Updated on 2024/04/15

写真a

 
HARADA Shunta
 
Organization
Institute of Materials and Systems for Sustainability Center for Integrated Research of Future Electronics Innovative Devices Section Associate professor
Graduate School
Graduate School of Engineering
Title
Associate professor
Contact information
メールアドレス
Profile
結晶欠陥の研究を軸に、製造プロセスや材料計測の高度化、ピコスケールの構造制御(ピコテクノロジー)に立脚した、熱振動の干渉を利用したコヒーレント熱伝導制御、パワーデバイス劣化抑制の研究を行っています。
「スペクトル超解像による分光分析の高度化」についてはこちらのwebサイトをご覧ください。→ https://spectralsr.com/
External link

Degree 1

  1. 博士(工学) ( 2011.3   京都大学 ) 

Research Interests 11

  1. パワー半導体

  2. 原子構造制御

  3. 熱伝導

  4. 結晶成長

  5. 結晶欠陥

  6. 製造プロセスへの機械学習応用

  7. 熱伝導

  8. 結晶欠陥

  9. 結晶成長

  10. 機械学習

  11. スペクトル超解像

Research Areas 3

  1. Nanotechnology/Materials / Structural materials and functional materials  / 結晶欠陥制御

  2. Nanotechnology/Materials / Crystal engineering  / 結晶成長、結晶評価

  3. Nanotechnology/Materials / Metals production and resources production  / 材料製造プロセス

Current Research Project and SDGs 5

  1. ピコスケール構造制御による新奇熱輸送制御

  2. スペクトル超解像による分光分析の高精度化

  3. パワーデバイスSiC結晶の欠陥制御によるデバイス信頼性の向上

  4. 計測技術と数理解析技術の連動による半導体検査の高度化

  5. in-situ観察による材料製造の高効率化・自動化技術の開発

Research History 12

  1. Nagoya University   Institute of Materials and Systems for Sustainability Center for Integrated Reserch of Future Electronics   Associate professor

    2020.6

  2. Japan Science and Technology Agency

    2018.10 - 2022.3

  3. Nagoya University   Institute of Materials and Systems for Sustainability Center for Integrated Research of Future Electronics Innovative Devices Section   Lecturer

    2017.4 - 2020.5

  4. Nagoya University   Lecturer

    2017.4 - 2020.5

  5. Nagoya University   Institute of Materials and Systems for Sustainability Center for Integrated Research of Future Electronics Innovative Devices Section   Assistant Professor

    2015.10 - 2017.3

  6. Nagoya University   Assistant Professor

    2015.10 - 2017.3

  7. Nagoya University   Green Mobility Collaborative Research Center Green Mobility Collaborative Research Center   Assistant Professor

    2014.4 - 2015.9

  8. Nagoya University   Assistant Professor

    2014.4 - 2015.9

  9. Nagoya University   Assistant Professor

    2011.4 - 2014.4

  10. Nagoya University   Graduate School of Engineering Department of Materials,Physics and Energy Engineering Advanced Material Process Engineering   Assistant Professor

    2011.4 - 2014.3

  11. Kyoto University   Researcher

    2008.4 - 2011.3

  12. Kyoto University   Researcher

    2008.4 - 2011.3

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Education 2

  1. Kyoto University

    2006.4 - 2011.3

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    Country: Japan

  2. Kyoto University   Faculty of Engineering

    2002.4 - 2006.3

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    Country: Japan

Professional Memberships 6

  1. 応用物理学会   会員

    2011.7

  2. 日本結晶成長学会   会員

    2011.11

  3. The Japan institute of metals

    2005.11

  4. 日本結晶成長学会

  5. The Japan institute of metals

  6. 応用物理学会

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Committee Memberships 16

  1. 応用物理学会 先進パワー半導体分科会   幹事  

    2016.4   

  2. 応用物理学会インフォマティクス応用研究グループ   幹事  

    2020.4   

  3. ICSCRM組織委員会   委員  

    2020.12   

  4. SSDM2017 論文委員会   Area 14 vice-chair  

    2017.1 - 2017.12   

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    Committee type:Academic society

  5. SSDM2017 論文委員会   Area 14 vice-chair  

    2017.1 - 2017.12   

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    Committee type:Academic society

  6. 応用物理学会 先進パワー半導体分科会   幹事  

    2016.4   

  7. SSDM2016 論文委員会   編集委員  

    2016.1 - 2016.12   

  8. SSDM2016 論文委員会   編集委員  

    2016.1 - 2016.12   

  9. ICCGE-18 現地実行委員会   実行委員  

    2015.9 - 2016.12   

  10. ICCGE-18 現地実行委員会   実行委員  

    2015.9 - 2016.12   

  11. SSDM2015 論文委員会   編集委員  

    2015.1 - 2015.12   

  12. ISPlasma2015 / IC-PLANTS2015   現地実行委員  

    2015.1 - 2015.12   

  13. SSDM2015 論文委員会   編集委員  

    2015.1 - 2015.12   

  14. ISPlasma2015 / IC-PLANTS2015   現地実行委員  

    2015.1 - 2015.12   

  15. SSDM2014 論文委員会   委員  

    2014.1 - 2014.12   

  16. SSDM2014 論文委員会   委員  

    2014.1 - 2014.12   

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Awards 14

  1. Young Researcher Award

    2022.9   DRIP XIX Executive Committee   Identifying edge-component Burgers vector of threading dislocations in SiC crystals by birefringence imaging

    Shunta Harada, Kenta Murayama

  2. 2022年春季講演大会 第38回ポスターセッション 優秀ポスター賞

    2022.3   日本金属学会   Cr添加酸化チタンにおける面欠陥不規則配列の形成

    位田 麻衣, 杉本 峻也, 服部 泰河, 田川 美穂, 宇治原, 徹, 原田 俊太

  3. 優秀ポスター賞

    2021.7   第5回フォノンエンジニアリング研究会   Control of an Ordered Arrangement of Coherent Interfaces to Phoons in Titanium-Chromium Oxide Natural Superlattices

    杉本 峻也, 原田俊太

  4. 第14回奨励賞

    2016   日本結晶成長学会  

  5. 第14回奨励賞

    2016   1. 日本結晶成長学会  

  6. ISPlasma2015 / IC-PLANTS2015 Best presentation award

    2015.3   ISPlasma2015 / IC-PLANTS2015  

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    Country:Japan

  7. 愛知県若手研究者イノベーション創出奨励事業第9回「わかしゃち奨励賞」最優秀賞

    2015.1   愛知県  

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    Country:Japan

  8. 愛知県若手研究者イノベーション創出奨励事業第9回「わかしゃち奨励賞」最優秀賞

    2015.1   愛知県  

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    Country:Japan

  9. Award for Encouragement of Research in IUMRS-ICA2014

    2014.10   MRS-J  

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    Country:Japan

  10. Award for Encouragement of Research in IUMRS-ICA2014

    2014.10   MRS-J  

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    Country:Japan

  11. 2010 International Metallographic Contest (IMC) class 3 (Transmission and Analytical), Third place

    2010.8   The International Metallographic Society  

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    Country:United States

  12. 2010 International Metallographic Contest (IMC) class 3 (Transmission and Analytical), Third place

    2010.8   The International Metallographic Society  

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    Country:United States

  13. 第60回日本金属学会金属組織写真賞優秀賞

    2010.3   日本金属学会  

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    Country:Japan

  14. 第60回日本金属学会金属組織写真賞優秀賞

    2010.3   日本金属学会  

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    Country:Japan

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Papers 195

  1. Effects of proton implantation into 4H-SiC substrate: Stacking faults in epilayer on the substrate Reviewed

    Masashi Kato, Ohga Watanabe, Shunta Harada, Hitoshi Sakane

    Materials Science in Semiconductor Processing   Vol. 175   page: 108264 - 108264   2024.6

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Elsevier BV  

    DOI: 10.1016/j.mssp.2024.108264

    Scopus

  2. Analysis of Macrostep Interaction via Carbon Diffusion Field in SiC Solution Growth Reviewed

    Yuki Nakanishi, Kentaro Kutsukake, Yifan Dang, Shunta Harada, Miho Tagawa, Toru Ujihara

    Journal of Crystal Growth   Vol. 631   page: 127609 - 127609   2024.4

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Elsevier BV  

    DOI: 10.1016/j.jcrysgro.2024.127609

    Web of Science

    Scopus

  3. Accelerating X-ray photoemission spectroscopy measurements using Bayesian super-resolution

    Harada, S; Tsujimori, K; Nomoto, T; Ito, T

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 63 ( 4 )   2024.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ad3140

    Web of Science

  4. Effects of proton implantation for expansion of basal plane dislocations in SiC toward suppression of bipolar degradation: review and perspective Reviewed

    Masashi Kato, Shunta Harada, Hitoshi Sakane

    Japanese Journal of Applied Physics   Vol. 63 ( 2 ) page: 020804 - 020804   2024.2

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:IOP Publishing  

    Abstract

    Silicon carbide (SiC) is widely used in power semiconductor devices; however, basal plane dislocations (BPDs) degrade device performance, through a mechanism called bipolar degradation. Recently, we proposed that proton implantation could suppress BPD expansion by reducing BPD mobility. We considered three potential mechanisms: the hydrogen presence around BPDs, point defects induced by implantation, and carrier lifetime reduction. In this study, we discuss the mechanisms of proton implantation and its applicability to SiC power device production.

    DOI: 10.35848/1347-4065/ad1779

    Web of Science

    Other Link: https://iopscience.iop.org/article/10.35848/1347-4065/ad1779/pdf

  5. Effect of Solution Components on Solvent Inclusion in SiC Solution Growth Reviewed

    Huiqin Zhou, Hitoshi Miura, Yuma Fukami, Yifan Dang, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    Crystal Growth & Design   Vol. 24 ( 4 ) page: 1806 - 1817   2024.2

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:American Chemical Society (ACS)  

    DOI: 10.1021/acs.cgd.3c01476

    Web of Science

    Scopus

  6. DNA修飾ナノ粒子の結晶化とX線小角散乱による構造解析

    田川 美穂, 張 力東, 小島 憧子, 鷲見 隼人, 横森 真麻, 太田 昇, 関口 博史, 原田 俊太, 宇治原 徹

    日本結晶学会誌   Vol. 65 ( Supplement ) page: s19 - s19   2023.10

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    Language:Japanese   Publishing type:Research paper (scientific journal)   Publisher:日本結晶学会  

    DOI: 10.5940/jcrsj.65.s19

    CiNii Research

  7. Non-destructive identification of edge-component burgers vector of threading dislocations in SiC wafers by birefringence imaging Reviewed

    Shunta Harada, Yasutaka Matsubara, Kenta Murayama

    Diamond and Related Materials   Vol. 138   2023.10

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    Non-destructive characterization of crystalline defects in SiC wafers is important for manufacturing high-performance SiC power devices with high productivity. The present study shows that the edge component of the Burgers vector can be identified by birefringence imaging under conditions deviating slightly from the crossed-Nicols condition and by calculation of the in-plane shear stress distribution. It is also found that the combination of birefringence observation and X-ray topography allows the discrimination of the family of threading screw dislocations. The present results will further the understanding of the relationship between defect structure and the properties of SiC power devices.

    DOI: 10.1016/j.diamond.2023.110192

    Web of Science

    Scopus

  8. Machine learning for semiconductor process simulation described by coupled partial differential equations Reviewed

    Rikuya Sato, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    Advanced theory and simulations   Vol. 6 ( 9 )   2023.9

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/adts.202300218

    Web of Science

    Scopus

  9. Numerical Modeling of the Cellular Structure Formation Process in SiC Solution Growth for Suppression of Solvent Inclusions Reviewed

    Huiqin Zhou, Hitoshi Miura, Yifan Dang, Yuma Fukami, Hisaki Takemoto, Shunta Harada, Miho Tagawa, Toru Ujihara

    CRYSTAL GROWTH & DESIGN   Vol. 23 ( 5 ) page: 3393 - 3401   2023.5

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER CHEMICAL SOC  

    For the solution growth of silicon carbide, solvent inclusions are significant technological issues, and methods to suppress the formation of solvent inclusions are investigated in this study. Experimental observations show that solvent inclusions are formed behind the cellular structures. A phase field model is used to reproduce the formation process of cellular structures and solvent inclusions. Simulation results indicate that slight perturbations of the step front can convert into cellular structures in the case of insufficient supply of carbon, and the overdeveloped cellular structures consequently result in solvent inclusions. Accordingly, several schemes can be suggested by the simulation model to suppress the formation of cellular structures by enhancing the carbon supply. By increasing the carbon diffusion coefficient, cellular structures can be suppressed. Moreover, the step height and the solution flow direction also play an important role in suppressing the cellular structures. This study provides a comprehensive understanding of the formation process of cellular structures and solvent inclusions. A growth process with a high diffusion coefficient and opposite solution flow to the step flow direction was proposed to suppress the formation of cellular structures. The proposed numerical model could be applied in other solution crystal growth methods.

    DOI: 10.1021/acs.cgd.2c01512

    Web of Science

    Scopus

  10. Development of High-Resolution Nuclear Emulsion Plates for Synchrotron X-Ray Topography Observation of Large-Size Semiconductor Wafers Reviewed

    Shunta Harada, Taketo Nishigaki, Nobuko Kitagawa, Kotaro Ishiji, Kenji Hanada, Atsushi Tanaka, Kunihiro Morishima

    Journal of Electronic Materials   Vol. 52 ( 5 ) page: 2951 - 2956   2023.5

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    Characterization of defects in semiconductor wafers is essential for the development and improvement of semiconductor devices, especially power devices. X-ray topography (XRT) using synchrotron radiation is a powerful methods used for defect characterization. To achieve detailed characterization of large-size semiconductor wafers by synchrotron XRT, we have developed nuclear emulsion plates reaching a high-resolution and wide dynamic range. We have shown that higher-resolution XRT images could be obtained using emulsions with smaller iodobromide crystals, and demonstrated clear observation of threading edge dislocations in a SiC epitaxial layer having small contrast. Furthermore, we demonstrated XRT image acquisition for almost all of a 150-mm SiC wafer with one plate. Our development will contribute to advances in electronic materials, especially in the field of power electronics, in which defect characterization is important for improving the performance and yield of devices.

    DOI: 10.1007/s11664-023-10270-8

    Web of Science

    Scopus

  11. Fluorescence Turn-on of Tetraphenylethylene Derivative by Transfer from Cyclodextrin to Liposomes, HeLa Cells, and E. coli

    Masuda K., Omokawa R., Kawasaki R., Mise Y., Ooyama Y., Harada S., Shinoda W., Ikeda A.

    Chemistry - A European Journal   Vol. 29 ( 10 )   2023.2

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Chemistry - A European Journal  

    Herein, trimethyl-β-cyclodextrin (TMe-β-CDx) and γ-cyclodextrin (γ-CDx) could dissolve a tetraphenylethylene derivative (TPE−OH4) in water through high-speed vibration milling. The fluorescence intensity of the TMe-β-CDx−TPE−OH4 complex was much higher than that of the γ-CDx−TPE−OH4 complex, as the rotation of the central C=C double bond of TPE−OH4 after photoactivation was inhibited in a smaller TMe-β-CDx cavity in comparison with the γ-CDx cavity. In contrast, the fluorescence intensity of the γ-CDx−TPE−OH4 complex was very weak; nevertheless, it increased after the addition of liposomes due to the transfer of TPE−OH4 from the γ-CDx cavity to the lipid membrane as a “turn-on” phenomenon. Furthermore, to apply temperature sensor, it was demonstrated that the fluorescence intensity in the liposomes depended on the phase-transition temperature. By using the fluorescence turn-on phenomenon, TPE−OH4 could detect the presence of HeLa cells and E. coli by fluorescence.

    DOI: 10.1002/chem.202203071

    Scopus

  12. Fluorescence Turn-on of Tetraphenylethylene Derivative by Transfer from Cyclodextrin to Liposomes, HeLa Cells, and <i>E</i>. <i>coli</i>

    Masuda, K; Omokawa, R; Kawasaki, R; Mise, Y; Ooyama, Y; Harada, S; Shinoda, W; Ikeda, A

    CHEMISTRY-A EUROPEAN JOURNAL   Vol. 29 ( 10 )   2023.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/chem.202203071

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    PubMed

  13. Thermal conduction in titanium-chromium oxide natural superlattices with an ordered arrangement of nearly pristine interfaces Reviewed

    Shunya Sugimoto, Gareoung Kim, Tsunehiro Takeuchi, Miho Tagawa, Toru Ujihara, Shunta Harada

    Journal of Alloys and Compounds   Vol. 934   page: 167915   2023.2

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    Thermal conduction was investigated in titanium-chromium oxide natural superlattices with an ordered arrangement of crystallographic shear planes, which were nearly pristine interfaces for thermal phonons. Thermal conductivity exhibited a clear maximum value at around 50 K, which indicates interface roughness as small as 20 pm based on the calculation of thermal conductivity by a modified Debye-Callaway model. With an ordered arrangement of nearly pristine interfaces at nanoscale, the wave contribution to phonon transport was estimated to be predominant at lower temperatures (less than 100 K) and as much as 30 % even at room temperature. We found that the interface roughness greatly influences the thermal conduction in natural superlattice systems, which may lead to variations in the reported value of thermal conductivity. We have demonstrated that the wave contribution of thermal conductivity become apparent in bulk crystal having nano scale periodic structure with pristine interfaces.

    DOI: 10.1016/j.jallcom.2022.167915

    Web of Science

    Scopus

  14. Suppression of partial dislocation glide motion during contraction of stacking faults in SiC epitaxial layers by hydrogen ion implantation Reviewed

    Shunta Harada, Hitoshi Sakane, Toshiki Mii, Masashi Kato

    APPLIED PHYSICS EXPRESS   Vol. 16 ( 2 ) page: 021001   2023.2

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:IOP Publishing Ltd  

    Bipolar degradation in SiC bipolar devices, in which stacking faults (SFs) expand to accommodate the movement of partial dislocations during forward bias application, is one of the critical problems impeding the widespread implementation of SiC power devices. Here we clearly demonstrate that the movement of partial dislocations can be suppressed by proton implantation, which has good compatibility with semiconductor processing, through investigation of the contraction behavior of SFs in SiC epitaxial layers subjected to proton implantation.

    DOI: 10.35848/1882-0786/acb585

    Web of Science

    Scopus

  15. Modeling-Based Design of the Control Pattern for Uniform Macrostep Morphology in Solution Growth of SiC Reviewed

    Yifan Dang, Xinbo Liu, Can Zhu, Yuma Fukami, Shuyang Ma, Huiqin Zhou, Xin Liu, Kentaro Kutsukake, Shunta Harada, Toru Ujihara

    Crystal Growth and Design   Vol. 23 ( 2 ) page: 1023 - 1032   2023.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    In the solution growth of the SiC crystal, macrosteps with sufficient height on an off-axis substrate are required to reduce defects and achieve a high-quality grown layer. However, over-developed macrosteps can induce new defects and adversely affect the crystal quality. To better understand and control the behavior of macrosteps corresponding to the control parameters of the growth system, a simulation method that consists of a global two-dimensional computational fluid dynamic (CFD) model, a local three-dimensional CFD model near the growth front, and a kinetics model that describes the movement of macrosteps on the crystal surface is proposed. The simulation method is first applied to investigate the effect of the crystal rotation speed on macrostep morphology. Although the results indicate that a higher crystal rotation speed results in less step bunching, constantly rotating the crystal in one direction is demonstrated to be incapable of yielding a uniform macrostep distribution on the whole surface. Accordingly, a sophisticated control pattern is designed by periodically switching the flow direction underneath the crystal surface, where the proposed simulation method is critical to determine detailed control-parameter values. When the control pattern suggested by the simulation is used, a grown crystal with a uniform macrostep morphology and ideal step height on the whole surface is obtained in the practical experiment.

    DOI: 10.1021/acs.cgd.2c01194

    Web of Science

    Scopus

  16. Fluorescence Turn-on of Tetraphenylethylene Derivative by Transfer from Cyclodextrin to Liposomes, HeLa Cells, and <i>E. coli</i>

    Masuda, K; Omokawa, R; Kawasaki, R; Mise, Y; Ooyama, Y; Harada, S; Shinoda, W; Ikeda, A

    CHEMISTRY-A EUROPEAN JOURNAL     2023.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/chem.202203071

    Web of Science

    PubMed

  17. Analysis of carrier lifetime in a drift layer of 1.2-kV class 4H–SiC devices toward complete suppression of bipolar degradation Reviewed

    Toshiki Mii, Hitoshi Sakane, Shunta Harada, Masashi Kato

    Materials Science in Semiconductor Processing   Vol. 153   page: 107126   2023.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    We analyzed the carrier lifetime in a drift layer of 1.2 kV-class SiC p-n diodes to suppress bipolar degradation. According to the device simulation results, the required carrier lifetime in the drift layer was estimated to be shorter than 10 ns with a current density of 300 A/cm2 if the threshold hole density for the expansion of the stacking fault at the interface of the drift layer and substrate was 2 × 1016 cm−3. Numerical analysis revealed that to ensure a carrier lifetime shorter than 10 ns, the 1/e2 lifetime obtained by microwave photoconductivity decay (μ-PCD) measurements should be shorter than 7.2 ns. Experimental μ-PCD measurements showed that 1/e2 lifetimes obtained from the as-received epiwafer were much longer than 7.2 ns, and even after H+ implantation, high-temperature annealing, or electron irradiation, 1/e2 lifetimes were still long. Therefore, carrier lifetime control in the drift layer is not sufficient to suppress bipolar degradation, and a combination of carrier lifetime control with other methods is necessary for the fabrication of 1.2 kV-class SiC p-n diodes for the complete suppression of bipolar degradation at a current capacity of 300 A/cm2.

    DOI: 10.1016/j.mssp.2022.107126

    Web of Science

    Scopus

  18. Prediction of operating dynamics in floating-zone crystal growth using Gaussian mixture model Reviewed

    R. Omae, S. Sumitani, Y. Tosa, S. Harada

    Science and Technology of Advanced Materials: Methods   Vol. 2 ( 1 ) page: 294 - 301   2022.12

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    Authorship:Last author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Informa UK Limited  

    DOI: 10.1080/27660400.2022.2107884

  19. Analysis of Phonon Dispersion of Rutile-type Titanium Oxides Reviewed

    Harada Shunta, Kosaka Naoki, Tsutsui Satoshi, Tanaka Katsushi, Tagawa Miho, Ujihara Toru

    SPring-8/SACLA Research Report   Vol. 10 ( 6 ) page: 521 - 523   2022.12

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    Authorship:Lead author, Corresponding author   Language:Japanese   Publishing type:Research paper (scientific journal)   Publisher:Japan Synchrotron Radiation Research Institute  

    DOI: 10.18957/rr.10.6.521

    CiNii Research

  20. Suppression of stacking-fault expansion in 4H-SiC PiN diodes using proton implantation to solve bipolar degradation Reviewed

    Masashi Kato, Ohga Watanabe, Toshiki Mii, Hitoshi Sakane, Shunta Harada

    Scientific Reports   Vol. 12 ( 1 ) page: 18790   2022.11

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    Authorship:Last author   Language:English   Publishing type:Research paper (scientific journal)  

    4H-SiC has been commercialized as a material for power semiconductor devices. However, the long-term reliability of 4H-SiC devices is a barrier to their widespread application, and the most important reliability issue in 4H-SiC devices is bipolar degradation. This degradation is caused by the expansion of single Shockley stacking-faults (1SSFs) from basal plane dislocations in the 4H-SiC crystal. Here, we present a method for suppressing the 1SSF expansion by proton implantation on a 4H-SiC epitaxial wafer. PiN diodes fabricated on a proton-implanted wafer show current–voltage characteristics similar to those of PiN diodes without proton implantation. In contrast, the expansion of 1SSFs is effectively suppressed in PiN diodes with proton implantation. Therefore, proton implantation into 4H-SiC epitaxial wafers is an effective method for suppressing bipolar degradation in 4H-SiC power-semiconductor devices while maintaining device performance. This result contributes to the development of highly reliable 4H-SiC devices.

    DOI: 10.1038/s41598-022-23691-y

    Web of Science

    Scopus

    PubMed

  21. Optimization of Flow Distribution by Topological Description and Machine Learning in Solution Growth of SiC Reviewed

    Masaru Isono, Shunta Harada, Kentaro Kutsukake, Tomoo Yokoyama, Miho Tagawa, Toru Ujihara

    Advanced Theory and Simulations   Vol. 5 ( 9 ) page: 2200302   2022.9

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    Authorship:Corresponding author   Language:English   Publishing type:Research paper (scientific journal)  

    The macroscopic distribution of fluid flows, which affect the quality of final products for various kinds of materials, is often difficult to describe in mathematical formulae and hinders the implementation of empirical knowledge in scaling up. In the present study, the characteristics of the flow distribution in silicon carbide (SiC) solution growth are described by using the position of the saddle point and the solution growth conditions are optimized by computational fluid dynamics simulation, machine learning, and a genetic algorithm. As a result, the candidates of the optimal condition for the solution growth of 6-in. SiC crystals are successfully obtained from the empirical knowledge gained from 3-in. crystal growth, by adding the topological description to the objective function. The present design of the objective function using the topological description can possibly be applied to other crystal growth or materials processing problems and to overcome scale-up difficulties, which can facilitate the rapid development of functional materials such as SiC wafers for power device applications.

    DOI: 10.1002/adts.202200302

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  22. A Transfer Learning-Based Method for Facilitating the Prediction of Unsteady Crystal Growth Reviewed

    Yifan Dang, Kentaro Kutsukake, Xin Liu, Yoshiki Inoue, Xinbo Liu, Shota Seki, Can Zhu, Shunta Harada, Miho Tagawa, Toru Ujihara

    Advanced Theory and Simulations   Vol. 5 ( 9 ) page: 2200204   2022.9

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    Real-time prediction and dynamic control systems that can adapt to an unsteady environment are necessary for material fabrication processes, especially crystal growth. Recent studies have demonstrated the effectiveness of machine learning in predicting an unsteady crystal growth process, but its wider application is hindered by the large amount of training data required for sufficient accuracy. To address this problem, this study investigates the capability of transfer learning to predict geometric evolution in an unsteady silicon carbide (SiC) solution growth system based on a small amount of data. The performance of transferred models is discussed regarding the effect of the transfer learning method, training data amount, and time step length. The transfer learning strategy yields the same accuracy as that of training from scratch but requires only 20% of the training data. The accuracy is stably inherited through successive time steps, which demonstrates the effectiveness of transfer learning in reducing the required amount of training data for predicting evolution in an unsteady crystal growth process. Moreover, the transferred models trained with relatively more data (no more than 100%) further improve the accuracy inherited from the source model through multiple time steps, which broadens the application scope of transfer learning.

    DOI: 10.1002/adts.202200204

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  23. Suppression of stacking fault expansion in a 4H-SiC epitaxial layer by proton irradiation Reviewed

    Shunta Harada, Toshiki Mii, Hitoshi Sakane, Masashi Kato

    Scientific Reports   Vol. 12 ( 1 ) page: 13542   2022.8

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    SiC bipolar degradation, which is caused by stacking fault expansion from basal plane dislocations in a SiC epitaxial layer or near the interface between the epitaxial layer and the substrate, is one of the critical problems inhibiting widespread usage of high-voltage SiC bipolar devices. In the present study, we investigated the stacking fault expansion behavior under UV illumination in a 4H-SiC epitaxial layer subjected to proton irradiation. X-ray topography observations revealed that proton irradiation suppressed stacking fault expansion. Excess carrier lifetime measurements showed that stacking fault expansion was suppressed in 4H-SiC epitaxial layers with proton irradiation at a fluence of 1 × 1011 cm−2 without evident reduction of the excess carrier lifetime. Furthermore, stacking fault expansion was also suppressed even after high-temperature annealing to recover the excess carrier lifetime. These results implied that passivation of dislocation cores by protons hinders recombination-enhanced dislocation glide motion under UV illumination.

    DOI: 10.1038/s41598-022-17060-y

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  24. Observation of in-plane shear stress fields in off-axis SiC wafers by birefringence imaging Reviewed

    Shunta Harada, Kenta Murayama

    Journal of Applied Crystallography   Vol. 55   page: 1029 - 1032   2022.8

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    For the nondestructive characterization of SiC wafers for power device application, birefringence imaging is one of the promising methods. In the present study, it is demonstrated that birefringence image contrast variation in off-axis SiC wafers corresponds to the in-plane shear stress under conditions slightly deviating from crossed Nicols according to both theoretical consideration and experimental observation. The current results indicate that the characterization of defects in SiC wafers is possible to achieve by birefringence imaging.

    DOI: 10.1107/S1600576722006483

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  25. Designing a High-Crystallinity Nano-Gapped Particle Superlattice via DNA-Guided Colloidal Crystallization and Dehydration Reviewed

    Hayato Sumi, Noboru Ohta, Hiroshi Sekiguchi, Shunta Harada, Toru Ujihara, Katsuo Tsukamoto, Miho Tagawa

    Crystal Growth & Design   Vol. 22 ( 6 ) page: 3708 - 3718   2022.6

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    For the emergence of quantum effects such as plasmonic enhancement, we successfully assembled high-crystallinity nano-gapped particle superlattices composed of sub-10 nm nanoparticles into the solid state through the self-assembly of DNA-programmed nanoparticles (DNA-NPs) in solution followed by dynamic isotropic contraction during dehydration. By this method of isotropic contraction, the crystal symmetry of the self-assembled DNA-NP superlattice in solution was inherited into a dehydrated and contracted one. The optimal isotropic contraction during dehydration was achieved by minimizing the g-factor, which is the index value of the degree of crystallinity. The g-factor was calculated using small-angle X-ray scattering and scanning electron microscopy data for self-assembled DNA-NP superlattices before and after dehydration. The experimental success was driven by our theoretical prediction based on the geometrical calculation regarding the spatial restriction of the nearest-neighbor particle arrangement in a three-dimensional crystal lattice, which was quantified as the particle volume fraction in the lattice, φ. By reducing the nanogap to less than 4 nm through DNA-programmed sub-10 nm nanoparticle crystallization, nanofabrication on a scale exhibiting quantum effects in a bottom-up manner would be feasible.

    DOI: 10.1021/acs.cgd.2c00075

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  26. 「スペクトル超解像」による分光分析の高精度化 Invited

    原田俊太

    OplusE   Vol. 44 ( 3 ) page: 217 - 217   2022.5

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  27. 品質管理へのAI活用の現状と展望—外観検査・棚卸しの自動化を例に Invited Reviewed

    炭谷翔悟、西田陽良、原田俊太

    システム/制御/情報   Vol. 66 ( 5 ) page: 161 - 167   2022.5

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  28. Identification of a novel large duplication (exon2_6dup): copy number variation in the <i>LDLR</i> gene in a large family with familial hypercholesterolemia by whole-genome sequencing

    Hori, M; Takahashi, A; Hosoda, K; Harada-Shiba, M

    JOURNAL OF CLINICAL LIPIDOLOGY   Vol. 16 ( 2 ) page: 167 - 172   2022.3

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    DOI: 10.1016/j.jacl.2022.01.007

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  29. Crossover from incoherent to coherent thermal conduction in bulk titanium oxide natural superlattices Reviewed

    Shunta Harada, Naoki Kosaka, Takashi Yagi, Shunya Sugimoto, Miho Tagawa, Toru Ujihara

    Scripta Materialia   Vol. 208   2022.2

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    We have investigated thermal conduction in bulk titanium oxide natural superlattices with crystallographic shear (CS) structures, in which dense planar faults are introduced with different periodicities, prepared by reductive annealing of rutile TiO2 and crystal growth by the floating zone method. High-angle annular dark-field (HAADF) scanning transmission electron microscopy (STEM) revealed that (132)rutile and (121)rutile CS planes with interspacings of 2.7 and 1.0 nm were introduced in the mother rutile structure. Time-domain thermoreflectance (TDTR) revealed that the thermal conductivity decreased by the introduction of CS planes, but that the decrease is not monotonic with increasing density of CS planes. Calculation of the thermal conductivity and the mean free path for phonons revealed that a crossover from incoherent to coherent thermal conduction took place, and coherent interfaces with nanoscale periodicity were formed as thermodynamically stable phases in bulk titanium oxide natural superlattices.

    DOI: 10.1016/j.scriptamat.2021.114326

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  30. Numerical investigation of solute evaporation in crystal growth from solution: A case study of SiC growth by TSSG method Reviewed

    Yifan Dang, Can Zhu, Xin Liu, Wancheng Yu, Xinbo Liu, Koki Suzuki, Tomoaki Furusho, Shunta Harada, Miho Tagawa, Toru Ujihara

    Journal of Crystal Growth   Vol. 579   page: 126448   2022.2

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    Evaporation of the volatile solute from the liquid phase is a common problem for the crystal grown from solution, especially for the growth under high temperature. In the present study, a numerical model was constructed to quantitatively investigate the evaporation process in crystal growth. This model was applied in top-seeded solution growth (TSSG) of SiC crystal to simulate the transport of aluminum (Al), which is important for crystal surface morphology but easy to vaporize. The transport path of Al in the growth system was determined by analyzing the possible reactions on different boundaries. Accordingly, an improved structure was proposed to suppress the evaporation loss of Al during long-term growth, and was compared with the original case both numerically and experimentally. The simulation results showed that the improved structure could effectively decrease the Al loss by over 70%, and meanwhile had almost no influence on the thermal and flow environment in the solution. For the experimental results, the improved case presented much lower spontaneous nucleation possibilities and higher step height on the crystal surface, which matched well with the features of high Al addition in literatures. Therefore, the improved structure proposed in the present study was proven to be effective to enhance the composition stability of solution during long-term SiC solution growth, and this numerical method could be applied in the growth of other crystals facing the similar problem.

    DOI: 10.1016/j.jcrysgro.2021.126448

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  31. Application of Bayesian Super-Resolution to Spectroscopic Data for Precise Characterization of Spectral Peak Shape Reviewed

    Kota Tsujimori, Jun Hirotani, Shunta Harada

    JOURNAL OF ELECTRONIC MATERIALS   Vol. 51 ( 2 ) page: 712 - 717   2022.2

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    The number of data points of digitally recorded spectra have been limited by the number of multichannel detectors employed, which sometimes impedes the precise characterization of spectral peak shape. Here we describe a methodology to increase the number of data points as well as the signal-to-noise (S/N) ratio by applying Bayesian super-resolution in the analysis of spectroscopic data. In our present method, first, the hyperparameters for the Bayesian super-resolution are determined by a virtual experiment imitating actual experimental data, and the precision of the super-resolution reconstruction is confirmed by the calculation of errors from the ideal values. For validation of the super-resolution reconstruction of spectroscopic data, we applied this method to the analysis of Raman spectra. From 200 Raman spectra of a reference Si substrate with a data interval of about 0.8 cm(-1), super-resolution reconstruction with a data interval of 0.01 cm(-1) was successfully achieved with the promised precision. From the super-resolution spectrum, the Raman scattering peak of the reference Si substrate was estimated as 520.55 (+0.12, -0.09) cm(-1), which is comparable to the precisely determined value reported in previous works. The present methodology can be applied to various kinds of spectroscopic analysis, leading to increased precision in the analysis of spectroscopic data and the ability to detect slight differences in spectral peak positions and shapes.

    DOI: 10.1007/s11664-021-09326-4

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  32. Solvent design aiming at solution property induced surface stability: A case study using SiC solution growth Reviewed

    Xinbo Liu, Yifan Dang, Koki Suzuki, Can Zhu, Wancheng Yu, Shunta Harada, Miho Tagawa, Toru Ujihara

    JOURNAL OF CRYSTAL GROWTH   Vol. 578   page: 126425   2022.1

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    For solution growth of silicon carbide, it is significant to understanding the evolutionary mechanism of step bunching. This study infers that solute's incorporation into steps and transport together determines step bunching progress. The occurrence of step bunching is due to the depletion of solute in the region with high step density, caused by a high step kinetic coefficient. On the other hand, by promoting the transport of the solute in the solution, the step speed becomes uniform, thereby the step bunching can be prevented. Furthermore, we proposed a non-dimensional Damko center dot hler number for crystal growth in step-flow mode. It correlates incorporation rates with bulk diffusion rates and can build a phase map of growth rates and step bunching stability. Several solvents are located in the phase map, demonstrating the possible usage of the phase map as a pointer for solvent designing.

    DOI: 10.1016/j.jcrysgro.2021.126425

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  33. Automatic Detection of Basal Plane Dislocations in a 150-mm SiC Epitaxial Wafer by Photoluminescence Imaging and Template-matching Algorithm Reviewed

    Shunta Harada, Kota Tsujimori, Yosuke Matsushita

    JOURNAL OF ELECTRONIC MATERIALS   Vol. 51 ( 1 ) page: 243 - 248   2022.1

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    In this study, an algorithm was constructed for the automatic detection of basal plane dislocations (BPDs) propagating in SiC epitaxial layers in photoluminescence images, and its performance was evaluated. The BPDs are the origin of the degradation of SiC bipolar devices caused by the expansion of stacking faults. The present automatic detection algorithm, based on the template-matching method, was confirmed to have high accuracy and precision, and we succeeded in visualizing the BPD density in 150-mm SiC epitaxial wafers. We confirmed that the template-matching method is applicable for the detection of crystalline defects with geometrically fixed shapes such as BPDs in SiC epitaxial layers.

    DOI: 10.1007/s11664-021-09284-x

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  34. High fracture toughness AlN achieved by addition of AlN whiskers and tape-casting Reviewed

    Hiroki Shimizu, Naoki Kondo, Akihiro Shimamura, Mikinori Hotta, Shunta Harada, Toru Ujihara, Yoshihiro Ohnishi

    JOURNAL OF THE CERAMIC SOCIETY OF JAPAN   Vol. 130 ( 1 ) page: 195 - 198   2022.1

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    Aluminum nitride (AlN) possesses excellent thermal conductivity and electrical resistivity, which makes it an ideal candidate for high-power, high-speed integrated circuit substrates. Its low fracture toughness requires the manufacturing of thicker substrates. However, this leads to degraded heat dissipation performance. Herein, we investigated a new strategy, combining the addition of AlN whiskers and tape-casting, to overcome the low fracture toughness disadvantage. The sintered AlN with AlN whiskers addition induced the formation of a highly anisotropic microstructure with aligned rod-like grains, effectively enhancing the fracture toughness to 6.7 MPa m1/2, while maintaining thermal conductivity but degrading strength. (c) 2022 The Ceramic Society of Japan. All rights reserved.

    DOI: 10.2109/jcersj2.21143

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  35. Polarized light observation of semiconductor wafers for power devices

    Murayama K., Mizutani S., Mizutani Y., Harada S.

    2022 IEEE International Meeting for Future of Electron Devices, Kansai, IMFEDK 2022     2022

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    Polarized light observation is one of the promising methods for the non-destructive characterization of semiconductor wafers for power devices. We have visualized the distribution of defects in SiC wafers by birefringence imaging.

    DOI: 10.1109/IMFEDK56875.2022.9975432

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  36. Process informatics using simulation data for crystal growth

    Kutsukake Kentaro, Tsunooka Yosuke, Wancheng Yu, Dang Yifan, Harada Shunta, Ujihara Toru

    Journal of the Japanese Association for Crystal Growth   Vol. 49 ( 1 ) page: n/a   2022

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    <p>  In this paper, machine learning and optimization based on simulation data of crystal growth are discussed from the viewpoint of informatics application, introducing our application to solution growth of SiC crystal. First, general aspects of crystal growth process simulation and its informatics applications are described. Next, after an overview of the solution growth of SiC crystal, the process optimization of solution growth of SiC crystal using machine learning is described, including the prediction model of temperature and flow of the solution in the crucible, the optimization of geometry conditions, and the optimization of process conditions corresponding to time evolution. Next, application to other materials is described. Finally, this paper is summarized with future prospects.</p>

    DOI: 10.19009/jjacg.49-1-06

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  37. Association between Achilles Tendon Softness and Atherosclerotic Cardiovascular Disease in Patients with Familial Hypercholesterolemia

    Michikura, M; Ogura, M; Hori, M; Matsuki, K; Makino, H; Hosoda, K; Harada-Shiba, M

    JOURNAL OF ATHEROSCLEROSIS AND THROMBOSIS   Vol. 29 ( 11 ) page: 1603 - 1612   2022

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    DOI: 10.5551/jat.63151

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  38. Immobilization of partial dislocations bounding double Shockley stacking faults in 4H-SiC observed by in situ synchrotron X-ray topography Reviewed

    Fumihiro Fujie, Shunta Harada, Hiromasa Suo, Balaji Raghothamachar, Michael Dudley, Kenji Hanada, Haruhiko Koizumi, Tomohisa Kato, Miho Tagawa, Toru Ujihara

    MATERIALIA   Vol. 20   page: 101246   2021.12

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    The expansion of double Shockley stacking faults (DSFs) in an n-type 4H-SiC substrate with a nitrogen concentration of 3.9 x 10(19) cm(-3) was investigated using in situ synchrotron X-ray topography. DSF expansion was observed to be suppressed and immobilized above 1590 K, along with the partial dislocation (PD) shape being changed from a straight to zig-zag configuration. For a different heating process (higher heating rate), the PDs could continue to expand, even above 1590 K. Ex situ topography experiments revealed that the DSFs close to the specimen surface expanded widely, although those expanding toward the specimen interior became immobile. One possible mechanism for this immobilization was proposed, where the core structural changes from a Si-core to the C-core by non-conservative motion induced by the interaction between the PDs and point defects (C interstitials).

    DOI: 10.1016/j.mtla.2021.101246

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  39. Surface relaxation and photoelectric absorption effects on synchrotron X-ray topographic images of dislocations lying on the basal plane in off-axis 4H-SiC crystals Reviewed

    Tuerxun Ailihumaer, Hongyu Peng, Fumihiro Fujie, Balaji Raghothamachar, Michael Dudley, Shunta Harada, Toru Ujihara

    Materials Science and Engineering B: Solid-State Materials for Advanced Technology   Vol. 271   page: 115281   2021.9

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    A more sophisticated simulation model is developed based on the principle of ray-tracing to simulate the grazing-incidence synchrotron X-ray topographic contrast of dislocations lying on the basal plane including basal plane dislocations and deflected threading screw and mixed dislocations in off-axis 4H-SiC crystals. The model incorporates effects of surface relaxation as well as the photoelectric absorption to predict dislocation contrast. Compared to conventional ray-tracing images, surface relaxation effects dominate dislocation contrast for diffraction near the crystal surface. The simulated dislocation contrast gradually weakens with increasing depth of the diffracted beam position within the crystal due to photoelectric absorption. The distinctive features of the net simulated dislocation images obtained by aggregating through the effective penetration depth correlate well with contrast features observed on the experimental topographic images. Depth analysis reveals that in some cases the diffracted X-rays from regions below the dislocation can contribute additional contrast features previously not considered.

    DOI: 10.1016/j.mseb.2021.115281

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  40. Two-Step Nanoparticle Crystallization via DNA-Guided Self-Assembly and the Nonequilibrium Dehydration Process Reviewed

    Hayato Sumi, Noboru Ohta, Hiroshi Sekiguchi, Shunta Harada, Toru Ujihara, Katsuo Tsukamoto, Miho Tagawa

    Crystal Growth and Design   Vol. 21 ( 8 ) page: 4506 - 4515   2021.8

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    DNA strands are powerful tools as ligand molecules that bind nanoparticles to each other via programmable self-assembly for colloidal crystallization. We found that hydrated DNA-functionalized nanoparticle (DNA-NP) superlattices with a properly controlled volume fraction and spatial arrangement of nanoparticles successfully maintained their crystallinity even after dehydration, which involves drastic contraction. A detailed study of the structural changes was performed for the self-assembled DNA-NP sample using small-angle X-ray scattering (SAXS) after dehydration. Then, an optimal volume fraction of nanoparticles in the superlattice, φ, which minimized the level of distortion of the dehydrated superlattice, was found for each bcc and fcc structure. By acquiring clear SAXS diffraction patterns showing crystal symmetries for dehydrated DNA-NP superlattices, their lattice distortion was evaluated using our analysis technique, which is based on Hosemann's paracrystalline theory and involves SAXS and scanning electron microscopy data. Geometrical calculations substantiated the ease of movement of a nanoparticle under the influence of repulsions from adjacent particles that mainly affect the dehydration stability. These results suggest that it is possible to design the crystal structure of solid nanoparticle superlattices via DNA-guided nanoparticle assembly under a near-equilibrium state in solution as the first step, followed by dehydration under nonequilibrium conditions as the second step.

    DOI: 10.1021/acs.cgd.1c00398

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  41. Local Atomic Structures for Tunable Ordered Arrangements of Crystallographic Shear Planes in Titanium-Chromium Oxide Natural Superlattices Reviewed

    Shunta Harada, Shunya Sugimoto, Naoki Kosaka, Miho Tagawa, Toru Ujihara

    Journal of Physical Chemistry C   Vol. 125 ( 28 ) page: 15730 - 15736   2021.7

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    The atomic structure of titanium-chromium oxide natural superlattices with different compositions having an ordered arrangement of crystallographic shear (CS) planes was investigated by high-angle annular dark-field (HAADF) scanning transmission electron microscopy (STEM) and electron diffraction, using polycrystalline ceramics prepared by arc-melting and heat treatment. Analysis of the electron diffraction patterns revealed that not only the interspacing but also the direction of planar faults changed depending on the chromium concentration. HAADF-STEM observations showed that the atomic arrangements of CS planes deviating from (121)rutile are random arrangements of (121)rutile CS planes and (011)rutile antiphase boundaries. Using a random walk model and by calculating the specularity parameter, we found that the CS planes in titanium-chromium oxides behave as coherent interfaces for phonons based on the estimation of interface roughness.

    DOI: 10.1021/acs.jpcc.1c04516

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  42. Ordered Arrangement of Planar Faults with Picoscale Perfection in Titanium Oxide Natural Superlattices Reviewed

    S. Harada, N. Kosaka, M. Tagawa, T. Ujihara

    The Journal of Physical Chemistry C   Vol. 125 ( 20 ) page: 11175 - 11181   2021.5

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    DOI: 10.1021/acs.jpcc.1c01831

  43. Design of automatic detection algorithm for dislocation contrasts in birefringence images of SiC wafers Reviewed

    Kawata Akira, Murayama Kenta, Sumitani Shogo, Harada Shunta

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( SB )   2021.5

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    DOI: 10.35848/1347-4065/abde29

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  44. Synchrotron X-ray topographic image contrast variation of screw-type basal plane dislocations located at different depths below the crystal surface in 4H-SiC Reviewed International coauthorship

    Fujie Fumihiro, Peng Hongyu, Ailihumaer Tuerxun, Raghothamachar Balaji, Dudley Michael, Harada Shunta, Tagawa Miho, Ujihara Toru

    ACTA MATERIALIA   Vol. 208   2021.4

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    DOI: 10.1016/j.actamat.2021.116746

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  45. Geometrical design of a crystal growth system guided by a amachine learning algorithm Reviewed

    Wancheng Yu, Can Zhu, Wei Huang, Dang Yifan, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    CrystEngComm   Vol. 23 ( 14 ) page: 2695 - 2702   2021.4

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    DOI: 10.1039/d1ce00106j

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  46. Adaptive process control for crystal growth using machine learning for high-speed prediction: application to SiC solution growth

    Dang Yifan, Zhu Can, Ikumi Motoki, Takaishi Masaki, Yu Wancheng, Huang Wei, Liu Xinbo, Kutsukake Kentaro, Harada Shunta, Tagawa Miho, Ujihara Toru

    CrystEngComm   Vol. 23 ( 9 ) page: 1982 - 1990   2021.3

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    DOI: 10.1039/d0ce01824d

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  47. Analysis of dislocation line tilt in GaN single crystal by Raman spectroscopy

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 60 ( SA )   2021.1

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    DOI: 10.35848/1347-4065/abc7a1

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  48. Technologies for large-diameter SiC crystal growth and application of process informatics

    Ujihara Toru, Zhu Can, Tsunooka Yosuke, Furusho Tomoaki, Suzuki Koki, Kutsukake Kentaro, Takaishi Masaki, Yu Wancheng, Dang Yifan, Isono Masaru, Takeuchi Ichiro, Tagawa Miho, Harada Shunta

    Journal of the Japanese Association for Crystal Growth   Vol. 48 ( 3 ) page: n/a   2021

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    <p>  We have been developing a SiC crystal growth technique using the solution method. As a result, we have achieved the growth of ultra-high quality crystals with extremely low dislocation density. The key to this is the reduction of dislocation density by utilizing the macro-step dislocation conversion phenomenon and the suppression of surface morphology roughness by controlling the flow in the solution. In order to put these technologies to practical use, we have developed a new machine learning technique for optimizing crystal growth conditions for large-diameter crystals. In this method, a model is constructed in the computer that reproduces the actual experiment quickly and accurately, and then hundreds of thousands or millions of trials are performed using the model to derive the experimental conditions with high efficiency. This means that optimization by surrogate models, which is one of the methods of process informatics, has been realized in crystal growth. By using these techniques, we were able to achieve 6-inch crystal growth in a very short time.</p>

    DOI: 10.19009/jjacg.48-3-04

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  49. Numerical investigation and optimization of time evolution in the solution during solution growth for SiC crystal

    Dang Yifan, Zhu Can, Yu Wancheng, Huang Wei, Ikumi Motoki, Harada Shunta, Tagawa Miho, Ujihara Toru

    JSAP Annual Meetings Extended Abstracts   Vol. 2020.2 ( 0 ) page: 2128 - 2128   2020.8

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    DOI: 10.11470/jsapmeeting.2020.2.0_2128

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  50. Temperature dependence of double Shockley stacking fault behavior in nitrogen-doped 4H-SiC studied by in-situ synchrotron X-ray topography

    Fujie Fumihiro, Harada Shunta, Hanada Kenji, Suo Hiromasa, Koizumi Haruhiko, Kato Tomohisa, Tagawa Miho, Ujihara Toru

    ACTA MATERIALIA   Vol. 194   page: 387 - 393   2020.8

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    DOI: 10.1016/j.actamat.2020.04.019

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  51. Behavior of Threading Dislocations from GaN Substrate to Epitaxial Layer

    Inotsume Sho, Kokubo Nobuhiko, Yamada Hisashi, Onda Shoichi, Kojima Jun, Ohara Junji, Harada Shunta, Tagawa Miho, Ujihara Toru

    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS   Vol. 257 ( 4 )   2020.4

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    DOI: 10.1002/pssb.201900527

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  52. Demonstration of Observation of Dislocations in GaN by Novel Birefringence Method

    Tanaka Atsushi, Inotsume Syo, Harada Shunta, Hanada Kenji, Honda Yoshio, Ujihara Toru, Amano Hiroshi

    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS   Vol. 257 ( 4 )   2020.4

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    DOI: 10.1002/pssb.201900553

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  53. 機械学習を活用した SiC 高品質結晶成長条件のデザイン Invited Reviewed

    原田俊太, 林宏益, 角岡洋介, 朱燦, 鳴海大翔, 沓掛健太朗, 宇治原徹

    まてりあ   Vol. 59 ( 3 ) page: 145 - 152   2020.3

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  54. Effect of Crystal Orientation of Cu Current Collectors on Cycling Stability of Li Metal Anodes

    Ishikawa Kohei, Harada Shunta, Tagawa Miho, Ujihara Toru

    ACS APPLIED MATERIALS & INTERFACES   Vol. 12 ( 8 ) page: 9341 - 9346   2020.2

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    DOI: 10.1021/acsami.9b22157

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  55. Application of C-face dislocation conversion to 2 inch SiC crystal growth on an off-axis seed crystal

    Liu Xinbo, Zhu Can, Harada Shunta, Tagawa Miho, Ujihara Toru

    CRYSTENGCOMM   Vol. 21 ( 47 ) page: 7260 - 7265   2019.12

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    DOI: 10.1039/c9ce01338e

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  56. Nondestructive visualization of threading dislocations in GaN by micro raman mapping

    Kokubo Nobuhiko, Tsunooka Yosuke, Fujie Fumihiro, Ohara Junji, Onda Shoichi, Yamada Hisashi, Shimizu Mitsuaki, Harada Shunta, Tagawa Miho, Ujihara Toru

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 58 ( SC )   2019.6

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    DOI: 10.7567/1347-4065/ab0acf

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  57. SiC溶液成長による高品質化と機械学習の応用 Invited Reviewed

    原田俊太, 朱燦, 角岡洋介, 沓掛健太朗, 宇治原徹

      Vol. 14 ( 1 ) page: 13 - 18   2019.6

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  58. SiC溶液成長による高品質化と機械学習の応用 Invited Reviewed

    原田俊太, 朱燦, 角岡洋介, 沓掛健太朗, 宇治原徹

      Vol. 14 ( 1 ) page: 13 - 18   2019.6

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  59. Evaluation of basal plane dislocation behavior in the epitaxial layer on a 4H-SiC wafer fabricated by the solution growth method

    Seki K.

    Materials Science Forum   Vol. 963 MSF   page: 80 - 84   2019

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    DOI: 10.4028/www.scientific.net/MSF.963.80

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  60. The relationships between crystal orientation and morphology of electrode from a perspective of crystal growth

    Ishikawa Kohei, Mitsuhashi Takato, Ito Yasumasa, Takeuchi Yukihisa, Harada Shunta, Tagawa Miho, Ujihara Toru

    Journal of the Japanese Association for Crystal Growth   Vol. 46 ( 1 ) page: 136-140   2019

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    <p>  Metal anodes are promising materials for rechargeable batteries because of the higher capacity. However, low cycle efficiency due to non-uniform deposition prevents them from realization. In this review, we report the crystal orientation dependence of the deposition shape of Li and Zn, which are known as attractive materials for anodes. The result shows that the both of Li and Zn morphology has crystal orientation dependence.</p>

    DOI: 10.19009/jjacg.46-1-08

  61. The Prediction Model of Crystal Growth Simulation Built by Machine Learning and Its Applications

    UJIHARA Toru, TSUNOOKA Yosuke, HATASA Goki, KUTSUKAKE Kentaro, ISHIGURO Akio, MURAYAMA Kenta, NARUMI Taka, HARADA Shunta, TAGAWA Miho

    Vacuum and Surface Science   Vol. 62 ( 3 ) page: 136 - 140   2019

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    <p>The prediction model of the result of computed fluid dynamics simulation in SiC solution growth was constructed on neural network using machine learning. Utilizing the prediction model, we can optimize quickly crystal growth conditions. In addition, the real-time visualization system was also made using the prediction model.</p>

    DOI: 10.1380/vss.62.136

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  62. Machine learning for SiC top-seeded solution growth - Prediction, optimization and visualization Reviewed

    Toru Ujihara, Yosuke Tsunooka, Goki Hatasa, Can Zhu, Kentaro Kutsukake, Taka Narumi, Shunta Harada, Miho Tagawa

    CS MANTECH 2019 - 2019 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers     2019

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    © 2019 CS Mantech. All rights reserved. We are developing solution growth technique for high-quality SiC bulk crystal. In actual, we have achieved high-quality crystal with very-low-density of threading dislocations grown by controlling the surface morphology. In order to apply this technique to large-scale crystal growth, it is necessary to control supersaturation at growth surface, flow rate and flow direction of solvent in detail. However, there are many growth parameters which should be optimized. Simulation technique based on computational fluid dynamics (CFD) is often used. However, it is still difficult to optimize growth condition by utilizing simulation technique since the calculation speed of CFD simulation is not enough to optimize the growth conditions, exhaustively. In recent, informatics including machine learning is applied to various fields including materials science. In this study, we tried to apply machine learning to the analysis of the results of CFD. We could make the model to optimize the crystal growth parameters based on a neural network model. Using the model, the optimization time became 10000 times faster. This is just a trial of “Process Informatics”.

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  63. Machine learning for SiC top-seeded solution growth - Prediction, optimization and visualization

    Ujihara T.

    CS MANTECH 2019 - 2019 International Conference on Compound Semiconductor Manufacturing Technology, Digest of Papers     2019

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  64. Improvement mechanism of sputtered AlN films by high-temperature annealing

    Shiyu Xiao, Ryoya Suzuki, Hideto Miyake, Shunta Harada, Toru Ujihara

    Journal of Crystal Growth   Vol. 502   page: 41 - 44   2018.11

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    DOI: 10.1016/j.jcrysgro.2018.09.002

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  65. High-speed prediction of computational fluid dynamics simulation in crystal growth

    Tsunooka Yosuke, Kokubo Nobuhiko, Hatasa Goki, Harada Shunta, Tagawa Miho, Ujihara Toru

    CRYSTENGCOMM   Vol. 20 ( 41 ) page: 6546 - 6550   2018.11

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    DOI: 10.1039/c8ce00977e

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  66. Determination of edge-component Burgers vector of threading dislocations in GaN crystal by using Raman mapping

    Kokubo Nobuhiko, Tsunooka Yosuke, Fujie Fumihiro, Ohara Junji, Onda Shoichi, Yamada Hisashi, Shimizu Mitsuaki, Harada Shunta, Tagawa Miho, Ujihara Toru

    APPLIED PHYSICS EXPRESS   Vol. 11 ( 11 )   2018.11

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    DOI: 10.7567/APEX.11.111001

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  67. Observation of carrier recombination in single Shockley stacking faults and at partial dislocations in 4H-SiC

    Kato Masashi, Katahira Shinya, Ichikawa Yoshihito, Harada Shunta, Kimoto Tsunenobu

    JOURNAL OF APPLIED PHYSICS   Vol. 124 ( 9 )   2018.9

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    DOI: 10.1063/1.5042561

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  68. Classification and behavior of dislocations propagating from GaN substrate to epitaxial film

    Inotsume Sho, Kokubo Nobuhiko, Yamada Hisashi, Onda Shoichi, Ohara Junji, Harada Shunta, Tagawa Miho, Ujihara Toru

    JSAP Annual Meetings Extended Abstracts   Vol. 2018.2 ( 0 ) page: 3248 - 3248   2018.9

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    DOI: 10.11470/jsapmeeting.2018.2.0_3248

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  69. In Situ Observation of Chiral Symmetry Breaking in NaClO3 Chiral Crystallization Realized by Thermoplasmonic Micro-Stirring

    Niinomi Hiromasa, Sugiyama Teruki, Tagawa Miho, Harada Shunta, Ujihara Tom, Uda Satoshi, Miyamoto Katsuhiko, Omatsu Takashige

    CRYSTAL GROWTH & DESIGN   Vol. 18 ( 8 ) page: 4230 - 4239   2018.8

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    DOI: 10.1021/acs.cgd.8b00420

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  70. Direct observation of stacking fault shrinkage in 4H-SiC at high temperatures by in-situ X-ray topography using monochromatic synchrotron radiation

    Fujie Fumihiro, Harada Shunta, Koizumi Haruhiko, Murayama Kenta, Hanada Kenji, Tagawa Miho, Ujihara Toru

    APPLIED PHYSICS LETTERS   Vol. 113 ( 1 )   2018.7

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    DOI: 10.1063/1.5038189

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  71. Development of angle-resolved spectroscopy system of electrons emitted from a surface with negative electron affinity state

    Ichihashi Fumiaki, Dong Xinyu, Inoue Akito, Kawaguchi Takahiko, Kuwahara Makoto, Ito Takahiro, Harada Shunta, Tagawa Miho, Ujihara Toru

    REVIEW OF SCIENTIFIC INSTRUMENTS   Vol. 89 ( 7 )   2018.7

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    DOI: 10.1063/1.5021116

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  72. Detection of edge component of threading dislocations in GaN by Raman spectroscopy

    Nobuhiko Kokubo, Yosuke Tsunooka, Fumihiro Fujie, Junji Ohara, Kazukuni Hara, Shoichi Onda, Hisashi Yamada, Mitsuaki Shimizu, Shunta Harada, Miho Tagawa, Toru Ujihara

    Applied Physics Express   Vol. 11 ( 6 )   2018.6

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    We succeeded in measuring the density and direction of the edge component of threading dislocations (TDs) in c-plane (0001) GaN by micro- Raman spectroscopy mapping. In the micro-Raman spectroscopy mapping of the E2 H peak shift between 567.85 and 567.75 cm-1, six different contrast images are observed toward directions of h1-100i. By comparing X-ray topography and etch pit images, the E2 H peak shift is observed where the edge component of TDs exists. In contrast, the E2 H peak is not observed where the screw component of TDs exists.

    DOI: 10.7567/APEX.11.061002

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  73. Dislocation behavior in bulk crystals grown by TSSG method

    Kazuaki Seki, Kazuhiko Kusunoki, Yutaka Kishida, Hiroshi Kaido, Koji Moriguchi, Motohisa Kado, Hironori Daikoku, Takayuki Shirai, Mitsutoshi Akita, Akinori Seki, Hiroaki Saito, Shunta Harada, Toru Ujihara

    Materials Science Forum   Vol. 924   page: 39 - 42   2018

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    The dislocation behavior during bulk crystal growth on the 4H-SiC (000-1) C-face using the solution method was investigated. A 2 inch wafer with a 4 degree off angle was fabricated from a bulk crystal grown by the TSSG method, and the dislocations in the crystal were evaluated using synchrotron X-ray topography and TEM observation. From the topograph images, it was found that the TSD density remarkably decreased as the growth progressed. Furthermore, the TEM observation suggested that TSD decreases as the threading dislocations convert to in-plane defects toward the center of the crystal. Conventionally, it was considered that conversion of threading dislocations hardly occurs in solution growth on the C-face. However, it is thought that this phenomenon was not observable because the conversion efficiency is remarkably low. We speculate that dislocations may be converted by suddenly making macrosteps during bulk growth.

    DOI: 10.4028/www.scientific.net/MSF.924.39

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  74. Suppression of polytype transformation with extremely low-dislocation-density 4H-SiC crystal in two-step solution method

    Kenta Murayama, Shunta Harada, Fumihiro Fujie, Xin Bo Liu, Ryota Murai, Can Zhu, Kenji Hanada, Miho Tagawa, Toru Ujihara

    Materials Science Forum   Vol. 924   page: 60 - 63   2018

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    We achieved the growth of extremely-high quality SiC crystal with two-step solution method with specially-designed seed crystals. The two-step growth consists of 1st step growth on Si-face for the reduction of threading dislocations and 2nd step growth on C-face for the reduction of basal plane dislocations and thickening. In this method, we can make the dislocation density extremely low, while the polytype easily changes during growth due to the absence of spiral hillocks originating from threading screw dislocation (TSD). In this study, we prepared specially designed seed crystals for both 1st and 2nd growth steps to provide steps continuously. In the seeds, a few TSDs exist at the upper-side of the step structure. Consequently, we demonstrated the suppression of the polytype transformation during the C-face growth with extremely low-dislocation-density crystal. Accordingly, we successfully obtained extremely low-dislocation density 4H-SiC with TSD, TED and BPD density of 11, 385 and 28 cm-2.

    DOI: 10.4028/www.scientific.net/MSF.924.60

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  75. Temperature dependence of carrier relaxation time in gallium phosphide evaluated by photoemission measurements

    Fumiaki Ichihashi, Takahiko Kawaguchi, Xinyu Dong, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Miho Tagawa, Toru Ujihara

    AIP ADVANCES   Vol. 7 ( 11 )   2017.11

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    For understanding of carrier behavior in semiconductors, it is important to measure the carrier relaxation time. In the present study, the relaxation times of inter-valley transition from the valley to the X valley in GaP were evaluated by near-band-gap photoemission spectroscopy of electrons emitted from a surface with a negative electron affinity state. In the energy distribution curves, two peaks, which originate from the electron population accumulated in the valley and the X valley, were observed. From the temperature dependence of the energy of these two peaks, we could successfully evaluate the temperature dependence of the energies of the valley and the X valley. Furthermore, the relaxation times of the inter-valley transition from the valley to the X valley were estimated from the ratio of the electron concentration of the valley and the X valley. The values of the relaxation time are good agreement with the previous studies. These results indicate that the near-band-gap photoemission spectroscopy can directly investigate conduction electrons and also evaluate the carrier dynamics in semiconductor. (C) 2017 Author(s).

    DOI: 10.1063/1.4997800

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  76. Optimization of crystallization conditions of SiC crystal with machine learning

    Murai Ryota, Hatasa Goki, Tunooka Yosuke, Lin Hung, Murayama Kenta, Zhu Can, Harada Shunta, Tagawa Miho, Ujihara Toru

    JSAP Annual Meetings Extended Abstracts   Vol. 2017.2 ( 0 ) page: 3506 - 3506   2017.8

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    DOI: 10.11470/jsapmeeting.2017.2.0_3506

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  77. Investigation of high-temperature annealing process of sputtered AlN films

    Xiao Shiyu, Liu Yikang, Suzuki Ryoya, Miyake Hideto, Hiramatsu Kazumasa, Harada Shunta, Ujihara Toru

    JSAP Annual Meetings Extended Abstracts   Vol. 2017.2 ( 0 ) page: 3378 - 3378   2017.8

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    DOI: 10.11470/jsapmeeting.2017.2.0_3378

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  78. Morphology of AlN whiskers grown by reacting N-2 gas and Al vapor

    M. Matsumoto, H. Saitou, Y. Takeuchi, S. Harada, M. Tagawa, T. Ujihara

    JOURNAL OF CRYSTAL GROWTH   Vol. 468   page: 576 - 580   2017.6

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    We have investigated the morphology of AlN whiskers on a polycrystalline AlN substrate by using Fe-Al alloy melts under the different synthesis conditions. Formation density of the AlN whiskers increases and the diameter of the whisker decreases with increasing Al content of the Fe-Al alloy melt. Most of the AlN whiskers were zigzag shape with the hexagonal cross section. The longitudinal direction was the [0001] direction. The facet with the zigzag shape was the {1101} or {1101} pyramidal plane and the period of the zigzag facet was almost constant. The average diameter of the whiskers and the period of the zigzag facet decrease with increasing Al content. At the initial stage of the whisker formation, the island of AlN formed on the AlN substrate and the pyramidal facet grows via step-flow growth. From the observation, we discussed the possible mechanism for the formation of the zigzag-shape AlN whiskers.

    DOI: 10.1016/j.jcrysgro.2016.11.127

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  79. Two-step SiC solution growth for dislocation reduction

    K. Murayama, T. Hori, S. Harada, S. Xiao, M. Tagawa, T. Ujihara

    Journal of Crystal Growth   Vol. 468   page: 874 - 878   2017.6

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    We propose a two-step silicon carbide (SiC) solution growth method for dislocation reduction to produce the high-quality silicon carbide SiC crystals. The two-step growth consists of the growth on a Si face and a C face. Firstly, seed crystal with low threading dislocation density was prepared by the growth on a Si face utilizing the threading dislocation conversion. Secondly, the growth on the C face was conducted on the prepared seed crystal with low threading dislocation density to reduce the density of basal plane dislocations and keep smooth growth surface. We demonstrate that the two-step growth leads to the reduction of the density for all types of dislocations by two orders of magnitude compared to the initial density of the seed crystal.

    DOI: 10.1016/j.jcrysgro.2016.11.100

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  80. Phase transition process in DDAB supported lipid bilayer

    Takumi Isogai, Sakiko Nakada, Naoya Yoshida, Hayato Sumi, Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

    JOURNAL OF CRYSTAL GROWTH   Vol. 468   page: 88 - 92   2017.6

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    We report the results of microscope measurements examining the phase transition process of a cationic lipid, Dimethyldioctadecylammonium bromide (DDAB) supported lipid bilayer (SLB). Due to lateral fluidity and strong electrostatic interaction with DNA, SLB serves as a fluid substrate for assembling 2D lattices of DNA functionalized nanoparticles (DNA-NPs): lipid molecules work as carriers for transporting DNA-NPs. By fluorescence microscopy and atomic force microscopy (AFM), two types of phase transitions, which correspond to liquid crystalline-gel and liquid crystalline-interdigitated gel (L beta I) ones, were observed in DDAB SLB during cooling. In thermal equilibrium at room temperature both gel and L beta I phases have enough adsorbed amounts of DNA-NPs which indicate that both domains have enough surface charge densities for adsorbing DNA-NPs, however, during phase transition DNA-NPs preferably distributed into L beta I phase.

    DOI: 10.1016/j.jcrysgro.2016.09.063

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  81. Solvent design for high-purity SiC solution growth

    "S. Harada, G. Hatasa, K. Murayama, T. Kato, M. Tagawa, T. Ujihara"

    Mater. Sci. Forum   Vol. 897   page: 32-35   2017.5

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    DOI: DOI: 10.4028/www.scientific.net/MSF.897.32

  82. Formation of basal plane dislocations introduced by collision of macrosteps on growth surface during SiC solution growth

    "T. Hori, K. Murayama, S. Harada, S. Xiao, M. Tagawa, T. Ujihara"

    Mater. Sci. Forum   Vol. 897   page: 28-31   2017.5

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    DOI: DOI: 10.4028/www.scientific.net/MSF.897.28

  83. SiC solution growth on Si face with extremely low density of threading screw dislocations for suppression of polytype transformation

    "K. Murayama, T. Hori, S. Harada, S. Xiao, M. Tagawa, T. Ujihara"

    Mater. Sci. Forum   Vol. 897   page: 24-27   2017.5

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    DOI: DOI:10.4028/www.scientific.net/MSF.897.24

  84. Crystal Orientation Dependence of Precipitate Structure of Electrodeposited Li Metal on Cu Current Collectors

    K. Ishikawa, Y. Ito, S. Harada, M. Tagawa, T. Ujihara

    Cryst. Growth Des.   Vol. 17 ( 5 ) page: 2379 - 2385   2017.5

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    Dendritic growth at the Li anode during charging is caused by a morphological inhomogeneity of Li electrodeposition. In this study, we investigate the dependence of the morphology of Li electrodeposited on a polycrystalline Cu current collector on the Cu grain orientation both experimentally and by numerical analysis. The experimental results show that the Li precipitates that form on Cu grains that have close to (111) orientations are the smallest and the most uniform in size. Such a morphology is expected to be effective for the suppression of dendrite; growth. Numerical analysis indicates that the initial stage of electrodeposition plays an important role in determining morphological variation, and this is due to the crystal orientation dependence of the adatom concentration at equilibrium.

    DOI: 10.1021/acs.cgd.6b01710

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  85. Wulff polyhedral colloidal crystallization using DNA-nanoparticle superlattice precursors

    Sumi Hayato, Isogai Takumi, Yoshida Naoya, Harada Shunta, Ujihara Toru, Tagawa Miho

    JSAP Annual Meetings Extended Abstracts   Vol. 2017.1 ( 0 ) page: 2741 - 2741   2017.3

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    DOI: 10.11470/jsapmeeting.2017.1.0_2741

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  86. Modification of the surface morphology of 4H-SiC by addition of Sn and Al in solution growth with SiCr solvents

    Naoyoshi Komatsu, Takeshi Mitani, Yuichiro Hayashi, Tomohisa Kato, Shunta Harada, Toru Ujihara, Hajime Okumura

    JOURNAL OF CRYSTAL GROWTH   Vol. 458   page: 37 - 43   2017.1

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    For solution growth of 4H-SiC with Si0.6-x-yCr0.4AlxSny solvents, the changes in surface morphology and polytype induced by the addition of Sn and Al to the Si0.6Cr0.4 solvent were investigated. Growth with Si0.6Cr0.4 solvents resulted in a rough surface covered with large macrosteps that were several micrometers high, and the polytype of the grown layer transformed to 6H and 15R-SiC. The surface roughening and polytype instability were suppressed when more than 2 at% Al was added to the SiCr0.4 solvent. We also found that the combined addition of both 2-4 at% Sn and 0.5-1 at% Al resulted in smooth surface morphology. We discussed the modification of the surface morphology of 4H-SiC caused by the additives in terms of the wetting properties of the solvents. Based on the results of experiments and thermodynamic calculations, the addition of both Sn and Al increased the liquid/solid interfacial energy. Because the two-dimensional nucleation energy increases with the interfacial energy, we conclude that smooth step flow growth of 4H-SiC was achieved by lowering the frequency of two-dimensional nucleation on the growth surface.

    DOI: 10.1016/j.jcrysgro.2016.10.045

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  87. Modification of the surface morphology of 4H-SiC by addition of Sn and Al in solution growth with SiCr solvents

    "N. Komatsu, T. Mitani, Y Hayashi, T Kato, S. Harada, T. Ujihara, H. Okumura"

    J. Cryst. Growth   Vol. 458   page: 37-43   2017

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    DOI: http://dx.doi.org/10.1016/j.jcrysgro.2016.10.045

  88. Crystal Orientation Dependence of Precipitate Structure of Electrodeposited Li Metal on Cu Current Collectors

    "K. Ishikawa, Y. Ito, S. Harada, M. Tagawa, T. Ujihara"

    Cryst. Growth Des.   Vol. 17   page: 2379-2385   2017

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    DOI: DOI: 10.1021/acs.cgd.6b01710

  89. Phase transition process in DDAB supported lipid bilayer

    "T. Isogai, S. Nakada, N. Yoshida, H. Sumi, R. Tero, S. Harada, T. Ujihara, M. Tagawa"

    J. Cryst. Growth   Vol. 468   page: 88-92   2017

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    DOI: http://dx.doi.org/10.1016/j.jcrysgro.2016.09.063

  90. Formation of basal plane dislocations introduced by collision of macrosteps on growth surface during sic solution growth

    T. Hori, K. Murayama, S. Harada, S. Xiao, M. Tagawa, T. Ujihara

    Materials Science Forum   Vol. 897   page: 28 - 31   2017

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    The relationship between surface morphology and spatial distribution of basal plane dislocations in 4H-SiC crystal grown by top-seeded solution growth on the C face was investigated by the differential interference microscopy as well as X-ray topography. Basal plane dislocations were generated at the boundaries of the domains with the different macrosteps advance directions. On the other hand, at the area where macrosteps advance to the same directions, BPDs were hardly observed. This results suggest that BPD density can be decreased by the suppression of the collision of macrosteps during the solution growth on the C face controlling the surface morphology.

    DOI: 10.4028/www.scientific.net/MSF.897.28

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  91. Solvent design for high-purity SiC solution growth

    Shunta Harada, Goki Hatasa, Kenta Murayama, Tomohisa Kato, Miho Tagawa, Toru Ujihara

    Materials Science Forum   Vol. 897   page: 32 - 35   2017

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    Language:English   Publishing type:Research paper (international conference proceedings)   Publisher:Trans Tech Publications Ltd  

    In order to design a solvent for high-purity SiC solution growth, the impurity incorporation and the carbon solubility of various solvent materials have been investigated. Among the transition metal elements, the impurity elements of Cr, Ti, V and Hf are more readily incorporate during the solution growth than the other transition metal elements. The thermodynamic calculation revealed that the Y-Si solvent has relatively large carbon solubility, which is comparable to the Cr-Si and Ti-Si solvents often used in the solution growth of bulk SiC crystals. From these results, the Y-Si solvent is expected to be a suitable solvent for the high-purity SiC solution growth. Furthermore, we have demonstrated that the Y-Si solvent can achieve lower incorporation of metal impurity in the grown crystal than the Cr-Si solvent maintaining the growth rate.

    DOI: 10.4028/www.scientific.net/MSF.897.32

    Scopus

  92. Sic solution growth on si face with extremely low density of threading screw dislocations for suppression of polytype transformation

    K. Murayama, T. Hori, S. Harada, S. Xiao, M. Tagawa, T. Ujihara

    Materials Science Forum   Vol. 897   page: 24 - 27   2017

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    In order to achieve a high-quality SiC crystal in solution growth, one of the most difficult issues is to grow a thick layer on Si face avoiding polytype transformation. In this case, two-dimensional nucleation, which leads to the polytype transformation, is frequently induced because a density of threading screw dislocations acting as a source of spiral step decreases and wide terraces form by step bunching as growth proceeds. Therefore, it is very difficult to stabilize the polytype of crystals grown with extremely low density of threading screw dislocations. In this study, we tried to overcome these problems by using specially designed seed crystal and optimizing growth temperature and temperature distribution. We successfully grew thick low-threading-dislocation density SiC crystal without polytype transformation under the condition of high growth temperature and homogeneous temperature distribution.

    DOI: 10.4028/www.scientific.net/MSF.897.24

    Scopus

  93. Plasmonic Heating-Assisted Laser-Induced Crystallization from a NaClO3 Unsaturated Mother Solution

    "H. Niinomi, T. Sugiyama, M. Tagawa, M. Maruyama, T. Ujihara, T. Omatsu, Y. Mori"

    Cryst. Growth Des.     2016.12

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    DOI: doi:10.1021/acs.cgd.6b01657

  94. Plasmonic Heating-Assisted Laser-Induced Crystallization from a NaClO3 Unsaturated Mother Solution

    H. Niinomi, T. Sugiyama, M. Tagawa, M. Maruyama, T. Ujihara, T. Omatsu, Y. Mori

    Cryst. Growth Des.     2016.12

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    DOI: 10.1021/acs.cgd.6b01657

  95. Analysis of the carbon transport near the growth interface with respect to the rotational speed of the seed crystal during top-seeded solution growth of SiC

    Tomonori Umezaki, Daiki Koike, Shunta Harada, Toru Ujihara

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 55 ( 12 ) page: 125601   2016.12

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    Publishing type:Research paper (scientific journal)   Publisher:IOP PUBLISHING LTD  

    One of the most important issues of SiC solution growth is to increase the growth rate. In our previous study, we reported that increasing the rotational speed of the seed crystal is effective for improving the growth rate in top-seeded solution growth. In the present study, we investigated the origin of the growth rate improvement through a continuous fluid dynamics simulation with a full-scale three-dimensional model of the experimental setup for actual growth experiment. The numerical results indicated that the stagnant layer above the growth interface decreased in thickness and the carbon concentration gradient then became steep with an increase in the rotational speed of the seed crystal. The experimental growth rate was proportional to the calculated carbon concentration gradient, which indicates that the carbon diffusion through the stagnant layer is the rate-determining process. (C) 2016 The Japan Society of Applied Physics

    DOI: 10.7567/JJAP.55.125601

    Web of Science

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  96. Conversion Behavior of Threading Screw Dislocations on C Face with Different Surface Morphology During 4H-SiC Solution Growth

    Xiao Shiyu, Harada Shunta, Murayama Kenta, Tagawa Miho, Ujihara Toru

    CRYSTAL GROWTH & DESIGN   Vol. 16 ( 11 ) page: 6436 - 6439   2016.11

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    Publishing type:Research paper (scientific journal)   Publisher:Crystal Growth and Design  

    DOI: 10.1021/acs.cgd.6b01107

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  97. Conversion behavior of threading screw dislocations on C face with different surface morphology during 4H-SiC solution growth

    "S. Xiao, S. Harada, K. Murayama, M. Tagawa, T. Ujihara"

    Cryst. Growth Des.     page: 6436–6439   2016.10

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    DOI: doi:10.1021 / acs.cgd.6b01107

  98. Conversion behavior of threading screw dislocations on C face with different surface morphology during 4H-SiC solution growth

    S. Xiao, S. Harada, K. Murayama, M. Tagawa, T. Ujihara

    Cryst. Growth Des.     page: 6436–6439   2016.10

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  99. Characterization of V-Shaped Defects Formed during the 4H-SiC Solution Growth by Transmission Electron Microscopy and X-ray Topography Analysis

    Xiao Shiyu, Harada Shunta, Murayama Kenta, Ujihara Toni

    CRYSTAL GROWTH & DESIGN   Vol. 16 ( 9 ) page: 5136 - 5140   2016.9

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    Publishing type:Research paper (scientific journal)   Publisher:Crystal Growth and Design  

    DOI: 10.1021/acs.cgd.6b00711

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  100. Characterization of V-shaped defects formed during the 4H-SiC solution growth by transmission electron microscopy and X-ray topography analysis

    "S. Xiao, S. Harada, K. Murayama, T. Ujihara"

    Cryst. Growth Des.   Vol. 16 ( 9 ) page: 5136-5140   2016.7

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  101. Enantioselective amplification on circularly polarized laser-induced chiral nucleation from a NaClO 3 solution containing Ag nanoparticles

    "H. Niinomi, T. Sugiyama, M. Tagawa, K. Murayama, S. Harada, T. Ujihara"

    CrystEngComm   Vol. 18 ( 39 ) page: 7441-7448   2016.7

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    DOI: doi: 10.1039/c6ce01464j

  102. Characterization of V-shaped defects formed during the 4H-SiC solution growth by transmission electron microscopy and X-ray topography analysis

    S. Xiao, S. Harada, K. Murayama, T. Ujihara

    Cryst. Growth Des.   Vol. 16 ( 9 ) page: 5136-5140   2016.7

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  103. Enantioselective amplification on circularly polarized laser-induced chiral nucleation from a NaClO 3 solution containing Ag nanoparticles

    H. Niinomi, T. Sugiyama, M. Tagawa, K. Murayama, S. Harada, T. Ujihara

    CrystEngComm   Vol. 18 ( 39 ) page: 7441-7448   2016.7

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  104. High-Speed Solution Growth of Single Crystal AlN from Cr-Co-Al Solvent Reviewed

    Shota Watanabe, Masashi Nagaya, Yukihisa Takeuchi, Kenta Aoyagi, S. Harada, Miho Tagawa, Toru Ujihara

    Materials Science Forum   Vol. 858   page: 1210-1213   2016.5

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    DOI: doi:10.4028/www.scientific.net/MSF.858.1210

  105. Spatial Distribution of Carrier Concentration in 4H-SiC Crystal Grown by Solution Method Reviewed

    Zhen Jiang Wang, Takahiko Kawaguchi, Kenta Murayama, Kenta Aoyagi, S. Harada, Miho Tagawa, Takenobu Sakai, Tomohisa Kato, Toru Ujihara

    Materials Science Forum   Vol. 858   page: 57-60   2016.5

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    DOI: doi:10.4028/www.scientific.net/MSF.858.57

  106. Effect of magnesium ion concentration on two-dimensional structure of DNA-functionalized nanoparticles on supported lipid bilayer Reviewed

    Takumi Isogai, Eri Akada, Sakiko Nakada, Naoya Yoshida, Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 55 ( 3 ) page: 03DF11   2016.3

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    The effect of divalent cations on lipid-bilayer-assisted DNA-functionalized nanoparticle (DNA-NP) assembly has been studied. We previously reported the lateral diffusion of DNA-NPs on planar lipid bilayer patches, owing to the mobility of lipid molecules in a supported lipid bilayer (SLB), and the resultant two-dimensional (2D) assembly of DNA-NPs. We here report the structural change of the assembled 2D DNA-NP lattices by magnesium ion concentration control on a successfully formed uniform SLB. In the magnesium-free buffer solution, DNA-NPs on SLB loosely assembled into quasi-hexagonal ordered lattices. In buffer solution containing 1mM magnesium acetate, the interparticle distance of DNA-NPs decreased and the lattice structure became disordered. In buffer solution containing 5mM magnesium acetate, the structure of DNA-NP arrays changed markedly and square lattices appeared. It is suggested that magnesium ions affected DNA molecules, which linked nanoparticles, and enabled the control of the structure of DNA-NP 2D arrays. (C) 2016 The Japan Society of Applied Physics

    DOI: 10.7567/JJAP.55.03DF11

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  107. Polytype control by activity ratio of silicon to carbon during SiC solution growth using multicomponent solvents Reviewed

    Atsushi Horio, Shunta Harada, Daiki Koike, Kenta Murayama, Kenta Aoyagi, Takenobu Sakai, Miho Tagawa, Toru Ujihara

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 55 ( 1 ) page: 01AC01   2016.1

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    We report on the relationship between grown polytypes and the activity ratio of silicon to carbon during SiC solution growth using multicomponent solvents. From the thermodynamic calculation as well as crystallization experiments, we revealed that a high activity ratio (a(Si)/a(C)) in the solution leads to the growth of low-hexagonality polytypes, and low a(Si)/a(C) results in the growth of high-hexagonality polytypes. 4H-SiC is stable when a(Si)/a(C) is relatively low (similar to 10(1) > a(Si)/a(C)), 3C-SiC is stable when a(Si)/a(C) is relatively high (similar to 10(4) < a(Si)/a(C)), and 6H-SiC is stable in the intermediate a(Si)/a(C) range (similar to 10(2) < a(Si)/a(C) < similar to 10(3)). From these results, the Cr-Si solvent at high temperatures is expected to be suitable for 4H-SiC growth, and Sc-Si and Fe-Si solvents at relatively low temperatures are expected to be suitable for 3C-SiC growth. (C) 2016 The Japan Society of Applied Physics

    DOI: 10.7567/JJAP.55.01AC01

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  108. Thin film growth of CaFe2As2 by molecular beam epitaxy Reviewed

    T. Hatano, T. Kawaguchi, R. Fujimoto, I. Nakamura, Y. Mori, S. Harada, T. Ujihara, H. Ikuta

    SUPERCONDUCTOR SCIENCE & TECHNOLOGY   Vol. 29 ( 1 ) page: 015013   2016.1

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    Film growth of CaFe2As2 was realized by molecular beam epitaxy on six different substrates that have a wide variation in the lattice mismatch to the target compound. By carefully adjusting the Ca-to-Fe flux ratio, we obtained single-phase thin films for most of the substrates. Interestingly, an expansion of the CaFe2As2 lattice to the out-of-plane direction was observed for all films, even when an opposite strain was expected. A detailed microstructure observation of the thin film grown on MgO by transmission electron microscope revealed that it consists of cube-on-cube and 45 degrees-rotated domains. The latter domains were compressively strained in plane, which caused a stretching along the c-axis direction. Because the domains were well connected across the boundary with no appreciable discontinuity, we think that the out-of-plane expansion in the 45 degrees-rotated domains exerted a tensile stress on the other domains, resulting in the unexpectedly large c-axis lattice parameter, despite the apparently opposite lattice mismatch.

    DOI: 10.1088/0953-2048/29/1/015013

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  109. Polytype control by activity ratio of silicon to carbon during SiC solution growth using multicomponent solvents Reviewed

    A. Horio, S. Harada, D. Koike, K. Murayama, K. Aoyagi, T. Sakai, M. Tagawa, T. Ujihara

    Japanese Journal of Applied Physics   Vol. 55   page: 01AC01   2016

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    DOI: doi:10.7567/JJAP.55.01AC01

  110. Effect of magnesium ion concentration on two-dimensional structure of DNA-functionalized nanoparticles on supported lipid bilayer Reviewed

    T.Isogai, E. Akada, S. Nakada, N. YOshida, R. Tero,S. Harada, T. Ujihara, M. Tagawa

    Japanese Journal of Applied Physics   Vol. 55   page: 03DF11   2016

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    DOI: doi:10.7567/JJAP.55.03DF11

  111. Enantioselective amplification on circularly polarized laser-induced chiral nucleation from a NaClO3 solution containing Ag nanoparticles

    "H. Niinomi, T. Sugiyama, M. Tagawa, M. Maruyama, S. Harada, T. Ujihara"

    CrystEngComm   Vol. 18   page: 7441-7448   2016

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  112. Analysis of the carbon transport near the growth interface with respect to the rotational speed of the seed crystal during top-seeded solution growth of SiC

    "T. Umezaki, D. Koike, S. Harada, T. Ujihara"

    Japanese Journal of Applied Physics   Vol. 55 ( 12 ) page: 125601   2016

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  113. Two-step SiC solution growth for dislocation reduction

    "K. Murayama, T. Hori, S. Harada, S. Xiao, M. Tagawa, T. Ujihara"

    J. Cryst. Growth     2016

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    DOI: http://dx.doi.org/10.1016/j.jcrysgro.2016.11.100

  114. Morphology of AlN whiskers grown by reacting N 2 gas and Al vapor

    "M. Matsumoto, H. Saitou, Y. Takeuchi, S. Harada, M. Tagawa, T. Ujihara"

    J. Cryst. Growth     2016

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    DOI: doi:10.1016/j.jcrysgro.2016.11.127

  115. Enantioselective amplification on circularly polarized laser-induced chiral nucleation from a NaClO3 solution containing Ag nanoparticles

    H. Niinomi, T. Sugiyama, M. Tagawa, K. Murayama, S. Harada, T. Ujihara

    CRYSTENGCOMM   Vol. 18 ( 39 ) page: 7441 - 7448   2016

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    Publishing type:Research paper (scientific journal)   Publisher:ROYAL SOC CHEMISTRY  

    We demonstrate that a statistically-significant chiral bias in NaClO3 chiral crystallization can be provoked by inducing nucleation via the optical trapping of Ag nano-aggregates using a continuous wave visible circularly polarized laser (lambda = 532 nm). The laser was focused at the interface between air and an unsaturated NaClO3 aqueous solution containing Ag nanoparticles. The "dominant" enantiomorph was switchable by changing the handedness of the incident circularly polarized laser, indicating that the chiral bias is enantio-selective. Moreover, it has been found that the resulting crystal enantiomeric excess (CEE) reached approximately 25%. The CEE is much higher than the typical enantiomeric excess (EE) in the asymmetric photosynthesis of organic compounds ranging from 0.5 to 2%. The efficient induction of the nucleation and the large chiral bias imply the contribution of localized surface plasmon resonance of the Ag nanoaggregates to chiral nucleation. Our method has potential to offer the benefit for studies on the spatiotemporal nucleation control, optical resolution of chiral compounds and biohomochirality.

    DOI: 10.1039/c6ce01464j

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  116. Proposal of visible-light photoemmision spectroscopy for the evaluation of conduction band in semiconductors

    Ujihara Toru, Ichihashi Fumiaki, Dong Xinyu, Inoue Akito, Kawaguchi Takahiko, Kuwahara Makoto, Ito Takahiro, Harada Shunta, Tagawa Miho

    Abstract of annual meeting of the Surface Science of Japan   Vol. 36 ( 0 ) page: 338 - 338   2016

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    Language:Japanese   Publishing type:Research paper (scientific journal)   Publisher:The Surface Science Society of Japan  

    DOI: 10.14886/sssj2008.36.0_338

    CiNii Research

  117. Spatial distribution of carrier concentration in 4H-SiC crystal grown by solution method Reviewed

    Zhen Jiang Wang, Takahiko Kawaguchi, Kenta Murayama, Kenta Aoyagi, Shunta Harada, Miho Tagawa, Takenobu Sakai, Tomohisa Kato, Toru Ujihara

    Materials Science Forum   Vol. 858   page: 57 - 60   2016

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    We investigated the spatial distribution of carrier concentration in n-type 4H-SiC grown by the solution method using the peak frequency of the longitudinal optical phonon-plasmon coupled (LOPC) mode of the Raman spectra on the surface. The carrier concentration at the position of the smooth terrace was higher than the carrier concentration at the position where the macrosteps were formed. This indicates the nitrogen incorporation efficiently occurs on the smooth surface where the density of macrosteps is relatively low. The different incorporation of nitrogen depending on the surface morphology can be understood from the view point of the adsorption time of impurity on the terrace. The present result implies that the uniform surface morphology is necessary to achieve uniform doping concentration in SiC crystal.

    DOI: 10.4028/www.scientific.net/MSF.858.57

    Scopus

  118. High-speed solution growth of single crystal AlN from Cr-Co-Al solvent Reviewed

    Shota Watanabe, Masashi Nagaya, Yukihisa Takeuchi, Kenta Aoyagi, Shunta Harada, Miho Tagawa, Toru Ujihara

    Materials Science Forum   Vol. 858   page: 1210 - 1213   2016

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    We achieved high-speed solution growth of AlN single crystal from Cr-Co-Al solvent, which was designed on the basis of thermodynamic calculation. To avoid the unintentional precipitations at the interface between solution and gas as well as to increase the growth rate, we designed the solution growth condition, in which the solution near the interface is undersaturated and the solution near the growth position is supersaturated. To realize this kind of ideal condition, we selected Co and Cr as solvent materials due to their high affinity with nitrogen or aluminum. Finally, we achieved a growth rate as high as 200 μm/h in maximum.

    DOI: 10.4028/www.scientific.net/MSF.858.1210

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  119. Measurement of energy distribution of conduction electrons in superlattice by visible-light photoemission spectroscopy

    Ichihashi F.

    2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015     2015.12

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    Publishing type:Research paper (scientific journal)   Publisher:2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015  

    DOI: 10.1109/PVSC.2015.7356192

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  120. Non-uniform electrodeposition of zinc on the (0001) plane

    Mitsuhashi Takato, Ito Yasumasa, Takeuchi Yukihisa, Harada Shunta, Ujihara Toru

    THIN SOLID FILMS   Vol. 590   page: 207 - 213   2015.9

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    Publishing type:Research paper (scientific journal)   Publisher:Thin Solid Films  

    DOI: 10.1016/j.tsf.2015.07.068

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  121. Effect of aluminum addition on the surface step morphology of 4H-SiC grown from Si-Cr-C solution

    Takeshi Mitani, Naoyoshi Komatsu, Tetsuo Takahashi, Tomohisa Kato, Shunta Harada, Toru Ujihara, Yuji Matsumoto, Kazuhisa Kurashige, Hajime Okumura

    JOURNAL OF CRYSTAL GROWTH   Vol. 423   page: 45 - 49   2015.8

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:ELSEVIER SCIENCE BV  

    For the solution growth of 4H-SiC with Si1-xCrx solvents, the change in surface step structure by 4 at% Al addition to the solvent was investigated. Without Al addition, step bunching resulted in the formation of giant macrosteps with height greater than several micrometers, and trench-like surface defects formed with solvent inclusion. The edge of the giant macrosteps composing trench-like defects was faceted into low-index facet planes, (1 (1) over bar 0m) (m=1-4). The formation of the trench-like surface defects is considered to originate from the self-pinning of macrosteps owing to the step-faceting phenomenon, which facilitates further development of macrosteps. On the other hand, the addition of Al to the solvents significantly improved the surface roughening, and suppressed the formation of the trench-like surface defects. In this case, smaller bunched steps with heights from several nanometers to about 10 nm formed on the terraces of the macrosteps, while regularly arranged trains of unit-cell-size steps formed on the terrace of macrosteps in growth without Al addition. The decrease in step stiffness might be a possible cause for the formation of the smaller bunched steps on the terrace in growth with Al addition. (C) 2015 Elsevier B.V. All rights reserved.

    DOI: 10.1016/j.jcrysgro.2015.04.032

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  122. "Effect of aluminum addition on the surface step morphology of 4H-SiC grown from Si-Cr-C solution" Reviewed

    Takeshi Mitani, Naoyoshi Komatsu, Tetsuo Takahashi, Tomohisa Kato, Shunta Harada, Toru Ujihara, Yuji Matsumoto, Kazuhisa Kurashige, Hajime Okumura

    Journal of Crystal Growth   Vol. 423   page: 45–49   2015.8

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    DOI: doi:10.1016/j.jcrysgro.2015.04.032

  123. Non-uniform electrodeposition of zinc on the (0001) plane Reviewed

    T. Mitsuhashi, Y. Ito, Y. Takeuchi, S. Harada,T. Ujihara

    Thin Solid Films   Vol. 590   page: 207-213   2015.6

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  124. Non-uniform electrodeposition of zinc on the (0001) plane Reviewed

    T. Mitsuhashi, Y. Ito, Y. Takeuchi, S. Harada, T. Ujihara

    Thin Solid Films   Vol. 590   page: 207-213   2015.6

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  125. Dislocation conversion during sic solution growth for high-quality crystals Reviewed

    Shunta Harada, Yuji Yamamoto, Shi Yu Xiao, Daiki Koike, Takuya Mutoh, Kenta Murayama, Kenta Aoyagi, Takenobu Sakai, Miho Tagawa, Toru Ujihara

    Materials Science Forum   Vol. 821-823   page: 3 - 8   2015

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    Solution growth of SiC has attracted significant attention due to its potential for the production of high-quality SiC wafers. We have recently investigated the dislocation propagation behavior during SiC solution growth with the aim of reducing the dislocation density. Threading dislocations were found to be converted to defects on the basal planes during solution growth. Utilizing this dislocation conversion phenomenon, we have proposed a dislocation reduction process during solution growth and achieved high-quality 4H-SiC crystal growth. Here we confirm the potential of SiC solution growth for the production of high-quality SiC wafers.

    DOI: 10.4028/www.scientific.net/MSF.821-823.3

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  126. Control of interface shape by non-axisymmetric solution convection in top-seeded solution growth of SiC crystal Reviewed

    Daiki Koike, Tomonori Umezaki, Kenta Murayama, Kenta Aoyagi, Shunta Harada, Miho Tagawa, Takenobu Sakai, Toru Ujihara

    Materials Science Forum   Vol. 821-823   page: 18 - 21   2015

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    We achieved the convex growth interface shape in top-seeded solution growth of SiC applying non-axisymmetric solution convection induced by non-axisymmetric temperature distribution. The detailed solution flow, temperature distribution and carbon concentration distribution were calculated by 3-dimensional numerical analysis. In the present case, the solution flow below the crystal was unidirectional and the supersaturation was increased along the solution flow direction. By the rotation of the crystal in the unidirectional flow and the temperature distribution, we successfully obtained the crystal with the convex growth interface shape.

    DOI: 10.4028/www.scientific.net/MSF.821-823.18

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  127. Improvement of surface morphology by solution flow control in solution growth of SiC on off-axis seeds Reviewed

    Tomonori Umezaki, Daiki Koike, Shunta Harada, Toru Ujihara

    Materials Science Forum   Vol. 821-823   page: 31 - 34   2015

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    The solution growth of SiC on an off-axis seed is effective on the reduction of threading dislocations. We proposed a novel method to grow a SiC crystal on an off-axis seed by top-seeded solution growth (TSSG). In our previous study, a unidirectional solution flow above a seed crystal is effective to suppress surface roughness in the growth on the off-axis seed. However, it is difficult to apply the unidirectional flow in an axisymmetric TSSG set-up. In this study, the unidirectional flow could be achieved by shifting the rotational axis away from the center of the seed crystal. As a result, the smooth surface was obtained in the wider area where the solution flow direction was opposite to the step-flow direction.

    DOI: 10.4028/www.scientific.net/MSF.821-823.31

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  128. Research on solvent composition for different surface morphology on C face during 4H-SiC solution growth Reviewed

    Shi Yu Xiao, Natsumi Hara, Shunta Harada, Kenta Murayama, Kenta Aoyagi, Takenobu Sakai, Toru Ujihara

    Materials Science Forum   Vol. 821-823   page: 39 - 42   2015

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    Surface morphology of the SiC crystal grown on the C face of the 4H-SiC seed crystal by TSSG method using pure Si, Si-1at%Ti-C, Si-5at%Ti-C and Si-20at%Ti-C solvents was investigated. The surface morphology of the crystal grown from pure Si solvent was smooth. By the addition of Ti to the solvent, the surface morphology became rougher. The RMS value is not proportional to the concentration of Ti. The formation of macrosteps with several micrometers was observed when the addition of Ti increased to 5at% indicating the possibility of the threading screw dislocation conversion on the C face of the 4H-SiC crystal.

    DOI: 10.4028/www.scientific.net/MSF.821-823.39

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  129. 3C-SiC crystal on sapphire by solution growth method Reviewed

    Kenji Shibata, Shunta Harada, Toru Ujihara

    Materials Science Forum   Vol. 821-823   page: 185 - 188   2015

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    We realized the growth of 3C-SiC crystal on sapphire by solution growth method. The carbon deposition on a sapphire substrate before growth is the key point for this technology. This carbon layer plays a role to protect the dissolution of sapphire by Si solvent. 3C-SiC was grown on the whole surface of the sapphire substrate and some of the film was 3C-SiC single crystal. Surprisingly, the 3C-SiC layer did not directly grown on the sapphire substrate. The single crystal 3C-SiC layer formed by the reaction between the deposited carbon and the Si wafer that is a solvent material below the melting point of silicon during heating process before the growth. The 3C-SiC grew on Sapphire substrate. In this process, the deposited carbon play another important role.

    DOI: 10.4028/www.scientific.net/MSF.821-823.185

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  130. Thin film growth of CaFe2As2 by molecular beam epitaxy Reviewed

    T. Hatano, T. Kawaguchi, R. Fujimoto, I. Nakamura, Y. Mori, S. Harada, T. Ujihara and H. Ikuta

    Superconductor Science and Technology   Vol. 29   page: 015013   2015

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    DOI: doi:10.1088/0953-2048/29/1/015013

  131. Measurement of Energy Distribution of Conduction Electrons in Superlattice by Visible-Light Photoemission Spectroscopy

    Ichihashi Fumiaki, Nishitani Kenji, Dong Xinyu, Kawaguchi Takahiko, Kuwahara Makoto, Ito Takahiro, Harada Shunta, Tagawa Miho, Ujihara Tofu

    2015 IEEE 42ND PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC)     2015

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  132. Measurement of Energy Distribution of Conduction Electrons in Superlattice by Visible-Light Photoemission Spectroscopy Reviewed

    Fumiaki Ichihashi, Kenji Nishitani, Xinyu Dong, Takahiko Kawaguchi, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Miho Tagawa, Tofu Ujihara

    2015 IEEE 42ND PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC)     2015

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    Visible-light photoemission spectroscopy (VPS) is a novel angle-resolved photoemission spectroscopy developed by us for measuring conduction electrons emitted from a surface with negative electron affinity state. In this study, InGaAs/GaAsP quantum well superlattice was analyzed by the VPS method with changing the excitation photon energy. By comparing with comparison of the energy distribution curves obtained by different excitation energy, the first and second conduction mini-band structures were directly clarified.

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  133. Dislocation Conversion during SiC Solution Growth for High-quality Crystals Reviewed

    原田 俊太

    Materials Forum   Vol. N/A   2015

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  134. Different behavior of threading edge dislocation conversion during the solution growth of 4H-SiC depending on the Burgers vector

    Shunta Harada, Yuji Yamamoto, Kazuaki Seki, Atsushi Horio, Miho Tagawa, Toru Ujihara

    ACTA MATERIALIA   Vol. 81   page: 284 - 290   2014.12

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    Threading edge dislocation (TED) conversion during the solution growth of SiC was investigated by synchrotron X-ray topography. TEDs were converted to basal plane dislocations by lateral growth with the advance of macrosteps on the growth surface during the solution growth. TEDs with the Burgers vector parallel to the step-flow direction were converted to basal plane dislocations with a high probability. On the other hand, the conversion ratio of TEDs whose Burgers vector is not parallel to the step-flow direction was much lower. The variation in elastic energy of the basal plane dislocations after the conversion depending on the Burgers vectors led to the different behavior of TED conversion. (C) 2014 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

    DOI: 10.1016/j.actamat.2014.08.027

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  135. Electrostatic acceleration of helicon plasma using a cusped magnetic field

    Harada S., Baba T., Uchigashima A., Yokota S., Iwakawa A., Sasoh A., Yamazaki T., Shimizu H.

    APPLIED PHYSICS LETTERS   Vol. 105 ( 19 )   2014.11

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    DOI: 10.1063/1.4900423

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  136. Forming two-dimensional structure of DNA-functionalized Au nanoparticles via lipid diffusion in supported lipid bilayers

    Takumi Isogai, Agnes Piednoir, Eri Akada, Yuki Akahoshi, Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

    JOURNAL OF CRYSTAL GROWTH   Vol. 401   page: 494 - 498   2014.9

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    Two-dimensional (2D) form of DNA-functionalized gold nanoparticles (DNA-AuNPs) has been studied. To confine the DNA-AuNPs in 2D space, we utilized the strong affinity between DNA molecules and supported lipid bilayers (SLBs). DNA-AuNPs adsorbed onto cationic SLB consisting of Dimethyl dioctadecyl ammonium bromide (DDAB) on mica substrate with high affinity. Owing to the high mobility of lipid molecules, 2D diffusion and transportation of DNA-AuNPs on the SLB was achieved. Using AFM imaging we confirmed a selective adsorption of DNA-AuNPs onto cationic lipid bilayer patches on mica surface, and then we confirmed a drastic formation change of DNA-AuNPs on the SLB with annealing. We observed that the DNA-AuNPs assembled into a densely packed single layered 2D superstructure through DNA hybridization. (C) 2014 Elsevier B.V. All rights reserved.

    DOI: 10.1016/j.jcrysgro.2014.01.032

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  137. The investigation of step structure with different TSDs conversion behavior during 4H-SiC solution growth

    Xiao Shiyu, Hara Natsumi, Harada Shunta, Ujihara Toru

    JSAP Annual Meetings Extended Abstracts   Vol. 2014.2 ( 0 ) page: 3317 - 3317   2014.9

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    DOI: 10.11470/jsapmeeting.2014.2.0_3317

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  138. Defect evolution in high-quality 4H-SiC grown by solution method

    Harada, S; Tagawa, M; Ujihara, T

    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES   Vol. 70   page: C1415 - C1415   2014.8

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    DOI: 10.1107/S2053273314085842

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  139. Defect evolution in high-quality 4H-SiC grown by solution method

    Harada S, Tagawa M, Ujihara T

    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES   Vol. 70   page: C1415 - C1415   2014.8

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  140. Emergence and Amplification of Chirality via Achiral-Chiral Polymorphic Transformation in Sodium Chlorate Solution Growth

    Hiromasa Niinomi, Hitoshi Miura, Yuki Kimura, Makio Uwaha, Hiroyasu Katsuno, Shunta Harada, Toru Ujihara, Katsuo Tsukamoto

    CRYSTAL GROWTH & DESIGN   Vol. 14 ( 7 ) page: 3596 - 3602   2014.7

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    Chiral symmetry breaking during the chiral crystallization from a sodium chlorate (NaClO3) aqueous solution is an intriguing phenomenon because it provides insights into the prebiotic process of biohomochirality. However, a mechanism of the emergence and amplification of chirality remains controversial, especially for crystallization from highly supersaturated solution, and one of the hypotheses proposed before is a transition toward the homochiral state during the early stages of crystallization. In this contribution, we directly examined the early stage of crystallization by in situ polarized-light microscopy. The observation revealed that achiral crystals, which appear prior to the formation of chiral crystals, transform to the chiral crystal through two kinds of polymorphic transformations: (1) martensitic transformation (MT) and (2) solution-mediated phase transition (SMPT). The SMPT is remarkably facilitated by contact with a chiral crystal. Notably, the resulting enantiomorph through contact-facilitated SMPT is strongly directed by the contacting enantiomorph. In contrast, the MT yields two enantiomorphs in equal probability. The emergence and amplification of chirality has generally been considered to be a result of direct nucleation of a chiral crystal and its fragmentation. In contrast, our observations provide a possibility that the MT and contact-facilitated SMPT play a role for the emergence and amplification of chirality, respectively.

    DOI: 10.1021/cg500527t

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  141. Low-dislocation-density 4H-SiC crystal growth utilizing dislocation conversion during solution method Reviewed

    Yuji Yamamoto, Shunta Harada, Kazuaki Seki, Atsushi Horio, Takato Mitsuhashi, Daiki Koike, Miho Tagawa, Toru Ujihara

    APPLIED PHYSICS EXPRESS   Vol. 7 ( 6 ) page: 065501   2014.6

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    We report a marked reduction in the dislocation density of a 4H-SiC crystal using a high-efficiency dislocation conversion phenomenon. During the solution growth, threading dislocations were efficiently converted to basal plane defects by the step flow of macrosteps. Utilizing this dislocation conversion phenomenon, we achieved the marked reduction of threading dislocation density. Consequently, the threading screw dislocation density was only 30 cm(-2), which was two orders of magnitude lower than that of the seed crystal. The 4H-SiC polytype of the seed crystal was replicated in the grown crystal, which was attributed to the spiral growth owing to a few remaining threading screw dislocations upstream of the step flow. (C) 2014 The Japan Society of Applied Physics

    DOI: 10.7567/APEX.7.065501

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  142. Solubility measurement of a metastable achiral crystal of sodium chlorate in solution growth

    Hiromasa Niinomi, Atsushi Horio, Shunta Harada, Toru Ujihara, Hitoshi Miura, Yuki Kimura, Katsuo Tsukamoto

    JOURNAL OF CRYSTAL GROWTH   Vol. 394   page: 106 - 111   2014.5

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    The solubility of the metastable achiral monoclinic phase in NaClO3 crystallization from an aqueous solution, which appears prior to the nucleation of chiral crystals, was successfully measured in the range from 10 degrees C to 23 degrees C. Antisolvent crystallization method was used to obtain metastable crystals for the measurement. The solubility was determined to be about 1.6 times higher than that of the chiral stable cubic phase by observing growth or dissolution of the crystal in aqueous solution at the temperature and concentration of which is predetermined. (C) 2014 Elsevier B.V. All rights reserved.

    DOI: 10.1016/j.jcrysgro.2014.02.034

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  143. Nitrogen doping of 4H-SiC by the top-seeded solution growth technique using Si-Ti solvent

    Kazuhiko Kusunoki, Kazuhito Kamei, Kazuaki Seki, Shunta Harada, Toru Ujihara

    Journal of Crystal Growth   Vol. 392   page: 60 - 65   2014.4

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    The nitrogen doping behavior of 4H-SiC was investigated by the top-seeded solution growth technique using Si-Ti solvent. Growth experiments were performed under a mixed gas of helium and nitrogen at atmospheric pressure at 1940°C, in which nitrogen content ranged between 0.17 and 0.5 vol%. The electrical property and structural quality of nitrogen-doped crystals were examined. The nitrogen doping level increased with the increase of nitrogen content in the growth furnace. The most heavily nitrogen-doped SiC with a concentration of 1.1×1020 cm-3 was obtained
    however, stacking faults (SFs) were abruptly generated above a nitrogen concentration of 3.0×1019 cm-3. The lowest resistivity of approximately 0.010 Ω cm was obtained with SFs-free. Based on the both undoped and nitrogen-doped growth experimental results, the nitrogen incorporation behavior by employing our solution growth technique was discussed. © 2014 Elsevier B.V. All rights reserved.

    DOI: 10.1016/j.jcrysgro.2014.01.044

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  144. Increase in the Growth Rate by Rotating the Seed Crystal at High Speed during the Solution Growth of SiC Reviewed

    T. Umezaki, D. Koike, A. Horio, S. Harada, and T. Ujihara

    Materials Science Forum   Vol. 778-780   page: 63-66   2014.1

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    DOI: 10.4028/www.scientific.net/MSF.778-780.63

  145. Surface Morphology and Threading Dislocation Conversion Behavior during Solution Growth of 4H-SiC Using Al-Si Solvent Reviewed

    S. Harada, Y. Yamamoto, S. Xiao, M. Tagawa, and T. Ujihara

    Materials Science Forum   Vol. 778-780   page: 67-70   2014.1

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    DOI: 10.4028/www.scientific.net/MSF.778-780.67

  146. "Direct measurement of conduction miniband structure in superlattice by visible-light photoemission spectroscopy"

    F. Ichihashi, D. Shimura, K. Nishitani, T. Kawaguchi, M. Kuwahara, T. Ito, S. Harada, H. Katsuno, M. Tagawa, T.Ujihara

    Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th , 8-13 June 2014     page: 2882-2885   2014

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    DOI: DOI:10.1109/PVSC.2014.6925534

  147. Different behavior of threading edge dislocation conversion during the solution growth of 4H-SiC depending on the Burgers vector Reviewed

    S. Harada, Y. Yamamoto, K. Seki, A. Horio, M. Tagawa, T. Ujihara

    Acta Materialia   Vol. 81   page: pp. 284-290   2014

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    DOI: DOI: 10.1016/j.actamat.2014.08.027

  148. Direct Measurement of Conduction Miniband Structure in Superlattice by Visible-Light Photoemission Spectroscopy

    Ichihashi Fumiaki, Shimura Daiki, Nishitani Kenji, Kawaguchi Takahiko, Kuwahara Makoto, Ito Takahiro, Harada Shunta, Katsuno Hiroyasu, Tagawa Miho, Ujihara Tofu

    2014 IEEE 40TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC)     page: 2882 - 2885   2014

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  149. Direct Measurement of Conduction Miniband Structure in Superlattice by Visible-Light Photoemission Spectroscopy

    Fumiaki Ichihashi, Daiki Shimura, Kenji Nishitani, Takahiko Kawaguchi, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Hiroyasu Katsuno, Miho Tagawa, Tofu Ujihara

    2014 IEEE 40TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC)     page: 2882 - 2885   2014

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    We have proposed a novel angle-resolved photoemission spectroscopy to measure the conduction electrons emitted from a surface with negative electron affinity state. We call this method visible-light photoemission spectroscopy (VPS). In the present study, the conduction miniband structure formed in a superlattice was evaluated by the VPS method. As a result, we succeeded to obtain the dispersion of the miniband. In addition, the effective mass of the miniband was quantitatively determined from the observed dispersion. Therefore, we believe that VPS is a quite powerful tool for the evaluation of intermediate-band solar cells.

    DOI: 10.1109/PVSC.2014.6925534

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  150. Polytype Control in SiC Crystal Growth : Kinetic Polytype Control in 3C-SiC Solution Growth(<Special Issue>Formation and Crystal Growth of Metastable Phases)

    Seki Kazuaki, Harada Shunta, Ujihara Toru

    Journal of the Japanese Association for Crystal Growth   Vol. 40 ( 4 ) page: 253 - 260   2014

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    Silicon carbide forms polytypes due to different stacking arrangements of Si and C. For the use of semiconductor materials, it is necessary to fabricate a single polytype material. In this paper, firstly, determination factors of polytypes are introduced from both experimental and theoretical viewpoints, and the difficulty of the polytype control based on thermal stability is shown. Next, the actual control techniques in sublimation growth method and CVD method are shown to be based on the concept that the polytype sequence of seed crystal continues to the grown crystal. Finally, we propose the kinetic polytype control method based on the growth speed difference among polytypes in SiC solution growth.

    DOI: 10.19009/jjacg.40.4_253

  151. Achiral Metastable Crystals of Sodium Chlorate Forming Prior to Chiral Crystals in Solution Growth

    Hiromasa Niinomi, Tomoya Yamazaki, Shunta Harada, Toru Ujihara, Hitoshi Miura, Yuki Kimura, Takahiro Kuribayashi, Makio Uwaha, Katsuo Tsukamoto

    CRYSTAL GROWTH & DESIGN   Vol. 13 ( 12 ) page: 5188 - 5192   2013.12

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    Chiral symmetry breaking in NaClO3 crystallization from an aqueous solution with perturbations has been of great interest. To understand the mechanism, several models focusing on the early stage of the crystallization have been proposed. However, they are ambiguous because the early stage has been barely explored directly. Here, we investigate the early stages of the crystallization process driven by droplet evaporation using a combination of direct in situ microscopic observations and cryogenic single-crystal XRD experiments. We demonstrate that an achiral crystal having P2(1)/a symmetry, which is newly discovered for a solution growth, first appears in the droplet and then transforms into the chiral crystals. Additionally, determination of the lattice constants by XRD experiments (a = 8.42 angstrom, b = 5.26 angstrom, c = 6.70 angstrom, beta = 109.71 degrees) revealed that the achiral phase should be identical to Phase III (a = 8.78 angstrom, b = 5.17 angstrom, c = 6.83 angstrom, beta = 110 degrees), which is a high-temperature phase from a melt growth of NaClO3. We advocate further assessment of the achiral crystal and a new pathway for the formation of chiral crystals via crystalline phase transition from achiral Phase III.

    DOI: 10.1021/cg401324f

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  152. SiC 結晶成長における多形制御 ~速度論的多形制御法の提案(3C-SiC 溶液成長を例に)~

    関 和明、原田 俊太、宇治原 徹

    日本結晶成長学会誌,   Vol. 40 ( 4 ) page: 253   2013.12

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  153. SiC 結晶成長における多形制御 ~速度論的多形制御法の提案(3C-SiC 溶液成長を例に)~

    関 和明, 原田 俊太, 宇治原 徹

    日本結晶成長学会誌,   Vol. 40 ( 4 ) page: 253   2013.12

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  154. Direct Growth of AlN Single Crystal on Sapphire by Solution Growth Method

    Hiroaki Matsubara, Kohei Mizuno, Yukihisa Takeuchi, Shunta Harada, Yasuo Kitou, Eiichi Okuno, Toru Ujihara

    JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 52 ( 8 ) page: 08JE17   2013.8

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    AlN was directly grown on a sapphire substrate by the solution growth method with the Cu-Si-Al-Ti solvent under a nitrogen gas flow. X-ray diffraction measurements revealed that the grown AlN was single crystal. The AlN layer was epitaxially formed on the sapphire substrate with the orientation relationships: (0001)(AlN) parallel to (0001)(sapphire) and [(1) over bar 100](AlN) parallel to [&lt;(1over bar&gt;120](sapphire). The full widths at half maximum (FWHMs) of X-ray rocking curves for tilt and twist components were 414 and 2031 arcsec, respectively. (C) 2013 The Japan Society of Applied Physics

    DOI: 10.7567/JJAP.52.08JE17

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  155. Influence of solution flow on step bunching in solution growth of SiC crystals

    Can Zhu, Shunta Harada, Kazuaki Seki, Huayu Zhang, Hiromasa Niinomi, Miho Tagawa, Toru Ujihara

    Crystal Growth and Design   Vol. 13 ( 8 ) page: 3691 - 3696   2013.8

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    The control of step bunching by solution flow in 4H-SiC solution growth is proposed. We achieved the solution flow control with the specially designed top-seeded solution growth method as follows: by deviating a seed crystal from the center of a crucible and rotating the crucible in one direction, the solution flow direction was controlled to be parallel or antiparallel to the step-flow direction. After the growth, the widely spaced, accumulated macrosteps were observed and the surface of the grown crystal became rough under the parallel flow. On the other hand, the development of the macrosteps was suppressed under the antiparallel flow. As the growth proceeds, the surface roughness of the growth surface increases under the parallel flow, while the surface roughness decreases under the antiparallel flow. This fact suggests the solution flow control can be an effective method to suppress the step bunching during the solution growth of SiC single crystals. © 2013 American Chemical Society.

    DOI: 10.1021/cg400706u

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  156. Evolution of threading screw dislocation conversion during solution growth of 4H-SiC Reviewed

    S. Harada, Y. Yamamoto, K. Seki, A. Horio, T. Mitsuhashi, M. Tagawa, T. Ujihara

    APL Materials   Vol. 1 ( 2 ) page: 022109   2013.8

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    Evolution of threading screw dislocation (TSD) conversion during the solution growth of 4H-SiC on a vicinal crystal of 4H-SiC(0001) was investigated by synchrotron X-ray topography. Selecting appropriate X-ray wavelength and g vector, we can change the penetration of X-ray, and the dislocation behaviors with the different depth were successfully observed. Evidently TSDs parallel to the c-axis having c-component Burgers vector were changed into defects on the (0001) basal planes with the same Burgers vector as the TSDs, propagating to the [11\\documentclass[12pt]{minimal}\\begin{document}$\\bar{2}$\\ end{document}2̄0] step-flow direction by advancing macrosteps during the solution growth. The TSD conversions stochastically took place during the growth. The conversion rate was almost uniform and finally almost all TSDs were converted to the basal plane defects. The conversion rate was low at the very early stage of the growth, which implies that the macrosteps were not formed at the initial stage of the solution growth. © 2013 Author(s).

    DOI: 10.1063/1.4818357

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  157. Solution growth of an ultra-high quality SiC crystal

    UJIHARA Toru, HAKADA Shunta, YAMAMOTO Yuji, SEKI Kazuaki

    Oyo Buturi   Vol. 82 ( 4 ) page: 326 - 329   2013.4

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    <p>The improvement of the substrate quality is important to apply SiC materials to high-performance power devices. A solution growth method is attracting attention as the technique for "ultra-high quality" crystal growth. In our research, it has been revealed that threading dislocations are converted to other defects in the basal planes and they are swept from the crystal during the growth process. Utilizing this conversion phenomenon, we have demonstrated ultra-high quality growth. Recently, reports of improvements in the crystal growth rate and the expansion of the crystal size have also been made using other groups. We have almost established the solution growth as a full-scale quality SiC bulk crystal growth technology.</p>

    DOI: 10.11470/oubutsu.82.4_326

  158. 超高品質SiC溶液成長 Invited Reviewed

    宇治原 徹、原田 俊太、山本 祐治、関 和明

    応用物理   Vol. 82   page: 326-329   2013.4

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  159. SiC溶液成長の最近の展開

    原田 俊太、山本 祐治、関 和明、宇治原 徹

    日本結晶成長学会誌,   Vol. 40   page: 25   2013.4

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  160. SiC溶液成長の最近の展開

    原田 俊太, 山本 祐治, 関 和明, 宇治原 徹

    日本結晶成長学会誌,   Vol. 40   page: 25   2013.4

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  161. 超高品質SiC溶液成長 Invited Reviewed

    宇治原 徹, 原田 俊太, 山本 祐治, 関 和明

    応用物理   Vol. 82   page: 326-329   2013.4

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  162. Effect of Surface Polarity on the Conversion of Threading Dislocations in Solution Growth Reviewed

    Y. Yamamoto, S. Harada, K. Seki, A. Horio, T. Mitsuhashi, T. Ujihara

    Materials Science Forum   Vol. 740-742   page: 15-18   2013.1

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    DOI: 10.4028/www.scientific.net/MSF.740-742.15

  163. Reduction of Threading Screw Dislocation Utilizing Defect Conversion during Solution Growth of 4H-SiC Reviewed

    S. Harada, Y. Yamamoto, K. Seki, T. Ujihara

    Materials Science Forum   Vol. 740-742   page: 189-192   2013.1

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    DOI: 10.4028/www.scientific.net/MSF.740-742.189

  164. Bulk 3C-SiC Crystal by Top Seeded Solution Growth Method Reviewed

    K. Seki, S. Harada, T. Ujihara

    Materials Science Forum   Vol. 740-742   page: 311-314   2013.1

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    DOI: 10.4028/www.scientific.net/MSF.740-742.311

  165. Electron Spectroscopy of Conduction Electrons Excited by Visible Light Utilizing NEA Surface

    Ichihashi Fumiaki, Shimura Daiki, Nishitani Kenji, Kuwahara Makoto, Ito Takahiro, Harada Shunta, Tagawa Miho, Ujihara Toru

    2013 IEEE 39TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)     page: 288 - 291   2013

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  166. Ultrahigh-resolution direct observation of mini-bands formed in InGaAs/AlGaAs superlattice

    Shimura D.

    Conference Record of the IEEE Photovoltaic Specialists Conference     page: 306 - 310   2013

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    DOI: 10.1109/PVSC.2013.6744154

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  167. Ultrahigh-resolution direct observation of mini-bands formed in InGaAs/AlGaAs superlattice Reviewed

    Daiki Shimura, Fumiaki Ichihashi, Kenji Nishitani, Shunta Harada, Makoto Kuwahara, Takahiro Ito, Masaharu Matsunami, Shin-ichi Kimura, Takenobu Sakai, Miho Tagawa, Toru Ujihara

    2013 IEEE 39TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)     page: 306 - 310   2013

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    Mini-bands formed in superlattice structures are often used for an intermediate-band solar cell. In order to design an optimized structure, it is important to measure the mini-band dispersions which influence transport properties and solar-energy conversion efficiency. In this study, we directly observed the dispersions of mini-bands formed in InGaAs/AlGaAs quantum-well superlattices by angle-resolved photoemission spectroscopy with synchrotron radiation light. The short-period energy dispersions due to the mini-bands around the X-valley were clearly obtained. In addition, the effective mass coefficient of each mini-band could be individually evaluated.

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  168. Ultrahigh-resolution direct observation of mini-bands formed in InGaAs/AlGaAs superlattice

    Shimura Daiki, Ichihashi Fumiaki, Nishitani Kenji, Harada Shunta, Kuwahara Makoto, Ito Takahiro, Matsunami Masaharu, Kimura Shin-ichi, Sakai Takenobu, Tagawa Miho, Ujihara Toru

    2013 IEEE 39TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)     page: 306 - 310   2013

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  169. Current Advances in SiC Solution Growth(<Special Issue>)Opening Up a New World of Crystal Growth on SiC)

    Harada Shunta, Yamamoto Yuji, Seki Kazuaki, Ujihara Toru

    Journal of the Japanese Association for Crystal Growth   Vol. 40 ( 1 ) page: 25 - 32   2013

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    Solution growth has a potential to achieve high quality bulk SiC growth. In this paper we review current advances in SiC solution growth specially focusing on the crystal quality. During the solution growth, threading dislocations tend to be converted to basal plane defects by the step-flow of macrosteps. This phenomenon implies that all dislocations can be excluded from the lateral face of the crystal in principle. Actually, high quality SiC crystal with very low threading dislocation density was obtained applying the dislocation conversion during the solution growth.

    DOI: 10.19009/jjacg.40.1_25

  170. Electron spectroscopy of conduction electrons excited by visible light utilizing NEA surface Reviewed

    Fumiaki Ichihashi, Daiki Shimura, Kenji Nishitani, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Miho Tagawa, Toru Ujihara

    Conference Record of the IEEE Photovoltaic Specialists Conference     page: 288 - 291   2013

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    In this paper we propose an angle-resolved photoemission spectroscopy to observe the conduction electrons emitted from a surface of negative electron affinity state. In actual, we have measured conduction electrons in a GaAs bulk crystal and obtained the electron dispersion around Γ point. In addition, we could also observe hot electrons excited by the light which energy was much larger than band gap energy. These results suggest that the method we proposed is one of the most powerful tools for the evaluation method of the conduction band. © 2013 IEEE.

    DOI: 10.1109/PVSC.2013.6744149

    Scopus

  171. 2SBA-03 DNA-mediated Nanoparticle Assembly(2SBA Reconstitution of life phenomena in a designed reaction field : Synthetic biology approach to Biophysics,Symposium,The 51th Annual Meeting of the Biophysical Society of Japan)

    Tagawa Miho, Isogai Takumi, Akada Eri, Harada Syunta, Ujihara Toru, Yanger Kevin, Gang Oleg

    Seibutsu Butsuri   Vol. 53 ( 1 ) page: S92   2013

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:The Biophysical Society of Japan General Incorporated Association  

    DOI: 10.2142/biophys.53.S92_5

  172. Polytype-selective growth of SiC by supersaturation control in solution growth

    Kazuaki Seki, Alexander, Shigeta Kozawa, Shunta Harada, Toru Ujihara, Yoshikazu Takeda

    JOURNAL OF CRYSTAL GROWTH   Vol. 360 ( 1 ) page: 176 - 180   2012.12

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:ELSEVIER SCIENCE BV  

    We realized the polytype-selective growth of 3C-SiC and 6H-SiC on a 6H-SiC (0 0 0 1) seed crystal by controlling the supersaturation. Both 6H-SiC and 3C-SiC grew on the 6H-SiC seed crystal at low supersaturation, but 3C-SiC increased with increasing supersaturation. At high supersaturation, 3C-SiC grew so rapidly that it completely covered the 6H-SiC seed crystal. The growth rates of 3C-SiC and 6H-SiC have different dependences on supersaturation. In the present case, the growth rate of 3C-SiC in 2D nucleation mode is compared with that of 6H-SiC in spiral growth mode. The present kinetic polytype-control technique is based on polytypes having different growth rates and it differs considerably from the conventional technique that is based on "inheritance" of stacking sequence, which is well known as "step-controlled epitaxy". (C) 2011 Elsevier B.V. All rights reserved.

    DOI: 10.1016/j.jcrysgro.2011.11.041

    Web of Science

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  173. High-Efficiency Conversion of Threading Screw Dislocations in 4H-SiC by Solution Growth

    YAMAMOTO Yuji, HARADA Shunta, SEKI Kazuaki, HORIO Atsushi, MITSUHASHI Takato, UJIHARA Toru

    Applied physics express : APEX   Vol. 5 ( 11 ) page: "115501 - 1"-"115501-3"   2012.11

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    CiNii Research

  174. High-Efficiency Conversion of Threading Screw Dislocations in 4H-SiC by Solution Growth Reviewed

    Yuji Yamamoto, Shunta Harada, Kazuaki Seki, Atsushi Horio, Takato Mitsuhashi, Toru Ujihara

    APPLIED PHYSICS EXPRESS   Vol. 5 ( 11 ) page: 115501   2012.11

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    The high-efficiency conversion of threading screw dislocations (TSDs) in 4H-SiC by solution growth provides an efficient method of obtaining ultra high-quality SiC crystals. The behavior of TSDs on on-axis and off-axis 4H-SiC{0001} seed crystals was investigated by synchrotron X-ray topography. Almost all TSDs in the off-axis Si-face seed crystal were converted to Frank-type stacking faults on the basal planes. The conversion ratio of TSDs was highly influenced by the surface polarity of the seed crystal. The stacking faults laterally propagate toward the outside of the crystal. (C) 2012 The Japan Society of Applied Physics

    DOI: 10.1143/APEX.5.115501

    Web of Science

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  175. Polytype Transformation by Replication of Stacking Faults Formed by Two-Dimensional Nucleation on Spiral Steps during SiC Solution Growth Reviewed

    Shunta Harada, Alexander, Kazuaki Seki, Yuji Yamamoto, Can Zhu, Yuta Yamamoto, Shigeo Arai, Jun Yamasaki, Nobuo Tanaka, Toru Ujihara

    CRYSTAL GROWTH & DESIGN   Vol. 12 ( 6 ) page: 3209 - 3214   2012.6

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    Polytype transformations on the 4H-SiC(0001) Si face during top-seeded solution growth have been investigated by transmission electron microscopy and micro-Raman spectroscopy. 4H-, 15R-, and 6H-SiC were grown on the 4H-SiC(0001) Si face via spiral growth. Once a polytype transformation from 4H-SiC to 15R- or 6H-SiC occurs, the polytype rarely returns to 4H-SiC. Just before the polytype transformation, a disturbance in the stacking sequence involving the introduction of stacking faults was observed. A polytype transformation during spiral growth can be understood in terms of the replication of stacking faults due to two-dimensional nucleation of a single bilayer on the spiral steps. This polytype transformation model shows good agreement with observed polytype transformation pathways as well as the disturbance in the stacking sequence at the interface between 4H-SiC and 15R-SiC.

    DOI: 10.1021/cg300360h

    Web of Science

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  176. Stable Growth of 4H-SiC Single Polytype by Controlling the Surface Morphology Using a Temperature Gradient in Solution Growth Reviewed

    Y. Yamamoto, K. Seki, S. Kozawa, Alexander, S. Harada, T. Ujihara

    Materials Science Forum   Vol. 717-720   page: 53-56   2012.5

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  177. Conversion Mechanism of Threading Screw Dislocation during SiC Solution Growth

    T. Ujihara, S. Kozawa, K. Seki, Alexander, Y. Yamamoto, S. Harada

    Materials Science Forum   Vol. 717-720   page: 351-354   2012.5

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  178. Anisotropy of Lattice Thermal Conduction in TiO2-x with High Density of Planar Defects by Atomistic Simulations

    Y. Miyauchi, M. Tada, M. Yoshiya, S. Harada, K. Tanaka, H. Yasuda, H. Inui

    AMTC Letters   Vol. 3   page: 242-243   2012.5

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  179. Anisotropy of Lattice Thermal Conduction in TiO2-x with High Density of Planar Defects by Atomistic Simulations

    Y. Miyauchi, M. Tada, M. Yoshiya, S. Harada, K. Tanaka, H. Yasuda, H. Inui

    AMTC Letters   Vol. 3   page: 242-243   2012.5

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  180. CT-2-2 Solution Growth of High-Quality SiC Crystal

    Ujihara Toru, Harada Shunta, Seki Kazuaki, Yamamoto Yuji

    Proceedings of the IEICE General Conference   Vol. 2012 ( 2 ) page: "SS - 19"-"SS-21"   2012.3

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  181. CT-2-2 Solution Growth of High-Quality SiC Crystal

    Ujihara Toru, Harada Shunta, Seki Kazuaki, Yamamoto Yuji

    Proceedings of the IEICE General Conference   Vol. 2012 ( 2 ) page: "SS - 19"-"SS-21"   2012.3

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  182. Direct Observation of Vacancies and Local Thermal Vibration in Thermoelectric Rhenium Silicide Reviewed

    Shunta Harada, Katsushi Tanaka, Kyosuke Kishida, Norihiko L. Okamoto, Noriaki Endo, Eiji Okunishi, Haruyuki Inui

    APPLIED PHYSICS EXPRESS   Vol. 5 ( 3 ) page: 035203   2012.3

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    The crystal structure of rhenium silicide with an anomalous ordered arrangement of vacancies has been investigated by utilizing spherical-aberration (C-s)-corrected scanning transmission electron microscopy (STEM). Using C-s-corrected STEM imaging, we directly observe for the first time ordered silicon vacancies in thermoelectric rhenium silicide accompanied by anomalously large local thermal vibration ("rattling" motion) of silicon atoms in their adjacent sites. (C) 2012 The Japan Society of Applied Physics

    DOI: 10.1143/APEX.5.035203

    Web of Science

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  183. Conversion Mechanism of Threading Screw Dislocation during SiC Solution Growth

    Toru Ujihara, Shigeta Kozawa, Kazuaki Seki, Alexander, Yuji Yamamoto, Shunta Harada

    SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2   Vol. 717-720   page: 351 - +   2012

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    Publishing type:Research paper (international conference proceedings)   Publisher:TRANS TECH PUBLICATIONS LTD  

    Solution growth is considered to be a powerful method for high quality SiC crystals. This work reports that the conversion process from a threading screw dislocation into a few Frank partial dislocations in basal planes was investigated by synchrotron X-ray topography. This process was effectively assisted by step-flow growth on off-oriented (0001) seed crystals. The Frank partials were not extended into the crystal grown toward the [0001] direction perpendicular to the basal plane. Thus, the conclusion of this study suggests the use of off-orientcd seed crystal is important to improve crystal quality.

    DOI: 10.4028/www.scientific.net/MSF.717-720.351

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  184. Stable Growth of 4H-SiC Single Polytype by Controlling the Surface Morphology Using a Temperature Gradient in Solution Growth Reviewed

    Yuji Yamamoto, Kazuaki Seki, Shigeta Kozawa, Alexander, Shunta Harada, Toru Ujihara

    SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2   Vol. 717-720   page: 53 - 56   2012

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    We introduce a method to grow 4H-SiC single polytype stably by controlling the surface morphology. The polytype transition on on-axis 4H-SiC C-face was investigated from a viewpoint of surface morphology of grown layers. At the area where several hillock-like structures grew adjacently, the polytype transition from 4H-SiC to 6H-SiC or 15R-SiC often occurred. Therefore, we tried a vertical seeded solution growth (VSSG) method to suppress the formation of hillock-like structures. As a result, the hillock-like structure on the grown layer was dramatically reduced. Moreover, the ratio of 4H-SiC polytype to the whole grown surface was increased to be almost 100%.

    DOI: 10.4028/www.scientific.net/MSF.717-720.53

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  185. Acoustic Design Shape and Topology Sensitivity Formulations Based on Adjoint Method and BEM

    Matsumoto, T; Yamada, T; Takahashi, T; Zheng, CJ; Harada, S

    CMES-COMPUTER MODELING IN ENGINEERING & SCIENCES   Vol. 78 ( 2 ) page: 77 - 94   2011.8

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  186. Direct observation of an ordered arrangement of vacancies and large local thermal vibration in rhenium silicide by Cs-corrected STEM Reviewed

    Shunta Harada', Katsushi Tanaka, Kyosuke Kishida, Norihiko L. Okamoto', Noriaki Endo, Eiji Okunishi, Haruyuki Inui

    Materials Research Society Symposium Proceedings   Vol. 1295   page: 397 - 402   2011

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    The crystal structure of thermoelectric rhenium silicide with an ordered arrangement of vacancies is investigated by utilizing spherical aberration (Cs) corrected scanning transmission electron microscopy (STEM) combined with synchrotron X-ray diffraction and conventional transmission electron microscopy. By STEM Cs corrected imaging, we can clearly observe Si vacancies in rhenium silicide, which is impossible without Cs correction. In addition, significantly reduced contrast levels are noted in STEM images for particular Si sites near vacancies. From the STEM image simulation, the reduced contrast levels are concluded to be due to anomalously large local thermal vibration of these Si atoms. The crystal structure of rhenium silicide can be successfully refined by the synchrotron X-ray diffraction starting with the deduced structure model from the STEM images and the occurrence of large local thermal vibration can be qualitatively confirmed. Furthermore, we confirm the validity of the refined crystal structure of rhenium silicide by comparing experimental images with simulated image generating with the refined crystal structure parameters. © 2011 Materials Research Society.

    DOI: 10.1557/opl.2011.43

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  187. Crystal structure refinement of ReSi1.75 with an ordered arrangement of silicon vacancies Reviewed

    Shunta Harada, Hiroaki Hoshikawa, Kosuke Kuwabara, Katsushi Tanaka, Eiji Okunishi, Haruyuki Inui

    PHILOSOPHICAL MAGAZINE   Vol. 91 ( 23 ) page: 3108 - 3127   2011

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    The crystal structure and microstructure of ReSi1.75 were investigated by synchrotron X-ray diffraction combined with scanning transmission electron microscopy. ReSi1.75 contains an ordered arrangement of vacancies in Si sites in the underlying tetragonal C11(b) lattice of the MoSi2-type and the crystal structure is monoclinic with the space group Cm. Atomic positions of Si atoms near vacancies are considerably displaced from the corresponding positions in the parent C11(b) structure, and they exhibit anomalously large local thermal vibration accompanied by large values of atomic displacement parameter. There are four differently-oriented domains with two of them being related to each other by the 90 degrees rotation about the c-axis of the underlying C11(b) lattice and the other two being their respective twins. The habit planes for domain boundaries observed experimentally are consistent with those predicted with ferroelastic theory.

    DOI: 10.1080/14786435.2011.570278

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  188. Formation mechanism of high-density AlN by the nitridation of molten Al

    Mizuno Kohei, Matubara Hiroaki, Takeuchi Yukihisa, Harada Shunta, Ujihara Toru, Aoki Yuuichi, Kohara Kimio

    Preprints of Annual Meeting of The Ceramic Society of Japan<br>Preprints of Fall Meeting of The Ceramic Society of Japan   Vol. 2011 ( 0 ) page: 761 - 761   2011

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    DOI: 10.14853/pcersj.2011F.0.761.0

    CiNii Research

  189. Atomic-level analyses of thermal conduction in magneli-phase TiO<sub>2-x</sub> containing shear structure

    Yoshiya Masato, Miyauchi Yohei, Tada Masahiro, Harada Shunta, Tanaka Katsushi, Yasuda Hideyuki, Inui Haruyuki

    Preprints of Annual Meeting of The Ceramic Society of Japan<br>Preprints of Fall Meeting of The Ceramic Society of Japan   Vol. 2011 ( 0 ) page: 759 - 759   2011

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    DOI: 10.14853/pcersj.2011F.0.759.0

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  190. Thermoelectric properties and crystallographic shear structures in titanium oxides of the Magneli phases Reviewed

    Shunta Harada, Katsushi Tanaka, Haruyuki Inui

    JOURNAL OF APPLIED PHYSICS   Vol. 108 ( 8 )   2010.10

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    The thermoelectric properties of Magneli phase titanium oxides TinO2n-1 (n=2,3,...) have been investigated, paying special attention to how the thermoelectric performance can be altered by changing the microstructure. Dense polycrystalline specimens with nominal composition of TiO2-x (x=0.05, 0.10, 0.15, and 0.20) prepared by conventional hot-pressing are all identified to be one of the Magneli phases, in which crystallographic shear planes are regularly introduced according to the oxygen deficiency. Electrical conduction is n-type for all specimens and the carrier concentration increases with the increase in the oxygen deficiency. The values of lattice thermal conductivity, on the other hand, decrease with the increase in the oxygen deficiency, which can be attributed to phonon scattering at the crystallographic shear plane. The largest value of thermoelectric figure of merit Z, 1.6 X 10(-4) K-1 was obtained at 773 K for the hot-pressed specimen of TiO1.90. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3498801]

    DOI: 10.1063/1.3498801

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  191. Reduction in the Thermal Conductivity of Thermoelectric Titanium Oxide by Introduction of Planar Defects

    S. Harada, K. Tanaka, H. Inui

    Material Research Society Symposium Proceedings   Vol. 1218   2010.9

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    DOI: 10.1557/PROC-1218-Z01-04

  192. Soft X-ray photoelectron spectroscopy of heusler-type thermoelectric alloys Fe<inf>2-x-y</inf>lr<inf>y</inf>v<inf>1+x</inf>Al

    Harada S.

    Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy   Vol. 57 ( 4 ) page: 213 - 217   2010.4

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    Publishing type:Research paper (scientific journal)   Publisher:Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy  

    DOI: 10.2497/jjspm.57.213

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  193. Thermoelectric properties of ternary and Al-containing quaternary Ru1-xRexSiy chimney-ladder compound Reviewed

    K. Kishida, A. Ishida, T. Koyama, S. Harada, N. L. Okamoto, K. Tanaka, H. Inui

    Acta Materialia   Vol. 57 ( 6 ) page: 2010-2019   2009.4

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  194. Change in the thermoelectric properties with the variation in the defect structure of ReSi1.75 Reviewed

    S. Harada, K. Tanaka, K. Kishida, N. L. Okamoto, H. Inui

    Material Research Society Symposium Proceedings   Vol. 1128   page: 9-14   2009

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  195. Improvement of Grain-Boundary Conductivity of Trivalent Cation-Doped Barium Zirconate Sintered at 1600°C by Co-Doping Scandium and Yttrium

    S. Imashuku, T. Uda, Y. Nose, K. Kishida, S. Harada, H. Inui and Y. Awakura

    Journal of Electrochemical Society   Vol. 155 ( 6 ) page: B581-B586   2008.4

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Books 1

  1. 【一枚の写真】「スペクトル超解像」による分光分析の高精度化

    原田俊太( Role: Sole author)

    アドコム・メディア  2022.5 

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MISC 34

  1. 「 AI ニ ヨル ヒンシツ カンリ ト AI ノ ヒンシツ ホショウ 」 トクシュウゴウ Reviewed

    Sumitani Shogo, Nishida Hiro, Harada Shunta

    SYSTEMS, CONTROL AND INFORMATION   Vol. 66 ( 5 ) page: 161 - 166   2022

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    Language:Japanese   Publisher:THE INSTITUTE OF SYSTEMS, CONTROL AND INFORMATION ENGINEERS  

    DOI: 10.11509/isciesci.66.5_161

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  2. シミュレーションに基づく結晶成長プロセスインフォマティクス : 溶液法SiCを例に—Process informatics using simulation data for crystal growth : Application to solution growth of SiC—特集 機械学習・AIは結晶成長研究をいかに変えるか?

    沓掛 健太朗, 角岡 洋介, 郁 万成, 黨 一帆, 原田 俊太, 宇治原 徹

    日本結晶成長学会誌 Journal of the Japanese Association for Crystal Growth   Vol. 49 ( 1 ) page: 1 - 8   2022

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  3. 大口径SiCバルク結晶成長における主要技術とプロセス・インフォマティクスの活用—Technologies for large-diameter SiC crystal growth and application of process informatics—特集 ワイドバンドギャップ材料の結晶成長の最前線

    宇治原 徹, 朱 燦, 角岡 洋介, 古庄 智明, 鈴木 皓己, 沓掛 健太朗, 高石 将輝, 郁 万成, 黨 一帆, 磯野 優, 竹内 一郎, 田川 美穂, 原田 俊太

    日本結晶成長学会誌 Journal of the Japanese Association for Crystal Growth   Vol. 48 ( 3 ) page: 1 - 8   2021

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  4. Design of High-quality SiC Solution Growth Condition Assisted by Machine Learning

    Harada Shunta, Lin Hung-Yi, Tsunooka Yosuke, Zhu Can, Narumi Taka, Kutsukake Kentaro, Ujihara Toru

    Materia Japan   Vol. 59 ( 3 ) page: 145 - 152   2020

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    Language:Japanese   Publisher:The Japan Institute of Metals and Materials  

    DOI: 10.2320/materia.59.145

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  5. 機械学習を用いたSiC溶液成長法の熱流動の高速予測と育成条件の最適化に関する基礎検討

    鳴海大翔, 林宏益, 角岡洋介, 角岡洋介, 安藤圭理, 朱燦, 沓掛健太朗, 原田俊太, 原田俊太, 宇治原徹, 宇治原徹, 宇治原徹, 宇治原徹

    日本金属学会講演概要(CD-ROM)   Vol. 164th   page: ROMBUNNO.S2.10   2019.3

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    J-GLOBAL

  6. SiC溶液成長過程における転位変換現象を利用した高品質結晶成長

    原田俊太, 原田俊太, 朱燦, 遠藤友樹, 小泉晴比古, 鳴海大翔, 田川美穂, 田川美穂, 宇治原徹, 宇治原徹, 宇治原徹

    日本金属学会講演概要(CD-ROM)   Vol. 164th   page: ROMBUNNO.S2.7   2019.3

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  7. 機械学習を用いた昇華法SiC結晶成長シミュレーションの高速予測

    JIANG Yiqun, JIANG Yiqun, 角岡洋介, 角岡洋介, 角岡洋介, 畑佐豪記, 畑佐豪記, 鳴海大翔, 沓掛健太朗, 原田俊太, 原田俊太, 田川美穂, 田川美穂, 宇治原徹, 宇治原徹, 宇治原徹, 宇治原徹

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   Vol. 66th   page: ROMBUNNO.11p‐70A‐5   2019.2

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  8. 制約付きバッチベイズ最適化を用いたSiC研削条件の探索

    長田圭一, 長田圭一, 角岡洋介, 角岡洋介, 角岡洋介, 成田潔, 小泉晴比古, 沓掛健太朗, 原田俊太, 原田俊太, 田川美穂, 田川美穂, 宇治原徹, 宇治原徹, 宇治原徹

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   Vol. 66th   page: ROMBUNNO.10a‐W321‐7   2019.2

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  9. 大口径化にむけた機械学習によるSiC溶液成長の最適成長条件の決定

    宇治原徹, 宇治原徹, 宇治原徹, 角岡洋介, 角岡洋介, 遠藤友樹, ZHU Can, 沓掛健太朗, 鳴海大翔, 三谷武志, 加藤智久, 田川美穂, 田川美穂, 原田俊太, 原田俊太

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   Vol. 66th   page: ROMBUNNO.11p‐70A‐4   2019.2

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  10. 機械学習によって構築した温度分布予測モデルによる熱伝導率推定

    樋口雄介, 角岡洋介, 角岡洋介, 沓掛健太朗, 鳴海大翔, 原田俊太, 原田俊太, 田川美穂, 田川美穂, 宇治原徹, 宇治原徹, 宇治原徹

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   Vol. 66th   page: ROMBUNNO.9p‐W321‐8   2019.2

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  11. 機械学習による結晶成長シミュレーション回帰モデルの構築とその応用(結晶成長におけるCPS実現を目指して)

    宇治原徹, 宇治原徹, 宇治原徹, 角岡洋介, 角岡洋介, ZHU Can, 沓掛健太朗, 鳴海大翔, 田川美穂, 田川美穂, 原田俊太, 原田俊太

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   Vol. 66th   page: ROMBUNNO.9p‐W321‐6   2019.2

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    Language:Japanese  

    J-GLOBAL

  12. 3インチ4度オフ種結晶上へのSiC溶液成長における貫通転位変換とインクルージョン抑制の両立

    海野高天, ZHU Can, 原田俊太, 小泉晴比古, 田川美穂, 宇治原徹, 宇治原徹

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   Vol. 66th   page: ROMBUNNO.11p‐70A‐2   2019.2

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    J-GLOBAL

  13. 機械学習モデルと実験結果の比較による物性値推定手法のSiC溶液成長における融液物性への適用

    安藤圭理, 林宏益, 角岡洋介, 角岡洋介, 鳴海大翔, 朱燦, 沓掛健太朗, 原田俊太, 原田俊太, 松井孝太, 竹内一郎, 竹内一郎, 小山幸典, 宇治原徹, 宇治原徹, 宇治原徹, 宇治原徹

    日本金属学会講演概要(CD-ROM)   Vol. 164th   2019

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  14. SiC溶液成長における機械学習を用いた成長条件の最適化

    角岡洋介, 鳴海大翔, 安藤圭理, 沓掛健太朗, 朱燦, 林宏益, 原田俊太, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第5回講演会     2018.11

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  15. ベイズ最適化を用いたSiC研削条件の探索

    長田圭一, 長田圭一, 角岡洋介, 角岡洋介, 角岡洋介, 成田潔, 小泉晴比古, 小泉晴比古, 沓掛健太朗, 原田俊太, 原田俊太, 田川美穂, 田川美穂, 宇治原徹, 宇治原徹, 宇治原徹

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   Vol. 79th   page: ROMBUNNO.20p‐221C‐10   2018.9

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    J-GLOBAL

  16. SiC溶液成長における熱流体解析の機械学習を用いたパラメータ影響の可視化

    沓掛健太朗, 角岡洋介, 角岡洋介, 角岡洋介, 長田圭一, 長田圭一, 安藤圭理, 安藤圭理, LIN Hongyi, LIN Hongyi, ZHU Can, ZHU Can, 鳴海大翔, 鳴海大翔, 原田俊太, 原田俊太, 田川美穂, 田川美穂, 宇治原徹, 宇治原徹, 宇治原徹

    応用物理学会秋季学術講演会講演予稿集(CD-ROM)   Vol. 79th   page: ROMBUNNO.20p‐221C‐9   2018.9

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    J-GLOBAL

  17. Identification of Strain Distribution in Depth Direction Focusing on X‐ray Penetration Depth for SiC Wafer Optimized by Machine Learning Method

    小泉晴比古, 花田賢志, 長田圭一, 長田圭一, 成田潔, 原田俊太, 原田俊太, 田川美穂, 田川美穂, 宇治原徹, 宇治原徹

    結晶成長国内会議予稿集(CD-ROM)   Vol. 47th   page: ROMBUNNO.01p‐P31   2018

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    J-GLOBAL

  18. Enantioselective amplification on circularly polarized laser-induced chiral nucleation from a NaClO3 solution containing Ag nanoparticles

    H. Niinomi, T. Sugiyama, M. Tagawa, M. Maruyama, S. Harada, T. Ujihara

    CrystEngComm   Vol. 18 ( 39 ) page: 7441-7448   2016

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  19. 溶液法による4H-SiCバルク結晶成長と結晶品質評価

    楠一彦, 関和明, 岸田豊, 海藤宏志, 森口晃治, 岡田信宏, 大黒寛典, 加渡幹尚, 土井雅喜, 旦野克典, 関章憲, 佐藤和明, 別所毅, 原田俊太, 宇治原徹

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   Vol. 63rd   2016

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  20. 27pAQ-5 Direct Observation of Conduction Electrons in Semiconductors by Visible Light Photoemission Spectroscopy

    Ichihashi F., Shimura D., Nishitani K., Kuwahara M., Ito T., Harada S., Tagawa Miho, Ujihara T.

    Meeting abstracts of the Physical Society of Japan   Vol. 69 ( 1 ) page: 874 - 874   2014.3

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    CiNii Books

  21. Direct Measurement of Conduction Miniband Structure in Superlattice by Visible-Light Photoemission Spectroscopy

    Fumiaki Ichihashi, Daiki Shimura, Kenji Nishitani, Takahiko Kawaguchi, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Hiroyasu Katsuno, Miho Tagawa, Tofu Ujihara

    2014 IEEE 40TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC)     page: 2882 - 2885   2014

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    We have proposed a novel angle-resolved photoemission spectroscopy to measure the conduction electrons emitted from a surface with negative electron affinity state. We call this method visible-light photoemission spectroscopy (VPS). In the present study, the conduction miniband structure formed in a superlattice was evaluated by the VPS method. As a result, we succeeded to obtain the dispersion of the miniband. In addition, the effective mass of the miniband was quantitatively determined from the observed dispersion. Therefore, we believe that VPS is a quite powerful tool for the evaluation of intermediate-band solar cells.

    DOI: 10.1109/PVSC.2014.6925534

    Web of Science

  22. SiC 結晶成長における多形制御 ~速度論的多形制御法の提案(3C-SiC 溶液成長を例に)~

    関 和明, 原田 俊太, 宇治原 徹

    日本結晶成長学会誌,   Vol. 40 ( 4 ) page: 253   2013.12

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  23. 超高品質SiC溶液成長 Invited Reviewed

    宇治原 徹, 原田 俊太, 山本 祐治, 関 和明

    応用物理   Vol. 82   page: 326-329   2013.4

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  24. SiC溶液成長の最近の展開

    原田 俊太, 山本 祐治, 関 和明, 宇治原 徹

    日本結晶成長学会誌,   Vol. 40   page: 25   2013.4

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  25. AlGaAs/InGaAs超格子構造におけるミニバンドの超高分解能直接観察

    志村大樹, 市橋史朗, 原田俊太, 桑原真人, 伊藤孝寛, 松波雅治, 木村真一, 酒井武信, 田川美穂, 宇治原徹

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   Vol. 60th   page: ROMBUNNO.29A-G4-7   2013.3

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    J-GLOBAL

  26. NaClO<sub>3</sub>溶液成長におけるアキラルな準安定相を介したキラル結晶形成過程

    新家寛正, 原田俊太, 宇治原徹, 三浦均, 木村勇気, 栗林貴弘, 上羽牧夫, 塚本勝男

    結晶成長国内会議予稿集(CD-ROM)   Vol. 43rd   page: ROMBUNNO.08AC11   2013

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    J-GLOBAL

  27. NaClO<sub>3</sub>溶液成長におけるアキラルな準安定相の溶解度測定

    新家寛正, 原田俊太, 宇治原徹, 三浦均, 木村勇気, 上羽牧夫, 塚本勝男

    結晶成長国内会議予稿集(CD-ROM)   Vol. 43rd   page: ROMBUNNO.07PS29   2013

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    J-GLOBAL

  28. Anisotropy of Lattice Thermal Conduction in TiO2-x with High Density of Planar Defects by Atomistic Simulations

    Y. Miyauchi, M. Tada, M. Yoshiya, S. Harada, K. Tanaka, H. Yasuda, H. Inui

    AMTC Letters   Vol. 3   page: 242-243   2012.5

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  29. Direct Observation of Vacancies and Local Thermal Vibration in Thermoelectric Rhenium Silicide Reviewed

    Shunta Harada, Katsushi Tanaka, Kyosuke Kishida, Norihiko L. Okamoto, Noriaki Endo, Eiji Okunishi, Haruyuki Inui

    APPLIED PHYSICS EXPRESS   Vol. 5 ( 3 ) page: 035203   2012.3

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    The crystal structure of rhenium silicide with an anomalous ordered arrangement of vacancies has been investigated by utilizing spherical-aberration (C-s)-corrected scanning transmission electron microscopy (STEM). Using C-s-corrected STEM imaging, we directly observe for the first time ordered silicon vacancies in thermoelectric rhenium silicide accompanied by anomalously large local thermal vibration ("rattling" motion) of silicon atoms in their adjacent sites. (C) 2012 The Japan Society of Applied Physics

    DOI: 10.1143/APEX.5.035203

    Web of Science

    Scopus

  30. 空孔規則配列相を有するReSi<sub>1.75</sub>の異方的な熱電特性

    原田俊太, 田中克志, 岡本範彦, 乾晴行

    日本金属学会講演概要   Vol. 148th   2011

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  31. Direct observation of an ordered arrangement of vacancies and large local thermal vibration in rhenium silicide by Cs-corrected STEM Reviewed

    Shunta Harada', Katsushi Tanaka, Kyosuke Kishida, Norihiko L. Okamoto', Noriaki Endo, Eiji Okunishi, Haruyuki Inui

    Materials Research Society Symposium Proceedings   Vol. 1295   page: 397 - 402   2011

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    The crystal structure of thermoelectric rhenium silicide with an ordered arrangement of vacancies is investigated by utilizing spherical aberration (Cs) corrected scanning transmission electron microscopy (STEM) combined with synchrotron X-ray diffraction and conventional transmission electron microscopy. By STEM Cs corrected imaging, we can clearly observe Si vacancies in rhenium silicide, which is impossible without Cs correction. In addition, significantly reduced contrast levels are noted in STEM images for particular Si sites near vacancies. From the STEM image simulation, the reduced contrast levels are concluded to be due to anomalously large local thermal vibration of these Si atoms. The crystal structure of rhenium silicide can be successfully refined by the synchrotron X-ray diffraction starting with the deduced structure model from the STEM images and the occurrence of large local thermal vibration can be qualitatively confirmed. Furthermore, we confirm the validity of the refined crystal structure of rhenium silicide by comparing experimental images with simulated image generating with the refined crystal structure parameters. © 2011 Materials Research Society.

    DOI: 10.1557/opl.2011.43

    Scopus

  32. Crystal structure refinement of ReSi1.75 with an ordered arrangement of silicon vacancies Reviewed

    Shunta Harada, Hiroaki Hoshikawa, Kosuke Kuwabara, Katsushi Tanaka, Eiji Okunishi, Haruyuki Inui

    PHILOSOPHICAL MAGAZINE   Vol. 91 ( 23 ) page: 3108 - 3127   2011

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    The crystal structure and microstructure of ReSi1.75 were investigated by synchrotron X-ray diffraction combined with scanning transmission electron microscopy. ReSi1.75 contains an ordered arrangement of vacancies in Si sites in the underlying tetragonal C11(b) lattice of the MoSi2-type and the crystal structure is monoclinic with the space group Cm. Atomic positions of Si atoms near vacancies are considerably displaced from the corresponding positions in the parent C11(b) structure, and they exhibit anomalously large local thermal vibration accompanied by large values of atomic displacement parameter. There are four differently-oriented domains with two of them being related to each other by the 90 degrees rotation about the c-axis of the underlying C11(b) lattice and the other two being their respective twins. The habit planes for domain boundaries observed experimentally are consistent with those predicted with ferroelastic theory.

    DOI: 10.1080/14786435.2011.570278

    Web of Science

    Scopus

  33. Thermoelectric properties and crystallographic shear structures in titanium oxides of the Magneli phases Reviewed

    Shunta Harada, Katsushi Tanaka, Haruyuki Inui

    JOURNAL OF APPLIED PHYSICS   Vol. 108 ( 8 )   2010.10

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    The thermoelectric properties of Magneli phase titanium oxides TinO2n-1 (n=2,3,...) have been investigated, paying special attention to how the thermoelectric performance can be altered by changing the microstructure. Dense polycrystalline specimens with nominal composition of TiO2-x (x=0.05, 0.10, 0.15, and 0.20) prepared by conventional hot-pressing are all identified to be one of the Magneli phases, in which crystallographic shear planes are regularly introduced according to the oxygen deficiency. Electrical conduction is n-type for all specimens and the carrier concentration increases with the increase in the oxygen deficiency. The values of lattice thermal conductivity, on the other hand, decrease with the increase in the oxygen deficiency, which can be attributed to phonon scattering at the crystallographic shear plane. The largest value of thermoelectric figure of merit Z, 1.6 X 10(-4) K-1 was obtained at 773 K for the hot-pressed specimen of TiO1.90. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3498801]

    DOI: 10.1063/1.3498801

    Web of Science

    Scopus

  34. Reduction in the Thermal Conductivity of Thermoelectric Titanium Oxide by Introduction of Planar Defects

    S. Harada, K. Tanaka, H. Inui

    Material Research Society Symposium Proceedings   Vol. 1218   page: 1 - 6   2010.9

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    Thermoelectric properties of a homologous series of Magnéli phase titanium oxides TinO2n-1 (n = 2, 3..) have been investigated. Dense polycrystalline specimens with nominal composition of TiO2-x (x = 0.10, 0.20) have been prepared by conventional hot-pressing. X-ray diffraction analysis has revealed that prepared specimens are slightly reduced during hot-pressing. Electrical conduction is of n-type for all prepared titanium oxides and electrical resistivity and absolute values of Seebeck coefficient decrease with increasing oxygen deficiency. The carrier concentration of Magnéli phase titanium oxide increases with increasing oxygen deficiency. Lattice thermal conductivity decreases with increasing oxygen deficiency by more than 60% at room temperature and 40% at 773K compared to TiO2, which can be due to the presence of dense planar defects. The largest thermoelectric figure of merit Z, 1.6 × 10-4 K -1 at 773K, was obtained in TiO1.90 hot pressed specimen. © 2010 Materials Research Society.

    DOI: 10.1557/PROC-1218-Z01-04

    Scopus

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Presentations 672

  1. 窒化ガリウム結晶中の純粋な貫通らせん転位の非破壊での識別

    原田 俊太, 川瀬 道夫, 瀬尾 圭介, 松原 康高, 水谷 誠也, 水谷 優也, 水谷 誠二, 村山 健太

    第71回応用物理学会春季学術講演会  2024.3.23 

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  2. 4H-SiCへのプラズマ処理による水素導入

    リ トウ, 坂根 仁, 原田 俊太, 黒川 康良, 加藤 正史

    第71回応用物理学会春季学術講演会  2024.3.23 

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  3. エピタキシャル成長前SiC基板へのH+注入効果

    加藤 正史, 渡邉 王雅, 原田 俊太, 坂根 仁

    第71回応用物理学会春季学術講演会  2024.3.23 

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  4. 4H-SiC溶液成長シミュレーションの機械学習における転移学習によるデータ数削減

    甘原, 党一帆, 沓掛健太朗, 原田俊太, 田川美穂, 宇治原徹

    第52回結晶成長国内会議  2023.12.6 

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    Event date: 2023.12

    Language:English   Presentation type:Poster presentation  

  5. DNA修飾ナノ粒子の結晶成⾧における粒子間相互作用に対するPEG添加の影響

    小島憧子, 張力東, 太田昇, 関口博史, 原田俊太, 宇治原徹, 塚本勝男, 田川美穂

    第52回結晶成長国内会議  2023.12.4 

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    Event date: 2023.12

    Language:English   Presentation type:Oral presentation (general)  

  6. SiC溶液成⾧における実験者の知識を利用したスケールアップのための最適化手法の構築

    霜田大貴, 鈴木晧己, 沓掛健太朗, 原田俊太, 田川美穂, 宇治原徹

    第52回結晶成長国内会議  2023.12.5 

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    Event date: 2023.12

    Language:English   Presentation type:Oral presentation (general)  

  7. Analysis of the Effect of Solvent Composition on Suppression of Inclusion in SiC Solution Growth

    Huiqin Zhou, Yuma Fukami, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICMaSS 2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Oral presentation (general)  

  8. Effect of macrostep height and solution flow on formation of solvent inclusion in SiC solution growth

    Yuma Fukami, Huiqin Zhou, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICMaSS 2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Poster presentation  

  9. Optimization of experimental conditions using machine learning for large-diameter crystal growth in solution growth of SiC

    Daiki Shimoda, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICMaSS 2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Poster presentation  

  10. Numerical Analysis of Macrostep Instability focusing on Carbon Diffusion Field in SiC Solution Growth

    Yuki Nakanishi, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICMaSS 2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Poster presentation  

  11. Molecular Beam Epitaxy (MBE) and Metal Organic Vapor Phase Epitaxy (MOVPE) Surface Stability of Reconstructions on BAs (001) Surface: First-principles calculation

    PeiYang Cai, Toru Akiyama, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICMaSS 2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Oral presentation (general)  

  12. First-principles analysis of the mechanism of formation of large macrosteps by additive elements in solution growth of SiC

    Shota Seki, Takahiro Kawamura, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICMaSS 2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Poster presentation  

  13. Exploring Phonon Localization in TitaniumChromium Oxides with Modulated Crystallographic Shear Structures

    S. Harada, T. Hattori, M. Inden, S. Sugimoto, M. Itoh, M, Tagawa, T. Ujihara

    ICMaSS2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Oral presentation (general)  

  14. Effects of Sodium Chloride and Deuterium Oxide on Crystal Growth of DNAFunctionalized Nanoparticles

    Lidong Zhang, Maasa Yokomori, Hayato Sumi, HsinYi Chou, Shoko Kojima, Noboru Ohta, Hiroshi Sekiguchi, Shunta Harada, Toru Ujihara, Katsuo Tsukamoto, Miho Tagawa

    ICMaSS 2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Oral presentation (general)  

  15. Effect of Solvent Properties on Growth Process in SiC Solution Growth

    Li Juanheng, Huiqin Zhou, Xin Liu, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, nd Toru, Ujihara

    ICMaSS 2023  2023.12.2 

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    Event date: 2023.12

    Language:English   Presentation type:Poster presentation  

  16. エピタキシャル成長前 SiC 基板への H +注入の PiN ダイオードへの効果

    渡邉 王雅, 原田 俊太, 坂根 仁, 加藤 正史

    先進パワー半導体分科会 第 10 回講演会  2023.12.1 

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    Event date: 2023.11 - 2023.12

    Language:Japanese   Presentation type:Poster presentation  

  17. 偏光顕微鏡法と X 線トポグラフィ法による SiC 基板中の貫通転位のマルチモーダル解析

    原田 俊太, 松原 康高, 川瀬 道夫, 瀬尾 圭介, 水谷 誠也, 水谷 優也, 水谷 誠二, 村山 健太

    先進パワー半導体分科会 第 10 回講演会  2023.12.1 

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    Event date: 2023.11 - 2023.12

    Language:Japanese   Presentation type:Poster presentation  

  18. SiCパワーデバイスの研究開発は結晶欠陥と共に:SiCウェハー欠陥評価技術の進展 Invited

    原田俊太

    第11回SPring-8次世代先端デバイス研究会  2023.11.29 

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  19. 製造プロセスの制御への強化学習の応用ー浮遊帯域溶融法による結晶成長を例に Invited

    原田俊太

    半導体の結晶成長と加工および評価に関する産学連携委員会第3回「DX と AI がもたらす半導体基板製造の革新」  2023.11.24 

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    Event date: 2023.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  20. ベイズ超解像を用いた X 線光電子分光測定高速化プログラムの開発

    原田俊太, 辻森皓太, 木下慎一郎

    第 59 回 X 線分析討論会  2023.10.22 

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    Event date: 2023.10

    Language:Japanese   Presentation type:Oral presentation (general)  

  21. SiC溶液成長における溶媒インクルージョン形成のマルチスケールシミュレーション

    鄭 朗程, 周 惠琴, 黨 一帆, 沓掛 健太朗, 原田 俊太, 田川 美穂, 宇治原 徹

    2023年第84回応用物理学会秋季学術講演会  2023.9.20 

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  22. SiC溶液成長における炭素拡散場を介したマクロステップ相互作用の数値解析

    中西 祐貴, 沓掛 健太朗, 原田 俊太, 田川 美穂, 宇治原 徹

    日本金属学会2023年秋期(第173回)講演大会  2023.9.22 

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    Event date: 2023.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  23. 3-dimensional observation of dislocations in 4H-SiC using focused light birefringence

    Masashi Kato, Hisaya Sato, Tomohisa Kato, Koichi Murata, Shunta Harada

    ICSCRM 2023  2023.9.18 

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    Event date: 2023.9

    Language:English   Presentation type:Oral presentation (general)  

  24. Birefringence image simulation of dislocations in a SiC crystal considering three-dimensional stress fields.

    Yasutaka Matsubara, Kenta Murayama, Shunta Harada

    ICSCRM 2023  2023.9.21 

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    Event date: 2023.9

    Language:English   Presentation type:Poster presentation  

  25. Analysis of the Effect of Solvent Composition on Suppression of Inclusion in SiC Solution Growth

    Huiqin Zhou, Yuma Fukami, Hitoshi Miura, Kentaro Kutsukake, Shunta Harada, Tour Ujihara

    ICSCRM 2023  2023.9.19 

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    Event date: 2023.9

    Language:English   Presentation type:Oral presentation (general)  

  26. Advances in Suppressing Bipolar Degradation in SiC Devices: Carrier Lifetime Control and Proton Implantation (invited paper) Invited

    Masashi Kato, Shunta Harada, Hitoshi Sakane

    ICSCRM 2023  2023.9.20 

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    Event date: 2023.9

    Language:English   Presentation type:Oral presentation (invited, special)  

  27. Detailed characterization of defects in SiC using novel birefringence imaging toward identification of device-killer defects

    Shunta Harada, Yasutaka Matsubara, Kenta Murayama

    ICSCRM 2023  2023.9.19 

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    Event date: 2023.9

    Language:English   Presentation type:Oral presentation (general)  

  28. Optimization of Temperature Distribution and Flow Distribution using Machine Learning for 8-Inch SiC Crystal Growth by TSSG Method

    Daiki Shimoda, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICSCRM 2023  2023.9.19 

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    Event date: 2023.9

    Language:English   Presentation type:Oral presentation (general)  

  29. Effects of Solution Properties on Growth Conditions of SiC Solution Growth

    Juanheng Li, Zhou Huiqin, Liu Xin, Kutsukake Kentaro, Harada Shunta, Tagawa Miho, Ujihara Toru

    ICSCRM 2023  2023.9.20 

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    Event date: 2023.9

    Language:English   Presentation type:Poster presentation  

  30. Defect characterization of SiC wafers by polarized light microscope under a condition slightly deviated from crossed Nicols

    S. Harada, Y. Matsubara, K. Murayama

    IUCr2023  2023.8.29 

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    Event date: 2023.8

    Language:English   Presentation type:Oral presentation (general)  

  31. Modulated crystallographic shear structure in titanium-chromium oxides: their structure and phonon transport properties

    S. Harada, T. Hattori†, M. Inden†, S. Sugimoto†, M. Itoh†, M. Tagawa, T. Ujihara

    IUCr2023  2023.8.29 

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    Event date: 2023.8

    Language:English   Presentation type:Poster presentation  

  32. Analysis of Macrostep Interaction via Carbon Diffusion Field in SiC Solution Growth

    Yuki Nakanishi, Kentaro Kutsukake, Yifan Dang, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICCGE-20  2023.8.1 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (general)  

  33. Characterization of Defects in SiC Substrates for Power Device Applications by Birefringence Imaging

    Harada S, Matsubara Y, Murayama K

    ICCGE-20  2023.7.31 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (general)  

  34. Data-Driven Automated Control Algorithm for Floating-Zone Crystal Growth Using Reinforcement Learning Invited

    Harada S, Tosa Y, Omae R, Matsumoto R, Sumitani S

    ICCGE-20  2023.7.31 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (invited, special)  

  35. Surface Stability of Reconstructions on BAs(001) Surface: An Ab Initio-Based ApproachSurface Stability of Reconstructions on BAs(001) Surface: An Ab Initio-Based Approach

    Cai Peiyang, Toru Akiyama, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICCGE-20  2023.8.3 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (general)  

  36. Silicate Spherulites Rapidly Crystallized from Hypercooled Melt Droplets

    Katsuo Tsukamoto, Kana Watanabe, Shuta Harada, Daigo Shimizu, Hitoshi Miura

    ICCGE-20  2023.8.1 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (general)  

  37. Optimization method of crystal growth conditions by tacit knowledge (for large-diameter SiC solution growth)

    Toru Ujihara, Masaru Isono, Kentaro Kutsukake, Ichiro Takeuchi, Koki Suzuki, Tomoaki Furusho, Miho Tagawa, Shunta Harada

    ICCGE-20  2023.7.31 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (general)  

  38. First-principles analysis of the activation energy of solute-additive bonds in the solvent of SiC solution growth

    Shota Seki, Takahiro Kawamura, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICCGE-20  2023.8.3 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (general)  

  39. Effect of macrostep height on formation of solvent inclusion in SiC solution growth

    Yuma Fukami, Huiqin Zhou, Kentaro Kutsukake, Shunta Harada, Miho Tagawa, Toru Ujihara

    ICCGE-20  2023.8.1 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Poster presentation  

  40. Data-Driven Modeling and Adaptive Optimization of Floating Zone Crystal Growth Process Applying Gaussian Mixture Model and Reinforcement Learning

    Shunta Harada, Yusuke Tosa, Ryo Omae, Ryohei Matsumoto, Shogo Sumitani

    2023 MRS Spring Meeting  2023.4.14 

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    Event date: 2023.4

    Language:English   Presentation type:Oral presentation (general)  

  41. Application of Baysian Super Resolution to Spectroscopic Data Analysis

    Shunta Harada, Kota Tsujimori, Jun Hirotani

    2023 MRS Spring Meeting  2023.4.13 

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    Event date: 2023.4

    Language:English   Presentation type:Poster presentation  

  42. Application of Baysian super-resolution to spectroscopic data for precise characterizaion

    Shunta Harada

    2023.3.20 

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    Event date: 2023.3

    Language:English   Presentation type:Oral presentation (general)  

  43. SiC溶液成長におけるマクロステップ高さがインクルージョン形成に及ぼす影響

    深見 勇馬, 周 惠琴, 竹本 玖生, 黨 一帆, 原田 俊太, 田川 美穂, 宇治原 徹

    第70回応用物理学会春季学術講演会  2023.3.15 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  44. 集光した偏光レーザーを用いたSiC内部の転位の3次元観測

    佐藤 寿弥, 加藤 智久, 原田 俊太, 加藤 正史

    第70回応用物理学会春季学術講演会  2023.3.15 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  45. 連立微分方程式で記述される半導体プロセスシミュレーションの機械学習

    佐藤 陸彌, 沓掛 健太朗, 原田 俊太, 田川 美穂, 宇治原 徹

    第70回応用物理学会春季学術講演会  2023.3.18 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  46. 偏光観察によるSiC基板中の貫通混合転位の識別

    松原 康高, 村山 健太, 原田 俊太

    第70回応用物理学会春季学術講演会  2023.3.15 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  47. ベイズ超解像を用いたX線光電子分光測定の高速化

    原田 俊太, 辻森 皓太, 野本 豊和, 伊藤 孝寛

    第70回応用物理学会春季学術講演会  2023.3.17 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  48. SiC溶液成長法におけるパレート解に影響を与えるパラメータの考察

    霜田 大貴, 沓掛 健太朗, 原田 俊太, 田川 美穂, 宇治原 徹

    第70回応用物理学会春季学術講演会  2023.3.15 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  49. SiC溶液成長における粘度が流体分布、温度分布および成長速度に与える影響

    李 鐫恒, 党 一帆, 太田 壮音, 沓掛 健太朗, 原田 俊太, 田川 美穂, 宇治原 徹

    第70回応用物理学会春季学術講演会  2023.3.15 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  50. SiC溶液成長における炭素拡散場を介したステップ相互作用の解析

    中西 祐貴, 沓掛 健太朗, 黨 一帆, 原田 俊太, 田川 美穂, 宇治原 徹

    第70回応用物理学会春季学術講演会  2023.3.15 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  51. ベイズ超解像によるX線光電子スペクトルの高速取得

    原田俊太, 辻森皓太, 野本豊和, 伊藤孝寛

    第59回表面分析研究会  2023.3.3 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  52. 集光した偏光レーザーを用いた SiC 内部の転位の 3 次元観測

    佐藤 寿弥, 加藤 智久, 原田 俊太, 加藤 正史

    先進パワー半導体分科会第9回講演会  2022.12.20 

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    Event date: 2022.12

    Language:Japanese   Presentation type:Poster presentation  

  53. SiC PiN ダイオードへの H +注入によるバイポーラ劣化の抑制

    渡邉 王雅, 三井 俊樹, 原田 俊太, 坂根 仁, 加藤 正史

    先進パワー半導体分科会第9回講演会  2022.12.20 

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    Event date: 2022.12

    Language:Japanese   Presentation type:Poster presentation  

  54. 3 次元の応力分布を考慮した SiC 結晶中の転位の複屈折像シミュレーション

    松原 康高, 村山 健太, 原田 俊太

    先進パワー半導体分科会第9回講演会  2022.12.20 

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    Event date: 2022.12

    Language:Japanese   Presentation type:Poster presentation  

  55. パワーデバイス SiC 基板の結晶欠陥評価 Invited

    原田俊太

    先進パワー半導体分科会 第9回講演会  2022.12.21 

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    Event date: 2022.12

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  56. 混合ガウスモデルと強化学習による浮遊 帯域溶融法による結晶育成自動化の検 討

    原田俊太, 土佐祐介, 大前遼, 松本遼平, 炭谷翔悟

    第51回結晶成長国内会議  2022.10.31 

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    Event date: 2022.10 - 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  57. DNA修飾ナノ粒子の結晶成⾧における 重水の影響

    張力東, 横森真麻, 太田昇, 関口博, 原田俊太, 宇治原徹, 田川美穂

    第51回結晶成長国内会議  2022.11.1 

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    Event date: 2022.10 - 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  58. SiC溶液成⾧における溶液の拡散がス テップ成⾧に及ぼす影響の解明

    竹本玖生, 周恵琴, 深見勇馬, 沓掛健太郎, 原田俊太, 田川美穂, 宇治原徹

    第51回結晶成長国内会議  2022.10.31 

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    Event date: 2022.10 - 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  59. SiC溶液法における添加元素の溶液局 所構造への影響の第一原理計算による 解明

    関翔太, 河村貴宏, 原田俊太, 田川美穂, 宇治原徹

    第51回結晶成長国内会議  2022.10.31 

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    Event date: 2022.10 - 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  60. 偏光顕微鏡法によるSiC基板中の転位 の観察

    原田俊太, 松原康高, 村山健太

    第51回結晶成長国内会議  2022.10.31 

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    Event date: 2022.10 - 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  61. ベイズ超解像による分光分析の高精度化と応用展開 Invited

    原田俊太

    顕微鏡計測インフォマティックス研究部会 第4回研究会  2022.10.22 

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    Event date: 2022.10

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  62. 機械学習を用いたSiC結晶の転位増殖抑制に向けた降温条件の探索

    熊谷 尚純, 沓掛 健太朗, 原田 俊太, 田川 美穂, 宇治原 徹

    2022年第83回応用物理学会秋季学術講演会  2022.9.22 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  63. 専門家の知識を入れたものづくりのためのデータ同化(ii) -SiC溶液成長シミュレーションへの適用-

    太田 壮音, 沓掛 健太朗, 竹野 思温, 烏山 昌幸, 竹内 一郎, 原田 俊太, 田川 美穂, 宇治原 徹

    2022年第83回応用物理学会秋季学術講演会  2022.9.22 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  64. 大口径SiC溶液成長の現状と課題

    宇治原 徹, 鈴木 皓己, 古庄 智明, 沓掛 健太朗, 黨 一帆, 劉 欣博, 朱 燦, 周 惠琴, 深見 勇馬, 太田 壮音, 関 翔太, 霜田 大貴, 中西 祐貴, 島 颯一, 布野 日奈子, 上松 浩, 原田 俊太, 田川 美穂

    2022年第83回応用物理学会秋季学術講演会  2022.9.20 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  65. 多段プロセスに対するベイズ最適化の提案 -太陽電池プロセスを例に-

    沓掛 健太朗, 中野 高志, 草川 隼也, 竹内 一郎, 原田 俊太, 田川 美穂, 宇治原 徹

    2022年第83回応用物理学会秋季学術講演会  2022.9.22 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  66. 偏光観察による次世代パワーデバイス半導体基板の欠陥解析 Invited

    原田俊太, 松原康高, 村山健太

    日本金属学会2022年秋期(第171回)講演大会  2022.9.22 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (keynote)  

  67. プロトン注入によるSiCエピタキシャル層の基底面部分転位の運動抑制

    原田 俊太, 坂根 仁, 三井 俊樹, 加藤 正史

    2022年第83回応用物理学会秋季学術講演会  2022.9.20 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  68. SiC溶液法における溶媒への添加元素効果の第一原理計算による解析

    関 翔太, 河村 貴宏, 原田 俊太, 田川 美穂, 宇治原 徹

    2022年第83回応用物理学会秋季学術講演会  2022.9.20 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  69. SiC溶液成長法における中間メルトバックによる表面平坦性の改善

    馬 叔陽, 朱 燦, 党 一帆, 劉 欣博, 原田 俊太, 田川 美穂, 宇治原 徹

    2022年第83回応用物理学会秋季学術講演会  2022.9.20 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  70. H+注入によるSiC PiNダイオード内積層欠陥拡張の抑制

    渡邉 王雅, 三井 俊樹, 原田 俊太, 坂根 仁, 加藤 正史

    2022年第83回応用物理学会秋季学術講演会  2022.9.20 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  71. Analysis of effect of additives in solution growth of SiC by first-principles molecular dynamics calculation

    SHOTA SEKI, Takahiro Kawamura, Shunta Harada, Miho Tagawa, Toru Ujihara

    19th International Conference on Silicon Carbide and Related Materials  2022.9.12 

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    Event date: 2022.9

    Language:English   Presentation type:Oral presentation (general)  

  72. Suppression of stacking fault expansion in SiC PiN diodes by H+ implantation

    MASASHI KATO, Ohga Watanabe, Toshiki Mii, Hitoshi Sakane, Shunta Harada

    19th International Conference on Silicon Carbide and Related Materials  2022.9.15 

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    Event date: 2022.9

    Language:English   Presentation type:Oral presentation (general)  

  73. Suppression of recombination enhanced dislocation glide motion in 4H-SiC by hydrogen ion implantation

    SHUNTA HARADA, Toshiki Mii, Hitoshi Sakane, Masashi Kato

    19th International Conference on Silicon Carbide and Related Materials  2022.9.15 

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    Event date: 2022.9

    Language:English   Presentation type:Oral presentation (general)  

  74. Mechanism of defect contrast formation in off-axis SiC wafers by polarized light microscopy

    SHUNTA HARADA, Kenta Murayama

    19th International Conference on Silicon Carbide and Related Materials  2022.9.13 

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    Event date: 2022.9

    Language:English   Presentation type:Poster presentation  

  75. Defect Recognition and Evaluation of SiC Wafers for Power Device Application Invited

    Shunta Harada

    19th International Symposium on Control of Semiconductor Interfaces  2022.9.8 

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    Event date: 2022.9

    Language:English   Presentation type:Oral presentation (invited, special)  

  76. ベイズ超解像によるラマン散乱スペクトルの高精度化

    長坂 野乃子, 辻森 皓太, 原田 俊太, 廣谷 潤

    第59回炭素材料夏季セミナー  2022.9.1 

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    Event date: 2022.9

    Language:English   Presentation type:Poster presentation  

  77. Designing automated defect detection algorithm for characterization of semiconductor wafers

    Shunta Harada, Kota Tsujimori

    19th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors  2022.8.30 

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    Event date: 2022.8 - 2022.9

    Language:English   Presentation type:Poster presentation  

  78. Identifying edge-component Burgers vector of threading dislocations in SiC crystals by birefringence imaging

    Shunta Harada, Kenta Murayama

    19th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors  2022.8.31 

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    Event date: 2022.8 - 2022.9

    Language:English   Presentation type:Oral presentation (general)  

  79. Development of a high-resolution nuclear emulsion plate for X-ray topography observation of large-size semiconductor wafers

    Shunta Harada, Kunihiro Morishima, Nobuko Kitagawa, Atsushi Tanaka, Kenji Hanada, Kotaro Ishiji

    19th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors  2022.8.31 

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    Event date: 2022.8 - 2022.9

    Language:English   Presentation type:Poster presentation  

  80. ベイズ超解像による分光分析の高精度化 Invited

    原田俊太

    応用物理学会 インフォマティクス応用研究会 第4回研究会「計測インフォマティクス」  2022.5.24 

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    Event date: 2022.5

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  81. SiC基板の偏光観察における欠陥コントラスト生成メカニズム

    原田 俊太, 村山 健太

    第69回応用物理学会春季学術講演会  2022.3.25 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  82. 強化学習を用いた浮遊帯域溶融法による結晶成長の自動制御モデルの構築

    土佐 祐介, 炭谷 翔悟, 大前 遼, 原田 俊太

    第69回応用物理学会春季学術講演会  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  83. 面欠陥周期配列を含む酸化チタン自然超格子の熱輸送における フォノンの粒子性と波動性の定量化

    杉本 峻也, 田川 美穂, 宇治原 徹, 原田 俊太

    第69回応用物理学会春季学術講演会  2022.3.24 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  84. Cr添加酸化チタンにおける面欠陥不規則配列の形成

    位田 麻衣, 杉本 峻也, 服部 泰河, 田川 美穂, 宇治原 徹, 原田 俊太

    日本金属学会第170回講演大会  2022.3.20 

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    Event date: 2022.3

    Language:English   Presentation type:Poster presentation  

  85. 完全性の高い周期界面を含む自然超格子酸化チタンの構造制御と熱輸送特性

    原田 俊太, 小坂 直輝, 杉本 峻也, 八木 貴志, 田川 美穂, 宇治原 徹

    日本金属学会第170回講演大会  2022.3.16 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  86. 偏光観察によるパワーデバイス SiC 基板中の貫通刃状転位の観察

    原田 俊太, 村山 健太

    日本金属学会第170回講演大会  2022.3.6 

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    Event date: 2022.3

    Language:English   Presentation type:Oral presentation (general)  

  87. Thermal conduction in titanium oxide natural superlattice with an ordered arrangement of coherent interfaces International conference

    Shunta Harada, Naoki Kosaka, Shunya Sugimoto, Takashi Yagi, Miho Tagawa, Toru Ujihara

    International Conference on Materials and Systems for Sustainability 2021  2021.11.6 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

  88. Thermal conduction in titanium oxide natural superlattice with an ordered arrangement of planar faults with pico-scale structural perfection International conference

    S. Harada, N.Kosaka, S.Sugimoto, T.Yagi, M.Tagawa, T.Ujihara

    The 2nd Asian Conference on Thermal Sciences  2021.10.5 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

  89. Cr添加酸化チタン自然超格子における 面欠陥不規則配列

    服部泰河, 杉本峻也, 田川美穂, 宇治原徹, 原田俊太

    第50回結晶成長国内会議  2021.10.27 

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    Event date: 2021.10

    Language:Japanese   Presentation type:Oral presentation (general)  

  90. 完全性の高い界面を周期的に含む自然 超格子酸化チタン結晶の構造制御

    原田俊太, 杉本峻也, 小坂直輝, 田川美穂, 宇治原徹

    第50回結晶成長国内会議  2021.10.27 

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    Event date: 2021.10

    Language:Japanese   Presentation type:Oral presentation (general)  

  91. Coherent thermal conduction in titanium-chrome oxide natural superlattices with an ordered arrangement of planar faults International conference

    S.Sugimoto, G.Kim, T.Takeuchi, M.Tagawa, T.Ujihara, S.Harada

    The 2nd Asian Conference on Thermal Sciences  2021.10.5 

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    Event date: 2021.10

    Language:English   Presentation type:Oral presentation (general)  

  92. 混合ガウスモデルを用いた浮遊帯域溶融法における融液状態のダイナミクス推定

    大前 遼, 炭谷 翔悟, 土佐 祐介, 原田 俊太

    第82回応用物理学会秋季学術講演会  2021.9.11 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  93. ベイズ超解像のラマン散乱スペクトルへの応用

    原田 俊太, 辻森 皓太, 廣谷 潤

    第82回応用物理学会秋季学術講演会  2021.9.11 

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    Event date: 2021.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  94. Control of an Ordered Arrangement of Coherent Interfaces to Phoons in Titanium-Chromium Oxide Natural Superlattices

    2021.7.3 

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    Event date: 2021.7

    Language:English   Presentation type:Poster presentation  

  95. 機能性バルク結晶における原子スケール欠陥構造制御 Invited

    原田俊太

    日本地球惑星科学連合2021年大会  2021.6.5 

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    Event date: 2021.5 - 2021.6

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  96. Control of periodic structure in a homologous series of titanium oxide bulk crystals in atomic scale

    S. Harada, S. Sugimoto, M. Tagawa, T. Ujihara

    2021 Virtual MRS Spring Meteting  2021.4.18 

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    Event date: 2021.4

    Language:English   Presentation type:Poster presentation  

  97. 面欠陥周期配列を含むCr添加酸化チタン多結晶の熱伝導率の温度依存性

    杉本 峻也, 金 柯怜, 竹内 恒博, 田川 美穂, 宇治原 徹, 原田 俊太

    2021年第68回応用物理学会学術講演会  2021.3.16 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  98. 放射光トポグラフィーによるSiC中の基底面転位の深さ評価

    藤榮 文博, Hongyu Peng, Tuerxun Ailihumaer, Balaji Raghothamachar, Michael Dudley, 原田 俊太, 田川 美穂, 宇治原 徹

    2021年第68回応用物理学会学術講演会  2021.3.18 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  99. 面欠陥周期配列を含む自然超格子酸化チタンの構造制御と熱輸送特性

    原田 俊太, 小坂 直輝, 杉本 峻也, 八木 貴志, 田川 美穂, 宇治原 徹

    2021年第68回応用物理学会学術講演会  2021.3.16 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  100. 放射光トポグラフィーによるSiC中の基底面転位の深さ評価

    藤榮 文博, Hongyu Peng, Tuerxun Ailihumaer, Balaji Raghothamachar, Michael Dudley, 原田 俊太, 田川 美穂, 宇治原 徹

    2021年第68回応用物理学会学術講演会  2021.3.18 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  101. 面欠陥周期配列を含む自然超格子酸化チタンの構造制御と熱輸送特性

    原田 俊太, 小坂 直輝, 杉本 峻也, 八木 貴志, 田川 美穂, 宇治原 徹

    2021年第68回応用物理学会学術講演会  2021.3.16 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  102. 面欠陥周期配列を含むCr添加酸化チタン多結晶の熱伝導率の温度依存性

    杉本 峻也, 金 柯怜, 竹内 恒博, 田川 美穂, 宇治原 徹, 原田 俊太

    2021年第68回応用物理学会学術講演会  2021.3.16 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

  103. DNAガイドのナノ粒子結晶化:構造制御と結晶対称性を維持した収縮制御 Invited

    田川美穂, 鷲見隼人, 横森真麻,  前田勇士, 太田昇, 関口博史, 原田俊太, 宇治原徹

    日本物理学会第76回年次大会(領域9結晶成長)  2021.3.13 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  104. DNAガイドのナノ粒子結晶化:構造制御と結晶対称性を維持した収縮制御 Invited

    田川美穂, 鷲見隼人, 横森真麻, 前田勇士, 太田昇, 関口博史, 原田俊太, 宇治原徹

    日本物理学会第76回年次大会(領域9結晶成長)  2021.3.13 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  105. 顕微ラマン分光法によるGaN結晶中の貫通転位のひずみイメージング Invited

    小久保 信彦,角岡 洋介, 藤榮文博,恩田正一,山田永,清水三聡,原田俊太,田川美穂,宇治原徹

    先進パワー半導体分科会 第7回講演会  2020.12.10 

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    Event date: 2020.12

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  106. 顕微ラマン分光法によるGaN結晶中の貫通転位のひずみイメージング Invited

    小久保 信彦, 角岡 洋介, 藤榮文博, 恩田正一, 山田永, 清水三聡, 原田俊太, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第7回講演会  2020.12.10 

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    Event date: 2020.12

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

  107. Prediction system of CFD simulation in solution growth constructed by machine learning - Application for SiC top-seeded solution growth – Invited International conference

    Toru Ujihara, Yosuke Tsunooka, Tomoki Endo, Can Zhu, Shunta Harada, Miho Tagawa

    17th China International Forum on Solid State Lighting & 2020 International Forum on Wide Bandgap Semiconductors (SSLCHINA&IFWS 2020)  2020.11.24 

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    Event date: 2020.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:China  

  108. Prediction system of CFD simulation in solution growth constructed by machine learning - Application for SiC top-seeded solution growth – Invited International conference

    Toru Ujihara, Yosuke Tsunooka, Tomoki Endo, Can Zhu, Shunta Harada, Miho Tagawa

    17th China International Forum on Solid State Lighting & 2020 International Forum on Wide Bandgap Semiconductors (SSLCHINA&IFWS 2020)  2020.11.24 

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    Event date: 2020.11

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:China  

  109. 分子線エピタキシーによるBAs薄膜の成長条件の検討

    蔡沛陽, 畑野敬史, 原田俊太, 生田博志, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  110. DNA修飾ナノ粒子コロイド結晶化における結晶性に及ぼす塩濃度の影響

    鷲見隼人, 太田昇, 関口博史, 原田俊太, 宇治原徹, 田川美穂

    第49回結晶成長国内会議(JCCG-49)  2020.11.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  111. DNA修飾ナノ粒子超格子のサイズ・結晶性に及ぼす修飾DNA鎖長の影響

    鈴木康平, 太田昂, 関口博史, 鷲見隼人, 横森真麻, 原田俊太, 宇治原徹, 田川美穂

    第49回結晶成長国内会議(JCCG-49)  2020.11.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  112. DNA修飾ナノ粒子超格子結晶化における塩濃度が粒子間相互作用に与える影響

    楊冰琦, 鷲見隼人, 太田昇, 関口博史, 原田俊太, 宇治原徹, 田川美穂

    第49回結晶成長国内会議(JCCG-49)  2020.11.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  113. CFDによるステップバンチング挙動シミュレーション

    劉欣博, 党一帆, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  114. Cr添加酸化チタン結晶における面欠陥周期構造の制御

    杉本峻也, 田川美穂, 宇治原徹, 原田俊太

    第49回結晶成長国内会議(JCCG-49)  2020.11.10 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Poster presentation  

  115. 長時間安定SiC溶液成長における経時変化のシミュレーションと最適化

    党一帆, 朱燦, 幾見基希, 郁万成,黄威, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.10 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  116. SiC溶液成長における機械学習を用いた固-液界面形状の時間変化の推定

    高石将輝, 党一帆, 沓掛健太朗, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  117. 放射光トポグラフィー高温その場観察による窒素添加4H-SiC結晶における積層欠陥エネルギーの定量化

    藤榮文博, 原田俊太, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  118. SiC溶液成長における境界層とステップバンチングの関係

    海野高天, 朱燦, 原田俊太, 劉欣博, 幾見基希, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  119. Si-Y溶媒を用いたSiC溶液成長中の自然核生成による多結晶析出の抑制

    幾見基希, 朱燦, 原田俊太, 党一帆, 海野高天, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  120. 溶液法によるBPDフリー3インチSiC結晶の成長

    朱燦, 郁万成, 黄威, 幾見基希, 党一帆, 海野高天, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  121. 機械学習支援による溶液成長法を用いた6インチSiC作製手法の確立

    郁万成, 朱燦, 角岡洋介, 黄威, 党一帆, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  122. 機械学習を用いたSiC溶液法の温度・流速分布の次元削減とロバスト性評価

    磯野優, 小山幸典, 沓掛健太郎, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Language:Japanese   Presentation type:Oral presentation (general)  

  123. SiC昇華法におけるベイズ最適化を用いた高品質・高速成長条件の探索

    井上凱喜, 沓掛健太郎, 原田俊太,田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  124. 高温環境下におけるGaN基板中の貫通転位の構造変化の解明

    水野竜太郎, 藤榮文博, 山田永, 原田俊太, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  125. 時間的な温度差により熱エネルギーを電気に変換する熱電池の構築

    陳曄, 石川晃平, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  126. CFDによるステップバンチング挙動シミュレーション

    劉欣博, 党一帆, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  127. 高温環境下におけるGaN基板中の貫通転位の構造変化の解明

    水野竜太郎, 藤榮文博, 山田永, 原田俊太, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  128. 長時間安定SiC溶液成長における経時変化のシミュレーションと最適化

    党一帆, 朱燦, 幾見基希, 郁万成, 黄威, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.10 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  129. 溶液法によるBPDフリー3インチSiC結晶の成長

    朱燦, 郁万成, 黄威, 幾見基希, 党一帆, 海野高天, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  130. 機械学習支援による溶液成長法を用いた6インチSiC作製手法の確立

    郁万成, 朱燦, 角岡洋介, 黄威, 党一帆, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  131. 機械学習を用いたSiC溶液法の温度・流速分布の次元削減とロバスト性評価

    磯野優, 小山幸典, 沓掛健太郎, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  132. 時間的な温度差により熱エネルギーを電気に変換する熱電池の構築

    陳曄, 石川晃平, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  133. 放射光トポグラフィー高温その場観察による窒素添加4H-SiC結晶における積層欠陥エネルギーの定量化

    藤榮文博, 原田俊太, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  134. 分子線エピタキシーによるBAs薄膜の成長条件の検討

    蔡沛陽, 畑野敬史, 原田俊太, 生田博志, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  135. SiC溶液成長における機械学習を用いた固-液界面形状の時間変化の推定

    高石将輝, 党一帆, 沓掛健太朗, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  136. SiC溶液成長における境界層とステップバンチングの関係

    海野高天, 朱燦, 原田俊太, 劉欣博, 幾見基希, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  137. SiC昇華法におけるベイズ最適化を用いた高品質・高速成長条件の探索

    井上凱喜, 沓掛健太郎, 原田俊太, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  138. Si-Y溶媒を用いたSiC溶液成長中の自然核生成による多結晶析出の抑制

    幾見基希, 朱燦, 原田俊太, 党一帆, 海野高天, 田川美穂, 宇治原徹

    第49回結晶成長国内会議(JCCG-49)  2020.11.9 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  139. DNA修飾ナノ粒子超格子結晶化における塩濃度が粒子間相互作用に与える影響

    楊冰琦, 鷲見隼人, 太田昇, 関口博史, 原田俊太, 宇治原徹, 田川美穂

    第49回結晶成長国内会議(JCCG-49)  2020.11.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  140. DNA修飾ナノ粒子超格子のサイズ・結晶性に及ぼす修飾DNA鎖長の影響

    鈴木康平, 太田昂, 関口博史, 鷲見隼人, 横森真麻, 原田俊太, 宇治原徹, 田川美穂

    第49回結晶成長国内会議(JCCG-49)  2020.11.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  141. DNA修飾ナノ粒子コロイド結晶化における結晶性に及ぼす塩濃度の影響

    鷲見隼人, 太田昇, 関口博史, 原田俊太, 宇治原徹, 田川美穂

    第49回結晶成長国内会議(JCCG-49)  2020.11.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

  142. Cr添加酸化チタン結晶における面欠陥周期構造の制御

    杉本峻也, 田川美穂, 宇治原徹, 原田俊太

    第49回結晶成長国内会議(JCCG-49)  2020.11.10 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Poster presentation  

  143. Automatic Detection of Dislocation contrasts in Birefringence Image of SiC Wafers Using Variance Filter Method International conference

    Akira Kawata, Kenta Murayama, Shogo Sumitani, Shunta Harada

    2020 International Conference on Solid State Devices and Materials (SSDM 2020)  2020.9.29 

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    Event date: 2020.9

    Language:English   Presentation type:Oral presentation (general)  

  144. Automatic Detection of Dislocation contrasts in Birefringence Image of SiC Wafers Using Variance Filter Method International conference

    Akira Kawata, Kenta Murayama, Shogo Sumitani, Shunta Harada

    2020 International Conference on Solid State Devices and Materials (SSDM 2020)  2020.9.29 

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    Event date: 2020.9

    Language:English   Presentation type:Oral presentation (general)  

  145. イオン注入シミュレーションに対する機械学習の適用

    蜂谷涼太, 沓掛健太朗, 原田俊太, 田川美穂, 宇治原徹

    第81回応用物理学会秋季学術講演会  2020.9.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  146. イオン注入シミュレーションに対する機械学習の適用

    蜂谷涼太, 沓掛健太朗, 原田俊太, 田川美穂, 宇治原徹

    第81回応用物理学会秋季学術講演会  2020.9.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

  147. 機械学習を活用したSiC溶液成長プロセス・ビュジュアライゼーション

    宇治原徹, 畑佐豪記, 角岡洋介, 村山健太, 原田俊太, 田川美穂

    第46回結晶成長国内会議(JCCG-46) 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ホテルコンコルド浜松   Country:Japan  

  148. SiC溶液成長過程における転位伝播方向制御による高品質化

    原田俊太, 村山健太, 村井良多, 朱燦, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46) 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ホテルコンコルド浜松   Country:Japan  

  149. 4H-SiC溶液成長法二段階成長における異種多形の析出抑制

    村山健太, 原田俊太, 藤栄文博, 劉欣博, 村井良多, 朱燦, 花田賢志, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46) 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ホテルコンコルド浜松   Country:Japan  

  150. SiC溶液成長におけるプロセス・インフォマティクス

    宇治原徹,角岡洋介,畑佐豪記,村山健太,村井良多,朱燦,原田俊太,田川美穂

    第46回結晶成長国内会議(JCCG-46) 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:ホテルコンコルド浜松   Country:Japan  

  151. 気相法AlNウィスカー成長における形状変化メカニズムの解明

    齊藤廣志, 竹内幸久, 原田俊太, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46) 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:ホテルコンコルド浜松   Country:Japan  

  152. 機械学習による結晶成長条件の予測を用いたSiC溶液成長

    林宏益, 村井良多, 朱燦, 村山健太, 角岡洋介, 畑佐豪記, 原田俊太, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46) 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:ホテルコンコルド浜松   Country:Japan  

  153. 機械学習による熱流体解析の高速化における予測精度

    畑佐豪記, 角岡洋介, 村井良多, 村山健太, 朱燦, 原田俊太, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46) 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:ホテルコンコルド浜松   Country:Japan  

  154. 溶液法 SiC 基板を用いて作製した MOS キャパシタの評価

    古庄智明, 川畑直之, 古橋壮之, 渡辺友勝, 渡邊寛, 山川聡, 村山健太, 原田俊太, 宇治原徹

    先進パワー半導体分科会 第4回講演会 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  155. 貫通らせん転位が極めて少ない 4H-SiC の溶液成長における多形安定化手法

    村山健太, 原田俊太, 藤栄文博, 劉欣博, 村井良多, 朱燦, 花田賢志, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第4回講演会 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋国際会議場   Country:Japan  

  156. 溶液成長における溶液状態の高速予測と 網羅的探索により最適化した条件での結晶成長

    村井良多, 村山健太, 原田俊太, 畑佐豪記, 角岡洋介, 林宏益, 朱燦, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第4回講演会 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  157. SiC 溶液成長法における溶媒中の Cr 組成に対する 成長ポリタイプの面内分布及び相対存在割合の評価

    鈴木皓己, 高橋大, 土本直道, 玄光龍, 太子敏則, 村山健太, 原田俊太, 宇治原徹

    先進パワー半導体分科会 第4回講演会 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  158. ラマン分光法による GaN 単結晶における貫通転位の刃状成分の解析

    小久保信彦, 角岡洋介, 藤榮文博, 大原淳士, 原一都, 恩田正一, 山田永, 清水三聡, 原田俊太, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第4回講演会 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  159. X 線トポグラフィーその場観察による 4H-SiC 積層欠陥挙動の窒素濃度依存性評価

    藤榮文博, 原田俊太, 周防裕政, 加藤智久, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第4回講演会 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場   Country:Japan  

  160. Smooth Li Electrodeposition on Single Crystal Cu Current Collectors International conference

    K. Ishikawa, Y. Ito, S. Harada, M. Tagawa, T. Ujihara

    The Electrochemical Society (232nd ECS Meeting) 

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    Event date: 2017.10

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  161. High-Quality SiC Solution Growth Using Dislocation Conversion on C Face International conference

    S. Xiao, S. Harada, X. Liu, K. Murayama, R. Murai, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017) 

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    Event date: 2017.9

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  162. Two-Step Sic Solution Growth with Extremely Low-Dislocation-Density 4h-SiC Crystal for Suppression of Polytype Transformation International conference

    K. Murayama, S. Harada, F. Fujie, X. Liu, R. Murai, C. Zhu, K. Hanada, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017) 

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    Event date: 2017.9

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  163. High-Speed Prediction Model for Supersaturation and Flow Distribution by CFD Simulation and Machine Learning in SiC Solution Growth International conference

    Y. Tsunooka, N. Kokubo, G. Hatasa, S. Harada, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017) 

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    Event date: 2017.9

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  164. Real-Time Visualization System for Temperature and Fluid Flow Distributions in SiC Solution Growth Using Prediction Model Constructed by Machine Learning International conference

    G. Hatasa, Y. Tsunooka, S. Lee, K. Murayama, R. Murai, S. Harada, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017) 

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    Event date: 2017.9

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  165. Direct Observation of Stacking Faults Expansion in 4H-SiC at High Temperatures by In Situ X-Ray Topography International conference

    F. Fujie, S. Harada, K. Murayama, K. Hanada, P. Chen, T. Kato, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017) 

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    Event date: 2017.9

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  166. Evaluation of 2-Inch Wafer by Solution Growth Method Using Synchrotron X-Ray Topography International conference

    K. Seki, K. Kusunoki, Y. Kishida, H. Kaido, K. Moriguchi, M. Kado, H. Daikoku, T. Shirai, M. Akita, A. Seki, H. Saito, S. Harada, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017) 

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    Event date: 2017.9

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  167. 単結晶Cu集電体を用いた金属Li負極の不均一析出抑制

    石川 晃平, 原田 俊太, 田川 美穂, 宇治原 徹

    日本金属学会 2017年秋期講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  168. SiCにおける積層欠陥拡張・収縮挙動の高温その場観察

    藤榮 文博, 原田 俊太, 花田 賢志, 村山 健太, 田川 美穂, 加藤 智久, 宇治原 徹

    日本金属学会 2017年秋期講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  169. 溶液成長SiC基板上に作製した酸化膜の評価

    古庄 智明, 川畑 直之, 古橋 壮之, 渡辺 友勝, 渡邊 寛, 山川 聡, 村山 健太, 原田 俊太, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場   Country:Japan  

  170. DNA被覆ナノ粒子によるDDAB脂質二重膜の指組みゲル相形成の促進

    磯貝 卓巳, 鷲見 隼人, 手老 龍吾, 原田 俊太, 宇治原 徹, 田川 美

    2017年第78回応用物理学会秋季学術講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:福岡国際会議場   Country:Japan  

  171. Investigation of high-temperature annealing process ofsputtered AlN films

    S. Xiao, Y. Liu, R. Suzuki, H. Miyake, K. Hiramatsu, S. Harada,T. Ujihara

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    Event date: 2017.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  172. 機械学習を用いたSiC結晶成長実験条件の最適化

    村井 良多, 畑佐 豪記, 角岡 洋介, 林 宏益, 村山 健太, 朱 燦, 原田 俊太, 田川 美穂, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場   Country:Japan  

  173. SiC溶液法C面成長における貫通らせん転位の低減

    劉 欣博, 原田 俊太, 村山 健太, 村井 良多, 肖 世玉, 田川 美穂, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場   Country:Japan  

  174. 4H-SiC 溶液成長における積層欠陥との相互作用により生じる貫通らせん転位の変換挙動

    加渡 幹尚, 原田 俊太, 関 和明, 大黒 寛典, 楠 一彦, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場   Country:Japan  

  175. X線その場観察によりメニスカス高さ制御したSiC溶液成長

    酒井 武信, 秋田 光俊, 加度 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場   Country:Japan  

  176. Li挿入によるWO3薄膜の熱伝導率の変化

    小林 竜大, 中村 彩乃, 原田 俊太, 田川 美穂, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場   Country:Japan  

  177. SiC溶液成長における機械学習を用いた閉鎖空間の溶液温度・流速分布の予

    畑佐 豪記, 角岡 洋介, 村山 健太, 村井 良太, 原田 俊太, 田川 美穂, 宇治原 徹

    第40回結晶成長討論会 

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    Event date: 2017.8 - 2017.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:浜名湖ロイヤルホテル   Country:Japan  

  178. Hydrogen-Induced Thermal Conductivity Change across Metal-Insulator Transition in Amorphous WO3 Film International conference

    A. Nakamura, S. Harada, M. Tagawa, T. Ujihara

    2017 MRS Spring Meeting 

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    Event date: 2017.4

    Language:English  

    Country:United States  

  179. 後方反射X線トポグラフィによる4H-SiC積層欠陥拡張挙動のその場観察

    藤榮 文博, 原田 俊太, 村山 健太, 花田 賢志, 陳鵬磊, 加藤 智久, 田川 美穂, 宇治原 徹

    2017年第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:パシフィコ横浜   Country:Japan  

  180. DNA修飾ナノ粒子超格子を前駆体としたウルフ多面体型コロイド結晶の形成

    鷲見 隼人, 磯貝 卓巳, 吉田 直矢, 原田 俊太, 宇治原 徹, 田川 美穂

    2017年第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:パシフィコ横浜   Country:Japan  

  181. SiC溶液成長における最適条件高速探索手法の提案

    角岡 洋介, 小久保 信彦, 原田 俊太, 田川 美穂,宇治原 徹

    2017年第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:パシフィコ横浜   Country:Japan  

  182. 水素挿入・脱離によるWO3薄膜の熱伝導率制御

    中村 彩乃, 小林 竜太, 原田 俊太, 田川 美穂, 宇治原 徹

    2017年第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:パシフィコ横浜   Country:Japan  

  183. 酸化タングステンの酸化還元による可逆的熱伝導率制御

    原田 俊太, 弓削 勇輔, 田川 美穂, 宇治原徹

    2017年第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:パシフィコ横浜   Country:Japan  

  184. 4H-SiC中1SSF・PD起因フォトルミネッセンス減衰時間の温度依存性

    片平 真哉, 市川 義人, 原田 俊太, 木本 恒暢, 加藤 正史

    2017年第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:パシフィコ横浜   Country:Japan  

  185. X線透過法により溶液形状制御したSiC溶液成長

    酒井 武信, 加渡 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    2017年第64回応用物理学会春季学術講演会 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:パシフィコ横浜   Country:Japan  

  186. 半導体伝導帯構造を明らかにする可視光電子光電子分光法の提案

    宇治原 徹, 市橋 史朗, 董 キン宇, 井上 明人, 川口 昂彦, 桑原 真人, 伊藤 孝寛, 原田 俊太, 田川 美穂

    2016年真空・表面科学合同講演会 第 36 回表面科学学術講演会 第 57 回真空に関する連合講演会 

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    Event date: 2016.11 - 2016.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋国際会議場   Country:Japan  

  187. 金属 Li 負極における Cu 集電体の結晶方位と析出形状の関係

    石川 晃平, 伊藤 靖仁, 原田 俊太, 田川 美穂, 宇治原 徹

    第57回電池討論会 

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    Event date: 2016.11 - 2016.12

    Language:Japanese   Presentation type:Poster presentation  

    Venue:幕張メッセ国際会議場   Country:Japan  

  188. Optically induced crystallization of NaClO3 metastable phase on plasmonic gold nanostructures immersed in unsaturated mother solution

    H. Niinomi, T. Sugiyama, M. Tagawa, T. Ujihara, Y. Mori, S. Harada, K. Murayama, K. Miyamoto, T. Omatsu

    Institute for Global Prominent Research Kickoff Symposium 

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    Event date: 2016.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  189. X線透過法による SiC 溶液成長の溶液流れと溶液形状のその場観察

    酒井 武信, 加渡 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    先進パワー半導体分科会 第3回講演会 

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    Event date: 2016.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:つくば国際会議場   Country:Japan  

  190. 窒素添加した 4H-SiC における積層欠陥拡張・収縮挙動の高温その場観察

    藤榮 文博, 原田 俊太, 村山 健太, 花田 賢志, 陳 鵬磊, 田川 美穂, 加藤 智久, 宇治原 徹

    先進パワー半導体分科会 第3回講演会 

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    Event date: 2016.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:つくば国際会議場   Country:Japan  

  191. 透過電子顕微鏡による窒素添加 SiC 積層欠陥の高温その場観察

    陳 鵬磊, 原田 俊太, 荒井 重勇, 藤榮 文博, 肖 世玉, 加藤 智久, 田川 美穂, 宇治原 徹

    先進パワー半導体分科会 第3回講演会 

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    Event date: 2016.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:つくば国際会議場   Country:Japan  

  192. SiC 溶液成長においてルツボ口径が多結晶析出に及ぼす影響

    岡島 鎮記, 村井 良多, 村山 健太, 原田 俊太, 田川 美穂, 宇治原 徹

    先進パワー半導体分科会 第3回講演会 

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    Event date: 2016.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:つくば国際会議場   Country:Japan  

  193. 溶液成長法二段階成長による SiC 結晶内の欠陥密度の低減

    村山 健太, 堀 司紗, 原田 俊太, 田川 美穂, 宇治原 徹

    先進パワー半導体分科会 第3回講演会 

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    Event date: 2016.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:つくば国際会議場   Country:Japan  

  194. Crystallization of NaClO3 metastable phase from unsaturated mother solution achieved by excitation of plasmonic Au nanoarray

    H. Niinomi, T. Sugiyama, M. Tagawa, T. Ujihara, Y. Mori, S. Harada, K. Murayama, K. Miyamoto, T. Omatsu

    Optics & Photonics Japan 2016 

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    Event date: 2016.10 - 2016.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  195. Trial of Process Informatics in SiC Solution Growth International conference

    T. Ujihara, S. Harada, Y. Tsunooka, N. Kokubo, K. Murayama, R. Murai, M. Tagawa

    The 3rd International Conference on Universal Village (UV 2016) 

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    Event date: 2016.10

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  196. Effect of Crystal Orientation of Cu Current Collector on Morphology of Li Electrodeposition International conference

    K. Ishikawa, Y. Ito, S. Harada, M. Tagawa, T. Ujihara

    Nucleation and Growth Research Conference (NGRC 2016) 

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    Event date: 2016.9

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  197. Formation Mechanism of AlN Whiskers by Reacting N2 Gas and Al Vapor International conference

    M. Matsumoto, H. Saitou, Y. Takeuchi, S. Harada, M. Tagawa, T. Ujihara

    Nucleation and Growth Research Conference (NGRC 2016) 

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    Event date: 2016.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  198. Reduction of all types of dislocation in 4H-SiC crystal by two-step solution growth International conference

    K. Murayama, T. Hori, S. Harada, S. Xiao, M. Tagawa, T. Ujihara

    The 11th European Conference on Silicon Carbide and Related Materials (ECSCRM) 

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    Event date: 2016.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Greece  

  199. Solvent design for high-purity SiC solution growth International conference

    S. Harada, G. Hatasa, K. Murayama, T. Kato, M. Tagawa, T. Ujihara

    The 11th European Conference on Silicon Carbide and Related Materials (ECSCRM) 

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    Event date: 2016.9

    Language:English   Presentation type:Poster presentation  

    Country:Greece  

  200. In-situ observation during solution growth of SiC by X-ray transmission method International conference

    T. Sakai, M. Kado, H. Daikoku, S. Harada, T. Ujihara

    The 11th European Conference on Silicon Carbide and Related Materials (ECSCRM) 

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    Event date: 2016.9

    Language:English   Presentation type:Poster presentation  

    Country:Greece  

  201. Formation of basal plane dislocations introduced by collision of macrosteps on growth surface during SiC solution growth International conference

    T. Hori, K. Murayama, S. Harada, S. Xiao, M. Tagawa, T. Ujihara

    The 11th European Conference on Silicon Carbide and Related Materials (ECSCRM) 

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    Event date: 2016.9

    Language:English   Presentation type:Poster presentation  

    Country:Greece  

  202. AlN 溶液成長における機械学習を用いた溶液流動の高効率予測

    小久保 信彦, 角岡 洋介, 原田 俊太, 田川 美穂, 宇治原 徹

    2016年第78回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ   Country:Japan  

  203. n 型 4H-SiC 中 SSF 起因フォトルミネッセンスの時間分解測定

    加藤 正史, 片平 真哉, 市川 義人, 市村 正也, 原田 俊太

    2016年第82回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ   Country:Japan  

  204. 機械学習を用いた溶液成長における過飽和度分布の予測

    角岡 洋介, 小久保 信彦, 原田 俊太, 田川 美穂, 宇治原 徹

    2016年第81回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ   Country:Japan  

  205. X 線透過法による溶液法 SiC 結晶成長の溶液表面形状の経時変化の観察

    酒井 武信, 加渡 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    2016年第80回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ   Country:Japan  

  206. X 線透過法による溶液法 SiC 結晶成長のその場観察

    酒井 武信, 加渡 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    2016年第79回応用物理学会秋季学術講演会 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ   Country:Japan  

  207. Controlling two-dimensional structuer of DNA-linked Au nanoparticle lattices on supported lipid bilayer International conference

    T. Isogai, N. Yoshida, H. Sumi, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    The 22nd International Conference on DNA Computing and Molecular Programming (DNA22) 

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    Event date: 2016.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Germany  

  208. Control of Macrostep Structure for High-Quality SiC Grown by Liquid Phase Epitaxy International conference

    T. Ujihara, C. Zhu, K. Murayama, S. Harada, M.Tagawa

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  209. The realization of high-quality 4H-SiC C-face grown crystals by controlling the macrosteps formation during solution growth International conference

    S. Y. Xiao, S. Harada, P. L. Chen, K. Murayama, T.Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  210. Effect of Crystal Shape on Solution Flow and Surface Morphology in Solution Growth of SiC International conference

    D. Koike, T. Umezaki, K. Murayama, K. Aoyagi, S.Harada, M. Tagawa, T. Sakai, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  211. Two-step growth of SiC solution growth for reduction of dislocations International conference

    K. Murayama, T. Hori, S. Harada, S. Xiao, M.Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  212. Threading Screw Dislocation Conversion by Macrosteps during SiC Solution Growth for High-quality Crystals International conference

    S. Harada, K. Murayama, S. Xiao, F. Fujie, T.Sakai, M. Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  213. Morphology of AlN whiskers grown by reacting N2 gas and Al vapor International conference

    M. Matsumoto, H. Saitou, Y. Takeuchi, S. Harada, M. Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  214. Prediction of solution flow combined with computational fluid dynamics simulation and sparse modeling International conference

    N. Kokubo, Y. Tsunooka, S. Harada, M. Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  215. Crystal orientation dependence of precipitate structure of electrodeposited Li metal on Cu current collectors International conference

    K. Ishikawa, Y. Ito, S. Harada, M. Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  216. Phase transition process in DDAB supported lipid bilayer International conference

    T. Isogai, S. Nakada, N. Yoshida, H. Sumi, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18) 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  217. 塩素酸ナトリウム水溶液中の銀ナノ粒子円偏光光学捕捉により誘起されるキラル結晶化におけるキラリティの偏り

    新家 寛正, 杉山 輝樹, 田川 美穂, 村山 健太, 原田 俊太, 宇治原 徹

    日本地球惑星科学連合2016年大会 

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    Event date: 2016.5

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:幕張メッセ   Country:Japan  

  218. Chiral bias on circularly polarized laser-induced chiral crystallization from NaClO3 solution containing plasmonic Ag nanoparticles International conference

    H. Niinomi, T. Sugiyama, M. Tagawa, K. Murayama, S. Harada, K. Miyamoto, T. Omatsu, T. Ujihara

    Optical manipulation and its satellite topics (OMC'16) 

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    Event date: 2016.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  219. "溶液法による4H-SiCバルク結晶成長と結晶品質評価"

    楠一彦,関和明,岸田豊,海藤宏志,森口晃治,岡田信宏,大黒寛典,加渡幹尚,土井雅喜,旦野克典,関章憲,佐藤和明,別所毅,原田俊太,宇治原徹

    2016年第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東工大大岡山キャンパス   Country:Japan  

  220. "可視光励起光電子分光法を用いたGaPにおけるキャリア散乱の温度依存性評価"

    市橋史朗,川口昂彦,董キン宇,井上明人,桑原真人,伊藤孝寛,原田俊太,田川美穂,宇治原徹

    2016年第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東工大大岡山キャンパス   Country:Japan  

  221. "強磁場スパッタ法によるマンガン窒化物薄膜の作製"

    松本利希,川口昂彦,畑野敬史,原田俊太,飯田和昌,宇治原徹,生田博志

    2016年第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東工大大岡山キャンパス   Country:Japan  

  222. "超格子構造中のDNA被覆金ナノ粒子の融合に向けた粒子間距離収縮とナノ粒子融合"

    鷲見隼人,磯貝卓巳,中田咲子,吉田直矢,原田俊太,宇治原徹,田川美穂

    2016年第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東工大大岡山キャンパス   Country:Japan  

  223. "DDAB平面脂質二重膜の相転移過程の直接観察"

    磯貝卓巳,中田咲子,赤田英里,吉田直矢,鷲見隼人,手老龍吾,原田俊太,宇治原徹,田川美穂

    2016年第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東工大大岡山キャンパス   Country:Japan  

  224. "SiC溶液法における溶媒への金属添加による炭素溶解度変化の熱力学計算"

    畑佐豪記,原田俊太,田川美穂,村山健太,加藤智久,宇治原徹

    2016年第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東工大大岡山キャンパス   Country:Japan  

  225. "SiC溶液成長における基底面転位と表面モフォロジーの関係"

    堀司紗,村山健太,原田俊太,肖世玉,田川美穂,宇治原徹

    2016年第63回応用物理学会春季学術講演会 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東工大大岡山キャンパス   Country:Japan  

  226. "超高品質SiC溶液成長法の最前線"

    原田俊太,宇治原徹

    日本結晶成長学会・バルク成長分科会 第98回研究会「機能性単結晶材料の最新動向--パワーデバイスから光・圧電まで--」 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学 西早稲田キャンパス   Country:Japan  

  227. "Direct observation of electrons transported in second conduction mini-band of a semiconductor superlattice by visible-light photoemission spectroscopy" International conference

    Fumiaki Ichihashi, Keniji Nishitani, Xinyu Dong, Takahiko, Kawaguchi, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Miho Tagawa, Toru Ujihara

    SPIE Photonics West 2016 

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    Event date: 2016.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  228. "Thermal conductivity changes in WO3 films caused by hydrogen intercalation/deintercalation" International conference

    A. Nakamura, K. Aoyagi, S. Harada, M. Tagawa, T. Ujihara

    40th International Conference & Exposition on Advanced Ceramics & Composites(ICACC16) 

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    Event date: 2016.1

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  229. “SiC溶液成長における溶媒不純物の取り込み Impurity incorporation during solution growth of SiC”

    原田俊太、村山健太、青柳健大、酒井武信、田川美穂、加藤智久、宇治原徹

    先進パワー半導体分科会 第2回講演会 

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    Event date: 2015.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:大阪国際交流センター   Country:Japan  

  230. “4H-SiC溶液成長法Si面厚膜成長による貫通転位密度の低減 Growth of thick 4H-SiC crystal on Si face to reduce threading dislocation density by solution growth”

    村山健太、堀司紗、原田俊太、肖世玉、青柳健大、酒井武信、田川美穂、宇治原徹

    先進パワー半導体分科会 第2回講演会 

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    Event date: 2015.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:大阪国際交流センター   Country:Japan  

  231. "Temperature Dependence of the Energy Distribution of the Conduction Electrons in GaP Single Crystal" International conference

    Fumiaki Ichihashi, X. Dong, T. Kawaguchi, M. Kuwahara, T. Ito, S. Harada, M. Tagawa and T. Ujihara

    10th International Symposium on Atomic Level Characterizations for New Materials and Devices'15 (ALC '15) 

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    Event date: 2015.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  232. “溶媒を用いたAlNウィスカーの直接窒化法における溶媒組成が生成量に与える影響”

    松本昌樹,渡邉将太,竹内幸久,青柳健大,原田俊太,田川美穂,宇治原徹

    第45回結晶成長国内会議(NCCG-45) 

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    Event date: 2015.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学学術交流会館   Country:Japan  

  233. “4H-SiCのSi面溶液成長における温度分布制御による異種多形混入の抑制”

    堀司紗,村山健太,肖世玉,青柳健大,原田俊太,酒井武信,田川美穂,宇治原徹

    第45回結晶成長国内会議(NCCG-45) 

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    Event date: 2015.10

    Language:Japanese   Presentation type:Poster presentation  

    Venue:北海道大学学術交流会館   Country:Japan  

  234. “4H-SiC溶液成長法Si面厚膜化による低転位密度結晶成長の実現”

    村山健太,原田俊太,肖世玉,堀司紗,青柳健大,酒井武信,田川美穂,宇治原徹

    第45回結晶成長国内会議(NCCG-45) 

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    Event date: 2015.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学学術交流会館   Country:Japan  

  235. “脂質二重膜上のDNA被覆ナノ粒子の2次元配列に及ぼすマグネシウムおよび脂質膜形状の影響”

    磯貝卓巳,赤田英里,中田咲子,吉田直矢,手老龍吾,原田俊太,宇治原徹,田川美穂

    第45回結晶成長国内会議(NCCG-45) 

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    Event date: 2015.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学学術交流会館   Country:Japan  

  236. “Agナノ粒子の光学捕捉により誘起されるNaClO3キラル結晶化過程その場観察”

    新家寛正,杉山輝樹,丸山美帆子,田川美穂,村山健太,原田俊太,宇治原徹,森勇介

    第45回結晶成長国内会議(NCCG-45) 

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    Event date: 2015.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学学術交流会館   Country:Japan  

  237. "Distribution of nitrogen doping concentration in 4H-SiC grown by solution method" International conference

    Z. Wang, T. Kawaguchi, K. Murayama, K. Aoyagi, S. Harada, T. Sakai, M. Tagawa, T. Ujihara

    16th International Conference on Silicon Carbide and Related Materials(ICSCRM2015) 

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    Event date: 2015.10

    Language:English   Presentation type:Poster presentation  

    Country:Italy  

  238. "Consideration of threading dislocation conversion phenomena during SiC solution growth based on the elastic strain energy" International conference

    S. Harada, S. Xiao, K. Murayama, K. Aoyagi, T. Sakai, M. Tagawa, T. Ujihara

    16th International Conference on Silicon Carbide and Related Materials(ICSCRM2015) 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Italy  

  239. "High-speed solution growth of single crystal AlN from Cr-Co-Al solvent" International conference

    S. Watanabe, M. Nagaya, Y. Takeuchi, K. Aoyagi, S. Harada, M. Tagawa, T. Ujihara

    16th International Conference on Silicon Carbide and Related Materials(ICSCRM2015) 

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    Event date: 2015.10

    Language:English   Presentation type:Poster presentation  

    Country:Italy  

  240. "Solution Growth of AlN Single Crystal on Sapphire using Multi-Component Solvent Designed by Thermodynamic Calculation" International conference

    S. Harada, M. Nagaya, S. Watanabe, M. Chen, Y. Takeuchi, K. Aoyagi, M. Tagawa, T. Ujihara

    2015 International Conference on Solid State Devices and Materials(SSDM2015) 

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    Event date: 2015.9

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  241. “金属絶縁体転移に伴う WO3薄膜の熱伝導率変化”

    中村彩乃, 青柳健大, 原田俊太, 田川美穂, 宇治原徹

    公益社団法人日本セラミックス協会 第 28 回秋季シンポジウム 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:富山県, 富山大学(五福キャンパス)   Country:Japan  

  242. “脂質二重膜の性質が膜上のDNA被覆金ナノ粒子に及ぼす影響”

    中田咲子, 赤田英里, 磯貝卓巳, 吉田直矢, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    2015年 第76回応用物理学会秋季学術講演会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知県, 名古屋国際会議場   Country:Japan  

  243. “2種のDNAを被覆したナノ粒子の構造体の粒子間距離分布”

    吉田直矢, 赤田絵里, 磯貝卓巳, 中田咲子, 原田俊太, 宇治原徹, 田川美穂

    2015年 第76回応用物理学会秋季学術講演会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知県, 名古屋国際会議場   Country:Japan  

  244. “溶液法により成長したn型4H-SiC結晶のキャリア濃度分布の評価”

    王 振江, 川口昂彦, 村山健太, 青柳健大, 原田俊太, 酒井武信, 宇治原徹

    2015年 第76回応用物理学会秋季学術講演会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:愛知県, 名古屋国際会議場   Country:Japan  

  245. “Agナノ粒子を含んだNaClO3溶液からの円偏光レーザー誘起キラル結晶化におけるエナンチオ選択的増幅”

    新家寛正, 杉山輝樹, 田川美穂, 村山健太, 原田俊太, 丸山美帆子, 森 勇介, 宇治原徹

    2015年 第76回応用物理学会秋季学術講演会 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知県, 名古屋国際会議場   Country:Japan  

  246. Effect of Magnesium Ion Concentration on the Two-Dimensional Structure of DNA-Functionalized Nanoparticles on Supported Lipid Bilayer

    Takumi Isogai , Eri Akada, Sakiko Nakada, Naoya Yoshida, Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

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    Event date: 2015.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  247. Lipid diffusion and phase transition: Influence on DNA-functionalised nanoparticle adsorbates International conference

    S. Nakada, E. Akada, T. Isogai, N. Yoshida, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    5th International Colloids Conference 

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    Event date: 2015.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Austria  

  248. "Lipid diffusion and phase transition: Influence on DNA-functionalised nanoparticle adsorbates." International conference

    S. Nakada, E. Akada, T. Isogai, N. Yoshida, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    5th International Colloids Conference 

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    Event date: 2015.6

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  249. Ultra high quality SiC crystal grown by solution method International conference

    T. Ujihara, S. Harada, K. Aoyagi, M. Tagawa, T. Sakai,

    CMCEE 2015 

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    Event date: 2015.6

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Canada  

  250. Measurement of Energy Distribution of Conduction Electrons in Superlattice by Visible-Light Photoemission Spectroscopy International conference

    F. Ichihashi, K. Nishitani, X. Dong, T. Kawaguchi, M. Kuwahara, T. Ito, S. Harada, M. Tagawa, T. Ujihara

    42nd IEEE Photovoltaic Specialists Conference 

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    Event date: 2015.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  251. "Ultra high quality SiC crystal grown by solution method" International conference

    T. Ujihara, S. Harada, K. Aoyagi, M. Tagawa, T. Sakai

    11th CMCEE 

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    Event date: 2015.6

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Canada  

  252. "Measurement of Energy Distribution of Conduction Electrons in Superlattice by Visible-Light Photoemission Spectroscopy" International conference

    F. Ichihashi, K. Nishitani, X. Dong, T. Kawaguchi, M. Kuwahara, T. Ito, S. Harada, M. Tagawa, T. Ujihara

    42nd IEEE Photovoltaic Specialists Conference 

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    Event date: 2015.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  253. "Correlation Between Grown Polytypes and Activity Ratio During Solution Growth of SiC with Multi-Component Solvent" International conference

    Atsushi Horio, Shunta Harada, Daiki Koike, Kenta Murayama, Kenta Aoyagi, Takenobu Sakai, Miho Tagawa, Toru Ujihara

    ISPlasma2015 / IC-PLANTS2015 

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    Event date: 2015.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  254. Correlation Between Grown Polytypes and Activity Ratio During Solution Growth of SiC with Multi-Component Solvent

    A. Horio, S. Harada, D. Koike, K. Murayama, K. Aoyagi, T. Sakai, M. Tagawa, T. Ujihara

    ISPlasma2015 / IC-PLANTS2015 

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    Event date: 2015.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  255. "高熱伝導率AlNウィスカーの高効率合成"

    松本昌樹、陳鳴宇、永冶仁、渡邉将太、竹内幸久、原田俊太、田川美穂、宇治原徹、遠藤亮

    公益社団法人日本セラミックス協会 2015年 年会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:岡山大学 (津島キャンパス)、岡山県   Country:Japan  

  256. Synthesis of polycrystalline AlN with high thickness by an efficient method

    Pradip Ghosh, Kohei Mizuno, Makoto Hayashi, Yukihisa Takeuchi, Yuichi Aoki, Susumu Sobue, Yasuo Kitou, Jun Hasegawa, Makoto Kobashi, Toru Ujihara

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    Event date: 2015.3

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  257. 高熱伝導率AlNウィスカーの高効率合成

    松本昌樹,陳鳴宇,永冶仁,渡邉将太,竹内幸久,原田俊太,田川美穂,宇治原徹,遠藤亮

    公益社団法人日本セラミックス協会 2015年 年会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  258. "脂質二重膜上におけるDNA被覆金ナノ粒子のセルフアセンブリに対するイオンの効果"

    磯貝 卓巳、赤田 英理、中田 咲子、吉田 直矢、手老 龍吾、原田 俊太、宇治原 徹、田川 美穂

    2015年 第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学 湘南キャンパス、神奈川県   Country:Japan  

  259. "可視光励起光電子分光法を用いた半導体超格子における伝導電子のエネルギー分布測定"

    市橋 史朗、西谷 健治、董 鑫宇、川口 昂彦、桑原 真人、原田 俊太、田川 美穂、伊藤 孝寛、宇治原 徹

    2015年 第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学 湘南キャンパス、神奈川県   Country:Japan  

  260. "SiC溶液成長における貫通転位変換と成長表面のマクロステップの関係"

    原田 俊太、肖 世玉、青柳 健大、村山 健太、酒井 武信、田川 美穂、宇治原 徹

    2015年 第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学 湘南キャンパス、神奈川県   Country:Japan  

  261. "AlN溶液成長における熱力学計算を用いた成長速度の向上"

    渡邉 将太、永冶 仁、陳 鳴宇、竹内 幸久、青柳 健大、原田 俊太、田川 美穂、宇治原 徹

    2015年 第62回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学 湘南キャンパス、神奈川県   Country:Japan  

  262. SiC溶液成長における貫通転位変換と成長表面のマクロステップの関係

    原田俊太、肖世玉、青柳健大、村山健太、酒井武信、田川美穂、宇治原徹

    第63回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  263. 脂質二重膜上におけるDNA被覆金ナノ粒子のセルフアセンブリに対するイオンの効果

    磯貝卓巳,赤田英理,中田咲子,吉田直矢,手老龍吾,原田俊太,宇治原徹,田川美穂

    第65回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  264. AlN溶液成長における熱力学計算を用いた成長速度の向上

    渡邉将太,永冶仁,陳鳴宇,竹内幸久,青柳健大,原田俊太,田川美穂,宇治原徹

    第64回応用物理学会春季学術講演会 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  265. シンクロトロン X 線トポグラフィによる溶液成長 SiC 結晶の欠陥評価と高品質化

    原田俊太

    第4回名古屋大学シンクロトロン光研究センターシンポジウム 

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    Event date: 2015.1

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  266. SiC溶液成長における転位伝播挙動と高品質化

    原田俊太

    第2回グリーンエネルギー材料のマルチスケール創製研究会(松江)プログラム 

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    Event date: 2015.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  267. "Microstructure Observation of CaFe2As2 Family Thin Films by Transmission Electron Microscopy" International conference

    T. Kawaguchi, S. Harada, R. Fujimoto, Y. Mori, I. Nakamura, T. Hatano, T. Ujihara, H. Ikuta

    27th International Symposium on Superconductivity (ISS2014) 

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    Event date: 2014.11

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  268. Si-Al-Cu溶媒を用いた高Alドープ4H-SiC結晶の溶液成長

    楠一彦、関和明、亀井一人、原田俊太、宇治原徹

    先進パワー半導体分科会 第1回講演会 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  269. SiC溶液成長過程における貫通転位変換現象の成長表面との相互作用による考察

    原田俊太、肖世玉、村山健太、青柳健大、酒井武信、田川美穂、宇治原徹

    先進パワー半導体分科会 第1回講演会 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  270. 非対称温度分布下でのSiC溶液成長法におけるマランゴニ対流を考慮した3次元数値シミュレーションと表面形状の相関

    古池大輝、梅崎智典、村山健太、青柳健大、原田俊太、田川美穂、酒井武信、宇治原徹

    先進パワー半導体分科会 第1回講演会 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  271. "Si-Al-Cu溶媒を用いた高Alドープ4H-SiC結晶の溶液成長 Heavily Al doped 4H-SiC growth by solution growth technique using Si-Al-Cu melt as a solvent"

    楠一彦、関和明、亀井一人、原田俊太、宇治原徹

    先進パワー半導体分科会 第1回講演会 1st Meeting on Advanced Power Semiconductor 「未来を創る先進パワーエレクトロニクスと低炭素社会」 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:ウインクあいち、愛知県   Country:Japan  

  272. "SiC溶液成長過程における貫通転位変換現象の成長表面との相互作用による考察 Consideration of threading dislocation conversion phenomena during the solution growth of SiC based on the interaction between the growth surface and the dislocation"

    原田俊太、肖世玉、村山健太、青柳健大、酒井武信、田川美穂、宇治原徹

    先進パワー半導体分科会 第1回講演会 1st Meeting on Advanced Power Semiconductor 「未来を創る先進パワーエレクトロニクスと低炭素社会」 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:ウインクあいち、愛知県   Country:Japan  

  273. "非対称温度分布下でのSiC溶液成長法におけるマランゴニ対流を考慮した3次元数値シミュレーションと表面形状の相関 Relationship between Surface Morphology and Numerical Simulation in Consideration of Marangoni Convection during SiC Solution Growth under a Non-Axisymmetric Temperature Distribution"

    古池大輝、梅崎智典、村山健太、青柳健大、原田俊太、田川美穂、酒井武信、宇治原徹

    先進パワー半導体分科会 第1回講演会 1st Meeting on Advanced Power Semiconductor 「未来を創る先進パワーエレクトロニクスと低炭素社会」 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:ウインクあいち、愛知県   Country:Japan  

  274. 円偏光レーザー誘起結晶化によるキラリティ制御の可能性

    新家寛正, 村山健太, 原田俊太, 田川美穂, 宇治原徹

    第44回 結晶成長国内会議 NCCG-44 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  275. SiC 溶液成長過程における貫通転位変換現象の弾性論的考察

    原田俊太、肖世玉、村山健太、青柳健大、酒井武信、田川美穂、宇治原徹

    第44回 結晶成長国内会議 NCCG-44 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  276. 化学平衡計算に基づいた過飽和領域の制御によるAlN 単結晶溶液成長

    永冶仁,陳鳴宇,渡邉将太,竹内幸久,原田俊太,田川美穂,宇治原徹

    第44回 結晶成長国内会議 NCCG-44 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  277. "円偏光レーザー誘起結晶化によるキラリティ制御の可能性"

    新家寛正,村山健太,原田俊太,田川美穂,宇治原徹

    第44回結晶成長国内会議(NCCG-44) 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:学習院創立百周年記念会館, 東京都   Country:Japan  

  278. "化学平衡計算に基づいた過飽和領域の制御によるAlN単結晶溶液成長"

    永冶仁,陳鳴宇,渡邉将太,竹内幸久,原田俊太,田川美穂,宇治原徹

    第44回結晶成長国内会議(NCCG-44) 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:学習院創立百周年記念会館, 東京都   Country:Japan  

  279. "SiC溶液成長過程における貫通転位変換現象の弾性論的考察"

    原田俊太,肖世玉,村山健太,青柳健大,酒井武信,田川美穂,宇治原徹

    第44回結晶成長国内会議(NCCG-44) 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:学習院創立百周年記念会館, 東京都   Country:Japan  

  280. Two-dimensional assembly of Au nanoparticles through DNA hybridization on supported lipid bilayer International conference

    T. Isogai, E. Akada, S. Nakada, R. Tero, S. Harada, T. Ujihara and M. Tagawa

    20th International Conference on DNA Computing and Molecular Programming(DNA20) 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  281. Improvement of surface morphology by solution flow control in solution growth of SiC on off-axis seeds International conference

    T. Umezaki, D. Koike, S. Harada, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:France  

  282. Heavily Al doped 4H-SiC growth by the top-seeded solution growth technique using Si-Al-Cu melt as a solvent International conference

    K. Kusunoki , K. Kamei, K. Seki, Y. Kishida, K. Moriguchi, H. Kaidoh, S. Harada and T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:France  

  283. Dislocation conversion during SiC solution growth for high-quality crystal International conference

    S. Harada, Y. Yamamoto, S. Xiao, N. HARA, D. Koike, T. Mutoh, M. Tagawa, T. Sakai, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials 

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    Event date: 2014.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:France  

  284. Threading screw dislocations conversion behavior on C face with different surface morphology during 4H-SiC solution growth International conference

    S. Xiao, N. Hara, S. Harada, T. Sakai, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:France  

  285. Control of Interface Shape by Non-Axisymmetric Solution Convection in Top-Seeded Solution Growth for SiC Crystal International conference

    D. Koike, T. Umezaki, S. Harada, M. Tagawa, T. Sakai, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:France  

  286. 3C-SiC crystal on sapphire by solution growth method International conference

    K. Shibata, S. Harada, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:France  

  287. "Control of Interface Shape by Non-Axisymmetric Solution Convection in Top-Seeded Solution Growth for SiC Crystal" International conference

    Daiki KOIKE, Tomonori UMEZAKI, Shunta HARADA, Miho TAGAWA, Takenobu SAKAI, Toru UJIHARA

    10th European Conference on Silicon Carbide and Related Materials(ECSCRM 2014) 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:France  

  288. "Improvement of surface morphology by solution flow control in solution growth of SiC on off-axis seeds" International conference

    Tomonori UMEZAKI, Daiki KOIKE, Shunta HARADA, Toru UJIHARA

    10th European Conference on Silicon Carbide and Related Materials(ECSCRM 2014) 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:France  

  289. "3C-SiC crystal on sapphire by solution growth method" International conference

    Kenji SHIBATA, Shunta HARADA, Toru UJIHARA

    10th European Conference on Silicon Carbide and Related Materials(ECSCRM 2014) 

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    Event date: 2014.9

    Language:English   Presentation type:Poster presentation  

    Country:France  

  290. 高品質4H-SiC溶液成長における多形変化抑制メカニズム

    原田俊太,山本祐 治,村山健太,青柳健大,酒井武信,田川美穂,宇治原徹

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  291. 脂質二重膜上におけるDNA被覆金ナノ粒子の拡散現象

    中田咲子,赤田英里, 磯貝卓巳,手老龍吾,原田俊太,宇治原徹,田川美穂

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  292. CaFe2As2系超伝導薄膜の透過電子顕微鏡観察

    川口昂彦,原田俊太,藤本亮 祐,森康博,中村伊吹,畑野敬史,宇治原徹,生田博志

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  293. AlN溶液成長における化学平衡計算を用いた実験条件の決定

    永冶仁,陳鳴 宇,渡邉将太,竹内幸久,原田俊太,田川美穂,宇治原徹

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  294. 多元溶媒窒化法を用いた単結晶AlNウィスカーの合成

    陳鳴宇,永冶仁,渡邉 将太,竹内幸久,原田俊太,荒井重勇,田川美穂,宇治原徹

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  295. SiC溶液成長法における種結晶形状の成長表面への影響と貫通らせん転位変換

    古池大輝,梅崎智典,原田俊太,田川美穂,酒井武信,宇治原徹

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  296. The investigation of step structure with different TSDs conversion behavior during 4H-SiC solution growth

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    Event date: 2014.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  297. "高品質4H-SiC溶液成長における多形変化抑制メカニズム"

    原田俊太,山本祐治,村山健太,青柳健大,酒井武信,田川美穂,宇治原徹

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学札幌キャンパス、北海道   Country:Japan  

  298. "脂質二重膜上におけるDNA被覆金ナノ粒子の拡散現象"

    中田咲子,赤田英里,磯貝卓巳,手老龍吾,原田俊太,宇治原徹,田川美穂

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学札幌キャンパス、北海道   Country:Japan  

  299. "CaFe2As2系超伝導薄膜の透過電子顕微鏡観察"

    川口昂彦,原田俊太,藤本亮祐,森康博,中村伊吹,畑野敬史,宇治原徹,生田博志

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学札幌キャンパス、北海道   Country:Japan  

  300. "SiCフラックス成長におけるSiC基板/フラックス界面の高温真空レーザー顕微鏡観察"

    小沼碧海,丸山伸伍,原田俊太,宇治原徹,加藤智久,蔵重和央,奥村元,松本祐司

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学札幌キャンパス、北海道   Country:Japan  

  301. "AlN溶液成長における化学平衡計算を用いた実験条件の決定"

    永冶仁,陳鳴宇,渡邉将太,竹内幸久,原田俊太,田川美穂,宇治原徹

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学札幌キャンパス、北海道   Country:Japan  

  302. "多元溶媒窒化法を用いた単結晶AlNウィスカーの合成"

    陳鳴宇,永冶仁,渡邉将太,竹内幸久,原田俊太,荒井重勇,田川美穂,宇治原徹

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学札幌キャンパス、北海道   Country:Japan  

  303. "SiC溶液成長法における種結晶形状の成長表面への影響と貫通らせん転位変換"

    古池大輝,梅崎智典,原田俊太,田川美穂,酒井武信,宇治原徹

    第75回応用物理学会秋季学術講演会 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学札幌キャンパス、北海道   Country:Japan  

  304. "The investigation of step structure with different TSDs conversion behavior during 4H-SiC solution growth"

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    Event date: 2014.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  305. Structure of basal plane defects formed by the conversion of threading screw dislocation during solution growth of SiC International conference

    S. Harada, S.Y. Xiao, M. Tagawa, Y. Yamamoto, S. Arai, N. Tanaka and T. Ujihara

    Solid State Devices and Materials 2014 

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    Event date: 2014.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  306. Correlation between Surface Morphology and Threading Dislocation Conversion in Solution Growth of SiC International conference

    Shunta Harada, Shiyu Xiao, Natsumi Hara, Daiki Koike, Takuya Mutoh, Miho Tagawa and Toru Ujihara

    International Union of Materials Research Societies International Conference in Asia 2014 

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    Event date: 2014.8

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  307. Characterization of Newly Generated Defects during Solution Growth of 4H-SiC International conference

    Shiyu Xiao, Shunta Harada, Natsumi Hara, Miho Tagawa and Toru Ujihara

    International Union of Materials Research Societies International Conference in Asia 2014 

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    Event date: 2014.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  308. Defect evolution in high-qualit 4H-SiC grown by solution method International conference

    S. Harada, M. Tagawa, T. Ujihara

    International Union of Crystallography 2014 

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    Event date: 2014.8

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Canada  

  309. p型SiC溶液成長における欠陥変換挙動

    原田俊太

    高品質SiC結晶次世代成長法に関する研究会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  310. n型およびp型SiC溶液成長過程における欠陥挙動と高品質結晶成長

    原田俊太

    第91回バルク成長分科会研究会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  311. NaClO3 溶液成長におけるアキラル-キラル多形転移を介したキラリティの発生と増幅 International conference

    新家寛正, 原田俊太, 宇治原徹, 三浦均, 木村勇気, 上羽牧夫, 塚本勝男

    日本地球惑星科学連合2014年大会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  312. 可視光励起光電子分光法による半導体超格子ミニバンド構造の有効質量評価 International conference

    西谷健治,志村大樹,市橋史朗,桒原真人,伊藤孝寛,原田俊太,田川美穂,宇治原徹

    第61回応用物理学会春季学術講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  313. SiC溶液法C面成長におけるTSD変換 International conference

    原田俊太,肖世玉,原奈都美,原田俊太,宇治原徹

    第61回応用物理学会春季学術講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  314. SiC溶液成長における貫通らせん転位変換の弾性エネルギーによる考察 International conference

    原田俊太,肖世玉,原奈都美,勝野弘康,田川美穂,宇治原徹

    第61回応用物理学会春季学術講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  315. 4H-SiC溶液成長法における凸形状成長による貫通らせん転位の変換挙動 International conference

    古池大輝,梅崎智典,堀尾篤史,原田俊太,田川美穂,宇治原徹

    第61回応用物理学会春季学術講演会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  316. 可視光励起光電子分光法による半導体中の伝導電子の直接観察 International conference

    市橋史朗,志村大樹,西谷健治,桑原真人,伊藤孝寛,原田俊太,田川美穂,宇治原徹

    日本物理学会 第69回年次大会 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  317. Direct Measurement of Conduction Miniband Structure in Superlattice by Visible-Light Photoemission Spectroscopy International conference

    F. Ichihashi, D. Shimura, K. Nishitani, M. Kuwahara, T. Ito, S. Harada, H. Katsuno, M. Tagawa, T. Ujihara

    Photovoltaic Specialists Conference(The PVSC-40) 

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    Event date: 2014.1

    Language:English   Presentation type:Poster presentation  

    Country:United States  

  318. Structure of basal plane defects formed by threading screw dislocation conversion during high quality SiC solution growth International conference

    S.Harada, R.Kunimatsu, Xiao Shiyu, Y.Yamamoto, M.Tagawa, Y.Yamamoto, S.Arai, N.Tanaka, T.Ujihara

    ISETS '13 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  319. Observation of basal plane dislocations generated during solution growth in 4H-silicon carbide International conference

    S.Y.Xiao, S.Harada, T.Ujihara

    ISETS '13 

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    Event date: 2013.12

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  320. Two-dimensional crystallization of DNA-functionalized Au nanoparticles using lipid diffusion International conference

    T.Isogai, E.Akada, A.Piednoir, Y.Akahoshi, R.Tero, S.Harada, T.Ujihara, M.Tagawa

    ISETS '13 

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    Event date: 2013.12

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  321. Direct Observation of Conduction Band Structure and Conduction Electron Distribution in Semiconductor for Intermediate-band Solar Cells International conference

    F.Ichihashi, D.Shimura, K.Nishitani, M.Kuwahara, S.Harada, T.Ito, M.Tagawa, T.Ujihara

    ISETS '13 

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    Event date: 2013.12

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  322. Aluminum Nitride Whiskers with High Aspect Ratio Grown from Multi-Component Melt International conference

    M.Y.Chen, H.Matsubara, K.Mizuno, M.Nagaya, Y.Takeuchi, S.Harada, T.Ujihara, Y.Aoki, K.Kohara, T.Kano

    ISETS '13 

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    Event date: 2013.12

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  323. Evaluation of Mini-Bands Formed in Superlattice Structure for Intermediate-Band Solar Cell International conference

    D.Shimura, F.Ichihashi, K.Nishitani, S.Harada, T.Ito, M.Kuwahara, M.Matsunami, S.Kimura, M.Tagawa, T.Ujihara

    ISETS '13 

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    Event date: 2013.12

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  324. 多元溶媒SiC溶液成長における成長多形と活量比aSi/aCの相関 International conference

    堀尾篤史、原田俊太、田川美穂、宇治原徹

    第22回SiC講演会 

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    Event date: 2013.12

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  325. SiC溶液成長過程における基底面転位の形成 International conference

    肖 世玉、原田 俊太、宇治原 徹

    第22回SiC講演会 

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    Event date: 2013.12

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  326. SiC溶液成長における過飽和度制御による凸形状成長 International conference

    古池大輝、梅崎智典、堀尾篤史、原田俊太、田川美穂、宇治原徹

    第22回SiC講演会 

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    Event date: 2013.12

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  327. 4H-SiC溶液成長における成長表面のステップ構造と貫通転位変換挙動の相関 International conference

    原田俊太、山本祐治、肖世玉、堀尾篤史、田川美穂、宇治原徹

    第22回SiC講演会 

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    Event date: 2013.12

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  328. SiC溶液成長における欠陥変換挙動と高品質結晶成長 International conference

    原田俊太

    表面技術協会 関東支部・第86回講演会「ひらめき・未来材料~進化する選択的物質貯蔵・輸送・分離・変換材料~ 

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    Event date: 2013.11

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  329. NaClO3溶液成長におけるアキラルな準安定相を介したキラル結晶形成過程

    新家寛正,原田俊太,宇治原徹,三浦均,木村勇気,栗林貴弘上羽牧夫, 塚本勝男

    第43回結晶成長国内会議 

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    Event date: 2013.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  330. NaClO3溶液成長におけるアキラルな準安定相の溶解度測定

    新家寛正,原田俊太,宇治原徹,三浦均,木村勇気,上羽牧夫, 塚本勝男

    第43回結晶成長国内会議 

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    Event date: 2013.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  331. DNAと脂質二重膜を用いたナノ粒子の2次元結晶化

    磯貝卓巳,赤田英里,Agnes Piednoir,赤星祐樹,手老龍吾,原田俊太,宇 治原徹,田川美穂

    第43回結晶成長国内会議 

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    Event date: 2013.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  332. 多元溶媒を用いたAlNウィスカーの成長

    陳鳴宇,松原弘明,水野恒平,永冶仁,竹内幸久,原田俊太,青木祐一,小原公和, 加納豊広,宇治原徹

    第43回結晶成長国内会議 

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    Event date: 2013.11

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  333. 4H-SiC溶液成長過程における貫通転位変換挙動と成長表面モフォロジーの相関

    原田俊太,山本祐治,肖世玉,堀尾篤史、田川美穂,宇治原徹

    第43回結晶成長国内会議 

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    Event date: 2013.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  334. DNA-mediated Nanoparticle Assembly International conference

    M. Tagawa, T. Isogai, E. Akada, S. Harada, T. Ujihara

    DNA-mediated Nanoparticle Assembly 

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    Event date: 2013.10

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  335. Increase in the growth rate by rotating the seed crystal at a high speed during the solution growth of SiC International conference

    T. Umezaki, D. Koike, S. Harada, T. Ujihara

    ICSCRM 2013 

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    Event date: 2013.9 - 2013.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  336. Control of dislocation conversion during solution growth by changing surface step structure International conference

    Shunta Harada , Yuji Yamamoto , Shiyu Xiao, Atsushi Horio , Miho Tagawa , Toru Ujihara

    ICSCRM 2013 

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    Event date: 2013.9 - 2013.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  337. N-type doping of 4H-SiC by top-seeded solution growth technique International conference

    K. Kusunoki, K. Kamei, K. Seki, S. Harada, Toru Ujihara

    ICSCRM 2013 

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    Event date: 2013.9 - 2013.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  338. The Suppression of the Trenches by the Control of Solution Flow above Growth Surface in the Solution Growth of SiC International conference

    C. Zhu, S. Harada, S. Xiao, K. Seki, M. Tagawa, Y. Matsumoto, T. Kato, K. Kurashige, H. Okamura, and T. Ujihara

    ICSCRM 2013 

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    Event date: 2013.9 - 2013.10

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  339. 角度分解光電子分光法を用いた半導体超格子のミニバンド評価

    志村大樹,市橋史朗,西谷健治,原田俊太,伊藤孝寛,桒原真人,松波雅治,木村真一,田川美穂,宇治原徹

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  340. SiCフラックス成長におけるSi-NiフラックスのAl添加効果

    小沼碧海,丸山伸伍,原田俊太,宇治原徹,加藤智久,蔵重和央,奥村元,松本祐司

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  341. SiC溶液成長過程における基底面転位の形成

    肖世玉,朱燦,原田俊太,宇治原徹

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  342. SiC溶液成長過程における貫通転位変換と成長表面のステップ構造

    原田俊太,山本祐治,肖世玉,堀尾篤史,田川美穂,宇治原徹

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  343. SiC 溶液成長における流れ制御によるトレンチ形成の抑制

    朱燦,原田俊太,関和明,肖世玉,田川美穂,松本祐司,加藤智久,蔵重和央,奥村元,宇治原徹

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  344. Fe 過剰BaFe2(As,P)2 薄膜の臨界電流密度増大の起源

    森康博,藤本亮祐,坂上彰啓,原田俊太,宇治原徹,田渕雅夫,生田博志

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  345. 脂質分子をキャリアとしたDNA被覆金ナノ粒子の2次元結晶化

    磯貝卓巳,Agnes Piednoir,赤田英里,赤星祐樹,手老龍吾,原田俊太,宇治原徹,田川美穂

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  346. 可視光励起光電子分光法による伝導電子の直接観察

    市橋史朗,志村大樹,西谷健治,桒原真人,伊藤孝寛,原田俊太,田川美穂,宇治原徹

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  347. 可視光励起光電子分光法による半導体超格子構造の伝導キャリア観察

    西谷健治,市橋史朗,志村大樹,桒原真人,伊藤孝寛,原田俊太,田川美穂,宇治原徹

    2013年 第74回応用物理学会秋季学術講演会 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  348. 多元溶媒を用いた高アスペクト比AlN ウィスカーの成長

    陳鳴宇, 松原弘明, 水野恒平, 永冶仁, 竹内幸久, 原田俊太, 宇治原徹, 青木祐一, 小原公和, 加納豊広

    公益社団法人日本セラミックス協会 第26回秋季シンポジウ 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  349. Evolution of threading screw dislocation conversion during solution growth of 4H-SiC International conference

    Shunta Harada , Yuji Yamamoto , Kazuaki Seki , Atsushi Horio , Takato Mitsuhashi , Miho Tagawa , Toru Ujihara

    17th International Conference on Crystal Growth and Epitaxy 

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    Event date: 2013.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  350. Ultra-high quality SiC crystal grown by solution method utilizing the conversion from threading dislocations to basal plane defects International conference

    Toru Ujihara , Yuji Yamamoto , Shunta Harada , Shiyu Xiao , Kazuaki Seki

    17th International Conference on Crystal Growth and Epitaxy 

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    Event date: 2013.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  351. Two Pathways Determining Chirality in NaClO3 Crystals Grown from Solution via Achiral Precursors International conference

    Hiromasa Niinomi, Hitoshi Miura, Yuki Kimura, Takahiro Kuribayashi 2, Makio Uwaha, Shunta Harada, Toru Ujihara, Katsuo Tsukamoto

    17th International Conference on Crystal Growth and Epitaxy 

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    Event date: 2013.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  352. Forming two-dimensional structure of DNA-functionalized Au nanoparticles via lipid diffusion in supported lipid bilayers International conference

    Takumi Isogai , Agnes Piednoir , Eri Akada, Yuki Akahoshi , Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

    17th International Conference on Crystal Growth and Epitaxy 

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    Event date: 2013.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  353. Growth of high quality 3C-SiC on hexagonal SiC seed using TSSG method International conference

    Kazuaki Seki , Shota Yamamoto, Shunta Harada, Toru Ujihara

    17th International Conference on Crystal Growth and Epitaxy 

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    Event date: 2013.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  354. Two-dimensional crystallization of DNA-functionalized nanoparticles via lipid diffusion in supported lipid bilayers International conference

    Takumi Isogai , Agnes Piednoir , Eri Akada, Yuki Akahoshi , Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

    15th Summer School on Crystal Growth 

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    Event date: 2013.8

    Language:English   Presentation type:Poster presentation  

    Country:Poland  

  355. Ultrahigh-resolution direct observation of mini-bands formed in InGaAs/AlGaAs superlattice International conference

    Daiki Shimura, Fumiaki Ichihashi, Kenji Nishitani, Shunta Harada, Makoto Kuwahara, Takahiro Ito, Masaharu Matsunami, Shin-ichi Kimura, Takenobu Sakai, Miho Tagawa, Toru Ujihara

    Photovoltaic specialists conference 39th 

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    Event date: 2013.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  356. Electron Spectroscopy of Conduction Electrons Exited by Visible Light Utilizing NEA Surface International conference

    Fumiaki Ichihashi, Daiki Shimura, Kenji Nishitani, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Miho Tagawa, Toru Ujihara

    Photovoltaic specialists conference 39th 

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    Event date: 2013.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  357. Nanoparticle Assembly mediated by Designed DNA Nanostructures International conference

    M. Tagawa, O. Gang, K. Yager, T. Isogai, E. Akada, S. Harada, T. Ujihara

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    Event date: 2013.6 - 2013.7

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  358. Solution growth of high quality 3C-SiC on a vicinal 6H-SiC International conference

    T. Ujihara, K. Seki, S. Yamamoto, S. Harada, M. Tagawa

    HeteroSiC-WASMPE2013 

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    Event date: 2013.6

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  359. 高品質SiC溶液成長

    宇治原徹, 原田俊太,

    一般社団法人資源・素材学会 平成25年度春季大会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  360. SiC溶液成長において流速の変化が表面モフォロジーに与える影響

    朱燦,原田俊太,関和明,田川美穂,松本祐司,加藤智久,蔵重和央,奥村元,宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  361. 3C-SiC 溶液成長における多形制御と欠陥抑制

    関和明,山本翔太,原田俊太,宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  362. 酸化タングステンの酸素欠損に伴う熱伝導率の変化

    弓削勇輔,原田俊太,田川美穂,宇治原徹

    2012年春季 第60回 応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  363. AlGaAs/InGaAs超格子構造におけるミニバンドの超高分解能直接観察

    志村大樹,市橋史朗,原田俊太,桒原真人,伊藤孝寛,松波雅治,木村真一,酒井武信,田川美穂,宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  364. 脂質分子の拡散によるDNA被覆金ナノ粒子の2次元構造体形成

    磯貝卓巳,Agnes Piednoir,赤田英里,祐樹赤星,手老龍吾,原田俊太,宇治原徹,田川美穂

    2012年度春季 第60回 応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  365. NEA表面を利用した伝導電子エネルギーの直接測定

    市橋史朗,志村大樹,西谷健治,原田俊太,桑原真人,伊藤孝寛,田川美穂,宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  366. 4H-SiC溶液成長過程における貫通らせん転位変換により形成する欠陥の微細構造

    原田俊太,國松亮太,田川美穂,山本悠太,荒井重勇,田中信夫,宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  367. Al融液窒化法を用いたAlN多結晶の作製におけるMgによる窒化促進効果の検証 International conference

    水野恒平, 松原弘明, 永冶仁, 竹内幸久, 原田俊太, 宇治原徹, 加納豊広, 青木祐一, 小原公和

    日本セラミックス協会2013年 年会 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  368. Observation of Conduction Electrons in Superlattice Structure by Visible Light Photoemission Spectroscopy International conference

    Kenji Nishitani, Fumiaki Ichihashi, Daiki Shimura, Shunta Harada, Makoto Kuwahara, Miho Tagawa, Takahiro Ito, Toru Ujihara

    the 23rd International Photovoltaic Science and Engineering Conference(PVSEC-23) 

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    Event date: 2013

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  369. 金属負極蓄電池の実現に向けた配向結晶集電体によるデンドライト抑制 International conference

    三橋貴仁, 伊藤靖仁, 竹内幸久, 原田俊太, 田川美穂, 宇治原 徹

    第54回電池討論会 

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    Event date: 2013

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  370. 溶液成長過程における貫通転位変換を利用した高品質4H-SiCの実現

    原田俊太、山本祐治、関 和明、田川美穂、宇治原徹

    SiC 及び関連ワイドギャップ半導体研究会 第21 回講演会 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:大阪市中央公会堂   Country:Japan  

  371. TSSG 法による高品質3C-SiC の成長

    関 和明,原田俊太,宇治原徹

    SiC 及び関連ワイドギャップ半導体研究会 第21 回講演会 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:大阪市中央公会堂   Country:Japan  

  372. Si-C-X溶媒を用いたSiC 溶液成長における結晶化多形の熱力学的考察

    堀尾篤史、原田俊太、宇治原徹

    SiC 及び関連ワイドギャップ半導体研究会 第21 回講演会 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:大阪市中央公会堂   Country:Japan  

  373. 透過電子顕微鏡法によるSiC 溶液成長における欠陥挙動解析

    原田俊太、國松亮太、田川美穂、山本悠太、荒井重勇、田中信夫、宇治原徹

    SiC 及び関連ワイドギャップ半導体研究会 第21 回講演会 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:大阪市中央公会堂   Country:Japan  

  374. 溶液法による3C-SiCバルク結晶成長

    関 和明,原田俊太,宇治原徹

    第42回日本結晶成長学会 NCCG-42 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  375. 溶液法による高品質SiC結晶成長メカニズム

    原田俊太、山本祐治、関 和明、堀尾篤史、三橋貴仁、田川美穂、宇治原徹

    第42回日本結晶成長学会 NCCG-42 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  376. SiC溶液成長における窒素ドープによる積層欠陥の形成

    原田俊太、関和明、楠一彦、田川美穂、宇治原徹

    第42回日本結晶成長学会 NCCG-42 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:九州大学   Country:Japan  

  377. 3C-SiC溶液成長における双晶抑制

    関 和明,原田俊太,宇治原徹

    第42回日本結晶成長学会 NCCG-42 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:九州大学   Country:Japan  

  378. 溶液法によるα-Al2O3上へのAlNヘテロエピタキシャル成長

    松原弘明,水野恒平,竹内幸久,原田俊太,木藤泰男,奥野英一,宇治原徹

    第42回日本結晶成長学会 NCCG-42 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  379. 一方向の溶液流れ下におけるSiCのステップバンチングの挙動

    朱燦、原田俊太、関和明、新家寛正、田川美穂、宇治原徹

    第42回日本結晶成長学会 NCCG-42 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Poster presentation  

    Venue:九州大学   Country:Japan  

  380. Evolution of Threading Edge Dislocation During Solution Growth of SiC International conference

    S. Harada, Y. Yamamoto, K. Seki, A. Horio, T. Mitsuhashi and T. Ujihara

    SSDM2012 

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    Event date: 2012.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  381. Direct Observation of Mini-bands in AlGaAs/GaAs Superlattice for Intermediate Band Solar Cell International conference

    D. Shimura, K. Hashimoto, F. Ichihashi, S. Harada, T. Ito, M. Kuwahara, M. Matsunami, S. Kimura, T. Sakai,T. Ujihara

    IUMRS-ICEM 2012 

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    Event date: 2012.9

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  382. Direct Observation of Defect Evolution during Solution Growth of SiC by Synchrotron X-ray Topography International conference

    S. Harada, Y. Yamamoto, K. Seki, A. Horio, T. Mitsuhashi and T. Ujihara

    IUMRS-ICEM 2012 

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    Event date: 2012.9

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  383. Mechanisms behind low lattice thermal conduction of high density of planar defects containing TiO2-x by atomistic simulations International conference

    Y. Miyauchi, M. Tada, M. Yoshiya, S. Harada, K. Tanaka, H. Yasuda, H. Inui

    IUMRS-ICEM 2012 

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    Event date: 2012.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  384. Al 融液窒化法において成長温度がAlN組織形成に与える影響

    水野恒平,松原弘明,竹内幸久,原田俊太,宇治原徹,青木祐一,小原公和

    第25回セラミックス協会秋季シンポジウム 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  385. VS 法による高アスペクト比AlN ウィスカーの成長

    松原弘明,水野恒平,竹内幸久,原田俊太,宇治原徹,青木祐一,小原公和

    第25回セラミックス協会秋季シンポジウム 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Poster presentation  

    Country:Japan  

  386. 溶液法によるサファイア基板上へのAlN単結晶成長

    松原弘明,水野恒平,竹内幸久,原田俊太,木藤泰男,奥野英一,宇治原徹

    第73回 応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:愛媛大学・松山大学   Country:Japan  

  387. SiC溶液成長における流れがステップバンチングに及ぼす影響

    Can Zhu,原田俊太,関 和明,新家寛正,宇治原徹

    第73回 応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛媛大学・松山大学   Country:Japan  

  388. 4H-SiC溶液成長における貫通刃状転位の選択的変換

    原田俊太,山本祐治,関 和明,堀尾篤史,三橋貴仁,宇治原徹

    第73回 応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛媛大学・松山大学   Country:Japan  

  389. DPBフリー3C-SiCの溶液成長

    関 和明,原田俊太,宇治原徹

    第73回 応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛媛大学・松山大学   Country:Japan  

  390. TSSG法で育成した4H-SiC結晶の窒素ドーピング挙動

    楠 一彦,関 和明,原田俊太,亀井一人,矢代将斉,宇治原徹

    第73回 応用物理学会学術講演会 

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    Event date: 2012.9

    Language:Japanese   Presentation type:Poster presentation  

    Venue:愛媛大学・松山大学   Country:Japan  

  391. Solution growth of DPB-free 3C-SiC International conference

    K. Seki, S. Harada, T. Ujihara

    ECSCRM 2012 

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    Event date: 2012.9

    Language:English   Presentation type:Poster presentation  

    Country:Russian Federation  

  392. Effect of surface polarity on the conversion of threading dislocations in solution growth International conference

    Y. Yamamoto, S. Harada, K. Seki, A. Horio, T. Mitsuhashi, T. Ujihara

    ECSCRM 2012 

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    Event date: 2012.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Russian Federation  

  393. Possibility for elimination of dislocations in SiC crystal: conversion of threading edge dislocations by solution growth International conference

    S. Harada, Y. Yamamoto, K. Seki, A. Horio, T. Mitsuhashi, C. Zhu, M. Tagawa, T. Ujihara

    ECSCRM 2012 

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    Event date: 2012.9

    Language:English   Presentation type:Poster presentation  

    Country:Russian Federation  

  394. Influence of solution flow on step bunching in solution growth of SiC International conference

    C. Zhu, K. Seki, S. Harada, H. Niinomi, M. Tagawa, T. Ujihara

    ECSCRM 2012 

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    Event date: 2012.9

    Language:English   Presentation type:Poster presentation  

    Country:Russian Federation  

  395. Reduction of threading screw dislocation density utilizing defect conversion during solution growth of 4H-SiC International conference

    S. Harada, Y. Yamamoto, K. Seki, T. Ujihara

    ECSCRM 2012 

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    Event date: 2012.9

    Language:English   Presentation type:Poster presentation  

    Country:Russian Federation  

  396. Anisotropy of Lattice Thermal Conduction in TiO2-x with High Density of Planar Defects by Atomistic Simulations International conference

    Y. Miyauchi, M. Tada, M. Yoshiya, S. Harada, K. Tanaka, H. Yasuda, H. Inui

    The 3rd International Symposium on Advanced Microscopy and Theoretical Calculations (AMTC3) 

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    Event date: 2012.5

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  397. Efficient process for ultrahigh quality 4H-SiC crystal utilizing solution growth on off-axis seed crystal International conference

    Shunta HARADA, Yuji YAMAMOTO, Kazuaki SEKI, Atsushi HORIO, Takato MITSUHASHI, Toru UJIHARA

    Materials research society 2012 spring meeting 

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    Event date: 2012.4

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  398. SiC溶液成長における貫通らせん転位低減の促進

    原田 俊太,山本 祐治,関 和明,堀尾 篤史,三橋貴仁,宇治原 徹

    2012年春季 第59回 応用物理学関係連合講演会 

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    Event date: 2012.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学 早稲田キャンパス   Country:Japan  

  399. Reduction of Defects in SiC by Solution Growth for High Performance Power Device

    Shunta Harada, Yuji Yamamto, Kazuaki Seki, Toru Ujihara Yuta Yamamoto, Shigeo Arai, Jun Yamasaki and Nobuo Tanaka

    Interational symposium on role of electron microscopy in industry  

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    Event date: 2012.1

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  400. Formation of Different Polytypes during 4H-SiC Solution Growth International conference

    Shunta Harada, Alexander, Kazuaki Seki, Yuji Yamamoto, Toru Ujihara, Jun Yamasaki, Nobuo Tanaka

    ISETS '11 

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    Event date: 2011.12

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  401. 溶液成長における4H-SiC上での多形変化挙動

    原田俊太,アレキサンダー,関和明,山本祐治,宇治原徹

    第41回結晶成長国内会議(NCCG-41) 

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    Event date: 2011.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  402. Polytype transformation path on 4H-SiC during top-seeded solution growth International conference

    Shunta Harada, Alexander, Kazuaki Seki, Yuji Yamamoto, Toru Ujihara

    2011 International Conference on Solid State Devices and Materials (SSDM 2011) 

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    Event date: 2011.9

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  403. Direct observation of an ordered arrangement of vacancies and large local thermal vibration in rhenium silicide by Cs corrected STEM International conference

    Shunta Harada, Katsushi Tanaka Kyosuke Kishida, Norihiko L Okamoto, Noriaki Endo, Eiji Okunishi and Haruyuki Inui

    Materials Research Society Fall Meeting 

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    Event date: 2010.11 - 2010.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  404. 第三元素を添加したマグネリ相酸化チタンの熱電特性 International conference

    原田 俊太,田中 克志,乾 晴行

    日本金属学会 

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    Event date: 2010.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  405. Crystallographic shear structures and thermal conductivity of some thermoelectric Magnèli phase titanium oxides International conference

    Shunta Harada, Katsushi Tanaka and Haruyuki Inui

    International conference on intergranular and interphase boundaries in materials (iib2010) 

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    Event date: 2010.6 - 2010.7

    Language:English   Presentation type:Poster presentation  

    Country:Japan  

  406. シアー構造を有するMagnèli相化合物の構造変化と熱電特性 International conference

    原田 俊太,田中 克志,乾 晴行

    日本金属学会 

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    Event date: 2010.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:筑波大学   Country:Japan  

  407. Reduction in the thermal conductivity of thermoelectric titanium oxide by introduction of planar defects International conference

    Shunta Harada, Katsushi Tanaka and Haruyuki Inui

    Materials Research Society Fall Meeting 

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    Event date: 2009.11 - 2009.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  408. HAADF-STEM法によるRe4Si7の結晶構造解析 International conference

    原田 俊太,田中 克志,岸田 恭輔,岡本 範彦,乾 晴行,遠藤 徳明,奥西 栄治

    日本金属学会 

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    Event date: 2009.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:京都大学   Country:Japan  

  409. 高品質SiC溶液成長 International conference

    宇治原徹, 原田俊太

    一般社団法人資源・素材学会 平成25年度春季大会  2013.3.28 

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  410. 角度分解光電子分光法を用いた半導体超格子のミニバンド評価 International conference

    志村大樹, 市橋史朗, 西谷健治, 原田俊太, 伊藤孝寛, 桒原真人, 松波雅治, 木村真一, 田川美穂, 宇治原徹

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  411. 透過電子顕微鏡法によるSiC 溶液成長における欠陥挙動解析 International conference

    原田俊太, 國松亮太, 田川美穂, 山本悠太, 荒井重勇, 田中信夫, 宇治原徹

    SiC 及び関連ワイドギャップ半導体研究会 第21 回講演会  2012.11.19  応用物理学会「SiC 及び関連ワイドギャップ半導体研究会」

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    Venue:大阪市中央公会堂  

  412. 酸化タングステンの酸素欠損に伴う熱伝導率の変化 International conference

    弓削勇輔, 原田俊太, 田川美穂, 宇治原徹

    2012年春季 第60回 応用物理学関係連合講演会  2013.3.27 

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  413. 金属負極蓄電池の実現に向けた配向結晶集電体によるデンドライト抑制

    三橋貴仁, 伊藤靖仁, 竹内幸久, 原田俊太, 田川美穂, 宇治原 徹

    第54回電池討論会  2013 

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  414. 非対称温度分布下でのSiC溶液成長法におけるマランゴニ対流を考慮した3次元数値シミュレーションと表面形状の相関 International conference

    古池大輝, 梅崎智典, 村山健太, 青柳健大, 原田俊太, 田川美穂, 酒井武信, 宇治原徹

    先進パワー半導体分科会 第1回講演会  2014.11.19 

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  415. 高品質4H-SiC溶液成長における多形変化抑制メカニズム International conference

    原田俊太, 山本祐 治, 村山健太, 青柳健大, 酒井武信, 田川美穂, 宇治原徹

    第75回応用物理学会秋季学術講演会  2014.9.17 

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  416. 脂質分子をキャリアとしたDNA被覆金ナノ粒子の2次元結晶化 International conference

    磯貝卓巳, Agnes Piednoir, 赤田英里, 赤星祐樹, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  417. 脂質分子の拡散によるDNA被覆金ナノ粒子の2次元構造体形成 International conference

    磯貝卓巳, Agnes Piednoir, 赤田英里, 祐樹赤星, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    2012年度春季 第60回 応用物理学関係連合講演会  2013.3.27 

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  418. 脂質二重膜上におけるDNA被覆金ナノ粒子の拡散現象 International conference

    中田咲子, 赤田英里, 磯貝卓巳, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    第75回応用物理学会秋季学術講演会  2014.9.17 

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  419. 第三元素を添加したマグネリ相酸化チタンの熱電特性

    原田 俊太, 田中 克志, 乾 晴行

    日本金属学会  2010.9.25  日本金属学会

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    Venue:北海道大学  

  420. 溶液法による高品質SiC結晶成長メカニズム International conference

    原田俊太, 山本祐治, 関 和明, 堀尾篤史, 三橋貴仁, 田川美穂, 宇治原徹

    第42回日本結晶成長学会 NCCG-42  2012.11.9  日本結晶成長学会

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    Venue:九州大学  

  421. 溶液成長における4H-SiC上での多形変化挙動 International conference

    原田俊太, アレキサンダー, 関和明, 山本祐治, 宇治原徹

    第41回結晶成長国内会議(NCCG-41)  2011.11.3  日本結晶成長学会

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  422. 溶液成長過程における貫通転位変換を利用した高品質4H-SiCの実現 International conference

    原田俊太, 山本祐治, 関 和明, 田川美穂, 宇治原徹

    SiC 及び関連ワイドギャップ半導体研究会 第21 回講演会  2012.11.19  応用物理学会「SiC 及び関連ワイドギャップ半導体研究会」

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    Venue:大阪市中央公会堂  

  423. 溶液法による3C-SiCバルク結晶成長 International conference

    関 和明, 原田俊太, 宇治原徹

    第42回日本結晶成長学会 NCCG-42  2012.11.9  日本結晶成長学会

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    Venue:九州大学  

  424. 溶液法によるα-Al2O3上へのAlNヘテロエピタキシャル成長 International conference

    松原弘明, 水野恒平, 竹内幸久, 原田俊太, 木藤泰男, 奥野英一, 宇治原徹

    第42回日本結晶成長学会 NCCG-42  2012.11.9  日本結晶成長学会

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    Venue:九州大学  

  425. 溶液法によるサファイア基板上へのAlN単結晶成長 International conference

    松原弘明, 水野恒平, 竹内幸久, 原田俊太, 木藤泰男, 奥野英一, 宇治原徹

    第73回 応用物理学会学術講演会  2012.9.11  応用物理学会

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    Venue:愛媛大学・松山大学  

  426. 多元溶媒窒化法を用いた単結晶AlNウィスカーの合成 International conference

    陳鳴宇, 永冶仁, 渡邉 将太, 竹内幸久, 原田俊太, 荒井重勇, 田川美穂, 宇治原徹

    第75回応用物理学会秋季学術講演会  2014.9.17 

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  427. 多元溶媒を用いたAlNウィスカーの成長 International conference

    陳鳴宇, 松原弘明, 水野恒平, 永冶仁, 竹内幸久, 原田俊太, 青木祐一, 小原公和, 加納豊広, 宇治原徹

    第43回結晶成長国内会議  2013.11.6 

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  428. 多元溶媒を用いた高アスペクト比AlN ウィスカーの成長 International conference

    陳鳴宇, 松原弘明, 水野恒平, 永冶仁, 竹内幸久, 原田俊太, 宇治原徹, 青木祐一, 小原公和, 加納豊広

    公益社団法人日本セラミックス協会 第26回秋季シンポジウ  2013.9.4 

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  429. 多元溶媒SiC溶液成長における成長多形と活量比aSi/aCの相関

    堀尾篤史, 原田俊太, 田川美穂, 宇治原徹

    第22回SiC講演会  2013.12.9 

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  430. 可視光励起光電子分光法による半導体超格子構造の伝導キャリア観察 International conference

    西谷健治, 市橋史朗, 志村大樹, 桒原真人, 伊藤孝寛, 原田俊太, 田川美穂, 宇治原徹

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  431. 可視光励起光電子分光法による伝導電子の直接観察 International conference

    市橋史朗, 志村大樹, 西谷健治, 桒原真人, 伊藤孝寛, 原田俊太, 田川美穂, 宇治原徹

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  432. 可視光励起光電子分光法による半導体中の伝導電子の直接観察

    市橋史朗, 志村大樹, 西谷健治, 桑原真人, 伊藤孝寛, 原田俊太, 田川美穂, 宇治原徹

    日本物理学会 第69回年次大会  2014.3 

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  433. 可視光励起光電子分光法による半導体超格子ミニバンド構造の有効質量評価

    西谷健治, 志村大樹, 市橋史朗, 桒原真人, 伊藤孝寛, 原田俊太, 田川美穂, 宇治原徹

    第61回応用物理学会春季学術講演会  2014.3 

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  434. 化学平衡計算に基づいた過飽和領域の制御によるAlN 単結晶溶液成長 International conference

    永冶仁, 陳鳴宇, 渡邉将太, 竹内幸久, 原田俊太, 田川美穂, 宇治原徹

    第44回 結晶成長国内会議 NCCG-44  2014.11.6 

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  435. 円偏光レーザー誘起結晶化によるキラリティ制御の可能性 International conference

    新家寛正, 村山健太, 原田俊太, 田川美穂, 宇治原徹

    第44回 結晶成長国内会議 NCCG-44  2014.11.6 

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  436. 一方向の溶液流れ下におけるSiCのステップバンチングの挙動 International conference

    朱燦, 原田俊太, 関和明, 新家寛正, 田川美穂, 宇治原徹

    第42回日本結晶成長学会 NCCG-42  2012.11.9  日本結晶成長学会

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    Venue:九州大学  

  437. シンクロトロン X 線トポグラフィによる溶液成長 SiC 結晶の欠陥評価と高品質化 International conference

    原田俊太

    第4回名古屋大学シンクロトロン光研究センターシンポジウム  2015.1.22 

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  438. Ultrahigh-resolution direct observation of mini-bands formed in InGaAs/AlGaAs superlattice

    Daiki Shimura, Fumiaki Ichihashi, Kenji Nishitani, Shunta Harada, Makoto Kuwahara, Takahiro Ito, Masaharu Matsunami, Shin-ichi Kimura, Takenobu Sakai, Miho Tagawa, Toru Ujihara

    Photovoltaic specialists conference 39th  2013.7.16 

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  439. VS 法による高アスペクト比AlN ウィスカーの成長 International conference

    松原弘明, 水野恒平, 竹内幸久, 原田俊太, 宇治原徹, 青木祐一, 小原公和

    第25回セラミックス協会秋季シンポジウム  2012.9.19 

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  440. シアー構造を有するMagnèli相化合物の構造変化と熱電特性

    原田 俊太, 田中 克志, 乾 晴行

    日本金属学会  2010.3.27  日本金属学会

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    Venue:筑波大学  

  441. Ultra-high quality SiC crystal grown by solution method utilizing the conversion from threading dislocations to basal plane defects

    Toru Ujihara, Yuji Yamamoto, Shunta Harada, Shiyu Xiao, Kazuaki Seki

    17th International Conference on Crystal Growth and Epitaxy  2013.8.11 

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  442. Two-dimensional crystallization of DNA-functionalized nanoparticles via lipid diffusion in supported lipid bilayers

    Takumi Isogai, Agnes Piednoir, Eri Akada, Yuki Akahoshi, Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

    15th Summer School on Crystal Growth  2013.8.11 

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  443. Two-dimensional crystallization of DNA-functionalized Au nanoparticles using lipid diffusion

    T.Isogai, E.Akada, A.Piednoir, Y.Akahoshi, R.Tero, S.Harada, T.Ujihara, M.Tagawa

    ISETS '13  2013.12.13 

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  444. Two-dimensional assembly of Au nanoparticles through DNA hybridization on supported lipid bilayer

    T. Isogai, E. Akada, S. Nakada, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    20th International Conference on DNA Computing and Molecular Programming(DNA20)  2014.9.22 

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  445. Two Pathways Determining Chirality in NaClO3 Crystals Grown from Solution via Achiral Precursors

    Hiromasa Niinomi, Hitoshi Miura, Yuki Kimura, Takahiro Kuribayashi, Makio Uwaha, Shunta Harada, Toru Ujihara, Katsuo Tsukamoto

    17th International Conference on Crystal Growth and Epitaxy  2013.8.11 

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  446. The investigation of step structure with different TSDs conversion behavior during 4H-SiC solution growth International conference

    2014.9.17 

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  447. The Suppression of the Trenches by the Control of Solution Flow above Growth Surface in the Solution Growth of SiC

    C. Zhu, S. Harada, S. Xiao, K. Seki, M. Tagawa, Y. Matsumoto, T. Kato, K. Kurashige, H. Okamura, T. Ujihara

    ICSCRM 2013  2013.9.29 

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    Language:English   Presentation type:Poster presentation  

  448. Threading screw dislocations conversion behavior on C face with different surface morphology during 4H-SiC solution growth

    S. Xiao, N. Hara, S. Harada, T. Sakai, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials  2014.9.21 

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  449. TSSG 法による高品質3C-SiC の成長 International conference

    関 和明, 原田俊太, 宇治原徹

    SiC 及び関連ワイドギャップ半導体研究会 第21 回講演会  2012.11.19  応用物理学会「SiC 及び関連ワイドギャップ半導体研究会」

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    Venue:大阪市中央公会堂  

  450. TSSG法で育成した4H-SiC結晶の窒素ドーピング挙動 International conference

    楠 一彦, 関 和明, 原田俊太, 亀井一人, 矢代将斉, 宇治原徹

    第73回 応用物理学会学術講演会  2012.9.11  応用物理学会

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    Venue:愛媛大学・松山大学  

  451. Structure of basal plane defects formed by threading screw dislocation conversion during high quality SiC solution growth

    S.Harada, R.Kunimatsu, Xiao Shiyu, Y.Yamamoto, M.Tagawa, Y.Yamamoto, S.Arai, N.Tanaka, T.Ujihara

    ISETS '13  2013.12.13 

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  452. Solution growth of DPB-free 3C-SiC

    K. Seki, S. Harada, T. Ujihara

    ECSCRM 2012  2012.9.2 

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  453. Solution growth of high quality 3C-SiC on a vicinal 6H-SiC

    T. Ujihara, K. Seki, S. Yamamoto, S. Harada, M. Tagawa

    HeteroSiC-WASMPE2013  2013.6.17 

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  454. Structure of basal plane defects formed by the conversion of threading screw dislocation during solution growth of SiC

    S. Harada, S.Y. Xiao, M. Tagawa, Y. Yamamoto, S. Arai, N. Tanaka, T. Ujihara

    Solid State Devices and Materials 2014  2014.9.8 

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  455. SiC溶液法C面成長におけるTSD変換

    原田俊太, 肖世玉, 原奈都美, 原田俊太, 宇治原徹

    第61回応用物理学会春季学術講演会  2014.3 

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  456. SiC溶液成長過程における貫通転位変換現象の成長表面との相互作用による考察 International conference

    原田俊太, 肖世玉, 村山健太, 青柳健大, 酒井武信, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第1回講演会  2014.11.19 

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  457. SiC溶液成長過程における貫通転位変換と成長表面のステップ構造 International conference

    原田俊太, 山本祐治, 肖世玉, 堀尾篤史, 田川美穂, 宇治原徹

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  458. Si-C-X溶媒を用いたSiC 溶液成長における結晶化多形の熱力学的考察 International conference

    堀尾篤史, 原田俊太, 宇治原徹

    SiC 及び関連ワイドギャップ半導体研究会 第21 回講演会  2012.11.19  応用物理学会「SiC 及び関連ワイドギャップ半導体研究会」

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    Venue:大阪市中央公会堂  

  459. SiC 溶液成長における流れ制御によるトレンチ形成の抑制 International conference

    朱燦, 原田俊太, 関和明, 肖世玉, 田川美穂, 松本祐司, 加藤智久, 蔵重和央, 奥村元, 宇治原徹

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  460. SiC 溶液成長過程における貫通転位変換現象の弾性論的考察 International conference

    原田俊太, 肖世玉, 村山健太, 青柳健大, 酒井武信, 田川美穂, 宇治原徹

    第44回 結晶成長国内会議 NCCG-44  2014.11.6 

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  461. SiCフラックス成長におけるSi-NiフラックスのAl添加効果 International conference

    小沼碧海, 丸山伸伍, 原田俊太, 宇治原徹, 加藤智久, 蔵重和央, 奥村元, 松本祐司

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  462. SiC溶液成長において流速の変化が表面モフォロジーに与える影響 International conference

    朱燦, 原田俊太, 関和明, 田川美穂, 松本祐司, 加藤智久, 蔵重和央, 奥村元, 宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会  2013.3.27 

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  463. SiC溶液成長における欠陥変換挙動と高品質結晶成長

    原田俊太

    表面技術協会 関東支部・第86回講演会「ひらめき・未来材料~進化する選択的物質貯蔵・輸送・分離・変換材料~  2013.11.29 

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  464. SiC溶液成長における流れがステップバンチングに及ぼす影響 International conference

    Can Zhu, 原田俊太, 関 和明, 新家寛正, 宇治原徹

    第73回 応用物理学会学術講演会  2012.9.11  応用物理学会

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    Venue:愛媛大学・松山大学  

  465. SiC溶液成長における窒素ドープによる積層欠陥の形成 International conference

    原田俊太, 関和明, 楠一彦, 田川美穂, 宇治原徹

    第42回日本結晶成長学会 NCCG-42  2012.11.9  日本結晶成長学会

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    Venue:九州大学  

  466. SiC溶液成長における貫通らせん転位低減の促進 International conference

    原田 俊太, 山本 祐治, 関 和明, 堀尾 篤史, 三橋貴仁, 宇治原 徹

    2012年春季 第59回 応用物理学関係連合講演会  2012.3.15  応用物理学会

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    Venue:早稲田大学 早稲田キャンパス  

  467. SiC溶液成長における貫通らせん転位変換の弾性エネルギーによる考察

    原田俊太, 肖世玉, 原奈都美, 勝野弘康, 田川美穂, 宇治原徹

    第61回応用物理学会春季学術講演会  2014.3 

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  468. SiC溶液成長における転位伝播挙動と高品質化 International conference

    原田俊太

    第2回グリーンエネルギー材料のマルチスケール創製研究会(松江)プログラム  2015.1.11 

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  469. SiC溶液成長における過飽和度制御による凸形状成長

    古池大輝, 梅崎智典, 堀尾篤史, 原田俊太, 田川美穂, 宇治原徹

    第22回SiC講演会  2013.12.9 

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  470. SiC溶液成長法における種結晶形状の成長表面への影響と貫通らせん転位変換 International conference

    古池大輝, 梅崎智典, 原田俊太, 田川美穂, 酒井武信, 宇治原徹

    第75回応用物理学会秋季学術講演会  2014.9.17 

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  471. SiC溶液成長過程における基底面転位の形成

    肖 世玉, 原田 俊太, 宇治原 徹

    第22回SiC講演会  2013.12.9 

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  472. SiC溶液成長過程における基底面転位の形成 International conference

    肖世玉, 朱燦, 原田俊太, 宇治原徹

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  473. Si-Al-Cu溶媒を用いた高Alドープ4H-SiC結晶の溶液成長 International conference

    楠一彦, 関和明, 亀井一人, 原田俊太, 宇治原徹

    先進パワー半導体分科会 第1回講演会  2014.11.19 

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  474. Reduction of threading screw dislocation density utilizing defect conversion during solution growth of 4H-SiC

    S. Harada, Y. Yamamoto, K. Seki, T. Ujihara

    ECSCRM 2012  2012.9.2 

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  475. Reduction of Defects in SiC by Solution Growth for High Performance Power Device International conference

    Shunta Harada, Yuji Yamamto, Kazuaki Seki, Toru Ujihara, Yuta Yamamoto, Shigeo Arai, Jun Yamasaki, Nobuo Tanaka

    Interational symposium on role of electron microscopy in industry  2012.1.19 

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  476. p型SiC溶液成長における欠陥変換挙動 International conference

    原田俊太

    高品質SiC結晶次世代成長法に関する研究会  2014.3 

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  477. Possibility for elimination of dislocations in SiC crystal: conversion of threading edge dislocations by solution growth

    S. Harada, Y. Yamamoto, K. Seki, A. Horio, T. Mitsuhashi, C. Zhu, M. Tagawa, T. Ujihara

    ECSCRM 2012  2012.9.2 

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  478. n型およびp型SiC溶液成長過程における欠陥挙動と高品質結晶成長 International conference

    原田俊太

    第91回バルク成長分科会研究会  2014.3 

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  479. Observation of basal plane dislocations generated during solution growth in 4H-silicon carbide

    S.Y.Xiao, S.Harada, T.Ujihara

    ISETS '13  2013.12.13 

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  480. Observation of Conduction Electrons in Superlattice Structure by Visible Light Photoemission Spectroscopy

    Kenji Nishitani, Fumiaki Ichihashi, Daiki Shimura, Shunta Harada, Makoto Kuwahara, Miho Tagawa, Takahiro Ito, Toru Ujihara

    the 23rd International Photovoltaic Science and Engineering Conference(PVSEC-23)  2013 

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  481. Polytype transformation path on 4H-SiC during top-seeded solution growth

    Shunta Harada, Alexander, Kazuaki Seki, Yuji Yamamoto, Toru Ujihara

    2011 International Conference on Solid State Devices and Materials (SSDM 2011)  2011.9.28 

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  482. NEA表面を利用した伝導電子エネルギーの直接測定 International conference

    市橋史朗, 志村大樹, 西谷健治, 原田俊太, 桑原真人, 伊藤孝寛, 田川美穂, 宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会  2013.3.27 

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  483. NaClO3 溶液成長におけるアキラル-キラル多形転移を介したキラリティの発生と増幅

    新家寛正, 原田俊太, 宇治原徹, 三浦均, 木村勇気, 上羽牧夫, 塚本勝男

    日本地球惑星科学連合2014年大会  2014.3 

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  484. NaClO3溶液成長におけるアキラルな準安定相の溶解度測定 International conference

    新家寛正, 原田俊太, 宇治原徹, 三浦均, 木村勇気, 上羽牧夫, 塚本勝男

    第43回結晶成長国内会議  2013.11.6 

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  485. NaClO3溶液成長におけるアキラルな準安定相を介したキラル結晶形成過程 International conference

    新家寛正, 原田俊太, 宇治原徹, 三浦均, 木村勇気, 栗林貴弘上羽牧夫, 塚本勝男

    第43回結晶成長国内会議  2013.11.6 

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  486. Nanoparticle Assembly mediated by Designed DNA Nanostructures

    M. Tagawa, O. Gang, K. Yager, T. Isogai, E. Akada, S. Harada, T. Ujihara

    2013.6.30 

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  487. N-type doping of 4H-SiC by top-seeded solution growth technique

    K. Kusunoki, K. Kamei, K. Seki, S. Harada, Toru Ujihara

    ICSCRM 2013  2013.9.29 

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  488. Mechanisms behind low lattice thermal conduction of high density of planar defects containing TiO2-x by atomistic simulations

    Y. Miyauchi, M. Tada, M. Yoshiya, S. Harada, K. Tanaka, H. Yasuda, H. Inui

    IUMRS-ICEM 2012  2012.9.23 

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  489. Improvement of surface morphology by solution flow control in solution growth of SiC on off-axis seeds

    T. Umezaki, D. Koike, S. Harada, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials  2014.9.21 

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  490. Increase in the growth rate by rotating the seed crystal at a high speed during the solution growth of SiC

    T. Umezaki, D. Koike, S. Harada, T. Ujihara

    ICSCRM 2013  2013.9.29 

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  491. Influence of solution flow on step bunching in solution growth of SiC

    C. Zhu, K. Seki, S. Harada, H. Niinomi, M. Tagawa, T. Ujihara

    ECSCRM 2012  2012.9.2 

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  492. Heavily Al doped 4H-SiC growth by the top-seeded solution growth technique using Si-Al-Cu melt as a solvent

    K. Kusunoki, K. Kamei, K. Seki, Y. Kishida, K. Moriguchi, H. Kaidoh, S. Harada, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials  2014.9.21 

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  493. Forming two-dimensional structure of DNA-functionalized Au nanoparticles via lipid diffusion in supported lipid bilayers

    Takumi Isogai, Agnes Piednoir, Eri Akada, Yuki Akahoshi, Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

    17th International Conference on Crystal Growth and Epitaxy  2013.8.11 

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  494. Growth of high quality 3C-SiC on hexagonal SiC seed using TSSG method

    Kazuaki Seki, Shota Yamamoto, Shunta Harada, Toru Ujihara

    17th International Conference on Crystal Growth and Epitaxy  2013.8.11 

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  495. Formation of Different Polytypes during 4H-SiC Solution Growth

    Shunta Harada, Alexander, Kazuaki Seki, Yuji Yamamoto, Toru Ujihara, Jun Yamasaki, Nobuo Tanaka

    ISETS '11  2011.12.9 

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  496. Fe 過剰BaFe2(As,P)2 薄膜の臨界電流密度増大の起源 International conference

    森康博, 藤本亮祐, 坂上彰啓, 原田俊太, 宇治原徹, 田渕雅夫, 生田博志

    2013年 第74回応用物理学会秋季学術講演会  2013.9.16 

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  497. Evolution of threading screw dislocation conversion during solution growth of 4H-SiC

    Shunta Harada, Yuji Yamamoto, Kazuaki Seki, Atsushi Horio, Takato Mitsuhashi, Miho Tagawa, Toru Ujihara

    17th International Conference on Crystal Growth and Epitaxy  2013.8.11 

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  498. Evolution of Threading Edge Dislocation During Solution Growth of SiC

    S. Harada, Y. Yamamoto, K. Seki, A. Horio, T. Mitsuhashi, T. Ujihara

    SSDM2012  2012.9.25 

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  499. Evaluation of Mini-Bands Formed in Superlattice Structure for Intermediate-Band Solar Cell

    D.Shimura, F.Ichihashi, K.Nishitani, S.Harada, T.Ito, M.Kuwahara, M.Matsunami, S.Kimura, M.Tagawa, T.Ujihara

    ISETS '13  2013.12.13 

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  500. Electron Spectroscopy of Conduction Electrons Exited by Visible Light Utilizing NEA Surface

    Fumiaki Ichihashi, Daiki Shimura, Kenji Nishitani, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Miho Tagawa, Toru Ujihara

    Photovoltaic specialists conference 39th  2013.7.16 

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  501. Efficient process for ultrahigh quality 4H-SiC crystal utilizing solution growth on off-axis seed crystal

    Shunta HARADA, Yuji YAMAMOTO, Kazuaki SEKI, Atsushi HORIO, Takato MITSUHASHI, Toru UJIHARA

    Materials research society 2012 spring meeting  2012.4.9 

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  502. Effect of surface polarity on the conversion of threading dislocations in solution growth

    Y. Yamamoto, S. Harada, K. Seki, A. Horio, T. Mitsuhashi, T. Ujihara

    ECSCRM 2012  2012.9.2 

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  503. DPBフリー3C-SiCの溶液成長 International conference

    関 和明, 原田俊太, 宇治原徹

    第73回 応用物理学会学術講演会  2012.9.11  応用物理学会

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    Venue:愛媛大学・松山大学  

  504. DNAと脂質二重膜を用いたナノ粒子の2次元結晶化 International conference

    磯貝卓巳, 赤田英里, Agnes Piednoir, 赤星祐樹, 手老龍吾, 原田俊太, 宇 治原徹, 田川美穂

    第43回結晶成長国内会議  2013.11.6 

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  505. DNA-mediated Nanoparticle Assembly

    M. Tagawa, T. Isogai, E. Akada, S. Harada, T. Ujihara

    DNA-mediated Nanoparticle Assembly  2013.10.7 

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  506. Dislocation conversion during SiC solution growth for high-quality crystal

    S. Harada, Y. Yamamoto, S. Xiao, N. HARA, D. Koike, T. Mutoh, M. Tagawa, T. Sakai, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials  2014.9.21 

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  507. Direct Observation of Mini-bands in AlGaAs/GaAs Superlattice for Intermediate Band Solar Cell

    D. Shimura, K. Hashimoto, F. Ichihashi, S. Harada, T. Ito, M. Kuwahara, M. Matsunami, S. Kimura, T. Sakai, T. Ujihara

    IUMRS-ICEM 2012  2012.9.23 

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  508. Direct Observation of Conduction Band Structure and Conduction Electron Distribution in Semiconductor for Intermediate-band Solar Cells

    F.Ichihashi, D.Shimura, K.Nishitani, M.Kuwahara, S.Harada, T.Ito, M.Tagawa, T.Ujihara

    ISETS '13  2013.12.13 

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  509. Direct Observation of Defect Evolution during Solution Growth of SiC by Synchrotron X-ray Topography

    S. Harada, Y. Yamamoto, K. Seki, A. Horio, T. Mitsuhashi, T. Ujihara

    IUMRS-ICEM 2012  2012.9.23 

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  510. Direct observation of an ordered arrangement of vacancies and large local thermal vibration in rhenium silicide by Cs corrected STEM

    Shunta Harada, Katsushi Tanaka, Kyosuke Kishida, Norihiko L Okamoto, Noriaki Endo, Eiji Okunishi, Haruyuki Inui

    Materials Research Society Fall Meeting  2010.11.29 

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  511. Direct Measurement of Conduction Miniband Structure in Superlattice by Visible-Light Photoemission Spectroscopy

    F. Ichihashi, D. Shimura, K. Nishitani, M. Kuwahara, T. Ito, S. Harada, H. Katsuno, M. Tagawa, T. Ujihara

    Photovoltaic Specialists Conference(The PVSC-40)  2014.1.8 

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  512. Defect evolution in high-qualit 4H-SiC grown by solution method

    S. Harada, M. Tagawa, T. Ujihara

    International Union of Crystallography 2014  2014.8.5 

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  513. Crystallographic shear structures and thermal conductivity of some thermoelectric Magnèli phase titanium oxides

    Shunta Harada, Katsushi Tanaka, Haruyuki Inui

    International conference on intergranular and interphase boundaries in materials (iib2010)  2010.6.27 

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  514. "SiC溶液成長過程における貫通転位変換現象の弾性論的考察" International conference

    原田俊太, 肖世玉, 村山健太, 青柳健大, 酒井武信, 田川美穂, 宇治原徹

    第44回結晶成長国内会議(NCCG-44)  2014.11.6 

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    Venue:学習院創立百周年記念会館, 東京都  

  515. "SiC溶液成長過程における貫通転位変換現象の成長表面との相互作用による考察 Consideration of threading dislocation conversion phenomena during the solution growth of SiC based on the interaction between the growth surface and the dislocation" International conference

    原田俊太, 肖世玉, 村山健太, 青柳健大, 酒井武信, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第1回講演会 1st Meeting on Advanced Power Semiconductor 「未来を創る先進パワーエレクトロニクスと低炭素社会」  2014.11.19  (公社)応用物理学会 先進パワー半導体分科会

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    Venue:ウインクあいち、愛知県  

  516. "The investigation of step structure with different TSDs conversion behavior during 4H-SiC solution growth" International conference

    2014.9.17 

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  517. "円偏光レーザー誘起結晶化によるキラリティ制御の可能性" International conference

    新家寛正, 村山健太, 原田俊太, 田川美穂, 宇治原徹

    第44回結晶成長国内会議(NCCG-44)  2014.11.6 

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    Venue:学習院創立百周年記念会館, 東京都  

  518. "化学平衡計算に基づいた過飽和領域の制御によるAlN単結晶溶液成長" International conference

    永冶仁, 陳鳴宇, 渡邉将太, 竹内幸久, 原田俊太, 田川美穂, 宇治原徹

    第44回結晶成長国内会議(NCCG-44)  2014.11.6 

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    Venue:学習院創立百周年記念会館, 東京都  

  519. "多元溶媒窒化法を用いた単結晶AlNウィスカーの合成" International conference

    陳鳴宇, 永冶仁, 渡邉将太, 竹内幸久, 原田俊太, 荒井重勇, 田川美穂, 宇治原徹

    第75回応用物理学会秋季学術講演会  2014.9.17 

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    Venue:北海道大学札幌キャンパス、北海道  

  520. "脂質二重膜上におけるDNA被覆金ナノ粒子の拡散現象" International conference

    中田咲子, 赤田英里, 磯貝卓巳, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    第75回応用物理学会秋季学術講演会  2014.9.17 

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    Venue:北海道大学札幌キャンパス、北海道  

  521. "非対称温度分布下でのSiC溶液成長法におけるマランゴニ対流を考慮した3次元数値シミュレーションと表面形状の相関 Relationship between Surface Morphology and Numerical Simulation in Consideration of Marangoni Convection during SiC Solution Growth under a Non-Axisymmetric Temperature Distribution" International conference

    古池大輝, 梅崎智典, 村山健太, 青柳健大, 原田俊太, 田川美穂, 酒井武信, 宇治原徹

    先進パワー半導体分科会 第1回講演会 1st Meeting on Advanced Power Semiconductor 「未来を創る先進パワーエレクトロニクスと低炭素社会」  2014.11.19  (公社)応用物理学会 先進パワー半導体分科会

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    Venue:ウインクあいち、愛知県  

  522. "高品質4H-SiC溶液成長における多形変化抑制メカニズム" International conference

    原田俊太, 山本祐治, 村山健太, 青柳健大, 酒井武信, 田川美穂, 宇治原徹

    第75回応用物理学会秋季学術講演会  2014.9.17 

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    Venue:北海道大学札幌キャンパス、北海道  

  523. 3C-SiC crystal on sapphire by solution growth method

    K. Shibata, S. Harada, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials  2014.9.21 

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  524. 3C-SiC 溶液成長における多形制御と欠陥抑制 International conference

    関和明, 山本翔太, 原田俊太, 宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会  2013.3.27 

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  525. 3C-SiC溶液成長における双晶抑制 International conference

    関 和明, 原田俊太, 宇治原徹

    第42回日本結晶成長学会 NCCG-42  2012.11.9  日本結晶成長学会

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    Venue:九州大学  

  526. 4H-SiC溶液成長における成長表面のステップ構造と貫通転位変換挙動の相関

    原田俊太, 山本祐治, 肖世玉, 堀尾篤史, 田川美穂, 宇治原徹

    第22回SiC講演会  2013.12.9 

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  527. 4H-SiC溶液成長における貫通刃状転位の選択的変換 International conference

    原田俊太, 山本祐治, 関 和明, 堀尾篤史, 三橋貴仁, 宇治原徹

    第73回 応用物理学会学術講演会  2012.9.11  応用物理学会

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    Venue:愛媛大学・松山大学  

  528. 4H-SiC溶液成長法における凸形状成長による貫通らせん転位の変換挙動

    古池大輝, 梅崎智典, 堀尾篤史, 原田俊太, 田川美穂, 宇治原徹

    第61回応用物理学会春季学術講演会  2014.3 

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  529. 4H-SiC溶液成長過程における貫通らせん転位変換により形成する欠陥の微細構造 International conference

    原田俊太, 國松亮太, 田川美穂, 山本悠太, 荒井重勇, 田中信夫, 宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会  2013.3.27 

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  530. 4H-SiC溶液成長過程における貫通転位変換挙動と成長表面モフォロジーの相関 International conference

    原田俊太, 山本祐治, 肖世玉, 堀尾篤史, 田川美穂, 宇治原徹

    第43回結晶成長国内会議  2013.11.6 

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  531. Al 融液窒化法において成長温度がAlN組織形成に与える影響 International conference

    水野恒平, 松原弘明, 竹内幸久, 原田俊太, 宇治原徹, 青木祐一, 小原公和

    第25回セラミックス協会秋季シンポジウム  2012.9.19 

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  532. AlGaAs/InGaAs超格子構造におけるミニバンドの超高分解能直接観察 International conference

    志村大樹, 市橋史朗, 原田俊太, 桒原真人, 伊藤孝寛, 松波雅治, 木村真一, 酒井武信, 田川美穂, 宇治原徹

    2012年度春季 第60回 応用物理学関係連合講演会  2013.3.27 

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  533. AlN溶液成長における化学平衡計算を用いた実験条件の決定 International conference

    永冶仁, 陳鳴 宇, 渡邉将太, 竹内幸久, 原田俊太, 田川美穂, 宇治原徹

    第75回応用物理学会秋季学術講演会  2014.9.17 

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  534. Aluminum Nitride Whiskers with High Aspect Ratio Grown from Multi-Component Melt

    M.Y.Chen, H.Matsubara, K.Mizuno, M.Nagaya, Y.Takeuchi, S.Harada, T.Ujihara, Y.Aoki, K.Kohara, T.Kano

    ISETS '13  2013.12.13 

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  535. Al融液窒化法を用いたAlN多結晶の作製におけるMgによる窒化促進効果の検証

    水野恒平, 松原弘明, 永冶仁, 竹内幸久, 原田俊太, 宇治原徹, 加納豊広, 青木祐一, 小原公和

    日本セラミックス協会2013年 年会  2013.3.17 

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  536. Anisotropy of Lattice Thermal Conduction in TiO2-x with High Density of Planar Defects by Atomistic Simulations

    Y. Miyauchi, M. Tada, M. Yoshiya, S. Harada, K. Tanaka, H. Yasuda, H. Inui

    The 3rd International Symposium on Advanced Microscopy and Theoretical Calculations (AMTC3)  2012.5.9 

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  537. CaFe2As2系超伝導薄膜の透過電子顕微鏡観察 International conference

    川口昂彦, 原田俊太, 藤本亮 祐, 森康博, 中村伊吹, 畑野敬史, 宇治原徹, 生田博志

    第75回応用物理学会秋季学術講演会  2014.9.17 

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  538. Characterization of Newly Generated Defects during Solution Growth of 4H-SiC

    Shiyu Xiao, Shunta Harada, Natsumi Hara, Miho Tagawa, Toru Ujihara

    International Union of Materials Research Societies International Conference in Asia 2014  2014.8.24 

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  539. Control of dislocation conversion during solution growth by changing surface step structure

    Shunta Harada, Yuji Yamamoto, Shiyu Xiao, Atsushi Horio, Miho Tagawa, Toru Ujihara

    ICSCRM 2013  2013.9.29 

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  540. Control of Interface Shape by Non-Axisymmetric Solution Convection in Top-Seeded Solution Growth for SiC Crystal

    D. Koike, T. Umezaki, S. Harada, M. Tagawa, T. Sakai, T. Ujihara

    10th European Conference on Silicon Carbide and Related Materials  2014.9.21 

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  541. Correlation between Surface Morphology and Threading Dislocation Conversion in Solution Growth of SiC

    Shunta Harada, Shiyu Xiao, Natsumi Hara, Daiki Koike, Takuya Mutoh, Miho Tagawa, Toru Ujihara

    International Union of Materials Research Societies International Conference in Asia 2014  2014.8.24 

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  542. "SiC溶液成長法における種結晶形状の成長表面への影響と貫通らせん転位変換" International conference

    古池大輝, 梅崎智典, 原田俊太, 田川美穂, 酒井武信, 宇治原徹

    第75回応用物理学会秋季学術講演会  2014.9.17 

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    Venue:北海道大学札幌キャンパス、北海道  

  543. "3C-SiC crystal on sapphire by solution growth method"

    Kenji SHIBATA, Shunta HARADA, Toru UJIHARA

    10th European Conference on Silicon Carbide and Related Materials(ECSCRM 2014)  2014.9.21 

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  544. "AlN溶液成長における化学平衡計算を用いた実験条件の決定" International conference

    永冶仁, 陳鳴宇, 渡邉将太, 竹内幸久, 原田俊太, 田川美穂, 宇治原徹

    第75回応用物理学会秋季学術講演会  2014.9.17 

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    Venue:北海道大学札幌キャンパス、北海道  

  545. "CaFe2As2系超伝導薄膜の透過電子顕微鏡観察" International conference

    川口昂彦, 原田俊太, 藤本亮祐, 森康博, 中村伊吹, 畑野敬史, 宇治原徹, 生田博志

    第75回応用物理学会秋季学術講演会  2014.9.17 

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    Venue:北海道大学札幌キャンパス、北海道  

  546. "Control of Interface Shape by Non-Axisymmetric Solution Convection in Top-Seeded Solution Growth for SiC Crystal"

    Daiki KOIKE, Tomonori UMEZAKI, Shunta HARADA, Miho TAGAWA, Takenobu SAKAI, Toru UJIHARA

    10th European Conference on Silicon Carbide and Related Materials(ECSCRM 2014)  2014.9.21 

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  547. "Improvement of surface morphology by solution flow control in solution growth of SiC on off-axis seeds"

    Tomonori UMEZAKI, Daiki KOIKE, Shunta HARADA, Toru UJIHARA

    10th European Conference on Silicon Carbide and Related Materials(ECSCRM 2014)  2014.9.21 

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  548. "Microstructure Observation of CaFe2As2 Family Thin Films by Transmission Electron Microscopy"

    T. Kawaguchi, S. Harada, R. Fujimoto, Y. Mori, I. Nakamura, T. Hatano, T. Ujihara, H. Ikuta

    27th International Symposium on Superconductivity (ISS2014)  2014.11.25 

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  549. "Si-Al-Cu溶媒を用いた高Alドープ4H-SiC結晶の溶液成長 Heavily Al doped 4H-SiC growth by solution growth technique using Si-Al-Cu melt as a solvent" International conference

    楠一彦, 関和明, 亀井一人, 原田俊太, 宇治原徹

    先進パワー半導体分科会 第1回講演会 1st Meeting on Advanced Power Semiconductor 「未来を創る先進パワーエレクトロニクスと低炭素社会」  2014.11.19  (公社)応用物理学会 先進パワー半導体分科会

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    Venue:ウインクあいち、愛知県  

  550. "SiCフラックス成長におけるSiC基板/フラックス界面の高温真空レーザー顕微鏡観察" International conference

    小沼碧海, 丸山伸伍, 原田俊太, 宇治原徹, 加藤智久, 蔵重和央, 奥村元, 松本祐司

    第75回応用物理学会秋季学術講演会  2014.9.17 

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    Venue:北海道大学札幌キャンパス、北海道  

  551. 4H-SiC溶液成長法二段階成長における異種多形の析出抑制 International conference

    村山健太, 原田俊太, 藤栄文博, 劉欣博, 村井良多, 朱燦, 花田賢志, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46)  2017.11.27 

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    Venue:ホテルコンコルド浜松  

  552. 機械学習による熱流体解析の高速化における予測精度 International conference

    畑佐豪記, 角岡洋介, 村井良多, 村山健太, 朱燦, 原田俊太, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46)  2017.11.27 

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    Venue:ホテルコンコルド浜松  

  553. ラマン分光法による GaN 単結晶における貫通転位の刃状成分の解析 International conference

    小久保信彦, 角岡洋介, 藤榮文博, 大原淳士, 原一都, 恩田正一, 山田永, 清水三聡, 原田俊太, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第4回講演会  2017.11.1 

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    Venue:名古屋国際会議場  

  554. X 線トポグラフィーその場観察による 4H-SiC 積層欠陥挙動の窒素濃度依存性評価 International conference

    藤榮文博, 原田俊太, 周防裕政, 加藤智久, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第4回講演会  2017.11.1 

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    Venue:名古屋国際会議場  

  555. Two-Step Sic Solution Growth with Extremely Low-Dislocation-Density 4h-SiC Crystal for Suppression of Polytype Transformation

    K. Murayama, S. Harada, F. Fujie, X. Liu, R. Murai, C. Zhu, K. Hanada, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017)  2017.9.17 

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  556. Smooth Li Electrodeposition on Single Crystal Cu Current Collectors

    K. Ishikawa, Y. Ito, S. Harada, M. Tagawa, T. Ujihara

    The Electrochemical Society (232nd ECS Meeting)  2017.10.1 

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  557. SiC溶液成長過程における転位伝播方向制御による高品質化 International conference

    原田俊太, 村山健太, 村井良多, 朱燦, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46)  2017.11.27 

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    Venue:ホテルコンコルド浜松  

  558. SiC溶液成長におけるプロセス・インフォマティクス International conference

    宇治原徹, 角岡洋介, 畑佐豪記, 村山健太, 村井良多, 朱燦, 原田俊太, 田川美穂

    第46回結晶成長国内会議(JCCG-46)  2017.11.27 

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    Venue:ホテルコンコルド浜松  

  559. Real-Time Visualization System for Temperature and Fluid Flow Distributions in SiC Solution Growth Using Prediction Model Constructed by Machine Learning

    G. Hatasa, Y. Tsunooka, S. Lee, K. Murayama, R. Murai, S. Harada, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017)  2017.9.17 

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  560. High-Speed Prediction Model for Supersaturation and Flow Distribution by CFD Simulation and Machine Learning in SiC Solution Growth

    Y. Tsunooka, N. Kokubo, G. Hatasa, S. Harada, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017)  2017.9.17 

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  561. Direct Observation of Stacking Faults Expansion in 4H-SiC at High Temperatures by In Situ X-Ray Topography

    F. Fujie, S. Harada, K. Murayama, K. Hanada, P. Chen, T. Kato, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017)  2017.9.17 

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  562. 機械学習による結晶成長条件の予測を用いたSiC溶液成長 International conference

    林宏益, 村井良多, 朱燦, 村山健太, 角岡洋介, 畑佐豪記, 原田俊太, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46)  2017.11.27 

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    Venue:ホテルコンコルド浜松  

  563. 貫通らせん転位が極めて少ない 4H-SiC の溶液成長における多形安定化手法 International conference

    村山健太, 原田俊太, 藤栄文博, 劉欣博, 村井良多, 朱燦, 花田賢志, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第4回講演会  2017.11.1 

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    Venue:名古屋国際会議場  

  564. 溶液法 SiC 基板を用いて作製した MOS キャパシタの評価 International conference

    古庄智明, 川畑直之, 古橋壮之, 渡辺友勝, 渡邊寛, 山川聡, 村山健太, 原田俊太, 宇治原徹

    先進パワー半導体分科会 第4回講演会  2017.11.1 

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    Venue:名古屋国際会議場  

  565. 溶液成長における溶液状態の高速予測と 網羅的探索により最適化した条件での結晶成長 International conference

    村井良多, 村山健太, 原田俊太, 畑佐豪記, 角岡洋介, 林宏益, 朱燦, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第4回講演会  2017.11.1 

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    Venue:名古屋国際会議場  

  566. 気相法AlNウィスカー成長における形状変化メカニズムの解明 International conference

    齊藤廣志, 竹内幸久, 原田俊太, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46)  2017.11.27 

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    Venue:ホテルコンコルド浜松  

  567. 機械学習を活用したSiC溶液成長プロセス・ビュジュアライゼーション International conference

    宇治原徹, 畑佐豪記, 角岡洋介, 村山健太, 原田俊太, 田川美穂

    第46回結晶成長国内会議(JCCG-46)  2017.11.27 

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    Venue:ホテルコンコルド浜松  

  568. 機械学習による結晶成長条件の予測を用いたSiC溶液成長 International conference

    林宏益, 村井良多, 朱燦, 村山健太, 角岡洋介, 畑佐豪記, 原田俊太, 田川美穂, 宇治原徹

    第46回結晶成長国内会議(JCCG-46)  2017.11.27 

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    Venue:ホテルコンコルド浜松  

  569. Automatic Detection of Dislocation contrasts in Birefringence Image of SiC Wafers Using Variance Filter Method

    Shunta Harada

    SSDM2020  2020.9.29 

  570. Structural control and thermal conduction in titanium oxide natural superlattices Invited

    Shunta Harada

    Mini-Workshop on Thermal and Charge Transport across Flexbile Nano-Interfaces (TCTFN2021)  2021.12.11 

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  571. "High-speed solution growth of single crystal AlN from Cr-Co-Al solvent"

    S. Watanabe, M. Nagaya, Y. Takeuchi, K. Aoyagi, S. Harada, M. Tagawa, T. Ujihara

    16th International Conference on Silicon Carbide and Related Materials(ICSCRM2015)  2015.10.4 

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  572. "Distribution of nitrogen doping concentration in 4H-SiC grown by solution method"

    Z. Wang, T. Kawaguchi, K. Murayama, K. Aoyagi, S. Harada, T. Sakai, M. Tagawa, T. Ujihara

    16th International Conference on Silicon Carbide and Related Materials(ICSCRM2015)  2015.10.4 

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  573. "Direct observation of electrons transported in second conduction mini-band of a semiconductor superlattice by visible-light photoemission spectroscopy"

    Fumiaki Ichihashi, Keniji Nishitani, Xinyu Dong, Takahiko, Kawaguchi, Makoto Kuwahara, Takahiro Ito, Shunta Harada, Miho Tagawa, Toru Ujihara

    SPIE Photonics West 2016  2016.2.13 

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  574. "DDAB平面脂質二重膜の相転移過程の直接観察" International conference

    磯貝卓巳, 中田咲子, 赤田英里, 吉田直矢, 鷲見隼人, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    2016年第63回応用物理学会春季学術講演会  2016.3.19 

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    Venue:東工大大岡山キャンパス  

  575. "Correlation Between Grown Polytypes and Activity Ratio During Solution Growth of SiC with Multi-Component Solvent"

    Atsushi Horio, Shunta Harada, Daiki Koike, Kenta Murayama, Kenta Aoyagi, Takenobu Sakai, Miho Tagawa, Toru Ujihara

    ISPlasma2015 / IC-PLANTS2015  2015.3.26 

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  576. "Consideration of threading dislocation conversion phenomena during SiC solution growth based on the elastic strain energy"

    S. Harada, S. Xiao, K. Murayama, K. Aoyagi, T. Sakai, M. Tagawa, T. Ujihara

    16th International Conference on Silicon Carbide and Related Materials(ICSCRM2015)  2015.10.4 

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  577. "AlN溶液成長における熱力学計算を用いた成長速度の向上" International conference

    渡邉 将太, 永冶 仁, 陳 鳴宇, 竹内 幸久, 青柳 健大, 原田 俊太, 田川 美穂, 宇治原 徹

    2015年 第62回応用物理学会春季学術講演会  2015.3.11  (公社)応用物理学会

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    Venue:東海大学 湘南キャンパス、神奈川県  

  578. "Lipid diffusion and phase transition: Influence on DNA-functionalised nanoparticle adsorbates."

    S. Nakada, E. Akada, T. Isogai, N. Yoshida, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    5th International Colloids Conference  2015.6.21 

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  579. SiCにおける積層欠陥拡張・収縮挙動の高温その場観察 International conference

    藤榮 文博, 原田 俊太, 花田 賢志, 村山 健太, 田川 美穂, 加藤 智久, 宇治原 徹

    日本金属学会 2017年秋期講演会  2017.9.6 

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    Venue:北海道大学  

  580. SiC 溶液成長においてルツボ口径が多結晶析出に及ぼす影響 International conference

    岡島 鎮記, 村井 良多, 村山 健太, 原田 俊太, 田川 美穂, 宇治原 徹

    先進パワー半導体分科会 第3回講演会  2016.11.8 

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    Venue:つくば国際会議場  

  581. Reduction of all types of dislocation in 4H-SiC crystal by two-step solution growth

    K. Murayama, T. Hori, S. Harada, S. Xiao, M. Tagawa, T. Ujihara

    The 11th European Conference on Silicon Carbide and Related Materials (ECSCRM)  2016.9.25 

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  582. Prediction of solution flow combined with computational fluid dynamics simulation and sparse modeling

    N. Kokubo, Y. Tsunooka, S. Harada, M. Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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  583. Phase transition process in DDAB supported lipid bilayer

    T. Isogai, S. Nakada, N. Yoshida, H. Sumi, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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  584. Optically induced crystallization of NaClO3 metastable phase on plasmonic gold nanostructures immersed in unsaturated mother solution International conference

    H. Niinomi, T. Sugiyama, M. Tagawa, T. Ujihara, Y. Mori, S. Harada, K. Murayama, K. Miyamoto, T. Omatsu

    Institute for Global Prominent Research Kickoff Symposium  2016.11.14 

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  585. n 型 4H-SiC 中 SSF 起因フォトルミネッセンスの時間分解測定 International conference

    加藤 正史, 片平 真哉, 市川 義人, 市村 正也, 原田 俊太

    2016年第82回応用物理学会秋季学術講演会  2016.9.13 

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    Venue:朱鷺メッセ  

  586. Morphology of AlN whiskers grown by reacting N2 gas and Al vapor

    M. Matsumoto, H. Saitou, Y. Takeuchi, S. Harada, M. Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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  587. Measurement of Energy Distribution of Conduction Electrons in Superlattice by Visible-Light Photoemission Spectroscopy

    F. Ichihashi, K. Nishitani, X. Dong, T. Kawaguchi, M. Kuwahara, T. Ito, S. Harada, M. Tagawa, T. Ujihara

    42nd IEEE Photovoltaic Specialists Conference  2015.6.14 

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  588. Li挿入によるWO3薄膜の熱伝導率の変化 International conference

    小林 竜大, 中村 彩乃, 原田 俊太, 田川 美穂, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会  2017.9.5 

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    Venue:福岡国際会議場  

  589. Lipid diffusion and phase transition: Influence on DNA-functionalised nanoparticle adsorbates

    S. Nakada, E. Akada, T. Isogai, N. Yoshida, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    5th International Colloids Conference  2015.6.21 

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  590. Investigation of high-temperature annealing process ofsputtered AlN films International conference

    S. Xiao, Y. Liu, R. Suzuki, H. Miyake, K. Hiramatsu, S. Harada, T. Ujihara

    2017.9.5 

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  591. In-situ observation during solution growth of SiC by X-ray transmission method

    T. Sakai, M. Kado, H. Daikoku, S. Harada, T. Ujihara

    The 11th European Conference on Silicon Carbide and Related Materials (ECSCRM)  2016.9.25 

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  592. Hydrogen-Induced Thermal Conductivity Change across Metal-Insulator Transition in Amorphous WO3 Film

    A. Nakamura, S. Harada, M. Tagawa, T. Ujihara

    2017 MRS Spring Meeting  2017.4.17 

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  593. High-Quality SiC Solution Growth Using Dislocation Conversion on C Face

    S. Xiao, S. Harada, X. Liu, K. Murayama, R. Murai, M. Tagawa, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017)  2017.9.17 

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  594. Formation of basal plane dislocations introduced by collision of macrosteps on growth surface during SiC solution growth

    T. Hori, K. Murayama, S. Harada, S. Xiao, M. Tagawa, T. Ujihara

    The 11th European Conference on Silicon Carbide and Related Materials (ECSCRM)  2016.9.25 

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  595. Formation Mechanism of AlN Whiskers by Reacting N2 Gas and Al Vapor

    M. Matsumoto, H. Saitou, Y. Takeuchi, S. Harada, M. Tagawa, T. Ujihara

    Nucleation and Growth Research Conference (NGRC 2016)  2016.9.27 

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  596. Evaluation of 2-Inch Wafer by Solution Growth Method Using Synchrotron X-Ray Topography

    K. Seki, K. Kusunoki, Y. Kishida, H. Kaido, K. Moriguchi, M. Kado, H. Daikoku, T. Shirai, M. Akita, A. Seki, H. Saito, S. Harada, T. Ujihara

    The International Conference on Silicon Carbide and Related Materials (ICSCRM 2017)  2017.9.17 

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  597. Effect of Magnesium Ion Concentration on the Two-Dimensional Structure of DNA-Functionalized Nanoparticles on Supported Lipid Bilayer International conference

    Takumi Isogai, Eri Akada, Sakiko Nakada, Naoya Yoshida, Ryugo Tero, Shunta Harada, Toru Ujihara, Miho Tagawa

    2015.6.22 

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  598. Effect of Crystal Shape on Solution Flow and Surface Morphology in Solution Growth of SiC

    D. Koike, T. Umezaki, K. Murayama, K. Aoyagi, S.Harada, M. Tagawa, T. Sakai, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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  599. Effect of Crystal Orientation of Cu Current Collector on Morphology of Li Electrodeposition

    K. Ishikawa, Y. Ito, S. Harada, M. Tagawa, T. Ujihara

    Nucleation and Growth Research Conference (NGRC 2016)  2016.9.27 

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  600. DNA被覆ナノ粒子によるDDAB脂質二重膜の指組みゲル相形成の促進 International conference

    磯貝 卓巳, 鷲見 隼人, 手老 龍吾, 原田 俊太, 宇治原 徹, 田川 美

    2017年第78回応用物理学会秋季学術講演会  2017.9.5 

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    Venue:福岡国際会議場  

  601. DNA修飾ナノ粒子超格子を前駆体としたウルフ多面体型コロイド結晶の形成 International conference

    鷲見 隼人, 磯貝 卓巳, 吉田 直矢, 原田 俊太, 宇治原 徹, 田川 美穂

    2017年第64回応用物理学会春季学術講演会  2017.3.14 

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    Venue:パシフィコ横浜  

  602. Crystallization of NaClO3 metastable phase from unsaturated mother solution achieved by excitation of plasmonic Au nanoarray International conference

    H. Niinomi, T. Sugiyama, M. Tagawa, T. Ujihara, Y. Mori, S. Harada, K. Murayama, K. Miyamoto, T. Omatsu

    Optics & Photonics Japan 2016  2016.10.30 

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  603. Crystal orientation dependence of precipitate structure of electrodeposited Li metal on Cu current collectors

    K. Ishikawa, Y. Ito, S. Harada, M. Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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  604. Correlation Between Grown Polytypes and Activity Ratio During Solution Growth of SiC with Multi-Component Solvent International conference

    A. Horio, S. Harada, D. Koike, K. Murayama, K. Aoyagi, T. Sakai, M. Tagawa, T. Ujihara

    ISPlasma2015 / IC-PLANTS2015  2015.3.26 

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  605. Controlling two-dimensional structuer of DNA-linked Au nanoparticle lattices on supported lipid bilayer

    T. Isogai, N. Yoshida, H. Sumi, R. Tero, S. Harada, T. Ujihara, M. Tagawa

    The 22nd International Conference on DNA Computing and Molecular Programming (DNA22)  2016.9.4 

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  606. Control of Macrostep Structure for High-Quality SiC Grown by Liquid Phase Epitaxy

    T. Ujihara, C. Zhu, K. Murayama, S. Harada, M.Tagawa

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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  607. Chiral bias on circularly polarized laser-induced chiral crystallization from NaClO3 solution containing plasmonic Ag nanoparticles

    H. Niinomi, T. Sugiyama, M. Tagawa, K. Murayama, S. Harada, K. Miyamoto, T. Omatsu, T. Ujihara

    Optical manipulation and its satellite topics (OMC'16)  2016.5.18 

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  608. AlN溶液成長における熱力学計算を用いた成長速度の向上 International conference

    渡邉将太, 永冶仁, 陳鳴宇, 竹内幸久, 青柳健大, 原田俊太, 田川美穂, 宇治原徹

    第64回応用物理学会春季学術講演会  2015.3.11 

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  609. AlN 溶液成長における機械学習を用いた溶液流動の高効率予測 International conference

    小久保 信彦, 角岡 洋介, 原田 俊太, 田川 美穂, 宇治原 徹

    2016年第78回応用物理学会秋季学術講演会  2016.9.13 

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    Venue:朱鷺メッセ  

  610. 4H-SiC中1SSF・PD起因フォトルミネッセンス減衰時間の温度依存性 International conference

    片平 真哉, 市川 義人, 原田 俊太, 木本 恒暢, 加藤 正史

    2017年第64回応用物理学会春季学術講演会  2017.3.14 

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    Venue:パシフィコ横浜  

  611. 4H-SiC 溶液成長における積層欠陥との相互作用により生じる貫通らせん転位の変換挙動 International conference

    加渡 幹尚, 原田 俊太, 関 和明, 大黒 寛典, 楠 一彦, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会  2017.9.5 

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    Venue:福岡国際会議場  

  612. "高熱伝導率AlNウィスカーの高効率合成" International conference

    松本昌樹, 陳鳴宇, 永冶仁, 渡邉将太, 竹内幸久, 原田俊太, 田川美穂, 宇治原徹, 遠藤亮

    公益社団法人日本セラミックス協会 2015年 年会  2015.3.18  公益社団法人日本セラミックス協会

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    Venue:岡山大学 (津島キャンパス)、岡山県  

  613. "超高品質SiC溶液成長法の最前線" International conference

    原田俊太, 宇治原徹

    日本結晶成長学会・バルク成長分科会 第98回研究会「機能性単結晶材料の最新動向--パワーデバイスから光・圧電まで--」  2016.3.4 

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    Venue:早稲田大学 西早稲田キャンパス  

  614. "超格子構造中のDNA被覆金ナノ粒子の融合に向けた粒子間距離収縮とナノ粒子融合" International conference

    鷲見隼人, 磯貝卓巳, 中田咲子, 吉田直矢, 原田俊太, 宇治原徹, 田川美穂

    2016年第63回応用物理学会春季学術講演会  2016.3.19 

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    Venue:東工大大岡山キャンパス  

  615. "脂質二重膜上におけるDNA被覆金ナノ粒子のセルフアセンブリに対するイオンの効果" International conference

    磯貝 卓巳, 赤田 英理, 中田 咲子, 吉田 直矢, 手老 龍吾, 原田 俊太, 宇治原 徹, 田川 美穂

    2015年 第62回応用物理学会春季学術講演会  2015.3.11  (公社)応用物理学会

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    Venue:東海大学 湘南キャンパス、神奈川県  

  616. "溶液法による4H-SiCバルク結晶成長と結晶品質評価" International conference

    楠一彦, 関和明, 岸田豊, 海藤宏志, 森口晃治, 岡田信宏, 大黒寛典, 加渡幹尚, 土井雅喜, 旦野克典, 関章憲, 佐藤和明, 別所毅, 原田俊太, 宇治原徹

    2016年第63回応用物理学会春季学術講演会  2016.3.19 

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    Venue:東工大大岡山キャンパス  

  617. "強磁場スパッタ法によるマンガン窒化物薄膜の作製" International conference

    松本利希, 川口昂彦, 畑野敬史, 原田俊太, 飯田和昌, 宇治原徹, 生田博志

    2016年第63回応用物理学会春季学術講演会  2016.3.19 

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    Venue:東工大大岡山キャンパス  

  618. "可視光励起光電子分光法を用いた半導体超格子における伝導電子のエネルギー分布測定" International conference

    市橋 史朗, 西谷 健治, 董 鑫宇, 川口 昂彦, 桑原 真人, 原田 俊太, 田川 美穂, 伊藤 孝寛, 宇治原 徹

    2015年 第62回応用物理学会春季学術講演会  2015.3.11  (公社)応用物理学会

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    Venue:東海大学 湘南キャンパス、神奈川県  

  619. "可視光励起光電子分光法を用いたGaPにおけるキャリア散乱の温度依存性評価" International conference

    市橋史朗, 川口昂彦, 董キン宇, 井上明人, 桑原真人, 伊藤孝寛, 原田俊太, 田川美穂, 宇治原徹

    2016年第63回応用物理学会春季学術講演会  2016.3.19 

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    Venue:東工大大岡山キャンパス  

  620. "Ultra high quality SiC crystal grown by solution method"

    T. Ujihara, S. Harada, K. Aoyagi, M. Tagawa, T. Sakai

    11th CMCEE  2015.6.14 

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  621. "Thermal conductivity changes in WO3 films caused by hydrogen intercalation/deintercalation"

    A. Nakamura, K. Aoyagi, S. Harada, M. Tagawa, T. Ujihara

    40th International Conference & Exposition on Advanced Ceramics & Composites(ICACC16)  2016.1.24 

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    Language:English   Presentation type:Poster presentation  

  622. "Temperature Dependence of the Energy Distribution of the Conduction Electrons in GaP Single Crystal"

    Fumiaki Ichihashi, X. Dong, T. Kawaguchi, M. Kuwahara, T. Ito, S. Harada, M. Tagawa, T. Ujihara

    10th International Symposium on Atomic Level Characterizations for New Materials and Devices'15 (ALC '15)  2015.10.25 

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  623. "Solution Growth of AlN Single Crystal on Sapphire using Multi-Component Solvent Designed by Thermodynamic Calculation"

    S. Harada, M. Nagaya, S. Watanabe, M. Chen, Y. Takeuchi, K. Aoyagi, M. Tagawa, T. Ujihara

    2015 International Conference on Solid State Devices and Materials(SSDM2015)  2015.9.27 

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  624. "SiC溶液法における溶媒への金属添加による炭素溶解度変化の熱力学計算" International conference

    畑佐豪記, 原田俊太, 田川美穂, 村山健太, 加藤智久, 宇治原徹

    2016年第63回応用物理学会春季学術講演会  2016.3.19 

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    Venue:東工大大岡山キャンパス  

  625. "SiC溶液成長における貫通転位変換と成長表面のマクロステップの関係" International conference

    原田 俊太, 肖 世玉, 青柳 健大, 村山 健太, 酒井 武信, 田川 美穂, 宇治原 徹

    2015年 第62回応用物理学会春季学術講演会  2015.3.11  (公社)応用物理学会

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    Venue:東海大学 湘南キャンパス、神奈川県  

  626. "SiC溶液成長における基底面転位と表面モフォロジーの関係" International conference

    堀司紗, 村山健太, 原田俊太, 肖世玉, 田川美穂, 宇治原徹

    2016年第63回応用物理学会春季学術講演会  2016.3.19 

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    Venue:東工大大岡山キャンパス  

  627. "Measurement of Energy Distribution of Conduction Electrons in Superlattice by Visible-Light Photoemission Spectroscopy"

    F. Ichihashi, K. Nishitani, X. Dong, T. Kawaguchi, M. Kuwahara, T. Ito, S. Harada, M. Tagawa, T. Ujihara

    42nd IEEE Photovoltaic Specialists Conference  2015.6.14 

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  628. SiC溶液成長における最適条件高速探索手法の提案 International conference

    角岡 洋介, 小久保 信彦, 原田 俊太, 田川 美穂, 宇治原 徹

    2017年第64回応用物理学会春季学術講演会  2017.3.14 

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    Venue:パシフィコ横浜  

  629. 高熱伝導率AlNウィスカーの高効率合成 International conference

    松本昌樹, 陳鳴宇, 永冶仁, 渡邉将太, 竹内幸久, 原田俊太, 田川美穂, 宇治原徹, 遠藤亮

    公益社団法人日本セラミックス協会 2015年 年会  2015.3.18 

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  630. 金属 Li 負極における Cu 集電体の結晶方位と析出形状の関係 International conference

    石川 晃平, 伊藤 靖仁, 原田 俊太, 田川 美穂, 宇治原 徹

    第57回電池討論会  2016.11.29 

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    Venue:幕張メッセ国際会議場  

  631. 酸化タングステンの酸化還元による可逆的熱伝導率制御 International conference

    原田 俊太, 弓削 勇輔, 田川 美穂, 宇治原徹

    2017年第64回応用物理学会春季学術講演会  2017.3.14 

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    Venue:パシフィコ横浜  

  632. 透過電子顕微鏡による窒素添加 SiC 積層欠陥の高温その場観察 International conference

    陳 鵬磊, 原田 俊太, 荒井 重勇, 藤榮 文博, 肖 世玉, 加藤 智久, 田川 美穂, 宇治原 徹

    先進パワー半導体分科会 第3回講演会  2016.11.8 

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    Venue:つくば国際会議場  

  633. 脂質二重膜上におけるDNA被覆金ナノ粒子のセルフアセンブリに対するイオンの効果 International conference

    磯貝卓巳, 赤田英理, 中田咲子, 吉田直矢, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    第65回応用物理学会春季学術講演会  2015.3.11 

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  634. 窒素添加した 4H-SiC における積層欠陥拡張・収縮挙動の高温その場観察 International conference

    藤榮 文博, 原田 俊太, 村山 健太, 花田 賢志, 陳 鵬磊, 田川 美穂, 加藤 智久, 宇治原 徹

    先進パワー半導体分科会 第3回講演会  2016.11.8 

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    Venue:つくば国際会議場  

  635. 溶液成長法二段階成長による SiC 結晶内の欠陥密度の低減 International conference

    村山 健太, 堀 司紗, 原田 俊太, 田川 美穂, 宇治原 徹

    先進パワー半導体分科会 第3回講演会  2016.11.8 

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    Venue:つくば国際会議場  

  636. 溶液成長SiC基板上に作製した酸化膜の評価 International conference

    古庄 智明, 川畑 直之, 古橋 壮之, 渡辺 友勝, 渡邊 寛, 山川 聡, 村山 健太, 原田 俊太, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会  2017.9.5 

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    Venue:福岡国際会議場  

  637. 水素挿入・脱離によるWO3薄膜の熱伝導率制御 International conference

    中村 彩乃, 小林 竜太, 原田 俊太, 田川 美穂, 宇治原 徹

    2017年第64回応用物理学会春季学術講演会  2017.3.14 

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    Venue:パシフィコ横浜  

  638. 機械学習を用いた溶液成長における過飽和度分布の予測 International conference

    角岡 洋介, 小久保 信彦, 原田 俊太, 田川 美穂, 宇治原 徹

    2016年第81回応用物理学会秋季学術講演会  2016.9.13 

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    Venue:朱鷺メッセ  

  639. 機械学習を用いたSiC結晶成長実験条件の最適化 International conference

    村井 良多, 畑佐 豪記, 角岡 洋介, 林 宏益, 村山 健太, 朱 燦, 原田 俊太, 田川 美穂, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会  2017.9.5 

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    Venue:福岡国際会議場  

  640. 後方反射X線トポグラフィによる4H-SiC積層欠陥拡張挙動のその場観察 International conference

    藤榮 文博, 原田 俊太, 村山 健太, 花田 賢志, 陳鵬磊, 加藤 智久, 田川 美穂, 宇治原 徹

    2017年第64回応用物理学会春季学術講演会  2017.3.14 

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    Venue:パシフィコ横浜  

  641. 塩素酸ナトリウム水溶液中の銀ナノ粒子円偏光光学捕捉により誘起されるキラル結晶化におけるキラリティの偏り International conference

    新家 寛正, 杉山 輝樹, 田川 美穂, 村山 健太, 原田 俊太, 宇治原 徹

    日本地球惑星科学連合2016年大会  2016.5.22 

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    Venue:幕張メッセ  

  642. 単結晶Cu集電体を用いた金属Li負極の不均一析出抑制 International conference

    石川 晃平, 原田 俊太, 田川 美穂, 宇治原 徹

    日本金属学会 2017年秋期講演会  2017.9.6 

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    Venue:北海道大学  

  643. 半導体伝導帯構造を明らかにする可視光電子光電子分光法の提案 International conference

    宇治原 徹, 市橋 史朗, 董 キン宇, 井上 明人, 川口 昂彦, 桑原 真人, 伊藤 孝寛, 原田 俊太, 田川 美穂

    2016年真空・表面科学合同講演会 第 36 回表面科学学術講演会 第 57 回真空に関する連合講演会  2016.11.29 

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    Venue:名古屋国際会議場  

  644. “金属絶縁体転移に伴う WO3薄膜の熱伝導率変化” International conference

    中村彩乃, 青柳健大, 原田俊太, 田川美穂, 宇治原徹

    公益社団法人日本セラミックス協会 第 28 回秋季シンポジウム  2015.9.16 

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    Venue:富山県, 富山大学(五福キャンパス)  

  645. “脂質二重膜上のDNA被覆ナノ粒子の2次元配列に及ぼすマグネシウムおよび脂質膜形状の影響” International conference

    磯貝卓巳, 赤田英里, 中田咲子, 吉田直矢, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    第45回結晶成長国内会議(NCCG-45)  2015.10.19 

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    Venue:北海道大学学術交流会館  

  646. “脂質二重膜の性質が膜上のDNA被覆金ナノ粒子に及ぼす影響” International conference

    中田咲子, 赤田英里, 磯貝卓巳, 吉田直矢, 手老龍吾, 原田俊太, 宇治原徹, 田川美穂

    2015年 第76回応用物理学会秋季学術講演会  2015.9.13 

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    Venue:愛知県, 名古屋国際会議場  

  647. “溶液法により成長したn型4H-SiC結晶のキャリア濃度分布の評価” International conference

    王 振江, 川口昂彦, 村山健太, 青柳健大, 原田俊太, 酒井武信, 宇治原徹

    2015年 第76回応用物理学会秋季学術講演会  2015.9.13 

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    Venue:愛知県, 名古屋国際会議場  

  648. “溶媒を用いたAlNウィスカーの直接窒化法における溶媒組成が生成量に与える影響” International conference

    松本昌樹, 渡邉将太, 竹内幸久, 青柳健大, 原田俊太, 田川美穂, 宇治原徹

    第45回結晶成長国内会議(NCCG-45)  2015.10.19 

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    Venue:北海道大学学術交流会館  

  649. “SiC溶液成長における溶媒不純物の取り込み Impurity incorporation during solution growth of SiC” International conference

    原田俊太, 村山健太, 青柳健大, 酒井武信, 田川美穂, 加藤智久, 宇治原徹

    先進パワー半導体分科会 第2回講演会  2015.11.9 

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    Venue:大阪国際交流センター  

  650. “Agナノ粒子を含んだNaClO3溶液からの円偏光レーザー誘起キラル結晶化におけるエナンチオ選択的増幅” International conference

    新家寛正, 杉山輝樹, 田川美穂, 村山健太, 原田俊太, 丸山美帆子, 森 勇介, 宇治原徹

    2015年 第76回応用物理学会秋季学術講演会  2015.9.13 

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    Venue:愛知県, 名古屋国際会議場  

  651. “Agナノ粒子の光学捕捉により誘起されるNaClO3キラル結晶化過程その場観察” International conference

    新家寛正, 杉山輝樹, 丸山美帆子, 田川美穂, 村山健太, 原田俊太, 宇治原徹, 森勇介

    第45回結晶成長国内会議(NCCG-45)  2015.10.19 

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    Venue:北海道大学学術交流会館  

  652. “4H-SiC溶液成長法Si面厚膜成長による貫通転位密度の低減 Growth of thick 4H-SiC crystal on Si face to reduce threading dislocation density by solution growth” International conference

    村山健太, 堀司紗, 原田俊太, 肖世玉, 青柳健大, 酒井武信, 田川美穂, 宇治原徹

    先進パワー半導体分科会 第2回講演会  2015.11.9 

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    Venue:大阪国際交流センター  

  653. “4H-SiC溶液成長法Si面厚膜化による低転位密度結晶成長の実現” International conference

    村山健太, 原田俊太, 肖世玉, 堀司紗, 青柳健大, 酒井武信, 田川美穂, 宇治原徹

    第45回結晶成長国内会議(NCCG-45)  2015.10.19 

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    Venue:北海道大学学術交流会館  

  654. “4H-SiCのSi面溶液成長における温度分布制御による異種多形混入の抑制” International conference

    堀司紗, 村山健太, 肖世玉, 青柳健大, 原田俊太, 酒井武信, 田川美穂, 宇治原徹

    第45回結晶成長国内会議(NCCG-45)  2015.10.19 

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    Venue:北海道大学学術交流会館  

  655. “2種のDNAを被覆したナノ粒子の構造体の粒子間距離分布” International conference

    吉田直矢, 赤田絵里, 磯貝卓巳, 中田咲子, 原田俊太, 宇治原徹, 田川美穂

    2015年 第76回応用物理学会秋季学術講演会  2015.9.13 

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    Venue:愛知県, 名古屋国際会議場  

  656. X線透過法による SiC 溶液成長の溶液流れと溶液形状のその場観察 International conference

    酒井 武信, 加渡 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    先進パワー半導体分科会 第3回講演会  2016.11.8 

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    Venue:つくば国際会議場  

  657. X線透過法により溶液形状制御したSiC溶液成長 International conference

    酒井 武信, 加渡 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    2017年第64回応用物理学会春季学術講演会  2017.3.14 

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    Venue:パシフィコ横浜  

  658. X線その場観察によりメニスカス高さ制御したSiC溶液成長 International conference

    酒井 武信, 秋田 光俊, 加度 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会  2017.9.5 

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    Venue:福岡国際会議場  

  659. X 線透過法による溶液法 SiC 結晶成長の溶液表面形状の経時変化の観察 International conference

    酒井 武信, 加渡 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    2016年第80回応用物理学会秋季学術講演会  2016.9.13 

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    Venue:朱鷺メッセ  

  660. X 線透過法による溶液法 SiC 結晶成長のその場観察 International conference

    酒井 武信, 加渡 幹尚, 大黒 寛典, 原田 俊太, 宇治原 徹

    2016年第79回応用物理学会秋季学術講演会  2016.9.13 

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    Venue:朱鷺メッセ  

  661. Ultra high quality SiC crystal grown by solution method

    T. Ujihara, S. Harada, K. Aoyagi, M. Tagawa, T. Sakai

    CMCEE 2015  2015.6.14 

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  662. Two-step growth of SiC solution growth for reduction of dislocations

    K. Murayama, T. Hori, S. Harada, S. Xiao, M.Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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  663. Trial of Process Informatics in SiC Solution Growth

    T. Ujihara, S. Harada, Y. Tsunooka, N. Kokubo, K. Murayama, R. Murai, M. Tagawa

    The 3rd International Conference on Universal Village (UV 2016)  2016.10.6 

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    Language:English   Presentation type:Oral presentation (invited, special)  

  664. Threading Screw Dislocation Conversion by Macrosteps during SiC Solution Growth for High-quality Crystals

    S. Harada, K. Murayama, S. Xiao, F. Fujie, T.Sakai, M. Tagawa, T. Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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    Language:English   Presentation type:Oral presentation (general)  

  665. The realization of high-quality 4H-SiC C-face grown crystals by controlling the macrosteps formation during solution growth

    S. Y. Xiao, S. Harada, P. L. Chen, K. Murayama, T.Ujihara

    the 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)  2016.8.7 

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    Language:English   Presentation type:Oral presentation (invited, special)  

  666. Synthesis of polycrystalline AlN with high thickness by an efficient method International conference

    Pradip Ghosh, Kohei Mizuno, Makoto Hayashi, Yukihisa Takeuchi, Yuichi Aoki, Susumu Sobue, Yasuo Kitou, Jun Hasegawa, Makoto Kobashi, Toru Ujihara

    2015.3.18 

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    Language:English   Presentation type:Poster presentation  

  667. Solvent design for high-purity SiC solution growth

    S. Harada, G. Hatasa, K. Murayama, T. Kato, M. Tagawa, T. Ujihara

    The 11th European Conference on Silicon Carbide and Related Materials (ECSCRM)  2016.9.25 

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    Language:English   Presentation type:Poster presentation  

  668. SiC溶液法C面成長における貫通らせん転位の低減 International conference

    劉 欣博, 原田 俊太, 村山 健太, 村井 良多, 肖 世玉, 田川 美穂, 宇治原 徹

    2017年第78回応用物理学会秋季学術講演会  2017.9.5 

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場  

  669. SiC溶液成長における貫通転位変換と成長表面のマクロステップの関係 International conference

    原田俊太, 肖世玉, 青柳健大, 村山健太, 酒井武信, 田川美穂, 宇治原徹

    第63回応用物理学会春季学術講演会  2015.3.11 

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    Language:Japanese   Presentation type:Oral presentation (general)  

  670. SiC溶液成長における機械学習を用いた閉鎖空間の溶液温度・流速分布の予 International conference

    畑佐 豪記, 角岡 洋介, 村山 健太, 村井 良太, 原田 俊太, 田川 美穂, 宇治原 徹

    第40回結晶成長討論会  2017.8.30 

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    Language:Japanese   Presentation type:Poster presentation  

    Venue:浜名湖ロイヤルホテル  

  671. SiC 溶液成長法における溶媒中の Cr 組成に対する 成長ポリタイプの面内分布及び相対存在割合の評価 International conference

    鈴木皓己, 高橋大, 土本直道, 玄光龍, 太子敏則, 村山健太, 原田俊太, 宇治原徹

    先進パワー半導体分科会 第4回講演会  2017.11.1 

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    Language:Japanese   Presentation type:Poster presentation  

    Venue:名古屋国際会議場  

  672. Automatic Detection of Dislocation contrasts in Birefringence Image of SiC Wafers Using Variance Filter Method

    Shunta Harada

    SSDM2020  2020.9.29 

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    Language:English   Presentation type:Oral presentation (general)  

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Research Project for Joint Research, Competitive Funding, etc. 17

  1. 強化学習を利用した素形材製造プロセスの自動化

    2021.4 - 2022.3

    永井素形材融合分野奨励金 

  2. SiC積層欠陥制御によるパワーデバイス特性劣化の抑制

    2019.4 - 2020.3

    研究助成金 

      More details

    Grant type:Competitive

  3. 酸化物結晶の周期構造制御による熱伝導制御材料の創製

    2018.9 - 2019.8

    研究助成 

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    Grant type:Competitive

  4. 自然超格子の構造変化を利用した熱伝導制御材料の創製

    2018.4 - 2019.3

    研究助成 

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    Grant type:Competitive

  5. 偏光顕微鏡観察と深層学習によるSiC結晶中の転位の自動識別

    2017.12 - 2018.12

    研究助成金 

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    Grant type:Competitive

  6. 機械学習による複屈折像における結晶欠陥の自動識別

    2017.6 - 2018.6

    研究助成金 

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    Grant type:Competitive

  7. 複屈折イメージングによる窒化ガリウム結晶中の転位の自動識別

    2017.4 - 2018.3

    研究助成金 

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    Grant type:Competitive

  8. ナノ構造制御による熱スイッチング材料の創製

    2016.1 - 2016.12

    研究助成金 

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    Grant type:Competitive

  9. 多元系溶媒を用いたSiC溶液成長における活量比による多形制御

    2016.1

    出版助成 

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    Grant type:Competitive

  10. 溶液成長過程における貫通転位変換現象の弾性論的考察

    2015.10

    海外派遣援助 

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    Grant type:Competitive

  11. 積層欠陥を利用したバルク二次元伝導熱電半導体の実現

    2015.1 - 2015.12

    研究助成金 

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    Grant type:Competitive

  12. 溶液成長過程におけるらせん転位変換による高品質結晶成長メカニズム

    2014.8

    海外派遣援助 

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    Grant type:Competitive

  13. シリコンカーバイト溶液成長における欠陥変換挙動

    2013.8

    海外派遣援助 

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    Grant type:Competitive

  14. 厚膜化によるらせん転位フリーSiC結晶成長

    2012.12 - 2013.7

    研究成果最適展開支援プログラム(A-STEP) 

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    Grant type:Competitive

  15. 微傾斜種結晶を用いた高品質SiC溶液成長

    2012.4 - 2013.3

    研究助成金 

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    Grant type:Competitive

  16. 積層欠陥を用いたバルク量子井戸型熱電半導体の作製

    2012.4 - 2013.3

    研究助成金 

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    Grant type:Competitive

  17. SiCパワーデバイスにおける通電劣化抑制法の開発

    研究助成金 

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KAKENHI (Grants-in-Aid for Scientific Research) 18

  1. 熱フォノンのアンダーソン局在を利用した極限熱絶縁材料の設計

    Grant number:24K01195  2024.4 - 2027.3

    科学研究費助成事業  基盤研究(B)

    原田 俊太

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    Authorship:Principal investigator 

    Grant amount:\18460000 ( Direct Cost: \14200000 、 Indirect Cost:\4260000 )

  2. Complex crystal growth modeling and process design in latent space

    Grant number:22H00300  2022.4 - 2025.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

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    Authorship:Coinvestigator(s) 

  3. Visualization of light elements by STEM imaging with Bayesian super-resolution

    Grant number:21K18819  2021.7 - 2023.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Challenging Research (Exploratory)

    Harada Shunta

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    Authorship:Principal investigator 

    Grant amount:\6500000 ( Direct Cost: \5000000 、 Indirect Cost:\1500000 )

    This research attempted to visualize light element atoms using HAADF-STEM methodology with Bayesian super-resolution, but due to the constraints of observation samples, the ideal results could not be achieved. However, successful visualization of oxygen atoms through integration has shown new possibilities as a visualization method for light element atoms. In terms of super-resolution of EELS data, the research succeeded in reconstructing a 0.01 eV/ch spectrum from multiple 0.1 eV/ch spectra and successfully achieved high-resolution reconstruction of Ti core-loss spectra. These results confirm that Bayesian super-resolution is a potent method for generating high-resolution spectral data. While the application of Bayesian super-resolution to HAADF-STEM images could not be realized in this research, the successes in visualization and application to EELS data illuminate the potential for future studies and advances in the field.

  4. 深層視覚運動学習による単結晶育成自動化の方法論の確立とその実証

    Grant number:21H01681  2021.4 - 2024.3

    原田 俊太

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    Authorship:Principal investigator 

    Grant amount:\18070000 ( Direct Cost: \13900000 、 Indirect Cost:\4170000 )

  5. 強化学習を利用した素形材製造プロセスの自動化

    2021.4 - 2022.3

    永井科学技術財団  永井素形材融合分野奨励金 

  6. Thermal switching device based on thermal properties change by intercalation

    Grant number:20K21081  2020.7 - 2022.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Challenging Research (Exploratory)

    Ujihara Toru

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    Authorship:Coinvestigator(s) 

    We are attempting to develop "thermal switch materials" that can reversibly change adiabatic and high thermal conductive states by electrochemical insertion and desorption of ions into and out of the crystal structure.
    We are attempting to develop "thermal switch materials" that can reversibly change between adiabatic and high thermal conductive states by electrochemical insertion and desorption of ions into the crystal structure. In our previous studies, we found that in the case of hydrogen insertion into amorphous WO3 thin films (HxWO3), the thermal conductivity decreases with H insertion in the range x = 0 ~ 0.32, but at x = 0.32, the thermal conductivity increases significantly, and at x > 0.32, the thermal conductivity decreases with H insertion.
    The thermal conductivity of (HxWO3) decreases with H insertion in the range x=0,0.32, but increases significantly for x = 0.32, and then decreases again for x>0.32. This complex change in thermal conductivity is caused by the H insertion.

  7. SiC積層欠陥制御によるパワーデバイス特性劣化の抑制

    2019.4 - 2020.3

    2. 池谷科学技術振興財団  研究助成金 

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    Grant type:Competitive

  8. 酸化物結晶の周期構造制御による熱伝導制御材料の創製

    2018.9 - 2019.8

    豊秋奨学会  研究助成 

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    Grant type:Competitive

  9. Method of Crystal Growth Informatics

    Grant number:18H03839  2018.4 - 2021.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

    Ujihara Toru

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    Materials development is said to take more than 20 years. The majority of this time is for process development. The ultimate objective of this research is to overwhelmingly increase the speed of process development using informatics technologies such as machine learning. We have achieved overwhelmingly high-quality SiC crystals using the solution-growth method. The next step is to increase the diameter of SiC crystals. The macrostep structure formed on the crystal growth surface is the key to achieve high quality. In this study, we first constructed a multi-physics simulation that reflects the relationship between macroscopic in-solution flow and macrostep structure. Next, by combining machine learning, we constructed a method to represent the surface structure in latent space.

  10. Materials science of multi-morphism in oxides and singular structural properties

    Grant number:18H01733  2018.4 - 2021.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (B)

    Harada Shunta

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    Authorship:Principal investigator  Grant type:Competitive

    Grant amount:\17550000 ( Direct Cost: \13500000 、 Indirect Cost:\4050000 )

    Among transition metal oxides having a plurality of valences, there is a group of substances exhibiting a multimorph, which structurally alleviates changes in the amount of oxygen and continuously changes the crystal structure depending on the composition. In this study, we focused on oxides containing periodic arrangements of surface defects called crystallographic shear structure, and established a method to control the periodic arrangement of nanoscale surface defects with picoscale accuracy by changing the amount of oxygen. .. In addition, the peculiar structural properties expressed by the nanoscale periodic structure contained in the bulk crystal were clarified. Specifically, the thermal conductivity does not change monotonically with respect to the density of surface defects and has a minimum value, which is a result of capturing the wave-like aspect of heat conduction.

  11. Active control of stacking fault in bulk SiC crystal

    Grant number:17H05331  2017.4 - 2019.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research on Innovative Areas (Research in a proposed research area)

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    Authorship:Principal investigator  Grant type:Competitive

    Grant amount:\4030000 ( Direct Cost: \3100000 、 Indirect Cost:\930000 )

  12. In-situ observation of threading dislocation conversion in high-quality SiC growth

    Grant number:26246019  2014.4 - 2017.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

    Ujihara Toru

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    Authorship:Coinvestigator(s) 

    Silicon carbide technology which can overcome the performance of silicon power devices is being developed in the world. However, many types of defect (threading dislocations, stacking faults, basal-plane dislocations) still remain in commercial SiC wafers. Thus, the reduction of them is a key to increase its reliability and performance. In this study, we developed new system for in-situ observation of growth surface and in-situ X-ray topography and evaluated the behaviors of defetcs in SiC at high temperatures.

  13. High-quality and Low-resistant SiC crystal

    Grant number:25249034  2013.4 - 2017.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

    Kamei Kazuhito

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    Authorship:Coinvestigator(s) 

    SiC is expected to be a semiconductor material for next-generation power devices. Reducing a electrical loss, it is necessary to decrease the electrical resistivity of semiconductor materials. In SiC, a doping impurities are nitrogen for n-type and aluminum for p-type. However, highly doping in SiC induces stacking faults. In this study, we developed the doping control in SiC solution growth which is a good method for high-quality SiC crystal. We estimated a modulate doping concentration avoiding the induction stacking faults. And, we made clear the mechanism of doping of nitrogen.

  14. Realization of quantum well structure in bulk thermoelectric semiconductor by control of the formation of stacking fault in SiC

    Grant number:24686078  2012.4 - 2015.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Young Scientists (A)

    HARADA Shunta

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    Authorship:Principal investigator  Grant type:Competitive

    Grant amount:\26000000 ( Direct Cost: \20000000 、 Indirect Cost:\6000000 )

    Thermoelectric materials which convert heat energy to electric energy attract great attention due to the efficient use of limited energy sources. Recently, Drastic improvement in the thermoelectric properties were expected by the quantum well structures. In the present study, by controlling the stacking fault formation in SiC crystal, we attempted to form the quantum well structure in the bulk semiconductors.
    By the addition of nitrogen in SiC, cubic-type stacking faults are introduced to the hexagonal SiC crystal. The stacking fault would be quantum-well because the band-gap energy of cubic SiC is smaller than that of hexagonal SiC.

  15. 溶液成長法によるSiC結晶の欠陥自己修復メカニズムの解明

    2011.9 - 2012.3

    日本学術振興会  科学研究費助成事業  若手研究(スタートアップ)

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    Grant type:Competitive

  16. 溶液成長法によるSiC結晶の欠陥自己修復メカニズムの解明

    Grant number:23860025  2011.8 - 2013.3

    日本学術振興会  科学研究費助成事業  研究活動スタート支援

    原田 俊太

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    Authorship:Principal investigator 

    Grant amount:\3250000 ( Direct Cost: \2500000 、 Indirect Cost:\750000 )

    低損失、高耐圧のSiCパワーデバイス実現の『カギ』を握るのが、SiC単結晶の高品質化である。現在、市販されているSiC単結晶には、高密度の欠陥が含まれている。特に貫通らせん転位(TSD)は、電流のリーク源となり、デバイス特性、信頼性の大幅な低下をもたらす事が知られている。本研究では、溶液成長法における、貫通らせん転位の低減に関する研究を実施した。
    本年度は、溶液法によって成長したSiC結晶中の欠陥のキャラクタリゼーションおよび、欠陥低減メカニズムに関する研究を実施した。
    X線トポグラフィー法および、透過電子顕微鏡法を複合的に用いて、SiC結晶中の欠陥評価を行った結果、溶液成長中に貫通らせん転位が基底面の欠陥に変換していることが明らかとなった。また、貫通らせん転位は、積層欠陥をはさんで複数の部分転位に分解していた。
    表面モフォロジーと貫通らせん転位の変換率を比較すると、ステップバンチングによって生じたマクロステップのステップフロー成長によって、効果的に貫通らせん転位が変換することが明らかとなった。また、微傾斜を設けた種結晶を用いて、ステップフロー成長をエンハンスすることによって、貫通らせん転位の変換率を飛躍的に向上させることに成功した。さらに、種結晶の傾斜角度を変化させることによって、貫通らせん転位の変換率を99%以上にまで向上させ、溶液成長法による、貫通らせん転位フリーの、高品質SiC結晶成長の可能性を示した。

  17. Realization of non-dislocation SiC crystal

    Grant number:23246004  2011.4 - 2014.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (A)

    UJIHARA Toru, HARADA Shunta, SASAKI Katsuhiro, KATO Masashi

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    The improvement of substrate quality is important to apply SiC materials to high-performance power device. The purpose of this study is to achieve "ultra-high quality" crystal grown by solution growth method. In our research, it has been revealed that threading dislocations are converted to other defects in the basal planes by macrosteps advancing and the converted defects are swept from the crystal during growth process. In addition, the converted ratio depends on the height and microstructure of the macrosteps. Utilizing this conversion phenomenon, we have demonstrated the ultra-high quality growth of SiC.

  18. SiCパワーデバイスにおける通電劣化抑制法の開発

    日本板硝子材料工学助成会  研究助成金 

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Industrial property rights 62

  1. 熱流体状態演算装置

    原田 俊太, ▲高▼石 将輝, 小山 幸典, 宇治原 徹

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    Applicant:国立大学法人東海国立大学機構

    Application no:JP2020032026  Date applied:2020.8

    Patent/Registration no:特許第7162937号  Date registered:2022.10 

    J-GLOBAL

  2. 結晶欠陥評価方法及び結晶欠陥評価装置

    原田 俊太, 村山 健太, 上田 将之, 河田 旺, 炭谷 翔悟

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    Applicant:国立大学法人東海国立大学機構

    Application no:特願2020-053096  Date applied:2020.3

    Announcement no:特開2021-153128  Date announced:2021.9

    J-GLOBAL

  3. 結晶成長条件の決定方法

    朱 燦, 遠藤 友樹, 原田 俊太, 宇治原 徹

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    Applicant:国立大学法人名古屋大学

    Application no:特願2018-161654  Date applied:2018.8

    Announcement no:特開2020-033231  Date announced:2020.3

    Patent/Registration no:特許第7162874号  Date registered:2022.10 

    J-GLOBAL

  4. 結晶成長条件の決定方法

    朱 燦, 遠藤 友樹, 原田 俊太, 宇治原 徹

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    Applicant:国立大学法人名古屋大学

    Application no:特願2018-161654  Date applied:2018.8

    Announcement no:特開2020-033231  Date announced:2020.3

    J-GLOBAL

  5. 炭化珪素基板、炭化珪素基板の製造方法、および炭化珪素半導体装置の製造方法

    古庄 智明, 田中 貴規, 黒岩 丈晴, 宇治原 徹, 原田 俊太, 村山 健太

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    Applicant:三菱電機株式会社

    Application no:特願2019-508768  Date applied:2018.2

    Patent/Registration no:特許第6685469号  Date registered:2020.4 

    J-GLOBAL

  6. 炭化珪素基板、炭化珪素基板の製造方法、および炭化珪素半導体装置の製造方法

    古庄 智明, 田中 貴規, 黒岩 丈晴, 宇治原 徹, 原田 俊太, 村山 健太

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    Applicant:三菱電機株式会社

    Application no:JP2018005948  Date applied:2018.2

    Publication no:WO2018-180013  Date published:2018.10

    J-GLOBAL

  7. 炭化ケイ素単結晶の製造方法

    原田 俊太, 宇治原 徹, 畑佐 豪記, 村山 健太

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    Applicant:国立大学法人東海国立大学機構

    Application no:特願2017-140932  Date applied:2017.7

    Announcement no:特開2019-019037  Date announced:2019.2

    Patent/Registration no:特許第6968408号  Date registered:2021.10 

    J-GLOBAL

  8. 炭化ケイ素単結晶の製造方法

    原田 俊太, 宇治原 徹, 畑佐 豪記, 村山 健太

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    Applicant:国立大学法人名古屋大学

    Application no:特願2017-140932  Date applied:2017.7

    Announcement no:特開2019-019037  Date announced:2019.2

    J-GLOBAL

  9. SiC単結晶

    宇治原 徹, 原田 俊太, 村山 健太

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    Applicant:国立大学法人名古屋大学

    Application no:特願2015-193859  Date applied:2015.9

    Announcement no:特開2017-065977  Date announced:2017.4

    J-GLOBAL

  10. 熱伝導率可変デバイス

    宇治原 徹, 中村 彩乃, 原田 俊太, 青柳 健大

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    Applicant:国立大学法人名古屋大学

    Application no:特願2015-106378  Date applied:2015.5

    Announcement no:特開2016-216688  Date announced:2016.12

    Patent/Registration no:特許第6671716号  Date registered:2020.3 

    J-GLOBAL

  11. 熱伝導率可変デバイス

    宇治原 徹, 中村 彩乃, 原田 俊太, 青柳 健大

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    Applicant:国立大学法人名古屋大学

    Application no:特願2015-106378  Date applied:2015.5

    Announcement no:特開2016-216688  Date announced:2016.12

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  12. 炭化ケイ素の結晶の製造方法及び結晶製造装置

    宇治原徹, 原田俊太, 古池大輝, 梅崎智典

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    Applicant:国立大学法人名古屋大学,セントラル硝子

    Application no:2014-184978  Date applied:2014.9

    Announcement no:2016-056071  Date announced:2016.4

    Country of applicant:Domestic  

  13. 炭化ケイ素の結晶の製造方法及び結晶製造装置

    宇治原徹,原田俊太,古池大輝,梅崎智典

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    Applicant:国立大学法人名古屋大学,セントラル硝子

    Application no:2014-184978  Date applied:2014.9

    Announcement no:2016-056071  Date announced:2016.4

    Country of applicant:Domestic  

  14. 炭化ケイ素の結晶の製造方法及び結晶製造装置

    宇治原 徹, 原田 俊太, 古池 大輝, 梅崎 智典

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    Applicant:国立大学法人名古屋大学

    Application no:特願2014-184978  Date applied:2014.9

    Announcement no:特開2016-056071  Date announced:2016.4

    Patent/Registration no:特許第6259740号  Date registered:2017.12 

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  15. 炭化ケイ素の結晶の製造方法及び結晶製造装置

    宇治原 徹, 原田 俊太, 古池 大輝, 梅崎 智典

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    Applicant:国立大学法人名古屋大学

    Application no:特願2014-184978  Date applied:2014.9

    Announcement no:特開2016-056071  Date announced:2016.4

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  16. 太陽光で励起された電子のエネルギーの測定方法と測定装置

    宇治原徹, 桑原真人, 原田俊太, 志村大樹, 市橋史朗

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    Applicant:国立大学法人名古屋大学

    Application no:2014-554458  Date applied:2013.12

    Patent/Registration no:特許第5991556号  Date registered:2016.8  Date issued:2016.8

    Country of applicant:Domestic  

    J-GLOBAL

  17. 太陽光で励起された電子のエネルギーの測定方法と測定装置

    宇治原徹,桑原真人,原田俊太,志村大樹,市橋史朗

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    Applicant:国立大学法人名古屋大学

    Application no:2014-554458  Date applied:2013.12

    Patent/Registration no:特許第5991556号  Date registered:2016.8 

    Country of applicant:Domestic  

  18. 太陽光で励起された電子のエネルギーの測定方法と測定装置

    宇治原 徹, 市橋 史朗, 志村 大樹, 桑原 真人, 原田 俊太

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    Applicant:国立大学法人名古屋大学

    Application no:特願2014-554458  Date applied:2013.12

    Patent/Registration no:特許第5991556号  Date registered:2016.8 

    J-GLOBAL

  19. 太陽光で励起された電子のエネルギーの測定方法と測定装置

    宇治原 徹, 市橋 史朗, 志村 大樹, 桑原 真人, 原田 俊太

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    Applicant:国立大学法人名古屋大学

    Application no:JP2013084497  Date applied:2013.12

    Publication no:WO2014-104022  Date published:2014.7

    J-GLOBAL

  20. 3C-SiC単結晶およびその製造方法

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:名古屋大学

    Application no:PCT/JP2013/005016  Date applied:2013.8

    Announcement no:WO 2014/034080 

    Country of applicant:Foreign country  

  21. 3C-SiC単結晶およびその製造方法

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:名古屋大学

    Application no:2014-532782  Date applied:2013.8

    Publication no:WO2014-034080  Date published:2014.3

    Country of applicant:Domestic  

    J-GLOBAL

  22. 結晶製造装置、SiC単結晶の製造方法およびSiC単結晶

    宇治原 徹, 原田 俊太, 関 和明, 朱 燦, 長岡 美津也

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    Applicant:名古屋大学

    Application no:PCT/JP2013/005017  Date applied:2013.8

    Announcement no:WO 2014/034081 

    Country of applicant:Foreign country  

  23. 結晶製造装置、SiC単結晶の製造方法およびSiC単結晶

    宇治原 徹, 原田 俊太, 関 和明, 朱 燦, 長岡 美津也

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    Applicant:名古屋大学

    Application no:14/630,607  Date applied:2013.8

    Country of applicant:Foreign country  

  24. 結晶製造装置、SiC単結晶の製造方法およびSiC単結晶

    宇治原 徹, 原田 俊太, 関 和明, 朱 燦, 長岡 美津也

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    Applicant:名古屋大学

    Application no:13832154.2  Date applied:2013.8

    Announcement no:2889397 

    Country of applicant:Foreign country  

  25. 結晶製造装置、SiC単結晶の製造方法およびSiC単結晶

    宇治原 徹, 原田 俊太, 関 和明, 朱 燦, 長岡 美津也

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    Applicant:名古屋大学

    Application no:PCT/JP2013/005017  Date applied:2013.8

    Announcement no:WO 2014/034081 

    Country of applicant:Foreign country  

  26. 結晶製造装置、SiC単結晶の製造方法およびSiC単結晶

    宇治原 徹, 原田 俊太, 関 和明, 朱 燦, 長岡 美津也

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    Applicant:名古屋大学

    Application no:14/630,607  Date applied:2013.8

    Country of applicant:Foreign country  

  27. 結晶製造装置、SiC単結晶の製造方法およびSiC単結晶

    宇治原 徹, 原田 俊太, 関 和明, 朱 燦, 長岡 美津也

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    Applicant:名古屋大学

    Application no:13832154.2  Date applied:2013.8

    Announcement no:2889397 

    Country of applicant:Foreign country  

  28. 3C-SiC単結晶およびその製造方法

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:名古屋大学

    Application no:PCT/JP2013/005016  Date applied:2013.8

    Announcement no:WO 2014/034080 

    Country of applicant:Foreign country  

  29. 3C-SiC単結晶およびその製造方法

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:名古屋大学

    Application no:2014-532782  Date applied:2013.8

    Country of applicant:Domestic  

  30. 3C-SiC単結晶およびその製造方法

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:国立大学法人名古屋大学

    Application no:JP2013005016  Date applied:2013.8

    Publication no:WO2014-034080  Date published:2014.3

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  31. 3C-SiC単結晶およびその製造方法

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:国立大学法人名古屋大学

    Application no:特願2014-532782  Date applied:2013.8

    Patent/Registration no:特許第6296394号  Date registered:2018.3 

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  32. SiC結晶の結晶成長方法およびSiC結晶基板

    柴田顕次, 市川慎一郎, 宇治原徹, 原田俊太, 関和明

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    Applicant:株式会社豊田自動織機

    Application no:TW101147322  Date applied:2012.12

    Announcement no:WO2013/088948  Date announced:2013.6

    Patent/Registration no:特許第5829508号  Date registered:2015.10 

    Country of applicant:Foreign country  

    J-GLOBAL

  33. SiC結晶の成長方法

    柴田顕次、市川慎一郎、宇治原徹、原田俊太、関和明

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    Applicant:株式会社豊田自動織機

    Application no:TW101147316  Date applied:2012.12

    Announcement no:WO2013/088947 

    Country of applicant:Foreign country  

  34. SiC結晶の結晶成長方法およびSiC結晶基板

    柴田顕次、市川慎一郎、宇治原徹、原田俊太、関和明

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    Applicant:株式会社豊田自動織機

    Application no:TW101147322  Date applied:2012.12

    Announcement no:WO2013/088948 

    Country of applicant:Foreign country  

  35. SiC結晶の成長方法

    柴田顕次, 市川慎一郎, 宇治原徹, 原田俊太, 関和明

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    Applicant:株式会社豊田自動織機

    Application no:TW101147316  Date applied:2012.12

    Announcement no:WO2013/088947 

    Country of applicant:Foreign country  

  36. SiC単結晶の製造方法

    宇治原徹, 原田俊太, 朱燦

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    Applicant:国立大学法人名古屋大学

    Application no:2012-185975  Date applied:2012.8

    Announcement no:2014-043369  Date announced:2014.3

    Patent/Registration no:特許第6069758号  Date registered:2017.1  Date issued:2017.1

    Country of applicant:Domestic  

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  37. SiC単結晶の製造方法

    宇治原徹, 原田俊太, 関和明

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    Applicant:名古屋大学

    Application no:2012-185974  Date applied:2012.8

    Announcement no:2014-043368  Date announced:2014.3

    Patent/Registration no:特許第6069757号  Date registered:2017.1  Date issued:2017.1

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  38. 結晶製造装置

    宇治原徹, 原田俊太, 朱燦, 長岡美津也

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    Applicant:日新技研株式会社、名古屋大学

    Application no:2012-185971  Date applied:2012.8

    Announcement no:2014-043366  Date announced:2014.3

    Patent/Registration no:特許第6122265号  Date registered:2017.4  Date issued:2017.4

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  39. SiC単結晶の製造方法

    宇治原徹,原田俊太,朱燦

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    Applicant:国立大学法人名古屋大学

    Application no:2012-185975  Date applied:2012.8

    Announcement no:2014-043369  Date announced:2014.3

    Patent/Registration no:特許第6069758号  Date registered:2017.1 

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  40. SiC単結晶の製造方法

    宇治原徹,原田俊太,朱燦

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    Applicant:国立大学法人名古屋大学

    Application no:2012-185973  Date applied:2012.8

    Announcement no:2014-043367  Date announced:2014.3

    Patent/Registration no:特許第5975482号  Date registered:2016.7 

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  41. 結晶製造装置

    宇治原 徹, 原田 俊太, 朱 燦, 長岡 美津也

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    Applicant:国立大学法人名古屋大学

    Application no:特願2012-185971  Date applied:2012.8

    Announcement no:特開2014-043366  Date announced:2014.3

    Patent/Registration no:特許第6122265号  Date registered:2017.4 

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  42. SiC単結晶の製造方法およびSiC単結晶

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:国立大学法人名古屋大学

    Application no:特願2012-185975  Date applied:2012.8

    Announcement no:特開2014-043369  Date announced:2014.3

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  43. SiC単結晶の製造方法およびSiC単結晶

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:国立大学法人名古屋大学

    Application no:特願2012-185974  Date applied:2012.8

    Announcement no:特開2014-043368  Date announced:2014.3

    J-GLOBAL

  44. SiC単結晶の製造方法

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:国立大学法人名古屋大学

    Application no:特願2012-185975  Date applied:2012.8

    Announcement no:特開2014-043369  Date announced:2014.3

    Patent/Registration no:特許第6069758号  Date registered:2017.1 

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  45. SiC単結晶の製造方法

    宇治原 徹, 原田 俊太, 朱 燦

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    Applicant:国立大学法人名古屋大学

    Application no:特願2012-185973  Date applied:2012.8

    Announcement no:特開2014-043367  Date announced:2014.3

    Patent/Registration no:特許第5975482号  Date registered:2016.7 

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  46. SiC単結晶の製造方法

    宇治原 徹, 原田 俊太, 関 和明

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    Applicant:国立大学法人名古屋大学

    Application no:特願2012-185974  Date applied:2012.8

    Announcement no:特開2014-043368  Date announced:2014.3

    Patent/Registration no:特許第6069757号  Date registered:2017.1 

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  47. SiC単結晶の製造方法

    宇治原 徹, 原田 俊太, 朱 燦

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    Applicant:国立大学法人名古屋大学

    Application no:特願2012-185973  Date applied:2012.8

    Announcement no:特開2014-043367  Date announced:2014.3

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  48. 結晶製造装置

    宇治原 徹, 原田 俊太, 朱 燦, 長岡 美津也

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    Applicant:国立大学法人名古屋大学

    Application no:特願2012-185971  Date applied:2012.8

    Announcement no:特開2014-043366  Date announced:2014.3

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  49. SiC結晶の成長方法およびSiC結晶の製造装置

    宇治原徹, 原田俊太, 関和明, 柴田顕次, 市川慎一郎, 今岡功

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    Applicant:豊田自動織機,国立大学法人名古屋大学

    Application no:2011-275588  Date applied:2011.12

    Announcement no:2013-124214  Date announced:2013.6

    Patent/Registration no:特許第5936344号  Date registered:2016.5  Date issued:2016.5

    Country of applicant:Domestic  

    J-GLOBAL

  50. SiC結晶の成長方法、SiC結晶の製造装置、および結晶基板

    宇治原徹, 原田俊太, 関和明, 柴田顕次, 市川慎一郎

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    Applicant:豊田自動織機,国立大学法人名古屋大学

    Application no:2011-275587  Date applied:2011.12

    Announcement no:2013-124213  Date announced:2013.6

    Patent/Registration no:特許第5936343号  Date registered:2016.5  Date issued:2016.5

    Country of applicant:Domestic  

    J-GLOBAL

  51. SiC結晶の成長方法およびSiC結晶の製造装置

    宇治原徹,原田俊太,関和明,柴田顕次,市川慎一郎,今岡功

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    Applicant:豊田自動織機,国立大学法人名古屋大学

    Application no:2011-275588  Date applied:2011.12

    Announcement no:2013-124214  Date announced:2013.6

    Patent/Registration no:特許第5936344号  Date registered:2016.5 

    Country of applicant:Domestic  

  52. SiC結晶の成長方法、SiC結晶の製造装置、および結晶基板

    宇治原徹,原田俊太,関和明,柴田顕次,市川慎一郎

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    Applicant:豊田自動織機,国立大学法人名古屋大学

    Application no:2011-275587  Date applied:2011.12

    Announcement no:2013-124213  Date announced:2013.6

    Patent/Registration no:特許第5936343号  Date registered:2016.5 

    Country of applicant:Domestic  

  53. SiC結晶の成長方法

    柴田 顕次, 市川 慎一郎, 宇治原 徹, 原田 俊太, 関 和明

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    Applicant:株式会社豊田自動織機

    Application no:特願2011-275587  Date applied:2011.12

    Announcement no:特開2013-124213  Date announced:2013.6

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  54. SiC結晶の成長方法およびSiC結晶の製造装置

    柴田 顕次, 市川 慎一郎, 今岡 功, 宇治原 徹, 原田 俊太, 関 和明

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    Applicant:株式会社豊田自動織機

    Application no:特願2011-275588  Date applied:2011.12

    Announcement no:特開2013-124214  Date announced:2013.6

    Patent/Registration no:特許第5936344号  Date registered:2016.5 

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  55. SiC結晶の成長方法、SiC結晶の製造装置、および結晶基板

    柴田 顕次, 市川 慎一郎, 宇治原 徹, 原田 俊太, 関 和明

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    Applicant:株式会社豊田自動織機

    Application no:特願2011-275587  Date applied:2011.12

    Announcement no:特開2013-124213  Date announced:2013.6

    Patent/Registration no:特許第5936343号  Date registered:2016.5 

    J-GLOBAL

  56. SiC結晶の成長方法

    柴田 顕次, 市川 慎一郎, 今岡 功, 宇治原 徹, 原田 俊太, 関 和明

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    Applicant:株式会社豊田自動織機

    Application no:特願2011-275588  Date applied:2011.12

    Announcement no:特開2013-124214  Date announced:2013.6

    J-GLOBAL

  57. SiC結晶の結晶成長方法およびSiC結晶基板

    柴田 顕次, 宇治原 徹, 原田 俊太, 関 和明

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    Applicant:株式会社豊田自動織機

    Application no:特願2011-275589  Date applied:2011.12

    Announcement no:特開2013-124215  Date announced:2013.6

    Patent/Registration no:特許第5829508号  Date registered:2015.10 

    J-GLOBAL

  58. SiC結晶の結晶成長方法およびSiC結晶基板

    柴田 顕次, 宇治原 徹, 原田 俊太, 関 和明

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    Applicant:株式会社豊田自動織機

    Application no:特願2011-275589  Date applied:2011.12

    Announcement no:特開2013-124215  Date announced:2013.6

    J-GLOBAL

  59. SiC結晶の成長方法

    柴田顕次、市川慎一郎、宇治原徹、原田俊太、関和明

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    Application no:2011-275588(JP)  Date applied:2011.12

    Announcement no:2013‐124214 

    Country of applicant:Domestic  

  60. SiC結晶の結晶成長方法およびSiC結晶基板

    柴田顕次、市川慎一郎、宇治原徹、原田俊太、関和明

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    Announcement no:2013‐124215 

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  61. SiC結晶の結晶成長方法およびSiC結晶基板

    柴田顕次, 市川慎一郎, 宇治原徹, 原田俊太, 関和明

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    Announcement no:2013‐124215 

    Country of applicant:Domestic  

  62. SiC結晶の成長方法

    柴田顕次, 市川慎一郎, 宇治原徹, 原田俊太, 関和明

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    Announcement no:2013‐124214 

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Teaching Experience (On-campus) 33

  1. 力学II

    2021

  2. 先端プロセス工学セミナー

    2020

  3. 学生実験2

    2020

  4. 学生実験1

    2020

  5. 力学II

    2020

  6. 材料工学実験第1

    2018

  7. 数値解析演習

    2018

  8. 電磁気学II

    2018

  9. 力学II

    2017

  10. 数値解析演習

    2017

  11. 材料工学基礎実験

    2017

  12. 材料工学実験第1

    2017

  13. 材料工学実験第1

    2016

  14. 物理工学科概論

    2016

  15. 材料工学基礎実験

    2016

  16. 材料工学実験第1

    2015

  17. 材料工学基礎実験

    2015

  18. 材料工学実験第2

    2015

  19. 物理工学科概論

    2015

  20. 材料工学基礎実験

    2014

  21. 材料工学実験第1

    2014

  22. 材料工学実験第2

    2014

  23. 物理工学科概論

    2014

  24. 物理工学科概論

    2013

  25. 材料工学実験第2

    2013

  26. 材料工学実験第1

    2013

  27. 材料工学基礎実験

    2013

  28. 材料工学実験第1

    2012

  29. 材料工学実験第2

    2012

  30. 材料工学基礎実験

    2012

  31. 物理工学科概論

    2012

  32. 物理工学科概論

    2011

  33. 材料工学実験第1

    2011

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Teaching Experience (Off-campus) 12

  1. 数値解析演習

    2020 Nagoya University)

  2. 先端プロセス工学セミナー

    2020 Nagoya University)

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    Level:Postgraduate 

  3. 学生実験1

    2020 Nagoya University)

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    Level:Undergraduate (specialized) 

  4. 学生実験2

    2020 Nagoya University)

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    Level:Undergraduate (specialized) 

  5. 力学II

    2020 Nagoya University)

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    Level:Undergraduate (liberal arts) 

  6. 数値解析演習

    Nagoya University)

  7. 材料工学基礎実験

    Nagoya University)

  8. 材料工学実験第1

    Nagoya University)

  9. 材料工学実験第1

    Nagoya University)

  10. 電磁気学II

    Nagoya University)

  11. 材料工学基礎実験

    Nagoya University)

  12. 応用数学

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Social Contribution 1

  1. 基盤産業支援セミナー

    Role(s):Lecturer

    あいち産業科学技術総合センター  「結晶の分析・評価」 ~シンクロトロン光によって見えるもの~  2017.12

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    Audience: Researchesrs, Company, Governmental agency

    Type:Seminar, workshop

Media Coverage 25

  1. 名大、分光測定時間を5分の1に ベンチャー設立で普及へ Internet

    日本経済新聞社  NIKKEI Tech Foresight  https://www.nikkei.com/prime/tech-foresight/article/DGXZQOUC141GA0U3A910C2000000  2023.9

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    Author:Other 

  2. 分光測定の時間を短縮できる解析プログラムを開発 名古屋大学 Internet

    MEITEC  fabcross for エンジニア  https://engineer.fabcross.jp/archeive/230908_nagoya-uac.html  2023.9

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    Author:Other 

  3. 分光分析の高速化を実現する解析プログラムを開発 ~X線光電子分光測定の測定時間を従来の約1/5に~ Internet

    株式会社 バイオインパクト  日本の研究.com  https://research-er.jp/articles/view/125667  2023.9

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    Author:Other 

  4. 名大,分光分析の高速化を実現するプログラムを開発 Internet

    オプトロニクス社  OPTRONICS ONLINE  https://optronics-media.com/news/20230907/82946/  2023.9

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    Author:Other 

  5. 名大、X線光電子分光の測定時間20分の1に 信頼性試験など効率向上 Internet

    日刊工業新聞社  日刊工業新聞  https://www.nikkan.co.jp/articles/view/00685032  2023.9

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    Author:Other 

  6. 名大など、ウエハー製造にAI 結晶成長工程を自動化 Internet

    日本経済新聞社  日経テックフォーサイト  https://www.nikkei.com/prime/tech-foresight/article/DGXZQOUC2140P0R20C23A7000000  2023.7

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    Author:Other 

  7. 結晶成長のプロセス制御 名大など 自動化アルゴリズム Newspaper, magazine

    日刊工業新聞社  日刊工業新聞  24面  2023.7

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    Author:Other 

  8. 名大など、自動化アルゴリズム開発 結晶成長のプロセス制御 Internet

    日刊工業新聞社  日刊工業新聞電子版  https://www.nikkan.co.jp/articles/view/00679272?gnr_footer=0071666/  2023.7

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    Author:Other 

  9. 製造プロセスの自動化へ、AI制御アルゴリズム開発 結晶成長装置の試作機を開発中 Internet

    アイティメディア株式会社  EE Times Japan  2023.7

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    Author:Other 

  10. 製造プロセスの自動化へ、AI制御アルゴリズム開発 Internet

    アイティメディア株式会社  EE Times Japan  https://eetimes.itmedia.co.jp/ee/articles/2307/11/news059.html  2023.7

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    Author:Other 

  11. 名大ら,製造プロセスのAI制御アルゴリズムを開発 Internet

    株式会社オプトロニクス社  OPTRONICS ONLINE  https://optronics-media.com/news/20230711/81924/  2023.7

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    Author:Other 

  12. 名古屋工業大学などがSiCの欠陥拡張抑制、長期信頼性向上 Newspaper, magazine

    株式会社 日経BP  日経XTECH  2022.10

  13. SiCパワー半導体結晶欠陥 水素イオン注入で抑制 Newspaper, magazine

    株式会社 科学新聞社  科学新聞  4面  2022.9

  14. SiC信頼性 水素イオンで向上 電気特性劣化を抑制 Newspaper, magazine

    産業新聞社  日刊産業新聞  9ページ  2022.9

  15. SiCの信頼性向上 イオン注入で欠陥抑制 Newspaper, magazine

    産業タイムズ社  電子デバイス産業新聞  3面  2022.9

  16. SiCパワー半導体劣化抑制技術を開発 Newspaper, magazine

    電気新聞  産業・技術  2022.9

  17. 水素イオンでSiCパワー半導体の欠陥拡張を抑制、名工大などが発見 Internet

    マイナビ  TECH+(テックプラス)  2022.9

  18. 名大など 半導体ウエハーの転移・ひずみ分布可視化 パワー半導体後押し

    電波新聞社  日刊電波新聞  10ページ  2022.8

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    Author:Other 

  19. 丁寧に不良解析 Newspaper, magazine

    日刊工業新聞社  日刊工業新聞  17面  2022.7

  20. NEDO/ウエハー内面の転移・ひずみ/分布可視化に成功/名大などと共同で

    産業新聞社  日刊産業新聞  9ページ  2022.7

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    Author:Other 

  21. 転位欠陥を非破壊検査 SiCウエハー欠陥分布可視化 名大とMipox Newspaper, magazine

    日刊工業新聞社  日刊工業新聞  25面  2022.7

  22. トヨタ・プリファードなど挑む、「研究DXビジネス」の課題 名大 ベイズ超解像、早期実装 Internet

    日刊工業新聞社  ニュースイッチ  2022.2

  23. 名大、分光スペクトルの解像度100倍 安価装置で高精度計測へ Newspaper, magazine

    日刊工業新聞  日刊工業新聞  24面「科学技術・大学」  2022.2

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    Author:Other 

  24. 分光スペクトル解像度100倍 Newspaper, magazine

    日刊工業新聞  日刊工業新聞  24面  2022.2

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    Author:Other 

  25. SiC結晶製法 高効率化 Newspaper, magazine

    日刊工業新聞社  日刊工業新聞  30ページ  2015.9

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    Author:Other 

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