2021/10/07 更新

写真a

セキネ マコト
関根 誠
SEKINE, Makoto
所属
低温プラズマ科学研究センター プラズマ科学部門 特任教授
大学院担当
大学院工学研究科
職名
特任教授
外部リンク

学位 1

  1. 博士(工学) ( 2006年1月   慶應義塾大学 ) 

研究キーワード 4

  1. プラズマ化学

  2. 反応性プラズマ

  3. プラズマ計測

  4. プラズマ応用

研究分野 3

  1. その他 / その他  / 原子・分子・量子エレクトロニクス・プラズマ

  2. その他 / その他  / 反応工学・プロセスシステム

  3. その他 / その他  / 電子デバイス・電子機器

経歴 2

  1. 名古屋大学   大学院工学研究科 附属プラズマナノ工学研究センター   特任教授

    2007年4月 - 現在

  2. 名古屋大学 大学院工学研究科 附属プラズマナノ工学研究センター   特任教授

所属学協会 2

  1. 応用物理学会   代議員

    2003年4月 - 2007年3月

  2. American Vacuum Society

受賞 2

  1. 日本学術振興会 プラズマ材料科学賞(研究奨励賞)受賞

    1999年9月   日本学術振興会 プラズマ材料科学第153委員会  

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    受賞国:日本国

  2. 社団法人 応用物理学会 論文賞B(奨励賞)受賞

    1987年10月   社団法人 応用物理学会  

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    受賞国:日本国

 

論文 83

  1. Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H-2 plasma at different substrate temperatures

    Hsiao Shih-Nan, Britun Nikolay, Thi-Thuy-Nga Nguyen, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    PLASMA PROCESSES AND POLYMERS     2021年8月

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    記述言語:日本語   出版者・発行元:Plasma Processes and Polymers  

    The dependences of etching characteristics on substrate temperature (Ts, from –20 to 50°C) of the plasma-enhanced chemical vapor deposition (PECVD) SiN films (PE-SiN) and low-pressure chemical vapor deposition (LPCVD) SiN films (LP-SiN) with CF4/H2 plasma were investigated. The Fourier-transform infrared spectroscopy shows that both film types were N–H bond-rich films, but in different hydrogen contents (PE-SiN 22.7 at% and LP-SiN 3.8 at%) from the Rutherford backscattering spectroscopy analyses. A higher hydrogen content led to a thinner fluorocarbon thickness because of the reaction between hydrogen outflux and C and N to form an HCN byproduct. The etch rates (ER) for the PE-SiN were higher than that of the LP-SiN at all Ts, due to the different FC thickness and etching mechanisms proposed. The formation of the N−Hx layer on PE-SiN at low temperature caused the decrease in ER. For the LP-SiN, the weak dependences of Ts on surface structure and ER were observed.

    DOI: 10.1002/ppap.202100078

    Web of Science

    Scopus

  2. Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H-2 plasma

    Hsiao Shih-Nan, Nakane Kazuya, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    APPLIED SURFACE SCIENCE   542 巻   2021年3月

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    出版者・発行元:Applied Surface Science  

    DOI: 10.1016/j.apsusc.2020.148550

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    Scopus

  3. Cyclic C4F8 and O-2 plasma etching of TiO2 for high-aspect-ratio three-dimensional devices

    Imamura Tsubasa, Sakai Itsuko, Hayashi Hisataka, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   60 巻 ( 3 )   2021年3月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.35848/1347-4065/abdf78

    Web of Science

    Scopus

  4. Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O-2, and Ar

    Hsiao Shih-Nan, Ishikawa Kenji, Hayashi Toshio, Ni Jiwei, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

    APPLIED SURFACE SCIENCE   541 巻   2021年3月

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    出版者・発行元:Applied Surface Science  

    DOI: 10.1016/j.apsusc.2020.148439

    Web of Science

    Scopus

  5. Plasma simulation for dual-frequency capacitively coupled plasma incorporating gas flow simulation

    Takagi Shigeyuki, Chikata Takumi, Sekine Makoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   60 巻 ( SA )   2021年1月

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  6. Reduction in photon-induced interface defects by optimal pulse repetition rate in the pulse-modulated inductively coupled plasma

    Miyoshi Yasufumi, Ishikawa Kenji, Sekine Makoto, Hori Masaru, Tatsumi Tetsuya

    JAPANESE JOURNAL OF APPLIED PHYSICS   60 巻 ( 1 )   2021年1月

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  7. Reduction in photon-induced interface defects by optimal pulse repetition rate in the pulse-modulated inductively coupled plasma

    Miyoshi Y.

    Japanese Journal of Applied Physics   60 巻 ( 1 )   2021年1月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.35848/1347-4065/abd113

    Scopus

  8. Plasma simulation for dual-frequency capacitively coupled plasma incorporating gas flow simulation

    Takagi S.

    Japanese Journal of Applied Physics   60 巻 ( SA )   2020年10月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.35848/1347-4065/abc106

    Scopus

  9. Silver film etching using halogen gas plasma

    Sasaki Toshiyuki, Yoshikawa Kenichi, Furumoto Kazuhito, Sakai Itsuko, Hayashi Hisataka, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   38 巻 ( 5 )   2020年9月

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    出版者・発行元:Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films  

    DOI: 10.1116/6.0000286

    Web of Science

    Scopus

  10. In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals

    Hasegawa Masaki, Tsutsumi Takayoshi, Tanide Atsushi, Nakamura Shohei, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   38 巻 ( 4 )   2020年7月

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    出版者・発行元:Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films  

    DOI: 10.1116/6.0000124

    Web of Science

    Scopus

  11. Characterization of a microsecond pulsed non-equilibrium atmospheric pressure Ar plasma using laser scattering and optical emission spectroscopy

    Jia Fengdong, Wu Yong, Min Qi, Su Maogen, Takeda Keigo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Hori Masaru, Zhong Zhiping

    PLASMA SCIENCE & TECHNOLOGY   22 巻 ( 6 )   2020年6月

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    出版者・発行元:Plasma Science and Technology  

    DOI: 10.1088/2058-6272/ab84e2

    Web of Science

    Scopus

  12. Electronic properties and primary dissociation channels of fluoromethane compounds

    Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   59 巻   2020年6月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.35848/1347-4065/ab7e3f

    Web of Science

    Scopus

  13. Dry Process FOREWORD

    Shirafuji Tatsuru, Kinoshita Keizo, Akatsuka Hiroshi, Eriguchi Koji, Ichikawa Takashi, Ichiki Takanori, Ishijima Tatsuo, Ishikawa Kenji, Karahashi Kazuhiro, Kurihara Kazuaki, Sekine Makoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   59 巻 ( SJ )   2020年6月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.35848/1347-4065/ab8acf

    Web of Science

    Scopus

  14. Transparent elongation and compressive strain sensors based on aligned carbon nanowalls embedded in polyurethane

    Slobodian Petr, Riha Pavel, Kondo Hiroki, Cvelbar Uros, Olejnik Robert, Matyas Jiri, Sekine Makoto, Hori Masaru

    SENSORS AND ACTUATORS A-PHYSICAL   306 巻   2020年5月

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    出版者・発行元:Sensors and Actuators, A: Physical  

    DOI: 10.1016/j.sna.2020.111946

    Web of Science

    Scopus

  15. Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp(2) carbon structures

    Sugiura Hirotsugu, Ohashi Yasuyuki, Ishikawa Kenji, Kondo Hiroki, Kato Toshiaki, Kaneko Toshiro, Takeda Keigo, Tsutsumi Takayoshi, Hayashi Toshio, Sekine Makoto, Hori Masaru

    DIAMOND AND RELATED MATERIALS   104 巻   2020年4月

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    出版者・発行元:Diamond and Related Materials  

    DOI: 10.1016/j.diamond.2019.107651

    Web of Science

    Scopus

  16. In-Liquid Plasma Synthesis of Nanographene with a Mixture of Methanol and 1-Butanol

    Ando Atsushi, Ishikawa Kenji, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Kondo Hiroki, Sekine Makoto, Hori Masaru

    CHEMNANOMAT   6 巻 ( 4 ) 頁: 604 - 609   2020年4月

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    出版者・発行元:ChemNanoMat  

    DOI: 10.1002/cnma.201900676

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    Scopus

  17. Electron and negative ion dynamics in a pulsed 100 MHz capacitive discharge produced in an O-2 and Ar/O-2/C4F8 gas mixture

    Sirse N., Tsutsumi T., Sekine M., Hori M., Ellingboe A. R.

    PLASMA SOURCES SCIENCE & TECHNOLOGY   29 巻 ( 3 )   2020年3月

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    出版者・発行元:Plasma Sources Science and Technology  

    DOI: 10.1088/1361-6595/ab7086

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    Scopus

  18. Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study

    Fukunaga Yusuke, Longo Roberto C., Ventzek Peter L. G., Lane Barton, Ranjan Alok, Hwang Gyeong S., Hartmann Greg, Tsutsumi Takayoshi, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JOURNAL OF APPLIED PHYSICS   127 巻 ( 2 )   2020年1月

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    出版者・発行元:Journal of Applied Physics  

    DOI: 10.1063/1.5127863

    Web of Science

    Scopus

  19. Initial growth analysis of ALD Al2O3 film on hydrogen-terminated Si substrate via in situ XPS

    Fukumizu Hiroyuki, Sekine Makoto, Hori Masaru, McIntyre Paul C.

    JAPANESE JOURNAL OF APPLIED PHYSICS   59 巻 ( 1 )   2020年1月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/1347-4065/ab6273

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    Scopus

  20. 第2部 最近の技術の進歩

    佐波 正浩, 小田 幸典, 松原 浩, 田代 雄彦, 姜 俊行, 宮田 麻衣, 竹林 浩史, 野村 広正, 平藤 哲司, 津田 哲哉, 安田 幸司, 中村 俊博, 幸塚 広光, 長田 実, 土屋 哲男, 笹野 順司, 伊﨑 昌伸, 滝川 浩史, 小島 啓安, 西川 博昭, 川名 淳雄, 坂本 幸弘, 森河 務, 竹内 貞雄, 斎藤 秀俊, 矢嶋 龍彦, 鈴木 雅人, 菊地 竜也, 近藤 敏彰, 岩崎 光伸, 阿相 英孝, 土谷 博昭, 幅崎 浩樹, 井上 学, 松本 歩, 八重 真治, 小崎 匠, 木口 忠広, 印部 俊雄, 遠藤 幸典, 太田 伶美, 奴間 伸茂, 鷹野 一朗, 新納 弘之, 内田 衛, 星野 薫, 渡邊 陽一, 三阪 佳孝, 松本 克才, 関根 誠, 谷 泰弘, 清水 健一, 松島 永佳, 高橋 和裕, 林 広司, 藤波 知之, 星 芳直, 小岩 仁子, 長瀧 敬行, 日野 実, 秦 朋美, 相木 文男, 森田 顕

    表面技術   71 巻 ( 2 ) 頁: 96 - 182   2020年

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    出版者・発行元:一般社団法人 表面技術協会  

    DOI: 10.4139/sfj.71.96

    CiNii Article

  21. Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate

    Isobe Yasuhiro, Sakai Takayuki, Suguro Kyoichi, Miyashita Naoto, Kondo Hiroki, Ishikawa Kenji, Wilson Amalraj Frank, Shimizu Naohiro, Oda Osamu, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   37 巻 ( 6 )   2019年11月

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    出版者・発行元:Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics  

    DOI: 10.1116/1.5114831

    Web of Science

    Scopus

  22. Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects

    Miyajima Hideshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   16 巻 ( 9 )   2019年9月

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    出版者・発行元:Plasma Processes and Polymers  

    DOI: 10.1002/ppap.201900039

    Web of Science

    Scopus

  23. Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation

    Ichikawa Tomonori, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Tanaka Hiromasa, Sekine Makoto, Hori Masaru

    ACS APPLIED BIO MATERIALS   2 巻 ( 7 ) 頁: 2698 - 2702   2019年7月

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    出版者・発行元:ACS Applied Bio Materials  

    DOI: 10.1021/acsabm.9b00178

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  24. Dry Process FOREWARD

    Kurihara Kazuaki, Karahashi Kazuhiro, Kinoshita Keizo, Sekine Makoto, Ichikawa Takashi, Ishijima Tatsuo, Shirafuji Tatsuru

    JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

  25. Formation mechanism of sidewall striation in high-aspect-ratio hole etching

    Omura Mitsuhiro, Hashimoto Junichi, Adachi Takahiro, Kondo Yusuke, Ishikawa Masao, Abe Junko, Sakai Itsuko, Hayashi Hisataka, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( SE )   2019年6月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/1347-4065/ab163c

    Web of Science

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  26. Electronic properties and primarily dissociation channels of fluoroethane compounds

    Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( SE )   2019年6月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/1347-4065/ab09ca

    Web of Science

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  27. Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas

    Zhang Yan, Ishikawa Kenji, Mozetic Miran, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   16 巻 ( 6 )   2019年6月

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    出版者・発行元:Plasma Processes and Polymers  

    DOI: 10.1002/ppap.201800175

    Web of Science

    Scopus

  28. Chemical bonding structure in porous SiOC films (k < 2.4) with high plasma-induced damage resistance

    Miyajima Hideshi, Masuda Hideaki, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    MICRO AND NANO ENGINEERING   3 巻   頁: 1 - 6   2019年5月

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    出版者・発行元:Micro and Nano Engineering  

    DOI: 10.1016/j.mne.2019.02.005

    Web of Science

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  29. Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition

    Isobe Yasuhiro, Sakai Takayuki, Sugiyama Naoharu, Mizushima Ichiro, Suguro Kyoichi, Miyashita Naoto, Lu Yi, Wilson Amalraj Frank, Kumar Dhasiyan Arun, Ikarashi Nobuyuki, Kondo Hiroki, Ishikawa Kenji, Shimizu Naohiro, Oda Osamu, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   37 巻 ( 3 )   2019年5月

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    出版者・発行元:Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics  

    DOI: 10.1116/1.5083970

    Web of Science

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  30. Chemical bonding structure in porous SiOC films (k < 2.4) with high plasma-induced damage resistance (vol 3, pg 1, 2019)

    Miyajima Hideshi, Masuda Hideaki, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    MICRO AND NANO ENGINEERING   3 巻   頁: 92 - 92   2019年5月

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    出版者・発行元:Micro and Nano Engineering  

    DOI: 10.1016/j.mne.2019.05.004

    Web of Science

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  31. Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

    Imai Shun, Naito Kenichi, Kondo Hiroki, Cho Hyung Jun, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 10 )   2019年3月

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    出版者・発行元:Journal of Physics D: Applied Physics  

    DOI: 10.1088/1361-6463/aaf8e0

    Web of Science

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  32. Control of sp(2)-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H-2 plasma-enhanced chemical vapor deposition

    Sugiura Hirotsugu, Jia Lingyun, Ohashi Yasuyuki, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( 3 )   2019年3月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/1347-4065/aafd49

    Web of Science

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  33. Atomic layer etching of AlGaN using Cl-2 and Ar gas chemistry and UV damage evaluation

    Fukumizu Hiroyuki, Sekine Makoto, Hori Masaru, Kanomaru Koji, Kikuchi Takuo

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   37 巻 ( 2 )   2019年3月

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    出版者・発行元:Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films  

    DOI: 10.1116/1.5063795

    Web of Science

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  34. Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition

    Tomatsu Masakazu, Hiramatsu Mineo, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

    C-JOURNAL OF CARBON RESEARCH   5 巻 ( 1 )   2019年3月

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  35. Effects of BCl3 addition to Cl-2 gas on etching characteristics of GaN at high temperature

    Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kohno Motohiro, Kinose Kazuo, Nadahara Soichi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   37 巻 ( 2 )   2019年3月

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    出版者・発行元:Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics  

    DOI: 10.1116/1.5082345

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  36. Real-time control of a wafer temperature for uniform plasma process

    Tsutsumi T.

    IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings   2018-December 巻   2019年2月

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    出版者・発行元:IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings  

    DOI: 10.1109/ISSM.2018.8651183

    Scopus

  37. Adhesion enhancement and amine reduction using film redeposited at the interface of a stack of plasma-enhanced CVD dielectrics for Cu/low-k interconnects

    Miyajima Hideshi, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( 2 )   2019年2月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/1347-4065/aafb5b

    Web of Science

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  38. Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds

    Ichikawa Tomonori, Tanaka Suiki, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS EXPRESS   12 巻 ( 2 )   2019年2月

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    出版者・発行元:Applied Physics Express  

    DOI: 10.7567/1882-0786/aaf469

    Web of Science

    Scopus

  39. Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system

    Fukunaga Yusuke, Tsutsumi Takayoshi, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( 2 )   2019年2月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/1347-4065/aaf92a

    Web of Science

    Scopus

  40. Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H-2 plasma-enhanced chemical vapor deposition

    Imai Shun, Kondo Hiroki, Hyungjun Cho, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

    APPLIED PHYSICS EXPRESS   12 巻 ( 1 )   2019年1月

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    出版者・発行元:Applied Physics Express  

    DOI: 10.7567/1882-0786/aaf0ab

    Web of Science

    Scopus

  41. Effect of N-2/H-2 plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD)

    Amalraj Frank Wilson, Dhasiyan Arun Kumar, Lu Yi, Shimizu Naohiro, Oda Osamu, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Ikarashi Nobuyuki, Hori Masaru

    AIP ADVANCES   8 巻 ( 11 )   2018年11月

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    出版者・発行元:AIP Advances  

    DOI: 10.1063/1.5050819

    Web of Science

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  42. Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

    Santhosh Neelakandan M., Filipic Gregor, Tatarova Elena, Baranov Oleg, Kondo Hiroki, Sekine Makoto, Hori Masaru, Ostrikov Kostya (Ken), Cvelbar Uros

    MICROMACHINES   9 巻 ( 11 )   2018年11月

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    出版者・発行元:Micromachines  

    DOI: 10.3390/mi9110565

    Web of Science

    Scopus

    PubMed

  43. Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H-2 at 300-500 degrees C

    Kako Takashi, Liu Zecheng, Ishikawa Kenji, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

    VACUUM   156 巻   頁: 219 - 223   2018年10月

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    出版者・発行元:Vacuum  

    DOI: 10.1016/j.vacuum.2018.07.040

    Web of Science

    Scopus

  44. Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching

    Zhang Yan, Imamura Masato, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 10 )   2018年10月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.106502

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  45. Effect of substrate temperature on sidewall erosion in high-aspect-ratio Si hole etching employing HBr/SF6/O-2 plasma

    Sakai Itsuko, Yahashi Katsunori, Shimonishi Satoshi, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 9 )   2018年9月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.098004

    Web of Science

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  46. Thrombohemorrhagic events, disease progression, and survival in polycythemia vera and essential thrombocythemia: a retrospective survey in Miyazaki prefecture, Japan

    Kamiunten A.

    International Journal of Hematology   107 巻 ( 6 ) 頁: 681 - 688   2018年6月

     詳細を見る

    出版者・発行元:International Journal of Hematology  

    DOI: 10.1007/s12185-018-2428-0

    Scopus

  47. Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma

    Liu Zecheng, Ishikawa Kenji, Imamura Masato, Tsutsumi Takayoshi, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.06JD01

    Web of Science

    Scopus

  48. Dissociative properties of 1,1,1,2-tetrafluoroethane obtained by computational chemistry

    Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.06JC02

    Web of Science

    Scopus

  49. Impact of helium pressure in arc plasma synthesis on crystallinity of single-walled carbon nanotubes

    Ando Atsushi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Suzuki Tomoko, Inoue Sakae, Ando Yoshinori, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.06JF01

    Web of Science

    Scopus

  50. Effects of gas residence time of CH4/H-2 on sp(2) fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition

    Sugiura Hirotsugu, Jia Lingyun, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 6 )   2018年6月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.06JE03

    Web of Science

    Scopus

  51. Nanographene synthesized in triple-phase plasmas as a highly durable support of catalysts for polymer electrolyte fuel cells

    Amano Tomoki, Kondo Hiroki, Takeda Keigo, Ishikawa Kenji, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 4 )   2018年4月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.045101

    Web of Science

    Scopus

  52. Oxygen reduction reaction properties of nitrogen-incorporated nanographenes synthesized using in-liquid plasma from mixture of ethanol and iron phthalocyanine

    Amano Tomoki, Kondo Hiroki, Takeda Keigo, Ishikawa Kenji, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 4 )   2018年4月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.040303

    Web of Science

    Scopus

  53. Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons

    Ando Atsushi, Ishikawa Kenji, Kondo Hiroki, Tsutsumi Takayoshi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 2 )   2018年2月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.57.026201

    Web of Science

    Scopus

  54. Electron impact ionization of perfluoro-methyl-vinyl-ether C3F6O

    Kondo Yusuke, Ishikawa Kenji, Hayashi Toshio, Sekine Makoto, Hori Masaru

    PLASMA SOURCES SCIENCE & TECHNOLOGY   27 巻 ( 1 )   2018年1月

     詳細を見る

    出版者・発行元:Plasma Sources Science and Technology  

    DOI: 10.1088/1361-6595/aaa22e

    Web of Science

    Scopus

  55. Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol

    Amano Tomoki, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Takeda Keigo, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS EXPRESS   11 巻 ( 1 )   2018年1月

     詳細を見る

    出版者・発行元:Applied Physics Express  

    DOI: 10.7567/APEX.11.015102

    Web of Science

    Scopus

  56. Real-time control of a wafer temperature for uniform plasma process

    Tsutsumi T., Fuknaga Y., Ishikawa K., Kondo H., Sekine M., Hori M.

    2018 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     2018年

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  57. Dependence of absolute photon flux on infrared absorbance alteration and surface roughness on photoresist polymers irradiated with vacuum ultraviolet photons emitted from HBr plasma

    Zhang Yan, Takeuchi Takuya, Ishikawa Kenji, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 12 )   2017年12月

     詳細を見る

    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.56.126503

    Web of Science

    Scopus

  58. Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

    Zhang Yan, Takeuchi Takuya, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   35 巻 ( 6 )   2017年11月

     詳細を見る

    出版者・発行元:Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films  

    DOI: 10.1116/1.4994218

    Web of Science

    Scopus

  59. Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium

    Furuta Ryo, Kurake Naoyuki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   14 巻 ( 11 )   2017年11月

     詳細を見る

    出版者・発行元:Plasma Processes and Polymers  

    DOI: 10.1002/ppap.201700123

    Web of Science

    Scopus

  60. High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition

    Imai Shun, Kondo Hiroki, Cho Hyungjun, Kano Hiroyuki, Ishikawa Kenji, Sekine Makoto, Hiramatsu Mineo, Ito Masafumi, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 40 )   2017年10月

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    出版者・発行元:Journal of Physics D: Applied Physics  

    DOI: 10.1088/1361-6463/aa8131

    Web of Science

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  61. Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy

    Furuta Ryo, Kurake Naoyuki, Takeda Keigo, Ishikawa Kenji, Ohta Takayuki, Ito Masafumi, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

    BIOINTERPHASES   12 巻 ( 3 ) 頁: 031006   2017年9月

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    出版者・発行元:Biointerphases  

    DOI: 10.1116/1.4997170

    Web of Science

    Scopus

    PubMed

  62. Measurement of F-, O- and CF3- densities in 60 and 100 MHz asymmetric capacitively coupled plasma discharge produced in an Ar/O-2/C4F8 gas mixture

    Sirse N., Tsutsumi T., Sekine M., Hori M., Ellingboe A. R.

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 33 )   2017年8月

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    出版者・発行元:Journal of Physics D: Applied Physics  

    DOI: 10.1088/1361-6463/aa77c4

    Web of Science

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  63. Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation

    Liu Zecheng, Imamura Masato, Asano Atsuki, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS EXPRESS   10 巻 ( 8 )   2017年8月

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    出版者・発行元:Applied Physics Express  

    DOI: 10.7567/APEX.10.086502

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  64. Temperature dependence of protection layer formation on organic trench sidewall in H-2/N-2 plasma etching with control of substrate temperature

    Fukunaga Yusuke, Tsutsumi Takayoshi, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 7 )   2017年7月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.56.076202

    Web of Science

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  65. Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy

    Furuta Ryo, Kurake Naoyuki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Kondo Hiroki, Ohta Takayuki, Ito Masafumi, Sekine Makoto, Hori Masaru

    PHYSICAL CHEMISTRY CHEMICAL PHYSICS   19 巻 ( 21 ) 頁: 13438 - 13442   2017年6月

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    出版者・発行元:Physical Chemistry Chemical Physics  

    DOI: 10.1039/c7cp00489c

    Web of Science

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    PubMed

  66. Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas

    Ueyama Toshinari, Fukunaga Yusuke, Tsutsumi Takayoshi, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Iwata Manabu, Ohya Yoshinobu, Sugai Hideo, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 6 )   2017年6月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.56.06HC03

    Web of Science

    Scopus

  67. Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition

    Tomatsu Masakazu, Hiramatsu Mineo, Foord John S., Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Takeda Keigo, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 6 )   2017年6月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.56.06HF03

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  68. Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 degrees C

    Takai Shinnosuke, Lu Yi, Oda Osamu, Takeda Keigo, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 6 )   2017年6月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.56.06HE08

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  69. Spatial distributions of O, N, NO, OH and vacuum ultraviolet light along gas flow direction in an AC-excited atmospheric pressure Ar plasma jet generated in open air

    Takeda Keigo, Ishikawa Kenji, Tanaka Hiromasa, Sekine Makoto, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 19 )   2017年5月

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    出版者・発行元:Journal of Physics D: Applied Physics  

    DOI: 10.1088/1361-6463/aa6555

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  70. Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas

    Ohya Yoshinobu, Ishikawa Kenji, Komuro Tatsuya, Yamaguchi Tsuyoshi, Takeda Keigo, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 巻 ( 15 )   2017年3月

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    出版者・発行元:Journal of Physics D: Applied Physics  

    DOI: 10.1088/1361-6463/aa60f7

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  71. Behavior of absolute densities of atomic oxygen in the gas phase near an object surface in an AC-excited atmospheric pressure He plasma jet

    Takeda Keigo, Kumakura Takumi, Ishikawa Kenji, Tanaka Hiromasa, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS EXPRESS   10 巻 ( 3 )   2017年3月

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    出版者・発行元:Applied Physics Express  

    DOI: 10.7567/APEX.10.036201

    Web of Science

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  72. Characteristics of optical emissions of arc plasma processing for high-rate synthesis of highly crystalline single-walled carbon nanotubes

    Ando Atsushi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Suzuki Tomoko, Inoue Sakae, Ando Yoshinori, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 3 )   2017年3月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.56.035101

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  73. Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl-2 plasma etching of GaN

    Liu Zecheng, Pan Jialin, Asano Atsuki, Ishikawa Kenji, Takeda Keigo, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 巻 ( 2 )   2017年2月

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.56.026502

    Web of Science

    Scopus

  74. Absolute density of precursor SiH3 radicals and H atoms in H-2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

    Abe Yusuke, Ishikawa Kenji, Takeda Keigo, Tsutsumi Takayoshi, Fukushima Atsushi, Kondo Hiroki, Sekine Makoto, Hori Masaru

    APPLIED PHYSICS LETTERS   110 巻 ( 4 )   2017年1月

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    出版者・発行元:Applied Physics Letters  

    DOI: 10.1063/1.4974821

    Web of Science

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  75. Thermally enhanced formation of photon-induced damage on GaN films in Cl<inf>2</inf> plasma

    Liu Z.

    Japanese Journal of Applied Physics   56 巻 ( 9 )   2017年

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    出版者・発行元:Japanese Journal of Applied Physics  

    DOI: 10.7567/JJAP.56.096501

    Scopus

  76. TIME EVOLUTION OF REACTIVE OXYGEN NITROGEN SPECIES IN PLASMA-ACTIVATED ESSENTIAL MEDIA AND WATER

    Brubaker Timothy, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

    2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS)     2017年

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  77. *低誘電率(Low-k)材料のドライエッチング 招待有り

    関根 誠、堀 勝

    プラズマ・核融合学会誌   85 巻 ( 4 ) 頁: 193-194   2009年4月

     詳細を見る

    担当区分:筆頭著者   記述言語:日本語  

    集積回路の配線遅延を緩和するために配線層間絶縁(Low-k)膜に使用される低誘電率膜のプラズマエッチング技術についての解説。水素と窒素を使用する有機系Low-k膜加工の高精度の形状制御について検討した。特にプラズマ中の窒素ラジカルの作用について議論した。

  78. *Combinatorial Plasma Etching Process 査読有り

    Chang Sung Moon, Keigotakeda, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, and Masaru Hori

    Applied Physics Express   2 巻   頁: 096001   2009年

     詳細を見る

    記述言語:英語   掲載種別:研究論文(学術雑誌)  

    Combinatorial plasma etching, which can be used to acquire large databases and to establish process-science map, is proposed for developing a process for etching low-k dielectric films. This process promises to save the cost and time spent on accumulating scientific databases for optimizing etching processes since it can acquire many results in a single operation. We interpreted the etching characteristics by using internal parameters such as the ion and the radical densities. By doing this, it is possible to eliminate the dependence of the etching characteristics on the etching system.

  79. Background and Challenges for Plasma Etching Tool Development 招待有り 査読有り

    M.Sekine

    Journal of plasma and fusion research   83 巻   頁: 319   2007年

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    担当区分:筆頭著者   記述言語:日本語  

  80. *Measurement of desorbed products by plasma beam irradiation on SiO2 査読有り

    K.Kurihara, Y.Yamaoka, K.Karahashi and M.Sekine

    J. Vac. Sci .Technol. A   22 巻 ( 5 ) 頁: 2311   2004年5月

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    記述言語:英語   掲載種別:研究論文(学術雑誌)  

  81. Effects of Air Exposure on SiO2 Surfaces Irradiated with Fluorocarbon Plasma 査読有り

    K.Kurihara, Y.Yamaoka and M.Sekine

    Jpn. J. Appl. Phys.   43 巻 ( 1 ) 頁: 351-352   2004年1月

     詳細を見る

    記述言語:英語   掲載種別:研究論文(学術雑誌)  

  82. *Dielectric film etching in semiconductor device manufacturing, Development of SiO2 etching and the next generation plasma reactor 招待有り 査読有り

    M.Sekine

    Applied Surface Science   192 巻   頁: 270   2002年

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    担当区分:筆頭著者   記述言語:英語   掲載種別:研究論文(学術雑誌)  

  83. *Approach to systematic research methodology for plasma etching and their future prospects 招待有り

    M.Sekine

    OYO BUTURI   70 巻   頁: 387   2001年

     詳細を見る

    担当区分:筆頭著者   記述言語:日本語  

▼全件表示

科研費 1

  1. 低温プラズマ加工の理論-計算-計測の連携環境構築による一原子一分子制御工学の創成

    研究課題/研究課題番号:21H01073  2021年4月 - 2024年3月

    関根 誠

      詳細を見る

    担当区分:研究代表者 

    配分額:18200000円 ( 直接経費:14000000円 、 間接経費:4200000円 )

 

担当経験のある科目 (本学以外) 1

  1. 電気電子工学先端技術特別講義半導体プロセスデバイス技術

    2009年4月 - 2010年3月 首都大学東京)