研究者詳細 - 大野　哲靖

論文 - 大野　哲靖

分割表示 657 件中 641 - 657 件目／全件表示 >>

Bifurcation Phencomena in an Emissive Plate-Simulated Divertor Plasma System 査読有り

S.Takamura, N.Ohno, K.Shiraishi, S.Masuzaki

Journal of Nuclear Materials 196-198 巻頁： 448-451 1992年

Numerical Study of Potential Formation and Negative Resistance in a Currnet Carrying Ion Sheath

N.Ohno, A.Komori, Y.Kawai, S.Takamura

Proc. of 1992 International Conference on Plasma Physics, Innsbruck, Austria 頁： 1807-1810 1992年

26p-C-7 準周期ルートによるイオンシースのカオス査読有り

小森彰夫, 大野哲靖, 河野光雄, 田中雅慶, 河合良信

秋の分科会予稿集 1992 巻 ( 0 ) 1992年

Averaging effect of radical particle profile by the scanning plasma method in SiH<inf>4</inf>Ar plasmas 査読有り国際誌

Fujiyama H., Kawasaki H., Matsuda Y., Ohno N.

Materials Science and Engineering A 140 巻 ( C ) 頁： 569 - 575 1991年7月

担当区分：最終著者記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Materials Science and Engineering A

A new plasma-enhanced chemical vapour deposition (PECVD) method has been developed for preparation of large-area uniform hydrogenated amorphous silicon (aSi:H) thin films. Detailed two-dimensional profiles of both charged particles and radical particles have been measured in magnetized multielectrode glow discharge plasmas in 10% SiH4Ar gas. The detailed profiles of SiH* and Ar I emissions had two peaks in the negative glow and cathode sheath regions but, for Hα emission, only one peak was observed in the cathode sheath region. It was verified that large-area uniform profiles of not only plasmas but also SiH* emission could be realized in the presence of modulated crossed magnetic and electric fields. By using this scanning plasma method (SPM), inhomogeneities for both profiles of plasma and SiH* (413.5 nm) emission intensity have improved to less than 2.5% near the substrate outside the discharge region. The thickness profile of prepared a-Si:H thin film has also been unified to less than 4.8% by SPM. © 1991.

DOI： 10.1016/0921-5093(91)90480-B

Scopus

INSTABILITIES ASSOCIATED WITH A NEGATIVE RF RESISTANCE IN CURRENT-CARRYING ION SHEATHS 査読有り国際誌

OHNO N, KOMORI A, TANAKA M, KAWAI Y

PHYSICS OF FLUIDS B-PLASMA PHYSICS 3 巻 ( 1 ) 頁： 228 - 235 1991年1月

短ギャップ同軸型マイクロ波放電の放電開始条件に及ぼす磁界の影響査読有り

重水哲郎、大野哲靖、藤山寛

電気学会論文誌A 111 巻 ( 8 ) 頁： 727-732 1991年

Instabilities associated with a negative of resistance in current-Carrying ion sheaths 査読有り

N.Ohno, A.Komori, M.Tanaka, Y.Kawai

Physics of Fluids B3 巻 ( 1 ) 頁： 228-235 1991年

Characteristics of ECR Plasmas for Weakly resonant conditions 査読有り

M.Saigoh, N.Ohno, H.Fujiyama

Material Science and Engineering A139 巻頁： 307-311 1991年

ボックスカー撮像法によるプラズマ中磁力線構造可視化システム

櫻井真治、大野哲靖、高村秀一

第6回産業における画像センシング技術シンポジウム講演論文集頁： 177-182 1991年

Averaging Effect of Radical Profile by the Scanning Plasma Method in S : H₄-Ar Plasma 査読有り

H.Kawasaki, N.Ohno, Y.Matsuda, H.Fujiyama

Material Science and Engineering A140 巻頁： 569-575 1991年

Development of Coaxial ECR Plasma Source for tube inner coating 査読有り

T.Shigemizu, N.Ohno, H.Fujiyama

Material Science and Engineering A139 巻頁： 312-318 1991年

短ギャップ同軸形マイクロ波放電の開始条件に及ぼす磁界の影響査読有り

重水哲郎, 大野哲靖, 藤山寛

電気学会論文誌Ａ（基礎・材料・共通部門誌） 111 巻 ( 8 ) 頁： 727 - 732 1991年

記述言語：日本語掲載種別：研究論文（学術雑誌）出版者・発行元：一般社団法人電気学会

The gaseous breakdown conditions by the microwave field were theoretically and experimentally investigated in the presence of an external crossed magnetic field. We developed the calculating method by taking account of collisions between electrons and neutral gases, and electron losses to a boundary in the magnetic field to be able to calculate the breakdown voltages in a low gas pressure range from 1×10<sup>-4</sup> to 1×10<sup>-2</sup>Torr. These calculated results are in good agreement with experimental ones. In the narrow-gap less than the wavelength of the microwave, both the magnetic field and the electron loss to the boundary play an important role for the breakdown condition. Coaxial-type electron cyclotron resonance (ECR) plasmas can be generated in a metal coaxial tube with a gap length of 4.5mm gap.

DOI： 10.1541/ieejfms1990.111.8_727

Chaotic Behavior of Current -Carrying Plasmas in External Periodic Oscillations 査読有り

N.Ohno, A.Komori, M.Tanaka, Y.Kawai

Journal of Physical Society of Japan 58 巻 ( 1 ) 頁： 28-31 1989年

Instatbilities Associated with Chaotic Behavior in a Current-Carrying Plasma

A.Komori, N.Ohno, M.Tanaka, Y.Kawai

Proc. of 1989 International Conference on Plasma Physics, New Delhi, India 頁： 801-804 1989年

Chaotic Behavior due to Wave-Wave Interaction in a Modulated Ion Beam-Plasma System

K.Araki, M.Saigoh, N.Ohno, H.Fujiyama, M.Nambu, H.Honjo

Proc. of 1989 International Conference on Plasma Physics, New Delhi, India 頁： 789-793 1989年

イオンビームプラズマ系におけるサブハーモニックスの励起機構の研究

大野哲靖、粕谷俊郎、田中雅慶、小森彰夫、河合良信

九州大学総合理工学研究科報告 9 巻 ( 1 ) 1987年

Observation of Subharmonic Waves in an Ion Beam-Plasma System

N.Ohno, T.Kasuya, A.Komori, Y.Kawai

Proc. of International Conference on Phenomena in Ionized Gases, Swansea, England, 1987 頁： 270-271 1987年

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