Updated on 2024/05/09

写真a

 
TOYODA, Hirotaka
 
Organization
Graduate School of Engineering Electronics 1 Professor
Graduate School
Graduate School of Engineering
Undergraduate School
School of Engineering Electrical Engineering, Electronics, and Information Engineering
Title
Professor
Contact information
メールアドレス

Degree 1

  1. Doctor of Engineering ( 1988.3   Nagoya University ) 

Research Interests 1

  1. Plasma Science and Technology

Research Areas 2

  1. Others / Others  / Plasma Science

  2. Others / Others  / Atomic/Molecular/Quantum Electronics, Plasma

Current Research Project and SDGs 6

  1. Large area process by atmospheric pressure microwave line plasma

  2. Charging process on the hole bottom of high-aspect hole in etching plasma

  3. Frontier material processing and water purification by microwave plasma

  4. Analysis of angular distribution of high energy particles in etching plasma

  5. Plasma behavior of inductively/capacitively coupled plasma

  6. Surface interaction between liquid tin and hydrogen plasma

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Research History 6

  1. 自然科学研究機構 核融合科学研究所   特任教授

    2020.4

  2. 名古屋大学教授(工学研究科)   教授

    2007.4

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    Country:Japan

  3. 名古屋大学助教授(工学研究科プラズマナノ工学研究センター)   助教授

    2006.10 - 2007.3

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    Country:Japan

  4. 名古屋大学助教授(工学研究科)   助教授

    2000.4 - 2006.9

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    Country:Japan

  5. 名古屋大学講師(工学部)   講師

    1992.4 - 2000.3

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    Country:Japan

  6. 名古屋大学助手(工学部)   助手

    1988.4 - 1992.3

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    Country:Japan

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Education 2

  1. Nagoya University   Graduate School, Division of Engineering   Department of Electrical Engineering

    - 1988

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    Country: Japan

  2. Nagoya University   Faculty of Engineering

    - 1983

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    Country: Japan

Professional Memberships 3

  1. The Japan Society of Plasma Science and Nuclear Fusion Research

  2. The Institute of Electrical Engineers of Japan

  3. Japan Society of Applied Physics

Committee Memberships 17

  1.   International Organizing Committee  

    2022.1 - 2022.12   

  2. International Symposium on Dry Process   Chair of Publication Committee  

    2022.1 - 2022.12   

  3. International Symposium on Dry Process   International Program Committee  

    2022.1 - 2022.12   

  4. 名古屋大学プラズマ研究60年記念シンポジウム   オーガナイザー  

    2021.7 - 2021.9   

  5. 応用物理学会東海支部   幹事  

    2021.4 - 2022.3   

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    Committee type:Academic society

  6. International Symposium on Advanced Plasma Science and its Application to Nitorides and Nanomaterials   International Organizing Committee  

    2021.3 - 2022.3   

  7. International Symposium on Advanced Plasma Science and its Application to Nitrides and Nanomaterials   Chair of Executive Committee  

    2021.3 - 2022.3   

  8.   International Program Committee  

    2021.3 - 2022.3   

  9. International Symposium on Dry Process   International Organizing Committee  

    2021.1 - 2021.12   

  10. International Symposium on Dry Process   Vice Chair of Publication Committee  

    2021.1 - 2021.12   

  11. International Symposium on Advanced Plasma Science and its application to nitride and nanomaterials   International Organizing Committee  

    2020.4 - 2021.3   

  12. International Symposium on Dry Process   Organizing Committee  

    2020.3 - 2020.11   

  13. 応用物理学会東海支部   企画幹事  

    2019.4 - 2020.4   

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    Committee type:Academic society

  14. プラズマ・核融合学会   副会長  

    2018.6 - 2020.5   

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    Committee type:Academic society

  15. 電気学会   理事・東海支部支部長  

    2018.6 - 2020.5   

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    Committee type:Academic society

  16. Microwave Discharge Workshop   International Organizing Committee  

    2018.3   

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    Committee type:Academic society

  17. プラズマ・核融合学会   理事  

    2014.6 - 2018.5   

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    Committee type:Academic society

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Awards 14

  1. 応用物理学会優秀論文賞

    2024.3   応用物理学会  

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    Award type:International academic award (Japan or overseas)  Country:Japan

    3D-NAND に代表されるメモリ作製技術では,反応性イオンエッチングプロセスの理解が重要であるものの,プラズマ中からバイアスされた基板へのイオンや中性粒子の輸送に関する実験的検証はその測定の困難さから現在までに検討された例は少ない.本論文では,プラズマからバイアス基板へ輸送されるイオンと中性粒子の角度分布をドリフトチューブを用いた洗練された計測法により詳細に明らかにしたものである.この中で,イオンと中性粒子の角度分布は,1 度以下の鋭いピークを持つことなどを明らかにした.得られた知見は,反応性イオンエッチングの理解を深める,半導体デバイスプロセスの深化に貢献するものであるため,本論文は応用物理学会優秀論文賞にふさわしい.

  2. 応用物理学会フェロー表彰

    2020.9   公益社団法人 応用物理学会   プロセスプラズマの気相・表面解析と新規プロセスプラズマ源創出

    豊田浩孝

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    Country:Japan

  3. Plasma Electronics Award

    2023.3   Japan Society of Applied Physics, Plasma Electronics Division  

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    Award type:International academic award (Japan or overseas)  Country:Japan

  4. 第25回プラズマ材料科学賞基礎部門賞

    2024.1   名古屋大学低温プラズマ科学研究センター  

    豊田浩孝

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    Award type:International academic award (Japan or overseas)  Country:Japan

    スパッタプロセスにおけるプラズマからシースを通過して基板に入射する負イオンのエネルギー分布や高アスペクト比孔における高速粒子の入射角度分布の計測,マイクロ波を用いた独自の大気圧・水中プラズマ源の開発に関する顕著な業績は、プラズマ材料科学分野の進歩・向上に多大な貢献をした

  5. 平成22年度第4回貢献賞

    2010.11   (社)プラズマ・核融合学会  

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    Country:Japan

    「平成22年度作成のプラズママップに対して」

  6. Plasma Electronics Award

    2007.3   Japan Society of Applied Physics, Plasma Electronics Division  

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    Country:Japan

  7. 講演奨励賞

    2022.10   応用物理学会   二周波重畳容量結合型プラズマから 電極へ入射する高速粒子の イメージング法を用いた角度分布計測

    市川景太, 鈴木陽香, 飯野大輝, 福水裕之, 栗原一彰, 豊田浩孝

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    Award type:Award from Japanese society, conference, symposium, etc.  Country:Japan

  8. キオクシア優秀研究賞 

    2022.8   キオクシア(株)  

    豊田浩孝

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    キオクシア奨励研究2021年度プロセス部門

  9. Best Poster Presentation Award

    2022.3   ISPlasma2022/IC-PLANTS2022   Radical measurements of Ar/C4F8 dual frequency capacitively-coupled plasma

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    Award type:Award from international society, conference, symposium, etc. 

  10. 電気学会優秀論文発表賞

    2022.1   令和3年度電気・電子・情報関係学会東海支部連合大会   イメージング法による容量結合型プラズマから電極へ入射する高速粒子の角度分布計測

    市川景太,鈴木陽香,豊田浩孝

  11. APEX/JJAP編集貢献賞

    2016.4   応用物理学会  

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    Country:Japan

  12. Best Poster Presentation Award (Poster)

    2014.3   ISPlasma2014 Organizing Committee  

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    Country:Japan

  13. 応用物理学会講演奨励賞

    2000  

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    Country:Japan

  14. 応用物理学会講演奨励賞

    1998  

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    Country:Japan

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Papers 151

  1. *Fine Structure of O Kinetic Energy Distribution in RF Plasma and Its Formation Mechanism Reviewed

    H.Toyoda, K. Goto, T. Ishijima, T. Morita, N. Ohshima, K. Kinoshita

    Applied Physics Express   Vol. 2 ( 12 ) page: 126001-(1-3)   2009.11

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

  2. Design of Large-Area Surface Wave Plasma Excited by Slotted Waveguide Antennas with Novel Power Divider Reviewed

    Tatsuo Ishijima, Hirotaka Toyoda, Yudai Takanishi, and Hideo Sugai

    Jpn. J. Appl. Phys.   Vol. 50   page: 036002   2011.3

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    Language:English   Publishing type:Research paper (scientific journal)  

  3. *Generation processes of super-high-energy atoms and ions in magnetron sputtering plasma Reviewed

    Y. Takagi, Y. Sakashita, H. Toyoda, and H. Sugai

    Vacuum   Vol. 80 ( 6 ) page: 581-587   2006.3

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    Language:English   Publishing type:Research paper (scientific journal)  

  4. *Evidence of Radical-free Etching of SiO2 by Fluorocarbon Molecules under Ion Bombardment Reviewed

    N. Takada, H. Toyoda and H. Sugai

    Transacitons of the Materials Research Society of Japan   Vol. 30 ( 1 ) page: 319-322   2005

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    Language:English   Publishing type:Research paper (scientific journal)  

  5. *Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H2/SiH4 Plasma Reviewed

    S. Somiya, H. Toyoda, Y. Hotta and H. Sugai

    Jpn. J. Appl. Phys.   Vol. 43 ( 11A ) page: 7696-7700   2004

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    Language:English   Publishing type:Research paper (scientific journal)  

  6. Time-varying mechanism of ion composition in a pulse-modulated Ar/C<sub>4</sub>F<sub>8</sub>/O<sub>2</sub> dual-frequency capacitively coupled plasma

    Kuboi, S; Kato, H; Akatsuka, Y; Suzuki, H; Toyoda, H

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 63 ( 1 )   2024.1

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Japanese Journal of Applied Physics  

    The time-varying mechanism of the positive-ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma was investigated in detail using a quadrupole mass spectrometer equipped with an electrostatic energy analyzer. Time-resolved measurements of the ion composition with respect to the pulse-off period ( T off ) revealed that the electron temperature ( T e ) just after turning on the pulse is an important factor in determining the ratio of the ionization rates of the Ar+ and Cx Fy + ions. The time-varying phenomenon of the ion composition was also investigated through a numerical analysis based on the particle balance model, considering the production and loss rates of ions, ion-ion recombination processes, and ion-molecule reactions. When the VHF power ( P VHF ) was increased, a decrease in the ambipolar diffusion loss time constants of the ions ( τ loss i ) was observed, and the change in electronegativity was pointed out as the cause of this phenomenon.

    DOI: 10.35848/1347-4065/ad121f

    Web of Science

    Scopus

  7. Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma International journal

    Shuichi Kuboi, Haruhito Kato, Yuto Seki, Haruka Suzuki and Hirotaka Toyoda

    Japanese Journal of Applied Physics   Vol. 62 ( SI ) page: SI1003   2023.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/acb6a1

    DOI: 10.35848/1347-4065/acb6a1

    Web of Science

  8. Polyvinyl alcohol-potassium iodide gel probe to monitor the distribution of reactive species generation around atmospheric-pressure plasma jet

    Tran, TN; Hu, M; Ogasawara, T; Iwata, Y; Suzuki, H; Sakamoto, J; Akiyoshi, M; Toyoda, H; Matsuura, H

    PLASMA SCIENCE & TECHNOLOGY   Vol. 25 ( 3 )   2023.3

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Plasma Science and Technology  

    This study proposes polyvinyl alcohol-potassium iodide (PVA-KI) as a novel gel chemical probe. The probe uses the reactions among PVA, KI, water, borax, and oxidative species to visualize the distribution of reactive species. This method provides information regarding the distribution of reactive species by coloration on the gel surface. The effects of the surrounding gas phase on the distribution and diffusion of the reactive species are also investigated using the PVA-KI gel probe. Further, the relationship between the irradiation distance and reactive species diffusion is determined on the surface of the PVA-KI probe with and without plastic shielding. Adjusting the irradiation distance appropriately leads to an increase in the modified area as detected by the PVA-KI gel probe analysis. The relative concentration distributions of the reactive species are also obtained from visualized color distributions measured using a colorimeter. Furthermore, reactive species generation by long-scale line plasma is confirmed by the color reaction on the PVA-KI gel surface, with a greater area being covered by an atmospheric-pressure pulsed microwave line plasma source.

    DOI: 10.1088/2058-6272/ac9891

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    Scopus

  9. Influence of small ground surface on plasma property in an inductively-coupled plasma with floating liner International journal

    Manabu Kyuzo, Yukinori Chiba, Haruka Suzuki and Hirotaka Toyoda

    Japanese Journal of Applied Physics   Vol. 62 ( SA ) page: SA1008-1 - SA1008-7   2023.1

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Japanese Journal of Applied Physics  

    Currently, the components of semiconductor processing chamber are coated with oxides to avoid metal contamination. As a result, electrical ground is hidden from the plasma. In this study, we experimentally investigate the effect of small ground surfaces in an inductively-coupled plasma (ICP) generated in an electrically floating liner. Peak-to-peak and DC voltages at a biasing stage and a floating liner are measured as a function of stage peak-to-peak voltage for various ICP powers and the ground surface areas. The results show that the stage and liner voltages vary with changing ground surface area due to a change in sheath thickness. The analytical plasma potentials, calculated from the experimental values are compared with the simulation results, show good agreement. It is suggested that under low biased voltage and high ICP power conditions, such as in the atomic layer etching process, the small ground surface affects the potential structure in the chamber.

    DOI: 10.35848/1347-4065/ac7e19

    DOI: 10.35848/1347-4065/ac7e19

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    Scopus

    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/ac7e19

  10. Experimental study on boron distribution and transport at plasma-facing components during impurity powder dropping in the Large Helical Device Reviewed

    NUCLEAR FUSION   Vol. 62 ( 12 )   2022.12

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    DOI: 10.1088/1741-4326/ac9ac6

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  11. Bubbling phenomenon of liquidized Sn-Bi-Li-Er alloy under hydrogen plasma exposure Reviewed

    Tamura Kota, Miyazawa Junichi, Masuzaki Suguru, Tokitani Masayuki, Hamaji Yukinori, Toyoda Hirotaka

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( 10 ) page: 106005   2022.10

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    DOI: 10.35848/1347-4065/ac92b1

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    Scopus

  12. Dry Process

    Japanese Journal of Applied Physics   Vol. 61 ( SI )   2022.7

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    DOI: 10.35848/1347-4065/ac6726

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  13. High-speed hydrophilic and ashing treatments of polyimide using Ar/O-2 atmospheric-pressure microwave line plasma Reviewed

    Japanese Journal of Applied Physics   Vol. 61 ( SI ) page: 1008-1 - 1008-5   2022.7

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    DOI: 10.35848/1347-4065/ac64e2

    Web of Science

  14. Enhancement of the ion flux to the substrate through high-voltage biasing in an electron cyclotron resonance plasma and its application to high-speed deposition of conductive carbon film Reviewed

    Bae Hansin, Hamaguchi Ikumi, Sasai Kensuke, Suzuki Haruka, Toyoda Hirotaka

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( 12 )   2021.12

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Japanese Journal of Applied Physics  

    A method for enhancing ion flux to the substrate via high-voltage pulse biasing is investigated in an electron cyclotron resonance plasma. When high-voltage pulse biases above 500 V are applied to the stage, an increase in the stage current is observed, especially in the case of diverging magnetic field configurations in front of the bias stage. The growth and decay time constants of the plasma density and emission intensity are evaluated using a time-resolved Langmuir probe and emission spectroscopy while the pulse is on, and the enhancement of the ionization rate during the bias application is estimated using the zero-dimensional global model. The estimated density enhancement from the model is in good agreement with the measured one. From the numerical simulation of secondary electron trajectory, it is concluded that the electron confinement from the magnetic field is the key factor in plasma density enhancement during stage biasing. Using the high-density plasma produced by the bias voltage, conductive carbon is deposited at a high deposition rate of ∼4 nm s-1.

    DOI: 10.35848/1347-4065/ac32b6

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    Scopus

  15. Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma Reviewed

    Keita Ichikawa, Manh Hung CHU, Makoto Moriyama, Naoya Nakahara, Haruka Suzuki, Daiki Iino, Hiroyuki Fukumizu, Kazuaki KURIHARA and Hirotaka TOYODA

    Applied Physics Express   Vol. 14 ( 126001 ) page: 126001-1 - 126001-5   2021.11

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    DOI: https://doi.org/10.35848/1882-0786/ac33c4

  16. High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing Reviewed

    Hansin BAE,Kensuke Sasai,Haruka Suzuki,Hirotaka Toyoda

    Vacuum   Vol. 192   page: 110429-1 - 110429-8   2021.10

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.vacuum.2021.110429

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  17. Quantitative evaluation of hydrogen retention of solid tin after exposure to hydrogen plasma Reviewed

    Kota Tamura,Haruka Suzuki, Junichi Miyazawa,Suguru Masuzaki,Hirotaka Toyoda

    Fusion Engineering and Design   Vol. 170 ( September 112532 ) page: 112532-1 - 112532-6   2021.9

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.fusengdes.2021.112532

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  18. Spatial Uniformity Evaluation of Atmospheric-Pressure Microwave Line Plasma for Wide-Area Surface Treatment Reviewed

    Haruka SUZUKI, Hirotsugu KOMA, Tomohiro OGASAWARA, Yosuke KOIKE and Hirotaka TOYODA

    Plasma and Fusion Research   Vol. 16 ( 0 ) page: 1406046 - 1406046   2021.4

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1585/pfr.16.1406046

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  19. Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma Reviewed

    Makoto Moriyama, Naoya Nakahara, Kazuaki Kurihara, Daiki Iino, Hiroyuki Fukumizu, Haruka Suzuki, and Hirotaka Toyoda

    Japanese Journal of Applied Physics   Vol. 60 ( 016001 ) page: 016001-1 - 016001-5   2021.1

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    harging and discharging behavior of high aspect-ratio (AR) hole capillary plate (CP) exposed to a pulse-modulated very high frequency (VHF) capacitively-coupled plasma is investigated. From an equivalent circuit model, time-dependent charge density on the bottom of the CP is quantitatively evaluated. AR of the CP plays very important role for the charging current, although the discharge current is dominated by the leakage current of the CP. Importance of electron current flowing into the CP bottom during the VHF pulse-on phase is suggested at higher self-bias voltages.

    DOI: 10.35848/1347-4065/abd0ca

  20. 長尺大気圧マイクロ波プラズマの生成と表面処理への応用

    豊田 浩孝、鈴木 陽香

    表面技術   Vol. 71 ( 10 ) page: 624-628   2020.10

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    Authorship:Lead author   Language:Japanese  

  21. Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma

    Makoto Moriyama1*, Naoya Nakahara1, Akihiro Mitsuya1, Haruka Suzuki1 , Kazuaki Kurihara2, Daiki Iino2, Hiroyuki Fukumizu2, and Hirotaka Toyoda1,3

    Japanese Journal of Applied Physics   Vol. 59   page: SJJB03   2020.4

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  22. Atmospheric-pressure microwave line plasma with an asymmetric cross-section waveguide for long-scale N2 plasma production

    Haruka Suzuki1, Yuto Tamura1, Manh Hung Chu2 and Hirotaka Toyoda1

    Japanese Journal of Applied Physics   Vol. 59 ( 016002 ) page: 016002-1-016002-6   2020.1

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  23. Microwave plasma

    Toyoda H.

    RF Power Semiconductor Generator Application in Heating and Energy Utilization     page: 181 - 194   2020.1

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    Publishing type:Research paper (scientific journal)   Publisher:RF Power Semiconductor Generator Application in Heating and Energy Utilization  

    DOI: 10.1007/978-981-15-3548-2_8

    Scopus

  24. 高密度表面波励起プラズマによるフッ素樹脂の表面改質

    豊田浩孝

    機能材料   ( 12月 ) page: PP   2019.12

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    Authorship:Lead author   Language:Japanese  

    DOI: PP01

  25. Rapid resist ashing by slot-excited atmospheric pressure microwave O2 plasma

    Hirotaka Toyoda1, Shota Ishikawa1, Haruka Suzuki1 and Takeshi Honda2

    Japanese Journal of Applied Physics   Vol. 58 ( 12 ) page: 126001-1-4   2019.11

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  26. 大気圧マイクロ波放電による高密度長尺ラインプラズマ Reviewed

    豊田浩孝、鈴木陽香

    応用物理   Vol. 88 ( 2 ) page: 101-104   2019.2

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  27. Atmospheric pressure water-vapor plasma in an air-shielded environment by water flow Reviewed

    Hikaru Senba, Haruka Suzuki and Hirotaka Toyoda

    Japanese Journal of Applied Physics   Vol. 58 ( SA ) page: pp.SAAC05-1~SAAC05-5   2018.12

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  28. Production of atmospheric pressure microwave plasma with dielectric half-mirror resonator and its application to polymer surface treatment

    Sasai Kensuke, Keyamura Kazuki, Suzuki Haruka, Toyoda Hirotaka

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/JJAP.57.066201

    Web of Science

  29. 液体処理用マイクロ波励起プラズマの生成

    豊田 浩孝

    表面と真空   Vol. 61 ( 3 ) page: 113-118   2018.3

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    Authorship:Lead author   Language:Japanese  

  30. Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using RF-near microwave PECVD

    Sahu Bibhuti Bhusan, Toyoda Hirotaka, Han Jeon Geon

    PHYSICS OF PLASMAS   Vol. 25 ( 2 ) page: 023511-1-14(2018)   2018.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.5016618

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  31. Development and plasma characterization of an 850 MHz surface-wave plasma source Reviewed

    B. B. Sahu, S. Koga, H. Toyoda, and Jeon G. Han

    AIP Advances   Vol. 7   page: 105213-1-17(2017)   2017.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.4995442

  32. Quantitative evaluation of high-energy O- ion particle flux in a DC magnetron sputter plasma with an indium-tin-oxide target

    Suyama Taku, Bae Hansin, Setaka Kenta, Ogawa Hayato, Fukuoka Yushi, Suzuki Haruka, Toyoda Hirotaka

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 44 )   2017.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/1361-6463/aa87a1

    Web of Science

  33. An approach to line-shaped nitrogen plasma production at atmospheric pressure by slot-excited microwave discharge

    Suzuki Haruka, Toyoda Hirotaka

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 11 )   2017.9

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/JJAP.56.116001

    Web of Science

  34. 液体処理用マイクロ波励起プラズマの生成 Reviewed

    豊田浩孝

    表面と真空   Vol. 61 ( 3 ) page: 113-118   2017.2

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  35. Enhancement of Liquid Treatment Efficiency by Microwave Plasma under Flow-Induced Reduced Pressure Reviewed

    Michiko Ito, Tomohiro Takahashi, Sho Takitou, Seigo Takashima, Norio Nomura, Tominori Kitagawa, Hirotaka Toyoda

    Japanese Journal of Applied Physics   Vol. 56   page: 026201-1-6   2017.1

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  36. Magnet-free uniform sputtering of dielectric film by RF and microwave power superposition Reviewed

    K. Sasai, T. Hagihara, T. Noda, H. Suzuki, H. Toyoda

    Jpn. J. Appl. Phys.,   Vol. 55   page: 086202 -1-5(2016)   2016.7

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  37. Desorption behavior of zinc atoms from zinc-sulfate solution irradiated with pulsed DC plasma Reviewed

    Takafumi Takaba, Haruka Suzuki and Hirotaka Toyoda

    Journal of Physics D: Applied Physics, Volume 49, Number 29   Vol. 49 ( 29 ) page: 295202   2016.6

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  38. Characteristics of an atmospheric-pressure line plasma excited by 2.45 GHz microwave travelling wave Reviewed

    Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori, Hirotaka Toyoda

    Jpn. J. Appl. Phys.   ( 55 ) page: Article ID: 01AH09-1-6(2016)   2015.12

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  39. Low pressure sustainment of surface-wave microwave plasma with modified microwave coupler Reviewed

    Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

    Jpn. J. Appl. Phys.   ( 55 ) page: Article ID: 016203-1-5(2016)   2015.12

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  40. New line plasma source excited by 2.45 GHz microwave at atmospheric pressure Reviewed

    Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori and Hirotaka Toyoda

      Vol. 8 ( 3 ) page: 036001   2015.2

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  41. Synergistic effect of microwave plasma and ultrasonic wave on decomposition of organic compounds in water Reviewed

    Tomohiro Takahashi, Noriharu Takada, and Hirotaka Toyoda

    Japanese Journal of Applied Physics   Vol. 53 ( 7S ) page: 07KE01   2014.6

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  42. 酸化物ターゲットを用いたRFマグネトロンプラズマにおける高エネルギー粒子の挙動 Invited Reviewed

    豊田浩孝

    Journal of the Vacuum Society of Japan   Vol. 57 ( 3 ) page: 80-83   2014.3

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  43. Influence of Si Substrate Temperature and Bias Voltage on Surface Reaction of Br Radical in HBr Inductively Coupled Plasma

    D. Iino, Y. Fujii, T. Oike, H. Toyoda

    JPS Conf. Proc.   Vol. 1   page: 015070-1-4 (2014)   2014.3

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  44. Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma Reviewed

    Daiki Iino , Yasuhiro Nojiri, Keiji Suzuki, Takumi Oike, Yoshitaka Fujii, and Hirotaka Toyoda

    Japanese Journal of Applied Physics   Vol. 52 ( 11 ) page: 11NC01-1-6   2013.11

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  45. High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System Reviewed

    Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 52   page: 11NE01   2013.11

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  46. A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink

    H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, H. Toyoda and M. Hori

    Journal ofPhysics:ConferenceSeries   Vol. 441   page: 012019   2013.6

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  47. Rapid Plasma Treatment of Polyimide for Adhesive and Durable Copper Film Deposition

    K. Usami, T. Ishijima, H. Toyoda

    Thin Solid Films   Vol. 521   page: 22-26   2012.10

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  48. High performance of carbon nanowall supported Pt catalyst for methanol electro-oxidation

    Chengxu Zhang , Jue Hu , Xiangke Wang , Xiaodong Zhang , Hirotaka Toyoda , Masaaki Nagatsu , Yuedong Meng

    CARBON   Vol. 50   page: 3731–3738   2012.4

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  49. Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source Reviewed

    Yasuhiro Hara , Keigo Takeda, Koji Yamakawa, Shoji Den, Hirotaka Toyoda, Makoto Sekine, and Masaru Hori

    Applied Physics Express   Vol. 5   page: 035801   2012.2

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  50. Characterization of a steam plasma jet at atmospheric pressure

    Guohua Ni, Peng Zhao, Cheng Cheng, Ye Song, Hirotaka Toyoda and Yuedong Meng

    Plasma Sources Sci. Technol.   Vol. 21   page: 015009 (12pp)   2012.1

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  51. Microphase separated hydroxide exchange membrane synthesis by a novel plasma copolymerization approach

    Chengxu Zhang, Jue Hua, Xiangke Wang, Hirotaka Toyoda, Masaaki Nagatsu, Xiaodong Zhang, Yuedong Meng

    Journal of Power Sources   Vol. 198   page: 112– 116   2011.10

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  52. Spatial Profile Measurement of SiH3 Radical Flux in SiH4/H2 Microwave Plasma by Modified Appearance Mass Spectrometry Reviewed

    Toshiyuki Kuroda, Masahira Ikeda, Tatsuo Ishijima, and Hirotaka Toyoda

    Jpn. J. Appl. Phys.   Vol. 50   page: 08JB05   2011.8

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  53. High-Performance Plasma-Polymerized Alkaline Anion-Exchange Membranes for Potential Application in Direct Alcohol Fuel Cells

    Chengxu Zhang, Jue Hu, Masaaki Nagatsu, Yuedong Meng, Wei Shen, Hirotaka Toyoda, Xingsheng Shu

    Plasma Process. Polym.   Vol. 8   page: 1024–1032   2011.8

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  54. Preparation of high-performance hydroxide exchange membrane by a novel ablation restriction plasma polymerization approach

    Chengxu Zhang, Jue Hu, Yuedong Meng, Masaaki Nagatsu and Hirotaka Toyoda

    Chem. Commun.   Vol. 47   page: 10230–10232   2011.5

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  55. Magnetron sputtering of platinum nanoparticles onto vertically aligned carbon nanofibers for electrocatalytic oxidation of methanol

    Chengxu Zhang, Jue Hu, Masaaki Nagatsu, Xingsheng Shu, Hirotaka Toyoda, Shidong Fang, Yuedong Meng

    Electrochimica Acta   Vol. 56   page: 6033– 6040   2011.5

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  56. Refractory Organic Solute Decomposition in Water using Microwave Plasma Reviewed

    Tatsuo Ishijima, Ryota Saito, Hiroyasu Sugihara, and Hirotaka Toyoda

    Transactions of the Materials Research Society of Japan   Vol. 36 ( 3 ) page: 475-478   2011.3

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  57. Influence of temperature and pressure on solute decomposition efficiency by microwave-excited plasma Reviewed

    R. Saito , H. Sugiura , T. Ishijima, H. Toyoda

    Current Applied Physics   Vol. 11 ( 5 ) page: S195-S198   2011.3

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  58. Pulsed plasma-polymerized alkaline anion-exchange membranes for potential application in direct alcohol fuel cells

    Chengxu Zhang, Jue Hu, Jie Cong, Yanping Zhao, Wei Shen, Hirotaka Toyoda, Masaaki Nagatsuc, Yuedong Menga

    Journal of Power Sources   Vol. 196   page: 5386–5393   2011.2

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  59. Effect of O Ion Beam Irradiation during RF-Magnetron Sputtering on Characteristics of CoFeB-MgO Magnetic Tunnel Junctions Reviewed

    Kazunaga Ono, Norikazu Ohshima, Kazuya Goto, Hiroki Yamamoto, Tadashi Morita, Keizo Kinoshita, Tatsuo Ishijima, and Hirotaka Toyoda

    Jpn. J. Appl. Phys. 50 (2011) 023001   Vol. 50   page: 023001   2011.2

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  60. Plasma-grafted alkaline anion-exchange membranes based on polyvinyl chloride for potential application in direct alcohol fuel cell

    Jue Hu, Chengxu Zhang, Jie Cong, Hirotaka Toyoda, Masaaki Nagatsu, Yuedong Meng

      Vol. 196   page: 4483–4490   2011.1

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  61. Novel Antenna Coupler Design for Production of Meter-ScaleHigh-Density Planar Surface Wave Plasma Reviewed

    Tatsuo Ishijima, Yasunori Nojiri, Hirotaka Toyoda, Hideo Sugai

      Vol. 49   page: 086002   2010.8

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  62. Efficient production of microwave bubble plasma in water for plasma processing in liquid Reviewed

    T. Ishijima, H. Sugiura, R. Saito, H. Toyoda, H. Sugai

    Plasma Sources Sci. Technol. 015010   Vol. 19   page: 015010   2010

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  63. Spatial Variation of Negative Oxygen Ion Energy Distribution in RF Magnetron Plasma with Oxide Target Reviewed

    T. Ishijima, K. Goto, N. Ohshima, K. Kinoshita, and H. Toyoda

    Jpn. J. Appl. Phys.   Vol. 48   page: 116004   2009.11

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  64. メタルスパッタリングプラズマの高度化とその最新動向

    豊田浩孝(分担執筆)

    電気学会技術報告書   Vol. 1162   page: pp.11~14   2009.7

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  65. Rapid treatment of polyimide film surfaces using high-density microwave plasma for enhancement of Cu layer adhesion Reviewed

    Y. Takagi , Y. Gunjo , H. Toyoda , H. Sugai

    Vacuum,   Vol. 83   page: 501–505   2008.10

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  66. Effect of Sputtering Deposition Process on Magnetic Properties on Magnetic Multilayers Reviewed

    Y. Maeda, Y. Suzuki, Y. Sakashita, S. Iwata, T. Kato, S. Tsunashima, H. Toyoda and H. Sugai

    Jpn. J. Appl. Phys.   Vol. 47 ( 10 ) page: 7879-7885   2008.10

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  67. Surface Modification of Fluorocarbon Polymer Film by High Density Microwave Plasma Reviewed

    K. Ishikawa, T. ishijima, K. Sasai, H. Toyoda and H. Sugai

    Transactions of the Materials Research Society of Japan   Vol. 33 ( 3 ) page: 683-686   2008.9

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  68. Characteristics of Low-energy Atom and Molecule Beams Generated by the Charge Exchange Reaction Reviewed

    Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Sekine, M. Hori

    J. Appl. Phys.   Vol. 103 ( 5 ) page: 053301 1-5   2008.5

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  69. Deposition of polycrystalline SiGe by surface wave excited plasma Reviewed

    Y. Takanishi, T. Okayasu, H. Toyoda, H. Sugai

    Thin Solid Films Vol., pp.   Vol. 516   page: 3554-3557   2008.4

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  70. スパッタプラズマ中の高エネルギー粒子計測と制御 Reviewed

    豊田浩孝

    真空   Vol. 51 ( 4 ) page: 258-263   2008.4

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  71. Suppression of Super High-Energy Species by VHF-DC Superimposed Magnetron Sputter Plasma Reviewed

    Y. Sakashita, Y. Takagi, T. Kato, H. Toyoda, S. Iwata, S. Tsunashima and H. Sugai

    Transaction of Materials Research Society of Japan   Vol. 32 ( 2 ) page: 481-484   2007.12

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  72. Suppression of High-Energy Backscattered Particles in Magnetron Plasma Reviewed

    Yusuke Takagi, Hirotaka Toyoda, and Hideo Sugai

    Jpn. J. Appl. Phys.   Vol. 46 ( 12 ) page: 7865-7869   2007.12

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  73. Tunable Low-energy Ar Fast Atom Source with Large Diameter Reviewed

    Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Hori

    Appl. Phys.Lett.   Vol. 91 ( 23 ) page: 23502 1-3   2007.12

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  74. High-Speed μc-Si Films Deposition and Large-Grain Poly-Si Films Deposition by Surface Wave Discharge Reviewed

    Y. Hotta, H. Toyoda and H. Sugai

    Thin Solid Films   Vol. 515   page: 4983-4987   2007.4

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  75. Role of atomic nitrogen during GaN growth by plasma-assisted molecular beam epitaxy revealed by appearance mass spectrometry Reviewed

    J. Osaka, M. Senthil Kumar, H. Toyoda, T. Ishijima, H. Sugai and T. Mizutani

    APPLIED PHYSICS LETTERS   Vol. 90   page: 172114 1-3   2007.4

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  76. Investigation of the ion dese non-uniformity caused by sheath-lens focusing effect on silicon wafers Reviewed

    N. Holtzer , E. Stamate, H. toyoda and H. Sugai

    Thin Solid Films   Vol. 515   page: 4887-4891   2007.4

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  77. Dependence of Giant Magnetoresitance in Cn/Cu Multilayers on Sputtering Condition Reviewed

    Changchuan Chen, Y. Suzuki, T. Kato. S. Iwata, S. Tsunashima, H. Toyoda, H. Sugai

    Japanese Juenal of Applied Physics   Vol. 45 ( 10B ) page: 8466-8468   2006.10

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  78. Generation processes of super-high-energy atoms and ions in magnetron sputtering plasma Reviewed

    Y. Takagi, Y. Sakashita, H. Toyoda, and H. Sugai

    Vacuum   Vol. 80 ( 6 ) page: 581-587   2006.3

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  79. バイアス光プローブによる反応性プラズマのEEDF測定 Reviewed

    豊田浩孝

    プラズマ・核融合学会誌   Vol. 81 ( 7 ) page: 496-501   2005

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  80. High-energy ions and atoms sputtered and reflected from magnetron source for deposition of magnetic thin films Reviewed

    H. Matsui, H. Toyoda and H. Sugai

    J. Vac. Sci. Technol. A   Vol. 23 ( 4 ) page: 671-675   2005

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  81. Evidence of Direct SiO2 Etching by Fluorocarbon Molecules under Ion Bombardment Reviewed

    N. Takada, H. Toyoda, I. Murakami and H. Sugai

    Journal of Applied Physics   Vol. 97 ( 1 ) page: 013534 1-5   2005

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  82. Evidence of Radical-free Etching of SiO2 by Fluorocarbon Molecules under Ion Bombardment Reviewed

    N. Takada, H. Toyoda and H. Sugai

    Transacitons of the Materials Research Society of Japan   Vol. 30 ( 1 ) page: 319-322   2005

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  83. Beam Study of the Si and SiO2 Etching Processes by Energetic Fluorocarbon Ions Reviewed

    H. Toyoda, H. Morishima, R. Fukute, Y. Hori, I .Murakami and H. Sugai

    J. Appl. Phys.   Vol. 95   page: 5172-5179   2004

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  84. Dramatic Reduction of Chemical Sputtering of Graphite under Intercalation of Lithium Reviewed

    H. Yagi, H. Toyoda, H. Sugai

    J. Nucl. Mater.   Vol. 313-316   page: 284-287   2003

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  85. Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductively-Coupled Plasma Reviewed

    T. Kojima, A. Ohishi, H. Toyoda, M. Goto, M. Nishitani and H. Sugai

    Jpn. J. Appl. Phys.   Vol. 40 ( 1 ) page: 322-325   2001

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  86. Rapid Diffusion of Lithium into Bulk Graphite in Lithium Conditioning Reviewed

    N. Itou, H. Toyoda, K. Morita and H. Sugai

    J. Nucl. Mater.   Vol. 290-293   page: 381-385   2001

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  87. Radial Density Profile of Microwave Plasma for Wall Conditioning in a Purely Toroidal Magnetic Field Reviewed

    H. Sugai, H. Toyoda, J. Ihde and J. Winter

    J. Plasma and Fusion Research   Vol. 77 ( 2 ) page: 130-136   2001

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  88. Electron Energy Distribution Function and the Influence on Fluorocarbon Plasma Chemistry Reviewed

    H. Sugai, I. Ghanashev, M. Hosokawa, K. Mizuno, K. Nakamura, H. Toyoda and K. Yamauchi

    Plasma Sources Sci. Technol   Vol. 10   page: 378-385   2001

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  89. Measurement of Electron-Impact-Dissociation Cross Section for Neutral Products Reviewed

    H. Sugai, H. Toyoda

    AIP Conf. Proc.   Vol. 500   page: 349-358   2000

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  90. Laboratory Experiment on Lithium Chemistry and its Application to Effective Wall Conditioning Reviewed

    S. Kato, M. Watanabe, H. Toyoda, H. Sugai

    J. Nucl. Mater.   Vol. 266-269   page: 406-411   1999

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  91. PSI in Fusion Devices -Function and Perspective of Wall Conditioning

    J. Plasma and Fusion Research   Vol. 75 ( 4 ) page: 403-408   1999

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  92. Lower Temperature Deposition of Poly-Crystalline Silicon Films from a Modified Inductively-Coupled Silane Plasma

    K. Goshima, H. Toyoda, T. Kojima, M. Nishitani, M. Kitagawa, H. Yamazoe, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 38 ( 6A ) page: 3655-3659   1999

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  93. High Sensitivity Optical Absorption Spectroscopy by Optical Multichannel Analyzer Reviewed

    OYO-BUTURI   Vol. 68 ( 5 ) page: 551-552   1999

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  94. Beam Experiments on Radical Production in Gas Phase and on Solid Surfaces Reviewed

    J. Plasma and Fusion Research   Vol. 75 ( 7 ) page: 779-784   1999

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  95. Mechanism of Carbon Impurity Suppression by Lithium Conditioning Reviewed

    J. Plasma and Fusion Research   Vol. 75 ( 4 ) page: 459-466   1999

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  96. Cross Sections for Electron-Impact Dissociation of Alternative Etching Gas, C3HF70 Reviewed

    H. Tanaka, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 37 ( 9A ) page: 5053-5059   1998

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  97. Observation of Surface Dissociation of Low-energy Polyatomic Ions Relevant to Plasma Processing

    H. Sugai, Y. Mitsuoka, H. Toyoda

    J. Vac. Sci. Technol.   Vol. 16 ( 1 ) page: 290-293   1998

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  98. Basic Experiments on in-situ Magnetized Boronization by Electron Cycrotron Resonance Discharges Reviewed

    H. Kokura, K. Sasaki, H. Toyoda, T. Mizuuchi, K. Kondo, F. Sano, T. Obiki, H. Sugai

    J. Nucl. Mater.   Vol. 241-243   page: 1217-1221   1997

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  99. Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasmas Reviewed

    M. Goto, H. Toyoda, M. Kitagawa, T. Hirao, H. Sugai

    Japanese Journal of Applied Physics   Vol. 36 ( 6A ) page: 3714-3720   1997

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  100. Cross Section Measurements for Electron-Impact Dissociation of C4F8 into Neutral and Ionic Radicals Reviewed

    H. Toyoda, M. Iio, H. Sugai

    Japanese Journal of Applied Physics   Vol. 36 ( 6A ) page: 3730-3735   1997

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  101. Laboratory Expercment on hydrogen and impurity behaviors in lithium-deposited environment

    H. Toyoda, M. Watanabe, H. Sugai

    Journal of Nuclear Materials   Vol. 241-243   page: 1031-1035   1997

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  102. Diagnostics for Advanced Plasma Control of Materials Processing Reviewed

    H. Sugai, T.H. Ahn, I. Ghanashev, M. Goto, H. Toyoda, N. Nagatsu, K. Nakamura, K. Suzuki

    Plasma Phys. Control. Fusion   Vol. 39   page: A445-458   1997

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  103. Lithium Wall Conditioning for Fuel and Impurity Control Reviewed

    H. Sugai, M. Ohori, H. Toyoda

    Vacuum   Vol. 47 ( 6-9 ) page: 981-984   1996

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  104. Lower Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductivety Coupled Silane Plasma

    M. Goto, H. Toyoda, M. Kitagawa, T. Hirao, H. Sugai

    Japanese Journal of Applied Physics   Vol. 35 ( 8A ) page: L1009-1011   1996

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  105. Dissociative Ion Yields on Metal Surfaces Bombarded with Low-Energy Fluorocarbon Ions. Reviewed

    Y. Mitsuoka, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 34 ( 11A ) page: L1486-1489   1995

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  106. Wall Conditioning with Lithium Evaporation Reviewed

    H. Sugai, H. Toyoda, K. Nakamura, K. Furuta, M. Ohori, K. Toi, S. Hirokura, K. Sato

    J. Nucl. Mater.   Vol. 220-222   page: 254   1995

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  107. Simple Direct Monitoring of SiH3 Radical and Particulates in a Silane Plasma with Ultra-Violet Transmission Spectroscopy Reviewed

    H. Toyoda, M. Goto, M. Kitagawa, T. Hirao, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 34 ( 4A ) page: L448-451   1995

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  108. A Biased Optical Probe Method for Measurements of Electron Enaergy Distribution in a Plasma

    H. Sugai, H. Toyoda, K. Nakano, N. Isomura

    Journal of Plasma Sources, Science and Technoloy   Vol. 4   page: 366372   1995

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  109. Boronization Study for Application to Large Helical Device

    N. Noda, A. Sagara, H. Yamada, H. Toyoda, H. Sugai, Y. Kubota, N. Inoue, K. Akaishi,, et al.

    J. Nucl. Mater.   Vol. 220-222   page: 623-626   1995

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  110. Relative Cross Sections for Electron-Impact Dissociation of SF6 into SFx(x=1-3) Neutral Radicals Reviewed

    M. Iio, M. Goto, H. Toyoda, H. Sugai

    Contribution to Plasma Physics   Vol. 35 ( 4-5 ) page: 405-413   1995

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  111. Absolute Cross Sections for the Electron-Impact Dissociation of CF4 and CHF3 into the CFx (x=1-3) Neutral Radicals Reviewed

    H. Sugai, H. Toyoda, T. Nakano, M. Goto

    Contribution to Plasma Physics   Vol. 35 ( 4-5 ) page: 415-420   1995

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  112. CCH3 and CH Densities in a Diamond Growth DC Discharge Reviewed

    K.L. Menningen, M.A. Childs, H. Toyoda, Y. Ueda, L.W. Anderson, J.E. .Lawler

    Contribution to Plasma Physics   Vol. 35 ( 4-5 ) page: 359-373   1995

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  113. Observation of Ion Scattering from Metals Surfaces Bombarded with Low-Energy Hydrocarbon Ions Reviewed

    Y. Mitsuoka, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 34 ( 4B ) page: L516-519   1995

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    Language:English   Publishing type:Research paper (scientific journal)  

  114. Hydrogen Content and Isotope Exchange in Boronization Reviewed

    M. Yamage, H. Sugai, T. Saito, H. Toyoda, M. Saidoh, N. Ogiwara, T. Mizuuchi, F. Sano, et al.

    J. Nucl. Mater.   Vol. 220-222   page: 743-747   1995

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  115. Measurement of CH3 and CH Densities in a Diamond Growth d. c. Discharge Reviewed

    M.A. Childs, K.L. Menningen, H. Toyoda, L.W. Anderson, J.E. Lawler

    Europhys. Lett.   Vol. 25 ( 9 ) page: 729-734   1994

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  116. Evaluation of a Substrate Pretreatment for Hot Filament CVD Reviewed

    K.L. Menningen, M.A. Childs, H. Toyoda, L.W. Anderson, J.E. Lawler

    J. Mater. Res.   Vol. 9 ( 4 ) page: 915-920   1994

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    Language:English   Publishing type:Research paper (scientific journal)  

  117. Cross Section Measurements for Electron-Impact Dissociation of CHF3 into Neutral and Ionic Radicals, Reviewed

    M. Goto, K. Nakamura, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys.,   Vol. 33 ( 6A ) page: 3602-3607   1994

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  118. Measurement of Absolute Hydrogen Dissociation in a Diamond Deposition System Reviewed

    M.A. Childs, K.L. Menningen, H. Toyoda, Y. Ueda, L.W. Anderson, J.E. Lawler

    Phys. Lett. A   Vol. 194   page: 119123   1994

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    Language:English   Publishing type:Research paper (scientific journal)  

  119. Ultraviolet Spectroscopy of Gaseous Spacies in a Hot Filament Diamond Deposition System When C2H2 and H2 are the Input Gases. Reviewed

    H. Toyoda, M.A. Childs, K.L. Menningen, L.W. Anderson, J.E. Lawler

    J. Appl. Phys.   Vol. 75 ( 6 ) page: 3142-3150   1994

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  120. Absolute Radical Density Measurements in a CH4-H2 d.c. Discharge Reviewed

    K.L. Menningen, M.A. Childs, H. Toyoda, Y. Ueda, L.W. Anderson, J.E. Lawler

    Diamond and Related Mater   Vol. 3   page: 422-425   1994

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  121. Plasma-assisted Surface Modification and Radical Diagnostics Reviewed

    H. Sugai, M. Yamage, Y. Hikosaka, T. Nakano, H. Toyoda

    J. Nucl. Mater   Vol. 200   page: 403-411   1993

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  122. Methyl Radical Production in a Hot Filament CVD System Reviewed

    K.L. Menningen, M.A. Childs, P. Chevako, H. Toyoda, L.W. Anderson, J.E. Lawler

    Chem. Phys. Lett   Vol. 204 ( 5-6 ) page: 573-577   1993

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  123. Spatial Distribution and Surface Loss of CF3 and CF2 Radicals in a CF4 Etching Plasma Reviewed

    Y. Hikosaka, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys   Vol. 32 ( 3A ) page: L353-L356   1993

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  124. Drastic Change in CF2 and CF3 Kinetics Induced by Hydrogen Addition into CF4 Etching Plasma Reviewed

    Y. Hikosaka, H. Toyoda, H. Sugai

    Japanese J. Appl. Phys   Vol. 32 ( 5A ) page: L690-L693   1993

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  125. Appearance Mass Spectrometry of Neutral Radicals in Radio Frequency Plasmas Reviewed

    H. Sugai, H. Toyoda

    Journal of Vacuum Science and Technology   Vol. A10 ( 4 ) page: 1193-12004   1992

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  126. In-situ Boron Nitride Coating and Comparison with Existing Boronization Reviewed

    M. Yamage, T. Ejima, H. Toyoda, H. Sugai

    J. Nucl. Mater.   Vol. 196-198   page: 618-621   1992

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  127. プラズマ界面における異常発光とフラグメンテーション Reviewed

    片寄恭一, 豊田浩孝, 菅井秀郎

    核融合研究   Vol. 67 ( 1 ) page: 51-61   1992

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  128. High Speed Cleaning of Boronized Wall with a CF4 Containing Plasma Reviewed

    H. Toyoda, A. Hanami, M. Yamage, H. Sugai

    Japanese Journal of Applied Physics   Vol. 30 ( 3B ) page: L514-517   1991

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  129. Electron Impact Dissociation of Methane into CH3 and CH2 Radicals, II. Absolute Cross Sections Reviewed

    T. Nakano, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 30 ( 11A ) page: 2912-2915   1991

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  130. Electron Impact Dissociation of Methane into CH3 and CH2 Radicals, I. Relative Cross Sections Reviewed

    T. Nakano, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 30 ( 11A ) page: 2908-2911   1991

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  131. Interactions of Bulk-Boronized Graphites with Deuterium Plasmas in the PISCES-B Facility Reviewed

    Y. Hirooka, R.W. Conn, H. Toyoda, H. Sugai et al.

    Fusion Technol   Vol. 19   page: 2059-2069   1991

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  132. Spatial Distribution of CH2 and CH2 Radicals in a Methane RF Discharge Reviewed

    H. Sugai, H. Kojima, A. Ishida, H. Toyoda

    Applied Physics Letters   Vol. 56 ( 26 ) page: 2616-2618   1990

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  133. Rapid Cleaning of Boronized Walls with a Chlorine/Hydrogen Glow Discharge Reviewed

    H. Toyoda, A. Hanami, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 29 ( 7 ) page: 1322-1323   1990

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  134. RF Plasma Production at Ultralow Pressure with Surface Magnetic Confinement Reviewed

    T. Shirakawa, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 29 ( 6 ) page: L1015-1018   1990

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  135. Ion-Induced Radical Production on Surfaces during Deposition of Hydrogenated Amorphous Carbon Reviewed

    Y. Yamashita, K. Katayose, H. Toyoda, H. Sugai

    Journal of Applied Physics   Vol. 68 ( 7 ) page: 3735-3737   1990

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  136. Effects of Carbon Wall on the Bahaviour of Heliotron-E Plasmas Reviewed

    N. Noda, T. Mizuuchi, H. Toyoda, S. Yoshida, H. Sugai et al.

    J. Nucl. Mater.   Vol. 162-164   page: 769-775   1989

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  137. Hydrogen Release and Retention Dynamics of Amorphous Carbon Layers Exposed to a Hydrogen/Helium Plasma Reviewed

    S. Yoshida, H. Sugai, H. Toyoda

    Jpn. J. Appl. Phys   Vol. 28 ( 6 ) page: 1101-1108   1989

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  138. Genaration of a Large Electron Beam for Plasma Processing, Reviewed

    H. Sugai, N. Yabuoshi, H. Toyoda

    Jpn. J. Appl. Phys.   Vol. 28 ( 5 ) page: L868-870   1989

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  139. Hydrogen Recycling Control by Helium Ion Bombardment onto Carbonized Surfaces Reviewed

    H. Sugai, H. Toyoda, S. Ohshita, S. Yoshida, A. Sagara

    J. Nucl. Meter.   Vol. 162-164   page: 1035-1039   1989

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  140. Carbonization Experiment by ECR Discharge in JIPPT-IIU Reviewed

    Y.Sakamoto, H. Amemiya, H. Toyoda, H. Sugai et al.

    J. Nucl. Mater.   Vol. 162-164   page: 783-786   1989

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  141. Mass Spectroscopic Investigation of the CH3 Radicals in a Methane RF Discharge Reviewed

    H. Toyoda, H. Kojima, H. Sugai

    Applied Physics Letters   Vol. 54 ( 16 ) page: 1507-1509   1989

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  142. Hydrogen Retention and Release Dynamics of Amorphous Carbon Filsm Exposed to a Hydrogen Plasma Reviewed

    H. Sugai, S. Yoshida, H. Toyoda

    Applied Physics Letters   Vol. 54 ( 15 ) page: 1412-1414   1989

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  143. In situ Boron Coating and its Removal by Glow Discharge Processes Reviewed

    H. Toyoda, T. Isozumi, H. Sugai, T. Okuda

    Journal of Nuclear Materials   Vol. 162-164   page: 732-736   1989

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  144. Observation of CH2 Radical and Comparison with CH3 Radical in a RF Methane Discharge Reviewed

    H. Kojima, H. Toyoda, H. Sugai

    Applied Physics Letters   Vol. 55 ( 13 ) page: 1292-1294   1989

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  145. Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge Reviewed

    Y. Yamashita, H. Toyoda, H. Sugai

    Jpn. J. Appl. Phys.   Vol. 28 ( 9 ) page: L1647-1650   1989

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  146. Control of Hydrogen Content of Boron Films Produced by a DC Toroidal Discharge Reviewed

    H. Toyoda, H. Sugai, T. Isozumi, T. Okuda

    Applied Physics Letters   Vol. 51 ( 11 ) page: 798-800   1987

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  147. イオン束を制御した水素化アモルファスシリコンの生成と成膜過程 Reviewed

    豊田浩孝, 菅井秀郎, 吉田 明, 奥田孝美

    応用物理   Vol. 55 ( 7 ) page: 718-726   1986

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  148. Hydrogenated Amorphous Silicon Formation by Flux Control and Hydrogen Effects on the Growth Mechanism Reviewed

    H. Toyoda, H. Sugai, K. Kato, A. Yoshida, T. Okuda

    Appl. Phys. Lett.   Vol. 48 ( 24 ) page: 1648-1650   1986

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  149. Ion and Radical Contributions to a Si : H Film Formation in a DC Toroidal Discharge Reviewed

    H. Sugai, H. Toyoda, A. Yoshida, T. Okuda

    Applied Physics Letters   Vol. 46 ( 11 ) page: 1048-1050   1985

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  150. プラズマイオン分析器の開発 Reviewed

    菅井秀郎, 小島啓明, 森 直生, 豊田浩孝, 奥田孝美

    核融合研究   Vol. 51 ( 3 ) page: 221-240   1984

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  151. A Mass Spectrometer for Boundary Plasma Diagnostics Reviewed

    H. Kojima, H. Sugai, T. Mori, H. Toyoda, T. Okuda

    J. Nucl. Mater   Vol. 128-129   page: 965-968   1984

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▼display all

Books 4

  1. RF Power Semiconductor Generator Application in Heating and Energy Utilization

    Hirotaka Toyoda( Role: Joint author)

    2020  ( ISBN:978-981-15-3547-5

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    Language:English Book type:Scholarly book

  2. メタルスパッタリングプラズマの高度化とその最新動向

    ( Role: Joint author)

    電気学会技術報告書 第1162号2009年7月 pp.11~14  2009.7 

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    Language:Japanese

  3. スパッタ実務(Q&A集)

    ( Role: Joint author)

    ㈱技術情報協会  2009.1 

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    Language:Japanese

  4. 最新プラズマプロセスのモニタリング技術と解析・制御

    豊田浩孝( Role: Joint author)

    リアライズ社  1997 

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    Language:Japanese

Presentations 842

  1. Large volume liquid treatment with high-density microwave plasma Invited International conference

    Hirotaka Toyoda

    Plasma Thin Film International Meeting (PLATHINUM2021)  2021.9.13 

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    Event date: 2021.9

    Language:English   Presentation type:Oral presentation (keynote)  

    Venue:Virtual Meeting(France)  

  2. High-energy Negative Ions in Sputtering Plasma - Energy Distribution and Its Spatial Variation - Invited International conference

    Hirotaka Toyoda

    3rd Asia-Pacific Conference on Plasma Physics 

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    Event date: 2019.11

    Language:English   Presentation type:Oral presentation (keynote)  

    Country:China  

  3. 高密度マイクロ波プラズマを用いた液体処理とナノ粒子合成への応用 Invited

    豊田浩孝

    第73回 プラズマが拓くものづくり研究会  2024.6.25  名古屋産業振興公社

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    Event date: 2024.6

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:名古屋市工業研究所   Country:Japan  

  4. Plasma processing: Key technology for the next-generation semiconductor device fabrication Invited International conference

    Hirotaka Toyoda

    The 1ST Global Forum and International Workshop on Industrial Plasma Plasma Processes and Diagnostics 2024  2024.5.9 

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    Event date: 2024.5

    Language:English   Presentation type:Oral presentation (keynote)  

    Venue:Indian Institute of Technology Delhi   Country:India  

  5. Angular distribution measurement of high-energy argon neutrals and ions incident on RF electrode of a capacitively-coupled plasma Invited International conference

    H. Toyoda, S. Kawamura, D.H. Kim, H. Suzuki, M. Moriyama, K. Tamura, S. Kuboi, D. Iino, H. Fukumizu, K. Kurihara

    Frontiers in Low Temperature Plasma Diagnostics  2024.5.1 

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    Event date: 2024.4 - 2024.5

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Castle Hotel Liblice near Prague   Country:Czech Republic  

  6. 二周波重畳容量結合型プラズマにおけるRF電極入射高エネルギー粒子の角度分布評価 Invited

    市川景太,Manh Hung Chu,森山誠,鈴木陽香, 飯野大輝,福水裕之,栗原一彰,豊田浩孝

    第71回応用物理学会春季講演会  2024.3  応用物理学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:東京 東京都市大学   Country:Japan  

  7. On-Off及びHigh-Low変調VHFプラズマ照射下のキャピラリープレート底部の電荷蓄積におけるデューティー比の影響

    赤塚 勇大,鈴木 陽香,森山 誠,飯野 大輝, 福水 裕之,栗原 一彰,豊田 浩孝

    第71回応用物理学会春季講演会  2024.3  応用物理学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京 東京都市大学   Country:Japan  

  8. 二周波重畳容量結合型プラズマにおけるイオン角度分布のエネルギー分解計測

    川村 隼也,Kim Dohan, 鈴木 陽香,飯野 大輝,福水 裕之,栗原 一彰,豊田 浩孝

    第71回応用物理学会春季講演会  2024.3  応用物理学会

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京 東京都市大学   Country:Japan  

  9. Plasma Science: achievements and future impact on semiconductor technologies Invited International conference

    Hirotaka Toyoda

    Nano Fabrication Technologies for Semiconductor Industry and Quantum Computing  2024.3.15  Japan Alumni and Researcher Assembly

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    Event date: 2024.3

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Lyngby, Denmark   Country:Denmark  

  10. Interaction of liquid tin with hydrogen plasma International conference

    Hirotaka Toyoda, Kota Tamura, Haruka Suzuki, Junichi Miyazawa, Suguru Masuzaki, Masayuki Tokitani, Yukinori Hamaji

    US-Japan and International Workshop on Power and Particle Control in DEMO Fusion Reactor by Liquid Metal Plasma-Facing Components  2024.3.7  National Institute for Fusion Science

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    Event date: 2024.3

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Toki, Gifu   Country:Japan  

  11. 高アスペクト比エッチングプラズマにおけるイオン挙動 Invited

    豊田浩孝

    サタデーモーニング講座  2023.12.9  名古屋大学低温プラズマ科学研究センター

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    Event date: 2023.12

    Language:Japanese   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:名古屋   Country:Japan  

  12. 気体流による減圧形成を応⽤した放電易化におけるノズル電極の構造検討

    小川泰那, 中林賢二, 鈴木陽香, 豊田浩孝

    第40回 プラズマ・核融合学会 年会  2023.11.29  プラズマ・核融合学会

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:盛岡市 岩手県民情報交流センター   Country:Japan  

  13. Production and Application of High-density Microwave Plasma in Contact with Flowing Liquid Invited International conference

    Haruka Suzuki, Hirotaka Toyoda

    13th Asia European International Conference on Plasma Surface Engineering  2023.11 

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    Event date: 2023.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Pusan Korea   Country:Korea, Republic of  

  14. 高速ガス流を用いた弱減圧マイクロ波プラズマ生成にむけた減圧形成シミュレーション

    中林 賢二,小川 泰那,鈴木 陽香, 豊田 浩孝

    令和5年度電気・電子情報関係学会東海支部連合講演会  2023.8.29 

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    Event date: 2023.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:豊橋技術科学大学   Country:Japan  

  15. 二周波容量結合型Ar/C4F8/O2パルスプラズマの電子密度時分解計測

    赤塚 勇大,加藤 閣人,久保井 宗一, 鈴木 陽香, 豊田 浩孝

    令和5年度電気・電子情報関係学会東海支部連合講演会  2023.8.29 

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    Event date: 2023.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:豊橋技術科学大学   Country:Japan  

  16. トリチウムプラズマ照射による固体・液体スズ中水素分布の高精度評価

    豊田浩孝

    核融合科学研究所-富山大学研究推進機構水素同位体科学研究センター 双方向型共同研究 研究会  2023.7.17 

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    Event date: 2023.7

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:富山大学    Country:Japan  

  17. Time-dependent measurement of ion composition in a capacitively-coupled Ar/C4F8/O2 power-modulated VHF plasma International conference

    H. Toyoda, H. Kato, Y. Seki, S. Kuboi, Y. Akatsuka, and H. Suzuki

    International Conference on Phenomena of Ionized Gases  2023.7.10 

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    Event date: 2023.7

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Egmond aan Zee, The Netherlands   Country:Netherlands  

  18. Influence of Pulse-off Time on Time-varying Ion Composition in a Pulse-operated Ar/C4F8/O2 Dual-frequency Capacitively Coupled Plasma International conference

    Shuichi Kuboi, Haruhito Kato, Yuto Seki, Yudai Akatsuka, Haruka Suzuki and Hirotaka Toyoda

    International Symposium on Plasma Chemistry  2023.5.22 

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    Event date: 2023.5

    Language:English   Presentation type:Poster presentation  

    Venue:Miyako-Messe, Kyoto   Country:Japan  

  19. 高アスペクト比加工におけるチャージング現象 Invited

    豊田浩孝

    グリーンDXプラズマコンソーシアム2023年度第1回講習会  2023.4.21  名古屋大学低温プラズマ科学研究センター

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    Event date: 2023.4

    Language:Japanese   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:名古屋大学   Country:Japan  

  20. 二周波重畳容量結合型プラズマにおけるシース内衝突がRF電極入射粒子の角度分布に及ぼす影響

    川村 隼也,市川 景太,鈴木 陽香, 飯野大輝,福水裕之,栗原一彰,豊田浩孝

    第70回応用物理学会春季講演会  2023.3.17  応用物理学会

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京   Country:Japan  

  21. 旋回流による流動液体プラズマ処理装置の放電部の電極保護

    柚木 健吾,鈴木 陽香,笹井 建典,増崎 貴,林 浩 己,村瀬 尊則,中川 翔,柳原 悠人,豊田 浩孝

    第70回応用物理学会春季講演会  2023.3.18  応用物理学会

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京   Country:Japan  

  22. 発光イメージをもとにしたプラズマ構造の評価

    原田健汰, 久蔵学, 大館暁, 豊田浩孝

    第70回応用物理学会春季講演会  2023.3.16  応用物理学会

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京   Country:Japan  

  23. 二周波容量結合型Ar/C4F8/O2プラズマにおける電力変調方式がイオン組成に与える影響

    加藤閣人,関悠斗,久保井宗一,鈴木陽香, 豊田浩孝

    第70回応用物理学会春季講演会  2023.3.17  応用物理学会

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京   Country:Japan  

  24. 高速ガス流を用いた減圧形成によるマイクロ波放電の易化

    小川泰那,岩田悠輝,鈴木陽香,豊田浩孝

    第70回応用物理学会春季講演会  2023.3.15  応用物理学会

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    Event date: 2023.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東京   Country:Japan  

  25. 大気圧プラズマによるラジカル生成に及ぼす酸素ガス混合の効果

    松浦寛人、トラントラングエン、岡本陽太、胡敏、仲野匠、岩田悠輝、鈴木陽香、豊田浩孝

    第70回応用物理学会春季講演会  2023.3.15  応用物理学会

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京   Country:Japan  

  26. C2F4の電子物性とPTFEの生成機構

    林俊雄、石川健治、関根誠、堀勝、兒玉直人,豊田浩孝

    第70回応用物理学会春季講演会  2023.3.17  応用物理学会

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京   Country:Japan  

  27. Time dependent nanoparticle density measurement in a liquid-flow plasma process International conference

    Kengo Yunoki, Haruka Suzuki, Kensuke Sasai and Hirotaka Toyoda

    ISPlasma2023/IC-PLANTS2023  2023.3.6 

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    Event date: 2023.3

    Language:English   Presentation type:Poster presentation  

    Venue:Gifu, Japan   Country:Japan  

  28. Microwave plasma production under air-flow-induced reduced pressure International conference

    Taina Ogawa, Yuki Iwata, Haruka Suzuki and Hirotaka Toyoda

    ISPlasma2023/IC-PLANTS2023  2023.3.6 

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    Event date: 2023.3

    Language:English   Presentation type:Poster presentation  

    Venue:Gifu, Japan   Country:Japan  

  29. Time Variation of Ion Composition in Dual-frequency Capacitively-Coupled Ar/C4F8/O2 Pulsed Plasma International conference

    Haruhito Kato, Yuto Seki, Shuichi Kuboi, Haruka Suzuki, and Hirotaka Toyoda

    ISPlasma2023/IC-PLANTS2023  2023.3.6 

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    Event date: 2023.3

    Language:English   Presentation type:Poster presentation  

    Venue:Gifu, Japan   Country:Japan  

  30. Power absorption of high negative pulse power to an electron cyclotron plasma International conference

    Ikumi Hamaguchi, Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

    ISPlasma2023/IC-PLANTS2023  2023.3.6 

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    Event date: 2023.3

    Language:English   Presentation type:Poster presentation  

    Venue:Gifu, Japan   Country:Japan  

  31. Development of a tomography calculation code for three-dimensional emission profile reconstruction International conference

    Kenta Harada, Manabu Kyuzo, Satoshi Ohdachi, Hirotaka Toyoda

    ISPlasma2023/IC-PLANTS2023  2023.3.6 

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    Event date: 2023.3

    Language:English   Presentation type:Poster presentation  

    Venue:Gifu, Japan   Country:Japan  

  32. Atomic composition of droplet ejected from liquidized Sn-Bi-Li-Er alloy under hydrogen plasma exposure International conference

    Kota Tamura, Junichi Miyazawa, Suguru Masuzaki, Masayuki Tokitani, Yukinori Hamaji, Hirotaka Toyoda

    ISPlasma2023/IC-PLANTS2023  2023.3.6 

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    Event date: 2023.3

    Language:English   Presentation type:Poster presentation  

    Venue:Gifu, Japan   Country:Japan  

  33. Hydrogen bubble formation on liquidized Sn-Bi-Li-Er Alloy under H2 Plasma Exposure International conference

    Hirotaka Toyoda

    US-Japan and International Workshop on Power and Particle Control in DEMO Fusion Reactor by Liquid Metal Plasma-Facing Components  2023.3.1 

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    Event date: 2023.2 - 2023.3

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Princeton Plasma Physics Lab., NJ, USA   Country:United States  

  34. 未来社会を担うクリーンエネルギー生成研究の最先端 Invited

    豊田浩孝

    グリーンDXプラズマコンソーシアム第4回講習会  2023.2.24  名古屋大学低温プラズマ科学研究センター

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    Event date: 2023.2

    Language:Japanese   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:名古屋大学   Country:Japan  

  35. Sn-Bi-Li-Er液体合金への水素プラズマ照射における気泡中への水素吸蔵量定量評価

    豊田浩孝

    2023.2.17 

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    Event date: 2023.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:土岐市   Country:Japan  

  36. パルス変調Ar/C4F8/O2二周波容量結合型プラズマにおけるイオン組成時間変化のメカニズム Invited

    久保井宗一,加藤閣人,関悠斗, 鈴木陽香, 豊田浩孝

    第242回シリコンテクノロジー分科会研究集会  2023.2.17  応用物理学会シリコンテクノロジー分科会

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    Event date: 2023.2

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:東京大学本郷キャンパス   Country:Japan  

  37. Quantitative Evaluation of Hydrogen Accumulation into Bubble Occurred in Liquidized Sn-Bi-Li-Er under H2 Plasma Exposure International conference

    Kota Tamura

    The 7th INTERNATIONAL SYMPOSIUM ON LIQUID METALS APPLICATIONS FOR FUSION 

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    Event date: 2022.12

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Kasugai, Japan   Country:Japan  

  38. Imaging measurement of angular distribution of high-speed particles from a dual-frequency capacitively-coupled plasma incident on an RF electrode International conference

    K. Ichikawa, H. Suzuki, D. Iino, H. Fukumizu, K. Kurihara and H. Toyoda

    43rd International Symposium on Dry Process  2022.11.24  Japan Society of Applied Physics

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    Event date: 2022.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Osaka International Convention Center   Country:Japan  

  39. Time-resolved measurement of Ionic composition change in Pulse-modulated Ar/C4F8/O2 DF-CCP International conference

    Shuichi Kuboi, Haruhito Kato, Yuto Seki, Haruka Suzuki, Hirotaka Toyoda

    43rd International Symposium on Dry Process  2022.11.24  Japan Society of Applied Physics

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    Event date: 2022.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Osaka International Convention Center   Country:Japan  

  40. マイクロ波プラズマ技術による大気圧プラズマ生成と液体処理 Invited

    豊田浩孝

    第16回日本電磁波エネルギー応用学会  2022.10.14  日本電磁波エネルギー応用学会

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    Event date: 2022.10

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン   Country:Japan  

  41. Microwave plasma source development and applications from low pressure to atmospheric pressure Invited International conference

    2022.10.13  Association of Asia Pacific Physical Societies, Division of Plasma Physics

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    Event date: 2022.10

    Language:English   Presentation type:Oral presentation (keynote)  

    Venue:Remote  

  42. Continuous liquid treatment by high-density microwave plasma in flowing liquid Invited International conference

    Haruka Suzuki, Hirotaka Toyoda

    11th International Conference on Reactive Plasmas/75th Annual Gaseous Electronics Conference  2022.10.6  Japan Society of Applied Physics

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    Event date: 2022.10

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Sendai International Ceneter, Sendai   Country:Japan  

  43. 二周波容量結合型Ar/C4F8/O2プラズマのパルス運転がイオン組成に及ぼす影響

    関 悠斗、加藤 閣人、久保井 宗一,鈴木 陽香, 豊田浩孝

    2022年第83回応用物理学会秋季学術講演会  2022.9.22  応用物理学会

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東北大学川内北キャンパス   Country:Japan  

  44. 二周波重畳容量結合型プラズマからRF電極へ入射する高速粒子入射角度分布のイメージング計測 Invited

    市川 景太,鈴木 陽香, 飯野大輝, 福水裕之,栗原一彰,豊田浩孝

    2022年第83回応用物理学会秋季学術講演会  2022.9.22  応用物理学会

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:東北大学川内北キャンパス   Country:Japan  

  45. 化学プローブを用いた長尺大気圧プラズマ生成活性ラジカルの可視化

    松浦寛人、トラントラングエン、胡敏、仲野匠、岩田悠揮、鈴木陽香、豊田浩孝

    2022年第83回応用物理学会秋季学術講演会  2022.9.20  応用物理学会

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東北大学川内北キャンパス   Country:Japan  

  46. Angular distribution of high-energy species on RF-biased electrode of a capacitively-coupled plasma Invited International conference

    Hirotaka Toyoda

    cLPS Global Plasma Forum  2022.9.8  Center for Low-temperature Plasma Sciences

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    Event date: 2022.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Nagoya University   Country:Japan  

  47. 二周波容量結合型Ar/C4F8/O2パルスプラズマ中のイオン時分解計測

    加藤 閣人, 関 悠斗,久保井 宗一, 鈴木 陽香, 豊田 浩孝

    令和4年度電気・電子情報関係学会東海支部連合講演会  2022.8.29 

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    Event date: 2022.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学 (オンライン)   Country:Japan  

  48. Experimental Study on boron distribution and transport at plasma-facing components during impurity powder dropping International coauthorship International conference

    T. Kawate, N. Ashikawa, M. Goto, T. Oishi, Y. Kawamoto, H. Toyoda, M. Shoji, G. Kawamura, S. Masuzaki, F. Nespoli, E.P. Gilson, R. Lunsford, C. Suzuki, A. Nagy, D. Gates

    15th Asia Pacific Physics Conference  Association of Asia Pacific Physical Societies

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    Event date: 2022.8

    Language:English   Presentation type:Oral presentation (general)  

    Venue:On-line  

  49. 二周波重畳容量結合型プラズマから電極へ入射する高速粒子のイメージング法を用いた角度分布計測

    市川景太, 鈴木陽香, 豊田浩孝

    第69回応用物理学会春期学術講演会   2022.3.25 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  50. 水シールド環境下でのマイクロ波励起水蒸気プラズマの生成と応用 Invited

    鈴木陽香、豊田浩孝

    第69回応用物理学会春期学術講演会   2022.3.23 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Symposium, workshop panel (nominated)  

  51. Time-resolved measurements of ions in a dual-frequency capacitively-coupled Ar/C4F8/O2 pulsed plasma by mass spectrometry

    Yuto Seki, Haruhito Kato, Schuichi Kuboi, Haruka Suzuki, Hirotaka Toyoda

    2022.3.25 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  52. Increase in plasma density by applying negative pulse bias voltage on a substrate stage in an electron cyclotron resonance plasma

    Ikumi Hamaguchi, Hansin Bae, Kensuke Sasai2, Haruka Suzuki, and Hirotaka Toyoda

    2022.3.22 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  53. Surface analysis of polyimide film treated by Ar/O2 atmospheric-pressure microwave plasma

    Y. Iwata, T. Ogasawara, H. Suzuki, H. Toyoda

    2022.3.26 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Poster presentation  

  54. 高周波容量結合型プラズマにおける高アスペクト比キャピラリーホール底部のチャージアップ現象 Invited

    豊田 浩孝

    応用物理学会シリコンテクノロジー分科会第234回研究集会  2022.3.15 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  55. Bubbling Phenomenon on Liquidized Sn-Bi-Li-Er Alloy Surface under H-Plasma Exposure International conference

    Kota Tamura, Hirotaka Toyoda

    The 2nd US-Japan Workshop on Power and Particle Control in a Steady State Magnetic Fusion DEMO Reactor by Liquid Metal PFCs  2022.3.11 

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    Event date: 2022.3

    Language:English   Presentation type:Oral presentation (general)  

  56. Angular distribution of high-energy Ar ion and neutral in a 13.56 MHz capacitively-coupled plasma International conference

    Keita Ichikawa, Haruka suzuki, Hirotaka Toyoda

    ISPlasma2022/IC-PLANTS2022 09aC05O  2022.3.9 

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    Event date: 2022.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  57. RF Voltage Division of in RF-biased High-density Plasma with Floating Liner International conference

    Yukinori Chiba, Manabu Kyuzo, Haruka Suzuki, Hirotaka Toyoda

    ISPlasma2022/IC-PLANTS2022 07P-14  2022.3.7 

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    Event date: 2022.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  58. Radical measurements of Ar/C4F8 dual frequency capacitively-coupled plasma International conference

    Yuto Seki, Haruhito Kato, Schuichi Kuboi, Haruka Suzuki, and Hirotaka Toyoda

    ISPlasma2022/IC-PLANTS2022 08P-14  2022.3.8 

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    Event date: 2022.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  59. Bubbling Phenomenon of Sn-Bi-Li-Er Alloy under H2 Plasma Exposure International conference

    Kota Tamura, H. Suzuki, J. Miyazawa, S. Masuzaki, M. Tokitani, H. Toyoda

    ISPlasma2022/IC-PLANTS2022 08P-21  2022.3.8 

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    Event date: 2022.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  60. O Radical Measurement of Ar/O2 Microwave Plasma in Atmospheric Pressure International conference

    Yuki Iwata, Tomohiro Ogasawara, Haruka Suzuki and Hirotaka Toyoda

    ISPlasma2022/IC-PLANTS2022 07pC09O  2022.3.7 

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    Event date: 2022.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  61. Plasma density increase of electron cyclotron resonance plasma by high voltage pulse power application International conference

    Ikumi Hamaguchi, Hansin Bae, Kensuke Sasai, Haruka Suzuki, and Hirotaka Toyoda

    ISPlasma2022/IC-PLANTS2022 07pC08O  2022.3.7 

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    Event date: 2022.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  62. Influence of the magnetic field configuration on the conductive carbon film deposition in an ECR Ar/C6H6 plasma with high voltage bias

    Ikumi Hamaguchi, Hansin Bae, Kensuke Sasai, Haruka Suzuki, and Hirotaka Toyoda

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  63. Bubbling phenomenon of melted tin-bismuth-lithium-erbium alloy during hydrogen plasma exposure

    Kota Tamura, H. Suzuki, J. Miyazawa, S. Masuzaki, M. Tokitani, H. Toyoda

    2022.1.25 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  64. Imaging measurement of angular distribution of high-energy particles incident on an electrode in a capacitively-coupled plasma

    Keita Ichikawa, Manh Hung Chu, Makoto Moriyama, Naoya Nakahara, Haruka Suzuki, and Hirotaka

    2022.1.25 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  65. Ionic and Neutral radical measurement of Ar/C4F8/O2 very high frequency capacitively-coupled plasma

    Yuto Seki, Haruhito Kato, Schuichi Kuboi, Haruka Suzuki, and Hirotaka Toyoda

    2022.1.24 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  66. 液体スズ合金の水素プラズマ照射における発泡現象

    田村晃汰、豊田浩孝

    「ダイバータの学理と応用」研究会  2022.1.21 

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    Event date: 2022.1

    Language:Japanese   Presentation type:Oral presentation (general)  

  67. 大気圧長尺マイクロ波プラズマの連続・離散構造変化

    豊田浩孝、鈴木陽香

    「原子分子過程研究の最先端と先進的プラズマ分光計測」 「原子分子データ応用フォーラムセミナー」合同研究会  2021.12.24 

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    Event date: 2021.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  68. High-performance Ag nanoparticle production by novel liquid-flow plasma treatment device International conference

    Kazuya Yamaguchi, Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

    Materials Research Meeting2021(MRM2021)  2021.12.14 

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    Event date: 2021.12

    Language:English   Presentation type:Poster presentation  

  69. Conductive carbon film deposition by microwave plasma with high voltage biasing International conference

    Ikumi Hamaguchi, Hansin Bae, Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

    Materials Research Meeting2021(MRM2021)  2021.12.16 

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    Event date: 2021.12

    Language:English   Presentation type:Oral presentation (general)  

  70. Spatial distribution measurement of atomic oxygen from atmospheric-pressure microwave line plasma by atomic absorption spectroscopy International conference

    Tomohiro Ogasawara, Yuki Iwata, Haruka Suzuki, Takayoshi Tsutsumi, Masaru Hori, Hirotaka Toyoda

    The 12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology(APSPT-12)  2021.12.10 

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    Event date: 2021.12

    Language:English   Presentation type:Oral presentation (general)  

    Venue:(Taipei On-line)   Country:Taiwan, Province of China  

  71. Influence of metal exposure on the plasma potential in RF-biased high-density plasma with floating liner International conference

    Yukinori Chiba, Manabu Kyuzo, Haruka Suzuki and Hirotaka Toyoda

    The 12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology(APSPT-12)  2021.12.9 

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    Event date: 2021.12

    Language:English   Presentation type:Oral presentation (general)  

    Venue:(Taipei On-line)   Country:Taiwan, Province of China  

  72. Performance evaluation of pulsed-microwave atmospheric-pressure Ar/O₂ line plasma source

    Tomohiro Ogasawara, Yuki Iwata, Haruka Suzuki, Takayoshi Tsutsumi, Masaru Hori, Hirotaka Toyoda

    2021.11.22 

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    Event date: 2021.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  73. Measurement of sputtered atoms from Sn and Sn alloy exposed to hydrogen plasma

    Kota Tamura, Haruka Suzuki, Junichi Miyazawa, Suguru Masuzaki, Masayuki Tokitani, Hirotaka Toyoda

    2021.11.22 

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    Event date: 2021.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  74. Melting of Ag nanoparticles by using a high-density surface-wave plasma

    Kazuya Hikita, Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

    2021.11.22 

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    Event date: 2021.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  75. Influence of small grounded surface on plasma property in an inductively-coupled plasma with floating liner International conference

    Haruka Suzuki, Makoto Moriyama, Naoya Nakahara, Keita Ichikawa, and Hirotaka Toyoda

    DPS2021 ONLINE SYMPOSIUM 42nd International Symposium on DryProcess 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

  76. Investigation of Ar/O2 atmospheric-pressure microwave line plasma and its application to Polyimide film ashing International conference

    H. Suzuki, T. Ogasawara1, Y. Iwata and H. Toyoda

    DPS2021 ONLINE SYMPOSIUM 42nd International Symposium on DryProcess 

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    Event date: 2021.11

    Language:English  

  77. High Speed sp2-rich Carbon Film Deposition with Surface-wave Microwave Plasma International conference

    H. Bae, H. Suzuki, K. Sasai and H. Toyoda

    DPS2021 ONLINE SYMPOSIUM 42nd International Symposium on DryProcess 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

  78. Conductive carbon deposition by surface wave plasma with high voltage pulse biasing International conference

    Ikumi Hamaguchi, Hansin Bae, Haruka Suzuki,Kensuke Sasai and Hirotaka Toyoda

    Workshop Japan-RUB 2021Bridging the Pandemic: Reigniting Cooperation on Plasma Research(Germany, Online)  2021.11.25 

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    Event date: 2021.10 - 2021.11

    Language:English   Presentation type:Poster presentation  

  79. Microwave application to liquid process in reduced pressure environment Invited International conference

    Hirotaka Toyoda, Kazuya Yamaguchi, Kengo Yunoki, Haruka Suzuki, Kensuke Sasai

    Workshop Japan-RUB 2021,Bridging the Pandemic: Reigniting Cooperation on Plasma Research  2021.10.29 

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    Event date: 2021.10

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:(Germany, Online)   Country:Germany  

  80. Oxygen radical measurement in Ar/O2 atmospheric pressure microwave line plasma International conference

    Yuki Iwata, Tomohiro Ogasawara, Haruka Suzuki and Hirotaka Toyoda

    Workshop Japan-RUB 2021,Bridging the Pandemic: Reigniting Cooperation on Plasma Research  2021.11.25 

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    Event date: 2021.10

    Language:English   Presentation type:Poster presentation  

    Venue:(Germany, Online)   Country:Germany  

  81. Conductive carbon deposition by surface wave plasma with high voltage pulse biasing International conference

    Ikumi Hamaguchi, Hansin Bae, Haruka Suzuki,Kensuke Sasai and Hirotaka Toyoda

    Workshop Japan-RUB 2021,Bridging the Pandemic: Reigniting Cooperation on Plasma Research  2021.11.25 

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    Event date: 2021.10

    Language:English   Presentation type:Poster presentation  

    Venue:(Germany, Online)   Country:Germany  

  82. Evaluation of charge density at hole bottom of capillary plates in a pulsed dual-frequency capacitively coupled plasma International conference

    Haruka Suzuki,Makoto Moriyama,Naoya Nakahara,Hirotaka Toyoda

    74th Annual Gaseous Electronics Conference  2021.10.7 

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    Event date: 2021.10

    Language:English   Presentation type:Oral presentation (general)  

  83. Highly conductive carbon film deposition by DC and microwave power superposition International conference

    Hansin Bae,Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

    74th Annual Gaseous Electronics Conference  2021.10.5 

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    Event date: 2021.10

    Language:English   Presentation type:Poster presentation  

  84. Fast and massive synthesis of silver nanoparticle by a liquid-flow plasma source using AgNO3 solution* International conference

    Haruka Suzuki,Kazuya Yamaguchi,Kensuke Sasai,Hirotaka Toyoda

    74th Annual Gaseous Electronics Conference  2021.10.5 

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    Event date: 2021.10

    Language:English   Presentation type:Poster presentation  

  85. Time-resolved Measurement of Charge Density at the Bottom of High-aspect-ratio Holes in a Pulsed Capacitively Coupled Plasma Invited International conference

    Haruka Suzuki, Makoto Moriyama, Naoya Nakahara, Keita Ichikawa, and Hirotaka Toyoda

    5th Asia-Pacific Conference on Plasma Physics, 26 Sept-1Oct, 2021, Remote e-conference(AAPPS-DPP2021)  2021.9.28 

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    Event date: 2021.9 - 2021.10

    Language:English   Presentation type:Oral presentation (invited, special)  

  86. Large A rea Ashing Treatment of Polyimide Film by Atmospheric pressure Pulsed Microwave Line Plasma with Ar/O 2 International conference

    T.Ogasawara, Y.Iwata, H.Suzuki and H.Toyoda

    5th Asia-Pacific Conference on Plasma Physics, 26 Sept-1Oct, 2021, Remote e-conference(AAPPS-DPP2021) 

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    Event date: 2021.9 - 2021.10

    Language:English   Presentation type:Poster presentation  

  87. 流動液体プラズマ処理装置を用いたAgナノ粒子の長時間安定合成

    〇山口 和也1、鈴木 陽香1、笹井 建典1、豊田 浩孝1,2 (1.名大工、2.核融合研)

    第82回応用物理学会秋季学術講演会、22a-P08-2  2021.9.22  応用物理学会

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    Event date: 2021.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:オンライン開催  

  88. High conductive carbon film deposition by electron cyclotron resonance (ECR) plasma

    〇Hansin BAE1、Hamaguchi Ikumi1、Kensuke Sasai2、Haruka Suzuki1,2、Hirotaka Toyoda1,2,3 (1.Nagoya Univ.、2.Nagoya Univ. cLPS、3.NIFS)

    2021.9.12 

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    Event date: 2021.9

    Language:English   Presentation type:Oral presentation (general)  

  89. イメージング法による容量結合型プラズマから電極へ入射する高速粒子の角度分布計測

    ○市川景太,鈴木陽香(名大),豊田浩孝(名大/ 核融合研)

    令和3年度電気・電子・情報関係学会東海支部連合大会、A1-7  2021.9.7 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン開催  

  90. 二周波容量結合型フルオロカーボンプラズマ中のラジカル計測

    ○関悠斗,久保井宗一,鈴木陽香(名大), 豊田浩孝(名大/ 核融合研)

    令和3年度電気・電子・情報関係学会東海支部連合大会、A1-6  2021.9.7 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン開催  

  91. 表面波プラズマを用いた高導電性炭素膜の高速堆積

    ○濱口育未,BaeHansin,笹井建典,鈴木陽香(名大), 豊田浩孝(名大/ 核融合研)

    令和3年度電気・電子・情報関係学会東海支部連合大会、A1-5  2021.9.7 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン開催  

  92. 大気圧長尺マイクロ波ラインプラズマによる広幅高速アッシング処理

    ○岩田悠揮,小笠原知裕,鈴木陽香(名大), 豊田浩孝(名大/ 核融合研)

    令和3年度電気・電子・情報関係学会東海支部連合大会、A1-4  2021.9.7 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン開催  

  93. BH and BD molecular spectroscopy during the Impurity Powder Dropper experiments International conference

    T. KAWATE, N. Ashikawa, M. Goto, T. Oishi, Y. Kawamoto, and H. Toyoda

    15th International Workshop on Hydrogen Isotopes in Fusion Reactor Materials(HWS2020) 

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    Event date: 2021.5

    Language:English   Presentation type:Oral presentation (general)  

    Venue:zoom  

  94. LHDにおけるボロンを使った水素リサイクリング抑制実験

    芦川直子(核融合研、総研大)、川手朋子(核融合研、総研大)、豊田浩孝(名古屋大学)、Zhen SUN(ASIPP、PPPL)

    日本原子力学会 春の年会(2021)オンライン(早稲田大学)  2021.3.17 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン開催   Country:Japan  

  95. High-speed Deposition of Graphite-like Carbon Film by Microwave Surface-wave Plasma

    2021.3.18 

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    Event date: 2021.3

    Language:English   Presentation type:Oral presentation (general)  

  96. International Expansion of Division of Plasma Electronics -Collaboration with GEC- Invited

    2021.3.17 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  97. Long-term Operation of Liquid Flow Plasma Processing Device and Its Application to Ag Nanoparticle Production

    2021.3.19 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Poster presentation  

  98. Wide-Area Ashing Treatment by Pulsed Microwave Atmospheric Pressure Ar/O2 Plasma

    2021.3.19 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  99. Plasma Fluctuation b y Inse rtion of a Small Grou nded Electrode into I nductively Coupled Plasma with I nsulated L iner

    2021.3.19 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Poster presentation  

  100. Wide-area and High-speed Deposition of Graphitic Film by Microwave Surface Wave Plasma with High Power Pulse International conference

    Hansin Bae, Haruka Suzuki, Kensuke Sasai and Hirotaka Toyoda

    ISPlasma2021/IC-PLANTS2021 09aB05O  2021.3.9 

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    Event date: 2021.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  101. Effect of grounded electrode on plasma propety in ICP with floating liner International conference

    Manabu Kyuzo*, Yukinori Chiba, Haruka Suzuki and Hirotaka Toyoda

    2021.3.8 

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    Event date: 2021.3

    Language:English   Presentation type:Poster presentation  

  102. Deuterium Depth Profile of Plasma-Exposed Solid/Liquid Tin International conference

    Kota Tamura,Haruka Suzuki, Suguru Masuzaki,Masayuki Tokitani, Junichi Miyazawa, Hirotaka Toyoda

    ISPlasma2021/IC-PLANTS2021 08P-38  2021.3.8 

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    Event date: 2021.3

    Language:English   Presentation type:Poster presentation  

  103. Time-dependent Measurement of Charge Density at Bottom of High-aspect Hole in a Capacitively-coupled Plasma International conference

    Makoto Moriyama, Naoya Nakahara, Keita Ichikawa,Manh Hung Chu,Haruka Suzuki* and Hirotaka Toyoda

    ISPlasma2021/IC-PLANTS2021 08pB14O  2021.3.8 

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    Event date: 2021.3

    Language:English   Presentation type:Oral presentation (general)  

  104. Ashing Treatment of Polyimide Film by Atmospheric-pressure Microwave Line Plasma with Ar/O2 International conference

    2Haruka Suzuki*, Tomohiro Ogasawara, Yuki Iwata, and Hirotaka Toyoda

    ISPlasma2021/IC-PLANTS2021 08pB07O  2021.3.8 

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    Event date: 2021.3

    Language:English   Presentation type:Oral presentation (general)  

  105. Wide Area and High Rate Deposition of Graphitic Carbon by Surface Wave Plasma

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    Event date: 2021.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  106. Temporal Variation of Accumulated Charge at the Bottom of High Aspect Hole in Pulse-modulated Capacitively-Coupled Plasma

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    Event date: 2021.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  107. グロー放電水素プラズマを用いたスズ-水素プラズマ相互作用の基礎研究

    田村 晃汰

    ダイバータの学理と応用 NIFS 

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    Event date: 2020.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  108. A Deuterium Distribution Measurement in Deuterium Plasma Exposed-Tin

    Kota Tamura1), Haruka Suzuki1), Suguru Masuzaki2), Masayuki Tokitani2), Junichi Miyazawa2), Hirotaka Toyoda1,2) 1)Nagoya Univ., 2) NIFS

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    Event date: 2020.12

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

    DOI: 02P99

  109. High speed and wide area conductive carbon film deposition by surface-wave plasma.

    H.Bae 1), K.Hikita 1), H.Suzuki 1) 2), K.Sasai 2), H.Toyoda 1) 2) 3) (1) Department of electronics, Nagoya univ., (2) Center for Low-temperature Plasma Sciences(cLPS), Nagoya univ., (3) National Institute for Fusion Science(NIFS)

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    Event date: 2020.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

    DOI: 03Ba06

  110. Surface treatment of resin material by pulsed microwave atmospheric pressure Ar/O2 plasma

    OGASAWARA Tomohiro1), SUZUKI Haruka1), TOYODA Hirotaka1,2) (1)Nagoya Univ.,2)NIFS)

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    Event date: 2020.12

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

    DOI: 02P31

  111. Evaluation of charge density at the bottom of the capillary plate in a pulse modulated dual frequency CCP International conference

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    Event date: 2020.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  112. Application of atmospheric pressure microwave plasma to large area and high-speed surface treatment

    2020.12.3 

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    Event date: 2020.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  113. Quantitative Evaluation of Hydrogen Retention of Solid and Liquid Tin by Thermal Desorption Spectroscopy International conference

    Kota TAMURA1, Haruka SUZUKI1, Junichi MIYAZAWA2, Suguru MASUZAKI2, Hirotaka TOYODA1;2 1. Nagoya University

    The 29th International Toki Conference on Plasma and Fusion Research 

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    Event date: 2020.10

    Language:English   Presentation type:Poster presentation  

    Venue:zoom   Country:Japan  

  114. Evaluation of absolute charge density at the bottom of hole pattern using high aspect ratio capillary plate International conference

    MAKOTO MORIYAMA, NAOYA NAKAHARA, HARUKA SUZUKI,HIROTAKA TOYODA

    GEC20 Meeting of The American Physical Society、RW3.4 

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    Event date: 2020.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  115. Film Surface Treatment with O2/Ar Line Plasma under Atmospheric Pressure International conference

    Haruka Suzuki, Hirotsugu Koma, Tomohiro Ogasawara, Manh Hung Chu, Hirotaka Toyoda

    GEC20 Meeting of The American Physical Society、LT3.00007  2020.10.6 

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    Event date: 2020.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  116. パルス変調容量結合型プラズマにおけるキャピラリープレート下部の電荷密度変化

    中原 尚哉 ,森山 誠 ,鈴木 陽香 ,豊田 浩孝

    第81回応用物理学会秋季学術講演会 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

    DOI: 11p-Z0310

  117. Time-resolved measurement of charge density at the bottom of capillary plate in a pulse modulated CCP

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

    DOI: 02Ba07

  118. Ag Particle Behavior in an Inductively Coupled Plasma

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

    DOI: B5-4

  119. Surface Hydrophilic Treatment by Microwave Line Plasma at Atmospheric Pressure

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

    DOI: B5-6

  120. Heat flux evaluation of the atmospheric pressure microwave line plasma from spatio-temporal temperature measurement of the slot-plate

    (M2) Manh Hung Chu1, Haruka Suzuki1, Hirotaka Toyoda1

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    Event date: 2020.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  121. Suppression of redissolution of p lasma synthesis silver nanoparticles using alkaline agent

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    Event date: 2020.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  122. Absolute charge density evaluation of a capillary plate in a pulse modulated CCP

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    Event date: 2020.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  123. Estimation of voltage at the top of capillary plate in a CCP

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    Event date: 2020.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  124. Temperature measurement of slot-plate in an atmospheric-pressure microwave linear plasma International conference

    ISPlasma/IC-PLANTS2020 

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    Event date: 2020.3

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Nagoya University   Country:Japan  

  125. Electromagnetic Analysis in a Long-scale Slot Plasma Excited by Microwave Travelling Wave International conference

    Hirotsugu Koma, Haruka Suzuki and Hirotaka Toyoda

    ISPlasma/IC-PLANTS2020 

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    Event date: 2020.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University   Country:Japan  

  126. Synthesis of silver nanoparticles by in line liquid process using microwave plasma source International conference

    Jyo Suzuki, Haruka Suzuki, Kensuke Sasai and Hirotaka Toyoda

    ISPlasma/IC-PLANTS2020 

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    Event date: 2020.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  127. Quantitative Evaluation of Hydrogen Retention in Metal Tin using Thermal Desorption Spectroscopy International conference

    ISPlasma/IC-PLANTS2020 

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    Event date: 2020.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University   Country:Japan  

  128. Spatial characteristics analysis of atmospheric pressure microwave plasma with FEM simulation International conference

    Yoshiki Baba*, Makoto Moriyama, Haruka Suzuki and Hirotaka Toyoda

    ISPlasma/IC-PLANTS2020 

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    Event date: 2020.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University   Country:Japan  

  129. 容量結合プラズマ中に設置されたエッチングホール模擬用キャピラリープレートの電位構造解析

    森⼭ 誠、中原 尚哉、三⽮ 晶洋、鈴⽊ 陽⾹、豊⽥ 浩孝

    プラズマ・核融合学会 第36回年会 

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    Event date: 2019.11 - 2019.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学 春日井キャンパス   Country:Japan  

  130. 核融合炉ダイバー応用へ向けたスズの水素吸蔵量定量評価

    田村晃汰,鈴木陽香,宮澤順一,豊田浩孝

    プラズマ・核融合学会 第36回年会 

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    Event date: 2019.11 - 2019.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学 春日井キャンパス   Country:Japan  

  131. potential structure of high-aspect-ratio capillary hole in a pulsed-VHF capactive coupled plasma International conference

    M. Moriyama, A. Mitsuya, N. Nakahara, H. Suzuki, H. Toyoda

    2019 International Symposium on DryProcess 

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    Event date: 2019.11

    Language:English   Presentation type:Poster presentation  

    Venue:JMS Aster Plaza,Hiroshima,Japan   Country:Japan  

  132. Microscopic observation of an atmospheric-pressure microwave plasma produced in a meter-scale slot with sub-millimeter gap International conference

    HIROTAKA TOYODA, HIROTSUGU KOMA, YOSHIKI BABA, MANH HUNG CHU, HANSIN BAE, HARUKA SUZUKI

    GEC19 Meeting of The American Physical Society 

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    Event date: 2019.10 - 2019.11

    Language:English   Presentation type:Poster presentation  

    Venue:Texas A&M University Campus in College Station   Country:United States  

  133. Space-resolved oxygen radical measurement of atmo- spheric pressure microwave line plasma using vacuum ul- traviolet absorption spectroscopy International conference

    HANSIN BAE, HIROTSUGU KOMA, HARUKA SUZUKI, HIROTAKA TOYODA

    GEC19 Meeting of The American Physical Society 

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    Event date: 2019.10 - 2019.11

    Language:English   Presentation type:Poster presentation  

    Venue:Texas A&M University Campus in College Station   Country:United States  

  134. Time-resolved Measurement of Pulsed-microwave Excited Atmospheric-pressure Long-scale Slot Plasma

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  135. Temporal Variation of Surface Potential on Insulated Film During DC Pulse Voltage Application to an Antenna of Surface-wave Plasma

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    Event date: 2019.9

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  136. Measurement of ion energy distribution with Faraday cup in dual frequency capacitively-coupled plasma

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    Event date: 2019.9

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  137. Electromagnetic field distribution in a long-scale slot plasma using traveling waves

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    Event date: 2019.9

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  138. Potential structure analysis of a capillary plate in a dual frequency CCP

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  139. Space-resolved cross-sectional observation of slot-excited microwave O2/Ar plasma at atmospheric pressure

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  140. 二周波重畳容量結合型プラズマにおける キャピラリープレート内の電位構造解析

    中原 尚哉*, 森山 誠,三矢 晶洋,鈴木 陽香,豊田 浩孝 (名大工) 栗原 一彰,飯野 大輝,福水 裕之,林 久貴,鈴木 啓之 (東芝メモリ)

    令和元年度 電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大同大学   Country:Japan  

  141. 昇温脱離法を用いた固体スズ中の水素吸蔵量評価

    田村晃汰,鈴木陽香,宮澤順一,豊田浩孝

    令和元年度 電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大同大学   Country:Japan  

  142. 大気圧マイクロ波プラズマにおけるギャップ内ガス温度の空間分解計測 

    馬場 賀己*,鈴木 陽香,豊田 浩孝

    令和元年度 電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大同大学   Country:Japan  

  143. "二周波重畳容量結合型プラズマ装置における ファラデーカップを用いたイオンエネルギー分布の測定"

    三矢 晶洋*,森山 誠,中原 尚哉、鈴木 陽香、豊田 浩孝

    令和元年度 電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大同大学   Country:Japan  

  144. Consideration of Surface Potential on Insulated Film during DC Pulse Voltage Application to an Antenna of Surface-wave Plasma

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  145. High Speed Synthesis of Nanoparticles in Liquid Environment by In-Line Type Plasma Device

    Shaofei Yang, Jyo Suzuki, Haruka Suzuki, Hirotaka Toyoda

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    Event date: 2019.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  146. High Speed Synthesis of Nanoparticles in Liquid Environment by In-Line Type Plasma Device

    Shaofei Yang, Jyo Suzuki, Haruka Suzuki, Hirotaka Toyoda

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    Event date: 2019.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  147. Oxygen Radical Flux Measurement of Atmospheric Pressure Microwave Line Plasma International conference

    H. Bae, Y. Koike, H. Koma, H. Suzuki and H. Toyoda

    AEPSE2019 

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    Event date: 2019.9

    Language:English   Presentation type:Poster presentation  

    Country:Korea, Republic of  

  148. Potential Control of Surface Wave Excited Plasma by Pulsed DC Voltage Applied to Plasma-Immersed Waveguide International conference

    S. Fukuda, K. Udagawa, H. Suzuki, Y. Tauchi, H. Toyoda

    XXXIV ICPIG & ICRP-10 

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    Event date: 2019.7

    Language:English   Presentation type:Poster presentation  

    Venue: Sapporo, Hokkaido, Japan   Country:Japan  

  149. Measurement of ion energy in dual-frequency capacitive coupled plasma International conference

    M. Moriyama, A. Mitsuya, N. Nakahara, H. Suzuki, H. Toyoda

    XXXIV ICPIG & ICRP-10 

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    Event date: 2019.7

    Language:English   Presentation type:Poster presentation  

    Venue: Sapporo, Hokkaido, Japan   Country:Japan  

  150. Development of Microwave Remote Plasma Source for New Surface Functionalization International conference

    T. Okimoto, Yoshiyuki Isomura, Y. Ikari, Y. Tauchi, K. Nishiyama, Kobe Steel, Ltd., Japan H. Toyoda, H. Suzuki, Nagoya University, Japan

    International Conference on Metallurgical Coatings and Thin Films(ICMCTF 2019) 

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    Event date: 2019.5

    Language:English   Presentation type:Poster presentation  

    Venue:San Diego, CA,USA   Country:United States  

  151. Large-area surface treatment using microwave plasma excited in meter-length slot with sub-millimeter gap International conference

    Haruka Suzuki, Hirotsugu Koma, Manh Hung Chu, Hansin Bae, Yoshiki Baba, and Hirotaka Toyoda

    The 10th of International Workshop on Microplasmas (IWM-10) 

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    Event date: 2019.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  152. Time-resolved microscopic measurement of slot excited atmospheric pressure microwave plasma International conference

    Yoshiki Baba, Haruka Suzuki, and Hirotaka Toyoda

    The 10th of International Workshop on Microplasmas (IWM-10) 

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    Event date: 2019.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  153. 革新的プラズマ源開発とエネルギー科学応用 Invited International conference

    豊田浩孝

    第82回マテリアルズテーラリング研究会 

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    Event date: 2019.4

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:横浜 慶応大学日吉キャンパス   Country:Japan  

  154. 長尺大気圧マイクロ波プラズマ生成と表面処理の応用 Invited

    豊田浩孝

    表面技術協会 第139回講演大会 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:神奈川大学 横浜キャンパス   Country:Japan  

  155. Optimized waveguide structure for atmospheric pressure microwave plasma International conference

    Manh Hung Chu,Haruka Suzuki ,Hirotaka Toyoda

    ISPlasma/IC-PLANTS2019(11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/12th International Conference on Plasma-Nano Technology & Science) 

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    Event date: 2019.3

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Nagoya Institute of Technology   Country:Japan  

  156. Time-resolved Measurement of Cross-Sectional Structure of a Narrow Gap Plasma Produced by an Atmospheric Pressure Microwave Discharge International conference

    Yoshiki Baba, Haruka Suzuki and Hirotaka Toyoda

    ISPlasma/IC-PLANTS2019(11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/12th International Conference on Plasma-Nano Technology & Science) 

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    Event date: 2019.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya Institute of Technology   Country:Japan  

  157. Potential Control of Surface Wave Plasma by Applying DC Pulse Voltage to a Slot type Microwave Antenna International conference

    Sho Fukuda, Kou Udagawa, Haruka Suzuki, Yuki Yauchi, Hirotaka Toyoda

    ISPlasma/IC-PLANTS2019(11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/12th International Conference on Plasma-Nano Technology & Science) 

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    Event date: 2019.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya Institute of Technology   Country:Japan  

  158. Microscopic Measurement of Long Microwave Plasma at Atmospheric Pressure International conference

    Hirotsugu Koma, Yosuke Koike, Haruka Suzuki,Hirotaka Toyoda

    ISPlasma/IC-PLANTS2019(11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/12th International Conference on Plasma-Nano Technology & Science) 

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    Event date: 2019.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya Institute of Technology   Country:Japan  

  159. Oxygen radical measurement of atmospheric pressure microwave plasma employing vacuum ultraviolet absorption spectroscopy International conference

    Hansin Bae, Koike Yosuke, Hirotsugu Koma, Haruka Suzuki Hirotaka Toyoda

    ISPlasma/IC-PLANTS2019(11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/12th International Conference on Plasma-Nano Technology & Science) 

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    Event date: 2019.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya Institute of Technology   Country:Japan  

  160. Hydrogen Recycling Properties of Tin wall in DC Glow Hydrogen Plasma International conference

    Kota Tamura*, Haruka Suzuki, Hirotaka Toyoda and Junichi Miyazawa

    ISPlasma/IC-PLANTS2019(11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/12th International Conference on Plasma-Nano Technology & Science) 

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    Event date: 2019.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya Institute of Technology   Country:Japan  

  161. 大気圧長尺マイクロ波プラズマによる大面積高速表面処理

    小間 浩嗣 ,杉山 敦士 ,鈴木 陽香,本田 剛 ,豊田 浩

    第66回応用物理学会春季学術講演会 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東工大 大岡山キャンパス   Country:Japan  

  162. マイクロ波アンテナへのDCパルス電圧印加による絶縁表面へのイオン衝撃

    福田 奨,宇田川 洸, 鈴木 陽香, 田内 裕基, 豊田 浩孝

    第66回応用物理学会春季学術講演会 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東工大 大岡山キャンパス   Country:Japan  

  163. High Speed Synthesis of Nanoparticles by Liquid Flow-type Microwave Plasma

    Shaofei Yang, Shohei Fujimura, Masafumi Shiigai, Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

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    Event date: 2019.3

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  164. Oxygen Radical Measurement of Atmospheric Pressure Microwavw Line Plasma by Vacuum Ultraviolet Absorption Spectroscopy

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    Event date: 2019.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  165. 二周波重畳容量結合プラズマ基本特性の実験的評価 の実験的評価 の実験的評価

    三矢 晶洋, 森山 誠,鈴木 ,鈴木 陽香,豊田 浩孝

    第66回応用物理学会春季学術講演会 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東工大 大岡山キャンパス   Country:Japan  

  166. シミュレーションによる二周波重畳容量結合プラズマの基本特性解析

    森山 誠,三矢 晶洋,中原 尚哉,鈴木 陽香,豊田 浩孝

    第66回応用物理学会春季学術講演会 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東工大 大岡山キャンパス   Country:Japan  

  167. スロット型大気圧マイクロ波プラズマの時空間分解計測

    馬場 賀己,鈴木陽香,豊田 浩孝

    第66回応用物理学会春季学術講演会 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東工大 大岡山キャンパス   Country:Japan  

  168. Time-resolved microscopic measurement of cross-sectional structure of slot excited atmospheric pressure microwave plasma

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    Event date: 2019.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  169. A Systematic Analysis of Modified Waveguide Structure for Atmospheric-Pressure Microwave Plasma Source via Simulations

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    Event date: 2019.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  170. メートル級長尺スロット型プラズマ源における 大気圧マイクロ波プラズマの顕微計測

    小間 浩嗣、小池 洋右、鈴木 陽香、豊田 浩孝、

    第36回プラズマプロセシング研究会と第31回プラズマ材料科学シンポジウム 

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    Event date: 2019.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:高知城ホール   Country:Japan  

  171. Water Vapor Plasma Treatment Process using Slot-Excited Microwave Plasma Invited

    28th Annual Meeting of MRS-Japan 2018 

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    Event date: 2018.12

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  172. Organic-matter removal treatment using atmospheric pressure microwave O2/CF4

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    Event date: 2018.12

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  173. 新規大気圧マイクロ波プラズマ源の開発と応用 Invited

    鈴木陽香、豊田浩孝

    高機能トライボ表面プロセス部会 第12回例会 

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    Event date: 2018.12

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:岐阜大学サテライトキャンパス   Country:Japan  

  174. 直流放電プラズマを用いた金属スズの水素リサイクリング評価

    田村晃汰,鈴木陽香,豊田浩孝,宮澤順一

    プラズマ核融合学会 第35回年会 

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    Event date: 2018.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大阪大学   Country:Japan  

  175. 二周波重畳容量結合プラズマの基本特性評価

    森山誠,三矢晶洋,中原尚哉,鈴木陽香,豊田浩孝

    プラズマ核融合学会 第35回年会 

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    Event date: 2018.12

    Language:Japanese   Presentation type:Poster presentation  

    Venue:大阪大学   Country:Japan  

  176. 大気圧マイクロ波ラインプラズマにおける酸素原子の紫外吸収分光計測

    BAE Hansin,小池洋右,小間浩嗣,鈴木陽香,豊田浩孝

    プラズマ核融合学会 第35回年会 

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    Event date: 2018.12

    Language:Japanese   Presentation type:Poster presentation  

    Venue:大阪大学   Country:Japan  

  177. 大気圧下でのメートル級マイクロ波プラズマの生成と応用 Invited

    鈴木陽香、豊田浩孝

    プラズマ核融合学会 第35回年会 

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    Event date: 2018.12

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:大阪大学   Country:Japan  

  178. Influence of magnetic field on high-energy negative ion behavior in magnetron plasma with oxide targets Invited International conference

    Hirotaka Toyoda, Ko Udagawa, Akihiro Mitsuya, Hansin Bae, Haruka Suzuki

    2nd Asia-Pacific Conference on Plasma Physics 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:The Kanazawa Chamber of Commerce and Industry Hall &Ishikawa Prefectural Bunkyo Hall   Country:Japan  

  179. High speed photoresist removal using slot-excited atmospheric-pressure microwave O2/CF4 plasma International conference

    Shota Ishikaw1, Haruka Suzuki, Tsuyoshi Honda and Hirotaka Toyoda

    The 40th International Symposium on Dry Process(2018) 

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    Event date: 2018.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  180. Ring-shaped microwave plasma production in liquid flow environment for nanoparticle synthesis Invited International conference

    S. Fujimura, S. Yang, K. Sasai, H. Suzuki and H. Toyoda

    The 40th International Symposium on Dry Process(2018) 

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    Event date: 2018.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  181. Observation of cross sectional plasma structure in a gap of an atmospheric pressure microwave discharge International conference

    Hirotaka Toyoda Yoshiki Baba Haruka Suzuki

    71st Annual Gaseous Electronics Conference  

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    Event date: 2018.11

    Language:English   Presentation type:Poster presentation  

    Venue: Portland, Oregon   Country:United States  

  182. Scaling of Microwave Absorption in Atmospheric Pressure Microwave Line Plasma International conference

    Ivan Ganachev,Haruka Suzuki, and Hirotaka Toyoda

    The Eighteenth Biennial IEEE Conference on Electromagnetic Field Computation (CEFC2018) 

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    Event date: 2018.10

    Language:English   Presentation type:Poster presentation  

    Country:China  

  183. Diagnostics of energetic particles in magnetron plasma using oxide target Invited International conference

    Ivan Ganachev, Haruka Suzuki, and Hirotaka Toyoda

    International Symposium on Sputtering & Plasma Processes Pre session (ISSP2018) 

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    Event date: 2018.10

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  184. 流動液体マイクロ波プラズマによるナノ粒子生成

    藤村 昇平、楊 少菲、鈴木 陽香、豊田 浩孝

    応用物理学会秋季学術講演会 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  185. 大気圧マイクロ波励起O2/CF4プラズマによるフォトレジスト除去処理

    (M2)石川 翔太1、鈴木 陽香1、本田 剛2、豊田 浩孝1 (1.名大工、2.ニッシン)

    応用物理学会秋季学術講演会 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋国際会議場   Country:Japan  

  186. メートル級長尺大気圧マイクロ波プラズマの顕微計測 Invited

    鈴木 陽香、小池 洋右、小間 浩嗣、馬場 賀己、豊田 浩孝

    応用物理学会秋季学術講演会 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  187. 電磁界シミュレーションを用いた大気圧長尺マイクロ波プラズマにおける定在波抑制

    (M2)小池 洋右、小間 浩嗣、鈴木 陽香、豊田 浩孝

    応用物理学会秋季学術講演会 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  188. Potential Control of Surface Wave Plasma by Applying DC Pulse Voltage to a Microwave Antenna

    (M2)Kou Udagawa1,Sho Fukuda1,Haruka Suzuki1,Yuki Tauchi2,Hirotaka Toyoda1(1.Nagoya Univ.,2.Kobe Steel Ltd.)

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    Event date: 2018.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  189. Meter-scale atmospheric pressure microwave line plasma and its applications. Invited International conference

    H. Toyoda

    Xth INTERNATIONAL WORKSHOP on MICROWAVE DISCHARGES: Fundamentals and Applications 

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    Event date: 2018.9

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Zvenigorod, Russia   Country:Russian Federation  

  190. 表面波プラズマアンテナへのDC パルス電圧印加によるプラズマ電位制御

    福田奨、宇田川洸、鈴木陽香、豊田浩孝(名古屋大学)、田内裕基(神戸製鋼所)

    平成30年度電気・電子・情報関係学会東海支部連合大会講演論文集 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名城大学   Country:Japan  

  191. 酸化物ターゲットを用いたマグネトロンスパッタにおける酸素負イオンフラックスの空間分布の数値解析

    三矢 晶洋、宇田川 洸、鈴木 陽香、豊田 浩孝

    平成30年度電気・電子・情報関係学会東海支部連合大会講演論文集 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名城大学   Country:Japan  

  192. 大気圧メートル級長尺マイクロ波ラインプラズマの顕微計測

    小間 浩嗣、小池 洋右、鈴木 陽香、豊田 浩孝

    平成30年度電気・電子・情報関係学会東海支部連合大会講演論文集 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名城大学   Country:Japan  

  193. スロット励起大気圧マイクロ波プラズマにおけるスロット断面構造の顕微観測

    馬場賀己, 鈴木陽香,豊田浩孝

    平成30年度電気・電子・情報関係学会東海支部連合大会講演論文集 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名城大学   Country:Japan  

  194. Surface Roughness Control of ITO Films by VHF Superposed DC Magnetron Plasma Invited International conference

    Hirotaka Toyoda, Haruka Suzuki

    THERMEC2018 

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    Event date: 2018.7

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Paris - FRANCE   Country:France  

  195. Long-scale atmospheric-pressure microwave plasma Invited International conference

    H. Toyoda, H. Suzuki Y. Koike, H. Koma, Y. Baba, J.H. Qiu, M.H. Chu, A. Sugiyama

    JAPAN-RUB Workshop on Plasma Science 

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    Event date: 2018.7

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Bochum /Germany   Country:Germany  

  196. Meter-scale atmospheric-pressure microwave plasma for molecular gas processes Invited International conference

    Hirotaka Toyoda

    19th International Congress on Plasma Physics 

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    Event date: 2018.6

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Vancouver   Country:Canada  

  197. 大気圧長尺マイクロ波プラズマにおける電力吸収の空間分布

    小池 洋右,田村 宥人,鈴木 陽香,豊田 浩孝

    第65回応用物理学会春季学術講演会 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  198. 同軸導波管の外部導体ギャップ間におけるマイクロ波プラズマ生成

    藤村 昇平, 鈴木 陽香, 笹井 建典, 豊田 浩孝

    第65回応用物理学会春季学術講演会 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  199. マグネトロンスパッタリングにおける負イオンの数値解析による評価

    宇田川 洸,三矢 晶洋,鈴木 陽香,豊田 浩孝

    第65回応用物理学会春季学術講演会 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  200. Water-vapor Atmospheric Pressure Microwave Plasma in an Air-Shielded Environment by Water Flow International conference

    Haruka Suzuki, Hikaru Senba and Hirotaka Toyoda

    ISPlasma2018 / IC-PLANTS2018 

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    Event date: 2018.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  201. Space-Resolved Measurement of Microwave Power along Waveguide in Atmospheric Pressure Microwave Line Plasma International conference

    Yosuke Koike, Haruka Suzuki, Yuto Tamura, Yoshiki Baba and Hirotaka Toyoda

    ISPlasma2018 / IC-PLANTS2018 

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    Event date: 2018.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  202. Oxygen Negative Ion Behavior in a VHF-superposed DC Magnetron Sputtering International conference

    Kou Udagawa, Akihiro Mitsuya, Haruka Suzuki and Hirotaka Toyoda

    ISPlasma2018 / IC-PLANTS2018 

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    Event date: 2018.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  203. A coaxial-waveguide microwave plasma source for in-line treatment of large volume liquid International conference

    Shohei Fujimura, Haruka Suzuki, Kensuke Sasai and Hirotaka Toyoda

    ISPlasma2018 / IC-PLANTS2018 

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    Event date: 2018.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  204. Power Absorption Mechanism of Atmospheric-Pressure Microwave Line Plasma International conference

    Haruka Suzuki, Yosuke Koike, Yuto Tamura, Yoshiki Baba and Hirotaka Toyoda

    ISPlasma2018 / IC-PLANTS2018 

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    Event date: 2018.3

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  205. 質量分析を用いた粒子計測の基礎 — 計測原理から分析応用までー International conference

    豊田 浩孝

    第30回専門講習会「プロセスプラズマ診断の基礎」 

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    Event date: 2018.1

    Language:Japanese   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:名古屋大学   Country:Japan  

  206. Development of Microwave Plasma Sources and its Application to Materials Processing International conference

    Hirotaka Toyoda

    27th Annual Meeting of MRS-Japan 2017 

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    Event date: 2017.12

    Language:English  

    Country:Japan  

  207. 大気圧マイクロ波プラズマCVDによるSiO2膜形成及び膜評価

    石川 翔太、鈴木 陽香、豊田 浩孝

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:姫路商工会議所   Country:Japan  

  208. 直流およびVHF重畳直流マグネトロンプラズマにおける高エネルギー酸素負イオンに起因する指向性熱フラックスの測定

    宇田川 洸、鈴木 陽香、豊田 浩孝

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:姫路商工会議所   Country:Japan  

  209. 電磁界シミュレーションを用いた大気圧マイクロ波ラインプラズマの均一性向上の検討

    小池 洋右、田村 宥人、鈴木 陽香、豊田 浩孝

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:姫路商工会議所   Country:Japan  

  210. ギャップ型マイクロ波プラズマ源の改良による液体処理能力向上

    藤村 昇平、堤 和紀、鈴木 陽香、豊田 浩孝

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:姫路商工会議所   Country:Japan  

  211. 水流遮蔽水蒸気マイクロ波プラズマの生成とその応用

    鈴木 陽香、仙波 輝、豊田 浩孝

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:姫路商工会議所   Country:Japan  

  212. Power Absorption Mechanism of Atmospheric Microwave Line Plasma International conference

    H. Suzuki, Y. Koike, Y. Tamura, Y. Baba, and H. Toyoda

    DPS2017 

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    Event date: 2017.11

    Language:English   Presentation type:Poster presentation  

    Venue:Tokyo Institute of Technology, Tokyo   Country:Japan  

  213. Power absorption of atmospheric-pressure microwave-line-plasma International conference

    HIROTAKA TOYODA, HARUKA SUZUKI, YUTO TAMURA, YOSUKE KOIKE, YOSHIKI BABA

    GEC2017 

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    Event date: 2017.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:DoubleTree by Hilton, Pittsburgh, Green Tree, Pennsylvania ,USA   Country:United States  

  214. Production of long-scale atmospheric pressure microwave plasma Invited International conference

    Hirotaka Toyoda

    AAPPS-DPP2017(the 1st Asia-Pacific Conference on Plasma Physics) 

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    Event date: 2017.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Jinniu Hotel, Chengdu, China   Country:China  

  215. Oxygen Negative Ion Flux Evaluation in DC and DC-VHF Magnetron Plasmas through Directional Heat Flux Measurement International conference

    Hirotaka Toyoda, Kou Udagawa, Haruka Suzuki, Taku Suyama and Hansin Bae

    AEPSE2017 

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    Event date: 2017.9

    Language:English   Presentation type:Poster presentation  

    Venue:Jeju International Convention Center, Jeju, Korea   Country:Korea, Republic of  

  216. VHF-DC重畳マグネトロンプラズマにおける高エネルギーO-イオンに由来する熱フラックスの評価

    宇田川 洸,鈴木 陽香,豊田 浩孝

    平成29年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  217. 空間分解型吸収分光装置を用いたプラズマによる有機溶質分解過程の調査

    藤村 昇平, 堤 和紀, 鈴木 陽香, 豊田 浩孝

    平成29年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  218. スロット励起大気圧マイクロ波プラズマにおける消費電力シミュレーション

    小池 洋右,田村 宥人,馬場 賀己,鈴木 陽香,豊田 浩孝

    平成29年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  219. スロット励起大気圧マイクロ波プラズマCVDによるSiO2薄膜形成

    石川 翔太,鈴木 陽香,豊田 浩孝

    平成29年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  220. スロット励起大気圧マイクロ波プラズの電力消費に関する電磁界シミュレーョン

    鈴木 陽香 ,小池 洋右 , 田村 宥人 , 馬場 賀己 , 豊田 浩孝

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場・国際センター・福岡サンパレス   Country:Japan  

  221. 水流により遮蔽された空間での水蒸気マイクロ波プラズ生成

    仙波 輝, 小池 洋右 , 鈴木 陽香 , 豊田 浩孝

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場・国際センター・福岡サンパレス   Country:Japan  

  222. 大気圧マイクロ波ラインプラズマにおける電力吸収機構

    田村 宥人, 小池 洋右 , 鈴木 陽香 , 豊田 浩孝

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場・国際センター・福岡サンパレス   Country:Japan  

  223. マイクロ波インライン液体処理における反応領域のその場計測

    堤 和紀 ,藤村 昇平, 鈴木 陽香,豊田 浩孝

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    Event date: 2017.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:福岡国際会議場・国際センター・福岡サンパレス   Country:Japan  

  224. Meter -scale microwave plasma production with various discharge gases for large-area surface treatment under atmospheric pressure Invited International conference

    H. Suzuki, Y. Tamura, Y. Inomata, and H. Toyoda

    IUMRS-ICAM 2017(The 15th International Conference on Advanced Materials) 

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    Event date: 2017.8

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Yoshida Campus, Kyoto University,   Country:Japan  

  225. Improvement of SiO2 film properties synthesized by plasma-enhanced chemical vapor deposition using slot-type microwave plasma with O 2/TEOS Invited International conference

    S. Ishikawa , M. Yamamoto, H. Suzuki, and H. Toyoda

    IUMRS-ICAM 2017(The 15th International Conference on Advanced Materials) 

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    Event date: 2017.8

    Language:English   Presentation type:Poster presentation  

    Venue:Yoshida Campus, Kyoto University,   Country:Japan  

  226. Optical measurement of meter-scale microwave line plasma under atmospheric pressure International conference

    H. Suzuki, Y. Tamura, Y. Inomata, and H. Toyoda

    ICPIG 2017 

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    Event date: 2017.7

    Language:English   Presentation type:Poster presentation  

    Venue:Estoril Congress Center, Estoril/Lisbon, Portugal   Country:Portugal  

  227. Quantitative Evaluation of High-Energy Oxygen Negative Ion Flux in DC Magnetron Sputtering of Indium-Tin-Oxide International conference

    H. Toyoda, H. Bae, T. Suyama, K. Setaka, H. Suzuki

    ICPIG 2017 

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    Event date: 2017.7

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Estoril Congress Center, Estoril/Lisbon, Portugal   Country:Portugal  

  228. Microwave plasma production inside the micro-gap with metergap with meter -scale length Invited International conference

    H. Suzuki and H. Toyoda

    IWM 2017(The 9th International Workshop on Microplasmas) 

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    Event date: 2017.6

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Riessersee Hotel, Garmisch-Partenkirchen, Germany   Country:Germany  

  229. Development of atmospheric pressure microwave plasma source for large-area surface treatment International conference

    H. Suzuki and H. Toyoda

    The 22th KJ workshop 

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    Event date: 2017.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Sungkyunkwan University, Suwon, Republic of Korea   Country:Korea, Republic of  

  230. マイクロ波励起メートル級大気圧プラズマの生成とその特性

    鈴木陽香 ,田村宥人 ,猪俣弥雄起 ,関根誠 ,堀勝 ,豊田浩孝

    第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:パシフィコ横浜 (神奈川県横浜市)   Country:Japan  

  231. マイクロ波インライン液体処理における反応領域の空間分布計測

    堤和紀,滝藤奨,藤村昇平, 鈴木陽香,豊田浩孝

    第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:パシフィコ横浜 (神奈川県横浜市)   Country:Japan  

  232. 水流により遮蔽された空間での大気圧プラズマジェット生成

    仙波 輝 , 小池 洋右 , 鈴木 陽香 , 豊田 浩孝

    第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:パシフィコ横浜 (神奈川県横浜市)   Country:Japan  

  233. マイクロ波励起長尺大気圧プラズマにおけるプラズマ維持機構の検討

    田村 宥人 ,猪俣 弥雄起 , 鈴木 陽香 , 豊田 浩孝

    第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:パシフィコ横浜 (神奈川県横浜市)   Country:Japan  

  234. Measurement of directional heat flux component in VHF-magnetron sputtering International conference

    Hansin Bae, Taku Suyama, Kenta Setaka, Haruka Suzuki and Hirotaka Toyoda

    9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/10th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2017.3

    Language:English   Presentation type:Oral presentation (general)  

    Venue:CHUBU UNIVERSITY, Aichi, Japan   Country:Japan  

  235. Film quality improvement in slot-type microwave plasma CVD of SiO2 International conference

    Masaki Yamamoto, Shota Ishikawa, Haruka Suzuki, and Hirotaka Toyoda

    9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/10th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2017.3

    Language:English   Presentation type:Poster presentation  

    Venue:CHUBU UNIVERSITY, Aichi, Japan   Country:Japan  

  236. Long-scale N2 line plasma production under atmospheric pressure International conference

    Haruka Suzuki, Yuto Tamura, Yaoki Inomata, Hitoshi Itoh, Makoto Sekine, Masaru Hori, and Hirotaka Toyoda

    9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/10th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2017.3

    Language:English   Presentation type:Oral presentation (general)  

    Venue:CHUBU UNIVERSITY, Aichi, Japan   Country:Japan  

  237. Shielding of plasma jets from ambient air by water flow certain International conference

    Hikaru Senba, Yosuke Koike, Haruka Suzuki and Hirotaka Toyoda

    9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/10th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2017.3

    Language:English   Presentation type:Poster presentation  

    Venue:CHUBU UNIVERSITY, Aichi, Japan   Country:Japan  

  238. Introduction to Plasma Production - from Breakdown to Plasma Sustainment - Invited International conference

    Hirotaka Toyoda

    9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/10th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2017.3

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:CHUBU UNIVERSITY, Aichi, Japan   Country:Japan  

  239. スパッタの基礎とプラズマ解析

    豊田 浩孝

    第29回専門講習会「スパッタ技術の現状と展望」 

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    Event date: 2017.2

    Language:Japanese   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:名古屋大学   Country:Japan  

  240. ITOターゲットを用いたVHF重畳DCマグネトロンプラズマにおける熱フラックスの空間分布

    Bae Hansin, 巣山 拓, 鈴木 陽香, 豊田 浩孝

    第34回プラズマプロセシング研究会/第29回プラズマ材料科学シンポジウム(合同会議) 

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    Event date: 2017.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:北海道大学   Country:Japan  

  241. 改良導波管および連続発振マイクロ波電力によるメートル級長尺大気圧ラインプラズマの効率的生成

    鈴木 陽香,田村 宥人,猪俣 弥雄起, 伊藤 仁,関根 誠,堀 勝,豊田 浩孝

    第34回プラズマプロセシング研究会/第29回プラズマ材料科学シンポジウム(合同会議) 

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    Event date: 2017.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  242. 長尺ラインプラズマ生成のための改良型導波管の電磁界シミュレーション

    田村 宥人,鈴木 陽香,猪俣 弥雄起, 伊藤 仁,関根 誠,堀 勝,豊田 浩孝

    第34回プラズマプロセシング研究会/第29回プラズマ材料科学シンポジウム(合同会議) 

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    Event date: 2017.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:北海道大学   Country:Japan  

  243. インラインマイクロ波プラズマ処理の高流速化による有機物分解効率の向上

    堤和紀,滝藤奨,藤村昇平, 伊藤美智子,高島成剛,鈴木陽香,豊田浩孝

    第34回プラズマプロセシング研究会/第29回プラズマ材料科学シンポジウム(合同会議) 

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    Event date: 2017.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:北海道大学   Country:Japan  

  244. 酸化物ターゲットを用いたスパッタリングにおける酸素負イオン挙動 Invited

    豊田 浩孝

    負イオン研究会2016 

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    Event date: 2016.12

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:核融合科学研究所(岐阜県土岐市)   Country:Japan  

  245. マグネトロンプラズマ中の高エネルギー負イオンフラックス評価

    豊田浩孝,巣山拓, Bae Hansin, 鈴木陽香

    プラズマ・核融合学第33回会年会 

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    Event date: 2016.12

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東北大学(宮城県仙台市)   Country:Japan  

  246. 大気圧高密度マイクロ波プラズマの生成とその応用 Invited

    豊田 浩孝

    2016年真空・表面科学合同講演会 

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    Event date: 2016.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:名古屋国際会議場   Country:Japan  

  247. Plasma -enhanced chemical vapor deposition of SiO2 films by slot type microwave plasma with O 2/TEOS International conference

    Haruka Suzuki, Masaki Yamamoto, and Hirotaka Toyoda

    DPS2016 

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    Event date: 2016.11

    Language:English   Presentation type:Poster presentation  

    Venue:Conference Hall, Hokkaido University, Sapporo, Hokkaido, in Japan   Country:Japan  

  248. Evaluation of O- Ion Flux in a VHFVHF -DC Magnetron Plasma under ITO Sputtering Process International conference

    Hirotaka Toyoda, Taku Suyama, Hansin Bae and Haruka Suzuki

    DPS2016 

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    Event date: 2016.11

    Language:English   Presentation type:Poster presentation  

    Venue:Conference Hall, Hokkaido University, Sapporo, Hokkaido, in Japan   Country:Japan  

  249. 100% N2 atmospheric-pressure microwave-line-plasma production with a modi ed waveguide structure International conference

    HARUKA SUZUKI, YUTO TAMURA, HITOSHI ITOH, MAKOTO SEKINE, MASARU HORI, HI- ROTAKA TOYODA

    69th Annual Gaseous Electronics Conference 

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    Event date: 2016.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Ruhr-Universität Bochum, Germany   Country:Germany  

  250. High speed deposition of SiO2 lm by slot-type microwave CVD system International conference

    HIROTAKA TOYODA, MASAKI YAMAMOTO, HARUKA SUZUKI

    69th Annual Gaseous Electronics Conference 

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    Event date: 2016.10

    Language:English   Presentation type:Poster presentation  

    Venue:Ruhr-Universität Bochum, Germany   Country:Germany  

  251. Development of microwave plasma sources and its applications Invited International conference

    Hirotaka Toyoda

    The 6th International Conference on Microelectronics and Plasma Technology (ICMAP2016) 

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    Event date: 2016.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Dream Center, Gyeongju, in Korea   Country:Korea, Republic of  

  252. Improvement of Liquid Treatment Efficiency using Microwave In-Line Plasma System with Narrow Flow Path International conference

    Haruka Suzuki, Sho Takitou, Hirotaka Toyoda

    The 6th International Conference on Microelectronics and Plasma Technology (ICMAP2016) 

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    Event date: 2016.9

    Language:English   Presentation type:Poster presentation  

    Venue:Dream Center, Gyeongju, in Korea   Country:Korea, Republic of  

  253. ITO マグネトロンスパッタにおける酸素負イオンフラックス評価

    巣山 拓, Bae Hansin, 瀬高 健太, 笹井 建典, 鈴木 陽香, 豊田 浩孝

    第77回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:朱鷺メッセ(新潟県新潟市)   Country:Japan  

  254. インラインマイクロ波プラズマの流路狭小化による液体処理性能向上

    滝藤 奨、伊藤 美智子 、高島 成剛、野村 記生、北川 富則、豊田 浩孝

    第77回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ(新潟県新潟市)   Country:Japan  

  255. O2/TEOS スロット型マイクロ波プラズマCVD によるSiO2 膜形成

    山本 匡毅、鈴木 陽香、豊田 浩孝

    第77回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ(新潟県新潟市)   Country:Japan  

  256. 改良型導波管構造によるマイクロ波励起純窒素大気圧ラインプラズマの生成

    鈴木陽香 ,田村宥人 ,伊藤仁 ,関根誠 ,堀勝 ,豊田浩孝

    第77回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ(新潟県新潟市)   Country:Japan  

  257. 窒素ガスを用いたマイクロ波大気圧ラインプラズマの生成

    田村 宥人,鈴木 陽香,伊藤 仁,関根 誠,堀 勝,豊田 浩孝

    平成28年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:豊田工業高等専門学校   Country:Japan  

  258. Evaluation of O- Ion Flux in VHF-DC Magnetron Sputtering

    Hansin Bae, Taku Suyama, Kenta Setaka, Kensuke Sasai, Haruka Suzuki, and Hirotaka Toyoda

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    Event date: 2016.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  259. プラズマスパッタ ―スパッタの物理とマグネトロンプラズマ―

    豊田 浩孝

    第10回プラズマエレクトロニクスインキュベーションホール 

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    Event date: 2016.8

    Language:Japanese   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:国立中央青少年交流の家   Country:Japan  

  260. High-speed -camera observation of plasma behavior in atmospheric-pressure microwave line plasma International conference

    H. Suzuki, H. Ito, M. Sekine, M. Hori, H. Toyoda

    7th International Workshop on Plasma Spectroscopy (IPS2016) 

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    Event date: 2016.6

    Language:English   Presentation type:Poster presentation  

    Venue:Meitetsu Inuyama Hotel, Inuyama, Japan   Country:Japan  

  261. Two-Dimensional Atomic Absorption Spectroscopy of Plasma-Stimulated Zn Atom Desorption from ZnSO4 Solution International conference

    H. Toyoda, T. Takaba, H. Suzuki

    7th International Workshop on Plasma Spectroscopy (IPS2016) 

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    Event date: 2016.6

    Language:English   Presentation type:Poster presentation  

    Venue:Meitetsu Inuyama Hotel, Inuyama, Japan   Country:Japan  

  262. VHF-DC重畳マグネトロンスパッタによる平坦性向上機構の検討

    巣山 拓,福井 崇史, 瀬高 健太, 笹井建典, 豊田 浩孝

    第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京工業大学 大岡山キャンパス (東京都目黒区)   Country:Japan  

  263. マイクロ波プラズマ液体処理におけるエネルギー効率向上

    滝藤 奨、伊藤 美智子 、高島 成剛、野村 記生、北川 富則、豊田 浩孝

    第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東京工業大学 大岡山キャンパス (東京都目黒区)   Country:Japan  

  264. スロット内生成マイクロ波プラズマを用いた高速プラズマCVD

    山本 匡毅、鈴木 陽香、豊田 浩孝

    第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東京工業大学 大岡山キャンパス (東京都目黒区)   Country:Japan  

  265. Low Pressure Sustainment of Surface-Wave Microwave Plasma with Modified Microwave Coupler (MMC-SWP) International conference

    KENSUKE SASAI, HARUKA SUZUKI AND HIROTAKA TOYODA

    8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/9th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2016.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  266. マイクロ波プラズを用いた高圧無電極紫外ランプの試作とその長尺化の検討

    西川 拓、豊田 浩孝

    第3回光源物性とその応用研究会 

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    Event date: 2015.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北とぴあ(東京都北区)   Country:Japan  

  267. 大気圧マイクロ波放電による長尺ラインプラズマの生成と基礎特性

    鈴木陽香, 中野優, 伊藤仁, 関根誠, 堀勝, 豊田浩孝

    第32回プラズマ・核融合学会 年会 

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    Event date: 2015.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  268. Experimental Verification of the Importance of Slot Position in Microwave Plasma Production with Slot Antenna Array International conference

    S. Koga and H. Toyoda

    DPS2015 

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    Event date: 2015.11

    Language:English   Presentation type:Poster presentation  

    Venue:Awaji Yumebutai International Conference Center, Awaji Island, Japan   Country:Japan  

  269. Surface Roughness Control of DC Sputter Film Deposition by Superposition of VHF Power International conference

    Takashi Fukui, Taku Suyama, Yushi Fukuoka, Kensuke Sasai, Hirotaka Toyoda

    ICRP-9/GEC-68/SPP-33 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Hawaii Convention Center, Honolulu, Hawaii   Country:United States  

  270. Development of High-Throughput Liquid Treatment System Using Slot Antenna Excited Microwave Plasma International conference

    SHO TAKITOU, MICHIKO ITO, SEIGOU TAKASHIMA, NORIO NOMURA, TOMINORI KITAGAWA, HIROTAKA TOYODA

    ICRP-9/GEC-68/SPP-33 

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    Event date: 2015.10

    Language:English   Presentation type:Poster presentation  

    Venue:Hawaii Convention Center, Honolulu, Hawaii   Country:United States  

  271. Application of Atmospheric-Pressure Microwave Line Plasma for Low Temperature Process International conference

    HARUKA SUZUKI, SUGURU NAKANO, HITOSHI ITOH, MAKOTO SEKINE, MASARU HORI, HIROTAKA TOYODA

    ICRP-9/GEC-68/SPP-33 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Hawaii Convention Center, Honolulu, Hawaii   Country:United States  

  272. Origin of Substrate Heating During Oxide Film Deposition by DC Magnetron Discharge and Superposition of VHF Power International conference

    KENTA SETAKA, TAKASHI FUKUI, KENSUKE SASAI, HIROTAKA TOYODA

    ICRP-9/GEC-68/SPP-33 

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    Event date: 2015.10

    Language:English   Presentation type:Poster presentation  

    Venue:Hawaii Convention Center, Honolulu, Hawaii   Country:United States  

  273. Organic Decomposition Performance of In-line Liquid Treatment System Using Microwave Plasma International conference

    MICHIKO ITO, SEIGO TAKASHIMA, NORIO NOMURA, TOMINORI NOMURA, HIROTAKA TOYODA

    ICRP-9/GEC-68/SPP-33 

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    Event date: 2015.10

    Language:English   Presentation type:Poster presentation  

    Venue:Hawaii Convention Center, Honolulu, Hawaii   Country:United States  

  274. Ultraviolet Light Source Using Electrodeless Microwave Discharge International conference

    Taku Nishikawa, Hirotaka Toyoda

    ICRP-9/GEC-68/SPP-33 

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    Event date: 2015.10

    Language:English   Presentation type:Poster presentation  

    Venue:Hawaii Convention Center, Honolulu, Hawaii   Country:United States  

  275. Evaluation of Heat Flux to Film Surface in DC-VHF Superposed Magnetron Plasma International conference

    K. Setaka, T. Fukui, T. Suyama, K. Sasai, and H. Toyoda

    the 21th KJ workshop 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Osaek Greenyard hotel, Yangyang, Gangwon - do, Korea   Country:Korea, Republic of  

  276. ベンチュリ効果を用いたマイクロ波プラズマ液体処理装置の性能向上

    滝藤 奨,伊藤 美智子, 高島 成剛, 野村 記生, 北川 富則, 豊田 浩孝

    平成27年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋工業大学   Country:Japan  

  277. VHF-DC重畳マグネトロンスパッタにおける膜特性の評価

    巣山 拓,福井 崇史,福岡 侑士,笹井 建典,豊田 浩孝

    平成27年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋工業大学   Country:Japan  

  278. スロット内生成マイクロ波プラズマの基礎的検討

    山本 匡毅,鈴木 陽香,豊田 浩孝

    平成27年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋工業大学   Country:Japan  

  279. Desorption of Alkaline Metals from Electrolyte Liquid Contacting with a DC Pulsed-Plasma International conference

    Haruka Suzuki, Takafumi Takaba, Noriharu Takada and Hirotaka Toyoda

    AEPSE2015 

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    Event date: 2015.9

    Language:English   Presentation type:Poster presentation  

    Venue:Ramada Plaza Hotel, Jeju, Korea   Country:Korea, Republic of  

  280. Toward Real Uniform Sputtering – Spatial Uniformity of Thickness and Quality - Invited International conference

    Hirotaka Toyoda

    AEPSE2015 

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    Event date: 2015.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Ramada Plaza Hotel, Jeju, Korea   Country:Korea, Republic of  

  281. Optimization of In-line Plasma Treatment Performance International conference

    Michiko Ito, Seigo Takashima, Norio Nomura, Tominori Kitagawa and Hirotaka Toyoda

    AEPSE2015 

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    Event date: 2015.9

    Language:English   Presentation type:Poster presentation  

    Venue:Ramada Plaza Hotel, Jeju, Korea   Country:Korea, Republic of  

  282. 吸収分光法によるVHF-DC 重畳マグネトロンプラズマのガス温度測定

    第76回応用物理学会秋季学術講演会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋国際会議場   Country:Japan  

  283. Low Temperature Treatment using Atmospheric-Pressure Microwave Line Plasma

    Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori and Hirotaka Toyoda

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  284. VHF -DC 重畳 マグネトロンスパッタにおける膜表面粗さの制御

    第76回応用物理学会秋季学術講演会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  285. マイクロ波プラズマを用いた無電極紫外ランプの温度分布

    第76回応用物理学会秋季学術講演会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋国際会議場   Country:Japan  

  286. Influence of Solution Temperature on Processing Performance by In-line Plasma Treatment Device International conference

    MICHIKO ITO, SEIGO TAKASHIMA, NORIO NOMURA, TOMINORI KITAGAWA AND

    7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/8th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2015.3

    Language:English   Presentation type:Poster presentation  

    Venue: Nagoya University, Nagoya, Japan   Country:Japan  

  287. Gas Temperature Measurement in Atmospheric-Pressure Microwave Line Plasmas International conference

    HARUKA SUZUKI, SUGURU NAKANO, HITOSHI ITOH, MAKOTO SEKINE, MASARU HORI

    7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/8th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2015.3

    Language:English   Presentation type:Poster presentation  

    Venue: Nagoya University, Nagoya, Japan   Country:Japan  

  288. 吸収分光法によるArパルスマイクロ波プラズマのガス温度時分解測定

    瀬高 健太、豊田 浩孝

    第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東海大学 湘南キャンパス (神奈川県平塚市)   Country:Japan  

  289. マイクロ波プラズマを用いた無電極紫外ランプの開発

    西川 拓、豊田 浩孝

    第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東海大学 湘南キャンパス (神奈川県平塚市)   Country:Japan  

  290. VHF-DC 重畳マグネトロンスパッタにおける成膜速度評価

    福井 崇史, 福岡 侑士, 高田 昇治, 笹井建典, 豊田 浩孝

    第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学 湘南キャンパス (神奈川県平塚市)   Country:Japan  

  291. 大気圧マイクロ波ラインプラズマにおけるプラズマ挙動シミュレーション

    鈴木 陽香,中野 優,伊藤 仁,関根誠,堀 勝,豊田 浩孝

    第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東海大学 湘南キャンパス (神奈川県平塚市)   Country:Japan  

  292. パルスマイクロ波プラズを用いた イン ラ溶液処理装置 における処理性能の Duty 比依存性

    伊藤美智子, 高島成剛, 野村記生, 北川富則, 豊田浩孝

    第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:東海大学 湘南キャンパス (神奈川県平塚市)   Country:Japan  

  293. 表面波プラズマ支援RFスパッタによるMgO薄膜の堆積 International conference

    萩原敏哉, 豊田浩孝

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  294. 狭ギャップスロットアンテナを用いた大気圧ラインプラズマ生成 International conference

    中野優, 鈴木陽香, 伊藤仁, 関根誠, 堀勝, 豊田浩孝

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  295. 電解質溶液を電極としたパルスDCプラズマにおける液相由来金属原子の吸収分光計測 International conference

    鷹羽貴史, 鈴木陽香, 高田昇治, 豊田浩孝

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  296. インラインのプラズマ処理装置により生成される水溶液中のOHラジカル評価 International conference

    伊藤美智子,高島成剛,野村記生,北川富則,豊田浩孝

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  297. Plasma Science for Future Nanotechnology Invited International conference

    Hirotaka Toyoda

    The GRDC Symposium 2014 

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    Event date: 2014.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Konkuk University, Seoul, Korea   Country:Korea, Republic of  

  298. Pseudo-continuous meter-scale microwave plasma production under atmospheric pressure International conference

    Hirotaka Toyoda, Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine and Masaru Hori

    67th Annual Gaseous Electronics Conference 

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    Event date: 2014.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue: North Carolina Marriott City Center and Raleigh Convention Center   Country:United States  

  299. Discharge Characteristic of VHF-DC Superimposed Magnetron Sputtering System International conference

    Hirotaka Toyoda, Yushi Fukuoka, Takashi Fukui, Noriharu Takada, Kensuke Sasai

    67th Annual Gaseous Electronics Conference 

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    Event date: 2014.11

    Language:English   Presentation type:Poster presentation  

    Venue: North Carolina Marriott City Center and Raleigh Convention Center   Country:United States  

  300. プラズマ技術とその産業応用 Invited

    豊田 浩孝

    プラズマ技術講演会 

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    Event date: 2014.10

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:ポートメッセなごや 名古屋国際展示場『TECH Biz EXPO 2014』   Country:Japan  

  301. Plasma movement mechanism in pseudo-continuous meter-scale atmospheric-pressure line plasma

    Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori and Hirotaka Toyoda

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    Event date: 2014.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  302. VHF-DC 重畳マグネトロンスパッタ装置の特性評価

    福岡 侑士,福井 崇史, 高田 昇治, 笹井建典,豊田 浩孝

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:北海道大学札幌キャンパス   Country:Japan  

  303. ポータブルUHF プラズマ装置の開発

    古賀 翔太,豊田浩孝

    平成26年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:中京大学 名古屋キャンパス   Country:Japan  

  304. 吸収分光法によるAr プラズマの中性粒子温度測定

    瀬高 健太,豊田 浩孝

    平成26年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:中京大学 名古屋キャンパス   Country:Japan  

  305. VHF-DC 重畳マグネトロンプラズマ装置の特性評価

    福井 崇史,福岡 侑士,高田 昇治, 笹井 建典, 豊田 浩孝

    平成26年度電気・電子・情報関係学会東海支部連合大会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中京大学 名古屋キャンパス   Country:Japan  

  306. Novel sputtering system for uniform dielectric film deposition International conference

    Hirotaka Toyoda, Toshiya Hagihara

    International conference on microelectronics and plasma technology 2014 

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    Event date: 2014.7

    Language:English   Presentation type:Poster presentation  

    Venue:Gunsan Saemangeum Convention Center, Gunsan, Korea   Country:Korea, Republic of  

  307. Development of compact UHF plasma source Invited International conference

    Hirotaka Toyoda and Shota Koga

    The International Symposium on Plasma-Nano Materials and Processes 

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    Event date: 2014.4

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:The Riverside Hotel, Seoul South Korea   Country:Korea, Republic of  

  308. パルスDC マグネトロンプラズマ中の酸素負イオン計測

    福岡 侑士,小川 勇人, 高田 昇治, 豊田 浩孝

    第61回応用物理学関係連合講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:青山学院大学相模原キャンパス   Country:Japan  

  309. 電解質溶液電極を用いたパルスDCプラズマにおける電解質由来金属原子の二次元吸収分光計測

    鷹羽 貴史,鈴木 陽香,高田 昇治,豊田 浩孝

    第61回応用物理学関係連合講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:青山学院大学相模原キャンパス   Country:Japan  

  310. 誘導結合型 誘導結合型 HBr プラズマにおける Br ラジカル表面損失確率の評価

    藤井 良隆 ,飯野 大輝 ,豊田 浩孝

    第61回応用物理学関係連合講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:青山学院大学相模原キャンパス   Country:Japan  

  311. 表面波プラズマ支援RF スパッタにおける絶縁性ターゲットの表面電位評価

    萩原 敏哉,野田 智紀,豊田 浩孝

    第61回応用物理学関係連合講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:青山学院大学相模原キャンパス   Country:Japan  

  312. 液流路式マイクロ波プラズマの溶液処理性能評価

    伊藤 美智子, 高橋 朋大, 高島 成剛, 野村 記生, 北川 富則, 豊田 浩孝

    第61回応用物理学関係連合講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:青山学院大学相模原キャンパス   Country:Japan  

  313. メートル級マイクロ波大気圧ラインプズマの均一性評価

    中野 優 ,鈴木 陽香 ,伊藤 仁 ,関根 誠 ,堀 勝 ,豊田 浩孝

    第61回応用物理学関係連合講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:青山学院大学相模原キャンパス   Country:Japan  

  314. パルスマイクロ波励起大気圧ラインプラズマの空間分解計測

    鈴木 陽香 、中野 優 、伊藤 仁 、関根誠 、堀 勝 、豊田 浩孝

    第61回応用物理学関係連合講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:青山学院大学相模原キャンパス   Country:Japan  

  315. Evaluation the reaction of Br radical at silicon surface in an Inductively Coupled HBr plasma International conference

    YOSHITAKA FUJII, DAIKI IINO, AND HIROTAKA TOYODA

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  316. Magnet-Free Sputtering System Using Surface Wave Plasma International conference

    Toshiya Hagihara, Tomonori Noda and Hirotaka Toyoda

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  317. O- Energy Distribution in a VHF-Superimposed DC Magnetron Plasma International conference

    YUSHI FUKUOKA, HAYATO OGAWA, KENSUKE SASAI, NORIHARU TAKADA AND HIROTAKA TOYODA

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  318. Spatiotemporal Resolved Investigations of Atmospheric Pressure Line Plasma International conference

    SUGURU NAKANO, HARUKA SUZUKI, HITOSHI ITOH, MAKOTO SEKINE, MASARU HORI AND HIROTAKA TOYODA

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  319. Spatio-temporal Behavior of Alkaline Metals in a DC Pulsed-Plasma with Liquid Electrode International conference

    TAKAFUMI TAKABA, HARUKA SUZUKI, NORIHARU TAKADA, AND HIROTAKA TOYODA

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  320. Decomposition of Phenol by Pulsed Microwave Plasma Generated in the Vicinity of a Fluid Flow Path International conference

    MICHIKO ITO, TOMOHIRO TAKAHASHI, SEIGO TAKASHIMA, NORIO NOMURA, TOMINORI KITAGAWA AND HIROTAKA TOYODA

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  321. Design of Meter-Scale Compact Microwave Antenna Structure by Electromagnetic Simulation International conference

    SHOGO KONDO, KENSUKE SASAI, NORIHARU TAKADA AND HIROTAKA TOYODA

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  322. Influence of Discharge-off Duration on the Plasma Density in an Atmospheric-pressure Pulsed Microwave Discharge International conference

    KAZUKI EGASHIRA, HIROTAKA TOYODA

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  323. Production of High-Uniform Microwave Line Plasma at Atmospheric Pressure International conference

    HARUKA SUZUKI, SUGURU NAKANO,HITOSHI ITOH, MAKOTO SEKINE, MASARU HORI AND HIROTAKA TOYODA

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/7th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2014.3

    Language:English   Presentation type:Poster presentation  

    Venue:Meijo University, Nagoya, Japan   Country:Japan  

  324. Advanced microwave plasma technology for liquid treatment Invited International conference

    Hirotaka Toyoda, T. Takahashi, N. Takada

    46th Annual Winter Conference following a special symposium 

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    Event date: 2014.2

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:BO Phoenix Park (Pyeongchang, Gangwon-do), Korea   Country:Korea, Republic of  

  325. Release Behavior of Metal Atom from Solution Surface Contacting to Plasma International conference

    Haruka Suzuki, Takafumi Takaba, Hirotaka Toyoda

    The 18th International Workshop of Advanced Plasma Processing and Diagnostics 

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    Event date: 2014.2

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Fukuoka, Japan   Country:Japan  

  326. Time- and space-resolved measurement of electron density in an atmospheric pressure microwave plasma Invited International conference

    Hirotaka Toyoda, Kazuki Egashira

    The 18th International Workshop of Advanced Plasma Processing and Diagnostics 

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    Event date: 2014.2

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Fukuoka, Japan   Country:Japan  

  327. Meter -Scale Production of Atmospheric Pressure Microwave Plasma by Travelling Wave International conference

    Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori, Hirotaka Toyoda

    ICRP-8/SPP-3 

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    Event date: 2014.2

    Language:English   Presentation type:Poster presentation  

    Venue:Fukuoka, Japan   Country:Japan  

  328. Production of high-density meter-length plasma with metal-covered slot antenna International conference

    N. Takada, S. Kondo, S. Nakano, K. Sasai and H. Toyoda

    ICRP-8/SPP-3 

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    Event date: 2014.2

    Language:English   Presentation type:Poster presentation  

    Venue:Fukuoka, Japan   Country:Japan  

  329. Dependence of Electron density on Pulse-OFF Time in an Atmospheric Pulse Microwave Discharge International conference

    Kazuki Egashira1, Hirotaka Toyoda

    ICRP-8/SPP-3 

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    Event date: 2014.2

    Language:English   Presentation type:Poster presentation  

    Venue:Fukuoka, Japan   Country:Japan  

  330. Development of Magnet-Free Uniform Sputtering System by RF and Microwave Power Superposition International conference

    Toshiya Hagihara, Tomonori Noda, Hirotaka Toyoda

    ICRP-8/SPP-3 

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    Event date: 2014.2

    Language:English   Presentation type:Poster presentation  

    Venue:Fukuoka, Japan   Country:Japan  

  331. Nano-scale film surface control by advanced sputtering system Invited International conference

    Hirotaka Toyoda

    THERMEC' 2013 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Las Vegas, USA   Country:United States  

  332. マイクロ波プラズマを用いた無磁場酸化物薄膜スパッタ装置の基礎的検討

    萩原敏哉,野田智紀,豊田浩孝

    電気学会プラズマ研究会 

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    Event date: 2013.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名城大学名駅サテライト   Country:Japan  

  333. Effect of superposing ultrasonic wave on microwave plasma under water

    Tomohiro Takahashi, Noriharu Takada, and Hirotaka Toyoda

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    Event date: 2013.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  334. Water Treatment by High-Density Microwave Plasma Invited International conference

    Hirotaka Toyoda, Tomohiro Takahashi, Takafumi Takaba, Haruka Suzuki, Noriharu Takada

    ICSE 2013(International Conference on Surface Engineering) 

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    Event date: 2013.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Haeundae Grand Hotel, Busan, Korea   Country:Japan  

  335. 大気圧パルスプラズマのプラズマ密度時分解計測とプラズマ挙動解析 Invited

    豊田 浩孝

    第29回 九州・山口プラズマ研究会 

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    Event date: 2013.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  336. Development of Magnet-Free Sputtering System for Dielectric Film Deposition with Surface-Wave Excited Plasma International conference

    T. Noda,T. Hagihara, H. Toyoda

    66th Annual Gaseous Electronics Conference 

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    Event date: 2013.10

    Language:English   Presentation type:Poster presentation  

    Venue:Princeton, New Jersey   Country:United States  

  337. Meter-Scale Atmospheric-Pressure Microwave Plasma Using Sub-Millimeter-Gap Slot Invited International conference

    HIROTAKA TOYODA

    66th Annual Gaseous Electronics Conference 

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    Event date: 2013.10

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Princeton, New Jersey   Country:United States  

  338. Electromagnetic Simulation of Long-Slotted Waveguide Antenna for Production of Meter-Scale Plasma under Atmospheric Pressure International conference

    H. Suzuki, S. Nakano, H. Itoh, M. Sekine, M. Hori, H. Toyoda

    66th Annual Gaseous Electronics Conference 

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    Event date: 2013.10

    Language:English   Presentation type:Poster presentation  

    Venue:Princeton, New Jersey   Country:United States  

  339. 表面波プラズマを用いた無磁場スパッタ装置の検討

    萩原 敏哉,野田 智紀,豊田 浩孝

    平成25年度電気関係学会東海支部連合大会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:静岡大学   Country:Japan  

  340. 電解質溶液電極を用いた大気圧パルスDCプラズマにおける放出金属原子の時分解吸収分光計測

    鷹羽貴史,鈴木陽香, 高田昇治, 豊田浩孝

    平成25年度電気関係学会東海支部連合大会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:静岡大学   Country:Japan  

  341. VHF-DC重畳マグネトロンプラズマの生成及び特性評価

    福岡 侑士,小川 勇人,豊田 浩孝

    平成25年度電気関係学会東海支部連合大会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:静岡大学   Country:Japan  

  342. 誘導結合型HBrプラズマにおけるBrラジカルの表面損失確率評価

    藤井 良隆,豊田 浩孝

    平成25年度電気関係学会東海支部連合大会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:静岡大学   Country:Japan  

  343. 進行波重畳によるメートル級マイクロ大気圧ランプズの生成

    中野 優,鈴木 陽香 ,関根 誠,堀 勝,豊田 浩孝,伊藤 仁

    平成25年度電気関係学会東海支部連合大会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:静岡大学   Country:Japan  

  344. 新規アンテナ構造を用いたメートル級マイクロ波大気圧ラインプラズマの生成

    鈴木 陽香 ,中野 優 ,伊藤 仁 ,関根誠 ,堀 勝 ,豊田 浩孝

    第74回応用物理学会学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:同志社大学京田辺キャンパス   Country:Japan  

  345. マイクロ波励起プラズマによる流体連続処理

    高橋 朋大,高田 昇治,豊田 浩孝

    第74回応用物理学会学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:同志社大学京田辺キャンパス   Country:Japan  

  346. 多目的マイクロ波アンテナの大面積化と高密度プラズマ生成

    近藤将吾,中野優、高田昇治,豊田浩孝

    第74回応用物理学会学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:同志社大学京田辺キャンパス   Country:Japan  

  347. 大気圧マイクロ波放電 におけるパルス停止時間のプラズマへの影響

    江頭一輝 ,豊田浩孝

    第74回応用物理学会学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:同志社大学京田辺キャンパス   Country:Japan  

  348. マイクロ波プラズマを用いた無磁場酸化物薄膜スパッタ装置の開発

    野田 智紀,萩原 敏哉,豊田 浩孝

    第74回応用物理学会学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:同志社大学京田辺キャンパス   Country:Japan  

  349. VHF-DC重畳マグネトロンプラズマの生成とプラズマ計測

    小川勇人,福岡 侑士,豊田浩孝

    第74回応用物理学会学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:同志社大学京田辺キャンパス   Country:Japan  

  350. Cross section measurement of the neutral dissociation of CH2F2 by electron impact International conference

    H. Ogawa and H. Toyoda

    DPS2013 (35th International Symposium on Dry Process) 

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    Event date: 2013.8

    Language:English   Presentation type:Poster presentation  

    Venue:Ramada Plaza Jeju Hotel in Korea   Country:Korea, Republic of  

  351. Plasma Characteristics of Multipurpose Microwave Antenna and Its Application to Silicon Thin Film Deposition International conference

    S. Kondo, S. Nakano and H. Toyoda

    DPS2013 (35th International Symposium on Dry Process) 

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    Event date: 2013.8

    Language:English   Presentation type:Poster presentation  

    Venue:Ramada Plaza Jeju Hotel in Korea   Country:Korea, Republic of  

  352. Superposition of Ultrasonic Power on Microwave Plasma and Its Effect on Solution Treatment Efficiency International conference

    T. Takahashi, N. Takada, and H. Toyoda

    DPS2013 (35th International Symposium on Dry Process) 

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    Event date: 2013.8

    Language:English   Presentation type:Poster presentation  

    Venue:Ramada Plaza Jeju Hotel in Korea   Country:Korea, Republic of  

  353. Development of Magnet-Free Uniform Sputtering System for Dielectric Film Deposition International conference

    Tomonori Noda, and Hirotaka Toyoda

    DPS2013 (35th International Symposium on Dry Process) 

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    Event date: 2013.8

    Language:English   Presentation type:Poster presentation  

    Venue:Ramada Plaza Jeju Hotel in Korea   Country:Korea, Republic of  

  354. Surface Treatment of Three-Dimensional Product by Flexible Twin Microwave Plasma Source International conference

    K. Sasai, K. Ishikawa, H. Toyoda and H. Sugai

    DPS2013 (35th International Symposium on Dry Process) 

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    Event date: 2013.8

    Language:English   Presentation type:Poster presentation  

    Venue:Ramada Plaza Jeju Hotel in Korea   Country:Korea, Republic of  

  355. Influence of gas addition and substrate bias voltage on Br radical behavior in HBr inductively coupled plasma International conference

    D. Iino, Y. Nojiri, K. Suzuki, T. Oike, Y. Fujii, and H. Toyoda

    DPS2013 (35th International Symposium on Dry Process) 

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    Event date: 2013.8

    Language:English   Presentation type:Poster presentation  

    Venue:Ramada Plaza Jeju Hotel in Korea   Country:Korea, Republic of  

  356. High density plasma production by a Multipurpose Microwave Antenna International conference

    Hirotaka Toyoda, Shogo Kondo, Suguru Nakano, Noriharu Takada

    The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013) 

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    Event date: 2013.8

    Language:English   Presentation type:Poster presentation  

    Venue:Jeju, Korea   Country:Korea, Republic of  

  357. Influence of Si Substrate Temperature and Bias Voltage on Surface reaction of Br Radical in HBr Inductively Coupled Plasma International conference

    D. Iino, Y. Fujii, T. Oike, H. Toyoda

    The 12th Asia Pacific Physics Conference 

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    Event date: 2013.7

    Language:English   Presentation type:Poster presentation  

    Venue:Chiba, Japan   Country:Japan  

  358. Absorption Spectroscopy of Atomic Metal in Atmospheric-pressure Plasma with Electrolyte Solution Electrode International conference

    H. Suzuki, T. Takaba, N. Takada and H. Toyoda

    Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 

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    Event date: 2013.5

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Sungkyunkwan University, Korea   Country:Korea, Republic of  

  359. Influence of Ultrasonic Power Superposition to Microwave Plasma Produced under Water Invited International conference

    Hirotaka Toyoda

    Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 

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    Event date: 2013.5

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Sungkyunkwan University, Korea   Country:Korea, Republic of  

  360. 超音波重畳マイクロ波液中プラズマによる液中有機物処理

    高橋 朋大,高田 昇治,豊田 浩孝

    第60回応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学   Country:Japan  

  361. 多目的マイクロ波アンテナを用いたプラズマ生成とSi薄膜形成への応用

    近藤将吾,中野優,豊田浩孝

    第60回応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:神奈川工科大学   Country:Japan  

  362. 低圧環境下における無磁場マイクロ波プラズマ生成と応用

    野田 智紀,中坊 将人,豊田 浩孝

    第60回応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学   Country:Japan  

  363. 電解質溶液電極を用いた大気圧パルスプラズマにおける金属原子吸収分光計測

    鈴木 陽香,鷹羽 貴史,高田 昇治,豊田 浩孝

    第60回応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学   Country:Japan  

  364. CH2F2への電子衝突によるラジカル生成断面積の評価

    小川勇人,豊田浩孝

    第60回応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学   Country:Japan  

  365. 誘導結合型HBr プラズマ中のBr ラジカル挙動

    飯野大輝,野尻康弘,鈴木啓之,大池 匠,藤井良隆,豊田浩孝

    第60回応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学   Country:Japan  

  366. 大気圧パルスマイクロ波プラズマにおける放電開始後のプラズマ挙動

    江頭一輝 ,村瀬卓也 ,豊田浩孝

    第60回応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:神奈川工科大学   Country:Japan  

  367. スパッタリングにおける高エネルギー粒子の発生とその制御 Invited

    豊田 浩孝

    プラズマ材料科学第153委員会第108回研究会 

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    Event date: 2013.2

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:弘済会館   Country:Japan  

  368. Temporal and Spatial Variations of Atomic Metals in Atmospheric-Pressure Pulsed-Plasmas with Liquid Electrode International conference

    H.Suzuki, T. Takaba, N. Takada and H. Toyoda

    The 6th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2013.2

    Language:English   Presentation type:Poster presentation  

    Venue:Gero Japan   Country:Japan  

  369. Microwave Plasma Production - From Micro- to Meter-scale - Invited International conference

    H. Toyoda

    The 6th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2013.2

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Gero Japan   Country:Japan  

  370. Absolute Dissociation Cross Section of CH2F2 into CH2F for Electron-Impact International conference

    H.Ogawa and H.Toyoda

    The 6th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2013.2

    Language:English   Presentation type:Poster presentation  

    Venue:Gero Japan   Country:Japan  

  371. Deposition of Microcrystalline Silicon Thin Film by Compact Antenna Structure International conference

    S.Kondo, S.Nakano and H. Toyoda

    The 6th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2013.2

    Language:English   Presentation type:Poster presentation  

    Venue:Gero Japan   Country:Japan  

  372. Synergistic Effect of Ultrasonic Wave on Microwave Excited Plasma Production under Water International conference

    T. Takahashi, N. Takada and H. Toyoda

    The 6th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2013.2

    Language:English   Presentation type:Poster presentation  

    Venue:Gero Japan   Country:Japan  

  373. Surface-Wave Excited Plasma Produced in Low Pressures International conference

    T. Noda, M. Nakabo and H. Toyoda

    The 6th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2013.2

    Language:English   Presentation type:Poster presentation  

    Venue:Gero Japan   Country:Japan  

  374. Measurement of Br Atom Density in an Inductively-Coupled HBr Plasma by Appearance Mass Spectrometry International conference

    Y.Fujii, T. Oike, D. Iino, K. Suzuki and H. Toyoda

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2013.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Aichi, Japan   Country:Japan  

  375. Development of Compact Microwave Plasma Source and Its Application to Si Film Deposition International conference

    S. Kondo, S. Nakano and H. Toyoda

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2013.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Aichi, Japan   Country:Japan  

  376. Production of Surface-Wave Excited Plasma in Low Pressures International conference

    T.Noda, M. Nakabo and H. Toyoda

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2013.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Aichi, Japan   Country:Japan  

  377. Effect of Superposition of Ultrasonic Power on Microwave Plasma under Water International conference

    T. Takahashi, N. Takada, H. Toyoda

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2013.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Aichi, Japan   Country:Japan  

  378. Absolute Cross Section Measurement for Electron-Impact Dissociation of CH2F2 into CH2F International conference

    H. Ogawa and H. Toyoda

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2013.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Aichi, Japan   Country:Japan  

  379. Temporal Variation of Alkaline Metals in an Atmospheric-Pressure Pulsed-Plasma with Liquid Electrode International conference

    H. Suzuki, T. Takaba, N. Takada, H. Toyoda

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2013.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Aichi, Japan   Country:Japan  

  380. Time-Resolved Measurement of Electric Field in Ar and N2 Atmospheric-Pressure Microwave Plasmas International conference

    K. Egashira, T. Murase AND H. Toyoda

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2013.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Aichi, Japan   Country:Japan  

  381. Measurement of Electron-Impact Cross Section for Dissociation of CH2F2 into CH2F International conference

    H. Ogawa and H. Toyoda

    The 16th International Workshop of Advanced Plasma Processing and Diagnostics 

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    Event date: 2013.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  382. コンパクトマイクロ波アンテナを用いた微結晶シリコン薄膜の生成

    近藤将吾,中野優,豊田浩孝

    第30回プラズマプロセシング研究会 

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    Event date: 2013.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:アクトシティー浜松   Country:Japan  

  383. 二電子ビーム法を用いたCH2F2への電子衝突によるCH2Fラジカル生成断面積測定

    小川勇人,豊田浩孝

    第30回プラズマプロセシング研究会 

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    Event date: 2013.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:アクトシティー浜松   Country:Japan  

  384. シュタルク分光を用いたAr及びN2添加大気圧マイクロ波プラズマの時分解計測

    江頭 一輝,村瀬 卓也,豊田 浩孝

    第30回プラズマプロセシング研究会 

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    Event date: 2013.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:アクトシティー浜松   Country:Japan  

  385. マイクロ波液中プラズマ生成における超音波波動の影響

    高橋朋大,高田昇治,豊田浩孝

    第30回プラズマプロセシング研究会 

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    Event date: 2013.1

    Language:Japanese   Presentation type:Poster presentation  

    Venue:アクトシティー浜松   Country:Japan  

  386. Diagnostics and Control of High Energy Species in Magnetron Sputter Plasmas Invited International conference

    Hirotaka TOYODA

    The International Symposium on Visualization in Joining & Welding Science through Advanced Measurements and Simulation 

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    Event date: 2012.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Hotel Hankyu Expo Park, Osaka, Japan   Country:Japan  

  387. 液体電極を用いた大気圧マイクロ波プラズマの光学的時分解計測 International conference

    鈴木陽香, 鷹羽貴史, 高田昇治, 豊田浩孝

    第5回プラズマ技術産業応用センター&プラズマが拓くものづくり研究会国際シンポジウム 

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    Event date: 2012.10

    Language:Japanese   Presentation type:Poster presentation  

    Venue:サイエンス交流プラザ大会議室(守山)   Country:Japan  

  388. Plasma ignition dynamics in atmospheric-pressure pulsed-microwave plasma International conference

    H. Toyoda, T. Murase, K. Egashira

    GEC2012(65th Annual Gaseous Electronics Conference) 

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    Event date: 2012.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Austin, Tevas, USA   Country:United States  

  389. A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink International conference

    Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Hirotaka Toyoda and Masaru Hori

    11th APCPST (Asia Pacific Conference on Plasma Science and Technology)and 25th SPSM (Symposium on Plasma Science for Materials) 

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    Event date: 2012.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Kyoto University, Kyoto, Japan   Country:Japan  

  390. Preparation of Direct Alcohol Fuel Cells by Plasma Technology International conference

    Y. D. Meng, C. X. Zhang, J. Hu, M. Nagatsu and H. Toyoda

    11th APCPST (Asia Pacific Conference on Plasma Science and Technology)and 25th SPSM (Symposium on Plasma Science for Materials) 

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    Event date: 2012.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Kyoto University, Kyoto, Japan   Country:Japan  

  391. Temporal Variation of Ar/H2 and N2/H2 Atmospheric Pressure Microwave Plasma International conference

    Takuya Murase, Kazuki Egashira, Hirotaka Toyoda

    11th APCPST (Asia Pacific Conference on Plasma Science and Technology)and 25th SPSM (Symposium on Plasma Science for Materials) 

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    Event date: 2012.10

    Language:English   Presentation type:Poster presentation  

    Venue:Kyoto University, Kyoto, Japan   Country:Japan  

  392. 希ガス及び分子ガスを用いた大気圧パルスマイクロ波放電におけるプラズマの時間発展

    江頭 一輝,村瀬 卓也,豊田 浩孝

    平成24年度電気関係学会東海支部連合大会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:豊橋技術科学大学   Country:Japan  

  393. CH2F2 への電子衝突によるCH2F ラジカル生成絶対断面積

    小川 勇人,豊田 浩孝

    平成24年度電気関係学会東海支部連合大会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:豊橋技術科学大学   Country:Japan  

  394. スロットアンテナ励起マイクロ波プラズマによる微結晶シリコン薄膜の生成

    近藤 将吾,豊田 浩孝

    平成24年度電気関係学会東海支部連合大会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:豊橋技術科学大学   Country:Japan  

  395. マイクロ波液中プラズマ生成における超音波重畳効果

    高橋 朋大,高田 昇治, 豊田 浩孝

    平成24年度電気関係学会東海支部連合大会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:豊橋技術科学大学   Country:Japan  

  396. 低圧環境下における高密度マイクロ波プラズマの生成

    野田 智紀,中坊 将人,豊田 浩孝

    平成24年度電気関係学会東海支部連合大会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:豊橋技術科学大学   Country:Japan  

  397. 液体を電極としたマイクロ波励起大気圧プラズマの発光分光計測

    鈴木 陽香,鷹羽 貴史,高田 昇治,豊田 浩孝

    第73回応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:愛媛大学・松山大学   Country:Japan  

  398. RFマグネトロンプラズマにおける高エネルギーO-イオン挙動のシミュレーション

    中坊 将人,豊田 浩孝

    第73回応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:愛媛大学・松山大学   Country:Japan  

  399. 誘導結合HBrプラズマ中Br原子の出現質量分析

    大池 匠,藤井 良隆,豊田 浩孝

    第73回応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:愛媛大学・松山大学   Country:Japan  

  400. 大気圧パルスマイクロ波プラズマにおける放電開始後のプラズマの時間発展

    村瀬卓也,江頭一輝,豊田浩孝

    第73回応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛媛大学・松山大学   Country:Japan  

  401. Microwave Plasma Production - From Low- to Atmospheric-pressure. From Micro- to Meter-scale - Invited International conference

    Hirotaka Toyoda

    The 15th International Workshop on Advanced Plasma Processing and Diagnostics 

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    Event date: 2012.6

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Sungkyunkwan University, Korea   Country:Korea, Republic of  

  402. Time-resolved Evaluation of Ar/H2 Microwave Plasma in Atmospheric Pressure Using Optical Emission Spectroscopy International conference

    T. Murase, K. Egashira, and H. Toyoda

    The 15th International Workshop on Advanced Plasma Processing and Diagnostics 

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    Event date: 2012.6

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Sungkyunkwan University, Korea   Country:Korea, Republic of  

  403. 誘導結合HBrプラズマにおける高エネルギー電子の空間分布評価

    大池 匠,石島 達夫,豊田 浩孝

    第59回応用物理学関係連合講演会 

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    Event date: 2012.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  404. シュタルク分光を用いた大気圧パルスマイクロ波プラズマの時空間分解計測

    村瀬卓也,石島達夫,豊田浩孝

    第59回応用物理学関係連合講演会 

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    Event date: 2012.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  405. 液中気泡内における水蒸気とマイクロ波プラズマの相互作用

    鈴木 陽香,石島 達夫,豊田 浩孝

    第59回応用物理学関係連合講演会 

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    Event date: 2012.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  406. Temporal-Spatial Measurement of Electric Field Using Stark Spectroscopy in Atmospheric-pressure Pulsed Slot-antenna Microwave Plasma International conference

    T. Murase, T. Ishijima and H. Toyoda

    The 5th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2012.3

    Language:English   Presentation type:Poster presentation  

    Venue:Inuyama, Japan   Country:Japan  

  407. Temporal Variation of Water Vapor Pressure inside a Bubble under Water Induced by Microwave Plasma International conference

    H. Suzuki, T. Ishijima and H. Toyoda

    The 5th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2012.3

    Language:English   Presentation type:Poster presentation  

    Venue:Inuyama, Japan   Country:Japan  

  408. Spatial Profile Measurement of High Energy Electrons in an Inductively Coupled Plasma with Electronegative Gas International conference

    Takumi Oike, Tatsuo Ishijima and Hirotaka Toyoda

    The 5th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2012.3

    Language:English   Presentation type:Poster presentation  

    Venue:Inuyama, Japan   Country:Japan  

  409. Simulation of Spatial- and Energy-Distributions of High-Energy O- Ions in a RF Magnetron Plasma International conference

    MASATO NAKABO, KAZUNAGA ONO, TADASHI MORITA, NORIKAZU OHSHIMA, TATSUO ISHIJIMA AND HIROTAKA TOYODA

    4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2012.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  410. Evaluation of High Energy Electrons in an Inductively Coupled Plasma Using Optical Emission Spectroscopy International conference

    TAKUMI OIKE ,TATSUO ISHIJIMA AND HIROTAKA TOYODA

    4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2012.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  411. Temporal Variation of Water Vapor Pressure inside a Bubble under Water Induced by Atmospheric Pressure Microwave Plasma International conference

    HARUKA SUZUKI, TATSUO ISHIJIMA AND HIROTAKA TOYODA

    4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2012.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  412. Spatio-temporal Variation of Microwave Electric Field in an Atmospheric Pressure Slot-antenna Microwave Plasma International conference

    TAKUYA MURASE, TATSUO ISHIJIMA AND HIROTAKA TOYODA

    4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2012.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  413. Bubble Plasma Production under Water using Microwave -Basic Study in Multiphase Structure and Application- Invited International conference

    T. Ishijima, H. Suzuki, K. Kanetake, H. Toyoda

    12th International Symposium on Biomimetic Materials Processing(BWWMP-12) 

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    Event date: 2012.1

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  414. Evaluation of High Energy Electrons in an Inductively- Coupled Plasma with Electronegative Gas International conference

    T. Oike and H. Toyoda, T. Ishijima

    The 14th International Workshop of Advanced Plasma Processing and Diagnostics 

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    Event date: 2012.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  415. Microwave Plasma Production under Water - Basic Research and Organic Decomposition - Invited International conference

    H. Toyoda, K. Kanetake, H. Suzuki and T. Ishijima

    The 14th International Workshop of Advanced Plasma Processing and Diagnostics 

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    Event date: 2012.1

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  416. Evaluation of Deposited Film Suppression on the Dielectric Window Using Gas Flow

    K. Keyamura, T. Ishijima and H. Toyoda

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    Event date: 2011.12

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  417. Improvement of Silicon Thin Film Quality by Modified Microwave Antenna under High Pressure SiH4/H2 Plasma

    Y. Ito, S.Kondo, T. Ishijima and H. Toyoda

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    Event date: 2011.12

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  418. マイクロ波励起プラズマを用いた減圧流水中有機物の分解処理における効率向上 International conference

    金武浩司、石島達夫、豊田浩孝

    第4回プラズマ技術産業応用センター&プラズマが拓くものづくり研究会国際シンポジウム  

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    Event date: 2011.12

    Language:Japanese   Presentation type:Poster presentation  

    Venue:なごやサイエンスパーク、サイエンス交流プラザ   Country:Japan  

  419. RFマグネトロンプラズマ中の酸素負イオン軌道解析 International conference

    中坊 将人, 小野 一修,森田 正,大嶋 則和,石島 達夫,豊田 浩孝

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    Event date: 2011.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  420. 発光分光法を用いたICPアンテナ近傍の高エネルギー電子空間分布計測 International conference

    大池匠, 石島達夫,豊田浩孝

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    Event date: 2011.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  421. Microwave Plasma CVD for High-Rate and Large-Area Si Deposition - Plasma Control and Plasma Chemistry- Invited International conference

    Hirotaka Toyoda

    Topical Workshop on Green Plasma-Nano Technology- Green Energy and Flexible New Materials - 

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    Event date: 2011.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Sungkyunkwan University, Korea   Country:Japan  

  422. マイクロ波励起液中気泡内プラズマの時分解発光分光計測 International conference

    鈴木陽香, 石島達夫,豊田浩孝

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    Event date: 2011.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  423. 時空間発光分光によるスロットアンテナ励起大気圧マイクロ波プラズマの診断 International conference

    村瀬卓也, 石島達夫,豊田浩孝

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    Event date: 2011.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  424. Time-resolved OES measurement of microwave plasma produced inside controlled bubbles under water International conference

    T. Ishijima, H. Suzuki and H. Toyoda

    GEC2011(64th Annual Gaseous Electronics Conference) 

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    Event date: 2011.11

    Language:English   Presentation type:Poster presentation  

    Venue:Salt Lake City,Utah, USA   Country:United States  

  425. Suppression of film deposition in a plasma CVD system using gas flow International conference

    H. Toyoda, K. Keyamura and T. Ishijima

    GEC2011(64th Annual Gaseous Electronics Conference) 

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    Event date: 2011.11

    Language:English   Presentation type:Poster presentation  

    Venue:Salt Lake City,Utah, USA   Country:United States  

  426. Influence of microwave electric field on Hb broadening in atmospheric pressure microwave plasma International conference

    H. Toyoda, T. Murase and T. Ishijima

    GEC2011(64th Annual Gaseous Electronics Conference) 

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    Event date: 2011.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Salt Lake City,Utah, USA   Country:United States  

  427. Spatial Profile of SiH4 and SiH3 Fluxes under High Speed Gas Flow Environ International conference

    M. Ikeda, T. Ishijima and H. Toyoda

    DPS2011(33rd International Symposium on Dry Process) 

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    Event date: 2011.11

    Language:English   Presentation type:Poster presentation  

    Venue:Kyoto Garden Palace Hotel,Kyoto, Japan   Country:Japan  

  428. Trajectory Simulation of High-Energy O- Ions in RF Magnetron Plasma International conference

    M. Nakabo, K. Ono, T. Morita, N. Ohshima, K. Kinoshita, T. Ishijima and H. Toyoda

    DPS2011(33rd International Symposium on Dry Process) 

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    Event date: 2011.11

    Language:English   Presentation type:Poster presentation  

    Venue:Kyoto Garden Palace Hotel,Kyoto, Japan   Country:Japan  

  429. 誘導結合型プラズマにおける高エネルギー電子空間分布評価

    大池 匠,石島 達夫,豊田 浩孝

    応用物理学会 プラズマエレクトロニクス分科会20周年(研究会創設25周年)記念 特別シンポジウム 

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    Event date: 2011.10

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋大学   Country:Japan  

  430. パルスマイクロ波液中気泡内プラズマの時分解発光分光計測

    鈴木 陽香,石島 達夫,豊田 浩孝

    応用物理学会 プラズマエレクトロニクス分科会20周年(研究会創設25周年)記念 特別シンポジウム 

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    Event date: 2011.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  431. 大気圧パルスマイクロ波プラズマの時空間発光分光計測

    村瀬 卓,石島 達夫,豊田 浩孝

    応用物理学会 プラズマエレクトロニクス分科会20周年(研究会創設25周年)記念 特別シンポジウム 

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    Event date: 2011.10

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋大学   Country:Japan  

  432. 数値シミュレーションを用いたRFマグネトロンプラズマにおける酸素負イオンの軌道解析

    中坊 将人, 森田 正, 小野 一修,大嶋 則和, 石島 達夫, 豊田 浩孝

    応用物理学会 プラズマエレクトロニクス分科会20周年(研究会創設25周年)記念 特別シンポジウム 

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    Event date: 2011.10

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋大学   Country:Japan  

  433. 時空間発光分光計測を用いた大気圧パルスマイクロ波プラズマ生成過程の観察

    村瀬 卓也*,石島 達夫,豊田 浩孝

    平成23年度電気関係学会東海支部連合大会 

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    Event date: 2011.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:三重大学   Country:Japan  

  434. パルスマイクロ波液中プラズマの時分解発光分光計測

    鈴木 陽香,石島 達夫,豊田 浩孝

    平成23年度電気関係学会東海支部連合大会 

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    Event date: 2011.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:三重大学   Country:Japan  

  435. 分光的手法を用いた誘導結合プラズマ中高エネルギー電子の空間分布評価

    大池 匠,石島 達夫,豊田 浩孝

    平成23年度電気関係学会東海支部連合大会 

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    Event date: 2011.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:三重大学   Country:Japan  

  436. 数値シミュレーションを用いたマグネトロンプラズマ中の高エネルギー負イオン挙動の解析

    中坊 将人,森田 正,小野 一修,大嶋 則和,木下 啓藏,石島 達夫,豊田 浩孝

    平成23年度電気関係学会東海支部連合大会 

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    Event date: 2011.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:三重大学   Country:Japan  

  437. 質量分析法を用いた大気圧マイクロ波プラズマの気相診断

    澤口 陽介,石島 達夫,豊田 浩孝

    平成23年度電気関係学会東海支部連合大会 

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    Event date: 2011.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:三重大学   Country:Japan  

  438. Silicon Film Deposition by Microwave-Excited SiH4/H2 Plasma Invited International conference

    H. Toyoda, Y. Ito, S. Kondo, T. Ishijima

    The 8th Asian-European International Conference on Plasma Surface Engineering(AEPSE2011) 

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    Event date: 2011.9

    Language:English   Presentation type:Poster presentation  

    Venue:Dalianm, China   Country:China  

  439. Particle Diagnostics of Reactive Species in Processing Plasmas Invited International conference

    Hirotaka Toyoda

    The 8th Asian-European International Conference on Plasma Surface Engineering(AEPSE2011) 

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    Event date: 2011.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Dalianm, China   Country:China  

  440. ガス流を用いた誘電体窓への膜堆積抑制の検討

    毛家村 一樹,石島 達夫,豊田 浩孝

    第72回応用物理学会学術講演会 

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    Event date: 2011.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:山型大学   Country:Japan  

  441. Behavior of High-Energy Oxygen Negative Ions in a RF Magnetron Plasma Invited International conference

    Hirotaka Toyoda

    The XXX International Conference on Phenomena in Ionized Gases (ICPIG) 

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    Event date: 2011.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Belfast, Northern Ireland   Country:United Kingdom  

  442. Influence of Microwave Electric Field on Spatial and Time-Variation of Hb Spectra in Pulsed-Microwave Atmospheric Pressure Plasma International conference

    T. Murase, A. Kamata, T. Ishijima, H. Toyoda

    The XXX International Conference on Phenomena in Ionized Gases (ICPIG) 

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    Event date: 2011.9

    Language:English   Presentation type:Poster presentation  

    Venue:Belfast, Northern Ireland   Country:United Kingdom  

  443. 高圧力SiH4/H2マイクロ波プラズマによるシリコン製膜

    伊藤裕紀,近藤将吾,石島達夫,豊田浩孝

    第72回応用物理学会学術講演会 

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    Event date: 2011.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:山型大学   Country:Japan  

  444. ガス流環境下におけるH2/SiH4プラズマの気相診断

    池田昌平,石島 達夫,豊田 浩孝

    第72回応用物理学会学術講演会 

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    Event date: 2011.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:山型大学   Country:Japan  

  445. マイクロ波励起プラズマを用いた有機物含有流体処理におけるプロセスの高効率化

    金武 浩司,石島 達夫,豊田 浩孝

    第72回応用物理学会学術講演会 

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    Event date: 2011.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:山型大学   Country:Japan  

  446. Flowing Liquid Treatment by Microwave Plasma International conference

    K. Kanetake, T. Ishijima, and H. Toyoda

    The 13th International Workshop on Advanced Plasma Processing and Diagnostics 

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    Event date: 2011.7

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Deajeon, Korea   Country:Korea, Republic of  

  447. Spatiotemporal measurement of microwave electric field in an atmospheric pressure microwave plasma Invited International conference

    Hirotaka Toyoda, Takuya Murase, Tasuo Ishijima

    The 13th International Workshop on Advanced Plasma Processing and Diagnostics 

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    Event date: 2011.7

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Deajeon, Korea   Country:Korea, Republic of  

  448. Behavior of High Energy Negative Ions in RF Magnetron Sputtering Plasma Invited

    H. Toyod, T. Ishijima, K. Ono, T. Morita, N. Ohshima, K. Kinoshita

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    Event date: 2011.7

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  449. Flowing Liquid Treatment by Microwave Plasma under Reduced Pressures

    Koji Kanetake, Tatsuo Ishijima and Hirotaka Toyoda

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    Event date: 2011.7

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  450. Time- and Space-Resolved Characteristics of Ozone Concentration in Atmospheric Pressure Plasma using Ultra Short Pulses International conference

    T. Murase, A. Kamata, T. Ishijima, Y. Kinoshita, H. Kawauchi, K. Yoshida, and H. Toyoda

    The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP-2011) 

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    Event date: 2011.7

    Language:English   Presentation type:Poster presentation  

    Venue:Dalian, China   Country:China  

  451. Enhancement of Polyimide/Copper Film Adhesion by Dense Carbon Interlayer using Microwave Plasma CVD International conference

    K. Usami, T. Ishijima, and H. Toyoda

    The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP-2011) 

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    Event date: 2011.7

    Language:English   Presentation type:Poster presentation  

    Venue:Dalian, China   Country:China  

  452. RFマグネトロン・スパッタリング法で作製したMgO障壁層MTJのMgO結晶配向性と高エネルギー負イオンとの関係 Invited

    小野一修, 大嶋則和, 後藤和也, 森田正, 木下啓藏, 石島達夫, 豊田浩孝

    日本HDD協会 ヘッド・ディスク部会 

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    Event date: 2011.6

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:IDEMA JAPAN 会議室 東京都港区   Country:Japan  

  453. 有機物含有流体の減圧下における連続プラズマ処理

    金武 浩司,石島 達夫,豊田 浩孝

    第58回応用物理学関係連合講演会 

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    Event date: 2011.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学(神奈川県厚木市)   Country:Japan  

  454. 熱流束抑制による微結晶シリコン薄膜特性の改善

    伊藤裕紀,坂井淳二,石島達夫,豊田浩孝

    第58回応用物理学関係連合講演会 

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    Event date: 2011.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学(神奈川県厚木市)   Country:Japan  

  455. SiH4/H2マイクロ波プラズマ中のSiH3ラジカル空間分布計測

    池田昌平, 黒田 俊之, 石島 達夫, 豊田 浩孝

    第58回応用物理学関係連合講演会 

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    Event date: 2011.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:神奈川工科大学(神奈川県厚木市)   Country:Japan  

  456. 質量分析法による大気圧プラズマの気相診断

    澤口 陽介,石島 達夫,豊田 浩孝

    第58回応用物理学関係連合講演会 

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    Event date: 2011.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:神奈川工科大学(神奈川県厚木市)   Country:Japan  

  457. Space- and Time-Resolved Measurement of Electric Field International conference

    T. Murase, A. Kamata, T. Ishijima and H. Toyoda

    The 4th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  458. Improvement of Silicon Thin Film Quality for Photovoltaic Cells by Modified Microwave Antenna Structure International conference

    Y. Ito, J. Sakai, T. Ishijima and H. Toyoda

    The 4th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  459. Reactive Species Measurement of an Atmosphere-pressure Plasma by a Differentially-Pumped Mass-Spectrometer International conference

    Y. Sawaguchi, T. Ishijima and H. Toyoda

    The 4th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  460. Investigation of C6H6 Dissociation Process in a Microwave Plasma International conference

    K .Keyamura, T. Ishijima and H. Toyoda

    The 4th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  461. Treatment of Flowing Organic Solution by Microwave Excited Plasma under Reduced-Pressure Condition International conference

    K. Kanetake, T. Ishijima and H. Toyoda

    The 4th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  462. Measurement of SiH3 Spatial Profile in H2/SiH4 Microwave Plasma International conference

    M. Ikeda, T. Kuroda, T. Ishijima and H. Toyoda

    The 4th International Conference on Plasma-Nano Technology & Science 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  463. Dissociation Process of C6H6 Molecules in Surface Wave Plasma International conference

    KAZUKI KEYAMURA, TATSUO ISHIJIMA AND HIROTAKA TOYODA

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan   Country:Japan  

  464. Gas-Phase Diagnostics of Hydrogen Diluted Silane Plasma by Modified Appearance Mass Spectrometry International conference

    MASAHIRA IKEDA, TOSHIYUKI KURODA, TATSUO ISHIJIMA AND HIROTAKA TOYODA

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan   Country:Japan  

  465. Improvement of Silicon Thin Film Quality for Photovoltaic Cells by Newly-developed Microwave Antenna International conference

    YUKI ITO, JUNJI SAKAI, TASTUO ISHIJIMA AND HIROTAKA TOYODA

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan   Country:Japan  

  466. Flowing Liquid Treatment by Microwave Plasma under Reduced Pressure Condition International conference

    KOJI KANETAKE, TATSUO ISHIJIMA AND HIROTAKA TOYODA

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2011.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan   Country:Japan  

  467. Improvement of Adhesion Strength between Polyimide and Copper Foil by High Density Plasma Treatment Invited International conference

    T. Ishijima, K. Usami, H. Toyoda

    11th International Symposium on Biomimetic Materials Processing(BWWMP-11)  

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    Event date: 2011.1

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  468. Evaluation of Absolute SiH3 Radical Density in H2/SiH4 Surface Wave Exited Plasma International conference

    M. Ikeda, T. Kuroda, T. Ishijima, and H. Toyoda

    The 12th International Workshop of Advanced Plasma Processing and Diagnostics 

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    Event date: 2011.1

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Kyushu University, Japan   Country:Japan  

  469. Time and Space Resolved Measurement of Microwave Electric Field in Atmospheric Pressure Plasma Invited International conference

    H. Toyoda, A. Kamata, T. Murase, T. Ishijima

    The 12th International Workshop of Advanced Plasma Processing and Diagnostics 

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    Event date: 2011.1

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Kyushu University, Japan   Country:Japan  

  470. 表面波プラズマ処理によるCu膜とポリイミドフィルムの密着性向上

    宇佐見健二,石島達夫,豊田浩孝

    第20日本MRS学術シンポジウム 

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    Event date: 2010.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:開港記念館(神奈川県横浜市)   Country:Japan  

  471. Organic Solute Decomposition in Water using Microwave Plasma

    T. Ishijima, K. Kanetake and H. Toyoda

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    Event date: 2010.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  472. Diagnostics of atmospheric pressure plasma by space and time-resolved Stark broadening Invited International conference

    H. Toyoda, A. Kamata, T. Murase, and T. Ishijima

    The 2nd International Plasma Nanoscience Symposium 

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    Event date: 2010.12

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:New South Wales, Australia   Country:Australia  

  473. Microwave H2/SiH4 PCVD by Modified Microwave Antenna for Improvement of Silicon Film Quality International conference

    J. Sakai, Y. Ito, T. Ishijima, H. Toyoda

    The 32nd International Symposium on Dry Process 

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    Event date: 2010.11

    Language:English   Presentation type:Poster presentation  

    Venue:Tokyo Institute of Technology , Tokyo, Japan   Country:Japan  

  474. RFマグネトロンプラズマにおける高エネルギー粒子の挙動 Invited

    豊田 浩孝 , 後藤 和也,石島 達夫

    第26回九州・山口プラズマ研究会 

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    Event date: 2010.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:日田ひなの里「山陽館」(大分県日田市)   Country:Japan  

  475. マグネトロンプラズマ中の高エネルギー負イオン計測 Invited

    豊田 浩孝

    真空・表面科学合同講演会 

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    Event date: 2010.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:大阪大学   Country:Japan  

  476. プラズマ計測:電気的計測

    豊田 浩孝

    第21回プラズマエレクトロニクス講習会 

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    Event date: 2010.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:慶応義塾大学   Country:Japan  

  477. Influences of Liquid Temperature and Pressure on Microwave-Excited Bubble Plasma Production International conference

    T. Ishijima, R. Saito, K. Kanetake, H. Toyoda

    7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference 

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    Event date: 2010.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Maison de la Chimie, Paris, France   Country:France  

  478. Formation of High Energy Oxygen Species in RF Magnetron Sputter Plasma International conference

    K. Goto, T. Ishijima, T. Morita, K. Ono, N. Ohshima, K. Kinoshita, H. Toyoda

    7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference 

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    Event date: 2010.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Maison de la Chimie, Paris, France   Country:France  

  479. Study on modified surface layer of photoresist employing fluorocarbon ion beam and radicals International conference

    Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda

    7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference 

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    Event date: 2010.10

    Language:English   Presentation type:Poster presentation  

    Venue:Maison de la Chimie, Paris, France   Country:France  

  480. Synthesis of High Quality SiO2 Film by Capacitively-Coupled Plasma CVD with Comb-Type Electrodes International conference

    Takahiro Hiramatsu, Tokiyoshi Matsuda, Toshiyuki Kawaharamura, Mamoru Furuta, Takashi Hirao, Koji Kanetake, Hirotaka Toyoda

    7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference 

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    Event date: 2010.10

    Language:English   Presentation type:Poster presentation  

    Venue:Maison de la Chimie, Paris, France   Country:France  

  481. Space- and Time-Resolved Measurement of Hb Emission Spectrum in Atmospheric-pressure Pulsed Microwave Plasma International conference

    Azumi Kamata, Takuya Murase, Tatsuo Ishijima and Hirotaka Toyoda

    7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference 

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    Event date: 2010.10

    Language:English   Presentation type:Poster presentation  

    Venue:Maison de la Chimie, Paris, France   Country:France  

  482. Absolute Density Measurement of SiHx Radicals in SiH4/H2 Microwave Plasma by Modified Appearance Mass Spectrometry International conference

    T. Kuroda, M. Ikeda, T. Ishijima and H. Toyoda

    7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference 

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    Event date: 2010.10

    Language:English   Presentation type:Poster presentation  

    Venue:Maison de la Chimie, Paris, France   Country:France  

  483. Capacitively Coupled Plasma Source with Comb-Type Electrodes for Uniform Plasma Processing International conference

    Hirotaka Toyoda, Koji Kanetake, Takahiro Hiramatsu, Tokiyoshi Matsuda, Toshiyuki Kawaharamura, Mamoru Furuta, Takashi Hirao

    7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference 

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    Event date: 2010.10

    Language:English   Presentation type:Poster presentation  

    Venue:Maison de la Chimie, Paris, France   Country:France  

  484. フルオロカーボンプラズマビームによるフォトレジスト表面改質層の解析

    竹内拓也、尼崎新平、竹田圭吾、石川健治、近藤博基、豊田浩孝、関根誠、康松潤、沢田郁夫、堀勝

    第71回応用物理学会学術講演会 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  485. 表面波励起プラズマ処理によるポリイミドフィルムの密着性向上

    宇佐見健二,石島達夫,豊田浩孝,伊関清司,菅井秀郎

    第71回応用物理学会学術講演会 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  486. 新規マイクロ波PCVDによるシリコン薄膜の高品質化

    坂井淳二,伊藤裕紀,石島達夫,豊田浩孝

    第71回応用物理学会学術講演会 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  487. 酸化物ターゲットマグネトロンプラズマにおける高エネルギー粒子挙動シミュレーション

    後藤 和也,石島 達夫,森田 正,小野一修,大嶋 則和,木下 啓藏,豊田 浩孝

    第71回応用物理学会学術講演会 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  488. 改良型出現質量分析法によるSiH4/H2マイクロ波プラズマ中のラジカル絶対密度計測

    黒田 俊之, 池田 昌平, 石島 達夫, 豊田 浩孝

    第71回応用物理学会学術講演会 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  489. マイクロ波SiH4/H2プラズマCVDによる大面積シリコン堆積 Invited

    豊田 浩孝

    プラズマ材料科学第153委員会, 第98回研究会 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:弘済会館   Country:Japan  

  490. MgOターゲットRFマグネトロンプラズマにおける高エネルギー酸素負イオンの空間分布計測

    後藤 和也,石島 達夫,森田 正,小野一修,大嶋 則和,木下 啓藏,豊田 浩孝

    第34回日本磁気学会学術講演会 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:つくば国際会議場(エポカルつくば)   Country:Japan  

  491. 高密度表面波プラズマにおけるC6H6分子の解離過程

    毛家村 一樹,石島 達夫,豊田 浩孝

    平成22年度電気関係学会東海支部連合大会 

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    Event date: 2010.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  492. CH2F2への電子衝突によるCH2Fラジカル生成断面積測定

    齊藤 耕平,関根 誠,堀 勝,石島 達夫,豊田 浩孝,康 松潤,澤田 郁夫

    平成22年度電気関係学会東海支部連合大会 

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    Event date: 2010.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  493. 新規マイクロ波アンテナによるシリコン薄膜の高品質化

    伊藤 裕紀, 坂井 淳二,石島 達夫,豊田 浩孝

    平成22年度電気関係学会東海支部連合大会 

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    Event date: 2010.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  494. 減圧環境下における液体流の連続プラズマ処理

    金武 浩司,石島 達夫,豊田 浩孝

    平成22年度電気関係学会東海支部連合大会 

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    Event date: 2010.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  495. 質量分析法による大気圧プラズマの気相診断

    澤口 陽介,石島 達夫,豊田 浩孝

    平成22年度電気関係学会東海支部連合大会 

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    Event date: 2010.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  496. 大気圧パルスマイクロ波プラズマにおける時空間発光分光計測

    齊藤 耕平,関根 誠,堀 勝,石島 達夫,豊田 浩孝,康 松潤,澤田 郁夫

    平成22年度電気関係学会東海支部連合大会 

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    Event date: 2010.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  497. 改良型出現質量分析法を用いたマイクロ波励起水素希釈シランプラズマ中の気相診断

    池田 昌平,黒田 俊之,石島 達夫,豊田 浩孝

    平成22年度電気関係学会東海支部連合大会 

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    Event date: 2010.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  498. Gas phase diagnostics of high-density SiH4/H2 microwave plasma Invited International conference

    Hirotaka Toyoda, Toshiyuki Kuroda, Masahira Ikeda, Junji Sakai, Yuki Ito, Tatsuo Ishijima

    39th The Korean Vacuum Society Summer 

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    Event date: 2010.8

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:The Beachepalace, Boryong-city, Korea   Country:Korea, Republic of  

  499. Organic Solute Decomposition using Microwave excited Plasma Invited International conference

    T. Ishijima, H. Toyoda

    The 11th International Workshop on Advanced Plasma Processing and Diagnostics 

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    Event date: 2010.7

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Ramada Jeju Hotel, Jeju, Korea   Country:Korea, Republic of  

  500. 酸化物RFスパッタにおける高エネルギー酸素負イオンの空間分布計測

    石島達夫、後藤和也、小野一修、森田 正、大嶋則和、木下啓藏、豊田浩孝

    酸化物RFスパッタにおける高エネルギー酸素負イオンの空間分布計測 

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    Event date: 2010.7

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:化学会館(東京都千代田区)   Country:Japan  

  501. Influence of pressure and water temperature on the microwave plasma production under water International conference

    T. Ishijima, R. Saito, K. Kanetake, H. Toyoda

    10th APCPST (Asia Pacific Conference on Plasma Science and Technology)and 23th SPSM (Symposium on Plasma Science for Materials) 

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    Event date: 2010.7

    Language:English   Presentation type:Poster presentation  

    Venue:LotteHotel Jeju, Jeju, Korea   Country:Korea, Republic of  

  502. Dissociation process of SiH4 parent gas in high density microwave plasma for Si film deposition International conference

    T. Ishijima, H. Endo, T. Kuroda, H. Toyoda

    10th APCPST (Asia Pacific Conference on Plasma Science and Technology)and 23th SPSM (Symposium on Plasma Science for Materials) 

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    Event date: 2010.7

    Language:English   Presentation type:Poster presentation  

    Venue:LotteHotel Jeju, Jeju, Korea   Country:Korea, Republic of  

  503. Diagnostics of high-energy negative ion in RF magnetron plasma Invited International conference

    H. Toyoda

    The 3rd International Oce Science Leader Workshop on Plasma Nanoscience and Nanotechnology 

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    Event date: 2010.3

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:CSIRO Materials Science and Engineering, Lindfield Nsw 2070 Australia   Country:Australia  

  504. Multibubble Plasma Production and Efficient Liquid Treatment by Slot-excited Microwave International conference

    T. Ishijima, R. Saito, K. Kanetake, H. Toyoda

    International Workshop on Plasmas with Liquids 

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    Event date: 2010.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  505. 高密度マイクロ波プラズマを用いたポリィミドフィルムの高速密着性改善

    宇佐見 健二,石島 達夫,豊田 浩孝,伊関清司,菅井秀郎

    第57回応用物理学関係連合講演会 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  506. 酸化物ターゲットのスパッタプロセスにおける酸素負イオンエネルギー分布中微細構

    後藤 和也,石島 達夫,森田 正,小野 一修,大嶋則和,木下 啓藏,豊田 浩孝

    第57回応用物理学関係連合講演会 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  507. 高密度SiH4/H2マイクロ波PCVDによる基板表面温度制御下での微結晶シリコン薄膜堆積

    坂井 淳二,池田 昌平,伊藤 裕紀,石島 達夫,豊田 浩孝

    第57回応用物理学関係連合講演会 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  508. 水素原子偏光スペクトル計測を用いた大気圧パルスプラズマの外部印加電界強度の検討

    鎌田 安住,楊 海鵬,石島 達夫,豊田 浩孝

    第57回応用物理学関係連合講演会 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  509. SiH4/H2マイクロ波プラズマの気相診断

    黒田 俊之,石島 達夫,豊田 浩孝

    第57回応用物理学関係連合講演会 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  510. TiCl4への電子衝突によるTiCl2ラジカル生成断面積測定

    齊藤 耕平,関根 誠,堀 勝,豊田 浩孝,康 松潤,沢田 郁夫

    第57回応用物理学関係連合講演会 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  511. Microcrystalline Silicon Film Deposition by 915MHz High-Density Microwave Plasma International conference

    J. Sakai, T. Ishijima, H. Toyoda

    The 3rd International Conference on Plasma-Nano Technology & Science 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  512. Effect of Post-Baking on Copper Adhesion to Polyimide Films Treated by High Density Microwave Plasma International conference

    K. Usami, T. Ishijima, H. Toyoda, K. Iseki, H. Sugai

    The 3rd International Conference on Plasma-Nano Technology & Science 

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    Event date: 2010.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  513. Time Resolved Measurement of Hb Emission from Atmospheric-Pressure Pulsed Microwave Plasma International conference

    A. Kamata, H. Yang, T. Ishijima, H. Toyoda

    The 3rd International Conference on Plasma-Nano Technology & Science 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  514. Mass Spectrometric Measurement of Neutral Radicals in SiH4/H2 High Density Microwave Plasma International conference

    T. Kuroda, T. Ishijima, H. Toyoda

    The 3rd International Conference on Plasma-Nano Technology & Science 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  515. Gas-Phase Diagnostics of SiH4/H2 Surface Wave Excited Plasma International conference

    T. Kuroda, T. Ishijima, H. Toyoda

    2nd International Symposium on Advansed Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  516. The Effect of Temperature and Pressure for Microwave-Excited Bubble Plasma Production International conference

    R. Saito, K. Kanetake, T. Ishijima, H. Toyoda

    The 3rd International Conference on Plasma-Nano Technology & Science 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  517. Substrate Temperature Control in Microwave Plasma CVD International conference

    J. Sakai, T. Ishijima, H. Toyoda

    2nd International Symposium on Advansed Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  518. Periodic Peak Formation in O- Energy Distribution in RF Magnetron Plasma International conference

    K. Goto, T. Ishijima, T. Morita, N. Ohshima, K. Kiinoshita, H. Toyoda

    2nd International Symposium on Advansed Plasma Science and its Applications for Nitrides and Nanomaterials 

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    Event date: 2010.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  519. 表面波励起高密度プラズマによる高分子フィルムの高速密着性改善

    宇佐見 健二,石島 達夫,豊田 浩孝

    第27回プラズマプロセシング研究会 

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    Event date: 2010.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜市開港記念会館   Country:Japan  

  520. 大気圧パルスマイクロ波プラズマの時分解発光分光計測

    鎌田 安住,楊 海鵬,石島 達夫,豊田 浩孝

    第27回プラズマプロセシング研究会 

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    Event date: 2010.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜市開港記念会館   Country:Japan  

  521. マイクロ波励起SiH4/H2高密度プラズマの気相診断

    黒田 俊之,石島 達夫,豊田 浩孝

    第27回プラズマプロセシング研究会 

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    Event date: 2010.2

    Language:Japanese   Presentation type:Poster presentation  

    Venue:横浜市開港記念会館   Country:Japan  

  522. Influence of Temperature and Pressure on Multibubble Plasma Production by Microwave Invited International conference

    T. Ishijima, R. Saito, K. Kanetake, H. Toyoda

    10th International Symposium on Biomimetic Materials Processing(BWWMP-10) and 1st International Symposium on Water Science and Technology(WaST-1) 

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    Event date: 2010.1

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  523. Plasma innovation towards next generation green technology Invited International conference

    M. Hori, M. Aekine, H. Toyoda

    The 10th International Worksop on Advanced Plasma Processing and Diagnostics 

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    Event date: 2010.1

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  524. Behavior of High-Energy Oxygen Negative Ions in Magnetron Plasma with Oxide Targets International conference

    K. Goto, T. Ishijima, T. Morita, N. Ohshima, K. Kiinoshita, H. Toyoda

    The 10th International Worksop on Advanced Plasma Processing and Diagnostics 

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    Event date: 2010.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  525. Deposition of Microcrystalline Silicon Thin Film by 915 MHz Microwave Plasma CVD

    J. Sakai, T. Ishijima, H. Toyoda

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    Event date: 2009.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  526. Periodic Peal Structure on O- Energy Distribution in RF Magnetron Plasma

    K. Goto, T. Ishijima, T. Morita, N. Ohshima, K. Kinoshita, H. Toyoda

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    Event date: 2009.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  527. Analysis of the surface reactions of ArF photoresist during fluorocarbon plasma etching by XPS International conference

    Takuya Takeuchi, Makoto Sekine, Hirotaka Toyoda, Keigo Takeda, Masaru Hori, Song-Yun Kang, Ikuo Sawada

    62nd Annual GEC 

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    Event date: 2009.10

    Language:English   Presentation type:Poster presentation  

    Venue:Saratoga Springs, NY, USA   Country:United States  

  528. Spatial variation of O− Energy distribution in an RF magnetron plasma International conference

    H. Toyoda, K. Goto, T. Ishijima, N. Ohshima, K. Kinoshita

    62nd Annual GEC 

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    Event date: 2009.10

    Language:English   Presentation type:Poster presentation  

    Venue:Saratoga Springs, NY, USA   Country:United States  

  529. Temporal variation of plasma density in atmospheric pressure International conference

    H. Toyoda, H. Yang, T. Ishijima

    62nd Annual GEC 

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    Event date: 2009.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Saratoga Springs, NY, USA   Country:United States  

  530. 2次元大面積プラズマ生成用表面波の並列励起

    平成18年度電気関係学会東海支部連合大会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  531. TIME-DEPENDENT PLASMA-DENSITY MEASUREMENT OF ATMOSPHERIC-PRESSURE PULSED-MICROWAVE PLASMA BY STARK BROADENING International conference

    H. Toyoda, H. Yang, T. Ishijima

    7th International Workshop on "Microwave Discharges: Fundamentals and Applications" 

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    Event date: 2009.9

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Hamamatsu   Country:Japan  

  532. SIH4 GAS DISSOCIATION PROCESS IN HIGH-DENSITY MICROWAVE PLASMA FOR SILICON FILM DEPOSITION International conference

    T. Ishijima, H. Asano, J. Sakai, T. Kuroda, M. Ikeda, H. Toyoda

    7th International Workshop on "Microwave Discharges: Fundamentals and Applications" 

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    Event date: 2009.9

    Language:English   Presentation type:Poster presentation  

    Venue:Hamamatsu   Country:Japan  

  533. Time-dependent measurement of plasma density in atmospheric-pressure microwave plasma using Stark broadening International conference

    H. Toyoda, H. Yang, T. Ishijima

    International Conference on Plasma Surface Engineering (AEPSE2009) 

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    Event date: 2009.9

    Language:English   Presentation type:Poster presentation  

    Venue:Busan, Korea   Country:Korea, Republic of  

  534. Monosilane Dissociation Process in Microwave-Excited High-Density H2/SiH4 Plasma International conference

    H. Asano, H. Endo, T. Ishijima and H. Toyoda

    The 31th International Symposium on Dry Process 

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    Event date: 2009.9

    Language:English   Presentation type:Poster presentation  

    Venue:Busan, Korea   Country:Japan  

  535. TOC Evaluation of Organic Solute Treated by Microwave-Excited Bubble Plasma International conference

    R. Saito, H. Sugiura, T. Ishijima and H. Toyoda

    The 31th International Symposium on Dry Process 

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    Event date: 2009.9

    Language:English   Presentation type:Poster presentation  

    Venue:Busan, Korea   Country:Japan  

  536. Temporal Variation of Hydrogen Atom Spectrum Emitted from Pulsed Microwave Plasma under Atmospheric Pressure International conference

    H. Yang, T. Ishijima, and H. Toyoda

    The 31th International Symposium on Dry Process 

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    Event date: 2009.9

    Language:English   Presentation type:Poster presentation  

    Venue:Busan, Korea   Country:Japan  

  537. Investigation of photoresist surface modeified layer by fluorocarbon ion ombardment International conference

    T. Takeuchi, M. Sekine, H. Toyoda, K. Takeda, M. Hori, S-Y. Kang, I. Sawada

    The 31th International Symposium on Dry Process 

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    Event date: 2009.9

    Language:English   Presentation type:Poster presentation  

    Venue:Busan, Korea   Country:Japan  

  538. Energy distribution of oxygen negative ion in an RF magnetron plasma International conference

    H. Toyoda, K. Goto, T. Ishijima, N. Ohshima, K. Kinoshita

    2nd International Conference on Microelectronics and Plasma Technology(ICMAP 2009) 

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    Event date: 2009.9

    Language:English   Presentation type:Poster presentation  

    Venue:Busan, Korea   Country:Korea, Republic of  

  539. Rapid Improvement of Polymer Film Adhesion by High Density Plasma International conference

    Y. Gunjo, K. Goto, T. Ishijima, H. Toyoda, K. Iseki, and H. Sugai

    International Conference on Plasma Surface Engineering (AEPSE2009) 

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    Event date: 2009.9

    Language:English   Presentation type:Poster presentation  

    Venue:Busan, Korea   Country:Korea, Republic of  

  540. High-density microwave plasma for fabrication of silicon thin film solar cells Invited International conference

    Hirotaka Toyoda

    International Conference on Plasma Surface Engineering (AEPSE2009) 

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    Event date: 2009.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Busan, Korea   Country:Korea, Republic of  

  541. マイクロ波プラズマCVD における基板への熱流束評価

    坂井 淳二,石島 達夫,豊田 浩孝

    平成21年度電気関係学会東海支部連合大会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知工業大学   Country:Japan  

  542. 微結晶シリコン薄膜堆積用SiH4/H2 マイクロ波プラズマの気相診断

    黒田 俊之,石島 達夫,豊田 浩孝

    平成21年度電気関係学会東海支部連合大会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知工業大学   Country:Japan  

  543. 酸化物ターゲットRF マグネトロンプラズマにおける高エネルギー酸素負イオンの空間分布計測

    後藤 和也,石島 達夫,大嶋 則和,木下 啓藏,豊田 浩孝

    平成21年度電気関係学会東海支部連合大会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知工業大学   Country:Japan  

  544. 915MHz表面波プラズマCVDにおける高付着性ラジカルの抑制

    浅野弘嗣、池田昌平、石島達夫、豊田浩孝

    第70回応用物理学会学術講演会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:富山大学   Country:Japan  

  545. 大気圧パルスマイクロ波プラズマにおける印加外部電界に起因するスペクトル拡がり

    鎌田 安住,楊 海鵬,石島 達夫,豊田 浩孝

    平成21年度電気関係学会東海支部連合大会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知工業大学   Country:Japan  

  546. CF系イオン照射によるフォトレジスト表面改質層の解析(2)

    竹内拓也、関根誠、豊田浩孝、竹田圭吾、堀勝、康松潤、沢田郁夫

    第70回応用物理学会学術講演会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:富山大学   Country:Japan  

  547. シュタルク拡がりを用いたプラズマ密度計測における外部電界の影響

    楊 海鵬、石島達夫、豊田浩孝

    第70回応用物理学会学術講演会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:富山大学   Country:Japan  

  548. マイクロ波バブルプラズマにおける水温・圧力の影響

    齋藤良太、杉浦宏康、石島達夫、豊田浩孝

    第70回応用物理学会学術講演会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:富山大学   Country:Japan  

  549. マイクロ波プラズマ生成による難分解性有機物分解処理

    石島達夫,齋藤良太,豊田浩孝

    電気学会プラズマ研究会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大阪府立大学,中之島サテライト   Country:Japan  

  550. Detection of High Energy Negative Ions in an RF Magnetron Sputter Plasma International conference

    H. Toyoda, K. Goto, T. Ishijima, N. Ohshima, K. Kinoshita

    The 19th International Symposium on Plasma Chemistry 

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    Event date: 2009.7

    Language:English   Presentation type:Poster presentation  

    Venue: Bochum, Germany   Country:Germany  

  551. Decomposition of Organic Solute with Microwave Bubble Plasmas International conference

    T. Ishijima, R. Saito, H. Sugiura, H. Toyoda

    The 19th International Symposium on Plasma Chemistry 

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    Event date: 2009.7

    Language:English   Presentation type:Poster presentation  

    Venue:Bochum, Germany   Country:Japan  

  552. High-Density Microwave Plasma Production For Thin Film Si Solar Cell and Monitoring of SiH4 Gas Dissociation Process Invited International conference

    T. Ishijima, H. Endo, H. Asano, H. Toyoda

    The 9th Korea-Japan Workshop on Thin Film and Plasma Process for Green Plasma Technology Advanced Plasma Diagnostics for Plasma-Nano Processing 

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    Event date: 2009.7

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Seoul, Korea   Country:Korea, Republic of  

  553. 915MHz表面波プラズマを用いた微結晶シリコン薄膜の膜特性評価

    浅野弘嗣、遠藤浩孝、石島達夫、豊田浩孝

    第56回応用物理学関係連合講演会 

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    Event date: 2009.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:筑波大学   Country:Japan  

  554. スロットアンテナ励起マイクロ波液中プラズマによる有機物含有溶液処理

    齋藤良太、杉浦宏康、石島達夫、豊田浩孝

    第56回応用物理学関係連合講演会 

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    Event date: 2009.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:筑波大学   Country:Japan  

  555. シュタルク拡がりを用いた大気圧パルスマイクロ波プラズマの電子密度計測

    楊 海鵬、石島達夫、豊田浩孝

    第56回応用物理学関係連合講演会 

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    Event date: 2009.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:筑波大学   Country:Japan  

  556. 高周波マグネトロンプラズマ中の高エネルギー負イオンエネルギーの空間分布計測

    後藤和也、石島達夫、大嶋則和、木下啓蔵、豊田浩孝

    第56回応用物理学関係連合講演会 

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    Event date: 2009.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:筑波大学   Country:Japan  

  557. 微結晶Si薄膜超高速堆積用表面波プラズマ Invited

    豊田浩孝

    太陽電池製造用新規プラズマ源に関する研究会 

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    Event date: 2009.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:九州大学   Country:Japan  

  558. Basic experiment on microcrystalline silicon film deposition by 915 MHz microwave PlasmaCVD International conference

    H. Asano, T. Ishijima, H. Toyoda

    First International Symposium on Advanced Plasma Science and its Applications 

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    Event date: 2009.3

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Nagoya JAPAN   Country:Japan  

  559. Low Temperature Microcrystalline Silicon Film Deposition by Microwave High-density Plasma Invited International conference

    Hirotaka Toyoda

    First International Symposium on Advanced Plasma Science and its Applications 

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    Event date: 2009.3

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Nagoya University, Nagoya JAPAN   Country:Japan  

  560. CF系プラズマにより改質されたフォトレジスト表面層の観察

    竹内拓也、関根誠、豊田浩孝、竹田圭吾、堀勝、康松潤、沢田郁夫

    プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会 プロシーディングス 

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    Event date: 2009.2

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋大学   Country:Japan  

  561. マイクロ波励起による液中プラズマ生成と化学反応性

    石島達夫、齋藤良太、豊田浩孝

    プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会 プロシーディングス 

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    Event date: 2009.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  562. スロットアンテナ励起バブルプラズマによる高速溶質処理

    齋藤良太、杉浦宏康、石島達夫、豊田浩孝

    プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会 プロシーディングス 

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    Event date: 2009.2

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋大学   Country:Japan  

  563. 915MHzマイクロ波励起 プラズマによる微結晶シリコン薄膜堆積

    浅野弘嗣、遠藤広考、石島達夫、豊田浩孝

    プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会 プロシーディングス 

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    Event date: 2009.2

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋大学   Country:Japan  

  564. 大気圧パルスマイクロ波プラズマにおける水素原子スペクトルの時分解計測

    楊 海鵬、石島達夫、豊田浩孝

    プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会 プロシーディングス 

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    Event date: 2009.2

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋大学   Country:Japan  

  565. RFマグネトロンプラズマ中の高エネルギー負イオン計測

    後藤和也、石島達夫、大嶋則和、木下啓蔵、豊田浩孝

    プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会 プロシーディングス 

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    Event date: 2009.2

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋大学   Country:Japan  

  566. SiH4 Dissociation Process in Microwave-Excited SiH4/H2 Plasma International conference

    H. Endo, H. Asano, T. Ishijima and H. Toyoda

    The 2nd International Conference on Plasma-Nanotechnology & Science 

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    Event date: 2009.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Nagoya JAPAN   Country:Japan  

  567. Detection of Energetic Negative Ions in an RF Magnetron Plasma International conference

    K. Goto, T. Ishijima, N. Ohshima, K. Kinoshita and H. Toyoda

    The 2nd International Conference on Plasma-Nanotechnology & Science 

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    Event date: 2009.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Nagoya JAPAN   Country:Japan  

  568. Treatment of Organic Solution with Microwave Excited Plasmas International conference

    R. Saito, H. Sugiura, T. Ishijima and H. Toyoda

    The 2nd International Conference on Plasma-Nanotechnology & Science 

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    Event date: 2009.1

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya University, Nagoya JAPAN   Country:Japan  

  569. Organic Solute Decomposition with Microwave Bubble Plasma International conference

    T. Ishijima, R. Saito, H. Sugiura, H. Toyoda

    9th International Symposium on Biomimetic Materials Processing (BMMP-9) 

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    Event date: 2009.1

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Nagoya University, Nagoya JAPAN   Country:Japan  

  570. SOLUTE DECOMPOSITION WITH MICROWAVE-EXCITED BUBBLE PLASMA International conference

    R. Saito, H. Sugiura, T. Ishijima and H. Toyoda

    The 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri(PLAM) 

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    Event date: 2009.1

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Techno Plaza, Gifu, Japan   Country:Japan  

  571. Investigation of Solute Decomposition Process in Water by Multibubble Plasma at Reduced and Atmospheric Pressures International conference

    T. Ishijima, H. Sugiura, R. Saito and H. Toyoda

    The IUMRS International Conference in Asia 2008 

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    Event date: 2008.12

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Nagoya, Japan   Country:Japan  

  572. Rapid Surface Modification of PET Film by High Density Microwave Plasma International conference

    Y. Gunjo, K. Goto, T. Ishijima, H. Toyoda, K. Iseki, and H. Sugai

    The IUMRS International Conference in Asia 2008 

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    Event date: 2008.12

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan   Country:Japan  

  573. Evaluation of Absolute H2O2 Concentration in Water Treated by Microwave Bubble Plasma International conference

    R. Saito, H. Sugiura, T. Ishijima, H. Toyoda

    The IUMRS International Conference in Asia 2008 

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    Event date: 2008.12

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan   Country:Japan  

  574. Film Quality of Microcrystalline Silicon Films Deposited by SiH4/H2 Surface Wave Plasma CVD International conference

    H. Endo, J. Sakai, H. Asano, T. Ishijima, H. Toyoda

    The IUMRS International Conference in Asia 2008 

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    Event date: 2008.12

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan   Country:Japan  

  575. Production of Large-Area Plasma by Three Parallel Waveguide Systems and Its Application to Si Film Deposition International conference

    H. Endo, T. Hayashi. Y. Takanishi, T. Ishijima, H. Toyoda, H. Sugai, A. Masuda and M. Kondo

    30th International Symposium on Dry Process(DPS2008) 

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    Event date: 2008.11

    Language:English   Presentation type:Poster presentation  

    Venue:KOKUYO HALL, Minato-ku, Tokyo JAPAN   Country:Japan  

  576. Effect of H2O Addition on Rapid Surface Treatment of Polymer Film by High Density Microwave Plasma International conference

    Y. Gunjo, K. Goto, T. Ishijima, H. Toyoda, K. Iseki, and H. Sugai

    30th International Symposium on Dry Process(DPS2008) 

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    Event date: 2008.11

    Language:English   Presentation type:Poster presentation  

    Venue:KOKUYO HALL, Minato-ku, Tokyo JAPAN   Country:Japan  

  577. Diagnostics of Microwave Excited Plasma in Liquid Using Spectroscopic Measurements International conference

    H. Sugiura, R. Saito, T. Ishijima, and H. Toyoda

    30th International Symposium on Dry Process(DPS2008) 

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    Event date: 2008.11

    Language:English   Presentation type:Poster presentation  

    Venue:KOKUYO HALL, Minato-ku, Tokyo JAPAN   Country:Japan  

  578. Mater-Scale Microwave Plasma Production and its Application to Silicon Thin Film Deposition International conference

    H. Toyoda, Y. Takanishi, H. Endo, T. Ishijima

    61th Gaseous Electronics Conference 

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    Event date: 2008.10

    Language:English   Presentation type:Poster presentation  

    Venue:Dallas, Texas USA   Country:United States  

  579. Diagnostics of Microwave Bubble Plasma in Liquid International conference

    H. Toyoda, H. Sugiura, R. Saito, T. Ishijima

    61th Gaseous Electronics Conference 

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    Event date: 2008.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Dallas, Texas USA   Country:United States  

  580. Meter-Scale Plasma Production and Thin Film Deposition Process with Parallel Waveguide at 915 MHz Microwave Excitation International conference

    T. Ishijima, Y. Takanishi, H. Endo and H. Toyoda

    9th Asia-Pacific Conference on Plasma Science and Technology and 21st Symposium on Plasma Science for Materials 

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    Event date: 2008.10

    Language:English   Presentation type:Poster presentation  

    Venue:Huangshan, China   Country:Japan  

  581. Solute Decomposition in Water by Slot-Excited Microwave Plasmas at Atmospheric Pressures International conference

    T. Ishijima, H. Sugiura, R. Saito and H. Toyoda

    9th Asia-Pacific Conference on Plasma Science and Technology and 21st Symposium on Plasma Science for Materials 

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    Event date: 2008.10

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Huangshan, China   Country:Japan  

  582. 915MHz表面波プラズマによる微結晶シリコン薄膜堆積

    浅野弘嗣、坂井淳二、遠藤広考、石島達夫、豊田浩孝

    平成20年度電気関係学会東海支部連合大会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知県立大学   Country:Japan  

  583. 大気圧マイクロ波プラズマによる溶質処理

    齋藤良太、杉浦宏康、石島達夫、豊田浩孝、菅井秀郎

    平成20年度電気関係学会東海支部連合大会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知県立大学   Country:Japan  

  584. 表面波プラズマCVDによる微結晶シリコン薄膜堆積と電気伝導特性評価

    遠藤広考、坂井淳二、浅野弘嗣、石島達夫、豊田浩孝

    平成20年度電気関係学会東海支部連合大会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知県立大学   Country:Japan  

  585. 水蒸気添加高密度マイクロ波アルゴンプラズマによるPETフィルムの高速表面改質

    郡上祐一、後藤和也、石島達夫、豊田浩孝、伊関清司、菅井秀郎

    平成20年度電気関係学会東海支部連合大会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知県立大学   Country:Japan  

  586. 蛍光プローブを用いたマイクロ波励起バブルプラズマの反応生成物診断

    杉浦宏康、齋藤良太、石島達夫、豊田浩孝

    平成20年度電気関係学会東海支部連合大会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知県立大学   Country:Japan  

  587. Simulation of Microwave Rediation for Microwave Discharge in Liquid International conference

    T. Ishijima, K. Nagira, H. Sugiura and H. Toyoda

    International Congress on Plasma Physics 2008 

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    Event date: 2008.9

    Language:English   Presentation type:Poster presentation  

    Venue:Fukuoka, Japan   Country:Japan  

  588. Production of One-meter Square High Density Microwave Plasma for Thin Film Deposition International conference

    Y. Takanishi, H. Endo, T. Ishijima, and H. Toyoda

    International Congress on Plasma Physics 2008 

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    Event date: 2008.9

    Language:English   Presentation type:Poster presentation  

    Venue:Fukuoka, Japan   Country:Japan  

  589. Efficient Decomposition of Organic Materials by Slot-Excited Microwave Plasmas in Water International conference

    H. Sugiura, T. Ishijima, and H. Toyoda, H. Sugai

    International Congress on Plasma Physics 2008 

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    Event date: 2008.9

    Language:English   Presentation type:Poster presentation  

    Venue:Fukuoka, Japan   Country:Japan  

  590. Efficiency Improvement of Solute Decomposition in Water by Multibubble Plasma Excited by Microwave Discharge International conference

    T. Ishijima, H. Sugiura, R. Saito, H. Toyoda and H. Sugai

    International Interdisciplinary-Symposium on Gaseous and Liquid Plasmas 

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    Event date: 2008.9

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Sendai, Japan   Country:Japan  

  591. 表面波プラズマCVDにより堆積した微結晶シリコン薄膜の電気伝導特性評価

    遠藤広考、坂井淳二、浅野弘嗣、石島達夫、豊田浩孝

    第69回応用物理学会学術講演会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  592. シュタルク広がりを用いたマイクロ波液中プラズマの電子密度測定

    豊田浩孝、杉浦宏康、齋藤良太、石島達夫

    第69回応用物理学会学術講演会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:中部大学   Country:Japan  

  593. 高密度マイクロ波プラズマを用いたPETフィルム表面改質における水蒸気添加の効果

    郡上祐一、豊田浩孝、伊関清司、菅井秀郎

    第69回応用物理学会学術講演会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  594. 表面波プラズマによる円筒状樹脂の均一表面改質

    石川喬介,石島達夫,豊田浩孝,笹井建典,菅井秀郎

    第69回応用物理学会学術講演会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  595. 大気圧マイクロ波バブルプラズマによる溶質処理

    齋藤良太、杉浦宏康、石島達夫、豊田浩孝、菅井秀郎

    第69回応用物理学会学術講演会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  596. 蛍光プローブを用いたマイクロ波バブルプラズマの反応生成物診断

    杉浦宏康、齋藤良太、石島達夫、豊田浩孝

    第69回応用物理学会学術講演会 

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    Event date: 2008.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  597. マイクロ波励起高密度プラズマを用いたPTFEフィルムの表面改質

    石川喬介,石島達夫,笹井建典,豊田浩孝,菅井秀郎

    プラズマ研究会 

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    Event date: 2008.5

    Language:Japanese  

    Venue:名古屋工業大学   Country:Japan  

  598. Measurement and Control of Energetic Rare Gas Atoms in Magnetron Plasma Invited International conference

    Hirotaka Toyoda

    6th EU-Japan Joint Symposium on Plasma Processing 

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    Event date: 2008.4

    Language:English   Presentation type:Oral presentation (invited, special)  

    Venue:Okinawa, Japan   Country:Japan  

  599. スロット励起大気圧マイクロ波プラズマの生成

    郡上祐一、石島達夫、豊田浩孝

    第55回応用物理学関係連合講演会 

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    Event date: 2008.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:日大船橋キャンパス   Country:Japan  

  600. マイクロ波バブルプラズマを用いた溶質の高速処理

    杉浦宏康、石島達夫、豊田浩孝、佐藤正典、菅井秀郎

    第55回応用物理学関係連合講演会 

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    Event date: 2008.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:日大船橋キャンパス   Country:Japan  

  601. 915MHzマイクロ波による大面積プラズマの生成と微結晶シリコン薄膜堆積

    遠藤広孝、林 孝信、高西雄大、石島達夫、豊田浩孝、菅井秀郎、増田  淳、近藤道雄

    第55回応用物理学関係連合講演会 

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    Event date: 2008.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:日大船橋キャンパス   Country:Japan  

  602. 高密度表面波励起プラズマによるPETフィルムの表面改質

    石川喬介、石島達夫、豊田浩孝、笹井建典、菅井秀郎

    第55回応用物理学関係連合講演会 

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    Event date: 2008.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:日大船橋キャンパス   Country:Japan  

  603. 超伝導溶融バルク体を磁場発生源とする強磁場スパッタ装置のプラズマ診断