Updated on 2022/05/23

写真a

 
HATTORI Kei
 
Organization
Center for Low-temperature Plasma Sciences (cLPS) Designated professor
Title
Designated professor

Degree 1

  1. Doctor of Engineering ( 2011.9   Nagoya University ) 

Education 3

  1. Nagoya University

    2008.10 - 2011.9

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    Country: Japan

  2. Osaka University

    1985.4 - 1987.3

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    Country: Japan

  3. Osaka City University

    1980.4 - 1985.3

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    Country: Japan

Professional Memberships 1

  1. The Japan Society of Applied Physics

    1993.5

Committee Memberships 1

  1. ドライプロセス国際シンポジウム組織委員会   プログラム委員  

    2019.1   

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    Committee type:Academic society

 

Papers 9

  1. Particle an pattern discriminant freeze-cleaning method. Reviewed

    Kei Hattori, Daisuke Matsushima, Kensuke Demura, Masaya Kamiya

    Journal of Micro/Nanolithography, MEMS, and MOEMS   Vol. 19 ( 4 ) page: 044401-1 - 044401-17   2020.9

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1117/1.JMM.19.4.044401

    DOI: 10.1117/1.JMM.19.4.044401

  2. high-Performance Decomposition and Fixiation of Dry Etching Exhaust Perfluoro-Compound Gases and Study of Their Mechanism Reviewed

    Kei Hattori, Masaaki Osato, Takeshi Maeda, Katsuya Okumura, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   Vol. 50   page: 117301-1 - 117301-8   2011.10

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1143/JJAP.50.117301

    DOI: 10.1143/JJAP.50.117301

  3. High-Dose Ion-Implanted Photoresist Stripping Technology Employing High Temperature Single-Wafer SPM System Reviewed

    K. Sasahira, S. Nakamura, K. Hamada, S. Jimbo, and K. Hattori

    ECS Transactions   Vol. 108 ( 4 ) page: 185 - 195   2022.5

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    Authorship:Last author   Language:English   Publishing type:Research paper (international conference proceedings)  

    Other Link: https://iopscience.iop.org/issue/1938-5862/108/4

  4. Unique freeze cleaning technology

    D. Matsuhima, K. Demura, S. Jimbo, K. Hattori

    Proceedings of SPIE   Vol. 11326   page: 11326-1 - 11326-9   2020.2

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (international conference proceedings)  

  5. SiC dry etch technology employing Chemical Dry Etch

    D. Watanabe, M. Suzuki, K. Hattori

    Proceedings of international symposium on dry process 2019     page: 151 - 152   2019.11

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    Authorship:Last author   Language:English   Publishing type:Research paper (international conference proceedings)  

  6. Dry etching technologies for Cr film

    K. Hattori, T. Miyamoto, Y. Iino, S. Kodama, Y. Okamoto, K. Nakazawa, M. Karyu, H. Terakado, H. Shirahama, H. Ita, T. Yoshimori, H. Azumano, M. Muto, M. Iwami

    Proceedings of SPIE   Vol. 10807   page: 10807-1 - 10807-6   2018.4

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (international conference proceedings)  

  7. Dry etching characteristics of TiN film using Ar/CHF3, Ar/Cl2, and Ar/BCl3 gas chemistries in an inductively coupled plasma. Reviewed

    J. Tonotani, T. Iwamoto, F. Sato, K Hattori, S. Ohmi, H. Iwai

    Journal of Vacuum Science and Technology   Vol. B21   page: 2163 - 2168   2003

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    Language:English   Publishing type:Research paper (scientific journal)  

  8. Residue-Free Etching of Al-Si-Cu Alloy Employing Magnetron Reactive Ion Etching Reviewed

    Kei Hattori, Masaru Hori, Michishige Aoyama

    Journal of the Electrochemical Society   Vol. 141 ( 10 ) page: 2825 - 2828   1994.10

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

  9. Wavelength-Dependent Decay Times and Time-Dependent Spectra of the Singlet-Exciton Luminescence in Anthracene Crystals. Reviewed

    H. Nishimura, T. Yamaoka, K. Hattori, A. Matsui, K. Mizuno

    Journal of Physical Society Japan   Vol. 54   page: 4370 - 4381   1985

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    Language:English   Publishing type:Research paper (scientific journal)  

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Presentations 7

  1. Freeze point monitoring system for freeze cleaning method International conference

    K.Demura, M. Kamiya, M. Nakamura , and K. Hattori

    Photomask Japan 2022  2022.4.27  Photomask Japan and SPIE

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    Event date: 2022.4

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  2. Effects of dopant to DIW in freeze cleaning method

    Minami Nakamura, Kensuke Demura, Satoshi Nakamura , Masaya Kamiya, Kei Hattori

    2021.3.16 

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    Event date: 2021.3 - 3021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  3. Unique freeze cleaning technology International conference

    D. Matsushima, K. Demura, S. Jimbo, K. Hattori

    SPIE Advanced Lithography  2020.2.25  SPIE

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    Event date: 2020.2

    Language:English   Presentation type:Oral presentation (general)  

    Venue:San Jose , California   Country:United States  

  4. SiC dry etch technology employing Chemical Dry Etch. International conference

    D. Watanabe, M. Suzuki, K. Hattori

    International Symposium on Dry Process 2019  2019.11.22  International Symposium on Dry Process Organizing Committee

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    Event date: 2019.11

    Language:English   Presentation type:Poster presentation  

    Venue:JMS Aster Plaza, Hiroshima   Country:Japan  

  5. Dry etching technologies for Cr film International conference

    T. Miyamoto, Y. Iino, S. Kodama, Y. Okamoto, K. Nakazawa, M. Karyu, H. Terakado, H. Shirahama, H. Ita, T. Yoshimori, H. Azumano, M. Muto, M. Iwami, K. Hattori

    Photomask Japan 2018  2018.4.18  Photomask Japan and SPIE

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    Event date: 2018.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Pacifico Yokohama, Yokohama, Japan   Country:Japan  

  6. Expectations and prospects for new materials: From semiconductor device manufacturing viewpoint. Invited International conference

    Kei Hattori

    Semicon Japan 2016, CGMC Forum  2016.12.14  Semi Japan

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    Event date: 2016.12

    Language:English   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:Tokyo Big Sight   Country:Japan  

  7. Residue Free Etching of Al-Si-Cu Alloys Employing Magnetron RIE. International conference

    K. Hattori, M. Hori, M. Aoyama

    183rd. Meeting of Electrochemical Society  1993.5.20  The electrochemical Society

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    Event date: 1993.5

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Hilton Hawaiian Village, Honolulu, Hawaii, USA   Country:United States  

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