論文 - 堤 隆嘉
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O2 and Ar plasma processing over SiO2/Si stack: Effects of processing gas on interface defect generation and recovery 査読有り
S. Nunomura; T. Tsutsumi; I. Sakata; M. Hori
journal of Applied Physics ( 135 ) 頁: 053301 2024年2月
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Osonio, A; Tsutsumi, T; Mukherjee, B; Borude, R; Kobayashi, N; Hori, M
JAPANESE JOURNAL OF APPLIED PHYSICS 62 巻 ( 12 ) 2023年12月
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Yoshie, T; Ishikawa, K; Nguyen, TTN; Hsiao, SN; Tsutsumi, T; Sekine, M; Hori, M
APPLIED SURFACE SCIENCE 638 巻 2023年11月
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Liu, QY; Sugiyama, S; Han, G; Tsutsumi, T; Tanaka, H; Sasaki, M
JAPANESE JOURNAL OF APPLIED PHYSICS 62 巻 ( SN ) 2023年11月
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Dela Vega, MSDC; Nguyen, TTN; Kondo, H; Tsutsumi, T; Ishikawa, K; Hori, M
PLASMA PROCESSES AND POLYMERS 20 巻 ( 11 ) 2023年11月
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Yoshimura, S; Otsubo, Y; Yamashita, A; Johzuka, K; Tsutsumi, T; Ishikawa, K; Hori, M
JAPANESE JOURNAL OF APPLIED PHYSICS 62 巻 ( SL ) 2023年9月
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Plasma processing and annealing for defect management at SiO<sub>2</sub>/Si interface
Nunomura, S; Tsutsumi, T; Sakata, I; Hori, M
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 41 巻 ( 5 ) 2023年9月
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Hsiao, SN; Britun, N; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M
VACUUM 210 巻 2023年4月
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Osonio, AP; Tsutsumi, T; Oda, Y; Mukherjee, B; Borude, R; Kobayashi, N; Hori, M
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 40 巻 ( 6 ) 2022年12月
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Indoor Floor Heel Mark Removal Using Spark Discharges and Pressurized Airflow
Sakamoto, Y; Tsutsumi, T; Tanaka, H; Ishikawa, K; Hashizume, H; Hori, M
COATINGS 12 巻 ( 12 ) 2022年12月
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Kurokawa, J; Kondo, H; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M
VACUUM 205 巻 2022年11月
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Sahu, BB; Nakane, K; Ishikawa, K; Sekine, M; Tsutsumi, T; Gohira, T; Ohya, Y; Ohno, N; Hori, M
PHYSICAL CHEMISTRY CHEMICAL PHYSICS 24 巻 ( 22 ) 頁: 13883 - 13896 2022年6月
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Nunomura, S; Tsutsumi, T; Nakane, K; Sato, A; Sakata, I; Hori, M
JAPANESE JOURNAL OF APPLIED PHYSICS 61 巻 ( 5 ) 2022年5月
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Low-temperature reduction of SnO2 by floating wire-assisted medium-pressure H-2/Ar plasma
Thi-Thuy-Nga Nguyen, Sasaki Minoru, Hsiao Shih-Nan, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru
PLASMA PROCESSES AND POLYMERS 2022年2月
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Nitrogen Atom Density Measurements in NAGDIS-T Using Vacuum Ultraviolet Absorption Spectroscopy
Nishio, R; Kajita, S; Tanaka, H; Asaoka, K; Tsutsumi, T; Hori, M; Ohno, N
PLASMA AND FUSION RESEARCH 17 巻 2022年1月
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Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems
Kaneko Toshiro, Kato Hiromitsu, Yamada Hideaki, Yamamoto Muneaki, Yoshida Tomoko, Attri Pankaj, Koga Kazunori, Murakami Tomoyuki, Kuchitsu Kazuyuki, Ando Sugihiro, Nishikawa Yasuhiro, Tomita Kentaro, Ono Ryo, Ito Tsuyohito, Ito Atsushi M., Eriguchi Koji, Nozaki Tomohiro, Tsutsumi Takayoshi, Ishikawa Kenji
JAPANESE JOURNAL OF APPLIED PHYSICS 61 巻 ( SA ) 2022年1月
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Hsiao, SN; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M
COATINGS 11 巻 ( 12 ) 2021年12月
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Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure
Vervuurt R. H. J., Mukherjee B., Nakane K., Tsutsumi T., Hori M., Kobayashi N.
LANGMUIR 37 巻 ( 43 ) 頁: 12663 - 12672 2021年11月
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Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H-2 plasma at different substrate temperatures 査読有り
Hsiao Shih-Nan, Britun Nikolay, Thi-Thuy-Nga Nguyen, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru
PLASMA PROCESSES AND POLYMERS 2021年8月
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Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H-2 plasma 査読有り
Hsiao Shih-Nan, Nakane Kazuya, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru
APPLIED SURFACE SCIENCE 542 巻 2021年3月