名古屋大学   大学院工学研究科 附属プラズマナノ工学研究センター   助教

2017年9月 - 2019年3月

名古屋大学   大学院工学研究科 附属プラズマナノ工学研究センター   助教

2017年9月 - 2019年3月

名古屋大学   大学院工学研究科 電子工学専攻 情報デバイス工学   助教

2017年5月 - 2023年3月

名古屋大学   工学研究科   研究員

2015年4月 - 2017年4月

44th DPS2023 実行委員会   実行委員  

2022年3月 - 2023年11月   

IUMRS-ICYRAM   組織委員  

2021年 - 2022年   

IUMRS-ICYRAM   組織委員  

2021年 - 2022年   

2019年国際固体素子・材料コンファレンス実行委員会   実行委員  

2018年8月 - 2019年9月   

ISPlasma / IC-PLANTS　実行委員会   実行委員  

2017年4月 - 現在   

ISPlasma / IC-PLANTS 実行委員会   実行委員  

2017年4月 - 現在   

IWOPA2 実行委員会   実行委員  

2017年4月 - 2018年3月   

40th DPS2018 実行委員会   実行委員  

2017年3月 - 2018年11月   

DPS40周年記念事業準備委員会   実行委員  

2017年3月 - 2018年11月   

Award of Encouragement of Research

2016年12月  

応用物理学会講演奨励賞

2012年11月   応用物理学会  

Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF6

Yoshie, T; Ishikawa, K; Nguyen, TTN; Hsiao, SN; Tsutsumi, T; Sekine, M; Hori, M

APPLIED SURFACE SCIENCE   638 巻   2023年11月

MEMS nozzle for dry-capturing lily pollens in array and fixing on culture media for plasma bio-applications

Liu, QY; Sugiyama, S; Han, G; Tsutsumi, T; Tanaka, H; Sasaki, M

JAPANESE JOURNAL OF APPLIED PHYSICS   62 巻 ( SN )   2023年11月

Deposition of carbon-based materials directly on copper foil and nickel foam as 2D-and 3D-networked metal substrates by in-liquid plasma

Dela Vega, MSDC; Nguyen, TTN; Kondo, H; Tsutsumi, T; Ishikawa, K; Hori, M

PLASMA PROCESSES AND POLYMERS   20 巻 ( 11 )   2023年11月

Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets

Yoshimura, S; Otsubo, Y; Yamashita, A; Johzuka, K; Tsutsumi, T; Ishikawa, K; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   62 巻 ( SL )   2023年9月

Plasma processing and annealing for defect management at SiO₂/Si interface

Nunomura, S; Tsutsumi, T; Sakata, I; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B   41 巻 ( 5 )   2023年9月

Manipulation of etch selectivity of silicon nitride over silicon dioxide to a-carbon by controlling substate temperature with a CF4/H2 plasma

Hsiao, SN; Britun, N; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

VACUUM   210 巻   2023年4月

Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent

Osonio, AP; Tsutsumi, T; Oda, Y; Mukherjee, B; Borude, R; Kobayashi, N; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   40 巻 ( 6 )   2022年12月

Indoor Floor Heel Mark Removal Using Spark Discharges and Pressurized Airflow

Sakamoto, Y; Tsutsumi, T; Tanaka, H; Ishikawa, K; Hashizume, H; Hori, M

COATINGS   12 巻 ( 12 )   2022年12月

Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis

Kurokawa, J; Kondo, H; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

VACUUM   205 巻   2022年11月

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O₂/C₄F₈ plasma etching process

Sahu, BB; Nakane, K; Ishikawa, K; Sekine, M; Tsutsumi, T; Gohira, T; Ohya, Y; Ohno, N; Hori, M

PHYSICAL CHEMISTRY CHEMICAL PHYSICS   24 巻 ( 22 ) 頁： 13883 - 13896   2022年6月

Ion-induced interface defects in a-Si:H/c-Si heterojunction: possible roles and kinetics of hot mobile hydrogens

Nunomura, S; Tsutsumi, T; Nakane, K; Sato, A; Sakata, I; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   61 巻 ( 5 )   2022年5月

Low-temperature reduction of SnO2 by floating wire-assisted medium-pressure H-2/Ar plasma

Thi-Thuy-Nga Nguyen, Sasaki Minoru, Hsiao Shih-Nan, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

PLASMA PROCESSES AND POLYMERS     2022年2月

Nitrogen Atom Density Measurements in NAGDIS-T Using Vacuum Ultraviolet Absorption Spectroscopy

Nishio, R; Kajita, S; Tanaka, H; Asaoka, K; Tsutsumi, T; Hori, M; Ohno, N

PLASMA AND FUSION RESEARCH   17 巻   頁： 1201004 - 1   2022年1月

Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems

Kaneko Toshiro, Kato Hiromitsu, Yamada Hideaki, Yamamoto Muneaki, Yoshida Tomoko, Attri Pankaj, Koga Kazunori, Murakami Tomoyuki, Kuchitsu Kazuyuki, Ando Sugihiro, Nishikawa Yasuhiro, Tomita Kentaro, Ono Ryo, Ito Tsuyohito, Ito Atsushi M., Eriguchi Koji, Nozaki Tomohiro, Tsutsumi Takayoshi, Ishikawa Kenji

JAPANESE JOURNAL OF APPLIED PHYSICS   61 巻 ( SA )   2022年1月

On the Etching Mechanism of Highly Hydrogenated SiN Films by CF₄/D₂ Plasma: Comparison with CF₄/H₂

Hsiao, SN; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

COATINGS   11 巻 ( 12 )   2021年12月

Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure

Vervuurt R. H. J., Mukherjee B., Nakane K., Tsutsumi T., Hori M., Kobayashi N.

LANGMUIR   37 巻 ( 43 ) 頁： 12663 - 12672   2021年11月

Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H-2 plasma at different substrate temperatures 査読有り

Hsiao Shih-Nan, Britun Nikolay, Thi-Thuy-Nga Nguyen, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

PLASMA PROCESSES AND POLYMERS     2021年8月

Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H-2 plasma 査読有り

Hsiao Shih-Nan, Nakane Kazuya, Tsutsumi Takayoshi, Ishikawa Kenji, Sekine Makoto, Hori Masaru

APPLIED SURFACE SCIENCE   542 巻   2021年3月

Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O-2, and Ar 査読有り

Hsiao Shih-Nan, Ishikawa Kenji, Hayashi Toshio, Ni Jiwei, Tsutsumi Takayoshi, Sekine Makoto, Hori Masaru

APPLIED SURFACE SCIENCE   541 巻   2021年3月

Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature 査読有り

Sugiura Hirotsugu, Kondo Hiroki, Higuchi Kimitaka, Arai Shigeo, Hamaji Ryo, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

CARBON   170 巻   頁： 93 - 99   2020年12月

Formation of spherical Sn particles by reducing SnO2 film in floating wire-assisted H-2/Ar plasma at atmospheric pressure 査読有り

Thi-Thuy-Nga Nguyen, Sasaki Minoru, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

SCIENTIFIC REPORTS   10 巻 ( 1 )   2020年10月

Measurements of nitrogen atom density in a microwave-excited plasma jet produced under moderate pressures 査読有り

Kim Jaeho, Takeda Keigo, Itagaki Hirotomo, Wang Xue-lun, Hirose Shingo, Ogiso Hisato, Shimizu Tetsuji, Kumagai Naoto, Tsutsumi Takayoshi, Kondo Hiroki, Hori Masaru, Sakakita Hajime

IEEJ TRANSACTIONS ON ELECTRICAL AND ELECTRONIC ENGINEERING   15 巻 ( 9 ) 頁： 1281 - 1287   2020年9月

Numerical analysis of coaxial dielectric barrier helium discharges: three-stage mode transitions and internal bullet propagation 査読有り

Sato Yosuke, Ishikawa Kenji, Tsutsumi Takayoshi, Hori Masaru

APPLIED PHYSICS EXPRESS   13 巻 ( 8 ) 頁： .   2020年8月

Atomic nitrogen density measurements by actinometry method in the toroidal device NAGDIS-T 査読有り

Kajita Shin, Asaoka Koji, Tanaka Hirohiko, Nishio Ryosuke, Tsutsumi Takayoshi, Hori Masaru, Ohno Noriyasu

JAPANESE JOURNAL OF APPLIED PHYSICS   59 巻 ( 8 ) 頁： .   2020年8月

In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals 査読有り

Hasegawa Masaki, Tsutsumi Takayoshi, Tanide Atsushi, Nakamura Shohei, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   38 巻 ( 4 )   2020年7月

Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity 査読有り

Yosuke Sato, Kenji Ishikawa, Takayoshi Tsutsumi, Akio Ui, Masato Akita, Shotaro Oka, Masaru Hori

Journal of Physics D: Applied Physics     2020年4月

Generation and Diagnostics of Ambient Air Glow Discharge in Centimeter-Order Gaps 査読有り

Gamaleev Vladislav, Tsutsumi Takayoshi, Hiramatsu Mined, Ito Masafumi, Hori Masaru

IEEE ACCESS   8 巻   頁： 72607 - 72619   2020年4月

Electron and negative ion dynamics in a pulsed 100 MHz capacitive discharge produced in an O-2 and Ar/O-2/C4F8 gas mixture 査読有り

Sirse N., Tsutsumi T., Sekine M., Hori M., Ellingboe A. R.

PLASMA SOURCES SCIENCE & TECHNOLOGY   29 巻 ( 3 )   2020年3月

Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study 査読有り

Fukunaga Yusuke, Longo Roberto C., Ventzek Peter L. G., Lane Barton, Ranjan Alok, Hwang Gyeong S., Hartmann Greg, Tsutsumi Takayoshi, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Hori Masaru

JOURNAL OF APPLIED PHYSICS   127 巻 ( 2 )   2020年1月

Etching characteristics of PECVD-prepared SiN films with CF₄/D₂ and CF₄/H₂ plasmas at different temperatures

Hsiao, SN; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

2020 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)   2020- 巻   2020年

Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp2 carbon structures 査読有り

Hirotsugu Sugiura, Yasuyuki Ohashi, Kenji Ishikawa, Hiroki Kondo, Toshiaki Kato, Toshiro Kaneko, Keigo Takeda, Takayoshi Tsutsumi, Toshio Hayashi, Makoto Sekine, Masaru Hori

Diamond and Related Materials   104 巻   頁： 107651   2019年12月

In Situ Monitoring of Surface Reactions during Atomic Layer Etching of Silicon Nitride Using Hydrogen Plasma and Fluorine Radicals 査読有り

Nakane Kazuya, Vervuurt Rene H. J., Tsutsumi Takayoshi, Kobayashi Nobuyoshi, Hori Masaru

ACS APPLIED MATERIALS & INTERFACES   11 巻 ( 40 ) 頁： 37263 - 37269   2019年10月

Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation 査読有り

Ichikawa, T; Kondo, H; Ishikawa, K; Tsutsumi, T; Tanaka, H; Sekine, M; Hori, M

ACS APPLIED BIO MATERIALS   2 巻 ( 7 ) 頁： 2698 - 2702   2019年7月

Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes? 査読有り

Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation 査読有り

Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development 査読有り

Iwase Taku, Kamaji Yoshito, Kang Song Yun, Koga Kazunori, Kuboi Nobuyuki, Nakamura Moritaka, Negishi Nobuyuki, Nozaki Tomohiro, Nunomura Shota, Ogawa Daisuke, Omura Mitsuhiro, Shimizu Tetsuji, Shinoda Kazunori, Sonoda Yasushi, Suzuki Haruka, Takahashi Kazuo, Tsutsumi Takayoshi, Yoshikawa Kenichi, Ishijima Tatsuo, Ishikawa Kenji

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻   2019年6月

Facile synthesis of SnO2-graphene composites employing nonthermal plasma and SnO2 nanoparticles-dispersed ethanol 査読有り

Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 17 )   2019年4月

Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

Imai, S; Naito, K; Kondo, H; Cho, HJ; Ishikawa, K; Tsutsumi, T; Sekine, M; Hiramatsu, M; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 10 ) 頁： 105503 - 105503   2019年3月

Real-time control of a wafer temperature for uniform plasma process

T. Tsutsumi, Y. Fuknaga, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

2018 International Symposium on Semiconductor Manufacturing     2019年2月

Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF₆-added plasma etching of quartz glass

Nguyen, TTN; Sasaki, M; Odaka, H; Tsutsumi, T; Ishikawa, K; Hori, M

JOURNAL OF APPLIED PHYSICS   125 巻 ( 6 ) 頁： 063304 - 063304   2019年2月

Liquid dynamics in response to an impinging low-temperature plasma jet

Brubaker, TR; Ishikawa, K; Kondo, H; Tsutsumi, T; Hashizume, H; Tanaka, H; Knecht, SD; Bilén, SG; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 巻 ( 7 )   2019年2月

Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition 査読有り

Hirotsugu Sugiura, Lingyun Jia, Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics   58 巻 ( 3 ) 頁： 030912   2019年2月

Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries 査読有り

Ranjit R. Borude, Hirotsugu Sugiura, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Nobuyuki Ikarashi, Masaru Hori

ACS Appplied Nano Materials   2 巻 ( 2 ) 頁： 649-654   2019年2月

Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds

Ichikawa, T; Tanaka, S; Kondo, H; Ishikawa, K; Tsutsumi, T; Sekine, M; Hori, M

APPLIED PHYSICS EXPRESS   12 巻 ( 2 )   2019年2月

Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system

Fukunaga, Y; Tsutsumi, T; Kondo, H; Ishikawa, K; Sekine, M; Hori, M

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( 2 )   2019年2月

Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma 査読有り

Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Han Jeon Geon, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   58 巻 ( SA )   2019年2月

Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition 査読有り

H. Sugiura, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Hori

C   5 巻 ( 1 ) 頁： 8   2019年1月

Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition 査読有り

Masakazu Tomatsu , Mineo Hiramatsu, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

C   5 巻 ( 1 ) 頁： 7   2019年1月

Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas 査読有り

Yan Zhang, Kenji Ishikawa, Miran Mozetič, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

Plasma Processes and Polymers     2019年1月

Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C₂F₆/H₂ plasma-enhanced chemical vapor deposition

Imai, S; Kondo, H; Hyungjun, C; Ishikawa, K; Tsutsumi, T; Sekine, M; Hiramatsu, M; Hori, M

APPLIED PHYSICS EXPRESS   12 巻 ( 1 )   2019年1月

Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching 査読有り

Zhang Yan, Imamura Masato, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS   57 巻 ( 10 )   2018年10月

Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma 査読有り

Zecheng Liu, Kenji Ishikawa, Masato Imamura, Takayoshi Tsutsumi, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics   57 巻 ( 6 )   2018年6月

Effects of gas residence time of CH4/H2 on sp2 fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition 査読有り

Hirotsugu Sugiura, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics   57 巻 ( 6 )   2018年6月

Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons 査読有り

Atsushi Ando, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics   57 巻 ( 2 )   2018年2月

Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol 査読有り

Tomoki Amano, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Keigo Takeda, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Applied Physics Express   11 巻 ( 1 )   2018年1月

Real-time control of a wafer temperature for uniform plasma process

Tsutsumi, T; Fuknaga, Y; Ishikawa, K; Kondo, H; Sekine, M; Hori, M

2018 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM)     頁： .   2018年

Measurement of F-, O- and CF3- densities in 60 and 100 MHz asymmetric capacitively coupled plasma discharge produced in an Ar/O2/C4F8 gas mixture 査読有り

N. Sirse, T. Tsutsumi, M. Sekine, M. Hori, A. R. Ellingboe

Journal of Physics D: Applied Physics   50 巻 ( 33 ) 頁： 335205   2017年7月

Temperature dependence of protection layer formation on organic trench sidewall in H2/N2 plasma etching with control of substrate temperature 査読有り

Y. Fukunaga, T. Tsutsumi, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

Japanese Journal of Applied Physics   56 巻 ( 7 ) 頁： 076202   2017年6月

Investigation of the radially resolved oxygen dissociation degree and local mean electron energy in oxygen plasmas in contact with different surface materials 査読有り

T. Tsutsumi, A. Greb, A. R. Gibson, M. Hori, D. O'Connell, T. Gans

Journal of Applied Physics   121 巻 ( 14 ) 頁： 143301   2017年4月

Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas 査読有り

T. Ueyama, Y. Fukunaga, T. Tsutsumi, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Iwata, Y. Ohya, H. Sugai, M. Hori

Japanese Journal of Applied Physics   56 巻 ( 6S2 ) 頁： 06HC03   2017年3月

Absolute density of precursor SiH₃ radicals and H atoms in H2-diluted SiH₄ gas plasma for deposition of microcrystalline silicon films 査読有り

Y. Abe, K. Ishikawa, K. Takeda, T. Tsutsumi, A. Fukushima, H. Kondo, M. Sekine, M. Hori

Applied Physics Letters   110 巻 ( 4 ) 頁： 043902   2017年1月

Advanced Plasma Etching Processing: Atomic Layer Etching for Nanoscale Devices 査読有り

T. Tsutsumi, M. Zaitsu, A. Kobayashi, N. Kobayashi, M. Hori

PLASMA NANO SCIENCE AND TECHNOLOGY   77 巻 ( 3 ) 頁： 25 - 28   2017年

Atomic layer etching of SiO₂ by alternating an O₂ plasma with fluorocarbon film deposition 査読有り

T. Tsutsumi, H. Kondo, M. Hori, M. Zaitsu, A. Kobayashi, T. Nozawa, N. Kobayashi

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films   35 巻 ( 1 ) 頁： 01A103   2016年11月

The role of plasma chemistry on functional silicon nitride film properties deposited at low-temperature by mixing two frequency powers using PECVD 査読有り

B. B. Sahu, Y. Y. Yin, T. Tsutsumi, M. Hori, Jeon G. Han

Physical Chemistry Chemical Physics   18 巻 ( 18 ) 頁： 13033   2016年4月

Control of Internal Plasma Parameters Toward Atomic Level Processing 査読有り

M. Sekine, T. Tsutsumi, Y. Fukunaga, K. Takeda, H. Kondo, K. Ishikawa, M. Hori

ECS Transactions   75 巻 ( 6 ) 頁： 21   2016年

Real-time temperature-monitoring of Si substrate during plasma processing and its heat-flux analysis 査読有り

T. Tsutsumi, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori

Japanese Journal of Applied Physics   55 巻 ( 1S ) 頁： 01AB04   2015年11月

Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching 査読有り

T. Tsutsumi, Y. Fukunaga, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori

IEEE Transactions on Semiconductor Manufacturing   28 巻 ( 4 ) 頁： 515   2015年8月

Wavelength Dependence for Silicon-Wafer Temperature Measurement by Autocorrelation-type Frequency-Domain Low-Coherence Interferometry 査読有り

T. Tsutsumi, T. Ohta, K Takeda, M. Ito, M. Hori

Applied Optics   54 巻 ( 23 ) 頁： 7088   2015年8月

Robust characteristics of semiconductor-substrate temperature-measurement method using auto-correlation type frequency-domain low-coherence interferometry 査読有り

T. Tsutsumi, T. Ohta, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori, M. Ito

Japanese Journal of Applied Physics   54 巻 ( 1S ) 頁： 01AB03   2014年11月

Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry 査読有り

T. Tsutsumi, T. Ohta, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori, M. Ito

Applied Physics Letters   103 巻 ( 18 ) 頁： 182102   2013年10月

窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス

堤 隆嘉, 石川 健治, 近藤 博基, 関根 誠, 堀 勝  

プラズマ・核融合学会誌97 巻 ( 9 ) 頁： 517 - 521   2021年9月

大気圧プラズマ処理による異種材料接合

近藤博基, 堤隆嘉, 石川健治, 関根 誠, 堀 勝  

化学工学（公益社団法人 化学工学会）82 巻 ( 9 ) 頁： 487-490   2018年9月

高電位試験時における白金微粒子担持カーボンナノウォール電極の分極特性の変化

今井駿, 近藤博基, 石川健治, 堤隆嘉, 平松美根男, 関根誠, 堀勝  

応用物理学会秋季学術講演会講演予稿集(CD-ROM)79th 巻   2018年

高速かつ高精度非接触, リアルタイム基板温度計測システムの開発～超微細加工プラズマプロセスのイノベーションに向けて～

堤　隆嘉  

プラズマエレクトロニクス分科会会報58 巻   頁： 19   2013年6月

パルスプラズマにおける負イオンエネルギー分布の時間 分解測定

都地 一輝, 堤 隆嘉, 蕭 世男, 関根 誠, 堀 勝, 石川 健治

第71回応用物理学会春期学術講演会  2024年3月24日 

Prediction Model for RF Bias Effect on Etch Resistance of Amorphous Carbon in Plasma Enhanced Chemical Vapor Deposition 国際会議

Y. Ando, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13  2024年3月4日 

In-situ analysis of chemisorption reactions on SiO2 surface using carbon precursor containing halogen 国際共著 国際会議

L. Hu, T. Tsutsumi, N. Kobayashi, D. C. P. Raj, R. Borude, K. Ishikawa, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13  2024年3月5日 

In-situ analysis of chemisorption reactions on SiO2 surface using carbon precursor containing halogen 国際共著 国際会議

L. Hu, T. Tsutsumi, N. Kobayashi, D. C. P. Raj, R. Borude, K. Ishikawa, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13  2024年3月5日 

Prediction Model for RF Bias Effect on Etch Resistance of Amorphous Carbon in Plasma Enhanced Chemical Vapor Deposition 国際会議

Y. Ando, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13  2024年3月4日 

ALEにおけるプラズマ誘起欠陥とラジカル吸着のin-situ計測 招待有り

堤隆嘉，近藤博基，関根誠，石川健治，堀勝

2024年1月25日 

ALEにおけるプラズマ誘起欠陥とラジカル吸着のin-situ計測 招待有り

堤隆嘉, 近藤博基, 関根誠, 石川健治, 堀勝

2024年1月25日 

Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma 国際会議

T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori

The 44th International Symposium on Dry Process (DPS2023)   2023年11月22日 

Defect characterization at SiO2/Si interface throughout plasma processing and annealing 国際会議

S.Nunomura, T.Tsutsumi, I. Sakata and M Hori

The 44th International Symposium on Dry Process (DPS2023)   2023年11月22日 

A pseudo-wet cryogenic plasma etching of SiO2 investigated with in-situ surface monitoring 国際会議

S-N Hsiao, M. Sekine, K. Ishikawa, T.Tsutsumi, and M. Hori Y Iijima, R. Suda, Y. Kihara

The 44th International Symposium on Dry Process (DPS2023)   2023年11月22日 

Electron-Beam-Assisted Self-limiting fluorination of GaN surface using XeF2 for Atomic Layer Etching 国際会議

Y. Izumi, T. Tsutsumi, H Kondo, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023)   2023年11月21日 

Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching 国際会議

K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023)   2023年11月21日 

Etch selectivities of SiO2 and SiN against a-C films using CF4/H2 plasma at low temperature 国際会議

Y. Imai, S-N. Hsiao, M. Sekine, K. Ishikawa, T. Tsutsumi, M. Iwata, M. Tomura, Y. Iijima, K. Matsushima, M. Hori

The 44th International Symposium on Dry Process (DPS2023)   2023年11月21日 

A pseudo-wet cryogenic plasma etching of SiO2 investigated with in-situ surface monitoring 国際会議

S-N Hsiao, M. Sekine, K. Ishikawa, T.Tsutsumi, M. Hori Y Iijima, R. Suda, Y. Kihara

The 44th International Symposium on Dry Process (DPS2023)  2023年11月22日 

Etch selectivities of SiO2 and SiN against a-C films using CF4/H2 plasma at low temperature 国際会議

Y. Imai, S-N. Hsiao, M. Sekine, K. Ishikawa, T. Tsutsumi, M. Iwata, M. Tomura, Y. Iijima, K. Matsushima, M. Hori

The 44th International Symposium on Dry Process (DPS2023)  2023年11月21日 

Electron-Beam-Assisted Self-limiting fluorination of GaN surface using XeF2 for Atomic Layer Etching 国際会議

Y. Izumi, T. Tsutsumi, H Kondo, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023)  2023年11月21日 

Defect characterization at SiO2/Si interface throughout plasma processing and annealing 国際会議

S.Nunomura, T.Tsutsumi, I. Sakata, M Hori

The 44th International Symposium on Dry Process (DPS2023)  2023年11月22日 

Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma 国際会議

T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori

The 44th International Symposium on Dry Process (DPS2023)  2023年11月22日 

Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching 国際会議

K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023)  2023年11月21日 

ドライエッチングと原子層エッチングの基礎と応用 招待有り

堤 隆嘉

第34回 プラズマエレクトロニクス講習会  2023年11月17日 

ドライエッチングと原子層エッチングの基礎と応用 招待有り

堤 隆嘉

第34回 プラズマエレクトロニクス講習会  2023年11月17日 

Etching Selectivities of SiO2 and SiN Against a-C Films Using CF4/H2 with a Pseudo-Wet Plasma Etching Mechanism 国際会議

Yusuke Imai, S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tamura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori,

AVS 69th International Symposium and Exhibition (AVS 69)  2023年11月6日 

Etching Selectivities of SiO2 and SiN Against a-C Films Using CF4/H2 with a Pseudo-Wet Plasma Etching Mechanism 国際会議

Yusuke Imai, S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tamura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori

AVS 69th International Symposium and Exhibition (AVS 69)  2023年11月6日 

Transient behavior of cycle process in Ar plasma with alternately injected C4F8 and SF6 国際会議

T. Yoshie, K. Ishikawa, TTN Nguyen, S. Hsiao, T. Tsutsumi, M. Sekine, M. Hori

13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023)  2023年11月8日 

Transient behavior of cycle process in Ar plasma with alternately injected C4F8 and SF6 国際会議

T. Yoshie, K. Ishikawa, TTN Nguyen, S. Hsiao, T. Tsutsumi, M. Sekine, M. Hori

13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023)  2023年11月8日 

Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis 国際会議

S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tomura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori

The 76th Annual Gaseous Electronics Conference (GEC76)  2023年10月11日 

Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis 国際会議

S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tomura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori

The 76th Annual Gaseous Electronics Conference (GEC76)  2023年10月11日 

Plasma-Enhanced Deposition Mechanism of Hydrogenated Amorphous Carbon Analyzed ByCombining Reactive Species Measurement and Machine Learning 招待有り 国際会議

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, H. Kousaka, M. Hori

244th ECS Meeting  2023年10月11日 

Selective removal of graphene by irradiation of remote oxygen plasma 国際会議

L. Hu, K. Ishikawa, T. Tsutsumi, TTN Nguyen, S. Hsiao, H. Kondo, M. Sekine, M. Hori

Global Plasma Forum in Aomori  2023年10月16日 

Plasma-Enhanced Deposition Mechanism of Hydrogenated Amorphous Carbon Analyzed ByCombining Reactive Species Measurement and Machine Learning 招待有り 国際会議

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, H. Kousaka, M. Hori

244th ECS Meeting  2023年10月11日 

Selective removal of graphene by irradiation of remote oxygen plasma 国際会議

L. Hu, K. Ishikawa, T. Tsutsumi, TTN Nguyen, S. Hsiao, H. Kondo, M. Sekine, M. Hori

Global Plasma Forum in Aomori  2023年10月16日 

カーボンハードマスクのプラズマエッチング耐性に対する，成膜過程におけるイオン照射効果

安藤 悠介、近藤 博基、堤 隆嘉、石川 健治、関根 誠、堀 勝

第84回応用物理学会秋季学術講演会  2023年9月21日 

CF4/H2プラズマによるSiO2,SiN,a-C膜の低温エッチング

今井 祐輔、蕭 世男、関根 誠、飯島 祐樹、須田 隆太郎、大矢 欣伸、木原 嘉英、堤 隆嘉、石川 健治、堀 勝

第84回応用物理学会秋季学術講演会  2023年9月22日 

低温における絶縁膜の擬ウェットプラズマエッチング

蕭 世男、関根 誠、飯島 祐樹、須田 隆太郎、大矢 欣伸、木原 嘉英、堤 隆嘉、石川 健治、堀 勝

第84回応用物理学会秋季学術講演会  2023年9月22日 

容量結合型パルスプラズマにおける負イオンの電極材料依存性

都地 一輝、堤 隆嘉、蕭 世男、関根 誠、石川 健治、堀 勝

第84回応用物理学会秋季学術講演会  2023年9月22日 

プラズマ誘起欠陥の発生と修復 ～酸素プラズマがSiO2/Si界面に及ぼす影響～

布村 正太、堤 隆嘉、堀 勝

第84回応用物理学会秋季学術講演会  2023年9月21日 

原子層エッチングにおけるプラズマ誘起欠陥へのラジカル吸着挙動

オソニオ アイラ ペラロ、堤 隆嘉、石川 健治、堀 勝

第84回応用物理学会秋季学術講演会  2023年9月21日 

CF4/H2プラズマによるSiO2,SiN,a-C膜の低温エッチング

今井 祐輔, 蕭 世男, 関根 誠, 飯島 祐樹, 須田 隆太郎, 大矢 欣伸, 木原 嘉英, 堤 隆嘉, 石川 健治, 堀 勝

第84回応用物理学会秋季学術講演会  2023年9月22日 

カーボンハードマスクのプラズマエッチング耐性に対する，成膜過程におけるイオン照射効果

安藤 悠介, 近藤 博基, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

第84回応用物理学会秋季学術講演会  2023年9月21日 

容量結合型パルスプラズマにおける負イオンの電極材料依存性

都地 一輝, 堤 隆嘉, 蕭 世男, 関根 誠, 石川 健治, 堀 勝

第84回応用物理学会秋季学術講演会  2023年9月22日 

原子層エッチングにおけるプラズマ誘起欠陥へのラジカル吸着挙動

オソニオ アイラ ペラロ, 堤 隆嘉, 石川 健治, 堀, 勝

第84回応用物理学会秋季学術講演会  2023年9月21日 

低温における絶縁膜の擬ウェットプラズマエッチング

蕭 世男, 関根 誠, 飯島 祐樹, 須田 隆太郎, 大矢 欣伸, 木原 嘉英, 堤 隆嘉, 石川 健治, 堀 勝

第84回応用物理学会秋季学術講演会  2023年9月22日 

プラズマ誘起欠陥の発生と修復 ～酸素プラズマがSiO2/Si界面に及ぼす影響～

布村 正太, 堤 隆嘉, 堀 勝

第84回応用物理学会秋季学術講演会  2023年9月21日 

In-liquid plasma synthesis, morphological control, and functionalization of nanographene materials 国際会議

H. Kondo, T. Tsutsumi, M. Hiramatsu, M. Hori

THERMEC'2023  2023年7月3日 

In-liquid plasma synthesis, morphological control, and functionalization of nanographene materials 国際会議

H. Kondo, T. Tsutsumi, M. Hiramatsu, M. Hori

THERMEC'2023  2023年7月3日 

Plasma Synthesis of Graphene-Based Materials: Functionalization and Applications 招待有り 国際共著 国際会議

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, and M.Hori

THERMEC'2023  2023年7月3日 

Plasma Synthesis of Graphene-Based Materials: Functionalization and Applications 招待有り 国際共著 国際会議

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, M.Hori

THERMEC'2023  2023年7月3日 

Recent Progress in the Synthesis of Functional and Three-Dimensional Carbon Nano-Composites By Gas-Liquid Interface Plasma 国際会議

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, and M.Hori

243rd ECS Meeting 

Recent Progress in the Synthesis of Functional and Three-Dimensional Carbon Nano-Composites By Gas-Liquid Interface Plasma 国際会議

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, M.Hori

243rd ECS Meeting 

A comparative study on the CF4/H2 and HF/H2 plasmas for etching of highly hydrogenated SiN films 国際会議

Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

25th International Symposium on Plasma Chemistry (ISPC25) 

A comparative study on the CF4/H2 and HF/H2 plasmas for etching of highly hydrogenated SiN films 国際会議

Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

25th International Symposium on Plasma Chemistry (ISPC25) 

Global and local contribution analysis of process parameters in Plasma enhanced chemical vapor deposition of amorphous carbon har 国際会議

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

The 4th International Conference on Data Driven Plasma Sciences ( ICDDPS-4 ) 

Global and local contribution analysis of process parameters in Plasma enhanced chemical vapor deposition of amorphous carbon har 国際会議

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

The 4th International Conference on Data Driven Plasma Sciences ( ICDDPS-4 ) 

熱酸化膜/シリコン界面でのプラズマ誘起欠陥の発生と修復

布村 正太、坂田 功、堤 隆嘉、堀 勝

第70回応用物理学会春季学術講演会 

成膜パラメータの寄与度解析に基づく、 水素化アモルファスカーボン薄膜のエッチ耐性の向上

安藤 悠介、近藤 博基、石川 健治、堤 隆嘉、関根 誠、堀 勝

第70回応用物理学会春季学術講演会 

成膜パラメータの寄与度解析に基づく、 水素化アモルファスカーボン薄膜のエッチ耐性の向上

安藤 悠介, 近藤 博基, 石川 健治, 堤 隆嘉, 関根 誠, 堀 勝

第70回応用物理学会春季学術講演会 

熱酸化膜/シリコン界面でのプラズマ誘起欠陥の発生と修復

布村 正太, 坂田 功, 堤 隆嘉, 堀 勝

第70回応用物理学会春季学術講演会 

Characterization of Plasmas and Polymerized Hydrofluorocarbon Films in Capacitively Coupled CF4/H2 Plasmas 国際会議

Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Self-Limited Fluorination of Electron Beam-Irradiated GaN Surface 国際会議

Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Contribution Analysis of Process Parameters in Plasma-Enhanced Chemical Vapor Deposition of Amorphous Carbon 国際会議

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Positive and Negative Ion Behaviors in DC-Imposed Ar/SF6 Pulsed Plasma 国際会議

Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, Shih-Nan Hsiao, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Etching Behavior of Lamellar Poly(styrene-b-2-vinylpyridine) Block Copolymer under N2/H2 Plasma Process 国際会議

Ma. Shanlene Dela Vega, Ayane Kitahara, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Atsushi Takano, Yushu Matsushita and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Study on Plasma Process Using Adsorbed C7F14 as an Etchant 国際会議

Kohei Masuda, Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao, Takayoshi Tsutsumi, Hiroki Kondo and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Morphological Effect of Carbon Nanowalls on Exosome Capture 国際会議

Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

MEMS Nozzle for Capturing Lily Pollen in Array and Fixing on Culture Media 国際会議

Sachiko Sugiyama, Gang Han, Takayoshi Tsutsumi, Hiromasa Tanaka and Minoru Sasaki

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Characterization of Plasmas and Polymerized Hydrofluorocarbon Films in Capacitively Coupled CF4/H2 Plasmas 国際会議

Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Etching Behavior of Lamellar Poly(styrene-b-2-vinylpyridine) Block Copolymer under N2/H2 Plasma Process 国際会議

Ma. Shanlene, Dela Vega, Ayane Kitahara, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Atsushi Takano, Yushu Matsushita, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Contribution Analysis of Process Parameters in Plasma-Enhanced Chemical Vapor Deposition of Amorphous Carbon 国際会議

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

MEMS Nozzle for Capturing Lily Pollen in Array and Fixing on Culture Media 国際会議

Sachiko Sugiyama, Gang Han, Takayoshi Tsutsumi, Hiromasa Tanaka, Minoru Sasaki

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Study on Plasma Process Using Adsorbed C7F14 as an Etchant 国際会議

Kohei Masuda, Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Self-Limited Fluorination of Electron Beam-Irradiated GaN Surface 国際会議

Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Positive and Negative Ion Behaviors in DC-Imposed Ar/SF6 Pulsed Plasma 国際会議

Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, Shih-Nan Hsiao, Makoto Sekine, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Morphological Effect of Carbon Nanowalls on Exosome Capture 国際会議

Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu, Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023） 

Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas 国際会議

Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2022 

Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas 国際会議

Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2022 

Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing 国際会議

Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI

Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma 国際会議

Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI

Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing 国際会議

Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI

Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma 国際会議

Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI

Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma 国際会議

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, and M. Hori

The 43rd International Symposium on Dry Process (DPS2022) 

Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma 国際会議

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori

The 43rd International Symposium on Dry Process (DPS2022) 

Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma 招待有り 国際会議

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori

242nd ECS Meeting 

Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma 招待有り 国際会議

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

242nd ECS Meeting 

Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)  

Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias 国際会議

Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)  

Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma 国際会議

Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)  

Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets 国際会議

Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)  

Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022) 

Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets 国際会議

Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022) 

Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias 国際会議

Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022) 

Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma 国際会議

Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022) 

水素化アモルファスカーボン薄膜の合成機構における活 性種の寄与度の機械学習を用いた解析

近藤 博基, 黒川 純平, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝

2022年　第83回　応用物理学会　秋季学術講演 

イオン照射角制御によるカーボンナノウォールの配向成長

射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

2022年　第83回　応用物理学会　秋季学術講演 

イオン照射角制御によるカーボンナノウォールの配向成長

射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

2022年 第83回 応用物理学会 秋季学術講演 

水素化アモルファスカーボン薄膜の合成機構における活 性種の寄与度の機械学習を用いた解析

近藤 博基, 黒川 純平, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝

2022年 第83回 応用物理学会 秋季学術講演 

Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition 国際会議

Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 

In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Naga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 

In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Naga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 

Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition 国際会議

Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22 

Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process 招待有り 国際会議

Ma. shanlene Dela Cruz DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022) 

Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials 招待有り 国際会議

Hiroki KONDO, Takayoshi TSUTSUMI, Kenji ISHIKAWA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022) 

Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials 招待有り 国際会議

Hiroki KONDO, Takayoshi TSUTSUMI, Kenji ISHIKAWA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022) 

Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process 招待有り 国際会議

Ma. shanlene, Dela Cruz, DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022) 

Study of etching process using CHF3 gas condensed layer in cryogenic region 国際会議

Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

1st International Workshop on Plasma Cryo Etching Processes（PlaCEP2022） 

Study of etching process using CHF3 gas condensed layer in cryogenic region 国際会議

Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

1st International Workshop on Plasma Cryo Etching Processes（PlaCEP2022） 

Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Pasivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma 国際会議

Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

MRS Spring Meetings & Exhibits 

Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Pasivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma 国際会議

Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

MRS Spring Meetings & Exhibits 

C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響

吉江 泰斗、堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝

第69回応用物理学会春季学術講演会 

窒化ガリウムの基板昇温時サイクルエッチング特性

南 吏玖、中村 昭平、谷出 敦、石川 健治、堤 隆嘉、近藤 博基、関根 誠、堀 勝

第69回応用物理学会春季学術講演会 

プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果

射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第69回応用物理学会春季学術講演会 

高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの 表面電位制御

橋本 拓海、近藤 博基、田中 宏昌、石川 健治、堤 隆嘉、関根 誠、安井 隆雄、馬場 嘉信、平松 美根男、堀 勝

第69回応用物理学会春季学術講演会 

ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析

近藤 博基、尾崎 敦士、堤 隆嘉、関根 誠、石川 健治、堀 勝、平松 美根男

第69回応用物理学会春季学術講演会 

C3H6 / H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係

黒川 純平、光成 正、近藤 博基、堤 隆嘉、関根 誠、石川 健治、堀 勝

第69回応用物理学会春季学術講演会 

C3H6 / H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係

黒川 純平, 光成 正, 近藤 博基, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝

第69回応用物理学会春季学術講演会 

C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響

吉江 泰斗, 堤 隆嘉, 石川 健治, 近藤 博基, 関根 誠, 堀 勝

第69回応用物理学会春季学術講演会 

プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果

射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

第69回応用物理学会春季学術講演会 

高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの 表面電位制御

橋本 拓海, 近藤 博基, 田中 宏昌, 石川 健治, 堤 隆嘉, 関根 誠, 安井 隆雄, 馬場 嘉信, 平松 美根男, 堀 勝

第69回応用物理学会春季学術講演会 

窒化ガリウムの基板昇温時サイクルエッチング特性

南 吏玖, 中村 昭平, 谷出 敦, 石川 健治, 堤 隆嘉, 近藤 博基, 関根 誠, 堀 勝

第69回応用物理学会春季学術講演会 

ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析

近藤 博基, 尾崎 敦士, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝, 平松 美根男

第69回応用物理学会春季学術講演会 

In-Liquid Plasma Coating of Graphite Films on Metal Surface Immersed in Ethanol 国際会議

Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Magdaleno R. Vasquez Jr., and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of Air Introduction between Electrodes on Rapid Removal Process of Polymer Contamination on Floor by Atmospheric Pressure Plasma 国際会議

Yoshihiro Sakamoto, Takayoshi Tsutsumi, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Simple external filter and tuning for operation in dual radio frequency plasmas using compensated Langmuir probe 国際会議

B. B. Sahu, M. Sekine, T. Tsutsumi, K. Ishikawa, H. Shogo, H. Tanaka, N. Ohno, and M. Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of Substrate Temperature on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Using C2F6 /H2 Mixture Gas 国際会議

Takumi Hashimoto, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Spectroscopy of H2/CH4/N2 Plasma for Carbon Nanowalls Growth 国際会議

Dennis Christy, Takayoshi Tsutsumi, Ngo Van Nong, Osamu Oda, Masaru Hori and Nikolay Britun

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Three-Dimensional Morphological Analysis of Carbon Nanowalls 国際会議

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar and Mineo Hiramatsu

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of RF Stage-Bias on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition 国際会議

Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Correlation analysis between radicals in gas phase and etch resistance of hydrogenated amorphous carbon film 国際会議

Jumpei Kurokawa, Tadashi Mitsunari, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Manipulation of etch selectivity of silicon nitride over silicon dioxide by controlling substrate temperature with a CF4/H2 plasma 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Feature profiles in cyclic etch using C4F8 and SF6 gas-modulated plasma 国際会議

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Correlation analysis between radicals in gas phase and etch resistance of hydrogenated amorphous carbon film 国際会議

Jumpei Kurokawa, Tadashi Mitsunari, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Feature profiles in cyclic etch using C4F8 and SF6 gas-modulated plasma 国際会議

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of Substrate Temperature on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Using C2F6 /H2 Mixture Gas 国際会議

Takumi Hashimoto, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of RF Stage-Bias on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition 国際会議

Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Effect of Air Introduction between Electrodes on Rapid Removal Process of Polymer Contamination on Floor by Atmospheric Pressure Plasma 国際会議

Yoshihiro Sakamoto, Takayoshi Tsutsumi, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

In-Liquid Plasma Coating of Graphite Films on Metal Surface Immersed in Ethanol 国際会議

Ma. Shanlene, D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Magdaleno R, Vasquez Jr, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Three-Dimensional Morphological Analysis of Carbon Nanowalls 国際会議

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar, Mineo Hiramatsu

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Spectroscopy of H2/CH4/N2 Plasma for Carbon Nanowalls Growth 国際会議

Dennis Christy, Takayoshi Tsutsumi, Ngo Van Nong, Osamu Oda, Masaru Hori, Nikolay Britun

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Simple external filter and tuning for operation in dual radio frequency plasmas using compensated Langmuir probe 国際会議

B. B. Sahu, M. Sekine, T. Tsutsumi, K. Ishikawa, H. Shogo, H. Tanaka, N. Ohno, M. Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

Manipulation of etch selectivity of silicon nitride over silicon dioxide by controlling substrate temperature with a CF4/H2 plasma 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science 

真空紫外原子吸光分光法による大気圧マイクロ波Ar/O2プラズマのO原子密度計測

岩田悠揮、小笠原知裕、鈴木陽香、堤隆嘉、堀勝、豊田浩孝

C2F6/H2混合ガスを用いてラジカル注入型プラズマ励起化学気相堆積法により成長されたカーボンナノウォールのモフォロジー制御

橋本拓海、近藤博基、石川健治、堤隆嘉、関根誠、平松美根男、堀勝

液中プラズマプロセスを用いたメタノール内金属基板上へのナノグラフェンの成膜

デラヴェガマリアシャンリン、近藤博基、堤隆嘉、グエン ティ・トゥイーンガ、石川健治、関根誠、ヴァスケズマグダレノジュニア、堀勝

カーボンナノウォールの形態と高さが光透過率に及ぼす影響

射場 信太朗、近藤 博基、石川 健治、関根 誠、堤 隆嘉、平松 美根男、堀 勝

C2F6/H2混合ガスを用いてラジカル注入型プラズマ励起化学気相堆積法により成長されたカーボンナノウォールのモフォロジー制御

橋本拓海, 近藤博基, 石川健治, 堤隆嘉, 関根誠, 平松美根男, 堀勝

カーボンナノウォールの形態と高さが光透過率に及ぼす影響

射場 信太朗, 近藤 博基, 石川 健治, 関根 誠, 堤 隆嘉, 平松 美根男, 堀 勝

真空紫外原子吸光分光法による大気圧マイクロ波Ar/O2プラズマのO原子密度計測

岩田悠揮, 小笠原知裕, 鈴木陽香, 堤隆嘉, 堀勝, 豊田浩孝

液中プラズマプロセスを用いたメタノール内金属基板上へのナノグラフェンの成膜

デラヴェガマリアシャンリン, 近藤博基, 堤隆嘉, グエン ティ・トゥイーンガ, 石川健治, 関根誠, ヴァスケズマグダレノジュニア

Optical transmission of carbon nanowalls from ultra-violet region to infra-red region 国際会議

S. Iba, H. Kondo, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hiramatsu, and M. Hori

Material Research Meeting (MRM2021) 

Three-dimensional structural analysis of carbon nanowalls synthesized by a radical-injection plasma-enhanced chemical vapor deposition system 国際会議

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar, Mineo Hiramatsu

Material Research Meeting (MRM2021) 

Optical transmission of carbon nanowalls from ultra-violet region to infra-red region 国際会議

S. Iba, H. Kondo, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hiramatsu, M. Hori

Material Research Meeting (MRM2021) 

Three-dimensional structural analysis of carbon nanowalls synthesized by a radical-injection plasma-enhanced chemical vapor deposition system 国際会議

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar, Mineo Hiramatsu

Material Research Meeting (MRM2021) 

Spatial Distribution Measurement of Atomic Oxygen from Atmospheric-Pressure Microwave Line Plasma by Atomic Absorption Spectroscopy 国際会議

Tomohiro Ogasawara, Yuki Iwata, Haruka Suzuki, Takayoshi Tsutsumi, Masaru Hori and Hirotaka Toyoda

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Comparison of CF4/H2 and HF/H2 Plasmas for Etching of PECVD-Prepared SiN Films 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nga, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Behavior of Hydrogen Atom in Atmospheric Pressure Micro-Hollow Cathode Discharge 国際会議

Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu, Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Behavior of Hydrogen Atom in Atmospheric Pressure Micro-Hollow Cathode Discharge 国際会議

Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu, Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Comparison of CF4/H2 and HF/H2 Plasmas for Etching of PECVD-Prepared SiN Films 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nga, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Spatial Distribution Measurement of Atomic Oxygen from Atmospheric-Pressure Microwave Line Plasma by Atomic Absorption Spectroscopy 国際会議

Tomohiro Ogasawara, Yuki Iwata, Haruka Suzuki, Takayoshi Tsutsumi, Masaru Hori, Hirotaka Toyoda

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12) 

Random forest model for property control of plasma 国際会議

J. Kurokawa, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Selective plasma-enhanced atomic layer etching of SiO using a silane coupling agent 国際会議

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches 国際会議

T. Yoshie, T. Tsutsumi, K. Ishikawa, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Random forest model for property control of plasma 国際会議

J. Kurokawa, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Selective plasma-enhanced atomic layer etching of SiO using a silane coupling agent 国際会議

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches 国際会議

T. Yoshie, T. Tsutsumi, K. Ishikawa, M. Hori

The 42nd International Symposium on Dry Process (DPS2021) 

Control of Interface Layers for Selective Atomic Layer Etching 招待有り 国際会議

Takayoshi Tsutsumi, R. Vervuurt, N. Kobayashi, and Masaru Hori

67th AVS International Symposium and Exhibitio 

Control of Interface Layers for Selective Atomic Layer Etching 招待有り 国際会議

Takayoshi Tsutsumi, R. Vervuur, N. Kobayashi, Masaru Hori

67th AVS International Symposium and Exhibitio 

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動2

吉江 泰斗、堤 隆嘉、石川 健治、堀 勝

第82回　応用物理学会秋季学術講演会 

カーボンナノウォールの光透過率に対する壁密度および高さの効果

射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第82回　応用物理学会秋季学術講演会 

窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測

南 吏玖、石川 健治、堤 隆嘉、近藤 博基、関根 誠、小田 修、堀 勝

第82回　応用物理学会秋季学術講演会 

原子層エッチングの反応素過程とその設計、制御

石川 健治、Nguyen Thi-Thuy-Nga、堤 隆嘉、蕭 世男、近藤 博基、関根 誠、堀 勝

第82回　応用物理学会秋季学術講演会 

螺旋状窒素プラズマ中の窒素原子密度計測

西尾 亮佑、梶田 信、大野 哲靖、田中 宏彦、浅岡 晃次、堤 隆嘉、堀 勝

第82回　応用物理学会秋季学術講演会 

C3H6 / H2プラズマを用いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響

黒川 純平、光成 正、堤 隆嘉、近藤 博基、関根 誠、石川 健治、堀 勝

第82回　応用物理学会秋季学術講演会 

プラズマ誘起欠陥の発生と修復 ～モバイル水素の役割と考察～

布村 正太、坂田 功、堤 隆嘉、堀 勝

第82回　応用物理学会秋季学術講演会 

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動2

吉江 泰斗, 堤 隆嘉, 石川 健治, 堀 勝

第82回 応用物理学会秋季学術講演会 

C3H6 / H2プラズマを用いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響

黒川 純平, 光成 正, 堤 隆嘉, 近藤 博基, 関根 誠, 石川 健治, 堀 勝

第82回 応用物理学会秋季学術講演会 

カーボンナノウォールの光透過率に対する壁密度および高さの効果

射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

第82回 応用物理学会秋季学術講演会 

螺旋状窒素プラズマ中の窒素原子密度計測

西尾 亮佑, 梶田 信, 大野 哲靖, 田中 宏彦, 浅岡 晃次, 堤 隆嘉, 堀 勝

第82回 応用物理学会秋季学術講演会 

窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測

南 吏玖, 石川 健治, 堤 隆嘉, 近藤 博基, 関根 誠, 小田 修, 堀 勝

第82回 応用物理学会秋季学術講演会 

原子層エッチングの反応素過程とその設計、制御

石川 健治, Nguyen Thi-Thuy-Nga, 堤 隆嘉, 蕭 世男, 近藤 博基, 関根 誠, 堀 勝

第82回 応用物理学会秋季学術講演会 

プラズマ誘起欠陥の発生と修復 ～モバイル水素の役割と考察～

布村 正太, 坂田 功, 堤 隆嘉, 堀 勝

第82回 応用物理学会秋季学術講演会 

Development of the nanocarbon coating process on metal surfaces via in-liquid plasma 国際会議

Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Interfinish 2020 World Congress 

Application of Atmospheric Pressure Plasma to Rapid Dry Etching of Polymer Contamination on Floor 国際会議

Y Sakamoto, T Tsutsumi, M Hori

Interfinish 2020 World Congress 

Application of Atmospheric Pressure Plasma to Rapid Dry Etching of Polymer Contamination on Floor 国際会議

Y Sakamoto, T Tsutsumi, M Hori

Interfinish 2020 World Congress 

Development of the nanocarbon coating process on metal surfaces via in-liquid plasma 国際会議

Ma. Shanlene, D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Interfinish 2020 World Congress 

Numerical analysis of effects of applying voltage polarity on atmospheric pressure argon streamer discharge under pin-to-plane electrode geometry 国際会議

Y. Sato, K. Ishikawa, T. Tsutsumi, A. Ui, M. Akita, S. Oka and M. Hori

47th Conference on Plasma Physics 

Numerical analysis of effects of applying voltage polarity on atmospheric pressure argon streamer discharge under pin-to-plane electrode geometry 国際会議

Y. Sato, K. Ishikawa, T. Tsutsumi, A. Ui, M. Akita, S. Oka, M. Hori

47th Conference on Plasma Physics 

塩素吸着による窒化ガリウム原子層エッチングの表面反応の理想と現実

堤 隆嘉, 長谷川 将希, 中村 昭平, 谷出 敦，近藤 博基, 関根 誠, 石川 健治, 堀 勝

第227回　シリコンテクノロジー分科会　研究集会  2021年3月25日 

塩素吸着による窒化ガリウム原子層エッチングの表面反応の理想と現実

堤 隆嘉, 長谷川 将希, 中村 昭平, 谷出 敦, 近藤 博基, 関根 誠, 石川 健治, 堀 勝

第227回 シリコンテクノロジー分科会 研究集会  2021年3月25日 

液中プラズマを用いたナノグラフェン合成における活性種の効果[II]

近藤 博基、濱地 遼、堤 隆嘉、石川 健治、関根 誠、堀 勝

第68回応⽤物理学会春季学術講演会 

塩素吸着を用いた窒化ガリウムの原子層エッチングプロセス特性のArイオンエネルギー依存性

堤 隆嘉、長谷川 将希、中村 昭平、谷出 敦、近藤 博基、関根 誠、石川 健治、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

リモート酸素ラジカルによるグラフェンのエッチング反応の分析

胡 留剛、堤 隆嘉、蕭 世男、近藤 博基、石川 健治、関根 誠、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

マイクロ放電ホローカソードプラズマを用いた真空紫外吸収分光用自己吸収光源の分光診断

竹田 圭吾、堤 隆嘉、平松 美根男、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動

吉江 泰斗、三好 康史、堤 隆嘉、釘宮 克尚、石川 健治、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

プラズマ誘起欠陥の発生と修復 ～少数キャリアライフタイムによる定量評価～

布村 正太、坂田 功、堤 隆嘉、堀 勝

2021年第68回応⽤物理学会春季学術講演会 

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動

吉江 泰斗, 三好 康史, 堤 隆嘉, 釘宮 克尚, 石川 健治, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

プラズマ誘起欠陥の発生と修復 ～少数キャリアライフタイムによる定量評価～

布村 正太, 坂田 功, 堤 隆嘉, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における活性種の効果[II]

近藤 博基, 濱地 遼, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

第68回応⽤物理学会春季学術講演会 

塩素吸着を用いた窒化ガリウムの原子層エッチングプロセス特性のArイオンエネルギー依存性

堤 隆嘉, 長谷川 将希, 中村 昭平, 谷出 敦, 近藤 博基, 関根 誠, 石川 健治, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

リモート酸素ラジカルによるグラフェンのエッチング反応の分析

胡 留剛, 堤 隆嘉, 蕭 世男, 近藤 博基, 石川 健治, 関根 誠, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

マイクロ放電ホローカソードプラズマを用いた真空紫外吸収分光用自己吸収光源の分光診断

竹田 圭吾, 堤 隆嘉, 平松 美根男, 堀 勝

2021年第68回応⽤物理学会春季学術講演会 

Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月9日 

Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 国際会議

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment 国際会議

B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka,T. Gohira, Y. Ohya, N. Ohno and M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer 国際会議

M. Hazumi, S. Selvaraj, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine and M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions 国際会議

Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface 国際会議

S. Selvaraj, M. Hazumi, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching 国際会議

Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Comparison of Nitrogen Atom Densities Measured with VUVAS and Actinometry in Spiral Shape Plasma 国際会議

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region 国際会議

Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori and Hajime Sakakita

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls 国際会議

Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma 国際会議

Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka,Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry 国際会議

Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Comparison of Nitrogen Atom Densities Measured with VUVAS and Actinometry in Spiral Shape Plasma 国際会議

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月9日 

Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions 国際会議

Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls 国際会議

Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry 国際会議

Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer 国際会議

M. Hazumi, S. Selvaraj, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface 国際会議

S. Selvaraj, M. Hazumi, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching 国際会議

Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 国際会議

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region 国際会議

Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Hajime Sakakita

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment 国際会議

B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka, T. Gohira, Y. Ohya, N. Ohno, M. Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma 国際会議

Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka, Kenji Ishikawa, Takayoshi Tsutsumi, Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021）  2021年3月8日 

Etching characteristics of PECVD prepared SiN films with CF4/H2 and CF4/D2 plasmas at different substrate temperatures 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2020 (ISSM2020)  2020年12月15日 

Etching characteristics of PECVD prepared SiN films with CF4/H2 and CF4/D2 plasmas at different substrate temperatures 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2020 (ISSM2020)  2020年12月15日 

Antitumor effect of plasma-activated Ringer’s acetate solution 国際会議

Yuki SudaU, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

2020年12月10日 

Antitumor effect of plasma-activated Ringer’s acetate solution 国際会議

Yuki SudaU, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

2020年12月10日 

Nitrogen Atom Density Measurements from Vacuum Ultraviolet Absorption Spectroscopy and Actinometry in Spiral Shape Plasma 国際会議

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi and Masaru Hori

The 29th International Toki Conference on Plasma and Fusion Research  2020年10月28日 

Time resolved measurements of electron density and temperature by an electrostatic probe with conditional averaging method in pulsed capacitively coupled plasmas 国際会議

S. Hattori, B. B. Sahu, H. Tanaka, T. Tsutsumi, S. Kajita, M. Sekine, M. Hori, N. Ohno

The 29th International Toki Conference on Plasma and Fusion Research  2020年10月28日 

Nitrogen Atom Density Measurements from Vacuum Ultraviolet Absorption Spectroscopy and Actinometry in Spiral Shape Plasma 国際会議

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori

The 29th International Toki Conference on Plasma and Fusion Research  2020年10月28日 

Time resolved measurements of electron density and temperature by an electrostatic probe with conditional averaging method in pulsed capacitively coupled plasmas 国際会議

S. Hattori, B. B. Sahu, H. Tanaka, T. Tsutsumi, S. Kajita, M. Sekine, M. Hori, N. Ohno

The 29th International Toki Conference on Plasma and Fusion Research  2020年10月28日 

Interactions of floating-wire-assisted atmospheric-pressure H2/Ar plasma with SnO2 film on glass substrate forming spherical Sn particles 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference  2020年10月8日 

Penetration of hydrogen atoms and termination of dangling bonds in amorphous carbon films 国際会議

Hiroki Kondo, Yasuyuki Ohashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference  2020年10月9日 

Interactions of floating-wire-assisted atmospheric-pressure H2/Ar plasma with SnO2 film on glass substrate forming spherical Sn particles 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference  2020年10月8日 

Penetration of hydrogen atoms and termination of dangling bonds in amorphous carbon films 国際会議

Hiroki Kondo, Yasuyuki Ohashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference  2020年10月9日 

カーボンナノウォールの局所電気伝導特性の解明

尾崎 敦士、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝

第81回応用物理学会秋季学術講演会 

液中プラズマを用いたナノグラフェン合成における活性種の効果

近藤 博基、濱地 遼、堤 隆嘉、石川 健治、関根 誠、堀 勝

第81回応用物理学会秋季学術講演会 

カーボンナノウォールの局所電気伝導特性の解明

尾崎 敦士, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝

第81回応用物理学会秋季学術講演会 

液中プラズマを用いたナノグラフェン合成における活性種の効果

近藤 博基, 濱地 遼, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

第81回応用物理学会秋季学術講演会 

Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis 国際会議

Masaki Hasagawa‚ Takayoshi Tsutsumi, Atsushi Tanide‚ Shohei Nakamura, Hiroki Kondo‚ Kenji Ishikawa‚ Masaru Hori

20th International Conference on Atomic Layer Deposition  2020年6月29日 

Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis 国際会議

Masaki Hasagawa‚, Takayoshi Tsutsumi, Atsushi Tanide‚, Shohei Nakamura, Hiroki Kondo‚, Kenji Ishikawa‚, Masaru Hori

20th International Conference on Atomic Layer Deposition  2020年6月29日 

プラズマプロセス中の基板温度分布の経時変化の解析

堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝

2020年第67回応用物理学会春季学術講演会 

Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性 (2)

長谷川 将希、堤 隆嘉、谷出 敦、近藤 博基、関根 誠、石川 健治、堀 勝

2020年第67回応用物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における照射時間依存性 [II]

近藤 博基、濱地 遼、 堤 隆嘉,、石川 健治、関根 誠、堀 勝

2020年第67回応用物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における照射時間依存性[Ⅰ]

濱地 遼、近藤 博基、堤 隆嘉、石川 健治、関根 誠、堀 勝

2020年第67回応用物理学会春季学術講演会 

プラズマ誘起欠陥の発生と修復 ～Arイオン照射の効果～

布村 正太、中根 一也、堤 隆嘉、松原 浩司、堀 勝

2020年第67回応用物理学会春季学術講演会 

極低温領域におけるCHF3ガス凝縮層を用いたエッチングプロセスの研究

羽澄 匡広, スガンサマラー セルヴァラジ, 蕭 世男, 関根 誠, 林 久貴, 佐々木 俊行, 阿部 知央, 堤 隆嘉, 石川 健治, 堀 勝

2020年第67回応用物理学会春季学術講演会 

プラズマ表面処理が自己集積化膜の分子配向に及ぼす影響

織田 祥成、堤 隆嘉、石川 健治、堀 勝

2020年第67回応用物理学会春季学術講演会 

Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性 (2)

長谷川 将希, 堤 隆嘉, 谷出 敦, 近藤 博基, 関根 誠, 石川 健治, 堀 勝

2020年第67回応用物理学会春季学術講演会 

プラズマプロセス中の基板温度分布の経時変化の解析

堤 隆嘉, 石川 健治, 近藤 博基, 関根 誠, 堀 勝

2020年第67回応用物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における照射時間依存性[Ⅰ]

濱地 遼, 近藤 博基, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

2020年第67回応用物理学会春季学術講演会 

液中プラズマを用いたナノグラフェン合成における照射時間依存性 [II]

近藤 博基, 濱地 遼, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝

2020年第67回応用物理学会春季学術講演会 

極低温領域におけるCHF3ガス凝縮層を用いたエッチングプロセスの研究

羽澄 匡広, スガンサマラー セルヴァラジ, 蕭 世男, 関根 誠, 林 久貴, 佐々木 俊行, 阿部 知央, 堤 隆嘉, 石川 健治, 堀 勝

2020年第67回応用物理学会春季学術講演会 

プラズマ誘起欠陥の発生と修復 ～Arイオン照射の効果～

布村 正太, 中根 一也, 堤 隆嘉, 松原 浩司, 堀 勝

2020年第67回応用物理学会春季学術講演会 

プラズマ表面処理が自己集積化膜の分子配向に及ぼす影響

織田 祥成, 堤 隆嘉, 石川 健治, 堀 勝

2020年第67回応用物理学会春季学術講演会 

Termination of Dangling Bonds in Amorphous Carbon Films by Hydrogen Atoms 国際会議

Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Formation of Spherical Sn Particles from SnO2 Film by Atmospheric-Pressure Plasma 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Etching Process Using CHF3 Gas Condensed Layer in Cryogenic Region 国際会議

Masahiro Hazumi, Suganthamalar Selvaraj, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Influence of Temperature on Etch Rate of SiN Films with CF4/H2 Plasma 国際会議

Shin-Nan Hsiao, Kazuya Nakane, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Measurement of Spatial Distribution of Absolute Hydrogen Radical Density in Non Equilibrium Atmospheric Pressure Plasma by Vacuum Ultraviolet Absorption Spectroscopy 国際会議

Kaede Katsuno, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Self-Absorbing Effect of Micro-Discharge Hollow Cathode Plasma as Light Source for Vacuum Ultraviolet Absorption Spectroscopy 国際会議

Sho Shimizu, Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Generation of Repulsing Glow Discharge in Centimeter Order Air Gaps 国際会議

Vladislav Gamaleev, Takayoshi Tsutsumi and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

In-Liquid Plasma Synthesis of Iron-Nitrogen-Doped Carbon Nanoflakes with Highly Catalytic Activity 国際会議

Ryo Hamaji, Tomoki Amano, Hiroki Kondo, Takayoshi Tsutsumi, 1Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Mineo Hiramatsu and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Fluctuation of Local Electrical Conductivity in Carbon Nanowalls Observed by Conductive Atomic Force Microscopy 国際会議

Atsushi Ozaki, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Etching Process Using CHF3 Gas Condensed Layer in Cryogenic Region 国際会議

Masahiro Hazumi, Suganthamalar Selvaraj, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Generation of Repulsing Glow Discharge in Centimeter Order Air Gaps 国際会議

Vladislav Gamaleev, Takayoshi Tsutsumi, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Formation of Spherical Sn Particles from SnO2 Film by Atmospheric-Pressure Plasma 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Fluctuation of Local Electrical Conductivity in Carbon Nanowalls Observed by Conductive Atomic Force Microscopy 国際会議

Atsushi Ozaki, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

In-Liquid Plasma Synthesis of Iron-Nitrogen-Doped Carbon Nanoflakes with Highly Catalytic Activity 国際会議

Ryo Hamaji, Tomoki Amano, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Mineo Hiramatsu, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Termination of Dangling Bonds in Amorphous Carbon Films by Hydrogen Atoms 国際会議

Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Self-Absorbing Effect of Micro-Discharge Hollow Cathode Plasma as Light Source for Vacuum Ultraviolet Absorption Spectroscopy 国際会議

Sho Shimizu, Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Measurement of Spatial Distribution of Absolute Hydrogen Radical Density in Non Equilibrium Atmospheric Pressure Plasma by Vacuum Ultraviolet Absorption Spectroscopy 国際会議

Kaede Katsuno, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Influence of Temperature on Etch Rate of SiN Films with CF4/H2 Plasma 国際会議

Shin-Nan Hsiao, Kazuya Nakane, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020) 

Analysis and Control of Surface Reaction in Plasma Enhanced Atomic Layer Etching Processes 招待有り 国際会議

Takayoshi Tsutsumi

7th Korea-Japan Joint Symposium on Advanced Solar Cells 2020 4th International Symposium on Energy Research and Application 

In-plane distribution of electrical conductivity of carbon nanowalls perpendicular to substrate measured by conductive atomic force microscopy 国際会議

Atsushi Ozaki, Hiroki Kondo, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori, Mineo Hiramatsu

7th Korea-Japan Joint Symposium on Advanced Solar Cells 2020 4th International Symposium on Energy Research and Application 

Improvement of wool surface charging properties by plasma surface modification process 国際会議

T. Moriyama, T. Tsutsumi, H. Kondo, M. Sekine, K. Ishikawa, and M. Hori

7th Korea-Japan Joint Symposium on Advanced Solar Cells 2020 4th International Symposium on Energy Research and Application 

Nano-scale pattern formation of organic material with precisely wafer-temperature-controlled plasma etch system 国際会議

Yusuke Fukunaga, Makoto Sekine, Takayoshi Tsutsumi, Hiroki Kondo, Kenji Ishikawa, and Masaru Hori

The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11)  

Synthesis and crystallinity of nanographene using in-liquid plasma of ethanol 国際会議

Ryo Hamaji, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Mineo Hiramatsu, and Masaru Hori

MATERIALS RESEARCH MEETING 2019 

Modification of lipid metabolism in Coccomyxa sp. treated by non-equilibrium atmosphere pressure plasma 国際会議

Takumi Kato, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

MATERIALS RESEARCH MEETING 2019 

Changes of resistive elements during degradation of carbon nanowalls electrodes for fuel cell synthesized employing a CH4/H2 mixture gas plasma 招待有り 国際会議

Hiroki Kondo, Shun Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

MATERIALS RESEARCH MEETING 2019 

Atomic hydrogen exposures of radical-injection CH4/H2 plasma-enhanced chemical vapor deposited amorphous carbon films 国際会議

Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

MATERIALS RESEARCH MEETING 2019 

In-situ analyses of GaN surfaces irradiated by a Cl2 plasma for atomic layer etching 招待有り

Masaki Hasegawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Hiroki Kondo, Atsushi Tanide, and Masaru Hori

第16回　赤﨑記念研究センターシンポジウム 第21回　CIRFEセミナー「窒化物半導体研究の新展開：新規デバイスの創出をめざして」 

Surface functionalization of wool fabrics using plasma process 国際会議

T. Moriyama, T. Tsutsumi, H. Kondo, M. Sekine, K. Ishikawa, and M. Hori

29th Annual Meeting of MRS-Japan 2019  

Electrical, optical, and physicochemical behaviors of atmospheric pressure plasma jet generated in open air 招待有り 国際会議

Keigo Takeda, Kenji Ishikawa, Takayuki Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

3rd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2019) 

Time-resolved diagnosis of afterglow phase in synchro-bias of negative direct current on pulsed plasmas 国際会議

K. Nakane, T. Tsutsumi, S.-N. Hsiao, K. Ishikawa, M. Sekine, T. Gohira, Y. Ohya, M. Hori

The 41st International Symposium on Dry Process (DPS2019) 

ALE of SiC by Plasma Modification and F-radical Etching Studied by in-situ Surface Spectroscopy 国際会議

R. H. J. Vervuurt, K. Nakane, T. Tsutsumi, M. Hori, N. Kobayashi

The 41st International Symposium on Dry Process (DPS2019) 

Etching characteristics of silicon nitride film in plasma of fluoroethane (CH2FCHF2), Ar, and O2 mixture 国際会議

J. Ni, S.-N. Hsiao, T. Hayashi, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori

The 41st International Symposium on Dry Process (DPS2019) 

Suppression of etch pit formation in GaN etching using H2-added Cl2 plasma at 400°C 国際会議

T. Omichi, A. Tanide, K. Ishikawa, T. Tsutsumi, H. Kondo, M. Sekine, M. Hor

The 41st International Symposium on Dry Process (DPS2019) 

Effects of functional groups in raw material molecules on synthesis rate and structures of nanographene materials synthesized by in-liquid plasma using alcohols 国際会議

H. Kondo, A. Ando, T. Tsutsumi, K. Takeda, T. Ohta, K. Ishikawa, M. Sekine, M. Ito, M. Hiramatsu, M. Hori

The 41st International Symposium on Dry Process (DPS2019) 

Plasma Processing with Feedback Control of Wafer Temperature By Non-Contact Temperature Measurement System 招待有り 国際会議

T. Tsutsumi, H. Kondo, K. Ishikawa , K. Takeda, T. Ohta, M. Sekine, M. Ito, and M. Hori

236th ECS meeting 

High-aspect-ratio organic-pattern formation with self-limiting manner by controlling plasma process based on substrate temperature measurement. 国際会議

Makoto Sekine,Yusuke Fukunaga,Takayoshi Tsutsumi,Kenji Ishikawa,Hiroki Kondo,Masaru Hori

The 72nd Annual Gaseous Electronics Conference