所属
低温プラズマ科学研究センター プラズマ科学部門 特任助教
職名
特任助教
トラン グエン トラン
TRAN Nguyen trung
TRAN Nguyen trung
学位 1
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博士 （ 2022年9月 ）
研究キーワード 1
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Plasma Processing, Plasma Etching,
論文 8
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Recent progress in atomic-scale controlled plasma processing 招待有り 査読有り 国際共著 Open Access
Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Airah P Osonio, Tran Trung Nguyen, Takayoshi Tsutsumi, Lan Li, Kazunori Shinoda, Mi-Young Song, Yong Sup Choi, Igor Kaganovich and Yevgeny Raitses
Japanese Journal of Applied Physics 65 巻 ( 12 ) 2026年6月
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Photodissociation and electron-collision induced dissociation of C5H2F10 using photoelectron–photoion coincidence spectroscopy and quantum chemistry 査読有り Open Access
Nguyen Trung Tran, Toshio Hayashi, Hiroshi Iwayama & Kenji Ishikawa
scientific reports 16 巻 ( 5312 ) 2026年1月
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Reaction surface analysis of plasma etching of SiN, SiO2, and poly-Si films using low-global warming potential CF3CHCF2 gas 査読有り Open Access
Trung Nguyen Tran, Kenji Ishikawa
Applied Surface Science 710 巻 ( 163955 ) 2025年7月
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Valence fragmentation dynamics of a promising low global warming etching gas CF3CHCF2 査読有り Open Access
Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama & Kenji Ishikawa
scientific reports 15 巻 ( 9507 ) 2025年3月
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Hydrofluoroethane plasma etching of SiN, SiO2, and poly-Si films with CHF2CF3, CF3CH3, and CHF2CH3 査読有り Open Access
Trung Nguyen Tran*, Toshio Hayashi, Hiroshi Iwayama, Makoto Sekine, Masaru Hori,Kenji Ishikawa
Applied Surface Science 684 巻 ( 161815 ) 2025年3月
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Transient behaviors of radicals and ions of CxFy and SFx during alternative injections C4F8 and SF6 in Ar plasma 査読有り Open Access
Taito Yoshie a , Tran Trung Nguyen b , Thi-Thuy-Nga Nguyen b , Kenichi Inoue b , Takayoshi Tsutsumi b , Kenji Ishikawa b
Vacuum 253 巻 2026年6月
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Etch profiles in silicon in SF6 and O2 plasma based on etch-depth-dependent O/F transport gradient model 査読有り Open Access
Shuto Tsuchioka, Tran Trung Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen and Kenji Ishikawa
Japanese Journal of Applied Physics 65 巻 ( 8 ) 2026年4月
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Formation of SCF+, SCF2+, and CS2+ ions during gas modulation cycles associated with interference between alternating C4F8 and SF6 in Ar plasma 査読有り Open Access
Taito Yoshie, Tran Trung Nguyen, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi and Kenji Ishikawa
Japanese Journal of Applied Physics 65 巻 ( 3 ) 2026年2月