Nagoya University   Graduate School of Engineering Plasma Nanotechnology Research Center   Assistant Professor

2017.9 - 2019.3

Nagoya University   Graduate School of Engineering Plasma Nanotechnology Research Center   Assistant Professor

2017.9 - 2019.3

Nagoya University   Graduate School of Engineering Electronics 2   Assistant Professor

2017.5 - 2023.3

Nagoya University   Researcher

2015.4 - 2017.4

44th DPS2023 実行委員会   実行委員  

2022.3 - 2023.11   

IUMRS-ICYRAM   組織委員  

2021 - 2022   

IUMRS-ICYRAM   組織委員  

2021 - 2022   

2019年国際固体素子・材料コンファレンス実行委員会   実行委員  

2018.8 - 2019.9   

ISPlasma / IC-PLANTS　実行委員会   実行委員  

2017.4   

ISPlasma / IC-PLANTS 実行委員会   実行委員  

2017.4   

IWOPA2 実行委員会   実行委員  

2017.4 - 2018.3   

40th DPS2018 実行委員会   実行委員  

2017.3 - 2018.11   

DPS40周年記念事業準備委員会   実行委員  

2017.3 - 2018.11   

The Best Oral Presentation Awards

2019.3   11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2019) / 12th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2019)   Control of sp2-C Fraction and Hardness of Amorphous Carbon Films by Formation of Precursor Radicals Depending on a Residence Time

Hirotsugu Sugiura, Yasuyuki Ohashi, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine and Masaru Hori

堀場雅夫賞

2018.10   株式会社　堀場製作所  

Award of Encouragement of Research

2016.12  

応用物理学会講演奨励賞

2012.11   応用物理学会  

Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO₂ by Cryogenic-Assisted Surface Reactions

Tsutsumi Takayoshi

Small Methods   Vol. 8 ( 12 )   2024.12

Radical, ion, and photon's effects on defect generation at SiO₂/Si interface during plasma etching

Nunomura, S; Tsutsumi, T; Takada, N; Fukasawa, M; Hori, M

APPLIED SURFACE SCIENCE   Vol. 672   2024.11

High-Speed Removal Process for Organic Polymers by Non-Thermal Atmospheric-Pressure Spark Discharge at Room Temperature and Its Mechanism

Yoshihiro Sakamoto, Takayoshi Tsutsumi, Hiromasa Tanaka, Kenji Ishikawa, Hiroshi Hashizume, Masaru Hori

Coatings   Vol. 14 ( 10 )   2024.10

In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching

Takayoshi Tsutsumi, Atsuki Asano, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Journal of Vacuum Science & Technology A   Vol. 42 ( 3 )   2024.5

O2 and Ar plasma processing over SiO2/Si stack: Effects of processing gas on interface defect generation and recovery

S. Nunomura, T. Tsutsumi, I. Sakata, M. Hori

journal of Applied Physics   Vol. 135 ( 5 ) page： 053301   2024.2

Topographically-selective atomic layer etching of SiO₂ using radical fluorination of the surface followed by Ar ion bombardment

Tsutsumi Takayoshi

Japanese Journal of Applied Physics   Vol. 62 ( 12 )   2023.12

Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF6

Tsutsumi Takayoshi

Applied Surface Science   Vol. 638   2023.11

MEMS nozzle for dry-capturing lily pollens in array and fixing on culture media for plasma bio-applications

Tsutsumi Takayoshi

Japanese Journal of Applied Physics   Vol. 62 ( SN )   2023.11

Deposition of carbon-based materials directly on copper foil and nickel foam as 2D-and 3D-networked metal substrates by in-liquid plasma

Tsutsumi Takayoshi

Plasma Processes and Polymers   Vol. 20 ( 11 )   2023.11

Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets

Tsutsumi Takayoshi

Japanese Journal of Applied Physics   Vol. 62 ( SL )   2023.9

Plasma processing and annealing for defect management at SiO2/Si interface

Shota Nunomura, Takayoshi Tsutsumi, Isao Sakata, Masaru Hori

Journal of Vacuum Science & Technology B   Vol. 41 ( 5 )   2023.9

Manipulation of etch selectivity of silicon nitride over silicon dioxide to a-carbon by controlling substrate temperature with a CF4/H2 plasma

Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Vacuum   Vol. 210   2023.4

Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent

Airah P. Osonio, Takayoshi Tsutsumi, Yoshinari Oda, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, Masaru Hori

Journal of Vacuum Science & Technology A   Vol. 40 ( 6 )   2022.12

Indoor Floor Heel Mark Removal Using Spark Discharges and Pressurized Airflow

Yoshihiro Sakamoto, Takayoshi Tsutsumi, Hiromasa Tanaka, Kenji Ishikawa, Hiroshi Hashizume, Masaru Hori

COATINGS   Vol. 12 ( 12 )   2022.12

Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis

Tsutsumi Takayoshi

Vacuum   Vol. 205   2022.11

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O₂/C₄F₈ plasma etching process

Tsutsumi Takayoshi

Physical Chemistry Chemical Physics   Vol. 24 ( 22 ) page： 13883 - 13896   2022.6

Ion-induced interface defects in a-Si:H/c-Si heterojunction: possible roles and kinetics of hot mobile hydrogens

Tsutsumi Takayoshi

Japanese Journal of Applied Physics   Vol. 61 ( 5 )   2022.5

Low-temperature reduction of SnO2 by floating wire-assisted medium-pressure H-2/Ar plasma

Thi-Thuy-Nga Nguyen, Sasaki Minoru, Hsiao Shih-Nan, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

PLASMA PROCESSES AND POLYMERS     2022.2

Nitrogen Atom Density Measurements in NAGDIS-T Using Vacuum Ultraviolet Absorption Spectroscopy

Ryosuke Nishio, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori, Noriyasu Ohno

Plasma and Fusion Research   Vol. 17   page： 1201004 - 1   2022.1

Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems

Kaneko Toshiro, Kato Hiromitsu, Yamada Hideaki, Yamamoto Muneaki, Yoshida Tomoko, Attri Pankaj, Koga Kazunori, Murakami Tomoyuki, Kuchitsu Kazuyuki, Ando Sugihiro, Nishikawa Yasuhiro, Tomita Kentaro, Ono Ryo, Ito Tsuyohito, Ito Atsushi M., Eriguchi Koji, Nozaki Tomohiro, Tsutsumi Takayoshi, Ishikawa Kenji

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 61 ( SA )   2022.1

On the Etching Mechanism of Highly Hydrogenated SiN Films by CF₄/D₂ Plasma: Comparison with CF₄/H₂

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Tsutsumi Takayoshi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Coatings   Vol. 11 ( 12 )   2021.12

Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure

Vervuurt R. H. J., Mukherjee B., Nakane K., Tsutsumi T., Hori M., Kobayashi N.

LANGMUIR   Vol. 37 ( 43 ) page： 12663 - 12672   2021.11

Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H-2 plasma at different substrate temperatures Reviewed

Hsiao Shih-Nan, Britun Nikolay, Thi-Thuy-Nga Nguyen, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

PLASMA PROCESSES AND POLYMERS     2021.8

Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H-2 plasma Reviewed

Hsiao Shih-Nan, Nakane Kazuya, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

APPLIED SURFACE SCIENCE   Vol. 542   2021.3

Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O-2, and Ar Reviewed

Hsiao Shih-Nan, Ishikawa Kenji, Hayashi Toshio, Ni Jiwei, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

APPLIED SURFACE SCIENCE   Vol. 541   2021.3

Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature Reviewed

Sugiura Hirotsugu, Kondo Hiroki, Higuchi Kimitaka, Arai Shigeo, Hamaji Ryo, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

CARBON   Vol. 170   page： 93 - 99   2020.12

Formation of spherical Sn particles by reducing SnO2 film in floating wire-assisted H-2/Ar plasma at atmospheric pressure Reviewed

Thi-Thuy-Nga Nguyen, Sasaki Minoru, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

SCIENTIFIC REPORTS   Vol. 10 ( 1 )   2020.10

Measurements of nitrogen atom density in a microwave-excited plasma jet produced under moderate pressures Reviewed

Kim Jaeho, Takeda Keigo, Itagaki Hirotomo, Wang Xue-lun, Hirose Shingo, Ogiso Hisato, Shimizu Tetsuji, Kumagai Naoto, Tsutsumi Takayoshi, Kondo Hiroki, Hori Masaru, Sakakita Hajime

IEEJ TRANSACTIONS ON ELECTRICAL AND ELECTRONIC ENGINEERING   Vol. 15 ( 9 ) page： 1281 - 1287   2020.9

Numerical analysis of coaxial dielectric barrier helium discharges: three-stage mode transitions and internal bullet propagation Reviewed

Sato Yosuke, Ishikawa Kenji, Tsutsumi Takayoshi, Hori Masaru

APPLIED PHYSICS EXPRESS   Vol. 13 ( 8 ) page： .   2020.8

Atomic nitrogen density measurements by actinometry method in the toroidal device NAGDIS-T Reviewed

Kajita Shin, Asaoka Koji, Tanaka Hirohiko, Nishio Ryosuke, Tsutsumi Takayoshi, Hori Masaru, Ohno Noriyasu

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 59 ( 8 ) page： .   2020.8

In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals Reviewed

Hasegawa Masaki, Tsutsumi Takayoshi, Tanide Atsushi, Nakamura Shohei, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   Vol. 38 ( 4 )   2020.7

Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity Reviewed

Yosuke Sato, Kenji Ishikawa, Takayoshi Tsutsumi, Akio Ui, Masato Akita, Shotaro Oka, Masaru Hori

Journal of Physics D: Applied Physics     2020.4

Generation and Diagnostics of Ambient Air Glow Discharge in Centimeter-Order Gaps Reviewed

Gamaleev Vladislav, Tsutsumi Takayoshi, Hiramatsu Mined, Ito Masafumi, Hori Masaru

IEEE ACCESS   Vol. 8   page： 72607 - 72619   2020.4

Electron and negative ion dynamics in a pulsed 100 MHz capacitive discharge produced in an O-2 and Ar/O-2/C4F8 gas mixture Reviewed

Sirse N, Tsutsumi T, Sekine M, Hori M, Ellingboe A. R

PLASMA SOURCES SCIENCE & TECHNOLOGY   Vol. 29 ( 3 )   2020.3

Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study Reviewed

Fukunaga Yusuke, Longo Roberto C, Ventzek Peter L. G, Lane Barton, Ranjan Alok, Hwang Gyeong S, Hartmann Greg, Tsutsumi Takayoshi, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Hori Masaru

JOURNAL OF APPLIED PHYSICS   Vol. 127 ( 2 )   2020.1

Etching characteristics of PECVD-prepared SiN films with CF4/D2and CF4/H2plasmas at different temperatures

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings   Vol. 2020-   2020

Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp2 carbon structures Reviewed

Hirotsugu Sugiura, Yasuyuki Ohashi, Kenji Ishikawa, Hiroki Kondo, Toshiaki Kato, Toshiro Kaneko, Keigo Takeda, Takayoshi Tsutsumi, Toshio Hayashi, Makoto Sekine, Masaru Hori

Diamond and Related Materials   Vol. 104   page： 107651   2019.12

In Situ Monitoring of Surface Reactions during Atomic Layer Etching of Silicon Nitride Using Hydrogen Plasma and Fluorine Radicals Reviewed

Nakane Kazuya, Vervuurt Rene H. J., Tsutsumi Takayoshi, Kobayashi Nobuyoshi, Hori Masaru

ACS APPLIED MATERIALS & INTERFACES   Vol. 11 ( 40 ) page： 37263 - 37269   2019.10

Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation Reviewed

Tsutsumi Takayoshi

ACS Applied Bio Materials   Vol. 2 ( 7 ) page： 2698 - 2702   2019.7

Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes? Reviewed

Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, Kenji Ishikawa

Japanese Journal of Applied Physics   Vol. 58   2019.6

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation Reviewed

Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, Kenji Ishikawa

Japanese Journal of Applied Physics   Vol. 58   2019.6

Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development Reviewed

Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, Kenji Ishikawa

Japanese Journal of Applied Physics   Vol. 58   2019.6

Facile synthesis of SnO2-graphene composites employing nonthermal plasma and SnO2 nanoparticles-dispersed ethanol Reviewed

Borude Ranjit R, Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 17 )   2019.4

Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

Imai Shun, Naito Kenichi, Kondo Hiroki, Cho Hyung Jun, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 10 ) page： 105503 - 105503   2019.3

Real-time control of a wafer temperature for uniform plasma process

T. Tsutsumi, Y. Fuknaga, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

2018 International Symposium on Semiconductor Manufacturing     2019.2

Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF6-added plasma etching of quartz glass

Thi-Thuy-Nga Nguyen, Sasaki Minoru, Odaka Hidefumi, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

JOURNAL OF APPLIED PHYSICS   Vol. 125 ( 6 ) page： 063304 - 063304   2019.2

Liquid dynamics in response to an impinging low-temperature plasma jet

Tsutsumi Takayoshi

Journal of Physics D: Applied Physics   Vol. 52 ( 7 )   2019.2

Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition Reviewed

Hirotsugu Sugiura, Lingyun Jia, Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics   Vol. 58 ( 3 ) page： 030912   2019.2

Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries Reviewed

Ranjit R. Borude, Hirotsugu Sugiura, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Nobuyuki Ikarashi, Masaru Hori

ACS Appplied Nano Materials   Vol. 2 ( 2 ) page： 649-654   2019.2

Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds

Tsutsumi Takayoshi

Applied Physics Express   Vol. 12 ( 2 )   2019.2

Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system

Tsutsumi Takayoshi

Japanese Journal of Applied Physics   Vol. 58 ( 2 )   2019.2

Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma Reviewed

Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Han Jeon Geon, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( SA )   2019.2

Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

H. Sugiura, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Hori

C   Vol. 5 ( 1 ) page： 8   2019.1

Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition Reviewed

Masakazu Tomatsu , Mineo Hiramatsu, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

C   Vol. 5 ( 1 ) page： 7   2019.1

Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas Reviewed

Yan Zhang, Kenji Ishikawa, Miran Mozetič, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

Plasma Processes and Polymers     2019.1

Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H-2 plasma-enhanced chemical vapor deposition

Imai Shun, Kondo Hiroki, Hyungjun Cho, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

APPLIED PHYSICS EXPRESS   Vol. 12 ( 1 )   2019.1

Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching Reviewed

Zhang Yan, Imamura Masato, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 10 )   2018.10

Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma Reviewed

Zecheng Liu, Kenji Ishikawa, Masato Imamura, Takayoshi Tsutsumi, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics   Vol. 57 ( 6 )   2018.6

Effects of gas residence time of CH4/H2 on sp2 fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition Reviewed

Hirotsugu Sugiura, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics   Vol. 57 ( 6 )   2018.6

Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons Reviewed

Atsushi Ando, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics   Vol. 57 ( 2 )   2018.2

Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol Reviewed

Tomoki Amano, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Keigo Takeda, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Applied Physics Express   Vol. 11 ( 1 )   2018.1

Real-time control of a wafer temperature for uniform plasma process

Tsutsumi T., Fuknaga Y., Ishikawa K., Kondo H., Sekine M., Hori M.

2018 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     page： .   2018

Measurement of F-, O- and CF3- densities in 60 and 100 MHz asymmetric capacitively coupled plasma discharge produced in an Ar/O2/C4F8 gas mixture Reviewed

N. Sirse, T. Tsutsumi, M. Sekine, M. Hori, A. R. Ellingboe

Journal of Physics D: Applied Physics   Vol. 50 ( 33 ) page： 335205   2017.7

Temperature dependence of protection layer formation on organic trench sidewall in H2/N2 plasma etching with control of substrate temperature Reviewed

Y. Fukunaga, T. Tsutsumi, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

Japanese Journal of Applied Physics   Vol. 56 ( 7 ) page： 076202   2017.6

Investigation of the radially resolved oxygen dissociation degree and local mean electron energy in oxygen plasmas in contact with different surface materials Reviewed

T. Tsutsumi, A. Greb, A. R. Gibson, M. Hori, D. O'Connell, T. Gans

Journal of Applied Physics   Vol. 121 ( 14 ) page： 143301   2017.4

Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas Reviewed

T. Ueyama, Y. Fukunaga, T. Tsutsumi, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Iwata, Y. Ohya, H. Sugai, M. Hori

Japanese Journal of Applied Physics   Vol. 56 ( 6S2 ) page： 06HC03   2017.3

Absolute density of precursor SiH₃ radicals and H atoms in H2-diluted SiH₄ gas plasma for deposition of microcrystalline silicon films Reviewed

Y. Abe, K. Ishikawa, K. Takeda, T. Tsutsumi, A. Fukushima, H. Kondo, M. Sekine, M. Hori

Applied Physics Letters   Vol. 110 ( 4 ) page： 043902   2017.1

Advanced Plasma Etching Processing: Atomic Layer Etching for Nanoscale Devices Reviewed

T. Tsutsumi, M. Zaitsu, A. Kobayashi, N. Kobayashi, M. Hori

PLASMA NANO SCIENCE AND TECHNOLOGY   Vol. 77 ( 3 ) page： 25 - 28   2017

Atomic layer etching of SiO₂ by alternating an O₂ plasma with fluorocarbon film deposition Reviewed

T. Tsutsumi, H. Kondo, M. Hori, M. Zaitsu, A. Kobayashi, T. Nozawa, N. Kobayashi

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films   Vol. 35 ( 1 ) page： 01A103   2016.11

The role of plasma chemistry on functional silicon nitride film properties deposited at low-temperature by mixing two frequency powers using PECVD Reviewed

B. B. Sahu, Y. Y. Yin, T. Tsutsumi, M. Hori, Jeon G. Han

Physical Chemistry Chemical Physics   Vol. 18 ( 18 ) page： 13033   2016.4

Control of Internal Plasma Parameters Toward Atomic Level Processing Reviewed

M. Sekine, T. Tsutsumi, Y. Fukunaga, K. Takeda, H. Kondo, K. Ishikawa, M. Hori

ECS Transactions   Vol. 75 ( 6 ) page： 21   2016

Real-time temperature-monitoring of Si substrate during plasma processing and its heat-flux analysis Reviewed

T. Tsutsumi, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori

Japanese Journal of Applied Physics   Vol. 55 ( 1S ) page： 01AB04   2015.11

Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching Reviewed

T. Tsutsumi, Y. Fukunaga, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori

IEEE Transactions on Semiconductor Manufacturing   Vol. 28 ( 4 ) page： 515   2015.8

Wavelength Dependence for Silicon-Wafer Temperature Measurement by Autocorrelation-type Frequency-Domain Low-Coherence Interferometry Reviewed

T. Tsutsumi, T. Ohta, K Takeda, M. Ito, M. Hori

Applied Optics   Vol. 54 ( 23 ) page： 7088   2015.8

Robust characteristics of semiconductor-substrate temperature-measurement method using auto-correlation type frequency-domain low-coherence interferometry Reviewed

T. Tsutsumi, T. Ohta, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori, M. Ito

Japanese Journal of Applied Physics   Vol. 54 ( 1S ) page： 01AB03   2014.11

Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry Reviewed

T. Tsutsumi, T. Ohta, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori, M. Ito

Applied Physics Letters   Vol. 103 ( 18 ) page： 182102   2013.10

窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス

堤 隆嘉, 石川 健治, 近藤 博基, 関根 誠, 堀 勝

プラズマ・核融合学会誌   Vol. 97 ( 9 ) page： 517 - 521   2021.9

大気圧プラズマ処理による異種材料接合

近藤博基, 堤隆嘉, 石川健治, 関根 誠, 堀 勝

化学工学（公益社団法人 化学工学会）   Vol. 82 ( 9 ) page： 487-490   2018.9

高電位試験時における白金微粒子担持カーボンナノウォール電極の分極特性の変化

今井駿, 近藤博基, 石川健治, 堤隆嘉, 平松美根男, 関根誠, 堀勝

応用物理学会秋季学術講演会講演予稿集(CD-ROM)   Vol. 79th   2018

高速かつ高精度非接触, リアルタイム基板温度計測システムの開発～超微細加工プラズマプロセスのイノベーションに向けて～

堤　隆嘉

プラズマエレクトロニクス分科会会報   Vol. 58   page： 19   2013.6

低温下での塩素ラジカル照射による窒化チタン原子層エッチングにおけるin-situ表面反応解析

In-situ analysis of chlorination of TiN surfaces by chlorine radical irradiations International conference

Shunya Hirai, Kazunori Shinoda, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenichi Inoue, and Kenji Ishikawa

ISPlasma2025/IC-PLANTS2025 

Evaluation of Lateral Selective Etching with CF4/H2 Plasma of Si0.7Ge0.3/Si/Si0.7Ge0.3 Layers International conference

Kotaro Ozaki, Noriharu Takada, Yusuke Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Yuji Yamamoto, Wei-Chen Wen, Katsunori Makihara

ISPlasma2025/IC-PLANTS2025 

Damage evaluation for electron-beam-assisted modification of GaN surface International conference

Takayoshi Tsutsumi, Yusuke Izumi, Makoto Sekine, Masaru Hori, and Kenji Ishikawa

ISPlasma2025/IC-PLANTS2025 

Surface reactions by deep ultraviolet laser irradiation for GaN etching International conference

Ryoto Takahashi, Takayoshi Tsutsumi, Kenichi Inoue, Ryusei Sakai, Makoto Sekine, Masaru Hori and Kenji Ishikawa

ISPlasma2025/IC-PLANTS2025 

Effect of Sticking Probability on Radical Transports in High-Aspect-Ratio Holes International conference

Takumi Kurushima, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori, and Kenji Ishikawa

ISPlasma2025/IC-PLANTS2025 

UVレーザー光照射エッチングプロセスにおけるGaN表⾯の脱離挙動

Transport of Reactive Species in Pulsed Plasma for High-Aspect-Ratio Hole Etching Invited

T. Tsutsumi, M. Sekine, M. Hori and K. Ishikawa

Undestanding Surface Reaction in PECVD Process by Combining In-situ Monitoring and Machine Learning Invited International conference

Takayoshi Tsutsumi, Y. Ando, M.Sekine, M.Hori, K.Ishikwa

International Symposium on Semiconductor Manufacturing (ISSM) 2024 

In-Situ Observation of Reaction Layer in Surface for Damage-Free Atomic Layer Etching Invited International conference

Tsutsumi Takayoshi, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa and Masaru Hori

2024 MRS FALL MEETING & EXHIBIT 

四重極型質量分析を用いた材料表面の中性粒子の付着確率計測

機械学習を用いたアモルファスカーボン薄膜の堆積機構におけるプロセスパラメータの寄与度解析

Plasma-enhanced atomic layer deposition of carbon films Invited International conference

Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, Kenji Ishikawa, and Masaru Hori

DPS2024 

Etching of GaN using Ar/F2 plasma at high temperatures Invited International conference

J. He, S. Nakamura, A. Tanide, T. N. Tran, T. Tsutsumi, M. Sekine, M. Hori, and K. Ishikawa

DPS2024 

UV laser ionization desorption of surfaces for GaN etching Invited International conference

R. Takahashi, R. Sakai, T. Tsutsumi, M. Sekine, M. Hori, and K. Ishikawa

DPS2024 

Plasma-assisted Atomic Layer Etching (PE-ALE) of SiO2 via surface fluorination and argon bombardment International conference

A.P. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, and M. Hori

AAPPS_DPP 

Advanced Semiconductor Plasma Processes Pioneered by Understanding and Controlling Plasma-Surface Interactions Invited International conference

Masaru Hari, M. Sekine, T. Tsutsumi, K. Ishikawa

AVS70 

In-situ measurements of plasma-induced defects and radical adsorption in ALE International conference

T. Tsutsumi, M. Sekine, K. Ishikawa, M. Hori

AAPPS_DPP 

Behavior of Radical Adsorption on Plasma Induced Defect for Atomic Layer Etching Invited International conference

OSONIO Airah Peraro, TSUTSUMI Takayoshi, ISHIKAWA Kenji and MASARU Hori

ICMSEP2024 

Effect of bias voltage on etching reaction of SiO2 in cryogenic process with HF contained plasmas International conference

Yusuke Imai, Shih-Nan Hsiao, Makoto Sekine, Kenji Ishikawa, Takayoshi Tsutsumi, Yuki Iijima and Masaru Hori

VASSCAA-12&TVS-2024 

電子線支援原子層エッチングにおけるGaN表面フッ素化反応

エピタキシャル成長した Si0.7Ge0.3 および Si 薄膜におけるH2 希釈 CF4 ガスによるドライエッチングの選択性評価

CF4/H2プラズマによるSiO2低温エッチングのRFバイアス依存性

高アスペクト比ホール内におけるラジカルの付着確率の輸送への影響

紫外光照射時のGaN表面エッチング反応機構

プラズマ誘起欠陥の発生と修復～アニールにおける雰囲気ガスの効果～

ALD代替に向けたダメージレスALEプロセス Invited

Plasma-based pseudo-wet etching for SiN using hydrogencontained fluorocarbon gases at cryogenic temperatures International conference

Shih-Nan Hsiaoa, Yusuke Imaia, Makoto Sekinea, Takayoshi Tsutsumia, Kenji Ishikawaa, Yuki Iijimab, Ryutaro Sudab, Masahiko Yokoib, Maju Tomurab, Yoshihide Kiharab and Masaru Hori

2nd International Workshop on Plasma Cryo Etching Processes 

Chemical Reaction Analysis for Plasma-Enhanced Atomic Layer Process Invited International conference

Takayoshi Tsutsumi

The 1ST Global Forum and International Workshop in Hybrid mode on Industrial Plasma Processes and Diagnostics 2024 (IPPD 2024) 

プラズマ誘起欠陥の発生と修復～RIE-SiO2に伴うSiO2 / Si界面の欠陥評価～

布村 正太, 堤 隆嘉, 深沢 正永, 堀 勝

第71回応用物理学会春期学術講演会  2024.3.24 

パルスプラズマにおける負イオンエネルギー分布の時間 分解測定

都地 一輝, 堤 隆嘉, 蕭 世男, 関根 誠, 堀 勝, 石川 健治

第71回応用物理学会春期学術講演会  2024.3.24 

カーボンハードマスクの膜特性に対する基板バイアス寄 与度の局所的顕在化

安藤 悠介, 近藤 博基, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

第71回応用物理学会春期学術講演会  2024.3.24 

カーボンハードマスクの膜特性に対する基板バイアス寄 与度の局所的顕在化

安藤 悠介, 近藤 博基, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

第71回応用物理学会春期学術講演会  2024.3.24 

プラズマ誘起欠陥の発生と修復～RIE-SiO2に伴うSiO2 / Si界面の欠陥評価～

布村 正太, 堤 隆嘉, 深沢 正永, 堀 勝

第71回応用物理学会春期学術講演会  2024.3.24 

パルスプラズマにおける負イオンエネルギー分布の時間 分解測定

都地 一輝, 堤 隆嘉, 蕭 世男, 関根 誠, 堀 勝, 石川 健治

第71回応用物理学会春期学術講演会  2024.3.24 

Prediction Model for RF Bias Effect on Etch Resistance of Amorphous Carbon in Plasma Enhanced Chemical Vapor Deposition International conference

Y. Ando, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13  2024.3.4 

In-situ analysis of chemisorption reactions on SiO2 surface using carbon precursor containing halogen International coauthorship International conference

L. Hu, T. Tsutsumi, N. Kobayashi, D. C. P. Raj, R. Borude, K. Ishikawa, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13  2024.3.5 

In-situ analysis of chemisorption reactions on SiO2 surface using carbon precursor containing halogen International coauthorship International conference

L. Hu, T. Tsutsumi, N. Kobayashi, D. C. P. Raj, R. Borude, K. Ishikawa, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13  2024.3.5 

Prediction Model for RF Bias Effect on Etch Resistance of Amorphous Carbon in Plasma Enhanced Chemical Vapor Deposition International conference

Y. Ando, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13  2024.3.4 

In-situ observation of plasma-induced damage and radical adsorption for Atomic Layer Etching Invited

SPP-41  2024.1.25 

In-situ observation of plasma-induced damage and radical adsorption for Atomic Layer Etching Invited

SPP-41  2024.1.25 

Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma International conference

T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori

The 44th International Symposium on Dry Process (DPS2023)   2023.11.22 

Defect characterization at SiO2/Si interface throughout plasma processing and annealing International conference

S.Nunomura, T.Tsutsumi, I. Sakata and M Hori

The 44th International Symposium on Dry Process (DPS2023)   2023.11.22 

A pseudo-wet cryogenic plasma etching of SiO2 investigated with in-situ surface monitoring International conference

S-N Hsiao, M. Sekine, K. Ishikawa, T.Tsutsumi, and M. Hori Y Iijima, R. Suda, Y. Kihara

The 44th International Symposium on Dry Process (DPS2023)   2023.11.22 

Electron-Beam-Assisted Self-limiting fluorination of GaN surface using XeF2 for Atomic Layer Etching International conference

Y. Izumi, T. Tsutsumi, H Kondo, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023)   2023.11.21 

Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching International conference

K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023)   2023.11.21 

Etch selectivities of SiO2 and SiN against a-C films using CF4/H2 plasma at low temperature International conference

Y. Imai, S-N. Hsiao, M. Sekine, K. Ishikawa, T. Tsutsumi, M. Iwata, M. Tomura, Y. Iijima, K. Matsushima, M. Hori

The 44th International Symposium on Dry Process (DPS2023)   2023.11.21 

A pseudo-wet cryogenic plasma etching of SiO2 investigated with in-situ surface monitoring International conference

S-N Hsiao, M. Sekine, K. Ishikawa, T.Tsutsumi, M. Hori Y Iijima, R. Suda, Y. Kihara

The 44th International Symposium on Dry Process (DPS2023)  2023.11.22 

Etch selectivities of SiO2 and SiN against a-C films using CF4/H2 plasma at low temperature International conference

Y. Imai, S-N. Hsiao, M. Sekine, K. Ishikawa, T. Tsutsumi, M. Iwata, M. Tomura, Y. Iijima, K. Matsushima, M. Hori

The 44th International Symposium on Dry Process (DPS2023)  2023.11.21 

Electron-Beam-Assisted Self-limiting fluorination of GaN surface using XeF2 for Atomic Layer Etching International conference

Y. Izumi, T. Tsutsumi, H Kondo, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023)  2023.11.21 

Defect characterization at SiO2/Si interface throughout plasma processing and annealing International conference

S.Nunomura, T.Tsutsumi, I. Sakata, M Hori

The 44th International Symposium on Dry Process (DPS2023)  2023.11.22 

Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma International conference

T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori

The 44th International Symposium on Dry Process (DPS2023)  2023.11.22 

Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching International conference

K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023)  2023.11.21 

ドライエッチングと原子層エッチングの基礎と応用 Invited

堤 隆嘉

第34回 プラズマエレクトロニクス講習会  2023.11.17 

ドライエッチングと原子層エッチングの基礎と応用 Invited

堤 隆嘉

第34回 プラズマエレクトロニクス講習会  2023.11.17 

Etching Selectivities of SiO2 and SiN Against a-C Films Using CF4/H2 with a Pseudo-Wet Plasma Etching Mechanism International conference

Yusuke Imai, S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tamura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori,

AVS 69th International Symposium and Exhibition (AVS 69)  2023.11.6 

Etching Selectivities of SiO2 and SiN Against a-C Films Using CF4/H2 with a Pseudo-Wet Plasma Etching Mechanism International conference

Yusuke Imai, S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tamura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori

AVS 69th International Symposium and Exhibition (AVS 69)  2023.11.6 

Transient behavior of cycle process in Ar plasma with alternately injected C4F8 and SF6 International conference

T. Yoshie, K. Ishikawa, TTN Nguyen, S. Hsiao, T. Tsutsumi, M. Sekine, M. Hori

13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023)  2023.11.8 

Transient behavior of cycle process in Ar plasma with alternately injected C4F8 and SF6 International conference

T. Yoshie, K. Ishikawa, TTN Nguyen, S. Hsiao, T. Tsutsumi, M. Sekine, M. Hori

13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023)  2023.11.8 

Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis International conference

S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tomura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori

The 76th Annual Gaseous Electronics Conference (GEC76)  2023.10.11 

Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis International conference

S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tomura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori

The 76th Annual Gaseous Electronics Conference (GEC76)  2023.10.11 

Plasma-Enhanced Deposition Mechanism of Hydrogenated Amorphous Carbon Analyzed ByCombining Reactive Species Measurement and Machine Learning Invited International conference

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, H. Kousaka, M. Hori

244th ECS Meeting  2023.10.11 

Selective removal of graphene by irradiation of remote oxygen plasma International conference

L. Hu, K. Ishikawa, T. Tsutsumi, TTN Nguyen, S. Hsiao, H. Kondo, M. Sekine, M. Hori

Global Plasma Forum in Aomori  2023.10.16 

Plasma-Enhanced Deposition Mechanism of Hydrogenated Amorphous Carbon Analyzed ByCombining Reactive Species Measurement and Machine Learning Invited International conference

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, H. Kousaka, M. Hori

244th ECS Meeting  2023.10.11 

Selective removal of graphene by irradiation of remote oxygen plasma International conference

L. Hu, K. Ishikawa, T. Tsutsumi, TTN Nguyen, S. Hsiao, H. Kondo, M. Sekine, M. Hori

Global Plasma Forum in Aomori  2023.10.16 

カーボンハードマスクのプラズマエッチング耐性に対する，成膜過程におけるイオン照射効果

安藤 悠介、近藤 博基、堤 隆嘉、石川 健治、関根 誠、堀 勝

第84回応用物理学会秋季学術講演会  2023.9.21 

CF4/H2プラズマによるSiO2,SiN,a-C膜の低温エッチング

今井 祐輔、蕭 世男、関根 誠、飯島 祐樹、須田 隆太郎、大矢 欣伸、木原 嘉英、堤 隆嘉、石川 健治、堀 勝

第84回応用物理学会秋季学術講演会  2023.9.22 

低温における絶縁膜の擬ウェットプラズマエッチング

蕭 世男、関根 誠、飯島 祐樹、須田 隆太郎、大矢 欣伸、木原 嘉英、堤 隆嘉、石川 健治、堀 勝

第84回応用物理学会秋季学術講演会  2023.9.22 

容量結合型パルスプラズマにおける負イオンの電極材料依存性

都地 一輝、堤 隆嘉、蕭 世男、関根 誠、石川 健治、堀 勝

第84回応用物理学会秋季学術講演会  2023.9.22 

プラズマ誘起欠陥の発生と修復 ～酸素プラズマがSiO2/Si界面に及ぼす影響～

布村 正太、堤 隆嘉、堀 勝

第84回応用物理学会秋季学術講演会  2023.9.21 

原子層エッチングにおけるプラズマ誘起欠陥へのラジカル吸着挙動

オソニオ アイラ ペラロ、堤 隆嘉、石川 健治、堀 勝

第84回応用物理学会秋季学術講演会  2023.9.21 

CF4/H2プラズマによるSiO2,SiN,a-C膜の低温エッチング

今井 祐輔, 蕭 世男, 関根 誠, 飯島 祐樹, 須田 隆太郎, 大矢 欣伸, 木原 嘉英, 堤 隆嘉, 石川 健治, 堀 勝

第84回応用物理学会秋季学術講演会  2023.9.22 

カーボンハードマスクのプラズマエッチング耐性に対する，成膜過程におけるイオン照射効果

安藤 悠介, 近藤 博基, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

第84回応用物理学会秋季学術講演会  2023.9.21 

容量結合型パルスプラズマにおける負イオンの電極材料依存性

都地 一輝, 堤 隆嘉, 蕭 世男, 関根 誠, 石川 健治, 堀 勝

第84回応用物理学会秋季学術講演会  2023.9.22 

原子層エッチングにおけるプラズマ誘起欠陥へのラジカル吸着挙動

オソニオ アイラ ペラロ, 堤 隆嘉, 石川 健治, 堀, 勝

第84回応用物理学会秋季学術講演会  2023.9.21 

低温における絶縁膜の擬ウェットプラズマエッチング

蕭 世男, 関根 誠, 飯島 祐樹, 須田 隆太郎, 大矢 欣伸, 木原 嘉英, 堤 隆嘉, 石川 健治, 堀 勝

第84回応用物理学会秋季学術講演会  2023.9.22 

プラズマ誘起欠陥の発生と修復 ～酸素プラズマがSiO2/Si界面に及ぼす影響～

布村 正太, 堤 隆嘉, 堀 勝

第84回応用物理学会秋季学術講演会  2023.9.21 

In-liquid plasma synthesis, morphological control, and functionalization of nanographene materials International conference

H. Kondo, T. Tsutsumi, M. Hiramatsu, M. Hori

THERMEC'2023  2023.7.3 

In-liquid plasma synthesis, morphological control, and functionalization of nanographene materials International conference

H. Kondo, T. Tsutsumi, M. Hiramatsu, M. Hori

THERMEC'2023  2023.7.3 

Plasma Synthesis of Graphene-Based Materials: Functionalization and Applications Invited International coauthorship International conference

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, and M.Hori

THERMEC'2023  2023.7.3 

Plasma Synthesis of Graphene-Based Materials: Functionalization and Applications Invited International coauthorship International conference

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, M.Hori

THERMEC'2023  2023.7.3 

Recent Progress in the Synthesis of Functional and Three-Dimensional Carbon Nano-Composites By Gas-Liquid Interface Plasma International conference

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, and M.Hori

243rd ECS Meeting 

Recent Progress in the Synthesis of Functional and Three-Dimensional Carbon Nano-Composites By Gas-Liquid Interface Plasma International conference

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, M.Hori

243rd ECS Meeting 

A comparative study on the CF4/H2 and HF/H2 plasmas for etching of highly hydrogenated SiN films International conference

Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

25th International Symposium on Plasma Chemistry (ISPC25) 

A comparative study on the CF4/H2 and HF/H2 plasmas for etching of highly hydrogenated SiN films International conference

Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

25th International Symposium on Plasma Chemistry (ISPC25) 

Global and local contribution analysis of process parameters in Plasma enhanced chemical vapor deposition of amorphous carbon har International conference

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

The 4th International Conference on Data Driven Plasma Sciences ( ICDDPS-4 ) 

Global and local contribution analysis of process parameters in Plasma enhanced chemical vapor deposition of amorphous carbon har International conference

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

The 4th International Conference on Data Driven Plasma Sciences ( ICDDPS-4 ) 

熱酸化膜/シリコン界面でのプラズマ誘起欠陥の発生と修復

布村 正太、坂田 功、堤 隆嘉、堀 勝

第70回応用物理学会春季学術講演会 

成膜パラメータの寄与度解析に基づく、 水素化アモルファスカーボン薄膜のエッチ耐性の向上

安藤 悠介、近藤 博基、石川 健治、堤 隆嘉、関根 誠、堀 勝

第70回応用物理学会春季学術講演会 

成膜パラメータの寄与度解析に基づく、 水素化アモルファスカーボン薄膜のエッチ耐性の向上

安藤 悠介, 近藤 博基, 石川 健治, 堤 隆嘉, 関根 誠, 堀 勝

第70回応用物理学会春季学術講演会 

熱酸化膜/シリコン界面でのプラズマ誘起欠陥の発生と修復

布村 正太, 坂田 功, 堤 隆嘉, 堀 勝

第70回応用物理学会春季学術講演会 

Characterization of Plasmas and Polymerized Hydrofluorocarbon Films in Capacitively Coupled CF4/H2 Plasmas International conference

Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Self-Limited Fluorination of Electron Beam-Irradiated GaN Surface International conference

Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Contribution Analysis of Process Parameters in Plasma-Enhanced Chemical Vapor Deposition of Amorphous Carbon International conference

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Positive and Negative Ion Behaviors in DC-Imposed Ar/SF6 Pulsed Plasma International conference

Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, Shih-Nan Hsiao, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Etching Behavior of Lamellar Poly(styrene-b-2-vinylpyridine) Block Copolymer under N2/H2 Plasma Process International conference

Ma. Shanlene Dela Vega, Ayane Kitahara, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Atsushi Takano, Yushu Matsushita and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Study on Plasma Process Using Adsorbed C7F14 as an Etchant International conference

Kohei Masuda, Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao, Takayoshi Tsutsumi, Hiroki Kondo and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Morphological Effect of Carbon Nanowalls on Exosome Capture International conference

Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

MEMS Nozzle for Capturing Lily Pollen in Array and Fixing on Culture Media International conference

Sachiko Sugiyama, Gang Han, Takayoshi Tsutsumi, Hiromasa Tanaka and Minoru Sasaki

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Characterization of Plasmas and Polymerized Hydrofluorocarbon Films in Capacitively Coupled CF4/H2 Plasmas International conference

Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Etching Behavior of Lamellar Poly(styrene-b-2-vinylpyridine) Block Copolymer under N2/H2 Plasma Process International conference

Ma. Shanlene, Dela Vega, Ayane Kitahara, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Atsushi Takano, Yushu Matsushita, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Contribution Analysis of Process Parameters in Plasma-Enhanced Chemical Vapor Deposition of Amorphous Carbon International conference

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

MEMS Nozzle for Capturing Lily Pollen in Array and Fixing on Culture Media International conference

Sachiko Sugiyama, Gang Han, Takayoshi Tsutsumi, Hiromasa Tanaka, Minoru Sasaki

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Self-Limited Fluorination of Electron Beam-Irradiated GaN Surface International conference

Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Positive and Negative Ion Behaviors in DC-Imposed Ar/SF6 Pulsed Plasma International conference

Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, Shih-Nan Hsiao, Makoto Sekine, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Morphological Effect of Carbon Nanowalls on Exosome Capture International conference

Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Study on Plasma Process Using Adsorbed C7F14 as an Etchant International conference

Kohei Masuda, Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas International conference

Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2022 

Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas International conference

Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2022 

Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing International conference

Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI

Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma International conference

Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI

Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing International conference

Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI

Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma International conference

Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI

Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma International conference

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, and M. Hori

The 43rd International Symposium on Dry Process (DPS2022) 

Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma International conference

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori

The 43rd International Symposium on Dry Process (DPS2022) 

Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma Invited International conference

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori

242nd ECS Meeting 

Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma Invited International conference

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

242nd ECS Meeting 

Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature International conference

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)  

Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias International conference

Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)  

Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma International conference

Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)  

Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets International conference

Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)  

Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature International conference

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022) 

Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets International conference

Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022) 

Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias International conference

Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022) 

Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma International conference

Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022) 

水素化アモルファスカーボン薄膜の合成機構における活 性種の寄与度の機械学習を用いた解析

近藤 博基, 黒川 純平, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝

2022年　第83回　応用物理学会　秋季学術講演 

イオン照射角制御によるカーボンナノウォールの配向成長

射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

2022年　第83回　応用物理学会　秋季学術講演 

イオン照射角制御によるカーボンナノウォールの配向成長

射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

2022年 第83回 応用物理学会 秋季学術講演 

水素化アモルファスカーボン薄膜の合成機構における活 性種の寄与度の機械学習を用いた解析

近藤 博基, 黒川 純平, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝

2022年 第83回 応用物理学会 秋季学術講演 

Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition International conference

Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 

In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas International conference

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Naga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 

In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas International conference

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Naga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 

Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition International conference

Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 

Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process Invited International conference

Ma. shanlene Dela Cruz DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022) 

Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials Invited International conference

Hiroki KONDO, Takayoshi TSUTSUMI, Kenji ISHIKAWA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022) 

Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials Invited International conference

Hiroki KONDO, Takayoshi TSUTSUMI, Kenji ISHIKAWA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022) 

Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process Invited International conference

Ma. shanlene, Dela Cruz, DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022) 

Study of etching process using CHF3 gas condensed layer in cryogenic region International conference

Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

1st International Workshop on Plasma Cryo Etching Processes（PlaCEP2022） 

Study of etching process using CHF3 gas condensed layer in cryogenic region International conference

Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

1st International Workshop on Plasma Cryo Etching Processes（PlaCEP2022） 

Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Pasivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma International conference

Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

MRS Spring Meetings & Exhibits 

Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Pasivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma International conference

Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

MRS Spring Meetings & Exhibits 

C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響

吉江 泰斗、堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝

第69回応用物理学会春季学術講演会 

窒化ガリウムの基板昇温時サイクルエッチング特性

南 吏玖、中村 昭平、谷出 敦、石川 健治、堤 隆嘉、近藤 博基、関根 誠、堀 勝

第69回応用物理学会春季学術講演会 

プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果

射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第69回応用物理学会春季学術講演会 

高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの 表面電位制御

橋本 拓海、近藤 博基、田中 宏昌、石川 健治、堤 隆嘉、関根 誠、安井 隆雄、馬場 嘉信、平松 美根男、堀 勝

第69回応用物理学会春季学術講演会 

ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析

近藤 博基、尾崎 敦士、堤 隆嘉、関根 誠、石川 健治、堀 勝、平松 美根男

第69回応用物理学会春季学術講演会 

C3H6 / H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係

黒川 純平、光成 正、近藤 博基、堤 隆嘉、関根 誠、石川 健治、堀 勝

第69回応用物理学会春季学術講演会 

C3H6 / H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係

黒川 純平, 光成 正, 近藤 博基, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝

第69回応用物理学会春季学術講演会 

C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響

吉江 泰斗, 堤 隆嘉, 石川 健治, 近藤 博基, 関根 誠, 堀 勝

第69回応用物理学会春季学術講演会 

プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果

射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

第69回応用物理学会春季学術講演会 

窒化ガリウムの基板昇温時サイクルエッチング特性

南 吏玖, 中村 昭平, 谷出 敦, 石川 健治, 堤 隆嘉, 近藤 博基, 関根 誠, 堀 勝

第69回応用物理学会春季学術講演会 

ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析

近藤 博基, 尾崎 敦士, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝, 平松 美根男

第69回応用物理学会春季学術講演会 

高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの 表面電位制御

橋本 拓海, 近藤 博基, 田中 宏昌, 石川 健治, 堤 隆嘉, 関根 誠, 安井 隆雄, 馬場 嘉信, 平松 美根男, 堀 勝

第69回応用物理学会春季学術講演会 

In-Liquid Plasma Coating of Graphite Films on Metal Surface Immersed in Ethanol International conference

Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Magdaleno R. Vasquez Jr., and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Manipulation of etch selectivity of silicon nitride over silicon dioxide by controlling substrate temperature with a CF4/H2 plasma International conference

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Feature profiles in cyclic etch using C4F8 and SF6 gas-modulated plasma International conference

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Correlation analysis between radicals in gas phase and etch resistance of hydrogenated amorphous carbon film International conference

Jumpei Kurokawa, Tadashi Mitsunari, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of Air Introduction between Electrodes on Rapid Removal Process of Polymer Contamination on Floor by Atmospheric Pressure Plasma International conference

Yoshihiro Sakamoto, Takayoshi Tsutsumi, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Simple external filter and tuning for operation in dual radio frequency plasmas using compensated Langmuir probe International conference

B. B. Sahu, M. Sekine, T. Tsutsumi, K. Ishikawa, H. Shogo, H. Tanaka, N. Ohno, and M. Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of Substrate Temperature on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Using C2F6 /H2 Mixture Gas International conference

Takumi Hashimoto, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Spectroscopy of H2/CH4/N2 Plasma for Carbon Nanowalls Growth International conference

Dennis Christy, Takayoshi Tsutsumi, Ngo Van Nong, Osamu Oda, Masaru Hori and Nikolay Britun

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Three-Dimensional Morphological Analysis of Carbon Nanowalls International conference

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar and Mineo Hiramatsu

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of RF Stage-Bias on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition International conference

Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Correlation analysis between radicals in gas phase and etch resistance of hydrogenated amorphous carbon film International conference

Jumpei Kurokawa, Tadashi Mitsunari, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of Substrate Temperature on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Using C2F6 /H2 Mixture Gas International conference

Takumi Hashimoto, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of RF Stage-Bias on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition International conference

Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of Air Introduction between Electrodes on Rapid Removal Process of Polymer Contamination on Floor by Atmospheric Pressure Plasma International conference

Yoshihiro Sakamoto, Takayoshi Tsutsumi, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Feature profiles in cyclic etch using C4F8 and SF6 gas-modulated plasma International conference

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Spectroscopy of H2/CH4/N2 Plasma for Carbon Nanowalls Growth International conference

Dennis Christy, Takayoshi Tsutsumi, Ngo Van Nong, Osamu Oda, Masaru Hori, Nikolay Britun

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Simple external filter and tuning for operation in dual radio frequency plasmas using compensated Langmuir probe International conference

B. B. Sahu, M. Sekine, T. Tsutsumi, K. Ishikawa, H. Shogo, H. Tanaka, N. Ohno, M. Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Manipulation of etch selectivity of silicon nitride over silicon dioxide by controlling substrate temperature with a CF4/H2 plasma International conference

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

In-Liquid Plasma Coating of Graphite Films on Metal Surface Immersed in Ethanol International conference

Ma. Shanlene, D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Magdaleno R, Vasquez Jr, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Three-Dimensional Morphological Analysis of Carbon Nanowalls International conference

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar, Mineo Hiramatsu

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

真空紫外原子吸光分光法による大気圧マイクロ波Ar/O2プラズマのO原子密度計測

岩田悠揮、小笠原知裕、鈴木陽香、堤隆嘉、堀勝、豊田浩孝

C2F6/H2混合ガスを用いてラジカル注入型プラズマ励起化学気相堆積法により成長されたカーボンナノウォールのモフォロジー制御

橋本拓海、近藤博基、石川健治、堤隆嘉、関根誠、平松美根男、堀勝

液中プラズマプロセスを用いたメタノール内金属基板上へのナノグラフェンの成膜

デラヴェガマリアシャンリン、近藤博基、堤隆嘉、グエン ティ・トゥイーンガ、石川健治、関根誠、ヴァスケズマグダレノジュニア、堀勝

カーボンナノウォールの形態と高さが光透過率に及ぼす影響

射場 信太朗、近藤 博基、石川 健治、関根 誠、堤 隆嘉、平松 美根男、堀 勝

C2F6/H2混合ガスを用いてラジカル注入型プラズマ励起化学気相堆積法により成長されたカーボンナノウォールのモフォロジー制御

橋本拓海, 近藤博基, 石川健治, 堤隆嘉, 関根誠, 平松美根男, 堀勝

カーボンナノウォールの形態と高さが光透過率に及ぼす影響

射場 信太朗, 近藤 博基, 石川 健治, 関根 誠, 堤 隆嘉, 平松 美根男, 堀 勝

真空紫外原子吸光分光法による大気圧マイクロ波Ar/O2プラズマのO原子密度計測

岩田悠揮, 小笠原知裕, 鈴木陽香, 堤隆嘉, 堀勝, 豊田浩孝

液中プラズマプロセスを用いたメタノール内金属基板上へのナノグラフェンの成膜

デラヴェガマリアシャンリン, 近藤博基, 堤隆嘉, グエン ティ・トゥイーンガ, 石川健治, 関根誠, ヴァスケズマグダレノジュニア

Optical transmission of carbon nanowalls from ultra-violet region to infra-red region International conference

S. Iba, H. Kondo, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hiramatsu, and M. Hori

Material Research Meeting (MRM2021) 

Three-dimensional structural analysis of carbon nanowalls synthesized by a radical-injection plasma-enhanced chemical vapor deposition system International conference

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar, Mineo Hiramatsu

Material Research Meeting (MRM2021) 

Optical transmission of carbon nanowalls from ultra-violet region to infra-red region International conference

S. Iba, H. Kondo, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hiramatsu, M. Hori

Material Research Meeting (MRM2021) 

Three-dimensional structural analysis of carbon nanowalls synthesized by a radical-injection plasma-enhanced chemical vapor deposition system International conference

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar, Mineo Hiramatsu

Material Research Meeting (MRM2021) 

Spatial Distribution Measurement of Atomic Oxygen from Atmospheric-Pressure Microwave Line Plasma by Atomic Absorption Spectroscopy International conference

Tomohiro Ogasawara, Yuki Iwata, Haruka Suzuki, Takayoshi Tsutsumi, Masaru Hori and Hirotaka Toyoda

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Comparison of CF4/H2 and HF/H2 Plasmas for Etching of PECVD-Prepared SiN Films International conference

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nga, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Behavior of Hydrogen Atom in Atmospheric Pressure Micro-Hollow Cathode Discharge International conference

Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu, Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Behavior of Hydrogen Atom in Atmospheric Pressure Micro-Hollow Cathode Discharge International conference

Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu, Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Comparison of CF4/H2 and HF/H2 Plasmas for Etching of PECVD-Prepared SiN Films International conference

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nga, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Spatial Distribution Measurement of Atomic Oxygen from Atmospheric-Pressure Microwave Line Plasma by Atomic Absorption Spectroscopy International conference

Tomohiro Ogasawara, Yuki Iwata, Haruka Suzuki, Takayoshi Tsutsumi, Masaru Hori, Hirotaka Toyoda

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Random forest model for property control of plasma International conference

J. Kurokawa, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Selective plasma-enhanced atomic layer etching of SiO using a silane coupling agent International conference

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches International conference

T. Yoshie, T. Tsutsumi, K. Ishikawa, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Random forest model for property control of plasma International conference

J. Kurokawa, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Selective plasma-enhanced atomic layer etching of SiO using a silane coupling agent International conference

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches International conference

T. Yoshie, T. Tsutsumi, K. Ishikawa, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Control of Interface Layers for Selective Atomic Layer Etching Invited International conference

Takayoshi Tsutsumi, R. Vervuurt, N. Kobayashi, and Masaru Hori

67th AVS International Symposium and Exhibitio 

Control of Interface Layers for Selective Atomic Layer Etching Invited International conference

Takayoshi Tsutsumi, R. Vervuur, N. Kobayashi, Masaru Hori

67th AVS International Symposium and Exhibitio 

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動2

吉江 泰斗、堤 隆嘉、石川 健治、堀 勝

第82回　応用物理学会秋季学術講演会 

カーボンナノウォールの光透過率に対する壁密度および高さの効果

射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第82回　応用物理学会秋季学術講演会 

窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測

南 吏玖、石川 健治、堤 隆嘉、近藤 博基、関根 誠、小田 修、堀 勝

第82回　応用物理学会秋季学術講演会 

原子層エッチングの反応素過程とその設計、制御

石川 健治、Nguyen Thi-Thuy-Nga、堤 隆嘉、蕭 世男、近藤 博基、関根 誠、堀 勝

第82回　応用物理学会秋季学術講演会 

螺旋状窒素プラズマ中の窒素原子密度計測

西尾 亮佑、梶田 信、大野 哲靖、田中 宏彦、浅岡 晃次、堤 隆嘉、堀 勝

第82回　応用物理学会秋季学術講演会 

C3H6 / H2プラズマを用いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響

黒川 純平、光成 正、堤 隆嘉、近藤 博基、関根 誠、石川 健治、堀 勝

第82回　応用物理学会秋季学術講演会 

プラズマ誘起欠陥の発生と修復 ～モバイル水素の役割と考察～

布村 正太、坂田 功、堤 隆嘉、堀 勝

第82回　応用物理学会秋季学術講演会 

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動2

吉江 泰斗, 堤 隆嘉, 石川 健治, 堀 勝

第82回 応用物理学会秋季学術講演会 

C3H6 / H2プラズマを用いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響

黒川 純平, 光成 正, 堤 隆嘉, 近藤 博基, 関根 誠, 石川 健治, 堀 勝

第82回 応用物理学会秋季学術講演会 

カーボンナノウォールの光透過率に対する壁密度および高さの効果

射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

第82回 応用物理学会秋季学術講演会 

窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測

南 吏玖, 石川 健治, 堤 隆嘉, 近藤 博基, 関根 誠, 小田 修, 堀 勝

第82回 応用物理学会秋季学術講演会 

原子層エッチングの反応素過程とその設計、制御

石川 健治, Nguyen Thi-Thuy-Nga, 堤 隆嘉, 蕭 世男, 近藤 博基, 関根 誠, 堀 勝

第82回 応用物理学会秋季学術講演会 

プラズマ誘起欠陥の発生と修復 ～モバイル水素の役割と考察～

布村 正太, 坂田 功, 堤 隆嘉, 堀 勝

第82回 応用物理学会秋季学術講演会 

螺旋状窒素プラズマ中の窒素原子密度計測

西尾 亮佑, 梶田 信, 大野 哲靖, 田中 宏彦, 浅岡 晃次, 堤 隆嘉, 堀 勝

第82回 応用物理学会秋季学術講演会 

Development of the nanocarbon coating process on metal surfaces via in-liquid plasma International conference

Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Interfinish 2020 World Congress 

Application of Atmospheric Pressure Plasma to Rapid Dry Etching of Polymer Contamination on Floor International conference

Y Sakamoto, T Tsutsumi, M Hori

Interfinish 2020 World Congress 

Application of Atmospheric Pressure Plasma to Rapid Dry Etching of Polymer Contamination on Floor International conference

Y Sakamoto, T Tsutsumi, M Hori

Interfinish 2020 World Congress 

Development of the nanocarbon coating process on metal surfaces via in-liquid plasma International conference

Ma. Shanlene, D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Interfinish 2020 World Congress 

Numerical analysis of effects of applying voltage polarity on atmospheric pressure argon streamer discharge under pin-to-plane electrode geometry International conference

Y. Sato, K. Ishikawa, T. Tsutsumi, A. Ui, M. Akita, S. Oka and M. Hori

47th Conference on Plasma Physics 

Numerical analysis of effects of applying voltage polarity on atmospheric pressure argon streamer discharge under pin-to-plane electrode geometry International conference

Y. Sato, K. Ishikawa, T. Tsutsumi, A. Ui, M. Akita, S. Oka, M. Hori

47th Conference on Plasma Physics 

塩素吸着による窒化ガリウム原子層エッチングの表面反応の理想と現実

堤 隆嘉, 長谷川 将希, 中村 昭平, 谷出 敦，近藤 博基, 関根 誠, 石川 健治, 堀 勝

第227回　シリコンテクノロジー分科会　研究集会  2021.3.25 

塩素吸着による窒化ガリウム原子層エッチングの表面反応の理想と現実

堤 隆嘉, 長谷川 将希, 中村 昭平, 谷出 敦, 近藤 博基, 関根 誠, 石川 健治, 堀 勝

第227回 シリコンテクノロジー分科会 研究集会  2021.3.25 

塩素吸着を用いた窒化ガリウムの原子層エッチングプロセス特性のArイオンエネルギー依存性

堤 隆嘉、長谷川 将希、中村 昭平、谷出 敦、近藤 博基、関根 誠、石川 健治、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

リモート酸素ラジカルによるグラフェンのエッチング反応の分析

胡 留剛、堤 隆嘉、蕭 世男、近藤 博基、石川 健治、関根 誠、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

マイクロ放電ホローカソードプラズマを用いた真空紫外吸収分光用自己吸収光源の分光診断

竹田 圭吾、堤 隆嘉、平松 美根男、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動

吉江 泰斗、三好 康史、堤 隆嘉、釘宮 克尚、石川 健治、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

プラズマ誘起欠陥の発生と修復 ～少数キャリアライフタイムによる定量評価～

布村 正太、坂田 功、堤 隆嘉、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における活性種の効果[II]

近藤 博基、濱地 遼、堤 隆嘉、石川 健治、関根 誠、堀 勝

第68回応⽤物理学会春季学術講演会 

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動

吉江 泰斗, 三好 康史, 堤 隆嘉, 釘宮 克尚, 石川 健治, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

プラズマ誘起欠陥の発生と修復 ～少数キャリアライフタイムによる定量評価～

布村 正太, 坂田 功, 堤 隆嘉, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における活性種の効果[II]

近藤 博基, 濱地 遼, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

第68回応⽤物理学会春季学術講演会 

塩素吸着を用いた窒化ガリウムの原子層エッチングプロセス特性のArイオンエネルギー依存性

堤 隆嘉, 長谷川 将希, 中村 昭平, 谷出 敦, 近藤 博基, 関根 誠, 石川 健治, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

リモート酸素ラジカルによるグラフェンのエッチング反応の分析

胡 留剛, 堤 隆嘉, 蕭 世男, 近藤 博基, 石川 健治, 関根 誠, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

マイクロ放電ホローカソードプラズマを用いた真空紫外吸収分光用自己吸収光源の分光診断

竹田 圭吾, 堤 隆嘉, 平松 美根男, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure International conference

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.9 

Comparison of Nitrogen Atom Densities Measured with VUVAS and Actinometry in Spiral Shape Plasma International conference

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region International conference

Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori and Hajime Sakakita

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls International conference

Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma International conference

Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka,Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry International conference

Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching International conference

Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 International conference

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment International conference

B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka,T. Gohira, Y. Ohya, N. Ohno and M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer International conference

M. Hazumi, S. Selvaraj, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine and M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions International conference

Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface International conference

S. Selvaraj, M. Hazumi, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas International conference

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Comparison of Nitrogen Atom Densities Measured with VUVAS and Actinometry in Spiral Shape Plasma International conference

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas International conference

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure International conference

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.9 

Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions International conference

Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls International conference

Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry International conference

Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching International conference

Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 International conference

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region International conference

Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Hajime Sakakita

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment International conference

B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka, T. Gohira, Y. Ohya, N. Ohno, M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma International conference

Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka, Kenji Ishikawa, Takayoshi Tsutsumi, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface International conference

S. Selvaraj, M. Hazumi, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer International conference

M. Hazumi, S. Selvaraj, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021.3.8 

Etching characteristics of PECVD prepared SiN films with CF4/H2 and CF4/D2 plasmas at different substrate temperatures International conference

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2020 (ISSM2020)  2020.12.15 

Etching characteristics of PECVD prepared SiN films with CF4/H2 and CF4/D2 plasmas at different substrate temperatures International conference

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2020 (ISSM2020)  2020.12.15 

Antitumor effect of plasma-activated Ringer’s acetate solution International conference

Yuki SudaU, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

2020.12.10 

Antitumor effect of plasma-activated Ringer’s acetate solution International conference

Yuki SudaU, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

2020.12.10 

Nitrogen Atom Density Measurements from Vacuum Ultraviolet Absorption Spectroscopy and Actinometry in Spiral Shape Plasma International conference

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi and Masaru Hori

The 29th International Toki Conference on Plasma and Fusion Research  2020.10.28 

Time resolved measurements of electron density and temperature by an electrostatic probe with conditional averaging method in pulsed capacitively coupled plasmas International conference

S. Hattori, B. B. Sahu, H. Tanaka, T. Tsutsumi, S. Kajita, M. Sekine, M. Hori, N. Ohno

The 29th International Toki Conference on Plasma and Fusion Research  2020.10.28 

Nitrogen Atom Density Measurements from Vacuum Ultraviolet Absorption Spectroscopy and Actinometry in Spiral Shape Plasma International conference

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori

The 29th International Toki Conference on Plasma and Fusion Research  2020.10.28 

Time resolved measurements of electron density and temperature by an electrostatic probe with conditional averaging method in pulsed capacitively coupled plasmas International conference

S. Hattori, B. B. Sahu, H. Tanaka, T. Tsutsumi, S. Kajita, M. Sekine, M. Hori, N. Ohno

The 29th International Toki Conference on Plasma and Fusion Research  2020.10.28 

Interactions of floating-wire-assisted atmospheric-pressure H2/Ar plasma with SnO2 film on glass substrate forming spherical Sn particles International conference

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference  2020.10.8 

Penetration of hydrogen atoms and termination of dangling bonds in amorphous carbon films International conference

Hiroki Kondo, Yasuyuki Ohashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference  2020.10.9 

Interactions of floating-wire-assisted atmospheric-pressure H2/Ar plasma with SnO2 film on glass substrate forming spherical Sn particles International conference

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference  2020.10.8 

Penetration of hydrogen atoms and termination of dangling bonds in amorphous carbon films International conference

Hiroki Kondo, Yasuyuki Ohashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference  2020.10.9 

カーボンナノウォールの局所電気伝導特性の解明

尾崎 敦士、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第81回応用物理学会秋季学術講演会 

液中プラズマを用いたナノグラフェン合成における活性種の効果

近藤 博基、濱地 遼、堤 隆嘉、石川 健治、関根 誠、堀 勝

第81回応用物理学会秋季学術講演会 

カーボンナノウォールの局所電気伝導特性の解明

尾崎 敦士, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

第81回応用物理学会秋季学術講演会 

液中プラズマを用いたナノグラフェン合成における活性種の効果

近藤 博基, 濱地 遼, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

第81回応用物理学会秋季学術講演会 

Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis International conference

Masaki Hasagawa‚ Takayoshi Tsutsumi, Atsushi Tanide‚ Shohei Nakamura, Hiroki Kondo‚ Kenji Ishikawa‚ Masaru Hori

20th International Conference on Atomic Layer Deposition  2020.6.29 

Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis International conference

Masaki Hasagawa‚, Takayoshi Tsutsumi, Atsushi Tanide‚, Shohei Nakamura, Hiroki Kondo‚, Kenji Ishikawa‚, Masaru Hori

20th International Conference on Atomic Layer Deposition  2020.6.29 

プラズマプロセス中の基板温度分布の経時変化の解析

堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝

2020年第67回応用物理学会春季学術講演会 

Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性 (2)

長谷川 将希、堤 隆嘉、谷出 敦、近藤 博基、関根 誠、石川 健治、堀 勝

2020年第67回応用物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における照射時間依存性 [II]

近藤 博基、濱地 遼、 堤 隆嘉,、石川 健治、関根 誠、堀 勝

2020年第67回応用物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における照射時間依存性[Ⅰ]

濱地 遼、近藤 博基、堤 隆嘉、石川 健治、関根 誠、堀 勝

2020年第67回応用物理学会春季学術講演会 

プラズマ誘起欠陥の発生と修復 ～Arイオン照射の効果～

布村 正太、中根 一也、堤 隆嘉、松原 浩司、堀 勝

2020年第67回応用物理学会春季学術講演会 

極低温領域におけるCHF3ガス凝縮層を用いたエッチングプロセスの研究

羽澄 匡広, スガンサマラー セルヴァラジ, 蕭 世男, 関根 誠, 林 久貴, 佐々木 俊行, 阿部 知央, 堤 隆嘉, 石川 健治, 堀 勝

2020年第67回応用物理学会春季学術講演会