Updated on 2022/04/21

写真a

 
HORI, Masaru
 
Organization
Center for Low-temperature Plasma Sciences (cLPS) Professor
Graduate School
Graduate School of Engineering
Title
Professor
Contact information
メールアドレス

Degree 1

  1. 工学博士

Research Areas 1

  1. Others / Others  / Surface Physics

Current Research Project and SDGs 3

  1. Flexible Nano Devices

  2. Measurement of Atoms, Molecules and Radicals Using Laser Spectroscopy

  3. Study on Smart Nano-Process

Research History 12

  1. 名古屋大学低温プラズマ科学研究センター長

    2019.4

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    Country:Japan

  2. 名古屋大学未来社会創造機構 機構長補佐

    2016.4 - 2019.3

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    Country:Japan

  3. 名古屋大学未来社会創造機構 暮らし・健康基盤情報部門長(COI)

    2014.4 - 2017.3

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    Country:Japan

  4. 名古屋大学プラズマ医療科学国際イノベーションセンター長

    2013.8 - 2019.3

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    Country:Japan

  5. NU-SKKU 先端プラズマナノ材料研究所(韓国)研究所長

    2011.11 - 2019.9

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    Country:Korea, Republic of

  6. 名古屋大学大学院工学研究科付属プラズマナノ工学研究センター長

    2009.4 - 2013.3

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    Country:Japan

  7. 名古屋大学教授

    2004.4

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    Country:Japan

  8. 英国ケンブリッジ大学キャベンディシュ研究所客員研究員

    1997.8 - 1997.12

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    Country:Japan

  9. 名古屋大学助教授(工学部)

    1996.7 - 2004.3

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    Country:Japan

  10. 名古屋大学講師(工学部)

    1994.4 - 1996.6

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    Country:Japan

  11. 名古屋大学助手(工学部)

    1992.4 - 1994.3

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    Country:Japan

  12. (株)東芝 総合研究所 超LSI研究所

    1986.4 - 1992.3

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    Country:Japan

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Education 2

  1. Nagoya University   Graduate School, Division of Engineering

    - 1986

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    Country: Japan

  2. Waseda University   Faculty of Science and Engineering   Dept of Electronics and Communication

    - 1981

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    Country: Japan

Professional Memberships 7

  1. プラズマ・核融合学会

  2. 応用物理学会

  3. Materials Research Society

  4. American Vacuum Society

  5. 日本分光学会

  6. 日本表面技術科学会

  7. IEEE

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Committee Memberships 182

  1. 学術振興会「153委員会」プラズマ材料科学   委員長  

    2016.4 - 2017.3   

  2. 日本学術会議   連携委員  

    2011.4   

  3. 応用物理学会   常務理事  

    2009.4 - 2011.3   

  4. 表面技術協会   理事  

    2010.4 - 2012.3   

  5. 応用物理学会 プラズマエレクトロニクス分科会   幹事長  

    2010.4 - 2012.3   

  6. ISPC25   Organizing Committee  

    2023.5   

  7. ICRP-11 / GEC 2022, 11th International Conference on Reactive Plasma / 2022 Gaseous Electronics Conference / 40th Symposium on Plasma Processing (SPP-40) / 35th Symposium on Plasma Science for Materials (SPSM35)   Advisory Committee  

    2022.10   

  8. 9th International Symposium on Control of Semiconductor Interfaces(ISCSI-IX)   International Technical Program Committee.  

    2022.9   

  9. 5th International Symposium on Plasmas for Catalysis and Energy Materials (ISPCEM)   International Advisory Committee  

    2022.7   

  10. The 13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2021)   International Scientific Committee (ISC)  

    2022.2   

  11. The International Symposium of the Vacuum Society of the Philippines (ISVSP 2022) conference   Scientific Program Committee  

    2022.2   

  12. The 43rd International Symposium on Dry Process (DPS2022)   Organizing Committee  

    2022   

  13. 42nd International Symposium on Dry Process (DPS2021)   Organizing Committee  

    2021.11   

  14. The 2nd Plasma Thin films International Union Meeting (PLATHINIUM 2021)   International Scientific Committee  

    2021.9   

  15. Interfinish2020   Chair of International Organizing Committee  

    2021.9   

  16. ISplasma2021/IC-PLANTS2021   Organizing Committee.  

    2021.3   

  17. The 2nd International Workshop on Plasma Agriculture (IWOPA-3)   International Organizing Committee  

    2021.3   

  18. The 10th Global Nanotechnology Congress and Expo (Nano-2020)   Organizing Committee  

    2020.11   

  19. The 8th International Conference on Plasma Medicine (ICPM-8)   Board & International Scientific Committee  

    2020.11   

  20. The 11th International Symposium on Plasma Nanoscience (iPlasmaNano-XI)   Executive Committee  

    2020.9   

  21. ISplasma2020/IC-PLANTS2020   Advisory Committee.  

    2020.3   

  22. 41st International Symposium on Dry Process (DPS2019)   Organizing Committee.  

    2019.11   

  23. 8th International Symposium on Control of Semiconductor Interfaces   International Technical Program Committee  

    2019.11   

  24. 41st International Symposium on Dry Process Symposium (DPS2019)   Vice Chair of Executive Committee and Organizing Committee  

    2019.11   

  25. The 10th International Symposium on Plasma Nanoscience (iPlasmaNano-X)   Executive Committee  

    2019.9   

  26. The 12th Asian-European International Conference on Plasma Surface Engineering(AEPSE 2019)   International Program Committee  

    2019.9   

  27. Plasma Thin film International Union Meeting, PLATHINIUM   International Scientific Committee  

    2019.9   

  28. International Symposium on Plasma Chemistry (ISPC24)   International Organizing Committee  

    2019.6   

  29. 6th International Workshop on Plasma for Cancer Treatment (IWPCT 2019)   International Scientific Committee  

    2019.4   

  30. ISplasma2019/IC-PLANTS2019,   Organizing Committee  

    2019.3   

  31. 40th International Symposium on Dry Process (DPS2018)   Executive Committee Chair / Organizing Committee  

    2018.11   

  32. 40th International Symposium on Dry Process Symposium (DPS2018)   Chair of Executive Committee and Organizing Committee  

    2018.11   

  33. 2018 International Symposium on Plasmas for Catalysts and Energy Materials (ISPCEM-2018)   International Advisory Board  

    2018.10   

  34. The 8th International Workshop on Plasma Spectroscopy (IPS 2018)   International Scientific Committee  

    2018.9   

  35. 2018 Asia-Pacific Conference on Plasma and Terahertz Science (APCOPTS)   International Advisory Committee  

    2018.8   

  36. The 9th International Symposium on Plasma Nanoscience (iPlasmaNano-IX)   Executive Committee  

    2018.8   

  37. 7th International Conference on Microelectronics and Plasma Technology (ICMAP 2018)   International Advisory Committee  

    2018.7   

  38. The 7th International Conference on Microelectronics and Plasma Technology (ICMAP 2018)   International Advisory Committee  

    2018.7   

  39. 7th International Conference on Plasma Medicine (ICPM-7)   Board & International Scientific Committee  

    2018.6   

  40. Joint International Conference on ICMAP 2018, APCPST 2018, and ISPB 2018   International Advisory Committee  

    2018.6   

  41. ISplasma2018/IC-PLANTS2018   Organizing Committee.  

    2018.3   

  42. The 2nd International Workshop on Plasma Agriculture (IWOPA-2)   International Organizing Committee  

    2018.3   

  43. 5th International Workshop on Plasma for Cancer Treatment (IWPCT 2018)   International Scientific Committee  

    2018.3   

  44. 39th International Symposium on Dry Process Symposium (DPS2017)   Organizing Committee  

    2017.11   

  45. The 8th International Symposium on Plasma Nanoscience (iPlasmaNano-IIIV)   Executive Committee  

    2017.9 - 2017.10   

  46. The 11th Asian-European International Conference on Plasma Surface Engineering(AEPSE 2017)   Organizing Committee Co-Chair.  

    2017.9   

  47. 2017 International Forum on Functional Materials (IFFM2017)   International Advisory Board  

    2017.6   

  48. Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials   Co-Chair  

    2017.4   

  49. ISplasma2017/IC-PLANTS2017, March 1-5 2017   Organizing Committee  

    2017.3   

  50. The 3rd International Workshop on Advanced Plasma Technology and Applications   Organizing Committee  

    2017.1   

  51. 38th International Symposium on Dry Process Symposium (DPS2016)   Organizing Committee  

    2016.11   

  52. The 3rd International Conference on Universal Village (UV 2016)   Session Chair (Intelligent Healthcare)  

    2016.10   

  53. The 3rd International Conference on Universal Village (UV 2016)   Session Chair (Intelligent Healthcare)  

    2016.10   

  54. The 7th International Symposium on Plasma Nanoscience (iPlasmaNano-IIV)   Executive Committee.  

    2016.9 - 2016.10   

  55. The 6th International Conference on Plasma Medicine (ICPM-6)   Board & International Scientific Committee.  

    2016.9   

  56. 15th International Conference on Plasma Surface Engineering (PSE 2016)   Conference Co-chairman  

    2016.9   

  57. ・The 6th International Conference on Microelectronics and Plasma Technology (ICMAP2016), September 26-29, 2016, Gyeongju Dream Center, Gyeongju, Korea. International Advisory Committee,   International Advisory Committee  

    2016.9   

  58. 20th International Vacuum Congress (IVC-20)   International Scientific Committee in Plasma Science and Technique Division  

    2016.8   

  59. ・2016 International Symposium on Plasma for Catalysts and Energy Materials (ISPCEM-2016)   International Advisory Board.  

    2016.6 - 2016.7   

  60. 43rd IEEE International Conference on Plasma Science   Session Organizer  

    2016.6   

  61. 7th International Workshop on Plasma Spectroscopy (IPS 2016)   International Scientific Committee.  

    2016.6   

  62. ISplasma2016/IC-PLANTS2016, March 6-10, 2016   Organizing Committee  

    2016.3   

  63. The 3rd International Workshop on Plasma for Cancer Treatment, 2016   International Scientific Committee.  

    2016   

  64. 37th International Symposium on Dry Process Symposium (DPS2015)   Organizing  

    2015.11   

  65. 21th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials   Co-Chair  

    2015.10   

  66. 9th International Conference on Reactive Plasmas / 68th Gaseous Electronics Conference/ 33rd Symposium on Processing Plasmas   Advisory Committee  

    2015.10   

  67. The 6th International Symposium on Plasma Nanoscience (iPlasmaNano-IV)   Executive Committee  

    2015.9 - 2015.10   

  68. The 10th Asian-European International Conference on Plasma Surface Engineering(AEPSE 2015)   Organizing Committee Chair  

    2015.9   

  69. 22th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics, The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials & The 1st International Workshop on Advanced Plasma Technology and Application   Chair  

    2015.7   

  70. The 32nd International Conference on Phenomena in Ionized Gases (ICPIG2015)   International Organizing Committee  

    2015.7   

  71. ISplasma2015/IC-PLANTS2015, March 26-31, 2016   Organizing Committee  

    2015.3   

  72. ・20th Workshop on Advanced Plasma Processes and Diagnostics & The 7th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, Jan. 27 ~ 29, 2015. Hokkaido University, Sapporo, Japan, Chair.   Chair  

    2015.1   

  73. The 2nd International Workshop on Plasma for Cancer Treatment (Nagoya 2015)   Chair of Organizing Committee & International Scientific Committee  

    2015   

  74. 36th International Symposium on Dry Process Symposium (DPS2014)   Organizing Committee  

    2014.11   

  75. The 5th International Symposium on Plasma Nanoscience (iPlasmaNano-V)   Executive Committee  

    2014.9 - 2014.10   

  76. International Symposium on Plasmas for Catalysts and Energy Materials (ISPCEM-2014)   International Advisory Board  

    2014.9   

  77. 14th international conference on Plasma Surface Engineering (PSE 2014)   International Advisory Board  

    2014.9   

  78. 14th International Conference on Plasma Surface Engineering (PSE 2012)   International Advisory Board  

    2014.9   

  79. The 5th International Conference on Microelectronics and Plasma Technology (ICMAP 2014)   International Advisory Committee  

    2014.7   

  80. ISplasma2014/IC-PLANTS2014   Organizing Committee  

    2014.3   

  81. 18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics   Chair  

    2014.2   

  82. 8th International Conference on Reactive Plasmas / 31st Symposium on Plasma Processing   aaaaa  

    2014.2   

  83. International Conference on Plasma Medicine (ISPM)   Board & International Scientific Committee  

    2014   

  84. The first International Workshop on Plasma for Cancer Treatment   International Scientific Committee  

    2014   

  85. The 4th International Symposium on Plasma Nanoscience (iPlasmaNano-IV)   Executive Committee  

    2013.9 - 2013.10   

  86. 35th International Symposium on Dry Process Symposium (DPS2013)   Organizing Committee  

    2013.8   

  87. The 31st International Conference on Phenomena in Ionized Gases (ICPIG2013)   International Organizing Committee  

    2013.7   

  88. 17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials   Co-Chair  

    2013.5   

  89. The 6th International Conference on Plasma-Nano Technology & Science, IC-PLANTS 2013   Organizing Committee  

    2013.2   

  90. ISplasma2013   Organizing Committee Chair  

    2013.1 - 2013.2   

  91. 16th International Workshop on Advanced Plasma Processing and Diagnostics   Chair  

    2013.1   

  92. 34th International Symposium on Dry Process Symposium (DPS2012)   Organizing Committee  

    2012.11   

  93. The 11th Asia Pacific Conference on Plasma Science and Technology (APCPST) / The 25th Symposium on Plasma Science for Materials(SPSM)   Chair of Executive Committee  

    2012.10   

  94. 2012 International Symposium on Plasmas for Catalysts and Energy Materials (ISPCEM-2012)   International Advisory Board  

    2012.9   

  95. 13th International conference on Plasma Surface Engineering (PSE 2012)   International Advisory Board  

    2012.9   

  96. The 2nd International Symposium for Plasma Biosciences (SPB 2012)   Chair of Organizing Committee  

    2012.8   

  97. The 4th International Conference on Microelectronics and Plasma Technology (ICMAP 2012)   International Advisory Committee  

    2012.7   

  98. 15th Korea- Japan workshop for Advanced Plasma Process and Diagnostics   Co-Chair  

    2012.6   

  99. ISplasma2012   Organizing Committee Chair  

    2012.3   

  100. The 5th International Conference on Plasma-Nano Technology & Science, IC-PLANTS 2012   Organizing Committee  

    2012.3   

  101. The 3rd International Symposium on Plasma Nanoscience (iPlasmaNano-III)   International Consultative and Program Committee Executive Committee  

    2012.2 - 2012.3   

  102. 14th International Workshop of Advanced Plasma Processing and Diagnostics & 2nd Workshop for NU- SKKU Joint Institute for Plasma-Nano Materials   Chair  

    2012.1   

  103. The 15th International Conference on Thin Films (ICTF-15)   Organizing Committee  

    2011.11   

  104. 33rd International Symposium on Dry Process Symposium (DPS2011)   Organizing Committee  

    2011.11   

  105. The 4th International Symposium on Plasma Nanoscience (iPlasmaNano-IV)   Executive Committee  

    2011.9 - 2011.10   

  106. 112 IUVSTA Executive Council Meeting and 4th International Conference on Advanced Plasma Technologies with Workshop   Program Committee  

    2011.9   

  107. The 8th Asian-European International Conference on Plasma Surface Engineering (AEPSE2011)   International Organizing Committee  

    2011.9   

  108. The 30th International Conference on Phenomena in Ionized Gases (ICPIG2011)   International Scientific Committee  

    2011.8 - 2011.9   

  109. Advanced Plasma Technology for Green Energy and Biomedical Applications (APT 2011)   International Organizing Committee  

    2011.8   

  110. The 1st International Symposium for Plasma Biosciences / The 1st Annual Workshop for Plasma Bioscinece Research Center   Chair of Organizing Committee  

    2011.8   

  111. 13th International Workshop on Advanced Plasma Processing and Diagnostics   Chair  

    2011.7   

  112. International Symposium on Plasma Chemistry (ISPC20)   Board of Director of the International Plasma Chemistry Society (IPCS)  

    2011.7   

  113. The 6th International Symposium on Control of Semiconductor Interfaces(ISCSI-VI)   Technical program committee  

    2011.5   

  114.   実行委員長  

    2011.4 - 2012.3   

  115. 第58回応用物理学会関係連合講演会   運営委員長  

    2011.3   

  116. The 4th International Conference on Plasma-Nano Technology & Science, IC-PLANTS 2013   Organizing Committee  

    2011.3   

  117. The 4th International Conference on Plasma-Nano Technology & Science (IC-PLANTS 2011)   Organizing Committee  

    2011.3   

  118. ISplasma2011   Organizing Committee Chair  

    2011.3   

  119. 2nd International Workshop on Plasma nano-Interface and Plasma Characterization   Organizing Committee  

    2011.3   

  120. 12th International Workshop of Advanced Plasma Processing and Diagnostics   Chair  

    2011.1   

  121. 2011 International Conference on Solid State device and materials (SSDM2011)   Chair of Steering Committee  

    2011   

  122. 32nd International Symposium on Dry Process Symposium (DPS2010)   Organizing Committee  

    2010.11   

  123. 7th International Conference on Reactive Plasmas / 63rd Gaseous Electronics Conference/28th Symposium on Processing Plasmas   Chair of Organize Committee  

    2010.10   

  124. The 2nd International Symposium on Plasma Nanoscience (iPlasmaNano-II)   Executive Committee  

    2010.9 - 2010.10   

  125. 第71回応用物理学会学術講演会   運営委員長  

    2010.9   

  126. 2010 International Conference on Solid State device and materials (SSDM)   Vice Chair of Steering Committee  

    2010.9   

  127. 10th Asia-Pacific Conference on Plasma Science and Technology (APCPST) and 23rd Symposium on Plasma Science for Materials (SPSM)   Program Committee  

    2010.7   

  128. 11th International Workshop on Advanced Plasma Processing and Diagnostics   Co-Chair  

    2010.7   

  129. The 3rd International Conference on Plasma-Nano Technology & Science, IC-PLANTS 2010   Organizing Committee Chair  

    2010.3   

  130. ISplasma2010   Organizing Committee Chair  

    2010.3   

  131. The 3rd International Conference on Plasma-Nano Technology & Science (IC-PLANTS 2010)   Organizing Committee Chair  

    2010.3   

  132. 10th International Workshop of Advanced Plasma Processing and Diagnostics   Chair  

    2010.1   

  133. The 2nd International Symposium on Plasma Nanoscience (iPlasmaNano-II)   Executive Committee  

    2009.9   

  134. The 29th International Conference on Phenomena in Ionized Gases (ICPIG2015)   International Organizing Committee  

    2009.9   

  135. 7th International Workshop on Microwave Discharges: Fundamentals and Applications (MD7)   Steering Committee  

    2009.9   

  136. 31st International Symposium on Dry Process Symposium (DPS2009)   Organizing Committee  

    2009.9   

  137. Joint International Conference of Asian-European International Conference on Plasma and Ion surface Engineering (AEPSE) / The 2nd International Conference on Microelectronics and Plasma Technology (ICMAP) /DPS   International Organizing Committee and Scientific Program Committee  

    2009.9   

  138. The 2nd International Conference on Microelectronics and Plasma Technology (ICMAP 2009)   International Advisory Committee  

    2009.9   

  139. The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP 2011)   International Advisory Committee  

    2009.9   

  140. 9th Korea-Japan Workshop on Thin Film and Plasma Process for Green Technology Advanced Plasma Diagnostics for Plasma-Nano Processing   Co-Chair  

    2009.7   

  141. 19th International Symposium on Plasma Chemistry   International Plasma Chemistry Society (IPCS) Board of Directors  

    2009.7   

  142. ISplasma2009   Organizing Committee Chair  

    2009.3   

  143. 8th International Workshop of Advanced Plasma Processing and Diagnostics, Joint Workshop with Plasma Application Monodzukuri(PLAM)   Chair  

    2009.1   

  144. The 2nd International Conference on Plasma-Nano Technology & Science, IC-PLANTS 2009   Organizing Committee Vice Chair  

    2009.1   

  145. 30th International Symposium on Dry Process Symposium (DPS2008)   Organizing Committee  

    2008.11   

  146. 2008 International Microprocess and Nanotechnology Conference (MNC)   Executive Committee  

    2008.10   

  147. The 1st International Conference on Microelectronics and Plasma Technology (ICMAP 2008)   Executive Committee  

    2008.8   

  148. 7th Korea-Japan Workshop on Plasma Technology Thin Film and Plasma Technology for Next Generation Energy Advanced Plasma Diagnostics for Plasma-Nano Processing   Co-Chair  

    2008.7   

  149. The 3rd International School of Advanced Plasma Technology   Scientific Organizing Committee  

    2008.7   

  150. The 1st International Conference on Plasma-Nano Technology & Science, IC-PLANTS 2008   Organizing Committee Vice Chair  

    2008.3   

  151. Fifth International Symposium on Control of Semiconductor Interfaces―for Next Generation ULSI Process Integrations―   Program Committee  

    2007.11   

  152. 29th International Symposium on Dry Process Symposium (DPS2007)   Organizing Committee  

    2007.11   

  153. The 6th Asian-European International Conference on Plasma Surface Engineering (AEPSE)   International Organizing Committee  

    2007.9   

  154. The 18th International Symposium on Plasma Chemistry (ISPC-18)   Local Executive Committee  

    2007.8   

  155. The 16th International Colloquium on Plasma Processes (CIP)   International Science Committee  

    2007.6   

  156. 5th International Symposium on Advanced Plasma Processes and Diagnostics & The 1st International Symposium on Flexible Electronics Technology   Co-Chair  

    2007.4   

  157. 6th International Workshop on Advanced Plasma Processing and Diagnostics & The 3rd Plasma Application Monodzukuri (PLAM)   Chair  

    2007.1   

  158. 2nd International workshop on Infrared plasma diagnostics   International Science Committee  

    2007   

  159. 4th Workshop on Advanced Plasma Processing and Diagnostics   Chair  

    2006.12   

  160. 28th International Symposium on Dry Process Symposium (DPS2006)   Chair of Executive Committee and Organizing Committee  

    2006.11 - 2006.12   

  161. 38th International Symposium on Dry Process Symposium (DPS2016)   Organizing Committee  

    2006.11   

  162. The 1st International Workshop on Infrared Plasma Spectroscopy   International Scientific Committee  

    2006.6   

  163. 3rd Workshop on Advanced Plasma Processing and Diagnostics   Co-Chair  

    2006.4   

  164. The 6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing (ICRP-6/SPP-23)   Organizing Committee / Program Committee / Vice Chair of Fundraising Committee  

    2006.1   

  165. The Ist International workshop on Infrared plasma diagnostics   International Science Committee  

    2006   

  166. The 6th Korea-Japan Symposium on Plasma and Thin Film Technology   Advisory Committee  

    2006   

  167. 8th Asia-Pacific Conference on Plasma Science and Technology / 19th Symposium on Plasma Science for Materials ASCPST   International Program Committee  

    2006   

  168. 2nd Workshop on Advanced Plasma Processing and Diagnostics   Co-Chair  

    2005.12   

  169. 27th International Symposium on Dry Process Symposium (DPS2005)   Chair of Executive Committee and Organizing Committee  

    2005.11   

  170. International Symposium on EcoTopia Science 2005 (ISETS05)   Secretariats  

    2005.8   

  171. 15th International Colloquium on Plasma Process (CIP 05)   International Scientific Committee  

    2005.6   

  172. 応用物理学会   東海支部長  

    2005.4 - 2007.3   

  173. 1st Workshop on Advanced Plasma Processing and Diagnostics   Chair  

    2005.4   

  174. International Symposium on EcoTopia Science (ISETS05)   Session Organizer  

    2005   

  175. 26th International Symposium on Dry Process Symposium (DPS2004)   Chair of Executive Committee and Organizing Committee  

    2004.11 - 2004.12   

  176. The 2nd International School of Advanced Plasma Technology   Scientific Organizing Committee  

    2004.9 - 2004.10   

  177. International COE Forum on Plasma Science and Technology,   Local Organizing Committee  

    2004.4   

  178. International Workshop on Plasma Nano-Technology and Its Future Vision   Vice Chair of Organizing Committee and Chair of Local Organizing Committee  

    2004.2   

  179. 25th International Symposium on Dry Process Symposium (DPS2003)   Chair of Executive Committee and Organizing Committee  

    2003.11   

  180. 2003 International Microprocess and nanotechnology Conference,   Program Committee, Etching and Deposition Technologies, Section Head  

    2003.10   

  181. 24th International Symposium on Dry Process Symposium (DPS2002)   Organizing Committee  

    2002.11   

  182. 23th International Symposium on Dry Process Symposium (DPS2001)   Chair of Program Committee and Organizing Committee  

    2001.11   

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Awards 36

  1. The Best Short Presentation (poster) Awards

    2022.3   14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma-Nano Technology & Science (ISPlasma2022/IC-PLANTS2022)   Enhanced Bioremediation of 4-Chlorophenol by Oxygen Radical Treatment Based on Non-Thermal Atmospheric Pressure Plasma

    Hiroyuki Kato, Kiyota Sakai, Shou Ito, Naoyuki Iwata, Masafumi Ito, Masaru Hori, Motoyuki Shimizu and Masashi Kato

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    Award type:International academic award (Japan or overseas)  Country:Japan

  2. The Best Short Presentation (poster) Awards

    2022.3   14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma-Nano Technology & Science (ISPlasma2022/IC-PLANTS2022)   Carbon Layer Formation on Boron Nitride via a Plasma in Hydroquinone Solution

    Kenichi Inoue, Noritaka Sakakibara, Taku Goto, Tsuyohito Ito, Yoshiki Shimizu, Kenji Ishikawa, Masaru Hori and Kazuo Terashima

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    Award type:International academic award (Japan or overseas)  Country:Japan

  3. 第43回(2021年度)応用物理学会論文賞

    2022.3   応用物理学会  

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    Award type:Award from Japanese society, conference, symposium, etc. 

  4. The Best Oral Presentation Awards

    2022.3   14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma-Nano Technology & Science (ISPlasma2022/IC-PLANTS2022)   Evaluation of Selective Anti-Cancer Effect in Plasma-Activated Ringer's Lactate Solution Produced by Regulated Surrounding Atmosphere

    Daiki Ito, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Kae Nakamura, Camelia Miron, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno and Masaru Hori

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

  5. DPS Paper Award

    2021.11   DPS(International Symposium on Dry Process)   Formation mechanism of sidewall striation in high-aspect-ratio hole etching

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

    This award is to be offered to the authors of the best paper published in the Special Issues of Japanese Journal of Applied Physics (JJAP) for DPS in the past 3 years (i.e., DPS 2017, 2018, and 2019) . The awardee(s) of the Best Presentation Award or Young Researcher Award is/are also eligible for this award.

  6. DPS Nishizawa Award 2020

    2021.11   DPS(International Symposium on Dry Process)  

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

    DPS Nishizawa Award is to be presented to an individual who has made outstanding contributions to DPS as well as significant academic/technological achievements in the fields of interest to DPS.

  7. The Best Short Presentation Awards, ISPlasma2021/IC-PLANTS2021

    2021.3   13th anniversary International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2021) / 14th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2021)   Study of Etching Process Using Gas Condensed Layer at Cryogenic Temperature 2

    Masahiro Hazumi, Suganthamalar Selvaraj, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

  8. The Best Oral Presentation Awards, ISPlasma2021/IC-PLANTS2021

    2021.3   13th anniversary International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2021) / 14th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2021)   Dependency of bactericidal effect in oxygen-radical-exposed E. coli suspension containing L-tryptophan on its concentration

    N. Iwata, K. Ishikawa, H. Hashizume, H. Tanaka, J.-S. Oh, M. Ito, M. Hori

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  9. The Best Oral Presentation Award, ISPlasma2021/IC-PLANTS2021

    2021.3   13th anniversary International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2021) / 14th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2021)   Design of Removal Process of SnO2 on Glass by H2/Ar Plasma at Atmospheric Pressure and Medium Pressure

    Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa and Masaru Hori

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    Award type:Award from international society, conference, symposium, etc. 

  10. The Best Short Presentation Awards, ISPlasma2021/IC-PLANTS2021

    2021.3   13th anniversary International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlsma2021) / 14th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2021)   Apoptosis-inducing Activity through Caspase-9 of Radical-Activated Lactate Ringers Solution for Melanoma Cells

    Yuki Hori, Tomiyasu Murata, Hiromasa Tanaka, Masaru Hori and Masafumi Ito

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    Award type:Award from international society, conference, symposium, etc. 

  11. 2020 AAPPS-DPP Plasma Innovation Prize

    2020.10   Division of Plasma Physics, Association of Asia-Pacific Physical Societies(AAPPS-DPP)  

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    Award type:International academic award (Japan or overseas)  Country:Japan

  12. 第18回 プラズマエレクトロニクス賞

    2020.3   公益社団法人 応用物理学会 プラズマエレクトロニクス分科会  

    大村光広、橋本惇一、足立昴拓、近藤祐介、石川勝朗、阿部淳子、酒井伊都子、林久貴、関根誠、堀勝

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    Country:Japan

    Japanese Journal of Applied Physics 58, SEEB02 (2019)

  13. IAAM Award Lecture

    2019.10   International Association of Advanced material (IAAM)   Carbon Nanowalls Propelling Social Innovations

    Masaru Hori

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

  14. K-T Rie Award for the year 2019

    2019.9   Asian-European International Conference on Plasma Surface Engineering (AEPSE2019)  

    Masaru Hori

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    Award type:International academic award (Japan or overseas)  Country:Korea, Republic of

  15. The Best Poster Presentation Awards, ISPlasma2019/IC-PLANTS2019

    2019.3   ISPlasma2019 / IC-PLANTS2019   Cytotoxicity of Plasma-Activated Glucose and Amino Acids

    Maho Yamada, Nanami Ito, Yugo Hosoi, Hiromasa Tanaka, Kenji Ishikawa and Masaru Hori

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

  16. The Best Oral Presentation Awards in the area of Plasma Science, ISPlasma2019/IC-PLANTS2019

    2019.3   ISPlasma2019 / IC-PLANTS2019   Control of sp2-C Fraction and Hardness of Amorphous Carbon Films by Formation of Precursor Radicals Depending on a Residence Time

    Hirotsugu Sugiura, Yasuyuki Ohashi, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine and Masaru Hori

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

  17. The Best Poster Presentation Awards, ISPlasma2019/IC-PLANTS2019

    2019.3   ISPlasma2019 / IC-PLANTS2019   Morphological Dynamics of Dying Cells Incubated in Plasma-Activated Medium

    Nanami Ito, Maho Yamada, Yugo Hosoi, Hiromasa Tanaka, Kenji Ishikawa and Masaru Hori

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

  18. The Best Oral Presentation Awards, ISPlasma2019/IC-PLANTS2019

    2019.3   ISPlasma2019 / IC-PLANTS2019   The Best Oral Presentation Awards in the area of Bio Applications, ISPlasma2019/IC-PLANTS2019

    Naoyuki Iwata, Vladislav Gamaleeve, Jun-SeokOh, Hiroshi Hashizume, Takayuki Ohta, Kenji Ishikawa, Masaru Hori and Masafumi Ito

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    Award type:Award from international society, conference, symposium, etc.  Country:Japan

  19. 2018 The Plasma Medical Award

    2018.6   ICPM7  

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    Award type:Award from international society, conference, symposium, etc.  Country:United States

  20. Best Presentation Award

    2016.3   ISPlasma2016/10th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  

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    Country:Japan

  21. 第37回(2015年度)応用物理学会論文賞

    2015.9   応用物理学会  

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    Country:Japan

  22. 第11回プラズマエレクトロニクス賞

    2013.3   応物理学会プラズマエレクトロニクス分科会  

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    Country:Japan

    石川健治、河野昭彦、堀邊英夫、竹田圭吾、近藤博基、関根誠、堀勝

  23. 五大成果(全2,000件のうちトップ5)

    2013.2   文部科学省ナノテクノロジーネットワーク事業(平成19年~24年)  

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    Country:Japan

    田畑泰彦 堀勝 馬場嘉信(カーボンナノウォールの細胞培養基材としての特性評価)

  24. ISPlasma2013 Best Poster Presentation Award

    2013.2   5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2013)  

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    Country:Japan

  25. 応用物理学会東海支部貢献賞

    2013.1   応用物理学会  

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    Country:Japan

  26. 11th APCPST and 25th SPSM Plasma Science Award

    2012.10   11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  

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    Country:Japan

  27. 応用物理学会 第6回(2012年度)フェロー表彰

    2012.9   公益社団法人応用物理学会  

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    Country:Japan

    ラジカル制御プラズマプロセスの研究開発

  28. 第14回プラズマ材料科学賞(基礎部門賞)

    2012.8   日本学術振興会  

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    Country:Japan

    原子状ラジカル制御 プラズマプロセスの基礎的研究

  29. The Distinguished Professor Award

    2012.6  

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    Country:Japan

  30. 高温学会 論文賞

    2012.3   社団法人高温学会  

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    Country:Japan

    フレキシブルデバイス創製に向けたプラズマーソフトマテリアル相互作用の解析

  31. 第9回産学官連携功労者表彰(科学技術政策担当大臣賞)

    2011.9   第10回産学官連携推進会議  

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    Country:Japan

    産学連携功労者表彰

  32. 平成22年度科学技術分野の文部科学大臣表彰・科学技術賞(研究部門)

    2010.4   文部科学省  

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    Country:Japan

  33. Plasma Material Science Award

    2004  

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    Country:Japan

  34. JJAP Editorial Contribution Award

    2004  

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    Country:Japan

  35. Plasam Electronics Award

    2003  

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    Country:Japan

  36. Microprocess and Nanotechnology 2000 Award

    2001   Microprocess and Nanotechnology 2000  

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    Country:Japan

▼display all

 

Papers 668

  1. In-liquid plasma synthesis of iron–nitrogen-doped carbon nanoflakes with high catalytic activity Reviewed

    Hiroki Kondo,Ryo Hamaji,Tomoki Amano,Kenji Ishikawa,Makoto Sekine,Mineo Hiramatsu,Masaru Hori

    Plasma Processes and Polymers     2022.4

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    Language:English  

  2. Low-temperature reduction of SnO2 by floating wire-assisted medium-pressure H2/Ar plasma Reviewed

    Nguyen, Thi-Thuy-Nga; Sasaki, Minoru; Hsiao, Shih-Nan; Tsutsumi, Takayoshi; Ishikawa, Kenji; Hori, Masaru

    Plasma Processes and Polymers     2022.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: https://doi.org/10.1002/ppap.202100209

  3. Scaffolds with isolated carbon nanowalls promote osteogenic differentiation through Runt-related transcription factor 2 and osteocalcin gene expression of osteoblast-like cells Reviewed

    Tomonori Ichikawa, Kenji Ishikawa, Hiromasa Tanaka, Naohiro Shimizu, and Masaru Hori

    AIP Advances   Vol. 12 ( 2 )   2022.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/5.0075530

  4. Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride, Reviewed

    Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Yuko Hanaoka, Masaru Izawa, Kenji Ishikawa, and Masaru Hori

    Journal of Vacuum Science & Technology B   Vol. 40 ( 2 )   2022.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1116/6.0001660

  5. Tetrachloroaurate (III)-induced oxidation increases non-thermal plasma-induced oxidative stress Reviewed

    Yasumasa Okazaki, Kanako Sasaki, Nanami Ito, Hiromasa Tanaka, Ken-Ichiro Matsumoto, Masaru Hori & Shinya Toyokuni

    Free Radical Research   Vol. 55 ( 8 )   2022.1

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    Language:English  

    DOI: 10.1080/10715762.2022.2026348

  6. Nitrogen Atom Density Measurements in NAGDIS-T Using Vacuum Ultraviolet Absorption Spectroscopy

    Nishio Ryosuke, Kajita Shin, Tanaka Hirohiko, Asaoka Koji, Tsutsumi Takayoshi, Hori Masaru, Ohno Noriyasu

    PLASMA AND FUSION RESEARCH   Vol. 17   2022.1

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    Language:Japanese  

    DOI: 10.1585/pfr.17.1201004

    Web of Science

  7. プラズマ生命エレクトロニクスの幕開 Invited Reviewed

    堀 勝

    化学工業   ( 863 ) page: 1 - 5   2022.1

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    Authorship:Lead author   Language:Japanese   Publishing type:Research paper (scientific journal)  

  8. Enhancement of ethanol production and cell growth in budding yeast by direct irradiation of low-temperatur Reviewed

    Hiromasa Tanaka, Shogo Matsumura, Kenji Ishikawa, Hiroshi Hashizume, Masafumi Ito, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Mikako Ito, Kinji Ohno, Yasumasa Okazaki, Shinya Toyokuni, Masaaki Mizuno and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 61 ( SA )   2022.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ac2037

    Web of Science

  9. ハイパーサーミアがん治療への相乗効果―プラズマ活性酢酸リンゲル液との併用 Reviewed

    田中 宏昌, 堀 勝

    日本ハイパーサーミア学会誌   Vol. 37 ( 4 ) page: 141 - 142   2021.12

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

    DOI: 10.3191/thermalmed.37.141 https://www.jstage.jst.go.jp/article/thermalmed/37/4/37_141/_article/-char

  10. Low Temperature Plasma for Biology, Hygiene, and Medicine: Perspective and Roadmap Reviewed

    Mounir Laroussi, Sander Bekeschus, Michael Keidar, Annemie Bogaerts, Alexander Fridman, XinPei Lu, Kostya (Ken)Ostrikov, Masaru Hori, Katharina Stapelmann, Vandana Miller, Stephan Reuter, Christophe Laux, Ali Mesbah, James Walsh, Chunqi Jiang, Selma Mededovic Thagard, Hiromasa

    IEEE Transaction on Radiation and Plasma Medical Sciences   Vol. 6 ( 2 )   2021.12

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    Language:English  

    DOI: 10.48550/arXiv.2108.03158

  11. On the etching mechanism of highly hydrogenated sin films by CF4/D2 plasma: Comparison with CF4/H2 Reviewed

    Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

    Coatings   Vol. 11 ( 12 )   2021.12

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    Language:English  

    DOI: https://doi.org/10.3390/coatings11121535

  12. プラズマによるがん治療 -2021年の状況と将来展望- Reviewed

    石川 健治、 堀 勝

    静電気学会誌   Vol. 45 ( 6 ) page: 2 - 8   2021.12

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  13. Reaction Mechanism & Selectivity Control of Si-Compound ALE Based on Plasma Modification and F-radical Exposure Reviewed

    Vervuurt Ren, Mukherjee Bablu, Nakane Kazuya, Tsutsumi Takayoshi, Hori, Masaru, Kobayashi, Nobuyoshi

    LANGMUIR   Vol. 37 ( 43 ) page: 12519 - 12766   2021.10

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    DOI: 10.1021/acs.langmuir.1c02036

  14. 窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス Reviewed

    堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝

    プラズマ・核融合学会誌   Vol. 97 ( 9 ) page: 517 - 521   2021.9

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  15. Low temperature plasma irradiation products of sodium lactate solution that induce cell death on U251SP glioblastoma cells were identified. Reviewed

    HiromasaTanaka, Yugo Hosoi, Kenji Ishikawa, JunYoshitake, Takahiro Shibata, Koji Uchida, Hiroshi Hashizume, Masaaki Mizuno, Yasumasa Okazaki, ShinyaToyokuni, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaru Hori

    Scientific Reports     2021.9

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    Language:English  

    DOI: 10.1038/s41598-021-98020-w

  16. 先端プラズマプロセスが実現するバイオ・ライフテクノロジー Reviewed

    堀 勝

    化学工学   Vol. 85 ( 9 ) page: 478 - 479   2021.9

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    Authorship:Lead author   Language:Japanese  

  17. Novel Method of Rebound Tailing Pulse (RTP) for Water Dissociation Reviewed

    Naohiro Shimizu; Ranjit R. Borude; Reiko Tanaka; Kenji Ishikawa; Osamu Oda; Hiroki Hosoe; Satoshi Ino; Yosuke Inoue; Masaru Hori

    IEEE Transactions on Plasma Science   Vol. 49 ( 9 ) page: 2893 - 2900   2021.8

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    Language:English  

    DOI: 10.1109/TPS.2021.3102639

  18. Evidence of near-the-limit energy cost NO formation in atmospheric spark discharge Reviewed

    Nikolay Britun, Vladislav Gamaleev and Masaru Hori

    Plasma Sources Science and Technology   Vol. 30 ( 8 )   2021.8

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    DOI: https://doi.org/10.1088/1361-6595/ac12bf

  19. Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures Reviewed

    Shih-Nan Hsiao,Nikolay Britun,Thi-Thuy-Nga Nguyen,Takayoshi Tsutsumi,Kenji Ishikawa,Makoto Sekine,Masaru Hori,

    Plasma Processes and Polymers   Vol. 18 ( 11 )   2021.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.202100078

  20. Plasma-activated Ringer's lactate solution inhibits the cellular respiratory system in HeLa cells Reviewed

    Hiromasa Tanaka,Shogo Maeda,Kae Nakamura,Hiroshi Hashizume,Kenji Ishikawa,Mikako Ito,Kinji Ohno,Masaaki Mizuno,Yashiro Motooka,Yasumasa Okazaki,Shinya Toyokuni,Hiroaki Kajiyama,Fumitaka Kikkawa,Masaru Hori

    PLASMA PROCESSES AND POLYMERS   Vol. 18 ( 10 )   2021.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.202100056

  21. Non-thermal plasma-induced DMPO-OH yields hydrogen peroxide Reviewed

    Yasumasa Okazaki HiromasaTanaka Ken-Ichiro Matsumoto Masaru Hori ShinyaToyokuni

    Archives of Biochemistry and Biophysics   Vol. 705   2021.7

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    Language:English  

    DOI: 10.1016/j.abb.2021.108901

  22. Brain cell proliferation in adult rats after irradiation with nonequilibrium atmospheric pressure plasma Reviewed

    Yamato Masanori, Tamura Yasuhisa, Tanaka Hiromasa, Ishikawa Kenji, Ikehara Yuzuru, Hori Masaru, Kataoka Yosky

    Applied Physics Express   Vol. 14 ( 36 )   2021.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: https://doi.org/10.35848/1882-0786/ac03c1

  23. Cancer Treatments Using Low-Temperature Plasma Reviewed

    Hiromasa Tanaka , Masaaki Mizuno , Kenji Ishikawa , Shinya Toyokuni , Hiroaki Kajiyama , Fumitaka Kikkawa , Masaru Hori

    Current Medicinal Chemistry   Vol. 28 ( 41 ) page: 8549 - 8558   2021.6

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    DOI: 10.3390/coatings11121535

  24. Hydrogen peroxide in lactate solutions irradiated by non-equilibrium atmospheric pressure plasma Reviewed

    Yang Liu, Kenji Ishikawa, Camelia Miron, Hiroshi Hashizume, Hiromasa Tanaka and Masaru Hori

    Plasma Sources Science and Technology   Vol. 30   2021.4

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  25. Lysosomal nitric oxide determines transition from autophagy to ferroptosis after exposure to plasma-activated Ringer's lactate Reviewed

    LiJianga, Hao Zhenga, Qinying Lyua Shotaro Hayashi, Kotaro Satoa, Yoshitaka Sekido, Kae Nakamura, Hiromasa Tanaka, Kenji Ishikawa, Hiroaki Kajiyama, Masaaki Mizuno, Masaru Hori, ShinyaToyokuni

    Redox Biology   Vol. 43   2021.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.redox.2021.101989

  26. Plasma-Treated Solutions (PTS) in Cancer Therapy Reviewed

    Hiromasa Tanaka, Sander Bekeschus, Dayun Yan, Masaru Hori, Michael Keidar and Mounir Laroussi

    Cancer   Vol. 13 ( 7 )   2021.4

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    Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/cancers13071737

  27. Differential data on the responsiveness of multiple cell types to cell death induced by non-thermal atmospheric pressure plasma-activated solutions Reviewed

    Ko Eto, Chiaki Ishinada, Takuya Suemoto, Keiichiro Hyakutake, Hiromasa Tanaka, Masaru Hori

    Data in Brief   Vol. 36   2021.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.dib.2021.106995

  28. Preclinical Verification of the Efficacy and Safety of Aqueous Plasma for Ovarian Cancer Therapy Reviewed

    Kae Nakamura, Nobuhisa Yoshikawa, Yuko Mizuno, Miwa Ito, Hiromasa Tanaka, Masaaki Mizuno, Shinya Toyokuni, Masaru Hori, Fumitaka Kikkawa and Hiroaki Kajiyama

    Cancer   Vol. 13 ( 5 )   2021.3

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    Language:English  

    DOI: 10.3390/cancers13051141

  29. 小特集 大気圧低温プラズマに対する細胞応答とがん治療への展開 1.はじめに Reviewed

    田 中 宏 昌,堀 勝

    プラズマ・核融合学会誌   Vol. 97 ( 3 ) page: 117 - 118   2021.3

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  30. 小特集 大気圧低温プラズマに対する細胞応答とがん治療への展開 2.プラズマ照射溶液が誘発する細胞死 Reviewed

    田 中 宏 昌,堀 勝

    プラズマ・核融合学会誌   Vol. 97 ( 3 ) page: 119 - 122   2021.3

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  31. 低温プラズマを用いたウイルスの不活性化(-ウイルス滅のプラズマ刃-) Reviewed

    堀 勝,伊藤 昌文

    応用物理学会 特別WEBコラム 新型コロナウィルス禍に学ぶ応用物理     2021.2

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  32. Cyclic C4F8 and O2 plasma etching of TiO2 for high-aspect-ratio three-dimensional devices Reviewed

    Tsubasa Imamura, Itsuko Sakai, Hisataka Hayashi, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 60 ( 3 )   2021.2

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    DOI: 10.35848/1347-4065/abdf78

  33. A novel and distinctive mode of cell death revealed by using non-thermal atmospheric pressure plasma: The involvements of reactive oxygen species and the translation inhibitor Pdcd4 Reviewed

    Ko Eto, Chiaki Ishinada, Takuya Suemoto, Keiichiro Hyakutake, Hiromasa Tanaka, Masaru Hori

    Chemico-Biological Interactions   Vol. 338   2021.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.cbi.2021.109403

  34. Identification of key neutral species in atmospheric‐pressure plasma for promoting proliferation of fibroblast cells Reviewed

    Yuki Hori, Naoyuki Iwata, Vladislav Gamaleev, Jun‐Seok Oh, Tomiyasu Murata, Masaru Hori, Masafumi Ito

    Plasma Processes and Polymers   Vol. 18 ( 4 )   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.202000225

  35. L-Dehydroascorbate efficiently degrades non-thermal plasma-induced hydrogen peroxide Reviewed

    Yasumasa Okazaki, Yuuri Ishidzu, Fumiya Itoa, Hiromasa Tanaka, Masaru Hori, Shinya Toyokuni

    Archives of Biochemistry and Biophysics   Vol. 700   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.abb.2021.108762

  36. Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS) Reviewed

    Ryusei Sakai, Tomonori Ichikawa, Hiroki Kondo , Kenji Ishikawa, Naohiro Shimizu, Takayuki Ohta, Mineo Hiramatsu, Masaru Hori

    Nanomaterials    Vol. 11 ( 262 )   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/nano11020262

  37. Growth inhibition effect on Trypanosoma brucei gambiense by the oxidative stress supplied from low-temperature plasma at atmospheric pressure Reviewed

    Naoaki Yokoyama, Thillaiampalam Sivakumar, Sanae Ikehara, Yoshihiro Akimoto, Takashi Yamaguchi, Ken Wakai, Kenji Ishikawa, Masaru Hori, Tetsuji Shimizu, Hajime Sakakita and Yuzuru Ikehara

    Japanese Journal of Applied Physics   Vol. 60 ( 2 )   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abd464

  38. Cancer Treatments Using Low-Temperature Plasma

    Tanaka Hiromasa, Mizuno Masaaki, Ishikawa Kenji, Toyokuni Shinya, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

    CURRENT MEDICINAL CHEMISTRY   Vol. 28 ( 41 ) page: 8549 - 8558   2021

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  39. Reduction in photon-induced interface defects by optimal pulse repetition rate in the pulse-modulated inductively coupled plasma Reviewed

    Yasufumi Miyoshi, Kenji Ishikawa, Makoto Sekine, Masaru Hori and Tetsuya Tatsumi

    Japanese Journal of Applied Physics   Vol. 60 ( 1 )   2020.12

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    DOI: 10.35848/1347-4065/abd113

  40. 大気圧低温プラズマとバイオ技術応用 Reviewed

    堀 勝

    応用物理    Vol. 89 ( 12 ) page: 701-706   2020.12

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  41. Inactivation mechanism of fungal spores through oxygen radicals in atmospheric-pressure plasma Reviewed

    Masafumi Ito, Hiroshi Hashizume, Jun-Seok Oh, Kenji Ishikawa, Takayuki Ohta and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 60 ( 1 )   2020.12

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    DOI: https://doi.org/10.35848/1347-4065/abcbd1

  42. Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H2 plasma Reviewed

    Shih-NanHsiao, Kazuya Nakane, Takayoshi Tsutsumi, KenjiI shikawa, Makoto Sekine, Masaru Hori

    Applied Surface Science   Vol. 542   2020.11

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    DOI: 10.1016/j.apsusc.2020.148550

  43. Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O2, and Ar Reviewed

    Shih-Nan Hsiao, Kenji Ishikawa, Toshio Hayashi, Jiwei Ni, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

    Applied Surface Science   Vol. 541   2020.11

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    DOI: 10.1016/j.apsusc.2020.148439

  44. Novel Epitaxy for Nitride Semiconductors Using Plasma Technology Reviewed

    Osamu Oda, Masaru Hori

    physica status solidi (a)   Vol. 218 ( 1 )   2020.10

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    DOI: 10.1002/pssa.202000462

  45. Formation of spherical Sn particles by reducing SnO2 film in floating wire-assisted H2/Ar plasma at atmospheric pressure Reviewed

    Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa & Masaru Hori

    Scientific Reports   Vol. 10   2020.10

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    DOI: 10.1038/s41598-020-74663-z

  46. Improvement of yield and grain quality by periodic cold plasma treatment with rice plants in a paddy field Reviewed

    Hiroshi Hashizume Hidemi Kitano Hiroko Mizuno Akiko Abe Genki Yuasa Satoe Tohno Hiromasa Tanaka Kenji Ishikawa Shogo Matsumoto

    Plasma Processes and Polymers   Vol. 18 ( 1 )   2020.10

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    DOI: 10.1002/ppap.202000181

  47. Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources Reviewed

    Atsushi Tanide, Shohei Nakamura, Akira Horikoshi, Shigeru Takatsuji, Takahiro Kimura, Kazuo Kinose, Soichi Nadahara, Masazumi Nishikawa, Akinori Ebe, Kenji Ishikawa, Osamu Oda, and Masaru Hori

    ACS omega   Vol. 5 ( 41 ) page: 26297-26956   2020.10

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    DOI: 10.1021/acsomega.0c03865

  48. Laser-induced-plasma-activated medium enables killing of HeLa cells Reviewed

    Yukihiro Kurokawa, Keigo Takeda, Kenji Ishikawa, Hiromasa Tanaka and Masaru Hori

    Applied Physics Express   Vol. 13 ( 10 )   2020.9

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    DOI: https://doi.org/10.35848/1882-0786/abb68c

  49. Small size gold nanoparticles enhance apoptosis-induced by cold atmospheric plasma via depletion of intracellular GSH and modification of oxidative stress Reviewed

    Mati Ur Rehman, Paras Jawaid, Qing Zhao, Masaki Misawa, Kenji Ishikawa, Masaru Hori, Tadamichi Shimizu, Jun ichi Saitoh, Kyo Noguchi, and Takashi Kondo

    Cell Death Discovery   Vol. 6   2020.9

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    DOI: 10.1038/s41420-020-00314-x

  50. Influence of chamber pressure on the crystal quality of homo-epitaxial GaN grown by radical-enhanced MOCVD (REMOCVD) Reviewed

    Frank Wilson Amalraj, NaohiroShimizu, OsamuOda, KenjiIshikawa, MasaruHori

    Journal of Crystal Growth   Vol. 549   2020.8

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    DOI: 10.1016/j.jcrysgro.2020.125863

  51. Silver film etching using halogen gas plasma Reviewed

    Toshiyuki Sasaki, Kenichi Yoshikawa, Kazuhito Furumoto, Itsuko Sakai, Hisataka Hayashi, Makoto Sekine, and Masaru Hori

    Journal of Vacuum Science & Technology A   Vol. 38 ( 5 ) page: 1-12   2020.8

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    DOI: 10.1116/6.0000286

  52. Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature temperature Reviewed

    Hirotsugu Sugiura, Hiroki Kondo, Kimitaka Higuchi, Shigeo Arai, Ryo Hamaji, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

    Carbon   Vol. 170   page: 93-99   2020.8

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    DOI: 10.1016/j.carbon.2020.07.052

  53. Steering of surface discharges on Through-Glass-Vias (TGVs) combined with high-density nonequilibrium atmospheric pressure plasma generation Reviewed

    Yoichiro Sato, Kaede Katsuno, Hidefumi Odaka, Nobuhiko Imajyo, Kenji Ishikawa and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 53 ( 43 ) page: 1-11   2020.7

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    DOI: 10.1088/1361-6463/aba1ad

  54. Atomic nitrogen density measurements by actinometry method in the toroidal device NAGDIS-T Reviewed

    Shin Kajita, Koji Asaoka, Hirohiko Tanaka, Ryosuke Nishio, Takayoshi Tsutsumi, Masaru Hori, and Noriyasu Ohno

    Japanese Journal of Applied Physics   Vol. 59 ( 8 ) page: 1-6   2020.7

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    DOI: 10.35848/1347-4065/aba456

  55. Measurements of nitrogen atom density in a microwave-excited plasma jet produced under moderate Reviewed

    Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Hajime Sakakita

    IEEJ TRANSACTIONS ON ELECTRICAL AND ELECTRONIC ENGINEERING   Vol. 15 ( 9 )   2020.7

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    DOI: 10.1002/tee.23194

  56. Numerical analysis of coaxial dielectric barrier helium discharges: Three-stage mode transitions and internal bullet propagation Reviewed

    Yosuke Sato, Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori

    Applied Physics Express   Vol. 13 ( 8 ) page: 1-5   2020.7

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  57. Adjusted multiple gases in the plasma flow induce differential antitumor potentials of plasma activated solutions Reviewed

    Kae Nakamura Nobuhisa Yoshikawa Masato Yoshihara Yoshiki Ikeda Akihiro Higashida Akihiro Niwa Takahiro Jindo Hiromasa Tanaka Kenji Ishikawa Masaaki Mizuno Shinya Toyokuni Masaru Hori Fumitaka Kikkawa Hiroaki Kajiyama

    Plasma Processes and Polymers   Vol. 17 ( 10 )   2020.7

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    DOI: 10.1002/ppap.201900259

  58. In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals Reviewed

    Masaki Hasegawa Takayoshi Tsutsumi, Atsushi Tanide, Shohei Nakamura, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Journal of Vacuum Science & Technology A   Vol. 38 ( 4 ) page: 1-11   2020.6

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    DOI: 10.1116/6.0000124

  59. Study of the effect of normal load on friction coefficient and wear properties of CNx thin films Reviewed

    Satyananda Kar, Bibhuti Bhusan Sahu, Hiroyuki Kousaka, Jeon Geon Han, and Masaru Hori

    AIP Advances   Vol. 10 ( 6 ) page: 1-8   2020.6

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    DOI: 10.1063/5.0009783

  60. Atomic oxygen radical induced intracellular oxidization of mould spore Reviewed

    Yuta Tanaka, Jun Seok Oh, Hiroshi Hashizume, Takayuki Ohta, Masashi Kato, Masaru Hori, Masafumi Ito

    Plasma Processes and Polymers   Vol. 17 ( 10 )   2020.6

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    DOI: 10.1002/ppap.202000001

  61. Non-thermal plasma-activated lactate solution kills U251SP glioblastoma cells in an innate reductive manner with altered metabolism Reviewed

    Kenji Ishikawa, Yugo Hosoi, Hiromasa Tanaka, Li Jiang, ShinyaToyokuni, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Masaru Hori

    Archives of Biochemistry and Biophysics   Vol. 688   page: 1-9   2020.5

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    DOI: 10.1016/j.abb.2020.108414

  62. In-plane modification of hexagonal boron nitride particles via plasma in solution Reviewed

    Tsuyohito Ito, Taku Goto, Kenichi Inoue, Kenji Ishikawa, Hiroki Kondo, Masaru Hori, Yoshiki Shimizu, Yukiya Hakuta and Kazuo

    Applied Physics Express   Vol. 13 ( 6 ) page: 1-3   2020.5

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    DOI: 10.35848/1882-0786/ab916c

  63. Electronic properties and primarily dissociation channels of fluoromethane Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine and Masaru

    Japanese Journal of Applied Physics   Vol. 59 ( SJ ) page: 1-12   2020.5

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    DOI: 10.35848/1347-4065/ab7e3f

  64. Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity Reviewed

    Yosuke Sato, Kenji Ishikawa, Takayoshi Tsutsumi, Akio Ui1, Masato Akita, Shotaro Oka and Masaru

    Journal of Physics D: Applied Physics   Vol. 53 ( 26 ) page: 1-14   2020.4

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    DOI: 10.1088/1361-6463/ab7df0

  65. Synthesis of carbon nanowalls on the surface of nanoporous alumina membranes by RI-PECVD method Reviewed

    Yerassyl Yerlanuly, Dennis Christy, Ngo Van Nong, Hiroki Kondo, Balaussa Alpysbayeva, Renata Nemkayeva, Meruert Kadyr, Tlekkabul Ramazanov, Maratbek Gabdullin, Didar Batryshev, Masaru Hori

    Applied Surface Science   Vol. 523   page: 1-6   2020.4

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    DOI: 10.1016/j.apsusc.2020.146533

  66. Characterization of a microsecond pulsed non-equilibrium atmospheric pressure Ar plasma using laser scattering and optical emission spectroscopy Reviewed

    Fengdong JIA, Yong WU, Qi MIN, Maogen SU, Keigo TAKEDA, Kenji ISHIKAWA, Hiroki KONDO,Makoto SEKINE, Masaru HORI and Zhiping ZHONG

    Plasma Science and Technology   Vol. 22 ( 6 ) page: 1-8   2020.4

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    DOI: 10.1088/2058-6272/ab84e2

  67. Generation and diagnostics of ambient air glow discharge in centimeter-order gaps Reviewed

    Vladislav Gamaleev, Takayoshi Tsutsumi, Mineo Hiramatsu, Masafumi Ito, and Masaru Hori

    IEEE Access   Vol. 8   page: 72607 - 72619   2020.4

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    DOI: 10.1109/ACCESS.2020.2988091

  68. Transparent elongation and compressive strain sensors based on aligned carbon nanowalls embedded in polyurethane

    Slobodian Petr, Riha Pavel, Kondo Hiroki, Cvelbar Uros, Olejnik Robert, Matyas Jiri, Sekine Makoto, Hori Masaru

    SENSORS AND ACTUATORS A-PHYSICAL   Vol. 306   2020.3

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    DOI: 10.1016/j.sna.2020.111946

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  69. Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition Reviewed

    Naho Itagaki, Yuta Nakamura, Ryota Narishige, Keigo Takeda, Kunihiro Kamataki, Kazunori Koga, Masaru Hori & Masaharu Shiratani

    Scientific Reports   Vol. 10   2020.3

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    DOI: 10.1038/s41598-020-61596-w

  70. Electron and negative ions dynamics in a pulsed 100 MHz capacitive discharge produced in O2 and Ar/O2/C4F8 gas mixture Reviewed

    N Sirse, T Tsutsumi, M Sekine, M Hori and A R Ellingboe

    Plasma Sources Science and Technology   Vol. 29 ( 3 ) page: 1-   2020.3

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    DOI: 10.1088/1361-6595/ab7086

  71. N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence Reviewed

    Neelakandan M. Santhosh, Gregor Filipič, Eva Kovacevic, Andrea Jagodar, Johannes Berndt, Thomas Strunskus, Hiroki Kondo, Masaru Hori, Elena Tatarova & Uroš Cvelbar

    Nano-Micro Letters   Vol. 12   page: 1-17   2020.2

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    DOI: 10.1007/s40820-020-0395-5

  72. Plasma-activated medium promotes autophagic cell death along with alteration of the mTOR pathway Reviewed

    Nobuhisa Yoshikawa, Wenting Liu, Kae Nakamura, Kosuke Yoshida, Yoshiki Ikeda, Hiromasa Tanaka, Masaaki Mizuno, Shinya Toyokuni, Masaru Hori, Fumitaka Kikkawa & Hiroaki Kajiyama

    Scientific Reports   Vol. 10   page: 1-8   2020.1

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    DOI: 10.1038/s41598-020-58667-3

  73. Oxygen radical based on non-thermal atmospheric pressure plasma alleviates ligninderived phenolic toxicity in yeast Reviewed

    Shou Ito, Kiyota Sakai, Vladislav Gamaleev, Masafumi Ito, Masaru Hori, Masashi Kato, Motoyuki Shimizu

    Biotechnology for Biofuels   Vol. 13   page: 1-13   2020.1

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    DOI: 10.1186/s13068-020-1655-9

  74. Scalable Treatment of Flowing Organic Liquids Using Ambient-Air Glow Discharge for Agricultural Applications Reviewed

    Vladislav Gamaleev, Naoyuki Iwata, Ginji Ito, Masaru Hori, Mineo Hiramatsu and Masafumi Ito

    Applied Sciences   Vol. 10 ( 3 ) page: 1-17   2020.1

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    DOI: 10.3390/app10030801

  75. Synthesis of isolated carbon nanowalls via high-voltage nanosecond pulses in conjunction with CH4/H2 plasma enhanced chemical vapor deposition Reviewed

    Tomonori Ichikawa, Naohiro Shimizu, Kenji Ishikawa, Mineo Hiramatsu, and Masaru Hori

    Carbon   Vol. 161   page: 403-412   2020.1

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    DOI: 1016/j.carbon.2020.01.064

  76. Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study Reviewed

    Yusuke Fukunaga, Roberto C. Longo, Peter L. G. Ventzek, Barton Lane, Alok Ranjan, Gyeong S. Hwang, Gregory Hartmann, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Journal of Applied Physics   Vol. 127 ( 2 )   2020.1

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    DOI: 10.1063/1.5127863

  77. Initial growth analysis of ALD Al2O3 film on hydrogen-terminated Si substrate via in situ XPS Reviewed

    Hiroyuki Fukumizu, Makoto Sekine, Masaru Hori and Paul C. McIntyre

    Japanese Journal of Applied Physics   Vol. 59 ( 1 ) page: 1-6   2020.1

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    DOI: 10.7567/1347-4065/ab6273

  78. In-liquid plasma synthesis of nanographene with a mixture of methanol and 1-butanol Reviewed

    Atsushi Ando, Kenji Ishikawa, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Hiroki Kondo, Makoto Sekine, Masaru Hori

      Vol. Volume6 ( Issue4 )   2019.12

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    DOI: 10.1002/cnma.201900676

  79. Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp2 carbon structures Reviewed

    Hirotsugu Sugiura, Yasuyuki Ohashi, Kenji Ishikawa, Hiroki Kondo, Toshiaki Kato, Toshiro Kaneko, Keigo Takeda, Takayoshi Tsutsumi, Toshio Hayashi, Makoto Sekine, Masaru Hori

    Diamond & Related Materials   Vol. 104   page: 1-10   2019.12

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    DOI: 10.1016/j.diamond.2019.107651

  80. Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate Reviewed

    Yasuhiro Isobe, Takayuki Sakai, Kyoichi Suguro, Naoto Miyashita, Hiroki Kondo, Kenji Ishikawa, Amalraj Frank Wilson, Naohiro Shimizu, Osamu Oda, Makoto Sekine, and Masaru Hori

    Journal of Vacuum Science & Technology B   Vol. 37 ( 6 )   2019.12

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    DOI: https://doi.org/10.1116/1.5114831

  81. Exosomal Analysis of ALK Rearrangements by Spin Column with Porous Glass Filter

    Hatta T., Hase T., Ozawa N., Yogo N., Yukawa H., Tanaka H., Onoshima D., Sato M., Hori M., Baba Y., Hasegawa Y.

    JOURNAL OF THORACIC ONCOLOGY   Vol. 14 ( 10 ) page: S676-S676   2019.10

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  82. Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions Reviewed

    Tanaka Hiromasa, Mizuno Masaaki, Katsumata Yuko, Ishikawa Kenji, Kondo Hiroki, Hashizume Hiroshi, Okazaki Yasumasa, Toyokuni Shinya, Nakamura Kae, Yoshikawa Nobuhisa, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

    SCIENTIFIC REPORTS   Vol. 9   2019.9

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    DOI: 10.1038/s41598-019-50136-w

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  83. In Situ Monitoring of Surface Reactions during Atomic Layer Etching of Silicon Nitride Using Hydrogen Plasma and Fluorine Radicals Reviewed

    Kazuya Nakane, René H. J. Vervuurt, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, and Masaru Hori

    ACS Applied Materials & Interfaces   Vol. 11 ( 40 )   2019.9

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    DOI: 10.1021/acsami.9b11489

  84. Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O-2 downstream plasma Reviewed

    Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Masaru Izawa, Kenji Ishikawa and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 52 ( 47 )   2019.9

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    DOI: 10.1088/1361-6463/ab3cf3

  85. Direct Treatment of Liquids Using Low-Current Arc in Ambient Air for Biomedical Applications Reviewed

    Gamaleev Vladislav, Iwata Naoyuki, Hori Masaru, Hiramatsu Mineo, Ito Masafumi

    APPLIED SCIENCES-BASEL   Vol. 9 ( 17 )   2019.8

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    DOI: 10.3390/app9173505

  86. Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride Reviewed

    Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Masaru Izawa, Tomonori Saeki, Kenji Ishikawa, and Masaru Hori

    Journal of Vacuum Science & Technology A   Vol. 37 ( 5 )   2019.8

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    DOI: 10.1116/1.5111663

  87. Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS) Reviewed

    Takayuki Ohta , Hironori Ito , Kenji Ishikawa , Hiroki Kondo , Mineo Hiramatsu and Masaru Hori

    Special Issue "Plasma Processing for Carbon-based Materials   Vol. 5 ( 3 )   2019.7

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    DOI: 10.3390/c5030040

  88. l-Dehydroascorbic acid recycled by thiols efficiently scavenges non-thermal plasma-induced hydroxyl radicals Reviewed

    Yasumasa Okazaki, Hiromasa Tanaka, Masaru Hori, Shinya Toyokuni

    Archives of Biochemistry and Biophysics   Vol. 669   page: 87-95   2019.7

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    DOI: 10.1016/j.abb.2019.05.019

  89. Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlar dielectrics used for semiconductor logic device interconnects Reviewed

    Hideshi Miyajima , Kenji Ishikawa, Makoto Sekine , Masaru Hori

    Plasma Processes and Polymers   Vol. 16 ( 9 )   2019.6

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    DOI: https://doi.org/10.1002/ppap.201900039

  90. Investigation on the long-term bactericidal effect and chemical composition of radical-activated water Reviewed

    Naoyuki Iwata, Vladislav Gamaleev, Jun-Seok Oh, Takayuki Ohta, Masaru Hori, Masafumi Ito

    Plasma Processes and Polymers   Vol. 16 ( 10 )   2019.6

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    DOI: 10.1002/ppap.201900055

  91. Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation Reviewed

    Tomonori Ichikawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Hiromasa Tanaka, Makoto Sekine, Masaru Hori

    ACS Applied Bio Materials   Vol. 2 ( 8 )   2019.6

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    DOI: 10.1021/acsabm.9b00178

  92. Non-thermal plasma specifically kills oral squamous cell carcinoma cells in a catalytic Fe(II)-dependent manner Reviewed

    Kotaro Sato, Lei Shi, Fumiya Ito, Yuuki Ohara, Yashiro Motooka, Hiromasa Tanaka, Masaaki Mizuno, Masaru Hori, Tasuku Hirayama, Hideharu Hibi and Shinya Toyokuni

    Journal of Clinical Biochemistry and Nutrition   Vol. 65 ( 1 ) page: 8-15   2019.6

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    DOI: 10.3164/jcbn.18-91

  93. Simultaneous Achievement of Antimicrobial Property and Plant Growth Promotion using Plasma Activated Benzoic Compound Solution Reviewed

    Naoyuki Iwata, Vladislav Gamaleev, Hiroshi Hashizume, Jun-Seok Oh, Takayuki Ohta, Kenji Ishikawa, Masaru Hori, and Masafumi Ito

    Plasma Processes and Polymers   Vol. 16 ( 8 )   2019.5

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    DOI: 10.1002/ppap.201900023

  94. Formation mechanism of sidewall striation in high-aspect-ratio hole etching Reviewed

    Mitsuhiro Omura, Junichi Hashimoto, Takahiro Adachi, Yusuke Kondo, Masao Ishikawa, Junko Abe, Itsuko Sakai, Hisataka Hayashi, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 58 ( SE )   2019.5

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    DOI: 10.7567/1347-4065/ab163c

  95. Plasma-activated solution alters the morphological dynamics of supported lipid bilayers observed by high-speed atomic force microscopy Reviewed

    Sotaro Yamaoka, Hiroki Kondo, Hiroshi Hashizume, Kenji Ishikawa, Hiromasa Tanaka and Masaru Hori

    Applied Physics Express   Vol. 12 ( 6 )   2019.5

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    DOI: 10.7567/1882-0786/ab1a58

  96. Electronic properties and primarily dissociation channels of fluoroethane compounds Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 58 ( SE )   2019.5

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    DOI: 10.7567/1347-4065/ab09ca

  97. プラズマプロセスにおける吸収分光計測の基礎

    竹田圭吾、高島成剛、堀 勝

    プラズマ・核融合学会誌   Vol. 195 ( 4 ) page: 180-186   2019.4

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  98. Facile synthesis of SnO2-graphene composites employing nonthermal plasma and SnO2 nanoparticles-dispersed ethanol

    Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 17 )   2019.4

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    DOI: 10.1088/1361-6463/ab03c4

    Web of Science

  99. Laser-drilling formation of through-glass-via (TGV) on polymer-laminated glass Reviewed

    Yoichiro Sato, Nobuhiko Imajyo, Kenji Ishikawa, Rao Tummala, Masaru Hori

    Journal of Materials Science: Materials in Electronics   Vol. 30 ( 11 ) page: pp10183-10190   2019.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1007/s10854-019-01354-5

  100. Systematic diagnostics of the electrical, optical, and physicochemical characteristics of low-temperature atmospheric-pressure helium plasma sources

    Takeda Keigo, Yamada Hiromasa, Ishikawa Kenji, Sakakita Hajime, Kim Jaeho, Ueda Masashi, Ikeda Jun-ichiro, Akimoto Yoshihiro, Kataoka Yosky, Yokoyama Naoaki, Ikehara Yuzuru, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 16 )   2019.4

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    DOI: 10.1088/1361-6463/aaff44

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  101. Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition Reviewed

    Yasuhiro Isobe, Takayuki Sakai, Naoharu Sugiyama, Ichiro Mizushima, Kyoichi Suguro, Naoto Miyashita, Yi Lu, Amalraj Frank Wilson, Dhasiyan Arun Kumar, Nobuyuki Ikarashi, Hiroki Kondo, Kenji Ishikawa, Naohiro Shimizu, Osamu Oda, Makoto Sekine, and Masaru Hori

    Journal of Vacuum Science & Technology B   Vol. 37 ( 3 )   2019.4

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    DOI: 10.1116/1.5083970

  102. A 65-nm CMOS Fully Integrated Analysis Platform Using an On-Chip Vector Network Analyzer and a Transmission-Line-Based Detection Window for Analyzing Circulating Tumor Cell and Exosome

    Niitsu Kiichi, Nakanishi Taiki, Murakami Shunya, Matsunaga Maya, Kobayashi Atsuki, Karim Nissar Mohammad, Ito Jun, Ozawa Naoya, Hase Tetsunari, Tanaka Hiromasa, Sato Mitsuo, Kondo Hiroki, Ishikawa Kenji, Odaka Hidefumi, Hasegawa Yoshinori, Hori Masaru, Nakazato Kazuo

    IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS   Vol. 13 ( 2 ) page: 470-479   2019.4

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    DOI: 10.1109/TBCAS.2018.2882472

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  103. Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

    Imai Shun, Naito Kenichi, Kondo Hiroki, Cho Hyung Jun, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 52 ( 10 )   2019.3

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    DOI: 10.1088/1361-6463/aaf8e0

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  104. Chemical bonding structure in porous SiOC films (k<2.4) with high plasma-induced damage resistance Reviewed

    Hideshi Miyajima, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Micro and Nano Engineering   Vol. 3   page: 1-6   2019.3

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    DOI: 10.1016/j.mne.2019.02.005

  105. Effects of BCl3 addition to Cl-2 gas on etching characteristics of GaN at high temperature

    Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kohno Motohiro, Kinose Kazuo, Nadahara Soichi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   Vol. 37 ( 2 )   2019.3

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    DOI: 10.1116/1.5082345

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  106. Atomic layer etching of AlGaN using Cl-2 and Ar gas chemistry and UV damage evaluation

    Fukumizu Hiroyuki, Sekine Makoto, Hori Masaru, Kanomaru Koji, Kikuchi Takuo

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   Vol. 37 ( 2 )   2019.3

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    DOI: 10.1116/1.5063795

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  107. Real-time control of a wafer temperature for uniform plasma process

    T. Tsutsumi, Y. Fuknaga, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    2018 International Symposium on Semiconductor Manufacturing (ISSM)     2019.2

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    DOI: 10.1109/ISSM.2018.8651183

  108. Non-thermal plasma-activated medium modified metabolomic profiles in the glycolysis of U251SP glioblastoma Reviewed

    Naoyuki Kurake, Kenji Ishikawa, Hiromasa Tanaka, Hiroshi Hashizume, Kae Nakamura, Hiroaki Kajiyama, Shinya Toyokuni, Fumitaka Kikkawa, Masaaki Mizuno, Masaru Hori

    Archives of Biochemistry and Biophysics   Vol. 662   page: 83-92   2019.2

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  109. Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF6-added plasma etching of quartz glass

    Thi-Thuy-Nga Nguyen, Sasaki Minoru, Odaka Hidefumi, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

    JOURNAL OF APPLIED PHYSICS   Vol. 125 ( 6 )   2019.2

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    DOI: 10.1063/1.5081875

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  110. Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition Reviewed

    Hirotsugu Sugiura, Lingyun Jia, Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 58 ( 3 )   2019.2

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    DOI: 10.7567/1347-4065/aafd49

  111. Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries Reviewed

    Ranjit R. Borude, Hirotsugu Sugiura, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Nobuyuki Ikarashi, and Masaru Hori

    ACS Applied Nano Materials   Vol. 2 ( 2 ) page: 649-654   2019.2

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  112. Adhesion enhancement and amine reduction using film redeposited at the interface of a stack of plasma-enhanced CVD dielectrics for Cu/low-k interconnects

    Miyajima Hideshi, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( 2 )   2019.2

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    DOI: 10.7567/1347-4065/aafb5b

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  113. Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system

    Fukunaga Yusuke, Tsutsumi Takayoshi, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( 2 )   2019.2

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    DOI: 10.7567/1347-4065/aaf92a

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  114. Hetero-epitaxial growth of a GaN film by the combination of magnetron sputtering with Ar/Cl-2 gas mixtures and a separate supply of nitrogen precursors from a high density radical source

    Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kohno Motohiro, Kinose Kazuo, Nadahara Soichi, Nishikawa Masazumi, Ebe Akinori, Ishikawa Kenji, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( SA )   2019.2

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    DOI: 10.7567/1347-4065/aaeb39

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  115. Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Hirotsugu Sugiura , Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa and Masaru Hori

    C-Journal of Carbon Research   Vol. 5 ( 1 )   2019.1

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    DOI: 10.3390/c5010008

  116. Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Masakazu Tomatsu 1, Mineo Hiramatsu, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine and Masaru Hori

    Journal of Carbon Research   Vol. 5 ( 1 )   2019.1

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    DOI: 10.3390/c5010007

  117. Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds Reviewed

    Tomonori Ichikawa, Suiki Tanaka, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine and Masaru Hori

    Applied Physics Express   Vol. 12 ( 2 )   2019.1

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    DOI: 10.7567/1882-0786/aaf469

  118. Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma Reviewed

    Ranjit R. Borude, Hirotsugu Sugiura, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Jeon Geon Han and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 58 ( SA )   2019.1

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    DOI: 10.7567/1347-4065/aaec87

  119. Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas Reviewed

    Yan Zhang, Kenji Ishikawa, Miran Mozetič, Takayoshi Tsutsumi, Hiroki Kondo , Makoto Sekine, Masaru Hori

    Plasma Processes and Polymers   Vol. 16 ( 6 )   2019.1

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    DOI: 10.1002/ppap.201800175

  120. Batch Fabrication of Nano-Gap Electrode Array Using Photo-Patterning and Resist UV-Curing Reviewed

    Hai Minh Nguyer, Mako Kumeuchi, Shinya Kumagai, Kenji Ishikawa, Masaru Hori, Minoru Sasaki

    IEEJ Transactions on Sensors and Micromachines   Vol. 139 ( 1 ) page: 27-28   2019.1

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    DOI: 10.1541/ieejsmas.139.27

  121. Liquid dynamics in response to an impinging low-temperature plasma jet Reviewed

    Timothy R. Brubaker, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Hiroshi Hashizume, Hiromasa Tanaka, Sean D. Knecht, Sven G. Bilen, and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 52 ( 7 )   2018.12

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    DOI: 10.1088/1361-6463/aaf460

  122. Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H2 plasma-enhanced chemical vapor deposition Reviewed

    Shun Imai, Hiroki Kondo, Cho Hyungjun, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

    Applied Physics Express   Vol. 12 ( 1 )   2018.12

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    DOI: 10.7567/1882-0786/aaf0ab

  123. 大気圧プラズマを用いたがん治療へ向けた基礎研究

    田中宏昌、堀勝

    腎とフリーラジカル 第13集     page: 46-49   2018.11

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  124. Effect of N2/H2 plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) Reviewed

    Frank Wilson Amalraj, Arun Kumar Dhasiyan, Yi Lu1, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Nobuyuki Ikarashi, and Masaru Hori

    AIP Advances   Vol. 8 ( 11 )   2018.11

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    DOI: 10.1063/1.5050819

  125. Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

    Santhosh Neelakandan M., Filipic Gregor, Tatarova Elena, Baranov Oleg, Kondo Hiroki, Sekine Makoto, Hori Masaru, Ostrikov Kostya (Ken), Cvelbar Uros

    MICROMACHINES   Vol. 9 ( 11 )   2018.11

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    DOI: 10.3390/mi9110565

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  126. Time Evolution Of Reactive Oxygen Nitrogen Species in Plasma-Activated Essential Media and Water

    Brubaker Timothy, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

    2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS)     2018.10

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    DOI: 10.1109/PLASMA.2017.8496057

  127. Molecular mechanisms of non-thermal plasma-induced effects in cancer cells Reviewed

    Tanaka, Hiromasa; Mizuno, Masaaki; Ishikawa, Kenji; Toyokuni, Shinya; Kajiyama, Hiroaki; Kikkawa, Fumitaka; Hori, Masaru

    Biological Chemistry     2018.10

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    DOI: 10.1515/hsz-2018-0199

  128. 大気圧プラズマ処理による異種材料接合

    近藤博基、堤隆嘉、石川健治、関根 誠、堀 勝 

    化学工学(公益社団法人 化学工学会)   Vol. 82 ( 9 ) page: 487-490   2018.9

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  129. Mechanism of asymmetric etched profiles in trimming process Reviewed

    Nobuyuki Negishi, Masatoshi Miyake, Keigo Takeda, and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 57 ( 10 )   2018.9

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    DOI: 10.7567/JJAP.57.106201

  130. Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching Reviewed

    Yan Zhang, Masato Imamura, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   Vol. 57 ( 10 )   2018.8

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    DOI: 10.7567/JJAP.57.106502

  131. New hopes for plasma-based cancer treatment Reviewed

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Shinya Toyokuni, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaru Hori

    Plasma 2018   Vol. 1   page: 150-155   2018.8

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    DOI: 10.3390/plasma1010014

  132. Cytotoxic effects of plasma-irradiated fullerenol Reviewed

    Daiki Kanno, Hiromasa Tanaka, Kenji Ishikawa, Hiroshi Hashizume and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 51 ( 37 )   2018.8

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    DOI: 10.1088/1361-6463/aad510

  133. Effect of substrate temperature on sidewall erosion in high-aspect-ratio Si hole etching employing HBr/SF6/O2 plasma Reviewed

    Itsuko Sakai, Katsunori Yahashi, Satoshi Shimonishi, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 57 ( 9 )   2018.8

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    DOI: 10.7567/JJAP.57.098004

  134. Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H2 at 300-500°C Reviewed

    Takashi Kako, Zecheng Liu, Kenji Ishikawa, Hiroki Kondo, Osamu Oda, Makoto Sekine, and Masaru Hori

    Vacuum   Vol. 156   page: 219-223   2018.7

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    DOI: 10.1016/j.vacuum.2018.07.040

  135. プラズマ技術概論

    堀 勝

    自動車技術   Vol. 72   page: P12-17   2018.6

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  136. Cell Deposition Microchip with Micropipette Control over Liquid Interface Motion Reviewed

    Onoshima Daisuke, Hattori Yuya, Yukawa Hiroshi, Ishikawa Kenji, Hori Masaru, Baba Yoshinobu

    CELL MEDICINE   Vol. 10   2018.5

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    DOI: 10.1177/2155179017733152

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  137. Imaging Differences between Neuromyelitis Optica Spectrum Disorders and Multiple Sclerosis: A Multi-Institutional Study in Japan Reviewed

    Tatekawa H., Sakamoto S., Hori M., Kaichi Y., Kunimatsu A., Akazawa K., Miyasaka T., Oba H., Okubo T., Hasuo K., Yamada K., Taoka T., Doishita S., Shimono T., Miki Y.

    AMERICAN JOURNAL OF NEURORADIOLOGY   Vol. 39 ( 7 ) page: 1239-1247   2018.5

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    DOI: 10.3174/ajnr.A5663

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  138. Effects of gas residence time of CH4/H2 on sp2 fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition Reviewed

    Hirotsugu Sugiura, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 57 ( 6s2 )   2018.5

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    DOI: 10.7567/JJAP.57.06JE03

  139. Low-autofluorescence fluoropolymer membrane filters for cell filtration Reviewed

    Naoto Kihara, Daiki Kuboyama, Daisuke Onoshima, Kenji Ishikawa, Hiromasa Tanaka, Naoya Ozawa, Tetsunari Hase, Ryohei Koguchi, Hiroshi Yukawa, Hidefumi Odaka, Yoshinori Hasegawa, Yoshinobu Baba and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 57 ( 6s2 )   2018.5

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    DOI: 10.7567/JJAP.57.06JF03

  140. Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma Reviewed

    Zecheng Liu, Kenji Ishikawa, Masato Imamura, Takayoshi Tsutsumi, Hiroki Kondo, Osamu Oda, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 57 ( 6s2 )   2018.5

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    DOI: 10.7567/JJAP.57.06JD01

  141. Plasma Activated Medium

    Hiromasa Tanaka, and Masaru Hori

    Comprehensive Clinical Plasma Medicine     page: 431-440   2018.5

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    DOI: 10.1007/978-3-319-67627-2_26

  142. Dissociative properties of 1,1,1,2-tetrafluoroethane obtained by computational chemistry Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 57 ( 6s2 )   2018.4

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    DOI: 10.7567/JJAP.57.06JC02

  143. Impact of helium pressures in arc plasma synthesis on crystallinity of single-walled carbon nanotubes Reviewed

    Atsushi Ando, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Tomoko Suzuki, Sakae Inoue, Yoshinori Ando, and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 57 ( 6S2 )   2018.4

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    DOI: 10.7567/JJAP.57.06JF01

  144. Isotropic atomic level etching of tungsten using formation and desorption of tungsten fluoride Reviewed

    Shinoda Kazunori, Miyoshi Nobuya, Kobayashi Hiroyuki, Hanaoka Yuko, Kawamura Kohei, Izawa Masaru, Ishikawa Kenji, Hori Masaru

    ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VII   Vol. 10589   2018.3

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    DOI: 10.1117/12.2297241

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  145. Nanographene synthesized in triple-phase plasmas as a highly durable support of catalysts for polymer electrolyte fuel cells Reviewed

    Amano Tomoki, Kondo Hiroki, Takeda Keigo, Ishikawa Kenji, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 4 )   2018.3

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    DOI: 10.7567/JJAP.57.045101

  146. Disruption of the pacemaker activity of interstitial cells of Cajal via nitric oxide contributes to postoperative ileus Reviewed

    Kaji N., Nakayama S., Horiguchi K., Iino S., Ozaki H., Hori M.

    NEUROGASTROENTEROLOGY AND MOTILITY   Vol. 30 ( 8 )   2018.3

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    DOI: 10.1111/nmo.13334

  147. Reduced HeLa cell viability in methionine-containing cell culture medium irradiated with microwave-excited atmospheric-pressure plasma

    Takahashi Yohei, Taki Yusuke, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Ishikawa Kenji, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 15 ( 3 )   2018.3

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    DOI: 10.1002/ppap.201700200

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  148. Glioblastoma Cell Lines Display Different Sensitivities to Plasma-Activated Medium

    Tanaka Hiromasa, Mizuno Masaaki, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Nakamura Kae, Utsumi Fumi, Kajiyama Hiroaki, Okazaki Yasumasa, Toyokuni Shinya, Akiyama Shinichi, Maruyama Shoichi, Kikkawa Fumitaka, Hori Masaru

    IEEE TRANSACTIONS ON RADIATION AND PLASMA MEDICAL SCIENCES   Vol. 2 ( 2 ) page: 99-102   2018.3

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    DOI: 10.1109/TRPMS.2017.2721973

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  149. NHM-SMAP: spatially and temporally high-resolution nonhydrostatic atmospheric model coupled with detailed snow process model for Greenland Ice Sheet Reviewed

    Niwano Masashi, Aoki Teruo, Hashimoto Akihiro, Matoba Sumito, Yamaguchi Satoru, Tanikawa Tomonori, Fujita Koji, Tsushima Akane, Iizuka Yoshinori, Shimada Rigen, Hori Masahiro

    CRYOSPHERE   Vol. 12 ( 2 ) page: 635-655   2018.2

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    DOI: 10.5194/tc-12-635-2018

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  150. Cytotoxicity of cancer HeLa cells sensitivity to normal MCF10A cells in cultivations with cell culture medium treated by microwave-excited atmospheric pressure plasmas Reviewed

    Takahashi Yohei, Taki Yusuke, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Ishikawa Kenji, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 51 ( 11 )   2018.2

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    DOI: 10.1088/1361-6463/aaab09

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  151. Oxygen reduction reaction properties of nitrogen-incorporated nanographenes synthesized using in-liquid plasma from mixture of ethanol and iron phthalocyanine Reviewed

    Amano Tomoki, Kondo Hiroki, Takeda Keigo, Ishikawa Kenji, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 4 )   2018.2

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    DOI: 10.7567/JJAP.57.040303

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  152. Free radical generation by non-equilibrium atmospheric pressure plasma in alcohol-water mixtures: an EPR-spin trapping study Reviewed

    Uchiyama Hidefumi, Ishikawa Kenji, Zhao Qing-Li, Andocs Gabor, Nojima Nobuyuki, Takeda Keigo, Krishna Murali C., Ishijima Tatsuo, Matsuya Yuji, Hori Masaru, Noguchi Kyo, Kondo Takashi

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 51 ( 9 )   2018.2

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    DOI: 10.1088/1361-6463/aaa885

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  153. Intraperitoneal Treatment With Plasma-Activated Liquid Inhibits Peritoneal Metastasis In Ovarian Cancer Mouse Model Reviewed

    Kae Nakamura, Hiroaki Kajiyama, Yang Peng, Fumi Utsumi, Nobuhisa Yoshikawa, Hiromasa Tanaka, Masaaki Mizuno, Shinya Toyokuni, Masaru Hori, and Fumitaka Kikkawa

    Clinical Plasma Medicine   Vol. 9   page: 47-48   2018.2

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    DOI: 10.1016/j.cpme.2017.12.073

  154. Similarities And Differences In The Cellular Resposnses Between Plasma-Activated Medium-Treated Glioblastomas And Plasma-Activated Ringer's Lactate Solution-Treated Glioblastomas Reviewed

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Hiroshi Hashizume, Kae Nakamura, Hiroaki Kajiyama, Yasumasa Okazaki, Shinya Toyokuni, Shinichi Akiyama, Shoichi Maruyama, Fumitaka Kikkawa, and Masaru Hori

    Clinical Plasma Medicine   Vol. 9   page: 42-43   2018.2

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    DOI: 10.1016/j.cpme.2017.12.066

  155. Plasma-Activated Medium Inhibites Metastatic Activities Of Ovarian Cancer Cells In Vitro Via Repressing Mapk Pathway Reviewed

    Yang Peng, Hiroaki Kajiyama, Kae Nakamura, Fumi Utsumi, Nobuhisa Yoshikawa, Hiromasa Tanaka, Masaaki Mizuno, Shinya Toyokuni, Masaru Hori, and Fumitaka Kikkawa

    Clinical Plasma Medicine   Vol. 9   page: 41-42   2018.2

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    DOI: 10.1016/j.cpme.2017.12.065

  156. Current status and future prospects of agricultural applications using atmospheric-pressure plasma technologies

    Ito Masafumi, Oh Jun-Seok, Ohta Takayuki, Shiratani Masaharu, Hori Masaru

    PLASMA PROCESSES AND POLYMERS   Vol. 15 ( 2 )   2018.2

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    DOI: 10.1002/ppap.201700073

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  157. Facile fabrication of a poly(ethylene terephthalate) membrane filter with precise arrangement of through-holes Reviewed

    Kihara Naoto, Odaka Hidefumi, Kuboyama Daiki, Onoshima Daisuke, Ishikawa Kenji, Baba Yoshinobu, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 3 )   2018.1

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    DOI: 10.7567/JJAP.57.037001

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  158. Effect of Plasma-Activated Lactated Ringer's Solution on Pancreatic Cancer Cells In Vitro and In Vivo Reviewed

    Sato Yusuke, Yamada Suguru, Takeda Shigeomi, Hattori Norifumi, Nakamura Kae, Tanaka Hiromasa, Mizuno Masaaki, Hori Masaru, Kodera Yasuhiro

    ANNALS OF SURGICAL ONCOLOGY   Vol. 25 ( 1 ) page: 299-307   2018.1

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    DOI: 10.1245/s10434-017-6239-y

    Web of Science

  159. Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons Reviewed

    Atsushi Ando, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Makoto Sekine and Masaru Hori

    The Japan Society of Applied Physics   Vol. 57 ( 2 )   2018.1

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    DOI: https://doi.org/10.7567/JJAP.57.026201

  160. Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons Reviewed

    Ando Atsushi, Ishikawa Kenji, Kondo Hiroki, Tsutsumi Takayoshi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Sekine Makoto, Hori Masaru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 2 )   2018.1

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    DOI: 10.7567/JJAP.57.026201

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  161. Electron impact ionization of perfluoro-methyl-vinyl-ether C3F6O

    Kondo Yusuke, Ishikawa Kenji, Hayashi Toshio, Sekine Makoto, Hori Masaru

    PLASMA SOURCES SCIENCE & TECHNOLOGY   Vol. 27 ( 1 )   2018.1

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    DOI: 10.1088/1361-6595/aaa22e

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  162. Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol Reviewed

    Tomoki Amano, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Keigo Takeda, Mineo Hiramatsu, Makoto Sekine and Masaru Hori

    The Japan Society of Applied Physics   Vol. 11 ( 1 )   2017.12

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    DOI: 10.7567/APEX.11.015102

  163. Plasma-activated medium (PAM) kills human cancer-initiating cells Reviewed

    Ikeda Jun-ichiro, Tanaka Hiromasa, Ishikawa Kenji, Sakakita Hajime, Ikehara Yuzuru, Hori Masaru

    PATHOLOGY INTERNATIONAL   Vol. 68 ( 1 ) page: 23-30   2017.12

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    DOI: 10.1111/pin.12617

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  164. Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy Reviewed

    Timothy Ryan Brubaker, Kenji Ishikawa, Keigo Takeda, Jun-Seok Oh, Hiroki KONDO, Hiroshi Hashizume, Hiromasa Tanaka, Sean David Knecht, Sven Bilén, and Masaru Hori

    Journal of Applied Physics   Vol. 122 ( 21 )   2017.12

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    DOI: 10.1063/1.4999256

  165. Oxygen-radical pretreatment promotes cellulose degradation by cellulolytic enzymes Reviewed

    Kiyota Sakai, Saki Kojiya, Junya Kamijo, Yuta Tanaka, Kenta Tanaka, Masahiro Maebayashi, Jun-Seok Oh, Masafumi Ito, Masaru Hori, Motoyuki Shimizu, and Masashi Kato

    Biotechnology for Biofuels   Vol. 10   2017.12

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    DOI: 10.1186/s13068-017-0979-6

  166. Abstract 18: Therapeutic potential of cold physical plasma in palliative cancer care: Introduction and perspectives Reviewed

    Christian Seebauer, Thomas von Woedtke, Klaus-Dieter Weltmann, Vandana Miller, Masaru Hori and Hans-Robert Metelmann

    CLINICAL CANCER RESEARCH 23(23 supplement) pp. 18 (December, 2017)     2017.12

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    DOI: 10.1158/1557-3265.AACRAHNS17-18

  167. Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation: Induction of apoptotic death in HeLa cells following cultivation in non-equilibrium (cold) atmospheric pressure plasma-activated medium Reviewed

    Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiromasa Tanaka, Hiroshi Hashizume, Hiroki Kondo, Makoto Sekine and Masaru Hori

    Plasma Process and Polymers   Vol. 14 ( 11 )   2017.11

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    DOI: 10.1002/ppap.201700123

  168. Dependence of absolute photon flux on infrared absorbance alteration and surface roughness on photoresist polymers irradiated with vacuum ultraviolet photons emitted from HBr plasma Reviewed

    Yan Zhang, Takuya Takeuchi, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Makoto Sekine, and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 56 ( 12 )   2017.11

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    DOI: 10.7567/JJAP.56.126503

  169. Selective production of reactive oxygen and nitrogen species in the plasma-treated water by using a nonthermal high-frequency plasma jet Reviewed

    Uchida Giichiro, Takenaka Kosuke, Takeda Keigo, Ishikawa Kenji, Hori Masaru, Setsuhara Yuichi

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 1 )   2017.10

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    DOI: 10.7567/JJAP.57.0102B4

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  170. Crystallization of calcium oxalate dihydrate in a buffered calcium-containing glucose Reviewed

    Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama,

    Journal of Applied Physics   Vol. 122 ( 14 )   2017.10

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    DOI: 10.1063/1.5006598

  171. 大気圧プラズマ処理における殺菌・医療・バイオ分野への応用

    橋爪博司、田中宏昌、堀勝、伊藤昌文

    工業材料   Vol. Vol.65. ( No.10 ) page: 27-30   2017.10

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  172. Clinical Experience with Cold Plasma in the Treatment of Locally Advanced Head and Neck Cancer Reviewed

    Hans-Robert Metelmann, Christian Seebauer,Vandana Miller, Alexander Fridman, Georg Bauer, David B.Graves, Jean-Michel Pouvesle Rico Rutkowski, Matthias Schuster Sander Bekeschus, Kristian Wende, Kai Masur, Sybille Hasse, Torsten Gerling, Masaru Hori, Hiromasa Tanaka, Eun Ha Choi, Klaus-Dieter Weltmann, and Thomas von Woedtke

    Clinical Plasma Medicine,     2017.9

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    DOI: 10.1016/j.cpme.2017.09.001

  173. Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication Reviewed

    Kazunori Shinodaa, Nobuya Miyoshia, Hiroyuki Kobayashia, Masaru Kuriharaa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori

    ECS Transactions     2017.9

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    DOI: 10.1149/08003.0003ecst

  174. Cold atmospheric helium plasma causes synergistic enhancement in cell death with hyperthermia and an additive enhancement with radiation Reviewed

    Moniruzzaman Rohan, Qing-Li Zhao, Paras Jawaid, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Kei Tomihara, Noguchi Kyo, Takashi Kondo, and Makoto Noguchi

    Scientific Reports   Vol. 7   2017.9

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    DOI: 10.1038/s41598-017-11877-8

  175. Surface roughening of photoresist after change of the photon/radical and ion treatment sequence Reviewed

    Yan Zhanga, Takuya Takeuchi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films J.   Vol. 135 ( 6 )   2017.9

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    DOI: 10.1116/1.4994218

  176. High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition Reviewed

    Shun Imai, Hiroki Kondo, Hyungjun Cho, Hiroyuki Kano, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masafumi Ito, Masaru Hori

    Journal of Physics D: Applied Physics,   Vol. Vol 50 ( 40 )   2017.9

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    DOI: 10.1088/1361-6463/aa8131

  177. Thermally enhanced formation of photon-induced damage on GaN films in Cl2 plasma Reviewed

    Zecheng Liu*, Atsuki Asano, Masato Imamura, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo,

    Japanese Journal of Applied Physics   Vol. 56   2017.8

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    DOI: 10.7567/JJAP.56.096501

  178. Palliative Plasmabehandlung von Kopf-Hals-Tumoren und kurative Konzepte

    Christian Seebauer, Hiromasa Tanaka, Masaru Hori, Hans Robert Metelmann

    Plasmamedizin (in German)     page: 99-109   2017.8

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    DOI: 10.1007/978-3-662-52645-3_8

  179. The 2017 Plasma Roadmap: Low temperature plasma science and technology

    Adamovich I., Baalrud S. D., Bogaerts A., Bruggeman P. J., Cappelli M., Colombo V., Czarnetzki U., Ebert U., Eden J. G., Favia P., Graves D. B., Hamaguchi S., Hieftje G., Hori M., Kaganovich I. D., Kortshagen U., Kushner M. J., Mason N. J., Mazouffre S., Thagard S. Mededovic, Metelmann H-R, Mizuno A., Moreau E., Murphy A. B., Niemira B. A., Oehrlein G. S., Petrovic Z. Lj, Pitchford L. C., Pu Y-K, Rauf S., Sakai O., Samukawa S., Starikovskaia S., Tennyson J., Terashima K., Turner M. M., van de Sanden M. C. M., Vardelle A.

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 32 )   2017.8

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    DOI: 10.1088/1361-6463/aa76f5

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  180. Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation Reviewed

    Zecheng Liu, Masato Imamura, Atsuki Asano, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, and Masaru Hori

    Applied Physics Express   Vol. 10   2017.8

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    DOI: 10.7567/APEX.10.086502

  181. Lipid Droplets Exhaustion with Caspases Activation in HeLa Cells Cultured in Plasma-Activated Medium (PAM) Observed By Multiplex Coherent Anti-Stokes Raman Scattering (CARS) Microscopy Reviewed

    Ryo Furuta, Naoyuki Kurake, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine and Masaru Hori

    Biointerphases   Vol. 12 ( 3 )   2017.8

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    DOI: 10.1116/1.4997170

  182. Measurement of F-, O- and CF3- densities in 60 and 100 MHz asymmetric capacitively coupled plasma discharge produced in an Ar/O2/C4F8 gas mixture Reviewed

    N Sirse, T Tsutsumi, M Sekine, M Hori and A R Ellingboe

    Journal of Physics D: Applied Physics   Vol. 50 ( 33 )   2017.7

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    DOI: 10.1088/1361-6463/aa77c4

  183. Novel Intraperitoneal Treatment With Non-Thermal Plasma-Activated Medium Inhibits Metastatic Potential of Ovarian Cancer Cells Reviewed

    Kae Nakamura, Yang Peng, Fumi Utsumi, Hiromasa Tanaka, Masaaki Mizuno, Shinya Toyokuni, Masaru Hori, Fumitaka Kikkawa & Hiroaki Kajiyama

    Scientific Reports   Vol. 7   2017.7

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    DOI: 10.1038/s41598-017-05620-6

  184. State of the art in medical applications using non-thermal atmospheric pressure plasma Reviewed

    Hiromasa Tanaka, Kenji Ishikawa, Masaaki Mizuno, Shinya Toyokuni, Hiroaki Kajiyama, Fumitaka Kikkawa, Hans-Robert Metelmann, Masaru Hori

    Plasma Physics, Association of Asia Pacific Physical Societies 2017   Vol. 1   2017.7

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    DOI: 10.1007/s41614-017-0004-3

  185. Non-thermal plasma induces a stress response in mesothelioma cells resulting in increased endocytosis, lysosome biogenesis and autophagy Reviewed

    Lei Shi, Fumiya Ito, Yue Wang, Yasumasa Okazaki, Hiromasa Tanaka, Masaaki Mizuno, Masaru Hori, Tasuku Hirayama, Hideko Nagasawa, Des R. Richardson, Shinya Toyokuni

    Free Rad. Biol. Med   Vol. 108   page: 904-917   2017.7

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    DOI: 10.1016/j.freeradbiomed.2017.04.368

  186. Temperature dependence of protection layer formation on organic trench sidewall in H2/N2 plasma etching with control of substrate temperature Reviewed

    Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 56 ( 21 )   2017.6

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    DOI: 10.7567/JJAP.56.076202

  187. Intracellular-Molecular Changes in Plasma-irradiated Budding Yeast Cells Studied Using Multiplex Coherent Anti-Stokes Raman Scattering Microscopy Reviewed

    Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto, Sekine, and Masaru Hori

    Physical Chemistry Chemical Physics   Vol. 19 ( 21 )   2017.6

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    DOI: 10.1039/C7CP00489C

  188. Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition Reviewed

    Masakazu Tomatsu, Mineo Hiramatsu, John S. Foord, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Keigo Takeda and Masaru Hori

    Journal of Applied Physics   Vol. 56 ( 6S2 )   2017.6

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    DOI: 10.7567/JJAP.56.06HF03

  189. Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions? Reviewed

    K. Ishikawa, K. Karahashi, T. Ichiki, J. P. Chang, S. M. George, W. M. M. Kessels, H. J. Lee, S. Tinck, J. H. Um, K. Kinoshita

    Japanese Journal of Applied Physics   Vol. 56 ( 6S2 )   2017.6

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    DOI: 10.7567/JJAP.56.06HA02

  190. Micro-Coordination of Pacemaker Potentials in the Intestine of the Mouse

    Morishita Hirotaka, Iwata Naoko, Takai Chiho, Mochizuki Naoto, Kaji Noriyuki, Hori Masatoshi, Kajioka Shunichi, Nakayama Shinsuke

    GASTROENTEROLOGY   Vol. 152 ( 8 ) page: 1831-+   2017.6

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    DOI: 10.1053/j.gastro.2017.04.016

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  191. Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas Reviewed

    Toshinari Ueyama, Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Manabu Iwata, Yoshinobu Ohya, Hideo Sugai, and Masaru Hori

    Journal of Applied Physics   Vol. 56 ( 6S2 )   2017.5

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    DOI: 10.7567/JJAP.56.06HC03

  192. Advanced Plasma Etching Processing: Atomic Layer Etching for Nanoscale Devices Reviewed

    Takayoshi Tsutsumi, M. Zaitsu, Akiko Kobayashi, N. Kobayashi, and Masaru Hori

    ECS Transactions   Vol. 77 ( 3 )   2017.5

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    DOI: 10.1149/07703.0025ecst

  193. Growth of InN firms by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 °C Reviewed

    S. Takai, Y. Lu, O. Oda, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine and M. Hori

    Journal of Applied Physics   Vol. 56 ( 6S2 )   2017.5

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    DOI: 10.7567/JJAP.56.06HE08

  194. 電子スピン共鳴法を活用したプラズマバイオ反応プロセスの診断

    石川健治 近藤隆 竹田圭吾 呉準席 橋爪博司 田中宏昌 近藤博基 太田貴之 伊藤昌文 関根誠 堀勝

    プラズマ・核融合学会誌   Vol. 93 ( 5 ) page: 246-252   2017.5

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  195. Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

    Shinoda K., Miyoshi N., Kobayashi H., Miura M., Kurihara M., Maeda K., Negishi N., Sonoda Y., Tanaka M., Yasui N., Izawa M., Ishii Y., Okuma K., Saldana T., Manos J., Ishikawa K., Hori M.

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 19 )   2017.5

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    DOI: 10.1088/1361-6463/aa6874

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  196. Intraperitoneal Administration of Plasma-Activated Medium: Proposal of a Novel Treatment Option for Peritoneal Metastasis From Gastric Cancer Reviewed

    Shigeomi Takeda, Suguru Yamada, Norifumi Hattori, Kae Nakamura, Hiromasa Tanaka, Hiroaki Kajiyama, Mitsuro Kanda, Daisuke Kobayashi, Chie Tanaka, Tsutomu Fujii, Michitaka Fujiwara, Masaaki Mizuno, Masaru Hori, Yasuhiro Kodera

    Annals of Surgical Oncology   Vol. 24 ( 5 )   2017.5

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    DOI: 10.1245/s10434-016-5759-1

  197. Effect of plasma-activated medium on the decrease of tumorigenic population in lymphoma Reviewed

    N. Wada, J. Ikeda, H. Tanaka, H. Sakakita, M. Hori, Y. Ikehara, E. Morii

    Pathology - Researchand Practice   Vol. 213   2017.4

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    DOI: 10.1016/j.prp.2017.04.003

  198. Bactericidal pathway of Escherichia coli in buffered saline treated with oxygen radicals Reviewed

    Tsuyoshi Kobayashi, Natsumi Iwata, Jun-Seok Oh, Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, 20Masaru Hori, and Masafumi Ito

    J. Phys. D: Appl. Phys   Vol. 50 ( 15 )   2017.4

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    DOI: 10.1088/1361-6463/aa61d7/

  199. Absolute density of precursor SiH3 radicals and H atoms in H2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films Reviewed

    Yusuke Abe , Kenji Ishikawa , Keigo Takeda , Takayoshi Tsutsumi , Atsushi Fukushima , Hiroki KONDO , Makoto Sekine , Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 50 ( 19 )   2017.4

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    DOI: DOI: 10.1088/1361-6463/aa6874

  200. Spatial distributions of O, N, NO, OH and vacuum ultraviolet light along gas flow direction in an AC-excited atmospheric pressure Ar plasma jet generated in open air Reviewed

    Keigo Takeda, Kenji Ishikawa, Hiromasa Tanaka, Makoto Sekine, and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 50 ( 19 )   2017.4

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    DOI: 10.1088/1361-6463/aa6555

  201. Investigation of the radially resolved oxygen dissociation degree and local mean electron energy in oxygen plasmas in contact with different surface materials Reviewed

    T. Tsutsumi, A. Greb, A. R. Gibson, M. Hori, D. OConnell, T. Gans

    Journal of Physics D: Applied Physics   Vol. 50 ( 19 )   2017.4

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    DOI: 10.1088/1361-6463/aa6555

  202. Bactericidal pathway of Escherichia coli in buffered saline treated with oxygen radicals Reviewed

    Tsuyoshi Kobayashi, Natsumi Iwata, Jun-Seok Oh, Hiroshi Hahizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori and Masafumi Ito

    Journal of Physics D: Applied Physics   Vol. 50 ( 15 )   2017.3

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    DOI: DOI: 10.1088/1361-6463/aa61d7

  203. Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas Reviewed

    Yoshinobu Ohya, Kenji Ishikawa, Tatsuya Komuro, Tsuyoshi Yamaguchi, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 50 ( 15 )   2017.3

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    DOI: DOI: 10.1088/1361-6463/aa60f7

  204. Effects of OH and NO radicals in the aqueous phase on H2O2 and NO2-generated in plasma-activated medium Reviewed

    Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Kae Nakamura, Hiroaki Kajiyama, Takashi Kondo, Fumitaka Kikkawa, Masaaki Mizuno and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 50 ( 15 )   2017.3

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    DOI: DOI: 10.1088/1361-6463/aa5f1

  205. Effects of center dot OH and center dot NO radicals in the aqueous phase on H2O2 and NO2- generated in plasma-activated medium

    Kurake Naoyuki, Tanaka Hiromasa, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Nakamura Kae, Kajiyama Hiroaki, Kondo Takashi, Kikkawa Fumitaka, Mizuno Masaaki, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 15 )   2017.3

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    DOI: 10.1088/1361-6463/aa5f1d

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  206. Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas Reviewed

    Ohya Yoshinobu, Ishikawa Kenji, Komuro Tatsuya, Yamaguchi Tsuyoshi, Takeda Keigo, Kondo Hiroki, Sekine Makoto, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 15 )   2017.3

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    DOI: 10.1088/1361-6463/aa60f7

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  207. Postpartum atypical hemolytic uremic syndrome with complement factor H mutation complicated by reversible cerebrovascular constriction syndrome successfully treated with eculizumab Reviewed

    Yamaguchi Makoto, Hori Mayuko, Hiroshi Nagaya, Maruyama Shoichi

    THROMBOSIS RESEARCH   Vol. 151   page: 79-81   2017.3

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    DOI: 10.1016/j.thromres.2017.01.013

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  208. Behavior of absolute densities of atomic oxygen in the gas phase near an object surface in an AC-excited atmospheric pressure He plasma jet Reviewed

    Keigo Takeda, Takumi Kumakura, Kenji Ishikawa, Hiromasa Tanaka, Makoto Sekine and Masaru Hori

    Applied Physics Express   Vol. 10 ( 3 )   2017.2

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    DOI: DOI: 10.7567/APEX.10.036201

  209. Characteristics of optical emissions of arc plasma processing for high-rate synthesis of highly crystalline single-walled carbon nanotubes Reviewed

    A. Ando, K. Takeda, T. Ohta, M. Ito, M. Hiramatsu, K. Ishikawa, H. Kondo, M. Sekine, T. Suzuki, S. Inoue, Y. Ando, M. Hori

    Japanese Journal of Applied Physics   Vol. 56 ( 3 )   2017.2

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    DOI: DOI: 10.7567/APEX.9.096201

  210. Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl2 plasma etching of GaN Reviewed

    Zecheng Liu, Jialin Pan, Atsuki Asano, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine and Masaru Hori

    "Japanese Journal of Applied   Vol. 56   2017.1

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    DOI: DOI:10.7567/JJAP.56.026502

  211. Absolute density of precursor SiH3 radicals and H atoms in H2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

    Yusuke Abe , Kenji Ishikawa , Keigo Takeda , Takayoshi Tsutsumi , Atsushi Fukushima , Hiroki KONDO , Makoto Sekine , Masaru Hori

    Applied Physics Letters (2017)     2017.1

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    DOI: 10.1063/1.4974821

  212. Densities and Surface Reaction Probabilities of Oxygen and Nitrogen Atoms During Sputter Deposition of ZnInON on ZnO Reviewed

    Matsushima Koichi, Ide Tomoaki, Takeda Keigo, Hori Masaru, Yamashita Daisuke, Seo Hyunwoong, Koga Kazunori, Shiratani Masaharu, Itagaki Naho

    IEEE TRANSACTIONS ON PLASMA SCIENCE   Vol. 45 ( 2 ) page: 323-327   2017.1

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    DOI: 10.1109/TPS.2016.2632124

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  213. Intraperitoneal Administration of Plasma-Activated Medium: Proposal of a Novel Treatment Option for Peritoneal Metastasis From Gastric Cancer Reviewed

    Shigeomi Takeda, Suguru Yamada, Norifumi Hattori, Kae Nakamura, Hiromasa Tanaka, Hiroaki Kajiyama, Mitsuro Kanda, Daisuke Kobayashi, Chie Tanaka, Tsutomu Fujii, Michitaka Fujiwara, Masaaki Mizuno, Masaru Hori, Yasuhiro Kodera

    Annals of Surgical Oncology   Vol. 24 ( 5 ) page: 1-7   2017.1

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    DOI: DOI: 10.1245/s10434-016-5759-1

  214. Annual shell growth pattern of the Stimpson's hard clam Mercenaria stimpsoni as revealed by sclerochronological and oxygen stable isotope measurements

    Kubota Kaoru, Shirai Kotaro, Murakami-Sugihara Naoko, Seike Koji, Hori Masako, Tanabe Kazushige

    PALAEOGEOGRAPHY PALAEOCLIMATOLOGY PALAEOECOLOGY   Vol. 465   page: 307-315   2017.1

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    DOI: 10.1016/j.palaeo.2016.05.016

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  215. Medical applications of non-thermal atmospheric pressure plasma

    Tanaka Hiromasa, Hori Masaru

    JOURNAL OF CLINICAL BIOCHEMISTRY AND NUTRITION   Vol. 60 ( 1 ) page: 29-32   2017.1

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    DOI: 10.3164/jcbn.16-67

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  216. Advanced Plasma Etching Processing: Atomic Layer Etching for Nanoscale Devices

    Tsutsumi T., Zaitsu M., Kobayashi A., Kobayashi N., Hori M.

    PLASMA NANO SCIENCE AND TECHNOLOGY   Vol. 77 ( 3 ) page: 25-28   2017

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    DOI: 10.1149/07703.0025ecst

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  217. Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication

    Shinoda K., Miyoshi N., Kobayashi H., Kurihara M., Izawa M., Ishikawa K., Hori M.

    ATOMIC LAYER DEPOSITION APPLICATIONS 13   Vol. 80 ( 3 ) page: 3-14   2017

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    DOI: 10.1149/08003.0003ecst

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  218. Plasma-inspired biomaterials Reviewed

    Cvelbar Uros, Canal Cristina, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 4 )   2016.12

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    DOI: 10.1088/1361-6463/50/4/040201

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  219. Medical applications of non-thermal atmospheric pressure plasma

    Hiromasa Tanaka, Masaru Hori

    J. Clin. Biochem. Nutr.   Vol. 60 ( 1 ) page: 29-32   2016.12

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  220. Future perspective of strategic non-thermal plasma therapy for cancer treatment

    Hiroaki Kajiyama, fumi Utsumi, Kae Nakamura, Hiromasa Tanaka, Shinya Toyokuni, Masaru Hori, Fumitaka Kikkawa

    J. Clin. Biochem. Nutr.   Vol. 60 ( 1 ) page: 33-38   2016.12

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  221. Atomic layer etching of SiO2 by alternating an O2 plasma with fluorocarbon film deposition

    Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, Nobuyoshi Kobayashi

    Journal of Vacuum Science & Technology   Vol. 35   2016.11

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    DOI: 10.1116/1.4971171

  222. Non-Thermal atmospheric pressure plasma activated lactate in Ringer's solution for anti-tumor effects

    H.Tanaka, K.Nakamura, M.Mizuno, K.Ishikawa, K.Takeda, h.Kajiyama, F.Utsumi, F.Kikkawa, M.Hori

    Scientific Report   Vol. 35   2016.11

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    DOI: DOI:10.1038

  223. Effects of assisted magnetic field to an atomospheric-pressure plasma jet on radical generation at the plasma-surface interface and bactericidal function Reviewed

    Chih-Tung Liu, Takumi Kumakura, Kenji Ishikawa, Hiroshi Hashizume, Keigo Takeda, Masafumi Ito, Masaru Hori, Jong-Shinn Wu

    Plasam Source Science and Technology   Vol. 25 ( 6 )   2016.10

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    DOI: 10.1088/0963-0252/25/6/065005

  224. Cell survival of glioblastoma grown in medium containing hydrogen peroxide and/or nitrite, or in plasma-activated medium

    Naoyuki Kurake,Hiromasa Tanaka, Kenji Ishikawa, Takashi Kondo, Makoto Sekine, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Masaru Hori

    Archives of Biochemistry and Biophysics   Vol. 605   page: 102-108   2016.9

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    DOI: DOI :10.1016/j.abb.2016.01.011

  225. Low-temperature plasma in biology and medicine

    Masaru Hori, Eun Ha Choi, Shinya Toyokuni

    Archives of Biochemistry and Biophysics   Vol. 605   page: 1-2   2016.9

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  226. Red Blood Cell Coagulation Induced by Low-temperature Plasma Treatment

    K. Miyamoto, S. Ikehara, H. Takei, Y. Akimoto, H. Sakakita, K. Ishikawa, M. Ueda, J. Ikeda, M. Yamagishi, J. Kim, T. Yamaguchi, H. Nakanishi, T. Shimizu, N. Shimizu, M. Hori, and Y. Ikehara

    Arch. Biochem. Biophys   Vol. 605   page: 95–101   2016.9

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    DOI: 10.1016/j.abb.2016.03.023

  227. Galectin expression in healing wounded skin treated with low-temperature plasma: Comparison with treatment by electronical coagulation

    Y. Akimoto, S. Ikehara, T. Yamaguchi, J. Kim, H. Kawakami, N. Shimizu, M. Hori, H. Sakakita, and Y. Ikehara

    Arch. Biochem. Biophys.   Vol. 605   page: 1-9   2016.9

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    DOI: 10.1016/j.abb.2016.01.012

  228. Low temperature plasma processing for cell growth inspired carbon thin films fabrication Reviewed

    M. Kumar, J. X. Piao, S. B. Jin, J. H. Lee, S. Tajima, M. Hori, and J. G. Han

    Archives of Biochemistry and Biophysics   Vol. 605   page: 41–48   2016.9

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    DOI: DOI: 10.1016/j.abb.2016.03.026

  229. Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching

    T. Tsutsumi, Y. Fukunaga, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori

    IEEE Trans. Semicond. Manuf. 28 (4)     page: pp. 515-520   2016.8

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    DOI: 10.1109/TSM.2015.2470554

  230. Synthesis of calcium oxalate crystals in culture medium irradiated with non-equilibrium atmospheric-pressure plasma Reviewed

    Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Yoko Yamanishi and Masaru Hori

    Applied Physics Express   Vol. 9 ( 9 )   2016.8

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    DOI: DOI: 10.7567/APEX.9.096201

  231. Rapid electron density decay observed by surface-wave probe in afterglow of pulsed fluorocarbon-based plasma

    Y. Ohya, M. Iwata, K. Ishikawa, M.Sekine, M.Hori and H.Sugai

    Japanese Journal of Applied Physics   Vol. 55 ( 8 ) page: 10.7567/JJAP.55.080309   2016.7

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  232. Non-thermal plasma prevents progression of endometriosis in mice

    Chiharu Ishida, Masahiko Mori, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Masaru Hori, Akira Iwase, Fumitaka Kikkawa and Shinya Toyokuni

        page: 111   2016.7

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  233. Plasma-Activated Medium Selectively Eliminates Undifferentiated Human Induced Pluripotent Stem Cells

    R. Matsumoto, K. Shimizu, T. Nagashima, H. Tanaka, M. Mizuno, F. Kikkawa, M. Hori, and H. Honda

    Regenerative Therapy   Vol. 5   page: 55-63   2016.7

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    DOI: 10.1016/j.reth.2016.07.001

  234. Possible therapeutic option of aqueous plasma for refractory ovarian cancer

    H. Kajiyama, F. Utsumi, K. Nakamura, H. Tanaka, M. Mizuno, S. Toyokuni, M. Hori, and F. Kikkawa

    Clinical Plasma Medicine   Vol. 4 ( 1 ) page: 14-18   2016.7

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    DOI: 10.1016/j.cpme.2015.12.002

  235. Microfluidic Transport Through Microsized Holes Treated by Nonequilibrium Atmospheric-Pressure Plasma

    Takumi Ito, Kenji Ishikawa,Daisuke Onoshima, Naoto Kihara,Kentaro Tatsukoshi Hidefumi Odaka, Hiroshi Hashizume,Hiromasa Tanaka,Hiroshi Yukawa, Keigo Takeda Hiroki Kondo, Makoto Sekine, Yoshinobu Baba, Masaru Hori

    IEEE Transactions on Plasma Science     2016.6

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    DOI: 10.1109/TPS.2016.2571721

  236. Computational study on SiH4 dissociation channels and H abstraction reactions Reviewed

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

    Japanese Journal of Applied Physics   Vol. 55 ( 7S2 )   2016.6

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    DOI: DOI: 10.7567/JJAP.55.07LD07

  237. Helium-based cold atmospheric plasma-induced reactive oxygen species-mediated apoptotic pathway attenuated by platinum nanoparticles Reviewed

    Jawaid P, Rehman MU, Zhao QL, Takeda K, Ishikawa K, Hori M, Shimizu T, Kondo T.

    J Cell Mol Med     2016.6

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    DOI: 10.1111/jcmm.12880

  238. Role of surface-electrical properties on the cell-viability of carbon thin films grown in nanodomain morphology

    Amjed Javid,, Manish Kumar, Seokyoung Yoon, Jung Heon Lee,Satomi Tajima, Masaru Hori and Jeon Geon Han

    J. Phys. D: Appl. Phys.   Vol. 49 ( 26 )   2016.5

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    DOI: 10.1088/0022-3727/49/26/264001

  239. Biphasic effects of l-ascorbate on the tumoricidal activity of non-thermal plasma against malignant mesothelioma cells

    L. Shi, Y.Wang, F.Ito, Y.Okazaki, H.Tanaka, M.Mizuno, M.Hori, D.R.Richardson, S.Toyokuni

    Archives of Biochemistry and Biophysics   Vol. 605   page: 109-116   2016.5

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  240. Nanopore formation process in artificial cell membrane induced by plasma-generated reactive oxygen species

    R.Tero, R.Yamashita, H.Hashizume, Y.Suda, H.Takikawa, M.Hori, M.Ito

    Archives of Biochemistry and Biophysics   Vol. 605   page: 26-33   2016.5

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    DOI: DOI:10.1016/j.abb.2016.05.014

  241. Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas Reviewed

    Y. Ohya, M. Tomura, K. Ishikawa, M. Sekine, and M. Hori

    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films   Vol. 34 ( 4 )   2016.5

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    DOI: DOI: 10.1116/1.4949570

  242. The role of plasma chemistry on functional silicon nitride film properties deposited at low-temperature by mixing two frequency powers using PECVD

    B. B. Sahu,Y. Y. Yin,T. Tsutsumi, M. Hori, Jeon G. Han

    Phys. Chem. Chem. Phys     2016.4

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    DOI: 10.1039/C6CP00986G

  243. Effects of nitrogen on the apoptosis of and changes in gene expression in human lymphoma U937 cells exposed to argon-based cold atmospheric pressure plasma

    Yoshikawa Tabuchi, Hidefumi Uchiyama, Quing-Li XZhao, Tatsuya Yunoki, Gabor Andocs, Nobuyuki Nojima, Kengo Takeda, Kenji Ishikawa, Masaru Hori, Takashi Kondo

    International Journal of Molecular Medicine   Vol. 37 ( 6 ) page: 1706-1714   2016.4

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    DOI: DOI:10.3892/ijmm.2016.2574

  244. Variable susceptibility of ovarian cancer cells to non-thermal plasma-activated medium Reviewed

    F. Utsumi, H. Kajiyama, K. Nakamura, H. Tanaka, M. Mizuno, S. Toyokuni, M. Hori, and F. Kikkawa

    Oncology Report   Vol. 35 ( 6 ) page: 3169–3177   2016.4

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    DOI: DOI: 10.3892/or.2016.4726

  245. Low temperature plasma processing for cell growth inspired carbon thin films fabrication

    M.Kumar, J.X.Piao, S.B.Jin, J.H.Lee, S.Tajima, M.Hori, J.G.Han

    Archives of Biochemistry and Biophysics   Vol. 605   page: 41-48   2016.3

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  246. Red blood cell coagulation induced by low-temperature plasma treatment

    K,Miyamoto, S.Ikehara, H.Takei, Y.Akimoto, H.Sakakita, K. Ishikawa, M.Ueda, J.Ikeda, M.Yamagishi, J.Kim, T. Yamaguchi, H. Nakanishi, T.Shimizu, N.Shimizu, M.Hori, Y.Ikehara

    Archives of Biochemistry and Biophysics   Vol. 605   page: 95-101   2016.3

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  247. Galectin expression in healing wounded skin treated with low-temperature plasma: Comparison with treatment by electronical coagulation

    Y.Akimoto, S.Ikehara, T.Yamaguchi, J.Kim, H. Kawakami, N.Shimizu, M.Hori, H. Sakakita, Y.Ikehara

    Archives of Biochemistry and Biophysics   Vol. 305   page: 86-94   2016.1

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  248. Synthesis of calcium oxalate crystals in culture medium irradiated with non-equilibrium atmospheric-pressure plasma

    M. Hori, N.Kurake, Y.Yamanishi, M.Mizuno, K.Nakamura, K.Ishikawa, H.Tanaka

        page: 111   2016

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  249. Plasma-Activated Medium Selectively Eliminates Undifferentiated Human Induced Pluripotent Stem Cells

    Ryo Matsumoto, Kazunori Shimizu, Takunori Nagashima, Hiromasa Tanaka, Masaaki Mizuno, Fumitaka Kikkawa, Masaru Hori, Hiroyuki Honda

    Regenerative Therapy     page: 111   2016

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  250. Effects of assisted magnetic field to an atmospheric-pressure plasma jet on radical generation at the plasma-surface interface and bactericidal function

    Liu, Chih-Tung; Kumakura, Takumi; Ishikawa, Kenji; Hashizume, Hiroshi; Takeda, Keigo; Ito, Masafumi; Hori, Masaru; Wu, Jong-Shinn

    Plasma Sources Science and Technology     page: 111   2016

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  251. Plasma with high electron density and plasma-activated medium for cancer treatment

    H. Tanaka, M. Mizuno, K. Ishikawa, H. Kondo, K. Takeda, H. Hashizume, K. Nakamura, F. Utsumi, H. Kajiyama, H. Kano, Y. Okazaki, S. Toyokuni, S. Akiyama, S. Maruyama, S. Yamada, Y. Kodera, H. Kaneko, H. Terasaki, H. Hara, T. Adachi, M. Iida, I. Yajima, M. Kato, F. Kikkawa, M. Hori

    Clinical Plasma Medicine 3     page: pp. 72-76   2015.12

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    DOI: 10.1016/j.cpme.2015.09.001

  252. Histological and Nuclear Medical Comparison of Inflammation After Hemostasis with Non-Thermal Plasma and Thermal Coagulation

    Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori,Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori,Hajime Sakakita, Yuzuru Ikehara, Shuichi Enomoto

    Plasma Process and Polymers     2015.12

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    DOI: 10.1002/ppap.201500099

  253. Plasma and Cancer

    Masashi Ueda, Daiki Yamagami, Keiko watanabe, Asami Mori, Hiroyuki Kimura, Masaru Hori, Mounir Laroussi, Kai Masur, Yuzuru Ikehara ,

    Plasma Processes and Polymers 12,No. 12     page: p.p. 1329-1469   2015.12

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    DOI: 10.1002/ppap.201570043

  254. プラズマ医療の可能性と今後の展望

    田中宏昌、堀 勝

    ファルマシア/メカノバイオロジーと薬の融合   Vol. 51 ( 11 ) page: 1053   2015.11

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  255. Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method Reviewed

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Jpn. J. Appl. Phys. 55 (1S)   Vol. 55 ( 1S ) page: 01AA11   2015.11

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    DOI: 10.7567/JJAP.55.01AA11

  256. Real-time temperature-monitoring of Si substrate during plasma processing and its heat-flux analysis

    T. Tsutsumi, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori

    Jpn. J. Appl. Phys. 55 (1S)     page: 01AB04:1-4   2015.11

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    DOI: 10.7567/JJAP.55.01AB04

  257. Cancer therapy using non-thermal atmospheric pressure plasma with ultra-highelectron density

    H. Tanaka, M. Mizuno, S. Toyokuni, S. Maruyama, Y. Kodera, H. Terasaki, T. Adachi, M. Kato, F. Kikkawa, M. Hori

    Phys Plasmas     page: 122004   2015.10

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    DOI: 10.1063/1.4933402

  258. Development of Microelectrode Arrays Using Electroless Plating for CMOS-Based Direct Counting of Bacterial and HeLa Cells

    Niitsu K, Ota S, Gamo K, Kondo H, Hori M, Nakazato K

    IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS, VOL. 9, NO. 5     page: p.p.607-619   2015.10

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    DOI: 10.1109/TBCAS.2015.2479656

  259. Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD Reviewed

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. 68th GEC/9th ICRP/33rd SPP   Vol. 60 ( 9 ) page: GT1.145   2015.10

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  260. Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization Reviewed

    T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

    Proc. 68th GEC/9th ICRP/33rd SPP   Vol. 60 ( 9 ) page: GT1.155   2015.10

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  261. Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films Reviewed

    K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

    Proc. 68th GEC/9th ICRP/33rd SPP   Vol. 60 ( 9 ) page: GT1.154   2015.10

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  262. Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films Reviewed

    T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

    Proc. 68th GEC/9th ICRP/33rd SPP   Vol. 60 ( 9 ) page: GT1.150   2015.10

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  263. Effectiveness of plasma treatment on pancreatic cancer cells

    N. Hattori, S. Yamada, K. Torii, S. Takeda, K. Nakamura, H. Tanaka, H. Kajiyama, M. Kanda, T. Fujii, G. Nakayama, H. Sugimoto, M. Koike, S. Nomoto, M. Fujiwara, M. Mizuno, M. Hori, Y. Kodera

    International journal of oncology, 47     page: pp. 1655-1662   2015.9

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    DOI: 10.3892/ijo.2015.3149

  264. Growth control of Saccharomyces cerevisiae through dose of oxygen atoms

    Hiroshi Hashizume, Takayuki Ohta, Masaru Hori, and Masafumi Ito

    APPLIED PHYSICS LETTERS     2015.9

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    DOI: 10.1063/1.4929952

  265. EPR-Spin Trapping and Flow Cytometric Studies of Free Radicals Generated Using Cold Atmospheric Argon Plasma and X-Ray Irradiation in Aqueous Solutions and Intracellular Milieu Reviewed

    Hidefumi Uchiyama, Qing-Li Zhao, Mariame Ai Hassan, Gabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji ishikawa, Masaru Hori, Takashi Kondo

    PLOS one     2015.8

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    top 10% most cited PLOS One (2015)

    DOI: 10.1371/journal.pone.0136956

  266. Wavelength dependence for silicon-wafer temperature measurement by autocorrelationtype frequency-domain low-coherence interferometry

    T. Tsutsumi, T. Ohta, K. Takeda, M. Ito, M. Hori

    Appl. Opt. 54 (23)     page: pp. 7088-7093   2015.8

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    DOI: 10.1364/AO.54.007088

  267. Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method Reviewed

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Trans. Mater. Res. Soc. Jpn.   Vol. 40 ( 2 ) page: 123-128   2015.7

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    DOI: 10.14723/tmrsj.40.123

  268. Utility of dual frequency hybrid source for plasma and radical generation

    Kyung Sik Shin, Bibhuti Bhusan Sahu, Jeon Geon Han, and Masaru Hori

    Japanese Journal of Applied Physics     2015.6

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    DOI: 10.7567/JJAP.54.076201

  269. Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence Reviewed

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori

    J. Phys. : Conf. Series (SPSM26)   Vol. 518 ( 1 ) page: 012010   2015.6

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    DOI: 10.1088/1742-6596/518/1/012010

  270. Suppression of plasma-induced damage on GaN etched by a Cl2 plasma at high temperatures

    Zecheng Liu, Jialin Pan, Takashi Kako, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo,Osamu Oda, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys. 54 (6S2)     page: 06GB04   2015.6

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    DOI: 10.7567/JJAP.54.06GB04

  271. Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering

    Kyung Sik Shin, Bibhuti Bhusan Sahu, Jeon Geon Han, and Masaru Hori

    Japanese Journal of Applied Physics     2015.5

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    DOI: 10.7567/JJAP.54.060303

  272. Electronic properties of HBr, O2 and Cl2 used in Si etching

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Japanese Journal of Applied Physics     2015.5

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    DOI: 10.7567/JJAP.54.06GA03

  273. シリコン薄膜形成プロセスにおけるプラズマ中の水素原子の計測とその挙動

    堀勝、阿部祐介、竹田圭吾、石川健治、近藤博基、関根誠、韓銓健

    プラズマ・核融合学会誌   Vol. 91 ( 5 ) page: 317   2015.5

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  274. プラズマ活性溶液:作用機序解明と臨床応用・産業化を目指して

    田中宏昌 、水野正明、豊國伸哉、丸山彰一、小寺泰弘、吉川史隆、堀勝

    福岡医学雑誌   Vol. 106 ( 4 ) page: 71-76   2015.4

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  275. Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton

    Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Japan. J. Appl. Phys. 54 (4)     page: 40303   2015.3

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    DOI: 10.7567/JJAP.54.040303

  276. Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF hybrid plasmas using a PECVD process Plasma Sources

    Bibhuti Bhusan Sahu, Jeon G. Han, Kyung-Sik Shin, Kenji Ishikawa, Masaru Hori, and Yudai Miyawaki

    Plasma Sources Science and Technology 24 (2)     page: 25019   2015.3

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    DOI: 10.1088/0963-0252/24/2/025019

  277. CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase

    Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Japan. J. Appl. Phys. 54 (4)     page: 40301   2015.3

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    DOI: 10.7567/JJAP.54.040301

  278. Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD Reviewed

    X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, .M. Hori

    Jpn. Phys. Soc. Conf. Proc (APPC12)   Vol. 1   page: 015072   2015.3

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    DOI: 10.7566/JPSCP.1.015072

  279. New line plasma source excited by 2.45 GHz microwave at atmospheric pressure

    Haruka Suzuki,Suguru Nakano,Hitoshi Itoh,Makoto Sekine,Masaru Hori,and Hirotaka Toyoda

    Applied Physics Express 8     2015.2

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    DOI: 10.7567/APX.8.036001

  280. Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer

    Akihiko Kono, Yu Arai, Yousuke Goto, Masashi Yamamoto, Seiji Takahashi, Tadaaki Yamagishi, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

    Thin Solid Film 575     page: pp. 17-20   2015.2

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    DOI: 10.1016/j.tsf.2014.10.020

  281. Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals

    Yu Arai, Yusuke Noto, Yousuke Goto, Seiji Takahashi, Masashi Yamamoto, Akihiko Kono, Tatsuo Ishijima, Kenji Ishikawa, Masaru Hori, and Hideo Horibe

    Thin Solid Film 575     page: pp. 12-16   2015.2

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    DOI: 10.1016/j.tsf.2014.10.020

  282. Plasma-activated medium induces A549 cell injury via a spiral apoptotic cascade involving the mitochondrial-nuclear network

    Tetsuo Adachi, Hiromasa Tanaka, Saho Nonomura, Hirokazu Hara, Shin-ichi Kondo, Masaru Hori

    Free Radical Biology and Medicine 79     page: p.p. 28-44   2015.2

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    DOI: 10.1016/j.freeradbiomed.2014.11.014

  283. Experimental evidence of warm electron populations in magnetron sputtering plasmas

    B. B. Sahu, Jeon G. Han, Hye R. Kim, Kenji Ishikawa, and Masaru Hori

    J. Appl. Phys. 117     page: 33301   2015.1

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    DOI: 10.1063/1.4905901

  284. Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: Generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions

    Yusuke Kondo, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    J. Phys. D: Appl. Phys. 48 (4)     page: 45202   2015.1

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    DOI: 10.1088/0022-3727/48/4/045202

  285. Plasma-activated medium suppresses choroidal neovascularization in mice: a new therapeutic concept for age-related macular degeneration

    F. Ye, H. Kaneko, Y. Nagasaka, R. Ijima, K. Nakamura, M. Nagaya, K. Takayama, H. Kajiyama, T. Senga, H. Tanaka, M. Mizuno, F. Kikkawa, M. Hori, and H. Terasaki

    Sci Rep, vol. 5     page: 7705   2015.1

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    DOI: 10.1038/srep07705

  286. Langmuir probe and optical emission spectroscopy studies in magnetron sputtering plasmas for Al-doped ZnO film deposition

    B. B. Sahu, Jeon G. Han, Masaru Hori and Keigo Takeda

    J. Appl. Phys. 117     page: 23301   2015.1

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    DOI: 10.1063/1.4905541

  287. Electrical,Optical and Structural Properties of AZO Thin Film Deposited Using Facing Targets Magnetron Sputtering System with Inductively Coupled Plasma

    Hye R.Kim,Jay B.Kim,Yoon S.Choi,M.Hori,and Jeon G.Han

    American Scientific Publishers 7     page: p.p. 107-112   2015.1

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    DOI: 10.1166/sam.2015.2088

  288. Carbon nanowall scaffold to control culturing of cervical cancer cells Reviewed

    Hitoshi Watanabe, Hiroki Kondo, Yukihiro Okamoto, Mineo Hiramatsu, Makoto Sekine, Yoshinobu Baba, and Masaru Hori

    Applied Physics Letters   Vol. 105 ( 24 )   2014.12

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    DOI: 10.1063/1.4902054

  289. Plasma Medical Science for Cancer Therapy: Toward Cancer Therapy Using Nonthermal Atmospheric Pressure Plasma

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Kae Nakamura, Fumi Utsumi,Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Kae Nakamura, Fumi Utsumi, Shoichi Maruyama, Fumitaka Kikkawa, and Masaru Hori

    IEEE TRANSACTIONS ON PLASMA SCIENCE   Vol. 42 ( 12 ) page: 3760-3764   2014.12

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  290. Plasma-activated medium induces A549 cell injury via a spiral apoptotic cascade involving the mitochondrial-nuclear network. Reviewed

    Adachi T, Tanaka H, Nonomura S, Hara H, Kondo SI, Hori M

    Free Radical Biology & Medicine     2014.11

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    DOI: 10.1016/j.freeradbiomed.2014.11.014

  291. Quantitative clarification of inactivation mechanism of Penicillium digitatum spores treated with neutral oxygen radicals

    Hiroshi Hashizume,Takayuki Ohta,Keigo Takeda,Kenji Ishikawa,Masaru Hori,and Masafumi Ito

    Japanese Journal of Applied Physics 54,01ag05(2015)     2014.11

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    DOI: 10.7567/JJAP.54.01AG05

  292. Robust characteristics of semiconductor-substrate temperature measurement by autocorrelation-type frequency-domain low-coherence interferometry

    T. Tsutsumi, T. Ohta, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori, and M. Ito

    Jpn. J. Appl. Phys.   Vol. 54 ( 1S )   2014.11

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    DOI: 10.7567/JJAP.54.01AB03

  293. Plasma Nitriding Process for Aluminum Alloy and its Al Nitride Material Reviewed

    Seigo Takashima, Etsuo Asami, Masahiro Hayakawa, Koji Yamakawa, Hiroyuki Yamamoto, Shoji Den, Hitoshi Wada, Masaru Hori

      Vol. 44 ( 10 ) page: 18-23   2014.10

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  294. Localized plasma irradiation through a micronozzle for individual cell treatment Reviewed

    Ryutaro Shimane, Shinya Kumagai, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Masaru Hori and Minoru Sasaki

    Japanese Journal of Applied Physics   Vol. 53 ( 11S )   2014.10

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    DOI: 10.7567/JJAP.53.11RB03

  295. Effectiveness of plasma diagnostic in ultra high frequency and radio frequency hybrid plasmas for synthesis of silicon nitride film at low temperature

    B.B. Sahu, Kyung Sik Shin, Su B. Jin, Jeon G.Han, K.Ishikawa, M. Hori

    Journal of Applied Physics   Vol. 116   2014.10

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    DOI: 10.1063/1.4896833

  296. Recovery of atom density drift caused by change in reactor wall conditions by real-time autonomous control Reviewed

    Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori

    Journal of Physics D: Applied Physics   Vol. 47 ( 42 )   2014.9

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    DOI: 10.1088/0022-3727/47/42/422002

  297. Direct exposure of non-equilibrium atmospheric pressure plasma confers simultaneous oxidative and ultraviolet modifications in biomoleculels Reviewed

    Yasumasa Okazaki, Yue Wang, Hiromasa Tanaka, Masaaki Mizuno, Kae Nakamura, Hiroaki Kajiyama, Hiroyuki Kano, Koji Uchida, Fumitaka Kikkawa, Masaru Hori and Shinya Toyokuni

    Journal of Clinical Biochemistry and Nutrition (JCBN)   Vol. 55 ( 3 ) page: 207-215   2014.9

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    DOI: 10.3164/jcbn.14-40

  298. Non-thermal atmospheric pressure plasmas as a novel candidate for preventive therapy of melanoma. Reviewed

    Omata Y, Iida M, Yajima I, Takeda K, Ohgami N, Hori M, Kato M

    Environmental health and preventive medicine   Vol. 19 ( 5 ) page: 367-9   2014.9

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    DOI: 10.1007/s12199-014-0399-1.

  299. An atmospheric pressure inductively coupled microplasma source of vacuum ultraviolet light

    Ryoto Sato, Daisuke Yasumatsu, Shinya Kumagai, Keigo Takeda, Masaru Hori, Minoru Sasaki

    Sensors and Actuators A: Physical   Vol. 215   page: 144-149   2014.8

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  300. Effectiveness of plasma treatment on gastric cancer cells Reviewed

    Koji Torii, Suguru Yamada, Kae Nakamura, Hiromasa Tanaka, Hiroaki Kajiyama, Kuniaki Tanahashi, Naoki Iwata, Mitsuro Kanda, Daisuke Kobayashi, Chie Tanaka, Tsutomu Fujii, Goro Nakayama, Masahiko Koike, Hiroyuki Sugimoto, Shuji Nomoto, Atsushi Natsume, Michitaka Fujiwara, Masaaki Mizuno, Masaru Hori, Hideyuki Saya, Yasuhiro Kodera

    Gastric Cancer     2014.7

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    DOI: 10.1007/s10120-014-0395-6

  301. Perspective of strategic plasma therapy in patients with epithelial ovarian cancer: A short review of plasma in cancer treatment

    Hiroaki Kajiyama, Kae Nakamura, Fumi Utsumi, Hiromasa Tanaka, Masaru Hori and Fumitaka Kikkawa

    Jpn. J. Appl. Phys. 53 (5S1) (Apr 14, ,2014) 05FA05     2014.4

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    DOI: 10.7567/JJAP.53.05FA05

  302. Effects of Different Chamber-Wall Conditions on Temporal Changes of H and N Radicals Densities in H2 and N2 Mixture Gas Plasma

    Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys. 53 (5) (Apr 7, 2014) 050301     2014.4

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    DOI: 10.7567/JJAP.53.050301

  303. Temporal changes in absolute atom densities in H2 and N2 mixture gas plasmas by surface modifications of reactor wall

    Toshiya Suzuki, KeigoTakeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Japanese Journal of Applied Physics   ( 53 )   2014.4

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    DOI: 10.7567/JJAP.53.050301

  304. Epitaxial growth of GaN by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) in the downflow of a very high frequency (VHF) N2/H2 excited plasma-effect of TMG flow rate and VHF power

    Yi Lu, Hiroki Kondo, Kenji Ishikawa, Osamu Oda, Keigo Takeda, Makoto Sekine, Hiroshi Amano, and Masaru Hori

    Journal of Crystal Growth 391 (Jan 23; Apr 1, 2014)     page: 97-103   2014.4

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    DOI: 10.1016/j.jcrysgro.2014.01.014

  305. Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

    Appl. Phys. Express 7 (4) (Mar 25, 2014) 046201     2014.3

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    DOI: 10.7567/APEX.7.046201

  306. Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

    Jpn. J. Appl. Phys. 53 (4) (Mar 20, 2014) 040307     2014.3

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    DOI: 10.7567/JJAP.53.040307

  307. Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys. 53 (4) (Mar 7, 2014) 040305     page: 1-4   2014.3

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    DOI: 10.7567/JJAP.53.040305

  308. Spatiotemporal behaviors of absolute density of atomic oxygen in a planar type of Ar/O2 non-equilibrium atmospheric pressure plasma jet

    Fengdong Jia, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Jagath Kularatne, Hiroki Kondo, Makoto Sekine and Masaru Hori

    Plasma Source Sci. Technol. 23 (Mar. 3, 2014) 025004     2014.3

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    DOI: 10.1088/0963-0252/23/2/025004

  309. Effectiveness of plasma treatment on gastric cancer cells Reviewed

    Koji Torii, Suguru Yamada, Kae Nakamura, Hiromasa Tanaka, Hiroaki Kajiyama, Kuniaki Tanahashi, Naoki Iwata, Mitsuro Kanda, Daisuke Kobayashi, Chie Tanaka, Tsutomu Fujii, Goro Nakayama,Masahiko Koike, Hiroyuki Sugimoto, Shuji Nomoto, Atsushi Natsume, Michitaka Fujiwara,Masaaki Mizuno, Masaru Hori, Hideyuki Saya, Yasuhiro Kodera

    Gastric Cancer     2014.3

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    DOI: 10.1007/s10120-014-0395-6

  310. Density Control of Carbon Nanowalls Grown by CH4/H2 plasma and Their Electrical Properties

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

    Carbon 68 (Nov 15, 2013; Mar, 2014)     page: 380-388   2014.3

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    DOI: 10.1016/j.carbon.2013.11.014

  311. 未来を創るプラズマ ─ ものづくりから医療まで

    堀 勝

    応用物理   Vol. 83 ( 2 ) page: 132-135   2014

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  312. Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50 °C

    Yi Lu, Akiko Kobayashi, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys. 53 (1) (Dec 30, 2013; 2014) 010305     page: 1-4   2014

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    DOI: 10.7567/JJAP.53.010305

  313. Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50 °C

    Yi Lu, Akiko Kobayashi, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys.     2013.12

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    DOI: DOI: 10.7567/JJAP.53.010305

  314. Surface morphology on high-temperature plasma-etched gallium nitride

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Trans. Mater. Res. Soc. Jpn.   Vol. 38 ( 2 ) page: 325-328   2013.12

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    DOI: 10.14723/tmrsj.38.325

  315. A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink

    H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, K. Ishikawa, H. Kondo, M.Sekine, H. Toyoda, and M. Hori

    Journal of Physics: Conference Series   Vol. 441   2013.12

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    DOI: doi:10.1088/1742-6596/441/1/012019

  316. Effect of Indirect Nonequilibrium Atmospheric Pressure Plasma on Anti-Proliferative Activity against Chronic Chemo-Resistant Ovarian Cancer Cells In Vitro and In Vivo

    Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, and Fumitaka Kikkawa

    PLoS ONE 8 (12) (Dec. 18, 2013) e81576     2013.12

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    DOI: 10.1371/journal.pone.0081576

  317. Oxidation mechanism of Penicillium digitatum spores through neutral oxygen radicals

    Hiroshi Hashizume, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Masafumi Ito

    Jpn. J. Appl. Phys. 53 (1) (Dec 16 2013; 2014) 010209     page: 1-6   2013.12

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    DOI: 10.7567/JJAP.53.010209

  318. Investigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine

    K. Takenaka, K. Cho, Y. Setsuhara, M. Shiratani, M. Sekine, and M. Hori

    Journal of Physics: Conference Series   Vol. 441   2013.12

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    DOI: doi:10.1088/1742-6596/441/1/012001

  319. Scale-up approach for industrial plasma enchanced chemical vapor deposition processes and Siox thin film technology

    Su B. Jin, Joon S Lee, Yoon S. Choi, In S Choi, Jeon G.Han, M. Hori

    Thin Solid Films   Vol. 547   page: 193-197   2013.11

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  320. Perspective of strategic plasma therapy for prognostic improvement of patients with ovarian cancer

    Hiroaki Kajiyama, Fumi Utsumi, Kae Nakamura, Hiromasa Tanaka, Masaru Hori and Fumitaka Kikkawa

    MRS Proc 1598     2013.11

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    DOI: 10.1557/opl.2013.1188

  321. Plasma Interactions with Biological Molecules in Aqueous Solution

    Yuichi Setsuhara, Atsushi Miyazaki, Kosuke Takenaka, and Masaru Hori

    MRS Proc 1598     2013.11

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    DOI: 10.1557/opl.2013.1155

  322. High H Radical Density Produced by 1-m-length Atmospheric Pressure Microwave Plasma System

    Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, and Masaru Hori

    Jpn. J. Appl. Phys. 52 (11) (Nov 20, 2013) 11NE01     2013.11

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    DOI: 10.7567/JJAP.52.11NE01

  323. Study on Effects of Hydrogen Flow Rates on the Properties of ZnO Thin Film Deposited by Facing Targets Sputtering System

    Hye Ran Kim, L. Wen, Su Bong Jin, Yoon Seok Choi, In Sik Choi, M. Hori, and Jeon Geon Han

    Jpn. J. Appl. Phys. 52 (11) (Nov 20, 2013) 11NB01     2013.11

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    DOI: 10.7567/JJAP.52.11NB01

  324. Field Emissions from Organic Nanorods Armored with Metal Nanoparticles

    Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys. 52 (12) (Nov 15, 2013) 120203     page: 1-4   2013.11

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    DOI: 10.7567/JJAP.52.120203

  325. 卵巣癌治療におけるプラズマの応用をめざして

    梶山広明、中村香江、内海史、堀勝、古川史隆

    産婦人科の実際   Vol. 62 ( 11 ) page: 1550-1552   2013.11

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  326. Effect of gas flow on transport of O (3Pj) atoms produced in ac power excited non-equilibrium atmospheric-pressure O2/Ar plasma jet

    Keigo Takeda, Masaki Kato, Fendong Jia, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, and Masaru Hori

    J. Phys. D: Appl. Phys. 46 (Oct 30, 2013) 464006     2013.10

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    DOI: 10.1088/0022-3727/46/46/464006

  327. Inactivation effects of neutral reactive-oxygen species on Penicillium digitatum spores using non-equilibrium atmospheric-pressure oxygen radical source

    Hiroshi Hashizume, Takayuki Ohta, Jia Fengdong, Keigo Takeda,Kenji Ishikawa,Masaru Hori, and Masafumi Ito

    Appl. Phys. Lett. 103 (15) (Oct 11, 2013) 153708-1:4     2013.10

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    DOI: 10.1063/1.4824892

  328. An Atmpospheric pressure inductively coupled microplasma source of vacuum ultraviolet light

    Ryoto Sato, Daisuke Yasumatsu, Shinya Kumagai Keigo Takeda, Masaru Hori, Minoru Sasaki

    Sensors and Actuators   Vol. 215   page: 144-149   2013.9

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    DOI: 10.1016/j.sna.2013.09.018

  329. Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO -> F + FNO at an Elevated Temperature

    Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    J. Phys. Chem. C 117 (40)     page: 20810–20818   2013.9

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    DOI: 10.1021/jp4084794

  330. Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori

    Appl. Phys. Express 6 (9) (Aug 27, 2013) 095201     2013.8

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    DOI: 10.7567/APEX.6.095201

  331. Mass density control of carbon films deposited by H-assisted plasma CVD method

    Surf. Coat Technol. 228 (S1)

    Tatsuya Urakawa, Hidehumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori     page: S15-S18   2013.8

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    DOI: 10.1016/j.surfcoat.2012.10.002

  332. A novel fast and flexible technique of radical kinetic behaviour investigation based on pallet for plasma evaluation structure and numerical analysis

    Arkadiusz Malinowski, Takuya Takeuchi, Shang Chen, Toshiya Suzuki, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Lidia Lukasiak, and Andrzej Jakubowski

    J. Phys. D: Appl. Phys. 46 (26) (Jul 3, 2013) 265201     2013.7

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    DOI: 10.1088/0022-3727/46/26/265201

  333. Improving the Gas Barrier Properties of a-SiOxCyNz Film at Low Temperature using High Energy and Suitable Nitrogen Flow Rate

    Su B. Jin, Joon S.Lee, Yoon S.Choi, In S.Choi, Jeon G.Han, M.Hori

    Current Applied Physics   Vol. 13   page: 885-889   2013.7

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  334. A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink

    H Itoh,Y Kubota, Y Kashiwagi, K Takeda, K Ishikawa, H Kondo, M Sekine, H Toyoda, M Hori

    Journal of Physics: Conference Series   Vol. 441   2013.6

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    DOI: 10.1088/1742-6596/441/1/012019

  335. Surface morphology on high-temperature plasma-etched gallium nitride Reviewed

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Trans. Mater. Res. Soc. Jpn.   Vol. 38 ( 2 ) page: 325-328   2013.6

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    DOI: 10.14723/tmrsj.38.325

  336. Investigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine

    Kosuke Takenaka, Ken Cho, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, and Masaru Hori

    J. Phys.: Conf. Ser.   Vol. 441 ( 1 )   2013.6

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    DOI: 10.1088/1742-6596/441/1/012001

  337. Photoluminescence Study of Plasma-Induced Damage of GaInN Single Quantum Well

    Shouichiro Izumi, Masaki Minami, Michiru Kamada, Tetsuya Tatsumi, Atsushi A. Yamaguchi, Kenji Ishikawa, Masaru Hori, and Shigetaka Tomiya

    Jpn. J. Appl. Phys. 52 (8) (May 31, 2013) 08JL09     page: 1-4   2013.5

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    DOI: 10.7567/JJAP.52.08JL09

  338. Dissociations of C5F8 and C5HF7 in Etching Plasma

    Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

    Japanese Journal of Applied Physics   Vol. 52 ( 5 )   2013.5

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    DOI: 10.7567/JJAP.52.05EB02

  339. Wavelength dependence of photon-induced interface defects in hydrogenated silicon nitride/Si structure during plasma etching processes

    Masanaga Fukasawa, Hiroyasu Matsugai, Takayoshi Honda, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Kazunori Nagahata, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

    Jpn. J. Appl. Phys. 52 (5) (May 20, 2013) 05ED01     page: 1-4   2013.5

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    DOI: 10.7567/JJAP.52.05ED01

  340. Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability

    H. Watanabe, H. Kondo, M. Hiramatsu, M. Sekine, S. Kumar, K. Ostrikov, M. Hori

    Plasma Process. Polym. 10 (7) (May 20, 2013)     page: 582-592   2013.5

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    DOI: 10.1002/ppap.201200141

  341. A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Appl. Phys. Express 6 (5) (April 25, 2013) 056201     page: 1-4   2013.4

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    DOI: 10.7567/APEX.6.056201

  342. Inactivation Process of Penicillium digitatum Spores Treated with Non-equilibrium Atmospheric Pressure Plasma

    H. Hashizume, T. Ohta, T. Mori, S. Iseki, M. Hori, and M. Ito

    Jpn. J. Appl. Phys. 52 (5) (Apr 15, 2013) 056202     page: 1-4   2013.4

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    DOI: 10.7567/JJAP.52.056202

  343. Supercritical Fluid Deposition of High-Density Nanoparticles of Photo-Catalytic TiO2 on Carbon Nanowalls

    Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

    Appl. Phys. Express 6 (4) (2013) 045103     page: 1-4   2013.4

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    DOI: 10.7567/APEX.6.045103

  344. Study on change of electrical properties of ZnO thin films deposited in low temperature facing targets magnetron sputtering (FTS) system with H2 and O2 flow rate changes

    Hye R. Kim, Su B. Jin, Long Wen, Yoon S. Choi, In S. Choi, M. Hori, and Jeon G. Han

    Journal of Ceramic Processing Research   Vol. 14 ( 2 ) page: pp.188-193   2013.4

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  345. Graphene Nanowalls

    Mineo Hiramatsu, Hiroki Kondo and Masaru Hori

    Chapter 9 in Book "New Progress on Graphene Research"     2013.3

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    DOI: 10.5772/3358

  346. Plasma interactions with aminoacid (l-alanine) as a basis of fundamental processes in plasma medicine

    Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori

    Current Applied Physics   Vol. 13   page: S59-S63   2013.3

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  347. Optical-Fiber-Type Broadband Cavity Ring-Down Spectroscopy Using Wavelength-Tunable Ultrashort Pulsed Light

    T. Hiraoka, T. Ohta, M. Ito, N. Nishizawa, M. Hori

    Jpn. J. Appl. Phys.   ( 52 ) page: DOI: 10.7567/JJAP.52.040201   2013.3

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  348. Room-Temperature Si Etching in NO/F2 Gases and the Investigation of Surface Reaction Mechanisms

    S.Tajima, T. Hayashi , K. Ishikawa , M. Sekine , M. Hori

    J. Phys. Chem. C   ( 117 ) page: pp 5118-5125, DOI: 10.1021/jp3119132   2013.2

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  349. Etching-Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma

    Y. Miyawaki, E. Shibata, Y. Kondo, K. Takeda, H. Kondo, K. Ishikawa, H. Okamoto, M. Sekine, M. Hori

    Jpn. J. Appl. Phys.   ( 52 ) page: P.020204:1-4   2013.2

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  350. Plasma-activated medium selectively kills glioblastoma brain tumor cells by downregulating a survival signaling molecule, AKT kinase

    H. Tanaka, M. Mizuno, K. Ishikawa, K. Nakamura, H. Kajiyama, H. Kano, F. Kikkawa, M. Hori

    Plasma Medicine   Vol. 3   page: 265-277   2013.2

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  351. Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma

    T. Takeuchi, K. Ishikawa, Y. Setsuhara, K. Takeda, H. Kondo, M. Sekine, M. Hori

    J. Phys. D: Appl. Phys.   ( 46 ) page: P. 102001:1-5.   2013.2

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  352. Temperature Measurement of Si Substrate Using Optical-Fiber-Type Low-Coherence Interferometry Employing Supercontinuum Light

    Takehiro Hiraoka, Takayuki Ohta, Tetsunori Kageyama, Masafumi Ito, Norihiko Nishizawa, Masaru Hori

    Jpn. J. Appl. Phys.   ( 52 ) page: 026602-1:6   2013.2

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  353. Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition

    M. Hiramatsu, M. Naito, H. Kondo, and M. Hori

    Jpn. J. Appl. Phys. 52 (1) 01AK04     2013.1

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    DOI: 10.7567/JJAP.52.01AK04

  354. Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition

    M. Hiramatsu, Y. Nihashi, H. Kondo, and M. Hori

    Jpn. J. Appl. Phys. 52 (1) (Jan 21, 2013) 01AK05     2013.1

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    DOI: 10.7567/JJAP.52.01AK05

  355. Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells

    Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    J. Appl. Phys.   Vol. 113   page: DOI: 10.1063/1.4778608 P.033304:1-6   2013.1

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  356. Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy

    Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, Masaru Hori

    Jpn.J.Appl.Phys   ( 52 ) page: DOI: 10.7567/JJAP.52.021001   2013.1

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  357. H2/N2 plasma etching rate of carbon films deposited by H-assisted plasma CVD

    Tatsuya Urakawa, Ryuhei Torigoe, Hidefumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Keigo Takeda, Makoto Sekine, Masaru Hori

    Jpn. J. Appl. Phys.   ( 52 ) page: 1,01AB01   2013.1

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  358. Highly selective etching of SiO2 over Si3N4 and Si in capacitivlly coupled plasma employing C5HF7 gas

    Y. Miyawaki, Y. Kondo, M. Sekine, K. Ishikawa,T. Hayashi, K. Takeda, H. Kondo, M. Hori

    Jpn. J. Appl. Phys.   ( 52 ) page: 016201:1-9   2013.1

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  359. Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment

    T. Takeuchi, C. Corbella, S. Grosse-Kreul, A. von Keudell, K. Ishikawa, H. Kondo, K. Takeda, M. Sekine, M. Hori

    J. Appl. Phys.   Vol. 113   page: 014306:1-6.   2013.1

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  360. Surface loss probability of H radicals on silicon thin films in SiH4/H2 plasma

    Y. Abe, A. Fukushima, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, and M.Hori

    J. Appl. Phys.   Vol. 113 ( 1 )   2013.1

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    DOI: http://dx.doi.org/10.1063/1.4773104 (6 pages)

  361. Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry

    Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito

    Appl. Phys. Lett. 103 (18) (2013) 182102     2013

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    DOI: 10.1063/1.4827426

  362. プラズマ異方性化学気相堆積法による硬質カーボン薄膜の低温製膜

    古閑 一憲、白谷 正治、節原 裕一、関根 誠、堀 勝

    化学工業/化学工業社   Vol. 63 ( 12 ) page: 908-912   2013

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  363. Study on change of electrical properties of ZnO thin films deposited in low temperature facing targets magnetron sputtering (FTS) system with H2 and O2 flow rate changes

    Hye R. Kim, Su B. Jin, Long Wen, Yoon S. Choi, In S. Choi, M. Hori, and Jeon G. Han

    Journal of Ceramic Processing Research 14 (2)     page: 188-193   2013

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  364. Highly selective etching of SiO2 over Si3N4 and Si in capacitivlly coupled plasma employing C5HF7 gas

    Y. Miyawaki, Y. Kondo, M. Sekine, K. Ishikawa, T. Hayashi, K. Takeda, H. Kondo, M. Hori

    Jpn. J. Appl. Phys.   ( 52 ) page: 016201:1-9   2012.12

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  365. プラズマ異方性化学気相堆積法による硬質カーボン薄膜の低温製膜

    古閑 一憲、 白谷 正治、 節原 裕一、 関根 誠、 堀 勝

    月刊 化学工業/化学工業社   Vol. 63 ( 12 ) page: 908-912   2012.12

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  366. 社会イノベーションを実現する低温プラズマ科学技術

    堀 勝

      Vol. 32   page: 17   2012.12

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  367. MINIMIZING PLASMA IRRADIATION AREA BY MICRO-NOZZLE DEVICE TOWARDS SINGLE CELL TREATMENT

    Ryutaro Shimane, Shinya Kumagai, Masaru Hori, Minoru Sasaki

    Micro&Nano letters   Vol. 7   page: 1210-1212   2012.12

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    DOI: 10.1049/mln.2012.0555

  368. Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation

    Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

    Thin Solid Films   Vol. 523   page: 15-19   2012.11

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  369. Properties of Indium-Zinc-Oxide Films Synthesized by Radio Frequency Magnetron Sputtering Based on Gas Phase Monitoring Using Multi-Micro Hollow Cathode Lamp

    M. Inoue, T. Ohta, N. Takota, S. Tsuchitani, M. Ito, S. Takashima, K. Yamakawa, H. Kano, K. Takeda, M. Hori

    Jpn. J. Appl. Phys.   ( 51 ) page: DOI: 10.1143/JJAP.51.116202   2012.10

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  370. Individual Roles of Atoms and Ions during Hydrogen Plasma Passivivation of Surface Defects on GaN Created by Plasma Etching

    Shang Chen, Kenji Ishikawa, Yi Lu, Ryosuke Kometani, Keigo Takeda, Hiroki Kondo, Yutaka Tokuda, Takashi Egawa, Hiroshi Amano, Makoto Sekine, Masaru Hori

    Jpn.J.Appl.Phys   Vol. 51   page: DOI: 10.1143/JJAP.51.111002   2012.10

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  371. Critical flux ratio of hydrogen radical to film precursor in microcrystalline silicon deposition for solar cells

    Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    Appl. Phys. Volume 101, 172109     2012.10

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    DOI: 10.1063/1.4764065

  372. As-grown deep-level defects in n-GaN grown by metal-organic chemical vapor deposition on freestanding GaN

    Shang Chen, Unhi Honda, Tatsunari Shibata, Toshiya Matsumura, Yutaka Tokuda, Kenji Ishikawa, Masaru Hori, Hiroyuki Ueda, Tsutomu Uesugi, Tetsu Kachi

    J. Appl. Phys.   Vol. 112 ( 5 ) page: 10.1063/1.4748170   2012.9

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  373. プラズマナノテクノロジーによる10mmサイズ、超高アスペクト比有機ナノピラーの室温近傍形成とフレキシブルディスプレイへの応用

    堀 勝、鈴木 俊哉、竹田 圭吾、近藤 博基、石川 健治、関根 誠

    名古屋大学ベンチャー・ビジネス・ラボラトリーニュース 研究紹介(1)   Vol. 17 ( 1 ) page: 2012, Summere, No.33   2012.8

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  374. Line-Profiles and Translational Temperatures of Pb Atoms in Multi-Micro Hollow Cathode Lamp Measured by Diode Laser Absorption Spectroscopy

    M. Inoue, T. Ohta, N. Takota, S. Tsuchitani, M. Ito, S. Takashima, K. Yamakawa, H. Kano, K. Takeda, M. Hori

    Jpn. J. Appl. Phys.   ( 51 ) page: DOI: 10.1143/JJAP.51.086301   2012.7

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  375. Real-time in situ electron spin resonance measurements on fungal spores of Penicillium digitatum during exposure of oxygen plasmas

    Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Appl. Phys. Lett.   Vol. 101 ( 1 )   2012.7

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    DOI: 10:1063/1.4733387

  376. An Autonomously Controllable Plasma Etching System Based on Radical Monitoring

    Shunji Takahashi, Ryota Kawauchi, Seigo Takashima, Shoji Den, Toshiro Katagiri, Hiroyuki Kano, Takayuki Ohta, Masafumi Ito, Tatsuya Suzuki, Keigo Takeda, and Masaru Hori

    Jpn. J. Appl. Phys. 51 (2012) 076502     2012.6

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    DOI: 10.1143/JJAP.51.076502

  377. The 2012 Plasma Roadmap

    Seiji Samukawa, Masaru Hori, Shahid Rauf, Kunihide Tachibana, Peter Bruggeman, Gerrit Kroesen, J Christopher Whitehead, Anthony B Murphy, Alexander F Gutsol, Svetlana Starikovskaia, Uwe Kortshagen, Jean-Pierre Boeuf, Timothy J Sommerer, Mark J Kushner, Uwe Czarnetzki and Nigel Mason

    J. Phys. D: Appl. Phys. 45 253001     2012.6

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    DOI: 10.1088/0022-3727/45/25/253001

  378. Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature

    S. Chen, Y. Lu, R. Kometani, K. Ishikawa, H. Kondo, Y. Tokuda, M. Sekine, and M. Hori

    AIP Advances 2, 022149     2012.6

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    DOI: 10.1063/1.4729448 (2012)

  379. タングステン加熱触媒体により生成した水素ラジカルによるレジスト用ベースポリマーの分解除去

    新井 祐, 渡邉 誠, 河野 昭彦, 山岸 忠明, 石川 健治, 堀 勝, 堀邊 英夫

    高分子論文集Vol. 69 (2012) No. 6     page: p. 266-273   2012.6

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    DOI: 10.1295/koron.69.266

  380. トリフルオロメチルトリフルオロビニルエーテル混合ガスを用いた60Hz非平衡大気圧プラズマによるビア底残渣のドライデスミア

    岩田義幸, 坂本一, 竹田圭吾, 堀 勝

    表面技術, Vol.63, No.4,     page: pp.247-251   2012.4

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  381. Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma

    T. Hagino, H. Kondo, K. Ishikawa, H. Kano, M. Sekine, M. Hori

    Applied Physics Express (2012).   Vol. Vol.5   page: pp. 035101-1:3   2012.3

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    DOI: 10.1143/APEX.5.035101

  382. Plasma Agriculture

    Masafumi Ito and Takayuki Ohta, Masaru Hori

    Journal of the Korean Physical Society, Vol. 60, No. 6,     2012.3

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    DOI: DOI: 10.3938/jkps.60.937

  383. Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source

    Yasuhiro Hara, Keigo Takeda, Koji Yamakawa, Shoji Den, Hirotaka Toyoda, Makoto Sekine, and Masaru Hori

    Appl. Phys. Express 5 (2012) 035801     2012.2

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    DOI: DOI: 10.1143/APEX.5.035801

  384. Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF3 into N2 Downflow Plasma

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

    Japanese Journal of Applied Physics 51 (2012) 026505     2012.2

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    DOI: DOI: 10.1143/JJAP.51.026505

  385. Pressure dependence of carbon film deposition using H-assisted plasma CVD

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori

    Proc. 8th Int. Conf. Reactive Plasmas     page: 5P-PM-S08-P14   2012.2

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  386. Effects of Irradiation with Ions and Photons in Ultraviolet--Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas

    Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

    Jpn. J. Appl. Phys.   ( 51 ) page: 01AJ02-01AJ02-5   2012.1

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  387. Floating Wire for Enhancing Ignition of Atmospheric Pressure Inductively Coupled Microplasma

    Shinya Kumagai, Hirotaka Asano, Masaru Hori, and Minoru Sasaki

    Jpn. J. Appl. Phys. 51 (2012) 01AA01     2012.1

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    DOI: DOI: 10.1143/JJAP.51.01AA01

  388. Multiple-Height Microstructure Fabricated by Deep Reactive Ion Etching and Selective Ashing of Resist Layer Combined with Ultraviolet Curing

    Shinya Kumagai, Akiyoshi Hikita, Takuya Iwamoto, Takashi Tomikawa, Masaru Hori, and Minoru Sasaki

    Jpn. J. Appl. Phys. 51 (2012) 01AB04     2012.1

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    DOI: DOI: 10.1143/JJAP.51.01AB04

  389. Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation

    Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo,K. Ishikawa, M. Sekine, H. Matsugai, T. Honda, M. Minam, F. Uesawa, M. Hori, and T. Tatsumi

    Jpn. J. Appl. Phys.     2012.1

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    DOI: 10.1143/JJAP.51.026201

  390. Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments

    H. Watanabe, H. Kondo, M. Sekine, M. Hiramatsu ,M. Hori

    Jpn. J. Appl. Phys. 51 (2012) 01AJ07 (4 pages)     2012.1

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    DOI: 10.1143/JJAP.51.01AJ07

  391. Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature

    H. Yamamoto, H. Kuroda, M. Ito, T. Ohta, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    Jpn. J. Appl. Phys.   Vol. 51   2012.1

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    DOI: 10.1143/JJAP.51.016202 (2012)

  392. Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC

    T. Yamaguchi, T. Komuro, C. Koshimizu, S. Takashima, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    J. Phys. D: Appl. Phys.   Vol. 45   2012.1

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    DOI: 10.1088/0022-3727/45/2/025203 (2012).

  393. Chemical bond modification in porous SiOCH films by H2 and H2/N2 plasmas investigated by in situ infrared reflection absorption spectroscopy

    Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, and Masaru Hori

    Journal of Applied Physics 2011   Vol. 110 ( 123301 )   2011.12

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    DOI: doi:10.1063/1.3671547

  394. Quantum Chemical Investigation for Chemical Dry Etching of SiO2 by Flowing NF3 into H2 Downflow Plasma

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

    Japanese Journal of Applied Physics (JJAP)     2011.12

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    DOI: 10.1143/JJAP.51.016201

  395. Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC

    Tsuyoshi Yamaguchi, Tatsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine and Masaru Hori

    Journal of Physics D: Applied Physics     2011.12

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    DOI: 10.1088/0022-3727/45/2/025203

  396. Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature

    Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito1, Takayuki Ohta1, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

    Japanese Journal of Applied Physics (JJAP)     2011.12

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    DOI: 10.1143/JJAP.51.016202

  397. Synchrotron x-ray analyses of crystalline and electronic structures of carbon nanowalls

    Hiroki Kondo, Wakana Takeuchi, Masaru Hori, Shigeru Kimura, Yukako Kato, Takayuki Muro, Toyohiko Kinoshita, Osami Sakata, Hiroo Tajiri, and Mineo Hiramatsu

    Appl. Phys. Lett   Vol. 99   2011.11

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    DOI: 10.1063/1.3659470

  398. Investigations on Plasma Interactions with Soft Materials for Fabrication of Flexible Devices

    Ken CHO, Yuichi SETSUHARA, Kosuke TAKENAKA, Masaharu SHIRATANI, Makoto SEKINE and Masaru HORI

      Vol. Vol.37 ( No.6 ) page: pp.289-297   2011.11

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  399. Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure

    K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. Plasma Conf. 2011     page: 23G03   2011.11

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  400. Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor

    T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. Intern. Symp. on Dry Process   Vol. 33   page: 24P007-O   2011.11

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  401. Investigation of plasma interactions with organic semiconductors for fabrication of flexible electronics devices

    K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori

    Proc. Intern. Symp. on Dry Process   Vol. 33   page: 69-70   2011.11

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  402. Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon

    T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. Intern. Symp. on Dry Process   Vol. 33   page: 123-124   2011.11

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  403. High-Performance Decomposition and Fixation of Dry Etching ExhaustPerfluoro-Compound Gases and Study of Their Mechanism

    Kei Hattori, Masaaki Osato, Takeshi Maeda, Katsuya Okumura, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys   Vol. 50   2011.10

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    DOI: 10.1143/JJAP.50.117301

  404. Inactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma

    S. Iseki, H. Hashizume, F. Jia, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, and M. Hori

    Appl. Phys. Express   Vol. Vol. 4   2011.10

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    DOI: 10.1143/APEX.4.116201 (2011)

  405. Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma

    Masaki Minami Shigetaka Tomiya, Kenji Ishikawa, Ryosuke Matsumoto, Shang Chen, Masanaga Fukasawa,Fumikatsu Uesawa, Makoto Sekine, Masaru Hori, and Tetsuya Tatsumi

    Japanese Journal of Applied Physics   Vol. 50   page: 08JE03   2011.8

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    DOI: 10.1143/JJAP.50.08JE03

  406. Impacts of CF+,CF2+,CF3+,andAr Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist

    TakuyaTakeuchi,ShinpeiAmasaki,HirokiKondo,KenjiIshikawa,HirotakaToyoda,MakotoSekine,Song-Yun Kang,IkuoSawada,MasaruHori

    JapaneseJournalOfAppliedPhysics   Vol. 50 ( 8 )   2011.8

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    DOI: 10.1143/JJAP.50.08JE05

  407. Novel Atmospheric Pressure Inductively Coupled Micro Plasma Source Using Floating Wire Electrode

    Shinya Kumagai, Hiroki Matsuyama, Yoshihiro Yokoyama, Masaru Hori, and Minoru Sasaki

    Jpn. J. Appl. Phys. 50 (2011) 08JA02     2011.8

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    DOI: DOI: 10.1143/JJAP.50.08JA02

  408. Reactive Ion Etching of Carbon Nanowalls

    Shingo Kondo, Hiroki Kondo, Yudai Miyawaki, Hajime Sasaki,Hiroyuki Kano,Mineo Hiramatsu,Masaru Hori

    Japanese Journal of Applied Physics   Vol. 50 ( 7 )   2011.7

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    DOI: 075101

  409. Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen :A Real-time In Situ Electron Spin Resonance Study

    Kenji Ishikwa,Naoya Sumi,Akihiko Kono Hideo Horibe,Keigo Takeda,Hiroki Kondo,Makoto Sekine,and Masaru Hori

    Physical Chemistry   Vol. 2 ( 11 ) page: 1278-1281   2011.7

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  410. Achieving high-growth-rate in GaN homoepitaxy using high-density nitrogen radical source

    Yohjiro Kawai1,*, Shang Chen1, Yoshio Honda1,2, Masahito Yamaguchi1,2, Hiroshi Amano1,2, Hiroki Kondo1, Mineo Hiramatsu3, Hiroyuki Kano4, Koji Yamakawa5, Shoji Den5, Masaru Hori1

    physica status solidi (c)   Vol. 8 ( 7--8 ) page: 2089-2091   2011.7

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    DOI: 10.1002/pssc.201000969

  411. Spatial Distributions of Electron, CF, and CF2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C4F8/N2/Ar Gas

    Tsuyoshi Yamaguchi, Tetsuya Kimura, Chishio Koshimizu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

    Jpn. J. Appl. Phys   Vol. 50   page: 056101-1:6   2011.5

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  412. H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics

    Hiroshi Yamamoto, Keigo Takeda, Kenji Ishikawa, Masafumi Ito, Makoto Sekine, Masaru Hori, Takeshi Kaminatsui, Hisataka Hayashi, Itsuko Sakai, and Tokuhisa Ohiwa

    J. Appl. Phys.   Vol. 109   page: pp.084112-1-8   2011.4

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    DOI: 10.1063/1.3562161

  413. O2/N2ガスを用いた60Hz非平衡大気圧プラズマによるソルダーレジストとドライフィルムの表面改質

    岩田義幸,坂本一,乾裕俊,堀勝

    表面技術   Vol. 62 ( 6 ) page: 311-316   2011.4

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  414. Radical-controlled plasma processing for nanofabrication

    Hori Masaru Hori, Hiroki Kondo and Mineo Hiramatsu

    J. Phys. D: Appl. Phys.     page: 44, 174027   2011.4

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  415. Spontaneous formation of highly regular superlattice structure in InGaN epilayers grown by molecular beam epitaxy

    Z. H. Wu, Y. Kawai, Y.-Y. Fang, C. Q. Chen, H. Kondo, M. Hori, Y. Honda, M. Yamaguchi, and H. Amano

    Appl. Phys. Lett.     page: 98, 141905   2011.4

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  416. Formation and mechanism of ultrahigh density platinum nanoparticles on vertically grown graphene sheets by metal-organic chemical supercritical fluid deposition

    Kota Mase, Hiroki Kondo, Shingo Kondo, Masaru Hori, Mineo Hiramatsu, and Hiroyuki Kano

    APPLIED PHYSICS LETTERSGRAPHENE, CARBON NANOTUBES, C60, AND RELATED STUDIES     page: 98, 193108   2011.4

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  417. Dissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma

    Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu

    Japanese Journal of Applied Physics     page: 50   2011.3

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  418. Electron field emission enhancement of carbon nanowalls by plasma surface nitridation

    Wakana Takeuchi, Hiroki Kondo, Tomomi Obayashi, Mineo Hiramatsu, and Masaru Hori

    Appl. Phys. Lett.     page: 98, 123107   2011.3

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  419. Hydrophobic treatment of organics against glass employing nonequilibrium atmospheric pressure pulsed plasmas with a mixture of CF4 and N2 gases

    Hirotoshi Inui, Keigo Takeda, Kenji Ishikawa, Takuya Yara, Tsuyoshi Uehara, Makoto Sekine, and Masaru Hori

    Journal of Applied Physics   Vol. 109   page: 013310   2011.1

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  420. Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N2?H2 Mixture Plasmas

    Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den, and Masaru Hori

    Jpn. J. Appl. Phys.   Vol. 50   page: 01AE03   2011.1

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  421. Mechanism of plasma-induced damage to low-k SiOCH films during plasma ashing of organic resists

    Keigo Takeda, Yudai Miyawaki, Seigo Takashima, Masanaga Fukasawa, Keiji Oshima, Kazunori Nagahata, Tetsuya Tatsumi, and Masaru Hori

    J. Appl. Phys.   Vol. 109   page: 033303   2011.1

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  422. Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet

    Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui,Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, and Masaru Hori

    Applied Physics   Vol. 4   page: 026101   2011.1

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  423. Controlled Synthesis of Carbon Nanowalls for Carbon Channel Engineering

    Hiroki Kondo, Masaru Hori, Wakana Takeuchi, Mineo Hiramatsu

    Key Engineering Materials   Vol. 470   page: 85-91   2011.1

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  424. プラズマ技術とバイオアプリケーション -非均衡大気圧プラズマのミドリカビ殺菌への応用-

    伊藤昌文、堀勝

    化学工業   Vol. 61 ( 6 ) page: 44-48   2010.6

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  425. 研究開発の効率を飛躍的に高めるコンビ名とリアルプラズマ解析装置

    白谷正治、節原裕一、関根誠、堀勝

    化学工業   Vol. 60 ( 5 ) page: 43-47   2010.5

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  426. 巻頭言・プラズマ誘起表面科学の魅力

    堀勝

    表面科学   Vol. 31 ( 3 ) page: 123   2010.3

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  427. プラズマCVD法を用いたカーボンナノウォールの形成

    平松美根男、堀勝

    表面科学   Vol. 31 ( 3 ) page: 144-149   2010.3

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  428. 自律型プラズマナノエッチング製造装置の創製~装置が自己判断、自己制御、自己修正する究極のプラズマプロセスの実現~

    堀勝、竹田圭吾

      Vol. 14 ( 2 ) page: 4   2010.2

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  429. Contrast Enhancement of Wavelength Selective Detection on Mid-InfraredUsing Localized Atmospheric Plasma Treatment

    K. Masuno, K. Tashiro, M. Hori, S. Kumagai, M. Sasaki

    Jpn J. Appl. Phys   Vol. 49 ( 4 )   2010

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  430. Surface Loss Probability of Nitrogen Atom on Stainless-Steel in N2 Plasma Afterglow

    S. Takashima, K. Takeda, S. Kato, M. Hiramatsu, and M. Hori

    Jpn J. Appl. Phys.   Vol. 49   page: 076101-1 - 4   2010

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  431. Optical Properties of Evolutionary Grown Layers of Carbon Nanowalls Analyzed by Spectroscopic Ellipsometry

    Shinji Kawai, Shingo Kondo, Wakana Takeuchi, Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

    Japanese Journal of Applied Physics   Vol. 49   page: 060220   2010

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  432. Etching characteristics of organic low-k films interpreted by internal parameters employing a combinatorial plasma process in an inductively coupled H2/N2 plasma

    Moon Chang Sung; Takeda Keigo; Sekine Makoto; Setsuhara Yuichi; Shiratani Masaharu; Hori Masaru

    J. Appl. Phys   Vol. 107 ( 11 ) page: 113310 - 113310-8   2010

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  433. Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H2 and N2 mixture gases

    Chang S. Moon, Keigo Takeda, Seigo Takashima, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, and Masaru Hori

    J. Appl. Phys   Vol. 107 ( 10 ) page: 103310   2010

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  434. Rapid inactivation of Penicillium digitatum spores using high-density nonequilibrium atmospheric pressure plasma

    Sachiko Iseki, Takayuki Ohta, Akiyoshi Aomatsu, Masafumi Ito, Hiroyuki Kano, Yasuhiro Higashijima, and Masaru Hori

    Appl. Phys.   Vol. 96   page: 153704   2010

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  435. Preparation of Dispersed Platinum Nanoparticles on a Carbon Nanostructured Surface Using Supercritical Fluid Chemical Deposition Materials

    M. Hiramatsu, M. Hori

      Vol. 3 ( 3 ) page: 1559-1572   2010

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  436. “High performance of compact radical monitoring probe in H2/N2 mixture plasma"

    Chang S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, and M. Hori

    J. Vac. Sci. Technol.   Vol. B 28 ( L17 )   2010

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  437. Critical Factors for Nucleation and Vertical Growth of Two Dimensional Nano-Graphene Sheets Employing a Novel Ar+ Beam with Hydrogen and Fluorocarbon Radical Injection

    Shingo Kondo, Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    Applied Physics Express   Vol. 3 ( 4 ) page: 045102   2010

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  438. Monolithic self-sustaining nanographene sheet grown using plasma-enhanced chemical vapor deposition

    Wakana Takeuchi, Keigo Takeda, Mineo Hiramatsu, Yutaka Tokuda, Hiroyuki Kano, Shigeru Kimura, Osami Sakata, Hiroo Tajiri, and Masaru Hori

    Phys. Status Solidi A 207   Vol. 1   page: 139-143   2010

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  439. Preparation of Platinum Nanoparticles on Carbon Nanostructures Using Metal-Organic Chemical Fluid Deposition Employing Supercritical Carbon Dioxide

    M. Hiramatsu, T. Machino, K. Mase, M. Hori, and H. Kano

    J. Nanosci. Nanotechnol   Vol. 10   page: 4023-4029   2010

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  440. Dependence of Surface-Loss Probability of Hydrogen Atom on Pressures in Very High Frequency Parallel-Plate Capacitively Coupled Plasma

    Yusuke Abe, Sho Kawashima, Keigo Takeda, Makoto Sekine, and Masaru Hori

    Applied Physics Express   Vol. 13 ( 10 ) page: 106001   2010

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  441. Measurement of Hydrogen Radical Density and its Impact on Reduction of Copper Oxide in Atmospheric-Pressure Remote Plasma Using H2 and Ar Mixture Gases

    Hirotoshi Inui, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Sekine Makoto, Hiroyuki Kano, Naofumi Yoshida, and Masaru Hori

    Appl. Phys. Express   Vol. 3   page: 126101   2010

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  442. Modeling considerations and performance estimation of Single Carbon Nano Wall based Field Effect Transistor by 3D TCAD simulation study

    Malinowski A., Hori M., Sekine M., Takeuchi W., ?ukasiak L., Jakubowski A., Tomaszewski D.

    Journal Transactions of the Materials Research Society of Japan   Vol. 35 ( 3 ) page: 669-674   2010

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  443. Initial growth process of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition

    S. Kondo, S. Kawai, W. Takeuchi, K. Yamakawa, S. Den, H. Kano, M. Hiramatsu, and M. Hori

    J. Appl. Phys   Vol. 106   page: 094302   2009.11

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  444. A scientific look at plasma technology

    SPOTLIGHT ON NAGOYA     page: 16   2009.10

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  445. *Development of atomic monitoring probe and its application to spatial distribution measurements of H and O atomic radical densities in radical-based plasma processing

    S. Takahashi, S.Takashima, K.Yamakawa, S. Den, H.Kano, K. Takeda, and M. Hori

    J. Appl. Phys   Vol. 106 ( 5 )   2009.9

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  446. Analysis of dispersion of electrical parameters and characteristics of FinFET devices

    Malinowski A., Sekine M., Hori M., Jakubowski A., Lukasiak L., Tomaszewski D

    Journal of Telecommunications and Information Technology (JTIT)   ( 4 )   2009.9

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  447. ラジカル制御プラズマとその応用

    堀 勝

      Vol. 52 ( 9 ) page: 491-497   2009.9

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  448. Monolithic self-sustaining nanographene sheet grown using plasma-enhanced chemical vapor deposition

    Wakana Takeuchi, Keigo Takeda, Mineo Hiramatsu, Yutaka Tokuda, Hiroyuki Kano, Shigeru Kimura, Osami Sakata, Hiroo Tajiri, and Masaru Hori

    Phys. Status Solidi A   Vol. 1-5   2009.9

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  449. SiH4 /H2 &not;プラズマによる高品質微結晶シリコンの低温形成

    堀 勝

    月間ディスプレイ   Vol. 15 ( 8 ) page: 3-8   2009.8

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  450. Development of measurement technique for carbon atoms employing vacuum ultraviolet absorption spectroscopy with a microdischarge hollow-cathode lamp and its application to diagnostics of nanographene sheet material formation plasmas Reviewed

    W. Takeuchi, H. Sasaki, S. Kato, S. Takashima, M. Hiramatsu, and M. Hori

    J. Appl. Phys   Vol. 105   page: 113305 -1- 113305 -6   2009.6

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  451. 低誘電率(Low-k)材料のドライエッチング

    堀 勝、関根 誠

    プラズマ・核融合学会誌   Vol. 85 ( 4 ) page: 193,194   2009.4

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  452. Synthesis of Platinum Nanoparticles on Two-Dimensional Carbon Nanostructures with an Ultrahigh Aspect Ratio Employing Supercritical Fluid Chemical Vapor Deposition Process Reviewed

    T. Machino, W. Takeuchi, H. Kano, M. Hiramatsu, and M. Hori

    Appl. Phys. Express   Vol. 2 ( 2 ) page: 025001-1-025001-3   2009.1

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  453. Combinatorial Plasma Etching Process

    Chang Sung Moon, Keigotakeda, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, and Masaru Hori

    Applied Physics Express   Vol. 2   2009

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  454. DEVELOPMENT OF COMBINATORIAL PLASMA PROCESS ANALYZER FOR ADVANCED R&D OF NEXT GENERATION NANODEVICE FABRICATIONS

    K. Takenaka, K. Cho, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori

    Cramics Transactions   Vol. -   2009

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  455. X-Ray Photoelectron Spectroscopy for Analysis of Plasma-Polymer Interactions in Ar Plasmas Sustained via RF Inductive-Coupling with Low-Inductance Antenna Units

    Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine and M. Hori, E. Ikeitaga and S. Zaima

    Thin Solid Films   Vol. -   2009

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  456. Low-Damage Surface Modification of Polymethylmethacrylate with Argon-Oxygen Mixture Plasmas Driven by Multiple Low-Inductance Antenna Units

    Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, E. Ikeitaga and S. Zaima

    Thin Solid Films   Vol. -   2009

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  457. Plasma Surface Treatment of Polymers with Inductivity Coupled RF Plasmas Driven by Low inductance Antenna Units

    Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe, M. Shiratani, M. Sekine, M. Hori E. Ikeitaga, H. Kondo, O. Nakatsuka and S. Zaima

    Thin Solid Films   Vol. 518   page: 1006-1011   2009

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  458. Development of d ensity-inclination plasmas for analysis of plasma nano-processes via combinatorial method

    Y. Setsuhara, K. Nagao, M. Shiratani, M. Sekine, M. Hori

    Thin Solid Films   Vol. 518   page: 1020-1023   2009

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  459. Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches

    Jun Umetsu, Kazuhiko Inoue, Takuya Nomura, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, and Masaru Hori

    Journal of Plasma and Fusion Research Series   Vol. 8   page: 1443-1446   2009

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  460. 半導体特性を持つカーボンナノウォールの合成及びその電気伝導特性の制御に世界で初めて成功

    堀 勝

    科研費NEWS   Vol. 2   page: 7   2008.11

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  461. Fabrication of Carbon Nanowalls using Electron Beam Excited Plasma-Enhanced Chemical Vapor Deposition Reviewed

    T. Mori, M. Hiramatsu, K. Yamakawa, K. Takeda, and M. Hori

    Diamond & Related Materials   Vol. 17 ( 7-10 ) page: 1513-1517   2008.10

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  462. New Compact Continuous Spectrum Light Source Using Atmospheric Pressure Microplasma with High-Velocity Ar Gas Flow Reviewed

    H. Ito, H. Kano, and M. Hori

    Appl. Phys. Express   Vol. 1 ( 10 ) page: 106001-1-106001-3   2008.9

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  463. 先進プラズマナノプロセス技術~プラズマナノ科学創成による製造技術の革新~

    堀 勝

    真空ジャーナル   Vol. 120   page: 18,25   2008.9

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  464. Novel Silicon Wafer Slicing Technology Using Atmospheric-Pressure Reactive Microplasma Reviewed

    T. Ideno, H. Inui, S. Takashima, H. Kano, M. Kondo, M. Hiramatsu, and M. Hori

    Jpn. J. Appl. Phys.   Vol. 47 ( 7 ) page: 5648-5651   2008.7

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  465. グラファイト(黒鉛)から半導体を創る――カーボンナノウォールの電気伝導制御に成功――

    堀 勝

    名大トピックス   Vol. 182   page: 12,13   2008.7

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  466. Surface Reactions during Low-k Etching using N2/H2 Plasma Reviewed

    M. Fukasawa, T. Tatsumi, K. Oshima, K. Nagahata, S. Uchida, S. Takashima, M. Hori, and Y. Kamide

    J. Vac. Sci. Technol   ( A26 ) page: 870-874   2008.7

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  467. Absolute Density and Temperature of O(1D2) in Highly Ar or Kr Diluted O2 Plasma Reviewed

    K. Takeda, S. Takashima, M. Ito, and M. Hori

    Appl. Phys. Lett   Vol. 93 ( 2 ) page: 021501-1-021501-3   2008.7

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  468. 大気圧プラズマを用いた加工技術 Invited

    堀 勝

    放電研究   Vol. 51 ( 2 ) page: 27-31   2008.6

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  469. Evaluation of Property Changes due to Radiation, Radicals, and Ions on Organic Low-k Films in H2/N2 Plasma Etching Reviewed

    S. Uchida, S. Takashima, M. Hori, M. Fukasawa, K. Ohshima, K. Nagahata, and T. Tatsumi

    Jpn. J. Appl. Phys.   Vol. 47 ( 5 ) page: 3621-3624   2008.5

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  470. Electrical Conduction Control of Carbon Nanowalls Reviewed

    W. Takeuchi, M. Ura, M. Hiramatsu, Y. Tokuda, H. Kano, and M. Hori

    Appl. Phys. Lett.   Vol. 92   page: 213103-1-213103-3   2008.5

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  471. Surface Modification Process of Contact Lens Using Three-Phase AC Excited Nonequilibrium Atmospheric Pressure Ar Plasma Reviewed

    M. Iwasaki, H. Inui, H. Kano, M. Ito, Y. Suzuki, D. Sutou, K. Nakada, and M. Hori

    Jpn. J. Appl. Phys   Vol. 47 ( 5 ) page: 3625-3629   2008.5

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  472. Plasma Damage Mechanisms for Low-k Porous SiOCH Films due to Radiation, Radicals, and Ions in the Plasma Etching Process Reviewed

    S. Uchida, S. Takashima, M. Hori, M. Fukasawa, K. Ohshima, K. Nagahata, and T. Tatsumi

    J. Appl. Phys.   Vol. 103 ( 7 ) page: 073303-1-073303-5   2008.4

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  473. プラズマ中のラジカル制御によるカーボンナノウォールの合成

    堀 勝、平松 美根男

    応用物理   Vol. 77 ( 4 ) page: 406-410   2008.4

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  474. のぞいてみよう!“プラズマの世界”

    堀 勝

    青少年のための科学の祭典・岐阜大会実験解説集     page: 10   2008.3

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  475. Characteristics of Low Energy Atom and Molecule Beams Generated by the Charge Exchange Reaction Reviewed

    Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Sekine, and M. Hori

    J. Appl. Phys.   Vol. 103 ( 5 ) page: 053301-1-053301-5   2008.3

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  476. Nonequilibrium Atmospheric Pressure Plasma with Ultrahigh Electron Density and High Performance for Glass Surface Cleaning Reviewed

    M. Iwasaki, H. Inui, Y. Matsudaira, H. Kano, N. Yoshida, M. Ito, and M, Hori

    Appl. Phys. Lett.   Vol. 92   page: 081503-1-081503-3   2008.2

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  477. Octave Spanning High Quality Super Continuum Generation Using 10 nJ and 104 fs High Energy Ultrashort Soliton Pulse Reviewed

    N. Nishizawa and M. Hori

    Appl. Phys. Express 1     page: 022009-1-022009-2   2008.2

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  478. プラズマイノベーションによる学と産の世界拠点を目指して!

    堀 勝

      Vol. 112   page: 23-25   2008.1

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  479. Roles of Oxidizing Species in a Nnonequilibrium Atmospheric-Pressure Pulsed Remote O2/N2 Plasma Glass Cleaning Process Reviewed

    M. Iwasaki, Y. Matsudaira, K. Takeda, M. Ito, E. Miyamoto, T. Yara, T. Uehara, and M. Hori

    J. Appl. Phys.   Vol. 103   page: 023303-1-023303-7   2008.1

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  480. Highly Reliable Growth Process of Carbon Nanowalls using Radical Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

    S. Kondo, K. Yamakawa, S. Den, H. Kano, M. Hiramatsu, and M. Hori

    J. Vac. Sci. Technol   ( B26 ) page: 1294   2008

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  481. Analysis of Process Plasma via Computer Simulations and Plasma Diagnostics, for N2 Plasma and H2 Plasma Reviewed

    Journal of the Vacuum Society of Japan   Vol. 51 ( 12 ) page: 807-813   2008

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  482. Tunable Low-Energy Ar Fast Atom Source with Large Diameter Reviewed

    Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, and M. Hori

    Appl. Phys. Lett.   Vol. 91 ( 23 ) page: 231502-1-231502-3   2007.12

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  483. カーボンナノウォールの超精密形成と機能デバイスへの応用 Invited

    堀 勝、平松 美根男

      Vol. 7 ( 11 ) page: 10-16   2007.11

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  484. シリコン表面の窒化初期過程とエネルギーバンドギャップの形成

    近藤 博基、財満 鎮明、堀 勝、酒井 朗、小川 正毅

    真空   Vol. 50 ( 11 ) page: 665- 671   2007.11

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  485. 高密度プラズマとその応用技術の最前線 展望『高密度プラズマプロセッシングの現状と将来展望』 Invited

    堀 勝

    精密工学学会誌   Vol. 73 ( 9 ) page: 971-974   2007.9

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  486. VBLニュース 研究紹介 「大気圧プラズマによるフレキシブルエレクトロニクスの技術革新」

    堀 勝

    名古屋大学ベンチャー・ビジネス・ラボラトリー ニュースNo. 23   Vol. 12 ( 1 ) page: 3   2007.8

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  487. ラジカル制御CVD法によるカーボンナノウォールの成長

    堀 勝、平松 美根男

      Vol. 23 ( 3 ) page: 13-17   2007.7

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  488. Effect of Low Level O2 Addition to N2 on Surface Cleaning by Nonequilibrium Atmospheric-Pressure Pulsed Remote Pmasma

    M .Iwasaki, K. Takeda, M. Ito, T. Yara, T. Uehara, and M. Hori

    Jpn. J. Appl. Phys., Express Letter   Vol. 46 ( 23 ) page: L540-L542   2007.6

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  489. *Insights into Sticking of Radicals on Surfaces for Smart Plasma Nano-Processing

    M. Hori and T. Goto

    Applied Surface Science   Vol. 253 ( 16 ) page: 6657-6671   2007.6

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  490. 小特集「材料プロセス用フルオロカーボンプラズマ――現状と展望―― 9.フルオロカーボンプラズマを用いたナノ構造体の形成」

    平松美根男、堀 勝、

    プラズマ・核融合学会誌   Vol. 83 ( 4 ) page: 356-360   2007.4

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  491. 小特集「材料プロセス用フルオロカーボンプラズマ――現状と展望―― 1.はじめに」

    堀 勝

    プラズマ・核融合学会誌   Vol. 83 ( 4 ) page: 317-318   2007.4

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  492. 小特集「材料プロセス用フルオロカーボンプラズマ――現状と展望―― 7.環境調和型ゼロエミッション・リサイクルナノエッチングプロセスの開発」

    高橋俊次、堀 勝

    プラズマ・核融合学会誌   Vol. 83 ( 4 ) page: 346-349   2007.4

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  493. Aligned Growth of Single-Walled and Double-Walled Carbon Nanotube Films by Control of the Catalyst Preparation

    M. Hiramatsu, T. Deguchi, H. Nagao, and M. Hori

    Jpn. J. Appl. Phys.   Vol. 46 ( 13 ) page: L303 - L306   2007.3

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  494. 巻頭言

    堀 勝

    応用物理学会東海支部創立40周年記念リフレッシュ理科教室「たのしい工作大集合!」     2007.1

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  495. Growth and Energy Bandgap Formation of Silicon Nitride Films in Radical Nitridation

    H. Kondo, K. Kawaai, A. Sakai, M. Hori, S. Zaima, and Y. Yasuda

    Jpn. J. Appl. Phys.   Vol. 46 ( 1 ) page: 71-75   2007.1

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  496. Geometric Characteristics of Silicon Cavities Etched in EDP Reviewed

    H. Ju, T. Ohta, M. Ito, M. Sasaki, K. Hane, and M. Hori

    J. Micromech, & Microeng.   Vol. 17   page: 1012-1016   2007

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  497. Diagnostics of Surface Wave Excited Kr/O2 Plasma for Low-Temperature Oxidation Processes

    K. Takeda, Y. Kubota, S. Takashima, M. Hori, A. Serdyuchenko, M. Ito, and Y. Matsumi

    J. Appl. Phys.,   Vol. 102   page: 013302-1-013302-6   2007

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  498. The Silicon Mold Fabrication of a Kind of Micro-Optical Resonator and Coupler

    H. Ju, T. Ohta, S. Takao, M. Ito, M. Sasaki, K. Hane, and M. Hori

    Proceedings of SPIE   Vol. 6462   page: 64620I   2007

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  499. Area-Selective Growth of Aligned Single-Walled Carbon Nanotube Films using Microwave Plasma-Enhanced CVD

    M. Hiramatsu, T. Deguchi, H. Nagao, and M. Hori

    Diamond and Related Materials   Vol. 16   page: 1126-1130   2007

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  500. Simultaneous Monitoring of Multimetallic Atom Densities in Plasma Processes Employing a Multimicrohollow Cathode Lamp

    T. Ohta, M. Ito, Y. Tachibana, S. Taneda, S. Takashima, M. Hori, H. Kano, and S. Den

    Appl. Phys. Lett.   Vol. 90   page: 251502.1- 251502.3   2007

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  501. Silicon Oxide Selective Etching Employing Dual Frequency Superimposed Magnetron Sputtering of Carbon Using F2/Ar Gases

    M. Nagai and M. Hori

    Jpn. J. Appl. Phys.   Vol. 46 ( 2 ) page: 799-802   2007

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  502. Initial Stage of Processes and Energy Bandgap Formation in Nitridation of Silicon Surface Using Nitrogen Radicals

    H. Kondo, S. Zaima, M. Hori, A. Sakai, M. Ogawa

    J. Vac. Soc. Jpn   Vol. 50 ( 11 ) page: 665- 671   2007

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  503. Formation of Microcrystalline Diamond Using a Low-Pressure Inductively Coupled Plasma Assisted by Thermal Decomposition of Di-t-alkyl Peroxide

    H. Ito, K. Teii, M. Ito, and M. Hori

    Diamond and Related Materials   Vol. 16   page: 393-396   2007

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  504. Plasma Etching Technology for Low-k Porous SiOCH Films

    M. Hori

    Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics 9   Vol. 6 ( 3 ) page: 485-500   2007

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  505. 精密シリコンスライスでフッ素系ガスプラズマ切断浮上

    堀 勝

    ガスレビュー   Vol. 614   page: 25   2006.12

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  506. 研究室紹介

    堀 勝

    応用物理学会プラズマエレクトロニクス分科会会報   Vol. 45   2006.12

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  507. Ion Attachment Mass Spectrometry of Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma for SiO2 Etching

    M. Iwasaki, M. Ito, T. Uehara, M. Nakamura, and M. Hori

    J. Appl. Phys.   Vol. 100   2006.11

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  508. Nitriding of a Tool Steel with an Electron-beam-excited Plasma

    H. Shoyama, T. Hishida, T. Hara, Y. Dake, T. Mori, H. Nagai, M. Hori, and T. Goto

    J. Vac. Sci. Techno.   Vol. A24   page: 1999-2002   2006.11

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  509. Carbon Nanowalls Formation by Radical Controlled Plasma Process

    M. Hori and M. Hiramatsu

    Advanced in Science and Technology   Vol. 48   page: 119-126   2006.11

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  510. Development of a Low Pressure Microwave Excited Plasma and its Application to the Formation of Microcrystalline Silicon Films

    D. Kikukawa, M. Hori, K. Honma, M. Yamamoto, T. Goto, S. Takahashi, and S. Den

    J. Vac. Sci. Technol.   Vol. A24   page: 2128-2132   2006.10

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  511. プラズマ化学気相堆積法を用いたカーボンナノウォールの作製

    平松美根男、堀 勝

    真空   Vol. 49 ( 9 ) page: 368-372   2006.9

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  512. Effects of N2 Addition on Density and Temperature of Radicals in 60 MHz Capacitively Coupled C-C4F8 Gas Plasma

    M. Nagai and M. Hori

    J. Vac. Sci. Technol.   Vol. A24   page: 1760-1763   2006.9

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  513. Low-k SiOCH Film Etching Process and Its Diagnostics Employing Ar/C5F10O/N2 Plasma

    M. Nagai, T. Hayashi, M. Hori, and H. Okamoto

    Jpn. J. Appl. Phys.   Vol. 45 ( 9A ) page: 7100-7104   2006.9

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  514. Silicon Dioxide Etching Process for Fabrication of Micro-optics Employing Pulse-Modulated Electron-beam-excited Plasma

    K. Takeda, T. Ohta, M. Ito, and M. Hori

    J. Vac. Sci. Technol.   Vol. A24   page: 1725-1729   2006.8

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  515. Fabrication of Carbon Nanowalls Using Novel Plasma Processing

    M. Hiramatsu and M. Hori

    Jpn. J. Appl. Phys.   Vol. 45 ( 6B ) page: 5522-5527   2006.6

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  516. Progress of Radical Measurements in Plasmas for Semiconductor Processing

    M. Hori and T. Goto

    Plasma Sources Sci. Technol.   Vol. 15 ( 2 ) page: S74-S83   2006.5

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  517. Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating

    M. Nagai, O. Takai, and M. Hori

    Jpn. J. Appl. Phys.   Vol. 45 ( 17 ) page: L460-L462   2006.4

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  518. 新規エッチングガスを用いた半導体微細加工プロセス

    堀 勝、高橋俊次

    化学工業   Vol. 57 ( 3 ) page: 55-58   2006.3

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  519. プラズマCVDを用いたカーボンナノウォールの成長

    平松美根男、堀 勝

    日本結晶成長学会誌   Vol. 32 ( 32 ) page: 27-32   2005.12

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  520. スマートプラズマプロセス

    堀 勝

    応用物理   Vol. 74 ( 10 ) page: 1328-1335   2005.10

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  521. プラズマで遊ぼう

    堀 勝

    WEC青少年のための科学の祭典 2005年岐阜大会in岐阜メモリアルセンター     page: 5   2005.10

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  522. RFプラズマCVDによるカーボンナノウォールの配向成長

    平松美根男、堀 勝

    プラズマ・核融合学会誌   Vol. 81 ( 9 ) page: 669-673   2005.9

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  523. 巻頭言

    堀 勝

    応用物理学会東海支部第8回リフレッシュ理科教室「あつい!つめたい!熱の不思議」     2005.7

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  524. 名古屋大学ナノプロセス研究Gr.自立型ナノ製造装置を開発 LTPS向け各種製膜から平面バックライト向けCNWの形成まで

    堀 勝

    EExpress     page: 24-31   2005.6

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  525. 第52回応用物理学関係連合講演会 講演会報告「シリコンナノエレクトロニクスの新展開――ポストスケーリングテクノロジー――」

    堀 勝、宮崎誠一、田畑仁

    応用物理   Vol. 74 ( 6 ) page: 804-805   2005.6

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  526. 巻頭言

    堀 勝

    応用物理学会シリコンテクノロジー分科会「65nmから45nmノードlow-kエッチングの最前線」特集号   ( 71 ) page: 1   2005.6

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  527. カーボンナノウォールの合成と合成装置の実用化開発

    堀 勝、平松美根男

    放電研究   Vol. 48 ( 2 ) page: 33-38   2005.5

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  528. カーボンナノ構造体製膜装置の開発

    平松美根男、堀 勝

    Display Asia(韓国)     2005.5

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  529. Property of Atmospheric Pressure Plasma with Microwave Excitation of Plasma Processing

    M. Nagai, M. Hori, and T. Goto

    J. Vac. Sci. Technol. A   Vol. 23 ( 2 ) page: 221-225   2005.3

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  530. マイクロ波励起非平衡大気圧プラズマを用いたシリコン酸化膜の超高速エッチングおよびカーボンナノチューブの形成

    山川晃司、堀 勝

    真空 Journal of the Vacuum Society of Japan   Vol. 48 ( 2 ) page: 51-56   2005.2

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  531. Vertical Growth of Carbon Nanowalls Using RF Plasma-Enhanced Chemical Vapor Deposition

    K. Shiji, M. Hiramatsu, A. Enomoto, M. Nakamura, H. Amano and M. Hori

    Diamond & Related Materials   Vol. 14   page: 831-834   2005

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  532. Development of Compact C2F4 Gas Supply Equipment and Its Application to Etching of Dielectrics in an Environmental Benign Process

    S. Takahashi, S. Den, T. Katagiri, K. Yamakawa, H. Kano, and M. Hori

    Jpn. J. Appl. Phys.   Vol. 44 ( 24 ) page: L781-L783   2005

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  533. Decomposition and Polymerization of Perfluorinated Compounds in Microwave-Excited Atmospheric Pressure Plasma

    M. Nagai, M. Hori, and T. Goto

    J. Appl. Phys.   Vol. 97   page: 123304-1-123304-5   2005

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  534. *Ultra-High-Speed Etching of Organic Films Using Microwave-Excited Nonequilibrium Atmospheric-Pressure Plasma

    K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri, and H. Kano

    J. Appl. Phys.   Vol. 98   page: 43311-1-43311-5   2005

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  535. Etching Process of Silicon Dioxide with Nonequilibrium Atmospheric Pressure Plasma

    K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri, and H. Kano

    J. Appl. Phys.   Vol. 98   page: 13301-1-13301-6   2005

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  536. High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition

    M. Hiramatsu, H. Nagao, M. Taniguchi, H. Amano, Y. Ando, and M. Hori

    Jpn. J. Appl. Phys.   Vol. 44   page: L693-L695   2005

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  537. Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition

    M. Hiramatsu, M. Taniguchi, H. Nagao, Y. Ando, and M. Hori

    Jpn. J. Appl. Phys.   Vol. 44 ( 2 ) page: 1150-1154   2005

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  538. Preparation of Dense Carbon Nanotube Film Using Microwave Plasma-Enhanced Chemical Vapor Deposition

    M. Taniguchi, H. Nagao, M. Hiramatsu, Y. Ando, and M. Hori

    Diamond & Related Materials   Vol. 14   page: 855-858   2005

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  539. マイクロ波励起非平衡大気圧プラズマを用いた超高速加工技術

    堀 勝、山川晃司

    表面技術   Vol. 55 ( 12 ) page: 38-42   2004.12

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  540. Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH4 Plasma with Ar, N2, and H2 Dilution Gases Reviewed

    T. Ohta, M. Hori, T. Ishida, T. Goto, M. Ito, and S. Kawakami

    Jpn. J. Appl. Phys.   Vol. 43 ( 9A ) page: 6405-6412   2004.9

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  541. A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma Reviewed

    K. Takeda, Y. Tomekawa, M. Iwasaki, M. Ito, T. Ohta, K. Yamakawa, and M. Hori

    Jpn. J. Appl. Phys.   Vol. 43 ( 9A/B ) page: L1166-L1168   2004.8

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  542. Ultrahigh-Speed Etching of SiO2 with Ultrahigh Selectivity over Si in Microwave-Excited Non Equilibrium Atmospheric Pressure Plasma Reviewed

    K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri, and H. Kano

    Applied Physics Letters   Vol. 84 ( 4 ) page: 549-551   2004.7

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  543. Fabrication of Vertically Aligned Carbon Nanowalls Using Capacitively Coupled Plasma-Enhanced Chemical Vapor Deposition Assisted by Hydrogen Radical Injection Reviewed

    M. Hiramatsu, K. Shiji, H. Amano, and M. Hori

    Applied Physics Letters   Vol. 84 ( 23 ) page: 4708-4710   2004.6

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  544. Fabrication of Vertically Aligned Carbon Nanowalls Using Capacitively Coupled Plasma-Enhanced Chemical Vapor Deposition Assisted by Hydrogen Radical Infection

    M. Hiramatsu, K. Shiji, H. Amano, and M. Hori

    Virtual Journal of Nanoscale Science & Technology   Vol. 9 ( 21 )   2004.5

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  545. Diagnostic and analytical study on a low-pressure limit of diamond chemical vapor deposition in inductively coupled CO-CH4-H2 plasmas Reviewed

    K. Teii, M. Hori, and T. Goto

    J. Appl. Phys.   Vol. 95 ( 8 ) page: 4463-4470   2004.4

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  546. Silicon-oxide etching process employing an electron-beam-excited plasma Reviewed

    M. Ito, K. Takeda, T. Shiina, Y. Okamura, H. Nagai, M. Hori, and T. Goto

    J. Vac. Sci. & Technol.   Vol. 22 ( 2 ) page: 543-547   2004.3

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  547. High Performance of Silicon Oxide Selective Etching Using F2 Gas and Graphite Instead of Perfluorinated Compound Gases

    M.Nagai,M.Hori,and T.Goto

    Jpn.P.Appl.Phys.(Express Letter)   Vol. 43 ( 4A ) page: pp.L501-L503   2004

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  548. Effects of Driving Frequency on the Translation Temperature and Absolute Density of Si Atoms In Very High Frequency Capacitively Coupled SiF4 Plasma

    Takayuki Ohta, Masaru Hori, Tetsuro Ishida, Toshio Goto, Masafumi Ito, Satoshi Kawakami, Nobuo Ishii

    Jpn.J.Appl.Phys.   Vol. Vol.42 ( No.12B ) page: pp L1532-L1534   2003.12

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  549. MBE-growth, characterization and properties of InN and InGaN Reviewed

    Y. Nanishi, Y. Saito, T. Yamaguchi, M. Hori, F. Matsuda, T. Araki, A. Suzuki, T. Miyajima

    Physica Status Solidi (a)   Vol. 200 ( 1 ) page: 202-208   2003.10

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    DOI: 10.1002/pssa.200303327

  550. Synthesis of polytetrafluoroethylene-like Film by a Novel Plasma Enhanced Chemical vapor Deposition Employing Solid material Evaporation Technique Reviewed

    K. Fujita, M. Ito, M. Hori and T. Goto

    Jpn. J. Appl. Phys.   Vol. 42 ( 2A ) page: 650-656   2003

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  551. Effects of Driving Frequency on the Translation Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF4 Plasma Reviewed

    Takayuki Ohta, Masaru Hori, Tetsuro Ishida, Toshio Goto, Masafumi Ito, Satoshi Kawakami, Nobuo Ishii

    Jpn. J. Appl. Phys.   Vol. 42 ( 12B ) page: L1532-L1534   2003

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  552. Dry Etching Invited Reviewed

    Masaru Hori

    Electrochemistry   Vol. 71 ( 7 ) page: 603-604   2003

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  553. Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N2 and H2 Gas Chemistry Reviewed

    H. Nagai, M. Hiramatsu, M. Hori and T. Goto

    Jpn. J. Appl. Phys.(Express Letter)   Vol. 42 ( 3A ) page: L212-L214   2003

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  554. Environmentally Benign Etching Process of Amorphous Silicon and Tungsten Using Species Evaporated from Polytetrafluoroethylene and Fluorinated Ethylene Propylene Reviewed

    K. Fujita, M. Hori, T. Goto and M. Ito

    J. Vac. Sci.Technol.   Vol. B21 ( 1 ) page: 302-309   2003

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  555. Measurement of S, SiF, and SiF2 Radicals and SiF4 Molecule Using Very High Frequency Capacitively Coupled Plasma Employing SiF4 Reviewed

    T.Ohta, K. Hara, T. Ishida, M. Hori, T. Goto

    J. Appl. Phys.   Vol. 94 ( 3 ) page: 1428-1435   2003

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  556. Etching Organic Low Dielectric Film in Ultrahigh Frequency Plasma Using N2/H2 and N2/NH3 Reviewed

    H.Nagai, M. Hiramatsu, M. Hori, T. Goto

    J. Appl. Phys.   Vol. 94 ( 3 ) page: 1362-1367   2003

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  557. Measurement of Oxgen Atom Density Employing Vacuum Ultraviolet Absorption Spectroscopy with Microdischarge Hollow Cathode Lamp Reviewed

    H. Nagai,M. Hiramatsu, M. Hori, T. Goto

    Review of Scientific Instruiments   Vol. 74 ( 7 ) page: 3453-3459   2003

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  558. Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation Reviewed

    H. Nagai, M. Hori, T. Goto, T. Fujii, M. Hiramatsu

    Jpn. J. Appl. Phys.   Vol. 42 ( 5A ) page: 2775-2779   2003

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  559. *Fabrication of Vertically Aligned Carbon Nanostructures by Microwave Plasma-enhanced Vapor Deposition Reviewed

    M.Hiramatsu, K.Ito, C.H.Lau, J.S.Food, M.Hori

    Diamond & Related Materials   Vol. 12 ( 3月7日 ) page: 787-790   2003

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  560. Measurement of C2 Radical Density in Microwave Methane/Hydrogen Plasma Used For Nanocrystalline Diamond Film Formation Reviewed

    M.Hiramatsu, K.Kato, C.H.Lau, J.S.Food, M.Hori

    Diamond & Related Materials   Vol. 12 ( 3月7日 ) page: 366-369   2003

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  561. Effect of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh Frequency Plasma Reviewed

    H. Nagai, Y. Maeda, M. Hiramatsu, M. Hori and T. Goto

    Jpn. J. Appl. Phys.   Vol. 42 ( 3B ) page: L326-L328   2003

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  562. Measurement technique of radicals, their gas phase and surface reactions in reactive plasma prosessing Reviewed

    M. Hori and T. Goto

    Applied Surface Science   Vol. 192   page: 135   2002

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  563. Subsurface reaction of silicon nitride in a high selective etching process of silicon oxide over silicon nitride Reviewed

    M. Ito, K. Kamiya, M. Hori and T. Goto

    J. Appl. Phys.   Vol. 91 ( 3 ) page: 3452   2002

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  564. Investigation of Nitrogen Atoms in Low-Pressure Nitrogen Plasmas Using a Compact Electron-Beam-Excited Plasma Source Reviewed

    S.Tada, S. Takashima, M. Ito, M. Hamagaki, M. Hori and T. Goto

    Jpn. J. Appl. Phys.   Vol. 41 ( 7A ) page: 4691   2002

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  565. Effects of Initial Layers on Surface Roughness and Crystallinity of Microcrystalline Silicon Thin Films Formed by Remote Electron Cyclotron Resonance Silane Plasma Reviewed

    K. Murata, D. Kikukawa, M. Hori and T.Goto

    J. Vac. Sci. Technolo.   Vol. A20 ( 3 ) page: 953   2002

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  566. Behavior of Atomic Radicals and Their Effects on Organic Low Dielectric Constant Film Etching in High Density N2/H2 and N2/NH3 Plasmas Reviewed

    H. Nagai, S. Takashima, M. Hiramatsu, M. Hori and T. Goto

    J. Appl. Phys.   Vol. 91 ( 5 ) page: 2615   2002

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  567. Formation of Preferentially Oriented Polycrystalline Silicon Thin Film Employing Pulse-Modulated Plasma CVD Invited Reviewed

    M. Hori and T. Goto

    Jouranl of The Surface Finishing Society of Japan   Vol. 53 ( 12 ) page: 860   2002

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  568. Silicon Oxide Contact Hole Etching Employing an Environmentally Benign Process Reviewed

    K. Fujita, M. Hori, T. Goto and M. Ito

    J. Vac. Sci & Technol.   Vol. B20 ( 6 ) page: 2192   2002

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  569. Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source Reviewed

    S. Tada, M. Ito, M. Hamagaki, M. Hori and T.GOTO

    Jpn. J. Appl. Phys.   Vol. 41 ( 11A ) page: 6553   2002

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  570. Ion-to CH3 Flux Ratio in Diamond Chemical-vapor Deposition Reviewed

    K. Teii, M. Hori and T. Goto

    J. Appl. Phys.   Vol. 92 ( 7 ) page: 4103   2002

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  571. Deposition of diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source Reviewed

    S.Tada, M. Ito, m. Hamagaki, m. Hori and T. Goto

    Jpn. J. Appl. Phys.   Vol. 41 ( 8 ) page: 5408   2002

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  572. Growth of Preferentially Oriented Microcrystalline Silicon Film Using Pulse-Modulated Ultrahigh-Frequency Plasma

    Jpn. J. Appl. Phys.(Express Letter)   Vol. 40 ( 1 ) page: L4   2001

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  573. On the Mechanism of Polytetrafluoroethylene Ablation Using a Synchrotron Radiation-Induced Photochemical Process Reviewed

    Hisao Nagai, Muneto Inayoshi, Masaru Hori, Toshio Goto, Mineo Hiramatsu

    Appl. Surf. Sci.   Vol. 183   page: 284   2001

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  574. Development of Vacuum Ultraviolet Absorption Spectroscopy Technique Employing Nitrogen Molecule Microdischarge Hollow Cathode Lamp for Absolute Density Measurements of Nitrogen Atoms in Process Plasmas Reviewed

    J.Vac. Sci. Technol. A   Vol. A19 ( 2 ) page: 599   2001

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  575. Absolute Cocentration and Loss Kinetics of Hydrogen Atom in Methane and Hydrogen Plasma Reviewed

    Seigou Takashima, Masaru Hori, Akihiro Kono, Toshio Goto, Katsumi Yoneda

    J. Appl. Phys   Vol. 90 ( 11 ) page: 5497   2001

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  576. Spatial distribution of the absolute CF and CF2 radical densities in high-density plasma employing low global warming potential fluorocarbon gases and precursors for film formation Reviewed

    Masayuki Nakamura, Masaru Hori, Toshio Goto, Masafumi Ito, Nobuo Ishii

    J. Vac. Sci. Technol.   Vol. A19 ( 5 ) page: 2134   2001

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  577. Semiconductor Process Monitoring Using Infrared Laser Absorption Spectroscopy Reviewed

      Vol. 11 ( 1 ) page: 2   2001

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  578. Measurement of absolute density of atomic species using vacuum ultraviolet absorption spectroscopy with microdischarge lamp Reviewed

    J. Vac. Soc. Jpn.   Vol. 44 ( 9 ) page: 802   2001

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  579. Ultrathin Fluorinated Silicon Nitride Gate Dielectric Films Formed by Remote Plasma Enhanced Chemical Vapor Deposition Employing NH3 and SiF4 Reviewed

    H. Ohta, M. Hori and T.Goto

    J. Appl. Phys.   Vol. 90 ( 4 ) page: 1955   2001

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  580. Measurement of Spatial Distribution of SiF4 and SiF2 Densities in High Density SiF4 Plasma Using Single -Path Infrared Diode Laser Absorption Spectroscopy and laser-Induced Fluorescence Technique Reviewed

    M.Nakamura, M. Hori, T. Goto, M. Ito and N. Ishii

    Jpn. J. Appl. Phys.   Vol. 40 ( 7 ) page: 4730   2001

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  581. Dual-Electrode Biasing for Controlling Ion-to Adatom Flus ratio during Ion-Assisted Deposition of Diamond Reviewed

    Kungen Teii Masaru Hori Toshio Goto

    J. Appl. Phys.   Vol. 89 ( 9 ) page: 4714   2001

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  582. Behavior of Hydrogen Atoms in Ultrahigh-Frequency Silane Plasmas Reviewed

    Seigou Takashima Masaru Hori Toshio Goto Katsumi Yoneda

    J. Appl. Phys.   Vol. 89 ( 9 ) page: 4727   2001

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  583. Spatial Distribution of the Absolute Densities of CFx Radicals in Fluorocarbon Plasmas Determined from Single-Path Infrared Laser Absorption and Laser-Induced Fluorescence Reviewed

    Masayuki Nakamura Masaru Hori Toshio Goto Masafumi Ito Nobuo Ishii

    J. Appl. Phys.   Vol. 90 ( 2 ) page: 580   2001

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  584. Effect of Ions and Radicals on Formation of Silicon Nitride Gate Dielectric Film Using Plasma Chemical Vapor Deposition Reviewed

    Hiroyuki Ohta Atsushi Nagashima Hiroyuki Ohta Atsushi Nagashima Masaru Hori Toshio Goto

    J. Appl. Phys.   Vol. 89 ( 9 ) page: 5083   2001

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  585. Amorphous Silicon and Tungsten Etching Employing Environmentally Benign Plasma Process

    Jpn. J. Appl. Phys.   Vol. 40 ( 2A ) page: 832   2001

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  586. Negative Bias Dependence of Surfur and Fluorine Incorporation in Diamond Films Etched by an SF6 Plasma

    J. Electrochem. Soc.   Vol. 148 ( 2 ) page: G55   2001

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  587. Codeposition on Diamond Film Surface during Reactive Ion Etching in SF6 and O2 Plasma

    J. Vac. Sci. & Technol.   Vol. 18 ( 6 ) page: 2779   2000

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  588. Formation of Silicon Nitride Gate Dielectric Film at 300℃ Employing Radical Chemical Vapor Deposition

    J. Vac. Sci. & Technol.   Vol. B18 ( 5 ) page: 2486   2000

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  589. Loss Kinetics of Carbon Atoms in Low-pressure High Density Plasmas

    J. Appl. Phys.   Vol. 88 ( 8 ) page: 4537   2000

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  590. Measurement and Control of Absolute Nitrogen Atom Density in an Electron Beam-Excited Plasma Using Vacuum Ultraviolet Absorption Spectroscopy

    J. Appl. Phys.   Vol. 88 ( 33 ) page: 1756   2000

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  591. Plasma Diagnostics and Low-Temperature Deposition of Microcrystalline Silicon in Ultrahigh-Frequency Silane Plasma

    J. Appl. Phys.   Vol. 88 ( 1 ) page: 576   2000

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  592. Precursors of Fluorocarbon Film Growth Studied by Mass Spectroscopy

    J. Appl. Phys.   Vol. 87 ( 10 ) page: 7185   2000

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  593. Study on Polymeric Neutral Species in High-Density Fluorocarbon Plasmas

    J. Appl. Phys.   Vol. 87 ( 9 ) page: 4572   2000

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  594. Kinetics and Role of C, O, and OH in Low-Pressure Nanocrystalline Diamond Growth

    J. Appl. Phys.   Vol. 87 ( 9 ) page: 4572   2000

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  595. Plasma Absorption Spectroscopy Using Microdischarge Light Source

    J. Plasma and Fusion Res.   Vol. 76 ( 5 ) page: 435   2000

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  596. Formation and Micromachining of Teflon(Fluorocarbon Polymer) Film by a Completely Dry Process Using Synchrotron Radiation

    J. Vac.Sci. Technol.   Vol. B17 ( 3 ) page: 949   1999

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  597. Diamond Deposition and Behavior of Atomic Carbon Species in a Low-Pressure Inductively Coupled Plasma

    Jpn. J. Appl. Phys.   Vol. 38   page: 4504   1999

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  598. Spatial Distribution Measurement of Absolute Densities of CF and CF2 Radicals i a High Density Plasma Reactor Using a Combination of Single Path Infrared Diode Laser Absorption and Laser-Induced Fluorescence Technique

    Jpn. J. Appl. Phys.   Vol. 38   page: L1469   1999

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  599. Silicon Oxide Selective Etching Process Keeping Harmony with Environment by Using Radical Injection Technique

    J. Vac. SCi. Technol.   Vol. A17   page: 3260   1999

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  600. Low Temperature Polycrystalline Silicon Film Formation with and without Charged Species in an Electron Cyclotron Resonance Vapor Deposition

    J.Vac.Sci. Technol.   Vol. A17   page: 2542   1999

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  601. Environmentally Harmonized Etching Process for Cleaning Amorphous Silicon and Tungsten in Chemical Vapor Deposition Chamber

    Material Science in Semiconductor Processing   Vol. 2   page: 219   1999

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  602. Ploycrystalline Silicon Film Formation at Low Temperature Using Ultra-High-Frequency Plasma Enhanced Chemical Vapor Deposition

    Material Letters   Vol. 41   page: 16   1999

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  603. Control of Seed Layer for a Low Temperature Formation of Polycrystalline Silicon with High Crystallinity and a Smooth Surface

    J. Vac. Sci. Technol.   Vol. B17 ( 3 ) page: 1098   1999

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  604. Novel Process for SiO2/Si Selective Etching Using a Novel Gas Source for Preventing Global Warming

    J.Vac. Sci. Technol.   Vol. B17 ( 3 ) page: 957   1999

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  605. Surface Reaction Process of Fluorocarbon Radicals(CFx)

    J. Plasma and Fusion Res.   Vol. 75 ( 7 ) page: 777   1999

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  606. In-situ Observation of Hydrogenated Amorphous Silicon Surface in Electron Cyclotron Resonance Hydrogen Plasma Annealing

    J.Appl. Phys.   Vol. 85 ( 2 ) page: 1172   1999

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  607. High-density Plasma and Its Application to Etching and Thin-film Formation

    OYO BUTURI   Vol. 68 ( 11 ) page: 1251   1999

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  608. Vacuum Ultraviolet Absorption Spectroscopy Employing a Microdischarge Hollow-Cathode Lamp for Absolute Density Measurement of Hydrogen Atoms in Reactive Plasmas

    Appl. Phys. Lett.   Vol. 75   page: 3929   1999

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  609. Control over Size and Density of Sub-5nm Gold Dots by Retarding-Field Single Ion Deposition(RSID)

    Microelectronic Engineering   Vol. 47   page: 401   1999

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  610. Surface Reaction of CF2 Radicals for Fluorocarbon Film Formation in SiO2/Si Selective Etching Process(共著)

    J. Vac. Sci. Technol. A   Vol. 16 ( 1 ) page: 233   1998

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  611. A Study on the Time Evolution of SiH3 Surface Loss Probability on Hydrogenated Amorphous Silicon Films in SiH4 RF Discharges Using Infrared Diode-Laser Absorption Spectroscopy(共著)

    J. Phys. D : Appl. Phys.   Vol. 31   page: 776   1998

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  612. Sub-5nm Gold Dot Formation Using Retarding-Field Single. Ion Deposition(共著)

    Appl. Phys. Lett.   Vol. 73 ( 22 ) page: 3223   1998

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  613. Synchrotron Radiation Induced SiC Formation on Si Substrate Employing Methonol and H Radical(共著)

    J. Vac. Sci. Technol. A.   Vol. 16 ( 4 ) page: 2252   1998

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  614. 赤外半導体レーザー吸収分光法を用いたプラズマプロセスの計測

    オプトロニクス   Vol. 11 ( 90 ) page: 145   1997

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  615. Low Dielectric Constant Film Formation by Oxygen-Radical Polymerization of Laser-Evapotated Siloxane

    J. Vac. Sci. Technol.   Vol. B15 ( 3 ) page: 746   1997

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  616. Substrate Bias Effect on Low Temperature Polycrystalline Silicon Formation Using Electron Cyclotron Resonance SiH4/H2 Plasma

    J. Appl. Phys.   Vol. 81 ( 12 ) page: 8035   1997

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  617. Scanning Tunneling Microscopic and Spectroscopic Characterinzation of Diamond film Prepared by capacitively Compled Radio Frequency CH3OH Plasma with OH Radical Injection

    Appl. Phys. Lett.   Vol. 70 ( 16 ) page: 2141   1997

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  618. CFx(X=1-3)Radical Densities during Si, SiO2 and Si3N4 Etching Employing Electron Cyclotron Resonance CHF3 Plasma

    J. Vac. Sci. Technol.   Vol. A15 ( 3 ) page: 568   1997

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  619. Effects of Dilution Gases on Si Atoms and SiHx+(X=O-3)Ions in Electron Cyclotron Resonance SiH4 Plasmas

    Jpn. J. Appl. Phys.   Vol. 36 ( 7B ) page: 4664   1997

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  620. Measuement of Einstein's A Coefficient of the 296.7nm Tramition Live of the Carbon Atom

    Jpn. J. Appl. Phys.   Vol. 36 ( 12A ) page: L1616   1997

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  621. Development and Characterization of a New Compact Microwave Radical Beam Source

    Jpn. J. Appl. Phys.   Vol. 36 ( 7B ) page: 4588   1997

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  622. Measurement of Carbon Atom Density in High Density Plasma Process

    Jpn. J. Appl. Phys.   Vol. 36 ( 7A ) page: L880   1997

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)  

  623. Effects of H, OH and CH3 Radicals on Diamond Film Formation in Parallel-Plate Radio Frequency Plasma Reactor

    J. Appl. Phys.   Vol. 82 ( 8 ) page: 4055   1997

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  624. Kinetics of Radicals in CF4 and C4F8 Electron Cyclotron Resonance Plasmas

    Jpm. J. Appl. Phys   Vol. 36 ( 8 ) page: 5340   1997

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  625. Influence on Selective SiO2/Si Etching of Carbon Atoms Produced by CH4 Addition to a C4F8 Permanent Magnet Electron Cyclotron Resonance

    J. Vac. Sci. Techual   Vol. A15 ( 6 ) page: 2880   1997

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  626. Rols of SiH3 and SiH2 Radicals in Particle Growth in RF Silame Plasma

    Jpn. J. Appl. Phys.   Vol. 36 ( 7B ) page: 4985   1997

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  627. Absolute Density Measurement of Cynogen Fluoride in CHF3/N2 Electron Cyclotron Resonance Plasma Using Infrared Diode Laser Absorption

    J. Appl. Phys   Vol. 82 ( 10 ) page: 4777   1997

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  628. ドライエッチング中の反応種計測

    堀勝

    ウルトラクリーンテクノロジー   Vol. 8 ( 4 ) page: 265   1996

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  629. プラズマプロセスにおけるラジカルの気体ー固体相互作用

    堀勝

    放電研究   Vol. 151   page: 3   1996

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    Authorship:Lead author   Language:Japanese   Publishing type:Research paper (scientific journal)  

  630. Hydrogen Radical Assisted Radio-Frequency Plasma Enhonced Chemical Vapon Deposition System for Diamond Formation

    Rev. Sci. Instrum.   Vol. 67 ( 6 ) page: 2360   1996

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  631. Effects of Ions on Surface Morphology and Structure of Polycrystalline Silicon Films Prepared by Electron Rosonance Silane/Hydrogen Plasmas

    Plasma Processing XI   Vol. 96 ( 12 ) page: 662   1996

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  632. Evaluation of CF2 Radical as a Precursar for Fluorocarbon Film Formation in Highly Selectine SiO2 Etching Process Using Radical Injection Technigene

    Jpn. J. Appl. Phys.   Vol. 35 ( 6A ) page: 3635   1996

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  633. Formation of PTFE Thin Films by Using CO2 Laser Evaporation and Xecl Laser Ablation

    J. Vac. Sci & Technal. A   Vol. 14 ( 4 ) page: 1981   1996

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  634. CFx Radical Generation by Plasma Interaction with Fluorocarbon Films on the Reactor Wall

    J. Vac. Sci & Technal. A   Vol. 14 ( 4 ) page: 2083   1996

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  635. Radical Beharvior in Fluorocarbon Palsma and Control of Silicon Oxide Etching by Injection of Radicals

    Jpn. J. Appl. Phys.   Vol. 35 ( 12B ) page: 6521   1996

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  636. Diamond Film Formation by OH Radical Injection from Microwave H2/H2O Plasma into Pardlel-plate RF Methnol Plasma

    Jpn. J. Appl. Phys.   Vol. 35 ( 9 ) page: 4826   1996

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  637. Preparation of Polysiloxane Thin Films Using CO2 Laser Evaporation Assisted by Remate Radical Sowce

    J. Vac. Sci & Technol. A   Vol. 14 ( 5 ) page: 2849   1996

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  638. Infrared Diode Laser Absorption Spectroscopy Measurement of CFx(X=1-3) Radical Densities in Electron Cyctrotron Resonance Plasma Emplaying C4F8, C2F6, CF4 and CHF3 Gases

    J. Vac. Sci. & Technal. A   Vol. 14 ( 4 ) page: 2343   1996

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  639. Behavior of Si Atom in a Silane Electron Cyctroton Resonance Plasma at High Dissociations

    J. Vac. Sci & Technol. A   Vol. 14 ( 4 ) page: 1999   1996

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  640. Fluorocarbon Radicals and Surface Reactions in Fluorocarbon High Density Plasma I. O2 Addition to Electron Cyclotron Resonamce Plasma

    J. Vac. Sci & Technal. A   Vol. 14 ( 4 ) page: 2004   1996

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  641. Fluorocarbon Radicals and Surface Reactions in Fluorocarbon High Demsity Plasma II. H2 Addition to Electron Cyclotron Resonance Plasma

    J. Vac. Sci. & Technol. A   Vol. 14 ( 4 ) page: 2011   1996

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  642. Diagnastics of Fluorocarbon Radicals in a Large-area Permanent Magnet Electron Cyclotron Etching Plasma

    Jpn. J. Appl. Phys.   Vol. 35 ( 12B ) page: 6521   1996

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  643. Plasma CVD Assisted by Selective Radical Source and Its Application to Synthesis of Diamond

    Rarefield Gas Dynamics 19   Vol. 1   page: 671-677   1995

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  644. High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process

    Jpn. J. Appl. Phys.   Vol. 34 ( 12B ) page: L1675-1677   1995

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  645. CH3 Radical Density in Electron Cyclotron Resonance CH3OH and CH3OH/H2 Plasma

    Jpn. J. Appl. Phys.   Vol. 34 ( 6A ) page: 3273-3277   1995

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  646. Synthesis of Diamond Using RF Magnetion Plasma Chemical Vapour Deposition Assisted by Hydrogen Radical Injection

    Jpn. J. Appl. Phys.   Vol. 34   page: 2484   1995

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  647. CFX(X=1-3) Radical Measurements in ECR Etching prasma Employing C4H8 Gas by Infrared Diode Laser Absorption Spectroscopy

    Jpn. J. Appl. Phys.   Vol. 34 ( 4A ) page: L444-L447   1995

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  648. Residue-Free Etching of the Al-Si-Cu Alloy Employing Magnetron Reactive Ion Etching

    J. Electrochem. Soc.   Vol. 141 ( 10 ) page: 2825-2828   1994

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  649. Characteristics of Fluorocarbon Radicals and CHF3 Molecule in CHF3 Electron Cyclotron Resonance Downstream Plasma

    Jpn. J. Appl. Phys.   Vol. 33   page: 4745-4751   1994

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  650. Measurement of Absolute Densities of Si, SiH and SiH3 in SiH4/H2 Election Cyclation Resonance Plasma

    Jpn. J. Appl. Phys.   Vol. 33   page: 4320   1994

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  651. CFX(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition

    Jpn. J. Appl. Phys.   Vol. 33   page: 4181   1994

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  652. Measurement of the CF, CF2 and CF3 Radicals in a CHF3 Electron Cyclotron Resonance Plasma

    Jpn. J. Appl. Phys.   Vol. 32 ( 5A ) page: L694   1993

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  653. Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma

    Jpn. J. Appl. Phys.   Vol. 32 ( 5A ) page: L694   1993

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  654. The Origin of Stress in Sputter-Deposited Tungsten Film for X-ray Masks

    J. Vac. SCi. & Technol.   Vol. B9 ( 1 ) page: 149   1991

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  655. A study of Radiation Damage in SiN and SiC Mask Membranes

    J. Vac. Sci. & Technol.   Vol. B9 ( 6 ) page: 3262   1991

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  656. An Ultra-Low Stress Tungsten Absorber for X-Ray Masks

    J. Vac. Sci. & Technol.   Vol. B9 ( 1 ) page: 165   1991

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  657. Oxygen Plasma Etching Resistance of Plasma Polymerized Organometallic Film

    J. Vac. Sci.& Technol.   Vol. B7 ( 2 ) page: 175   1989

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  658. Self Development of Polymethylmethacrylate by Synchrotoron Radiation Exposure

    J. Electron Soc.   Vol. 135 ( 4 ) page: 966   1988

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  659. Gold Particles Containing Plasma-Polymerized Styrene as an X-Ray Absorber

    Plasma Chemistry and Plasma Processing   Vol. 7 ( 2 ) page: 155   1987

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)  

  660. Plasma-Polymerized Electron Beam Resists Prepared from Methyl Methacrylate Using Various Carrier Gases

    Thin Solid Films   Vol. 149 ( 3 ) page: 341   1987

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)  

  661. Plasma-Polymerized Dry Developable Resist for Synchrotron Radiation Lithography

    J. Electrochem. Soc.   Vol. 134 ( 3 ) page: 707   1987

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  662. Effect of Sn in Plasma Copolymerized Methylmethacrylate and Tetramethyltin(MMA-TMT) Resist on Plasma Development for X-Ray Absorber

    J.Vac.Sci. & Technol.   Vol. B4 ( 2 ) page: 500   1986

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    Authorship:Lead author   Language:English  

  663. H2 Plasma Development of X-Ray Imaged Patterns on Plasma-Polymerized Resists

    Plasma Chemistry and Plasma Processing   Vol. 4 ( 2 ) page: 119   1984

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  664. Molecular Structure of Plasma-Polymerized Methyl Methacrylate and Evaluation as a Resist

    Nippon Kagaku Kaishi   Vol. 10   page: 1670   1984

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  665. Low-Temperature Redistribution of As in Si during Ni Silicide Formation

    J. Appl. Phys.   Vol. 56 ( 10 ) page: 2725   1984

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  666. Molecular Structure of Plasma-Polymerized Methy Methacrylate and Evaluation as a Resist

    M.Hori,S.Hattori,S.Morita,and S.Ishibashi

      ( 10 ) page: pp 1670-1676   1984

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    Language:English   Publishing type:Research paper (scientific journal)  

  667. Reduction of Contact Resistivity by As Redistribution during Pd2Si Formation

    J. Appl. Phys.   Vol. 54 ( 8 ) page: 4679   1983

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)  

  668. Electron Paramagnetic Resonance Study on the Annealing Behavior of Vacuum Deposited Amorphous Silicon on Crystalline Silicon

    J. Appl. Phys.   Vol. 52 ( 11 ) page: 6617   1981

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▼display all

Books 41

  1. Plasma-Activated Solutions in Cancer Treatment Reviewed

    Hiromasa Tanaka, Mounir Laroussi, Sander Bekeschus, Dayun Yan, Masaru Hori, and Michael ( Role: Joint author)

    Springer  2020.8 

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    Language:English Book type:Textbook, survey, introduction

  2. PLASMA MEDICAL SCIENCE

    Masao Ichinose, Masaharu Shiratani, and Masaru Hori( Role: Joint author ,  8. Future outlooks in plasma medical science)

    Academic Press  2018.7 

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    Total pages:438   Language:English

  3. PLASMA MEDICAL SCIENCE

    Masaru Hori( Role: Sole author ,  1. General introduction)

    ACADEMIC PRESS   2018.7 

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    Total pages:438   Language:English Book type:Scholarly book

  4. PLASMA MEDICAL SCIENCE

    Kenji Ishikawa, and Masaru Hori( Role: Joint author ,  2.1 Physical and chemical basis of nonthermal plasma, Introduction)

    ACADEMIC PRESS   2018.7 

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    Total pages:438   Language:English Book type:Scholarly book

  5. PLASMA MEDICAL SCIENCE

    Hiromasa Tanaka, Masaaki Mizuno, and Masaru Hori( Role: Joint author ,  5.7 Plasma medicine innovations in cancer therapy: Glioblastoma)

    5.7 Plasma medicine innovations in cancer therapy: Glioblastoma  2018.7 

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    Total pages:438   Language:English Book type:Scholarly book

  6. PLASMA MEDICAL SCIENCE

    Machiko Iida, Yasuhiro Omata, Ichiro Yajima, Awoi Sato, Takehito Kajiwara, Ryoko Tasaka, Masaru Hori, and Masashi Kato( Role: Joint author ,  5.8 Plasma medical innovations in cancer therapy: Melanoma)

    Academic Press  2018.7 

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    Total pages:438   Language:English

  7. PLASMA MEDICAL SCIENCE

    PLASMA MEDICAL SCIENCE( Role: Joint author)

    Academic Press  2018.7 

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    Total pages:438   Language:English Book type:Scholarly book

  8. PLASMA MEDICAL SCIENCE

    Kenji Miyamoto, Yuzuru Ikehara, Sanae Ikehara, Yoshihiro Akimoto, Hajime Sakakita, Kenji Ishikawa, Masashi Ueda, Jun-ichiro Ikeda, Hayao Nakanishi, Nobuyuki Shimizu, Tetsuji Shimizu, and Masaru Hori( Role: Joint author ,  6.2 Cutting edge technologies of bleeding control using nonthermal plasma - Mechanism of blood coagulation and wound healing)

    Academic Press  2018.7 

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    Total pages:438   Language:English Book type:Scholarly book

  9. PLASMA MEDICAL SCIENCE

    Yoshihiro Akimoto, Sanae Ikehara, Takashi Yamaguchi, Jaeho Kim, Hayato Kawakami, Nobuyuki Shimizu, Masaru Hori, Hajime Sakakita, ( Role: Joint author ,  6.4 Molecular morphological analysis of the effect of plasma irradiation on cells, tissue)

    Academic Press  2018.7 

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    Total pages:438   Language:English

  10. PLASMA MEDICAL SCIENCE

    Masashi Ueda, Daiki Yamagami, Takashi Temma, Kazuhiro Koshino, Osamu Goto, Jun-ichiro Ikeda, Hajime Sakakita, Kenji Ishikawa, Masaru Hori, ( Role: Joint author ,  6.5 Evaluating the invasiveness of nonthermal plasma treatment using molecular imaging technique)

    Academic Press  2018.7 

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    Total pages:438   Language:English Book type:Scholarly book

  11. PLASMA MEDICAL SCIENCE

    Keigo Takeda, Kenji Ishikawa, and Masaru Hori( Role: Sole author ,  2.4 Optical diagnostics of atmospheric pressure plasma)

    ACADEMIC PRESS   2018.7 

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    Total pages:438   Language:English

  12. プラズマプロセス技術 ナノ材料作製・加工のためのアトムテクノロジー

    プラズマ・核融合学会( Role: Sole author)

    森北出版株式会社  2017.1  ( ISBN:978-4-627-77561-9

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    Language:Japanese

  13. ドライプロセスによる表面処理・薄膜形成の応用

    表面技術協会( Role: Sole author)

    コロナ社  2016.12  ( ISBN:978-4-339-04650-2

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    Language:Japanese

  14. Nanotechnology and Nanomaterials New Progress on Graphene Research "Graphene Nanowalls"

    Mineo Hiramatsu, Hiroki Kondo and Masaru Hori( Role: Joint author)

    InTech  2014.3 

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    Language:English

  15. 精密加工と微細構造の形成技術-材料・プロセスの最適化、トラブル対策- 第2章第2節[2] ArFフォトレジストのプラズマエッチング技術

    堀勝,石川健治( Role: Joint author)

    技術情報協会  2013.7