Faculty Profiles - 松山　智至

Full-field X-ray fluorescence microscope based on total-reflection advanced Kirkpatrick-Baez mirror optics Reviewed

S. Matsuyama, J. Yamada, Y. Kohmura, M. Yambashi, T. Ishikawa, K. Yamauchi

Optics Express Vol. 27 ( 13 ) page： 18318 - 18328 2019.6

Language：English Publishing type：Research paper (scientific journal)

A novel full-field X-ray fluorescence microscope based on total-reflection advanced Kirkpatrick–Baez mirror optics was developed. The total-reflection imaging mirror optics arrangement, with four reflections, has the advantage of being able to function both as a powerful low-pass energy filter, completely rejecting incident excitation X-rays, and as an achromatic optical imaging system. Isolated X-ray fluorescence signals can be imaged, avoiding imaging-detector saturation, with low background noise. A prototype fluorescence microscope constructed at SPring-8 demonstrated the capability to simultaneously image elemental distributions using various X-ray fluorescence signals (Ni, Cu, Zn, Ge, and Bi). A half-period spatial resolution of ~0.5–1 µm (1000–500 LP/mm) was achieved, owing to the achromaticity of the imaging mirrors and the photon-counting scheme of the CCD camera used for fluorescence detection.

DOI： 10.1364/OE.27.018318

Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors Reviewed

J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

Optics Express Vol. 27 ( 3 ) page： 3429 - 3438 2019.2

Language：English Publishing type：Research paper (scientific journal)

We demonstrated that the combination of a hyperbolic convex and elliptical concave mirrors works as a compact reflective X-ray imaging system with a short optical focal length and large magnification factor. We performed an experiment to form a one-dimensional demagnified image with a demagnification factor of 321 within an approximately 2-m-long optical setup at an X-ray energy of 10 keV. The results showed that this imaging optics system is capable of providing a resolution of ~40 nm. From wavefront analysis, it was confirmed that the optics possessed a wide field-of-view with a significant reduction of comatic aberration.

DOI： 10.1364/oe.27.003429

Nanofocusing of X-ray free-electron laser using wavefront-corrected multilayer focusing mirrors Reviewed

S. Matsuyama, T. Inoue, J. Yamada, J. Kim, H. Yumoto, Y. Inubushi, T. Osaka, I. Inoue, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

Scientific Reports Vol. 8 2018.11

Language：English Publishing type：Research paper (scientific journal) Publisher：NATURE PUBLISHING GROUP

A method of fabricating multilayer focusing mirrors that can focus X-rays down to 10 nm or less was established in this study. The wavefront aberration induced by multilayer Kirkpatrick-Baez mirror optics was measured using a single grating interferometer at a photon energy of 9.1 keV at SPring-8 Angstrom Compact Free Electron Laser (SACLA), and the mirror shape was then directly corrected by employing a differential deposition method. The accuracies of these processes were carefully investigated, considering the accuracy required for diffraction-limited focusing. The wavefront produced by the corrected multilayer focusing mirrors was characterized again in the same manner, revealing that the root mean square of the wavefront aberration was improved from 2.7 (3.3) rad to 0.52 (0.82) rad in the vertical (horizontal) direction. A wave-optical simulator indicated that these wavefront-corrected multilayer focusing mirrors are capable of achieving sub-10-nm X-ray focusing.

DOI： 10.1038/s41598-018-35611-0

アダプティブX線顕微鏡における形状可変ミラーの形状最適化手法の提案

長嶋友作, 青戸仁志, 井上陽登, 松山智至

精密工学会学術講演会講演論文集 Vol. 2024A ( 0 ) page： 614 - 614 2024.8

Authorship：Last author Language：Japanese Publishing type：Research paper (other academic) Publisher：公益社団法人精密工学会

ミラーを用いた結像型X線顕微鏡は，高効率かつ色収差無くX線像を取得できる．更なる高分解能化にむけて，形状可変ミラーを用いたアダプティブ顕微鏡を開発しているが，顕微鏡の光学収差を計測することは困難である．この問題を解決するために，深層学習に基づき，顕微鏡像から，形状可変ミラーの変形形状を最適化できる手法を開発した．

DOI： 10.11522/pscjspe.2024a.0_614

高空間周波数形状制御実現のための接合型形状可変ミラーの開発

加納愛彩, 井上陽登, 吉水純弥, 上山冬馬, 松山智至

精密工学会学術講演会講演論文集 Vol. 2024A ( 0 ) page： 610 - 610 2024.8

Authorship：Last author Language：Japanese Publishing type：Research paper (other academic) Publisher：公益社団法人精密工学会

X線ミラーを用いた結像型X線顕微鏡は優れた性能を有しており、更なる高空間分解能化が期待されている。一方で、高空間分解能化を実現するには，ミラーに求められる形状精度が厳しく，特に高い空間周波数の形状誤差への対応が難しい。この課題を解決するために、我々は3枚のニオブ酸リチウム（LN）を接合した形状可変ミラーを開発した。本発表では、作製したミラーの性能評価を行った結果を報告する。

DOI： 10.11522/pscjspe.2024a.0_610

多層膜形状可変ミラーを用いたアダプティブX線顕微鏡の開発

南澤亮太, 井上陽登, 中林荘太, 加納愛彩, 吉水純弥, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2024A ( 0 ) page： 613 - 613 2024.8

Authorship：Last author Language：Japanese Publishing type：Research paper (other academic) Publisher：公益社団法人精密工学会

Ｘ線顕微鏡の更なる高分解能化のためには，形状可変ミラーを用いたアダプティブ顕微鏡の構築が有力である．これまでにニオブ酸リチウム製の形状可変ミラーを開発し，アダプティブＸ線顕微鏡の原理実証に成功してきた．現在，分解能sub-10nmの達成を目指し新規光学系を開発している．本発表では，光学系の詳細や新規作製した形状可変ミラーの性能評価結果について報告する．

DOI： 10.11522/pscjspe.2024a.0_613

Examination of measurement by hard X-ray grazing incidence diffraction patterns of isolated lattices for 3D 1-nm resolution Reviewed

Tetsuya Hoshino, Sadao Aoki, Masahide Itoh, Hiroshi Itoh, Takato Inoue, and Satoshi Matsuyama

Optical Engineering Vol. 63 ( 11 ) page： 111804-1 - 111804-11 2024.6

Role of sulfane sulfur species in elemental tellurium nanorod formation in mammalian cells

Yu-ki Tanaka, Hiroki Yanagi, Ayako Shiokawa, Akihiro Matsunaga, Mari Shimura, Satoshi Matsuyama, Yasunori Fukumoto, Noriyuki Suzuki, Yasumitsu Ogra

Redox Biochemistry and Chemistry Vol. 8 page： 100029-1 - 100029-8 2024.5

A lipid index for risk of hyperlipidemia caused by anti-retroviral drugs Reviewed Open Access

Mari Shimura, Nobuyo Higashi-Kuwata, Asuka Fujiwara, Mai Taniguchi, Takayuki Ichinose, Fumie Hamano, Masaaki Uematsu, Takato Inoue, Satoshi Matsuyama, Takahiro Suzuki, Arun K. Ghosh, Hideo Shindou, Takao Shimuzu, Hiroaki Mitsuya

Antiviral Research Vol. 223 page： 105819 2024.3

大視野を持つＸ線斜入射結像光学系を備えたX線顕微鏡

入山陽仁, 井上陽登, 松山智至

精密工学会学術講演会講演論文集 Vol. 2024S ( 0 ) page： 418 - 418 2024.2

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

全反射現象を用いたAdvanced Kirkpatrick-Baez (AKB）ミラー結像光学系は回折、屈折結像光学系と比較し高い結像効率と色収差がほとんどない利点を持つ。しかしこれまで開発されたWolterⅠ型およびⅢ型AKBミラー光学系は像面湾曲収差とコマ収差により視野が大きく制限されていた。我々はこれら2つの収差の低減を目的とし、WolterⅠ型ミラーに像面湾曲補正光学系を組み合わせた大視野結像光学系を提案した。本発表では顕微鏡開発の状況を報告する。

DOI： 10.11522/pscjspe.2024s.0_418

高強度レーザー集光光学系のための大口径形状可変ミラーの開発

金﨑健太, 井上陽登, 吉水純弥, 中林荘太, 我妻一博, 石井雅樹, 松尾一輝, 松山智至

精密工学会学術講演会講演論文集 Vol. 2024S ( 0 ) page： 372 - 372 2024.2

Authorship：Last author Language：Japanese Publishing type：Research paper (other academic) Publisher：公益社団法人精密工学会

レーザー核融合は次世代エネルギー源として注目されている．しかし，核融合の過程におけるレーザー集光装置の劣化が必至であるため，長期的な運用が困難である．この課題を解決するために，集光装置に形状可変ミラーを導入し，補償光学システムを構築することが提案されている．本発表では，大口径かつ高温環境耐性のある単結晶圧電素子製形状可変ミラーの開発について報告する．

DOI： 10.11522/pscjspe.2024s.0_372

色収差の無いX線 sub-10 nm 集光のための極薄形状可変ミラーの開発

上山冬馬, 井上陽登, 吉水純弥, 松山智至

精密工学会学術講演会講演論文集 Vol. 2024S ( 0 ) page： 427 - 427 2024.2

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

X線を色収差無く 10nm 集光するためには，全反射ミラーのみで大開口数化を実現しなければならない．この問題を解決するために，多数の薄板ミラーを並べた新規光学配置を考案している．この光学系を実現する最も重要な課題は，高い形状精度を有する薄板ミラーを作製することにある．そこで本研究では，圧電素子を用いた厚み 100µm 以下の形状可変ミラーを開発した．

DOI： 10.11522/pscjspe.2024s.0_427

深層強化学習によるX線アダプティブミラー制御法の開発

長嶋友作, 青戸仁志, 井上陽登, 松山智至

精密工学会学術講演会講演論文集 Vol. 2024S ( 0 ) page： 421 - 421 2024.2

Authorship：Last author Language：Japanese Publishing type：Research paper (other academic) Publisher：公益社団法人精密工学会

ミラーを用いた結像型X線顕微鏡は，高効率かつ色収差無くX線像を取得できる．更なる高分解能化にむけて，形状可変ミラーを用いたアダプティブ顕微鏡を開発しているが，顕微鏡の光学収差を計測することは困難である．この問題を解決するために，深層強化学習に基づき，顕微鏡像の変化から，形状可変ミラーの変形形状を最適化できる手法を開発した．

DOI： 10.11522/pscjspe.2024s.0_421

Development of precision Wolter mirrors for future soft x-ray observations of the Sun

Taro Sakao, Sota Kashima, Satoshi Matsuyama, Takato Inoue, Haruhito Iriyama, Shinnosuke Kurimoto, Kazuto Yamauchi, Yoshiki Kohmura, Akira Miyake, Hiroki Nakamori, Shunichiro Matsuzaka, Toshiki Taniguchi, Toshio Nakano, Noriyuki Narukage

Space Telescopes and Instrumentation 2024: Ultraviolet to Gamma Ray Vol. 13093 page： 191 - 191 2024

Ultimate condensation of hard X-ray free-electron laser reaching single-nanometre focus size and 1022 W/cm2 intensity

2023.10

Femtosecond Reduction of Atomic Scattering Factors Triggered by Intense X-Ray Pulse Reviewed International coauthorship Open Access

Ichiro Inoue, Jumpei Yamada, Konrad J. Kapcia, Michal Stransky, Victor Tkachenko, Zoltan Jurek, Takato Inoue, Taito Osaka, Yuichi Inubushi, Atsuki Ito, Yuto Tanaka, Satoshi Matsuyama, Kazuto Yamauchi, Makina Yabashi, Beata Ziaja

Physical Review Letters Vol. 131 ( 16 ) page： 163201 2023.10

ニオブ酸リチウムを用いた大変形可能なX線形状可変ミラーの開発

吉水純弥, 井上陽登, 加納愛彩, 中林荘太, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2023A ( 0 ) page： 572 - 572 2023.8

Authorship：Last author Language：Japanese Publishing type：Research paper (conference, symposium, etc.) Publisher：公益社団法人精密工学会

X線ビームサイズを制御できる光学システムは未だ実用化されておらず，高精度な形状可変ミラーが注目されている．これまでにニオブ酸リチウム（LN）を用いた高安定なミラーを開発したが，圧電定数が小さいため，このままではビームサイズの大幅な変化は見込めない．これを解決するために，LNの分極反転特性を活かしたバイモルフミラーを開発した．本発表では，X線波面計測法に基づき変形性能を評価した結果について報告する．

DOI： 10.11522/pscjspe.2023a.0_572

試料回転を用いたブラインドデコンボリューション手法の開発

栗本晋之介, 井上陽登, 伊藤俊希, 伊藤颯希, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2023A ( 0 ) page： 579 - 579 2023.8

Authorship：Last author Language：Japanese Publishing type：Research paper (conference, symposium, etc.) Publisher：公益社団法人精密工学会

Advanced Kirkpatrick-Baezミラーを用いた結像型X線顕微鏡は，高空間分解能な観察を高効率かつ色収差なく行えるという利点を持つ．一方で，アライメントの難易度やミラーに要求される形状精度が高く，未知のアライメント誤差及びミラー形状誤差により生じる光学収差が更なる高空間分解能化を律速させている．本講演では，試料を面内回転させることで未知の光学収差を分離可能な新規手法を提案する．

DOI： 10.11522/pscjspe.2023a.0_579

単結晶圧電素子ベース形状可変ミラーを用いたアダプティブ結像型X線顕微鏡の開発

中林荘太, 井上陽登, 伊藤颯希, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2023A ( 0 ) page： 576 - 576 2023.8

Authorship：Last author Language：Japanese Publishing type：Research paper (conference, symposium, etc.) Publisher：公益社団法人精密工学会

結像型X線顕微鏡の超高空間分解能5nmを達成するためには，1nm PV以上の形状精度を満たすX線ミラーが必要である．しかし，その精度は現代の加工技術では達成不可能である．この問題を解決するため，単結晶圧電素子であるニオブ酸リチウムを利用した形状可変ミラーに基づくアダプティブ結像型X線顕微鏡を開発している．本発表では，開発した補償光学系を構築し，SPring-8にて実証実験を行った結果について報告する．

DOI： 10.11522/pscjspe.2023a.0_576

Zinc and iron dynamics in human islet amyloid polypeptide-induced diabetes mouse model. Reviewed Open Access

Fukunaka A, Shimura M, Ichinose T, Pereye OB, Nakagawa Y, Tamura Y, Mizutani W, Inoue R, Inoue T, Tanaka Y, Sato T, Saitoh T, Fukada T, Nishida Y, Miyatsuka T, Shirakawa J, Watada H, Matsuyama S, Fujitani Y

Scientific reports Vol. 13 ( 1 ) page： 3484 2023.3

X線フーリエタイコグラフィによる超解像イメージング

伊藤俊希, 栗本晋之介, 田中優人, 井上陽登, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2023S ( 0 ) page： 680 - 680 2023.3

Authorship：Last author,　Corresponding author Language：Japanese Publisher：公益社団法人精密工学会

ミラーを用いた結像型X線顕微鏡は色収差がなく、効率も高いといった特徴を持っている。一方でミラーの製作難度は非常に高く、技術的観点からさらなる高分解能化は非常に難しい。そこで我々は、合成開口および光学収差の分離による分解能向上を見込めるフーリエタイコグラフィに着目した。ミラーを用いたX線顕微鏡像にこれを適用することで、結像システムの回折限界を超える空間分解能で試料像を得ることを試みた。

DOI： 10.11522/pscjspe.2023s.0_680

高空間周波数形状制御可能な新規構造の形状可変ミラーの開発

加納愛彩, 井上陽登, 中林荘太, 上松航太, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2023S ( 0 ) page： 683 - 683 2023.3

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

ミラーベースの結像型X線顕微鏡は優れた性能を有しており，更なる高分解能化が期待されている．そのためには，高精度なミラーが不可欠だが，もはや現行の加工技術では満足できない．この問題を解決するために，ニオブ酸リチウム（ＬＮ）製の形状可変ミラーを開発している．本発表では，変形可能な空間周波数を更に向上させるために開発した，複数枚のＬＮを積層させた新規構造ミラーについて報告する．

DOI： 10.11522/pscjspe.2023s.0_683

単結晶圧電素子を用いた大変形可能なX線形状可変ミラーの開発

吉水純弥, 井上陽登, 中林荘太, 上松航太, 松山智至

精密工学会学術講演会講演論文集 Vol. 2023S ( 0 ) page： 684 - 684 2023.3

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

X線複合分析を実現するために，X線ビームサイズを変えられる光学システムが求められており，形状可変ミラーが注目されている．これまでにニオブ酸リチウム（LN）を用いた高安定なミラーを実現した．一方で，変形量が小さいため，ビームサイズを大きく変えることができない．この問題を解決するために，LNの分極反転特性に着目した．本発表では，約1100℃でアニールしたLNミラーの基礎検討結果を報告する．

DOI： 10.11522/pscjspe.2023s.0_684

タイコグラフィを用いたXFEL sub-10nm集光光学系のビーム径計測

塩井康太, 山田純平, 伊藤篤輝, 田中優人, 松山智至, 井上陽登, 大坂泰斗, 井上伊知郎, 犬伏雄一, 矢橋牧名, 石川哲也, 山内和人

精密工学会学術講演会講演論文集 Vol. 2023S ( 0 ) page： 678 - 679 2023.3

Language：Japanese Publisher：公益社団法人精密工学会

我々は硬X線FELにおける1022 W/cm2強度の達成のために sub-10 nm集光光学系を開発している．極微小な集光径評価のためには，デフォーカス位置におけるタイコグラフィ法が適用可能であるが，低次波面収差と照射位置誤差がどちらも存在する場合に，誤った解に収束することが問題となっていた．本研究では，複数のデフォーカス位置での計測手法・再構成アルゴリズムを新たに開発し，SACLA BL3にて実証実験を行った結果について報告する．

DOI： 10.11522/pscjspe.2023s.0_678

X線顕微鏡のためのin-situ波面計測法の開発

伊藤颯希, 田中優人, 中林荘太, 上松航太, 井上陽登, 栗本晋之介, 青戸仁志, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2023S ( 0 ) page： 687 - 687 2023.3

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

ミラーベースX線顕微鏡の更なる高分解能化のためには，ミラーの高精度化が求められるが，加工技術の限界が近づいている．これを解決するために，形状可変ミラーとin-situ波面計測法を組み合わせたアダプティブ顕微鏡の開発を進めている．フレネルゾーンプレートの集光点を用いた波面計測法と，その応用であるテストチャートのエッジの回折光を用いた波面計測法を提案し，その実証実験を行った．

DOI： 10.11522/pscjspe.2023s.0_687

Development and Commercial Application of Glue-Free Adaptive High Precision X-Ray Mirror

ICHII Yoshio, SHIROMA Shinsaku, NAKAMORI Hiroki, INOUE Takato, MATSUYAMA Satoshi

Journal of the Japan Society for Precision Engineering Vol. 89 ( 2 ) page： 147 - 152 2023.2

Episode 3

ICHII Yoshio, SHIROMA Shinsaku, NAKAMORI Hiroki, INOUE Takato, MATSUYAMA Satoshi

Journal of the Japan Society for Precision Engineering Vol. 89 ( 2 ) page： 157 - 158 2023.2

Wide field-of-view x-ray imaging optical system using grazing-incidence mirrors Reviewed Open Access

Satoshi Matsuyama, Takato Inoue, Kentaro Hata, Haruhito Iriyama, Kazuto Yamauchi

APPLIED OPTICS Vol. 61 ( 35 ) page： 10465 - 10470 2022.12

Language：English Publishing type：Research paper (scientific journal) Publisher：Optica Publishing Group

A field-curvature-corrected imaging optical system for x-ray microscopy using only grazing-incidence mirrors is proposed. It combines a Wolter type I (WO1) mirror pair, which forms a real image, with field curvature correction (FCC) optics-a convex hyperbolic mirror pair-that form a virtual image; compensation of the field curvatures realizes a wide field-of-view (FOV) and high magnification. Ray-tracing and wave-optics simulations verified the efficacy of the design, for which a FOV width was 111 mu m-4.7 times larger than that for the uncorrected WO1 design. The addition of FCC optics also produced a 2.3-fold increase in magnification.(c) 2022 Optica Publishing Group

DOI： 10.1364/AO.475891

教師なし学習によるX線顕微鏡画像群からの波面を推定する手法の開発

青戸仁志, 井上陽登, 栗本晋之介, 田中優人, 松山智至

精密工学会学術講演会講演論文集 Vol. 2022A ( 0 ) page： 74 - 74 2022.8

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

超高分解能なアダプティブX線顕微鏡の実現を目指し，顕微鏡上にてin-situでの波面計測を行う技術の開発を進めた．機械学習を用いて既知試料の顕微鏡像から波面を推定する手法を提案した．計算と実験のそれぞれで得た二種類の顕微鏡像を機械学習の入力とし用い，本手法の実現可能性を検証した．この結果，両者とも推定波面から再現した顕微鏡像とインプットした顕微鏡像がよく一致し，本手法の有効性を示すことができた．

DOI： 10.11522/pscjspe.2022a.0_74

フーリエタイコグラフィに基づいたX線波面計測法の開発

栗本晋之介, 井上陽登, 青戸仁志, 田中優人, 山田純平, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2022A ( 0 ) page： 73 - 73 2022.8

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

形状可変ミラーを用いたアダプティブ波面修正により，超高分解能な結像型X線顕微鏡の実現に挑戦している．そのためには，拡大結像配置のままin-situにＸ線波面を計測できる手法が必要であるが，未だその手法は確立されていない．本研究ではフーリエタイコグラフィに基づいた波面計測法を提案し，本手法により拡大結像配置において高精度なin-situ X線波面計測が可能であることを実証した．

DOI： 10.11522/pscjspe.2022a.0_73

ニオブ酸リチウム単結晶を用いたX線用形状可変ミラーの開発

中林荘太, 井上陽登, 上松航太, 香村芳樹, 矢橋牧名, 松山智至

精密工学会学術講演会講演論文集 Vol. 2022A ( 0 ) page： 72 - 72 2022.8

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

空間分解能5nmを持つX線顕微鏡の達成には，1nm以上の形状精度を有するX線ミラーが必要である．そこで我々はニオブ酸リチウムを用いた形状可変ミラーを開発した．単結晶圧電体であるため，逆圧電効果により高精度に変形できるだけでなく，高い安定性とヒステリシスフリーを実現できる．本発表では楕円凹面の形状可変ミラーを組み込んだアダプティブAdvanced KBミラー光学系を構築し，SPring-8にてX線波面補償を行った結果について報告する．

DOI： 10.11522/pscjspe.2022a.0_72

The new X-ray/visible microscopy MAXWELL technique for fast three-dimensional nanoimaging with isotropic resolution Reviewed International coauthorship Open Access

Kohmura Yoshiki, Yang Shun-Min, Chen Hsiang-Hsin, Takano Hidekazu, Chang Chia-Ju, Wang Ya-Sian, Lee Tsung-Tse, Chiu Ching-Yu, Yang Kai-En, Chien Yu-Ting, Hu Huan-Ming, Su Tzu-Ling, Petibois Cyril, Chen Yi-Yun, Hsu Cheng-Huan, Chen Peilin, Hueng Dueng-Yuan, Chen Shean-Jen, Yang Chi Lin, Chin An-Lun, Low Chian-Ming, Tan Francis Chee Kuan, Teo Alvin, Tok Eng Soon, Cai Xu Xiang, Lin Hong-Ming, Boeckl John, Stampfl Anton P., Yamada Jumpei, Matsuyama Satoshi, Ishikawa Tetsuya, Margaritondo Giorgio, Chiang Ann-Shyn, Hwu Yeukuang

SCIENTIFIC REPORTS Vol. 12 ( 1 ) page： 9668 2022.6

Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system (vol 92, 123706, 2021) Reviewed International coauthorship Open Access

Inoue Takato, Nishioka Yuka, Matsuyama Satoshi, Sonoyama Junki, Akiyama Kazuteru, Nakamori Hiroki, Ichii Yoshio, Sano Yasuhisa, Shi Xianbo, Shu Deming, Wyman Max D., Harder Ross, Kohmura Yoshiki, Yabashi Makina, Assoufid Lahsen, Ishikawa Tetsuya, Yamauchi Kazuto

REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 93 ( 4 ) page： 123706 2022.4

高空間分解能な結像型Ｘ線顕微鏡のためのin-situ波面計測法の開発

田中優人, 松山智至, 井上陽登, 山田純平, 香村芳樹, 矢橋牧名, 表和彦, 石川哲也, 山内和人

精密工学会学術講演会講演論文集 Vol. 2022S ( 0 ) page： 119 - 119 2022.3

Language：Japanese Publisher：公益社団法人精密工学会

ミラーベースの結像型Ｘ線顕微鏡はスループットや色収差の点で優れているが，高空間分解能観察を行う上ではミラーの許容形状誤差が小さくなる．修正すべき形状誤差を波面に基づき計測する手法の開発が求められていたが，現行の手法では大開口ミラー全体の波面が計測できなかった．そこで本研究ではミラーの異なる位置の波面を求め，スティッチングする手法を提案した．概念実証実験によりミラー全体の波面は矛盾なく求められた．

DOI： 10.11522/pscjspe.2022s.0_119

機械学習を用いたX線顕微鏡像からの波面推定

青戸仁志, 田中優人, 松山智至

精密工学会学術講演会講演論文集 Vol. 2022S ( 0 ) page： 114 - 115 2022.3

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

結像型X線顕微鏡上でin-situに波面計測を行う技術が実現すれば，アダプティブX線顕微鏡によるさらなる高分解能化が可能である．本研究では，機械学習により顕微鏡から得られた画像から波面を推定する手法の開発を行った.情報量の多いコヒーレント結像の画像を用いて,顕微鏡画像と波面のゼルニケ係数との関係を学習させた．学習済みモデルは顕微鏡画像のみからゼルニケ係数を予想することができた．

DOI： 10.11522/pscjspe.2022s.0_114

単結晶圧電素子を用いた形状可変ミラーの開発

上松航太, 中林荘太, 井上陽登, 松山智至

精密工学会学術講演会講演論文集 Vol. 2022S ( 0 ) page： 116 - 116 2022.3

Authorship：Last author Language：Japanese Publisher：公益社団法人精密工学会

高分解能な結像型X線顕微鏡を実現するためには、より高精度な光学素子が必要となる。しかし、光学素子の作製精度は限界に達しており、この問題解決のため形状可変ミラーの導入を進めている。これまでの形状可変ミラーは、高空間周波数の形状が制御不能、圧電素子由来の不安定性などの欠点を有する。そこで、本研究では単結晶圧電素子を用いた新構造の形状可変ミラーを提案、試作し、性能評価を実施した。

DOI： 10.11522/pscjspe.2022s.0_116

ニオブ酸リチウム単結晶を用いたX線用形状可変ミラーの開発

中林荘太, 松山智至, 上松航太

精密工学会学術講演会講演論文集 Vol. 2022S ( 0 ) page： 661 - 661 2022.3

Language：Japanese Publisher：公益社団法人精密工学会

X線領域では、高精度な光学素子が必要とされる。しかし、その作成難易度は限界(1nm)に到達しつつあり、これら光学素子によって乱された波面を形状可変ミラーによって修正する戦略が今後重要となる。本研究では、単結晶圧電素子であるニオブ酸リチウムを用いた極シンプルな形状可変ミラーを試作した。SPring-8にてＸ線波面計測を試みたところ、試作した形状可変ミラーが意図したとおり変形できることを確認した。

DOI： 10.11522/pscjspe.2022s.0_661

Preparation of highly planarized optical surface on Si substrate via catalyst-referred etching

Itagaki K., Toh D., Van Bui P., Matsuyama S., Yamauchi K., Sano Y.

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022 page： 105 - 106 2022

Language：English Publisher：European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022

In recent years, crystalline silicon (Si) has been used as a promising material for precision X-ray mirrors and Bragg optics. These devices require extremely well-ordered surfaces without crystallographic damage. Thus, we applied an ultra-precision polishing method called catalyst-referred etching (CARE) to planarize crystalline Si substrates. CARE is a catalyzed chemical etching method that uses pure water as an etchant and a catalytic pad that promotes the designed reactions. Owing to its abrasive-free nature, the polished surface reaches an atomic-level smoothness suitable for application to excellent optical devices, particularly in the X-ray regime. Understanding the mechanism of this method is essential for its wide practical application. CARE has been successfully applied to silicon dioxide (SiO2) optical glasses, and the removal mechanism has been clarified to be an indirect hydrolysis reaction using first-principles calculations. In the case of Si CARE, because Si is easily oxidized by dissolved oxygen (DO) in pure water, the removal pathway may involve oxidation reactions, which may be similar to the removal mechanism of SiO2CARE. Clarifying the role of DO is essential for understanding the mechanism of Si CARE. In this study, we evaluated the processing characteristics under different DO concentrations and investigated whether the accompanying oxidation induced by DO is critically required. It was observed that Si CARE does not require oxidation. The surface roughness was observed to be drastically improved in low-DO water. We conclude that the etching mechanism of Si CARE is different from that of SiO2CARE. Thus, a first-principles investigation is possible, except for the O2molecule from relevant reactions.

Planarization of polymer materials using catalytic reaction in pure water

Takeda K., Toh D., Van Bui P., Matsuyama S., Yamauchi K., Sano Y.

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022 page： 111 - 112 2022

Language：English Publisher：European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022

In recent years, polymer materials with excellent properties, such as chemical resistance, heat resistance, and high insulation, have been produced. These materials have been widely used in advanced devices. For example, polycarbonate (PC), polymethyl methacrylate (PMMA), and polyimide (PI) are used as insulating films in microelectromechanical systems (MEMSs), and polytetrafluoroethylene (PTFE) is a promising substrate for next-generation high-frequency devices exceeding 5G. To exploit the excellent properties of these polymer materials, well-ordered surfaces are required. However, because polymer materials are extremely soft, conventional polishing methods that use abrasives cannot produce a damage-free surface. We present an abrasive-free polishing technique called catalyst-referred etching (CARE). In this method, the top surface of the workpiece is preferentially removed via an indirect hydrolysis reaction promoted by a metal catalyst. The surfaces of the amorphous and single-crystalline samples processed using CARE exhibited atomic flatness. We discuss the polishing characteristics and material removal mechanisms of polymers in CARE. The PC and PMMA were polished using Pt and pure water as the catalyst and etchant, respectively. An atomically smooth surface, which could not be fabricated by mechanical polishing, was obtained. Based on observations of the surface, the removal mechanism was estimated as follows. Molecule chains entangle to form clusters that constitute the surface of the polymer and determine the surface roughness. In CARE, the top of this cluster was selectively removed, forming a flat surface similar to that obtained on a single-crystalline polymer material. Therefore, CARE is a promising polishing method for polymer materials.

Fabrication of an atomically smooth polycrystalline surface without grain boundary steps using catalyst-referred etching

Toh D., Van Bui P., Matsuyama S., Sano Y., Yamauchi K.

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022 page： 273 - 274 2022

Language：English Publisher：European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022

Recently, polycrystalline material can express its excellent physical properties and has been used in advanced applications in semiconductors and optics. Similar to single crystal materials, to fully exploit the properties of polycrystalline material in devices, a flat surface on the atomic level is required. However, since the polycrystalline material surface has various crystal orientations, the grain boundary steps appear on the surface polished by CMP (chemical mechanical polishing). Thus, new polishing technology needs to be developed. The following two conditions are required to obtain atomically well-ordered polycrystalline material surfaces: 1) The polishing pad must always act as a reference flat to selectively remove the crystal grain located at the topmost of the sample surface. 2) The material removal must proceed via a chemical etching to avoid crystallographic damages. Therefore, we developed a chemical etching method assisted by a metal catalyst named catalyst-referred etching (CARE). In this method, a polishing pad with a catalyst thin film works as a reference plane to be copied onto the workpiece surface. A workpiece is pressed to the polishing pad in an etchant, and they rotate around their axes. Accordingly, only the grain located at the topmost site frequently contacts the catalyst and is preferentially removed chemically, leading to obtaining a damage-free surface without grain boundary steps. In this study, we demonstrated the possibility of realizing the atomically flat polycrystalline surface by applying the CARE. Polycrystalline SiC and YAG ceramics were processed using Ru catalyst and a solution having neutral pH as a catalyst and an etchant, respectively. Using this method, we obtained an extremely smooth surface with a grain boundary step less than 1 nm without introducing crystallographic damage.

XFEL single-nanometer focusing system at SACLA

Yamada J., Matsuyama S., Inoue T., Ito A., Inoue I., Osaka T., Inubushi Y., Yumoto H., Koyama T., Ohashi H., Yamauchi K., Yabashi M.

Optics InfoBase Conference Papers 2022

Language：English Publisher：Optics InfoBase Conference Papers

A sub-10 nm focusing mirror system for the XFEL has been developed to generate an ultra-intense X-ray laser field. For the sub-10 nm focusing optic, an advanced Kirkpatrick-Baez mirror system based on Wolter-type III geometry has been adopted. The mirrors were fabricated based on a strategy of X-ray wavefront correction. As the results of the performance test at SACLA, we confirmed nearly diffraction-limited wavefront accuracy, 7 nm focusing spot size, more than 10 hours stability, and ~1022 W/cm2 intensity.

DOI： 10.1364/CLEOPR.2022.CWP19B_01

XFEL single-nanometer focusing system at SACLA

Yamada J., Matsuyama S., Inoue T., Ito A., Inoue I., Osaka T., Inubushi Y., Yumoto H., Koyama T., Ohashi H., Yamauchi K., Yabashi M.

2022 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2022 - Proceedings 2022

Publisher：2022 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2022 - Proceedings

DOI： 10.1109/CLEO-PR62338.2022.10432393

High-throughput deterministic plasma etching using array-type plasma generator system Reviewed Open Access

Yasuhisa Sano, Ken Nishida, Ryohei Asada, Shinya Okayama, Daisetsu Toh, Satoshi Matsuyama, Kazuto Yamauchi

Review of Scientific Instruments Vol. 92 ( 12 ) page： 125107 - 125107 2021.12

Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system Reviewed International coauthorship Open Access

Takato Inoue, Yuka Nishioka, Satoshi Matsuyama, Junki Sonoyama, Kazuteru Akiyama, Hiroki Nakamori, Yoshio Ichii, Yasuhisa Sano, Xianbo Shi, Deming Shu, Max D. Wyman, Ross Harder, Yoshiki Kohmura, Makina Yabashi, Lahsen Assoufid, Tetsuya Ishikawa, Kazuto Yamauchi

Review of Scientific Instruments Vol. 92 ( 12 ) page： 123706 - 123706 2021.12

Fabrication of atomically smooth polycrystalline surface without grain boundary steps by using catalyst referred etching method

Toh Daisetsu, Bui Van Pho, Matsuyama Satoshi, Sano Yasuhisa, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting Vol. 2021A ( 0 ) page： 115 - 116 2021.9

Language：Japanese Publisher：The Japan Society for Precision Engineering

We propose the using of catalyst referred etching (CARE) method to realize well-ordered surface on the polycrystalline. In CARE, the metal catalyst layer on the polishing pad works as a reference plane and only the top most site of sample surface contacted with the catalyst removed chemically. By using this processing characteristic, it is possible to obtain an ultra-smooth surface even on the polycrystalline surface having a random crystal orientation. In this experiment, we prepared polycrystalline SiC and YAG ceramics as a sample and applied CARE using Pt and pure water as a catalyst and an etchant respectivelly. As a result, an atomically smooth surface with no grain boundary steps was realized.

DOI： 10.11522/pscjspe.2021a.0_115

結像型X線顕微鏡における位相イメージング手法の開発

田中優人, 松山智至, 井上陽登, 山田純平, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

精密工学会学術講演会講演論文集 Vol. 2021A ( 0 ) page： 546 - 547 2021.9

Language：Japanese Publisher：公益社団法人精密工学会

結像型X 線顕微鏡では，試料の高空間分解能な像がリアルタイムに得られる．しかし，本顕微鏡では，コントラストの低い吸収コントラスト像しか直接観察できないことから，高いコントラストを持つ位相コントラスト像の獲得が望まれる．本研究では，様々なデフォーカス位置における試料の吸収コントラスト像を用いて，位相コントラスト像を得る手法を提案した． SPring-8 BL29XUでの実験を通して本手法の有用性を実証した．

DOI： 10.11522/pscjspe.2021a.0_546

圧電素子駆動型形状可変ミラーを用いたX線sub-5 nm集光システムの開発（第2報）

井上陽登, 松山智至, 田中優人, 二村浩平, 一井愛雄, 山田純平, 佐野泰久, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

精密工学会学術講演会講演論文集 Vol. 2021A ( 0 ) page： 545 - 545 2021.9

Language：Japanese Publisher：公益社団法人精密工学会

大型放射光施設が発振する高強度X線をより小さく集光することで，高光子密度を活かしたX線非線形光学や，小さなスポット径を利用したナノ構造解析の発展が期待される．求める集光径が小さくなるほどミラーに必要な形状精度は厳しくなる．そこで我々は中周期以上の形状を形状可変ミラーで，短周期形状を差分成膜法で修正するハイブリッド波面補償を導入した．本システムを用いることで，回折限界集光条件を満たすことに成功した．

DOI： 10.11522/pscjspe.2021a.0_545

Hard X-ray nanoprobe scanner Reviewed

Jumpei Yamada, Ichiro Inoue, Taito Osaka, Takato Inoue, Satoshi Matsuyama, Kazuto Yamauchi, Makina Yabashi

IUCrJ Vol. 8 ( Pt 5 ) page： 713 - 718 2021.9

Language：English Publishing type：Research paper (scientific journal) Publisher：International Union of Crystallography (IUCr)

X-ray scientists are continually striving to improve the quality of X-ray microscopy, due to the fact that the information obtained from X-ray microscopy of materials can be complementary to that obtained from optical and electron microscopes. In contrast to the ease with which one can deflect electron beams, the relative difficulty to deflect X-ray has constrained the development of scanning X-ray microscopes (SXMs) based on a scan of an X-ray small probe. This restriction has caused severe complications that hinder progress toward achieving ultimate resolution. Here, a simple and innovative method for constructing an SXM equipped with a nanoprobe scanner is proposed. The nanoprobe scanner combines X-ray prisms and advanced Kirkpatrick–Baez focusing mirrors. By rotating the prisms on the order of degrees, X-ray probe scanning with single-nanometre accuracy can be easily achieved. The validity of the concept was verified by acquiring an SXM image of a test pattern at a photon energy of 10 keV, where 50 nm line-and-space structures were resolved. This method is readily applicable to an SXM with a single-nanometre resolution and will assist effective utilization of increasing brightness of fourth-generation synchrotron radiation sources.

DOI： 10.1107/S2052252521007004

Introduction to Synchrotron Radiation X-Ray Experiment

MATSUYAMA Satoshi

Journal of the Japan Society for Precision Engineering Vol. 87 ( 7 ) page： 7_618 - 7_621 2021.7

X-ray adaptive zoom condenser utilizing an intermediate virtual focus Reviewed Open Access

Satoshi Matsuyama, Hiroyuki Yamaguchi, Takato Inoue, Yuka Nishioka, Jumpei Yamada, Yasuhisa Sano, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Optics Express Vol. 29 ( 10 ) page： 15604 - 15615 2021.5

圧電素子駆動型形状可変ミラーを用いたX線sub-5nm集光システムの開発

井上陽登, 松山智至, 田中優人, 二村浩平, 一井愛雄, 山田純平, 佐野泰久, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

精密工学会学術講演会講演論文集 Vol. 2021S ( 0 ) page： 668 - 668 2021.3

Language：Japanese Publisher：公益社団法人精密工学会

大型放射光施設が発振する高強度X線をより小さく集光することで，高光子密度を活かしたX線非線形光学や，小さなスポット径を利用したナノ構造解析の発展が期待される．求める集光径が小さくなるほどミラーに必要な形状精度は厳しくなる．そこで我々は形状可変ミラーを導入し，有限要素法を用いて修正可能な形状を計算した．6周期までの正弦波型の初期形状誤差がPV-3 nm以上存在した場合においても修正可能であることがわかった．

DOI： 10.11522/pscjspe.2021s.0_668

複数の凸面鏡を持つ高度な硬X線結像光学系の開発（第一報）

松山智至, 波多健太郎, 山内和人

精密工学会学術講演会講演論文集 Vol. 2021S ( 0 ) page： 672 - 672 2021.3

Language：Japanese Publisher：公益社団法人精密工学会

4枚のミラーから成るAdvanced Kirkpatrick-Baezミラーは硬X線領域における有望な結像光学系である．我々は様々な光学系を実際に開発し，30nmの空間分解能を持つX線顕微鏡をすでに実現した．この光学系に複数の凸面鏡を組み入れることで，さらに高度な光学系が構築可能であることを見出した．本発表では，いくつかの設計例とシミュレーションを示し，結像特性について調査した結果を示す．

DOI： 10.11522/pscjspe.2021s.0_672

結像型X線顕微鏡における波面計測手法の開発

田中優人, 松山智至, 井上陽登, 中村南美, 山田純平, 香村芳樹, 矢橋牧名, 表和彦, 石川哲也, 山内和人

精密工学会学術講演会講演論文集 Vol. 2021S ( 0 ) page： 671 - 671 2021.3

Language：Japanese Publisher：公益社団法人精密工学会

X線ミラーを用いた結像型X線顕微鏡は，色収差が無くスループットが高い点で優れているが，許容アライメント誤差が厳しく，高空間分解能画像を得るためには，拡大結像配置にて光学素子由来の波面収差を計測しなければならない．我々は，フレネルゾーンプレートの集光点を試料とし，その拡大像を複数枚取得した上で反復的位相回復計算を施すことで波面を計測した．本手法を用いてアライメントを調整し，空間分解能23 nmを達成した．

DOI： 10.11522/pscjspe.2021s.0_671

High-speed etching of silicon carbide wafer using high-pressure SF6 plasma

Yasuhisa Sano, Koki Tajiri, Yuki Inoue, Risa Mukai, Yuma Nakanishi, Satoshi Matsuyama, Kazuto Yamauchi

ECS Journal of Solid State Science and Technology Vol. 10 ( 1 ) 2021.1

Publishing type：Research paper (scientific journal)

Semiconductor silicon carbide (SiC) is proposed to be a promising material for power-saving devices. However, due to its hard and brittle properties, there is a need to develop a highly efficient strain-free thinning process for the backside thinning of vertical power transistors. As a method for thinning SiC wafers without crystallographic damages, plasma etching with high-pressure SF6 plasma was proposed and the dependence of different processing parameters on the removal rate was investigated. The results revealed that the removal rate was mainly influenced by the power density and relatively insensitive to processing parameters such as processing gap and gas flow rate. It was discovered that a high-speed etching of the entire surface of a commercially available 2- inch wafer at approximately 15 μm min-1 can be achieved by increasing the radio frequency power. Additionally, it was demonstrated that the thickness of the 2-inch wafer can be thinned to approximately 100 μm by only 20 min plasma etching.

DOI： 10.1149/2162-8777/abdc47

Focus characterization of an X-ray free-electron laser by intensity correlation measurement of X-ray fluorescence Reviewed

Development of precision Wolter mirrors towards PhoENiX mission for the Sun

Taro Sakao, Satoshi Matsuyama, Jumpei Yamada, Takato Inoue, Kentaro Hata, Hiroyuki Yamaguchi, Taku Hagiwara, Nami Nakamura, Kazuto Yamauchi, Yoshiki Kohmura, Yoshinori Suematsu, Noriyuki Narukage

Space Telescopes and Instrumentation 2020: Ultraviolet to Gamma Ray 2020.12

X-Ray Single-Grating Interferometry for Wavefront Measurement and Correction of Hard X-Ray Nanofocusing Mirrors Reviewed Open Access

Jumpei Yamada, Takato Inoue, Nami Nakamura, Takashi Kameshima, Kazuto Yamauchi, Satoshi Matsuyama, Makina Yabashi

Sensors Vol. 20 ( 24 ) page： 7356 - 7356 2020.12

Language：English Publishing type：Research paper (scientific journal) Publisher：MDPI AG

X-ray single-grating interferometry was applied to conduct accurate wavefront corrections for hard X-ray nanofocusing mirrors. Systematic errors in the interferometer, originating from a grating, a detector, and alignment errors of the components, were carefully examined. Based on the measured wavefront errors, the mirror shapes were directly corrected using a differential deposition technique. The corrected X-ray focusing mirrors with a numerical aperture of 0.01 attained two-dimensionally diffraction-limited performance. The results of the correction indicate that the uncertainty of the wavefront measurement was less than λ/72 in root-mean-square value.

DOI： 10.3390/s20247356

hv 2-concept breaks the photon-count limit of RIXS instrumentation Reviewed International coauthorship

Ke-Jin Zhou, Satoshi Matsuyama, Vladimir N. Strocov

Journal of Synchrotron Radiation Vol. 27 ( Pt 5 ) page： 1235 - 1239 2020.9

Nami Nakamura, Satoshi Matsuyama, Takato Inoue, Ichiro Inoue, Jumpei Yamada, Taito Osaka, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Journal of Synchrotron Radiation Vol. 27 ( 5 ) page： 1366 - 1371 2020.9

Language：English Publishing type：Research paper (scientific journal) Publisher：International Union of Crystallography (IUCr)

This paper proposes and demonstrates a simple method using the intensity correlation of X-ray fluorescence to evaluate the focused beam size of an X-ray free-electron laser (XFEL). This method was applied to the sub-micrometre focused XFEL beam at the SPring-8 Angstrom Compact Free Electron Laser, and the beam size evaluated using the proposed method was consistent with that measured using the knife-edge scan method. The proposed method is readily applicable to extremely small X-ray spots and can be applied for the precise diagnostics of sub-10 nm focused X-ray beams which have recently emerged.

DOI： 10.1107/s1600577520009868

High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser Reviewed

Shotaro Matsumura, Taito Osaka, Ichiro Inoue, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, Yasuhisa Sano

Optics Express Vol. 28 ( 18 ) page： 25706 - 25706 2020.8

Compact full-field hard x-ray microscope based on advanced Kirkpatrick–Baez mirrors Reviewed

Jumpei Yamada, Satoshi Matsuyama, Raita Hirose, Yoshihiro Takeda, Yoshiki Kohmura, Makina Yabashi, Kazuhiko Omote, Tetsuya Ishikawa, Kazuto Yamauchi

Optica Vol. 7 ( 4 ) page： 367 - 367 2020.4

An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating. Reviewed

Toh D, Van Bui P, Isohashi A, Matsuyama S, Yamauchi K, Sano Y

The Review of scientific instruments Vol. 91 ( 4 ) page： 045108 2020.4

An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating Reviewed

D. Toh, P. V. Bui, A. Isohashi, S. Matsuyama, K. Yamauchi, Y. Sano

Review of Scientific Instruments Vol. 91 ( 4 ) page： 045108 2020.4

Development of an Experimental Platform for Combinative Use of an XFEL and a High-Power Nanosecond Laser Reviewed

Y. Inubushi, T. Yabuuchi, T. Togashi, K. Sueda, K. Miyanishi, Y. Tange, N. Ozaki, T. Matsuoka, R. Kodama, T. Osaka, S. Matsuyama, K. Yamauchi, H. Yumoto, T. Koyama, H. Ohashi, K. Tono, M. Yabashi

Applied Science Vol. 10 ( 7 ) page： 2224 - 2224 2020.3

Language：English Publishing type：Research paper (scientific journal) Publisher：MDPI AG

© 2020 by the authors. We developed an experimental platform for combinative use of an X-ray free electron laser (XFEL) and a high-power nanosecond laser. The main target of the platform is an investigation of matter under high-pressure states produced by a laser-shock compression. In this paper, we show details of the experimental platform, including XFEL parameters and the focusing optics, the laser irradiation system and X-ray diagnostics. As a demonstration of the high-power laser-pump XFEL-probe experiment, we performed an X-ray diffraction measurement. An in-situ single-shot X-ray diffraction pattern expands to a large angle side, which shows a corundum was compressed by laser irradiation.

DOI： 10.3390/app10072224

Focusing mirror for coherent hard X-rays

Kazuto Yamauchi, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yukio Takahashi, Kenji Tamasaku, Tetsuya Ishikawa

Synchrotron Light Sources and Free-Electron Lasers: Accelerator Physics, Instrumentation and Science Applications page： 1093 - 1122 2020.1

Publishing type：Part of collection (book)

The development of high-precision x-ray mirrors is described. Atomistic surface polishing technique, elastic emission machining (EEM), was developed more than 30 years ago. This chapter describes how the polishing technique was improved to successfully apply to the synchrotron radiation and XFEL mirrors. The key was actually the figure metrology. The metrology was dramatically advanced by using coherent x-rays at the 1-km beamline of SPring-8, where classical ray-tracing approach was no more valid so that wave-optical approach was developed. Various optical references were developed to improve the global surface figures of mirrors. Successful development of elliptical mirrors helped attaining less than 100 nm focal spot in the conventional beamlines using Kirkpatrick-Baez focusing configuration, reaching 7 nm at the 1-km beamline. The speckle-free mirrors and focusing mirrors were used in XFEL facilities. These mirrors have been applied for various types of scanning nano-probes, imaging system, and generation of high-intensity photon fields for nonlinear xray optical experiments.

DOI： 10.1007/978-3-030-23201-6_54

Atomically smooth Si surface planarized using a thin film catalyst in pure water

Pho van Bui, Daisetsu Toh, Shinsaku Shiroma, Taku Hagiwara, Ai Isohashi Osaka, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Proceedings of the 20th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2020 page： 43 - 44 2020

Publishing type：Research paper (international conference proceedings)

A catalytically assisted etching method was applied to planarization of Si surfaces for the ultra-precision fabrication of X-ray mirrors. The study demonstrates that an atomically smooth surface with less than 0.1 nm root-mean-square roughness could be achieved on a Si substrate using a thin metal film and pure water as the catalyst and etching solution, respectively. The removal rate using a Pt catalyst can reach to over 500 nm/h. Density functional theory calculations is carried out to understand the initial steps of the catalyzed hydrolysis reaction at catalyst-Si interface during the planarization. The removal mechanism is expected to be similar to that in SiC and SiO2.

Cause of etch pits during the high speed plasma etching of silicon carbide and an approach to reduce their size

Y. Nakanishi, R. Mukai, S. Matsuyama, K. Yamauchi, Y. Sano

Materials Science Forum Vol. 1004 MSF page： 161 - 166 2020

Publishing type：Research paper (international conference proceedings)

To reduce the on-resistance in vertical power transistors, backside thinning is required after device processing. However, it is difficult to thin silicon carbide (SiC) wafers with a high removal rate by conventional mechanical processing because their hardness and brittleness cause cracks and chips during thinning. Therefore, the authors have attempted to thin SiC wafers using plasma chemical vaporization machining (PCVM), which is plasma etching using high-pressure plasma. PCVM has a high removal rate because of the high radical density in the high-pressure plasma, and it does not form a damaged layer on the processed surface because of the low ion energy. The authors have already achieved a very high removal rate of 15.6 μm/min by PCVM. However, many etch pits were generated on the wafer during PCVM in these high-speed machining conditions. Therefore, this study, using molten potassium hydroxide (KOH) etching, investigated the cause of such etch pits and found that they may stem from threading screw dislocation in the wafers. In addition, this research considered a process for reducing an etch pit size and succeeded in doing so by controlling wafer temperature.

DOI： 10.4028/www.scientific.net/MSF.1004.161

Prototype design and experimental tests of a zoom mirror system for the APS upgrade

Xianbo Shi, Zhi Qiao, Sheikh Mashrafi, Ross Harder, Deming Shu, Max Wyman, Jayson Anton, Steven Kearney, Luca Rebuffi, Tim Mooney, Jun Qian, Bing Shi, Satoshi Matsuyama, Kazuto Yamauchi, Lahsen Assoufid

Proceedings of SPIE - The International Society for Optical Engineering Vol. 11491 2020

Language：English Publishing type：Research paper (international conference proceedings) Publisher：SPIE

Mirror-based zoom optics systems can offer variable focal spot sizes over a wide range, which is essential for coherent nanoprobe beamlines, such as the proposed Atomic beamline in the Advanced Photon Source (APS) upgrade project. The success of the zoom mirror system in the nano-focusing regime requires the development of high-precision deformable mirrors, in-situ surface profilers and wavefront sensors, and advanced feedback control system. A prototype 1-D zoom mirror system consists of two vertical focusing mirrors was designed, assembled, and tested at the APS 1-BM beamline. The system consists of a bender-based mirror with a capacitive-sensor- array-based real-time mirror profiler, a bimorph adaptive mirror, and a grating interferometer for the wavefront monitoring. In this work, we present the design and test results of the prototype system demonstrating its zoom focusing capability.

DOI： 10.1117/12.2569129

触媒表面電位制御を取り入れた光電気化学触媒表面基準エッチング法によるSiC基板の高能率平坦化加工

大西諒典, 木田英香, 藤大雪, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集 Vol. 2019A page： 28 - 29 2019.8

Language：Japanese Publisher：公益社団法人精密工学会

我々はSiC基板の新たな平坦化加工技術として光酸化を援用した触媒表面基準エッチング法の開発を行っている．さらに，現在では光酸化を促進するため，基板への逆バイアス印加を提案している．しかしながら，高電圧を印加した場合，基板と接する触媒の表面電位まで上昇してしまい触媒活性が低下するため，加工速度の向上に限りがあった．本研究では触媒の表面電位を制御することで更なる高能率化を目指した．

DOI： 10.11522/pscjspe.2019a.0_28

Catalyzed chemical polishing of SiO2 glasses in pure water Reviewed

Daisetsu Toh, Pho Van Bui, Ai Isohashi, Naotaka Kidani, Satoshi Matsuyama, Yasuhisa Sano, Yoshitada Morikawa, Kazuto Yamauchi

REVIEW OF SCIENTIFIC INSTRUMENTS Vol. 90 ( 4 ) page： 045115 2019.4

Language：English Publishing type：Research paper (scientific journal) Publisher：AMER INST PHYSICS

A catalytically assisted etching system was developed for the ultra-precision fabrication of optical components, such as X-ray mirrors and extreme-ultraviolet mask blanks. This study demonstrates that an atomically smooth surface with a sub-Angstrom root-mean-square roughness could be achieved on a SiO2 glass substrate using pure water and Pt as the etching solution and catalyst, respectively. Density functional theory calculations confirmed that the mechanistic pathway was involved in catalyzed hydrolysis. The significant roles of the catalyst were clarified to be the dissociation of water molecules and the stabilization of a meta-stable state, in which a hypervalent silicate state is induced, and the Si-O backbond is elongated and loosened. To confirm the role of the catalyst, the Pt metal was replaced by Au, and the observed drastic difference in the removal rate was attributed to the degree of stabilization of the metastable state. Published under license by AIP Publishing.

DOI： 10.1063/1.5090320

多層膜結像ミラーを用いた高分解能X線顕微鏡の開発

松山智至, 山田純平, 波多健太郎, 萩原拓, 表和彦, 廣瀬雷太, 武田佳彦, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

精密工学会春季大会 2019.3

Surface Finishing Method using Plasma Chemical Vaporization Machining for Narrow Channel Walls of X-ray Crystal Monochromators Reviewed

T. Hirano, Y. Morioka, S. Matsumura, Y. Sano, T. Osaka, S. Matsuyama, M. Yabashi, K. Yamauchi

Int. J. Automation Technol. Vol. 13 ( 2 ) page： 246 - 253 2019.3

Development of a glue-free bimorph mirror for use in vacuum chambers Reviewed

Y. Ichii, H. Okada, H. Nakamori, A. Ueda, H. Yamaguchi, S. Matsuyama, K. Yamauchi

Review of Scientific Instruments Vol. 90 ( 2 ) page： 021702 2019.2

High-efficiency planarization of GaN wafer by catalyst-referred etching with positive-biased photo-electrochemical oxidation

Ryosuke Ohnishi, Daisetsu Toh, Satoshi Matsuyama, Ai Isohashi, Yasuhisa Sano, Kazuto Yamauchi

Proceedings - 34th ASPE Annual Meeting page： 79 - 83 2019

High-efficiency planarization of SIC wafers by water-CARE (Catalyst-referred etching) employing photoelectrochemical oxidation

H. Kida, D. Toh, P. V. Bui, A. Isohashi, R. Ohnishi, S. Matsuyama, K. Yamauchi, Y. Sano

Materials Science Forum Vol. 963 MSF page： 525 - 529 2019

Publishing type：Research paper (international conference proceedings)

© 2019 Trans Tech Publications Ltd, Switzerland. Catalyst-referred etching (CARE) is an abrasive-free and damage-free polishing method that involves applying a catalytic reaction at the contact point of the catalyst surface and workpiece in a chemical solution. An atomically flat silicon carbide (SiC) wafer surface can be obtained by the CARE process. Recently, it was found that water can be used as a chemical solution, even in the case of SiC polishing. However, its current removal rate of 4H-SiC (0001) 4°off-axis substrate is only 2 nm/h and is expected to increase. In this study, the use of photoelectrochemical oxidation in combination with the CARE process using water was investigated, successfully increasing the removal rate up to approximately 100 nm/h.

DOI： 10.4028/www.scientific.net/MSF.963.525

High-efficiency SiC polishing using a thin film catalyst in pure water

Pho Van Bui, Daisetsu Toh, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 19th International Conference and Exhibition, EUSPEN 2019 page： 50 - 51 2019

Publishing type：Research paper (international conference proceedings)

A novel abrasive-free method called catalyst-referred etching (CARE) is used for planarization of SiC In this method, a thin platinum (Pt) catalyst layer is deposited on an elastic pad. The planarization is performed by rotating the catalyst pad in contact with a wafer surface in water. After the planarization, SiC surfaces are atomically smooth with a root-mean-square (RMS) roughness of less than 0.1 nm over a whole wafer. Thanks to the use of pure water as the etchant, CARE is an environmentally friendly planarization method and potentially applicable to planarization of many functional materials, including GaN and oxides surfaces. However, the practical application of CARE is limited due to its low material removal rate (MRR) when using a Pt catalyst. Therefore, improving its MRR is highly demanded. Our recent research indicated that the etching proceeds via dissociative adsorption of water molecules onto Si-C bonds at topmost Si atoms. The lower activation barrier in the presence of the Pt catalyst is mainly due to the chemical stabilization resulting from the formation of Pt-0 bonds at the Pt-SiC interface. Accordingly, the reaction will be promoted by tuning the binding energy with O using other catalysts. Therefore, we experimentally investigate the dependence of MRR on various catalyst materials. The study reveals that Ni and Ru have high catalytic performance. Compared to Pt, Ni and Ru have the higher binding energy with O. The stronger chemical bonds promote water dissociation and stabilization of chemical bonds at the catalyst-SiC interface, leading to lowering its activation barrier and enhancement of the etching reaction.

Development of an abrasive-free polishing method for optical material using pure water and Ni catalyst

Daisetsu Toh, Ryosuke Ohnishi, Pho V. Bui, Ai Isohsahi, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Proceedings - 34th ASPE Annual Meeting page： 474 - 477 2019

Publishing type：Research paper (international conference proceedings)

The removal rate using a Ni catalyst was higher than that using a Pt catalyst. However, it decreased with the processing time because the Ni surface was easily oxidized. Therefore, we proposed the electrochemical method to keep the Ni surface active. By repeating Ni plating and dissolution cycle, we stabilized the removal rate for at least 8 h and created an atomically flat surface on a SiO2 surface.

High-resolution full-field X-ray microscope for 20-keV X-rays with multilayer imaging mirrors Reviewed

Numerically controlled plasma chemical vaporization machining using array-type electrode toward high-throughput deterministic machining

Ken Nishida, Shinya Okayama, Satoshi Matsuyama, Kazuto Yamauchi, Yasuhisa Sano

Proceedings - 34th ASPE Annual Meeting page： 466 - 469 2019

Development of adaptive Kirkpatrick-Baez mirrors based on mechanical and piezoelectric bending

H. Nakamori, T. Goto, S. Matsuyama, H. Hayashi, H. Yamaguchi, J. Sonoyama, K. Akiyama, Y. Sano, Y, Kohmura, M. Yabashi, T. Ishikawa, H. Okada, K. Yamauchi

2018.8

Reflective Imaging Optics using Concave and Convex Mirrors for A Compact and Achromatic Full-field X-ray Microscope Invited Reviewed

J. Yamada, S. Matsuyama, K. Hata, R. Hirose, Y. Takeda, Y. Kohmura, M. Yabashi, K. Omote, T. Ishikawa, K. Yamauchi

Microscopy and Microanalysis Vol. 24 ( S2 ) page： 274 - 275 2018.8

S. Matsuyama

Microscopy and Microanalysis Vol. 24 ( S2 ) page： 284 - 285 2018.8

Development of new diagnostics based on LiF detector for pump-probe experiments Reviewed

T.A. Pikuz, A.Ya.Faenov, N. Ozaki, T. Matsuoka, B. Albertazzi, N. Hartley, K. Miyanishi, K. Katagiri, S. Matsuyama, K. Yamauchi, H. Habara, Y. Inubushi, T. Togashi, H. Yumoto, H. Ohashi, Y. Tange, T. Yabuuchi, M. Yabashi, A. Grum-Grzhimailo, A. Casner, I. Skobelev, S. Makarov, S. Pikuz, G. Rigon, M. Koenig, K.A. Tanaka, T. Ishikawa, R. Kodama

2018.7

Nearly diffraction-limited hard X-ray line focusing with hybrid adaptive X-ray mirror based on mechanical and piezo-driven deformation Reviewed

Takumi Goto, Satoshi Matsuyama, Hiroki Hayashi, Hiroyuki Yamaguchi, Junki Sonoyama, Kazuteru Akiyama, Hiroki Nakamori, Yasuhisa Sano, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Optics Express Vol. 26 ( 13 ) page： 17477 - 17486 2018.6

Language：English Publishing type：Research paper (scientific journal) Publisher：OSA - The Optical Society

We have developed the new hybrid adaptive X-ray mirror based on mechanical and piezo-driven deformation to realize precise shape controllability on a long-length mirror. The mechanical bender approximately provides the required ellipse, while the piezoelectric actuators attached to the mirror correct very small residual errors to satisfy the diffraction-limited condition. The mechanical bender significantly reduces the role of the piezoelectric actuator, resulting in the suppression of accuracy degradation due to the drift and/or junction effect of the piezoelectric actuators. In addition, line focusing was demonstrated with two different numerical apertures at SPring-8, and the obtained beam sizes were 127 and 253 nm (FWHM), which agree well with the diffraction-limited sizes.

DOI： 10.1364/OE.26.017477

Development of a multilayer Kirkpatrick-Baez mirror optics for X-ray free electron laser

T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, T. Osaka, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on Synchrotron Radiation Instrumentation (SRI 2018) 2018.6

Hard-x-ray imaging mirror optics using concave and convex mirrors Invited

J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on Synchrotron Radiation Instrumentation (SRI 2018) 2018.6

Full‐field imaging and focusing with advanced mirror‐based optics Invited

S. Matsuyama

International Conference on Synchrotron Radiation Instrumentation (SRI 2018) 2018.6

Fabrication of ultraprecise multilayer focusing mirrors using an X-ray grating interferometer and differential deposition technique

T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, T. Osaka, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

International Workshop on X-ray Optics and Metrology Satellite Meeting of SRI 2018 (IWXM 2018) 2018.6

Development of reflective imaging optics using concave and convex mirrors

J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Workshop on X-ray Optics and Metrology Satellite Meeting of SRI 2018 (IWXM 2018) 2018.6

Development of hybrid X-ray adaptive optical system based on piezo-driven deformable mirror and a mechanical mirror bender

H. Yamaguchi, T. Goto, H. Hayashi, S. Matsuyama, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on Synchrotron Radiation Instrumentation (SRI 2018) 2018.6

Development of adaptive Kirkpatrick-Baez mirrors based on bimorph and mechanical bending

H. Nakamori, T. Goto, S. Matsuyama, H. Hayashi, H. Yamaguchi, J. Sonoyama, K. Akiyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, H. Okada, K. Yamauchi

International Workshop on X-ray Optics and Metrology Satellite Meeting of SRI 2018 (IWXM 2018) 2018.6

Platinum-catalyzed hydrolysis etching of SiC in water: A density functional theory study Reviewed

Pho Van Bui, Daisetsu Toh, Ai Isohashi, Satoshi Matsuyama, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi, Yoshitada Morikawa

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 57 ( 5 ) page： 055703-1 - 055703-5 2018.5

Language：English Publishing type：Research paper (scientific journal) Publisher：IOP PUBLISHING LTD

A comprehensive study of the physicochemical interactions and the reaction mechanism of SiC etching with water by Pt catalysts can reveal key details about the surface treatment and catalytic phenomena at interfaces. Therefore, density functional theory simulations were performed to study the kinetics of Pt-assisted water dissociation and breaking of a Si-C bond compared to the HF-assisted mechanism. These calculations carefully considered the elastic and chemical interaction energies at the Pt-SiC interface, activation barriers of Si-C bond dissociation, and the catalytic role of Pt. It was found that the Pt-catalyzed etching of SiC in water is initiated via hydrolysis reactions that break the topmost Si-C bonds. The activation barrier strongly depends on the elastic and chemical interactions. However, chemical interactions are a dominant factor and mainly contribute to the lowering of the activation barrier, resulting in an increased rate of reaction. (C) 2018 The Japan Society of Applied Physics

DOI： 10.7567/JJAP.57.055703

Systematic-error-free wavefront measurement using an X-ray single-grating interferometer Reviewed

Takato Inoue, Satoshi Matsuyama, Shogo Kawai, Hirokatsu Yumoto, Yuichi Inubushi, Taito Osaka, Ichiro Inoue, Takahisa Koyama, Kensuke Tono, Haruhiko Ohashi, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Review of Scientific Instruments Vol. 89 ( 4 ) page： 043106-1 - 043106-7 2018.4

Language：English Publishing type：Research paper (scientific journal) Publisher：American Institute of Physics Inc.

In this study, the systematic errors of an X-ray single-grating interferometer based on the Talbot effect were investigated in detail. Non-negligible systematic errors induced by an X-ray camera were identified and a method to eliminate the systematic error was proposed. Systematic-error-free measurements of the wavefront error produced by multilayer focusing mirrors with large numerical apertures were demonstrated at the SPring-8 Angstrom Compact free electron LAser. Consequently, wavefront aberration obtained with two different cameras was found to be consistent with an accuracy better than λ/12.

DOI： 10.1063/1.5026440

Performance of a hard X-ray split-and-delay optical system with a wavefront division Reviewed

Compact and large-magnification full-field X-ray microscope using concave-convex imaging mirrors

J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics and Applications 2018 (XOPT2018) 2018.4

Development of nanofocusing system for X-ray free electron Laser (Study of nanobeam characterization)

T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, T. Osaka, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics and Applications 2018 (XOPT2018) 2018.4

Development of high-resolution X-ray imaging optical system using multilayer imaging mirrors

K. Hata, J. Yamada, S. Matsuyama, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International Conference on X-ray Optics and Applications 2018 (XOPT2018) 2018.4

Takashi Hirano, Taito Osaka, Yuki Morioka, Yasuhisa Sano, Yuichi Inubushi, Tadashi Togashi, Ichiro Inoue, Satoshi Matsuyama, Kensuke Tono, Aymeric Robert, Jerome B. Hastings, Kazuto Yamauchi, Makina Yabashi

Journal of Synchrotron Radiation Vol. 25 ( 1 ) page： 20 - 25 2018.1

Language：English Publishing type：Research paper (international conference proceedings) Publisher：International Union of Crystallography

The performance of a hard X-ray split-and-delay optical (SDO) system with a wavefront division scheme was investigated at the hard X-ray free-electron laser facility SACLA. For the wavefront division, beam splitters made of edge-polished perfect Si(220) crystals were employed. We characterized the beam properties of the SDO system, and investigated its capabilities for beam manipulation and diagnostics. First, it was confirmed that shot-to-shot non-invasive diagnostics of pulse energies for both branches in the SDO system was feasible. Second, nearly ideal and identical focal profiles for both branches were obtained with a spot size of â1/41.5μm in full width at half-maximum. Third, a spatial overlap of the two focused beams with a sub-μm accuracy was achieved by fine tuning of the SDO system. Finally, a reliable tunability of the delay time between two pulses was confirmed. The time interval was measured with an X-ray streak camera by changing the path length of the variable-delay branch. Errors from the fitted line were evaluated to be as small as ±0.4ps over a time range of 60ps.The performance of a hard X-ray split-and-delay optical system with a wavefront division scheme has been investigated at SACLA.

DOI： 10.1107/S1600577517014023

Development of new diagnostics based on LiF detector for pump-probe experiments Reviewed

T. Pikuz, A. Faenov, N. Ozaki, T. Matsuoka, B. Albertazzi, N. J. Hartley, K. Miyanishi, K. Katagiri, S. Matsuyama, K. Yamauchi, H. Habara, Y. Inubushi, T. Togashi, H. Yumoto, H. Ohashi, Y. Tange, T. Yabuuchi, M. Yabashi, A. N. Grum-Grzhimailo, A. Casner, I. Skobelev, S. Makarov, S. Pikuz, G. Rigon, M. Koenig, K. A. Tanaka, T. Ishikawa, R. Kodama

Matter and Radiation at Extremes Vol. 3 ( 4 ) page： 197 - 206 2018.1

Language：English Publishing type：Research paper (scientific journal)

We present new diagnostics for use in optical laser pump - X-ray Free Electron Laser (XFEL) probe experiments to monitor dimensions, intensity profile and focusability of the XFEL beam and to control initial quality and homogeneity of targets to be driven by optical laser pulse. By developing X-ray imaging, based on the use of an LiF crystal detector, we were able to measure the distribution of energy inside a hard X-ray beam with unprecedented high spatial resolution (∼1 μm) and across a field of view larger than some millimetres. This diagnostic can be used in situ, provides a very high dynamic range, has an extremely limited cost, and is relatively easy to be implemented in pump-probe experiments. The proposed methods were successfully applied in pump-probe experiments at the SPring-8 Angstrom Compact free electron LAser (SACLA) XFEL facility and its potential was demonstrated for current and future High Energy Density Science experiments.

DOI： 10.1016/j.mre.2018.01.006

High-efficiency planarization of GaN by catalyst-referred etching using photo-electrochemical oxidation

超精密X線ミラーが拓く次世代X線集光・結像 Invited

松山智至

2018.1

KIDA Hideka, TOH Daisetsu, OHNISHI Ryosuke, Matsuyama Tomohisa, Sano Yasuhisa, Yamauchi Kazuto

The Proceedings of Mechanical Engineering Congress, Japan Vol. 2018 page： S1630004 2018

Language：Japanese Publisher：The Japan Society of Mechanical Engineers

In this study, a gallium nitride (GaN) substrate produced was planarized using catalyst-referred etching (CARE). To improve the removal rate, the GaN substrate was processed using CARE-assisted photoelectrochemical (PEC) reaction (PEC CARE); the removal rate was 77 nm/h. However, the shape was embossed because of subsurface scratches introduced during preprocessing. These scratches were removed when the PEC CARE process was conducted under an applied potential of 2.5 V; The removal rate was 800 nm/h. In addition, a smooth surface of surface roughness 0.4 nm rms was obtained. A surface with step-terrace structures on the entire substrate was subsequently obtained when the CARE process was performed using a platinum (Pt) catalyst and deionized water; in this case, the surface roughness was 0.11 nm rms and the removal rate was 5 nm/h.

DOI： 10.1299/jsmemecj.2018.s1630004

In Situ Characterization of XFEL Beam Intensity Distribution and Focusability by High-Resolution LiF Crystal Detector

T. A. Pikuz, A. Ya. Faenov, T. Matsuoka, B. Albertazzi, N. Ozaki, N. Hartely, O. Muray Ricardo Arturo, T. Yabuuchi, H. Habara, S. Matsuyama, K. Yamauchi, Y. Inubushi, T. Togashi, H. Yumoto, Y. Tange, K. Tono, Y. Sato, M. Yabashi, M. Nishikino, T. Kawachi, A. Mitrofanov, S. A. Pikuz, D. Bleiner, A. Grum-Grzhimailo, N. N. Rosanov, N. V. Vysotina, M. Harmand, M. Koenig, K. A. Tanaka, T. Ishikawa, R. Kodama

Springer Proceedings in Physics Vol. 202 page： 109 - 115 2018

Language：English Publishing type：Research paper (international conference proceedings) Publisher：Springer Science and Business Media, LLC

We present here a new diagnostics based on using LiF crystal detectors that are able to perform measurements an intensity distribution of X-rays beams with diameters ranging from some microns up to some centimetres with high spatial resolution (~1 µm). In situ, 3D visualization of SACLA XFEL focused beam profile along propagation, including propagation inside photoluminescence solid materials, is demonstrated. Also, a high spatial resolution control a quality of targets used in optical laser pump—XFEL probe HEDS experiments is proposed.

DOI： 10.1007/978-3-319-73025-7_17

High-efficiency planarization of SiC in pure water using a thin film catalyst

Pho Van Bui, Yuta Nakahira, Daisetsu Toh, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 18th International Conference and Exhibition, EUSPEN 2018 page： 433 - 434 2018

Publishing type：Research paper (international conference proceedings)

A novel abrasive-free method called catalyst-referred etching (CARE) has been developed in our group. In this method, a platinum film as a catalyst is deposited on an elastic pad that is rotated in contact with a wafer surface in water. After CARE planarization, SiC surfaces are atomically smooth with a root-mean-square (RMS) roughness of less than 0.1 nm over a whole wafer. Using only pure water as an etchant, CARE is a promising planarization method and potentially applicable to planarization of many semiconductor surfaces, including GaN and oxides surfaces. However, the removal rate (RR) of SiC via CARE using a Pt catalyst is quite low, limiting its practical application. Our recent research on the removal mechanism using density functional theory (DFT) calculations indicated that the etching proceeded via a dissociative adsorption of water molecules onto the Si-C bonds at the topmost Si surface, catalyzed by a Pt catalyst. We expect that the RR can be improved by using the higher reactivity catalyst. Therefore, we experimentally investigate the dependence of RR on various catalyst materials. The results indicate that SiC can be planarized with a high RR using 3d transition metal catalysts. Using DFT calculations, we clarify that a high catalytic reactivity of a 3d transition metal is attributed to the higher chemical binding energy with OH, compared to that of Pt. This high chemical bond promotes water dissociation and stabilizes metastable states by forming chemical bonds at the catalyst-SiC interface, leading to lowering its activation barrier and an enhancement of the etching reaction.

Development of high efficiency polishing method using pure water and Ni catalyst

Daisetsu Toh, Pho Van Bui, Nakahira Yuta, Hideka Kida, Takahisa Ohgushi, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 18th International Conference and Exhibition, EUSPEN 2018 page： 435 - 436 2018

Publishing type：Research paper (international conference proceedings)

We have developed "Catalyst Referred Etching" (CARE) using pure water as an etchant and Pt as a catalyst as a new polishing method. Using CARE, many functional materials, such as silicon carbide (SiC), gallium nitride (GaN), and metal oxides, can be planar-ized to atomically well-ordered surfaces with a root-mean-square (RMS) roughness of less than 0.1 nm over a whole wafer. The planarized surface has a step-and-terrace structure, indicating that CARE is step-flow etching type. Thus, the material removal rate (MRR) of CARE using a Pt catalyst, especially for crystalline materials, is quite low, approximately 20 nm/h for SiC. Our recent study shows that the catalytic reactivity of a Ni for CARE is higher than that of a Pt. Additionally, compared to Pt, Ni is cost-effective and abundant, indicating that Ni is a promising catalyst for CARE. However, the MRR using a Ni catalyst usually decreases with the processing time due to catalytic deactivation by oxidation of the Ni surface. Therefore, we use electrochemical deposition method to control Ni surface condition and to keep its surface catalytivally active. First, before CARE processing, the Ni is deposited on a polishing pad by setting its potential to be lower than that of the etchant. The deposited Ni layer works as an active catalyst. Second, after CARE processing, the residual Ni is dissolved into the etchant by changing its potential to be higher than that of the etchant. By alternative repeating these steps, reactive Ni on the polishing pad is continually prepared. Accordingly, the removal rate is stable with processing time. The study reveals that CARE with the potential control method is potential for high-efficiency polishing of functional materials.

Wavefront sensing for nano-focusing characterization

S. Matsuyama

9th Hard X-ray FEL Collaboration Meeting (5-way meeting 2017) 2017.12

Ellipsoidal mirror for two-dimensional 100-nm focusing in hard X-ray region Reviewed

H. Yumoto, T. Koyama, S. Matsuyama, Y. Kohmura, K. Yamauchi, T. Ishikawa, H. Ohashi

Scientific Reports Vol. 7 ( 1 ) page： 16408 2017.11

Language：English Publishing type：Research paper (scientific journal) Publisher：NATURE PUBLISHING GROUP

Cutting-edge hard X-ray microscopy strongly depends on sophisticated focusing optics and ultrabright X-ray sources at synchrotron-radiation and X-ray free-electron laser (XFEL) facilities. These facilities typically provide two-dimensional nanofocusing X-ray beams by combining one-dimensional focusing mirrors. However, single-reflecting two-dimensional focusing mirrors with an ellipsoidal surface, which are well-known to possess high efficiency, have limited microfocusing applications. In this paper, we present an ultrahigh-precision ellipsoidal mirror for two-dimensional X-ray nanofocusing by overcoming the difficulties faced in the manufacturing process of its aspherical surface, including the surface-processing methods and surface metrology. The developed mirror has nanoscale accuracy, and it achieves focus size of 85 nm x 125 nm (full width at half maximum) using 7-keV X-rays. Two-dimensional focus was demonstrated in the same focal plane by resolving 50-nm test structures by scanning X-ray microscopy using a focusing beam. These achievements represent an important first step toward realizing two-dimensional aspherical mirrors with complex designs, in addition to ultralow loss and unprecedented small focusing property for extensive optical applications in synchrotron-radiation and XFEL facilities as well as in other scientific fields that require ultraprecision optical surfaces.

DOI： 10.1038/s41598-017-16468-1

全反射ミラーを用いた色収差のない結像光学系の開発 Invited

松山智至

2017.11

衝撃圧縮された多結晶コランダムの時分割XFELその場観察

丹下慶範, 尾崎典雅, 瀬戸雄介, 佐藤友子, 奥地拓生, 松岡健之, 高橋謙次郎, 宮西宏併, ALBERTAZZI Bruno・HARTLEY Nicholas, 梅田悠平, 西川豊人, 松山智至, 山内和人, 関根利守, 田中和夫, 兒玉了祐, 籔内俊毅, 矢橋牧名

高圧討論会講演要旨集 Vol. 58th 2017.11

Fabrication of X-ray imaging mirror for an achromatic and high-resolution full-field X-ray microscope

J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, K. Yamauchi

2017.10

Development of crystal-based split-and-delay optics with wavefront splitting at SACLA

T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, M. Yabashi

SPIE Optics+Photonics2017 page： 187 - 187 2017.8

高分解能かつ色収差のないX線顕微鏡の開発 Invited

松山智至

日本学術振興会，結晶加工と評価技術第145委員会，第154回研究会 2017.8

高分解能かつ色収差のない X 線顕微鏡の開発 Invited

松山智至

精密工学会学術講演会講演論文集 Vol. 2017 page： 957 - 958 2017.8

Language：Japanese Publisher：公益社団法人精密工学会

高精度なX線全反射ミラーを4枚用いて，高分解能かつ色収差のない結像型X線顕微鏡を開発した．本顕微鏡の実用性を確かめるために，蛍光X線イメージング，暗視野イメージング，位相イメージングを実施した．暗視野イメージングでは，後焦点位置にナイフエッジを挿入した．位相イメージングでは，位相回折格子を用いたタルボ効果を利用した．ポリスチレン球や金属微粒子，テストチャートの観察について詳細に報告する．

DOI： 10.11522/pscjspe.2017S.0_957

Full-field X-ray fluorescence imaging based on total-reflection imaging mirrors

S. Matsuyama, S. Yasuda, J. Yamada, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics 2017.8

Development of precision Wolter mirrors for solar x-ray observations

Taro Sakao, Satoshi Matsuyama, Takumi Goto, Jumpei Yamada, Shuhei Yasuda, Kazuto Yamauchi, Yoshiki Kohmura, Ayumi Kime, Akira Miyake, Tadakazu Maezawa, Hirokazu Hashizume, Yoshinori Suematsu, Noriyuki Narukage, Shin-nosuke Ishikawa

Proceedings of SPIE Vol. 10386 page： 103860E-1 - 103860E-11 2017.8

Language：English Publishing type：Research paper (international conference proceedings) Publisher：SPIE-INT SOC OPTICAL ENGINEERING

High resolution imagery of the Sun's X-ray corona provides an essential clue in understanding dynamics and heating processes of plasma particles there. However, X-ray imagery of the Sun with sub-arcsecond resolution has so far never been conducted due to severe technical difficulty in fabricating precision Wolter mirrors. For future X-ray observations of the solar corona, we are attempting to realize precision Wolter mirrors with sub-arcsecond resolution by adopting advanced surface polish and metrology methods to sector mirrors which consist of a portion of an entire annulus, by direct polishing onto the mirror substrate.
Based on the knowledge obtained through fabrication of the first (in 2013) and second (in 2014) engineering Wolter mirrors and subsequent evaluations on their X-ray focusing performance, the third engineering mirror was made in 2015-2016. The primary target of improvement over the second mirror was to suppress figure error amplitude especially for spatial frequencies around 1 mm(-1) and to suppress the large astigmatism that was present in the second mirror, by introducing improved deterministic polish and smoothing on the precision mirror surfaces (32.5 mm x 10 mm in area for both parabola and hyperbola segments), as well as by careful characterization of the systematic error in the figure measurement system for the precision polish. Measurements on the focusing performance of thus-fabricated third Wolter mirror at SPring-8 synchrotron facility with 8 keV X-rays demonstrated that the mirror attained sub-arcsecond focusing performance with its HPD (half-power diameter) size reaching as small as similar to 0.2 arcsec for meridional focusing while similar to 0.1 arcsec for sagittal focusing. The meridional focusing achieved nearly diffraction limited performance (similar to 0.12 arcsec FWHM for the PSF core). We also confirmed that the large astigmatism noted in the second mirror was correctly removed in the third mirror with the correction of the above-mentioned systematic error.

DOI： 10.1117/12.2273507

Development of Precise Wavefront Measurement Method for X-Ray Free Electron Laser Focusing System

T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Osaka, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

The 24th Congress of the International Comission for Optics, X-ray and High-energy Optics 2017.8

Development of measurement system for ellipsoidal mirrors

H. Nakamori, Y. Ichii, H. Okada, A. Ueda, T. Tsumura, S. Matsuyama, K. Yamauchi

SPIE Optics+Photonics2017 page： 185 - 185 2017.8

Development of measurement system for ellipsoidal mirrors Reviewed

H. Nakamori, Y. Ichii, H. Okada, A. Ueda, T. Tsumura, S. Matsuyama, K. Yamauchi

2017.8

Development of hybrid adaptive x-ray focusing system based on piezoelectric bimorph mirror and mirror bender Reviewed

T. Goto, S. Matsuyama, H. Hayashi, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, K. Yamauchi

SPIE Optics+Photonics2017 page： 187 - 187 2017.8

Development of full-field x-ray fluorescence microscope using total-reflection mirrors Reviewed

S. Matsuyama, J. Yamada, S. Yasuda, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

SPIE Optics+Photonics2017 page： 193 - 193 2017.8

Shock response to solid germanium

Kohei Miyanishi, Norimasa Ozaki, Takeshi Matsuoka, Satoshi Matsuyama, Kenjiro Takahashi, Hideaki Habara, Tatiana Pikuz, Anatoly Faenov, Kazuto Yamauchi, Ryosuke Kodama, Kazuo Tanaka, Yusuke Seto, Yoshinobu Tange, Toshinori Yabuuchi, Yuichi Inubushi, Tadashi Togashi, Makina Yabashi, Tetsuya Ishikawa, Michel Koenig, Tommaso Vinci, Takuo Okuchi, Nicholas Hartley, Osami Sakata, Toshimori Sekine, Emma McBride

2017.7

Development of new diagnostics in the interests of pump-probe experiments Invited

T. Pikuz, A. Faenov, N. Ozaki. T. Matsuoka, B. Albertazzi, N. Hartely, S. Matsuyama, K. Yamauchi, H. Habara, Y. Inubushi, T. Togashi, H. Yumoto, H. Ohashi, Y. Tange, T. Yabuuchi, M. Yabashi, A. Grum-Grzhimailo, A. Casner, G. Rigon, M. Koenig, K. A. Tanaka, T. Ishikawa, R. Kodama

2017.6

Measurement of the X-ray Spectrum of a Free Electron Laser with a Wide-Range High-Resolution Single-Shot Spectrometer Reviewed

Y. Inubushi, I. Inoue, J. Kim, A. Nishihara, S. Matsuyama, H. Yumoto, T. Koyama, K. Tono, H. Ohashi, K. Yamauchi, M. Yabashi

Applied Sciences Vol. 7 ( 6 ) page： 584-1 - 584-5 2017.6

Language：English Publishing type：Research paper (scientific journal) Publisher：MDPI AG

We developed a single-shot X-ray spectrometer for wide-range high-resolution measurements of Self-Amplified Spontaneous Emission (SASE) X-ray Free Electron Laser (XFEL) pulses. The spectrometer consists of a multi-layer elliptical mirror for producing a large divergence of 22 mrad around 9070 eV and a silicon (553) analyzer crystal. We achieved a wide energy range of 55 eV with a fine spectral resolution of 80 meV, which enabled the observation of a whole SASE-XFEL spectrum with fully-resolved spike structures. We found that a SASE-XFEL pulse has around 60 longitudinal modes with a pulse duration of 7.7 +/- 1.1 fs.

DOI： 10.3390/app7060584

Development of new diagnostics in the interests of pumpprobe experiments Invited

T. Pikuz, A. Faenov, N. Ozaki, T. Matsuoka, B. Albertazzi, N.Hartely, S. Matsuyama, K. Yamauchi, H. Habara, Y. Inubushi, T. Togashi, H. Yumoto, H. Ohashi, Y. Tange, T. Yabuuchi, M. Yabashi, A. Grum-Grzhimailo, A. Casner, G. Rigon, M. Koenig, K. A. Tanaka, T. Ishikawa, R. Kodama

2017.6

Chemical etching of silicon carbide in pure water by using platinum catalyst Reviewed

A. Isohashi, P. V. Pho, S. Matsuyama, Y. Sano, K. Inagaki, Y. Morikawa, K. Yamauchi

Applied Phsyics Letters Vol. 110 ( 20 ) page： 201601 2017.5

Language：English Publishing type：Research paper (scientific journal) Publisher：AMER INST PHYSICS

Chemical etching of SiC was found to proceed in pure water with the assistance of a Pt catalyst. A 4H-SiC (0001) wafer was placed and slid on a polishing pad in pure water, on which a thin Pt film was deposited to give a catalytic nature. Etching of the wafer surface was observed to remove protrusions preferentially by interacting with the Pt film more frequently, thus flattening the surface. In the case of an on-axis wafer, a crystallographically ordered surface was obtained with a straight step-and-terrace structure, the height of which corresponds to that of an atomic bilayer of Si and C. The etching rate depended upon the electrochemical potential of Pt. The vicinal surface was observed at the potential at which the Pt surface was bare. The primary etching mechanism was hydrolysis with the assistance of a Pt catalyst. This method can, therefore, be used as an environmentally friendly and sustainable technology. Published by AIP Publishing.

DOI： 10.1063/1.4983206

50-nm-resolution full-field X-ray microscope without chromatic aberration using total-reflection imaging mirrors Reviewed

S. Matsuyama, S. Yasuda, J. Yamada, H. Okada, Y. Kohmura, M Yabashi, T. Ishikawa, K. Yamauchi

Scientific Reports Vol. 7 page： 46358 2017.4

Language：English Publishing type：Research paper (scientific journal) Publisher：NATURE PUBLISHING GROUP

X-ray spectromicroscopy with a full-field imaging technique is a powerful method for chemical analysis of heterogeneous complex materials with a nano-scale spatial resolution. For imaging optics, an X-ray reflective optical system has excellent capabilities with highly efficient, achromatic, and long-workingdistance properties. An advanced Kirkpatrick-Baez geometry that combines four independent mirrors with elliptic and hyperbolic shapes in both horizontal and vertical directions was developed for this purpose, although the complexity of the system has a limited applicable range. Here, we present an optical system consisting of two monolithic imaging mirrors. Elliptic and hyperbolic shapes were formed on a single substrate to achieve both high resolution and sufficient stability. The mirrors were finished with a similar to 1-nm shape accuracy using elastic emission machining. The performance was tested at SPring-8 with a photon energy of approximately 10 keV. We could clearly resolve 50-nm features in a Siemens star without chromatic aberration and with high stability over 20 h. We applied this system to X-ray absorption fine structure spectromicroscopy and identified elements and chemical states in specimens of zinc and tungsten micron-size particles.

DOI： 10.1038/srep46358

4枚の形状可変鏡に基づく開口数可変集光光学系を用いた回折限界Ｘ線集光

松山智至

X線結像光学ニューズレター 2017.4

Achromatic and High-Resolution Full-Field X-ray Microscope and its Applicaiton

S. Matsuyama, J. Yamada, S. Yasuda, Y. Kohmura, H. Okadam, Y. Sano, M. Yabashi, T. Ishikawa, K. Yamauchi

International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017 page： 10 - 11 2017.4

High-magnification X-ray imaging mirror system consisting of elliptical concave and hyperbolic convex mirrors

J. Yamada, S. Matsuyama, S. Yasuda, Y. Sano, Y. Kohmura, M. Yabashi, T. Ishikawa, K. Yamauchi

International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017 page： 66 - 66 2017.4

Hard X-ray Split-and-Delay Optics with wavefront Division at SACLA

T. Hirano, T. Osaka, Y. Sano, Y. Inubushi, T. Togashi, I. Inoue, S. Matsuyama, K. Tono, K. Yamauchi, M. Yabashi

International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017 page： 34 - 34 2017.4

Development of calibration method for X-ray single-grating interferometry

T. Inoue, S. Matsuyama, S. Kawai, H. Yumoto, Y. Inubushi, T. Koyama, K. Tono, H. Ohashi, T. Katayama, S. Goto, T. Ishikawa, M. Yabashi, K. Yamauchi

International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017 page： 59 - 60 2017.4

Development of an adaptive x-ray focusing system based on the combination of piezoelectric bimorph mirror and mirror bender

T. Goto, S. Matsuyama, H. Hayashi, J. Sonoyama, K. Akiyama, H. Nakamori, Y. Sano, K. Yamauchi

International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017 page： 72 - 72 2017.4

Development of a multilayer KB mirror sysem for sub-10nm XFEL focusing

S. Kawai, S. Matsuyama, T. Inoue, H. Yumoto, Y. Inubushi, T. Osaka, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, K. Yamauchi

International conference on X-ray optics and applications 2017 (XOPT'17) in OPIC2017 page： 61 - 62 2017.4

パワーレーザーとXFELを用いた動的超高圧下の物質変形・相転移に関する研究 Reviewed

尾崎典雅

2017.3

全反射ミラーを用いた高分解能かつ色収差のない結像型X線顕微鏡の開発ー様々な観察法への応用ー

松山智至, 安田周平, 山田純平, 佐野泰久, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

アブストラクト集 Vol. P02 2017.3

全反射ミラーを用いた高分解能かつ色収差のない結像型X線顕微鏡の開発ー様々な観察法への応用ー

松山智至, 安田周平, 山田純平, 佐野泰久, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

2017年度精密工学会春季大会学術講演会 2017.3

高エネルギー密度科学のための新しい実験ステーション Reviewed

松岡健之, 尾崎典雅

2017.3

Simulation of concave-convex imaging mirror system for development of a compact and achromatic full-field x-ray microscope Reviewed

J. Yamada, S. Matsuyama, Y. Sano, K. Yamauchi

Applied Optics Vol. 56 ( 4 ) page： 967 - 974 2017.2

Language：English Publishing type：Research paper (scientific journal) Publisher：OPTICAL SOC AMER

We propose the use of two pairs of concave-convex mirrors as imaging optics for the compact full-field x-ray microscope with high resolution and magnification factors. The optics consists of two pairs of hyperbolic convex and elliptical concave mirrors with the principal surface near the object, consequently enabling the focal length to be 10 times shorter than conventional advanced Kirkpatrick-Baez mirror optics. This paper describes characteristics of the optics calculated by ray-tracing and wave-optical simulators. The expected spatial resolution is approximately 40 nm with a wide field of view of more than 10 mu m and a total length of about 2 m, which may lead to the possibility of laboratory-sized, achromatic, and high-resolution full-field x-ray microscopes. (C) 2017 Optical Society of America

DOI： 10.1364/AO.56.000967

Ultrafast observation of lattice dynamics in laser-irradiated gold foils Reviewed

N. J. Hartley, N. Ozaki, T. Matsuoka, B. Albertazzi, A. Faenov, Y. Fujimoto, H. Habara, M. Harmand, Y. Inubushi, T. Katayama, M. Koenig, A. Krygier, P. Mabey, Y. Matsumura, S. Matsuyama, E. E. McBride, K. Miyanishi, G. Morard, T. Okuchi, T. Pikuz, O. Sakata, Y. Sano, T. Sato, T. Sekine, Y. Seto, K. Takahashi, K. A. Tanaka, Y. Tange, T. Togashi, Y. Umeda, T. Vinci, M. Yabashi, T. Yabuuchi, K. Yamauchi, R. Kodama

Applied Physics Letters Vol. 110 ( 7 ) page： 071905 - 071905 2017.2

Language：English Publishing type：Research paper (scientific journal) Publisher：AMER INST PHYSICS

We have observed the lattice expansion before the onset of compression in an optical-laser-driven target, using diffraction of femtosecond X-ray beams generated by the SPring-8 Angstrom Compact Free-electron Laser. The change in diffraction angle provides a direct measure of the lattice spacing, allowing the density to be calculated with a precision of +/- 1%. From the known equation of state relations, this allows an estimation of the temperature responsible for the expansion as <1000 K. The subsequent ablation-driven compression was observed with a clear rise in density at later times. This demonstrates the feasibility of studying the dynamics of preheating and shock formation with unprecedented detail. Published by AIP Publishing.

DOI： 10.1063/1.4976541

Visualization of intracellular elements using scanning X-ray fluorescence microscopy Reviewed

Mari Shimura, Lukasz Szyrwiel, Satoshi Matsuyama, Kazuto Yamauchi

Metallomics: Recent Analytical Techniques and Applications page： 63 - 92 2017.1

Language：English Publishing type：Part of collection (book) Publisher：Springer Japan

Recent technological developments have enabled the imaging of chemical elements in cells, although quantitative analyses, such as by inductively coupled plasma mass spectrometry, were developed previously. Applications allowing high-resolution imaging at the single-cell level are anticipated in cell biology and medicine, where the roles of elements, especially in relation to intracellular molecules such as proteins, nucleic acids, lipids, and sugars, are essential for understanding cellular functions. The expression of proteins and genes varies depending on cellular function, and multiple elements are likely to be associated with biological molecules in the functioning of cell proliferation, differentiation, aging, and stress responses. In this review, we describe a scanning X-ray fluorescence microscopy system, which can reliably determine the cellular distribution of multiple elements by a sub-100-nm focusing approach, together with its applications. Visualizing intracellular elements and understanding their dynamics at the single-cell level may provide great insight into their behaviors.

DOI： 10.1007/978-4-431-56463-8_3

Generation of apodized X-ray illumination and its application to scanning and diffraction microscopy Reviewed

Krishna P. Khakurel, Takashi Kimura, Hiroki Nakamori, Takumi Goto, Satoshi Matsuyama, Tomoya Sasaki, Masashi Takei, Yoshiki Kohmura, Tetsuya Ishikawa, Kazuto Yamauchi, Yoshinori Nishino

JOURNAL OF SYNCHROTRON RADIATION Vol. 24 ( Pt 1 ) page： 142 - 149 2017.1

Language：English Publishing type：Research paper (scientific journal) Publisher：INT UNION CRYSTALLOGRAPHY

X-ray science has greatly benefited from the progress in X-ray optics. Advances in the design and the manufacturing techniques of X-ray optics are key to the success of various microscopic and spectroscopic techniques practiced today. Here the generation of apodized X-ray illumination using a two-stage deformable Kirkpatrick-Baez mirror system is presented. Such apodized illumination is marked by the suppression of the side-lobe intensities of the focused beam. Thus generated apodized illumination was employed to improve the image quality in scanning X-ray fluorescence microscopy. Imaging of a non-isolated object by coherent X-ray diffractive imaging with apodized illumination in a non-scanning mode is also presented.

DOI： 10.1107/S1600577516017677

Forefront of Development of Ultraprecise X-ray Mirrors for Synchrotron Radiation X-rays

全反射結像ミラーを使った色収差のないX線顕微鏡の開発と顕微分光への応用

松山智至, 安田周平, 山田純平, 岡田浩巳, 香村芳樹, 矢橋牧名, 石川哲也, 山内和人

アブストラクト集 Vol. 5D003 2017.1

光電気化学酸化を援用した触媒表面基準エッチング法による窒化ガリウムの高能率平坦化

木田英香, 藤大雪, 中平雄太, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集 Vol. 2017A page： 19 - 20 2017

Language：Japanese Publisher：公益社団法人精密工学会

我々は，窒化ガリウム (GaN) 基板を平坦化する革新的な手法として触媒表面基準エッチング (Catalyst-Referred Etching; CARE) 法の開発，研究を行っている．現在までに研磨定盤にPt触媒，加工液に純水を用いて，原子レベルに平坦な表面が作製可能となっているが，ステップフロー型であるのでCARE法は加工速度が不十分である．そこで本研究では，GaN基板の高能率平坦化を目指し，光電気化学酸化を援用したCARE法（PEC-CARE加工）を検討することで，加工速度は800 nm/hにまで向上した．

DOI： 10.11522/pscjspe.2017a.0_19

MATSUYAMA Satoshi, YAMAUCHI Kazuto

Journal of the Japan Society for Precision Engineering Vol. 83 ( 4 ) page： 300 - 304 2017

The development of the dry planarization method with a reference plane by the transportation of active species

Ryokume Reiji, Miyazaki Toshinobu, Sano Yasuhisa, Matsuyama Satoshi, Yamauchi Kazuto

Proceedings of JSPE Semestrial Meeting Vol. 2017 page： 541 - 542 2017

高濃度SF6ガスを用いたサブ大気圧プラズマエッチングによるSiC基板の高能率薄化加工

井上裕貴, 田尻光毅, 向井莉紗, 佐野泰久, 松山智至, 山内和人

精密工学会学術講演会講演論文集 Vol. 2017 page： 975 - 976 2017

Language：Japanese Publisher：公益社団法人精密工学会

SiCデバイス製造工程においてサブ大気圧プラズマを用いたプラズマエッチング加工を検討している。今回、実用化を視野に入れた加工速度を達成することを目指した。SF6の供給量と投入電力を増大させ、反応種であるFラジカル数を増加させることで加工速度を向上させた。大電力の投入はこれまで困難であったが、新たな試料台を用いることで大電力を投入しても安定なプラズマの発生に成功し、2インチウエハ全面加工速度15.2 μm/minを達成した。

DOI： 10.11522/pscjspe.2017S.0_975

触媒表面基準エッチング法における水素水を用いた被毒除去法の提案

中平雄太, 礒橋藍, Bui Pho, 稻田辰昭, 藤大雪, 木田英香, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集 Vol. 2017 ( 0 ) page： 1 - 2 2017

Language：Japanese Publisher：公益社団法人精密工学会

我々はこれまで触媒表面基準エッチング法の開発を行ってきた。本手法ではエッチング反応による加工が、触媒作用を有する研磨パッドの近傍のみで進行するため凸部からの選択的な加工が可能である。砥粒等の機械的作用によるダメージはなく効率的に基準面形状の転写が可能である。本研究では、水素水を用い触媒表面の加工生成物を除去することで加工速度の安定化を行い、加工液のpHを変化させることで加工速度の向上に成功した。

DOI： 10.11522/pscjspe.2017A.0_1

Change in surface morphology of Si (100) wafer after oxidation with atmospheric-pressure plasma Reviewed

Hiroyasu Takei, Satoshi Kurio, Satoshi Matsuyama, Kazuto Yamauchi, Yasuhisa Sano

Key Engineering Materials Vol. 723 page： 242 - 246 2017

Language：English Publishing type：Research paper (international conference proceedings) Publisher：Trans Tech Publications Ltd

Modern surface processing of semiconductors or oxide materials requires highly precise temporal control of each processing step. In addition, large wafers must be processed quickly for high throughput. We have developed a numerically controlled sacrificial oxidation method with atmospheric-pressure plasma using electrode arrays. In this method, we oxidized the surface of a wafer with atmospheric-pressure plasma applied precisely by an electrode array, and then dipped the wafer in HF solution to remove the surface oxide layer. The plasma process time can be controlled independently at each electrode area. The oxidation rate and surface profile of the treated wafer are crucial for precision processing. We investigated the oxidation rate of atmospheric-pressure plasma oxidation by spectroscopic ellipsometry and examined the surface morphologies of untreated and treated wafers by atomic force microscopy. The surface profile smoothness correlated with the plasma oxidation time and electrode voltage during oxidation. The surface roughness tended to increase when the sample was oxidized for longer times with higher electrode voltage. This correlation between surface roughness and oxidation time resembled the results of Si/SiO2 interfacial roughness in the case of thermal oxidation. In the plasma sacrificial oxidation process, the increase of surface roughness at the Si/SiO2 interface by plasma oxidation must be considered.

DOI： 10.4028/www.scientific.net/KEM.723.242

多層膜KBミラーを用いたX線自由電子レーザーナノ集光システムの開発

川合蕉吾, 松山智至, 井上陽登, 湯本博勝, 犬伏雄一, 小山貴久, 登野健介, 大橋治彦, 大坂泰斗, 矢橋牧名, 石川哲也, 山内和人

精密工学会学術講演会講演論文集 Vol. 2017 page： 959 - 960 2017

Language：Japanese Publisher：公益社団法人精密工学会

X線自由電子レーザーは超高強度という非常に優れた性質をもつ．その性能をより向上させるためには，高精度かつ大開口数であるX線集光光学系の開発が必要不可欠である．我々は，大開口数多層膜ミラーを用いた集光光学系をSPring-8に構築した．そして，X線グレーチング干渉計で波面計測を行うことによって多層膜ミラーの作製誤差を計測しさらにこれを修正した．λ/4程度の精度で多層膜集光ミラーを完成させた．

DOI： 10.11522/pscjspe.2017S.0_959

ニッケル触媒を利用した純水ベースの触媒表面基準エッチング法の開発

藤大雪, 礒橋藍, 稻田辰昭, 中平雄太, 木田英香, 松山智至, 佐野泰久, 山内和人

精密工学会学術講演会講演論文集 Vol. 2017 ( 0 ) page： 35 - 36 2017

Language：Japanese Publisher：公益社団法人精密工学会

我々は機能性材料を平坦化する手法として触媒表面基準エッチング法を開発してきた．加工液に純水，触媒にPt，を用いる本手法は高精度表面の実現を可能にするがステップフロー型エッチングであるため加工速度は未だ不十分である．そこで本研究ではニッケルを触媒として利用し，加工速度の向上を図った．表面が酸化され化学的不活性になりやすいニッケルを電気化学的手法によりその触媒活性を安定させ超高速加工を実現した．

DOI： 10.11522/pscjspe.2017A.0_35

Planarization of SiC and oxide surfaces by using Catalyst-Referred Etching with water

Pho Van Bui, Ai Isohashi, Daisetsu Toh, Satoshi Matsuyama, Kouji Inagaki, Yasuhisa Sano, Kazuto Yamauchi

Proceedings of the 17th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2017 page： 157 - 158 2017

Publishing type：Research paper (international conference proceedings)

A novel abrasive-free planarization method called catalyst-referred etching (CARE) has been invented and developed in our group. In this method, a platinum film, which acts as a catalyst, is deposited on an elastic pad that is rotated in contact with a wafer surface in water. CARE can produce flat, undamaged, and smooth SiC and SiO2 surfaces with a root-mean-square (RMS) roughness of less than 0.1 nm over a whole wafer. The mechanism is considered a dissociative adsorption of water molecules onto the Si-C bonds at the topmost Si surface. The gross activation barrier strongly correlates with the stability of the metastable state and is reduced by the formation of Pt-O chemical bonds, leading to an enhancement of the etching reaction.

Stabilization of removal rate of silica glass on catalyst-referred etching by cleaning catalyst surface

Yuta Nakahira, Ai Isohashi, Tatsuaki Inada, Daisetsu Toh, Hideka Kida, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

ICPT 2017 - International Conference on Planarization/CMP Technology page： 110 - 114 2017

Publishing type：Research paper (international conference proceedings)

A novel planarization method termed catalyst-referred etching (CARE) was developed, in which platinum and pure water were respectively employed as a catalyst and an etchant to create highly ordered surfaces with a step terrace structure on oxide materials, such as quarts, sapphire, and zinc oxide substrates. The step heights were in good agreement with the theoretical single-bilayer thickness. However, the removal rate of the etching process gradually decreased with the processing time. This decrease in the removal rate was attributed to degradation of the catalyst via the adsorption of silicic acid produced during the CARE process on the catalyst surface. Two methods were employed to remove the silicic acid: control of the potential of the Pt surface and cleaning of the catalyst pad with H2 water. The removal rate was maintained by using both methods. In both methods, the potential of the Pt surface was set at the H generation level. It is proposed that the generated hydrogen atoms broke the Pt-O bonds, thereby maintaining the reactivity of the catalyst surface.