017.7

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    DOI: 10.7567/JJAP.56.076202

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  128. Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy

    Furuta Ryo, Kurake Naoyuki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Kondo Hiroki, Ohta Takayuki, Ito Masafumi, Sekine Makoto, Hori Masaru

    PHYSICAL CHEMISTRY CHEMICAL PHYSICS   Vol. 19 ( 21 ) page: 13438-13442   2017.6

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    DOI: 10.1039/c7cp00489c

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  129. Dry Process FOREWORD

    Ishikawa Kenji, Kinoshita Keizo, Higashi Seiichiro, Ichiki Takanori, Karahashi Kazuhiro, Kuboi Nobuyuki

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

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    DOI: 10.7567/JJAP.56.06H001

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  130. Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas

    Ueyama Toshinari, Fukunaga Yusuke, Tsutsumi Takayoshi, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Iwata Manabu, Ohya Yoshinobu, Sugai Hideo, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

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    DOI: 10.7567/JJAP.56.06HC03

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  131. Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?

    Ishikawa Kenji, Karahashi Kazuhiro, Ichiki Takanori, Chang Jane P., George Steven M., Kessels W. M. M., Lee Hae June, Tinck Stefan, Um Jung Hwan, Kinoshita Keizo

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

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    DOI: 10.7567/JJAP.56.06HA02

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  132. Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition

    Tomatsu Masakazu, Hiramatsu Mineo, Foord John S., Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Takeda Keigo, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

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    DOI: 10.7567/JJAP.56.06HF03

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  133. Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 degrees C

    Takai Shinnosuke, Lu Yi, Oda Osamu, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 6 )   2017.6

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    DOI: 10.7567/JJAP.56.06HE08

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  134. Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

    Shinoda K., Miyoshi N., Kobayashi H., Miura M., Kurihara M., Maeda K., Negishi N., Sonoda Y., Tanaka M., Yasui N., Izawa M., Ishii Y., Okuma K., Saldana T., Manos J., Ishikawa K., Hori M.

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 19 )   2017.5

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    DOI: 10.1088/1361-6463/aa6874

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  135. Spatial distributions of O, N, NO, OH and vacuum ultraviolet light along gas flow direction in an AC-excited atmospheric pressure Ar plasma jet generated in open air

    Takeda Keigo, Ishikawa Kenji, Tanaka Hiromasa, Sekine Makoto, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 19 )   2017.5

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    DOI: 10.1088/1361-6463/aa6555

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  136. Bactericidal pathway of Escherichia coli in buffered saline treated with oxygen radicals

    Kobayashi Tsuyoshi, Iwata Natsumi, Oh Jun-Seok, Hahizume Hiroshi, Ohta Takayuki, Takeda Keigo, Ishikawa Kenji, Hori Masaru, Ito Masafumi

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 15 )   2017.4

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    DOI: 10.1088/1361-6463/aa61d7

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  137. Effects of center dot OH and center dot NO radicals in the aqueous phase on H2O2 and NO2- generated in plasma-activated medium

    Kurake Naoyuki, Tanaka Hiromasa, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Nakamura Kae, Kajiyama Hiroaki, Kondo Takashi, Kikkawa Fumitaka, Mizuno Masaaki, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 15 )   2017.3

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    DOI: 10.1088/1361-6463/aa5f1d

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  138. Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas

    Ohya Yoshinobu, Ishikawa Kenji, Komuro Tatsuya, Yamaguchi Tsuyoshi, Takeda Keigo, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 15 )   2017.3

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    DOI: 10.1088/1361-6463/aa60f7

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  139. Behavior of absolute densities of atomic oxygen in the gas phase near an object surface in an AC-excited atmospheric pressure He plasma jet

    Takeda Keigo, Kumakura Takumi, Ishikawa Kenji, Tanaka Hiromasa, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS EXPRESS   Vol. 10 ( 3 )   2017.3

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    DOI: 10.7567/APEX.10.036201

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  140. Characteristics of optical emissions of arc plasma processing for high-rate synthesis of highly crystalline single-walled carbon nanotubes

    Ando Atsushi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Suzuki Tomoko, Inoue Sakae, Ando Yoshinori, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 3 )   2017.3

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    DOI: 10.7567/JJAP.56.035101

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  141. Fabrication of superconductor-ferromagnet-insulator-superconductor Josephson junctions with critical current uniformity applicable to integrated circuits

    Ito Hiroshi, Taniguchi Soya, Ishikawa Kouta, Akaike Hiroyuki, Fujimaki Akira

    APPLIED PHYSICS EXPRESS   Vol. 10 ( 3 )   2017.3

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    DOI: 10.7567/APEX.10.033101

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  142. Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl-2 plasma etching of GaN

    Liu Zecheng, Pan Jialin, Asano Atsuki, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 2 )   2017.2

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    DOI: 10.7567/JJAP.56.026502

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  143. Absolute density of precursor SiH3 radicals and H atoms in H-2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

    Abe Yusuke, Ishikawa Kenji, Takeda Keigo, Tsutsumi Takayoshi, Fukushima Atsushi, Kondo Hiroki, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS LETTERS   Vol. 110 ( 4 )   2017.1

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    DOI: 10.1063/1.4974821

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  144. Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication

    Shinoda K., Miyoshi N., Kobayashi H., Kurihara M., Izawa M., Ishikawa K., Hori M.

    ATOMIC LAYER DEPOSITION APPLICATIONS 13   Vol. 80 ( 3 ) page: 3-14   2017

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    DOI: 10.1149/08003.0003ecst

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  145. TIME EVOLUTION OF REACTIVE OXYGEN NITROGEN SPECIES IN PLASMA-ACTIVATED ESSENTIAL MEDIA AND WATER Reviewed

    Brubaker Timothy, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

    2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS)     page: .   2017

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  146. Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas Reviewed

    Yoshinobu Ohya, Maju Tomura, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Journal of Vacuum Science and Technology A Letters   Vol. 34 ( 4 ) page: 040602   2016.5

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    DOI: 10.1116/1.4949570

  147. Effects of nitrogen on apoptosis and changes in gene expression in human lymphoma U937 cells exposed to argon-cold atmospheric pressure plasma Reviewed

    Yoshiaki Tabuchi, Hidefumi Uchiyama, Qing-li Zhao, Tatsuya Yunoki, Qabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori and Takashi Kondo

    International Journal of Molecular Medicine   Vol. 37   page: 1706-1714   2016.5

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    DOI: 10.3892/ijmm.2016.2574

  148. Red Blood Cell Coagulation Induced by Low-temperature Plasma Treatment Reviewed

    Kenji Miyamoto, Sanae Ikehara, Hikaru Takei, Yoshihiro Akimoto, Hajime Sakakita, Kenji Ishikawa, Masashi Ueda, Jun-ichiro Ikeda, Masahiro Yamagishi, Jaeho Kim, Takashi Yamaguchi, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara

    Archives of Biochemistry and Biophysics     2016.4

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    DOI: 10.1016/j.abb.2016.03.023

  149. Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

    Appl. Phys. Express   Vol. 7   page: 046201   2016.3

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    DOI: 10.7567/APEX.7.046201

  150. Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-injection Plasma-enhanced Chemical Vapor Deposition Reviewed

    Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    Plasma Process Polym.     2016.2

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    DOI: 10.1002/ppap.201500229

  151. Cell survival of glioblastoma grown in medium containing hydrogen peroxide and/or nitrite, or in plasma-activated medium Reviewed

    Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Takashi Kondo, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Masaru Hori

    Archives of Biochemistry and Biophysics     2016.1

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    DOI: 10.1016/j.abb.2016.01.011

  152. Cover Picture: Plasma Process. Polym. 12∕2015 (page 1329) Reviewed

    Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara and Shuichi Enomoto

    Plasma Processes and Polymers   Vol. 12 ( 12 ) page: 1329   2015.12

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    DOI: 10.1002/ppap.201570043

  153. Plasma Blood Coagulation Without Involving the Activation of Platelets and Coagulation Factors Reviewed

    Sanae Ikehara, Hajime Sakakita, Kenji Ishikawa, Yoshihiro Akimoto, Takashi Yamaguchi, Masahiro Yamagishi, Jaeho Kim, Masashi Ueda, Jun-ichiro Ikeda, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara

    Plasma Processes and Polymers   Vol. 12 ( 12 ) page: 1348–1353   2015.12

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    DOI: 10.1002/ppap.201500132

  154. Real-time temperature-monitoring of Si substrate during plasma processing and its heat-flux analysis Reviewed

    Takayoshi Tsutsumi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori

    Japan. J. Appl. Phys.   Vol. 55   page: 01AB04   2015.11

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    DOI: 10.7567/JJAP.55.01AB04

  155. Superhydrophilic glass membrane device with open-microhole array for filtering and counting rare tumor cells Reviewed

    Akihiro Yonese, Daisuke Onoshima, Hiroshi Yukawa, Kenji Ishikawa, Masaru Hori, and Yoshinobu Baba

    Micro Total Analysis Systems 2015     page: 493-495   2015.10

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  156. Histological and nuclear medical comparison of inflammation after haemostasis with non-thermal plasma and thermal coagulation Reviewed

    Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara, and Shuichi Enomoto

    Plasma Processes and Polymers   Vol. 12 ( 12 ) page: 1338–1342   2015.9

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    DOI: 10.1002/ppap.201500099

  157. Plasma with high electron density and plasma-activated medium for cancer treatment Reviewed

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroshi Hashizume, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinya Toyokuni, Shin’ichi Akiyama, Shoichi Maruyama, Suguru Yamada, Yasuhiro Kodera, Hiroki Kaneko, Hiroko Terasaki, Hirokazu Hara, Tetsuo Adachi, Machiko Iida, Ichiro Yajima, Masashi Kato, Fumitaka Kikkawa, and Masaru Hori

    Clinical Plasma Medicine   Vol. 3   page: 72-76   2015.9

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    DOI: 10.1016/j.cpme.2015.09.001

  158. EPR-Spin Trapping and Flow cytometric Studies of Free Radicals Generated using Cold Atmospheric Argon Plasma and X-ray irradiation in Aqueous Solutions and Intracellular Milieu Reviewed

    Hidefumi Uchiyama, Qing-Li Zhao, Mariame Ali Hassan, Gabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori, and Takashi Kondo

    PLoS One   Vol. 10 ( 8 ) page: e0136956   2015.8

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    DOI: 10.1371/journal.pone.0136956

  159. Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching Reviewed

    Takayoshi Tsutsumi, Yusuke Fukunaga, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori

    IEEE Trans Semiconductor manufacturing   Vol. 28 ( 4 ) page: 515-520   2015.8

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    DOI: 10.1109/TSM.2015.2470554

  160. Decreased expression levels of cell cycle regulators and matrix metalloproteinases in melanoma from RET-transgenic mice by single irradiation of non-equilibrium atmospheric pressure plasmas Reviewed

    Machiko Iida, Ichiro Yajima, Nobutaka Ohgami, Li Xiang, Cunchao Zou, Kenji Ishikawa, Masaru Hori, and Masashi Kato

    International Journal of Clinical and Experimental Pathology   Vol. 8 ( 8 ) page: 9326-9331   2015.8

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  161. Suppression of plasma-induced damage on GaN etched by a Cl2 plasma at high temperatures Reviewed

    Zecheng Liu, Jialin Pan, Takashi Kako Kenji Ishikawa, Osamu Oda, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Japan. J. Appl. Phys.   Vol. 54   page: 06GB04   2015.6

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    DOI: 10.7567/JJAP.54.06GB04

  162. Electronic properties of HBr, O2 and Cl2 used in Si etching Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Japan. J. Appl. Phys.   Vol. 54   page: 06GA03   2015.5

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    DOI: 10.7567/JJAP.54.06GA03

  163. Effect of gas residence time on near-edge X-ray absorption fine structures of hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition Reviewed

    Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

    Japan. J. Appl. Phys.   Vol. 55 ( 4 ) page: 040305   2015.3

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    DOI: 10.7567/JJAP.55.040305

  164. Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton Reviewed

    Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Japan. J. Appl. Phys.   Vol. 54 ( 4 ) page: 040303   2015.3

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    DOI: 10.7567/JJAP.54.040303

  165. Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF hybrid plasmas using a PECVD process Reviewed

    Bibhuti Bhusan Sahu, Jeon G. Han, Kyung-Sik Shin, Kenji Ishikawa, Masaru Hori, and Yudai Miyawaki

    Plasma Sources Sci. Technol.   Vol. 24 ( 2 ) page: 025019   2015.3

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    DOI: 10.1088/0963-0252/24/2/025019

  166. CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase Reviewed

    Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Japan. J. Appl. Phys.   Vol. 54 ( 4 ) page: 040301   2015.3

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    DOI: 10.7567/JJAP.54.040301

  167. Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals Reviewed

    Yu Arai, Yusuke Noto, Yousuke Goto, Seiji Takahashi, Masashi Yamamoto, Akihiko Kono, Tatsuo Ishijima, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

    Thin Solid Film   Vol. 575   page: 12-16   2015.2

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    DOI: 10.1016/j.tsf.2014.10.021

  168. Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer Reviewed

    Akihiko Kono, Yu Arai, Yousuke Goto, Masashi Yamamoto, Seiji Takahashi, Tadaaki Yamagishi, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

    Thin Solid Film   Vol. 575   page: 17-20   2015.2

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    DOI: 10.1016/j.tsf.2014.10.020

  169. Experimental evidence of warm electron populations in magnetron sputtering plasmas Reviewed

    B. B. Sahu, Jeon G. Han, Hye R. Kim, Kenji Ishikawa, and Masaru Hori

    J. Appl. Phys.   Vol. 117   page: 033301   2015.1

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    DOI: 10.1063/1.4905901

  170. Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: Generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions Reviewed

    Yusuke Kondo, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    J. Phys. D: Appl. Phys.   Vol. 48 ( 4 ) page: 045202   2015.1

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    DOI: 10.1088/0022-3727/48/4/045202

  171. Plasma Medical Science for Cancer Therapy: Toward Cancer Therapy Using Nonthermal Atmospheric Pressure Plasma Invited Reviewed

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinnya Toyokuni, Shoichi Maruyama, Fumitaka Kikkawa, and Masaru Hori

    IEEE Trans. on Plasma Sci.   Vol. 42 ( 12 ) page: 3760-3763   2014.12

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    DOI: 10.1109/TPS.2014.2353659

  172. Quantitative Clarification of Inactivation Mechanism of Penicillium digitatum Spores Treated with Neutral Oxygen Radicals Reviewed

    Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori, and Masafumi Ito

    Jpn. J. Appl. Phys.   Vol. 54   page: 01AG05   2014.11

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    DOI: 10.7567/JJAP.54.01AG05

  173. Robust characteristics of semiconductor-substrate temperature-measurement method using auto-correlation type frequency-domain low-coherence interferometry Reviewed

    Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito

    Jpn. J. Appl. Phys.   Vol. 54   page: 01AB03   2014.11

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    DOI: 10.7567/JJAP.54.01AB03

  174. Effectiveness of plasma diagnostic in ultra high frequency and radio frequency hybrid plasmas for synthesis of silicon nitride film at low temperature Reviewed

    Bibhuti Bhusan Sahu, Kyung-Sik Shin, Su-Bong Jin, Jeon G. Han, Kenji Ishikawa and Masaru Hori

    J. Appl. Phys.   Vol. 116   page: 134903   2014.10

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    DOI: 10.1063/1.4896833

  175. Recovery of Atom Density Drift Caused by Change in Reactor Wall Conditions by Real-time Autonomous Control Reviewed

    Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 47   page: 422002   2014.9

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    DOI: 10.1088/0022-3727/47/42/422002

  176. Diagnostics of plasma-biological surface interactions in low pressure and atmospheric pressure plasmas Invited Reviewed

    Kenji Ishikawa, and Masaru Hori

    International Journal of Modern Physics: Conference Series   Vol. 32   page: 1460318   2014.8

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    DOI: 10.1142/S2010194514603184

  177. Cell survival and proliferation signaling pathways are downregulated by plasma-activated medium in glioblastoma brain tumor cells Reviewed

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Shoichi Maruyama, Fumitaka Kikkawa, and Masaru Hori

    Plasma Medicine   Vol. 4   page: 1   2014.7

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  178. Temporal Changes of Absolute Densities of Atoms in H2 and N2 Mixture Gas Plasmas by Surface Modifications of Reactor Wall Reviewed

    Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 53   page: 050301   2014.4

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    DOI: 10.7567/JJAP.53.050301

  179. Epitaxial Growth of GaN by Radical-Enhanced Metalorganic Chemical Vapor Deposition (REMOCVD) in the Downflow of a Very High Frequency (VHF) N2/H2 Excited Plasma– Effect of TMG Flow Rate and VHF Power Reviewed

    Yi Lu, Hiroki Kondo, Kenji Ishikawa, Osamu Oda, Keigo Takeda, Makoto Sekine, Hiroshi Amano, and Masaru Hori

    J. Cryst. Growth   Vol. 391   page: 97-103   2014.4

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    DOI: 10.1016/j.jcrysgro.2014.01.014

  180. Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls Reviewed

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 53   page: 040307   2014.3

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    DOI: 10.7567/JJAP.53.040307

  181. Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution Reviewed

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 53   page: 040305   2014.3

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    DOI: 10.7567/JJAP.53.040305

  182. Spatial distribution of absolute atomic oxygen density of a non-equilibrium atmospheric pressure planar plasma jet Reviewed

    Fengdong Jia, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Jagath Kularatne, Hiroki Kondo, Makoto Sekine and Masaru Hori

    Plasma Source Sci Technol.   Vol. 23   page: 025004   2014.3

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    DOI: 10.1088/0963-0252/23/2/025004

  183. Chemical Reactions during Plasma-enhanced Atomic Layer Deposition of SiO2 Films employing aminosilane and O2/Ar plasma at 50 C Reviewed

    Lu Yi, Akiko Kobayashi, H. Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 53   2013.12

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    DOI: 10.7567/JJAP.53.

  184. Density Control of Carbon Nanowalls Grown by CH4/H2 plasma and Their Electrical Properties Reviewed

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

    Carbon   Vol. 66   2013.12

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    DOI: 10.1016/j.carbon.2013.11.014

  185. Effect of Indirect Nonequilibrium Atmospheric Pressure Plasma on Anti-proliferative Activity against Chronic Chemo-resistant Ovarian Cancer Cells in vitro and in vivo Reviewed

    Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, and Fumitaka Kikkawa

    PLOS One   Vol. 8   page: e81576   2013.12

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    DOI: 10.1371/journal.pone.0081576

  186. Oxidation mechanism of Penicillium digitatum spores through neutral oxygen radicals Reviewed

    Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Masafumi Ito

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 53   page: 010209   2013.12

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    DOI: 10.7567/JJAP.53.010209

  187. High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System Reviewed

    Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, and Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 52   page: 11NE01   2013.11

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    DOI: 10.7567/JJAP.52.11NE01

  188. Field emission of nano-organic-rods armored with metal nanoparticles Reviewed

    Toshiya Suzuki, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 52   page: 120203   2013.11

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    DOI: 10.7567/JJAP.52.120203

  189. Effect of gas flow on atomic radical transportation in AC Excited Non-equilibrium Atmospheric Pressure Plasma jet Reviewed

    Keigo Takeda, Masanori Kato, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Makoto Sekine, and Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 46   page: 464006   2013.10

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    DOI: 10.1088/0022-3727/46/46/464006

  190. Highly Precise and Rapid Measurements on Substrate Temperature Using Frequency Domain Low Coherence Interferometer Reviewed

    Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito

    APPLIED PHYSICS LETTERS   Vol. 101   page: 182102   2013.10

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    DOI: 10.1063/1.4827426

  191. Inactivation effects of neutral reactive-oxygen species on Penicillium digitatum spores using non-equilibrium atmospheric-pressure oxygen radical source Reviewed

    Hiroshi Hashizume, Takayuki Ohta, Jia Fengdong, Keigo Takeda,Kenji Ishikawa,Masaru Hori, and Masafumi Ito

    APPLIED PHYSICS LETTERS   Vol. 101   page: 53708   2013.10

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    DOI: 10.1063/1.4824892

  192. Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO -> F + FNO at an Elevated Temperature Reviewed

    Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    JOURNAL OF PHYSICAL CHEMISTRY C   Vol. 117 ( 40 ) page: 20810-20818   2013.9

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    DOI: 10.1021/jp4084794

  193. Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls Reviewed

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

    APPLIED PHYSICS EXPRESS   Vol. 6   page: 095201   2013.8

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    DOI: 10.7567/APEX.6.095201

  194. A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink Reviewed

    Hitoshi Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, Kenji Ishikawa, H. Kondo, M. Sekine, H. Toyoda, and M. Hori

    J. Phys.: Conf. Ser.   Vol. 441   page: 12019   2013.6

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    DOI: 10.1088/1742-6596/441/1/012019

  195. A novel fast and flexible technique of radical kinetic behavior investigation based on pallet for plasma evaluation structure and numerical analysis Reviewed

    Malinowski, Arkadiusz; Takeuchi, Takuya; Chen, Shang; Suzuki, Toshiya; Ishikawa, Kenji; Sekine, Makoto; Hori, Masaru; Lukasiak, Lidia; Jakubowski, Andrzej

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 46   page: 265201   2013.6

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    DOI: 10.1088/0022-3727/46/26/265201

  196. Surface morphology on high-temperature plasma-etched gallium nitride Reviewed

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Trans. Mater. Res. Soc. Jpn.   Vol. 38   page: 325   2013.6

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  197. Dissociations of C5F8 and C5HF7 in Etching Plasma Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 5   page: 05EB02   2013.5

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    DOI: 10.7567/JJAP.52.05EB02

  198. Wavelength dependence of photon-induced interface defects in hydrogenated silicon nitride/Si structure during plasma etching processes Reviewed

    Masanaga Fukasawa, Hiroyasu Matsugai, Takayoshi Honda, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Kazunori Nagahata, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 5   page: 05ED01   2013.5

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    DOI: 10.7567/JJAP.52.05ED01

  199. Surface analysis of gallium nitride (GaN) at elevated substrate temperature Reviewed

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    APPLIED PHYSICS EXPRESS   Vol. 6   page: 056201   2013.4

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    DOI: 10.7567/APEX.6.056201

  200. Supercritical Fluid Deposition of High-Density Nanoparticles of Photo-Catalytic TiO2 on Carbon Nanowalls Reviewed

    Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

    Appl. Phys. Express   Vol. 6   page: 045103   2013.4

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    DOI: 10.7567/APEX.6.045103

  201. A Room Temperature Si Etching in NO/F2 Gas Chemistry and Its Reaction Mechanism Reviewed

    Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    J. Phys. Chem. C   Vol. 117 ( 10 ) page: 5118–5125   2013.2

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    DOI: 10.1021/jp3119132

  202. Plasma-activated medium selectively kills glioblastoma brain tumor cells by downregulating a survival signaling molecule, AKT kinase Reviewed

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, and Masaru Hori

    Plasma Medicine   Vol. 3   page: 1   2013.2

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    DOI: 10.1615/PlasmaMed.2012006275

  203. Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma Reviewed

    Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

    J. Phys. D: Appl. Phys.   Vol. 46   page: 102001   2013.2

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    DOI: 10.1088/0022-3727/46/10/102001

  204. Etching-Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma Reviewed

    Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 52 ( 2 ) page: 1   2013.1

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  205. Impact of hydrogen radical injection plasma on fabrication of microcrystalline silicon thin film for solar cells Reviewed

    Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    J. Appl. Phys.   Vol. 113 ( 2 ) page: 033304   2013.1

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    DOI: 10.1063/1.4778608

  206. Highly selective etching of SiO2 over Si3N4 and Si in capacitivlly coupled plasma employing C5HF7 gas Reviewed

    Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 52 ( 1 ) page: 016201   2013.1

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    DOI: 10.7567/JJAP.52.016201

  207. Development of high-density nitrogen radical source for low mosaicity and high rate growth of InGaN films in molecular beam epitaxy Reviewed

    Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 52 ( 1 ) page: 021001   2013.1

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    DOI: 10.7567/JJAP.52.021001

  208. Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment Reviewed

    Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    J. Appl. Phys.   Vol. 113 ( 1 ) page: 014306   2013.1

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    DOI: 10.1063/1.4772996

  209. Surface loss probability of H radicals on silicon thin films in SiH4/H2 plasma Reviewed

    Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    J. Appl. Phys.   Vol. 113 ( 1 ) page: 013303   2013.1

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.4773104

  210. Individual roles for atoms and ions during hydrogen atom passivation of surface-defects on GaN created by plasma-etching Reviewed

    Shang Chen, Kenji Ishikawa, Yi Lu, Ryosuke Kometani, Hiroki Kondo, Yutaka Tokuda, Takashi Egawa, Hiroshi Amano, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 51 ( 11 ) page: 111002-1:6   2012.10

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    DOI: 10.1143/JJAP.51.111002

  211. Critical flux ratio of hydrogen radical to fi lm precursor in microcrystalline silicon deposition for solar cells Reviewed

    Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Appl. Phys. Lett.   Vol. 101 ( 17 ) page: 172109-1:4   2012.10

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    DOI: 10.1063/1.4764065

  212. Decomposition Removal of the Polymers for Resist Material by the Hydrogen Radical Generated Using Tungsten Hot-Wire Catalyzer Reviewed

    Yu Arai, Makoto Watanabe, Akihiko Kono, Tadaaki Yamagishi, Kenji Ishikawa, Masaru Hori, Hideo Horibe

    Kobunshi Ronbunshu   Vol. 69 ( 6 ) page: 266-273   2012.9

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  213. As-grown deep-level defects in n-GaN grown by metal-organic chemical vapor deposition on freestanding GaN Reviewed

    Shang Chen, Unhi Honda, Tatsunari Shibata, Toshiya Matumura, Yutaka Tokuda, Kenji Ishikawa, Masaru Hori, Hiroyuki Ueda, Tsutomu Uesugi, and Tetsu Kachi

    J. Appl. Phys.   Vol. 112 ( 5 ) page: 053513-1:4   2012.9

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    DOI: 10.1063/1.4748170

  214. Real-time In Situ Electron Spin Resonance Measurements on Fungal Spores of Penicillium digitatum during Exposure of Oxygen Plasmas Reviewed

    Kenji Ishikawa, Hiroko Moriyama, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Appl. Phys. Lett.   Vol. 101 ( 1 ) page: 013704-1:4   2012.7

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    DOI: 10.1063/1.4733387

  215. Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature Reviewed

    Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, and Masaru Hori

    AIP advance   Vol. 2 ( 2 ) page: 022149-1:6   2012.6

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    DOI: 10.1063/1.4729448

  216. Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma Reviewed

    Tatsuya Hagino, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Masaru Hori

    Appl. Phys. Express   Vol. 5 ( 3 ) page: 035101-1:3   2012.3

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    DOI: 10.1143/APEX.5.035101

  217. Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF3 into N2 Downflow Plasma Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

    Jpn. J. Appl. Phys.   Vol. 51 ( 2 ) page: 026505-1:5   2012.2

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    DOI: 10.1143/JJAP.51.026505

  218. Direct current superposed dual-frequency capacitively-coupled-plasma in selective etch of SiOCH over SiC Reviewed

    Tsuyoshi Yamaguchi, Tetsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    J. Phys. D: Appl. Phys.   Vol. 45 ( 2 ) page: 025203-1:7   2012.1

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    DOI: 10.1088/0022-3727/45/2/025203

  219. Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation Reviewed

    Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minami, Fumikatsu Uesawa, Masaru Hori, and Tetsuya Tatsumi

    Jpn. J. Appl. Phys.   Vol. 51 ( 2 ) page: 026201-1:7   2012.1

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    DOI: 10.1143/JJAP.51.026201

  220. Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature Reviewed

    Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

      Vol. 51 ( 1 ) page: 016202-1:6   2012.1

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    DOI: 10.1143/JJAP.51.016202

  221. Quantum Chemical Investigation for Chemical Dry Etching of SiO2 by Flowing NF3 into H2 Downflow Plasma Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

    Jpn. J. Appl. Phys.   Vol. 51 ( 1 ) page: 016201-1:6   2012.1

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    DOI: 10.1143/JJAP.51.016201

  222. Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas Reviewed

    Kenji Ishikawa, Hiroko Moriyama, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Hiromasa Tanaka, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori

    MRS Online Proceedings Library   Vol. 1469   2012

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    DOI: 10.1557/opl.2012.928

  223. Chemical Bond Modification in Porous SiOCH Films by H2 and H2/N2 Plasmas Investigated by in situ Infrared Reflection Absorption Spectroscopy (IR-RAS) Reviewed

    Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, and Masaru Hori

    J. Appl. Phys.   Vol. 111 ( 12 ) page: 1   2011.12

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  224. Inactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma Reviewed

    Sachiko Iseki, Hiroshi Hashizume, Fengdong Jia, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, and Masaru Hori

    Appl. Phys. Express   Vol. 4   page: 116201   2011.11

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    DOI: 10.1143/APEX.4.116201

  225. Impacts of CF+, CF2+, CF3+ and Ar Ion Beam Bombardment with energies from 100eV and 400eV on Surface Modification of Photoresist

    Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 50 ( 8 ) page: 08JE05-1:5   2011.8

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    DOI: 10.1143/JJAP.50.08JE05

  226. Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma Reviewed

    Masaki Minami, Shigetaka Tomiya, Kenji Ishikawa, Ryosuke Matsumoto, Shang Chen, Masanaga Fukasawa, Fumikatsu Uesawa, Makoto Sekine, Masaru Hori, and Tetsuya Tatsumi

    Jpn. J. Appl. Phys.   Vol. 50 ( 8 ) page: 08JE03-1:4   2011.8

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    DOI: 10.1143/JJAP.50.08JE03

  227. Spatial Distributions of Electron, CF, CF2 Radical Densities and Gas Temperature in dc-Superposed Dual- Frequency- Capacitively-Coupled Plasma Etch Reactor Employing c-C4F8/N2/Ar gas

    Tsuyoshi Yamaguchi, Tetsuya Kimura, Chishio Koshimizu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 50 ( 5 ) page: 0   2011.5

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    DOI: 10.1088/0022-3727/45/2/025203

  228. Synergistic Formation of Radicals with Irradiation with both Vacuum Ultraviolet and Atomic Hydrogen: a Real time in situ Electron-Spin-Resonance Study Reviewed

    Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    J. Phys. Chem. Lett.   Vol. 2   page: 1278-1281   2011.5

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    DOI: 10.1021/jz2002937

  229. H2/N2 Plasma Damage on Porous Dielectric SiOCH Film Evaluated by In-situ Film Characterization and Plasma Diagnostics Reviewed

    Hiroshi Yamamoto, Keigo Takeda, Kenji Ishikawa, Masafumi Ito, Makoto Sekine, Masaru Hori, Takeshi Kaminatsui, Hisataka Hayashi, Itsuko Sakai, and Tokuhisa Ohiwa

    J. Appl. Phys.   Vol. 109   page: 084112:1-8   2011.4

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    DOI: 10.1063/1.3562161

  230. Dissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

    Jpn. J. Appl. Phys.   Vol. 50   page: 036203:1-4   2011.3

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    DOI: 10.1143/JJAP.50.036203

  231. Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet Reviewed

    Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, and Masaru Hori

    Appl. Phys. Express   Vol. 4   page: 026101:1-3   2011.1

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    DOI: 10.1143/APEX.4.026101

  232. Behaviors of Absolute Densities of N, H and NH3 at Remote Region of High Density Radical Source Employing N2-H2 Mixture Plasmas Reviewed

    Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 50   page: 01AE03:1-4   2011.1

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    DOI: 10.1143/JJAP.50.01AE03

  233. Hydrophobic Treatment of Organics against Glass Employing nonequilibrium Atmospheric Pressure Pulsed Plasmas with a Mixture of CF4 and N2 Gases Reviewed

    Hirotoshi Inui, Keigo Takeda, Kenji Ishikawa, Takuya Yara, Tsuyoshi Uehara, Makoto Sekine and Masaru Hori

    J. Appl. Phys.   Vol. 109   page: 013310:1-6   2011.1

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    DOI: 10.1063/1.3525246

  234. Measurement of Hydrogen Radical Density and its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases

    Hirotoshi Inui, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Sekine Makoto, Hiroyuki Kano, Naofumi Yoshida, and Masaru Hori

    Appl. Phys. Express   Vol. 3   page: 126101:1-3   2010.12

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    DOI: 10.1143/APEX.3.126101

  235. Etching Damage in Diamond Studied Using an Energy-Controlled Oxygen Ion Beam Reviewed

    Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

    Jpn. J. Appl. Phys.   Vol. 46 ( 1 ) page: 60-64   2007.1

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    DOI: 10.1143/JJAP.46.60

  236. Defect creation in diamond by hydrogen plasma treatment at room temperature Reviewed

    Yuuichi Yamazaki, Kenji Ishikawa, Seiji Samukawa, and Satoshi Yamasaki

    Physica B   Vol. 376/377   page: 327-330   2006.6

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    DOI: 10.1016/j.physb.2005.12.084

  237. Structure of diamond surface defective layer damaged by hydrogen ion beam exposure Reviewed

    Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

    Diamond Related Mater.   Vol. 15 ( 4-8 ) page: 703-706   2006.5

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    DOI: 10.1016/j.diamond.2005.12.021

  238. Surface Reactions During Etching of Organic Low-k Films by Plasma of N2 and H2 Reviewed

    Kenji Ishikawa, Yoshikazu Yamaoka, Moritaka Nakamura, Yuichi Yamazaki, Satoshi Yamasaki, Yasushi Ishikawa, and Seiji Samukawa

    J. Appl. Phys.   Vol. 99 ( 8 ) page: 083305:1-6   2006.5

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    DOI: 10.1063/1.2191567

  239. Effcient Reduction of Standby Leakage Current in LSIs for Use in Mobile Devices Reviewed

    Hiroshi Kudo, Kenji Ishikawa, Yasuyoshi Mishima, et al.

    Jpn. J. Appl. Phys.   Vol. 45 ( 4B ) page: 3150-3153   2006.4

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    DOI: 10.1143/JJAP.45.3150

  240. 理想的な界面形成を追求 半導体のドライ洗浄技術 Invited

    石川健治、安立なつ美

    工業材料   Vol. 54   page: 1   2006

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  241. Structural change in diamond by hydrogen plasma treatment at room temperature Reviewed

    Yuuichi Yamazaki, Kenji Ishikawa, Norikazu Mizuochi, and Satoshi Yamasaki

    Diamond Related Mater.   Vol. 14 ( 11-12 ) page: 1939-1942   2005.10

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    DOI: 10.1016/j.diamond.2005.09.011

  242. In vacuo measurements of dangling bonds created during Ar-diluted fluorocarbon plasma etching of silicon dioxide films Reviewed

    Kenji Ishikawa, Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa, and Satoshi Yamasaki

    Appl. Phys. Lett.   Vol. 86   page: 264104:1-3   2005.6

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    DOI: 10.1063/1.1978982

  243. Mass-analyzed CFx+ (x=1,2,3) ion beam study on selectivity of SiO2-to-SiN etching and a-C:F film deposition Reviewed

    Ken-ichi Yanai, Kazuhiro Karahashi, Kenji Ishikawa, and Moritaka Nakamura

    J. Appl. Phys.   Vol. 97 ( 5 ) page: 053302:1-6   2005.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.1854726

  244. Etching yield of SiO2 irradiated by F+ CFx+ (x=1,2,3) ion with energies from 250 to 2000 eV Reviewed

    Kazuhiro Karahashi, Ken-ichi Yanai, Kenji Ishikawa, Hideo Tsuboi, Kazuaki Kurihara, and Moritaka Nakamura

    J. Vac. Sci. Technol. A   Vol. 22 ( 4 ) page: 1166   2004.6

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    DOI: 10.1116/1.1761119

  245. ドライ洗浄技術-半導体製造- Reviewed

    伊藤隆司、杉野林志、石川健治

    精密工学会誌   Vol. 70   page: 894   2004

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    DOI: 10.2493/jjspe.70.894

  246. Transitional change to amorphous fluorinated carbon film deposition under energetic irradiation of mass-analyzed carbon mono-fluoride ions on silicon dioxide surfaces Reviewed

    Kenji Ishikawa, Kazuhiro Karahashi, Hideo Tsuboi, Ken-ichi Yanai, and Moritaka Nakamura

    J. Vac. Sci. Technol. A   Vol. 21   page: L1-L3   2003.6

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    DOI: 10.1116/1.1578653

  247. Surface and gas-phase observations of Ar diluted c-C4F8 plasma by using real-time infrared spectroscopy and planar laser-induced fluorescence Reviewed

    Kenji Ishikawa, Shigenori Hayashi, and Makoto Sekine

    J. Appl. Phys.   Vol. 93 ( 3 ) page: 1403-1408   2003.2

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    DOI: 10.1063/1.1536740

  248. Vapor Treatment of Copper Surface Using Organic Acids Reviewed

    Kenji Ishikawa, Teruo Yagishita and Moritaka Nakamura

    MRS Proceedings   Vol. 766   2003

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    DOI: 10.1557/PROC-766-E3.28

  249. In-vacuo electron spin resonance study on amorphous fluorinated carbon films for understanding of surface chemical reactions in plasma etching Reviewed

    Kenji Ishikawa, Shoji Kobayashi, Mitsuru Okigawa, Makoto Sekine, Satoshi Yamasaki, Tetsuji Yasuda, and Junichi Isoya

    Appl. Phys. Lett.   Vol. 81 ( 10 ) page: 1773-1775   2002.9

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    DOI: 10.1063/1.1505121

  250. Planar laser-induced fluorescence of fluorocarbon radicals in oxide etch process plasma Reviewed

    Shigenori Hayashi, Kenji Ishikawa, and Makoto Sekine

    Jpn. J. Appl. Phys.   Vol. 41 ( 4A ) page: 2207-2212   2002.4

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    DOI: 10.1143/JJAP.41.2207

  251. Direct observation of surface dangling bonds during plasma process: chemical reactions during H2 and Ar plasma treatments Reviewed

    Satoshi Yamasaki, Ujjwal Das, and Kenji Ishikawa

    Thin Solid Films   Vol. 407 ( 1-2 ) page: 139-143   2002.2

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    DOI: 10.1016/S0040-6090(02)00028-7

  252. Early-stage modification of a silicon oxide surface in fluorocarbon plasma for selective etching over silicon Reviewed

    Kenji Ishikawa, and Makoto Sekine

    J. Appl. Phys.   Vol. 91 ( 3 ) page: 1661-1666   2002.2

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    DOI: 10.1063/1.1430882

  253. In-situ time-resolved infrared spectroscopic study of silicon-oxide surface during selective etching over silicon in fluorocarbon plasma Reviewed

    Kenji Ishikawa, and Makoto Sekine

    Jpn. J. Appl. Phys.   Vol. 39   page: 6990-6995   2000.12

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    DOI: 10.1143/JJAP.39.6990

  254. Asymmetric peak line shape on infrared dielectric function spectra of thermally grown silicon dioxide films Reviewed

    Kenji Ishikawa, Kunihiro Suzuki, and Shigeru Okamura

    J. Appl. Phys.   Vol. 88   page: 7150-7156   2000

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    DOI: 10.1063/1.1325377

  255. Thickness-deconvolved structural properties of thermally grown silicon dioxide films Reviewed

    Kenji Ishikawa, Hiroki Ogawa, and Shuzo Fujimura

    J. Appl. Phys.   Vol. 86   page: 3472-3474   1999

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    DOI: 10.1063/1.371232

  256. Contribution of interface roughness to infrared spectra of thermally grown silicon dioxide films Reviewed

    Kenji Ishikawa, Hiroki Ogawa, and Shuzo Fujimura

    J. Appl. Phys.   Vol. 85   page: 4076-4082   1999

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    DOI: 10.1063/1.370313

  257. Analysis of native oxide growth process on an atomically flattened and hydrogen terminated Si(111) surface in pure water using fourier transformed infrared reflection absorption spectroscopy Reviewed

    Shuzo Fujimura, Kenji Ishikawa, and Hiroki Ogawa

    J. Vac. Sci. Technol. A   Vol. 16 ( 1 ) page: 375-381   1998.1

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    DOI: 10.1116/1.581008

  258. Dependence of TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature Reviewed

    Kenji Ishikawa, Yuji Uchiyama, Hiroki Ogawa, and Shuzo Fujimura

    Appl. Surf. Sci.   Vol. 117/118   page: 212-215   1997.6

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    DOI: 10.1016/S0169-4332(97)80081-5

  259. Infrared spectroscopy study of the RCA standard clean chemical oxides and their sequencing Reviewed

    Carlos Inomata, Hiroki Ogawa, Kenji Ishikawa, and Shuzo Fujimura

    J. Electrochem. Soc.   Vol. 143 ( 9 ) page: 2995-3000   1996.9

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    DOI: 10.1149/1.1837138

  260. Initial stage of native oxide growth on hydrogen terminated silicon (111) surfaces Reviewed

    Hiroki Ogawa, Kenji Ishikawa, Carlos Inomata, and Shuzo Fujimura

    J. Appl. Phys.   Vol. 79 ( 1 ) page: 472-477   1996.1

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    DOI: 10.1063/1.360853

  261. Observation of Oxygen Exposed Hydrogen Terminated Silicon Surface Reviewed

    Hiroki Ogawa, Kenji Ishikawa, M. Aoki, Shuzo Fujimura, N. Ueno, Yasuhiro Horiike, Y. Harada

    The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 3, edited by H.Z. Massoud, E.H. Poindexter, and C.R. Helms, (The Electrochemical Society, NJ)     page: 428   1996

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  262. Effects of Dissolved Oxygen in HF Solution on Silicon Surface Morphology Reviewed

    Hiroki Ogawa, Kenji Ishikawa, Miki T. Suzuki, Yuka Hayami, and Shuzo Fujimura

    Jpn. J. Appl. Phys.   Vol. 34 ( 2B ) page: 732-736   1995.2

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    DOI: 10.1143/JJAP.34.732

  263. FT-IR-RAS analysis of the structure of the SiO2/Si interface Reviewed

    Kenji Ishikawa, Hiroki Ogawa, Carlos Inomata, Shuzo Fujimura, and Haruhisa Mori

    Control of Semiconductor Interfaces, edited by I. Ohdomari, M. Oshima and A. Hiraki, (Elsevier Science B.V.)     page: 447   1994

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  264. Native Oxide Characterization on Silicon Surfaces Reviewed

    Hiroki Ogawa, Carlos Inomata, Kenji Ishikawa, Shuzo Fujimura, and Haruhisa Mori

    Control of Semiconductor Interfaces, edited by I. Ohdomari, M. Oshima and A. Hiraki, (Elsevier Science B.V.)     page: 383   1994

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  265. Observation of Thin SiO2 Films using IR-RAS Reviewed

    Shuzo Fujimura, Kenji Ishikawa, and Haruhisa Mori

    The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2, edited by C. R. Helms and B. E. Deal, (Plenum Press)     page: 91   1993

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  266. New Analytical Method of SiO2 Structure by Infrared Reflection Absorption Spectroscopy (IR-RAS) Reviewed

    Kenji Ishikawa, Hiroki Ogawa, Carlos Inomata, Shuzo Fujimura and Haruhisa Mori

    MRS Proceedings   Vol. 318   page: 425-431   1993

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    DOI: 10.1557/PROC-318-425

▼display all

Books 10

  1. Chapter 2. Physical and chemical basis of non-thermal plasma. In: "Plasma Medical Science"

    Kenji Ishikawa( Role: Contributor ,  Chapter 2-1, 2-4, 2-5, 2-6, and 2-8. )

    Academic Press  2018.7  ( ISBN:9780128150054

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    Total pages:485   Language:English Book type:Scholarly book

    Plasma Medical Science describes the progress that has been made in the field over the past five years, illustrating what readers must know to be successful. As non-thermal, atmospheric pressure plasma has been applied for a wide variety of medical fields, including wound healing, blood coagulation, and cancer therapy, this book is a timely resource on the topics discussed.

    Other Link: https://www.amazon.co.jp/gp/product/0128150041

  2. Chapter 5. "Plasma Diagnostics" In: "Cold Plasma in Food and Agriculture, Fundamentals and Applications"

    Kenji Ishikawa( Role: Contributor)

    Academic Press  2016.8  ( ISBN: 9780128013656

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    Language:Japanese

    Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications.

    Other Link: https://www.amazon.co.jp/gp/product/0128013656

  3. 7.2節 表面計測法 In: プラズマプロセス技術

    石川健治,堀勝( Role: Contributor)

    森北出版  2016.5  ( ISBN:978-4-627-77561-9

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    Language:Japanese

    Other Link: https://www.amazon.co.jp/gp/product/462777561X

  4. 化学便覧 応用化学編 第7版 7.5.2「ドライエッチング」

    堀勝、石川健治( Role: Sole author)

    丸善  2014.1  ( ISBN:978-4-621-08759-6

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    Language:Japanese

  5. ArFフォトレジストのプラズマエッチング技術

    石川健治,堀勝( Role: Joint author)

    技術情報協会  2013.7 

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    Language:Japanese

  6. ドライエッチング In: 「ドライプロセスによる表面処理・薄膜形成(表面技術協会編)」

    石川健治,堀勝( Role: Joint author)

    丸善  2013.5  ( ISBN:978-4-339-04631-1

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    Language:Japanese

    Other Link: https://www.amazon.co.jp/gp/product/4339046310

  7. 層間絶縁膜の成膜とエッチング

    石川健治,堀勝( Role: Joint author)

    エヌティエス出版  2012.7  ( ISBN:978-4-86469-039-3

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    Language:Japanese

  8. エッチング工程の手法およびレジスト・レジストパターンへの影響

    石川健治,堀勝( Role: Joint author)

    情報機構  2011.9  ( ISBN:978-4-904080-90-0

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    Language:Japanese

  9. 半導体プロセス洗浄方法とその効果

    石川健治( Role: Joint author)

    有機汚染物質/アウトガスの発生メカニズムとトラブル対策事例集(技術情報協会)  2008 

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    Language:Japanese

  10. シリコン基板の洗浄

    石川健治( Role: Joint author)

    エレクトロニクス洗浄技術(技術情報協会)  2007 

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▼display all

Presentations 221

  1. ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析

    近藤 博基、尾崎 敦士、堤 隆嘉、関根 誠、石川 健治、堀 勝、平松 美根男

    第69回応用物理学会春季学術講演会 24p-D114-6  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  2. 稲穂への低温プラズマ照射がもたらす酒造品種玄米の品質向上

    橋爪 博司、北野 英己、水野 寛子、阿部 明子、三田 薫、蕭 世男、湯浅 元気、東野 里江、田中 宏昌、石川 健治、松本 省吾、榊原 均、仁川 進、前島 正義、水野 正明、堀 勝

    第69回応用物理学会春季学術講演会 25p-E105-13  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  3. 網羅的解析に基づくプラズマ活性溶液による細胞死の機構解明

    田中 宏昌、水野 正明、石川 健治、橋爪 博司、中村 香江、梶山 広明、吉川 史隆、岡崎 康昌、豊國 伸哉、堀 勝

    第69回応用物理学会春季学術講演会 25a-E105-8  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  4. プラズマ照射乳酸リンゲル液の抗腫瘍成分の評価

    伊藤 大貴、岩田 直幸、石川 健治、橋爪 博司、中村 香江、ミロン カメリア、田中 宏昌、梶山 広明、豊國 伸哉、水野 正明、堀 勝

    第69回応用物理学会春季学術講演会 25a-E105-7  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  5. 流液への照射によるプラズマ活性溶液の作製と短寿命活性種の測定

    柏倉 慧史、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、堀 勝

    第69回応用物理学会春季学術講演会 25a-E105-6  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  6. 中性酸素ラジカル源を用いたポリエチレンテレフタレートの生分解速度の向上

    五藤 大智、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、伊藤 昌文、堀 勝

    第69回応用物理学会春季学術講演会 25a-E105-1  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  7. C3H6/H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係

    黒川 純平、光成 正、近藤 博基、堤 隆嘉、関根 誠、石川 健治、堀 勝

    第69回応用物理学会春季学術講演会 25p-E104-13  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  8. C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響

    吉江 泰斗、堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝

    第69回応用物理学会春季学術講演会 25a-E104-7  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  9. Ar/F2プラズマとBCl3の交互供給によるAlGaN原子層エッチングでの組成比制御

    中村 昭平、谷出 敦、木村 貴弘、灘原 壮一、石川 健治、小田 修、堀 勝

    第69回応用物理学会春季学術講演会 25a-E104-5  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  10. 窒化ガリウムの基板昇温時サイクルエッチング特性

    南 吏玖、中村 昭平、谷出 敦、石川 健治、堤 隆嘉、近藤 博基、関根 誠、堀 勝

    第69回応用物理学会春季学術講演会 25a-E104-4  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  11. プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果

    射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

    第69回応用物理学会春季学術講演会 24p-D114-8  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  12. 高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの表面電位制御

    橋本 拓海、近藤 博基、田中 宏昌、石川 健治、堤 隆嘉、関根 誠、安井 隆雄、馬場 嘉信、平松 美根男、堀 勝

    第69回応用物理学会春季学術講演会 24p-D114-7  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ハイブリッド,青山学院大学相模原キャンパス  

  13. Stable production of high-quality strawberry fruits with cold plasma treatment during cultivation

    2022.1.24 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

  14. Morphological control of carbon nanowalls grown by a radical injection plasma enhanced chemical vapor deposition using C2F6/H2 mixture gas

    2022.1.24 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

  15. Deposition of nanographene on ethanol-immersed metal substrates by in-liquid plasma process

    2022.1.24 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

  16. Effect of morphology and heights of carbon nanowalls on their optical transmittance

    2022.1.24 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

  17. Biodegradation of polyethylene terephthalate treated neutral oxygen radical

    2022.1.24 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

  18. Molecular mechanisms of cancer cell death by plasma-activated Ringer's lactate solution

    2022.1.24 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

  19. Functional nitrogen science for plasma-processing in life and matter Invited International conference

    Kenji Ishikawa, Toshiro Kaneko, and Masaru Hori

    2021.12.12  Material Research Society of Japan

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    Event date: 2021.12

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  20. Optical transmission of carbon nanowalls from ultra-violet region to infra-red region International conference

    Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

    Material Research Meeting (MRM 2020)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  21. Enhancement of biodegradation technology of polyethylene terephthalate with plasma-pretreatment International conference

    Daichi Goto, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Masafumi Ito, and Masaru Hori

    31st Material Research Society in Japan (MRS-J)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  22. Plasma-biological reaction networks and aqueous radical chemistry Invited International conference

    Kenji Ishkawa, Camelia Miron, Takashi Kondo, Hiromasa Tanaka, and Masaru Hori

    31st Material Research Society in Japan (MRS-J)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (invited, special)  

    Venue:Yokohama   Country:Japan  

  23. Cellular Respiration System Affected by Low-temperature Plasma International conference

    Hiromasa Tanaka, Shogo Maeda, Shogo Matsumura, Masaaki Mizuno, Kenji Ishikawa, Masafumi Ito, Hiroshi Hashizume, Mikako Ito, Kinji Ohno, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Yasumasa Okazaki, Shinya Toyokuni, and Masaru Hori

    31st Material Research Society in Japan (MRS-J)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  24. Effects of cold plasma treatment with rice seedlings in a paddy on yield and grain quality for different cultivars International conference

    Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Kaoru Sanda, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori

    31st Material Research Society in Japan (MRS-J)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  25. Anti-tumor effect of plasma-activated solution produced by the flowing system International conference

    Satoshi Kashiwagura, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Camelia Miron, Kae Nakamura, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori

    31st Material Research Society in Japan (MRS-J)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  26. Production of plasma-activated Ringer's lactate solution with regulated surrounding atmosphere International conference

    Daiki Ito, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Kae Nakamura, Camelia Miron, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori

    31st Material Research Society in Japan (MRS-J)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  27. Growth promotion of cultured feed Artemia irradiated with low-temperature plasma International conference

    Takumi Yamauchi, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Shin'ichi Akiyama, and Masaru Hori

    31st Material Research Society in Japan (MRS-J)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  28. Rebound Tailing Pulse method for water reformation International conference

    Naohiro Shimizu, Ranjit Borude, Reiko Tanaka, Kenji Ishikawa, Osamu Oda, Hiroki Hosoe, Satoru Ino, Yosuke Inoue, and Masaru Hori

    31st Material Research Society in Japan (MRS-J)  2021.12.12 

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    Event date: 2021.12

    Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  29. Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches International conference

    Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori

    42nd International Symposium on Dry Process (DPS)  2021.11.18 

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    Event date: 2021.11

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  30. Atomic layer etching of GaN using F2-added Ar plasma removal of BCl3 modified layer at high temperature International conference

    Shohei Nakamura Atsushi Tanide, Takahiro Kimura, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori

    42nd International Symposium on Dry Process (DPS)  2021.11.18 

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    Event date: 2021.11

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  31. Random forest model for property control of plasma deposited hydrogenated amorphous carbon films International conference

    Junpei Kurokawa, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    42nd International Symposium on Dry Process (DPS)  2021.11.18 

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    Event date: 2021.11

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  32. Toward plasma cancer therapy and intracellular metabolic modifications by treatments using low-temperature plasma-activated solutions Invited International conference

    Kenji Ishkawa, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori

    30th International Toki Conference on Plasma and Fusion Research  2021.11.15 

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    Event date: 2021.11

    Presentation type:Oral presentation (invited, special)  

    Venue:online   Country:Japan  

  33. Floating wire assisted plasma with vapor injection of liquid mixtures for etching titanium compounds International conference

    Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori

    67th AVS International Symposium and Exhibition  2021.10.24 

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    Event date: 2021.10

    Presentation type:Oral presentation (general)  

    Venue:online   Country:United States  

  34. In-situ analysis of surface reactions for plasma-assisted thermal-cyclic atomic layer etching of tantalum nitride International conference

    Kazunori Shinoda, M. Hasegawa, H. Hamamura, K. Maeda, K. Yokogawa, M. Izawa, Kenji Ishikawa, and Masaru Hori

    67th AVS International Symposium and Exhibition  2021.10.24 

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    Event date: 2021.10

    Presentation type:Oral presentation (general)  

    Venue:online   Country:United States  

  35. 原子層エッチングの反応素過程とその設計、制御 Invited

    石川 健治, Nguyen Thi-Thuy-Nga, 堤 隆嘉, 蕭 世男, 近藤 博基, 関根 誠, 堀 勝

    第82回応用物理学会秋季学術講演会 11a-S301-5  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  36. 酸素ラジカル照射したL-トリプトファン溶液の殺菌効果 Invited

    岩田 直幸, 石川 健治, 橋爪 博司, 田中 宏昌, 伊藤 昌文, 堀 勝

    第82回応用物理学会秋季学術講演会 12p-N204-6  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  37. 流液への照射によるプラズマ活性溶液の大量作製と抗腫瘍効果の評価 Invited

    柏倉 慧史, 岩田 直幸, 石川 健治, 橋爪 博司, カメリア ミロン, 中村 香江, 田中 宏昌, 梶山 広明, 豊國 伸哉, 水野 正明, 堀勝

    第82回応用物理学会秋季学術講演会 12p-N204-4  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  38. Arパージ下でプラズマ照射した乳酸リンゲル液の抗腫瘍効果の評価 Invited

    伊藤 大貴, 岩田 直幸, 石川 健治, 橋爪 博司, 中村 香江, ミロン カメリア, 田中 宏昌, 梶山 広明, 豊國 伸哉, 水野正明, 堀勝

    第82回応用物理学会秋季学術講演会 12p-N204-3  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  39. プラズマ活性溶液及びプラズマ照射が細胞呼吸に与える影響 Invited

    田中 宏昌, 前田 昌吾, 松村 翔伍, 水野 正明, 石川 健治, 伊藤 昌文, 橋爪 博司, 伊藤 美佳⼦, 大野 欽司, 中村 香江, 梶山広明, 吉川史隆, 岡崎泰昌, 豊國伸哉, 堀勝

    第82回応用物理学会秋季学術講演会 12p-N204-2  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  40. ポリエチレンテレフタラートの新しい生分解プラズマ技術の開発 Invited

    五藤 大智, 岩田 直幸, 石川 健治, 橋爪 博司, 田中 宏昌, 伊藤 昌文, 堀 勝

    第82回応用物理学会秋季学術講演会 12p-N204-1  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  41. Ar/C4F8/SF6を⽤いたガス変調サイクルプロセスにおける活性種の挙動 Invited

    吉江 泰斗, 堤 隆嘉, 石川 健治, 堀 勝

    第82回応用物理学会秋季学術講演会 12a-N102-3  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  42. 窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測 Invited

    南 吏玖, 石川 健治, 堤 隆嘉, 近藤 博基, 関根 誠, ⼩田 修, 堀 勝

    第82回応用物理学会秋季学術講演会 12a-N102-2  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  43. CNW細胞培養基板上のSiCコートが細胞増殖に与える影響 Invited

    ⼩野 浩毅, ⼩出 崇史, 石川 健治, 田中 宏昌, 近藤 博基, 鳴瀧 彩絵, ⾦ 勇, 安原 重雄, 堀 勝, 竹内 和歌奈

    第82回応用物理学会秋季学術講演会 13p-N107-1  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  44. カーボンナノウォールの光透過率に対する壁密度および高さの効果 Invited

    射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

    第82回応用物理学会秋季学術講演会 13a-N323-8  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  45. C3H6/H2プラズマを⽤いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響 Invited

    ⿊川 純平, 光成 正, 堤 隆嘉, 近藤 博基, 関根 誠, 石川 健治, 堀 勝

    第82回応用物理学会秋季学術講演会 13p-N107-1  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  46. 低温プラズマ照射した養殖餌料アルテミアの成⻑促進 Invited

    山内 拓海, 石川 健治, 田中 宏昌, 秋山 真⼀, 橋爪 博司, 堀 勝

    第82回応用物理学会秋季学術講演会 13p-N107-15  2021.9.10 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン  

  47. Low-temperature plasma-activated solutions and metabolic modification Invited International conference

    Kenji Ishkawa, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori

    5th Asia Pacific Conference on Plasma Physics, Division of Plasma Physics, Association of Asia-Pacific Physical Societies (AAPPS-DPP2021)  2021.9.26 

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    Event date: 2021.9 - 2021.10

    Presentation type:Oral presentation (invited, special)  

    Venue:online   Country:Japan  

  48. High ionization of analytes for oxygen doped carbon nanowall in surface-assisted laser desorption ionization mass spectrometry (SALDI-MS) International conference

    Kenji Ishikawa, Ryusei Sakai, Tomonori Ichikawa, Hiroki Kondo, Takayuki Ohta, Mineo Hiramatsu, and Masaru Hori

    20th Interfinish World Congress (INTERFINISH2020)  2021.9.6 

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    Event date: 2021.9

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  49. Improvement of Hydrophilic Treatment of Atmospheric Pressure Plasma and its Oxygen Radical Densities International conference

    Seigo Takashima, Takahiro Jindo, Kenji Ishikawa, and Masaru Hori

    20th Interfinish World Congress (INTERFINISH2020)  2021.9.6 

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    Event date: 2021.9

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  50. Epitaxial growth of InN film on GaN template by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) International conference

    Frank Wilson Amalraj, Arun Kumar Dhasiyan, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, and Masaru Hori

    20th Interfinish World Congress (INTERFINISH2020)  2021.9.6 

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    Event date: 2021.9

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  51. Deformation properties of carbon nanowalls analyzed by nanoindentation International conference

    Swapnil Ghodke, Motoyuki Murashima, Dennis Christy, Ngo Van Nong, Osamu Oda, Noritsugu Umehara, Kenji Ishikawa, and Masaru Hori

    20th Interfinish World Congress (INTERFINISH2020)  2021.9.6 

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    Event date: 2021.9

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  52. Nanosecond high-voltage pulse imposed chemical vapor deposition (ns HV CVD) of sparsely isolated carbon nanowalls International conference

    Tomonori Ichikawa, Kenji Ishikawa, Naohiro Shimizu, and Masaru Hori

    20th Interfinish World Congress (INTERFINISH2020)  2021.9.6 

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    Event date: 2021.9

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  53. Development of the nanocarbon coating process on metal surfaces via in-liquid plasma International conference

    Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    20th Interfinish World Congress (INTERFINISH2020)  2021.9.6 

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    Event date: 2021.9

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  54. Development of new biodegradation technology by surface modification of polyethylene terephthalate using atmospheric pressure plasma International conference

    Daichi Goto, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Masafumi Ito, and Masaru Hori

    20th Interfinish World Congress (INTERFINISH2020)  2021.9.6 

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    Event date: 2021.9

    Presentation type:Oral presentation (general)  

    Venue:online   Country:Japan  

  55. Cell Death Mechanisms by Plasma Activated Medium and Plasma Activated Ringer’s Lactate Solution International conference

    Masaru Hori, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Yasumasa Okazaki, Shinya Toyokuni, and Fumitaka Kikkawa

    8th International Conference on Plasma Medicine (ICPM8)  2021.8.2 

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    Event date: 2021.8

    Presentation type:Oral presentation (invited, special)  

    Venue:online  

  56. Efficacy for Rice Plant Growth with Plasma Irradiation to Seeds International conference

    Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori

    8th International Conference on Plasma Medicine (ICPM8)  2021.8.2 

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    Event date: 2021.8

    Presentation type:Oral presentation (general)  

    Venue:online  

  57. Dynamical Changes in Free-radical Signals of Seeds during Water Imbibition and Seed Germination: Analysis of Plasma-Irradiation Effects Using an Electron Spin Resonance (ESR) Technique International conference

    Kenji Ishikawa, Ryo Arita, Takamasa Okumura, Pankaj Attri, Kazunori Koga, Ryoya Sato, Hayate Tanaka, Masaya Hiromatsu, Kayo Matsuo, Daisuke Yamashita, Kunihiro Kamataki, Naho Itagaki, Masaru Hori, and Masaharu Shiratani

    8th International Conference on Plasma Medicine (ICPM8)  2021.8.2 

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    Event date: 2021.8

    Presentation type:Oral presentation (general)  

    Venue:online  

  58. Analysis of Cellular Respiration in Plasma-activated Solutions-treated Cancer Cells International conference

    Hiromasa Tanaka, Shogo Maeda, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Yasumasa Okazaki, Shinaya Toyokuni, M. Ito, K. Ohno, Fumitaka Kikkawa, and Masaru Hori

    8th International Conference on Plasma Medicine (ICPM8)  2021.8.2 

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    Event date: 2021.8

    Presentation type:Oral presentation (general)  

    Venue:online  

  59. Numerical analysis of high-electron-density atmospheric pressure argon streamer under pin-to-plane electrode geometry: Effects of applying voltage polarity International conference

    Yosuke Sato, Kenji Ishikawa, Takayoshi Tsutsumi, A. Ui, M. Akita, S. Oka, and Masaru Hori

    47th Conference on Plasma Physics (EPS47)  2021.6.21 

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    Event date: 2021.6

    Presentation type:Oral presentation (general)  

    Venue:online  

  60. Dependency of bactericidal effect in oxygen-radical exposed E. coli suspension containing L-tryptophan on its concentration International conference

    Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Jun-Seok Oh, Masafumi Ito and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  61. Effects of non-equilibrium atmospheric pressure plasma on aquaculture feed International conference

    Takumi Yamauchi, Kenji Ishikawa, Hiromasa Tanaka, Shin'ichi Akiyama, Hiroshi Hashizume and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  62. Efficacy of plasma treatment in a paddy field for yield and grain quality of rice International conference

    Kaoru Sanda, Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  63. Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activated lactated solutions International conference

    Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  64. Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas International conference

    Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  65. Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma International conference

    Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka, Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  66. Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer International conference

    Masahiro Hazumi, Suganthamalar Selvaraj, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  67. Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface International conference

    Suganthamalar Selvaraj, Masahiro Hazumi, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  68. Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 International conference

    Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  69. Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching International conference

    Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  70. Atomic Layer Etching of GaN Using Cl2/Ar Plasma at 400℃ International conference

    Shohei Nakamura, Atsushi Tanide, Takahiro Kimura, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  71. Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry International conference

    Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  72. IR spectra of monosaccharide treated with atmospheric pressure plasma using sum frequency generation spectroscopy International conference

    Yuta Yoshida, Takayuki Ohta, Kenji Ishikawa, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  73. Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment International conference

    B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, Makoto Sekine, Kenji Ishikawa, H. Tanaka,T. Gohira, Y. Ohya, Noriyasu Ohno, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  74. Selective killing effects of organics in plasma-activated Ringer's solutions International conference

    Yuki Suda, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  75. Reversible change in surface morphology of lipid bilayer induced by indirect plasma irradiation International conference

    Hiroki Kondo, Takuya Tonami, Sotaro Yamaoka, Hiromasa Tanaka, Kenji Ishikawa, Makoto Sekine, Masafumi Ito and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  76. Enhancement of alcohol production of budding yeast by direct irradiation of nonequilibrium atmospheric pressure plasma International conference

    Shogo Matsumura, Kenji Ishikawa, Hiromasa Tanaka, Hiroshi Hashizume, Masafumi Ito, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  77. Effect of wall-to-wall distance of carbon nanowalls on survival yield in surface assisted laser desorption/ionization mass spectrometry International conference

    Ryusei Sakai, Hiroki Kondo, Kenji Ishikawa, Takayuki Ohta, Mineo Hiramatsu, Naohiro Shimizu, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  78. Quality increase of fruits with plasma treatment on strawberry cultivation International conference

    Hiroshi Hashizume, Shogo Matsumoto, Kenki Tsubota, Kaoru Sanda, Hiroko Mizuno, Akiko Abe, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Masafumi Ito, Hidemi Kitano, Hitoshi Sakakibara, Susumu Nikawa, Takayuki Okuma, Masayoshi Maeshima,Masaaki Mizuno, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  79. Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure International conference

    Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  80. Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls International conference

    Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  81. A comparative study on inn growth at very high frequencies (VHF) by radical enhanced metalorganic chemical vapor deposition (REMOCVD) International conference

    Frank Wilson Amalraj, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, and Masaru Hori

    13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021)  2021.3.8 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  82. Plasma applications for agriculture from seeds to field International conference

    Hiroshi Hashizume, Hiroko Mizuno, Akiko Abe, Kenki Tsubota, Genki Yuasa, Satoe Tohno, Mikiko Kojima, Yumiko Takebayashi, Hiromasa Tanaka, Kenji Ishikawa, Masafumi Ito, Hidemi Kitano, Shogo Matsumoto, Hitoshi Sakakibara, Takayuki Okuma, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori

    3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021  2021.3.1 

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    Event date: 2021.3

    Country:Germany  

  83. Roles of seed pigments in responses of seeds to plasma treatment International conference

    Kazunori Koga, Pankaj Attri, Ryo Arita, Ryoya Sato, Hayate Tanaka, Masaya Hiromatsu, Kayo Matsuo, Daisuke Yamashita, Kenji Ishikawa, Naho Itagaki, Kunihiro Kamataki, Masaharu Shiratani, and Vida Mildaziene

    3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021  2021.3.1 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Germany  

  84. Electron spin resonace study on germination dynamics of plasma-activated seeds of radish sprouts International conference

    Kenji Ishikawa, Ryo Arita, Ryoya Sato, Hayate Tanaka, Masaya Hiromatsu, Tomoaki Yoshida, Pankaj Attri, Kunihiro Kamataki, Naho Itagaki, Daisuke Yamashita, Kayo Matsuo, Kazunori Koga, and Masaharu Shiratani

    3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021  2021.3.1 

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    Event date: 2021.3

    Presentation type:Oral presentation (general)  

    Country:Germany  

  85. (Plenary) Plasma-surface interactions in plasma etching of future device fabrication International conference

    Kenji Ishikawa, Y. Miyawaki, T. Takeuchi, K. Takeda, S. Tajima, H. Kondo, T. Hayashi, M. Sekine, and M. Hori

    The 16th International Workshop on Advanced Plasma Processing and Diagnostics 

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    Event date: 2013.1

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  86. Plasma-Biological Surface Interaction for Food Hygiene: Real-time in situ electron spin resonance measurements International conference

    Kenji Ishikawa, H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, and M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  87. A High Temperature Plasma Etching of GaN and Its Reaction Mechanism International conference

    R. Kometani, S. Chen, M. Liu, Kenji Ishikawa, H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, and M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  88. Studies on Plasma Etching of Si3N4 in Capacitively Coupled Plasma employing C5HF7 International conference

    Y. Miyawaki, Y. Kondo, M. Sekine, Kenji Ishikawa, T. Hayashi, K. Takeda, A. Ito, H. Matsumoto, and M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  89. A reduction of degradation on ArF photoresist by C5HF7 plasma etching and its mechanism International conference

    K. Asano, Y. Miyawaki, Kenji Ishikawa, M. Sekine, K. Takeda, A. Ito, H. Matsumoto, H. Kondo, and M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  90. Quantum chemical investigations for excitation dissociations of C5F8 and C5HF7 etching gases International conference

    T. Hayashi, Kenji Ishikawa, M. Sekine, M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  91. Highly selective etching of gap-fill dielectrics over SiC and SiN by the dc-bias superposed dual-frequency CCP International conference

    T. Komuro, K. Takeda, Kenji Ishikawa, M. Sekine, Y. Ohya, H. Kondo, and M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  92. Photon-stimulated surface reaction and generation of damage to hydrogenated silicon nitride in fluorocarbon plasma International conference

    M. Fukasawa, H. Matsugai, T. Honda, Y. Miyawaki, Y. Kondo, K. Takeda, H. Kondo, Kenji Ishikawa, M. Sekine, K. Nagahata, F. Uesawa, M. Hori, and T. Tatsumi

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  93. An in-situ sequential H and N radical exposure process for recovery of plasma-damaged GaN International conference

    Z. Liu, S. Chen, Y. Lu, R. Kometani, Kenji Ishikawa, H. Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, and M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  94. High performances of microcrystalline Si thin film formation for a solar cell by measurement and control of hydrogen radicals in the SiH4/H2 plasma International conference

    Y. Abe, A. Fukushima, Y. Lu, Y. Kim, K. Takeda, H. Kondo, Kenji Ishikawa, M. Sekine, and M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  95. Evaluation of gas-surface reaction dynamics during the plasmaless Si etching using NO/F2 gas mixture International conference

    S. Tajima, T. Hayashi, Kenji Ishikawa, M. Sekine, and M. Hori

    The 34th International Symposium on Dry Process (DPS) 

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    Event date: 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  96. (INVITED) Real time In Situ Electron Spin Resonance (ESR) Study of Free Radicals on Materials Created by Plasmas International conference

    Kenji Ishikawa,

    American Vacuum Society (AVS) 

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    Event date: 2012.10 - 2012.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  97. Investigation of Plasma-Surface Interactions Between Hydrogen Radical and Chemically Amplified Photoresist International conference

    Arkadiusz Malinowski, Makoto Sekine, Kenji Ishikawa,

    American Vacuum Society (AVS) 

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    Event date: 2012.10 - 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  98. Evaluation of Surface Chemical Bonding State and Surface Roughness of Chemical Dry Etched Si using NO and F2 Gas Mixture International conference

    Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    American Vacuum Society (AVS) 

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    Event date: 2012.10 - 2012.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  99. Control of Surface Properties on Plasma-Etched Gallium Nitride (GaN) International conference

    Makoto Sekine, Ryosuke Kometani, Kenji Ishikawa,

    American Vacuum Society (AVS) 

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    Event date: 2012.10 - 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  100. Subsequent Temporal Change of Gaseous H and N Radical Density in Plasma after Different Processes International conference

    Toshiya Suzuki, Kenji Ishikawa,

    American Vacuum Society (AVS) 

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    Event date: 2012.10 - 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  101. (Coburn Winters Finalist) Mechanism of Generating Ions and Radicals in Fluorocarbon Plasma Investigated by Reaction Model Analysis International conference

    Yusuke Kondo, Kenji Ishikawa,

    American Vacuum Society (AVS) 

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    Event date: 2012.10 - 2012.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  102. Measurement of activated species generated by 60 Hz excited atmospheric pressure Ar plasma in atmospheric gas International conference

    Keigo Takeda, Jerome Jolibois, Kenji Ishikawa, Hiromasa Tanaka, Hiroyuki Kano, Makoto Sekine, and Masaru Hori

    65th Annual Gaseous Electronics Conference (GEC) 

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    Event date: 2012.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  103. Reaction model for etching surface interacted with hydrofluorocarbon plasmas International conference

    Kenji Ishikawa, Yusuke Kondo, Yudai Miyawaki, Toshio Hayashi, Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori

    65th Annual Gaseous Electronics Conference (GEC) 

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    Event date: 2012.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  104. Study on synthesis processes and crystallinity changes of nanographene materials synthesized by alcohol liquid-plasma International conference

    Hiroki Kondo, Tatusya Hagino, Keigo Takeda, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, and Masaru Hori

    65th Annual Gaseous Electronics Conference (GEC) 

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    Event date: 2012.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  105. Precise plasma process control based on combinatorial plasma etching International conference

    Makoto Sekine, Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Yuichi Setsuhara, Masaharu Shiratani, and Masaru Hori

    65th Annual Gaseous Electronics Conference (GEC) 

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    Event date: 2012.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  106. Temperature measurement of substrate with a thin film using low-coherence interference International conference

    Takayoshi Tsutsumi, Takehiro Hiraoka, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori

    65th Annual Gaseous Electronics Conference (GEC) 

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    Event date: 2012.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  107. (Invited) Healing Process of Plasma Damaged Gallium Nitride (GaN) International conference

    Kenji Ishikawa, Shang Chen,

    International conference on emerging advanced nanomaterials (ICEAN) 

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    Event date: 2012.10

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  108. Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals International conference

    Yu Arai, Yusuke Noto, Yousuke Goto, Seiji Takahashi, Akihiko Kono, Tatsuo Ishijima, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

    7th International Conference on Hot-Wire Chemical Vapor Deposition (HWCVD-7) 

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    Event date: 2012.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  109. Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer International conference

    Akihiko Kono, Yu Arai, Yousuke Goto, Seiji Takahashi, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

    7th International Conference on Hot-Wire Chemical Vapor Deposition (HWCVD-7) 

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    Event date: 2012.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  110. Real-time electron-spin-resonance measurement of plasma induced surface interactions International conference

    Naoya Sumi, Kenji Ishikawa, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori

    3rd International Symposium on Advance Plasma Science and its Application (ISPlasma2010) 

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    Event date: 2011.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  111. (INVITED) Surface analysis of chemical reactions during plasma etching

    Kenji Ishikawa, et al.

    133th Workshop on Silicon Technology 

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    Event date: 2011.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  112. (INVITED) Real-time Electron-Spin-Resonance Study of Plasma-Surface interaction International conference

    Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori

    12th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop 

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    Event date: 2011.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  113. (INVITED) In line Electron Spin Resonance Study of Plasma-Surface Interaction for plasma etching

    Kenji Ishikawa, Makoto Sekine, Masaru Hori

    20th MRS-Japan Academic Symposium, Session A: Frontier of Nano-Materials Based on Advanced Plasma Technologies 

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    Event date: 2010.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  114. Polymer Surface Modification: Vibrational Sum Frequency Generation Study for Plasma Etching International conference

    Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

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    Event date: 2010.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  115. (INVITED) In line electron spin resonance observation of surface reactions during plasma etching

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  116. エタノールを用いた気液プラズマによるカーボンナノ材料の作製

    萩野達也,乾裕俊,加納浩之,石川建治,竹田圭吾,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 14a-ZK-6" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  117. 単一カーボンナノウォールの電気特性

    神田貴幸,山川晃司,竹田圭吾,石川健冶,近藤博基,平松美根男,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16a-ZQ-6" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  118. カーボンナノウォールの成長に対する基板形状の効果

    渡邊均,近藤博基,石川健治,竹田圭吾,関根誠,堀勝,平松美根男

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZM-3" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  119. 和周波振動分光(SFG)によるポリフッ化ビニリデンの分極配向特性評価

    石川健治,河野昭彦,堀邊英夫,竹田圭吾,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 14a-K-2" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  120. Spatial distribution measurement of the electron temperature and density of 60 Hz nonequilibrium atmospheric pressure plasma by laser Thomson scattering

    賈鳳東,鷲見直也,石川健治,加納浩之,乾裕俊,竹田圭吾,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 15p-D-4" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  121. プラズマによるGaNエッチング損傷と反応機構の解析

    陳尚,米谷亮祐,竹田圭吾,石川健治,近藤博基,加納浩之,徳田豊,関根誠,節原裕一,江川孝志,天野浩,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 17a-ZA-3" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  122. 高精度Cl2プラズマビームを用いたGaNエッチング表面反応の解明

    米谷亮祐,陳尚,竹田圭吾,石川健治,近藤博基,関根誠,江川孝志,節原裕一,天野浩,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 17a-ZA-2" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  123. リアルタイム電子スピン共鳴によるプラズマ誘起表面反応の解析

    鷲見直也,石川健冶,河野昭彦,堀邊英夫,竹田圭吾,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-13" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  124. O2プラズマ曝露によるポーラスSiOCH 膜へのダメージ発生メカニズム

    浅野高平,山本洋,竹田圭吾,石川健治,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-12" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  125. 二周波容量結合型エッチングプラズマにおける上部電極へのDCバイアス印加効果(III)

    山口剛,竹田圭吾,輿水地塩,近藤博基,石川健治,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-9" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  126. サブナノメーター形状揺らぎ制御有機膜エッチングのための主要因子の解明

    鈴木俊哉,竹田圭吾,近藤博基,石川健治,関根 誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-8" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  127. C5HF7/O2/ArプラズマによるArFレジスト表面ラフネス発生抑制機構

    山本洋,宮脇雄大,竹田圭吾,石川健治,近藤博基,関根誠,堀勝,伊東安曇,松本裕一

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-6" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  128. ガスデザインに基づいたSiO2膜エッチングとその機構解明(III)

    宮脇雄大,近藤祐介,竹田圭吾,伊東安曇,松本裕一,近藤博基,石川健治,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-5" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  129. フルオロカーボンプラズマビームによるフォトレジスト表面改質層の解析

    竹内拓,尼崎新平,竹田圭吾,石川健治,近藤博基,豊田浩孝,関根誠,堀勝,康松潤,沢田郁夫

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-4" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  130. ラジカルが発生し易いエッチングガスと分子構造

    林俊雄,石川健治,関根誠,堀勝,河野明廣,鄒弘綱

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-2" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  131. C3F6O代替ガスを用いた絶縁膜の高速エッチングとその機構解明

    近藤祐介,宮脇雄大,竹田圭吾,石川健治,近藤博基,林俊雄,関根誠,岡本秀一,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZA-1" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  132. Radical Transport Simulation under Roof on Substrate in Processing Plasma

    アルカディウス マリノフスキ,堀勝,関根誠,石川健治,近藤博基,山本洋,竹内拓也,鈴木俊哉,宮脇雄大,リディア ルカシャック,アンジェイ ヤクボフスキ,ダニエル トマシェフスキ

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16a-ZA-7" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  133. SF6/O2プラズマを用いたSiエッチング機構

    尼崎新平,竹内拓也,竹田圭吾,石川健治,近藤博基,関根誠,堀勝,櫻井典子,林久貴,酒井伊都子,大岩徳久

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学),16a-ZA-3" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  134. H2/Ar大気圧プラズマによる酸化銅還元反応の検討

    乾裕俊,吉田直史,竹田圭吾,近藤博基,石川健治,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学),16p-ZF-10" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  135. アモルファスカーボン膜の結晶構造に対する成長温度の効果

    木野徳重,近藤博基,石川健治,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZF-3" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  136. N原子注入によるアモルファスカーボン膜の結晶性制御

    九鬼淳,木野徳重,竹田圭吾,石川健治,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16p-ZF-2" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  137. 水素ラジカル注入型プラズマ源を用いた微結晶シリコン薄膜の成膜

    川嶋翔,阿部祐介,竹田圭吾,石川健治,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 16a-ZF-8" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  138. 非平衡大気圧プラズマによるミドリカビ殺菌速度の酸素ラジカル密度依存性

    井関紗千子,太田貴之,伊藤昌文,加納浩之,東島康裕,竹田圭吾,石川健治,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 15p-D-17" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  139. 非平衡大気圧プラズマにおける原子状ラジカルの挙動に関する研究

    加藤正規,竹田圭吾,石川健治,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 15p-D-16" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  140. 太陽電池用シリコン薄膜プラズマプロセスにおける水素原子表面損失確率(II)

    阿部祐介,竹田圭吾,石川健治,近藤博基,関根誠,堀勝

    "2010年秋季 第71回 応用物理学会学術講演会(長崎大学), 15p-D-11" 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  141. Modification of Si-O-Si Structure in Porous SiOCH Films by O2 plasma International conference

    Hiroshi Yamamoto, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    The 11th International Workshop on Advanced Plasma Processing and Diagnostics, Ramada Jeju Hotel, Jeju, Korea 

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    Event date: 2010.7

    Language:English   Presentation type:Oral presentation (general)  

  142. Control in optical properties of amorphous carbon films synthesized by plasma enhanced chemical vapor deposition for solar cell applications

    International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan 

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    Event date: 2010.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  143. イオン照射誘起深い準位欠陥の水素ラジカルによる不活性化

    陳尚,永江陽一,石川健治,中井雅文,加納浩之,竹田圭吾,近藤博基,徳田豊,関根誠,堀勝

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 17p-D-7 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  144. プラズマCVD法における微結晶シリコン薄膜形成のメカニズム解明

    川嶋翔,阿部祐介,竹田圭吾,石川健治,近藤博基,関根誠,堀  勝

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 19a-ZB-8 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  145. ポーラスSiOCH low-k膜へのH2/N2プラズマアッシングダメージ発生機構の解明(II)

    山本洋,竹田圭吾,石川健治,近藤博基,関根誠,堀勝,上夏井健,林久貴,酒井伊都子,大岩徳久

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 18a-ZD-8 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  146. 反応性プラズマ中におけるc-C4F8の解離過程

    林俊雄,石川健治,関根誠,堀勝,河野明廣,鄒弘綱

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 18a-ZD-10 

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    Event date: 2010.3

    Language:Japanese  

  147. 反応性プラズマ中におけるC2F4の解離過程

    林俊雄,石川健治,関根誠,堀勝,河野明廣,鄒弘綱

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 19a-ZB-11 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  148. O2プラズマおよびCO2プラズマによるレジストアッシング機構

    阿部祐介,竹田圭吾,石川健治,近藤博基,関根誠,堀勝

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 18p-ZD-2 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  149. SF6/O2プラズマによるフォトレジスト表面改質層の解析

    竹内拓也,尼崎新平,竹田圭吾,石川健治,近藤博基,関根誠,堀勝

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 18p-ZD-3 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  150. ガスデザインに基づいたSiO2膜エッチングとその機構解明(II)

    宮脇雄大,竹田圭吾,伊東安曇,中村昌洋,石川健治,関根誠,堀勝

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 18p-ZD-9 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  151. ポーラスSiOCH膜プラズマ処理後の大気曝露の影響(II)

    鈴木俊哉,山本洋,竹田圭吾,近藤博基,石川健治,関根誠,堀勝

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 18p-ZD-10 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  152. 誘導結合型H2/N2プラズマによる有機low-k薄膜のための小型コンビナトリアルプラズマエッチングプロセス

    堀勝,チャンソン ムン,竹田圭吾,関根誠,節原裕一,白谷正治,石川健治,近藤博基

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 18p-ZD-18 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  153. 和周波振動分光によるプラズマ処理表面の解析

    石川健治,竹田圭吾,近藤博基,関根誠,堀勝

    2010年春季 第57回 応用物理学関係連合講演会(東海大学), 19a-R-14 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  154. Dissociation channel of c-C4F8 to CF2 radical in reactive plasma

    The 3rd International Conference on PLAsma-Nano Technology & Science (IC-PLANTS2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  155. Quasi-Bragg grating with sub-wavelength particles

    The 3rd International Conference on PLAsma-Nano Technology & Science (IC-PLANTS2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  156. Radical Kinetics in N2-H2 Plasma Generated by Novel High Density Radical Source

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  157. Siloxane Polymer Surface Modifications by Exposure of Plasma-Beams: A Vibrational Sum-Frequency Generation Spectroscopy (SFG) Study

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  158. Fabrication of carbon nanomaterials synthesized by plasma enhanced chemical vapor deposition for solar cell applications

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  159. Synthesis of Amorphous Carbon Films using Nonequilibrium Atmosperic-Pressure Plasma

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  160. Low-Temperature Treatment Using High-Density Non-Equilibrium Atmospheric of Pressure Plasma

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  161. Effect of Plasma Surface Treatments on Supporting of Platinum Nanoparticles to Graphite Materials in Supercritical Carbon Dioxide

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  162. Effect of Ion Irradiation on Carbon Nanowalls Growth

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  163. Initial Nucleation in Carbon Nnowalls Growth on Si and SiO2 Surface

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  164. Effect of Oxygen Etching on the Morphologies of Carbon Nanowalls

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  165. Measurement of Si Wafer Temperature with Metal Thin Film during Plasma Process Using Low-Coherence Interferometer

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  166. Deep-Level Defect Passivation by High Density Hydrogen Radical Exposure on Ion Irradiated Si

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  167. Analysis of ArF Photoresist Modified by Fluorocarbon Ion Bombardment

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  168. SiO2 Cotact Hole Etch Mechanism Using Environment-Friendly New Gas, C5F7H

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  169. Porous SiOCH Low-k Film Etch Process and its Surface Reactions Employing an Alternative Fluorocarbon Gas C5F10O

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  170. Modeling of Radical Tranformation under `PAPE' Structure and Method of Estimation for Surface Loss Probabilities of Radicals

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  171. Measurement of H Radical Density in H2/Ar Nonequilibrium Atmospheric Pressure Plasma

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  172. Surface Loss Probabilities of H Atom on Various Silicon Thin Films

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  173. A Well-Established Compact Combinatorial Etching Process Employing Inductively Coupled H2/N2 Plasma

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  174. Diagnostics in High Pressure SiH4/H2 Plasma for Deposition of Microcrystalline Si

    The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  175. Nanoscale engineering for plasma etching of future device fabrication International conference

    The 10th International Workshop of Advanced Plasma Processing and Diagnostics 

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    Event date: 2010.1

    Language:English   Presentation type:Oral presentation (invited, special)  

  176. A new framework for performance prediction of advanced MOSFETs with plasma-induced recess structure and latent defect site International conference

    2008 IEEE International Electron Devices Meeting (IEDM), (San Francisco, U.S.A., December 15-17, 2008), 18-2, pp. 443-447. 

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    Event date: 2008.12

    Language:English   Presentation type:Oral presentation (general)  

  177. Enhancing Yield and Reliability by Applying Dry Organic Acid Vapor Cleaning to Copper Contact Via-Bottom for 32-nm Nodes and Beyond International conference

    The 11th International Interconnect Technology Conference (IITC) 2008, (San Francisco, June 10-12, 2008), pp. 93-96. 

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    Event date: 2008.6

    Language:English   Presentation type:Oral presentation (general)  

  178. Reaction mechanism of low-temperature damageless cleaning of Cu2O by HCOOH International conference

    Advanced Metallization Conference (AMC) 2006: 16th Asian Session, (Tokyo, September 25-27, 2006), No. 3-6, pp. 111-116. 

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    Event date: 2006.9

    Language:English   Presentation type:Oral presentation (general)  

  179. Large Reduction in Standby Power Consumption Achieved with Stress-controlled SRAM Cell Layout International conference

    Ext. Abst. the 2006 International conference on Solid State Devices and Materials (SSDM), (Yokohama, Japan, September 12-15, 2006), H-2-2, pp. 172-173. 

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    Event date: 2006.9

    Language:English  

    Country:Japan  

  180. Reduction of Copper Surface with Formic Acid for 32-nm-Node ULSI Metallization: Surface Kinetics Study International conference

    The 209th Electrochemical Society Spring Meeting (ECS) (Colorado, U.S.A., May 7-12, 2006), vol. 601, p. 828. 

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    Event date: 2006.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  181. Plasma emission irradiation effects on etching surface reactions: Analysis using in-vacuo electron-spin-resonance technique International conference

    International conference on reactive plasmas and Symposium on Plasma processing (ICRP 6/SPP 23), (Sendai, Japan, January 24-27, 2006), P-2A-38, p. 467. 

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    Event date: 2006.1

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  182. Structural damage of diamond by oxygen ion beam exposure International conference

    International conference on reactive plasmas and Symposium on Plasma processing (ICRP 6/SPP 23), (Sendai, Japan, January 24-27, 2006), G-3A-5, p. 91. 

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    Event date: 2006.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  183. Vacuum-ultraviolet photon irradiation effects in fluorocarbon plasmas on SiO2 etching surface reactions using In vacuo electron-spin-resonance

    AVS 52nd International Symposium American Vacuum Society (AVS), (Boston, MA, U. S. A., October 31-November 4, 2005), PS-TuA6, p.97. 

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    Event date: 2005.10

    Language:English   Presentation type:Oral presentation (general)  

  184. Low temperature dry cleaning technology using formic acid in Cu/Low-k multilecel interconnects for 45 nm node and beyond International conference

    Advanced Metallization Conference (AMC) 2005, (Colorado, U. S. A., September 27-29, 2005), pp. 569-574. 

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    Event date: 2005.9

    Language:English   Presentation type:Oral presentation (general)  

  185. Efficient reduction of standby leakage current in LSIs for use in mobile devices International conference

    Ext. Abst. the 2005 International conference on Solid State Devices and Materials (SSDM), (Kobe, September 13-15, 2005), pp. 878-879. 

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    Event date: 2005.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  186. Defect creation in diamond by hydrogen plasma treatment at room temperature International conference

    23rd International Conference on Defects in Semiconductors (ICDS-23), (Hyogo, Japan, July 24 -29, 2005), Th-P17, p. 290. 

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    Event date: 2005.7

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  187. Structural change in diamond by hydrogen plasma treatment at room temperature International conference

    10th International Conference New Diamond Science and Technology (ICNDST-10), (Tsukuba, Japan, May 11-14, 2005), P5-3, p. 21. 

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    Event date: 2005.5

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  188. Using In-vacuo Electron-spin-resonance and infrared spectroscopy technique in the analysis of surface reactions of Low-k films during/after plasma processes

    AVS 51th International Symposium American Vacuum Society (AVS), (Anaheim, CA, U. S. A., November 14-17, 2004), PS1-MoM6, p. 62. 

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    Event date: 2004.11

    Language:English   Presentation type:Oral presentation (general)  

  189. Dangling bond creation and annihilation during plasma processes studied by in-situ ESR technique International conference

    AVS 51st International Symposium American Vacuum Society (AVS), (Anaheim, CA, U. S. A., November 14-17, 2004), PS-ThA4, p. 140. 

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    Event date: 2004.11

    Language:English   Presentation type:Oral presentation (invited, special)  

  190. Cleaning of copper surface using vapor-phase organic acids International conference

    2nd EU-Japan Joint Symposium on Plasma processing, (February 17-19, 2004), P-06, p. 322. 

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    Event date: 2004.2

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  191. Incident angular dependence of SiO2 and Si3N4 etching with mass-analyzed CFx+ ion beam irradiation International conference

    2nd EU-Japan Joint Symposium on Plasma processing, (February 17-19, 2004), P-03, p. 295. 

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    Event date: 2004.2

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  192. Incident angular dependence of SiO2 and Si3N4 etching with mass-analyzed CFx+ ion beam irradiation International conference

    4th International Symposium on Dry Process, (Hongoh, Tokyo, November 14-15, 2003), 7-3, pp. 271-276. 

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    Event date: 2003.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  193. Study of SiO2 plasma etching with off-normal mass-analyzed CFx+ ion beam irradiation International conference

    AVS 50th International Symposium American Vacuum Society (AVS), (Baltimore, MD, U. S. A., November 2-7, 2003), PS1-WeA9, p. 171. 

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    Event date: 2003.11

    Language:English   Presentation type:Oral presentation (general)  

  194. Mechanisms of vapor cleaning of copper surface using organic acids International conference

    204th Meeting of the Electrochemical Society (ECS), (Orlando, Florida, U. S. A., October 12-17, 2003), G1-613, pp. 259-263. 

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    Event date: 2003.10

    Language:English   Presentation type:Oral presentation (general)  

  195. Study of fluorocarbon plasma etching and film deposition with mass separated CFx+ ion beam irradiation International conference

    16th International Symposium on Plasma Chemistry (ISPC16), (Taorumina, Italy, June 22-27, 2003), p. 307. 

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    Event date: 2003.6

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  196. Cleaning of copper surface using vapor-phase organic acids International conference

    203rd Meeting of the Electrochemical Society (ECS), (Paris, France, April 27 – May 2, 2003), F2-425, pp. 320-323. 

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    Event date: 2003.4

    Language:English   Presentation type:Oral presentation (general)  

  197. Vapor treatment of copper surface using organic acids International conference

    2003 Spring meeting of the Material Research Society (MRS), (San Francisco, April 21–25, 2003), E3-28, pp. 459-464. 

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    Event date: 2003.4

    Language:English   Presentation type:Oral presentation (general)  

  198. Study of selective etching of SiO2-to-Si3N4 and a-C:F film deposition with mass-analyzed CFx+ ion beam irradiation International conference

    4th International Conference on Microelectronics and Interfaces (ICMI'03), (Santa Clara, CA, March 3-6, 2003), pp. . 

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    Event date: 2003.3

    Language:English   Presentation type:Oral presentation (general)  

  199. Measurements of Desorbed Products and Etching Yield by CFx+(x=1,2,3) Ion Irradiation International conference

    AVS 49th International Symposium American Vacuum Society (AVS), (Denver Colorado, November 3-8, 2002), PS-FrM2, p.137. 

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    Event date: 2002.11

    Language:English   Presentation type:Oral presentation (general)  

  200. Using Real-time Infrared Spectroscopy and In-vacuo Electron-Spin-Resonance Technique in the Analysis of Surface Reactions during Etching of Organic Low-k Film by a Plasma of N2 and H2 International conference

    2nd International Symposium on Dry Process, (Hongoh, Tokyo, October 11-12, 2002), I-7, pp. 39-44. 

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    Event date: 2002.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  201. Decomposition Mechanism of c-C4F8 in Plasma Assisted Catalytic Technology (PACT) International conference

    2nd International Symposium on Dry Process, (Hongoh, Tokyo, October 11-12, 2002). VI-22, pp. 243-248. 

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    Event date: 2002.10

    Language:English   Presentation type:Oral presentation (general)  

  202. Study of SiO2 plasma etching and fluorocarbon film deposition with mass separated CFx+ ion beam irradiation International conference

    2nd International Symposium on Dry Process, (Hongoh, Tokyo, October 11-12, 2002), VII-3, pp. 269-274. 

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    Event date: 2002.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  203. Dangling Bond Observation during Plasma Etching Processes Using In-vacuo Electron-Spin-Resonance Technique International conference

    16th European Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG) and 5th International Conference on Reactive Plasmas (ICRP), (Grenoble, France, July 15-18, 2002), P1-65, pp.169-170. 

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    Event date: 2002.7

    Language:English   Presentation type:Oral presentation (general)  

  204. Measurements of desorbed products and etching yield by CFx+ (x=1,2,3) ion irradiation on SiO2 International conference

    16th European Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG) and 5th International Conference on Reactive Plasmas (ICRP), (Grenoble, France, July 15-18, 2002), P1-80, pp. 199-200. 

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    Event date: 2002.7

    Language:English   Presentation type:Oral presentation (general)  

  205. Measurements of SiO2 Etch Yields under F+ and CFx+ Ion Irradiation International conference

    3rd International Conference on Microelectronics and Interfaces (ICMI'02), (Santa Clara, CA, February 11-15, 2002), pp. . 

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    Event date: 2002.2

    Language:English   Presentation type:Oral presentation (general)  

  206. Dangling Bond Observation during Fluorocarbon Plasma Etching Processes Using In-vacuo Electron-Spin-Resonance Technique International conference

    1st International Symposium on Dry Process, (Waseda, Tokyo, November 20-21, 2001), VII-6, pp. 301-306. 

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    Event date: 2001.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  207. In-vacuo Electron-Spin-Resonance Study on Fluorocarbon Films for SiO2 Plasma Etching International conference

    AVS 48th International Symposium American Vacuum Society (AVS), (San Francisco, CA, October 28-November 2, 2001), PS1-MoA2, p.64. 

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    Event date: 2001.10

    Language:English   Presentation type:Oral presentation (general)  

  208. Early-stage modification of Silicon dioxide surface during fluorocarbon plasma etching International conference

    25th Intern. Conf. on Phenomena in Ionized Gases (ICPIG), (Nagoya, July 17-22, 2001), 18a35, p. 89. 

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    Event date: 2001.7

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  209. Electron-Spin-Resonance Investigation on Solid Surfaces Irradiated by Fluorocarbon Plasma International conference

    25th International Conference on Phenomena in Ionized Gases (ICPIG), (Nagoya, July 17-22, 2001), 18a34, p. 87. 

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    Event date: 2001.7

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  210. Time-Resolved Planer Laser-Induced Fluorescence of Fluorocarbon Radicals in Oxide Etch Process Plasma International conference

    25th International Conference on Phenomena in Ionized Gases (ICPIG), (Nagoya, July 17-22, 2001), 18a36, p. 91. 

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    Event date: 2001.7

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  211. Early-stage modification of silicon oxide surface in fluorocarbon plasma for selective etching over silicon International conference

    47th International Symposium American Vacuum Society (AVS), (Boston, MA, October 2-6, 2000), PS-MoM4, p. 6. 

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    Event date: 2000.10

    Language:English   Presentation type:Oral presentation (general)  

  212. An in-situ time-resolved infrared spectroscopic study of silicon dioxide surface during selective etching over silicon using fluorocarbon plasma International conference

    Microprocess and Nanotechnology Conference (MNC), (Tokyo, July 11-13, 2000), 13B-9-3, pp. 270-271. 

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    Event date: 2000.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  213. Early Stage of Native Oxide Growth on an Atomically Flat Hydrogen Terminated Si(111) Surface International conference

    Proc. 3rd Intern. Symp. Ultra Clean Processing of Silicon Surface (UCPSS 96), edited by M. Heyns, (Acco Leuven/Amersfoort, 1996), pp. 273-278. 

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    Event date: 1996

    Language:English   Presentation type:Oral presentation (general)  

  214. Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film International conference

    26th IEEE Semiconductor Interface Specialist Conf. (SISC 95), (Charleston, South Carolina, December 7-9, 1995), P1.2. 

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    Event date: 1995.12

    Language:English   Presentation type:Poster presentation  

  215. Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film International conference

    Ext. Abst. of the 1995 Intern. Conf. on Solid State Devices and Mater. (SSDM), (Osaka, August 21-24, 1995), PA-1-8, pp. 500-502. 

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    Event date: 1995.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  216. In-situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces International conference

    Ext. Abst. of the 1995 Intern. Conf. on Solid State Devices and Mater. (SSDM), (Osaka, August 21-24, 1995), S-1-1-2, pp.13-15. 

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    Event date: 1995.8

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  217. Study on Reaction of Fluorine Radicals with Si(111) Surface Employing an In-situ Combinated of ATR and XPS International conference

    8th Intern. Micro Process Conf., (Sendai, July 17-20, 1995), pp. 170-171. 

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    Event date: 1995.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  218. Contribution of Si/SiO2 Interface Roughness in the Observation of Chemical Structure International conference

    Ext. Abst. of the 1994 Intern. Conf. on Solid State Devices and Mater.(SSDM), (Yokohama, August 23-26, 1994), C-8-5, pp. 850-852. 

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    Event date: 1994.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  219. Effects of Dissolved Oxygen in HF solution on Silicon Surface Morphology International conference

    Ext. Abst. of the 1994 Intern. Conf. on Solid State Devices and Mater. (SSDM), (Yokohama, August 23-26, 1994), pp. 437-439. 

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    Event date: 1994.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  220. New Analytical Method of SiO2 Structure by Infrared Reflection Absorption Spectorscopy (IR-RAS) International conference

    1993 Fall Meeting of the Material Research Society (MRS), Proc. 318 (Boston, November 28-December 5, 1993), pp. 425-430. 

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    Event date: 1993.11

    Language:English   Presentation type:Oral presentation (general)  

  221. FT-IR-RAS Analysis of Native Oxide Grown on Si(111) International conference

    S. Fujimura, H. Ogawa, K. Ishikawa, C. Inomata, and H. Mori

    Ext. Abst. of the 1993 Intern. Conf. on Solid State Devices and Mater. (SSDM), (Makuhari, August 29-September 1, 1993), pp.618-620. 

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    Event date: 1993.8

    Language:English   Presentation type:Oral presentation (general)  

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KAKENHI (Grants-in-Aid for Scientific Research) 8

  1. Innovation in atomically controlled engineering of plasma etching technology with builiding a collaborative environment for theory, computation, and measurement

    Grant number:21H01073  2021.4 - 2024.3

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    Authorship:Coinvestigator(s) 

  2. Spatiotemporal analysis of aqueous reaction field of plasma-generated free radicals

    Grant number:21H04451  2021.4 - 2024.3

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    Authorship:Principal investigator 

    Grant amount:\43030000 ( Direct Cost: \33100000 、 Indirect Cost:\9930000 )

  3. Mechanism elucidation of spatio-temporal structure formation of sheath fluctuation using optically trapped fine particles in plasmas

    Grant number:20H00142  2020.4 - 2024.3

    Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

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    Authorship:Coinvestigator(s) 

  4. Plasma Biochemistry and Metabolic Profiles of Cells Interacted with Non-thermal Plasmas

    Grant number:17H02805  2017.4 - 2020.3

    Ishikawa Kenji

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    Authorship:Principal investigator 

    Grant amount:\18460000 ( Direct Cost: \14200000 、 Indirect Cost:\4260000 )

    The alternation of intracellular metabolites cultured in plasma-activated solutions was observed in brain tumor cells (U251SPs). Bioenergetics and biomass production were taken place through catabolism from glucose uptake in the cell culture medium; (i) bioenergetics were deficient in the plasma-activated culture medium due to reduced activity of glycolytic enzymes due to oxidative stress; (ii) lactate-containing solutions enhanced anabolism from lactate uptake while maintaining a reduced intracellular state; and (iii) plasma-activated organics acted as inhibitors of glutamine assimilation and lipid metabolism in the plasma-activated lactate solution (PAL). In particular, we found that intracellular metabolism was altered by plasma-activated organic matter in PAL, leading to plasma-induced cell death.

  5. Health risk assessment and development of remediation systems for elemental contamination of drinking water in Asian countries

    Grant number:15H02588  2015.4 - 2019.3

    Kato Masashi

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    Authorship:Coinvestigator(s) 

    Contamination of toxic elements in well drinking water has caused various element-originating diseases in tens of millions of people in Asian countries. In this study, the comprehensive study was conducted to quickly resolve the international environmental problems related to contamination of toxic elements in well drinking water. First, the present situation of elemental contamination of well drinking water was investigated in the areas including Afghanistan. Then, harmful elements that may induce carcinogenesis and/or disorders of sensory organs (melanosis, hearing loss, etc.) were detected by our multidisciplinary health risk assessment system consisted of experimental and epidemiological analyses. Finally, we developed a new remediation system that can remove harmful elements from well drinking water based on our results of health risk assessment.

  6. Construction of carbon nanowall sheet edge electronics and differentiation induction control of single cell

    Grant number:15H02032  2015.4 - 2018.3

    Hori Masaru

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    Authorship:Collaborating Investigator(s) (not designated on Grant-in-Aid) 

    In order to cultivate biotechnology devices and plasma bioelectronics that can control adhesion, morphology and differentiation induction of cells by systematic elucidation interaction between electronic properties developed from nanosheet-edges in carbon nanowall (CNW) and cells, the effects of superimposed electrical stimulation on the CNW scaffold on the proliferation / differentiation (ossification) of osteoblasts were elucidated. Proliferation promotion and suppression of ossification were specifically confirmed only when the electrical stimulation at the frequency of 10 Hz was superimposed. Furthermore, the dependence on wall density and the formation of cell clumps without ossification were also found. These suggest changes in cell proliferation and differentiation due to the synergy between the sheet edge on the CNW surface and electrical stimulation, and establishment of new cell control technology in various regenerative medicine is expected.

  7. プラズマで生成された生体内フリーラジカルの実時間計測とプラズマ滅菌処理の研究

    2014.4 - 2017.3

    基盤研究(B)  基盤研究(B)

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    Authorship:Principal investigator 

  8. 実時間その場電子スピン共鳴分析によるプラズマの生体に及ぼす作用に関する研究

    2012.4 - 2014.3

    挑戦的萌芽 

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    Authorship:Principal investigator 

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Industrial property rights 8

  1. Silicon oxide film evaluation method

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    Date applied:1994.3

    Patent/Registration no:US 5,595,916  Date registered:1997.1 

    Country of applicant:Foreign country  

  2. 半導体装置の製造方法

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    Date applied:2004.9

    Patent/Registration no:4283189  Date registered:2009.3 

    Country of applicant:Domestic  

  3. シリコン酸化膜の評価方法及び装置並びに半導体装置の製造方法及び装置

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    Date applied:2005.3

    Patent/Registration no:3844770  Date registered:2006.8 

    Country of applicant:Domestic  

  4. シリコン酸化膜の評価方法及び半導体装置の製造方法

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    Date applied:2002.12

    Patent/Registration no:3816440  Date registered:2006.6 

    Country of applicant:Domestic  

  5. シリコン酸化膜の評価方法及び半導体装置の製造方法

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    Date applied:1995.3

    Patent/Registration no:3670336  Date registered:2005.4 

    Country of applicant:Domestic  

  6. シリコン酸化膜の評価方法及び装置、並びに半導体装置の製造方法及び装置

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    Date applied:1994.3

    Patent/Registration no:3452629  Date registered:2003.7 

    Country of applicant:Domestic  

  7. 半導体装置の製造方法

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    Date applied:1999.3

    Patent/Registration no:3326718  Date registered:2002.7 

    Country of applicant:Domestic  

  8. 半導体装置の製造方法

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    Date applied:1999.2

    Patent/Registration no:3326717  Date registered:2002.7 

    Country of applicant:Domestic  

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Teaching Experience (On-campus) 6

  1. ナノプロセス工学特論

    2020

  2. Nanoprocessing technology

    2018

  3. ナノプロセス工学特論

    2017

  4. ナノプロセス工学特論

    2016

  5. ナノプロセス工学特論

    2014

  6. ナノプロセス工学特論

    2012

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